12420¾ 8twf.doc/006 九、發明說明： 【發明所屬之技術領域】 本發明是有關於一種薄膜的製造方法及與薄膜有關之 相關元件的製造方法，且特別是有關於一種彩色濾光膜之 製造方法及與此彩色濾光膜有關之影像感測元件的製造方 法。 【先前技術】 隨著科技的進步，「彩色化」已成為各種影像產品必 備的條件之一，因而具有紅色、綠色、藍色三原色的彩色 濾光膜，乃成為這些影像元件中重要且必備的膜層之一。 衫色濾光膜的形成一般係先於基底上形成具有一顏色之彩 色濾光材料層，然後，對此彩色濾光材料層進行曝光及顯 影等圖案化製程，以形成一彩色濾光圖案。之後，重複兩 -人上述之形成膜層及圖案化膜層的步驟，以得到由三種顏 色之彩色濾光圖案所構成之彩色濾光膜。 然而，在進行彩色濾光材料層之曝光時，由於彩色噱 光材料層中的化學物質會蒸發，因此會造成用以進行曝^ 之步進機(Stepper)其透鏡(Lens)被污染的問題。於是，定 期清潔步進機上的透鏡，以避免這些化學物質沾附其上乃 成為重要^必要的工作之_。換言之，透鏡上所沾^之化 學物質清除料會影響錢叙使赌況L此定期 清潔的工作g耗費人力及咖來進行，HUb會影響製程的 產能與成本的支出。 另一方面，透鏡上一旦沾附有化學物質，在進行曝光 8twf.doc/006 步驟時’也可能會造成光線不可預期之反射或散射。而因 反射或散射而偏折的光線則可能會使得非預期曝光之彩色 濾光材料層遭到光線照射，而影響彩色濾光材料層之定義 的準確度，甚至產生殘留物等等的問題，如此都將影響製 程良率。 【發明内容】 有鑑於此，本發明的目的就是在提供一種彩色濾光膜 之製造方法，以解決習知在圖案化彩色濾光材料層時，因 彩色濾光材料層中的成分會逸失，而污染製程設備的問 題。 本發明的再一目的是提供一種影像感測元件的製造方 法，以解決習知在圖案化彩色濾光材料層時，因彩色濾光 材料層中的成分會逸失，而污染製程設備的問題。 本發明提出一種彩色濾光膜之製造方法，此方法係先 於基底上形成彩色濾光材料層。然後，於彩色濾光材料層 上形成隔離層（Segregation Layer)，以阻絕彩色濾光材料 層中的成分逸失。接著，對彩色濾光材料層進行圖案化製 程，以形成彩色濾光圖案，其中在進行圖案化製程時，係 一併移除隔離層。 本發明提出一種影像感測元件的製造方法，此方法係 先k供一基底，且此基底上係已形成有多數個感測胞 (Sensor Cell)。然後，於基底上形成第一彩色濾光材料層。 接著，於第一彩色濾光材料層上形成第一隔離層，以阻絕 苐彩色滤、光材料層中的成分逸失。之後，對第一彩色滤 12420¾ 8twf.doc/006 2材二層進二第，化製程，以形成第—彩色滤光圖 繼之’減仃广μ圖案化製程時，係—併移除第—隔離層。 ;辛、清二L形成第，彩色濾光材料層。然後，於第二 ^ “、 " 9上形成第二隔離層，以阻絕第-彩色滅光 ㈣層中的成嫩。接著，對此㈣ :弟二圖案化製程，以形成第二彩色濾光圖案，且在進行 苐一圖案化製程時，係—併移除第二隔離層。之後，於基 底上幵y成第一彩色濾、光材料層。繼之，於第三彩色遽光材 料層上形成第三隔離層，雜絕第三彩色濾、光材料層中的 成分逸失。然後，對第三彩色濾光材料層進行第三圖案化 製程，以形成第三彩色濾光圖案，且在進行第三圖案化製 程時，係一併移除第三隔離層，其中第一彩色濾光圖案： 第二彩色濾光圖案與第三彩色濾光圖案係構成一彩色濾光 膜。 “ 由於本發明在對彩色濾光材料層進行圖案化製程之 前，會先於彩色濾光材料層上形成一層隔離層，因此可以 避免因彩色濾光材料層中的成分，在圖案化的過程中逸 失，而污染製程設備的問題。 為壤本發明之上述和其他目的、特徵、和優點能更明 顯易懂，下文特舉較佳實施例，並配合所附圖式，作詳細 說明如下。 【實施方式】 在下述的實施例中，雖僅以影像感測元件的製作來說 明本發明，然非用以限定本發明之應用範疇。任何需要彩 12420¾ 8twf.doc/006 色濾、光膜之元㈣產品，皆可利用本發明之方法來進行。 圖1A至圖1D是緣示依照本發明一較佳實施例的一 種影像感測元件之製造流程剖面示意圖。 請參照圖1A，影像感測元件的製造方法係先提供一 基底100,且此基底100上係已形成有多數個感測胞1〇2。 其中，感測胞102包括可將光轉換成電流，並藉由驅動電 路項取訊號之感測元件，其例如是光二極體感測區或是其 他合適之光感測單元，如此當光線經由微透鏡(Micr〇_ Lens)(未繪示）入射至感測胞102時，就可將光轉換成電 流，並藉由驅動電路來讀取訊號。 然後’於基底100上形成彩色濾、光材料層W6。其中， 所形成之彩色濾光材料層106的顏色例如是紅色(R)、綠 色(G)或藍色(B)。此外’彩色濾光材料層的材質例如 疋對光敏感之材料或是具有類似光阻特性之材料。而且， 此彩色濾光材料層106會因後續之曝光步驟而使本身的結 構被加強或是被破壞，而在顯影之後形成所謂的彩色濾光 圖案(未纟會示）。 除此之外，在一較佳實施例中，在形成彩色濾光材料 層106之前，更可先於基底100上形成如圖ία所示之保 護層104，以覆蓋基底10〇上之感測胞102。其中，保護 層104的材質例如是氧化矽、氮化石夕或是其他合適之材 質’而其形成的方法例如是化學氣相沈積法（Chemical12420¾ 8twf.doc / 006 IX. Description of the invention: [Technical field to which the invention belongs] The present invention relates to a method for manufacturing a thin film and a method for manufacturing related elements related to the thin film, and in particular, to a color filter film. Manufacturing method and manufacturing method of image sensing element related to the color filter film. [Previous technology] With the advancement of technology, "colorization" has become one of the necessary conditions for various image products. Therefore, color filters with three primary colors of red, green and blue have become important and necessary among these image elements. One of the film layers. The color filter film is generally formed by forming a color filter material layer with a color on the substrate, and then performing a patterning process such as exposure and development on the color filter material layer to form a color filter pattern. After that, the two steps of forming the film layer and the patterned film layer described above are repeated to obtain a color filter film composed of color filter patterns of three colors. However, when the color filter material layer is exposed, the chemicals in the color phosphor material layer will evaporate, which will cause the lens of the stepper