TWI269945B - Lithographic apparatus, device manufacturing method and device manufactured thereby - Google Patents

Abstract

A bellows used to connect two sealed compartments of the lithographic apparatus or a compartment and a pump, comprises a first section having smooth helical corrugations and a second section that can accommodate the longitudinal movement caused by relative rotation of the ends of the first section. The second section may be a mirror image of the first section or one or more sub-sections of circumferential corrugations.

Description

1269945 (1) Di, invention description, U Ming π Ming Ying: The technical field of the invention 'Previous technology, content, embodiments and drawings are simple descriptions» The present invention relates to a lithography projection apparatus, comprising: a radiation system for supplying a radiation projection beam; a support structure for supporting the patterned member, the patterned member having a function of patterning the projection beam according to a desired pattern; And a projection system for projecting the pattern beam onto a target portion of the substrate. The patterned member used in this document is broadly interpreted as a member for patterning a profile corresponding to a pattern that is created in the target portion of the substrate to enter the μ beam; in this case, ''light can also be used Valve, the name. Generally, 5, the pattern corresponds to a specific functional layer of one of the devices generated in the target portion, such as an integrated circuit or other device (see below), examples of such patterned members include: The concept of a mask is well known to lithography and includes mask types such as binary and phase shifts and attenuated phase shifts, as well as various composite mask types. This mask can be placed in the radiation beam. Depending on the pattern on the mask, the radiation on the mask produces a selective transmission (if a transmissive mask) or a reflection (if a reflective mask). In the case of a mask, the support structure is generally a A masking station to ensure that the mask is held in a desired position into the radiation beam and that it can be moved relative to the radiation beam as needed. % - Programmable mirror array. An example of this device is a moment a addressable surface having a viscoelastic control layer and a reflective surface. The basic principle of the device is: for example, the address region of the reflective surface reflects incident light (2) 1269945 into diffracted light, The address region reflects the incident light into undiffracted light. The undiffracted light can be filtered from the reflected beam by a suitable filter to leave only the diffracted light; in this way, the address of the surface addressable according to the matrix The pattern transforms the beam into a pattern. An alternative embodiment of a programmable mirror array employs a matrix configuration of micromirrors, each of which is individually edged by application of a suitable local electric field or by piezoelectrically actuating members. The axis is tilted. Furthermore, the mirror is also addressable by the matrix, so that the displaced mirror will reflect the incoming radiation beam in a different direction for the unaddressed mirror; in this way, the matrix can be addressable The mirrored address pattern is patterned by the reflected beam. The desired matrix address can be performed using appropriate electronic components. In both cases, the patterned member can include one or more A programmable array of mirrors can be used to perform the required matrix addressing using appropriate baffle components. For example, see US Patent Nos. 5,296,89 1 and 5,523,193 and the patent application. Case 98/38597 and side 8/33〇卿', above: Each case is incorporated herein by reference to f. In the -formable mirror array dimorphism, the support structure is implemented as a frame or a table. For example, the sigma-type LCD array can be used as a fixed or movable type. For an example of this configuration, see U.S. Patent No. 5,229,872, the disclosure of which is incorporated herein by reference. The structure is implemented as follows; the second is fixed or movable. u is on demand.. ^ b text, the rest can be in a specific position special # f+ contains a mask and mask △ ♦ such as and % pin The example is described; however, the general principles described in these cases can be seen from the broad range of the above-mentioned patterned components. For example, a lithographic projection device can be used to fabricate an integrated circuit, in which case the patterned member can produce a circuit pattern corresponding to a respective layer of the IC, and the pattern can be imaged onto a layer of radiation-sensitive material ( A target (such as one or more crystal grains) on one of the substrates (tantalum wafer). In general, a single wafer will contain a complete network of adjacent targets that are continuously irradiated via the projection system in a single pass. In today's devices, a masking pattern on a masking table can be used to distinguish between two different types of machines. In a type of lithography projection device, by exposing the entire mask pattern to the target portion, the target portion is photographed; this is followed by f stepper) 〇t ^ ^ ^ ^ ^ # description (step-and- In an alternative apparatus of the apparatus, the concavity pattern is progressively scanned under a projection beam in a given reference direction (scanning direction) while simultaneously scanning the substrate table parallel or anti-parallel to the direction, thereby irradiating Each target part; because of the general t, the fish + σ projection system will have a magnification Μ (usually < ι), the scanning speed of the substrate table V will be rabbit access 4*, Λ / Γ + ^ rod for amplification Multiply the multiplier by the scanning speed of the concealer. 'More on the lithography device. 1 See the U.S. Patent No. 6,046,79, the disclosure of which is incorporated herein by reference. In a method of manufacturing a lithographic projection device, a pattern (such as in a mask) is imaged at least partially by a layer of radiation sensitive material (resistance). On the material. Prior to this imaging step, the substrate can be subjected to various procedures such as primer, bismuth and bismuth coating and soft baking. After the exposure, the substrate can be subjected to measurements such as 皋 & 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 Program 1269945

(4) As a basis for patterning individual layers of devices such as ICs, the patterned layer can then be subsequently scheduled to complete a separate layer such as etching, ion implantation (doping), metallization, deuteration, Various procedures such as chemical mechanical polishing. If several layers are required, the entire program or its changing program must be repeated for each new layer. Finally, an array of devices is present on the substrate (wafer), and the devices are then separated from each other by techniques such as cutting or sawing, at which point the device can be mounted on the body and connected to Needle material. Such procedures: For further information, see “Microchip fabrication: Practical guidelines for the treatment of germanium conductors (M1CI〇Chlp Fabncatl〇n: a Pracdcal Gmde t〇Semiconductor Processing)”, Chu Yi r, 珩 2nd edition, Peter van Zant, McGrawmn, 1997 ' ISBN 〇. 〇 7_〇 6725 〇-4, which is incorporated herein by reference. For the sake of simplicity, the projection system can be collectively referred to as "lens, but, but for the sake of simplicity. This name should be interpreted broadly to cover various types of projection systems, such as refractive optical devices, reflective optical devices, and catadioptric systems. The system may also include components that operate according to any type of design that is used by any of the above-mentioned adults, U, U, U, U, U, U, U, U, U, U, U, U, U, U Private _ slice 'and' lithography device may be a stage with two or more substrate tables (and / or two or more mask tables), in the device, can be used in parallel?侗 △ ^ f 匕 夕 夕 十 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订 订The two-stage lithography device, such as Shishi, and Guangxuan, such as the 彳田 于 in Wu Guo patent 5,969 44 98, 9 said, in each case to "image in order to image smaller features, to use shorter waves in the projection beam Also, night-time uses ultraviolet (1) V) or deep ultraviolet (DUV) to 1269945 (5) 193 nm to 2 〇 nano Λ (four) with 157 or 126 nm _ ruling or) - 初羊 "士的极Ultraviolet radiation (euv). It is also proposed to use a device with a charged y's inch and an electron beam. All of the proposed radiation types are large and air-absorbed, so the device using 157 or 126 nm radiation must be a class #β々々Jr ^ If you want to wash the gas and rinse it, the EUV and the device with the particle beam must be emptied to the exact standard. It is therefore necessary to surround these devices in an airtight or vacuum tight compartment. Passing, charging, and enclosing different components of the device, such as a Korean source, a lighting system, and a 19-channel system, in separate compartments. Then, it is necessary to provide an airtight or vacuum tight connection having a large diameter between the intervals through which the beam is to be delivered. φ requires that the @ compartment be connected to the vacuum or purge gas supply and exhaust system. -' In all lithography devices, it is important to at least isolate the mask, substrate and projection I.. from vibration, and this requirement only increases when the characteristic size to be imaged is reduced. It is further important to isolate the different compartments from stresses, forces and moments caused by relative movements such as thermal expansion, vibration and mounting tolerances. Therefore, it is necessary to mechanically isolate the different compartments of the device from each other, and in particular to isolate, for example, a chest that is a source of vibration. It is therefore known to use metal telescopic joints to connect between the compartments of an evacuated or cleaned micro-shadow device and to the vacuum conduits of the pump, which may be in various forms but generally rounded or It has a conical shape and has a pleat portion perpendicular to the axis of the telescopic joint. By making a large enough pleat portion and a thin telescopic rib wall, the relative longitudinal and lateral movement of the telescopic joint to its end point and along the angular movement of the cylinder or the line perpendicular to the axis of the cone can be produced. Low-10 - 1269945 (6) Captured the strength of _ recommended. Low stiffness prevents vibration transmission through the telescopic joint, but conventional telescopic joints have stiffness for rotational motion along the cylinder or conical axis, especially if the telescopic joint is large enough to accommodate a projected beam or a large air or purge gas The situation of the flow is especially true. Thus, the conventional telescopic section maintains a poor transmission path of torsional vibration, force and moment. It is an object of the present invention to provide a telescoping section for use in a lithography apparatus that is capable of isolating oscillating vibrations, forces and/or moments. This and other objects are achieved in accordance with a lithography apparatus comprising: - a radiation system for supplying a radiation projection beam; - a support structure for a branch patterned member, patterned The component has a function of patterning the projection beam according to a desired pattern; a substrate table for holding a substrate;

a projection system for projecting a pattern beam onto a substrate, wherein at least a portion of the radiation system, the support structure, the substrate table, and at least one of the projections are contained in - a sealed chamber towel, and the load-retracting joint provides a combined channel between the chamber (4) and the other chamber m having a longitudinal axis, characterized by the expansion joint package < a: segment L having a The plurality of blessings of the longitudinal axis extending in a spiral shape enable the opposite ends of the scorpion scorpion to rotate relative to each other; and: the t-th segment can be changed in length to compensate for the length of the first segment (5) The spiral pleats in the middle allow the end point to undergo a phase transition, but this rotation will cause the first length to be "transformed." To this end, the first & ... is provided to keep the telescopic section a fixed full length. The first segment of the network -11 - 1269945 degree change is coupled with the rotation, but the second segment decouples it. In a specific range, the telescopic "end. point total, a total of six self-twisting degrees can be translated independently of each other. ^ Rotating' expansion joints can have low stiffness in each of these degrees of freedom to prevent vibration from passing through the expansion joint. The smooth pleat portion distributes the torsional stress generated by the pleated portion evenly over the entire expansion joint. The stress is not concentrated at a single point, thereby reducing the overall wear of the expansion joint, and thus the expansion joint is less likely to leak. 'In high-precision applications' especially for users, the radiation loss of gas is a major problem. The device must be thoroughly cleaned before use, and the smoothness of the device is easier to clean and more effectively clean than the fold. The pleat portion preferably has a large radius of curvature and is, for example, at least five times larger than the thickness of the stretchable raft material. The hop portion may be sinusoidal and the peaks and valleys preferably travel parallel to each other. The second segment may be a segment of the helical pleat portion corresponding to the first segment but reversely wound, or a segment of the circumferential pleat portion. The first segment should have at least one basic form of rotational symmetry. According to another aspect of the present invention, there is provided a device manufacturing method comprising the steps of: providing a radiation sensitive material at least partially covering a substrate; providing a light projecting beam using a sputtering system; - using a patterned member to impart a pattern to the profile of the projected beam; - projecting the conditioned pattern beam onto the target portion of the (4) sensitive material layer, characterized by the following steps: providing a telescopic section that will be used to surround The radiation system, the support knot -12 1269945 (8) invention: at least one of the at least one part of the splicing page is closely connected, the expansion joint is provided with a structure suitable for accommodating the first segment, The substrate table and the partition between the compartment and the other compartment or pump of the projection system have a first segment of the spiral pleat portion and a second segment of the length change. Although specifically described herein, the root gentleman T艨 The device of the present invention is used in the manufacture of 1C, and it should be clearly understood that the device has the other possible applications, such as the use of the integrated optical system, the D, and the dead magnetic domain memory. Guide and detection type , liquid crystal display panel, thin film magnetic head, etc. Those skilled in the art understand that in the scope of such alternative applications, if any "mask", "wafer or "grain" name is used in the text,丨LV Street A » πσ ^ J k Knife is replaced by the more general terms “mask,, “substrate” and “target”. This document includes “boom” and “bundle” to cover all Types of electromagnetic radiation include ultraviolet radiation (such as having a wavelength of 365, 24 8, 193, 157, or 126 nm) and EUV (extreme ultraviolet radiation, such as having a wavelength of 5 to 2 nanometers), and particle beams such as ions. EMBODIMENT OF THE INVENTION Embodiments of the present invention will now be described, by way of example only, with reference to the accompanying drawings, in which: FIG. 1 illustrates a lithographic projection apparatus in accordance with an embodiment of the invention; FIGS. A perspective view of the telescopic section in the middle. Corresponding symbols in the figures represent corresponding elements. Embodiment 1 FIG. 1 is a view schematically showing a lithography projection apparatus according to a specific embodiment of the present invention, which comprises a radiation system Ex, 1L for supplying a radiation projection beam ρβ (such as EUV radiation) and In this particular case, the radiation source 丄a is also included; -13 - 1269945 1 j mmmm The first object stage (mask stage) MT is provided with a mask holder for holding a mask Μ A (such as a mask) And connected to the first positioning member to accurately position the mask relative to the item PL; the first object table (substrate table) WT, which is provided with a substrate holder for holding a substrate W (such as a coating) a resistive germanium wafer) and coupled to the second positioning member to accurately position the substrate relative to the item PL; a projection system ("lens,") PL (such as a mirror) for An irradiated portion of the mask MA is imaged onto a target portion C of the substrate W (e.g., comprising one or more dies). As described herein, the device is reflective (i.e., has a reflective mask) 'but it may, for example, also be transmissive (with a transmissive mask). Alternatively, the apparatus may employ another type of patterned member, such as a programmable mirror array of the type described above. Source LA (e.g., a discharge or laser generated plasma source) produces a beam of radiation, such as a direct feed of the beam. Into or after traversing a control member (such as a beam of amplifiers Ex) into an illumination system (illuminator) IL, which may include a 5-week integral member AM to set the intensity distribution outside the beam and/or the inner diameter In addition, it is generally referred to as σ-outer and σ_in. In addition, it generally contains various external components, such as an integrator and a concentrator c. In this way, the hand is placed on the mask MA. The beam PB has the required uniformity and intensity distribution in its profile. It should be noted that for the diagram!, the source LA may be located in the housing of the lithographic projection device (for example, if the source LA is a mercury lamp), However, it is also possible to move away from the lithographic projection device and introduce the generated beam into the device (for example, (10) 1269945, the invention says that the page is supplemented by an appropriate guide lens; the source la is a cross-excimer laser Time is a silly a program. And the scope of the patent application covers both schemes. The bundle PB is then (4) held at the mask-price of the mask MA intersects the wearer ^^ traverses the mask core and then passes the lens to focus the bundle on the substrate W - the target red. With the second positioning member (and interferometric member IF) as an aid, the substrate table WT can be accurately moved, for example, to position different target portions C in the path of the beam PB. After the mask database mechanically removes the mask MA, or during scanning, the first positioning member can be used to accurately position the mask MA relative to the beam_path. - generally by - (four) (four) __ positioning) and _ short stroke The module (fine positioning) acts as an aid to the object table MT, 'playing movement, and the figure is not clearly displayed. In the case of a wafer stepper (rather than a stepper and scanning device), the mask can be connected to only a short-stroke actuator, or it may be stationary. The described device can be used in two different ways: In step mode, the mask is still substantially static, and the overall mask image is projected once (ie a single "flash,") in a target section. On C, the substrate σ WTI^ is shifted in the ^ and / or y directions, whereby a different target portion C is irradiated with the beam pB. 2. In the scan mode, approximately the same situation is applied, but the difference is not Instead of exposing a given target portion c with a single "flash", the mask table MT can be moved in a given direction (so-called scanning direction, such as the ^ direction), causing the projection beam PB to be scanned in a mask image. Above; at the same time, the substrate table WT moves at the same speed or in the opposite direction at the speed V = M>, where Μ is the magnification of the lens PL (usually 1/4 or 1/5), which can be used for this purpose - 15 - 1269945

