CN1282889A - Composition used for forming inorganic envelope and method to form inorganic envelope - Google Patents
Composition used for forming inorganic envelope and method to form inorganic envelope Download PDFInfo
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- CN1282889A CN1282889A CN00120418A CN00120418A CN1282889A CN 1282889 A CN1282889 A CN 1282889A CN 00120418 A CN00120418 A CN 00120418A CN 00120418 A CN00120418 A CN 00120418A CN 1282889 A CN1282889 A CN 1282889A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/2805—Compounds having only one group containing active hydrogen
- C08G18/2815—Monohydroxy compounds
- C08G18/283—Compounds containing ether groups, e.g. oxyalkylated monohydroxy compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
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- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Paints Or Removers (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Luminescent Compositions (AREA)
- Glass Compositions (AREA)
Abstract
Provided is a composition which can form an inorganic film, characterized by including (A) a photosensitive agent, (B) a powder, and (C) a nitrate, where (C) the nitrate is selected from at least one kind from the nonmetal salt, a ferric nitrate and a cerous nitrate of the nitric acid. Also provided is a method to form inorganic envelope. According to the invention, all kinds of inorganic film such as a conductivity film, an insulatibity film, a light-absorbing property film or a fluorophor film etc are formed adopting low temperature baking techonology.
Description
The present invention relates to a kind of inorganic tunicle and form, particularly relate to a kind of inorganic tunicle that is suitable for forming on face glass the fluorophor pattern and form composition and the inorganic tunicle formation method used at CRT with composition and the inorganic tunicle method of formationing.
When on substrate, forming the inorganic tunicle of desired pattern, generally be to use composition such as inorganic tunicle formation such as the slurries shape that has mixed emulsion such as polyvinyl alcohol (PVA) (PVA) organic high molecular compound of etc.ing, dichromate, various powder (demonstrating the powder of character such as electric conductivity, insulativity, light absorption or fluorescence) and spreading agent etc.Should illustrate that usually, said composition is a negative photosensitive composition.
And, this slurries shape composition is applied on the substrate and drying after, carry out photocuring reaction by the exposure of carrying out radioactive ray with mask selectively, unexposed portion water or aqueous alkali etc. are removed, form the photocuring pattern thus, then, the organic principle thermal decomposition in the photocuring pattern is removed, on substrate, form the inorganic tunicle of desired pattern through bakingout process.
But, because employed dichromate is the sexavalent chrome of severe toxicity in the formation of the inorganic tunicle that uses said composition, exist environmental pollution problems, seeking a kind of formation method of not using chromic inorganic tunicle at present.As the formation method of not using chromic inorganic tunicle, the spy opens flat 11-24241 communique, spy and opens flat 10-83077 communique, spy and open flat 8-146598 communique, spy and open flat 6-202316 communique, spy and open flat 11-84646 communique, spy and open flat 8-227153 communique, spy and open flat 8-315634 communique, spy and open flat 8-50811 communique, spy and open flat 8-315637 communique, spy and open that clear 63-64953 communique, spy are opened clear 61-158861 communique, the spy opens in flat 2-25847 communique etc. and proposed the whole bag of tricks.
But employed material in the above-mentioned prior art when the organic principle thermal decomposition in the photocuring pattern is removed, needs to surpass 500 ℃ high temperature, considers from technologic problem, wishes heat decomposition temperature is reduced.
In addition, use the existing photosensitive composite of dichromate, its heat decomposition temperature is about 400～500 ℃, for practicability, wish to obtain a kind of with the temperature of its equal extent under the inorganic tunicle of thermal decomposition form and use composition.
Therefore, the objective of the invention is to, provide a kind of inorganic tunicle that can in low-temperature bake technology, form various inorganic tunicles such as conductive cell envelope, insulativity tunicle, light absorption tunicle or fluorophor tunicle to form, particularly provide a kind of inorganic tunicle that can under the lower temperature below 500 ℃, form inorganic tunicle to form with composition and inorganic tunicle formation method with composition and inorganic tunicle formation method.
The inventor etc. obtain a kind of like this experience, promptly, the organic principle that the inorganic tunicle of the so-called PVA-of use dichromic acid salt forms in the photocuring pattern that forms with composition can decompose the character of removing under the lower temperature below 500 ℃, dichromate has the effect that promotes thermal decomposition.
That is, find out that along with the addition of dichromate increases, the decomposition temperature of the organic principle in the photocuring pattern reduces, confirm that dichromate has the thermal decomposition facilitation by test.
Fig. 1 illustrates the relation of the decomposition temperature of dichromate addition and PVA, describes with reference to Fig. 1.The addition of dichromate is 0 o'clock, and the decomposition temperature of PVA is about 570 ℃, in case the addition of dichromate increases, then the heat decomposition temperature of the PVA behind the photocuring reduces, and when adding 10 weight portions, heat decomposition temperature is reduced to about 430 ℃.
The inventor etc. have carried out meticulous research to the material of having given play to the equal effect of thermal decomposition facilitation effect of this dichromate, and the result is surprised to find that nitrate and organic acid slaine exist good thermal decomposition facilitation, have so far finished the present invention.
Also find in addition, nitrate is mixed use with the organic acid slaine, heat decomposition temperature is further reduced.
That is, the invention provides a kind of inorganic tunicle and form and use composition, it is characterized in that, wherein contain (A) emulsion, (B) powder and (C) nitrate, this (C) nitrate is select non-metal salt, ferric nitrate and the cerous nitrate from nitric acid at least a.
In addition, above-mentioned inorganic tunicle provided by the invention forms uses composition, it is characterized in that, further contains (D) organic acid slaine.
In addition, above-mentioned inorganic tunicle provided by the invention forms uses composition, it is characterized in that with respect to the solid content that contains in the composition, (A) composition is 4～24 weight %, and (B) composition is 70～95 weight %, and (C) composition is 0.1～20 weight %.
In addition, above-mentioned inorganic tunicle provided by the invention forms uses composition, it is characterized in that (C) composition contains select at least a from ferric nitrate and cerous nitrate.
In addition, the invention provides a kind of inorganic tunicle and form and use composition, it is characterized in that, wherein contain (A) emulsion, (B) powder and (D) organic acid molysite.
In addition, above-mentioned inorganic tunicle provided by the invention forms uses composition, it is characterized in that with respect to the solid content that contains in the composition, (A) composition is 4～24 weight %, and (B) composition is 70～95 weight %, and (D) composition is 0.1～20 weight %.
In addition, the invention provides a kind of inorganic tunicle formation method, be applied on the substrate and dry operation and with composition in the operation of below 500 ℃ the organic principle thermal decomposition in the dry coationg that forms being removed comprising above-mentioned inorganic tunicle is formed.Should illustrate that the spy opens in the flat 11-116947 communique, put down in writing and a kind ofly contained through ultraviolet ray irradiation and send the inorganic phosphor of blue light and the fluorescencer composition of copper or copper compound, but (C) that openly use among the present invention and (D) composition any.(A) emulsion
As (A) emulsion, so long as, inorganic tunicle is formed with composition dissolves gets final product in the material of developer solution (water, alkaline aqueous solution, acidic aqueous solution, solvent, water-solvent liquid etc.) through radiation exposure energy polymerization reaction take place or cross-linking reaction etc.
As this material, can enumerate over as the known diazonium base system of emulsion emulsion, repeatedly (spy opens flat 6-65415 communique to nitrogen base system emulsion, Te Kaiping 8-334895 communique, Te Kaiping 7-72620 communique, Te Kaiping 7-234504 communique), styryl piperidines (ス チ Le バ ゾ リ ウ system) is that (spy opens clear 55-135834 communique to emulsion, Te Kaiping 5-5990 communique), stibazole is that (spy opens flat 5-92955 communique to emulsion, Te Kaiping 4-51046 communique), the styryl quinoline is emulsion (spy opens flat 4-51046 communique), in the pyridine emulsion (spy opens flat 4-8706 communique), by Photoepolymerizationinitiater initiater with contain the photonasty composition that the compound of unsaturated group constitutes (spy opens flat 8-160612 communique, Te Kaiping 8-328249 communique, Te Kaiping 7-319160 communique) etc.For the solid content that contains in the composition, (A) composition uses 4～24 weight %.(B) powder
There is no particular limitation as (B) powder, can use the material that demonstrates character such as electric conductivity, insulativity (dielectricity), light absorption or fluorescence according to the kind of the pattern of the inorganic tunicle that will form.
As material, can enumerate over conductive metal powder or their conductive metal oxide powder such as known Ag, Cu, Ni, Au, Pd, Al, Ir, Ru, Rh, Re, Os and Pt with electric conductivity.They can use separately, perhaps make alloy or mixed-powder uses.
As material, can use for example particulate of solid ceramic with insulativity (dielectricity).As oxide, can enumerate aluminium oxide, titanium dioxide, barium titanate, ferrite, yttria, zirconia, mullite etc.As carbonide, can enumerate silit, tungsten carbide, zirconium carbide, titanium carbide, tantalum carbide etc.As nitride, can enumerate silicon nitride, boron nitride, aluminium nitride, zirconium nitride, titanium nitride etc.As boride, can enumerate aluminium boride, titanium boride, zirconium boride, tantalum boride, tungsten boride etc.As oxyhydroxide, can enumerate aluminium hydroxide etc.
As material with light absorption, except carbonaceous class pigment such as carbon black, refining carbon and carbon nanometer tube, can also enumerate sulfate, carbonate, silicate and the phosphate of metal oxide pigments such as iron oxide black, cobalt blue, zinc paste, titanium dioxide and chromium oxide, zinc sulphide sulfides pigment, phthualocyanine pigment, metal and aluminium powder, copper powder, zinc powder.In addition, as organic pigment, can enumerate for example nitroso pigments, nitropigments, purplish red 10B, C lake red CAN'T 4R and chromium phthalein red azo or intellectual circle's pigment, quinoline a word used for translation ketone pigment, quinacridine pigment and isoindolyl ketone (isoindolynone) pigment such as phthalocyanine colors such as color lake pigment, phthalocyanine blue, thioindigo red and indanthrene blue such as azo lake pigment, peacock blue lake and rhodamine color lake such as (chromo phthal red) such as naphthol green B.Except these pigment,, can also possess the dyestuff that is used to improve light absorptive simultaneously.
As having epipolic material, can use inorganic or the organic fluorescence luminophor any.As inorganic fluorescence radiation compound, can enumerate ZnS:Ag, MgWO
4, CaWO
4, (Ca, Zn) (PO
4)
2: Ti
+, Ba
2P
2O
7: Ti, BaSi
2O
5: Pb
2+, Sr
2P
2O
7: Sn
2+, SrFB
2O
3.5: Eu
2+, MgAl
16O
27: Eu
2+, mineral acid salt such as tungstate, sulfate.In addition, as the organic fluorescence luminophor, can enumerate acridine orange, aminacrine, quinacrine, anilino-naphthalene sulfonic acid derivant, anthracene acyloxy (anthroyloxy) stearic acid, auramine O, chloro tetracycline, merocyanine, 1,1 '-dihexyl-2, cyanine such as 2 '-oxa-carbocyanine are pigment; The dansyl sulfonamide; the dansyl choline; the dansyl galactoside; the dansyl tolidine; dansyl chloride derivants such as dansyl chloride; diphenyl six (alkatrienes); eosin; ε-adenosine; bromination 3; 8-diamido-5-ethyl-6-phenylphenanthridineand; fluorescein; formicin (Off オ-マ ィ シ Application); 4-benzamide-4 '-amino Stilbene-2; 2 '-sulfonic acid; the betanaphthyl triphosphoric acid; ability キ ソ ノ-Le pigment; stearidonic acid derivative; perylene; the N-phenyl naphthyl amines; pyrene; Safranine O; fluorescamine; FIC; the 7-chloronitrobenzene also-2-oxa--1, the 3-diazole; the dansyl aziridine; 5-(iodoacetamide ethyl) amino naphthalenes-1-sulfonic acid; 5-iodoacetamide fluorescein; N-(1-anilino-naphthyl 4) maleimide; N-(7-dimethyl-4-methyl Network マ ニ Le) maleimide; N-(3-pyrene) maleimide; eosin-5-iodoacetamide; the mercuric acetate fluorescein; 2-[4 '-and (2 " iodoacetamide)] amino naphthalenes-6-sulfonic acid; eosin; rhodamine derivant etc.
With respect to the solid content that contains in the composition, on pattern formed, (B) powder preferably used in the scope of 70～95 weight %.In addition, the mean grain size of conductive metal powder is preferably 0.5～25 μ m.(C) nitrate
Among the present invention,, can give play to the effect (the following low temperature effect that only is called) that reduces organic principle decomposition temperature in the photocuring pattern by adding (C) nitrate.
As (C) nitrate, can enumerate non-metal salt, ferric nitrate, cerous nitrates such as ammonium nitrate, nitric acid hydroxylammonium, hydrazine nitrate, calcium nitrate, wherein, the low temperature effect of ferric nitrate and cerous nitrate is good, is preferred.
Should illustrate that ferric nitrate and cerous nitrate also can merge use.In addition, also the slaine of nitric acid can be mixed aptly with non-metal salt and use.
The ferric nitrate of this occasion and/or the use level of cerous nitrate for the non-metal salt of nitric acid, are approximately 10～300 weight %, preferred especially 100～250 weight %.
(C) the cooperation ratio of composition is selected according to the composition of above-mentioned (A)～(B) composition and the kind of nitrate, and for the solid content that contains in the composition, nitrate is preferably 0.1～20 weight %, is preferably 0.2～5 weight % especially.(D) organic acid slaine
Among the present invention, same with (C) composition, by adding (D) organic acid slaine, can give play to the low temperature effect.
As (D) organic acid slaine, can enumerate for example slaine of ketone group acid such as hydroxycarboxylic acids such as dibasic acid such as monoacid such as formic acid, acetic acid, propionic acid, butyric acid, oxalic acid, malonic acid, succinic acid, glutaric acid, hexane diacid, malic acid, tartrate, citric acid, glycollic acid, lactic acid, pyruvic acid, acetoacetate, laevulic acid, for example iron, cerium, chromic salts etc. especially preferably contain the slaine of iron.(D) organic acid slaine since to the intermiscibility of the present composition than (C) nitrate height, and be, so storage stability is good, is preferred near neutral material.
Among the present invention, if (D) organic acid slaine is mixed use with above-mentioned (C) nitrate, then having the effect of further promotion low temperature effect, is preferred.Should illustrate that do not use under the occasion of (C) composition, (D) composition must be the organic acid molysite.
When (C) composition is the non-metal salt of nitric acid, (D) use level of composition, for (C) composition, be approximately 10～300 weight %, be preferably 100～250 weight % especially, and (C) when composition is the mixed stocker of non-metal salt of ferric nitrate or cerous nitrate and nitric acid, (C) composition and (D) the total amount of composition, with respect to the non-metal salt of nitric acid, be approximately 10～300 weight %, be preferably 100～250 weight % especially.
Under any above-mentioned occasion, during 10 weight % of the not enough non-metal salt of the use level of slaine, above-mentioned low temperature weak effect, and when surpassing 300 weight %, the colour developing etc. that inorganic tunicle is formed electric conductivity, insulativity or the fluorophor of pattern has the tendency of adverse effect to improve.
(D) the cooperation ratio of composition, select according to the composition of above-mentioned (A)～(B) composition and the kind of organic acid slaine, with respect to the solid content that contains in the composition, the organic acid slaine is preferably 0.1～20 weight %, is preferably 0.2～5 weight % especially.Other compositions
In the composition of the present invention, in the scope of not damaging the object of the invention, can add general known adjuvant as required, for example the precipitation of organic high molecular compound, heat polymerization inhibitors, photosensitizer, the cohesive improving agent with substrate, surfactant, powder prevents agent (antistatic agent, spreading agent) etc.
In the composition of the present invention, can contain organic high molecular compound.This organic high molecular compound is used for improving the formation of filming.
There is no particular limitation as organic high molecular compound, so long as with inorganic tunicle of the present invention form with composition be applied on the substrate and drying after, can form good dry coationg, developer solution is had deliquescent compound to get final product, as developer solution, consider from the operating environment aspect preferably to use the water system developer solution, so tunicle forms with macromolecular material and also is preferably material among the mixed solvent that can be dissolved in water, aqueous alkali or water and alcohol etc. etc.Therefore, the organic high molecular compound that uses among the present invention preferably can be enumerated water-soluble polymers, alkali-soluble polymkeric substance and pure soluble polymer etc.
For example, water-soluble polymers is that polymkeric substance in the water about pH5～8 just can be not particularly limited to use so long as be dissolved in water.Specifically, can enumerate polyvinyl alcohol (PVA), N hydroxymethyl acrylamide addition polyvinyl alcohol (PVA), modified polyvinylalcohol (polyvinyl alcohol (PVA) polyacrylic acid ester block copolymer, the modified polyvinylalcohol that makes acrylic anhydride reaction formation, grafted polyethylene alcohol etc.), carboxyl alkyl cellulose, polyamide, polyamide, polyamide, polyvinyl pyrrolidone etc., but not be subjected to their qualification with basic nitrogen or ammonium salt type nitrogen with ehter bond with sodium sulfonate group.Wherein, from less expensive consideration, preferably use polyvinyl alcohol (PVA).Water-soluble polymers can only use a kind of, also can will be used in combination more than 2 kinds.
In addition, the alkali-soluble polymkeric substance, so long as the polymkeric substance that is dissolved or dispersed in about pH8 in the above aqueous alkali just can be not particularly limited use, can for example enumerate contain-COOH ,-PO
3H
2,-SO
3H ,-SO
2NH
2,-SO
2NH-SO
2-and SO
2The polymkeric substance of groups such as-NH-CO-.
As this polymkeric substance; can enumerate maleic anhydride modified polybutadiene particularly; the styrene-butadiene-copolymer that contains carboxyl; maleic ester resin; the polymkeric substance of Beta-methyl acryloxy ethyl-N-(p-three sulfonyls)-carbamate; and with the multipolymer that constitutes the similar monomer of these polymer monomers and other monomers; vinyl acetate/crotonic acid multipolymer; phenylethylene/maleic anhydride copolymer; methacrylate/methacrylic acid copolymer; methacrylic acid/styrene/acrylonitrile copolymer; and the cellulose ethanoate phthalic ester etc., but be not subjected to their qualification.Wherein, aspect the transparency, dissolubility, preferably use the cellulose ethanoate class.The alkali-soluble polymkeric substance can only use a kind, also can will be used in combination more than 2 kinds.
In addition, pure soluble polymer preferably can be enumerated polyacrylic acid, polymethylacrylic acid and pure soluble nylon etc.As pure soluble nylon, can enumerate nylon 8, nylon 6/ nylon 66, nylon 6/ nylon 66/ NYLON610, nylon 6/ nylon 66/ NYLON610/nylon 612,4 particularly, 4 '-diamino-dicyclohexyl methane/hexamethylene diamine/hexane diacid/epsilon-caprolactams multipolymer etc., but be not subjected to their qualification.Wherein, consider, preferably use polyacrylic acid, polymethylacrylic acid, nylon 8,4,4 '-diamino-dicyclohexyl methane/hexamethylene diamine/hexane diacid/epsilon-caprolactams multipolymer etc. from the transparency, dissolubility aspect.The alcohol soluble polymer can only use a kind of, also can be used in combination more than 2 kinds.For the solid content that contains in the composition, organic high molecular compound uses about 0.5～20 weight %.
In addition, composition of the present invention preferably with other compositions and the solvent of above-mentioned (A)～(D) composition and interpolation as required, uses with the form of coating fluid.As solvent, can enumerate water, alcohol, ether, ester etc., wherein, water, alcohol, water-pure mixed solvent etc. are preferred aspect operating environment.The formation method of inorganic tunicle
As an example of inorganic tunicle formation method of the present invention, below narration is used for the formation method of the phosphor pattern of color CRT (cathode-ray tube (CRT)).
On the face glass inner face that forms black matrix pattern, be coated with composition of the present invention and make its drying, form dry coationg.
Then, undertaken after the radioactive ray selectivity exposure, make developer solution such as water remove unexposed portion, form the photocuring pattern of point-like or striated by planar mask.The formation operation that comprises this photocuring pattern of red (R), green (G), blue (B) fluorophor repeatedly, make the photocuring pattern of 3 look fluorophor, then under the temperature conditions that the organic principle in making this photocuring pattern decomposes, for example carry out heat treated below 500 ℃, form the fluorophor pattern.
Embodiment
Below further specify the present invention, but the present invention is not subjected to their restriction with embodiment and comparative example.
Table 1 (comparative example) is composition (A): compound 18.04 weight portions of Photoepolymerizationinitiater initiater+contain unsaturated group [Photoepolymerizationinitiater initiater: benzyl dimethyl ketal (0.04 weight portion), contain the compound of unsaturated group: pentaerythritol triacrylate (18.0 weight portion)] are composition (B): blue emitting phophor 80.0 weight portions [goods name: P22-HCB1 (changing into just プ ト ニ Network ス (strain) system), ZnS:Ag powder (average grain diameter 7～10 μ m)] organic high molecular compound: polymethylacrylic acid (degree of polymerization 2000) 2.0 weight portion heat polymerization inhibitors: hydroquinone monomethyl ether 0.0017 parts by weight solvent: Water-Methanol Mixtures 100.0 weight portions [water: methyl alcohol=60: 40 (weight ratio)]
The inorganic tunicle of negative photosensitive composition that above-mentioned composition is constituted forms to drip on the face glass with 300 rpm rotation with composition and is coated with, 70 ℃ dry 5 minutes down, forming thickness is the dry coationg of 14 μ m.
Then, the extra-high-pressure mercury vapour lamp with 1kW carries out the selectivity exposure by planar mask, process water development, drying, formation photocuring pattern.
The part of photocuring pattern as sample, is carried out thermogravimetry (TG), its result, the heat decomposition temperature of organic principle is 561 ℃.
Should illustrate that above-mentioned heat decomposition temperature is meant that after weight reduced along with the thermal decomposition of organic principle, the TG slope of a curve almost became 0 o'clock temperature.Above-mentioned photocuring pattern is learnt in the time of 10 minutes that 500 ℃ of following roastings the fluorophor pattern of acquisition is a brown, and organic principle is not decomposed fully.
Embodiment 1
Add ferric nitrate 0.41 weight portion as (C) composition in the negative photosensitive composition of in comparative example, putting down in writing, similarly form the photocuring pattern, similarly measure the heat decomposition temperature of the organic principle in the photocuring pattern with comparative example with comparative example.
Its result, the heat decomposition temperature of organic principle is 475 ℃.In addition, the photocuring pattern is learnt in the time of 10 minutes 475 ℃ of following roastings that the fluorophor pattern of acquisition is a white, organic principle decomposes fully.
Embodiment 2
Conduct (C) composition adds ammonium nitrate 0.45 weight portion and ferric nitrate 0.9 weight portion in the negative photosensitive composition of putting down in writing in comparative example, similarly form the photocuring pattern with comparative example, similarly measure the heat decomposition temperature of the organic principle in the photocuring pattern with comparative example.
Its result, the heat decomposition temperature of organic principle is 437 ℃.In addition, the photocuring pattern is learnt in the time of 10 minutes 437 ℃ of following roastings that the fluorophor pattern of acquisition is a white, organic principle decomposes fully.
Embodiment 3
Conduct (D) composition adds ferric citrate 1.46 weight portions in the negative photosensitive composition of putting down in writing in comparative example, similarly form the photocuring pattern with comparative example, similarly measure the heat decomposition temperature of the organic principle in the photocuring pattern with comparative example.
Its result, the heat decomposition temperature of organic principle is 494 ℃.In addition, the photocuring pattern is learnt in the time of 10 minutes 494 ℃ of following roastings that the fluorophor pattern of acquisition is a white, organic principle decomposes fully.
Embodiment 4
Conduct (C) composition adds ammonium nitrate 0.45 weight portion in the negative photosensitive composition of putting down in writing in comparative example, conduct (D) composition adds ferric citrate 0.9 weight portion, similarly form the photocuring pattern with comparative example, similarly measure the heat decomposition temperature of the organic principle in the photocuring pattern with comparative example.
Its result, the heat decomposition temperature of organic principle is 450 ℃.In addition, the photocuring pattern is learnt in the time of 10 minutes 450 ℃ of following roastings that the fluorophor pattern of acquisition is a white, organic principle decomposes fully.
Embodiment 5
Add ferric nitrate 1.35 weight portions as (C) composition in the negative photosensitive composition of in comparative example, putting down in writing, similarly form the photocuring pattern, similarly measure the heat decomposition temperature of the organic principle in the photocuring pattern with comparative example with comparative example.
Its result, the heat decomposition temperature of organic principle is 408 ℃.In addition, the photocuring pattern is learnt in the time of 10 minutes 408 ℃ of following roastings that the fluorophor pattern of acquisition is a white, organic principle decomposes fully.
Embodiment 6
Add ammonium ceric nitrate 1.35 weight portions as (C) composition in the negative photosensitive composition of in comparative example, putting down in writing, similarly form the photocuring pattern, similarly measure the heat decomposition temperature of the organic principle in the photocuring pattern with comparative example with comparative example.
Its result, the heat decomposition temperature of organic principle is 386 ℃.In addition, the photocuring pattern is learnt in the time of 10 minutes 386 ℃ of following roastings that the fluorophor pattern of acquisition is a white, organic principle decomposes fully.
According to the present invention, provide a kind of inorganic tunicle that can form various inorganic tunicles such as conductive cell envelope, insulativity tunicle, light absorption tunicle or fluorophor tunicle to form with composition and inorganic tunicle formation method with low-temperature bake technology.
Claims (7)
1. an inorganic tunicle forms and use composition, it is characterized in that, wherein contains (A) emulsion, (B) powder and (C) nitrate, and this (C) nitrate is select non-metal salt, ferric nitrate and the cerous nitrate from nitric acid at least a.
2. the inorganic tunicle described in the claim 1 forms and uses composition, it is characterized in that, wherein further contains (D) organic acid slaine.
3. the inorganic tunicle described in the claim 1 forms and uses composition, it is characterized in that with respect to the solid content that contains in the composition, (A) composition is 4～24 weight %, and (B) composition is 70～95 weight %, and (C) composition is 0.1～20 weight %.
4. the inorganic tunicle described in the claim 1 forms and uses composition, it is characterized in that (C) composition contains select at least a from ferric nitrate and cerous nitrate.
5. an inorganic tunicle forms and use composition, it is characterized in that, wherein contains (A) emulsion, (B) powder and (D) organic acid molysite.
6. the inorganic tunicle described in the claim 5 forms and uses composition, it is characterized in that with respect to the solid content that contains in the composition, (A) composition is 4～24 weight %, and (B) composition is 70～95 weight %, and (D) composition is 0.1～20 weight %.
7. inorganic tunicle formation method is applied on the substrate and dry operation and in the operation of below 500 ℃ the organic principle thermal decomposition in the dry coationg that forms being removed comprising above-mentioned inorganic tunicle is formed with composition.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP194111/1999 | 1999-07-08 | ||
| JP19411199A JP3912471B2 (en) | 1999-07-08 | 1999-07-08 | Composition for forming inorganic film and method for forming inorganic film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1282889A true CN1282889A (en) | 2001-02-07 |
| CN1220913C CN1220913C (en) | 2005-09-28 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB001204181A Expired - Fee Related CN1220913C (en) | 1999-07-08 | 2000-07-07 | Composition used for forming inorganic envelope and method to form inorganic envelope |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP3912471B2 (en) |
| KR (1) | KR100489741B1 (en) |
| CN (1) | CN1220913C (en) |
| TW (1) | TWI265959B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002313582A (en) * | 2001-04-17 | 2002-10-25 | Matsushita Electric Ind Co Ltd | Light emitting element and display device |
| JP2003326627A (en) * | 2002-05-09 | 2003-11-19 | Mitsubishi Polyester Film Copp | Colored film for coating metallic sheet |
| JP6745977B2 (en) * | 2017-03-21 | 2020-08-26 | 富士フイルム株式会社 | Curable composition, cured film, light-shielding film, solid-state imaging device, solid-state imaging device, and method for producing cured film |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0680653B2 (en) * | 1988-09-08 | 1994-10-12 | 株式会社東芝 | Pattern formation method |
| KR930009523A (en) * | 1991-11-27 | 1993-06-21 | 배동현 | How to Make Pumpkin Noodles |
| JPH06264054A (en) * | 1993-03-11 | 1994-09-20 | Nichia Chem Ind Ltd | Production of phosphor for cathode ray tube |
| JPH06349857A (en) * | 1993-06-11 | 1994-12-22 | Hitachi Ltd | Manufacture of liquid crystal-display |
| JP3817749B2 (en) * | 1994-03-17 | 2006-09-06 | 日産化学工業株式会社 | Coating agent for pattern formation of silica-containing inorganic oxide film by ultraviolet irradiation and pattern formation method |
| JP3817748B2 (en) * | 1994-03-17 | 2006-09-06 | 日産化学工業株式会社 | Coating agent for pattern formation of inorganic oxide film by ultraviolet irradiation and pattern formation method |
| JP3817750B2 (en) * | 1994-03-17 | 2006-09-06 | 日産化学工業株式会社 | Coating agent for pattern formation of metal oxide film by ultraviolet irradiation and pattern formation method |
| JPH09329891A (en) * | 1996-06-12 | 1997-12-22 | Nippon Kayaku Co Ltd | Resin composition, its film and its cured matter |
-
1999
- 1999-07-08 JP JP19411199A patent/JP3912471B2/en not_active Expired - Fee Related
-
2000
- 2000-06-29 TW TW089112901A patent/TWI265959B/en not_active IP Right Cessation
- 2000-07-07 CN CNB001204181A patent/CN1220913C/en not_active Expired - Fee Related
- 2000-07-08 KR KR10-2000-0039107A patent/KR100489741B1/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TWI265959B (en) | 2006-11-11 |
| KR100489741B1 (en) | 2005-05-16 |
| JP3912471B2 (en) | 2007-05-09 |
| CN1220913C (en) | 2005-09-28 |
| JP2001019873A (en) | 2001-01-23 |
| KR20010049747A (en) | 2001-06-15 |
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