1251030 ----91100287_年月 日 五、發明說明（1) 【發明所屬之技術領域】 本發明係一種在真空狀態下將兩種靶材料銹製炎混合 光學薄膜的方法，可應用於光電元件、光電顯^業7光通 訊業、光學量測系統、能源控制、半導體蝕笠。 【先前技術】 I g =學，膜是在光電產業之中佔有很重要的地位，因為 光電仏说藉由干涉濾光片（optical interference filter)提昇信噪比（signal/n〇lse)，而其干涉濾光片所 <需的多是多層薄膜所構成，依目前的技術是使用兩 禋以上的材料來完成。在理論設計上，往往找曰 射率^材料，便設計兩種以上折射率或更多層的=γ 成所需要的光學濾光效果。在實際製鏔上， 极凡 其獨特性，鍍膜方法各不相同，更增加〗材料各有 因此有採用同時蒸鍍兩種#^ “的困難。 於此兩高低折射率材料之鑛出折射 但是，此種方法穩定性不作，因 /解决上述的困難。 常是不穩定，何況是同時基 =材料蒸鍍的蒸鍍逮率經 僅是不易控制其製程而才料再作混合薄膜，不 定，如此是很難製造出好的Ζ興ι ’寻膜的折射率也不穩 在，上再鑲亡其他乾材再來作；：Π:、:再者，也有人 但是其所鍍誕的薄膜還是只 σ 1 义到混合光學薄膜， 【發明内容】 一、早—的折射率。 是以，目前離子束濺鍍薄膜… 最穩定的方式之―，其濺錐的速：，所有鍍膜的方式中是 源之离隹時打在兩種革、—「疋極穩定的，而且離子 ' '一^ 子束流有極少的 901236^0 IPtc #號 91100287 1251030 曰 修正 五、發明說明（2) 上下不穩定，兩靶材被濺鍍的速率v 合的比例依然是不變的。由上得知忆:步上下改，，其混 、穩定的折射率，採用以離子束濺鎢錐&、、了使所鍍薄膜具有 材料之光學薄膜是一種很穩定的製二。材料誕鍍混合此兩 【實施方式】 n ° 玆就本發明所提出之方法，g — 士主夂Μ楚 囬π - 么丄 口圖不說明如下： 明麥閱弟一圖所不，為本發明 包括下列步驟： 法之製造流程圖，其 A ·提供一高、低折射率之雙乾 上，並令真空腔進行抽高真空處= = ^材座 受離子束撞擊進行濺射出游離分子（或原$ ) 。&位移而 B·導入混合氣體及位移雙靶材進;;離子束藏鍍，以使 玻璃基板生成氧化薄膜，供以建立一薄膜折射率與靶 置的實驗曲線。 C·利周所建立的實驗曲線，依要求的薄膜折射率來移 動靶材的位置及監控濺鍍時薄膜厚度，可不破真空就能在 玻璃基板上鍍出各種不同折射率戒折射率漸變之多層^ 學干涉濾光片製品。 胃' & 方、y ‘ A中係將第二圖所示之真空腔1 0於革巴材座2 〇 亡承載咼、低折射率之雙靶材3〇 (如第三圖所示），並 真空腔1 0經過尚真空抽氣系統進行抽高真空處理，且需 到10-7t〇g或10-6t〇rr的真空度，供使高、低折射率之雙靶 材3 0可Ik位;r夕而文離子束進行撞擊濺射出游離 子此雙乾材3。為一高折射率… jBACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for rusting and mixing an optical film of two kinds of target materials under vacuum, which can be applied to photovoltaics. Components, optoelectronic display industry 7 optical communication industry, optical measurement system, energy control, semiconductor etching. [Prior Art] I g = learning, film plays a very important role in the optoelectronic industry, because optoelectronics say that the signal-to-noise ratio (signal/n〇lse) is improved by an interference interference filter. The interference filter is mostly composed of a multilayer film, which is completed by using two or more materials according to the current technology. In the theoretical design, it is often necessary to find the irradiance rate material, and then design two or more refractive indices or more layers of γ to achieve the desired optical filtering effect. In the actual system, the uniqueness of the coating, the coating method is different, and the increase of the material has the difficulty of using both evaporations. The mineralization of the two high and low refractive index materials is The stability of this method is not made, because / solve the above difficulties. Often unstable, not to mention the simultaneous base = vapor deposition rate of material evaporation is only difficult to control the process and then mixed film, uncertain, It is very difficult to make a good Yan Xing ι 'the refractive index of the film is not stable, and then put on other dry materials again; Π:,: Again, there are people but the film they are plated Or only σ 1 to hybrid optical film, [Summary] First, early - refractive index. Therefore, the current ion beam sputtering film ... the most stable way -- the speed of the splash cone: all the way of coating In the middle of the source is the two kinds of leather, "the bungee is stable, and the ion" 'a ^ beam beam has very few 901236^0 IPtc #号91100287 1251030 曰Revision 5, invention description (2) Unstable, the ratio of the rate at which the two targets are sputtered It is still unchanged. From the above, it is known that: step up and down, its mixed, stable refractive index, using an ion beam splashing tungsten cone &, the optical film with the material of the plated film is a very stable The second system. The material is plated and mixed. [Embodiment] n ° The method proposed by the present invention, g - 士主夂Μ楚回π - 丄丄口图 does not explain as follows: Ming Mai Yuedi a map No, the present invention includes the following steps: a manufacturing flow chart of the method, A. providing a high and low refractive index double dry, and vacuuming the vacuum chamber == ^ the material is splashed by the ion beam Ejecting free molecules (or original $). & shifting and B. introducing a mixed gas and shifting the double target; ion beam plating to form an oxidized film on the glass substrate to establish a refractive index and target of the film Experimental curve C. Li Zhou's experimental curve, according to the required refractive index of the film to move the target position and monitor the thickness of the film during sputtering, can be plated on the glass substrate without breaking the vacuum, different refractive index or refraction Multi-level gradient The product of the stomach ' & square, y 'A is the vacuum chamber 10 shown in the second figure in the leather block 2 〇 咼 咼, low refractive index double target 3 〇 (such as the third figure The vacuum chamber 10 is evacuated by a vacuum evacuation system and requires a vacuum of 10-7t〇g or 10-6t〇rr for the high and low refractive index double targets. 3 0 can be Ik position; R Xiwen ion beam is subjected to impact sputtering to spray ions. This double dry material 3 is a high refractive index... j
901236—S01· ptc 第7頁 一錢身心石夕巧)把材32 ^ 1251030 -----案號 9] 1 no州7 _年月日_修正 五、發明說明（3) 於步驟B中，係先利用靶材移動架21將靶材座20移到 一端，使離子束只有能濺鍍一 3 1上實施高折射率之光學薄膜 將乾材座2 0移到另一端上直到 率之石夕（Si )靶材32上實施低 在離子束濺鍍在高、低折射率 率之光學薄膜之製程中，需將 氣體所混合之氣體離子導入真 中氬氣1 2經氣量調節器丨丨調整 源80放電腔施放能量而能解離 子1 4並經加速撞擊於雙靶材3 〇 (或原子）1 6，而該氧氣1 3係 導入真空腔10中，與氬離子14 原子）16化合在玻璃基板5〇上 率之T a2 05、低折射率之$丨Q〗）， 一步由另一支離子源9〇充又氬 體’使離子源9 0放電腔施放能 14及氧離子15，此氬離子η、 鍍，一樣可與雙靶材濺射出分 基板50上生成氧化薄膜，具有 同日π真工腔1 0頂部以旋轉基板 利用旋轉基板架4 0調整迴轉速 鍍膜均勻之特性，同時利用石 70來監控所需要的薄膜厚度而 個高折射率之鈕（Ta )乾材 生成，復利用乾材移動架2 1 離子束只有錢鐘另一低折射 折射率之光學薄膜生成。而 之雙靶材30上生成不同折射 由氬氣12、氧氣13或其混合 空腔10中調節鍍膜速率，其 充入離子源8 0中後，經離子 成電漿的氬離子14，此氬離 上，使雙乾材3 0濺射出分子 經另一個氣量調節器11調整 及雙把材30濺射出分子（或 生成氧化薄膜（如：高折射 或者其導入混合氣體也可進 氣1 2、氧氣1 3或其混合氣 量而能解離成電漿的氬離子 氧離子1 5作以離子輔助濺 子（或原子）1 6化合在破5离 加快調節鍍膜速率之特性， 座40上架構玻璃基板50，可 率，使生成氧化薄膜能達到 英膜厚計60或是光學膜厚計 停止濺鍍。依此製程，可以901236—S01· ptc page 7 money and body stone Xiqiao) material 32 ^ 1251030 ----- case number 9] 1 no state 7 _ year month day _ correction five, invention description (3) in step B First, the target holder 20 is moved to one end by the target moving frame 21, so that the ion beam can only be sputtered on the optical film having a high refractive index, and the dry material holder 20 is moved to the other end until the rate is reached. On the Shixi (Si) target 32, in the process of ion beam sputtering on the optical film with high and low refractive index, the gas ions mixed by the gas are introduced into the argon gas 1 2 gas volume regulator. Adjusting the source 80 