The Lgy-cable method exposes a large target c without sacrificing resolution. Although not shown in Figure 1, the beam path of the device is evacuated to a depth that the total pressure must be as low as 1 -6 mbar and where the hydrocarbon has a partial pressure of 1 〇 4 or ί ο 9 mbar. The purpose of this stringent requirement is to prevent contamination of mirrors, masks, and wafers. In order to be able to achieve and maintain this degree of vacuum, the segments that are worn, such as the radiation source LA, the illumination system IL, the mask stage, the projection system PL, and the substrate stage, are held in separate vacuum enclosures that are connected to the vacuum enclosure A vacuum pump of the appropriate type and capacity. Isolation expansion joints are used to connect the various components and their pumps together, to allow the projection beam, the measurement beam or gas flow to pass, and to prevent vibration, force and torque from being transmitted to and between the compartments. In order to prevent the transmission of vibration, force and moment in the direction of torsion (Rz), longitudinal (Z) and lateral (χ, γ) and angular (R\r) directions with respect to the axis of the expansion joint, the isolation used in the present invention The telescoping section includes at least one segment having a helical weight portion and at least one segment for accommodating longitudinal movement. The following description is for the XYZ orthogonal coordinate system, where the z-axis is the longitudinal axis of the unstressed expansion joint, and one end of the expansion joint is located in the χγ plane. The torsional motion in this coordinate system can be called Rz. The coordinate system is for convenience of description only and should not imply that the telescoping section has any particular orientation with respect to the ground or any other coordinate system defined in the device. Also, the description of a longitudinal axis of the telescoping section should not mean that the telescopic section needs to be cylindrical or have a linear longitudinal axis. Figure 2 shows a first example of an isolated telescoping section 2 that is not usable in the present invention. The isolated telescoping section 20 is generally cylindrical and comprises three movement receiving sections: -16 - 1269945

/ has a segment 21 of the smooth spiral pleat portion 22, and has segments 25, 24 outside the circumferential wave portions 25, 26. A flat rounded end portion 27, a Zq is provided to facilitate the mounting of the telescopic joint to a compartment or vacuum conduit, having eight pleat portions, each pleat portion extending substantially a half turn around the longitudinal axis of the telescopic joint, utilizing a telescopic joint 2〇 forms a closed passage from one of the vacuum chambers to the other of the vacuum chambers, in this embodiment the longitudinal axis of the telescopic joint corresponds to the longitudinal axis of the passage. The spiral pleat portion 22 is 30 with respect to the longitudinal axis of the telescopic joint 20. To 60. Compared with the 45 ° angle configuration. If a torsional (Rz) force is applied between the endpoints 2, 7 and 8,

The helical pleat portion 22 of the middle section 21 will permit a relative rotational movement of the outer segments 23, 24, but this will change the length in the longitudinal (Z) direction. However, since the length variation is accommodated by the circumferential pleating portions 25, 26 of the outer segments ^, 24, there is no longitudinal movement of the private points 23, 24. Basically, although the helical pleats 22 couple the Z and Rz motions, the outer segments decouple these motions by accommodating the Z motion.

It is understood that the size of the telescopic section and the size and number of various pleat sections may be changed according to the required vacuum path size and the range of motion that must be accommodated. Figure 3 depicts one of the features of the present invention. Isolation and expansion, the first example, this expansion joint has the same function as the expansion joint 2〇 but = a radius larger than its length, the expansion joint 3〇 element performs the same function as the expansion joint, but has the same reduction The number of the cymbal, the telescopic section 3 〇 has a ten 棬 皮 卩, and each pleat portion extends approximately half a circle around the longitudinal axis. Figure 4 - A third example of the isolation of the telescopic section 4 from one of the members of the present invention: in the section 4, two spiral segments are provided, each of which has a spiral segment 41, and two have an extension of the quarter-turn of the eight The spiral fingers are 44, 44. The spiral pleats 43 of τ'(4) & 41, 42 are turned in the opposite direction, -17-1262945

The middle is clockwise and the other is counterclockwise. In this way: a screw (four) segment has the effect of accommodating the longitudinal movement, which can be explained by reference to an example of a clockwise torque applied to the mounting flange 49, wherein the mounting flange 48 is fixed. Under the influence of this force, the spiral segment (4) roll: and the satin contraction, while the spiral segment 42 will "loose, and extend longitudinally. If the two spiral segments have the same configuration but are mirror images, the expansion joint 40 The full length will be maintained. For the sake of convenience, the cylindrical portions C, 47 are provided in the telescopic section 4, and it is also conceivable that the telescopic section 40 will accommodate the two ends by the rotation of the intermediate portion 45 with respect to the end point. A relative Z displacement, the compression of the expansion joint will cause the two 'red parts to be wound up, the two will cause the middle part to rotate counterclockwise, of course, can also accommodate the combination of torsional and longitudinal movement. For the convenience of clothing and as needed The full length of the telescopic joint is set, and the cylindrical portions 45, 46, 47 are slanted in the telescopic joint 4, and it can be seen that the spiral pleat portions 44, 44 are formed as inserts in a nominal cylindrical surface and have Sharp corners. Figure 5, ', can not be used in the fourth example of the isolated expansion joint $ 本 of the present invention, this example has two spiral segments 51, 52 and a middle segment 55, in each spiral 1 In the middle, there are fifteen spiral pleats with a reverse rotation that extends approximately half a turn. The wave portions 53, 54 and a middle portion 55 of the circumferential pleat portion 56. The reversely wound "spiral segments 51, 52 have functions as the third example, but the middle & accommodates the longitudinal (z), lateral The additional capability of (χ & gamma) and angular U motion, the middle section 55 also reduces stiffness for torsional (Rz) motion by accommodating some longitudinal movements that rotate at one end. Figure 6 illustrates a fifth example of an isolated expansion joint 60 that may not be used in the present invention. -18 - (14) 1269945

The expansion is similar to the third example (Fig. 4) in that it has a reversely "wound," snail, 62, but has eight more arcuate and substantially half-turn pleat portions 63, 64. And providing a cylindrical end segment 65, a for installation. As shown in Figures 2 to 6, the pleat portion is smooth and has a large radius of curvature compared to the thickness of the expansion joint material such as metal. The peaks and valleys of the tobo portion travel parallel to each other and form the same angle with respect to the longitudinal axis of the telescopic joint.

Any convenient form of termination is placed on either or both ends

μ It should be noted that although the example of a generally cylindrical isolated telescopic joint has been described, the telescopic section may have other forms. For example, the basic form of the telescopic section (i.e., the stacked shape of the pleat portion) may have an oval shape, a square shape, or other polygonal cross-section. In general, the basic form of the telescopic section may be a pyramid which represents the shape of the side points having similar, equal and parallel polygons and the sides of the parallelogram; a flat head pyramid 'which represents similar but not equal The shape of the end point of the polygon; or a conical shape, one of which is a core-restricted example. Also, the functional segments of the telescoping section may be adjacent or separated by segments that do not require low stiffness and are in any conventional form. It is also possible to make all of the isolated expansion joints described above from an elastic material such as metal. One of the currently preferred manufacturing methods of these devices is an electrical shape, by which a suitable shape of a form is formed and then electroplated. The technique covers a metal layer of a suitable thickness 'and then removes this form, such as by dissolving, melting or mechanical components, to leave a separate metal layer. While the invention has been described with respect to the specific embodiments of the present invention, it is understood that the invention may be practiced otherwise. -19 - 1269945 (15) Invention said to the table page Component symbol table 20 isolation expansion joint 2 1 middle pleat portion 22 spiral pleat portion 23 outer section 24 outer section 25 circumferential pleat portion 26 circumferential pleat portion

27 Flat circumferential end 28 Flat circumferential end 30 Isolated telescopic joint 40 Isolated telescopic joint 4 1 Spiral section 42 Spiral section 43 Spiral pleated part 44 Spiral pleated part 45 Cylindrical part 46 Cylindrical part

