JP6398361B2 - Microlens array substrate, electro-optical device, and electronic device - Google Patents

Description

  The present invention relates to a microlens array substrate, an electro-optical device, and an electronic apparatus.

  There is known an electro-optical device including an electro-optical material such as liquid crystal between an element substrate and a counter substrate. Examples of the electro-optical device include a liquid crystal device used as a liquid crystal light valve of a projector. In the liquid crystal device, a light shielding portion is provided in a region where switching elements, wirings, and the like are arranged, and a part of incident light is shielded by the light shielding portion and is not used. Therefore, a configuration is known in which a microlens is provided on one substrate, and light that is blocked by a light-shielding portion arranged at a boundary between pixels among light incident on a liquid crystal device is incident into an opening of the pixel ( For example, see Patent Literature 1 and Patent Literature 2).

  In the microlens array substrate (microlens substrate) described in Patent Document 1, an incident side substrate on which a concave lens curved surface is formed, an emission side substrate on which a convex lens curved surface is formed, and refraction provided therebetween. Convex meniscus microlenses are formed of a resin having a larger rate than the substrate. The light (parallel light) incident on the microlens is collected by the refractive index difference (positive refractive power) between the substrate and the resin on the lens curved surface on the incident side, and then between the resin and the substrate on the lens curved surface on the exit side. Due to the difference in refractive index (negative refracting power), the light is emitted close to parallel light.

  In addition, in the microlens array substrate (microlens substrate) described in Patent Document 2, the incident side substrate on which the concave lens curved surface is formed, the emission side substrate on which the concave lens curved surface is formed, and the gap between them are provided. A biconvex microlens is formed of a resin having a refractive index larger than that of the substrate. The light (parallel light) incident on the microlens is collected by the refractive index difference (positive refractive power) between the substrate and the resin on the lens curved surface on the incident side, and then between the resin and the substrate on the lens curved surface on the exit side. It is further condensed by the refractive index difference (positive refractive power) and emitted with high brightness.

JP 2002-006114 A Japanese Patent Laid-Open No. 2002-014205

  By the way, the light emitted from the light source and incident on the liquid crystal device includes not only parallel light along the normal direction of the substrate surface but also oblique light having an angle with respect to the normal direction. When incident oblique light is condensed (refracted) by the microlens and the angle with respect to the normal direction is further increased, it is shielded by the light shielding part or kicked by the projection lens, leading to a decrease in light utilization efficiency, An increase in the amount of light traveling obliquely with respect to the direction of molecular orientation may lead to a decrease in contrast. For such oblique light, it is better to refract the light refracted on the lens curved surface on the incident side further to the same side on the curved lens surface on the exit side according to the position and angle of incidence on the microlens. In some cases, it is better to refract the light refracted by the lens curved surface on the incident side and return it to the opposite side by the lens curved surface on the exit side.

  However, Patent Document 1 and Patent Document 2 do not mention oblique light. That is, Patent Document 1 only mentions that parallel light is returned to its original state after collecting parallel light, and there is a possibility that the light use efficiency is not optimized for incident light including oblique light. Further, Patent Document 2 only mentions that the collimated light is condensed and further condensed, and there is a possibility that the contrast is lowered by increasing the oblique light due to the condensing. An object of the present invention is to achieve both improvement in light utilization efficiency and improvement in contrast in an electro-optical device even when incident light includes oblique light.

  SUMMARY An advantage of some aspects of the invention is to solve at least a part of the problems described above, and the invention can be implemented as the following forms or application examples.

  Application Example 1 A microlens array substrate according to this application example is provided with a substrate having a first recess on a first surface and a first surface covering the first recess and embedding the first recess. A first light-transmitting layer having a first lens surface in contact with the first recess, and a second recess formed on the surface so as to overlap the first lens surface in plan view; and And a second lens surface provided so as to embed the second concave portion and in contact with the second concave portion, and having a substantially flat surface. The depth of the second recess is equal to or less than the depth of the first recess, the diameter of the second recess is equal to or less than the diameter of the first recess, and the refraction of the first light transmitting layer The refractive index is larger than the refractive index of the substrate, and the refractive index of the second light transmitting layer is larger than the refractive index of the first light transmitting layer. That.

  According to the configuration of this application example, the first-stage microlens having the first lens surface is configured by embedding the first concave portion of the substrate with the first light-transmitting layer. By embedding the second concave portion with the second light-transmitting layer, a second-stage microlens having a second lens surface and arranged so as to overlap the first-stage microlens in plan view is configured. . Since the refractive index of the first light-transmitting layer is larger than the refractive index of the substrate and the refractive index of the second light-transmitting layer is larger than the refractive index of the first light-transmitting layer, the first microlens and 2 Both of the microlenses at the stage have a positive refractive power. For this reason, parallel light and oblique light incident on the end of the first-stage microlens are refracted toward the center, and further refracted toward the center with the second-stage microlens, thereby improving the light utilization efficiency. Yes (see Figure 3 for details). Then, depending on the incident angle of the oblique light, it is possible to emit the oblique light close to parallel light by refracting it with the second-stage microlens on the side opposite to the side refracted by the first-stage microlens. (For details, see FIG. 5). As a result, even when the incident light includes oblique light, the emitted light can be brought close to parallel light while improving the light utilization efficiency. In addition, since the depth of the second recess is equal to or less than the depth of the first recess and the diameter of the second recess is equal to or less than the diameter of the first recess, when manufacturing the microlens array substrate, By depositing the material of the first light-transmitting layer so as to cover the first surface and fill the first recess, the second shape in which the shape of the first recess is reflected on the surface of the first light-transmitting layer. Can be formed. Thereby, compared with the case where the 2nd recessed part is formed by etching with respect to the 1st translucent layer, a photolithography process and an etching process can be made unnecessary.

  Application Example 2 In the microlens array substrate according to the application example described above, the first recess and the second recess have inclined surfaces that are inclined from the end portion toward the center portion in a cross-sectional view. Preferably it is.

  According to the configuration of this application example, the first recess and the second recess have inclined surfaces that are inclined from the end toward the center. Therefore, the light incident on the end portions of the first-stage microlens and the second-stage microlens is refracted toward the center at substantially the same angle. Thereby, compared with the case where the edge part of a 1st recessed part and a 2nd recessed part is a curved surface, while being able to suppress the excessive refraction of incident light, the dispersion | variation in a refraction angle can be suppressed small. Further, when the first concave portion has an inclined surface, it is formed on the surface of the first light transmitting layer by depositing the material of the first light transmitting layer when the microlens array substrate is manufactured. The shape of the second recess can be closer to the shape of the first recess.

  Application Example 3 In the microlens array substrate according to the application example described above, a straight line connecting the center of the first lens surface and the center of the second lens surface is a first axis, and the first lens The normal of the tangent plane at the first position of the lens surface is the first normal, and is the normal of the tangential plane at the second position of the second lens surface, and passes through the first position. When the straight line is a second normal line, the light is obliquely incident on the first axis from the substrate side, and the first axis side is closer to the first axis than the first normal line. The light incident on the first position of the lens surface, transmitted through the first light transmissive layer, and incident on the second lens surface on the first axis side with respect to the second normal. Is preferably refracted by the second lens surface opposite to the side refracted by the first lens surface with respect to the first axis. .

  According to the configuration of this application example, the light is incident obliquely with respect to the first axis, and is incident on the first position of the first lens surface from the first axis side with respect to the first normal line. Then, light that is transmitted through the first light-transmitting layer and is incident on the second lens surface on the first axis side with respect to the second normal line is incident on the first lens surface with respect to the first axis. The light is refracted by the second lens surface on the side opposite to the refracted side. For this reason, oblique light that is incident so as to be directed toward the first axis connecting the center of the first lens surface and the center of the second lens surface is refracted in a direction in which the inclination increases on the first lens surface. In this case, the second lens surface can be refracted and returned in a direction in which the inclination on the opposite side becomes smaller. Accordingly, the oblique light can be directed toward the center side and can be emitted close to the parallel light.

  Application Example 4 A microlens array substrate according to this application example has a substrate having a first surface and a first convex portion provided on the first surface and having a first lens surface formed on the surface. The first light-transmitting layer and the second light-projecting portion provided so as to cover the first light-transmitting layer and having the second lens surface overlap the first convex portion in plan view. A second translucent layer formed on the surface; and a third translucent layer provided so as to cover the second translucent layer and having a substantially flat surface; The height of the first convex portion is equal to or smaller than the height of the first convex portion, the diameter of the second convex portion is equal to or larger than the diameter of the first convex portion, and the refractive index of the first light-transmitting layer is The refractive index of the second light-transmitting layer is larger than the refractive index of the substrate, the refractive index of the first light-transmitting layer is smaller than the refractive index of the third light-transmitting layer, and the refractive index of the third light-transmitting layer is the second light-transmitting layer. The refractive index of the layer Characterized in that is also small.

  According to the configuration of this application example, the first microlens having the first lens surface is configured by covering the first convex portion of the first light transmitting layer with the second light transmitting layer. The second step of the second light-transmitting layer is arranged so as to have a second lens surface and overlap the first step microlens in plan view by covering the second convex portion of the second light-transmitting layer with the third light-transmitting layer. The microlens is configured. Since the refractive index of the second light transmitting layer is smaller than the refractive index of the first light transmitting layer and the refractive index of the third light transmitting layer is smaller than the refractive index of the second light transmitting layer, the first step Both the microlens and the second-stage microlens have positive refractive power. Therefore, parallel light and oblique light incident on the end of the first-stage microlens are refracted toward the center, and further refracted toward the center with the second-stage microlens, thereby improving the light utilization efficiency. Yes (see FIG. 8 for details). In addition, depending on the incident angle of oblique light, it is possible to emit oblique light close to parallel light by refracting it with the second-stage microlens on the side opposite to the side refracted by the first-stage microlens. (For details, see FIG. 10). As a result, even when the incident light includes oblique light, the emitted light can be brought close to parallel light while improving the light utilization efficiency. In addition, since the height of the second convex portion is equal to or smaller than the height of the first convex portion and the diameter of the second convex portion is equal to or larger than the diameter of the first convex portion, the microlens array substrate is manufactured. Further, by depositing the material of the second light-transmitting layer so as to cover the first convex portion of the first light-transmitting layer, the shape of the first convex portion is reflected on the surface of the second light-transmitting layer. The 2nd convex part made can be formed. This eliminates the need for the photolithography process, the etching process, and the heat treatment process, as compared with the case where the second light-transmitting layer is subjected to etching or heat treatment to form the second convex portion. .

