TWI277771B - Method of manufacturing microlens, microlens, microlens array, electro-optical device, and electronic apparatus - Google Patents

Method of manufacturing microlens, microlens, microlens array, electro-optical device, and electronic apparatus Download PDF

Info

Publication number
TWI277771B
TWI277771B TW094126975A TW94126975A TWI277771B TW I277771 B TWI277771 B TW I277771B TW 094126975 A TW094126975 A TW 094126975A TW 94126975 A TW94126975 A TW 94126975A TW I277771 B TWI277771 B TW I277771B
Authority
TW
Taiwan
Prior art keywords
lens
microlens
portion
curved surface
etching
Prior art date
Application number
TW094126975A
Other languages
Chinese (zh)
Other versions
TW200609539A (en
Inventor
Norihiko Ozawa
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2004254816A priority Critical patent/JP4285373B2/en
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of TW200609539A publication Critical patent/TW200609539A/en
Application granted granted Critical
Publication of TWI277771B publication Critical patent/TWI277771B/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • G02B3/0056Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0012Arrays characterised by the manufacturing method
    • GPHYSICS
    • G02OPTICS
    • G02FDEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating, or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133526Lenses, e.g. microlenses, Fresnel lenses
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00Optical: systems and elements
    • Y10S359/90Methods

Abstract

A method of manufacturing a microlens includes: forming on a transparent substrate an etching stop layer in a lens formation region where a curved lens surface of the microlens is to be formed, the etching stop layer having an island shape as a planar shape thereof; forming an intermediate layer on the etching stop layer; forming an etching mask layer on the intermediate layer, the etching mask layer having an opening at a position facing the etching stop layer; and etching, by means of isotropic etching, the intermediate layer from the opening, and etching the transparent substrate and the intermediate layer from a side of the etching stop layer.

Description

[Brief Description of the Invention] [Technical Field] The present invention relates to a microlens, a microlens array, and a photovoltaic device including the microlens, which are applied to a photovoltaic device such as a liquid crystal device. The technical field of devices and electronic machines. [Prior Art]

