TWI245406B - Cascaded gate-driven ESD clamp - Google Patents

Cascaded gate-driven ESD clamp Download PDF

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Publication number
TWI245406B
TWI245406B TW093138087A TW93138087A TWI245406B TW I245406 B TWI245406 B TW I245406B TW 093138087 A TW093138087 A TW 093138087A TW 93138087 A TW93138087 A TW 93138087A TW I245406 B TWI245406 B TW I245406B
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circuit
electrostatic discharge
series
transistor
voltage
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TW093138087A
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Chinese (zh)
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TW200541043A (en
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Ker-Min Chen
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Taiwan Semiconductor Mfg
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • H01L27/0266Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

A method is provided for semiconductor ESD protection in a mixed voltage device using cascaded gate driven NMOS clamp circuit. Used of a bias circuit allows for an external I/O signal to have a voltage higher than the internal circuit power supply voltage so that a proper trigger level is provided in reference to an external power supply reference. A cascaded gate-driven NMOS clamp circuit dissipates charge from an ESD event from the higher external I/O signal level without interfering with the normal operation of the internal or ""core"" circuits.

Description

1245406 九、發明說明: 【發明所屬之技術領域】 本i明係有關於靜電放電防護電路, 動之放電電晶體的靜電放雷_㈣ 4疋有關於使用具有閘極驅 靜電放電防護電路的機制。—隻包於使用金氣半技術之積體電路中進行 【先前技術】 半導體電路的可靠度在晶片設計中是 的複雜度與密度增加的踅 9衣,锊別是在電路 «連結易接收到會損害内部零組件的靜電放雪 打輪出與電 材質n μ 件咖峨會亂碰魏中的精細 歼貝層胃日日片附置於—大型電路(如:附置於 易受到靜電放電,因此靜電放電防護對於維持半導體產Γ的了^特別容 地重要,且商品化的積體電路通常被期望能承^二產㈤的士可就就特別 體模式靜電放電電壓)的靜電放電,而不會受^損1^伏备(逋常稱為人 .半導體元件變得日趙雜,簡時元件的電路也 & 容納更新與更複雜的功能,由於互連 乂、以雍擠以 …常見的多輪入電壓準位,使得元縮小’ :靖電放電機會增加,另-挑戰為保護元件:二 電路之位址、資料與控制線的靜電放電電顯電流所損壞。 積肢 、由於積體電路的電源線與電源腳位之間的電塵準位差異 承為電性隔絕的,亦使得内部電源供應由外部#… ^1245406 IX. Description of the invention: [Technical field to which the invention belongs] The present invention relates to electrostatic discharge protection circuits, static lightning protection of moving discharge transistors. ㈣ 4 疋 There is a mechanism for using an electrostatic discharge protection circuit with a gate drive. . —Only included in integrated circuits using gold gas semi-techniques [Previous technology] The reliability of semiconductor circuits is increased in complexity and density in chip design, not to mention the circuit «link easy to receive The electrostatic discharge of snow that would damage the internal components and the electric material n μ pieces of coffee will mess with the fine Jiebei stomach-sunscreen tablets in Weizhong. Attached to-large circuits (such as: attached to susceptible to electrostatic discharge, so Electrostatic discharge protection is particularly important for maintaining semiconductor production, and commercial integrated circuits are usually expected to withstand electrostatic discharge (e.g., special body mode electrostatic discharge voltage). Will suffer ^ damage 1 ^ volt preparation (逋 often called people. Semiconductor components have become increasingly complex, and the circuit of simple components also & accommodates newer and more complex functions, due to interconnection The multi-round input voltage level has made the yuan shrink: the opportunity for Jingdian discharge to increase, and the other challenge is to protect the components: the second circuit's address, data and control lines are damaged by electrostatic discharge electric current. Power for body circuit And the dust level difference between the power supply pin bearing is electrically insulated, also makes the internal power supply from an external ^ # ...

;,雖然可能在積體電路的輪入舆輸出焊墊附近有i合的靜電電電 路,此種隔絕仍被用於較易於受到靜電放電損害的介面電路中的口羽 知的靜電放電控制方法範例揭露於下列參考文獻·· 于白 0503-A30870TWF 5 1245406 N. Maene 荨人於一九九二年在 pr〇ceecjings 〇f e〇S/ESD Symposium 所 發表的「用於互補式金氧半電路之輸入輸出與電源供應的靜電放電防護(〇n; Although there may be a static electric circuit near the output pad of the integrated circuit, this kind of isolation is still used as an example of known methods of electrostatic discharge control in interface circuits that are more susceptible to electrostatic discharge damage. Disclosed in the following references: Yu Bai 0503-A30870TWF 5 1245406 N. Maene, published in 1992 by pr.ceecjings 〇fe〇S / ESD Symposium, "Inputs for Complementary Metal Oxide Half Circuits" Output and power supply electrostatic discharge protection (〇n

Chip Electrostatic Discharge Protections for Inputs, Outputs, and Supplies of CMOS Circuits) j ; 柯明迢教授等人於一九九六年在J〇umal 〇f Micr〇electr〇nics &Chip Electrostatic Discharge Protections for Inputs, Outputs, and Supplies of CMOS Circuits) j; Professor Ke Mingxuan et al.

Reliability所發表的「克服混模互補式金氧半積體電路之數位/類比介面之内 部問極氧化層損害的靜電放電防護(ESD Pr〇tecti〇n t〇 〇verc_ Gate<)xide on Digital-Analog Interface of Mixed-Mode CMOS 1C,s)」; 柯明道教授等人於_九九四年在PlOeeedings Qf EEE Intemati〇nal Integrated Reliability Workshop所發表的「用於多電源腳位之互補式金氧半 超大型積體電路的晶片整體靜電放電防護(職.啊卿Pr〇tecti〇n鈿 CMOS VLSI/ULSI with Multiple Power Pins) j ; 柯月道教授等人於一九九七年在pr〇ceedings 〇f胚£ CuSt〇m Integrated —uits f〇nference所發表的「用騎次微米互補式金氧半技術之互補式金 氧半混模频電關^整體靜電放電卩續編e_Chip哪p加ecti〇nReliability's "ESD Protection (ESD Pr〇tecti〇nt〇〇verc_ Gate <) xide on Digital-Analog, which overcomes the damage of the internal interlayer oxide layer of the digital / analog interface of a mixed-mode complementary metal-oxide semiconductor integrated circuit "Interface of Mixed-Mode CMOS 1C, s)"; "Complementary metal-oxide-semiconductor for multiple power supply pins" published by Professor Ke Mingdao and others in 1994 at PlOeeedings Qf EEE Intematial Integrated Reliability Workshop Integral Electrostatic Discharge Protection for Large-Scale Integrated Circuit Chips (Professor PrOtecti〇n 钿 CMOS VLSI / ULSI with Multiple Power Pins) j; Professor Ke Yuedao and others in 1997 at prOceedings 〇f Developed by CuSt〇m Integrated — uits fOnference, "Complementary Metal Oxide Semi-Mixed Mode Frequency Switch with Sub-micron Complementary Metal Oxygen Semi-Technology ^ Integral Electrostatic Discharge" sequel e_Chip which adds ecti〇n

Scheme for CMOS Mixed-Mode IC5s in Deep^ Submicron CMOS Technology)」。 /靜電放電防護通f在設計上較半導體元件内其他的電路要強韋刃, -靜電放電防護電路通常會將靜電放電電壓與電流導向較易於傳導靜電放 電電肌的途;L因此能夠在保護其他電路時承受靜電放電,一般而言,靜 電放電防護電路位於元件互連焊墊_近,有許多著名的靜電放電防護電 路組悲’本說明書討論為習知的閘極驅動箝制電路的新式建構法,有些習 知的閘極驅動箝制電路揭露於: C· Duwmy等人之美國專利號4,855,62〇專利; C.D· Lien之美國專利號5,〇86,365專利; C·仏,等人於一九九二年在P聰edings of Int_ti〇nalScheme for CMOS Mixed-Mode IC5s in Deep ^ Submicron CMOS Technology). " The / ESD protection circuit is designed to be stronger than other circuits in the semiconductor device. -The ESD protection circuit usually directs the ESD voltage and current to the path that is easier to conduct ESD electrical muscles; therefore, it can protect Other circuits are subject to electrostatic discharge. Generally speaking, the ESD protection circuit is located near the component interconnection pad. There are many well-known ESD protection circuit groups. This specification discusses the new construction of the conventional gate drive clamping circuit. Some conventional gate drive clamping circuits are disclosed in: C. Duwmy et al., U.S. Patent No. 4,855,62; C. Lien, U.S. Patent No. 5,086,365; C.K., et al. In 1992, Pingedings of Int_ti〇nal

ReliabilityReliability

0503-A30870TWF 12454060503-A30870TWF 1245406

Physics Symposium所發表的「用於有效輪出靜電放電防護的n型金氧半的 動態閘極搞合(Dynamic Gate Coupling 〇f nm〇S f〇r 〇utput ESDPhysics Symposium published "Dynamic Gate Coupling 〇f nm〇S f〇r 〇utput ESD

Protection)」; C. Duwury 專人於九九一年在 Technical Digest of International Elelctmn Device Meeting所發表的「達成N型金氧半元件之能量均勻分佈以 提升次微米靜電放電可靠度(Achieving Uniform NMOS Deviee Povrar Dis仕ibution for Submicron ESD Reliability)」;Protection) "; C. Duwury," Achieving Uniform NMOS Deviee Povrar ", published in Technical Digest of International Elelctmn Device Meeting," Achieving Uniform NMOS Deviee Povrar " Disibibution for Submicron ESD Reliability ";

Proceedings of International Reliability Physics Symposium所發表的「深次微米N型金氧半防護元件之靜電放電可 靠度(EOS/ESD Reliability of Deep Submi_ Devie_ S.R_SWamy等人於一九九六年在正征以脱出㈣〇fProceedings of International Reliability Physics Symposium published `` ESD / ESD Reliability of Deep Submi_ Devie_ S.R_SWamy et al. ㈣〇f

Symposi腿所發表的「用於深次微来低壓互補式金氧半特定應用積體電路 之電容耦合靜電放電防護電路(Capadtor_Coiipled ESD Protection Circuit for Deep-Submicron Low-Voltage CMOS ASIC)」; 柯明道等人之美國專利號5,631,793專利。 靜電放電發生時,箝制電路提供一電流路徑從輸入焊墊或電源供應流 至基板偏壓供應(Vss,通常為接地),綠至另—可吸收靜電放電電流的電 路元件,在傳統的電源供應箝制電路中,在電路正常操作時,電源供應線· 透過-偏塵於關狀g的箝制電晶體雛到接地,當於電源供應線上偵測 到-超過最大容允電壓的電壓時,箝制電路會導通,並將引發的靜電放電 電位導流至概,減’_容電離c電路)亦可使驗魏供應輸入 以吸收靜電放電的賴電源突波,此類電路之範例進—步描述於下列參考 文獻中: C. Duwrny 專人於九九一年在 pr〇ceedings"Capadtor_Coiipled ESD Protection Circuit for Deep-Submicron Low-Voltage CMOS ASIC" published by Symposi's Leg "Compatible ESD Protection Circuit for Deep-Submicron Low-Voltage Complementary Metal Oxide Semi-Specific Application Integrated Circuit"; Ke Mingdao, etc. U.S. Patent No. 5,631,793. When an electrostatic discharge occurs, the clamping circuit provides a current path from the input pad or power supply to the substrate bias supply (Vss, usually ground), green to another—circuit components that can absorb the static discharge current. In the traditional power supply In the clamping circuit, during normal operation of the circuit, the power supply line passes through-the clamping transistor that is dusty and close to the ground, and the circuit is clamped when a voltage exceeding the maximum allowable voltage is detected on the power supply line. It will conduct, and conduct the induced electrostatic discharge potential to the minimum, and reduce the '_ capacitance ionization c circuit). It can also make Wei Wei supply input to absorb the electrostatic power surge surge. Examples of such circuits are further described in In the following references: C. Duwrny in 1991 at pr〇ceedings

Physics S—所《的「纽輸讀毅雜護的n型金氧半的 動態閘極耦合(Dynamic Gate C〇_ng of 觀⑶ f〇r Efficient 〇mput 0503-A30870TWF 7 1245406Physics S—The "Non-type Metal Gate Oxygen Half Dynamic Gate Coupling (Dynamic Gate Co-ng of View ⑶ f〇r Efficient 〇mput 0503-A30870TWF 7 1245406

Protection)」; C. Duwury 荨人於—九九二年在 Technical Digest of International Elelctron Device Meeting所發表的「達成n型金氧半元件之能量均勻分佈以 提升次微米靜電放電可靠度(Achieving Unif〇mi Device p〇werProtection) "; C. Duwury," The Achieving Uniform Energy Distribution of N-type Metal-Oxygen Half-Elements to Improve the Reliability of Sub-micron Electrostatic Discharge (Achieving Unif.), Published at the Technical Digest of International Elelctron Device Meeting in 1992. mi Device p〇wer

Distribution for Submicron ESD Reliability)」;Distribution for Submicron ESD Reliability) ";

S.Ramaswamy 專人於一九九六年在顶gE Transactions of VLSIS. Ramaswamy was in 1996 at the top gE Transactions of VLSI

Symposium所㈣「帛於深次微#低屋互補^金氧半彳找應帛積體電路 之私谷麵合靜電放電防護電路(Capacit0r_C0upled ESD pr〇tecti〇n CircukSymposium's `` 帛 于 深 次 微 #Low House Complementary ^ Metal Oxygen Half 彳 Finding the Integrated Circuit Circuits, Private Valley Surfaces and ESD Protection Circuits (Capacit0r_C0upled ESD pr〇tecti〇n Circuk

Deep-Submicron Low-Voltage CMOS ASIC)」。 如上所述,晶片設計有時支援多電源準位,舉例而言,有一電源準位 提供給内部或核心電路,而另一電源準位提供給外部電路,在此類狀況下, 卜4迅路通吊j ^壓準位南於晶片設計的内部或核心電路,舉例而言, -晶片設計的半導體製程可於内部使用工錢2·5伏特,以產生其他諸如較Deep-Submicron Low-Voltage CMOS ASIC) ". As mentioned above, chip designs sometimes support multiple power levels. For example, one power level is provided to internal or core circuits and another power level is provided to external circuits. The pass-through level is based on the internal or core circuit of the chip design. For example,-the semiconductor process of the chip design can use 2.5 volts internally to generate other

J、、、且fr尺寸與車父低功耗的贿,然而,晶片的外部介面可能需要相容於L 伏特的外部㈣,使得晶片的外部介面視應用而定而接收务驅動3.3伏特的 介面。 a而,夕電源準位設計會產生靜電放電防護的挑戰,該等挑戰詳述於 柯明運教等人於二〇〇二年在IEEE J〇umal 〇f s〇lid_s論circ_所發表 的用於心壓互補式金氧半輸入輸出緩衝器的靜電放電防護(册伽触c D1S^ge Protecti〇n f〇r Μ·ν〇1 一架構’可提供靜電放護方法,而不會遭遇壯述於混壓電 路中所會產生的難題。 【發明内容】 以下所揭露為可符合混壓電路之靜電放電防護需求的箝制電路,此等 貫施例包括用於混M積體電路的改良靜電放電防護電路,在該混塵積體電J ,, and fr size and car driver low power consumption, however, the external interface of the chip may need an external compatible with L volts, so that the external interface of the chip accepts 3.3 volts driven interface depending on the application . a, Xi power supply level design will generate challenges of electrostatic discharge protection, these challenges are detailed in Ke Ming Yun Jiao et al. 2002 in IEEE J〇umal 〇fs〇lid_s 论 circ_ for heart Electrostatic discharge protection of CMOS complementary metal-oxide-semiconductor half-input buffers (Book Gat c D1S ^ ge Protecti〇nf〇r Μ · ν〇1 A framework 'can provide a method of electrostatic protection without experiencing the mixed description [Summary of the invention] The following disclosure is a clamping circuit that can meet the electrostatic discharge protection requirements of mixed voltage circuits. These embodiments include improved electrostatic discharge for mixed M integrated circuits. Protective circuit

