TWI248475B - Hard coating and method for producing the same - Google Patents

Hard coating and method for producing the same Download PDF

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TWI248475B
TWI248475B TW92112061A TW92112061A TWI248475B TW I248475 B TWI248475 B TW I248475B TW 92112061 A TW92112061 A TW 92112061A TW 92112061 A TW92112061 A TW 92112061A TW I248475 B TWI248475 B TW I248475B
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coating
group
metal film
patent application
composite metal
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TW92112061A
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TW200407453A (en
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Chi-Wen Chu
Yue-Sen Yang
Sung-Mao Chiu
Wan-Chung Lo
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Metal Ind Res & Dev Ct
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Abstract

A hard coating formed by a physical vapor deposition mainly comprises surface coating including chromium, carbon, and at least one of vanadium, niobium, tantalum, molybdenum, or tungsten. The surface coating possesses properties of high temperature resistance and low frictional resistance. The hard coating preferably includes a substrate coating comprising chromium and at least one of vanadium, niobium, tantalum, molybdenum, or tungsten. Thus, a surface coating with high temperature resistance and low frictional resistance is stably formed on a substrate. The present invention further provides a method for forming a hard coating on a substrate.

Description

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【相關申請案】 本案主張中華民國九十一年十一月一曰申請案第 09 1 1 32636號「硬質鍍膜及其製造方法」之國内優先權。 【發明所屬之技術領域】 本發明係有關於一種耐高溫硬質鍍膜(hard coating)。 【先前技術】 耐久使用的工具一直是製造業界的需求,因此硬質鍍膜的 發展也應運而生。硬質鍍膜的應用十分廣泛,具凡工作機器 所用的刀具、切削工具(包含車、絞、鋸、銑、鉋、磨、 鑽、螺攻以及沖壓等)、模具(用於沖、壓或擠等)、汽車 工業中引擎、曲軸、變速箱、喷油嘴等零組件、航太工業中 各種推動器的渦輪葉片、紡織機械等各種零組件的表面都需 要覆蓋有硬質鍍層,用以得到耐磨、抗腐蝕、耐高溫、具潤 滑性之表面。 ' 目前已知的硬質鍍膜所都具備耐磨的特性,然而其耐高溫 的性質以及具潤滑性(低摩擦性)的性質卻難以兩全。舉例 而言,氮化鉻是一種應用廣泛的硬質鍍膜,其耐熱溫度^ 80 0 °C且其與水的接觸角約為7〇。,因此由氮化鉻鍍膜& 的^面具有耐高溫以及抗沾黏的特性,然而其缺點是氮化鉻 鍍f表面的摩擦係數高達〇 · 6,因此不適用於需低摩擦性質 (咼潤滑性質)之工具表面。碳化鉻是另一種應用廣泛的硬 質鍍膜,其表面的摩擦係數僅有〇·卜〇· 2,但是其與水的接 觸角只有約60。且耐熱溫度只有3〇〇,因此由碳化鉻鍍膜 形成的表面雖具有低摩擦性質(高潤滑性質)但卻難以抗沾[Related Applications] This case claims the domestic priority of “Hard Coating and Its Manufacturing Method” No. 09 1 1 32636 of the application for the Republic of China in November. TECHNICAL FIELD OF THE INVENTION The present invention relates to a high temperature resistant hard coating. [Prior Art] Durable tools have always been the demand of the manufacturing industry, so the development of hard coatings has emerged. Hard coatings are used in a wide range of applications, including tools for cutting machines, cutting tools (including cars, strands, saws, milling, planing, grinding, drilling, screwing, stamping, etc.) and molds (for punching, pressing or squeezing, etc.). ), the engine, crankshaft, gearbox, fuel injector and other components in the automotive industry, turbine blades, textile machinery and other components of the aerospace industry need to be covered with a hard coating for wear resistance. Corrosion resistant, high temperature resistant, lubricious surface. 'The hard coatings currently known are all wear resistant, but their high temperature resistance and lubricity (low friction) properties are difficult to achieve. For example, chromium nitride is a widely used hard coating with a heat resistance temperature of 80 ° C and a contact angle with water of about 7 〇. Therefore, the surface of the chrome-plated coating & has high temperature resistance and anti-stick properties, but its disadvantage is that the surface friction coefficient of the chromium nitride plated surface is as high as 〇·6, so it is not suitable for low friction properties. Lubricating properties) of the tool surface. Chromium carbide is another widely used hard coating with a surface friction coefficient of only 〇·〇·2, but its contact angle with water is only about 60. And the heat resistance temperature is only 3〇〇, so the surface formed by the chromium carbide coating has low friction property (high lubricating property) but is difficult to resist.

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黏也不適用於40 0 °C以卜—^ _ 上之鬲溫下。 然而’在高速操作的機 _ 以及低摩擦性質經常是缺二,鬲耐熱溫度、抗沾黏之性質 鍍膜在具有耐磨、抗腐蝕::::,因此目前亟需-種硬質 【發明内容】“黏之性質以及低摩擦性質)。 以及至少鉻、鈒、銳、鈕、鉬或鎢其中之一之表層鍍膜。該 硬質鍍膜較佳地另包含一層鈦或是其他4Β族之元素(例 或铪)之底層鍍膜,以及含有氮、鈦或是其他4B族之元 如錯或铪)、以及至少鉻、釩、鈮、钽、鉬或鎢其中之一所 組成之中間層鍍膜,該底層鍍膜以及該中間層鍍膜有助於將 表層鍍膜穩固地設於一基材上。 本發明之主要目的係提供一 貝鑛膜’藉此克服或至少改善 為達上述目的,本發明提供 質鍍膜,其主要包含一含有鉻 或鎢其中之一之表層鑛膜。該 有鉻以及至少飢、銳、纽、鉬 膜’該底層鍍膜有助於將表層 本發明另提供一種以物理氣 要包含一含有鈦或是其他4B族 種耐高溫以及低摩擦性質之硬 前述先前技術的問題。 一種以物理氣相沉積形成之硬 、石炭以及至少飢、銳、纽、銦 硬質鍍膜較佳地另包含一層含 或鶴其中之一所組成之底層鍍 鍵Μ穩固地設於一基材上。 相沉積形成之硬質鍍膜,其主 之元素(例如錯或铪)、氮、碳 本發明另提供一種將硬質鍍膜形成於一基材表面之方法。 首先,將基材置於一物理氣相沉積系統,然後於物理氣相沉 積系統中通入鈍氣,再以鉻金屬以及至少凱、銳、钽、鉬或Viscosity is also not applicable to 40 ° C to the temperature of the ^ ^ _. However, 'the machine with high speed operation _ and low friction properties are often lacking. The heat-resistant temperature and anti-adhesive properties of the coating are wear-resistant and corrosion-resistant::::, so there is a need for a hard type [invention] "viscosity and low friction properties" and a surface coating of at least one of chrome, tantalum, sharp, button, molybdenum or tungsten. The hard coating preferably further comprises a layer of titanium or other 4 lanthanum elements (eg or底层) an underlying coating, and an intermediate layer coating comprising nitrogen, titanium or other 4B elements such as erbium or yttrium, and at least one of chromium, vanadium, niobium, tantalum, molybdenum or tungsten, the underlying coating And the interlayer coating facilitates the stable coating of the surface coating on a substrate. The main object of the present invention is to provide a shell film 'to thereby overcome or at least improve the above object, and the present invention provides a coating film, Mainly comprising a surface mineral film containing one of chromium or tungsten. The chromium film and at least the hunger, sharp, new, molybdenum film 'the underlying coating layer helps to provide the surface layer of the invention with a physical gas to contain a Titanium or other Group 4B species are resistant to high temperature and low friction properties. The hard prior art of hard, charcoal and at least hunger, sharp, neon, and indium hard coatings formed by physical vapor deposition preferably further comprises a layer containing Or the bottom plating of one of the cranes is firmly disposed on a substrate. The hard coating formed by phase deposition, the main element (such as wrong or 铪), nitrogen, carbon, the present invention further provides a hard coating a method of forming a surface of a substrate. First, placing the substrate in a physical vapor deposition system, then introducing an blunt gas into the physical vapor deposition system, and then using chromium metal and at least Kay, sharp, bismuth, molybdenum or

00596.Tl-CAl.ptd00596.Tl-CAl.ptd

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=中之-的純金屬為㈣’將其同時蒸鑛於該基材表面以 底層鍍膜。下—步,可通入碳氫化合物氣體於該物理 ::’儿2系統中以鉻金屬以及至少叙、㉟、鈕、鉬或鎢 a的純金屬為乾源(較佳相同於形成底層鍍膜之靶源— :=述之至)兩種金屬同時蒸鍍於該底層鍍膜以形成該、The pure metal of the medium is (four)', which is simultaneously distilled to the surface of the substrate to coat the underlayer. In the next step, a hydrocarbon gas can be introduced into the physics:: 2 system with a chrome metal and at least a pure metal of 35, button, molybdenum or tungsten a as a dry source (preferably the same as forming an underlying coating) The target source - : = is described) two metals are simultaneously evaporated on the underlying coating to form the

、,本發明再提供一種將硬質鍍膜形成於一基材表面之方法。 :先,將基材置於一物理氣相沉積系統,然後於物理氣相沉 二糸八统中通入氬氣,再以鈦或是其他4β族之元素(例如鍅或 :)至屬*為靶源,將其蒸鍍於該基材表面以形成該底層鍍 或曰ί二於物理氣相沉積系統中通入氬氣以及氮&,以敍 ^疋/、他4Β族之元素(例如錘或铪)金屬以及至少鉻、釩、 ;某5茅:或鎢其中之一的純金屬為靶源’將其同時蒸鍍炉 2材表面以形成該中間層鑛膜。下一步, 二 氧體、亂氣以及氬氣於該物理氣 i 口物 组Γ二:t(例如锆或铪)金屬以及至少鉻、飢、銳 膜以形成該表層㈣。ν兩種金屬@時蒸鍍於該底g 關它目的、優點、和新穎之特徵,從下文盘譽— 關%的砰細說明中將更為明確。 攸卜又與圖开 【實施方式】 本务明揭示一種硬質鑛膜,iFurther, the present invention provides a method of forming a hard coating film on the surface of a substrate. : First, the substrate is placed in a physical vapor deposition system, and then argon gas is introduced into the physical vapor deposition system, and then titanium or other elements of the 4β family (for example, yttrium or :) are attached to the genus*. As a target source, it is vapor-deposited on the surface of the substrate to form the underlying plating or argon gas into the physical vapor deposition system, and argon gas and nitrogen & For example, a hammer or bismuth metal and at least a chromium, vanadium, or a pure metal of one of the 5: or tungsten is used as a target source. The surface of the furnace 2 is simultaneously vapor-deposited to form the intermediate layer of the ore film. Next, a dioxane, a disordered gas, and an argon gas are applied to the physical gas to form a metal such as z (or zirconium or hafnium) and at least a chromium, hunger, and sharp film to form the surface layer (4). ν Two kinds of metal @ vapor deposition on the bottom g of its purpose, advantages, and novel features, from the following definitions - the detailed description of the details will be more clear.攸布又和图开 [Embodiment] This task reveals a hard mineral film, i

層鍍膜包含終、妒/、主要包含—表層鍍獏,該I 厌以及與鉻具有相同體心立方結構之週期;The layer coating comprises a final, 妒/, mainly comprising-surface ruthenium, the I ruin and a period of the same body-centered cubic structure as the chrome;

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五、發明說明(4) 中5 B奴或是6 B族(例如飢、銳 地說,前述之表層鍍膜係為—種找/目或鑛)&素。更具體 (由鉻以及釩、鈮、钽、翻或鎢中?有一碳的之複合金屬鍍膜 說明書中所界定的複合 >' 一兀素所組成)。在本 形成之鍍膜。 、糸私由兩種以上金屬所共同 苐1圖所不為根據明^一每fju / 件,其包含-美材uwi右ιί例之具有硬質鍛膜之物 供胺1qn 土 復盍有一底層鍍膜120以及前述之表層 鑛膜130 ’而該底層鍍膜120則包含欽以;^如本士 6B族之元素,且較佳為鉻二表中5B族或是 族或是6B族之元素之藉入入層鍍膜相同之週期表中5B 基材11〇 (例如鋼、、鋁^屬/签入’藉此使表層鍍膜130與 穩定的結合鋼㉟、鈦、超薄合金或是陶幻有良好且 2明另揭示一種硬質鍍膜’其主要包含 ,太或疋八他4B鉍之το素(例如鍅或姶)、氮、碳 =、目同體心立方結構之週期表中5B族或是6B族(例如 ;膜:盔ί、鈕、鉬或鎢)元素。更具體地說,前述之表層 為一種摻雜有碳以及氮之複合金屬鍍膜(由鈦或是1 ,4B知之凡素(例如錄或給)以及鉻、飢、铌、组、鉬 至少一元素所組成)。 τ 杜第4為根據本發明一實施例之具有硬質鍍膜之翁 ,、匕3—基材410覆蓋有一底層鍍膜42〇、中 ·· 4 Q Π ΤΎ . I, J θ 曰 刖广之表層鍍膜43〇,而該底層鍍膜420係為含鈦或 他!B^之、疋素(例如錯或給)之金屬錢膜。該中間層鍍膜 糸匕s鈦或疋其他4 β族之元素(例如錯或铪)以及週期表V. INSTRUCTIONS (4) 5 B slaves or 6 B groups (for example, hungry, sharply speaking, the above-mentioned surface coating is a kind of looking / mesh or mine) & More specific (composed of chromium and vanadium, niobium, tantalum, turn or tungsten, a composite metal coating as defined in the specification). The coating formed in this case.糸 由 由 由 由 由 由 由 由 由 由 由 由 由 由 由 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图 图120 and the surface mineral film 130' described above, and the underlying coating film 120 comprises an element of the group 6B, and is preferably a borrowing of the element 5B or the group of the group BB in the chrome table. The 5B substrate 11〇 (for example, steel, aluminum/sign-in) in the same periodic coating is used to make the surface coating 130 and the stable bonded steel 35, titanium, ultra-thin alloy or ceramics have good and 2 It is also disclosed that a hard coating film mainly contains, or is a tantalum, a 4B or a 6B group of the periodic table of the same body-centered cubic structure. (for example, film: helmet, button, molybdenum or tungsten). More specifically, the surface layer is a composite metal coating doped with carbon and nitrogen (known as titanium or 1, 4B). Or giving) and chromium, hunger, sputum, group, molybdenum at least one element.) τ Du 4 is an implementation according to the present invention. The hard coating, the crucible 3 - the substrate 410 is covered with an underlying coating 42 〇, medium · 4 Q Π ΤΎ . I, J θ 曰刖 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广 广Titanium or he! B^, 疋素 (such as wrong or give) metal money film. The middle layer is coated with 糸匕s titanium or 疋 other 4 β group elements (such as wrong or 铪) and periodic table

