TWI266950B - Method, system, and computer program product for improved trajectory planning and execution - Google Patents

Method, system, and computer program product for improved trajectory planning and execution

Info

Publication number
TWI266950B
TWI266950B TW092132327A TW92132327A TWI266950B TW I266950 B TWI266950 B TW I266950B TW 092132327 A TW092132327 A TW 092132327A TW 92132327 A TW92132327 A TW 92132327A TW I266950 B TWI266950 B TW I266950B
Authority
TW
Taiwan
Prior art keywords
trajectory
time
profile
trajectory planning
execution
Prior art date
Application number
TW092132327A
Other languages
English (en)
Chinese (zh)
Other versions
TW200422773A (en
Inventor
Daniel N Galburt
Todd J Bednarek
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of TW200422773A publication Critical patent/TW200422773A/zh
Application granted granted Critical
Publication of TWI266950B publication Critical patent/TWI266950B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Control Of Position Or Direction (AREA)
  • Numerical Control (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW092132327A 2002-11-20 2003-11-18 Method, system, and computer program product for improved trajectory planning and execution TWI266950B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/299,855 US6845287B2 (en) 2002-11-20 2002-11-20 Method, system, and computer program product for improved trajectory planning and execution

Publications (2)

Publication Number Publication Date
TW200422773A TW200422773A (en) 2004-11-01
TWI266950B true TWI266950B (en) 2006-11-21

Family

ID=32229856

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092132327A TWI266950B (en) 2002-11-20 2003-11-18 Method, system, and computer program product for improved trajectory planning and execution

Country Status (8)

Country Link
US (2) US6845287B2 (enExample)
EP (1) EP1422569B1 (enExample)
JP (1) JP4093950B2 (enExample)
KR (1) KR100627739B1 (enExample)
CN (1) CN100386701C (enExample)
DE (1) DE60325933D1 (enExample)
SG (1) SG105593A1 (enExample)
TW (1) TWI266950B (enExample)

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KR100540588B1 (ko) * 2002-12-27 2006-01-10 삼성중공업 주식회사 모션 제어의 실시간 응답을 위한 궤적발생방법 및 시스템
EP1452920A3 (en) * 2003-02-25 2006-06-21 ASML Netherlands B.V. Device manufacturing method,device manufactured thereby,computer program for performing the method,lithographic apparatus, and robotics system
US7341822B2 (en) 2003-02-25 2008-03-11 Asml Netherlands B.V. Time-optimal setpoint generator in a lithographic apparatus
US20040204777A1 (en) * 2003-04-14 2004-10-14 Alon Harpaz Precision motion control using feed forward of acceleration
US20040236453A1 (en) * 2003-05-22 2004-11-25 Gabor Szoboszlay Method and apparatus for combining and generating trajectories
US7016019B2 (en) * 2003-12-16 2006-03-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060190136A1 (en) * 2005-02-24 2006-08-24 Paragon Technical Services, Inc. Method and system for controlling a manipulator
DE102005061570A1 (de) * 2005-12-22 2007-07-05 Siemens Ag Ermittlungsverfahren für eine lagegeführte abzufahrende Grobbahn
US7919940B2 (en) * 2007-10-21 2011-04-05 Ge Intelligent Platforms, Inc. System and method for jerk limited trajectory planning for a path planner
TWI402641B (zh) * 2009-12-04 2013-07-21 Ind Tech Res Inst 聯結多系統達成多軸同步插值裝置與方法
EP2996003B1 (en) * 2014-09-11 2021-06-30 Robert Bosch GmbH Device and method for moving an object
CN105319989B (zh) * 2015-11-19 2018-06-15 清华大学 一种永磁弹射掩模台弹射区电机出力最小轨迹规划方法
CN106817508B (zh) 2015-11-30 2019-11-22 华为技术有限公司 一种同步对象确定方法、装置和系统
EP3593212B1 (en) * 2017-03-06 2024-09-04 Honeywell Limited Method and apparatus for designing model-based control having temporally robust stability and performance for multiple-array cross-direction (cd) web manufacturing or processing systems or other systems
CN109358492A (zh) * 2018-10-31 2019-02-19 电子科技大学 一种光刻机工件台运动控制方法
CN109782815B (zh) * 2018-12-27 2020-06-19 西安交通大学 基于多轴联动系统的复杂型面自适应测量路径规划方法
CN110207966A (zh) * 2019-06-13 2019-09-06 北京工业大学 一种航空结构多轴随机疲劳载荷下在线损伤评估方法
CN110333722A (zh) * 2019-07-11 2019-10-15 北京电影学院 一种机器人轨迹生成和控制方法、装置及系统
CN113031511B (zh) * 2019-12-24 2022-03-22 沈阳智能机器人创新中心有限公司 一种基于高阶b样条的多轴系统实时引导轨迹规划方法
CN112558427A (zh) * 2020-12-11 2021-03-26 西安工业大学 一种适用于步进扫描投影光刻机的轨迹规划系统及方法
CN113759853B (zh) * 2021-09-18 2023-07-18 法兰泰克重工股份有限公司 一种物料自动搬运控制系统
CN114139339B (zh) * 2021-10-14 2025-10-10 苏州谋迅智能科技有限公司 基于位置平滑的速度滤波方法和装置、存储介质和设备
CN114740715A (zh) * 2022-03-15 2022-07-12 青岛科技大学 一种基于时间与急动度最优的速度曲线模型方法
CN116009473B (zh) * 2022-10-25 2024-02-06 华中科技大学 基于非对称fir滤波器的刀具位姿轨迹插补与光顺方法
US20240286280A1 (en) * 2023-02-24 2024-08-29 Sanctuary Cognitive Systems Corporation Method and system of generating a feasible smooth reference trajectory for an actuator
CN116795044B (zh) * 2023-08-16 2023-11-14 通用技术集团机床工程研究院有限公司 速度规划方法、装置、机床控制系统和存储介质
US20250164892A1 (en) * 2023-11-17 2025-05-22 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography scanner throughput

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US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
US5625267A (en) * 1995-12-13 1997-04-29 Coburn Optical Industries, Inc. Constant delay filtering for synchronized motion on multiple axes
US6069684A (en) * 1998-02-04 2000-05-30 International Business Machines Corporation Electron beam projection lithography system (EBPS)
US6509953B1 (en) * 1998-02-09 2003-01-21 Nikon Corporation Apparatus for exposing a pattern onto an object with controlled scanning
US6320345B1 (en) 1998-03-05 2001-11-20 Nikon Corporation Command trajectory for driving a stage with minimal vibration
US6008610A (en) * 1998-03-20 1999-12-28 Nikon Corporation Position control apparatus for fine stages carried by a coarse stage on a high-precision scanning positioning system
US6260282B1 (en) * 1998-03-27 2001-07-17 Nikon Corporation Stage control with reduced synchronization error and settling time
JP2000040658A (ja) * 1998-07-24 2000-02-08 Nikon Corp ステージ制御方法及び走査型露光装置
US6360078B1 (en) * 1998-12-23 2002-03-19 Nortel Networks Limited Method of compensating for group time delay asymmetry in a radio receiver
TW490596B (en) * 1999-03-08 2002-06-11 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus
JP3796367B2 (ja) * 1999-03-09 2006-07-12 キヤノン株式会社 ステージ制御方法、露光方法、露光装置およびデバイス製造方法
US6285438B1 (en) * 1999-05-19 2001-09-04 Nikon Corporation Scanning exposure method with reduced time between scans
JP2001250757A (ja) 2000-03-03 2001-09-14 Canon Inc 走査型露光装置
US6766339B2 (en) * 2001-01-11 2004-07-20 Asml Holding N.V. Method and system for efficient and accurate filtering and interpolation

Also Published As

Publication number Publication date
US20050077484A1 (en) 2005-04-14
KR100627739B1 (ko) 2006-09-25
EP1422569B1 (en) 2009-01-21
US20040098160A1 (en) 2004-05-20
EP1422569A2 (en) 2004-05-26
EP1422569A3 (en) 2005-12-14
KR20040044175A (ko) 2004-05-27
US7389155B2 (en) 2008-06-17
US6845287B2 (en) 2005-01-18
JP2004172625A (ja) 2004-06-17
TW200422773A (en) 2004-11-01
DE60325933D1 (de) 2009-03-12
JP4093950B2 (ja) 2008-06-04
SG105593A1 (en) 2004-08-27
CN1503093A (zh) 2004-06-09
CN100386701C (zh) 2008-05-07

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