0503-A30870TWF 1245406 ^射積體f路會接收比内部或核心電源翊更高的朽師於 =辦’靜電放電防護電路係以單一間極氧化 ^虎· ’於―實 有較核从件要厚之氧化層的電晶體之 二同於使用具 層的使用部份是由於提供 书”瘦-电路,單一閘極氧化 入舆接地端之間的元件予路偏雜人且將較高電塵VD33輸 的m额定值内。 ’i侍施於該等元件兩端的電壓仍在元件 本發明之一實施例使用—電壓一+ 接的間極驅㈣型金氧侧電路,,至一串Γ=!Γ以及—串 可·測到一靜電放電使 ^串接的柑制電路之偏屋電路 正極性地宣稱(繼句二或更多^於^ _位超過其正常操作龍時 又又夕偏壓輸入,該電路口於^ 觸發意味著«輕_電路可㈣ 過则3麵準位時 路設計可以使用現有的元件心巧運作干擾到内部電路,電 與驗證過的可.靠度,二或多=提供了設計便利性 靜電«防護電路内串接的箝制電晶體。‘―或更夕偏塵電塵可導通多個 實施例除了提供混塵系統之靜雷放 的速度與可靠度,該轉施。提供祕驅動箝制電路 程斜,《或核心供應料通:摘啟動程序,於該 使用單一間極氧化層建構的電源供應再導通,· 電防護電路的建構可有最小的直流漏電路;靜電放 用於靜電放電防護電路中。 了將傳統而可罪的元件組態使 【實施方式】 第1圖纷示-習知的閑極驅動之N型金氧半雷⑽ 使用閘極驅動之箝制技巧建構於— 的放抓轉路_, (彻至vss),於此實施例中,靜電放電防電壓源與基板題電壓源 極’連接至電源供軸_上=;=型金氧半電晶體有一汲0503-A30870TWF 1245406 ^ The projectile f will receive a higher power than the internal or core power source. The ESD protection circuit is oxidized with a single electrode ^ tiger. "There are actually more nuclear followers. The thick oxide layer of the second transistor is the same as the use of the layer. This is partly due to the book "thin-circuit". The single gate is oxidized into the component between the ground terminal and the circuit. VD33 is within the rated value of m. 'I The voltage applied to the two ends of these components is still in the component. One embodiment of the present invention uses a voltage-plus-gated drive-type metal oxide side circuit, to a series of Γ =! Γ and—A string can be detected. An electrostatic discharge makes ^ the biased circuit of a tandem orange circuit positively declared (following the sentence two or more ^ in the ^ _ position when it exceeds its normal operation. Bias input, the circuit port is triggered at ^ means «light _ circuit can be used, then the 3-sided level time design can use existing components to operate smartly to interfere with internal circuits, electrical and verified reliability. Two or more = provides design convenience ESD «clamping transistor in series in the protection circuit .'― In addition, the partial dust and electric dust can be conducted in various embodiments. In addition to providing the speed and reliability of the static lightning discharge of the dust mixing system, the application is provided. The secret driving clamp circuit is provided. When the power supply constructed using a single interlayer oxide layer is re-conducted, the construction of the electric protection circuit can have the smallest DC leakage circuit; the electrostatic discharge is used in the electrostatic discharge protection circuit. The traditional and guilty component configuration enables [Embodiment] Figure 1 shows the conventional idle-drive N-type metal-oxide half-thunder ⑽ using the gate-driven clamping technique to build the grasping circuit _, (through vss), and implement it here In the example, the electrostatic discharge prevention voltage source and the substrate voltage source are connected to the power supply shaft.

/、原、極連接至基板偏壓電壓源VSS/, The source and the pole are connected to the substrate bias voltage source VSS

0503-A30870TWF 1245406 =^2_路145包括—雜電容_延滞,電阻電容時間 匕一電阻180與電容185,靜電放電偵測電路145有榦 147 ’分別連接至電源供應龍源伽以及基板驗電壓源^s 6。、 145 L了電阻電容時間延滞電路的電阻獅與電容185,靜電放物^路 以及—p型金氧错_體2 夺禮電谷%間延滯電路i 80/185的Vx以、^ ^ ^ ^ 係連接於輪入㈣6與N型金氧半緩衝電晶體携以及—=電== 之閘極的共同連線197之間,本實施例之電容敗係以_= 晶體所形成,其閑極連接至N型金氧半缓衝電晶體⑽以及一 P 3L金氧半緩衝電晶體195之共接間極,形成電容m的N型金氧半電晶體0503-A30870TWF 1245406 = ^ 2_ Road 145 includes-miscellaneous capacitors_delay, resistance capacitor time lag resistor 180 and capacitor 185, electrostatic discharge detection circuit 145 has 147 'connected to the power supply Long Yuan Jia and the substrate inspection voltage Source ^ s 6. , 145 L of the resistor-capacitor time-delay circuit of the resistance lion and capacitor 185, the electrostatic discharge circuit and the -p-type metal-oxide complex_body 2 The Vx of the 80% 185 interval delay circuit i, ^^ ^ ^ Is connected between the wheel ㈣6 and the common connection 197 of the N-type metal-oxygen half-buffered transistor and the gate of — = 电 ==. The capacitor of this embodiment is formed by _ = crystal, which The free pole is connected to the N-type metal-oxide-semi-buffered transistor ⑽ and a common terminal of a P 3L metal-oxide-semi-buffered transistor 195 to form an N-type metal-oxide-semiconductor with a capacitance m.

之及極、源極與基底共同連接至連接到基板偏壓電麟V 電偵測電路的輸入埠147。 請迅放 、於弟1歡習知的實施例中,電阻18〇與電容185係依延滯時間常數 約為0.1至1.0毫秒而決定,電阻電容電路刪85係用以偵測跨越獅㈣ 與则30的靜電放電,靜電放電防護_金氧半電晶體11〇迅速地導通, 並箝制跨越VDD與VSS的靜電放電電壓。 於VDD/VSS準位的正常(直流)操作條件下,電容⑻充電至電鮮位 ,使得電晶體携因為高間極龍而處於導通狀態,而電晶體则 為低閑極^而處湖職態,因此,正常條件下,電晶體的閑極連 ,基板偏壓_ VSS m,使得靜_防護電晶體⑽碰於關閉狀 怨,電阻⑽與電容m所決定的延料間常數之設^,使得其可以迅速 地侧靜電《,而又可畴供足__梅電電荷着。 繼續參照第1圖,當靜電放電發生時,電晶體190與m所形成的反 相益可改變狀態,並迅速地觸發靜電放電防護電晶體ιι〇以將電源線上的 靜電放電糖·f魏VDD⑽與雜健雜源·3G,此種箱 制電路亦可用敎件輸入、輸出、位址線與控制線,且於相關聊位電屬在The sum electrode, the source electrode and the substrate are connected in common to an input port 147 connected to the substrate bias electric V detection circuit. Please quickly release, in the embodiment that Yu Di 1 is familiar with, the resistance 18 and the capacitor 185 are determined based on the delay time constant of about 0.1 to 1.0 milliseconds. The resistor-capacitor circuit 85 is used to detect the crossing of the griffon and Then, the electrostatic discharge of 30, the electrostatic discharge protection_metal oxide semiconductor transistor 110 is turned on quickly, and the electrostatic discharge voltage across VDD and VSS is clamped. Under normal (DC) operating conditions of the VDD / VSS level, the capacitor ⑻ is charged to the fresh position, so that the transistor is in an on state because of the high-voltage dragon, and the transistor is a low-voltage pole and is in a lake position. State, therefore, under normal conditions, the idler of the transistor is connected, and the substrate bias voltage _ VSS m, so that the static_protection transistor encounters a closed complaint, and the setting of the interval constant between the resistance ⑽ and the capacitance m ^ , So that it can quickly side static electricity, and can also be used to supply sufficient __ plum electric charge. Continuing to refer to Figure 1, when an electrostatic discharge occurs, the reverse phase formed by the transistor 190 and m can change the state, and quickly trigger the electrostatic discharge protection transistor ιι to reduce the electrostatic discharge sugar on the power line. With other sources of miscellaneous sources and 3G, this box circuit can also use file input, output, address line, and control line.

0503-A30870TWF 10 1245406 ==應的極限内時正常地工作,然而,此種傳統的箝制電路會在混 土口又计中失效,於混壓設計中,内部元 曰 線與控制線的腳位電壓。 ’〜、,4於輪入、輪出、位址 第2圖緣示-實施例,其中,—靜電放電防護電路可 W元件_部電路’電路可娜不同賴準位的餘,並提供j :箝制電路以作為靜電放電防護,於此實施射,假設内部《 ^ VDD為⑽特’ _路2_彳設物容域高準㈣輸入: 波,例如:所示侧電源供應線上的3.3伏特,然而,此說日脖中的^ 2限於所描述的特定Μ,較明確地說,現在所描述的實施“以二 对定調整或未經調整而容允不同值的多電壓準位。 二 靜電放電防護電路·明確鱗示__電路挪的區塊圖 彻3上的外部3.3伏特電源供峨,由於外部咖 為芬考準位,箝制電路2〇5主要的靜電放電路徑介於_技 壓VSS,於正常操作下,控制部份逝的開關施導通,麟 供應可以將電晶體207的源極至伽M,通常在—設計 電駐少為VD33電屢的一半,使得電晶體2〇7之偏屢不會超出直 壓範圍’反相器部份m的開關m會在正常操作下呈斷路祕,、可防止 電晶體犯的源/汲極之間的通道存在—電流路徑,也因此關閉電晶體观, 其臟鍋電晶體2】5所控制,而電晶體215由於間極因導通的開關施 而·至VDD,使其可將任何可能存在於電晶體215找極的電流予以散 流(_,並將電晶體208之間極拉至大約為〇伏特。 當靜電放電發生時’控制部份2〇2的開闕206設計為斷路,且反相器 部份崩的開關為導通,在那個時間點,由於靜電放電使得伽I 有一高鑛如:沈伏特),接著會傳到P型金氧半電晶體2M的源極與基 板上’ P型金氧半電晶體214之間極的相對電塵等效於〇伏特,被靜電放電 架高的翻電顧著會穿過p型金氧半電晶體2]4,並因此而將籍制電晶0503-A30870TWF 10 1245406 == works normally within the required limits, however, this traditional clamping circuit will fail in the mixed soil port. In the mixed pressure design, the pin positions of the internal yuan line and the control line Voltage. '~ ,, 4 are shown in the figure 2 of the example of the wheel-in, wheel-out, and address. Among them,-the electrostatic discharge protection circuit can be composed of components and parts of the circuit. : Clamp the circuit for electrostatic discharge protection, and implement the shot here, assuming the internal "^ VDD is ⑽ 特 '_ 路 2_, set the physical capacity of the Micro Motion ㈣ input: wave, for example: 3.3 volts on the power supply line on the side shown However, it is said that ^ 2 in the sun neck is limited to the specific M described. More specifically, the implementation now described "allows two voltage adjustments or unadjusted multi-voltage levels with different values." Electrostatic discharge protection circuit · Clear scale display __ Circuit diagram of the block diagram of the external 3.3 volt power supply for E, because the external coffee level is Finnau level, the main electrostatic discharge path of the clamping circuit 205 is between _ technology By pressing VSS, under normal operation, the control switch that is partially turned on is turned on. The supply can connect the source of transistor 207 to GM, usually at-the design voltage is less than half of VD33, making the transistor 2〇 The deviation of 7 will not exceed the direct voltage range. The switch m of the inverter part m will be normal. It works as a circuit breaker, which can prevent the existence of the channel between the source / drain of the transistor, the current path, and therefore close the transistor view. Its dirty pot transistor 2] 5 is controlled, and the transistor 215 is The pole is turned to VDD by the conducting switch, so that it can dissipate any current that may exist in the transistor 215 (_, and pull the pole between the transistor 208 to about 0 volts. When static discharge At the time of the occurrence, the opening and closing 206 of the control part 202 was designed to be open circuit, and the switch of the inverter part was broken to be on. At that point in time, due to the electrostatic discharge, Ga I had a high mine such as: Shen Volt), then The relative electric dust between the P-type metal-oxide-semiconductor 2M source and the substrate 'P-type metal-oxide-semiconductor 214 is equivalent to 0 volts. Through the p-type metal-oxide semi-transistor 2] 4,

0503-A30870TWF 11 1245406 體207、208的閘極偏慶至一高電壓,播a 土使件廷些箝制電晶體導通,箝制電晶 207、208接著會將靜電放電電流由奶 包包机田VD3〇導至接地,此電流導通會更 步為某底雷诂斛‘茲,廿山 、 體 、 I主接地’此電流導通會更進 .&所加強’其中’ _寄生的雙載子接面電晶體(Mp〇iar junction _istOT)由一基板或井區相連之兩電晶體所形成_電晶體所形 成。 同時’電阻電容電路部份203包括電阻21〇以及電容2ιι與212,可以 觸!X反相„礼』4兩電谷為分離的以分別提供延滞時間常數對電晶體 ~ 進行控制’藉由提供這些分離的電容與偏Μ,可對電晶體214盈 215可靠地提供安全的偏壓電壓,於串聯電容2ιι、212與電阻別所提供 的電Μ容電路之延料間常數期,型金氧半電晶體別的閘極電屡逐 漸拉间至\^的電壓準位,電晶體214因而開始_,於延滞時間常數 期間,電容犯會充電,而將_金氧半電晶體犯的閘極拉高,並使該 電晶體逐漸地導通,當電晶體214義而電晶體215導通時,包括電晶體 凡、208的柑制電路亦開始關閉,須注意的是,該延滞時間常數之設定須 比靜電放電的時間要長。0503-A30870TWF 11 1245406 The gates of the bodies 207, 208 are celebrated to a high voltage. The earthenware parts are turned on by the clamping transistors. The clamping transistors 207, 208 will then discharge the electrostatic discharge current from the milk bag charter field VD3. Lead to ground, this current conduction will further step into a certain ground, the main ground, Laoshan, body, I main ground, this current conduction will be further advanced. &Amp; strengthened 'where' _ parasitic double carrier interface The crystal (Mpoiar junction _istOT) is formed by a substrate or two transistors connected to a well region. At the same time, the 'resistance-capacitance circuit part 203 includes the resistance 21 ° and the capacitances 2 ι and 212, which can be touched! X inversion „Li’ 4 The two valleys are separated to provide a delay time constant to control the transistor ~ ”by providing These separated capacitors and biases can reliably provide a safe bias voltage to the transistors 214 and 215. During the constant interval between the capacitors provided by the series capacitors 2 ι, 212 and the capacitors provided by the resistors, the type of metal oxide is half. The transistor gate of the transistor is gradually pulled to a voltage level of \ ^, so the transistor 214 starts to _. During the delay time constant, the capacitor will be charged, and the gate of the metal oxide semi-transistor will be pulled. High and make the transistor gradually turn on. When transistor 214 is turned on and transistor 215 is turned on, the orange circuit including transistor Fan and 208 also starts to close. It should be noted that the setting of the delay time constant must be lower than Static discharge takes longer.