In a photovoltaic device such as a liquid crystal device, for example, a microlens corresponding to each pixel is incorporated in a counter substrate, and a microlens array plate in which such a plurality of microlenses are assembled is attached. With such a microlens array, a bright display is achieved in the optoelectronic device. In other words, the microlens condenses the light emitted from the light source of the backlight without being wasted in the opening region of each pixel, thereby improving the utilization efficiency of the light emitted from the light source. For example, in a liquid crystal device including such a microlens, a counter substrate in which a microlens array is mounted and a pixel electrode and a thin film transistor are formed in each pixel by adjusting a gap with a resin in addition to a resin. The element substrate of a switching element or the like is sealed with a liquid crystal therein, thereby being manufactured. In such a liquid crystal device, the thickness of the liquid crystal layer is uniform in the entire liquid crystal panel, which is an important factor for reducing unevenness in brightness and unevenness in color. According to the technique disclosed in Patent Document 1, the peripheral portion of the microlens is still a curved surface, and the central portion of the microlens is a flat surface. Thereby, the thickness of the microlens is reduced, and the thickness of the resin layer formed on the microlens is thinned as much as possible by reducing the thickness error of the liquid crystal layer. [Patent Document 1] JP-A-2000- 1 93 92 8 (2) 1277771 [Disclosure] [The object to be solved by the invention] Such a photovoltaic device has a general requirement for the long life of the device, but generally In the liquid crystal and the alignment film, for example, in a portion located at the center of the opening region of each pixel, the light source light is locally concentrated by the microlens, and it is confirmed by the inventor of the present invention. A situation in which significant degradation occurs. The technique described in the patent document is a technique for reducing the thickness error of the liquid crystal layer, and the known description by the inventors of the present invention through the deterioration in the condensed pixel® region is not observed. Further, the lens characteristics of the microlens assumed by the inventors of the present invention are poor because the central portion of the microlens is a flat surface. In other words, the microlens described in the patent document does not condense light incident on the central portion of the flat surface, and penetrates as it is, and the central φ portion does not function as a lens. Therefore, it is difficult to increase the light utilization efficiency by effectively concentrating the light in the opening area, and thus it becomes difficult to increase the brightness and contrast of the display, and there is a problem in technology. The present invention has been made in view of the above problems, and an object of the present invention is to provide a microlens which can reduce the lifetime of a liquid crystal device or the like by reducing the lifetime of a liquid crystal device or the like by reducing the brightness of the liquid crystal device and the like. , microlens arrays, optoelectronic devices and electronic machines. (3) 1277771 [Means for Solving the Problem] The method for producing a microlens according to the present invention is to provide an etch stop layer having a planar shape of an island formed by forming a lens formation region of a microlens on a transparent substrate. a step of forming an intermediate layer on the etch stop layer, wherein the opening portion is provided at a position layer facing the etch stop layer, and the layer is etched by the opening portion by an isotropic etching, thereby further etching An etching step of etching the transparent substrate in the middle of the side of the stop layer. According to the method for producing a microlens according to the present invention, an etch stop layer is formed on a lens on a transparent substrate such as a quartz substrate or a glass substrate. The etch-stop layer has a smaller size than a lens-forming region having an island shape and having a microlens through etching, for example, which will be described later. On the other hand, for example, the positions of a plurality of microlenses formed by φ in the case where a plurality of microlenses are formed into a curved surface of the lens form an island-shaped spot stop layer. Next, an intermediate layer is formed on the etch stop layer. In the middle, as in the film forming method which is generally used for the CVD method or the sputtering method, an etching mask layer having an opening portion opposite to the etching is formed on the intermediate layer. The etch mask layer may be formed directly on the intermediate layer in such a manner as to avoid the position of the stopper layer. The portion is formed by etching to cover the entire upper portion of the intermediate layer, for example, and removing a lens including a surface opposite to the position of the etching stop layer, and etching the intermediate layer on the intermediate layer. Together, the etch is first formed on the transparent substrate in the formation region, and finally formed on the transparent substrate, and the final plurality of layers are formed by way of example. The stop layer is formed to etch stop or after the opening of the mask layer. Formed like this -6 - (4) 1277771, and after forming an etch stop layer, an intermediate layer, and an uranium engraved mask layer on the transparent substrate, the interlayer is etched by the opening portion by an isotropic etching, and The side of the etch stop layer is uranium engraved with the transparent substrate along with the intermediate layer. More specifically, as the intermediate layer is etched toward the outside from the opening portion, the uranium stop layer is exposed, and the intermediate layer is removed, whereby the intermediate layer is continuously etched while the uranium engraved on the side surface of the etch stop layer. As a result, a lens curved surface having a specific shape is formed by the presence of the etch stop layer in the transparent substrate. More specifically, the etched surface which is formed from the side surface of the etch-stop layer toward the inside of the etch-stop layer is in contact with the lower side of the etch-stop layer, and a convex curved surface is formed on the etch-stop layer side. On the other hand, the uranium facet which is formed toward the outer side of the etch stop layer forms a convex convex curved surface on the side opposite to the lens curved surface formed on the lower side of the etch stop layer. The transparent substrate is etched from the side surface of the uranium engraving stop layer and the lower side of the etched intermediate layer, and the lens curved surface is a lens curved surface which is continuously connected to the lens formation region of the transparent substrate. When the lens curved surface formed as described above is filled with a resin having, for example, light transparency, a microlens having a lens curved surface whose central portion is further recessed than the circumference can be formed. Such a microlens can function as a lens in both the center portion of the lens recessed than the periphery and the peripheral portion around the central portion of the lens. Further, by the specific lens curved surface, the light emitted from the light source is condensed in the pixel region, and the light edge is appropriately diffused while being concentrated, so as not to concentrate on one point of the pixel region. Therefore, the deterioration of the -7-(5) 1277771 of each part of the pixel region caused by the light concentration can be suppressed without impairing the light transmittance of the pixel region. Thereby, it is possible to suppress deterioration of the alignment film in, for example, the pixel region, and to prolong the life of the liquid crystal device or the like. On the other hand, the etched surface is not filled with a resin, and the etched surface of the etched transparent substrate may be used as a lens curved surface. Further, the method for producing a microlens according to the present invention does not require the manufacture of a microlens such as a photovoltaic device of a liquid crystal device, and the photovoltaic device of the microlens is of course applicable to any device. According to the method for producing a microlens according to the present invention, a plurality of microlenses can be formed by changing the etching stop shape or changing the positional relationship, the size, and the like of the etching stop layer and the opening. In one aspect of the method for producing a microlens array according to the invention, the etching rate of the intermediate layer is larger than the etching rate of the transparent substrate. According to this aspect, the etching rate of the intermediate layer is larger than the etching rate of the previous recording. This makes it possible to form an aspherical lens surface. The film is formed by a general-purpose film such as a CVD method or a sputtering method, and the relationship between the etching rate of the intermediate layer and the size of the transparent substrate is the shape of the lens curved surface of the microlens formed by the starving step. In another aspect of the method for producing a microlens according to the present invention, the planar shape of the etch stop layer is circular. According to this aspect, the entire surface of the etch stop layer is etched on the side surface, and the etched surface is in contact with the lower side of the etch stop layer. The planar shape of the term "stop layer" means the etch stop layer in the surface of the transparent substrate. The etched surface to be touched is along the circumferential direction of the uranium etch stop layer, and can be arbitrarily limited to a shape having a root layer and a shape, and the method of determining the intermediate layer of the front lining substrate is an important factor. In the middle, the shape of the transparent etching is stopped to form a -8- (6) 1277771 smooth lens surface. In another aspect of the method for producing a microlens according to the present invention, the planar shape of the opening is circular. According to this aspect, the intermediate layer is etched by the eccentricity centering on the opening. More specifically, the intermediate layer is isotropically etched in the lateral direction of the intermediate layer, that is, on the transparent substrate along the direction in which the intermediate layer is extended. By setting the shape, size, or positional relationship of the opening portion and the etching stop layer, a desired lens curved surface can be formed on the transparent g substrate. In another aspect of the method for producing a microlens according to the present invention, the opening portion and the etching stop layer are coaxially viewed from a plane on the transparent substrate. According to this aspect, the opening portion and the etching stop layer are located at a coaxial position in plan view, and the distance from the opening portion to the side surface of the etching stop layer is equal to the circumferential direction of the etching stop layer at the same time on the side surface of the etching stop layer or The deviation of the time is applied to the etching of the transparent substrate φ plate from the side of the etch stop layer. More specifically, for example, when the planar shape of the opening portion and the etching stop layer is circular, the transparent substrate can be simultaneously etched by the entire side surface of the etching stop layer. In the case of "on the plane", it means that the above layers are viewed from the upper side of the etching stop layer. Therefore, the etching of the transparent substrate from the side surface of the etching stop layer toward the inside of the etching stop layer is performed so as to have a concentric circular shape in plan view along the circumferential direction of the etching stop layer having the same curvature radius. In a space surrounded by the curved surface of such a lens, a lens forming material having, for example, light transmittance is filled, whereby the isotropic property is more concentrically formed by the center of the etching stop layer and the opening portion. (7) 1277771 Lens surface with large line width. In another aspect of the method for producing a microlens according to the present invention, the size of the region in which the etching stop layer is formed in the lens formation region is larger than the size of the region in which the opening portion is formed. According to this aspect, etching is performed from the intermediate layer facing the opening portion in the lens forming region toward the side surface of the etching stopper layer. The etching is performed from the intermediate layer on the upper side of the etching stopper layer to the side surface of the uranium etching stop layer. Thereby, the etching of the transparent substrate is started from the side surface of the etching stop layer, and a concentric circular lens curved surface is formed as seen in the lower plane of the etching stop layer. Further, the side surface of the etching stop layer is etched in an isotropic manner, and the entire curved surface of the lens has a concentric circular contour line to form a continuous curved surface. When the uranium engraving rate of the intermediate layer is larger than the etching rate of the transparent substrate, a lens curved surface having a curved curvature radius of the lens surface is formed on the inner side and the outer side of the etching stop layer. In the case of the isotropic etching using, for example, wet uranium engraving, the intermediate layer is etched faster than the transparent substrate, whereby the lens curved surface formed on the outer side φ of the etch stop layer is formed as an aspherical surface. More specifically, a portion of the transparent substrate located on the lower side of the etched intermediate layer, the contact area contacting the etchant is larger than other regions of the transparent substrate, and only a portion having a larger contact area, a portion of the transparent substrate is more than other regions It is easier to be etched. Thereby, the lens curved surface on the outer side of the etching stop layer can be formed as an aspherical surface. On the other hand, when the etching rates of the intermediate layer and the transparent substrate are the same, the etched surface of the etched transparent substrate becomes a spherical surface. An intermediate layer having an etching rate equal to or higher than that of the transparent substrate is selected, whereby any one of an aspherical surface or a spherical surface is selected as a lens forming surface, -10- (8) 1277771 The radius of curvature of the lens surface of the microlens is adjusted in such a manner as to the desired lens characteristics. In order to solve the above problems, the microlens according to the first aspect of the present invention includes a ridge line extending in a ring shape around a normal line of a plane, and is inclined toward the outer side and the inner side of the ridge line, along the normal line. a peripheral portion of the lens that protrudes from the one plane, and a central portion of the lens that is surrounded by the peripheral edge of the lens and that is recessed toward the plane along the normal line; and a surface of the peripheral portion of the φ lens spans a surface of a central portion of the lens The area is the lens surface. According to the microlens according to the present invention, the surface of the lens peripheral portion and the central portion of the lens is used as a lens curved surface, whereby a region of one of the lens curved surfaces is protruded from a plane, and other regions of the curved surface of the lens are formed toward a plane. The shape of the depression. According to such a lens curved surface, the light intensity distribution of the light that is first concentrated on the second-order surface by the surface of the peripheral portion of the lens is the light that is also concentrated on the second-order surface by the surface of the central portion of the lens. The light intensity φ degree distribution exists in the circumferential direction. In other words, the central portion of the lens and the peripheral portion of the lens are respectively condensed, whereby the entire microlens is one of the microlenses, and the light incident on the formation region is condensed to correspond to the pixel of the one microlens. In the open area, the light is dispersed so as not to condense the light at one point. In order to solve the above problems, the microlens according to the second aspect of the present invention includes a ridge line extending in a ring shape around a normal line of a plane, and is inclined toward the outer side and the inner side of the ridge line, along the normal line. a lens peripheral portion having a first lens curved surface protruding from the one plane and surrounded by the lens peripheral edge portion, and continuously connected to the first lens curved surface, -11 - (9) 1277771 facing the aforementioned one along the normal line The central portion of the lens having the second lens curved surface recessed in the plane. According to the microlens of the present invention, the lens peripheral portion having the first lens curved surface and the lens central portion having the second lens curved surface are dispersed so as not to condense light at one point. Here, the "one plane" of the present invention means, for example, the bottom surface of the lens and the bottom surface of the lens peripheral portion, that is, the bottom surface of the microlens. The peripheral portion of the lens is a circumference extending from the normal line φ of the bottom surface of the microlens, and the ridge line of the peripheral portion of the lens is annularly extended around the normal. The peripheral portion of the lens has a first lens curved surface which is inclined toward the outer side and the inner side of the ridge line, and protrudes from the bottom surface of the microlens along the normal line of the bottom surface. On the other hand, the central portion of the lens surrounds the peripheral portion of the lens and has a second lens curved surface continuously connected to the curved surface of the first lens. The second lens curved surface is recessed toward a plane unlike the first lens curved surface. More specifically, the microlens is a plan view, and has a first lens curved surface and a second lens curved surface surrounding the first lens curved surface, and the curved surfaces are continuously connected, thereby forming a smooth lens curved surface. Further, the depression in the central portion of the lens includes both the peripheral portion of the lens being joined to the center of the microlens at a point, or the bottom of the recess having a slightly larger width. According to the central portion of the lens and the peripheral portion of the lens, the light intensity distribution of the light that is first concentrated on the second dimension surface by the peripheral portion of the lens is concentrated by the central portion of the lens along the same ectopic surface. The light intensity distribution of the light exists in the circumferential direction. In other words, the light is collected by the central portion of the lens and the peripheral portion of the lens, whereby the entire surface of the microlens can be concentrated and incident on the region of the pixel, and the aperture corresponding to the pixel of the one microlens is opened. Inside, the light is not dispersed in a way that it is concentrated at one point. According to the microlens of the invention of -12-(10) 1277771, both the peripheral portion of the lens and the central portion of the lens can be made into lenses having different first lens curved surfaces and second lens curved surfaces. The function can also be a function of making a lens into a whole lens. In this way, the entire light that is incident on the microlens can be efficiently collected in a specific region such as the opening region of each pixel, so that the light can be appropriately dispersed to enhance the brightness and contrast of the display, and to extend the liquid crystal device. Life expectancy. In the shape φ state of one of the microlenses according to the first and second aspects of the invention, the lens peripheral portion and the lens center portion are coaxially formed with the normal line as a central axis. According to this aspect, the peripheral portion of the lens is concentrically viewed around the central portion of the lens on a plane. The light 'concentrated by the central portion of the lens and the peripheral portion of the lens is a light intensity distribution that is concentrically dispersed, and it is possible to suppress light from being concentrated at one point. According to another aspect of the microlens according to the second aspect of the present invention, the first lens curved surface and the second lens curved surface have different curvature radii. According to this aspect, the light intensity distribution can be adjusted by the difference in the radius of curvature of the first lens curved surface and the second lens curved surface, so that the alignment film located in the pixel region can be adjusted not only at a point but also at a point. Light intensity distribution. Further, it is possible to concentrate the light intensity distribution in the pixel area while efficiently concentrating on the entire pixel region. In another aspect of the microlens according to the second aspect of the present invention, the cross-sectional shape of the first lens curved surface that is perpendicular to the extending direction of the ridge line extends is a spherical shape or an aspherical shape. According to this aspect, the cross-sectional shape of the curved surface of the first lens is a spherical shape of −13-(11) 1277771 or an aspherical shape, whereby the thickness of the microlens is designed while dispersing the light intensity distribution of the collected light. The desired thickness. In particular, when the first lens curved surface has an aspherical shape, the thickness of the microlens can be thinned while concentrating the light in a specific range. The microlens array of the present invention is a microlens of the present invention as described above in order to solve the above problems. According to the microlens array of the present invention, as compared with the above-described microlens, the light transmittance of the pixel region is not increased, and the light is prevented from being concentrated at one point. In particular, the microlens array in which each microlens is arranged in such a manner as to face each pixel of the photovoltaic device is a light condensed on each pixel, thereby improving the brightness of the pixel, etc., and suppressing by concentrating light. Deterioration occurs in each part of the pixel area. The photovoltaic device of the present invention is provided with the above-described microlens of the present invention in order to solve the above problems. According to the microlens according to the present invention, similarly to the above-described microlens, Φ does not impair the light transmittance of the pixel region, and it is possible to suppress light from being concentrated at one point. Thus, an optoelectronic device having excellent display performance can be provided. Further, in the photovoltaic device of the present invention, as described above, the microlens having excellent lens characteristics can improve the light use efficiency by the microlens, and can also improve the light transmittance and contrast of each pixel. Therefore, the photovoltaic device according to the present invention can exhibit high-quality images and have a long life. The electronic device according to the present invention is provided with the above-described photovoltaic device of the present invention in order to solve the above problems. According to the electronic device according to the invention of the present invention, it is possible to realize a projection type display device, a liquid crystal television, and a portable display device of the same level display having a high lifetime by the photoelectric device of the invention of the above-mentioned 14- (12) 1277771 Sub-notebook, word processor, viewing window or monitor direct view, workstation, TV phone, P 0 S terminal, touch panel and other sub-machines. With regard to the electronic device of the present invention, in addition to, for example, an electrophoresis device, a Field Emission Display and Surface-Conduction Emitter Display using an electronic radiation element can be realized, and DLP (Digital Light Processi) and other advantages of the present invention are [Embodiment] [Best Mode for Carrying Out the Invention] Hereinafter, a method of manufacturing a microlens according to the present invention, a microlens array, a photovoltaic device, and an electronic device will be described with reference to the drawing φ. (Microlens Array Plate) First, the lenticular sheet 1 to Fig. 3 to which the microlens of the present invention is applied will be described. Fig. 1 is a perspective view showing a schematic configuration of the lens array panel of the present embodiment. A plan view of the four differentials adjacent to each other among the microlenses of the microlens array plate is enlarged. Fig. 3 is an enlarged view showing a part of a cross section of the microplate of the embodiment, which can be used for telephone and electric recording. Various electronic newspapers and other devices (electron-ng), etc. for the implementation of the microlens and the details of the side, refer to the first form Micro lens showing lens array with lens -15-(13) 1277771 In Fig. 1, the microlens array plate 2 of the present embodiment is arranged in a matrix plane on the transparent plate member 210 of the "transparent substrate" of the present invention. A plurality of microlenses 500 are formed. The member 2 10 is, for example, a quartz plate or the like, and a matrix-like excavation is mostly concave in the concave recess in which the transparent plate member 2 1 0 is excavated, for example, formed of a photosensitive resin material. The adhesive hardening layer 230 is arranged to cover the transparent plate member 210 so that the transparent plate member 210 and the transparent plate member 2 1 0 are mutually connected. For the next 200 and the transparent plate member 2 1 0 The adhesive is, for example, a transparent adhesive layer having a higher refractive index than that of the transparent film. In FIGS. 2 and 3, the lens curvature of the microlens 500 is made by a transparent plate member 2 1 0 having a different refractive index from each other. The microlens 500 is formed by projecting a lens slightly protruding from the lens in Fig. 3. The microlens 500 of the present embodiment is manufactured by a special manufacturing method as described later, and the lens of the microlens 500 The curved surface is a peripheral portion with different radii 5 Ο Ο Α The central portion is composed of 5 Ο Β . The portion 5 Ο Ο A is the portion on the peripheral side of the microlens 500, which is convex in the figure. The central portion of the lens 5 Ο Ο B is the lens constituting the microlens. The portion on the inner side of the peripheral portion 5 Ο Ο A is a convex-shaped portion in the figure, and more specifically, a portion of the lens curved surface in which the lens central portion 500B covers the bottom surface 502 of the lens 510 and is recessed. The microlens array plate 2 0 In the case of using the microlens 500 0 0, the photovoltaic device of the liquid crystal device or the like described later is a recess having one of the transparent plate structures.塡 由 接着 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本The incident light incident on each of the microlenses 500 by the -16-(14) 1277771 is condensed toward the center of each pixel of the photovoltaic device by the refractive action of the microlens 500. Further, the configuration of the microlens 500 will be described in detail later. (Manufacturing method of microlens) Next, the method of manufacturing the microlens according to the present embodiment will be described with reference to Figs. 4 to 9 . 4 to 6 are cross-sectional views showing a series of steps of the manufacturing method of the microlens according to the embodiment of the present invention, and Fig. 7 is a plan view showing the arrangement of the mask layer 2 and the opening 5. In Fig. 4(a), a mask layer 2 of one example of the "etch stop layer" of the present invention is formed on the transparent plate member 210, and the intermediate layer 3 is sequentially formed thereon and the present invention is related thereto. A mask layer 4 of one example of "etching the mask layer". The mask layer 2 is, for example, an amorphous sand film formed by a CVD (Chemical Vapor Deposition) method or the like, or a Cr film having a fluorine-resistant acidity, a polycrystalline ruthenium film, or the like. In the present embodiment, the shape of the mask layer 2 in the surface of the transparent plate φ member 210 is circular, and the mask layer 2 is formed in an island shape on the transparent plate member 210. The intermediate layer 3 is a layer formed of a material mainly composed of a material having an etching rate equal to or higher than the etching rate of the transparent plate member 210. The intermediate layer 3 is formed by a CVD method or a sputtering method in a manner such as a desired uranium engraving rate. Further, in the following, the etching rate of the intermediate layer 3 is described as being larger than the etching rate of the transparent plate member 210. As will be described later, in the case where the etching rate of the intermediate layer 3 is larger than the etching rate of the transparent plate member 210, the uranium engraving rate of the aspherical 'intermediate layer 3 and the transparent plate -17- can be formed by the last formed microlens. (15) 1277771 When the etching rate of the member 2 10 is equal, the lens curved surface of the microlens may form a spherical surface. The mask layer 4 is formed by the same method as the mask layer 2, and has an opening portion 5 provided to expose a part of the surface of the intermediate layer 3. The opening portion 5 is a circular hole having a central shape coaxial with the central axis of the mask layer 2, and the size of the opening portion 5 is smaller than that of the mask layer 2. More specifically, the diameter of the circular opening portion 5 is larger than the circle. The shape of the mask layer 2 is also small. That is, the size of the mask layer 2 is changed, and the lens forming surface of the transparent plate member 2 10 is larger than the size of the opening portion 5. Further, the planar shape, size, and positional relationship of the mask layers 2 and 4 and the opening portion 5 are an example of a method of manufacturing the microlens according to the present invention, and a mask layer formed on the transparent plate member 210 in an island shape is formed. 2. The opening 5 may be disposed so as to face the mask layer 2 with the intermediate layer 3 interposed therebetween. The opening portion 5 is located coaxially with the central axis of the concealing layer 2. Therefore, when the opening 5 and the mask layer 2 are viewed from the upper side of the mask layer 4, the mask layer 2 φ and the edge of the opening 5 are respectively concentric. In the following, although the planar shape of the mask layer 2 and the opening 5 is circular, the method of manufacturing the microlens according to the present invention does not exclude the mask layer 2 and the opening. The planar shape of 5, for example, the planar shape of the mask layer 2 and the opening portion 5 may be an equilateral triangle, a square, a regular hexagon, a regular octagon, or other planar shape that rotates the object toward the central axis. Here, the arrangement of the mask layer 2 and the opening 5 will be described with reference to Fig. 7. In Fig. 7, on the transparent plate member 2 1 0, a mask layer -18-(16) 1277771 2, an intermediate layer 3, and a mask layer 4 are sequentially formed, and the description will be made with reference to Figs. 4 to 6 The manufacturing method of the microlens is equivalent to taking out one of the openings 5 formed in the plurality of openings 5 of the mask layer 4, and taking out the steps for etching the intermediate layer 3 and the transparent plate member 2 1 0. Step profile view. The mask layer 2 is formed in a lens-formed region 500a which is formed in an island shape on the transparent plate member 210, and the lens-forming region 500a is a plurality of pixels in which the microlens array plate 20 is disposed in an overlapping manner after completion of the microlens. The arrangement of φ is defined as a matrix shape along the longitudinal and lateral directions in the figure. The intermediate layer 3 and the transparent plate member 2 1 0 are formed by a plurality of openings 5 - 倂 provided in the mask layer 4, whereby the lens curved surfaces of the respective microlenses are respectively formed, thereby forming a plurality of reference figures 1 to The microlens array plate 20 of the microlens described in Fig. 3 is further removed, and in Fig. 4(b), the intermediate layer 3 is engraved by the uranium of the opening portion 5. Here, "isotropic" means that the intermediate layer 3 φ is uniformly etched toward the outside in the figure by the opening portion 5 which is coaxially located on the central axis A of the mask layer 2, and is, for example, wet in the present embodiment. Etching is performed to etch the intermediate layer 3 in the lateral direction of the drawing. Further, the intermediate layer 3 is etched along the longitudinal direction in the drawing, that is, in the thickness direction, but the etching of the intermediate layer 3 along the thickness direction is temporarily stopped by the mask layer 2, and the intermediate layer 3 is performed only in the lateral direction. The moment of engraving. In FIG. 4(c), the etching of the intermediate layer 3 is further performed. When the side surface of the mask layer 2 is exposed to the surface of the transparent plate member 210, the transparent plate member 210 is the mask layer 2. The side is engraved for the starting point. Here, in the present embodiment, the opening portion 5 is provided coaxially with the central axis of the mask layer 2, and the center portion of the opening portion 5 to the side surface portion 2a of the mask layer 2 is -19- (17). The distance of 1277771 is equal to the entire side surface portion 2a of the mask layer 2. Therefore, the etching surface of the intermediate crucible 3 reaches the entire side surface portion 2a of the mask layer 2 at the same time, and the etching of the transparent plate member 2 10 is started from the side surface portion 2 a of the mask layer 2 in the mask layer 2 . The entire side portion 2a starts at the same time. The etching of the transparent plate member 210 is performed in the direction of the inner side and the outer side of the mask layer 2 and the lower side of the mask layer 2 with the side surface portion 2 a of the mask layer 2 as a starting point, as will be described later. For the region of the transparent plate member 210 that covers at least the enamel layer 2, the isotropic is etched. In Fig. 5(a), the transparent plate member 210 is etched starting from the side surface portion 2a of the mask layer 2. The transparent plate member 210 is etched from the both side faces 2a of the mask layer 2 in the drawing toward the inside and the outside in the drawing, and the transparent plate member 2 10 is viewed from the upper side in the drawing, and is concentric from the central axis A toward the outside. An etched surface having contour lines is formed in a circular shape. In Fig. 5(b), when the etching of the transparent plate member 210 is further performed, the etching surface of the transparent plate member 2100 is etched from the side surface portion 2a of the mask layer 2 toward the central axis A, in the mask layer. The lower central axis A of the second surface 2 is in contact with each other to form a convex portion 11 having a ruffle shape from the central axis A of the mask layer 2 toward the outside. The convex portion 1 1 is an example of the "central portion of the lens" of the present invention, and has a sharp top portion toward the upper side in the drawing. In Fig. 5(c), if the etching is further performed, the top portion of the convex portion is away from the mask layer 2. Thereby, the top portion of the convex portion 1 is formed with a convex portion 13 having a rounded curved surface. A concave portion 1 2 extending in the circumferential direction of the central axis A is formed around the convex portion 13. Here, the convex portion 13 which is etched from the convex portion 1 1 also corresponds to one of the "central portions of the lens" of the present invention -20-(18) 1277771. Therefore, at the stage of forming the convex portion 11, the etching step is stopped to form the microlens ' or the etching proceeds until the convex portion 13 is formed to form the microlens. In the case where the convex portion 1 1 is the central portion of the lens of the microlens, the curved surface extending around the convex portion 1 1 is a spherical surface. Here, the shape of the uranium facet which is different in the etching rate of the intermediate layer 3, that is, the shape of the finally formed lens curved surface will be described. In the figure, the dotted line is the etched surface shown in Fig. 5(b), and the intermediate layer 3 is higher than the transparent plate member φ 21 0 because of the etching rate, and the transparent plate member 2 is outside the side portion 2 a of the mask layer 2 The intermediate layer 3 on 10 will be etched laterally in the drawing as fast as the transparent plate member 2 1 0. Therefore, the transparent plate member 2 1 接近 in the vicinity of the both ends in the drawing is etched from the surface exposed by the removal of the intermediate layer 3 in addition to the etching from the side surface portion 2a of the mask layer 2. In the figure, the area of the outer side of the side surface portion 2a of the mask layer 2 of the transparent plate member 210 is increased as compared with the etching by the side surface portion 2a of the mask layer 2 toward the central axis A. That is, the etched surface which is formed by the side surface portion 2a of the mask layer 2 toward the central axis A becomes a part of the spherical surface centering on the side surface portion 2a of the mask layer 2, and on the other hand, faces the side surface portion of the mask layer 2 The etched surface which is formed on the outer side of 2a is a curved surface having a radius of curvature different from the etched surface on the lower side of the mask layer 2, and forms an aspherical surface continuous with the etched surface on the lower side of the mask layer 2. Thus, the transparent plate member 2. The etched surface 10 of 10 is a lens curved surface which is connected to a curved surface having a different radius of curvature on the lower side of the mask layer 2 and the outside of the mask layer 2. In this way, if the etching is further performed by the state of Fig. 5(b), the connecting member 21 - (19) 1277771 has a convex portion 1 having a curved surface formed at the transparent plate member 2 1 at the end of the uranium engraving. 3. A recess 1 2 having a depth equal to the concentric shape of the convex portion 13 around the convex portion 13 . Further, the boundary between the "first lens curved surface" and the "second lens curved surface" according to the present invention is formed at the periphery of the microlens by the step of forming the convex portion n and further performing uranium engraving. The meaning of the border of the lens surface of the central part. More specifically, the surface of the convex portion 13 formed by further etching the convex portion 1 1 corresponds to an example of the "second lens curved surface", and the surface of the concave portion 12 corresponds to the "second lens φ curved surface". In the step of covering the convex portion 13 and the concave portion 12, a lens forming material such as a transparent resin is filled, whereby a curved surface reflecting the curved surface of the convex portion 13 and the inner side of the concave portion 12 can be formed. Microlens of the lens surface. More specifically, as will be described later, the central portion of the lens of the microlens is further recessed than the peripheral portion of the lens around the central portion of the lens, and microlenses having different lens curved surfaces are formed at the central portion of the lens and the peripheral portion of the lens. Next, in Fig. 6(a), the mask layer 2 and the mask layer 4 are removed from the transparent plate member 210 which forms the convex portion 13 and the concave portion 1 2 . The mask layer 2 is in a state where the transparent plate member 2 10 is etched, and the transparent plate member 2 10 is floated, and is removed when the mask layer 4 is removed. Here, the shape of the convex portion 13 and the concave portion 12 formed in the transparent plate member 2 10 will be described in detail with reference to Figs. 8 to 1 . Fig. 8 is a plan view showing the transparent plate member 2 10 from the side of the etching surface, and Fig. 9 is a sectional view taken along the line IX - IX / line of Fig. 8. The first drawing is an enlarged view showing the enlarged view of Fig. 9. In Figs. 8 and 9, the convex portion 13 and the concave portion 12 are formed in the lens forming region 5? a by the central axis A of the mask layer 2, and -22-(20) 1277771. The microlens having the surface of the convex portion 13 and the concave portion 12 as a curved surface of the lens is a single pixel disposed in, for example, a plurality of pixels including a liquid crystal device, and includes a lens of the convex portion 13 and the concave portion 12. The size of the formation area 500a is the size that is converged within one pixel area. In Fig. 9, the curved surface 12a on the inner side of the concave portion 12 is bilaterally symmetrical with respect to the central axis A, and is extended similarly along the circumference of the convex portion 13. The height from the bottom of the recess 12 to the top portion of the projection 13 is lower than the height of the bottom of the recess 12 to the peripheral portion 16 of the recess 12. The surface of the convex portion 13 is a curved surface 13a. The curved surface 12a is an example of the "first lens curved surface" corresponding to the present invention, and the curved surface 13a is an example corresponding to the "second lens curved surface" of the present invention. Therefore, by covering the convex portion 13 and the concave portion 12, for example, by embedding a transparent resin such as a lens forming material, a microlens having a lens curved surface reflecting the shapes of the curved surfaces 12a and 13a can be formed. Further, a lens forming material which is not a transparent resin may be formed, and the curved surfaces 13a and 12a are formed as continuous lens curved surfaces, and microscopically formed in the first drawing, and the curved surfaces 1 3 a and 1 2 Do more details. The curved surface 13 3 a is located in the convex portion 13 and has a spherical surface defined by the radius of curvature r. The curved surface 12 a is a space surrounded by the inner surface of the concave portion 12 2 , that is, the curved surface 1 2 a, and is configured to A part of the spherical surface defined by the radius of curvature R. Furthermore, the radius of curvature R is larger than the radius of curvature r. The curved surfaces 1 3 a and 1 2a form a continuous lens curved surface by interpolating the inflection points. The curved surface 1 2 a is an aspherical surface that is slightly offset from the spherical surface at both ends in the figure. Further, in the present embodiment, the curved surface 13 a is formed as a spherical surface defined by the radius of curvature r of -23 - (21) 1277771, but the uranium engraving may be further performed by the transparent plate member 2 1 0 And the surface 13 a forms a plane that is flatter than the spherical surface. On the contrary, the shape of the convex portion 13 can be formed into a conical shape by rapidly ending the etching of the transparent plate member 210, and the curved surface 13a can be bonded to a point on the central axis a. Further, in Fig. 6(b), a light-transmitting adhesive is applied as a lens forming material so as to cover the convex portion 13 and the concave portion 12 as a lens forming material. The glass member 14 is overlaid on the transparent plate member 210 to press the adhesive to form an adhesive layer 23 0. As a result, the microlens 500 having the lens curved surfaces respectively reflecting the curved surfaces of the convex portion 13 and the concave portion 12 can be formed. (Structure of Microlens) Next, the structure of the microlens will be described with reference to FIGS. 1 to 13 . Fig. 1 is a perspective view showing the outer shape of the microlens according to the embodiment. Fig. 12 is a graph showing the relationship between the shape of the microlens and the light intensity distribution of light collected by the microlens. Fig. 1 is a view comparing the light intensity distribution of the conventional microlens and the light intensity distribution of the microlens according to the present embodiment. Further, the microlens of this embodiment shown in Figs. 11 to 13 is a microlens formed by the manufacturing steps of the microlens described in Figs. 4 to 10 . Hereinafter, in the portions common to the fourth to the first drawings, common reference numerals will be attached for explanation. The microlens according to the present embodiment has a lens curved surface with a rotating body for the central axis A. However, the microlens according to the present invention is not limited to a shape in which the lens curved surface is rotationally symmetrical with respect to the central axis, for example, to include micro Face of the central axis of the lens-24- (22) (22)

1277771 Cut through the section of the microlens, the relevant central axis does not exclude the lens surface. In the first embodiment, the microlens 500 is composed of a lens peripheral portion 510A extending over the circumference of the central axis A of the microlens and a lens central portion 500B surrounding the rim portion 00A. The lens peripheral portion 5 00A is formed in the concave portion 12 formed by the etched plate member 2 10 in the fourth to sixth figures, and the lens-forming material having a higher refractive index material than the transparent member 210 has The lens curved surface curved surface 1 2 a reflecting the lens curved surface of the concave portion 1 2 of the transparent plate member 2 10 is an example of the "first lens curved surface" according to the present invention. The lens center portion 500B has a lens curved surface 13a that is recessed from the lens peripheral portion 500A when surrounded by the lens peripheral portion 500A. That is, the transmissive surface 13a is one of the "second lens curved surfaces" corresponding to the present invention, and more specifically recessed toward the bottom surface 502. The lens curved lens curved surface 13a and the lens curved surface 12a of the microlens 500 are formed by smoothing the inflection point, and the microlens 500 is composed of a lens center portion and a lens peripheral portion 500A. The lens center portion 500B is one of the spherical surfaces constituting the radius of curvature r. Among the lens curved surfaces 12a including the lens peripheral portion 500A, the lens curved surface of the region adjacent to the mirror center portion 500B is a part of the spherical surface of the curvature radius, and the lens surface 12 a is formed closer to the lens 500. The lens surface of the outer region has a larger radius of curvature. The ridge line 501 on the top of the lens peripheral portion 510A is etched through the micro-transparent 籁 non-pair 500 mirror. One of the same mirror examples, the surface is connected to the bottom of the microsphere surface ί 500 -25- (23) 1277771 through the R 00B portion, and is extended to the "normal" of the present invention. The circumference of the central axis A of an example. The curved surface 503a extending from the ridge line 501 toward the outer side in the drawing and the curved surface 503b extending toward the inner side constitute a lens curved surface 1 2 a 〇