used to perform exposure to be contaminated. . Therefore, it is important to clean the lenses of the stepper regularly to prevent these chemicals from adhering to them. In other words, the removal of chemical substances on the lens will affect Qian Xu's gambling situation. This regular cleaning work requires labor and coffee to perform. HUb will affect the production capacity and cost of the process. On the other hand, once chemicals are attached to the lens, it may also cause unexpected reflection or scattering of light when performing the exposure step 8twf.doc / 006. And the deflected light due to reflection or scattering may cause the unintended exposure of the color filter material layer to be irradiated with light, which affects the accuracy of the definition of the color filter material layer, and even causes problems such as residues, etc. This will affect the process yield. [Summary of the Invention] In view of this, the object of the present invention is to provide a method for manufacturing a color filter film, so as to solve the problem that the components in the color filter material layer may be lost when the color filter material layer is conventionally patterned. And the problem of pollution process equipment. Yet another object of the present invention is to provide a method for manufacturing an image sensing element, so as to solve the problem that conventionally, when patterning a color filter material layer, components in the color filter material layer may escape and contaminate the process equipment. The invention provides a method for manufacturing a color filter film. This method is to form a color filter material layer on a substrate. Then, a segregation layer is formed on the color filter material layer to prevent the components in the color filter material layer from escaping. Next, a patterning process is performed on the color filter material layer to form a color filter pattern, wherein the isolation layer is removed during the patterning process. The present invention provides a method for manufacturing an image sensing element. This method first provides a substrate, and a plurality of sensor cells have been formed on the substrate. Then, a first color filter material layer is formed on the substrate. Then, a first isolation layer is formed on the first color filter material layer to prevent the components in the color filter and the light material layer from escaping. After that, the second color filter 12420¾ 8twf.doc / 006 is used for the second layer of the second material, and the process is changed to form the first-color filter image followed by the 'reduction-wide μ patterning process, and the first-line filter is removed. -Isolation layer. Xin and Qingji L form the first, color filter material layer. Then, a second isolation layer is formed on the second ^ ", " 9 to prevent the tenderness in the first-color extinction layer. Then, the second patterning process is performed to form a second color filter. Light pattern, and during the first patterning process, remove and remove the second isolation layer. After that, a first color filter and a light material layer are formed on the substrate. Then, a third color light material is used. A third isolation layer is formed on the layer, and the components in the third color filter and optical material layer are lost. Then, a third patterning process is performed on the third color filter material layer to form a third color filter pattern, and During the third patterning process, the third isolation layer is removed together, where the first color filter pattern: the second color filter pattern and the third color filter pattern form a color filter film. "Since Before performing the patterning process on the color filter material layer, the present invention forms an isolation layer on the color filter material layer, so that the components in the color filter material layer can be prevented from escaping during the patterning process. The problem of pollution process equipment . In order to make the above and other objects, features, and advantages of the present invention more comprehensible, preferred embodiments are described below in detail with reference to the accompanying drawings, as follows. [Embodiment] In the following embodiments, although the present invention is described only by making an image sensing element, it is not intended to limit the application scope of the present invention. Any elementary product that requires color 12420¾ 8twf.doc / 006 color filter and light film can be performed by the method of the present invention. 1A to 1D are schematic cross-sectional views illustrating a manufacturing process of an image sensing element according to a preferred embodiment of the present invention. Please refer to FIG. 1A. A method for manufacturing an image sensing element is to first provide a substrate 100, and a plurality of sensing cells 102 have been formed on the substrate 100. The sensing cell 102 includes a sensing element that can convert light into a current and obtain a signal through a driving circuit item. For example, the sensing cell 102 is a photodiode sensing area or other suitable light sensing unit. When a microlens (Micr0_Lens) (not shown) is incident on the sensing cell 102, light can be converted into a current, and a signal can be read by a driving circuit. Then, a color filter and optical material layer W6 is formed on the substrate 100. The color of the formed color filter material layer 106 is, for example, red (R), green (G), or blue (B). In addition, the material of the color filter material layer is, for example, a material sensitive to light or a material having similar photoresistance characteristics. Moreover, the color filter material layer 106 will be strengthened or destroyed due to subsequent exposure steps, and a so-called color filter pattern (not shown) will be formed after development. In addition, in a preferred embodiment, before forming the color filter material layer 106, a protective layer 104 as shown in FIG. Α can be formed on the substrate 100 to cover the sensing on the substrate 100. Cell 102. The material of the protective layer 104 is, for example, silicon oxide, nitride, or other suitable materials. The method of forming the protective layer 104 is, for example, a chemical vapor deposition method.
Vapor Deposition，CVD)。 接著’於彩色濾光材料層106上形成隔離層1〇8，以 c/〇〇6 !2420^Lw,o 阻絕彩色濾光材料層106中的成分110逸失。其中，隔離 層1〇8的材質例如是六甲基矽氧烷(HMDS0)或是可以阻 、、、巴彩色濾光材料層106中之成分逸失至外界的材料，而其 形成方法例如是塗覆(Coating)法。特別是，此處所指的「逸 失」係指彩色濾光材料層106中的成分因反應、分解、揮 發等等作用，而逸失至反應室中。其中，這些逸失之成分 例如疋彩色濾、光材料層本身、或是與其他物質反應所生成 之副產物或是化學物質(例如：溶劑）等。此外，隔離層1〇8 例如是可以將自彩色濾光材料層106中逸失的成分吸收、 为解、包覆等等，防止其逸失至反應室中，進而造成製程 $又備污染的問題。因此，隔離層依其功效可以是一声 吸收層、分解層或是包覆層等等。除此之外，在一較佳^ 施例中，此隔離層108更同時具有抗反射的功效，即其係 為一抗反射覆蓋層，如此可避免後續在進行曝光步驟時， 因光線不可預期之反射或散射而影響曝光準確度之問題。 之後，請參照圖1B，對彩色濾光材料層1〇6進行第 一次之圖案化製程，以形成彩色濾光圖案1〇6a。其中， 此圖案化製程包括依序進行曝光步驟及顯影步驟，其詳細 說明如下。 ^ '' 於形成隔離層108後，係先對彩色濾光材料層1〇6進 行曝光步驟。其中，曝光步驟之進行例如是利用一步進機， 於基底100上一個區域、一個區域地進行曝光。此時，由 於彩色濾光材料層106上覆蓋有可以阻絕彩色濾、光材料層 1〇6中的成分逸失，且不影響曝光進行之隔離層1〇8。因 12420¾ 8twf.doc/006 此，步進機上的透鏡，甚至是其他的製程設備，將 原本會從彩色濾光材料層1〇6逸失的成分污染。於3^ 知因步進機上的透鏡沾附有化學物質等污染物，而兩〜= 清潔，造成人力、物力之浪費的問題，可以獲得解期 接下來，進行顯影步驟，以得到如圖1B所示之〜 濾光圖案106a。特別是在進行顯影步驟時，除^二 彩色濾光材料層1〇6會被移除之外，具有溶解性 108亦會-併被移除。Vapor Deposition, CVD). Next, an isolation layer 108 is formed on the color filter material layer 106, and the component 110 in the color filter material layer 106 is prevented from escaping by c / 〇〇! 2420 ^ Lw, o. The material of the isolation layer 108 is, for example, hexamethylsilane (HMDS0) or a material that can prevent the components in the color filter material layer 106 from escaping to the outside, and the formation method thereof is, for example, coating Covering method. In particular, "escape" as referred to herein means that the components in the color filter material layer 106 escape into the reaction chamber due to reactions, decomposition, volatilization, and the like. Among them, these lost components are, for example, color filters, optical material layers themselves, or by-products or chemical substances (such as solvents) produced by reaction with other substances. In addition, the isolation layer 108 can, for example, absorb, dissolve, coat, etc. the components that have escaped from the color filter material layer 106 to prevent them from escaping into the reaction chamber, thereby causing a problem of contamination in the manufacturing process. Therefore, the isolation layer can be an acoustic absorption layer, a decomposition layer, a cladding layer, or the like according to its function. In addition, in a preferred embodiment, the isolation layer 108 has anti-reflection effect at the same time, that is, it is an anti-reflection cover layer, which can avoid unexpected light due to light during subsequent exposure steps. The reflection or scattering affects the accuracy of the exposure. Thereafter, referring to FIG. 1B, the first patterning process is performed on the color filter material layer 106 to form a color filter pattern 106a. The patterning process includes sequentially performing an exposure step and a development step, which are described in detail below. ^ '' After forming the isolation layer 108, the color filter material layer 106 is first exposed. The exposure step is performed, for example, by using a stepper to perform exposure on one area and one area on the substrate 100. At this time, since the color filter material layer 106 is covered with an isolation layer 108 that can prevent the components in the color filter and the light material layer 106 from escaping without affecting the exposure. Because of 12420¾ 8twf.doc / 006, the lenses on the stepper and even other process equipment will contaminate the components that would have escaped from the color filter material layer 106. In 3 ^ know that because the lens on the stepper is contaminated with pollutants such as chemicals, and two ~ = clean, causing a waste of manpower and material resources, you can get a solution period. Next, develop the steps to get The filter patterns 106a shown in 1B. Especially during the development step, in addition to the color filter material layer 106 being removed, the solubility 108 is also removed.
/繼之，於基底1〇〇上形成第二個彩色濾光圖案。由於 此才i色濾、光圖案之製程係與上述之彩色濾光圖帛⑴如類 似，僅顏色有所不同，因此熟知此項技術者可輕易推知，、 相關之材質及製程參數可以採取上述之方式進行，故於下 述内容中不再詳細說明，其僅配合圖式及簡單之文字描 述，說明此第二個彩色濾光圖案的製程。/ Next, a second color filter pattern is formed on the substrate 100. Because the process of color filter and light pattern is similar to the color filter diagram above, only the color is different, so those skilled in the art can easily infer that related materials and process parameters can take the above This method will not be described in detail in the following content. It only describes the manufacturing process of this second color filter pattern in conjunction with the drawings and simple text description.