第3圖緣不-電路細的示意圖,該電路可用以提供上述之混壓靜電 放電防敎法,於第3 W中,電路係為串接式_驅動之Ν型金氧半 靜電放電推制電路’可提供混壓電路設計中的靜電放電防護,控制部份3〇2 的開關3%包括浮動μ井内的ρ型金氧半電晶體,這些開關為自我偏壓 或自我控制使传匕們只會通過上面的高電壓,但對低電壓信細為斷 路,在正常電路操作下,開關鳩為自我偏壓且非常有效地關閉,因此, 電曰曰體3G6的雜亦和其_連接,並偏壓至(在此實施例中以^伏 特暫代)於正$電路知作的浮動N型井31〇被p型金氧半電晶體對纽、 332偏壓至電源供應彻3,使得可崎低或抑止關到漏電流,電晶 體9相反地則於正㈡呆作下維持在關閉狀態,其因為電晶體撤之問極 的VDD包£(如·」·8伏特)相對於其正常戰^之源極偏壓(如:Μ伏特)Figure 3 is a thin schematic diagram of the circuit. This circuit can be used to provide the above-mentioned mixed-voltage electrostatic discharge protection method. In the 3 W, the circuit is driven by a series-connected _type metal-oxygen semi-electrostatic discharge. Circuits' can provide electrostatic discharge protection in mixed voltage circuit design. 3% of the switches in the control section 302 include p-type metal-oxide semiconductors in floating μ wells. These switches are self-biased or self-controlled. We will only pass the high voltage above, but it will open the low voltage signal. Under normal circuit operation, the switch is self-biased and closed very effectively. Therefore, the electric 3G6 is also connected to its _ And biased to (in this embodiment, ^ volts temporarily) the floating N-type well 31 known as the positive circuit is biased by the p-type metal-oxide semiconductor transistor, 332 to the power supply, Therefore, the leakage current can be reduced or suppressed, and the transistor 9 is maintained in a closed state under a positive condition, because the VDD package of the transistor is removed (such as · "· 8 volts) relative to The source bias of its normal battle ^ (eg: M volts)

0503-A30870TWF 12 1245406 ^成嚇編· __,賴物 的間極,則電晶體地於正常操作時維持闕閉,且箱制雷路3〇ς;; 部份3〇5)不會影響正常的核心或介面電路操作。 ^ (乂及掛制 由+於Ρ齡氧半電晶體__為_鞋—開啟的狀態,且 ,因此電晶體314、之間的共同源級極節 電維此實施例中為U伏特),此種纖排㈣金氧半=體3: 供保瘦,ϋ為制其他偏㈣排可能會使Ρ型金氧半電晶 入j0503-A30870TWF 12 1245406 ^ Intimidation series __, the pole of the relying object, the ground of the transistor is kept closed during normal operation, and the box-made mine road is 30%; part 30) will not affect the normal Core or interface circuit operation. ^ (乂 and hanging from + P age oxygen semi-transistor __ is _ shoes-open state, and therefore, the common source-level power saving between transistor 314, in this embodiment is U volts), This kind of fibrillation metal oxide half body = body 3: for thinness, for the sake of making other partial platoons may make P-type metal oxygen semi-crystals into j

較高外部偏壓VD33(在此實施例中為3 日日虹J 王口P 遍、彻、…。…寸)的效應,由於電晶體307、 ,、5 #、設_域作練低的畴f賴應VDD,假若它 們接觸到肖输妓柯承受賴(械,f罐 4 减電職作至較高外部電_仍受賴,财將舆核心電路相 同的閘極氧化層厚度使用於靜電放電防護電路·,電路設計藉由使用串接 =路將操作·各電路元件,而達成混壓的兼容性,相同地,卿 猶織315輪,電容31靖助15的閑極 直4星防護,使得從電阻313來的则3電壓被電容阻撞在一直流 準位。 ,的2彻包括—電阻電容時間延滞電路3G3,電阻電容時間延滯電路 必包含-電阻313與電容311、312,電容3ιι以一 n型金氧半電晶 成:其源極與沒極連接至基板偏屢電屢vss,且電容312以—p型金氧半 電晶體,其雜與祕連接至基板電阻313以及p型錢 閑極’這些電容與電阻形成延滞時間常數(如敘述第2圖時所提),可以設定 =5微秒至U微秒的範圍,以伽侧電源供應上的靜電放電電位, 並於延滯咖倾⑽持卿,餅錢得以·。 —當-靜電放電發生於彻3時,VDD電屢相對於在聰的數千伏特The effect of the higher external bias voltage VD33 (in this embodiment, 3rd Rihong J Wangkou P pass, thorough, .... inch), due to the transistor 307, The domain f depends on VDD. If they come into contact with Xiao Li and Ke Ke, they will still be dependent on the external power. It will still depend on the same gate oxide thickness of the core circuit. Electrostatic discharge protection circuit. The circuit design achieves mixed voltage compatibility by using serial connection = circuit operation. Each circuit element achieves mixed pressure compatibility. Similarly, weaving 315 rounds, capacitors 31 Jingzhu 15 idle pole straight 4 stars Protection, so that the voltage from the resistor 313 is blocked by the capacitor at a DC level. The two include-the resistor-capacitor time delay circuit 3G3, the resistor-capacitor time delay circuit must include-the resistor 313 and the capacitors 311, 312 The capacitor 3 ι is formed by an n-type metal-oxide-semiconductor crystal: its source and non-electrode are connected to the substrate, and the capacitor 312 is a p-type metal-oxide semi-crystal, and its impurities and secrets are connected to the substrate resistor. 313 and p-type money idle electrode 'these capacitors and resistors form a delay time constant (as mentioned in the description of Figure 2), With the setting range of 5 microseconds to U microseconds, the electrostatic discharge potential on the G-side power supply is maintained, and the money is delayed.-When-electrostatic discharge occurs at 3, VDD power is often relative to thousands of volts in Satoshi