In Fig. 12, the light intensity distribution D of the light condensed by the microlens 500 has the same light intensity concentrically in the second-order plane of the condensing end. The light intensity distribution D is divided into a central region I corresponding to the central portion 5 00B of the microlens 500, a peripheral region 环状 annularly expanded to the outside of the central region I, and a peripheral region III extending to the outer side of the peripheral region II. Among the three regions, the peripheral region II is a region where the light intensity is stronger than other regions, and is concentrated by collecting the peripheral portion 5 00A of the lens extending along the circumference of the central axis A of the microlens 500. The area of light. The peripheral region II is a region in which the ring shape is enlarged to the periphery of the central region I, and the light intensity of the peripheral region II becomes weaker than when the light is concentrated at one point. Therefore, when the microlens 00 is condensed on the pixels, it is possible to suppress the concentration of a part of the pixels, and it is possible to suppress the deterioration of each part included in the pixels due to light. It is possible to suppress deterioration of the alignment film or liquid crystal of, for example, a liquid crystal device due to light collected. In Fig. 13(a), on the cross section of the conventional microlens 60 cut by a face including a central axis, the microlens 60 has a function of having a convex portion as a convex lens. The light L1 passing through the microlens 60 is a specific region of the 2-dimensional plane S that is condensed on the condensing end. The light L1 passing through the microlens 60 is, for example, focused on the focal point f of the microlens 60. In particular, in the case where the microlens 60 is an aspherical lens, the alignment film is arranged at the point where the focus f is excellent, and the alignment film disposed in the region located at the focus is easily deteriorated -26- (24) 1277771 . Even in the case where the focus is not located on the 2-dimensional plane S, the light collected by the micro-mirror 60 is concentrated in a narrow region of the S-dimensional plane S in the light-emitting end of the light. On the other hand, in Fig. 13(b), according to the microlens 500 of the present embodiment, the light L2 is cut by the left and right symmetry on the face including the central axis A of the microlens 5〇〇. The lens peripheral portion 5 00A and the lens center portion 5 00B on the cross section of 500 00 are condensed separately, and the light condensed by the φ-point can be dispersed. More specifically, the peripheral portion 5 00A of the lens, which is located at the left and right sides of the figure, respectively, has a focus Π and f2 on the second-order plane of the condensing end, and the light is condensed by the peripheral portion 5 00A of the lens and the central portion 5 00B of the lens. L2 will be concentrated at the focal points f 1 and f2. The focus Π and f2 are located on a circle centered on the intersection of the central axis A and the second-order plane S1 of the condensing end of the light, and the light intensity of the second-order plane S 1 is more dispersed than when the spot is concentrated. Therefore, according to the microlens 500, the deterioration of each portion disposed in the pixel can be reduced. Further, the microlens 00 has a function of φ condensing light in a pixel disposed opposite to a certain region such as the microlens 00, similarly to the conventional microlens, and can also improve the light transmittance of the pixel. Improve the display performance of pixels. (Photoelectric device) Next, an optoelectronic device to which the microlens according to the present embodiment is applied will be described with reference to Figs. 14 to 17 . Fig. 14 is a plan view of the TFT array substrate viewed from the side of the microlens array plate used as the counter substrate from the respective constituent elements formed thereon, and Fig. 15 is a view of Fig. 14-27-(25) 1277771's Η — Η 'section diagram. Here, a liquid crystal device of a driving-type TFT active matrix driving method which is an example of a photovoltaic device is taken as an example. The microlens array plate of the present embodiment is a mirror of the present invention having a plurality of arrangements. In Figs. 14 and 15, in the liquid crystal device 100, the TFT substrate 1 is opposed to the microlens array plate 20 used as a counter substrate. The φ layer 50 is sealed between the TFT array substrate 10 and the microlens array plate 20, and the TFT array substrate 10 and the microlens array plate 20 are shielded by the shielding material 52 provided in the shielding region around the image display region 10a. then. The masking material 52 is formed by, for example, ultraviolet curing, thermosetting resin, or the like, and is applied to the TFT substrate 10 in a manufacturing process, and then cured to the masking material 5 by ultraviolet irradiation, heating, or the like. In the case of the second embodiment, the gap between the TF T array substrate 10 and the microlens array 20 (the gap between the substrates) is a gap material such as a predetermined glass fiber or a glass φ. That is, the photovoltaic device of the present embodiment is applied to a light valve of a machine and is enlarged and displayed in a small size. The rim of the occlusion of the rim region of the image display region 10 a is arranged in parallel with the inner side of the occlusion region in which the mask member 52 is disposed, and is provided on the microlens array plate 20 side. However, part or all of the frame light-shielding film 5 3 may be provided on the side of the TFT array 1 as a built-in light-shielding film. Among the peripheral regions around the image display area 1 〇 a, the area outside the shielding area where the masking material 52 is disposed is along