  Application Example 5 In the microlens array substrate according to the application example described above, a straight line connecting the center of the first lens surface and the center of the second lens surface is a first axis, and the first The normal of the tangent plane at the first position of the lens surface is the first normal, and is the normal of the tangential plane at the second position of the second lens surface, and passes through the first position. When the straight line is a second normal line, the light is obliquely incident on the first axis from the substrate side, and the first axis side is closer to the first axis than the first normal line. The light incident on the first position of the lens surface, transmitted through the second light transmissive layer, and incident on the second lens surface on the first axis side with respect to the second normal line. Is preferably refracted by the second lens surface opposite to the side refracted by the first lens surface with respect to the first axis. .

  According to the configuration of this application example, the light is incident obliquely with respect to the first axis, and is incident on the first position of the first lens surface from the first axis side with respect to the first normal line. The light that is transmitted through the second light-transmitting layer and is incident on the second lens surface on the first axis side with respect to the second normal line is incident on the first lens surface with respect to the first axis. The light is refracted by the second lens surface on the side opposite to the refracted side. For this reason, oblique light that is incident so as to be directed toward the first axis connecting the center of the first lens surface and the center of the second lens surface is refracted in a direction in which the inclination increases on the first lens surface. In this case, the second lens surface can be refracted and returned in a direction in which the inclination on the opposite side becomes smaller. Accordingly, the oblique light can be directed toward the center side and can be emitted close to the parallel light.

  Application Example 6 An electro-optical device according to this application example includes a first substrate, a second substrate disposed so as to face the first substrate, the first substrate, and the second substrate. And a microlens array substrate according to any one of claims 1 to 5, wherein the second substrate is provided with the microlens array substrate.

  According to the configuration of this application example, the electro-optical device includes the second microlens array substrate that can bring the emitted light closer to the parallel light while improving the light use efficiency even when the incident light includes oblique light. The board is equipped. Accordingly, it is possible to provide an electro-optical device that can display a bright image with good contrast.

  Application Example 7 An electronic apparatus according to this application example includes the electro-optical device described in the application example.

  According to the configuration of this application example, it is possible to provide an electronic apparatus that can display a bright image with good contrast.

1 is a schematic plan view showing a configuration of a liquid crystal device according to a first embodiment. FIG. 2 is an equivalent circuit diagram illustrating an electrical configuration of the liquid crystal device according to the first embodiment. 1 is a schematic cross-sectional view illustrating a configuration of a liquid crystal device according to a first embodiment. FIG. 2 is a schematic plan view showing the shape and arrangement of a light shielding portion and a microlens of the liquid crystal device according to the first embodiment. 1 is a schematic cross-sectional view showing a configuration of a microlens array substrate according to a first embodiment. The figure which shows an example of angle distribution of the incident light which inject | emits from the light source and injects into a microlens array board | substrate. FIG. 3 is a schematic cross-sectional view showing the method for manufacturing the microlens array substrate according to the first embodiment. FIG. 5 is a schematic cross-sectional view illustrating a configuration of a liquid crystal device according to a second embodiment. FIG. 6 is a schematic plan view showing the shape and arrangement of a light shielding part and a microlens of a liquid crystal device according to a second embodiment. FIG. 6 is a schematic cross-sectional view showing a configuration of a microlens array substrate according to a second embodiment. The schematic sectional drawing which shows the manufacturing method of the micro lens array board | substrate which concerns on 2nd Embodiment. Schematic which shows the structure of the projector as an electronic device which concerns on 3rd Embodiment.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, embodiments of the invention will be described with reference to the drawings. The drawings to be used are appropriately enlarged, reduced or exaggerated so that the part to be described can be recognized. In addition, illustrations of components other than those necessary for the description may be omitted.

  In the following embodiments, for example, when “on the substrate” is described, the substrate is disposed so as to be in contact with the substrate, or is disposed on the substrate via another component, or the substrate. It is assumed that a part is arranged so as to be in contact with each other and a part is arranged via another component.

(First embodiment)
<Electro-optical device>
In the first embodiment, as an electro-optical device, an active matrix liquid crystal device including a thin film transistor (TFT) as a pixel switching element will be described as an example. This liquid crystal device can be suitably used, for example, as a light modulation element (liquid crystal light valve) of a projection display device (projector) described later.

  First, a liquid crystal device as an electro-optical device according to the first embodiment will be described with reference to FIGS. 1, 2, and 3. FIG. 1 is a schematic plan view showing the configuration of the liquid crystal device according to the first embodiment. FIG. 2 is an equivalent circuit diagram showing an electrical configuration of the liquid crystal device according to the first embodiment. FIG. 3 is a schematic cross-sectional view illustrating the configuration of the liquid crystal device according to the first embodiment. Specifically, FIG. 3 is a schematic cross-sectional view taken along the line A-A ′ of FIG. 1.

  As shown in FIGS. 1 and 3, the liquid crystal device 1 according to the present embodiment includes an element substrate 20 as a first substrate, a counter substrate 30 as a second substrate disposed to face the element substrate 20, and A sealing material 42 and a liquid crystal layer 40 as an electro-optic layer are provided. As shown in FIG. 1, the element substrate 20 is larger than the counter substrate 30, and both the substrates are bonded together via a sealing material 42 arranged in a frame shape along the edge of the counter substrate 30.

  The liquid crystal layer 40 is composed of liquid crystal having positive or negative dielectric anisotropy enclosed in a space surrounded by the element substrate 20, the counter substrate 30, and the sealing material 42. The sealing material 42 is made of an adhesive such as a thermosetting or ultraviolet curable epoxy resin. Spacers (not shown) are mixed in the sealing material 42 to keep the distance between the element substrate 20 and the counter substrate 30 constant.

  Inside the sealing material 42 arranged in a frame shape, the light shielding layers 22 and 26 provided on the element substrate 20 and the light shielding layer 32 provided on the counter substrate 30 are arranged. The light shielding layers 22, 26, and 32 have a frame-like peripheral portion, and are formed of, for example, a light shielding metal or metal oxide. Inside the frame-shaped light shielding layers 22, 26, 32 is a display area E in which a plurality of pixels P are arranged. The pixels P have, for example, a substantially rectangular shape and are arranged in a matrix.

  The display area E is an area that substantially contributes to display in the liquid crystal device 1. The light shielding layers 22 and 26 provided on the element substrate 20 are provided, for example, in a lattice shape in the display region E so as to partition the opening regions of the plurality of pixels P in a plane. The liquid crystal device 1 may include a dummy area that is provided so as to surround the display area E and does not substantially contribute to display.

  A data line driving circuit 51 and a plurality of external connection terminals 54 are provided along the first side on the side opposite to the display region E of the sealing material 42 formed along the first side of the element substrate 20. An inspection circuit 53 is provided on the display region E side of the sealing material 42 along the other second side facing the first side. Further, a scanning line driving circuit 52 is provided inside the sealing material 42 along the other two sides that are orthogonal to these two sides and face each other.

  On the display area E side of the sealing material 42 on the second side where the inspection circuit 53 is provided, a plurality of wirings 55 that connect the two scanning line driving circuits 52 are provided. Wirings connected to the data line driving circuit 51 and the scanning line driving circuit 52 are connected to a plurality of external connection terminals 54. In addition, a vertical conduction portion 56 is provided at a corner portion of the counter substrate 30 to establish electrical continuity between the element substrate 20 and the counter substrate 30. The arrangement of the inspection circuit 53 is not limited to this, and the inspection circuit 53 may be provided at a position along the inner side of the seal material 42 between the data line driving circuit 51 and the display area E.

  In the following description, the direction along the first side where the data line driving circuit 51 is provided is defined as the X direction as the first direction, and the direction along the other two sides orthogonal to the first side and facing each other. Is the Y direction as the second direction. The X direction is a direction along the line A-A ′ in FIG. 1. The light shielding layers 22 and 26 are provided in a lattice shape along the X direction and the Y direction. The opening area of the pixel P is partitioned in a lattice shape by the light shielding layers 22 and 26 and is arranged in a matrix shape along the X direction and the Y direction.

  Further, a direction perpendicular to the X direction and the Y direction and directed upward in FIG. In this specification, viewing from the normal direction (Z direction) of the surface of the liquid crystal device 1 on the counter substrate 30 side is referred to as “plan view”.

  As shown in FIG. 2, in the display area E, the scanning lines 2 and the data lines 3 are formed so as to intersect with each other, and pixels P are provided corresponding to the intersections of the scanning lines 2 and the data lines 3. Yes. Each pixel P is provided with a pixel electrode 28 and a TFT 24 as a switching element.

  A source electrode (not shown) of the TFT 24 is electrically connected to the data line 3 extending from the data line driving circuit 51. Image signals (data signals) S1, S2,..., Sn are supplied to the data lines 3 from the data line driving circuit 51 (see FIG. 1) in a line sequential manner. A gate electrode (not shown) of the TFT 24 is a part of the scanning line 2 extending from the scanning line driving circuit 52. The scanning lines 2 are supplied with scanning signals G1, G2,..., Gm from the scanning line driving circuit 52 in a line sequential manner. A drain electrode (not shown) of the TFT 24 is electrically connected to the pixel electrode 28.

  The image signals S1, S2,..., Sn are written to the pixel electrode 28 through the data line 3 at a predetermined timing by turning on the TFT 24 for a certain period. The image signal of a predetermined level written in the liquid crystal layer 40 through the pixel electrode 28 in this manner is constant by the liquid crystal capacitance formed between the common electrode 34 (see FIG. 3) provided on the counter substrate 30. Hold for a period.

  In order to prevent the held image signals S1, S2,..., Sn from leaking, a storage capacitor 5 is formed between the capacitor line 4 formed along the scanning line 2 and the pixel electrode 28. Arranged in parallel with the liquid crystal capacitor. Thus, when a voltage signal is applied to the liquid crystal of each pixel P, the alignment state of the liquid crystal changes depending on the applied voltage level. As a result, the light incident on the liquid crystal layer 40 (see FIG. 3) is modulated to enable gradation display.

  The liquid crystal constituting the liquid crystal layer 40 modulates light and enables gradation display by changing the orientation and order of the molecular assembly depending on the applied voltage level. For example, in the normally white mode, the transmittance for incident light decreases according to the voltage applied in units of each pixel P. In the normally black mode, the transmittance for incident light increases in accordance with the voltage applied in units of each pixel P, and light having a contrast corresponding to an image signal is emitted from the liquid crystal device 1 as a whole.

  As shown in FIG. 3, the counter substrate 30 according to the first embodiment includes a microlens array substrate 10, a light shielding layer 32, a protective layer 33, a common electrode 34, and an alignment film 35. The microlens array substrate 10 according to the first embodiment includes two-stage microlenses, that is, a first-stage microlens ML1 and a second-stage microlens ML2.

  The microlens array substrate 10 includes a substrate 11, a lens layer 13 as a first light transmissive layer, a lens layer 15 as a second light transmissive layer, and an optical path length adjusting layer 16. The substrate 11 is made of an inorganic material having optical transparency such as glass or quartz. A surface on the liquid crystal layer 40 side of the substrate 11 is a surface 11a as a first surface. The board | substrate 11 has the recessed part 12 as the some 1st recessed part formed in the surface 11a. Each recess 12 is provided for each pixel P. As for the cross-sectional shape of the recessed part 12, the center part is a curved surface part, for example, and the peripheral part surrounding a curved surface part is an inclined surface (what is called a taper-shaped surface).

The lens layer 13 is formed to be thicker than the depth of the recess 12 so as to fill the recess 12 and cover the surface 11 a of the substrate 11. The lens layer 13 is made of a material having optical transparency and a light refractive index different from that of the substrate 11. In the present embodiment, the lens layer 13 is made of an inorganic material having a higher optical refractive index than the substrate 11. Examples of such inorganic materials include SiON and Al ₂ O ₃ .

  By embedding the concave portion 12 with a material forming the lens layer 13, a convex microlens ML1 that swells toward the substrate 11 is formed. The surface of the lens layer 13 that contacts the recess 12 (interface with the substrate 11) is referred to as a lens surface 13a as a first lens surface. Further, the micro lens array MLA1 is configured by the plurality of micro lenses ML1. The lens layer 13 has concave portions 14 as a plurality of second concave portions reflecting the shape of the concave portions 12 on the surface (the surface opposite to the substrate 11). The recess 14 is disposed so as to overlap the recess 12 in plan view, and has a cross-sectional shape similar to that of the recess 12.

  The lens layer 15 is formed thicker than the depth of the recess 14 so as to fill the recess 14 and cover the surface of the lens layer 13. The lens layer 15 is made of an inorganic material that is light transmissive and has a higher refractive index than the lens layer 13. The lens layer 15 is made of the same material as the lens layer 13, for example. When the material of the lens layer 13 and the lens layer 15 is SiON, the optical refractive index of the lens layer 13 and the optical refractive index of the lens layer 15 are made different by changing the ratio of oxygen (O) and nitrogen (N). Can be different.

  By embedding the concave portion 14 with a material forming the lens layer 15, a convex microlens ML2 is configured. The surface of the lens layer 15 that is in contact with the concave portion 14 (interface with the lens layer 13) is referred to as a lens surface 15a as a second lens surface. Further, a microlens array MLA2 is configured by the plurality of microlenses ML2. The microlens ML <b> 1 and the microlens ML <b> 2 are arranged so as to overlap each other in plan view corresponding to the pixel P. The surface of the lens layer 15 is a flat surface.

  Incident light that is incident on the central portion (curved surface portion) of the microlenses ML1 and ML2 is condensed toward the center (focal point of the curved surface portion) of the microlenses ML1 and ML2. In addition, incident light incident on the peripheral portions (inclined surfaces) of the microlenses ML1 and ML2 is refracted toward the center of the microlenses ML1 and ML2 at substantially the same angle if the incident angles are substantially the same. Therefore, as compared with the case where the entire microlenses ML1 and ML2 are formed of a curved surface portion, excessive refraction of incident light is suppressed, and variation in angle of light incident on the liquid crystal layer 40 is suppressed.

The optical path length adjustment layer 16 is formed so as to cover the lens layer 15. The optical path length adjusting layer 16 is light transmissive and is made of, for example, an inorganic material having substantially the same refractive index as that of the substrate 11. Examples of such an inorganic material include SiO ₂ . The optical path length adjustment layer 16 has a function of adjusting the distance from the microlens ML2 to the light shielding layer 26 to a desired value. Therefore, the layer thickness of the optical path length adjusting layer 16 is appropriately set based on optical conditions such as the focal length of the microlens ML2 corresponding to the wavelength of light. The surface of the optical path length adjusting layer 16 is a substantially flat surface.

  The light shielding layer 32 is provided on the microlens array substrate 10 (optical path length adjusting layer 16). The light shielding layer 32 is provided so as to surround the display area E (see FIG. 1) where the microlens ML1 and the microlens ML2 are arranged. The light shielding layer 32 is formed of, for example, a metal or a metal compound. The light shielding layer 32 may be provided in the display area E so as to overlap the light shielding layer 22 and the light shielding layer 26 of the element substrate 20 in a plan view. In this case, the light shielding layer 32 may be formed in a lattice shape, an island shape, a stripe shape, or the like, but is preferably disposed in a narrower range than the light shielding layer 22 and the light shielding layer 26 in a plan view.

  A protective layer 33 is provided so as to cover the microlens array substrate 10 (optical path length adjusting layer 16) and the light shielding layer 32. The common electrode 34 is provided so as to cover the protective layer 33. The common electrode 34 is formed across a plurality of pixels P. The common electrode 34 is made of a transparent conductive film such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide). The protective layer 33 covers the light shielding layer 32 so that the surface of the common electrode 34 on the liquid crystal layer 40 side is flat, but directly covers the conductive light shielding layer 32 without providing the protective layer 33. The common electrode 34 may be formed. The alignment film 35 is provided so as to cover the common electrode 34.

  The element substrate 20 includes a substrate 21, a light shielding layer 22, an insulating layer 23, a TFT 24, an insulating layer 25, a light shielding layer 26, an insulating layer 27, a pixel electrode 28, and an alignment film 29. . The substrate 21 is made of a light transmissive material such as glass or quartz.

  The light shielding layer 22 is provided on the substrate 21. The light shielding layer 22 is formed in a lattice shape so as to overlap the upper light shielding layer 26 in plan view. The light shielding layer 22 and the light shielding layer 26 are formed of, for example, a metal or a metal compound. The light shielding layer 22 and the light shielding layer 26 are disposed so as to sandwich the TFT 24 therebetween in the thickness direction (Z direction) of the element substrate 20. The light shielding layer 22 overlaps at least the channel region of the TFT 24 in plan view.

  Since the light shielding layer 22 and the light shielding layer 26 are provided, the incidence of light on the TFT 24 is suppressed, so that an increase in light leakage current in the TFT 24 and malfunction due to light can be suppressed. The light shielding layer 22 is composed of the light shielding layer 22 and the light shielding layer 26. The region surrounded by the light shielding layer 22 (inside the opening 22a) and the region surrounded by the light shielding layer 26 (inside the opening 26a) overlap each other in plan view, and light is transmitted through the region of the pixel P. Opening T

The insulating layer 23 is provided so as to cover the substrate 21 and the light shielding layer 22. The insulating layer 23 is made of an inorganic material such as SiO ₂ .

  The TFT 24 is provided on the insulating layer 23 and is disposed in a region overlapping the light shielding layer 22 and the light shielding layer 26 in plan view. The TFT 24 is a switching element that drives the pixel electrode 28. The TFT 24 includes a semiconductor layer, a gate electrode, a source electrode, and a drain electrode (not shown). A source region, a channel region, and a drain region are formed in the semiconductor layer. An LDD (Lightly Doped Drain) region may be formed at the interface between the channel region and the source region or between the channel region and the drain region.

  The gate electrode is formed on the element substrate 20 in a region overlapping with the channel region of the semiconductor layer in plan view via a part (gate insulating film) of the insulating layer 25. Although not shown, the gate electrode is electrically connected to the scanning line disposed on the lower layer side through a contact hole, and the TFT 24 is controlled to be turned on / off by applying a scanning signal.

The insulating layer 25 is provided so as to cover the insulating layer 23 and the TFT 24. The insulating layer 25 is made of an inorganic material such as SiO ₂ , for example. The insulating layer 25 includes a gate insulating film that insulates between the semiconductor layer of the TFT 24 and the gate electrode. The insulating layer 25 relieves surface irregularities caused by the TFT 24. A light shielding layer 26 is provided on the insulating layer 25. An insulating layer 27 made of an inorganic material is provided so as to cover the insulating layer 25 and the light shielding layer 26.

  The pixel electrode 28 is provided on the insulating layer 27 corresponding to the pixel P. The pixel electrode 28 is disposed in a region overlapping the opening 22 a of the light shielding layer 22 and the opening 26 a of the light shielding layer 26 in plan view. The pixel electrode 28 is made of a transparent conductive film such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide). The alignment film 29 is provided so as to cover the pixel electrode 28. The liquid crystal layer 40 is sealed between the alignment film 29 on the element substrate 20 side and the alignment film 35 on the counter substrate 30 side.

  Although not shown, an electrode, wiring, relay electrode, and storage capacitor 5 (see FIG. 2) for supplying an electrical signal to the TFT 24 are provided in a region overlapping the light shielding layer 22 and the light shielding layer 26 in plan view. A capacitive electrode or the like is provided. The light shielding layer 22 and the light shielding layer 26 may be configured to include these electrodes, wiring, relay electrodes, capacitor electrodes, and the like.

  In the liquid crystal device 1 according to the first embodiment, for example, light emitted from a light source or the like is incident from the counter substrate 30 (substrate 11) side including the microlenses ML1 and ML2. Of the incident light, the parallel light L1 incident on the center of the microlens ML1 (lens surface 13a) along the normal direction of the surface of the counter substrate 30 (substrate 11) travels straight to the microlens ML2 (lens surface 15a). ), Travels straight through, passes through the opening T of the pixel P, and exits toward the element substrate 20 side.

  In the following, the normal direction of the surface of the counter substrate 30 (substrate 11) is simply referred to as “normal direction”. The “normal direction” is a direction along the Z direction in FIG. 3 and is substantially the same as the normal direction of the element substrate 20 (substrate 21). In the following, light parallel to the normal direction is referred to as “parallel light”, and light inclined (with an angle) with respect to the normal direction is referred to as “oblique light”.

  If the parallel light L2 incident on the end portion of the microlens ML1 along the normal direction goes straight as it is, the parallel light L2 is shielded by the light shielding layer 26 as indicated by the broken line, but between the substrate 11 and the lens layer 13. Are refracted toward the center side of the microlens ML1 due to the difference in optical refractive index (positive refractive power) and enter the microlens ML2. The light L2 incident on the microlens ML2 is further refracted toward the center side of the microlens ML2 due to the difference in optical refractive index (positive refractive power) between the lens layer 13 and the lens layer 15, The light passes through the opening T and is emitted to the element substrate 20 side.

  The oblique light L3 incident on the end of the microlens ML1 obliquely with respect to the normal direction and toward the outside with respect to the center of the microlens ML1 goes straight as it is. Although the light is blocked by 32, the light is refracted toward the center of the microlens ML1 due to the difference in optical refractive index between the substrate 11 and the lens layer 13, and enters the microlens ML2. If the light L3 incident on the microlens ML2 goes straight as it is, the light L3 is shielded by the light shielding layer 26 as shown by the broken line, but due to the difference in the optical refractive index between the lens layer 13 and the lens layer 15, The light is further refracted toward the center of the lens ML2, passes through the opening T of the pixel P, and is emitted toward the element substrate 20 side.

  As described above, in the liquid crystal device 1, the parallel light L <b> 2 and the oblique light L <b> 3 that are shielded by the light shielding layer 32 and the light shielding layer 26 when traveling straight as they are are converted into the pixel P by the action of the two-stage microlenses ML <b> 1 and ML <b> 2. The light can be refracted toward the center of the opening T and transmitted through the opening T. As a result, since the amount of light emitted from the element substrate 20 side can be increased, the light utilization efficiency can be increased.

  When the optical path length adjustment layer 16 is made of a material having a lower optical refractive index than the lens layer 15, light refraction occurs at the interface between the lens layer 15 and the optical path length adjustment layer 16. However, the light refraction at this interface is small compared to the light refraction by the microlenses ML1 and ML2, and can be ignored.

<Microlens array substrate>
Next, the detailed configuration of the microlens array substrate 10 according to the first embodiment will be described with reference to FIGS. 4 and 5. FIG. 4 is a schematic plan view showing the shape and arrangement of the light shielding portion and the microlens of the liquid crystal device according to the first embodiment. FIG. 5 is a schematic cross-sectional view showing the configuration of the microlens array substrate according to the first embodiment. 5 corresponds to a partially enlarged view of one pixel P in FIG.

  As shown in FIG. 4, in the display area E of the liquid crystal device 1, a plurality of pixels P are arranged in a matrix at a predetermined arrangement pitch. FIG. 4 shows four pixels P adjacent to each other. Each of the pixels P has a substantially rectangular planar shape, and is arranged so that adjacent pixels P in the X direction and the Y direction are in contact with each other. A direction along a diagonal line connecting vertices located at diagonal positions of the pixel P is defined as a W direction.

  As shown by hatching in FIG. 4, the display area E of the liquid crystal device 1 is provided with light shielding portions S in a substantially lattice shape. The light shielding portion S includes a light shielding layer 22 and a light shielding layer 26. In other words, at least one of the light shielding layer 22 and the light shielding layer 26 is disposed in the light shielding portion S. Of the region of each pixel P, a region that overlaps the light shielding portion S in plan view is a non-opening region that does not transmit light, and a region that overlaps the opening T in plan view is an opening region that transmits light. The TFT 24 is disposed in a region overlapping the light shielding portion S in plan view.

  The light shielding portion S has a portion extending in the X direction and a portion extending in the Y direction. The light shielding portion S has, for example, portions that protrude to the opening T side at four corners. For example, a part of the TFT 24, a relay electrode, a capacitor electrode, and the like (not shown) are arranged on the protruding portion of the light shielding portion S. By forming the light shielding portion S in such a shape, the TFT 24 can be reliably shielded from light even if the area of the light shielding portion S is reduced to increase the aperture ratio.

  The light shielding portion S has an opening T corresponding to each of the plurality of pixels P. The opening T has a contour shape in which four corners of a substantially rectangular shape are recessed. The opening T has a contour shape that is line-symmetric with respect to a straight line along the X direction and a straight line along the Y direction. Note that the contour shape of the opening T (the planar shape of the light-shielding portion S) is not limited to such a form, and may be a contour shape in which the four corner portions are not recessed, It may be a non-axisymmetric contour with respect to a straight line along one of the Y directions.

  The opening T is a region where the opening 22a and the opening 26a overlap in plan view. When the light shielding layer 32 is also provided in the display area E, the light shielding portion S is composed of the light shielding layer 22, the light shielding layer 26, and the light shielding layer 32, and the opening T is an opening 22a and an opening in plan view. 26a and the opening of the light shielding layer 32 are overlapped.

  4, each of the plurality of microlenses ML1 (concave portion 12) and each of the plurality of microlenses ML2 (concave portion 14) correspond to each of the plurality of pixels P and have the same arrangement pitch. It is arranged. The microlens ML1 (concave portion 12) and the microlens ML2 (concave portion 14) are arranged so as to overlap each other and the opening portion T of the pixel P in plan view.

  The outer shapes of the microlens ML1 (recessed portion 12) and the microlens ML2 (recessed portion 14) are inscribed in the pixels P. The microlenses ML1 (concave portions 12) and the microlenses ML2 (concave portions 14) that are adjacent to each other in the X direction and the Y direction are connected to each other. Therefore, more light can be incident on the microlenses ML1 and ML2 than when the microlenses ML1 and ML2 adjacent in the X direction and the Y direction are separated from each other.

  The boundary between the microlenses ML1 and ML2 adjacent in the X direction and the Y direction is arranged in a region overlapping the portion extending in the X direction and the portion extending in the Y direction of the light shielding portion S in plan view. Further, the corner vertices at the four corners of the microlens ML1 (concave portion 12) and the microlens ML2 (concave portion 14) are portions where the portion extending in the X direction and the portion extending in the Y direction of the light shielding portion S intersect. Are arranged in a region overlapping in plan view. The microlenses ML1 (concave portions 12) and the microlenses ML2 (concave portions 14) that are adjacent to each other in the direction along the diagonal line (W direction) are spaced apart from each other.

  The planar shape of the microlens ML1 (recessed portion 12) and the microlens ML2 (recessed portion 14) is substantially rectangular, but the virtual outer shape of the recessed portions 12 and 14 is circular, for example, more than the inscribed circle of the pixel P. Larger and smaller than the circumscribed circle. If the circular diameter (length in the W direction) that is the virtual outer shape of the concave portion 12 is D1, and the circular diameter (length in the W direction) that is the virtual outer shape of the concave portion 14 is D2, D1 ≧ D2. It is. In the example shown in FIG. 4, D1> D2.

  As shown in FIG. 5, the depth of the concave portion 12, that is, the thickness of the microlens ML1, is E1, and the thickness of the thickest portion of the lens layer 13 is E2. An angle formed by the inclined surface of the recess 12 and the surface 11a (see FIG. 3) of the substrate 11 is defined as θ. The depth of the recess 14, that is, the thickness of the microlens ML <b> 2 is E <b> 3, and the thickness of the thickest part of the lens layer 15 is E <b> 4. The thickness of the optical path length adjusting layer 16 is E5.

  When the pitch of the pixels P is 10 μm, the depth E1 of the recess 12 is, for example, about 4.0 μm. The angle θ of the inclined surface of the recess 12 is, for example, about 40 °. The thickness E2 of the lens layer 13 is, for example, about 5.0 μm. The distance from the microlens ML1 to the microlens ML2 can be adjusted by the thickness E2 of the lens layer 13. The depth E3 of the recess 14 is E1 ≧ E3 with respect to the depth E1 of the recess 12. The thickness E4 of the lens layer 15 is, for example, about 7.0 μm. The thickness E5 of the optical path length adjusting layer 16 is, for example, about 7.0 μm.

  When the substrate 11 is made of quartz, the optical refractive index of the substrate 11 is about 1.46. On the other hand, the optical refractive index of the lens layer 13 is, for example, about 1.52, and the optical refractive index of the lens layer 15 is, for example, about 1.64. The optical refractive index of the optical path length adjusting layer 16 is approximately the same as the optical refractive index of the substrate 11, but may be larger than the optical refractive index of the substrate 11 as long as it is smaller than the optical refractive indexes of the lens layers 13 and 15. . Each numerical value described above shows an example, and these numerical values are appropriately set based on optical characteristics required for the microlenses ML1 and ML2.

  The optical axis Ax (first axis) of the microlenses ML1 and ML2 shown in FIG. 5 is a straight line connecting the planar center of the lens surface 13a (concave portion 12) and the planar center of the lens surface 15a (concave portion 14). It is. The center of the lens surface 13a and the center of the lens surface 15a are ideally arranged so as to overlap the center of the pixel P in plan view. Therefore, the optical axes Ax of the microlenses ML1 and ML2 are ideally parallel to the normal direction. Here, it is assumed that the optical axis Ax is parallel to the normal direction.