00596-TW-CAl.ptd 第8頁 1248475 五、發明說明(5) 中5B族或是μ族之元素,且較佳為 (例如錯或铪)以及盥表#铲膜相^夕$疋,、他仙族之元素 夕苷各 鍍膜相问之週期表中5B族或杲fiR旅 之兀素之複合金屬薄膜,藉此使表; 矢次疋6β^ 43〇有良好且穩定的結合。 胃鍍膜“Ο與中間層鍍膜 = 明之硬質鍍膜的特徵之一係為其由物理氣相沉積 田義:二ν3Ρ〇Γ deP〇Slti〇n)形成。物理氣相沉積,顧名 疋以物理機制來進行薄膜沉積而不涉及化學頁制名 Π轉Si;機制是物質的相變化現象,例如使^由 (丨離子化氣體之電漿態。藉著在兩個相對 分子濃产在輩e 上施以電壓,假如電極板間的氣體 /又某一特定的區間,電極板表面因離子轟擊(i 〇n /men” 所產生的二次電子(SeC〇ndary electrons), “ ”反所提供的電場下,將獲得足夠的能量。參照第2 二不二個陰極電極板2〇4遭受離子轟擊的情形。脫離電 ^二μ 正電荷離子,在暗區212的電場加速下,將獲得 極南的此1。當離子於陰極電極產生轟擊之後,基於動量 換(m⑽ent,um_ transf er)的原理,離子轟擊除了會產生二次 ,電子=外還會把與電極板2 0 4表面連接之靶源2 0 8的原子給 打擊’’出來’這個動作,我們稱之為,,濺擊(sputtering)”。 攻些被擊出的耙原子將進入電漿裡,然後利用諸如擴散& (diffusion)等的方式,最後傳遞到欲蒸鍍之基材n〇或^; 410的表面,並因而沈積。 才艮據所过^原、理’本發明亦提供一種利用物理氣相沉積將前 述之硬貝鍵膜形成於基材表面之方法。第3圖為根據本發明 1248475 五、發明說明(6) 一實施例之物理氣相沉積系統3 〇〇簡圖。該物理氣相沉積系 統3 0 0在基材的四周設有四個靶3 1〇,每一靶31〇設有鉻的純 金屬件以及纽(或是釩、鈮、鈕、鉬或鎢)的純金屬件,並 且該系統300還裝設有一氬氣源32〇以及反應氣體源33〇 (用 以挺供例如甲烧、乙快等碳氫化合物作為反應氣體)。 根據本發明之物理氣相沉積法係包括磁控直流濺鍵 (magnetron DC sputtering)或反應性濺鍍(reactive sputtering deposition)。首先,將已完成表面清潔及乾燥 之基材連接上系統3 〇 0之陰極電極並置入真空蒸鍍設備3 〇 〇 中,抽氣至真空腔壓達2x l〇-5Torr以下,即可進行蒸鍍製 程。蒸鍍時,充入氬氣控制真空腔壓,使蒸鍍壓力保持在約 l/x l(m〇rr〜9.0x 10-3Torr之間,再進行蒸鍍。適合用於 ,鍍,術的鈍氣另外還包含氦氣、氖氣、氪氣、氙氣、氮氣 等。瘵鍍時,利用前述之靶31〇作為蒸鍍靶源, 鍍=’靶電流為30A〜200A ;以濺射蒸鍍時,乾 以形成一底層鍍膜(厚度為約。.…至:為1A 5上 再通入甲燒或乙炔氣體,與被蒸鑛的』二 在^底層鍍膜表面形成—摻雜碳之表層鍍膜。 Κ 根據上述方法所製得之硬質鍍膜,表面 , 以下,水接觸角糊度,耐熱溫度在6〇〇ud〇) 顯具有較碳化鉻鍍膜良好之抗沾黏性與耐熱性0」此明 鑛膜良好之低摩擦性。 ^及較氮化鉻 本發明另提供-種利用物理氣相沉積將前述之硬質鑛膜形00596-TW-CAl.ptd Page 8 1248475 V. Description of the invention (5) Element 5B or group of μ, and preferably (for example, wrong or 铪) and 盥表# 膜膜相^@疋, The composite metal film of the 5B group or the 杲fiR britging element of the periodic table of the element of the immortality of the genus of the genus of the genus is a good and stable combination. Gastric coating "Ο and interlayer coating = one of the characteristics of the hard coating is formed by physical vapor deposition Tianyi: two ν3Ρ〇Γ deP〇Slti〇n.) Physical vapor deposition, as the name suggests physical mechanism To carry out thin film deposition without involving chemical chemistry, the name is changed to Si; the mechanism is the phase change phenomenon of the substance, for example, by the plasma state of the 丨 ionized gas. By the two relative molecules are concentrated on the generation e Apply voltage, if the gas between the electrode plates / a certain interval, the surface of the electrode plate due to ion bombardment (i 〇n /men" generated by secondary electrons (SeC〇ndary electrons), "" provided by Under the electric field, sufficient energy will be obtained. Refer to the case where the second two cathode electrode plates 2〇4 are subjected to ion bombardment. The detachment of the positively charged positive ions will obtain the polar south under the electric field acceleration of the dark region 212. 1. When the ions are bombarded at the cathode electrode, based on the principle of momentum switching (m(10)ent, um_transf er), the ion bombardment will generate a second time, and the electrons will also be connected to the surface of the electrode plate 204. Source 2 0 8 atoms give a blow '' Come out 'this action, we call it, sputtering.') Attacking some of the helium atoms that are hit will enter the plasma, and then use methods such as diffusion & The surface of the substrate is n〇 or ^ 410, and thus deposited. According to the present invention, the present invention also provides a method for forming the aforementioned hard shell film on the surface of the substrate by physical vapor deposition. Method 3 is a schematic diagram of a physical vapor deposition system 3 according to an embodiment of the invention. The physical vapor deposition system 300 has four sides around the substrate. The target 3 1〇, each target 31〇 is provided with a pure metal piece of chromium and a pure metal piece of neon (or vanadium, niobium, knob, molybdenum or tungsten), and the system 300 is also provided with an argon gas source 32〇. And a reaction gas source 33 〇 (for supplying a hydrocarbon such as a sulphur or a fast gas as a reaction gas). The physical vapor deposition method according to the present invention includes magnetron DC sputtering or reactivity. Reactive sputtering deposition. First, it will have The surface cleaned and dried substrate is connected to the cathode electrode of the system 3 〇0 and placed in a vacuum evaporation apparatus 3 ,, and evacuated to a vacuum chamber pressure of 2x l〇-5 Torr or less to perform the vapor deposition process. During vapor deposition, argon gas is charged to control the vacuum chamber pressure, and the vapor deposition pressure is maintained at about l/xl (m〇rr~9.0x 10-3 Torr, and then vapor deposition is performed. It is suitable for plating, blunt The gas also contains helium, neon, xenon, xenon, nitrogen, etc. In the case of rhodium plating, the target 31〇 is used as the vapor deposition target source, plating = 'target current is 30A~200A; Dry to form an underlying coating (thickness is about. .... to: 1A 5 is then introduced with a methane or acetylene gas, and the surface of the vaporized ore is formed on the surface of the underlying coating - doped carbon surface coating.硬 Hard coating film prepared according to the above method, surface, below, water contact angle paste, heat resistance temperature at 6〇〇ud〇) has better anti-adhesion and heat resistance than chromium carbide coating. The film is good in low friction. ^ and more chromium nitride. The present invention further provides the use of physical vapor deposition to form the aforementioned hard ore film.

00596-TW-CAl.ptd 第10頁 1248475 五、發明說明(7) 成^於基材表面之方法。參照第5圖,首先,將已完成表面清 潔及乾無之基材連接上系統5 〇 〇之陰極電極並置入真空蒸鍍 設備50 0中。該物理氣相沉積系統5〇〇在基材的四周設有四個 靶51 (^,每一靶510設有鈦(或是鍅、铪)的純金屬件以及鎢 ^,疋絡、,、銳、纽或鉬)的純金屬件,並且該系統5 〇 〇 退裝設有一氬氣源520以及反應氣體源“ο (用以提供例如甲 烷、乙炔等碳氫化合物作為反應氣體)以及540 (用以提供氮 氣)。 制接著’抽氣至真空腔壓達2 χ 1 〇 5 Τ 0 r r以下,即可進行蒸錢 製程。蒸鍍時,充入氬氣控制真空腔壓,使蒸鍍壓力保持在 約 1 · 0 X 1 〇-2Torr〜q Ω v 1 π-3 τ ^ pa .. 士 rr y· u x 10 3T〇rr之間,再進行蒸鍍。蒸鍍 牯,利用之靶作為蒸鍍靶源,分別控制蒸鍍時間及靶電流 (此靶電流與蒸鍍方式有關,例如以電弧蒸鍍時,靶電流為 30A〜200A ;以濺射蒸鍍時,靶電流為u〜5a之間),以形成一 僅有鈦(或疋锆、铪)之底層鍍膜(厚度為約〇ι 至約 之間)。然後,再通入氮氣,並且使兩種金屬靶之金屬 序π,到工作件4丨〇上與被蒸鍍的金屬結合在該底層鍍膜表 ,形成一摻雜氮之之金屬複合中間層鍍膜。下一步,通入氮 耽=及甲烷或乙炔氣體,在該中間層鍍膜表面形成一掺雜碳 以及亂之之金屬複合表層鍍膜。 =據^述方法所製得之硬質鍍膜,表面之摩擦係數在g n a % s 士接觸角大於8 〇度,耐熱溫度在6 0 0 °C至8 0 0 °C,因此 明α具有較碳化鉻鍍膜良好之抗沾黏性 鉻鍍膜良好之低摩擦性。 丁…r生以及季乂鼠化00596-TW-CAl.ptd Page 10 1248475 V. INSTRUCTIONS (7) Method of forming a surface on a substrate. Referring to Fig. 5, first, the substrate which has been cleaned and dried is connected to the cathode electrode of the system 5 〇 and placed in a vacuum evaporation apparatus 50. The physical vapor deposition system 5 is provided with four targets 51 around the substrate, and each target 510 is provided with a pure metal piece of titanium (or tantalum, niobium) and tungsten, tantalum, and Pure metal parts of sharp, new or molybdenum), and the system 5 〇〇 is equipped with an argon gas source 520 and a reactive gas source "o (to provide hydrocarbons such as methane, acetylene as a reaction gas) and 540 ( It is used to supply nitrogen.) Then, the pumping process can be carried out until the vacuum chamber pressure reaches 2 χ 1 〇5 Τ 0 rr, and the steaming process can be carried out. When vapor deposition, argon gas is charged to control the vacuum chamber pressure to make the vapor deposition pressure. Keep it between about 1 · 0 X 1 〇 -2 Torr ~ q Ω v 1 π - 3 τ ^ pa .. between rr y · ux 10 3T 〇 rr, and then carry out vapor deposition. The target source is controlled to control the evaporation time and the target current respectively. (The target current is related to the evaporation method. For example, when the arc is vapor-deposited, the target current is 30A to 200A; when sputtering is performed, the target current is u~5a. Between) to form an underlying coating of titanium (or zirconium, hafnium) (thickness between about 〇ι to about 约). Then, pass nitrogen And the metal sequence π of the two metal targets is combined with the vapor-deposited metal on the workpiece 4 to form a metal-doped intermediate layer coating film. Next, the access Nitrogen 耽 = and methane or acetylene gas, forming a doped carbon and a chaotic metal composite surface coating on the surface of the interlayer coating. = Hard coating prepared according to the method described above, the surface friction coefficient is gna % s The contact angle is more than 8 degrees, and the heat resistance temperature is between 60 ° C and 800 ° C. Therefore, the bright α has a good low friction resistance to the anti-adhesive chromium coating which is better than the chromium carbide coating. Mole

00596-TW-CAl.ptd 第11頁 1248475 五、發明說明(8) 以下實施例係用以說明本發明,並非用以 這些實施例中,係分別將多種的鍍膜組合蒗^ =其範圍。在 上,再進行附著力與刮痕試驗,以比較鍍膜=二一鋼基材 形,然後測試其摩擦係數。 、、者性之改善情 實施例 ------------ 鍍膜組合 ------- 附著力測 — ------ 刮痕試驗(Ν) 摩擦係數 -—------ 言式 --------- (scratch test) 鋼(基材)/鉻-組 高於50 鋼(基材)/碳(鉻- 附著力差 "" * --—---- 低於50 —-- 膜剝落 鈕) -----—-- 鋼(基材)/鉻-鈕/碳 (絡-叙) 附著力佳 -----— 而於50 ^- 由上表可知鍍層與工作件間的附著力係 及材料不同而有不同程度之改盖^ 、又、之π杰 屬層於鋼質工作件上時:t钽VAΛ 鉻-纽複合金 附著力極佳,因此其刮痕;驗Ύ曰對鋼貝工作件之 队m 』辰Α驗的拉力值可達50Ν以上,然而 鉻—me金屬制的缺點是其摩擦係、數大,不具有低 00596-TW-CAl.ptd 第12頁 1248475 五、發明說明(9) 舉擦性的表面。若是直接在鋼質工作件上形成一層摻雜碳的 鉻-组複合金屬鑛膜時’摻雜碳的絡〜钽複合金屬鍍膜對鋼質 工作件的附者力不良,因此鍍膜容易剝落,盔法進行摩捧係 數的測試。當蒸鍍一鉻-钽複合金屬層於鋼質工作件上以开 成-底層鍍膜’再蒸鍍一摻雜碳的鉻、钽複合金屬鍍臈於該 底層鍍膜上以形成-表層鑛膜時,由於介於卫作件與表^ 膜之間的底層Μ膜對於兩者都有良好的附著力,因此此^ :鍍膜對工作件之附著力良其到痕試驗的拉力值可; 5ON以上’且表面之摩擦係數低於〇 1 性質。實施例2_ 了具有良好的低摩擦 附著力測財熱 试 溫度 鋼(基材)/鈦 附著力優 300 40-50° >0.5 鋼(基材)/鈦/氮(鈦-鎢) 附著力優 500 50-60° >0.4 鋼(基材)/鈦/氮(鈦-^碳氮(鈦-鎢) 附著力優 800 _ >80° <0.1 摩擦係數 从—%瓜!敕朕興丞柯之結合力雖然良好,然而其 、潤滑性(具有低摩擦係數)以及抗沾黏性(具有較大之 水接觸角)卻不佳。中間層鍍膜與底層鍍膜結合力良好,发 耐熱性、潤滑性以及抗沾黏性較底層鍍膜佳。表層鍍膜盥、 間層鍍膜結合力良好,並且其耐熱性、潤滑性以及抗沾黏 第13頁 00596-TW-CAl.ptd 1248475 五、發明說明(10) 較中間層鑛膜更佳。 根據本發明之硬質鍍膜,其摩擦係數在0· 1以下,水接觸 角約80度,财熱溫度在6〇〇s8〇(rc,因此具有良好之抗沾黏 性且耐高溫並具有低摩擦性。此外,其製程與使用的器材與 製造碳化鉻鍍膜完全相同,因此在設備以及生產流程上不需 雖然本發明已以前述較佳實施例揭示,然复、, 本發明,任何熟習此技藝者,在不脫離本^並非用以限定 内,當可作各種之更動與修改。因此本發^明之精神和 後附之申請專利範圍所界定者為準。 之保護範圍卷国00596-TW-CAl.ptd Page 11 1248475 V. DESCRIPTION OF THE INVENTION (8) The following examples are intended to illustrate the invention, and are not intended to be used in the various embodiments. On the top, the adhesion and scratch test were performed to compare the coating = the shape of the steel substrate, and then the coefficient of friction was tested. , and the improvement of the situation ------------ coating combination ------- adhesion test - ------ scratch test (Ν) friction coefficient - ------ 言--------- (scratch test) steel (substrate) / chrome - group higher than 50 steel (substrate) / carbon (chromium - poor adhesion "" * ------- Less than 50 --- Membrane peeling button ) -------- Steel (substrate) / Chrome - button / carbon (complex - Syria) Good adhesion ----- — and 50 ^- From the above table, it can be seen that the adhesion between the coating and the workpiece is different and the material has different degrees of modification. Moreover, the π Jie layer is on the steel workpiece: t钽VAΛ chrome - New composite gold has excellent adhesion, so it has scratches; the inspection force on the steel shell work piece can be more than 50 拉, but the disadvantage of chrome-me metal is its friction system. The number is large, does not have the low 00596-TW-CAl.ptd Page 12 1248475 V. Description of the invention (9) The surface of the rubbing. If a layer of carbon-doped chrome-group composite metal ore film is formed directly on the steel work piece, the carbon-doped 钽-钽 composite metal coating has poor adhesion to the steel work piece, so the coating is easily peeled off, and the helmet is easily peeled off. The method is tested by the coefficient. When a chromium-ruthenium composite metal layer is vapor-deposited on the steel working piece to form an underlying coating film, and then a carbon-doped chromium or lanthanum composite metal is plated on the underlying plating film to form a surface mineral film. Because the underlying enamel film between the weigong and the film has good adhesion to both, this ^: the adhesion of the coating to the workpiece can be good to the tensile test of the trace test; 5ON or more 'And the friction coefficient of the surface is lower than the 〇1 nature. Example 2_ has a good low friction adhesion test heat test temperature steel (substrate) / titanium adhesion excellent 300 40-50 ° > 0.5 steel (substrate) / titanium / nitrogen (titanium - tungsten) adhesion Excellent 500 50-60° >0.4 Steel (substrate) / titanium / nitrogen (titanium - ^ carbon nitrogen (titanium - tungsten) adhesion excellent 800 _ > 80 ° < 0.1 friction coefficient from -% melon! Although the bonding strength of Xingfu Ke is good, its lubricity (with low friction coefficient) and anti-adhesion (with large water contact angle) are not good. The interlayer coating has good adhesion to the underlying coating and is heat-resistant. Sex, lubricity and anti-adhesion are better than the underlying coating. The surface coating 盥, interlayer coating adhesion is good, and its heat resistance, lubricity and anti-adhesion. Page 13 00596-TW-CAl.ptd 1248475 V. Invention Note that (10) is better than the intermediate layer mineral film. According to the hard coating of the present invention, the friction coefficient is less than 0.1, the water contact angle is about 80 degrees, and the heat temperature is 6 〇〇s8 〇 (rc, so it has good It is resistant to sticking and high temperature and has low friction. In addition, its process and equipment used to manufacture carbon The chrome plating film is completely the same, so the present invention is not required to be disclosed in the above-described preferred embodiments, and the present invention, any one skilled in the art, without departing from the scope of the present invention, is not limited thereto. , and the various changes and modifications may be made. Therefore, the spirit of the present invention and the scope of the patent application attached to it are subject to change.

1248475 圖式簡單說明 【圖式簡單說明】 第1圖 • 根 據 本 發 明 • 實 施 例之 具有硬質鍍 膜 之 物 件 剖 視 第2圖 • 根 據 本 發 明 一 實 施 例之 物理真空蒸 度 系 統 之 示 意 圖, 第3圖 • 根 據 本 發 明 另 一 實 施例 之物理真空 蒸 度 系 統 之 示 簡圖 > 第4圖 • 根 據 本 發 明 另 一 實 施例 之具有硬質 鍍 膜 之 物 件 剖 圖;以及 第5圖 • 根 據 本發 明 一 實 施 例之 物理真空蒸 度 系 統 之 示 意 圖。 圖號說明: 110 基 材 120 底層鍍膜 130 表 層 鍍 膜 202 陽 極 電 極 204 陰極電極 208 靶 源 210 電漿區 212 暗 區 300 物 理 真 空 墓 $ w\ 度 系 統 310 靶 320 氬氣源 Μ 330 反 應 氣 體 源 ί 410 基 材 420 底層鍍膜 430 中 間 層 鍍 膜 440 表層鍍膜 500 物 理 真 空 蒸 度 系 統1248475 Brief description of the drawings [Simplified description of the drawings] Fig. 1 is a cross-sectional view of an object having a hard coating according to the present invention. Fig. 2 is a schematic view of a physical vacuum evaporation system according to an embodiment of the present invention, Figure 4 is a schematic view of a physical vacuum evaporation system according to another embodiment of the present invention. Fig. 4 is a cross-sectional view of an article having a hard coating according to another embodiment of the present invention; and Fig. 5; A schematic of a physical vacuum evaporation system of an embodiment. Figure No. Description: 110 Substrate 120 Underlying Coating 130 Surface Coating 202 Anode Electrode 204 Cathode Electrode 208 Target 210 Plasma Zone 212 Dark Zone 300 Physical Vacuum Tomb $ w\ Degree System 310 Target 320 Argon Source Μ 330 Reagent Gas Source ί 410 Substrate 420 Underlying Coating 430 Intermediate Coating 440 Surface Coating 500 Physical Vacuum Steaming System

00596-TW-CAl.ptd 第15頁 1248475 圖式簡單說明 510 靶 530 反應氣體源 5 2 0 氬氣源 540 反應氣體源00596-TW-CAl.ptd Page 15 1248475 Schematic description 510 Target 530 Reactive gas source 5 2 0 Argon source 540 Reagent gas source

00596-TW-CAl.ptd 第16頁 111·00596-TW-CAl.ptd Page 16 111·

Claims (1)

1248475 … , __ 案號92112061_^年 月 日 修正_ 六、申請專利範圍 1、 一種硬質鍍膜,其包含: 一表層鍍膜,該表層鍍膜包含鉻、碳以及由釩、鈮、 钽、鉬以及鎢所組成之群組選出者。 2、 依申請專利範圍第1項之硬質鍍膜,其另包含一底層鍍 膜夾設於該表層鍍膜與一基材之間,該底層鍍膜包含鉻以 及由釩、鈮、钽、鉬以及鎢所組成之群組選出者。 3、 依申請專利範圍第1項之硬質鍍膜,其中該表層鍍膜係 為一摻雜有碳的複合金屬薄膜,該複合金屬薄膜係包含鉻 以及由釩、鈮、钽、鉬以及鎢所組成之群組選出者。 4、 依申請專利範圍第3項之硬質鍍膜,其另包含一底層鍍 膜夾設於該表層鍍膜與一基材之間,該底層鍍膜係為一複 合金屬薄膜,該複合金屬薄膜係包含鉻以及由釩、鈮、 钽、鉬以及鎢所組成之群組選出者。 5、 依申請專利範圍第4項之硬質鍍膜,其中該底層鍍膜之 複合金屬薄膜之成分相同於該表層鍍膜之複合金屬薄膜之 成分。 6、 一種硬質鍍膜,其包含: 一表層鑛膜,該表層鍍膜基本上由(consisting essentially of)鉻、碳以及由鈒、銳、钽、鉑以及鶴所1248475 ... , __ Case No. 92112061_^ Year Month Day Correction _ VI. Patent Application Scope 1. A hard coating comprising: a surface coating comprising chromium, carbon and vanadium, niobium, tantalum, molybdenum and tungsten The group of members selected. 2. The hard coating according to item 1 of the patent application scope further comprises an underlying coating sandwiched between the surface coating and a substrate, the underlying coating comprising chromium and consisting of vanadium, niobium, tantalum, molybdenum and tungsten Group selector. 3. The hard coating according to item 1 of the patent application scope, wherein the surface coating is a composite metal film doped with carbon, the composite metal film comprising chromium and consisting of vanadium, niobium, tantalum, molybdenum and tungsten. Group selector. 4. The hard coating according to item 3 of the patent application scope, further comprising an underlying coating layer sandwiched between the surface coating and a substrate, wherein the underlying coating is a composite metal film, the composite metal film comprising chromium and A group of vanadium, niobium, tantalum, molybdenum, and tungsten. 5. The hard coating according to item 4 of the patent application scope, wherein the composition of the composite metal film of the underlying coating is the same as the composition of the composite metal film of the surface coating. 6. A hard coating comprising: a surface mineral film substantially consisting of chromium, carbon, and by 鈒, sharp, 钽, platinum, and cranes 00596 專 CAl.ptc 第17頁 .1248475 … ___案號92112061_年月日_魅_ 六、申請專利範圍 組成之群組選出者所組成。 7、 依申請專利範圍第6項之硬質鍍膜,其另包含一底層鍍 膜夾設於該表層鍍膜與基材之間,該底層鍍膜基本上由 (consisting essentially of)鉻以及由飢、銳、组、 鉬以及鶴所組成之群組選出者所組成。 8、 依申請專利範圍第6項之硬質鍍膜,其中該表層鍍膜係 為一摻雜有碳的複合金屬薄膜,該複合金屬薄膜基本上由 (consisting essentially of)鉻以及由鈒、銳、钽、 鉬以及鎢所組成之群組選出者所組成。 9、 依申請專利範圍第8項之硬質鍍膜,其另包含一底層鍍 膜夾設於該表層鍍膜與基材之間,該底層鍍膜係為一複合 金屬薄膜,該複合金屬薄膜基本上由(consisting essentially of)鉻以及由叙、銳、組、I目以及嫣所組成 之群組選出者所組成。 1 0、依申請專利範圍第9項之硬質鍍膜,其中該底層鍍膜 之複合金屬薄膜之成分相同於該表層鍍膜之複合金屬薄膜 之成分。00596 Special CAl.ptc Page 17 .1248475 ... ___ Case No. 92112061_年月日日_魅_6. Patent application scope The group of selected members is composed. 7. The hard coating according to item 6 of the patent application scope, further comprising an underlying coating layer sandwiched between the surface coating and the substrate, the underlying coating substantially consisting of chromium and by hunger, sharp, group The group consisting of molybdenum and cranes. 8. The hard coating according to item 6 of the patent application scope, wherein the surface coating is a composite metal film doped with carbon, the composite metal film consists essentially of chromium and by 鈒, sharp, 钽, It consists of a group of molybdenum and tungsten. 9. The hard coating according to item 8 of the patent application scope further comprises an underlying coating sandwiched between the surface coating and the substrate, wherein the underlying coating is a composite metal film, and the composite metal film is substantially (consisting) Essentially of) chromium and consists of group selectors consisting of Syria, Sharp, Group, I and 嫣. 10. The hard coating according to item 9 of the patent application scope, wherein the composition of the composite metal film of the underlying coating is the same as the composition of the composite metal film of the surface coating. 00596-TW-CAl.ptc 第18 I 1248475 __案號92112061_年月曰 修正_ 六、申請專利範圍 11、一種將硬質鍍膜形成於一基材表面之方法,該方法包 含下列步驟: 將基材置於一同時以鉻以及由鈒、銳、组、翻以及鶴所 組成之群組選出者為靶源的物理氣相沉積系統中; 於該物理氣相沉積系統中通入碳氫化合物氣體;以及 當碳氫化合物氣體充滿物理氣相沉積系統時,同時將鉻 以及由釩、鈮、钽、鉬以及鎢所組成之群組選出者蒸鍍於 該基材表面,形成一表層鍍膜。 1 2、依申請專利範圍第1 1項之將硬質鍍膜形成於一基材表 面之方法,其另包含: 在通入碳氫化合物之前,將純氣通入該物理氣相沉積系 統;以及 當鈍氣充滿物理氣相沉積系統時,同時將鉻以及由釩、 鈮、鈕、鉬以及鎢所組成之群組選出者同時蒸鍍於該基材 表面,形成一底層鍍膜。 1 3、依申請專利範圍第1 2項之將硬質鍍膜形成於一基材表 面之方法,其中形成底層鍍膜以及形成表層鍍膜的步驟係 使用相同之金屬把源。 1 4、依申請專利範圍第11項之硬質鍍膜形成於一基材表面 之方法,其中該碳氫化合物氣體係為乙炔。00596-TW-CAl.ptc 18 I 1248475 __ Case No. 92112061_年月曰 _ _ _ 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 The material is placed in a physical vapor deposition system that uses both chromium and a group of sputum, sharp, group, turn, and crane as target sources; hydrocarbon gas is introduced into the physical vapor deposition system. And when the hydrocarbon gas is filled with the physical vapor deposition system, chromium and a group selected from vanadium, niobium, tantalum, molybdenum, and tungsten are simultaneously vapor-deposited on the surface of the substrate to form a surface coating. 1 . The method of forming a hard coating on a surface of a substrate according to the scope of claim 1 of the patent application, further comprising: introducing pure gas into the physical vapor deposition system before introducing the hydrocarbon; When the blunt gas is filled with the physical vapor deposition system, chromium and a group selected from vanadium, niobium, button, molybdenum and tungsten are simultaneously vapor-deposited on the surface of the substrate to form an underlying coating. 1 3. A method of forming a hard coating on a surface of a substrate according to the first aspect of the patent application, wherein the step of forming the underlying coating and forming the surface coating uses the same metal source. A method of forming a hard coating film according to claim 11 of the patent application form on a surface of a substrate, wherein the hydrocarbon gas system is acetylene. 00596-TW-CAl.ptc 第19頁 1248475 _案號92112061_年月曰 修正_ 六、申請專利範圍 15、 依申請專利範圍第11項之硬質鍍膜形成於一基材表面 之方法,其中該碳氫化合物氣體係為甲烷。 16、 一種具有硬質鍍膜之物件,其包含: 一基材,其材質係為由鋼、铭、鈦、超薄合金以及陶究 所組成之群組中選出者;及 一硬質鍍膜,其包含一表層鍍膜包含鉻、碳以及由釩、 鈮、钽、鉬以及鎢所組成之群組選出者。 1 7、依申請專利範圍第1 6項之具有硬質鍍膜之物件,其另 包含一底層鍍膜夹設於該表層鍍膜與基材表面之間,該底 層鍍膜包含鉻以及由釩、鈮、钽、鉬以及鎢所組成之群組 選出者。 1 8、依申請專利範圍第1 6項之具有硬質鍍膜之物件,其中 該表層鍍膜係為一摻雜有碳的複合金屬薄膜,該複合金屬 薄膜係包含鉻以及由凱、銳、組、顧以及鐫所組成之群組 選出者。 1 9、依申請專利範圍第1 8項之具有硬質鍍膜之物件,其另 包含一底層鍍膜夾設於該表層鍍膜與該基材表面之間,該 底層鍍膜係為一複合金屬薄膜,該複合金屬薄膜係包含鉻 以及由釩、鈮、鈕、鉬以及鎢所組成之群組選出者。00596-TW-CAl.ptc Page 19 1248475 _ Case No. 92112061_年月曰 曰 Amendment _ 6. Patent application scope 15. A method of forming a hard coating film on a surface of a substrate according to claim 11 of the patent application scope, wherein the carbon The hydrogen gas system is methane. 16. A hard coated article, comprising: a substrate selected from the group consisting of steel, inscription, titanium, ultra-thin alloy, and ceramics; and a hard coating comprising one The surface coating consists of chromium, carbon, and a group of vanadium, niobium, tantalum, molybdenum, and tungsten. 1 7. The object having a hard coating according to claim 16 of the patent application scope further comprises an underlying coating layer sandwiched between the surface coating film and the surface of the substrate, the underlying coating film comprising chromium and vanadium, niobium, tantalum, A group of molybdenum and tungsten selected. 18. The article having a hard coating according to the scope of the patent application, wherein the surface coating is a composite metal film doped with carbon, the composite metal film comprising chromium and by Kay, sharp, group, Gu And the group selection of the group. 1 . The article having a hard coating according to claim 18 of the patent application, further comprising an underlying coating layer sandwiched between the surface coating and the surface of the substrate, wherein the underlying coating is a composite metal film, the composite The metal film is composed of chromium and a group selected from vanadium, niobium, niobium, molybdenum and tungsten. 00596-TW-CAl.ptc 第20頁 1248475 ___案號92112061_年月曰 修正_ 六、申請專利範圍 2 0、依申請專利範圍第1 9項之具有硬質鍍膜之物件,其中 該底層鍍膜之複合金屬薄膜之成分相同於該表層鍍膜之複 合金屬薄膜之成分。 21、一種硬質鍍膜,其包含: 一表層鍍膜,該表層鍍膜包含由鈦、锆以及铪所組成之 群組選出者、氮、碳以及由鉻、釩、鈮、鈕、鉬以及鎢所 組成之群組選出者; 一底層鍍膜設於一基材上,該底層鍍膜包含由鈦、錘以 及铪所組成之群組選出者;以及 一中間層鍍膜夾設於該底層鍍膜與該表層鍍膜之間,該 中間層鍍膜包含由鈦、錘以及铪所組成之群組選出者、氮 以及由鉻、飢、銳、钽、錮以及鎢所組成之群組選出者。 2 2、依申請專利範圍第2 1項之硬質鍍膜,其中該表層鍍膜 係為一掺雜有礙以及氮的複合金屬薄膜,該複合金屬薄膜 係包含由鈦、錯以及铪所組成之群組選出者以及由鉻、 飢、銳、鈕、I目以及爲所組成之群組選出者。 2 3、依申請專利範圍第2 2項之硬質鍍膜,其中該底層鍍膜 係為一由鈦、锆以及铪所組成之群組選出者所構成之單一 金屬薄膜,該中間層鍍膜係為一摻雜有氮之複合金屬薄 膜,包含由鈦、錯以及铪所組成之群組選出者以及由鉻、 釩、鈮、鈕、鉬以及鎢所組成之群組選出者。00596-TW-CAl.ptc Page 20 1248475 ___ Case No. 92112061_年月曰 _ Revision _ 6. Patent application scope 2 0. According to the patent application scope, item 19 has a hard coated object, wherein the underlying coating is The composition of the composite metal film is the same as that of the composite metal film of the surface coating. 21. A hard coating comprising: a surface coating comprising a group of titanium, zirconium and hafnium selected from the group consisting of nitrogen, carbon and chromium, vanadium, niobium, niobium, molybdenum and tungsten. a group of coatings; an underlying coating disposed on a substrate, the underlying coating comprising a group of titanium, hammer, and tantalum; and an intermediate coating sandwiched between the underlying coating and the surface coating The interlayer coating comprises a group of titanium, hammer, and crucible, nitrogen, and a group of chrome, hunger, sharp, bismuth, antimony, and tungsten. 2, according to the patent application scope of the second aspect of the hard coating, wherein the surface coating is a doped and nitrogen composite metal film, the composite metal film comprising a group consisting of titanium, erbium and strontium The selected person is selected from the group consisting of chrome, hunger, sharp, button, I, and for the group. 2 3. The hard coating according to item 22 of the patent application scope, wherein the underlying coating is a single metal film composed of a group of titanium, zirconium and hafnium, and the interlayer coating is a blend. A composite metal film mixed with nitrogen, comprising a group of titanium, erbium, and yttrium, and a group of chrome, vanadium, niobium, niobium, molybdenum, and tungsten. 00596-TW-CAl.ptc 第21頁 1248475 _案號 92112061_年月-曰 _ 六、申請專利範圍 24、 依申請專利範圍第23項之硬質鍍膜,其中該中間層鑛 膜之複合金屬薄膜之成分相同於該表層链膜之複合金屬薄 膜之成分。 25、 一種硬質鍍膜,其包含: 一表層鍍膜,該表層鍍膜基本係由(c〇nsisting essentially of)由鈦、錄以及铪所組成之群組選出者、 氮、碳以及由鉻、釩、銳、鈕、鉬以及鎢所組成之群組選 出者所組成; 一底層鍍膜設於一基材上,該底層鍍膜基本上由 (consisting essentially of)鈦-鍅以及铪所組成之 群組選出者形成;以及 一中間層鍍膜夾設於該底層鍍膜與該表層鍍膜之間,該 中間層鍍膜基本上由(consisting essentially of) 鈦、锆以及铪所組成之群組選出者、氮以及由鉻、釩、 鈮、钽、鉬以及鎢所組成之群組選出者所組成。 26、 依申請專利範圍第2 5項之硬質鍵膜,其中該表層鑛膜 係為一摻雜有碳以及氮的複合金屬薄膜,該複合金屬薄膜 基本係由(consisting essentially of)由鈦、結以及 铪所組成之群組選出者以及由鉻、訊、鈮、鈕、鉬以及鎢 所組成之群組選出者所組成。00596-TW-CAl.ptc Page 21 1248475 _ Case No. 92112061_年月-曰_6. Patent application scope 24. Hard coating according to item 23 of the patent application scope, wherein the composite metal film of the intermediate layer mineral film The composition is the same as the composition of the composite metal film of the surface layer film. 25. A hard coating comprising: a surface coating, the surface coating is basically selected from the group consisting of titanium, ruthenium and ruthenium, nitrogen, carbon, and chromium, vanadium, and sharp. a group consisting of buttons, molybdenum, and tungsten; an underlying coating disposed on a substrate, the underlying coating being substantially formed by a group of constituents consisting essentially of titanium-germanium and tantalum And an intermediate layer coating between the underlying coating and the surface coating, the intermediate coating consisting essentially of a group consisting of titanium, zirconium and hafnium, nitrogen and chromium, vanadium The group consisting of 铌, 钽, 钼, molybdenum and tungsten is selected. 26. The hard bond film according to item 25 of the patent application scope, wherein the surface mineral film is a composite metal film doped with carbon and nitrogen, the composite metal film is basically consisting of titanium and a knot. And the group selection of 铪 and the group of chrome, signal, 铌, button, molybdenum and tungsten. 005%-TW-CAl_ptc 第22頁 1248475 __案號92112061_年月曰 修正_ 六、申請專利範圍 27、依申請專利範圍第2 6項之硬質鍍膜,其中該底層鍍膜 係為一基本上由(consisting essentially of)鈦、結 以及铪所組成之群組選出者所構成之單一金屬薄膜,該中 間層鍍膜係為一摻雜有氮之複合金屬薄膜,該複合金屬薄 膜基本上由 (consisting essentially of) 由鈦、錯以 及铪所組成之群組選出者以及由鉻、釩、鈮、钽、鉬以及 鎢所組成之群組選出者所組成。 2 8、依申請專利範圍第2 7項之硬質鍍膜,其中該中間鍍膜 之複合金屬薄膜之成分相同於該表層鍍膜之複合金屬薄膜 之成分。 29、一種將硬質鍍膜形成於一基材表面之方法,該方法包 含下列步驟: 將基材置於一以由鈦、锆以及铪所組成之群組選出者以 及由鉻、釩、鈮、钽、鉬以及鎢所組成之群組選出者為靶 源的物理氣相沉積系統中; 於該物理氣相沉積系統中通入碳氫化合物氣體以及氮 氣;以及 當碳氫化合物氣體以及氮氣充滿物理氣相沉積系統時, 同時將由鈦、錯以及給所組成之群組選出者以及由凱、 鈮、鈕、鉬以及鎢所組成之群組選出者蒸鍍於該基材表 面,形成一表層鍍膜。005%-TW-CAl_ptc Page 22 1248475 __ Case No. 92112061_年月曰 _ Revision _ 6. Patent application scope 27, according to the patent application scope of the 26th hard coating, wherein the underlying coating is basically (consisting essentially) a single metal film composed of a group of titanium, a junction, and a crucible, the intermediate layer coating being a composite metal film doped with nitrogen, the composite metal film substantially consisting of (consisting essentially Of) A group of titanium, erbium, and yttrium, and a group of chrome, vanadium, niobium, tantalum, molybdenum, and tungsten. 2 8. The hard coating according to item 27 of the patent application scope, wherein the composite metal film of the intermediate coating has the same composition as the composite metal film of the surface coating. 29. A method of forming a hard coating on a surface of a substrate, the method comprising the steps of: placing the substrate in a group selected from the group consisting of titanium, zirconium and hafnium and from chromium, vanadium, niobium, tantalum a group of molybdenum and tungsten selected as a target physical vapor deposition system; a hydrocarbon gas and nitrogen are introduced into the physical vapor deposition system; and when the hydrocarbon gas and nitrogen are filled with physical gas In the phase deposition system, a group of titanium, erroneous, and a group of selected ones, and a group of keels, samarium, knobs, molybdenum, and tungsten are vapor-deposited on the surface of the substrate to form a surface coating. 00596-TW-CAl.:otc 第23 I 1248475 、 _案號92112061_年月日_魅_ 六、申請專利範圍 3 0、依申請專利範圍第2 9項之將硬質鍍膜形成於一基材表 面之方法,其另包含: 在通入碳氫化合物之前,將鈍氣通入該物理氣相沉積系 統;以及 當鈍氣充滿物理氣相沉積系統時,將由鈦、锆以及铪所 組成之群組選出者蒸鍍於該基材表面,形成一底層鍍膜; 以及 將氮氣通入該物理氣相沉積系統,同時將由鈦、錯以及 铪所組成之群組選出者以及由鉻、鈒、銳、钽、錮以及鶴 所組成之群組選出者同時蒸鍍於該底層鍍膜表面,形成一 中間層鑛膜。 3 1、依申請專利範圍第3 0項之將硬質鍍膜形成於一基材表 面之方法,其中形成中間層鍍膜以及形成表層鍍膜的步驟 係使用相同之金屬靶源。 3 2、依申請專利範圍第2 9項之硬質鍍膜形成於一基材表面 之方法,其中該碳氫化合物氣體係為乙炔。 3 3、依申請專利範圍第2 9項之硬質鍍膜形成於一基材表面 之方法,其中該碳氫化合物氣體係為曱烷。 34、一種具有硬質鍍膜之物件,其包含: 一基材,其材質係為由鋼、銘、鈦、超薄合金以及陶竟00596-TW-CAl.:otc 23 I 1248475, _ case number 92112061_年月日日_魅_6, the scope of application for patents 30, according to the scope of the patent application, the hard coating is formed on the surface of a substrate The method further comprising: introducing an blunt gas into the physical vapor deposition system before introducing the hydrocarbon; and grouping the titanium, zirconium, and thorium when the blunt gas is filled with the physical vapor deposition system The selected one is vapor-deposited on the surface of the substrate to form an underlying coating; and nitrogen is introduced into the physical vapor deposition system, and the group consisting of titanium, ruthenium and ruthenium is selected as well as chrome, ruthenium, ruthenium, iridium The group selectors of 锢, 锢 and crane are simultaneously evaporated on the surface of the underlying coating to form an intermediate layer of mineral film. 3 1. A method of forming a hard coating film on a surface of a substrate according to item 30 of the patent application scope, wherein the step of forming the intermediate layer coating film and forming the surface layer coating film uses the same metal target source. 3. A method of forming a hard coating film according to claim 29 of the patent application form on a surface of a substrate, wherein the hydrocarbon gas system is acetylene. 3 3. A method of forming a hard coating film according to claim 29 of the patent application form on a surface of a substrate, wherein the hydrocarbon gas system is decane. 34. An object having a hard coating comprising: a substrate made of steel, inscription, titanium, ultra-thin alloy, and ceramics 00596-TW-CAl.ptc 第24 I 1248475 __案號92112061_年月曰 修正_ 六、申請專利範圍 所組成之群組中選出者; 一硬質鍍膜,其包含一表層鍍膜包含由鈦、銼以及铪所 組成之群組選出者、氮、碳以及由鉻、釩、鈮、钽、鉬以 及鎢所組成之群組選出者; 一底層鍍膜設於該基材上,該底層鍍膜包含由鈦、锆以 及铪所組成之群組選出者;以及 一中間層鍍膜夾設於該底層鍍膜與該表層鍍膜之間,該 中間層鑛膜包含由鈦、锆以及給所組成之群組選出者、氮 以及由鉻、釩、鈮、钽、鉬以及鎢所組成之群組選出者。 35、依申請專利範圍第34項之具有硬質鍍膜之物件,其中 該表層鍍膜係為一摻雜有碳以及氮的複合金屬薄膜,該複 合金屬薄膜係包含由鈦、鍅以及铪所組成之群組選出者以 及由鉻、釩、鈮、鈕、鉬以及鎢所組成之群組選出者。 3 6、依申請專利範圍第3 5項之具有硬質鍍膜之物件,其中 該底層鍍膜係為一由鈦、锆以及铪所組成之群組選出者所 構成之單一金屬薄膜,該中間層鍍膜係為一摻雜有氮之複 合金屬薄膜,包含由鈦、锆以及铪所組成之群組選出者以 及由鉻、飢、鈮、组、钥以及鐫所組成之群組選出者。 3 7、依申請專利範圍第3 6項之具有硬質鍍膜之物件,其中 該中間層鍍膜之複合金屬薄膜之成分相同於該表層鍍膜之 複合金屬薄膜之成分。00596-TW-CAl.ptc 24th I 1248475 __Case No. 92112061_Yearly revision _ 6. Selected from the group consisting of patents; a hard coating containing a surface coating containing titanium and tantalum And a group selector selected from the group consisting of nitrogen, carbon, and a group of chrome, vanadium, niobium, tantalum, molybdenum, and tungsten; an underlying coating disposed on the substrate, the underlying coating comprising titanium a group of zirconium and hafnium; and an intermediate layer coating between the underlying coating and the surface coating, the intermediate layer of mineral film comprising titanium, zirconium and a group selected by the group, Nitrogen and a group of chrome, vanadium, niobium, tantalum, molybdenum and tungsten. 35. The article having a hard coating according to claim 34, wherein the surface coating is a composite metal film doped with carbon and nitrogen, the composite metal film comprising a group consisting of titanium, tantalum and niobium. The group is selected as well as the group of chrome, vanadium, niobium, button, molybdenum and tungsten. 3. The article having a hard coating according to Item 35 of the patent application, wherein the underlying coating is a single metal film composed of a group of titanium, zirconium and hafnium, the intermediate layer coating system It is a nitrogen-doped composite metal film comprising a group of titanium, zirconium and hafnium and a group of chrome, hunger, sputum, group, key and sputum. 3 7. The article having a hard coating according to the third aspect of the patent application, wherein the composition of the intermediate layer coated composite metal film is the same as the composition of the surface coated composite metal film. 00596-TW-CAl.ptc 第25頁00596-TW-CAl.ptc Page 25
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