In the road, a micro-transparent array is arranged to match the liquid crystal in place with each other in the resin array. The substrate glass bead is projected on a substrate of the optical film. The data line driving circuit 1 〇 1 is connected to the terminal 102 in one side of the TFT -28- (26) 1277771 array substrate 10. On the other hand, the scanning line driving circuit 104 is a method of covering the frame light shielding film 53 along both sides of the one side. Further, in order to connect between the two scanning line driving circuits 104 of the image display area 1 in this manner, the remaining side of the TFT array is provided along the left side of the TFT array, and the front edge frame light shielding film 53 is provided. Wiring 1 0 5. φ In the four corners of the microlens array board 20, the upper and lower conductive members 06 of the function of the upper and lower conduction terminals between the writing plates are disposed. Further, the TFT array substrate 1 is turned on and off in a region facing the corner portions. Thereby, electrical conduction is obtained between the TFT array substrate 10 and the micro-transparent plate 20. In Fig. 14, on the TFT array substrate 10, an alignment film is formed on the electrode 9a after the TFT for the pixel switch and the wiring such as the scanning line and the data line. On the other hand, for the detailed configuration of the φ, on the microlens array plate 20, in addition to the counter electrode 2, the sub-shaped or stripe-shaped light-shielding film 23 is formed in the uppermost layer portion and the liquid crystal layer 50 is formed. For example, by mixing one or several kinds of nematic liquid crystals, a predetermined alignment state is obtained between the pair of alignment films. Further, in the TFT array shown in FIGS. 14 and 15, The data line driving circuit 1 〇1, the scanning line driving circuit, etc. can also form a sampling circuit for sampling the image signal on the image signal line to the data line, and supplying the predetermined signal of the predetermined voltage potential to the image signal to each other. The preparatory circuit of the data lines is externally adjacent to each other and is disposed on both sides: 10 is a complex number of two bases. The mirror array is arranged in a field to form a lattice film to form a lattice film. The liquid crystal 〇 i board ίο Road 104 is supplied for inspection. -29- (27) 1277771 Check the quality and defects of the photoelectric device during the manufacturing process or the load time. The composition and function of the microlens array panel 2 provided in the liquid crystal device 100 described above will be described with reference to Figs. 16 and 17 . Fig. 1 is a plan view showing the arrangement relationship between the light shielding film 23 and the microlens 500 of the microlens array panel 20, and Fig. 17 is a sectional view showing the sectional configuration of the liquid crystal device 100 in more detail for a plurality of pixels. . That is, the function of the microlens 500 will be described in detail by means of Fig. 17. In Fig. 16, the microlens array plate 20 is provided with a light shielding film 23 formed on, for example, a transparent substrate 210, and the light shielding film 23 has a lattice pattern. The microlens array plate 20 has a non-opening region defined by the light shielding film 23, and an area partitioned by the light shielding film 23 serves as an opening region 700. Further, the light-shielding film 23 is formed in a stripe shape, and the non-opening region may be defined by various components such as the light-shielding film 23 and the capacitance electrode 300 and the data line 6a provided on the TFT array substrate 10 side. Each of the microlenses 500 is arranged in such a manner as to correspond to each pixel. More specifically, in the microlens array panel 2, each pixel is provided with a region including at least a portion of the non-opening region located at the periphery of the opening region 7 and the opening region 700, and has a rectangular planar shape. Microlens 5 00. In Fig. 17, a counter electrode 2 1 made of a transparent conductive film is formed on the transparent plate member 210 to cover the light shielding film 23. Further, on the counter electrode 2 1, an alignment film not shown is formed. In addition, a color filter may be formed in each of the opening regions 700 on the transparent substrate 210. On the other hand, the pixel electrode 9a is formed in a region corresponding to each open region -30-(28) 1277771 region 700 on the TFT array substrate 10. On the other hand, an electronic component for the pixel switch and the scanning line 11a for driving the pixel electrode 9a, the wiring of the data line 6a, and the storage capacitor 70 are formed in the port area. According to this configuration, the photovoltaic device can maintain a relatively large number of apertures. When the light incident on the microlens array plate 20 or the like is incident on the microlens array plate 20, the lens center portion 500B and the lens peripheral portion 5 00A are integrally formed by the lens 00 and condensed. Further, in Fig. 17, the outline of the path of the light condensed by the lens 500 is indicated by a broken line. The light condensed by the micro-permeation penetrates the liquid crystal layer 50 and is irradiated onto the pixel electrode 9a of the pixel electrode 9a to form display light from the TFT array substrate 1''. Here, among the light incident on the microlens array from the upper side in the map in which the light source is disposed, the light toward the non-opening region 23 is also incident on the opening region 700 via the microscopic condensing action, thereby improving the respective paintings. The caliber of the prime. It is also possible to use a lens peripheral portion of each microlens 500 00A φ spherical lens. Therefore, the lens including the lens peripheral portion 500A can be formed into a lens having a small aberration to improve the light use efficiency. On the other hand, the peripheral edge portion of the lens around the center portion of the lens 00B is condensed by the light incident on the microlens 500, so that the light is not concentrated on one of the poles 9a, and the pixel electrode 9a is dispersed. The upper light intensity is further the function of the lens center portion 500B as a concave lens, and the region where the light intensity is large is concentrated at one point. Further, the function of the micro-transmission as a lens can also improve the light transmittance of each pixel. As a result, if the microlens 500 00 is used, it is possible to suppress the inferior pixel of the pixel 30, and the non-opening of the picture is performed by the micro-mirror 5 00 through the micro-mirror 5 00. The number is distributed as a non-microlens by bits from the source of the light. It can suppress the mirror and compare it with the -31 - (29) 1277771. This can extend the life of the liquid crystal device, such as the photoelectric device, while displaying high-quality images. As described above, the liquid crystal device 1 according to an example of the photovoltaic device of the present embodiment is provided, for example, on the TFT array substrate 10 instead of the data line drive circuit 110 and the scanning line drive circuit 104. The driving LSI on the TAB ( Tape Automated bonding) substrate may be electrically connected to the external circuit connecting terminal 102 in an electrically conductive manner and mechanically. On the side of the projection light incident on the microlens array panel 20 and the side from which the light emitted from the TFT array substrate 10 is emitted, the respective ones correspond to, for example, various TN (Twisted Nematic) modes, VA (Vertically Aligned) modes, and PDLC ( In the operation mode such as the Polymer Dispersed Liquid Crystal mode and the normally white mode/normal black mode, a polarizing film, a retardation film, a polarizing plate, or the like may be disposed in a specific direction. Further, in the above-described photovoltaic device, the microlens array plate 20 in which a plurality of microlenses shown in FIG. 1 are arranged is used as the counter substrate, but the microlens array plate 20 may be used as the TFT array substrate. 1 〇 use. Alternatively, the substrate on which the counter electrode and the alignment film are formed on a glass substrate or the like is used as the counter substrate (not the microlens array plate 20), and the microlens array substrate 20 may be mounted on the side of the TFT array substrate 1. That is, the microlens of the present invention is assembled or mounted on the side of the TFT array substrate 1. In the case of the pixel electrode 1 on the side on which the light is emitted, the lens peripheral portion 500A of the microlens 500 is a liquid crystal device in which the microlens 500 is recessed. In the lens peripheral portion 500A of the microlens 500, the -32-(30) 1277771 microlens array plate 20 can be disposed so as to be recessed toward the upper side in the same figure. (Electronic device) An embodiment of a projection type color display device which is an example of an electronic device used as a light valve as described above, and an overall configuration, particularly an optical configuration, will be described. Here, Fig. 18 is a schematic cross-sectional view of the projection type color display device. φ In FIG. 18, a liquid crystal projector 1100 which is an example of a projection type color display device is a liquid crystal module in which three liquid crystal devices including a driving circuit mounted on a TFT array substrate are prepared, and are respectively formed as light valves for RGB. It is composed of projectors used in 100R, 100G and 100B. In the liquid crystal projector 1 1 , when the projection light is emitted from the lamp unit 1 102 of the white light source such as a metal halide mercury lamp, it is divided into RGB by the three mirrors 1 106 and the two dichroic mirrors 1 108. The light components R, G, and B of the three primary colors are respectively introduced into the light valves 1 〇〇R, 1 〇〇G, and 1 00B corresponding to the respective colors. In this case, in particular, the B-light is introduced, and in order to prevent light loss due to a long optical path, the relay lens system 1121 formed by the incident lens 1 122, the relay lens 1 123, and the output lens 1 124 is introduced. Further, corresponding to the light components of the three primary colors which are modulated by the light valves i〇OR, 100G and 100B, respectively, after the color separation is further synthesized by the color separation 稜鏡1 1 12, the projection lens n 14 is interposed to form a color image. Projected on the screen. The present invention is not limited to the above-described embodiments, and the scope of the invention described in the claims and the entire disclosure may be appropriately changed within the scope of the invention, and the method of manufacturing the microlens according to the modification may be Manufacturing -33- (31) 1277771 The microlens manufactured by the method, the photovoltaic device including the microlens, and the electronic device including the photovoltaic device are all included in the technical scope of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS [Fig. 1] is a perspective view showing the configuration of a microlens array plate of the present embodiment. [Fig. 2] A plan view of a microlens adjacent to the microlens of the present embodiment is enlarged. [Fig. 3] A magnified view of a principal part of a cross section of the microlens array plate of the present embodiment. [Fig. 4] Fig. 1 is a cross-sectional view showing a step of manufacturing a microlens according to the present embodiment. Fig. 5 is a cross-sectional view showing a step of manufacturing a microlens according to the present embodiment (part 2). [Fig. 6] Fig. 3 is a cross-sectional view showing the steps of manufacturing the microlens according to the embodiment (3). [Fig. 7] is a plan view showing an arrangement of the mask layer 2 and the opening portion 5 of the present embodiment. [Fig. 8] A plan view of the transparent plate member 210 of the present embodiment is viewed from the side of the etching surface. [Fig. 9] Fig. 8 is a sectional view taken along the line IX - IX'. [Fig. 1] Enlarge the enlarged view shown in Fig. 6(a). [Fig. 4] is a perspective view showing the shape of the microlens according to the embodiment. -34- (32) 1277771 [Fig. 1 2] is a view showing the relationship between the shape of the microlens of the present embodiment and the light intensity distribution. The [Fig. 1 3] mode shows a schematic view of the path of the light of the microlens of the present embodiment and the conventional microlens. [Fig. 14] A plan view of a liquid crystal device which is an example of the photovoltaic device of the present embodiment. [Fig. 15] A cross-sectional view of the Η-IT line of Fig. 14. [Fig. 16] A plan view showing the arrangement relationship between the light shielding film and the microlens disposed in the microlens array plate of the present embodiment. [Fig. 17] A cross-sectional view showing a cross section shown in Fig. 15 in more detail. Fig. 18 is a cross-sectional view showing an example of an electronic apparatus according to the present embodiment. [Description of main component symbols] 2, 4: mask layer 3: intermediate layer 5: opening portion 210: transparent plate member 5 0 0 : microlens 500A: lens peripheral portion 500B: lens central portion 1 2 a : lens curved surface 5 0 1 : ridgeline -35-