之靜電放電電塵脈衝(如浙、遞、利,等同於零伏特,自我偏壓或自 0503-A30870TWF 13 1245406 :制的P型金氧半電晶體306會_,且作為開關,它們等同於斷路, '金氧丁屯曰曰體309之閘極上的相對低電壓會將電晶體導通,並透 =的崎極,將電路有效地_,此外,p型金氧半電晶體314之閑極 2對低健(其由於電阻犯與電細、312的延滞時間常數,在靜電 開始會维持麵本的侧準位),使得電晶體叫會導通,並提 ⑽间视料型金氧半電晶體術、姻的間極,這些電晶體因此會強烈 一2,趙純放„流從獅導流至vss,如第2圖時所討論的, 又载子接面電晶體基板電流會直接通過箝制電晶體307、的元件基 板,有效地將靜電放電電流釋放。 提供給箝制電晶體307、3⑽的兩偏録可由高準位卿提供分屋電 過量的不會損害到電路的電晶體,p型金氧半電晶體· 促㈣·龍的連結贱靜敎電(此_晶體解勒 ^時:兩箝制電晶體W、删予以導通,會_分地鱗接於^ Θ w 309、314與315 ’以確保這些電晶體不會在正 厂罐損害,雖_職_二或三辦接的元件 ’-較高準位的串接可靖似的技巧完成,以依據其他 、需求谷允使用較高的電壓。 第3圖亦提供-浮動的N型井區,由電晶體331與332提供電源, 且該電源亦於元件之魏·時,提供來保護電路,當魏開啟時,要避 免驗況是,突㈣原來在零伏鮮位的電晶體之—的祕施以则 壓,错由先對這些電晶體的浮動N型井區31()施以18伏特電位 至3.3伏特,就不會損害到元件,浮動N型井區则此可提供一兩狀 電源開啟的麵,其中,N型魏籠可升高,以麵電《啟時,過t 的壓降不會落在P型元件相對於_井區基板之上,這可崎蛾開啟=The electrostatic discharge electric dust pulse (such as Zhejiang, Di, Li, equivalent to zero volts, self-biased or self-biased from 0503-A30870TWF 13 1245406: P-type metal-oxide semiconductor 306 will be _, and as a switch, they are equivalent to The circuit is broken, and the relatively low voltage on the gate of the metal oxide substrate 309 will turn on the transistor and penetrate the saki pole, which will effectively circuit the circuit. In addition, the p-type metal oxide semiconductor transistor 314 is the free electrode. 2 pairs of low-key (the delay time constant of 312 due to the resistance of the resistor and the electric fine, will maintain the lateral position of the surface at the beginning of static electricity), so that the transistor will be turned on, and the intermetallic type of metal-oxygen semi-electric These crystals will be very strong because of crystallography and marriage. Zhao Chunfang „flowed from lion to vss, as discussed in Figure 2, and the current on the substrate of the transistor interface will directly pass through the clamp. The element substrate of the crystal 307, effectively discharges the electrostatic discharge current. The two partial records provided to the clamping transistor 307, 3⑽ can be provided by the high level officer, which will not damage the circuit. The p-type gold Oxygen Semi-Electric Crystal Hours: two clamped transistors W, deleted and turned on, will be connected to ^ Θ w 309, 314, and 315 'to ensure that these transistors will not be damaged in the factory tank, although The connected components'-higher level series connection can be completed in a similar way, so that higher voltages can be used according to other needs. Valley 3 also provides-floating N-type well area, which is composed of transistor 331. And 332 provide power, and the power is also provided to protect the circuit when the device is Wei. When Wei is turned on, to avoid inspection, the secret of the original transistor in the zero-volt fresh position- If the potential of the transistor is first applied to the floating N-type well 31 () of 18 to 3.3 volts, the element will not be damaged. The floating N-type well area can provide a surface with two or more power on. Among them, the N-type Wei cage can be raised, with the surface electricity "on, the voltage drop across t will not fall on the P-type element relative to the _ well area substrate, which can be turned on =

部VDD核心電源供應的電壓,再接著開啟咖電源供應而完成,者 為鮮位_啟VDD魏供鱗,左邊的p型純半電晶體^會 0503-A30870TWF 14 1245406 導通,且VDD會連接至N型井區電壓準位,當VD33接著打開時,施於右 邊的電晶體332的電壓會因而降低並因此導通,而將vd%施於浮動的n 型井區,值此同時,左邊電晶體331的閘極的高壓會關閉該p型金氧半電 晶體,因而避免VDD透過電晶體331、332連接至VD33。 雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任 何熟習此技藝者,在不脫離本發明之精神和範圍内,當可作些許之更動與 潤飾,舉例而言,雖然繪示的結構於特定組合下使轉定型態的電晶體(p 通道與N通道金氧半場效電晶體),其他敝合與其他鶴的電晶體可用以 完成此實蘭,電阻與電容可以是絲元件或修改金氧半場效電晶 體,或者獨立形成的積體電路元件,舉例而言,—電阻可以—主動的負= 電晶體或沉積-垂直的或卿的平面複抑或非晶⑨元相形成,雖然本 發明已個特定的偏壓配置,仍可設計其他的偏壓配置而不簡電路_ 有過度的電壓設計。 所述的半導體元件型式相是單—絲錢絲的互赋金氧半元 件’或者所述的半導體元件可以使用其他元件技術形成,特定的組件可以 依據設計需求加人靜電放電電路或從其,舉例而言,外部電路 ΓΓΓΓΓ是3.3伏特,電源供應可以是5伏特而峨心供應射為 1.8伙特,如此,可使用一具有三輸入的偏麼與串接電路,再者, 路可經過架構的修正絲經修正,而使内部核心、糕為3·3伏特且外邱 電壓為5或6伏特的電路,雖雜電放電防護電路綱與内部或核心電路 的=晶體之閘極層於敘述中為同方式形成,上述的好處亦適 防護電路與其他核㈣路分_成離況,錢钱晶_馳== =明書崎_的-樣,或者於巾請專利朗找釋時,將其解釋 極姐極,抑或金氧半電晶體的非閘極連接端。 、釋成源The voltage of the core VDD core power supply is then completed by turning on the power supply of the coffee. This is the fresh position. VDD Wei Wei supply scale, the p-type pure semitransistor on the left side will be 0503-A30870TWF 14 1245406 turned on, and VDD will be connected to N-type well area voltage level. When VD33 is then turned on, the voltage applied to the right transistor 332 will be reduced and therefore turned on. Vd% will be applied to the floating n-type well area. At the same time, the left transistor The high voltage of the gate of 331 will turn off the p-type metal-oxide semiconductor transistor, thus preventing VDD from being connected to VD33 through the transistors 331 and 332. Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Anyone skilled in the art can make some modifications and retouching without departing from the spirit and scope of the present invention. For example, Although the structure shown in the specific combination makes the transistor (p-channel and N-channel metal-oxide half-field effect transistor) in a certain combination, other transistors combined with other cranes can be used to complete this real blue, resistance and Capacitors can be wire elements or modified metal-oxide-semiconductor half-effect transistors, or integrated circuit elements that are formed separately, for example,-resistance can-active negative = transistor or deposition-vertical or clear plane complex or amorphous The unit phase is formed. Although the present invention has a specific bias configuration, other bias configurations can be designed without simplifying the circuit. There is an excessive voltage design. The type of the semiconductor element is a single-silk money intermetallic oxygen half element, or the semiconductor element can be formed using other element technologies, and a specific component can be added to or discharged from an electrostatic discharge circuit according to design requirements. For example, the external circuit ΓΓΓΓΓ is 3.3 volts, the power supply can be 5 volts and the Exin supply is 1.8 volts. In this way, a bias circuit with three inputs and a series circuit can be used. In addition, the circuit can pass through the architecture The correction wire is modified to make the internal core, the circuit is 3.3V, and the external voltage is 5 or 6V. Although the circuit of the hybrid electric discharge protection circuit and the internal or core circuit = crystal gate layer is described in the description China is formed in the same way, and the above benefits are also applicable to the protection circuit and other nuclear pathways. It is the same as that of Qian Qianjing_Chi === 明 书 崎 _, or when the patent asks the patent to find out. Explain it, or the non-gate connection of the metal-oxide semiconductor transistor. Shi Chengyuan

發明==:= 例後咖_解_括任何未為本 0503-A30870TWF 15 1245406 · 【圖式簡單說明】 第1圖繪示一習知的用於靜電放電防護的閘極驅動之N型金氧半箝制 電路圖。 第2圖為使用一串接式閘極驅動之N型金氧半箝制電路於一多電壓輸 入之靜電放電防護電路的電路區塊圖。 第3圖繪示建構第2圖之電路區塊圖的一電路元件示意圖。 【主要元件符號說明】 100〜N型金氧半靜電放電防護電路; 120〜VDD ; 130〜VSS ; 145〜靜電放電偵測電路; 146、147〜輸入埠; 180〜電阻; 185〜電容; 190〜N型金氧半缓衝電晶體; 195〜P型金氧半缓衝電晶體; 197〜共同連線; 200〜靜電放電防護電路; 202〜控制部份; 203〜電阻電容電路部份; 204〜反相器; 205〜箝制電路; 206a〜開關; 206b〜開關;. 207〜箝制電晶體; 208〜箝制電晶體; 209〜部份的開關; 210〜電阻; 211〜電容; 212〜電容; 214〜金氧半電晶體; 215〜電晶體; 300〜箝制電路; 3 02〜控制部份; 303〜電阻電容電路部份; 305〜箝制部份; 306a〜開關; 307〜電晶體; 308〜電晶體; 309〜電晶體;. 310〜浮動N型井; 311〜電容; 312〜電容; 0503-A30870TWF 16 1245406 313〜電阻; 314〜電晶體; 315〜電晶體; 331〜P型金氧半電晶體; 332〜P型金氧半電晶體。 0503-A30870TWF 17Invention ==: = Example after the coffee _ solution _ including any other than 0503-A30870TWF 15 1245406 · [Schematic description] Figure 1 shows a conventional N-type gold gate drive for electrostatic discharge protection Circuit diagram of oxygen half clamp. Figure 2 is a circuit block diagram of an electrostatic discharge protection circuit using a series-connected gate-driven N-type metal-oxide half-clamp circuit at a multi-voltage input. FIG. 3 is a schematic diagram of a circuit element constructing the circuit block diagram of FIG. 2. [Description of main component symbols] 100 ~ N type metal-oxide semi-electrostatic discharge protection circuit; 120 ~ VDD; 130 ~ VSS; 145 ~ ESD detection circuit; 146, 147 ~ input port; 180 ~ resistor; 185 ~ capacitor; 190 ~ N-type metal-oxygen half-buffered transistor; 195 ~ P-type metal-oxygen half-buffered transistor; 197 ~ common wiring; 200 ~ electrostatic discharge protection circuit; 202 ~ control part; 203 ~ resistance capacitor circuit part; 204 ~ inverter; 205 ~ clamping circuit; 206a ~ switch; 206b ~ switch; 207 ~ clamping transistor; 208 ~ clamping transistor; 209 ~ part of the switch; 210 ~ resistor; 211 ~ capacitor; 212 ~ capacitor 214 ~ metal oxide semitransistor; 215 ~ transistor; 300 ~ clamping circuit; 3 02 ~ control part; 303 ~ resistance capacitor circuit part; 305 ~ clamping part; 306a ~ switch; 307 ~ transistor; 308 ~ Transistor; 309 ~ transistor; 310 ~ floating N-type well; 311 ~ capacitor; 312 ~ capacitor; 0503-A30870TWF 16 1245406 313 ~ resistor; 314 ~ transistor; 315 ~ transistor; 331 ~ P-type gold oxide Semi-transistor; 332 ~ P type gold Oxygen semitransistor. 0503-A30870TWF 17

Claims (1)