47 Cylindrical part 48 Mounting flange 49 Mounting flange 50 Isolation expansion joint 5 1 Spiral section 52 Spiral section 53 Spiral pleated part 54 Spiral pleated part 55 Middle section 56 Circumferential pleated part 60 Isolation expansion joint -20 - 1269945 (16) 6 1 Spiral section 62 Spiral section 63 Circular pleat portion 64 Circular pleat portion 65 Cylindrical end section 66 Cylindrical end section AM adjustment member C Target section C concentrator

Ex Radiation System (Beam Amplifier) IF Interferometric Component IL Radiation System (Lighting System) IN Integrator L A Roller Source MA Mask MT First Object Table (Mask Table) PB Projection Beam PL Projection System (Lens)

Rx angular direction Rv angular direction Rz torsional direction W Substrate WT second object table (substrate table) X Lateral direction Y Lateral direction Z Longitudinal direction -21 -

Claims (1)

126^4^18206 Patent Application Chinese Patent Application Range Replacement (June 95) Pickup, Patent Application Range: .,:乂乂]心 fi 1 · A lithography projection device, including a radiation system, For providing a radiation projection beam; a support structure for supporting a patterned member, the patterned member having a pattern of the projection beam according to a desired pattern; a substrate table for holding a substrate a projection system for projecting the patterned beam onto a target portion of the substrate; wherein the radiation system, the support structure, the substrate table, and at least one of the projection systems At least a portion is received in a sealed chamber and a telescoping section is provided to provide a closed passage between the sealed chamber and another chamber or a pump, the passage having a longitudinal axis; The section includes: a first segment having a plurality of smooth pleat portions extending helically about the longitudinal axis such that opposite ends of the first segment are rotatable relative to each other; and a second segment adapted Change the length to make up The length of the first segment change. 2. The device of claim 1, wherein the second segment has a plurality of smooth pleat portions extending helically about the longitudinal axis opposite the direction of the smooth pleat portions of the first segment. 3. The device of claim 2, wherein the second segment is substantially a mirror image of the first segment. 4. The device of claim 1, wherein the second segment has 1269945 The longitudinal line is a plurality of smooth pleats extending vertically. 5. The device of claim i, 2, 3 or 4, further comprising a third segment' wherein the third segment has a plurality of smooth pleat portions extending perpendicularly to the longitudinal axis. 6. A device as claimed in claim 1, 2, 3 or 4, wherein the peaks of the smooth chopping portions are parallel to the valley portions. 7. The device of claim 1, 2, 3 or 4, wherein the peaks and valleys of the smoothed solitary portion are at the same angle with respect to the longitudinal axis of the telescopic joint. 8. The device of clause 1, 2, 3 or 4 of the scope of the invention, wherein the smooth pleat portion has a mean diameter compared to the thickness of the stretch joint material. 9. A Laibo section of the patent range 1 and 2, for example, is sinusoidal. 10·::: The device of the second, third or fourth patent range, in which the first paragraph /, has " in four to thirty smooth inspections. = The setting of the item, where the == (d) extends a quarter of a turn around the longitudinal axis. 13. If the scope of application for patents is i, 2, the structure includes - the mask is supported by the support, and the X is supported (4) as in the scope of the patent application 2, the system contains the radiation source. The shame of the staff, the radiation system 1269945 15. A method of fabricating an integrated circuit comprising the steps of: - providing a substrate for at least one of the substrates of the substrate; and arranging the layer of radiation sensitive material; Providing a radiation projection beam using a radiation system; - applying a pattern to the profile of the projection beam using a patterning member; - projecting the patterned radiation beam onto a target portion of the layer of radiation-sensitive material, characterized For the following steps: Providing: a total-stretching section for having one of at least one of the portions for enclosing the radiation system, the support junction, and the projection system having a compartment to be separated from another compartment or The pumps are electrically connected to each other, and the telescopic section 21 includes a first section of the smooth pleat portion and a second section adapted to accommodate the first length change.