TWI264519B - Method of determining aberration of a projection system of a lithographic apparatus - Google Patents
Method of determining aberration of a projection system of a lithographic apparatusInfo
- Publication number
- TWI264519B TWI264519B TW094108210A TW94108210A TWI264519B TW I264519 B TWI264519 B TW I264519B TW 094108210 A TW094108210 A TW 094108210A TW 94108210 A TW94108210 A TW 94108210A TW I264519 B TWI264519 B TW I264519B
- Authority
- TW
- Taiwan
- Prior art keywords
- test pattern
- projection system
- aberration
- lithographic apparatus
- determining aberration
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V33/00—Structural combinations of lighting devices with other articles, not otherwise provided for
- F21V33/0064—Health, life-saving or fire-fighting equipment
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L9/00—Disinfection, sterilisation or deodorisation of air
- A61L9/16—Disinfection, sterilisation or deodorisation of air using physical phenomena
- A61L9/22—Ionisation
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
- F21S8/00—Lighting devices intended for fixed installation
- F21S8/04—Lighting devices intended for fixed installation intended only for mounting on a ceiling or the like overhead structures
- F21S8/06—Lighting devices intended for fixed installation intended only for mounting on a ceiling or the like overhead structures by suspension
- F21S8/061—Lighting devices intended for fixed installation intended only for mounting on a ceiling or the like overhead structures by suspension with a non-rigid pendant, i.e. a cable, wire or chain
Landscapes
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Animal Behavior & Ethology (AREA)
- Veterinary Medicine (AREA)
- Public Health (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Epidemiology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Lenses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/808,598 US7242475B2 (en) | 2004-03-25 | 2004-03-25 | Method of determining aberration of a projection system of a lithographic apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200602613A TW200602613A (en) | 2006-01-16 |
TWI264519B true TWI264519B (en) | 2006-10-21 |
Family
ID=34862073
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094108210A TWI264519B (en) | 2004-03-25 | 2005-03-17 | Method of determining aberration of a projection system of a lithographic apparatus |
Country Status (8)
Country | Link |
---|---|
US (1) | US7242475B2 (zh) |
EP (1) | EP1580605B1 (zh) |
JP (1) | JP4410133B2 (zh) |
KR (1) | KR100695984B1 (zh) |
CN (1) | CN100570487C (zh) |
DE (1) | DE602005001011T2 (zh) |
SG (1) | SG115770A1 (zh) |
TW (1) | TWI264519B (zh) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10224363A1 (de) * | 2002-05-24 | 2003-12-04 | Zeiss Carl Smt Ag | Verfahren zur Bestimmung von Wellenfrontaberrationen |
JP4630611B2 (ja) * | 2004-09-01 | 2011-02-09 | キヤノン株式会社 | 干渉計を備えた露光装置及び方法、並びに、デバイス製造方法 |
US20080239263A1 (en) * | 2007-03-29 | 2008-10-02 | Asml Netherlands B.V. | Lithographic system and device manufacturing method |
CN101320219B (zh) * | 2008-07-22 | 2010-06-02 | 上海微电子装备有限公司 | 一种成像光学系统像差现场测量方法 |
DE102011080437A1 (de) | 2010-09-30 | 2012-04-05 | Carl Zeiss Smt Gmbh | Abbildendes optisches System für die Mikrolithographie |