1245406 十、申請專利範圍·· 盘輯^靜電放電防魏路,介於—频電路的第—端 之間,該靜電放電防護電路包括: :電荷消散電路,有麵-個驗輸人; 的仲,料依據該電荷雜電路藉域雜入所收到 的七就’絲電放钱流由_端導向另—端。 更包2括如申請專利範圍第1項所述之串接式問極驅動之靜電放電防護電路, 一靜電放電侧電路,連接至_驗控織路,· 其中該靜電放電_電路係肋制— =測電路的該偏咖電路係树顧靜_測=== 放電而將超過一個輸入予以宣稱(assert)。 3·如'轉纖’ 2項所述之串接式難鷄之靜電放餅護電路, 二三該靜電放電_電路連接至該第—與第二端,且用以制何時該第 端之間產生—巨幅,並於靜電放電時,提供—控制信號,以 作為偵測到巨幅電壓的指示。 4·如申睛專利範圍第3項所述之串接式閘極驅動之靜電放電防護電路, /、中該偏1:控制%路包合_電晶體關,依據雜制錄該等輪入之至 少兩者予以大致電性相連,且藉由該翻信號該兩者輸人可大致一併正 性宣稱(assert)。 5·如申明專利涵第4項所述之串接式間極驅動之靜電放電防護電路, 其中,該控制信號大致驅動該電晶體開關之一閘極。 6·如申鮮利顧第3項所述之串接式·驅動之靜電放電防護電路, 八中該御]電路更包括—時間延滞電路,可與該偏麼控制電路—併動作, 以維持該等輸入正電性宣稱超過一特定時間。 7·如申請專利範圍第6項所述之串接式酿轉之靜電放電防護電路, 0503-A30870TWF 18 1245406 其中’該時間延滞電路為-電阻電容時間延滞電路。 立中,节1酬述之串接·極驅動之靜電放電防護電路: ί該电何请散電路包括一箝制電路。 复中,^圍弟8項所述之串接式閑極驅動之靜電放電防護電路, 金氧半^與下方金氧半電晶;其中’該上^ 該第二端:0連^極與該第—端相連’訂方錢半電㈣以其源極與 路專利範„9項所述之串接式_鶴之靜電放電防護電 /、二上方舆下方金氧半電晶體分別以其源極與没極彼此相連。 路,2二項所述4接式閘極驅動之靜電放電防護電 斷路狀能。。〜放$防錢路包括自我控制的_,其在靜電放電時為 U.如申請專利範圍第„項所述之串接式閑極驅動之靜電放電防護電 ,,其鱗自我控制的開關為形成於—或多個浮動Ν型井區W型電 曰版該專浮動Ν型井區可隨靜電放電電靈而電位上升,使得該等ρ型電 晶體可阻擋一核心供應電壓施加於其輸入。 Μ、 如申Θ專蝴請第2項所述之串接式Μ極驅動之靜電放電防護電 路、,其中,該偏_制電路包括複數個串接的電晶體,並以_核心電源供 應為偏塵,使得沒有-辦接的電晶體會接_跨在該第_與第二端的全 部電壓。 14.如申請專利顧第6項所述之_接式間極驅動之靜電放電防護電 路,其中’時間延滞電路包括_第-時間信號與第二時間信號,該第一時 間信號係用以將該等偏壓輪人之第—者於—第—特定時間内維持正電性宣 稱,該第二時mm個以將該等偏壓輸人之第二者於—第二特定時間内 維持正電性宣稱。 I5·如申請專利範圍第Μ項所述之串接式間極驅動之靜電放電防護電 0503-A30870TWF 19 6 Ϊ24540 % 二一其中’該第—時間信號係由—第— 時間信號係由_第二電阻電容=電容時間延滞電路所驅動,該 苐-電阻電容時間延滞電路為串接,並=¾路所驅動,且其中該第_與 佐—電阻電料間延滯電路皆 ’ 1壓賴介於兩者之間,使得 麼。 胃_到跨錢第-與第二端的全部電 16.一種驗電路,祕綠介面 的或核;供應電壓與-較高的或輪入輪出供2^,電=^=路=較低 一核心電壓節點; H这偏壓電路包括: —輪入輪出電壓; 至少一浮動的參考電壓節點;以及 -雙供應_,供給爵_參考 -核心觸關,係祕該輸入輪==咖關包括: 參考電壓節點偏壓至該核心供應電塵;以及 準位時’將該浮動的 動的==_開關,制⑽該輪人輪_為高準位時,將y 動的茶考電壓郎點偏塵至該輸入輸出供應電屋。 T將該净 17·如申請專利範圍第16項所述之偏壓電ς, 用以於該輸入輸出供應電麼比該核心供應 乂勒入崩出開關係 節點偏屋至該輸入輪出供應霞。4★’將該洋動的參考· 18_如申請專利範_ 16項所述之偏壓電路, 供應開關為Ρ型金氧半電晶體。 ’、共輪入輪出 19. 如申請專利範圍第18項所述之偏a電路,其中,該等ρ型 晶體形成祕_ N财_,且該N型魏包括該縣的 ^ 20. 如申請專利範圍第16項所述之偏壓電路,其中, 土 P2。 -串接的,放·制電路,錢浮躺持龍節雖供 至少-電晶體,以直接或間接地驅動該串接的靜電放電箝制電路内的= 晶體。 电 0503-A30870TWF 20 4 1245406 的或核心將混齡面魏,該介面電路位於―電路的較低 提供—、、γί—較高的或輸入輪出供應電塵,該偏壓方法包括: h /子動的參考電壓節點; 將該核心供應電觀於該浮_參考綠節點上; LV R等4_足夠長的_,使得該混齡面電路驗至_'。供應電麼; 對於該汙動的麥考電壓節點施以該輸入輸出供應電壓。 〜22·如申請專利範圍第21工頁所述之偏壓方法,其中,該浮動的參考電壓 節點透過-對p型金氧半電晶體接收該内部與外部供應電壓,該等p型金 氧半包晶體之一傳送該内部供應電壓,並於該外部供應電壓為低準位時開 啟,而該等P型金氧半電晶體之另一傳送該外部供應電壓,並於該外部供 應電壓為高準位時開啟。 0503-A30870TWF 211245406 10. Scope of applying for patents .. Panji ^ Electrostatic discharge anti-Wei road, between the first end of the frequency circuit, the electrostatic discharge protection circuit includes: a charge dissipating circuit, there is a surface-an input checker; According to the data, the charge flow received by the charge hybrid circuit by the domain hybrid is received from the 就 terminal to the other terminal. It also includes the electrostatic discharge protection circuit of the series-connected question-electrode drive as described in item 1 of the scope of the patent application, an electrostatic discharge side circuit connected to the inspection and control weaving circuit, where the electrostatic discharge circuit is ribbed. — = The test circuit of this partial coffee circuit is Gu Jing_Test === Discharge and assert more than one input. 3. The cascade-type static electricity-dissipating cake protection circuit as described in the item "Converting Fiber", two or three of the electrostatic discharge circuit is connected to the first and second ends, and is used to make when the first end is A huge amplitude is generated from time to time and a control signal is provided during electrostatic discharge as an indication of the detection of a huge voltage. 4 · As described in item 3 of Shenjing's patent scope, the series-connected gate-driven electrostatic discharge protection circuit, /, the partial 1: control% road inclusion_transistor off, according to miscellaneous records At least two of them are substantially electrically connected, and the two inputs can be substantially asserted together by the flip signal. 5. The electrostatic discharge protection circuit of the series-connected inter-electrode drive as described in item 4 of the stated patent, wherein the control signal substantially drives a gate of the transistor switch. 6 · As described in Shen Xianli Gu's 3rd series, driven electrostatic discharge protection circuit, the 8th circuit should also include a time delay circuit, which can work in conjunction with the bias control circuit to maintain The inputs are positively asserted for more than a specified time. 7. The series-connected ESD protection circuit as described in item 6 of the scope of patent application, 0503-A30870TWF 18 1245406, where ‘the time delay circuit is a resistance-capacitance time delay circuit. In the middle, section 1 describes the series-connected and pole-driven electrostatic discharge protection circuit: 该 The power supply circuit includes a clamp circuit. In Zhongzhong, the cascaded idle-pole-driven electrostatic discharge protection circuit described in ^ 8 of the siege, the metal oxide half and the metal oxide half below; The first terminal is connected to the order of the semi-battery ㈣ with its source and circuit patent series „9 series connection type _ crane's electrostatic discharge protection / / two upper and lower metal-oxide semi-transistor The source electrode and the non-electrode are connected to each other. The circuit, the two-phase 4-pole gate-driven electrostatic discharge protection described in item 2 and 2. The circuit breaker can include self-controlled _, which is U during electrostatic discharge. .As described in the scope of the patent application, the series-connected idle-pole-driven electrostatic discharge protection electricity, its scale self-controlling switch is formed in-or a plurality of floating N-type well area W-type electric version, which is specially designed to float. The potential of the N-type well area can rise with the electrostatic discharge, so that the p-type transistors can block a core supply voltage from being applied to its input. Μ, the electrostatic discharge protection circuit of the series-connected M-pole drive as described in item 2 of the application Θ, wherein the bias circuit includes a plurality of series-connected transistors, and uses the core power supply as Dust, so that the non-connected transistor will connect all voltages across the first and second terminals. 14. The electrostatic discharge protection circuit of the connected-type pole electrode drive as described in Item 6 of the patent application, wherein the 'time delay circuit includes a first time signal and a second time signal, the first time signal is used to The first person of these biased wheelers maintains positive electricity during the first specified time, the second time mm to maintain the second person who loses these biased voltages to maintain the positive power within the second specified time. Electrical claims. I5 · As described in item M of the scope of the patent application, the series-connected pole-driven electrostatic discharge protection electric 0503-A30870TWF 19 6% 24540% 21 where 'the first time signal is from the first time signal is from the first Two resistors and capacitors = driven by a capacitor time delay circuit, the 时间-resistor and capacitor time delay circuit is connected in series, and = ¾ is driven, and the first and second resistor-electrical delay circuits are all 1 Somewhere in between, what makes it. Stomach _ all electricity across the first and second ends of the money 16. A test circuit, mitral interface or nuclear; supply voltage and-higher or in-round supply 2 ^, electricity = ^ = 路 = LOW A core voltage node; H the bias circuit includes:-the wheel-in-wheel-out voltage; at least a floating reference voltage node; and-dual supply_, supply_reference_core-contact, the input wheel == The coffee gate includes: the reference voltage node is biased to the core to supply electric dust; and when the position is 'on', the floating moving == _ switch to control the wheel when the wheel is at a high level, moving the tea The voltage test point is dusty to the input and output power house. The net 17 · bias voltage as described in item 16 of the scope of the patent application is used to supply power to the input and output modules. The core supply is connected to the input and output nodes. Kasumi. 4 ★ ’The reference of this oceanic movement. 18_ The bias circuit as described in item 16 of the patent application. The supply switch is a P-type metal-oxide semiconductor transistor. 'Total round-in and round-out 19. The partial a circuit as described in item 18 of the scope of application for patents, wherein the p-type crystals form a secret _ N 财 _, and the N-type Wei includes the county's ^ 20. Such as The bias circuit according to item 16 of the patent application, wherein: P2. -A series-connected, put-to-make circuit, although the floating float-holding dragon section is provided for at least-a transistor to directly or indirectly drive the = crystal in the series-connected electrostatic discharge clamp circuit. The core or core of the electric 0503-A30870TWF 20 4 1245406 will be mixed age, the interface circuit is located in the lower supply of the circuit, γ, the higher or the input wheel out to supply electric dust, the bias method includes: h / Sub-moving reference voltage node; View the core power supply on the floating reference green node; LV R, etc. 4_ long enough to make the mixed age circuit test _ '. Power supply? Apply the input and output supply voltage to the polluted McCaw voltage node. ~ 22 · The bias method as described on page 21 of the scope of the patent application, wherein the floating reference voltage node receives the internal and external supply voltage through a -pair p-type metal-oxide semiconductor transistor, and the p-type metal-oxide One of the half-packed crystals transmits the internal supply voltage and is turned on when the external supply voltage is at a low level, and the other of the P-type metal-oxide semiconductors transmits the external supply voltage and the external supply voltage is Turn on at high level. 0503-A30870TWF 21
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8179645B2 (en) 2008-01-31 2012-05-15 Realtek Semiconductor Corp. Network communication processing apparatus with ESD protection
TWI672905B (en) * 2016-03-31 2019-09-21 美商高通公司 Electrostatic discharge (esd) isolated input/output (i/o) circuits

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US7221551B2 (en) 2007-05-22
TW200541043A (en) 2005-12-16

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