Claims (1)

  1. (1) 1277771 X. Patent Application No. 1. A method for manufacturing a microlens, comprising: a lens forming region in which a microlens on a transparent substrate is formed into a lens curved surface, and an etching stop layer having an island shape in a planar shape is formed a step of forming an intermediate layer on the etch stop layer, and forming a etch mask layer on the intermediate layer at a position opposite to the etch stop layer, by isotropic etching The opening portion etches the intermediate layer, and the uranium engraving step of etching the transparent substrate together with the side surface of the etching stop layer is further performed. 2. The method of manufacturing the microlens of claim 1, wherein the uranium engraving rate of the intermediate layer is greater than the etching rate of the transparent substrate. 3. The microlens of claim 1 or 2 A manufacturing method, wherein the planar shape of the uranium engraving stop layer is circular. 4. The method of producing a microlens according to the first or second aspect of the invention, wherein the planar shape of the opening is circular. 5. The method of producing a microlens according to claim 1 or 2, wherein the opening portion and the etching stop layer are located coaxially on a plane of the transparent substrate. The method for manufacturing a microlens according to the first or second aspect of the invention, wherein the size of the region in which the etching stop layer is formed in the lens formation region is larger than the opening portion The size of the area is still large. 7. A microlens, comprising: slanting toward an outer side and an inner side of the ridge line so as to extend around the normal line extending in a plane around a normal line, and protruding from the g-plane along the normal line The lens peripheral portion is surrounded by the peripheral edge portion of the lens, and is located at a central portion of the lens that is recessed toward the one plane along the normal line; and a region of the surface of the lens peripheral portion that straddles the surface of the central portion of the lens is a lens curved surface. 8. A microlens characterized by comprising: slanting toward an outer side and an inner side of the ridge line so as to extend around an ridge line extending in a ring shape around a normal line of a plane, and protruding from the φ-plane along the normal line a lens peripheral portion having a first lens curved surface, and a lens center portion surrounded by the lens peripheral portion and continuously connected to the first lens curved surface, and having a second lens curved surface that is recessed toward the one plane along the normal line unit. The microlens of claim 7 or 8, wherein the peripheral portion of the lens and the central portion of the lens are coaxially formed with the normal line as a central axis. 10. The microlens of claim 8, wherein the first lens curved surface and the second lens curved surface have a curvature radius of not 37-(3) 1277771 and 0. 11. The microlens of claim 8 The cross-sectional shape of the i-th lens curved surface that is perpendicular to the extending direction of the ridge line extending is a spherical shape or an aspherical shape. A microlens array characterized by arranging a plurality of microlenses described in any one of the seventh to eleventh aspects of the patent application. A photovoltaic device characterized by comprising the microlens described in any one of claims 7 to 11. An electronic device characterized by having an optoelectronic device according to claim 13 of the patent application. -38-
TW094126975A 2004-09-01 2005-08-09 Method of manufacturing microlens, microlens, microlens array, electro-optical device, and electronic apparatus TWI277771B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004254816A JP4285373B2 (en) 2004-09-01 2004-09-01 Microlens manufacturing method, microlens and microlens array, and electro-optical device and electronic apparatus

Publications (2)

Publication Number Publication Date
TW200609539A TW200609539A (en) 2006-03-16
TWI277771B true TWI277771B (en) 2007-04-01

Family

ID=35943913

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094126975A TWI277771B (en) 2004-09-01 2005-08-09 Method of manufacturing microlens, microlens, microlens array, electro-optical device, and electronic apparatus

Country Status (5)

Country Link
US (1) US7372631B2 (en)
JP (1) JP4285373B2 (en)
KR (1) KR100726753B1 (en)
CN (1) CN100378532C (en)
TW (1) TWI277771B (en)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI289708B (en) 2002-12-25 2007-11-11 Qualcomm Mems Technologies Inc Optical interference type color display
US8867134B2 (en) 2003-11-21 2014-10-21 Visual Physics, Llc Optical system demonstrating improved resistance to optically degrading external effects
US7342705B2 (en) 2004-02-03 2008-03-11 Idc, Llc Spatial light modulator with integrated optical compensation structure
US7807488B2 (en) * 2004-09-27 2010-10-05 Qualcomm Mems Technologies, Inc. Display element having filter material diffused in a substrate of the display element
US7710636B2 (en) * 2004-09-27 2010-05-04 Qualcomm Mems Technologies, Inc. Systems and methods using interferometric optical modulators and diffusers
US7813026B2 (en) 2004-09-27 2010-10-12 Qualcomm Mems Technologies, Inc. System and method of reducing color shift in a display
EP2458423A3 (en) 2005-05-18 2013-01-09 Visual Physics, LLC Image presentation and micro-optic security system
US7583444B1 (en) * 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
JP2007219303A (en) * 2006-02-17 2007-08-30 Hitachi Ltd Fabrication method of microlens mold
JP2009536885A (en) 2006-05-12 2009-10-22 クレイン アンド カンパニー インコーポレーテッド A micro-optical film structure that projects a spatially coordinated image by static and / or other projected images, alone or with a security document or label
EP2468487B1 (en) * 2006-05-18 2017-07-12 3M Innovative Properties Company Light extraction structures and light guides incorporating same
EP2141408A3 (en) 2006-10-06 2010-03-31 Qualcomm Mems Technologies, Inc. Optical loss structure integrated in an illumination apparatus of a display
US8872085B2 (en) 2006-10-06 2014-10-28 Qualcomm Mems Technologies, Inc. Display device having front illuminator with turning features
US8068710B2 (en) 2007-12-07 2011-11-29 Qualcomm Mems Technologies, Inc. Decoupled holographic film and diffuser
JP5269454B2 (en) * 2008-03-25 2013-08-21 株式会社東芝 Solid-state image sensor
US20110181961A1 (en) * 2008-09-30 2011-07-28 Toshiyuki Imai Mold, Method of Manufacturing Mold, Method of Manufacturing Wafer Lens, and Wafer Lens
BR112012003071A2 (en) 2009-08-12 2016-08-16 Visual Physics Llc optical safety device indicating tampering
US8848294B2 (en) 2010-05-20 2014-09-30 Qualcomm Mems Technologies, Inc. Method and structure capable of changing color saturation
US8670171B2 (en) 2010-10-18 2014-03-11 Qualcomm Mems Technologies, Inc. Display having an embedded microlens array
US8755121B2 (en) 2011-01-28 2014-06-17 Crane & Co., Inc. Laser marked device
US8900994B2 (en) 2011-06-09 2014-12-02 Taiwan Semiconductor Manufacturing Company, Ltd. Method for producing a protective structure
JP6003214B2 (en) 2012-05-18 2016-10-05 セイコーエプソン株式会社 Microlens array substrate, electro-optical device, and electronic device
US9817216B2 (en) 2012-05-30 2017-11-14 Ev Group E. Thallner Gmbh Method and device for producing a plurality of microlenses
KR102014576B1 (en) 2012-08-17 2019-08-26 비쥬얼 피직스 엘엘씨 A process for transferring microstructures to a final substrate
CN105339180B (en) 2013-03-15 2018-05-11 光学物理有限责任公司 Optical safety equipment
US9873281B2 (en) 2013-06-13 2018-01-23 Visual Physics, Llc Single layer image projection film
JP6167740B2 (en) * 2013-08-08 2017-07-26 セイコーエプソン株式会社 Electro-optical device substrate, electro-optical device, and electronic apparatus
JP2017522602A (en) 2014-03-27 2017-08-10 ビジュアル フィジクス エルエルシー Optical device that produces flicker-like optical effects
JP6337604B2 (en) 2014-05-14 2018-06-06 セイコーエプソン株式会社 Electro-optical device manufacturing method, electro-optical device, and electronic apparatus
JP6299431B2 (en) 2014-05-28 2018-03-28 セイコーエプソン株式会社 Microlens array substrate, electro-optical device, and electronic device
JP6299493B2 (en) 2014-07-04 2018-03-28 セイコーエプソン株式会社 Microlens array substrate, electro-optical device, and electronic device
AU2015317844B2 (en) 2014-09-16 2019-07-18 Crane Security Technologies, Inc. Secure lens layer
JP6450965B2 (en) 2014-10-07 2019-01-16 セイコーエプソン株式会社 Microlens array substrate, electro-optical device including microlens array substrate, and projection display device
CN107250459A (en) 2015-02-11 2017-10-13 克瑞尼股份有限公司 The method that surface for safety device to substrate applies
JP2017134307A (en) * 2016-01-29 2017-08-03 セイコーエプソン株式会社 Lens array substrate, electro-optic device, electronic apparatus, method for manufacturing microlens substrate, and method for manufacturing electro-optic device
US10249510B1 (en) * 2018-02-28 2019-04-02 United Microelectronics Corp. Etching method
CN109056051A (en) * 2018-08-16 2018-12-21 湖南文理学院 A kind of preparation method of silicon substrate concave mirror

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4096346B2 (en) 1998-12-28 2008-06-04 ソニー株式会社 Light modulation element and image projection display device
JP3775173B2 (en) * 2000-05-30 2006-05-17 セイコーエプソン株式会社 Manufacturing method of microlens substrate
JP3938099B2 (en) * 2002-06-12 2007-06-27 セイコーエプソン株式会社 Microlens manufacturing method, microlens, microlens array plate, electro-optical device, and electronic apparatus

Also Published As

Publication number Publication date
CN100378532C (en) 2008-04-02
TW200609539A (en) 2006-03-16
US7372631B2 (en) 2008-05-13
KR20060050937A (en) 2006-05-19
CN1743916A (en) 2006-03-08
JP2006071941A (en) 2006-03-16
JP4285373B2 (en) 2009-06-24
US20060046486A1 (en) 2006-03-02
KR100726753B1 (en) 2007-06-11

Similar Documents

Publication Publication Date Title
US7826028B2 (en) Liquid crystal display device
JP3778179B2 (en) Liquid crystal display device, method for manufacturing liquid crystal display device, electronic device
JP3909782B2 (en) Liquid crystal display device having microlens
US7342622B2 (en) Liquid crystal display for enhancing reflection and method of manufacturing the same
JP3768367B2 (en) Liquid crystal display
US6781762B2 (en) Method of manufacturing microlens, microlens, microlens array plate, electrooptic device and electronic equipment
TW584823B (en) Electro-optic device and electronic machine and projection type display device
US20040125048A1 (en) Display element , display device, and microlens array
KR100861285B1 (en) Method of producing micro-lens-carrying display panel and display unit and exposure system
US5990992A (en) Image display device with plural planar microlens arrays
JP2005258290A (en) Electrooptical apparatus and method for manufacturing the same, and electronic equipment
CN100378532C (en) Microlens, method of manufacturing the same, microlens array, electro-optical device thereof, and electronic apparatus
JP2005275142A (en) Display panel and its manufacturing method
US20090015742A1 (en) Liquid Crystal on Silicon Display Panel with Reducing Fringe Effect
TWI633364B (en) Display apparatus
JP2000081623A (en) Liquid crystal display device and its production
JP2002040482A (en) Liquid crystal display device
TWI284216B (en) LCD device and electronic machine
CN1797117A (en) Liquid crystal display device and method of manufacturing the same
JP2001215515A (en) Wide-view angle liquid crystal display and its manufacturing method
JPH06258637A (en) Liquid crystal display device
KR20060051369A (en) Microlens array, manufacturing method of microlens array and liquid crystal display mounting microlens array
TWI501004B (en) Display apparatus
EP2071390A1 (en) Liquid crystal display panel provided with microlens array, method for manufacturing the liquid crystal display panel, and liquid crystal display device
CN101299121B (en)

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees