1277771 (1) 九、發明說明 【發明所屬之技術領域】 本發明是有關應用於例如液晶裝置等之光電裝置的微 透鏡、微透鏡陣列、及具備該些之製造方法、具備該微透 鏡之光電裝置及電子機器的技術領域。 【先前技術】[Brief Description of the Invention] [Technical Field] The present invention relates to a microlens, a microlens array, and a photovoltaic device including the microlens, which are applied to a photovoltaic device such as a liquid crystal device. The technical field of devices and electronic machines. [Prior Art]
於液晶裝置等之光電裝置中,例如在對向基板,組入 對應於各畫素的微透鏡,貼附有組裝此種複數個微透鏡的 微透鏡陣列板。利用此種微透鏡陣列,在光電裝置實現明 亮的顯示。即微透鏡將從背光之光源被射出的光,不浪費 的聚光於各畫素的開口區域,藉此提高從光源被射出的光 之利用效率。例如包含此種微透鏡的液晶裝置,是除了畫 像顯示區域的部分利用接著樹脂邊調整間隙邊遮蔽內裝有 微透鏡陣列的對向基板與在各畫素形成畫素電極及薄膜電 晶體等之開關元件等的元件基板,且在其中密封液晶,藉 此所製造。 於此種液晶裝置中,液晶層的厚度在液晶面板全體形 成均勻,是爲了減低亮度不勻及顏色不勻成爲重要的因子 。若根據專利文獻1所揭示的技術,微透鏡之周邊部仍爲 曲面,微透鏡的中央部爲平坦面。藉此,減低微透鏡的厚 度,儘可量薄化形成在微透鏡上之樹脂層的厚度,藉由減 低液晶層的厚度誤差。 〔專利文獻1〕特開2000 — 1 93 92 8號公報 (2) 1277771 【發明內容】 〔發明欲解決之課題〕 此種光電裝置具有所謂裝置之長壽命化的一般性要件 〇 但是一般若使用微透鏡,例如於液晶和配向膜之中, 對位於各畫素之開口區域之中央的部分,光源光會因中介 著微透鏡而局部性被集中照射,經由本案發明人等確認在 此部分會產生顯著劣化的情形。 而專利文獻〗所記載的技術是爲了減低液晶層之厚度 誤差的技術,針對本案發明人等所認知之經由聚光之畫素 ®域內的劣化並未看出所認知的記述。進而根據本案發明 人等所假設之微透鏡的透鏡特性會因微透鏡的中央部爲平 坦面而不良。即,記載於專利文獻丨的微透鏡,並不會使 射入到平坦面之中央部的光加以聚光,照樣會穿透,中央 φ部並沒有作爲透鏡的功能。因而,藉由使光有效的聚光於 開口區域內而提高光的利用效率是很困難的一件事,因而 欲提高顯示的亮度及對比就變得很困難,技術上會有問題 0 於是,本發明是有鑑於上述問題,其課題在於提供一 例如得以不犠牲像是亮度及對比的顯示性能,抑制液晶裝 置等之壽命因光被聚光於一點而降低的微透鏡之製造方法 '微透鏡、微透鏡陣列、光電裝置及電子機器。 (3) 1277771 〔欲解決課題的手段〕 有關本發明的微透鏡之製造方法是爲了解 ’具備:在透明基板上之微透鏡之被形成透鏡 形成區域,形成平面形狀爲島狀的蝕刻停止層 前述蝕刻停止層上形成中間層之步驟,於前述 成設置開口部於對向於前述蝕刻停止層的位置 層之步驟,藉由等方性蝕刻,由前述開口部蝕 g 層,進而由前述蝕刻停止層之側面與前述中間 刻前述透明基板的蝕刻步驟。 若藉由有關本發明的微透鏡之製造方法, 像是石英基板或玻璃基板的透明基板上的透鏡 形成蝕刻停止層。蝕刻停止層是具有結果比在 具有島狀之平面形狀,經由例如後述之蝕刻步 成微透鏡之際的透鏡形成區域還小的尺寸。而 上例如複數個微透鏡之形成透鏡曲面的情形下 φ所形成的複數個微透鏡之位置,而形成島狀點 倉虫刻停止層。 接著,在蝕刻停止層上形成中間層。中間 如像是CVD法或濺鍍法之汎用的膜形成方法 著,於中間層上形成設置開口部於對向於蝕刻 置的蝕刻遮罩層。蝕刻遮罩層是以避開例如對 止層的位置之方式直接形成在中間層上亦可。 部是以例如覆蓋中間層上全體之方式形成蝕刻 ,除去包括對向於蝕刻停止層的位置的區域所 決上述課題 曲面的透鏡 的步驟,於 中間層上形 的鈾刻遮罩 刻前述中間 層一起地蝕 是先在例如 形成區域內 透明基板上 驟而最後形 在透明基板 ,配合最後 設的複數個 層是藉由例 所形成。接 停止層的位 向於蝕刻停 或者,開口 遮罩層之後 形成。像這 -6 - (4) 1277771 樣所形成,而在透明基板上形成蝕刻停止層、中間層、及 鈾刻遮罩層之後’藉由等方性蝕刻,由開口部蝕刻中間層 ,進而由蝕刻停止層之側面與中間層一起地鈾刻透明基板 。更具體是隨著中間層由開口部向著外側被蝕刻’露出鈾 刻停止層,除出中間層藉此邊鈾刻由蝕刻停止層的側面露 出的透明基板邊繼續蝕刻中間層。 此結果,藉由於透明基板存在蝕刻停止層’形成特異 形狀的透鏡曲面。更具體是由蝕刻停止層的側面向著蝕刻 停止層的內側而進行的蝕刻面會在蝕刻停止層的下側碰觸 ,在蝕刻停止層側形成變凸的透鏡曲面。另一方面’向著 蝕刻停止層的外側而進行的鈾刻面,會在與形成於蝕刻停 止層之下側的透鏡曲面相反側形成變凸的透鏡曲面。透明 基板是由鈾刻停止層的側面及被蝕刻的中間層的下側被飩 刻,上述的透鏡曲面是在透明基板的透鏡形成區域構成連 續地連接的一透鏡曲面。 若在如以上所形成的透鏡曲面,塡充具有例如光透過 性的樹脂,就可形成具有中央部比周囲圍還凹陷的透鏡曲 面的微透鏡。此種微透鏡能以比周圍還凹陷的透鏡的中央 部,位在透鏡之中央部的周圍的周緣部的兩者作爲透鏡的 功能。更藉由特異的透鏡曲面,使由光源被射出的光聚光 於畫素區域,且不會集中於畫素區域之一點的方式,將光 邊適度地擴散邊加以聚光。因而,不會犠牲畫素區域的光 透過性,就能抑制起因於光集中一點的畫素區域之各部的 -7- (5) 1277771 劣化。藉此就能抑制例如畫素區域內之配向膜劣化 延長液晶裝置等的壽命。而在蝕刻面並未塡充樹脂 然以被飩刻的透明基板的蝕刻面作爲透鏡曲面使用 透鏡亦可。 再者,有關本發明的微透鏡之製造方法,並不 備有像是液晶裝置的光電裝置之微透鏡的製造,若 微透鏡的光電裝置,當然也適用於任何的裝置。而 據有關本發明的微透鏡之製造方法,改變蝕刻停止 狀,或改變蝕刻停止層與開口部的位置關係、尺寸 狀等,藉此也能形成集合複數個微透鏡。 於有關發明的微透鏡陣列的製造方法之一形態 述中間層之蝕刻率,比前述透明基板之蝕刻率還大 若根據此形態,前記中間層的蝕刻率比前記透 的蝕刻率還大,藉此就能形成非球面的透鏡曲面。 是藉由例如像是CVD法或濺鍍法之汎用的膜形成 形成,中間層的飩刻率及透明基板的大小關係則成 經由餓刻步驟所形成的微透鏡的透鏡曲面的形狀的 —〇 於有關本發明的微透鏡之製造方法之其他形態 述蝕刻停止層之平面形狀爲圓形。 若根據此形態樣,由蝕刻停止層的側面全體蝕 基板,蝕刻面會在蝕刻停止層的下側碰觸。在此’ 止層的平面形狀是指透明基板表面內的蝕刻停止層 的意思。碰觸的蝕刻面是沿著鈾刻停止層的周方向 ,而能 等,依 而成微 限於具 是具備 若是根 層的形 、及形 中,前 〇 明基板 中間層 方法所 爲決定 重要因 中,前 刻透明 蝕刻停 之形狀 而構成 -8- (6) 1277771 圓滑的透鏡曲面。 於有關本發明的微透鏡之製造方法之其他形態中,前 述開口部的平面形狀爲圓形。 若根據此形態,以開口部爲中心,中間層被等方性蝕 刻。更具體是在中間層的橫向亦即在透明基板上沿著延設 有中間層的方向而等方性蝕刻中間層。藉此設定開口部與 蝕刻停止層的形狀、尺寸,或位置關係,藉此就能在透明 g 基板形成所希望的透鏡曲面。 於有關本發明的微透鏡之製造方法之其他形態中,前 述開口部與前述蝕刻停止層,在前述透明基板上由平面看 位於同軸之位置。 若根據此形態,開口部及蝕刻停止層,平面看位於同 軸之位置,由開口部至蝕刻停止層之側面的距離,沿著蝕 刻停止層的周方向爲相等在蝕刻停止層的側面全體同時或 若干時間的偏離並由蝕刻停止層的側面開始施行於透明基 φ板的蝕刻。更具體是例如開口部及蝕刻停止層之平面形狀 爲圓形時,可由蝕刻停止層的側面全體同時對透明基板施 行蝕刻。在者,「平面上看」是指由蝕刻停止層的上側觀 看上述之各層的情形的意思。因而,藉由對透明基板而從 蝕刻停止層的側面向著蝕刻停止層的內側所施行的蝕刻, 沿著蝕刻停止層的周方向具有相等的曲率半徑的透鏡曲面 ,平面看形成同心圓狀。在包圍於此種透鏡曲面的空間, 塡充具有例如光透過性的透鏡形成材料,藉此由蝕刻停止 層及開口部的中心,等方性更具體是同心圓狀地形成等高 -9- (7) 1277771 線寬大的透鏡曲面。 於有關本發明的微透鏡之製造方法之其他形態中’於 前述透鏡形成區域內,被形成前述飩刻停止層的區域的尺 寸,比被形成前述開口部的區域的尺寸還大。 若根據此形態,從面臨於透鏡形成區域內之開口部的 中間層向著蝕刻停止層的側面進行蝕刻’從蝕刻停止層的 上側的中間層至鈾刻停止層的側面依序進行蝕刻。藉此’ g 對透明基板的蝕刻是由蝕刻停止層的側面開始,在蝕刻停 止層的下側平面看形成同心圓狀的透鏡曲面。更由蝕刻停 止層的側面於周圍等方性地進行蝕刻,透鏡曲面全體最後 具有同心圓狀之等高線地成爲連續的曲面。 而中間層的鈾刻率比透明基板的蝕刻率還大時,在蝕 刻停止層的內側及外側形成透鏡曲面之曲率半徑不周的透 鏡曲面。等方性蝕刻使用例如濕式鈾刻的情形下,中間層 比透明基板更快被蝕刻,藉此以形成在蝕刻停止層之外側 φ的透鏡曲面作爲非球面。更具體是位在被蝕刻的中間層之 下側的透明基板的一部分,接觸於蝕刻液的接觸區域比透 明基板之其他區域還大,只有接觸區域較大的部分,透明 基板的一部分比其他區域更容易被蝕刻。藉此,就能以形 成在蝕刻停止層之外側的透鏡曲面作爲非球面。另一方面 ,中間層及透明基板的蝕刻率爲同等的情形下,被蝕刻的 透明基板的蝕刻面成爲球面。選擇具有與透明基板的蝕刻 率同等,或比透明基板的蝕刻率還大的蝕刻率的中間層, 藉此以非球面或球面的任何一個作爲透鏡形成面而選擇, -10- (8) 1277771 以所希望的透鏡特性之方式來調整微透鏡的透鏡曲面的曲 率半徑。 有關本發明之第1發明的微透鏡是爲解決上述課題, 具備:以包含在一平面之法線周圍延伸爲環狀的稜線的方 式分別朝向該稜線的外側及內側傾斜,沿著前述法線由前 述一平面突出之透鏡周緣部,及被前述透鏡周緣部包圍, 沿著前述法線朝向前述一平面凹下的透鏡中央部;由前述 φ 透鏡周緣部之表面橫跨前述透鏡中央部之表面的區域係透 鏡曲面。 若根據有關本發明的微透鏡,以透鏡周緣部及透鏡中 央部的表面作爲透鏡曲面,藉此使透鏡曲面之一的區域從 一平面突出的同時,形成將透鏡曲面之其他區域向著一平 面而凹陷的形狀。若根據此種透鏡曲面,先藉由透鏡周緣 部的表面被聚光於2次元面之光的光強度分佈,是藉由透 鏡中央部的表面而沿著同樣被聚光於2次元面的光的光強 φ度分佈之周方向而存在。即,藉由透鏡中央部及透鏡周緣 部而分別聚光,藉此成爲之一的微透鏡全體,釗使射入到 其形成區域的光加以聚光,於對應在該一個微透鏡的畫素 的開口區域內,以不使此光聚光於一點的方式使其分散。 有關本發明之第2發明的微透鏡是爲解決上述課題, 具備:以包含在一平面之法線周圍延伸爲環狀的稜線的方 式分別朝向該稜線的外側及內側傾斜,沿著前述法線由前 述一平面突出之具有第1透鏡曲面的透鏡周緣部,及被前 述透鏡周緣部包圍,且與前述第1透鏡曲面連續地連接, -11 - (9) 1277771 沿著前述法線朝向前述一平面凹下的具有第2透鏡曲面的 透鏡中央部。 若根據有關本發明的微透鏡,藉由具有第1透鏡曲面 的透鏡周緣部及具有第2透鏡曲面的透鏡中央部,以不使 光聚光於一點的方式使其分散。在此,有關本發明之「一 平面」是指例如透鏡中央部及透鏡周緣部之底面即微透鏡 之底面的意思。透鏡周緣部是延設在微透鏡之底面的法線 φ 之周長,透鏡周緣部的稜線是環狀延設在法線的周圍。透 鏡周緣部具有分別向著稜線的外側及內側而傾斜的第1透 鏡曲面,沿著底面的法線而突出微透鏡的底面。另一方面 ,透鏡中央部是圍繞於透鏡周緣部,且具有與第1透鏡曲 面連續地連接的第2透鏡曲面。第2透鏡曲面與第1透鏡 曲面不同,向著一平面而凹陷。更具體是平面看微透鏡, 具有第1透鏡曲面與包圍在第1透鏡曲面的第2透鏡曲面 ,該些曲面是連續地連接,藉此形成滑順的一透鏡曲面。 φ再者,透鏡中央部的凹陷是包括透鏡周緣部向著微透鏡的 中心結合在一點,或是凹陷的底部具有稍寬大的兩者。 若根據此種透鏡中央部及透鏡周緣部,先藉由透鏡周 緣部被聚光於2次元面的光之光強度分佈,是藉由透鏡中 央部並沿著被聚光於同一 2次元面的光之光強度分佈的周 方向而存在。即,分別藉由透鏡中央部及透鏡周緣部加以 聚光,藉此作爲一個微透鏡全體能一邊加以聚集射入到該 形成區域的光,一邊在對應於該一個微透鏡的畫素之開口 區域內,不使此光聚光於一點的方式使其分散。若根據有 -12- (10) 1277771 關本發明的微透鏡’就能使透鏡周緣部及透鏡中央部之兩 者’即可成爲具備各不相同的第1透鏡曲面及第2透鏡曲 面的透鏡的功能,還可成爲以微透鏡全體成爲一個透鏡的 功能。藉此就能令射入到微透鏡的光全體,效率良好的聚 光於特定的區域例如各畫素的開口區域內,就能使光適度 分散’提昇顯示的亮度及對比,延長液晶裝置等的壽命。 針對有關本發明之第1及第2發明的微透鏡之一的形 φ態’前述透鏡周緣部與前述透鏡中央部,係以前述法線爲 中心軸而同軸地被形成。 若根據此形態,於平面上觀看在透鏡中央部之周圍, 透鏡周緣部是位於同心圓狀。藉由此種透鏡中央部及透鏡 周緣部所聚光的光’是表示被同心圓狀分散的光強度分佈 ,可抑制光被聚光於一點。 若根據有關本發明之第2發明的微透鏡之其他形態, 前述第1透鏡曲面與前述第2透鏡曲面,曲率半徑不同。 φ 若根據此形態,藉由第1透鏡曲面及第2透鏡曲面的 曲率半徑不同就能調整光強度分佈,就能以不會僅強制在 一點的方式來調整例如位於畫素區域的配向膜上的光強度 分佈。而且也能一邊效率良好的聚光於畫素區域全體,一 邊使光強度分佈分散在畫素區域內。 於有關本發明之第2發明的微透鏡之其他形態,在直 交於前述稜線延伸的延伸方向的面上切前述第1透鏡曲面 的剖面形狀爲球面形狀或非球面形狀。 若根據此形態,第1透鏡曲面的斷面形狀爲球面形狀 -13- (11) 1277771 或非球面形狀,藉此一邊分散被聚光之光的光強度分佈, 一邊將微透鏡的厚度設計爲所希望的厚度。特別是在第1 透鏡曲面爲非球面形狀的情形下,可一邊使光聚光於特定 的範圍,一邊薄化微透鏡的厚度。 有關本發明的微透鏡陣列是爲解決上述課題,配列複 數上述之本發明的微透鏡。 若根據有關本發明的微透鏡陣列,與上述的微透鏡同 Φ 樣地,不會犠牲畫素區域的光透過率,可抑制光被聚光於 一點。特別是各微透鏡以面臨光電裝置的每個畫素的方式 被配列的微透鏡陣列,是光聚光於各畫素,藉此提高畫素 之亮度等的同時,藉由聚光就能抑制畫素區域之各部產生 劣化。 有關本發明的光電裝置是爲解決上述課題,具備上述 之本發明的微透鏡。 若根據有關本發明的微透鏡,與上述之微透鏡同樣地 Φ ,不會犠牲畫素區域的光透過率,可抑制光被聚光於一點 。因而,能提供顯示性能優的光電裝置。而有關本發明的 光電裝置,是如上述具備透鏡特性優的微透鏡,就能藉由 微透鏡提高光的利用效率,且也可使各畫素的光透過率及 對比提昇。因而,有關本發明的光電裝置,可進行高品質 之畫像顯不的同時,具有局壽命。 有關本發明的電子機器是爲解決上述課題,具備上述 之本發明的光電裝置。 若根據有關本發明的電子機器,因具備有關上述之本 -14- (12) 1277771 發明的光電裝置而成,就能實現具有高壽命之同 等級顯示的投射型顯示裝置、液晶電視、攜帶式 子記事簿、文書處理器、觀景窗型或監視直視型 、工作站、電視電話、P 0 S終端機、觸控面板等 子機器。而有關本發明之電子機器,除了例如電 電泳裝置外,也可實現利用電子放射元件的顯 Field Emission Display 及 Surface-Conduction Emitter Display ) 、DLP ( Digital Light Processi 本發明之此種作用及其他優點由以下說明的 即可明白。 【實施方式】 〔用以實施發明的最佳形態〕 以下針對有關本發明之微透鏡之製造方法、 微透鏡陣列、光電裝置及電子機器,邊參照圖面 φ說明。 (微透鏡陣列板) 先針對應用有關本發明之微透鏡的微透鏡板 1圖至第3圖做說明。第1圖是表示有關本實施 透鏡陣列板之槪略構成的立體圖。第2圖是放大 微透鏡陣列板的微透鏡之中有關所鄰接的四個微 分的平面圖。第3圖是放大表示本實施形態的微 板之斷面的一部分的放大圖。 時,可局 電話、電 之錄影機 之各種電 子報等之 示裝置( Electron-ng )等。 實施形態 微透鏡及 邊做詳細 ,參照第 形態的微 表示具備 透鏡之部 透鏡陣列 -15- (13) 1277771 於第1圖中,本實施形態的微透鏡陣列板2 Ο 矩陣狀平面配列於有關本發明之「透明基板」的 的透明板構件210的複數個微透鏡5 00所構成。 件2 1 0是例如爲石英板等,矩陣狀挖掘多數凹狀 於透明板構件2 1 0被挖掘的凹狀凹陷之中,例如 光性樹脂材料所形成的接著劑。使此接著劑硬化 層230,以覆蓋透明板構件210的方式被配置的 2 〇 0與透明板構件2 1 0則相互接著。用以接著 2 0 0及透明板構件2 1 0的接著劑,是例如比透 2 1 0還高折射率的透明接著層。 於第2圖及第3圖中,微透鏡500的透鏡曲 藉由相互折射率不同的透明板構件2 1 0與接著層 定。微透鏡500是於第3圖中形成略凸狀突出於 透鏡所構成。 有關本實施形態的微透鏡5 00是如後述藉由 特的製造方法所製造,微透鏡5 00的透鏡曲面是 半徑相異的周緣部5 Ο Ο Α與中央部5 Ο Ο Β所構成。 部5 Ο Ο A是微透鏡5 0 0之周緣側的部分,於圖中 凸形狀的部分。透鏡中央部5 Ο Ο B是構成微透鏡 分之中的透鏡周緣部5 Ο Ο A之內側的部分,於圖 爲凸形狀的部分。更具體是透鏡中央部500B包 透鏡5 0 0之底面5 0 2而凹陷的透鏡曲面的部分。 微透鏡陣列板2 0,於其使用時,微透鏡5 0 0 後述之液晶裝置等的光電裝置之各晝素的方式被 ,是具備 其中一例 透明板構 的凹陷。 塡充由感 形成接著 覆蓋玻璃 覆蓋玻璃 明板構件 面,是略 23 0所限 下側的凸 本發明獨 具備曲率 透鏡周緣 下側成爲 5 00的部 中上側成 括向著微 以對應於 配置。因 -16- (14) 1277771 而’射入到各微透鏡5 00的射入光,藉由微透鏡5 00的折 射作用,向著光電裝置的各畫素之中央而聚光。再者,針 對微透鏡5 00的構造,於後做詳細說明。 (微透鏡之製造方法) 其次’針對有關本實施形態的微透鏡之製造方法,邊 參照第4圖至第9圖邊說明。第4圖至第6圖是表示有關 φ 本實施形態的微透鏡之製造方法之一連串的步驟剖面圖, 第7圖是表示遮罩層2及開口部5的配置形態的平面圖。 於第4圖(a )中,於透明板構件21 0上,形成有關 本發明之「蝕刻停止層」的其中一例的遮罩層2,在其上 依序形成中間層3及有關本發明之「蝕刻遮罩層」的其中 一例的遮罩層4。遮罩層2是例如藉由 CVD ( Chemical Vapor Deposition)法等所形成的非晶質砂膜,或具有耐 氟酸性的Cr膜、多結晶矽膜等。在本實施形態,透明板 φ構件21 0之表面內的遮罩層2的形狀爲圓形,遮罩層2是 島狀形成在透明板構件2 1 0上。 中間層3是以具有透明板構件2 1 0之蝕刻率以上的蝕 刻率的材料爲主的材料所形成的層。中間層3是以例如具 有所希望之鈾刻率的方式藉由CVD法或濺鍍法所形成。 再者,在以下,中間層3的蝕刻率是針對比透明板構件 2 1 0的蝕刻率還大的情形做說明。如後述,中間層3的蝕 刻率比透明板構件2 1 0的蝕刻率還大的情形下,能以最後 所形成的微透鏡作爲非球面’中間層3的鈾刻率與透明板 -17- (15) 1277771 構件2 1 0的蝕刻率同等的情形下,微透鏡的透鏡曲面可形 成球面。 遮罩層4是藉由與遮罩層2同樣的方法所形成’具備 以露出中間層3之表面的一部分的方式被設置的開口部5 。開口部5是在與遮罩層2之中心軸同軸上具有中心之圓 形的孔部,且開口部5的尺寸比遮罩層2還小’更具體是 圓形開口部5的直徑比圓形遮罩層2的直徑還小。即’換 •句話說就是遮罩層2的尺寸,於透明板構件2 1 0的透鏡形 成面,比開口部5的尺寸還大。再者’遮罩層2及4、開 口部5的平面形狀、尺寸、位置關係是說明有關本發明之 微透鏡之製造方法的其中一例,形成島狀形成在透明板構 件210上的遮罩層2,與中介著中間層3而與遮罩層2對 向之方式被配置的開口部5即可。 開口部5是位於與遮葶層2之中心軸同軸上。因而, 從遮罩層4的上側觀看開口部5及遮罩層2時,遮罩層2 φ及開口部5的緣部分別位於同心圓狀。再者’在以下,雖 以遮罩層2及開口部5的平面形狀爲圓形做說明,但有關 本發明的微透鏡之製造方法,其他的平面形狀並不排除遮 罩層2及開口部5的平面形狀,例如遮罩層2及開口部5 的平面形狀也可爲正三角形、正方形、正六角形、正八角 形或對中心軸而旋轉對象的其他平面形狀。 在此,邊參照第7圖,邊針對遮罩層2及開口部5的 配置形態做說明。 於第7圖中,在透明板構件2 1 0上,依序形成遮罩層 -18- (16) 1277771 2、中間層3及遮罩層4,邊參照第4圖至第6圖邊說明的 微透鏡之製造方法,是相當於從形成在遮罩層4的複數個 開口部5之中的其中一個開口部5,取出用以蝕刻中間層 3及透明板構件2 1 0之步驟所示的步驟剖面圖。 遮罩層2是分別島狀形成在透明板構件2 1 0的透鏡形 成區域500a,再者,透鏡形成區域5 00a是完成微透鏡之 後,配合重疊配置著微透鏡陣列板20的複數個畫素的配 φ 置而規定,沿著圖中縱向及橫向而形成矩陣狀。由設於遮 罩層4的複數個開口部5 —倂触刻中間層3及透明板構件 2 1 0,藉此分別形成各個微透鏡的透鏡曲面,就能形成具 備複數個參照第1圖至第3圖所說明的微透鏡的微透鏡陣 列板20 〇 再著,於第4圖(b )中,由開口部5等方性鈾刻中 間層3。在此,「等方性」是指由同軸式位於遮罩層2之 中心軸A上的開口部5向著圖中外側均等地蝕刻中間層3 φ的意思’在本實施形態是藉由例如濕式蝕刻而沿著圖中橫 向來蝕刻中間層3。再者,中間層3雖是沿著圖中縱向即 厚度方向被蝕刻’但對沿著厚度方向的中間層3的蝕刻是 藉由遮罩層2暫止,僅沿著橫向進行對中間層3的飩刻。 於第4圖(c )中,更進行對中間層3的蝕刻,由遮 罩層2的側面露出透明板構件2 1 0的表面開始的話,透明 板構件2 1 0是以遮罩層2的側面爲起點而飩刻。在此,於 本實施形態中,開口部5是與遮罩層2的中心軸同軸式地 被設置,由開口部5的中心至遮罩層2的的側面部2 a的 -19- (17) 1277771 距離,在遮罩層2的側面部2 a全體爲相等。因而,中間 餍3的蝕刻面是同時到達遮罩層2的側面部2a全體,對 透明板構件2 1 0的蝕刻,是以遮罩層2的側面部2 a爲起 點,在遮罩層2的側面部2a全體同時開始。對透明板構 件210的蝕刻,是以遮罩層2的側面部2 a爲起點,沿著 圖中橫向並分別沿著遮罩層2的內側及外側、圖下側的方 向而行進,如後述,對於透明板構件2 1 0之至少覆蓋於遮 應覃層2的區域,等方性施行蝕刻。 9 於第5圖(a )中,透明板構件210是以遮罩層2的 側面部2a爲起點而進行蝕刻。透明板構件210是分別由 圖中遮罩層2的兩側面部2a,向著圖中內側及外側而蝕刻 ,由圖中上側觀看透明板構件2 1 0的情形,從中心軸A向 著外側而同心圓狀地形成具有等高線的蝕刻面。 於第5圖(b)中,若透明板構件210的蝕刻更進一 步進行,由遮罩層2的側面部2a向著中心軸A蝕刻透明 板構件2 1 0而成的蝕刻面,在遮罩層2的下側的中心軸A 上碰觸,形成從遮罩層2的中心軸A向著外側而具有荷葉 邊狀的凸部1 1。凸部1 1是有關本發明之「透鏡中央部」 之一例,向著圖中上側而具備尖銳的頂上部。 於第5圖(c )中,若更進一步進行蝕刻,凸部Π的 頂上部會遠離遮罩層2。藉此,凸部1〗的頂上部會形成具 有圓滑曲面的凸部1 3。在凸部1 3的周圍,形成沿著中心 軸A之周方向而延伸的凹部1 2。在此,自凸部1 1進行蝕 刻的凸部1 3亦相當於有關本發明之「透鏡中央部」之一 -20- (18) 1277771 例。因而’在形成凸部1 1的階段,停止蝕刻步驟而形成 微透鏡’或者蝕刻進行到形成凸部1 3爲止而形成微透鏡 。再者’以凸部1 1爲微透鏡之透鏡中央部的情形下,延 設在凸部1 1之周圍的曲面爲球面。 在此’針對藉由中間層3之蝕刻率不同的鈾刻面之形 狀即最後形成的透鏡曲面之形狀做說明。圖中點線是第5 圖(b )所示的蝕刻面,中間層3因蝕刻率比透明板構件 φ 21 0還高,比遮罩層2之側面部2 a還外側的透明板構件 2 1 0上的中間層3,會比透明板構件2 1 0還快的沿著圖中 橫向被蝕刻。因而,接近圖中兩端的區域的透明板構件 2 1 〇,除了從遮罩層2的側面部2 a進行的蝕刻外,還會從 藉由除去中間層3而露出的面被蝕刻。圖中,比透明板構 件210的遮罩層2的側面部2a更外側的區域,與由遮罩 層2的側面部2a向著中心軸A而進行的蝕刻相比,蝕刻 量增多。即由遮罩層2的側面部2a向著中心軸A而進行 的蝕刻面,則成爲以遮罩層2的側面部2a爲中心的球面 的一部分,一方面,向著比遮罩層2之側面部2a更外側 而進行的蝕刻面,則成爲具有與遮罩層2之下側的蝕刻面 不同的曲率半徑的曲面,形成與遮罩層2之下側的蝕刻面 連續的非球面。因而,透明板構件2.1 0的蝕刻面’在遮罩 層2的下側與遮罩層2的外側,成爲曲率半徑各不相同的 曲面所相連的透鏡曲面。 像這樣,若由第5圖(b )的狀態,更進一步進行蝕 刻,在鈾刻結束的時點,會在透明板構件2 1 〇形成連接具 -21 - (19) 1277771 有曲面的凸部1 3、及在凸部1 3的周圍具有與凸部1 3同心 圓狀相等之深度的凹部1 2。再者,有關本發明的「第1透 鏡曲面」及「第2透鏡曲面」之邊界,是以形成凸部n 之後更進一步進行鈾刻的階段爲邊境,而分別形成在微透 鏡之周緣部與中央部的透鏡曲面的邊境之意。更具體是更 進一步蝕刻凸部1 1所形成的凸部1 3之表面是相當於「第 2透鏡曲面」之一例,凹部12的表面是相當於「第丨透鏡 φ 曲面」之一例。以覆蓋凸部13及凹部12的方式,於接下 的步驟中,塡充如透明樹脂的透鏡形成材料,藉此就能形 成具備反映凸部1 3之曲面及凹部1 2的內側之曲面的透鏡 曲面的微透鏡。更具體是如後述地,微透鏡的透鏡中央部 與透鏡中央部的周圍的透鏡周緣部相比還要凹陷,在透鏡 中央部與透鏡周緣部形成具有不同之透鏡曲面的微透鏡。 接著,於第6圖(a )中,從形成凸部1 3及凹部1 2 的透明板構件210除去遮罩層2及遮罩層4。遮罩層2是 φ藉由蝕刻透明板構件2 1 0,而成爲浮出透明板構件2 1 0的 狀態,配合除去遮罩層4之際而被除去。 在此,邊參照第8圖至第1〇圖,邊針對形成在透明 板構件2 1 0的凸部1 3及凹部12的形狀做詳細說明。第8 圖是由蝕刻面側觀看透明板構件2 1 0的平面圖,第9圖是 第8圖之IX — IX /線剖面圖。第1 〇圖是放大表示第9圖的 放大圖。 於第8圖及第9圖中,凸部13及凹部12,是由遮罩 層2的中心軸A向著外側而形成在透鏡形成區域5〇〇 a內 -22- (20) 1277771 。具備凸部1 3及凹部1 2之表面如透鏡曲面的微透鏡,因 是一個被配置在例如具備液晶裝置等的複數個畫素之中的 一個畫素,包括凸部13及凹部12的透鏡形成區域5 0 0a 的尺寸是收束在一個畫素區域內的尺寸。 於第9圖中,凹部1 2之內側的曲面12a,是有關於中 心軸A而左右對稱,沿著凸部1 3的周長而一樣地延設。 凹部12的底部至凸部1 3的頂上部的高度,比凹部12的 底部至凹部1 2的周緣部1 6的高度更低。凸部1 3的表面 是構成曲面13a。曲面12a是相當於有關本發明之「第1 透鏡曲面」之一例,曲面13a是相當於有關本發明之「第 2透鏡曲面」之一例。因而,以覆蓋凸部1 3及凹部12的 方式,例如藉由埋入透明樹脂之如透鏡形成材料,就能形 成具有反映曲面12a及13a之形狀的透鏡曲面的微透鏡。 再者,也可以形成不塡充像是透明樹脂的透鏡形成材料, 以曲面13a及12a作爲連續的透鏡曲面所具備而成的微透 於第1 0圖中,針對曲面1 3 a及1 2做更詳細說明。曲 面1 3 a是中心位於凸部1 3內,且構成以曲率半徑r所規 定的球面,曲面1 2a是中比位於經由凹部1 2之內側即曲 面1 2 a所包圍的空間,且構成以曲率半徑R所規定的球面 的一部分。再者,曲率半徑R比曲率半徑r還大。曲面 1 3 a及1 2a是中介著變曲點而構成連續的透鏡曲面。曲面 1 2 a是構成稍微從球面偏離圖中兩端那樣的非球面。再者 ,在本實施形態中,曲面1 3 a雖是構成以曲率半徑r所規 -23- (21) 1277771 定的球面,但也可藉由對透明板構件2 1 0更進一步進行鈾 刻,而將曲面1 3 a形成比球面更平坦的面。而與此相反地 ’也可藉由快速結束對透明板構件2 1 0的蝕刻,而將凸部 1 3的形狀形成圓錐形狀,將曲面1 3 a交結在中心軸a上 的一點。 再次於第6圖(b)中,以覆蓋凸部13及凹部12的 方式’以具有光透過性的接著劑作爲透鏡形成材料而塗佈 。在透明板構件2 1 0壓附上覆蓋玻璃1 4而使接著劑硬化 ,藉此形成接著層23 0。其結果,就能形成具備分別反映 出凸部13及凹部12之曲面的透鏡曲面的微透鏡5 00、。 (微透鏡的構造) 其次,邊參照第1 1圖至第1 3圖邊針對微透鏡構造做 說明。第1 1圖是表示有關本實施形態的微透鏡之外形形 狀的立體圖。第1 2圖是表示微透鏡的形狀和藉由微透鏡 所聚光的光之光強度分佈的關係圖。第1 3圖是比較習知 之微透鏡的光強度分佈及有關本實施形態之微透鏡的光強 度分佈的圖。再者,有關第11圖至第13圖所示的本實施 形態的微透鏡,是經由第4圖至第1 0圖所說明的微透鏡 之製造步驟所形成的微透鏡。以下,在與第4圖至第1〇 圖共通的部分,附上共通的參考符號做說明。有關本實施 形態的微透鏡雖是對中心軸A而言,具有旋轉體的透鏡曲 面’但有關本發明之微透鏡並不限於透鏡曲面是與中心軸 相關而旋轉對稱的形狀,例如以包含微透鏡之中心軸的面 -24- (22) (22)In a photovoltaic device such as a liquid crystal device, for example, a microlens corresponding to each pixel is incorporated in a counter substrate, and a microlens array plate in which such a plurality of microlenses are assembled is attached. With such a microlens array, a bright display is achieved in the optoelectronic device. In other words, the microlens condenses the light emitted from the light source of the backlight without being wasted in the opening region of each pixel, thereby improving the utilization efficiency of the light emitted from the light source. For example, in a liquid crystal device including such a microlens, a counter substrate in which a microlens array is mounted and a pixel electrode and a thin film transistor are formed in each pixel by adjusting a gap with a resin in addition to a resin. The element substrate of a switching element or the like is sealed with a liquid crystal therein, thereby being manufactured. In such a liquid crystal device, the thickness of the liquid crystal layer is uniform in the entire liquid crystal panel, which is an important factor for reducing unevenness in brightness and unevenness in color. According to the technique disclosed in Patent Document 1, the peripheral portion of the microlens is still a curved surface, and the central portion of the microlens is a flat surface. Thereby, the thickness of the microlens is reduced, and the thickness of the resin layer formed on the microlens is thinned as much as possible by reducing the thickness error of the liquid crystal layer. [Patent Document 1] JP-A-2000- 1 93 92 8 (2) 1277771 [Disclosure] [The object to be solved by the invention] Such a photovoltaic device has a general requirement for the long life of the device, but generally In the liquid crystal and the alignment film, for example, in a portion located at the center of the opening region of each pixel, the light source light is locally concentrated by the microlens, and it is confirmed by the inventor of the present invention. A situation in which significant degradation occurs. The technique described in the patent document is a technique for reducing the thickness error of the liquid crystal layer, and the known description by the inventors of the present invention through the deterioration in the condensed pixel® region is not observed. Further, the lens characteristics of the microlens assumed by the inventors of the present invention are poor because the central portion of the microlens is a flat surface. In other words, the microlens described in the patent document does not condense light incident on the central portion of the flat surface, and penetrates as it is, and the central φ portion does not function as a lens. Therefore, it is difficult to increase the light utilization efficiency by effectively concentrating the light in the opening area, and thus it becomes difficult to increase the brightness and contrast of the display, and there is a problem in technology. The present invention has been made in view of the above problems, and an object of the present invention is to provide a microlens which can reduce the lifetime of a liquid crystal device or the like by reducing the lifetime of a liquid crystal device or the like by reducing the brightness of the liquid crystal device and the like. , microlens arrays, optoelectronic devices and electronic machines. (3) 1277771 [Means for Solving the Problem] The method for producing a microlens according to the present invention is to provide an etch stop layer having a planar shape of an island formed by forming a lens formation region of a microlens on a transparent substrate. a step of forming an intermediate layer on the etch stop layer, wherein the opening portion is provided at a position layer facing the etch stop layer, and the layer is etched by the opening portion by an isotropic etching, thereby further etching An etching step of etching the transparent substrate in the middle of the side of the stop layer. According to the method for producing a microlens according to the present invention, an etch stop layer is formed on a lens on a transparent substrate such as a quartz substrate or a glass substrate. The etch-stop layer has a smaller size than a lens-forming region having an island shape and having a microlens through etching, for example, which will be described later. On the other hand, for example, the positions of a plurality of microlenses formed by φ in the case where a plurality of microlenses are formed into a curved surface of the lens form an island-shaped spot stop layer. Next, an intermediate layer is formed on the etch stop layer. In the middle, as in the film forming method which is generally used for the CVD method or the sputtering method, an etching mask layer having an opening portion opposite to the etching is formed on the intermediate layer. The etch mask layer may be formed directly on the intermediate layer in such a manner as to avoid the position of the stopper layer. The portion is formed by etching to cover the entire upper portion of the intermediate layer, for example, and removing a lens including a surface opposite to the position of the etching stop layer, and etching the intermediate layer on the intermediate layer. Together, the etch is first formed on the transparent substrate in the formation region, and finally formed on the transparent substrate, and the final plurality of layers are formed by way of example. The stop layer is formed to etch stop or after the opening of the mask layer. Formed like this -6 - (4) 1277771, and after forming an etch stop layer, an intermediate layer, and an uranium engraved mask layer on the transparent substrate, the interlayer is etched by the opening portion by an isotropic etching, and The side of the etch stop layer is uranium engraved with the transparent substrate along with the intermediate layer. More specifically, as the intermediate layer is etched toward the outside from the opening portion, the uranium stop layer is exposed, and the intermediate layer is removed, whereby the intermediate layer is continuously etched while the uranium engraved on the side surface of the etch stop layer. As a result, a lens curved surface having a specific shape is formed by the presence of the etch stop layer in the transparent substrate. More specifically, the etched surface which is formed from the side surface of the etch-stop layer toward the inside of the etch-stop layer is in contact with the lower side of the etch-stop layer, and a convex curved surface is formed on the etch-stop layer side. On the other hand, the uranium facet which is formed toward the outer side of the etch stop layer forms a convex convex curved surface on the side opposite to the lens curved surface formed on the lower side of the etch stop layer. The transparent substrate is etched from the side surface of the uranium engraving stop layer and the lower side of the etched intermediate layer, and the lens curved surface is a lens curved surface which is continuously connected to the lens formation region of the transparent substrate. When the lens curved surface formed as described above is filled with a resin having, for example, light transparency, a microlens having a lens curved surface whose central portion is further recessed than the circumference can be formed. Such a microlens can function as a lens in both the center portion of the lens recessed than the periphery and the peripheral portion around the central portion of the lens. Further, by the specific lens curved surface, the light emitted from the light source is condensed in the pixel region, and the light edge is appropriately diffused while being concentrated, so as not to concentrate on one point of the pixel region. Therefore, the deterioration of the -7-(5) 1277771 of each part of the pixel region caused by the light concentration can be suppressed without impairing the light transmittance of the pixel region. Thereby, it is possible to suppress deterioration of the alignment film in, for example, the pixel region, and to prolong the life of the liquid crystal device or the like. On the other hand, the etched surface is not filled with a resin, and the etched surface of the etched transparent substrate may be used as a lens curved surface. Further, the method for producing a microlens according to the present invention does not require the manufacture of a microlens such as a photovoltaic device of a liquid crystal device, and the photovoltaic device of the microlens is of course applicable to any device. According to the method for producing a microlens according to the present invention, a plurality of microlenses can be formed by changing the etching stop shape or changing the positional relationship, the size, and the like of the etching stop layer and the opening. In one aspect of the method for producing a microlens array according to the invention, the etching rate of the intermediate layer is larger than the etching rate of the transparent substrate. According to this aspect, the etching rate of the intermediate layer is larger than the etching rate of the previous recording. This makes it possible to form an aspherical lens surface. The film is formed by a general-purpose film such as a CVD method or a sputtering method, and the relationship between the etching rate of the intermediate layer and the size of the transparent substrate is the shape of the lens curved surface of the microlens formed by the starving step. In another aspect of the method for producing a microlens according to the present invention, the planar shape of the etch stop layer is circular. According to this aspect, the entire surface of the etch stop layer is etched on the side surface, and the etched surface is in contact with the lower side of the etch stop layer. The planar shape of the term "stop layer" means the etch stop layer in the surface of the transparent substrate. The etched surface to be touched is along the circumferential direction of the uranium etch stop layer, and can be arbitrarily limited to a shape having a root layer and a shape, and the method of determining the intermediate layer of the front lining substrate is an important factor. In the middle, the shape of the transparent etching is stopped to form a -8- (6) 1277771 smooth lens surface. In another aspect of the method for producing a microlens according to the present invention, the planar shape of the opening is circular. According to this aspect, the intermediate layer is etched by the eccentricity centering on the opening. More specifically, the intermediate layer is isotropically etched in the lateral direction of the intermediate layer, that is, on the transparent substrate along the direction in which the intermediate layer is extended. By setting the shape, size, or positional relationship of the opening portion and the etching stop layer, a desired lens curved surface can be formed on the transparent g substrate. In another aspect of the method for producing a microlens according to the present invention, the opening portion and the etching stop layer are coaxially viewed from a plane on the transparent substrate. According to this aspect, the opening portion and the etching stop layer are located at a coaxial position in plan view, and the distance from the opening portion to the side surface of the etching stop layer is equal to the circumferential direction of the etching stop layer at the same time on the side surface of the etching stop layer or The deviation of the time is applied to the etching of the transparent substrate φ plate from the side of the etch stop layer. More specifically, for example, when the planar shape of the opening portion and the etching stop layer is circular, the transparent substrate can be simultaneously etched by the entire side surface of the etching stop layer. In the case of "on the plane", it means that the above layers are viewed from the upper side of the etching stop layer. Therefore, the etching of the transparent substrate from the side surface of the etching stop layer toward the inside of the etching stop layer is performed so as to have a concentric circular shape in plan view along the circumferential direction of the etching stop layer having the same curvature radius. In a space surrounded by the curved surface of such a lens, a lens forming material having, for example, light transmittance is filled, whereby the isotropic property is more concentrically formed by the center of the etching stop layer and the opening portion. (7) 1277771 Lens surface with large line width. In another aspect of the method for producing a microlens according to the present invention, the size of the region in which the etching stop layer is formed in the lens formation region is larger than the size of the region in which the opening portion is formed. According to this aspect, etching is performed from the intermediate layer facing the opening portion in the lens forming region toward the side surface of the etching stopper layer. The etching is performed from the intermediate layer on the upper side of the etching stopper layer to the side surface of the uranium etching stop layer. Thereby, the etching of the transparent substrate is started from the side surface of the etching stop layer, and a concentric circular lens curved surface is formed as seen in the lower plane of the etching stop layer. Further, the side surface of the etching stop layer is etched in an isotropic manner, and the entire curved surface of the lens has a concentric circular contour line to form a continuous curved surface. When the uranium engraving rate of the intermediate layer is larger than the etching rate of the transparent substrate, a lens curved surface having a curved curvature radius of the lens surface is formed on the inner side and the outer side of the etching stop layer. In the case of the isotropic etching using, for example, wet uranium engraving, the intermediate layer is etched faster than the transparent substrate, whereby the lens curved surface formed on the outer side φ of the etch stop layer is formed as an aspherical surface. More specifically, a portion of the transparent substrate located on the lower side of the etched intermediate layer, the contact area contacting the etchant is larger than other regions of the transparent substrate, and only a portion having a larger contact area, a portion of the transparent substrate is more than other regions It is easier to be etched. Thereby, the lens curved surface on the outer side of the etching stop layer can be formed as an aspherical surface. On the other hand, when the etching rates of the intermediate layer and the transparent substrate are the same, the etched surface of the etched transparent substrate becomes a spherical surface. An intermediate layer having an etching rate equal to or higher than that of the transparent substrate is selected, whereby any one of an aspherical surface or a spherical surface is selected as a lens forming surface, -10- (8) 1277771 The radius of curvature of the lens surface of the microlens is adjusted in such a manner as to the desired lens characteristics. In order to solve the above problems, the microlens according to the first aspect of the present invention includes a ridge line extending in a ring shape around a normal line of a plane, and is inclined toward the outer side and the inner side of the ridge line, along the normal line. a peripheral portion of the lens that protrudes from the one plane, and a central portion of the lens that is surrounded by the peripheral edge of the lens and that is recessed toward the plane along the normal line; and a surface of the peripheral portion of the φ lens spans a surface of a central portion of the lens The area is the lens surface. According to the microlens according to the present invention, the surface of the lens peripheral portion and the central portion of the lens is used as a lens curved surface, whereby a region of one of the lens curved surfaces is protruded from a plane, and other regions of the curved surface of the lens are formed toward a plane. The shape of the depression. According to such a lens curved surface, the light intensity distribution of the light that is first concentrated on the second-order surface by the surface of the peripheral portion of the lens is the light that is also concentrated on the second-order surface by the surface of the central portion of the lens. The light intensity φ degree distribution exists in the circumferential direction. In other words, the central portion of the lens and the peripheral portion of the lens are respectively condensed, whereby the entire microlens is one of the microlenses, and the light incident on the formation region is condensed to correspond to the pixel of the one microlens. In the open area, the light is dispersed so as not to condense the light at one point. In order to solve the above problems, the microlens according to the second aspect of the present invention includes a ridge line extending in a ring shape around a normal line of a plane, and is inclined toward the outer side and the inner side of the ridge line, along the normal line. a lens peripheral portion having a first lens curved surface protruding from the one plane and surrounded by the lens peripheral edge portion, and continuously connected to the first lens curved surface, -11 - (9) 1277771 facing the aforementioned one along the normal line The central portion of the lens having the second lens curved surface recessed in the plane. According to the microlens of the present invention, the lens peripheral portion having the first lens curved surface and the lens central portion having the second lens curved surface are dispersed so as not to condense light at one point. Here, the "one plane" of the present invention means, for example, the bottom surface of the lens and the bottom surface of the lens peripheral portion, that is, the bottom surface of the microlens. The peripheral portion of the lens is a circumference extending from the normal line φ of the bottom surface of the microlens, and the ridge line of the peripheral portion of the lens is annularly extended around the normal. The peripheral portion of the lens has a first lens curved surface which is inclined toward the outer side and the inner side of the ridge line, and protrudes from the bottom surface of the microlens along the normal line of the bottom surface. On the other hand, the central portion of the lens surrounds the peripheral portion of the lens and has a second lens curved surface continuously connected to the curved surface of the first lens. The second lens curved surface is recessed toward a plane unlike the first lens curved surface. More specifically, the microlens is a plan view, and has a first lens curved surface and a second lens curved surface surrounding the first lens curved surface, and the curved surfaces are continuously connected, thereby forming a smooth lens curved surface. Further, the depression in the central portion of the lens includes both the peripheral portion of the lens being joined to the center of the microlens at a point, or the bottom of the recess having a slightly larger width. According to the central portion of the lens and the peripheral portion of the lens, the light intensity distribution of the light that is first concentrated on the second dimension surface by the peripheral portion of the lens is concentrated by the central portion of the lens along the same ectopic surface. The light intensity distribution of the light exists in the circumferential direction. In other words, the light is collected by the central portion of the lens and the peripheral portion of the lens, whereby the entire surface of the microlens can be concentrated and incident on the region of the pixel, and the aperture corresponding to the pixel of the one microlens is opened. Inside, the light is not dispersed in a way that it is concentrated at one point. According to the microlens of the invention of -12-(10) 1277771, both the peripheral portion of the lens and the central portion of the lens can be made into lenses having different first lens curved surfaces and second lens curved surfaces. The function can also be a function of making a lens into a whole lens. In this way, the entire light that is incident on the microlens can be efficiently collected in a specific region such as the opening region of each pixel, so that the light can be appropriately dispersed to enhance the brightness and contrast of the display, and to extend the liquid crystal device. Life expectancy. In the shape φ state of one of the microlenses according to the first and second aspects of the invention, the lens peripheral portion and the lens center portion are coaxially formed with the normal line as a central axis. According to this aspect, the peripheral portion of the lens is concentrically viewed around the central portion of the lens on a plane. The light 'concentrated by the central portion of the lens and the peripheral portion of the lens is a light intensity distribution that is concentrically dispersed, and it is possible to suppress light from being concentrated at one point. According to another aspect of the microlens according to the second aspect of the present invention, the first lens curved surface and the second lens curved surface have different curvature radii. According to this aspect, the light intensity distribution can be adjusted by the difference in the radius of curvature of the first lens curved surface and the second lens curved surface, so that the alignment film located in the pixel region can be adjusted not only at a point but also at a point. Light intensity distribution. Further, it is possible to concentrate the light intensity distribution in the pixel area while efficiently concentrating on the entire pixel region. In another aspect of the microlens according to the second aspect of the present invention, the cross-sectional shape of the first lens curved surface that is perpendicular to the extending direction of the ridge line extends is a spherical shape or an aspherical shape. According to this aspect, the cross-sectional shape of the curved surface of the first lens is a spherical shape of −13-(11) 1277771 or an aspherical shape, whereby the thickness of the microlens is designed while dispersing the light intensity distribution of the collected light. The desired thickness. In particular, when the first lens curved surface has an aspherical shape, the thickness of the microlens can be thinned while concentrating the light in a specific range. The microlens array of the present invention is a microlens of the present invention as described above in order to solve the above problems. According to the microlens array of the present invention, as compared with the above-described microlens, the light transmittance of the pixel region is not increased, and the light is prevented from being concentrated at one point. In particular, the microlens array in which each microlens is arranged in such a manner as to face each pixel of the photovoltaic device is a light condensed on each pixel, thereby improving the brightness of the pixel, etc., and suppressing by concentrating light. Deterioration occurs in each part of the pixel area. The photovoltaic device of the present invention is provided with the above-described microlens of the present invention in order to solve the above problems. According to the microlens according to the present invention, similarly to the above-described microlens, Φ does not impair the light transmittance of the pixel region, and it is possible to suppress light from being concentrated at one point. Thus, an optoelectronic device having excellent display performance can be provided. Further, in the photovoltaic device of the present invention, as described above, the microlens having excellent lens characteristics can improve the light use efficiency by the microlens, and can also improve the light transmittance and contrast of each pixel. Therefore, the photovoltaic device according to the present invention can exhibit high-quality images and have a long life. The electronic device according to the present invention is provided with the above-described photovoltaic device of the present invention in order to solve the above problems. According to the electronic device according to the invention of the present invention, it is possible to realize a projection type display device, a liquid crystal television, and a portable display device of the same level display having a high lifetime by the photoelectric device of the invention of the above-mentioned 14- (12) 1277771 Sub-notebook, word processor, viewing window or monitor direct view, workstation, TV phone, P 0 S terminal, touch panel and other sub-machines. With regard to the electronic device of the present invention, in addition to, for example, an electrophoresis device, a Field Emission Display and Surface-Conduction Emitter Display using an electronic radiation element can be realized, and DLP (Digital Light Processi) and other advantages of the present invention are [Embodiment] [Best Mode for Carrying Out the Invention] Hereinafter, a method of manufacturing a microlens according to the present invention, a microlens array, a photovoltaic device, and an electronic device will be described with reference to the drawing φ. (Microlens Array Plate) First, the lenticular sheet 1 to Fig. 3 to which the microlens of the present invention is applied will be described. Fig. 1 is a perspective view showing a schematic configuration of the lens array panel of the present embodiment. A plan view of the four differentials adjacent to each other among the microlenses of the microlens array plate is enlarged. Fig. 3 is an enlarged view showing a part of a cross section of the microplate of the embodiment, which can be used for telephone and electric recording. Various electronic newspapers and other devices (electron-ng), etc. for the implementation of the microlens and the details of the side, refer to the first form Micro lens showing lens array with lens -15-(13) 1277771 In Fig. 1, the microlens array plate 2 of the present embodiment is arranged in a matrix plane on the transparent plate member 210 of the "transparent substrate" of the present invention. A plurality of microlenses 500 are formed. The member 2 10 is, for example, a quartz plate or the like, and a matrix-like excavation is mostly concave in the concave recess in which the transparent plate member 2 1 0 is excavated, for example, formed of a photosensitive resin material. The adhesive hardening layer 230 is arranged to cover the transparent plate member 210 so that the transparent plate member 210 and the transparent plate member 2 1 0 are mutually connected. For the next 200 and the transparent plate member 2 1 0 The adhesive is, for example, a transparent adhesive layer having a higher refractive index than that of the transparent film. In FIGS. 2 and 3, the lens curvature of the microlens 500 is made by a transparent plate member 2 1 0 having a different refractive index from each other. The microlens 500 is formed by projecting a lens slightly protruding from the lens in Fig. 3. The microlens 500 of the present embodiment is manufactured by a special manufacturing method as described later, and the lens of the microlens 500 The curved surface is a peripheral portion with different radii 5 Ο Ο Α The central portion is composed of 5 Ο Β . The portion 5 Ο Ο A is the portion on the peripheral side of the microlens 500, which is convex in the figure. The central portion of the lens 5 Ο Ο B is the lens constituting the microlens. The portion on the inner side of the peripheral portion 5 Ο Ο A is a convex-shaped portion in the figure, and more specifically, a portion of the lens curved surface in which the lens central portion 500B covers the bottom surface 502 of the lens 510 and is recessed. The microlens array plate 2 0 In the case of using the microlens 500 0 0, the photovoltaic device of the liquid crystal device or the like described later is a recess having one of the transparent plate structures.塡 由 接着 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 覆盖 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本 本The incident light incident on each of the microlenses 500 by the -16-(14) 1277771 is condensed toward the center of each pixel of the photovoltaic device by the refractive action of the microlens 500. Further, the configuration of the microlens 500 will be described in detail later. (Manufacturing method of microlens) Next, the method of manufacturing the microlens according to the present embodiment will be described with reference to Figs. 4 to 9 . 4 to 6 are cross-sectional views showing a series of steps of the manufacturing method of the microlens according to the embodiment of the present invention, and Fig. 7 is a plan view showing the arrangement of the mask layer 2 and the opening 5. In Fig. 4(a), a mask layer 2 of one example of the "etch stop layer" of the present invention is formed on the transparent plate member 210, and the intermediate layer 3 is sequentially formed thereon and the present invention is related thereto. A mask layer 4 of one example of "etching the mask layer". The mask layer 2 is, for example, an amorphous sand film formed by a CVD (Chemical Vapor Deposition) method or the like, or a Cr film having a fluorine-resistant acidity, a polycrystalline ruthenium film, or the like. In the present embodiment, the shape of the mask layer 2 in the surface of the transparent plate φ member 210 is circular, and the mask layer 2 is formed in an island shape on the transparent plate member 210. The intermediate layer 3 is a layer formed of a material mainly composed of a material having an etching rate equal to or higher than the etching rate of the transparent plate member 210. The intermediate layer 3 is formed by a CVD method or a sputtering method in a manner such as a desired uranium engraving rate. Further, in the following, the etching rate of the intermediate layer 3 is described as being larger than the etching rate of the transparent plate member 210. As will be described later, in the case where the etching rate of the intermediate layer 3 is larger than the etching rate of the transparent plate member 210, the uranium engraving rate of the aspherical 'intermediate layer 3 and the transparent plate -17- can be formed by the last formed microlens. (15) 1277771 When the etching rate of the member 2 10 is equal, the lens curved surface of the microlens may form a spherical surface. The mask layer 4 is formed by the same method as the mask layer 2, and has an opening portion 5 provided to expose a part of the surface of the intermediate layer 3. The opening portion 5 is a circular hole having a central shape coaxial with the central axis of the mask layer 2, and the size of the opening portion 5 is smaller than that of the mask layer 2. More specifically, the diameter of the circular opening portion 5 is larger than the circle. The shape of the mask layer 2 is also small. That is, the size of the mask layer 2 is changed, and the lens forming surface of the transparent plate member 2 10 is larger than the size of the opening portion 5. Further, the planar shape, size, and positional relationship of the mask layers 2 and 4 and the opening portion 5 are an example of a method of manufacturing the microlens according to the present invention, and a mask layer formed on the transparent plate member 210 in an island shape is formed. 