請繼續參關1B，於基底上形成與彩色滤光圖 f l〇6a具有不同顏色之彩色濾光材料層112。然後，於 形色濾光材料層112上形成隔離層114，以阻絕彩色濾光 材料層112中的成分116逸失。其中，隔離層114的材質 例如是六甲基魏烧或是其他可職絕彩色濾光材料層 中的成分逸失至外界的材肖，而其形力方法例如是塗 覆法。 接著，請翏照圖ic，對彩色濾光材料層112進行圖 案化製程，以形成彩色濾光圖案U2a。其中，此圖案化 製程包括依序進行曝光步驟及顯影步驟。特別是，在進行 10 ；8twf.doc/006 曝光步驟時，由於彩色濾光材料層112上覆蓋有可以阻絕 彩色濾光材料層112中的成分逸失，且不影響曝光進行之 隔離層114。因此，可以解決習知因製程設備污染，而影 響曝光準確度的問題。此外，在進行後續之顯影步驟時， 除了部分之彩色濾光材料層112會被移除之外，具有溶解 性之隔離層114亦會一併被移除。 繼之，於基底100上形成第三個彩色濾光圖案。由於 此彩色濾光圖案之製程係與上述之彩色濾光圖案106a與 112a類似，僅顏色有所不同，因此熟知此項技術者可輕 易推知，相關之材質及製程參數可以採取上述之方式進 行，故於下述内容中不再詳細說明，其僅配合圖式及簡單 之文字描述，說明此第三個彩色濾光圖案的製程。 請繼續參照圖1C，於基底1〇〇上形成與彩色濾光圖 案106a與112a具有不同顏色之彩色濾光材料層118。然 後，於彩色濾光材料層118上形成隔離層120，以阻絕彩 色濾光材料層118中的成分122逸失。其中，隔離層120 的材質例如是六甲基石夕氧烧或是其他可以阻絕彩色濾光材 料層118中的成分逸失至外界的材料，而其形成方法例如 是塗覆法。 接著，請參照圖id，對彩色濾光材料層進行圖 案化製程，以形成彩色濾光圖案118a，且所形成之彩色 濾光圖案l〇6a、與118a係構成一彩色濾光膜124。 其中，此圖案化製程包括依序進行曝光步驟及顯影步驟。 特別是，在進行曝光步驟時，由於彩色濾光材料層118上 11 c/006 I2420%Lw,do $有可峨_色濾光材料層 118中的成分逸失，且不 ，響曝光進行之隔離層120。因此，可以解決習知因製程 "又備=染，而影響曝光準確度的問題。此外，在進行後續 之顯影步驟時’除了部分之彩色濾光材料層118會被移除 之外，具有溶解性之隔離層120亦會一併被移除。 y除此之外，在一較佳實施例中，在形成彩色濾光膜124 之後’更可於彩色濾光膜124上形成如圖1D所示，且對 應各個彩色濾光圖案l〇6a、112a與118a之多數個微透鏡 128 ’以將入射的光線聚焦投影至感測胞102，並轉換成 電流，而藉由驅動電路來讀取訊號。其中，微透鏡128的 f質例如是使用高透光性的光阻材料，而其形成方法例如 疋先將光阻材料層（微透鏡材料層）塗覆於彩色濾光膜124 上’並且於其上形成具有上述功效之隔離層，以阻絕光阻 材料層中的成分逸失，其中該隔離層的材質及形成方法係 與上述隔離層1⑽、114、120類似，於此不再贅述。然後， 進行曝光顯影等圖案化製程，以形成不連續的光阻圖案， 而且在進行圖案化製程時，該隔離層會一併移除。之後， 進行熱製程將光阻圖案圓弧化，而形成具有聚焦功能之微 透鏡128。 另外，在又一較佳實施例中，在形成彩色濾光膜124 之後以及形成微透鏡128之前，更可先於彩色濾光膜124 上形成平坦層126,之後再於其上形成對應彩色濾光圖案 106a、112a與118a的微透鏡128。其中，平坦層126的 材質包括透明材料，其例如是由透明的高分子聚合而成之 12 12420¾ 8twf.doc/006 材Ιΐΐ其他合適之材料。而其形成方法例如是先將平坦 材料層（未緣示）塗覆於彩色遽光膜m上，並且於其上形 ί具ΐΐ述功效之隔離層’以阻絕平坦材料層中的成分逸 失’，、中相離層特f及形成方法係與上述隔離層 108 114 12G類似’於此不再贅述。然後，進行曝光顯 影等圖案化製程’以形成平坦層m，且在騎圖案化製 程時’该隔離層會一併移除。 綜上所述，本發明至少具有下面的優點： 1.由於本㈣在對彩色遽光材料層，甚至是對平坦 料層或是微透鏡材料層進行圖案化製程之前，會先於這些 膜層上、形成-層隔離層，因此可以避免在圖案化的過^ 中’因這㈣層中的成分逸失，而污染步進機透鏡或是其 他製程設備㈣題。如此可以減少定麟料:欠數，進^ 減少人力、物力的浪費。 2·在上述實施例中，雖僅以影像感測元件的製作來說 明本發明，然非用以限定本發明之應用範疇。本發明之彩 色濾光膜的製作係在對彩色濾光材料層進行圖案化製程之 前，先於彩色濾光材料層上覆蓋一層隔離層，以有效阻絕 彩色濾光材料層中的成分在圖案化過程中逸失。因此，其 他需要彩色濾光膜的元件或產品，例如··液晶顯示器，^ 可採用本發明之方法，來解決上述步進機透鏡或是^他^ 程設備被彩色濾光材料層中之逸失成分污染的問題。衣 雖然本發明已以較佳實施例揭露如上，然其並非用以 限定本發明，任何熟習此技藝者，在不脫離本發明之精神 13 c/006 12420料_。 護 ^範圍内’當可作些許之更動與潤#，因此本發明 範圍當視後附之申請專利範圍所界定者為準。 ’、 【圖式簡單說明】 ^ 圖1A至圖id是依照本發明一較佳實施例的一種影 像感測元件之製造流程剖面示意圖。 、 【主要元件符號說明】 100 :基底Please continue to refer to 1B to form a color filter material layer 112 having a different color from the color filter pattern f106a on the substrate. Then, an isolation layer 114 is formed on the color filter material layer 112 to prevent the component 116 in the color filter material layer 112 from escaping. Among them, the material of the isolation layer 114 is, for example, hexamethylweilze or other useful color filter material layers, and the material is lost to the outside, and the force method is, for example, a coating method. Next, according to FIG. Ic, a patterning process is performed on the color filter material layer 112 to form a color filter pattern U2a. The patterning process includes sequentially performing an exposure step and a development step. In particular, during the 10: 8twf.doc / 006 exposure step, the color filter material layer 112 is covered with an isolation layer 114 that can prevent the escape of the components in the color filter material layer 112 without affecting the exposure. Therefore, it can solve the problem that the exposure accuracy is affected by the pollution of the process equipment. In addition, when the subsequent development step is performed, in addition to a portion of the color filter material layer 112 being removed, the isolating layer 114 having solubility is also removed. Then, a third color filter pattern is formed on the substrate 100. Because the process of this color filter pattern is similar to the above-mentioned color filter patterns 106a and 112a, only the colors are different, so those skilled in the art can easily infer that the relevant materials and process parameters can be carried out in the manner described above. Therefore, it will not be described in detail in the following content. It only describes the process of the third color filter pattern in conjunction with the drawings and simple text description. 1C, a color filter material layer 118 having different colors from the color filter patterns 106a and 112a is formed on the substrate 100. Then, an isolation layer 120 is formed on the color filter material layer 118 to prevent the components 122 in the color filter material layer 118 from escaping. The material of the isolation layer 120 is, for example, hexamethylxanthine or other materials that can prevent the components in the color filter material layer 118 from escaping to the outside, and the formation method is, for example, a coating method. Next, referring to FIG. Id, a patterning process is performed on the color filter material layer to form a color filter pattern 118a, and the formed color filter pattern 106a and 118a constitute a color filter film 124. The patterning process includes sequentially performing an exposure step and a development step. In particular, during the exposure step, since 11 c / 006 I2420% Lw, do $ on the color filter material layer 118, the components in the color filter material layer 118 are lost, and no, the isolation performed by the exposure Layer 120. Therefore, it is possible to solve the problem that the exposure accuracy is affected by the conventional manufacturing process. In addition, when the subsequent development step is performed, in addition to a part of the color filter material layer 118, the isolating layer 120 having solubility is also removed. In addition, in a preferred embodiment, after the color filter film 124 is formed, it can be further formed on the color filter film 124 as shown in FIG. 1D, and corresponds to each color filter pattern 106a, The plurality of microlenses 128 'of 112a and 118a are used to focus and project the incident light onto the sensing cell 102 and convert it into a current, and the signal is read by the driving circuit. Among them, the f quality of the microlens 128 is, for example, a photoresist material with high light transmittance, and the formation method thereof is, for example, first coating a photoresist material layer (microlens material layer) on the color filter film 124 'and then An isolation layer having the above-mentioned effect is formed thereon to prevent the escape of the components in the photoresist material layer. The material and formation method of the isolation layer are similar to the above-mentioned isolation layers 1⑽, 114, and 120, and will not be repeated here. Then, a patterning process such as exposure and development is performed to form a discontinuous photoresist pattern, and the isolation layer is removed together during the patterning process. After that, a thermal process is performed to circularize the photoresist pattern to form a micro lens 128 having a focusing function. In addition, in another preferred embodiment, after forming the color filter film 124 and before forming the microlenses 128, a flat layer 126 may be formed on the color filter film 124, and then a corresponding color filter may be formed thereon. Microlenses 128 of light patterns 106a, 112a, and 118a. The material of the flat layer 126 includes a transparent material, which is, for example, 12 12420¾ 8twf.doc / 006 made of a transparent polymer, and other suitable materials. The formation method is, for example, firstly coating a flat material layer (not shown) on the color phosphor film m, and forming an isolation layer with the above-mentioned effect on it to prevent the components in the flat material layer from escaping. The intermediate separation layer and its formation method are similar to the above-mentioned isolation layer 108 114 12G ', and will not be repeated here. Then, a patterning process such as exposure development is performed 'to form a flat layer m, and the isolation layer is removed during the patterning process. To sum up, the present invention has at least the following advantages: 1. Because the color film material layer, even the flat material layer or the micro lens material layer is patterned, the film layer will precede these film layers. The top-layer isolation layer is formed, so that the problem of contamination of the stepper lens or other process equipment due to the loss of components in this layer during the patterning process can be avoided. In this way, we can reduce the amount of material to be ordered: owe counts, reduce waste of manpower and material resources. 2. In the above embodiments, although the present invention is described with reference to the fabrication of an image sensing element, it is not intended to limit the scope of application of the present invention. The color filter film of the present invention is manufactured by covering the color filter material layer with an isolation layer before the patterning process of the color filter material layer, so as to effectively prevent the components in the color filter material layer from being patterned. Lost in the process. Therefore, other components or products that require a color filter film, such as a liquid crystal display, can use the method of the present invention to solve the loss of the stepper lens or other process equipment from the color filter material layer. Contamination of ingredients. Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art will not depart from the spirit of the present invention 13 c / 006 12420. Within the scope of protection, some changes and modifications can be made. Therefore, the scope of the present invention shall be determined by the scope of the attached patent application. [Simplified description of the drawings] ^ FIGS. 1A to 1D are schematic cross-sectional views illustrating a manufacturing process of an image sensing element according to a preferred embodiment of the present invention. [Description of Symbols of Main Components] 100: Base
102 =感測胞 104 :保護層 106、112、118 :彩色濾光材料層 106a、112a、118a :彩色濾光圖案 108、114、120 :隔離層 110、116、122 :成分 124 :彩色濾光膜 128 :微透鏡102 = sensing cell 104: protective layer 106, 112, 118: color filter material layer 106a, 112a, 118a: color filter pattern 108, 114, 120: isolation layer 110, 116, 122: component 124: color filter Film 128: micro lens
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