TWI265959B - Composition used for forming inorganic envelope and method to form inorganic envelope - Google Patents

Composition used for forming inorganic envelope and method to form inorganic envelope

Info

Publication number
TWI265959B
TWI265959B TW089112901A TW89112901A TWI265959B TW I265959 B TWI265959 B TW I265959B TW 089112901 A TW089112901 A TW 089112901A TW 89112901 A TW89112901 A TW 89112901A TW I265959 B TWI265959 B TW I265959B
Authority
TW
Taiwan
Prior art keywords
inorganic envelope
film
composition used
envelope
forming
Prior art date
Application number
TW089112901A
Other languages
Chinese (zh)
Inventor
Hiroshi Takanashi
Yoshimi Sato
Takekazu Obata
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Application granted granted Critical
Publication of TWI265959B publication Critical patent/TWI265959B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/2805—Compounds having only one group containing active hydrogen
    • C08G18/2815—Monohydroxy compounds
    • C08G18/283—Compounds containing ether groups, e.g. oxyalkylated monohydroxy compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Glass Compositions (AREA)
  • Luminescent Compositions (AREA)

Abstract

To obtain a composition which can form an inorganic film, such as a conductive film, an insulation film, a light-absorbing film, or a phosphor film, by a low-temperature baking process by compounding a photosensitive agent, a powder, and a nitrate and/or a metal salt of an organic acid.
TW089112901A 1999-07-08 2000-06-29 Composition used for forming inorganic envelope and method to form inorganic envelope TWI265959B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19411199A JP3912471B2 (en) 1999-07-08 1999-07-08 Composition for forming inorganic film and method for forming inorganic film

Publications (1)

Publication Number Publication Date
TWI265959B true TWI265959B (en) 2006-11-11

Family

ID=16319113

Family Applications (1)

Application Number Title Priority Date Filing Date
TW089112901A TWI265959B (en) 1999-07-08 2000-06-29 Composition used for forming inorganic envelope and method to form inorganic envelope

Country Status (4)

Country Link
JP (1) JP3912471B2 (en)
KR (1) KR100489741B1 (en)
CN (1) CN1220913C (en)
TW (1) TWI265959B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002313582A (en) * 2001-04-17 2002-10-25 Matsushita Electric Ind Co Ltd Light emitting element and display device
JP2003326627A (en) * 2002-05-09 2003-11-19 Mitsubishi Polyester Film Copp Colored film for coating metallic sheet
WO2018173692A1 (en) * 2017-03-21 2018-09-27 富士フイルム株式会社 Curable composition, cured film, light shielding film, solid state imaging element, solid state imaging device and method for manufacturing cured film

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0680653B2 (en) * 1988-09-08 1994-10-12 株式会社東芝 Pattern formation method
KR930009523A (en) * 1991-11-27 1993-06-21 배동현 How to Make Pumpkin Noodles
JPH06264054A (en) * 1993-03-11 1994-09-20 Nichia Chem Ind Ltd Production of phosphor for cathode ray tube
JPH06349857A (en) * 1993-06-11 1994-12-22 Hitachi Ltd Manufacture of liquid crystal-display
JP3817750B2 (en) * 1994-03-17 2006-09-06 日産化学工業株式会社 Coating agent for pattern formation of metal oxide film by ultraviolet irradiation and pattern formation method
JP3817748B2 (en) * 1994-03-17 2006-09-06 日産化学工業株式会社 Coating agent for pattern formation of inorganic oxide film by ultraviolet irradiation and pattern formation method
JP3817749B2 (en) * 1994-03-17 2006-09-06 日産化学工業株式会社 Coating agent for pattern formation of silica-containing inorganic oxide film by ultraviolet irradiation and pattern formation method
JPH09329891A (en) * 1996-06-12 1997-12-22 Nippon Kayaku Co Ltd Resin composition, its film and its cured matter

Also Published As

Publication number Publication date
KR20010049747A (en) 2001-06-15
CN1282889A (en) 2001-02-07
JP3912471B2 (en) 2007-05-09
JP2001019873A (en) 2001-01-23
KR100489741B1 (en) 2005-05-16
CN1220913C (en) 2005-09-28

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees