1247200 九、發明說明： 【發明所屬之技術領域】 本發明提供一種修補圖案缺陷的方法，尤指一種可精 確修補濾、光圖案或光罩圖案缺陷的方法。 【先前技術】 隨著TFT-LCD面板次世代生產線玻璃基板尺寸逐漸 放大，彩色濾光圖案產業發展也同樣地面臨到玻璃基板尺 寸擴大的問題，因為彩色濾光圖案在製程中立即面臨顏料 光阻一次塗佈均勻性的困難，以及大面積高速塗佈技術需 克服等技術障礙；加上基板尺寸放大後，導致生產製程參 數複雜使生產良率不易提升等。因此，彩色濾光圖案要能 夠提升良率才能有效降低生產成本。 然而於基板上製作彩色濾光圖案時，常因人為或製程 不可預期之因素而造成彩色據光圖案上產生缺陷與微粒污 木等門題 H兄’於製作彩色濾、光圖案時會依照缺陷 與微粒污㈣嚴重程度與否而有不同的補救措施。舉例來 說，若彩色㈣圖案之微粒過多或缺陷過大，則可能將基 板上之彩色濾光圖案清除並進行—重作(_叫製程重新 1247200 製作彩色濾光圖案。若彩色濾光圖案之缺陷或微粒數目不 多，則一般會利用局部修補方式，例如利用研磨方式或利 用注射墨水方式修補彩色濾光圖案，以避免重作製程所需 耗費之大量成本。 請參考第1圖以及第2圖，第1圖以及第2圖為習知 利用研磨方式修補濾光圖案之方法示意圖。如第1圖所 示，一包含有複數個呈陣列排列濾光圖案12之透明基板 1〇(習稱CF基板），以及複數個黑色濾光圖案（black matrix)14設置於各相鄰之濾光圖案12之間，其中，複數 個呈陣列排列之濾光圖案12係為紅色濾光圖案、綠色濾光 圖案以及藍色濾光圖案所組成。如前所述，由於濾光圖案 12上易產生缺陷，若產生之缺陷大於可容許尺寸，如獨示 之突起缺陷16時，則使用一研磨機18進行研磨，以去除 部分突起缺陷16。如第2圖所示，突起缺陷16經過研磨 機18的研磨使突起高度與濾光圖案12切齊或降低至一預 設高度。 然而上述習知利用研磨方式修補濾光圖案之技術，由 於必領將突起缺陷之高度研磨至一特定高度之下，因此若 突起缺陷太大，會使整個修補過程中耗時過久，不利成本， 1247200 此外由於突起缺陷仍然在濾光圖案上，因此會影響到顏色 之色度或飽和度等。 請參考第3圖至第5圖，第3圖至第5圖為習知利用 注射墨水修補濾光圖案之方法示意圖。如第3圖所示，一 透明基板30包含有複數個濾光圖案32，以及複數個黑色 濾光圖案34設置於相鄰之濾光圖案32間，其中，複數個 濾光圖案32係為紅色濾光圖案、綠色濾光圖案以及藍色濾 光圖案所組成。當濾光圖案32出現突起缺陷34時，先使 用雷射光束38將突起缺陷36去除，再進行修補濾光圖案 32。如第4圖所示，當濾光圖案32之突起缺陷（圖未示）被 去除後會形成一缺口 40，此時利用一針頭42以適合之顏 色墨水44滴入濾光圖案32上之缺口 40，並將缺口 40填 滿。最後如第5圖所示，進行一烘烤製程使缺口 40内之墨 水44固化，最後再利用清洗液將缺口 40以外之部分清洗 去除。 由於前述利用注射墨水方式修補濾光圖案之技術，容 易發生墨水擴散至其他不需修補之濾光圖案的情形，因此 無法正確地修補濾光圖案，需要再使用適當之清洗液清洗 擴散至其他濾光圖案之墨水，而且在此清洗過程中，亦可 1247200 月b將不而修補之濾光圖案或修補好的濾光圖案再次破掠々 問題，再者利於修獅近兩種以上·光圖案，、、仅等 水方式亦發生混色造成色度或色飽和度偏 法^墨 將濾光圖案修補。 “、、去成功地 综合上述習知修補濾光圖案之技術，由於整個修補 光圖案之過程中，其所耗時間過長、無法確實將突起 清除以及需用清洗液等，因此無法有效降低製作濾光圖 之時間以及成本問題。 回案 【發明内容】 有鑑於此，本發明的目的在於提供一種修補遽光圖案 之缺陷的方法，以避免習知修補遽光圖案之缺點。 本發明之另-目的在於提供一種修補光罩圖案之缺陷 的方法，以降低製作光罩圖案之成本。 為達上述之目的，本發明提供一種修補遽光圖案與光 罩圖案之缺陷的方法。其包含有將—修補乾膜㈣也㈣吻 film)置放㈣光圖案或光罩圖案上，並且將修補乾膜覆蓋 濾光圖案或光罩圖案以及缺陷上，隨後進行一轉印製程， 1247200 將位於缺陷上之修補乾膜轉印至缺陷内，最後移除未被轉 印至缺陷内之修補乾膜。 【實施方式】 請參考第6圖至第9圖，第6圖至第9圖為本發明之 一較佳實施例修補濾光圖案之缺陷的方法示意圖。如第6 圖所示，一透明基板110包含有複數個濾光圖案112，以及 複數個黑色濾光圖案114設置於相鄰之濾光圖案112間， 其中每一個濾光圖案112均係由紅色濾光圖案、綠色濾光 圖案以及藍色濾光圖案所組成。 當濾光圖案112出現突起缺陷116時，首先使用雷射 光束118將突起缺陷116去除，再進行修補濾光圖案112。 接著如第7圖所示，在去除掉濾光圖案112表面之突起缺 陷（圖未示）之後，濾光圖案112表面會形成一缺口 120，此 時再使用一修補乾膜122覆蓋在缺口 120與濾光圖案112 上，並進行一預壓製程，例如使用壓膜機或利用氣壓等方 式，將修補乾膜122黏著在濾光圖案112上。其中，修補 乾膜122含有一基膜124以及一修補顏料層126，而修補 乾膜122則視欲修補之濾光圖案112之不同而使用紅色修 補乾膜、綠色修補乾膜或藍色修補乾膜。 1247200 接著，如第8圖所示，使用一微熱壓膜頭128在缺口 120上進行熱壓，利用微熱壓頭128之高溫將位於缺口 12〇 上之修補乾膜122熔解，藉以將修補乾膜122轉印至缺口 2〇内，並將缺口 120填滿，如此一來修補乾膜122便可 緊袷黏著於缺口 120内而不致脫落，其中微熱壓膜頭128 之开> 狀與尺寸係配合缺口 12〇之形狀與尺寸。 最後，如第9圖所示，將修補乾膜122撕除，即完成 濾光圖案112之修補。其中值得注意的是，若濾光圖案112 上若無突起缺陷116或異物等雜質，而是包含有凹陷之缺 陷’則可省略利用雷射光束Π8將突起缺陷116或異物等 雜質去除之步驟，而直接由第7圖實施至第9圖即可。 請參考第10圖以及第11圖，第1〇圖以及第11圖為⑩ 本發明之另一較佳實施例修補濾光圖案缺陷的方法示意 圖。與上述實施例不同之處在於本實施例係使用一光束進 仃修補乾膜之轉印動作，例如：雷射光、紫外光(UV光）等不 同波長形式之光源，因此去除濾光圖案之突起缺陷之步驟 - 與上述實施例之第6圖至第7圖所示之步驟相同，在此不 多加贅述。 11 1247200 如第10圖所示，當濾光圖案212形成一缺口 220後， 利用一光束228照射濾光圖案212之缺口 22〇，以加熱位 於缺口 220上之修補乾膜222，使修補乾膜222轉印至缺 口 220内，並將缺口 220填滿。其中修補乾膜222包含有 一基膜224以及一修補顏料層226，而修補乾膜222則視 欲修補之濾光圖案；112之不同而使用紅色修補乾膜、綠色 修補乾膜或藍色修補乾膜。最後，如第11圖所示，將修補 馨 乾膜222撕除，即完成濾光圖案212之修補。 上述實施例皆係以修補彩色之濾光圖案為例說明本發 明之方法’然而本發明之方法並未侷限於修補彩色之渡光 圖案’若黑色滤光圖案有缺陷情況產生時，亦可利用本發 明之方法，並配合使用黑色修補乾膜以修補黑色濾、光圖案。 除此之外’本發明之方法亦可應用於修補光罩圖案之 缺陷。如第12圖所示，提供一光罩基板230，其包含有複 數個光罩圖案232，藉以使光罩基板230形成不透光區。 ， 其中光罩基板230為透光材質，例如玻璃、石英，所構成 ， 之主體，而光罩圖案232則係由不透光材質構成，例如鉻 及其化合物。而光罩基板230於製作過程中或運輸過程 12 1247200 中，可能因環境或其他不可預期因素使光罩圖案232受損 而使得光罩圖案232產生透光區缺陷说，此時可視情況 應用本I日月之方法並利用不透光材質（例如黑色修補乾膜） 進行修補❿修補光罩圖案缺陷之方法步驟如同上述實施 例之第7圖至第9 @所示之步驟相同，在此不多加資述。 綜上所述，本發明提供一種修補濾光圖案或光罩圖案 之缺的方法，相較於習知技藝至少包括以下之優點·· (1) 修補濾光圖案或光罩圖案之缺陷的方法採用 雷射光束將突起缺陷或異物等雜質去除，減少滤光圖案之 色彩文犬起缺陷或異物等雜質影響，以提升色彩之亮度與 飽和度。 (2) 修補濾、光圖案之缺陷的方法採用壓膜機預壓 修補乾膜’再使用雷射光束或微熱壓膜頭可以精確地修補籲 濾光圖案之缺口，並且不需再使用藥劑清洗，更可有效降 低成本，進而提升良率。 以上所述僅為本發明之較佳實施例，凡依本發明申請專 ， 利範圍所做之均等變化與修飾，皆應屬本發明專利之涵蓋 範圍。 13 1247200 【圖式簡單說明】 第1圖以及第2圖為習知利用研磨方式修補濾光圖案之方 法示意圖。 第3圖至第5圖為習知利用注射墨水方式修補濾光圖案之 方法示意圖。 第6至第9圖為本發明之一較佳實施例修補濾光圖案之缺 陷的方法示意圖。 第10至第11圖為本發明另一較佳實施例之修補濾光圖案 之缺陷的方法示意圖。 第12圖為本發明光罩圖案之缺陷示意圖。 【主要元件符號說明】 10 透明基板 12 濾光圖案 14 黑色濾光圖案 16 突起缺陷 18 研磨機 30 透明基板 32 濾光圖案 34 黑色濾光圖案 36 突起缺陷 38 雷射光束 40 缺口 42 針頭 14 1247200 44 墨水 110 透明基板 112 濾光圖案 114 黑色滤光圖案 116 突起缺陷 118 雷射光束 120 缺口 122 修補乾膜 124 基膜 126 修補顏料層 128 微熱壓膜頭 210 透明基板 212 濾光圖案 214 黑色濾光圖案 220 缺口 222 修補乾膜 224 基膜 226 修補顏料層 228 光束 230 光罩基板 232 光罩圖案 234 透光區缺陷 151247200 IX. Description of the Invention: [Technical Field] The present invention provides a method of repairing pattern defects, and more particularly to a method for accurately repairing defects of a filter, a light pattern or a reticle pattern. [Prior Art] As the size of the glass substrate of the next generation of TFT-LCD panel is gradually enlarged, the development of the color filter pattern industry is also facing the problem of the expansion of the size of the glass substrate, because the color filter pattern immediately faces the pigment photoresist in the process. The difficulty of uniform coating once, and the technical obstacles to overcome in large-area high-speed coating technology; coupled with the enlargement of the substrate size, the production process parameters are complicated and the production yield is not easy to be improved. Therefore, the color filter pattern can increase the yield to effectively reduce the production cost. However, when a color filter pattern is formed on a substrate, a defect such as a defect in the color light pattern and a particulate stain is often caused by an unpredictable factor of the human or the process, and the color pattern and the light pattern are in accordance with the defect. There are different remedies than the severity of particulate contamination (iv). For example, if the color (four) pattern has too many particles or the defect is too large, the color filter pattern on the substrate may be removed and re-created (the process is repeated 1247200 to create a color filter pattern. If the color filter pattern is defective) Or if the number of particles is small, the partial repair method is generally used, for example, the color filter pattern is repaired by grinding or by using ink injection to avoid the large cost of re-manufacturing the process. Please refer to FIG. 1 and FIG. Fig. 1 and Fig. 2 are schematic views showing a conventional method of repairing a filter pattern by grinding. As shown in Fig. 1, a transparent substrate 1 comprising a plurality of filter patterns 12 arranged in an array is arranged (referred to as CF). a substrate, and a plurality of black matrix 14 disposed between the adjacent filter patterns 12, wherein the plurality of filter patterns 12 arranged in an array are red filter patterns and green filters The pattern and the blue filter pattern are composed. As described above, since the filter pattern 12 is prone to defects, if the defect is larger than the allowable size, such as the protrusion defect 16 alone. Then, a grinder 18 is used for grinding to remove a part of the protrusion defect 16. As shown in Fig. 2, the protrusion defect 16 is ground by the grinder 18 so that the protrusion height is aligned with the filter pattern 12 or lowered to a predetermined height. However, the above-mentioned technique of repairing the filter pattern by the grinding method has a problem that the height of the protrusion defect is ground to a certain height, so if the protrusion defect is too large, the entire repair process takes too long, which is disadvantageous. Cost, 1247200 In addition, since the protrusion defects are still on the filter pattern, it affects the color chromaticity or saturation of the color, etc. Please refer to Figures 3 to 5, and Figures 3 to 5 show the conventional use of injection ink. A schematic diagram of a method for repairing a filter pattern. As shown in FIG. 3, a transparent substrate 30 includes a plurality of filter patterns 32, and a plurality of black filter patterns 34 are disposed between adjacent filter patterns 32, wherein The filter patterns 32 are composed of a red filter pattern, a green filter pattern, and a blue filter pattern. When the filter pattern 32 has a protrusion defect 34, the laser beam 38 is used first to expose the protrusion defect 36. In addition, the filter pattern 32 is repaired. As shown in FIG. 4, when the protrusion defect (not shown) of the filter pattern 32 is removed, a notch 40 is formed, and a needle 42 is used to fit the color ink. 44 is dropped into the notch 40 on the filter pattern 32, and the notch 40 is filled. Finally, as shown in Fig. 5, a baking process is performed to cure the ink 44 in the notch 40, and finally the cleaning liquid is used to cover the notch 40. Part of the cleaning and removal. Due to the above-mentioned technique of repairing the filter pattern by the method of injecting ink, it is easy to cause the ink to diffuse to other filter patterns that do not need to be repaired, so that the filter pattern cannot be properly repaired, and it is necessary to use a suitable cleaning solution. Cleaning the ink that has spread to other filter patterns, and during this cleaning process, the filter pattern or the repaired filter pattern that is not repaired may be broken again in 1247,200 b, and the lion is close to two. More than one kind of light pattern, and only the water-like method also causes color mixing to cause chromaticity or color saturation, and the ink filter pattern is repaired. ",, to successfully integrate the above-mentioned conventional technique of repairing the filter pattern, since the entire process of repairing the light pattern takes too long, the protrusion cannot be surely removed, and the cleaning liquid is required, the production cannot be effectively reduced. The time and cost of the filter chart. [Review] In view of the above, it is an object of the present invention to provide a method for repairing the defects of the calender pattern to avoid the disadvantages of the conventional repair of the calender pattern. - The object is to provide a method of repairing defects of a reticle pattern to reduce the cost of fabricating a reticle pattern. To achieve the above object, the present invention provides a method of repairing defects in a enamel pattern and a reticle pattern. - Repair the dry film (4) Also (4) Kiss film) Place the (4) light pattern or reticle pattern, and repair the dry film to cover the filter pattern or reticle pattern and defects, and then carry out a transfer process, 1247200 will be located on the defect The repaired dry film is transferred into the defect, and finally the repaired dry film that has not been transferred into the defect is removed. [Embodiment] Please refer to Fig. 6 to Fig. 9 6 to 9 are schematic views showing a method of repairing defects of a filter pattern according to a preferred embodiment of the present invention. As shown in FIG. 6, a transparent substrate 110 includes a plurality of filter patterns 112, and a plurality of The black filter pattern 114 is disposed between the adjacent filter patterns 112, wherein each of the filter patterns 112 is composed of a red filter pattern, a green filter pattern, and a blue filter pattern. When the filter pattern 112 appears When the defect 116 is protruded, the protrusion defect 116 is first removed using the laser beam 118, and the filter pattern 112 is repaired. Next, as shown in Fig. 7, after the protrusion defect (not shown) on the surface of the filter pattern 112 is removed A gap 120 is formed on the surface of the filter pattern 112. At this time, a repair dry film 122 is used to cover the gap 120 and the filter pattern 112, and a pre-pressing process is performed, for example, using a laminator or using air pressure. The repaired dry film 122 is adhered to the filter pattern 112. The repair dry film 122 includes a base film 124 and a repair pigment layer 126, and the repair dry film 122 uses red depending on the filter pattern 112 to be repaired. Dry film, green repair dry film or blue repair dry film. 1247200 Next, as shown in Fig. 8, a micro-hot stamping head 128 is used for hot pressing on the notch 120, and the high temperature of the micro-heating head 128 is located in the gap. The repaired dry film 122 on the 12th layer is melted, whereby the repaired dry film 122 is transferred into the notch 2〇, and the notch 120 is filled, so that the dry film 122 can be repaired and adhered to the notch 120 without falling off. The shape and size of the opening and the size of the micro-calendering head 128 are matched with the shape and size of the notch 12 最后. Finally, as shown in Fig. 9, the repairing dry film 122 is peeled off, that is, the repair of the filter pattern 112 is completed. It should be noted that if there are no defects such as protrusion defects 116 or foreign matter on the filter pattern 112, but defects including recesses are included, the steps of removing the protrusion defects 116 or foreign matters by the laser beam Π 8 may be omitted. It can be directly implemented from Fig. 7 to Fig. 9. Referring to Fig. 10 and Fig. 11, FIG. 1 and FIG. 11 are schematic views showing a method of repairing a defect of a filter pattern according to another preferred embodiment of the present invention. The difference from the above embodiment is that the present embodiment uses a light beam to repair the dry film transfer action, such as laser light, ultraviolet light (UV light) and other light sources of different wavelength forms, thereby removing the protrusion of the filter pattern. The steps of the defect are the same as those shown in the sixth to seventh embodiments of the above embodiment, and will not be further described herein. 11 1247200 As shown in FIG. 10, after the filter pattern 212 forms a notch 220, the notch 22〇 of the filter pattern 212 is irradiated by a light beam 228 to heat the repaired dry film 222 located on the notch 220 to repair the dry film. 222 is transferred into the gap 220 and the notch 220 is filled. The repaired dry film 222 includes a base film 224 and a repair pigment layer 226, and the repair dry film 222 is modified according to the filter pattern; the red repair dry film, the green repair dry film or the blue repair dry membrane. Finally, as shown in Fig. 11, the repaired sweet film 222 is peeled off, that is, the repair of the filter pattern 212 is completed. In the above embodiments, the color filter pattern is taken as an example to illustrate the method of the present invention. However, the method of the present invention is not limited to repairing the color of the light-passing pattern, and may be utilized if the black filter pattern is defective. The method of the present invention is combined with a black repair dry film to repair black filter and light patterns. In addition to this, the method of the present invention can also be applied to the defect of repairing the mask pattern. As shown in Fig. 12, a reticle substrate 230 is provided which includes a plurality of reticle patterns 232 whereby the reticle substrate 230 forms an opaque region. The mask substrate 230 is made of a light-transmitting material such as glass or quartz, and the mask pattern 232 is made of an opaque material such as chromium and a compound thereof. In the manufacturing process or in the transportation process 12 1247200, the reticle pattern 232 may be damaged due to environmental or other unpredictable factors, so that the reticle pattern 232 is transparent. The method of the method of I and the month and the method of repairing the defect of the reticle pattern by the opaque material (for example, black repair dry film) is the same as the steps shown in the seventh embodiment to the ninth embodiment of the above embodiment, and is not here. More than enough. In summary, the present invention provides a method for repairing a lack of a filter pattern or a reticle pattern, which at least includes the following advantages over the prior art: (1) A method of repairing a defect of a filter pattern or a reticle pattern The laser beam is used to remove impurities such as protrusion defects or foreign matter, thereby reducing the influence of impurities such as defects or foreign matter in the filter pattern to enhance the brightness and saturation of the color. (2) The method of repairing the defects of the filter and the light pattern is pre-pressed and repaired by the laminator. 'The laser beam or the micro-hot film head can be used to precisely repair the gap of the filter pattern, and no need to use the agent to clean. It can effectively reduce costs and increase yield. The above is only the preferred embodiment of the present invention, and all changes and modifications made to the specific scope of the invention should be covered by the present invention. 13 1247200 [Simple description of the drawings] Fig. 1 and Fig. 2 are schematic diagrams showing a conventional method of repairing a filter pattern by grinding. Fig. 3 to Fig. 5 are schematic views showing a conventional method of repairing a filter pattern by means of an injection ink. 6 to 9 are schematic views showing a method of repairing a defect of a filter pattern according to a preferred embodiment of the present invention. 10 to 11 are schematic views showing a method of repairing defects of a filter pattern according to another preferred embodiment of the present invention. Figure 12 is a schematic view showing the defects of the reticle pattern of the present invention. [Main component symbol description] 10 Transparent substrate 12 Filter pattern 14 Black filter pattern 16 Projection defect 18 Grinder 30 Transparent substrate 32 Filter pattern 34 Black filter pattern 36 Projection defect 38 Laser beam 40 Notch 42 Needle 14 1247200 44 Ink 110 Transparent substrate 112 Filter pattern 114 Black filter pattern 116 Projection defect 118 Laser beam 120 Notch 122 Repair dry film 124 Base film 126 Repair pigment layer 128 Micro hot stamping head 210 Transparent substrate 212 Filter pattern 214 Black filter pattern 220 notch 222 repair dry film 224 base film 226 repair pigment layer 228 beam 230 mask substrate 232 mask pattern 234 light transmission area defect 15