2. The opening 5 may be disposed so as to face the mask layer 2 with the intermediate layer 3 interposed therebetween. The opening portion 5 is located coaxially with the central axis of the concealing layer 2. Therefore, when the opening 5 and the mask layer 2 are viewed from the upper side of the mask layer 4, the mask layer 2 φ and the edge of the opening 5 are respectively concentric. In the following, although the planar shape of the mask layer 2 and the opening 5 is circular, the method of manufacturing the microlens according to the present invention does not exclude the mask layer 2 and the opening. The planar shape of 5, for example, the planar shape of the mask layer 2 and the opening portion 5 may be an equilateral triangle, a square, a regular hexagon, a regular octagon, or other planar shape that rotates the object toward the central axis. Here, the arrangement of the mask layer 2 and the opening 5 will be described with reference to Fig. 7. In Fig. 7, on the transparent plate member 2 1 0, a mask layer -18-(16) 1277771 2, an intermediate layer 3, and a mask layer 4 are sequentially formed, and the description will be made with reference to Figs. 4 to 6 The manufacturing method of the microlens is equivalent to taking out one of the openings 5 formed in the plurality of openings 5 of the mask layer 4, and taking out the steps for etching the intermediate layer 3 and the transparent plate member 2 1 0. Step profile view. The mask layer 2 is formed in a lens-formed region 500a which is formed in an island shape on the transparent plate member 210, and the lens-forming region 500a is a plurality of pixels in which the microlens array plate 20 is disposed in an overlapping manner after completion of the microlens. The arrangement of φ is defined as a matrix shape along the longitudinal and lateral directions in the figure. The intermediate layer 3 and the transparent plate member 2 1 0 are formed by a plurality of openings 5 - 倂 provided in the mask layer 4, whereby the lens curved surfaces of the respective microlenses are respectively formed, thereby forming a plurality of reference figures 1 to The microlens array plate 20 of the microlens described in Fig. 3 is further removed, and in Fig. 4(b), the intermediate layer 3 is engraved by the uranium of the opening portion 5. Here, "isotropic" means that the intermediate layer 3 φ is uniformly etched toward the outside in the figure by the opening portion 5 which is coaxially located on the central axis A of the mask layer 2, and is, for example, wet in the present embodiment. Etching is performed to etch the intermediate layer 3 in the lateral direction of the drawing. Further, the intermediate layer 3 is etched along the longitudinal direction in the drawing, that is, in the thickness direction, but the etching of the intermediate layer 3 along the thickness direction is temporarily stopped by the mask layer 2, and the intermediate layer 3 is performed only in the lateral direction. The moment of engraving. In FIG. 4(c), the etching of the intermediate layer 3 is further performed. When the side surface of the mask layer 2 is exposed to the surface of the transparent plate member 210, the transparent plate member 210 is the mask layer 2. The side is engraved for the starting point. Here, in the present embodiment, the opening portion 5 is provided coaxially with the central axis of the mask layer 2, and the center portion of the opening portion 5 to the side surface portion 2a of the mask layer 2 is -19- (17). The distance of 1277771 is equal to the entire side surface portion 2a of the mask layer 2. Therefore, the etching surface of the intermediate crucible 3 reaches the entire side surface portion 2a of the mask layer 2 at the same time, and the etching of the transparent plate member 2 10 is started from the side surface portion 2 a of the mask layer 2 in the mask layer 2 . The entire side portion 2a starts at the same time. The etching of the transparent plate member 210 is performed in the direction of the inner side and the outer side of the mask layer 2 and the lower side of the mask layer 2 with the side surface portion 2 a of the mask layer 2 as a starting point, as will be described later. For the region of the transparent plate member 210 that covers at least the enamel layer 2, the isotropic is etched. In Fig. 5(a), the transparent plate member 210 is etched starting from the side surface portion 2a of the mask layer 2. The transparent plate member 210 is etched from the both side faces 2a of the mask layer 2 in the drawing toward the inside and the outside in the drawing, and the transparent plate member 2 10 is viewed from the upper side in the drawing, and is concentric from the central axis A toward the outside. An etched surface having contour lines is formed in a circular shape. In Fig. 5(b), when the etching of the transparent plate member 210 is further performed, the etching surface of the transparent plate member 2100 is etched from the side surface portion 2a of the mask layer 2 toward the central axis A, in the mask layer. The lower central axis A of the second surface 2 is in contact with each other to form a convex portion 11 having a ruffle shape from the central axis A of the mask layer 2 toward the outside. The convex portion 1 1 is an example of the "central portion of the lens" of the present invention, and has a sharp top portion toward the upper side in the drawing. In Fig. 5(c), if the etching is further performed, the top portion of the convex portion is away from the mask layer 2. Thereby, the top portion of the convex portion 1 is formed with a convex portion 13 having a rounded curved surface. A concave portion 1 2 extending in the circumferential direction of the central axis A is formed around the convex portion 13. Here, the convex portion 13 which is etched from the convex portion 1 1 also corresponds to one of the "central portions of the lens" of the present invention -20-(18) 1277771. Therefore, at the stage of forming the convex portion 11, the etching step is stopped to form the microlens ' or the etching proceeds until the convex portion 13 is formed to form the microlens. In the case where the convex portion 1 1 is the central portion of the lens of the microlens, the curved surface extending around the convex portion 1 1 is a spherical surface. Here, the shape of the uranium facet which is different in the etching rate of the intermediate layer 3, that is, the shape of the finally formed lens curved surface will be described. In the figure, the dotted line is the etched surface shown in Fig. 5(b), and the intermediate layer 3 is higher than the transparent plate member φ 21 0 because of the etching rate, and the transparent plate member 2 is outside the side portion 2 a of the mask layer 2 The intermediate layer 3 on 10 will be etched laterally in the drawing as fast as the transparent plate member 2 1 0. Therefore, the transparent plate member 2 1 接近 in the vicinity of the both ends in the drawing is etched from the surface exposed by the removal of the intermediate layer 3 in addition to the etching from the side surface portion 2a of the mask layer 2. In the figure, the area of the outer side of the side surface portion 2a of the mask layer 2 of the transparent plate member 210 is increased as compared with the etching by the side surface portion 2a of the mask layer 2 toward the central axis A. That is, the etched surface which is formed by the side surface portion 2a of the mask layer 2 toward the central axis A becomes a part of the spherical surface centering on the side surface portion 2a of the mask layer 2, and on the other hand, faces the side surface portion of the mask layer 2 The etched surface which is formed on the outer side of 2a is a curved surface having a radius of curvature different from the etched surface on the lower side of the mask layer 2, and forms an aspherical surface continuous with the etched surface on the lower side of the mask layer 2. Thus, the transparent plate member 2. The etched surface 10 of 10 is a lens curved surface which is connected to a curved surface having a different radius of curvature on the lower side of the mask layer 2 and the outside of the mask layer 2. In this way, if the etching is further performed by the state of Fig. 5(b), the connecting member 21 - (19) 1277771 has a convex portion 1 having a curved surface formed at the transparent plate member 2 1 at the end of the uranium engraving. 3. A recess 1 2 having a depth equal to the concentric shape of the convex portion 13 around the convex portion 13 . Further, the boundary between the "first lens curved surface" and the "second lens curved surface" according to the present invention is formed at the periphery of the microlens by the step of forming the convex portion n and further performing uranium engraving. The meaning of the border of the lens surface of the central part. More specifically, the surface of the convex portion 13 formed by further etching the convex portion 1 1 corresponds to an example of the "second lens curved surface", and the surface of the concave portion 12 corresponds to the "second lens φ curved surface". In the step of covering the convex portion 13 and the concave portion 12, a lens forming material such as a transparent resin is filled, whereby a curved surface reflecting the curved surface of the convex portion 13 and the inner side of the concave portion 12 can be formed. Microlens of the lens surface. More specifically, as will be described later, the central portion of the lens of the microlens is further recessed than the peripheral portion of the lens around the central portion of the lens, and microlenses having different lens curved surfaces are formed at the central portion of the lens and the peripheral portion of the lens. Next, in Fig. 6(a), the mask layer 2 and the mask layer 4 are removed from the transparent plate member 210 which forms the convex portion 13 and the concave portion 1 2 . The mask layer 2 is in a state where the transparent plate member 2 10 is etched, and the transparent plate member 2 10 is floated, and is removed when the mask layer 4 is removed. Here, the shape of the convex portion 13 and the concave portion 12 formed in the transparent plate member 2 10 will be described in detail with reference to Figs. 8 to 1 . Fig. 8 is a plan view showing the transparent plate member 2 10 from the side of the etching surface, and Fig. 9 is a sectional view taken along the line IX - IX / line of Fig. 8. The first drawing is an enlarged view showing the enlarged view of Fig. 9. In Figs. 8 and 9, the convex portion 13 and the concave portion 12 are formed in the lens forming region 5? a by the central axis A of the mask layer 2, and -22-(20) 1277771. The microlens having the surface of the convex portion 13 and the concave portion 12 as a curved surface of the lens is a single pixel disposed in, for example, a plurality of pixels including a liquid crystal device, and includes a lens of the convex portion 13 and the concave portion 12. The size of the formation area 500a is the size that is converged within one pixel area. In Fig. 9, the curved surface 12a on the inner side of the concave portion 12 is bilaterally symmetrical with respect to the central axis A, and is extended similarly along the circumference of the convex portion 13. The height from the bottom of the recess 12 to the top portion of the projection 13 is lower than the height of the bottom of the recess 12 to the peripheral portion 16 of the recess 12. The surface of the convex portion 13 is a curved surface 13a. The curved surface 12a is an example of the "first lens curved surface" corresponding to the present invention, and the curved surface 13a is an example corresponding to the "second lens curved surface" of the present invention. Therefore, by covering the convex portion 13 and the concave portion 12, for example, by embedding a transparent resin such as a lens forming material, a microlens having a lens curved surface reflecting the shapes of the curved surfaces 12a and 13a can be formed. Further, a lens forming material which is not a transparent resin may be formed, and the curved surfaces 13a and 12a are formed as continuous lens curved surfaces, and microscopically formed in the first drawing, and the curved surfaces 1 3 a and 1 2 Do more details. The curved surface 13 3 a is located in the convex portion 13 and has a spherical surface defined by the radius of curvature r. The curved surface 12 a is a space surrounded by the inner surface of the concave portion 12 2 , that is, the curved surface 1 2 a, and is configured to A part of the spherical surface defined by the radius of curvature R. Furthermore, the radius of curvature R is larger than the radius of curvature r. The curved surfaces 1 3 a and 1 2a form a continuous lens curved surface by interpolating the inflection points. The curved surface 1 2 a is an aspherical surface that is slightly offset from the spherical surface at both ends in the figure. Further, in the present embodiment, the curved surface 13 a is formed as a spherical surface defined by the radius of curvature r of -23 - (21) 1277771, but the uranium engraving may be further performed by the transparent plate member 2 1 0 And the surface 13 a forms a plane that is flatter than the spherical surface. On the contrary, the shape of the convex portion 13 can be formed into a conical shape by rapidly ending the etching of the transparent plate member 210, and the curved surface 13a can be bonded to a point on the central axis a. Further, in Fig. 6(b), a light-transmitting adhesive is applied as a lens forming material so as to cover the convex portion 13 and the concave portion 12 as a lens forming material. The glass member 14 is overlaid on the transparent plate member 210 to press the adhesive to form an adhesive layer 23 0. As a result, the microlens 500 having the lens curved surfaces respectively reflecting the curved surfaces of the convex portion 13 and the concave portion 12 can be formed. (Structure of Microlens) Next, the structure of the microlens will be described with reference to FIGS. 1 to 13 . Fig. 1 is a perspective view showing the outer shape of the microlens according to the embodiment. Fig. 12 is a graph showing the relationship between the shape of the microlens and the light intensity distribution of light collected by the microlens. Fig. 1 is a view comparing the light intensity distribution of the conventional microlens and the light intensity distribution of the microlens according to the present embodiment. Further, the microlens of this embodiment shown in Figs. 11 to 13 is a microlens formed by the manufacturing steps of the microlens described in Figs. 4 to 10 . Hereinafter, in the portions common to the fourth to the first drawings, common reference numerals will be attached for explanation. The microlens according to the present embodiment has a lens curved surface with a rotating body for the central axis A. However, the microlens according to the present invention is not limited to a shape in which the lens curved surface is rotationally symmetrical with respect to the central axis, for example, to include micro Face of the central axis of the lens-24- (22) (22)
1277771 切過微透鏡的斷面,有關中心軸並不排除透鏡曲面爲 稱。 於第1 1圖中,微透鏡5 00是具備延設在微透鏡 之中心軸A的周長的透鏡周緣部5 00 A、和包圍於透 緣部5 00A的透鏡中央部500B所構成。 透鏡周緣部5 00A是於第4圖至第6圖中,在蝕 明板構件2 1 0所形成的凹部1 2,塡充折射率材料比透 構件210還高的透鏡形成材料所形成,具有反映出被 之透明板構件2 1 0的凹部1 2之透鏡曲面的透鏡曲面 鏡曲面1 2 a是相當於有關本發明之「第1透鏡曲面」 例。 透鏡中央部5 00B是具有包圍於透鏡周緣部5 00A 時比透鏡周緣部5 00A還凹陷的透鏡曲面13a。即透 面13a是相當於有關本發明之「第2透鏡曲面」之一 更具體是向著底面502而凹陷。微透鏡500的透鏡曲 透鏡曲面13a及透鏡曲面12a中介著變曲點而圓滑地 所構成,微透鏡5 0 0是具備成爲一體的透鏡中央部 及透鏡周緣部5 00A所構成。 透鏡中央部5 00B是構成曲率半徑r之球面的一 。具備透鏡周緣部5 00A的透鏡曲面12a之中,鄰接 鏡中央部5 00B的區域的透鏡曲面,是構成曲率半徑 球面的一部分,透鏡曲面1 2 a之中,形成愈佔據接近 透鏡5 0 0之外側的區域的透鏡曲面,曲率半徑愈大的 。在透鏡周緣部5 0 0 A之頂上的稜線5 0 1,是對微透籟 非對 500 鏡周 刻透 明板 蝕刻 。透 之一 的同 鏡曲 例, 面是 連接 5 00B 部分 於透 R之 於微 球面 ί 500 -25- (23) 1277771 之底面5 02而突出,延設在有關本發明之「法線」之一例 的中心軸A的周長。藉由從稜線5 0 1向著圖中外側而延設 的曲面503a,與向著內側而延設的曲面503b構成透鏡曲 面 1 2 a 〇1277771 Cut through the section of the microlens, the relevant central axis does not exclude the lens surface. In the first embodiment, the microlens 500 is composed of a lens peripheral portion 510A extending over the circumference of the central axis A of the microlens and a lens central portion 500B surrounding the rim portion 00A. The lens peripheral portion 5 00A is formed in the concave portion 12 formed by the etched plate member 2 10 in the fourth to sixth figures, and the lens-forming material having a higher refractive index material than the transparent member 210 has The lens curved surface curved surface 1 2 a reflecting the lens curved surface of the concave portion 1 2 of the transparent plate member 2 10 is an example of the "first lens curved surface" according to the present invention. The lens center portion 500B has a lens curved surface 13a that is recessed from the lens peripheral portion 500A when surrounded by the lens peripheral portion 500A. That is, the transmissive surface 13a is one of the "second lens curved surfaces" corresponding to the present invention, and more specifically recessed toward the bottom surface 502. The lens curved lens curved surface 13a and the lens curved surface 12a of the microlens 500 are formed by smoothing the inflection point, and the microlens 500 is composed of a lens center portion and a lens peripheral portion 500A. The lens center portion 500B is one of the spherical surfaces constituting the radius of curvature r. Among the lens curved surfaces 12a including the lens peripheral portion 500A, the lens curved surface of the region adjacent to the mirror center portion 500B is a part of the spherical surface of the curvature radius, and the lens surface 12 a is formed closer to the lens 500. The lens surface of the outer region has a larger radius of curvature. The ridge line 501 on the top of the lens peripheral portion 510A is etched through the micro-transparent 籁 non-pair 500 mirror. One of the same mirror examples, the surface is connected to the bottom of the microsphere surface ί 500 -25- (23) 1277771 through the R 00B portion, and is extended to the "normal" of the present invention. The circumference of the central axis A of an example. The curved surface 503a extending from the ridge line 501 toward the outer side in the drawing and the curved surface 503b extending toward the inner side constitute a lens curved surface 1 2 a 〇
於第12圖中,經由微透鏡500所聚光的光之光強度 分佈D,在聚光端的2次元平面內同心圓狀地具有同一光 強度。光強度分佈D分爲:對應於微透鏡5 00之透鏡中央 部5 00B的中央區域I、環狀擴大至中央區域I之外側的周 邊區域Π及擴大至周邊區域II之外側的周邊區域III。該 三個區域之中,周邊區域II爲光強度比其他區域還強的區 域,用以集中藉由沿著微透鏡500之中心軸A之周長所延 設的透鏡周緣部5 00A而聚光之光的區域。周邊區域II是 環狀擴大至中央區域I之周圍的區域,周邊區域II的光強 度變得比聚光於一點的情形還要弱。因而,藉由微透鏡 5 00聚光於畫素的情形下,就能抑制聚光於畫素之一點, 就能抑制包含於畫素之各部因光而劣化。就能抑制例如液 晶裝置等的配向膜或液晶因被聚光之光而劣化。 於第1 3圖(a )中,在以包括中心軸的面切過習知之 微透鏡60的斷面上,微透鏡60以具有一凸部作爲凸透鏡 的功能。通過微透鏡60的光L1,是被聚光於聚光端的2 次元平面S的特定區域。通過微透鏡60的光L1是例如被 聚光於微透鏡60的焦點f。特別是微透鏡60爲非球面透 鏡的情形下,因在焦點f精度良好的一點形成一致’配置 在位於此焦點的區域的各部,例如畫素內的配向膜易劣化 -26- (24) 1277771 。而即使焦點未位於2次元平面S上的情形下,藉由微透 鏡6 0所聚光的光,會被聚光於光之射出端的2次元平面 內S的狹窄區域。 一方面,於第13圖(b )中,若根據有關本實施形態 的微透鏡5 0 0,光L2則藉由左右對稱位於以包括微透鏡 5〇〇之中心軸A的面切過微透鏡5 00之斷面上的透鏡周緣 部5 00A及透鏡中央部5 00B而各別聚光,就能分散以往被 φ —點聚光的光。更具體是分別位在圖中左右的透鏡周緣部 5 00A,分別在聚光端的2次元平面上S1具有焦點Π及f2 ,藉由透鏡周緣部5 00A及透鏡中央部5 00B被聚光的光 L2會被聚光於焦點f 1及f2。焦點Π及f2是位在以中心 軸A及光之聚光端的2次元平面S1之交點爲中心的圓上 ,2次元平面S 1的光強度會比被一點聚光的情形還要分 散。因而,若根據微透鏡5 00,可減低被配設在畫素內的 各部的劣化。進而微透鏡5 00,與習知的微透鏡同樣具有 φ使光聚光於與一定區域例如微透鏡5 00對向配置的畫素內 的功能,也可藉由提高畫素之光透過率而提昇畫素之顯示 性能。 (光電裝置) 其次,邊參照第1 4圖至第1 7圖,邊針對應用有關本 實施形態的微透鏡的光電裝置做說明。第1 4圖是從形成 在其上的各構成要素的同時作爲對向基板所使用的微透鏡 陣列板側觀看TFT陣列基板的平面圖,第1 5圖是第1 4圖 -27- (25) 1277771 的Η — Η ’剖面圖。在此,以光電裝置之一例的驅動電 裝型的TFT主動矩陣驅動方式的液晶裝置爲例。而本 形態的微透鏡陣列板是具備有關複數配列的本發明的 鏡。 於第14圖及第15圖中,在液晶裝置100,TFT 基板1 〇和作爲對向基板使用的微透鏡陣列板20是對 置。在TFT陣列基板1 0與微透鏡陣列板20之間封入 φ層50,TFT陣列基板10與微透鏡陣列板20是藉由設 在畫像顯示區域l〇a之周圍的遮蔽區域的遮蔽材52 被接著。 遮蔽材52,爲了貼合兩基板,由例如紫外線硬化 、熱硬化樹脂等所形成,於製造製程中,塗佈於TFT 基板1 0上之後,經由紫外線照射、加熱等使其硬化 於遮蔽材5 2中,散佈以TF T陣列基板1 0與微透鏡陣 20的間隔(基板間間隙)爲所定値的玻璃纖維或是玻 φ等的間隙材。即本實施形態的光電裝置是應用於作爲 機之光閥用而以小型進行放大顯示。 並行於配置著遮蔽材5 2的遮蔽區域之內側,而 規定畫像顯示區域1 0 a之框緣區域的遮光性之框緣遮 5 3是設在微透鏡陣列板2 0側。但此種框緣遮光膜5 3 部分或全部’也可作爲內裝遮光膜而設在TFT陣列 1 〇側。 位於畫像顯示區域1 〇 a之周邊的周邊區域之中, 於配置著遮蔽材5 2的遮蔽區域之外側的區域,沿著In Fig. 12, the light intensity distribution D of the light condensed by the microlens 500 has the same light intensity concentrically in the second-order plane of the condensing end. The light intensity distribution D is divided into a central region I corresponding to the central portion 5 00B of the microlens 500, a peripheral region 环状 annularly expanded to the outside of the central region I, and a peripheral region III extending to the outer side of the peripheral region II. Among the three regions, the peripheral region II is a region where the light intensity is stronger than other regions, and is concentrated by collecting the peripheral portion 5 00A of the lens extending along the circumference of the central axis A of the microlens 500. The area of light. The peripheral region II is a region in which the ring shape is enlarged to the periphery of the central region I, and the light intensity of the peripheral region II becomes weaker than when the light is concentrated at one point. Therefore, when the microlens 00 is condensed on the pixels, it is possible to suppress the concentration of a part of the pixels, and it is possible to suppress the deterioration of each part included in the pixels due to light. It is possible to suppress deterioration of the alignment film or liquid crystal of, for example, a liquid crystal device due to light collected. In Fig. 13(a), on the cross section of the conventional microlens 60 cut by a face including a central axis, the microlens 60 has a function of having a convex portion as a convex lens. The light L1 passing through the microlens 60 is a specific region of the 2-dimensional plane S that is condensed on the condensing end. The light L1 passing through the microlens 60 is, for example, focused on the focal point f of the microlens 60. In particular, in the case where the microlens 60 is an aspherical lens, the alignment film is arranged at the point where the focus f is excellent, and the alignment film disposed in the region located at the focus is easily deteriorated -26- (24) 1277771 . Even in the case where the focus is not located on the 2-dimensional plane S, the light collected by the micro-mirror 60 is concentrated in a narrow region of the S-dimensional plane S in the light-emitting end of the light. On the other hand, in Fig. 13(b), according to the microlens 500 of the present embodiment, the light L2 is cut by the left and right symmetry on the face including the central axis A of the microlens 5〇〇. The lens peripheral portion 5 00A and the lens center portion 5 00B on the cross section of 500 00 are condensed separately, and the light condensed by the φ-point can be dispersed. More specifically, the peripheral portion 5 00A of the lens, which is located at the left and right sides of the figure, respectively, has a focus Π and f2 on the second-order plane of the condensing end, and the light is condensed by the peripheral portion 5 00A of the lens and the central portion 5 00B of the lens. L2 will be concentrated at the focal points f 1 and f2. The focus Π and f2 are located on a circle centered on the intersection of the central axis A and the second-order plane S1 of the condensing end of the light, and the light intensity of the second-order plane S 1 is more dispersed than when the spot is concentrated. Therefore, according to the microlens 500, the deterioration of each portion disposed in the pixel can be reduced. Further, the microlens 00 has a function of φ condensing light in a pixel disposed opposite to a certain region such as the microlens 00, similarly to the conventional microlens, and can also improve the light transmittance of the pixel. Improve the display performance of pixels. (Photoelectric device) Next, an optoelectronic device to which the microlens according to the present embodiment is applied will be described with reference to Figs. 14 to 17 . Fig. 14 is a plan view of the TFT array substrate viewed from the side of the microlens array plate used as the counter substrate from the respective constituent elements formed thereon, and Fig. 15 is a view of Fig. 14-27-(25) 1277771's Η — Η 'section diagram. Here, a liquid crystal device of a driving-type TFT active matrix driving method which is an example of a photovoltaic device is taken as an example. The microlens array plate of the present embodiment is a mirror of the present invention having a plurality of arrangements. In Figs. 14 and 15, in the liquid crystal device 100, the TFT substrate 1 is opposed to the microlens array plate 20 used as a counter substrate. The φ layer 50 is sealed between the TFT array substrate 10 and the microlens array plate 20, and the TFT array substrate 10 and the microlens array plate 20 are shielded by the shielding material 52 provided in the shielding region around the image display region 10a. then. The masking material 52 is formed by, for example, ultraviolet curing, thermosetting resin, or the like, and is applied to the TFT substrate 10 in a manufacturing process, and then cured to the masking material 5 by ultraviolet irradiation, heating, or the like. In the case of the second embodiment, the gap between the TF T array substrate 10 and the microlens array 20 (the gap between the substrates) is a gap material such as a predetermined glass fiber or a glass φ. That is, the photovoltaic device of the present embodiment is applied to a light valve of a machine and is enlarged and displayed in a small size. The rim of the occlusion of the rim region of the image display region 10 a is arranged in parallel with the inner side of the occlusion region in which the mask member 52 is disposed, and is provided on the microlens array plate 20 side. However, part or all of the frame light-shielding film 5 3 may be provided on the side of the TFT array 1 as a built-in light-shielding film. Among the peripheral regions around the image display area 1 〇 a, the area outside the shielding area where the masking material 52 is disposed is along
路內 實施 微透 陣列 向配 液晶 於位 互相 樹脂 陣列 。而 列板 璃珠 投影 用來 光膜 的一 基板 在位 TFT -28- (26) 1277771 陣列基板l 0的一邊而設置資料線驅動電路1 〇 1 路接続端子1 02。而掃描線驅動電路1 04是以沿著 此一邊的二邊,且覆蓋前述框緣遮光膜53的方式 。進而,像這樣爲了連繫設在畫像顯示區域1 之 兩個掃描線驅動電路1 04間,以沿著TFT陣列基丰! 剩的一邊,且覆蓋於前記框緣遮光膜5 3的方式設 個配線1 0 5。 φ 在微透鏡陣列板20的四個角隅部,配置.著作 板間之上下導通端子之功能的上下導通材〗06。另 ,在TFT陣列基板1 〇是在對向於該些角隅部的區 上下導通端子。藉此,在TFT陣列基板10與微透 板2 0之間取得電性的導通。 於第14圖中,在TFT陣列基板10上,是在形 素開關用之TFT和掃描線、資料線等之配線之後的 極9a上,形成配向膜。另一方面,針對詳細的構 φ述,但於微透鏡陣列板20上,除對向電極2 1外, 子狀或條紋狀的遮光膜23,更在最上層部分形成配 而液晶層5 0是由例如混合一種或數種的向列液晶 所形形,在該些一對配向膜間取得所定的配向狀態 再者,於第14圖及第15圖所示的TFT陣列: 上,除了該些資料線驅動電路1 〇 1、掃描線驅動電 等’也可形成將畫像訊號線上的畫像訊號進行抽樣 到資料線的抽樣電路,將所定電壓電位的預備訊號 晝像訊號而各別供給到複數個資料線的預備電路, 外部電 鄰接於 而設置 兩側的 :10之 置複數 爲兩基 一方面 域設置 鏡陣列 成有畫 畫素電 成於後 形成格 向膜。 的液晶 〇 i板ίο 路 104 而供給 先行於 用以檢 -29- (27) 1277771 查製造途中或出貨荷時之該光電裝置的品質、缺陷等的檢 查電路等。 針對設於上述之液晶裝置1 0 0的微透鏡陣列板2 〇之 詳姻構成及其功能參照第1 6圖及第1 7圖做說明。第1 6 圖是模式表示微透鏡陣列板20之遮光膜23及微透鏡500 的配置關係的平面圖,第1 7圖是針對複數個畫素更詳細 表示液晶裝置1 00之斷面構成的剖面圖。即藉由第1 7圖 詳細說明微透鏡500的功能。 於第1 6圖中,微透鏡陣列板20是具備形成在例如透 明基板210上的遮光膜23,遮光膜23具有格子狀的平面 圖案。微透鏡陣列板2 0是具備藉由遮光膜2 3所規定的非 開口區域,藉由遮光膜23所區隔的區域則成爲開口區域 700。再者,條紋狀形成遮光膜23,藉由該遮光膜23和設 在TFT陣列基板1 0側的容量電極3 00、資料線6a等的各 種構成要素,來規定非開口區域亦可。 各微透鏡5 00是以對應於各畫素的方式被配置。更具 體是在微透鏡陣列板2〇,在每個畫素設有至少部分包括位 於開口區域7 〇 〇及該開口區域7 0 0之周邊的非開口區域的 區域,且具有矩形狀之平面形狀的微透鏡5 00。 於第1 7圖中,在透明板構件2 1 0上以覆蓋遮光膜23 的方式,形成由透明導電膜所製成的對向電極2 1。更在對 向電極2 1上,形成圖未表示的配向膜。除此之外,在透 明基板2 1 0上的各開口區域700形成彩色濾光片亦可。 另一方面,在對應於TFT陣列基板1 0上之各開口區 -30- (28) 1277771 域7 00的區域形成畫素電極9a。而畫素開關用的 和用以驅動畫素電極9 a的掃描線1 1 a、資料線6 a 種配線以及儲存電容器70等的電子元件,被形成 口區域。若根據此種構成,該光電裝置即可維持較 素數値口徑。 射入到微透鏡陣列板20的投射光等之光,則 透鏡中央部5 00B及透鏡周緣部5 00A形成一體所製 • 透鏡5 00而聚光。再者,第17圖中,以虛線表示 透鏡500所聚光的光之路徑的槪略情形。經由微透 所聚光的光是穿透液晶層50而照射到畫素電極9a 該畫素電極9a而形成顯示光,自TFT陣列基板1〇 。在此,從配置著光源的圖中上側射入到微透鏡陣〕 的光之中,向著非開口區域2 3的光也是經由微透 的聚光作用射入到開口區域700,可提高各畫素的 値口徑。並能以各微透鏡5 00的透鏡周緣部5 00A φ球面透鏡。因而,可將包括透鏡周緣部500A的 5〇〇形成像差小的透鏡,提昇光利用效率。而分別 於透鏡中央部5 00B之周圍的透鏡周緣部5 0 0A,將 射入到微透鏡5 00的光加以聚光,使光不會集中於 極9a之一點的方式,分散畫素電極9a上的光強度 進而,透鏡中央部500B也是作爲凹透鏡的功能, 制光強度大的區域集中於一點。進而,即可使微透 全體作爲透鏡的功能還可提高各畫素的光之透過率 。其結果,若藉由微透鏡5 00,就能抑制畫素的劣 TFT30 等之各 在非開 大的畫 是藉由 成的微 經由微 鏡5 00 ,通過 被射出 叫板2 0 鏡 5 00 實行數 作爲非 微透鏡 藉由位 從光源 畫素電 分佈。 就能抑 鏡 5 00 及對比 化,藉 -31 - (29) 1277771 此延長液晶裝置之如光電裝置的壽命之同時還可進行高品 質的畫像顯示。 如以上說明,有關本實施形態的光電裝置之一例的液 晶裝置1 〇 〇,是取代資料線驅動電路1 0 1和掃描線驅動電 路1 04設置在TFT陣列基板10之上地,將例如安裝於 TAB ( Tape Automated bonding)基板上的驅動用 LSI,中 介著異方性導電薄膜電性式及機械式地接續於外部電路連 接端子102亦可。而在射入微透鏡陣列板20之投射光的 這側及射出TFT陣列基板10之射出光的這側,別分對應 於例如各種 TN ( Twisted Nematic)模式、VA ( Vertically Aligned)模式、PDLC ( Polymer Dispersed Liquid Crystal )模式等之動作模式和常白模式/常黑模式,在特定方向 配置偏光薄膜、相位差薄膜、偏光板等亦可。 再者,在上述之光電裝置,雖是使用配列複數個第1 1 圖所示的微透鏡的微透鏡陣列板20作爲對向基板,但也 可將此種微透鏡陣列板20作爲TFT陣列基板1 〇利用。或 是使用單純在玻璃基板等形成對向電極和配向膜的基板作 爲對向基板(不是微透鏡陣列板20 ),也可在TFT陣列 基板1 〇側安裝微透鏡陣列基板20。即本發明的微透鏡是 組裝或安裝於TFT陣列基板1 〇側。 而於第1 7圖中,雖是表示向著光之射出側的畫素電 極側,而微透鏡5 00的透鏡周緣部500A爲凹入地配置微 透鏡5 00而成的液晶裝置1〇〇之構成,但微透鏡5 00的透 鏡周緣部5 00A也能以向著同圖中上側而凹入的方式配置 -32- (30) 1277771 微透鏡陣列板2 0。 (電子機器) 針對以上述之光電裝置作爲光閥使用的電子機器之一 例的投射型彩色顯示裝置的實施形態,並針對其全體構成 ,特別是光學性的構成做說明。在此,第1 8圖是投射型 彩色顯示裝置之圖式剖面圖。 φ 於第1 8圖中,投射型彩色顯示裝置之一例的液晶投 影機1100,是準備三個包括驅動電路搭載在TFT陣列基 板上的液晶裝置的液晶模組,形成分別作爲RGB用的光 閥100R、100G及100B所使用的投影機所構成。在液晶 投影機1 1〇〇,若從金屬鹵化物水銀燈等之白色光源的燈單 元1 102發出投射光,藉由3片反射鏡1 106及2片分色鏡 1 108,而分成對應於RGB三原色的光成份R、G及B,分 別被導入到對應於各色的光閥1 〇〇R、1 〇〇G及1 00B。此時 馨特別是B光,爲了防止因較長的光路之光損失,中介著由 射入透鏡1 122、中繼透鏡1 123及射出透鏡1 124所形成的 中繼透鏡系1121被導入。而且對應於分別藉由光閥i〇OR 、1 00G及1 00B被調變的三原色的光成份,則經由分色稜 鏡1 1 12再度合成之後,中介著投射透鏡n 14而形成彩色 畫像被投射在螢幕。 本發明並不限於上述的實施形態,由申請專利範圍及 整份明細書所讀取的發明之主旨或不違反思想的範圍可適 當變更,按照此種變更的微透鏡之製造方法、藉由該製造 -33- (31) 1277771 方法所製造的微透鏡、具備該微透鏡的光電裝置及具備該 光電裝置而成的電子機器均包含在本發明之技術範圍。 【圖式簡單說明】 〔第1圖〕表示有關本實施形態的微透鏡陣列板的構 成的立體圖。 〔第2圖〕放大有關本實施形態的微透鏡之中所鄰接 的微透鏡的平面圖。 〔第3圖〕有關本實施形態之微透鏡陣列板的剖面之 一部分放大所示的主要部分放大圖。 〔第4圖〕表示有關本實施形態的微透鏡的製造步驟 的步驟剖面圖(其1 ) 〇 〔第5圖〕表示有關本實施形態的微透鏡的製造步驟 的步驟剖面圖(其2 )。 〔第6圖〕表示有關本實施形態的微透鏡的製造步驟 的步驟剖面圖(其3 )。 〔第7圖〕表示本實施形態之遮罩層2及開口部5的 配置形態的平面圖。 〔第8圖〕由蝕刻面側觀看本實施形態的透明板構件 2 1 0的平面圖。 〔第9圖〕第8圖之IX — IX'線剖面圖。 〔第1 〇圖〕放大第6圖(a )所示的放大圖。 〔第 Π圖〕表示有關本實施形態的微透鏡之外形形 狀的立體圖。 -34- (32) 1277771 〔第1 2圖〕表示有關本實施形態的微透鏡的形狀與 光強度分佈的關係圖。 〔第1 3圖〕模式表示有關本實施形態的微透鏡及習 知微透鏡之光的路徑的模式圖。 〔第14圖〕有關本實施形態的光電裝置之一例的液 晶裝置的平面圖。 〔第15圖〕第14圖的Η - IT線剖面圖。 〔第1 6圖〕模式表示配置在本實施形態的微透鏡陣 列板的遮光膜及微透鏡的配置關係的平面圖。 〔第1 7圖〕更詳細表示第1 5圖所示之剖面的剖面圖 〇 〔第1 8圖〕表示有關本實施形態的電子機器之一例 的剖面圖。 【主要元件符號說明】 2、4 :遮罩層 3 :中間層 5 :開口部 210 :透明板構件 5 0 0 :微透鏡 500A :透鏡周緣部 500B:透鏡中央部 1 2 a :透鏡曲面 5 0 1 :棱線 -35-In the road, a micro-transparent array is arranged to match the liquid crystal in place with each other in the resin array. The substrate glass bead is projected on a substrate of the optical film. The data line driving circuit 1 〇 1 is connected to the terminal 102 in one side of the TFT -28- (26) 1277771 array substrate 10. On the other hand, the scanning line driving circuit 104 is a method of covering the frame light shielding film 53 along both sides of the one side. Further, in order to connect between the two scanning line driving circuits 104 of the image display area 1 in this manner, the remaining side of the TFT array is provided along the left side of the TFT array, and the front edge frame light shielding film 53 is provided. Wiring 1 0 5. φ In the four corners of the microlens array board 20, the upper and lower conductive members 06 of the function of the upper and lower conduction terminals between the writing plates are disposed. Further, the TFT array substrate 1 is turned on and off in a region facing the corner portions. Thereby, electrical conduction is obtained between the TFT array substrate 10 and the micro-transparent plate 20. In Fig. 14, on the TFT array substrate 10, an alignment film is formed on the electrode 9a after the TFT for the pixel switch and the wiring such as the scanning line and the data line. On the other hand, for the detailed configuration of the φ, on the microlens array plate 20, in addition to the counter electrode 2, the sub-shaped or stripe-shaped light-shielding film 23 is formed in the uppermost layer portion and the liquid crystal layer 50 is formed. For example, by mixing one or several kinds of nematic liquid crystals, a predetermined alignment state is obtained between the pair of alignment films. Further, in the TFT array shown in FIGS. 14 and 15, The data line driving circuit 1 〇1, the scanning line driving circuit, etc. can also form a sampling circuit for sampling the image signal on the image signal line to the data line, and supplying the predetermined signal of the predetermined voltage potential to the image signal to each other. The preparatory circuit of the data lines is externally adjacent to each other and is disposed on both sides: 10 is a complex number of two bases. The mirror array is arranged in a field to form a lattice film to form a lattice film. The liquid crystal 〇 i board ίο Road 104 is supplied for inspection. -29- (27) 1277771 Check the quality and defects of the photoelectric device during the manufacturing process or the load time. The composition and function of the microlens array panel 2 provided in the liquid crystal device 100 described above will be described with reference to Figs. 16 and 17 . Fig. 1 is a plan view showing the arrangement relationship between the light shielding film 23 and the microlens 500 of the microlens array panel 20, and Fig. 17 is a sectional view showing the sectional configuration of the liquid crystal device 100 in more detail for a plurality of pixels. . That is, the function of the microlens 500 will be described in detail by means of Fig. 17. In Fig. 16, the microlens array plate 20 is provided with a light shielding film 23 formed on, for example, a transparent substrate 210, and the light shielding film 23 has a lattice pattern. The microlens array plate 20 has a non-opening region defined by the light shielding film 23, and an area partitioned by the light shielding film 23 serves as an opening region 700. Further, the light-shielding film 23 is formed in a stripe shape, and the non-opening region may be defined by various components such as the light-shielding film 23 and the capacitance electrode 300 and the data line 6a provided on the TFT array substrate 10 side. Each of the microlenses 500 is arranged in such a manner as to correspond to each pixel. More specifically, in the microlens array panel 2, each pixel is provided with a region including at least a portion of the non-opening region located at the periphery of the opening region 7 and the opening region 700, and has a rectangular planar shape. Microlens 5 00. In Fig. 17, a counter electrode 2 1 made of a transparent conductive film is formed on the transparent plate member 210 to cover the light shielding film 23. Further, on the counter electrode 2 1, an alignment film not shown is formed. In addition, a color filter may be formed in each of the opening regions 700 on the transparent substrate 210. On the other hand, the pixel electrode 9a is formed in a region corresponding to each open region -30-(28) 1277771 region 700 on the TFT array substrate 10. On the other hand, an electronic component for the pixel switch and the scanning line 11a for driving the pixel electrode 9a, the wiring of the data line 6a, and the storage capacitor 70 are formed in the port area. According to this configuration, the photovoltaic device can maintain a relatively large number of apertures. When the light incident on the microlens array plate 20 or the like is incident on the microlens array plate 20, the lens center portion 500B and the lens peripheral portion 5 00A are integrally formed by the lens 00 and condensed. Further, in Fig. 17, the outline of the path of the light condensed by the lens 500 is indicated by a broken line. The light condensed by the micro-permeation penetrates the liquid crystal layer 50 and is irradiated onto the pixel electrode 9a of the pixel electrode 9a to form display light from the TFT array substrate 1''. Here, among the light incident on the microlens array from the upper side in the map in which the light source is disposed, the light toward the non-opening region 23 is also incident on the opening region 700 via the microscopic condensing action, thereby improving the respective paintings. The caliber of the prime. It is also possible to use a lens peripheral portion of each microlens 500 00A φ spherical lens. Therefore, the lens including the lens peripheral portion 500A can be formed into a lens having a small aberration to improve the light use efficiency. On the other hand, the peripheral edge portion of the lens around the center portion of the lens 00B is condensed by the light incident on the microlens 500, so that the light is not concentrated on one of the poles 9a, and the pixel electrode 9a is dispersed. The upper light intensity is further the function of the lens center portion 500B as a concave lens, and the region where the light intensity is large is concentrated at one point. Further, the function of the micro-transmission as a lens can also improve the light transmittance of each pixel. As a result, if the microlens 500 00 is used, it is possible to suppress the inferior pixel of the pixel 30, and the non-opening of the picture is performed by the micro-mirror 5 00 through the micro-mirror 5 00. The number is distributed as a non-microlens by bits from the source of the light. It can suppress the mirror and compare it with the -31 - (29) 1277771. This can extend the life of the liquid crystal device, such as the photoelectric device, while displaying high-quality images. As described above, the liquid crystal device 1 according to an example of the photovoltaic device of the present embodiment is provided, for example, on the TFT array substrate 10 instead of the data line drive circuit 110 and the scanning line drive circuit 104. The driving LSI on the TAB ( Tape Automated bonding) substrate may be electrically connected to the external circuit connecting terminal 102 in an electrically conductive manner and mechanically. On the side of the projection light incident on the microlens array panel 20 and the side from which the light emitted from the TFT array substrate 10 is emitted, the respective ones correspond to, for example, various TN (Twisted Nematic) modes, VA (Vertically Aligned) modes, and PDLC ( In the operation mode such as the Polymer Dispersed Liquid Crystal mode and the normally white mode/normal black mode, a polarizing film, a retardation film, a polarizing plate, or the like may be disposed in a specific direction. Further, in the above-described photovoltaic device, the microlens array plate 20 in which a plurality of microlenses shown in FIG. 1 are arranged is used as the counter substrate, but the microlens array plate 20 may be used as the TFT array substrate. 1 〇 use. Alternatively, the substrate on which the counter electrode and the alignment film are formed on a glass substrate or the like is used as the counter substrate (not the microlens array plate 20), and the microlens array substrate 20 may be mounted on the side of the TFT array substrate 1. That is, the microlens of the present invention is assembled or mounted on the side of the TFT array substrate 1. In the case of the pixel electrode 1 on the side on which the light is emitted, the lens peripheral portion 500A of the microlens 500 is a liquid crystal device in which the microlens 500 is recessed. In the lens peripheral portion 500A of the microlens 500, the -32-(30) 1277771 microlens array plate 20 can be disposed so as to be recessed toward the upper side in the same figure. (Electronic device) An embodiment of a projection type color display device which is an example of an electronic device used as a light valve as described above, and an overall configuration, particularly an optical configuration, will be described. Here, Fig. 18 is a schematic cross-sectional view of the projection type color display device. φ In FIG. 18, a liquid crystal projector 1100 which is an example of a projection type color display device is a liquid crystal module in which three liquid crystal devices including a driving circuit mounted on a TFT array substrate are prepared, and are respectively formed as light valves for RGB. It is composed of projectors used in 100R, 100G and 100B. In the liquid crystal projector 1 1 , when the projection light is emitted from the lamp unit 1 102 of the white light source such as a metal halide mercury lamp, it is divided into RGB by the three mirrors 1 106 and the two dichroic mirrors 1 108. The light components R, G, and B of the three primary colors are respectively introduced into the light valves 1 〇〇R, 1 〇〇G, and 1 00B corresponding to the respective colors. In this case, in particular, the B-light is introduced, and in order to prevent light loss due to a long optical path, the relay lens system 1121 formed by the incident lens 1 122, the relay lens 1 123, and the output lens 1 124 is introduced. Further, corresponding to the light components of the three primary colors which are modulated by the light valves i〇OR, 100G and 100B, respectively, after the color separation is further synthesized by the color separation 稜鏡1 1 12, the projection lens n 14 is interposed to form a color image. Projected on the screen. The present invention is not limited to the above-described embodiments, and the scope of the invention described in the claims and the entire disclosure may be appropriately changed within the scope of the invention, and the method of manufacturing the microlens according to the modification may be Manufacturing -33- (31) 1277771 The microlens manufactured by the method, the photovoltaic device including the microlens, and the electronic device including the photovoltaic device are all included in the technical scope of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS [Fig. 1] is a perspective view showing the configuration of a microlens array plate of the present embodiment. [Fig. 2] A plan view of a microlens adjacent to the microlens of the present embodiment is enlarged. [Fig. 3] A magnified view of a principal part of a cross section of the microlens array plate of the present embodiment. [Fig. 4] Fig. 1 is a cross-sectional view showing a step of manufacturing a microlens according to the present embodiment. Fig. 5 is a cross-sectional view showing a step of manufacturing a microlens according to the present embodiment (part 2). [Fig. 6] Fig. 3 is a cross-sectional view showing the steps of manufacturing the microlens according to the embodiment (3). [Fig. 7] is a plan view showing an arrangement of the mask layer 2 and the opening portion 5 of the present embodiment. [Fig. 8] A plan view of the transparent plate member 210 of the present embodiment is viewed from the side of the etching surface. [Fig. 9] Fig. 8 is a sectional view taken along the line IX - IX'. [Fig. 1] Enlarge the enlarged view shown in Fig. 6(a). [Fig. 4] is a perspective view showing the shape of the microlens according to the embodiment. -34- (32) 1277771 [Fig. 1 2] is a view showing the relationship between the shape of the microlens of the present embodiment and the light intensity distribution. The [Fig. 1 3] mode shows a schematic view of the path of the light of the microlens of the present embodiment and the conventional microlens. [Fig. 14] A plan view of a liquid crystal device which is an example of the photovoltaic device of the present embodiment. [Fig. 15] A cross-sectional view of the Η-IT line of Fig. 14. [Fig. 16] A plan view showing the arrangement relationship between the light shielding film and the microlens disposed in the microlens array plate of the present embodiment. [Fig. 17] A cross-sectional view showing a cross section shown in Fig. 15 in more detail. Fig. 18 is a cross-sectional view showing an example of an electronic apparatus according to the present embodiment. [Description of main component symbols] 2, 4: mask layer 3: intermediate layer 5: opening portion 210: transparent plate member 5 0 0 : microlens 500A: lens peripheral portion 500B: lens central portion 1 2 a : lens curved surface 5 0 1 : ridgeline -35-