discharge chamber to apply energy to decompose the ion 14 and accelerate the impact on the double target 3 〇 (or atom) 16. The oxygen 13 is introduced into the vacuum chamber 10 and is combined with the argon ion 14 atom) In the glass substrate 5, the rate of T a2 05, the low refractive index of $ 丨 Q〗), one step of the ion source 9 is charged and the argon body is used to make the ion source 90 discharge chamber to apply energy 14 and oxygen ions 15 The argon ion η, plating, and the double target can be sputtered on the sub-substrate 50 to form an oxidized film, having the same day π real cavity 10 top to rotate The plate uses the rotating substrate holder 40 to adjust the uniformity of the rotational speed coating, while using the stone 70 to monitor the required film thickness and the high refractive index button (Ta) dry material is generated, and the dry material moving frame 2 1 ion beam is reused. Only the optical film of the low refractive index of the money clock is generated. The different refractions generated on the double target 30 are adjusted by the argon gas 12, the oxygen gas 13 or the mixing cavity 10 thereof, and after being charged into the ion source 80, the argon ions 14 are ionized into ions, and the argon is argon. Separating, the double dry material 30 is sputtered out of the molecule and adjusted by another gas amount adjuster 11 and the double material 30 is sputtered out of the molecule (or an oxidized film is formed (for example, high refraction or the introduction of the mixed gas can also be inhaled. The oxygen ion 13 or its mixed gas amount can be dissociated into the plasma of the argon ion oxygen ion 15 as the ion-assisted splash (or atom) 16 6 in the break 5 to accelerate the adjustment of the coating rate characteristics, the frame 40 on the frame glass substrate 50, the rate, so that the formation of oxide film can reach the film thickness gauge 60 or the optical film thickness gauge stops sputtering. According to this process,
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修正 立出薄膜折射率與靶材位置的實驗曲線關係圖表，如 ^四，所示，如此隨著位置坐標數值的增加，Ta2 05的成份 跟著增加，依據此結果我們可以由靶材位置找到一 需要的折射率。 n 人上述玻璃基板5 〇在濺鍍光學薄膜的過程中，其導入混 :，體工作氣壓可在8χ 1〇_Η〇ΓΗ,]5χ 1〇_4t〇rr的範圍，而 ^ 疋利用氣量調節器1 1充入離子源8 0中而導入真空腔〆 視/、抽軋速率而疋其流量，此流量可從5 s c c m到 該離子源8〇之離子束電壓（ion beam voltage) ί!* 可=5〇〇Vai 500V，離子束電流（ion beam current) 乾吉=k2〇mA a5〇〇mA ’·該氧氣13經另一氣量調節器11導 IΓ 〇中，其流1可從10sccm到50sccm ;以及可旋轉 土板座的迴轉速率可控制介於20rpma 1 0 0 0rpm之間。 新射Ϊ t:^中’利用所建立的實驗曲線，依要求的薄膜 學膜；：70央2材的位置’ f及利用石英膜厚計60或是光 ί板利用A : ί所需要的薄膜厚度而停止濺鍍，使玻璃 “、低曲線移動靶材的位置得以濺鍍生成介 Ϊ Li 率之雙靶材30的薄膜，且靶材的位置可-由 匕可一次製鍍各種不同折射率或製鍍折射率 漸k之多層膜光學干涉濾光片製品者。 又π身了手 綜上所陳，本發明所提供 混合光學薄膜之方法，子編雙乾材料製鑛 層膜，甚至可以製L二斩種：：折 的設計，更有利於自動化鍍膜的制-:工光干薄膜 徑制’以元成各種多層膜Correct the experimental curve relationship between the refractive index of the film and the position of the target, as shown in Fig. 4, so that as the position coordinate value increases, the composition of Ta2 05 increases, and based on this result, we can find a position from the target position. The required refractive index. n The above-mentioned glass substrate 5 〇 in the process of sputtering an optical film, the introduction and mixing: the working pressure of the body can be in the range of 8χ 1〇_Η〇ΓΗ,] 5χ 1〇_4t〇rr, and the amount of gas used The regulator 1 1 is charged into the ion source 80 and introduced into the vacuum chamber 〆 / /, the drawing rate and its flow rate, which can be from 5 sccm to the ion beam voltage of the ion source 8 ί! * can be = 5 〇〇 Vai 500V, ion beam current (dry beam = k2 〇 mA a5 〇〇 mA '· This oxygen 13 is guided by another gas volume regulator 11 I Γ 其, its flow 1 can be from 10sccm Up to 50 sccm; and the slew rate of the rotatable soil seat can be controlled between 20 rpm and 1 00 rpm. The new shot t: ^ in 'Using the established experimental curve, according to the requirements of the film film;: 70 central 2 material position 'f and the use of quartz film thickness gauge 60 or light plate using A: ί required The film thickness is stopped and the sputtering is stopped, so that the glass ", the position of the low-curve moving target is sputtered to form a film of the double target 30 having a Li ratio, and the position of the target can be made by a variety of different refractions. The rate or the plating of the multi-layer optical interference filter product with the refractive index gradually increasing. The method of mixing the optical film provided by the present invention, the sub-made double-dry material ore film, even It can be made into two kinds of bismuth:: folding design, which is more conducive to the system of automatic coating--: work-drying film diameter system
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901236—SOl.ptc 第10頁 1251030 案號91100287 年 修正 圖式簡單說明 第一圖所示本發明之製造流程示意圖。 第二圖所示本發明之具體實施例圖。 第三圖所示本發明靶材座上承載雙靶材之示意圖。 第四圖所示本發明折射率與雙靶材位置關係示意圖。 第五圖所示本發明靶材位置與薄膜成份關係示意圖。 符號說明： 真空腔...............10 氣量調節器.........11 氬氣..................12 氧氣..................13 氬離子...............14 氧離子...............15 分子（或原子）_··16 革巴材座...............20 靶材移動架.........21 雙靶材...............30 组（T a )革巴材......31 矽（S i )革巴材......3 2 旋轉基板架.........40 玻璃基板............50 石英膜厚計.........60 光學膜厚計.........70 離子源...............8 0、9 0901236—SOl.ptc Page 10 1251030 Case No. 91100287 Correction of the Drawings The first figure shows a schematic diagram of the manufacturing process of the present invention. The second figure shows a detailed embodiment of the invention. The third figure shows a schematic diagram of carrying a double target on a target holder of the present invention. The fourth figure shows a schematic diagram of the relationship between the refractive index of the present invention and the position of the double target. Fig. 5 is a schematic view showing the relationship between the position of the target of the present invention and the composition of the film. DESCRIPTION OF SYMBOLS: Vacuum chamber...............10 Gas volume regulator.........11 Argon gas.............. ....12 Oxygen..................13 Argon ion...............14 Oxygen ion..... ..........15 Molecules (or atoms) _··16 革巴材座...............20 Target moving frame... ...21 double targets...............30 groups (T a ) leather materials ... 31 矽 (S i ) leather materials .... ..3 2 Rotating substrate holder...40 Glass substrate............50 Quartz film thickness meter.........60 Optical film thickness meter .........70 ion source...............8 0,9 0
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