  FIG. 6 is a diagram illustrating an example of an angular distribution of incident light that is emitted from a light source (for example, the polarization illumination device 110 illustrated in FIG. 12) and is incident on the microlens array substrate. The horizontal axis is the angle with respect to the normal direction, and the angle with respect to the normal direction increases as the point moves from the intersection “0” with the vertical axis to the right. The vertical axis represents the intensity of incident light, and the intensity of light increases as it goes upward.

  In the example shown in FIG. 6, the incident light includes a lot of oblique light as well as parallel light. Of the oblique light included in the incident light, the oblique light having the smallest angle with respect to the normal direction (for example, about 5 °) is the largest, and the oblique light having the larger angle with respect to the normal direction is smaller. Therefore, the liquid crystal device 1 has high light utilization efficiency and good contrast for incident light including not only parallel light but also oblique light having a relatively small angle with respect to the normal direction. Desired. Note that the incident light angular distribution shown in FIG. 6 may vary depending on the structure and characteristics of the light source (polarized illumination device).

  Returning to FIG. 5, the normal line (first normal line) of the tangent plane at the position C1 (first position) of the lens surface 13a of the microlens ML1 is defined as V1. A normal line (second normal line) of the tangent plane at the position C2 (second position) of the lens surface 15a of the microlens ML2 and passing through the position C1 of the lens surface 13a is defined as V2. FIG. 5 shows an optical path when the oblique lights L4 and L5 are incident on the position C1 of the lens surface 13a of the microlens ML1. For easy understanding of the optical paths of the oblique lights L4 and L5, the angles of the oblique lights L4 and L5 with respect to the optical axis Ax are greatly exaggerated.

  The oblique light L4 incident on the position C1 of the lens surface 13a from the optical axis Ax side to the outer side (side away from the optical axis Ax) from the normal line V1 goes straight as it is. The light is shielded by the light shielding layer 32 (see FIG. 3) toward the outside (the adjacent pixel P side). However, since the optical refractive index of the lens layer 13 is larger than the optical refractive index of the substrate 11, the refractive angle at the lens surface 13a is smaller than the incident angle, so that the oblique light L4 is inside the optical path indicated by the broken line (optical axis). Refracted to the Ax side).

  The oblique light L4 refracted inward passes through the outside of the normal line V2 in the lens layer 13, and enters the position outside the position C2 of the lens surface 15a. Since the light refractive index of the lens layer 15 is larger than the light refractive index of the lens layer 13, the refraction angle at the lens surface 15a is smaller than the incident angle, so that the oblique light L4 is refracted inward from the optical path indicated by the broken line. That is, the oblique light L4 is refracted to the same side by the microlens ML1 and the microlens ML2 with respect to the optical axis Ax. Accordingly, the oblique light L4 incident on the microlens ML1 toward the side away from the optical axis Ax is directed toward the optical axis Ax by the microlens ML1 and the microlens ML2, and the opening T (see FIG. 3). (See), and the inclination (angle) with respect to the optical axis Ax is reduced to approach the parallel light.

  On the other hand, the oblique light L5 incident on the position C1 of the lens surface 13a from the optical axis Ax side to the inner side (side closer to the optical axis Ax) than the normal line V1 is refracted inward from the optical path indicated by the broken line. The light passes through the inner side of the normal line V2 in the layer 13 and enters the position C3 inside the position C2 of the lens surface 15a.

  If the oblique light L5 incident on the position C3 of the lens surface 15a travels straight as it is, it crosses the optical axis Ax toward the outside of the pixel P (on the adjacent pixel P side) as shown by a broken line, and the light shielding layer 32 Even if the light is blocked by (see FIG. 3) or not shielded, the liquid crystal layer 40 (see FIG. 3) is transmitted obliquely, leading to a decrease in contrast of the liquid crystal device 1. Further, when the liquid crystal device 1 is used as a liquid crystal light valve of a projector, the oblique light L5 may be kicked by the projection lens.

  Here, since the oblique light L5 passes through the inner side of the normal line V2 in the lens layer 13, it enters the lens surface 15a from the outer side to the inner side of the tangential plane normal line V3 at the position C3. Since the refraction angle at the lens surface 15a is smaller than the incident angle, the light is refracted outside the optical path indicated by the broken line. That is, the oblique light L5 is refracted by the microlens ML2 on the side opposite to the side refracted by the microlens ML1 with respect to the optical axis Ax. Accordingly, the oblique light L5 refracted in the direction in which the inclination increases with respect to the optical axis Ax by the microlens ML1 is refracted and returned in the direction in which the inclination decreases by the microlens ML2. The angle with respect to the optical axis Ax can be kept small.

  As described above, in the microlens array substrate 10 according to the first embodiment, the microlens ML1 and the microlens ML2 are refracted to the same side or the microlens ML1 and the microlens ML2 according to the direction in which the oblique light is incident. The lens ML2 is refracted to the opposite side. Thereby, in the liquid crystal device 1 according to the first embodiment, it is possible to achieve both the improvement of the light use efficiency and the improvement of the contrast even when the incident light includes oblique light.

  Even when the light beam enters the position C1 of the lens surface 13a from the optical axis Ax side to the inside from the normal line V1 as in the oblique light L5 shown in FIG. The oblique light incident on the position outside the position C2 of the lens surface 15a is refracted to the same side by the microlens ML1 and the microlens ML2. However, such an oblique light is refracted to the same side in the microlens ML1 and the microlens ML2 because the angle with respect to the optical axis Ax when entering the microlens ML1 is smaller than the oblique light L5 shown in FIG. However, the angle with respect to the optical axis Ax when emitted from the microlens ML2 does not become excessively large.

<Manufacturing method of microlens array substrate>
Next, a method for manufacturing the microlens array substrate 10 according to the first embodiment will be described. FIG. 7 is a schematic cross-sectional view showing the method for manufacturing the microlens array substrate according to the first embodiment. Specifically, each drawing in FIG. 7 corresponds to a schematic cross-sectional view along the line AA ′ in FIG. 3, and the vertical direction (Z direction) is reversed from FIG. 3.

First, as shown in FIG. 7A, a control film 70 made of an oxide film such as SiO ₂ is formed on the surface 11a of the light-transmitting substrate 11 made of quartz or the like. The control film 70 has an etching rate different from that of the substrate 11 in isotropic etching, and the width direction (W direction shown in FIG. A function of adjusting the etching rate in the X direction and the Y direction).

  After forming the control film 70, the control film 70 is annealed at a predetermined temperature. The etching rate of the control film 70 varies depending on the annealing temperature. Therefore, the etching rate of the control film 70 can be adjusted by appropriately setting the temperature during annealing.

  Subsequently, a mask layer 72 is formed on the control film 70. Then, the mask layer 72 is patterned to form openings 72 a in the mask layer 72. The position of the planar center of the opening 72a is the center of the recess 12 to be formed. Subsequently, isotropic etching is performed on the substrate 11 covered with the control film 70 through the opening 72 a of the mask layer 72. Although not shown, by this isotropic etching, an opening is formed in a region overlapping the opening 72a of the control film 70, and the substrate 11 is etched through the opening.

  For the isotropic etching, an etching solution (for example, hydrofluoric acid solution) is used such that the etching rate of the control film 70 is larger than the etching rate of the substrate 11. As a result, the etching amount per unit time of the control film 70 in the isotropic etching is larger than the etching amount per unit time of the substrate 11, so that the substrate is expanded along with the enlargement of the opening formed in the control film 70. The etching amount in the width direction 11 is larger than the etching amount in the depth direction.

  By the isotropic etching, the control film 70 and the substrate 11 are etched from the opening 72a, and the concave portion 12 is formed on the surface 11a side of the substrate 11 as shown in FIG. By setting the etching rate as described above, the width direction of the recess 12 is expanded more than the depth direction, and a tapered inclined surface is formed at the peripheral edge of the recess 12. FIG. 7B shows a state after the mask layer 72 and the control film 70 are removed from the substrate 11.

  In this step, the isotropic etching is finished in a state where the recesses 12 adjacent in the X direction and the Y direction are connected to each other and the recesses 12 adjacent in the W direction are separated from each other (see FIG. 4). . More specifically, the circular diameter D1 (see FIG. 4), which is a virtual outer shape of the concave portion 12, is, for example, about 95% of the length of the diagonal line of the pixel P, and between adjacent concave portions 12 in the W direction. The isotropic etching is finished with the surface 11a of the substrate 11 left.

  If isotropic etching is performed until the recesses 12 adjacent in the W direction are connected to each other, the mask layer 72 may be lifted off from the substrate 11 and peeled off. In the present embodiment, since the isotropic etching is finished with the surface 11a of the substrate 11 remaining between the adjacent recesses 12, the mask layer 72 can be supported until the isotropic etching is finished. . Thereby, the planar shape of the recessed part 12 becomes a substantially rectangular shape with rounded corners at four corners (see FIG. 4).

  Next, as shown in FIG. 7C, an inorganic material having light transmittance and a light refractive index larger than that of the substrate 11 is deposited so as to cover the surface 11 a side of the substrate 11 and fill the recess 12. Thus, the lens layer 13 is formed. The lens layer 13 can be formed using, for example, a CVD method. The lens layer 13 may be formed by depositing a material in a plurality of times. By forming the lens layer 13 with substantially the same thickness on the substrate 11, the shape of the recess 12 is reflected on the surface of the lens layer 13, and the recess 14 is formed. And the microlens ML1 is comprised by embedding the material of the lens layer 13 in the recessed part 12. FIG.

  Although depending on the state of the lens layer 13 around the material, the circular diameter D2 that is the virtual outer shape of the concave portion 14 is equal to or smaller than the circular diameter D1 that is the virtual outer shape of the concave portion 12 (see FIG. 4). The depth E3 of 14 is equal to or less than the depth E1 of the recess 12 (see FIG. 5). If the recess 12 has an inclined surface as in the present embodiment, the shape of the recess 14 formed on the surface of the lens layer 13 by depositing the material of the lens layer 13 depends on the shape of the recess 12. Can be close.

  In the present embodiment, as described above, the recess 14 reflecting the shape of the recess 12 is formed on the surface of the lens layer 13 by depositing the material of the lens layer 13. Therefore, after the lens layer 13 is formed to be thicker and the unevenness on the surface is alleviated, the photolithography process and etching are performed as compared with the case where the concave portion 14 is formed by etching the lens layer 13 as in FIG. A process can be dispensed with. Thereby, since productivity can be improved, cost competitiveness can be improved.

  Next, as shown in FIG. 7 (d), an inorganic material having light transmissivity and a higher refractive index than that of the lens layer 13 is deposited so as to cover the surface of the lens layer 13 and fill the recess 12. Thus, the lens layer 15 is formed. The lens layer 15 can be formed using, for example, a CVD method. The lens layer 15 may be formed by depositing a material in a plurality of times. By forming the lens layer 15 with substantially the same thickness on the lens layer 13, the shape of the recess 14 is reflected on the surface of the lens layer 15. The microlens ML2 is configured by embedding the material of the lens layer 15 in the recess 14.

  Next, as shown in FIG. 7E, the lens layer 15 is flattened. In the flattening process, for example, the upper surface of the lens layer 15 is flattened by polishing and removing a portion of the upper layer of the lens layer 15 where the irregularities are formed using a CMP (Chemical Mechanical Polishing) process or the like. Then, an optical path length adjusting layer 16 is formed by depositing an inorganic material having light transmittance and having a light refractive index comparable to that of the substrate 11 so as to cover the lens layer 15. The optical path length adjusting layer 16 can be formed using, for example, a CVD method. As described above, the microlens array substrate 10 is completed.

  After the microlens array substrate 10 is completed, a light shielding layer 32, a protective layer 33, a common electrode 34, and an alignment film 35 are sequentially formed on the microlens array substrate 10 to face each other using a known technique. A substrate 30 is obtained. Further, a known method is sequentially applied to the light shielding layer 22, the insulating layer 23, the TFT 24, the insulating layer 25, the light shielding layer 26, the insulating layer 27, the pixel electrode 28, and the alignment film 29 on the substrate 21. The element substrate 20 is obtained by forming using them.

  Subsequently, the element substrate 20 and the counter substrate 30 are positioned, and a thermosetting or photocurable adhesive is disposed between the element substrate 20 and the counter substrate 30 as a sealing material 42 (see FIG. 1) and cured. Let them stick together. The liquid crystal device 1 is completed by enclosing and sandwiching liquid crystal in a space formed by the element substrate 20, the counter substrate 30, and the sealing material 42. Before the element substrate 20 and the counter substrate 30 are bonded together, the liquid crystal may be disposed in a region surrounded by the sealant 42.

  The microlens ML1 has a configuration having an inclined surface at the peripheral portion of the concave portion 12, but does not have an inclined surface at the peripheral portion of the concave portion 12, and the entire concave portion 12 is configured by a curved surface portion. May be. In this case, the control film 70 may not be provided when forming the recess 12. Moreover, when the whole recessed part 12 is comprised by the curved surface part, the whole recessed part 14 will also be comprised by the curved surface part.

(Second Embodiment)
<Electro-optical device>
The liquid crystal device as the electro-optical device according to the second embodiment is different from the first embodiment in the configuration of the microlens array substrate. The configurations of the liquid crystal device 1A and the microlens array substrate 60 according to the second embodiment will be described with reference to FIG. FIG. 8 is a schematic cross-sectional view showing the configuration of the liquid crystal device according to the second embodiment. Specifically, FIG. 8 corresponds to a schematic cross-sectional view along the line AA ′ of FIG. Constituent elements common to the first embodiment are denoted by the same reference numerals and description thereof is omitted.

  As shown in FIG. 8, the liquid crystal device 1 </ b> A according to the second embodiment includes an element substrate 20, a counter substrate 30 </ b> A, a sealing material 42 (not shown), and a liquid crystal layer 40. The counter substrate 30 </ b> A includes a microlens array substrate 60 according to the second embodiment, a light shielding layer 32, a protective layer 33, a common electrode 34, and an alignment film 35.

  The microlens array substrate 60 according to the second embodiment includes two-stage microlenses, that is, a first-stage microlens ML1 and a second-stage microlens ML2. The microlens array substrate 60 includes a substrate 61, a lens layer 62 as a first light transmissive layer, a lens layer 64 as a second light transmissive layer, and a planarizing layer 66 as a third light transmissive layer. It is equipped with.

  The substrate 61 is made of an inorganic material having optical transparency such as glass or quartz. The lens layer 62 is provided on a surface 61 a as a first surface that is a surface of the substrate 61 on the liquid crystal layer 40 side. The lens layer 62 has convex portions 63 as a plurality of first convex portions. The cross-sectional shape of the convex portion 63 is, for example, a substantially elliptic spherical shape. The lens layer 62 is made of an inorganic material having optical transparency and a higher refractive index than that of the substrate 61, such as SiON.

  Each convex portion 63 is provided for each pixel P, and has a lens surface 63a as a first lens surface. When the lens surface 63a of the convex portion 63 is covered with the lens layer 64, a convex microlens ML1 that swells toward the liquid crystal layer 40 is formed. Further, the micro lens array MLA1 is configured by the plurality of micro lenses ML1.

  The lens layer 64 is formed thicker than the convex portion 63 so as to cover the surface of the lens layer 62. The lens layer 64 is made of an inorganic material having optical transparency and a light refractive index smaller than that of the lens layer 62, for example, SiON. The lens layer 64 has convex portions 65 as a plurality of second convex portions in which the shape of the convex portion 63 is reflected on the surface (the surface opposite to the lens layer 62). The convex portion 65 is arranged so as to overlap the convex portion 63 in plan view, and has a cross-sectional shape similar to that of the convex portion 63.

  Each convex portion 65 has a lens surface 65a as a second lens surface. By covering the lens surface 65a of the convex portion 65 with the planarizing layer 66, a convex microlens ML2 that swells toward the liquid crystal layer 40 is formed. Further, a microlens array MLA2 is configured by the plurality of microlenses ML2. The microlens ML <b> 1 and the microlens ML <b> 2 are arranged so as to overlap each other in plan view corresponding to the pixel P.

The planarizing layer 66 is formed thicker than the convex portion 65 so as to cover the surface of the lens layer 64. The planarizing layer 66 is made of an inorganic material having optical transparency and a light refractive index smaller than that of the lens layer 64, for example, SiO ₂ . The surface of the planarization layer 66 is a plane that is substantially parallel to the surface 61 a of the substrate 61. The flattening layer 66 has a function as an optical path length adjusting layer that adjusts the distance from the microlens ML2 to the light shielding layer 26 to a desired value.

  The parallel light L1 incident on the center of the microlens ML1 (lens surface 63a) travels straight and enters the center of the microlens ML2 (lens surface 65a), travels straight as it is, and passes through the opening T of the pixel P. Injected to the substrate 20 side.

  If the parallel light L2 incident on the end of the microlens ML1 goes straight as it is, it is shielded by the light shielding layer 26 as indicated by the broken line, but the light refractive index between the lens layer 62 and the lens layer 64 is reduced. Due to the difference (positive refractive power), the light is refracted toward the center side of the microlens ML1 and enters the microlens ML2. The light L2 incident on the microlens ML2 is further refracted toward the center side of the microlens ML2 due to the difference in optical refractive index (positive refractive power) between the lens layer 64 and the planarization layer 66, and the pixel P Is transmitted through the opening T and emitted toward the element substrate 20.

  The oblique light L3 incident on the end of the microlens ML1 obliquely with respect to the normal direction and toward the outside with respect to the center of the microlens ML1 goes straight as it is. Although the light is blocked by 32, the light is refracted toward the center of the microlens ML1 due to the difference in optical refractive index (positive refractive power) between the lens layer 62 and the lens layer 64, and enters the microlens ML2. If the light L3 incident on the microlens ML2 goes straight as it is, it is shielded by the light shielding layer 26 as indicated by the broken line, but the difference in optical refractive index between the lens layer 64 and the flattening layer 66 (positive) Refracting power) further refracts toward the center side of the microlens ML2, passes through the opening T of the pixel P, and is emitted toward the element substrate 20 side.

  As described above, also in the liquid crystal device 1A according to the second embodiment, the parallel light L2 and the oblique light L3 that are shielded by the light shielding layer 32 and the light shielding layer 26 when traveling straight as they are are converted into the two-stage microlenses ML1, ML2. Due to the action of ML2, the light can be refracted toward the center of the opening T of the pixel P and transmitted through the opening T. As a result, as in the first embodiment, the amount of light emitted from the element substrate 20 side can be increased, so that the light use efficiency can be increased.

<Microlens array substrate>
Next, a detailed configuration of the microlens array substrate 60 according to the second embodiment will be described with reference to FIGS. 9 and 10. FIG. 9 is a schematic plan view showing the shape and arrangement of the light shielding portion and the microlens of the liquid crystal device according to the second embodiment. FIG. 10 is a schematic cross-sectional view showing the configuration of the microlens array substrate according to the second embodiment. 10 corresponds to a partially enlarged view of one pixel P in FIG.

  As shown in FIG. 9, in the liquid crystal device 1A according to the second embodiment, similarly to the liquid crystal device 1 according to the first embodiment, the light shielding portions S are provided in a substantially lattice shape. Has an opening T corresponding to each of the plurality of pixels P.

  The microlenses ML1 (convex portions 63) and the microlenses ML2 (convex portions 65) adjacent to each other in the X direction and the Y direction are connected to each other. Microlenses ML1 (convex portions 63) and microlenses ML2 (convex portions 65) adjacent to each other in the direction along the diagonal line (W direction) are separated from each other.

  The planar shape of the microlens ML1 (convex portion 63) and the microlens ML2 (convex portion 65) is substantially rectangular, and four corners are rounded. When the diameter (length) of the convex portion 63 in the W direction is F1, and the diameter (length) of the convex portion 65 is F2, F1 ≦ F2. In the example shown in FIG. 9, F1 <F2. In the second embodiment, the microlenses ML1 (convex portions 63) and the microlenses ML2 (convex portions 65) adjacent in the W direction may be connected to each other.

  As shown in FIG. 10, the thickness of the convex portion 63, that is, the thickness of the microlens ML1, is H2, and the thickness of the lens layer 62 excluding the thickness H2 of the convex portion 63 is H1. The thickness of the thickest part of the lens layer 62 is H1 + H2. Then, the thickness of the convex portion 65, that is, the thickness of the microlens ML2 is set to H4, and the thickness obtained by removing the thickness H4 of the convex portion 65 from the thickness of the lens layer 64 at the center of the convex portion 65 (lens surface 65a). Let the height be H3. In the lens layer 64, the thickness of the portion from the vertex of the convex portion 63 (center of the lens surface 63a) to the vertex of the convex portion 65 (center of the lens surface 65a) is H3 + H4. The thickness of the planarizing layer 66 is H5.

  When the pitch of the pixels P is 10 μm, the thickness H1 of the lens layer 62 excluding the thickness H2 of the convex portion 63 is, for example, about 4.5 μm. The thickness H2 of the convex portion 63 is, for example, about 2.6 μm. The thickness H3 + H4 of the portion from the top of the convex portion 63 to the top of the convex portion 65 in the lens layer 64 is, for example, about 3.0 μm. The thickness H4 of the convex portion 65 is H2 ≧ H4 with respect to the thickness H2 of the convex portion 63. Further, the thickness H5 of the planarizing layer 66 is, for example, about 6.0 μm.

  When the substrate 61 is made of quartz, the optical refractive index of the substrate 61 is about 1.46. On the other hand, the optical refractive index of the lens layer 62 is, for example, about 1.70, and the optical refractive index of the lens layer 64 is, for example, about 1.60. The optical refractive index of the planarizing layer 66 is approximately the same as the optical refractive index of the substrate 61, but may be larger than the optical refractive index of the substrate 61 as long as it is smaller than the optical refractive indexes of the lens layers 62 and 64. Each numerical value described above shows an example, and these numerical values are appropriately set based on optical characteristics required for the microlenses ML1 and ML2.

  The normal line (first normal line) of the tangent plane at the position G1 (first position) of the lens surface 63a of the microlens ML1 is defined as K1. A tangential plane normal line (second normal line) at the position G2 (second position) of the lens surface 65a of the microlens ML2 and a straight line passing through the position G1 of the lens surface 63a is defined as K2. The center of the microlens ML1 (lens surface 63a) and the center of the microlens ML2 (lens surface 65a) are arranged so as to overlap the center of the pixel P in plan view, and the optical axis Ax is parallel to the normal direction. Suppose that

  The oblique light L4 that is incident on the microlens ML1 from the substrate 61 side and is incident on the position G1 from the optical axis Ax side to the outer side (side away from the optical axis Ax) from the normal line K1 is refracted by the lens layer 64. Since the refractive index is smaller than the optical refractive index of the lens layer 62, the refraction angle at the lens surface 63a is larger than the incident angle, so that the oblique light L4 is refracted outside the optical path indicated by the broken line.

  The oblique light L4 refracted to the outside passes through the inner side of the normal line K2 in the lens layer 64 and enters the position inside the position G2. Since the optical refractive index of the flattening layer 66 is smaller than the optical refractive index of the lens layer 64, the refractive angle at the lens surface 65a is larger than the incident angle, so that the oblique light L4 is inside the optical path indicated by the broken line (optical axis). Refracts toward the side closer to Ax. Accordingly, the oblique light L4 refracted in the direction in which the inclination increases with respect to the optical axis Ax by the microlens ML1 is refracted and returned in the direction in which the inclination decreases by the microlens ML2, so that the inside of the opening T of the pixel P The angle with respect to the optical axis Ax can be kept small.

  Even when the light enters the position G1 from the optical axis Ax side toward the outside from the normal line K1 as in the oblique light L4, the light passes through the outside of the normal line K2 in the lens layer 64 and is outside the position G2. The oblique light incident on the position is refracted outwardly by the microlens ML1 and the microlens ML2. However, if the incident light has a distribution such that the angle with respect to the optical axis Ax is small (for example, about 5 °) and the oblique light is the largest as shown in FIG. As in the case of the light L4, there are many oblique lights that are refracted by the microlens ML2 and returned to the inside.

  On the other hand, the oblique light L5 incident on the position G1 from the outside of the normal line K1 to the inside (side approaching the optical axis Ax) with respect to the optical axis Ax is refracted inward from the optical path indicated by the broken line, and the lens layer The light passes through the inner side of the normal line K2 at 64 and is refracted to the same side by the lens surface 65a. In this case, the oblique light L5 is refracted to the same side in the microlens ML1 and the microlens ML2, that is, the side where the angle with respect to the optical axis Ax increases. However, if the incident light has a distribution such that the oblique light having a small angle with respect to the optical axis Ax is the largest as shown in FIG. 6, the microlens ML1 and the microlens ML2 are the same as the oblique light L5. Even if the light is refracted to the side, the angle with respect to the optical axis Ax when emitted from the microlens ML2 does not become excessively large.

<Manufacturing method of microlens array substrate>
Next, a method for manufacturing the microlens array substrate 60 according to the second embodiment will be described. FIG. 11 is a schematic cross-sectional view showing a method for manufacturing a microlens array substrate according to the second embodiment. Specifically, each diagram in FIG. 11 corresponds to a schematic cross-sectional view along the line AA ′ in FIG. 3, and the vertical direction (Z direction) is reversed from FIG. 3.

  First, as shown in FIG. 11A, an inorganic material having light transmittance and a light refractive index larger than that of the substrate 61 is deposited on the surface 61a of the light-transmitting substrate 61 made of quartz or the like. Thus, the lens material layer 62a is formed. The lens material layer 62a can be formed using, for example, a CVD method.

  Subsequently, a resist layer 74 is formed on the lens material layer 62a. The resist layer 74 is formed of, for example, a positive photosensitive resist whose exposed portion is removed by development. The resist layer 74 can be formed by, for example, a spin coat method or a roll coat method. Although not shown, the resist layer 74 is exposed and developed through a mask provided with a light shielding portion corresponding to the position where the convex portion 63 is formed, so that the convex portion 63 is formed in a later step. A portion corresponding to the position where the is formed remains. FIG. 11A shows a state after development of the resist layer 74.

  The planar shape of the remaining portion of the resist layer 74 is, for example, a substantially rectangular shape in which four corners are rounded. In addition, the method of forming the corners at the four corners of the remaining portion in a round shape may round the corners at the four corners in the mask when the resist layer 74 is exposed, or the resist layer 74 is formed in a rectangular state in the mask. You may make it form the corner | angular part of four corners roundly, when exposing.

  Next, the remaining portion of the resist layer 74 is subjected to a heat treatment such as a reflow process to soften (melt) the remaining portion. The melted residual portion is in a fluid state, and the surface is deformed into a curved surface by the action of surface tension. As a result, as shown in FIG. 11B, a substantially elliptical convex portion 75 is formed on the lens material layer 62a. The bottom side (lens material layer 62a side) of the convex portion 75 has a substantially rectangular shape with rounded corners at four corners in plan view, but the substantially spherical tip side (upper side) of the convex portion 75 has a substantially concentric shape in plan view. It is formed in a shape.

  Next, anisotropic etching such as dry etching is performed on the convex portions 75 and the lens material layer 62a from above. Thus, as shown in FIG. 11C, the convex portions 75 made of resist are gradually removed, and the exposed portions of the lens material layer 62a are etched along with the removal of the convex portions 75. As a result, the shape of the convex portion 75 is transferred to the lens material layer 62a, and the convex portion 62b is formed. In this step, by setting the etching rate of the material (resist) of the convex portion 75 and the etching rate of the material of the lens material layer 62a in anisotropic etching to be substantially the same, the convex portion 75 and the convex portion 62b Can have substantially the same shape.

  Next, as shown in FIG. 11D, the same material as the convex portion 62b (lens material layer 62a) is deposited so as to cover the substrate 61 and the convex portion 62b by using, for example, a CVD method. Thereby, the lens layer 62 having the convex portion 63 corresponding to the convex portion 62b is formed. As a result, the convex portions 63 adjacent in the X direction and the Y direction are connected to each other. The convex portions 63 adjacent in the W direction are separated from each other (see FIG. 9).

  When processing the remaining portion of the resist layer 74 shown in FIG. 11B into the shape of the convex portion 75, the convex portion 75 has the same shape as the convex portion 63 by adjusting the conditions of the heat treatment, etc. The lens layer 62 having the convex portion 63 may be formed by transferring the shape of the convex portion 75 in the anisotropic etching step shown in FIG. In this way, the step shown in FIG. 11 (d) can be omitted. Further, the resist layer 74 may be processed from the resist layer 74 into the shape of the convex portion 75 using, for example, an exposure method using a gray scale mask or an area gradation mask, a multi-step exposure method, and the like. Good.

  Next, as shown in FIG. 11E, a lens layer 64 is formed by depositing an inorganic material having light transmittance and a light refractive index smaller than that of the lens layer 62 so as to cover the lens layer 62. To do. The micro lens ML1 is configured by covering the convex portion 63 of the lens layer 62 with the lens layer 64. Then, by forming the lens layer 64 with substantially the same thickness on the lens layer 62, the convex portion 65 reflecting the shape of the convex portion 63 is formed on the surface of the lens layer 64. Although depending on the state where the material of the lens layer 64 is attached, the diameter F2 of the convex portion 65 is not less than the diameter F1 of the convex portion 63 (see FIG. 9), and the thickness H4 of the convex portion 65 is the depth H2 of the convex portion 63. This is as follows (see FIG. 10).

  Also in this embodiment, as described above, the convex portion 65 reflecting the shape of the convex portion 63 is formed on the surface of the lens layer 64 by depositing the material of the lens layer 64. Therefore, after the lens layer 64 is formed thicker and the unevenness on the surface is alleviated, the photolithography process and the heat treatment process are performed as compared with the case where the convex portions 65 are formed in the same process as in FIGS. And an etching step can be eliminated. Thereby, since productivity can be improved, cost competitiveness can be improved.

  Next, as shown in FIG. 11 (f), an inorganic material having a light transmission property and having a light refractive index similar to that of the substrate 61 is deposited so as to cover the lens layer 64. Form. Then, a planarization process is performed on the planarization layer 66. The microlens ML <b> 2 is configured by covering the convex portion 65 of the lens layer 64 with the planarizing layer 66. As described above, the microlens array substrate 60 is completed.

(Third embodiment)
<Electronic equipment>
Next, an electronic apparatus according to a third embodiment will be described with reference to FIG. FIG. 12 is a schematic diagram illustrating a configuration of a projector as an electronic apparatus according to the third embodiment.

  As shown in FIG. 12, a projector (projection display device) 100 as an electronic apparatus according to the third embodiment includes a polarization illumination device 110, two dichroic mirrors 104 and 105, and three reflection mirrors 106 and 107. , 108, five relay lenses 111, 112, 113, 114, 115, three liquid crystal light valves 121, 122, 123, a cross dichroic prism 116, and a projection lens 117.

  The polarization illumination device 110 includes a lamp unit 101 as a light source composed of a white light source such as an ultra-high pressure mercury lamp or a halogen lamp, an integrator lens 102, and a polarization conversion element 103. The lamp unit 101, the integrator lens 102, and the polarization conversion element 103 are disposed along the system optical axis Lx.

  The dichroic mirror 104 reflects red light (R) and transmits green light (G) and blue light (B) among the polarized light beams emitted from the polarization illumination device 110. Another dichroic mirror 105 reflects the green light (G) transmitted through the dichroic mirror 104 and transmits the blue light (B).

  The red light (R) reflected by the dichroic mirror 104 is reflected by the reflection mirror 106 and then enters the liquid crystal light valve 121 via the relay lens 115. The green light (G) reflected by the dichroic mirror 105 enters the liquid crystal light valve 122 via the relay lens 114. The blue light (B) transmitted through the dichroic mirror 105 is incident on the liquid crystal light valve 123 via a light guide system composed of three relay lenses 111, 112, 113 and two reflection mirrors 107, 108.

  The transmissive liquid crystal light valves 121, 122, and 123 as light modulation elements are disposed to face the incident surfaces of the cross dichroic prism 116 for each color light. The color light incident on the liquid crystal light valves 121, 122, 123 is modulated based on video information (video signal) and emitted toward the cross dichroic prism 116.

  The cross dichroic prism 116 is configured by bonding four right-angle prisms, and a dielectric multilayer film that reflects red light and a dielectric multilayer film that reflects blue light are formed in a cross shape on the inner surface thereof. Yes. The three color lights are synthesized by these dielectric multilayer films, and the light representing the color image is synthesized. The synthesized light is projected onto the screen 130 by the projection lens 117 which is a projection optical system, and the image is enlarged and displayed.

  The liquid crystal light valve 121 is arranged with a gap between a pair of polarizing elements arranged in crossed Nicols on the incident side and emission side of colored light. The same applies to the other liquid crystal light valves 122 and 123. The liquid crystal light valves 121, 122, and 123 are those to which the liquid crystal device 1 or the liquid crystal device 1A according to the above embodiment is applied.

  According to the configuration of the projector 100 according to the third embodiment, the liquid crystal device 1 is provided that can obtain a bright display and excellent display quality even when the plurality of pixels P are arranged with high definition. Thus, it is possible to provide the projector 100 that can display an image having a bright and favorable contrast.

  The above-described embodiments merely show one aspect of the present invention, and can be arbitrarily modified and applied within the scope of the present invention. As modifications, for example, the following can be considered.

(Modification 1)
In the liquid crystal devices 1 and 1A described above, the microlens array substrates 10 and 60 are provided on the counter substrates 30 and 30A, but the present invention is not limited to such a form. For example, the element substrate 20 may include the microlens array substrates 10 and 60.

(Modification 2)
In the microlens array substrates 10 and 60 described above, the lens layers 13, 15, 62, and 64 are made of an inorganic material, but the present invention is not limited to such a form. For example, the lens layers 13, 15, 62, and 64 may be made of a resin material. However, the material of the lens layers 13, 15, 62, and 64 is preferably an inorganic material that is superior in heat resistance and weather resistance as compared with a resin material.

(Modification 3)
In the microlens array substrate 10 described above, the central portion of the concave portion 12 is a curved surface portion, and the peripheral portion surrounding the curved surface portion is an inclined surface, but the present invention is not limited to such a form. For example, a flat portion may be provided at the center of the concave portion 12, the periphery of the flat portion may be a curved surface portion, and the peripheral portion surrounding the curved surface portion may be an inclined surface.

(Modification 4)
Electronic devices to which the above-described liquid crystal devices 1 and 1A can be applied are not limited to the projector 100 and the video camera 200. The liquid crystal device 1 is, for example, a projection-type HUD (head-up display), a direct-view type HMD (head-mounted display), an electronic book, a personal computer, a digital still camera, a liquid crystal television, a viewfinder type video camera, or a car navigation system. It can be suitably used as a display unit of an information terminal device such as a system, electronic notebook, or POS.

  DESCRIPTION OF SYMBOLS 1,1A ... Liquid crystal device (electro-optical device) 10, 60 ... Micro lens array substrate, 11, 61 ... Substrate, 11a, 61a ... Surface (first surface), 12 ... Recess (first recess), 13 , 62 ... lens layer (first translucent layer), 13a, 63a ... lens surface (first lens surface), 14 ... concave portion (second concave portion), 15, 64 ... lens layer (second translucent layer) Layer), 15a, 65a ... lens surface (second lens surface), 63 ... convex portion (first convex portion), 65 ... convex portion (second convex portion), 66 ... flattening layer (third layer) Light transmitting layer), 20... Element substrate (first substrate), 30, 30A... Opposite substrate (second substrate), 40... Liquid crystal layer (electro-optical layer), 100. Axis (first axis), C1, G1 ... position (first position), C2, G2 ... position (second position), K1, V1 ... normal line (first Normal), K2, V2 ... normal (second normal), P ... pixel, S ... shielding portion, T ... opening.

Claims (5)

A substrate having a first recess on a first surface;
The first lens surface is provided so as to cover the first surface and embed the first concave portion, and is formed on the surface so as to overlap the first lens surface in plan view with the first lens surface in contact with the first concave portion. A first translucent layer having a second recess,
A second light-transmitting layer provided to cover the first light-transmitting layer and to embed the second recess, and to have a second lens surface in contact with the second recess and a substantially flat surface; With
A depth of the second recess is equal to or less than a depth of the first recess;
The diameter of the second recess is not more than the diameter of the first recess,
The refractive index of the first light transmitting layer is larger than the refractive index of the substrate,
The refractive index of the second light transmitting layer is greatly than the refractive index of the first light-transmitting layer,
The straight line connecting the center of the front Symbol first lens surface in contact with said first recess and a center of the second lens surface in contact with the second recess and the first axis,
The normal of the tangent plane at the first position of the first lens surface is the first normal,
A normal line of a tangent plane at a second position of the second lens surface, and a straight line passing through the first position is defined as a second normal line.
Light obliquely incident on the first axis from the substrate side and incident on the first position of the first lens surface from the first axis side with respect to the first normal line Then, the light transmitted through the first light-transmitting layer and incident on the second lens surface on the first axis side with respect to the second normal line is relative to the first axis. A microlens array substrate characterized in that the light is refracted by the second lens surface opposite to the side refracted by the first lens surface, and the direction of the light is changed in the direction of the first axis. . The microlens array substrate according to claim 1,
The microlens array substrate, wherein the first concave portion and the second concave portion have inclined surfaces inclined from an end portion toward a central portion in a sectional view.
A substrate having a first surface;
A first translucent layer provided on the first surface and having a first convex portion having a first lens surface formed on the surface;
A second light-transmitting surface that is provided so as to cover the first light-transmitting layer and is formed on the surface so that a second convex portion having a second lens surface overlaps the first convex portion in plan view. Layers,
A third light-transmitting layer provided to cover the second light-transmitting layer and having a substantially flat surface,
The height of the second convex portion is not more than the height of the first convex portion,
The diameter of the second convex part is not less than the diameter of the first convex part,
The refractive index of the first light transmitting layer is larger than the refractive index of the substrate,
The refractive index of the second light transmitting layer is smaller than the refractive index of the first light transmitting layer,
The refractive index of the third light transmitting layer is minor than the refractive index of the second light transmitting layer,

A straight line connecting the center of the first lens surface of the first convex portion and the center of the second lens surface of the second convex portion is a first axis,
The normal of the tangent plane at the first position of the first lens surface is the first normal,
A normal line of a tangent plane at a second position of the second lens surface, and a straight line passing through the first position is defined as a second normal line.
Light obliquely incident on the first axis from the substrate side and incident on the first position of the first lens surface from the first axis side with respect to the first normal line Then, the light transmitted through the second light-transmitting layer and incident on the second lens surface on the first axis side with respect to the second normal line is relative to the first axis. A microlens array substrate characterized in that the light is refracted by the second lens surface opposite to the side refracted by the first lens surface, and the direction of the light is changed in the direction of the first axis. . A first substrate;
A second substrate disposed to face the first substrate;
An electro-optic layer disposed between the first substrate and the second substrate,
Electro-optical device characterized in that it comprises a microlens array substrate according to the second substrate to any one of claims 1 to 3. An electronic apparatus comprising the electro-optical device according to claim 4 .

Images