TWI264168B - Semiconductor laser - Google Patents
Semiconductor laserInfo
- Publication number
- TWI264168B TWI264168B TW094129067A TW94129067A TWI264168B TW I264168 B TWI264168 B TW I264168B TW 094129067 A TW094129067 A TW 094129067A TW 94129067 A TW94129067 A TW 94129067A TW I264168 B TWI264168 B TW I264168B
- Authority
- TW
- Taiwan
- Prior art keywords
- laser
- semiconductor laser
- emitting surface
- reflectance
- oscillation wavelength
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 230000010355 oscillation Effects 0.000 abstract 2
- 239000003989 dielectric material Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004316393A JP2006128475A (ja) | 2004-10-29 | 2004-10-29 | 半導体レーザ |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200614613A TW200614613A (en) | 2006-05-01 |
TWI264168B true TWI264168B (en) | 2006-10-11 |
Family
ID=36261817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094129067A TWI264168B (en) | 2004-10-29 | 2005-08-25 | Semiconductor laser |
Country Status (4)
Country | Link |
---|---|
US (1) | US20060093005A1 (zh) |
JP (1) | JP2006128475A (zh) |
CN (1) | CN1767284A (zh) |
TW (1) | TWI264168B (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5191650B2 (ja) * | 2005-12-16 | 2013-05-08 | シャープ株式会社 | 窒化物半導体発光素子および窒化物半導体発光素子の製造方法 |
KR100853241B1 (ko) * | 2005-12-16 | 2008-08-20 | 샤프 가부시키가이샤 | 질화물 반도체 발광소자 및 질화물 반도체 레이저 소자의제조방법 |
JP5004597B2 (ja) * | 2006-03-06 | 2012-08-22 | シャープ株式会社 | 窒化物半導体発光素子および窒化物半導体発光素子の製造方法 |
JP5430826B2 (ja) | 2006-03-08 | 2014-03-05 | シャープ株式会社 | 窒化物半導体レーザ素子 |
JP4444304B2 (ja) * | 2006-04-24 | 2010-03-31 | シャープ株式会社 | 窒化物半導体発光素子および窒化物半導体発光素子の製造方法 |
WO2018184697A1 (en) * | 2017-04-07 | 2018-10-11 | Huawei Technologies Co., Ltd. | Laser |
JP6624154B2 (ja) | 2017-05-11 | 2019-12-25 | 日亜化学工業株式会社 | 半導体レーザ素子及びその製造方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5181219A (en) * | 1990-09-12 | 1993-01-19 | Seiko Epson Corporation | Surface emission type semiconductor laser |
JP3739107B2 (ja) * | 1995-04-26 | 2006-01-25 | シャープ株式会社 | 誘電体多層反射膜 |
JP2000349393A (ja) * | 1999-03-26 | 2000-12-15 | Fuji Xerox Co Ltd | 半導体デバイス、面発光型半導体レーザ、及び端面発光型半導体レーザ |
JP2003133638A (ja) * | 2001-08-14 | 2003-05-09 | Furukawa Electric Co Ltd:The | 分布帰還型半導体レーザ素子及びレーザモジュール |
JP5099948B2 (ja) * | 2001-08-28 | 2012-12-19 | 古河電気工業株式会社 | 分布帰還型半導体レーザ素子 |
JP4097552B2 (ja) * | 2003-03-27 | 2008-06-11 | 三菱電機株式会社 | 半導体レーザ装置 |
-
2004
- 2004-10-29 JP JP2004316393A patent/JP2006128475A/ja active Pending
-
2005
- 2005-08-25 TW TW094129067A patent/TWI264168B/zh active
- 2005-08-29 US US11/212,592 patent/US20060093005A1/en not_active Abandoned
- 2005-10-28 CN CN200510118823.5A patent/CN1767284A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
US20060093005A1 (en) | 2006-05-04 |
JP2006128475A (ja) | 2006-05-18 |
TW200614613A (en) | 2006-05-01 |
CN1767284A (zh) | 2006-05-03 |
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