CN102692820B (zh) * | 2011-03-21 | 2014-12-17 | 上海微电子装备有限公司 | 一种测量投影物镜畸变的装置及方法 |
NL2008957A (en) * | 2011-07-08 | 2013-01-09 | Asml Netherlands Bv | Methods and systems for pattern design with tailored response to wavefront aberration. |
CN104267581B (zh) * | 2014-09-26 | 2016-08-24 | 中国科学院光电技术研究所 | 一种光学系统气压分段补偿像差的划分方法 |
WO2016087142A1 (en) * | 2014-12-02 | 2016-06-09 | Asml Netherlands B.V. | Lithographic method and apparatus |
JP6661371B2 (ja) * | 2015-12-25 | 2020-03-11 | キヤノン株式会社 | 評価方法、露光方法、および物品の製造方法 |
NL2018639A (en) * | 2016-04-26 | 2017-11-01 | Asml Netherlands Bv | Measurement system, calibration method, lithographic apparatus and positioner |
DE102017203376B3 (de) * | 2017-03-02 | 2018-05-24 | Carl Zeiss Smt Gmbh | Messvorrichtung und Verfahren zur Vermessung eines Wellenfrontfehlers eines abbildenden optischen Systems sowie Projektionsbelichtungsanlage für die Mikrolithographie |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6304317B1 (en) * | 1993-07-15 | 2001-10-16 | Nikon Corporation | Projection apparatus and method |
JPH09167731A (ja) * | 1995-12-14 | 1997-06-24 | Mitsubishi Electric Corp | 投影露光装置、収差評価用マスクパタン、収差量評価方法、収差除去フィルター及び半導体装置の製造方法 |
KR20030096435A (ko) * | 1996-11-28 | 2003-12-31 | 가부시키가이샤 니콘 | 노광장치 및 노광방법 |
US5828455A (en) * | 1997-03-07 | 1998-10-27 | Litel Instruments | Apparatus, method of measurement, and method of data analysis for correction of optical system |
JP3774590B2 (ja) * | 1999-05-28 | 2006-05-17 | キヤノン株式会社 | 投影露光装置及びそれを用いたデバイスの製造方法 |
US6360012B1 (en) * | 1999-06-25 | 2002-03-19 | Svg Lithography Systems, Inc. | In situ projection optic metrology method and apparatus |
JP3348419B2 (ja) * | 1999-09-24 | 2002-11-20 | 株式会社東芝 | 収差測定方法、収差測定システム及び収差測定マスク |
JP2002033271A (ja) * | 2000-05-12 | 2002-01-31 | Nikon Corp | 投影露光方法、それを用いたデバイス製造方法、及び投影露光装置 |
JP3728187B2 (ja) | 2000-07-10 | 2005-12-21 | キヤノン株式会社 | 結像光学系性能測定方法及び装置 |
US6842237B2 (en) * | 2001-12-28 | 2005-01-11 | International Business Machines Corporation | Phase shifted test pattern for monitoring focus and aberrations in optical projection systems |
JP4343706B2 (ja) * | 2002-04-17 | 2009-10-14 | キヤノン株式会社 | レチクル及び光学特性計測方法 |
-
2004
- 2004-03-25 US US10/808,598 patent/US7242475B2/en active Active
-
2005
- 2005-03-17 TW TW094108210A patent/TWI264519B/zh not_active IP Right Cessation
- 2005-03-17 SG SG200501616A patent/SG115770A1/en unknown
- 2005-03-23 EP EP05251792A patent/EP1580605B1/en active Active
- 2005-03-23 DE DE602005001011T patent/DE602005001011T2/de active Active
- 2005-03-24 JP JP2005085248A patent/JP4410133B2/ja not_active Expired - Fee Related
- 2005-03-24 KR KR1020050024348A patent/KR100695984B1/ko active IP Right Grant
- 2005-03-25 CN CNB200510062763XA patent/CN100570487C/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN100570487C (zh) | 2009-12-16 |
TW200602613A (en) | 2006-01-16 |
DE602005001011T2 (de) | 2007-12-27 |
JP2005277424A (ja) | 2005-10-06 |
DE602005001011D1 (de) | 2007-06-14 |
EP1580605A2 (en) | 2005-09-28 |
KR20060044658A (ko) | 2006-05-16 |
US7242475B2 (en) | 2007-07-10 |
KR100695984B1 (ko) | 2007-03-15 |
US20050213097A1 (en) | 2005-09-29 |
SG115770A1 (en) | 2005-10-28 |
EP1580605B1 (en) | 2007-05-02 |
CN1673874A (zh) | 2005-09-28 |
EP1580605A3 (en) | 2005-11-30 |
JP4410133B2 (ja) | 2010-02-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |