TWI231020B - Substrate with embedded passive components and method for fabricating the same - Google Patents
Substrate with embedded passive components and method for fabricating the same Download PDFInfo
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- TWI231020B TWI231020B TW92103185A TW92103185A TWI231020B TW I231020 B TWI231020 B TW I231020B TW 92103185 A TW92103185 A TW 92103185A TW 92103185 A TW92103185 A TW 92103185A TW I231020 B TWI231020 B TW I231020B
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- circuit board
- film
- semiconductor package
- package substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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Abstract
Description
1231020 五、發明說明(1) 【發明所屬之技術領域】 本發明係有關於一種半導體封裝基板及其製 尤指一種在增層電路板結構中内嵌有被動元件與 2, 片等電子元件之半導體封裝基板及其製法。 -晶 【先前技術】 隨著電子產業的蓬勃發展,電子產品亦逐漸邁入夕 能、高性能的研發方向。為滿足半導體封裝件高積隹二功 (Integration)以及微型化(MiniaturizaU〇n)、 需求,提供多數線路載接之印刷電路板(pr inted 、1231020 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a semiconductor package substrate and a manufacturing method thereof, and more particularly to a passive component and two or more electronic components embedded in a layered circuit board structure. Semiconductor package substrate and manufacturing method thereof. -Jing [Previous Technology] With the vigorous development of the electronics industry, electronic products have gradually entered the direction of high-performance and high-performance research and development. In order to meet the needs of semiconductor package high integration and miniaturization, Mini printed circuit board (pr inted,
Circuit Board)亦逐漸由單層板演變成多層板 (Multi-layer Board),俾於有限的空間下,藉由層 連接技術(Interlayer Connection)擴大印刷電路板 可利用的電路面積而配合高電子密度之積體電路 (Integrated Circuit)需求。同時,亦需在半導體 件上整合有例如電阻器(r e s i s t 〇 r s )、電容器 (Capacitors)及電感器(Induct〇rs)等被動元件(passiw component),藉以相對提昇或穩定電子產品的電性功能。 如第1圖所不,多數之被動元件1 2係安置於基板i之表 面,該基板可為一般印刷電路板或半導體晶片之封裝基 板,然為避免該等被動元件丨2阻礙半導體晶片丨丨與多數銲 接墊yBondmg f ingers)間之電性連結,傳統上多將該等 被動兀件1 2安置於基板i之角端位置或半導體晶片j i接置 區域^之基板額外佈局面積上。惟限定被動元件1 2安設位 置將縮j基板1表面線路佈局(r 〇 u t a b丨1丨t y )之靈活性;同(Circuit Board) has gradually evolved from a single-layer board to a multi-layer board. In a limited space, the use of the Interlayer Connection technology to expand the available circuit area of the printed circuit board to match the high electron density. Integrated Circuit requirements. At the same time, it is also necessary to integrate passive components such as resistors, capacitors, and inductors on the semiconductor components to relatively improve or stabilize the electrical functions of electronic products. . As shown in Figure 1, most of the passive components 12 are placed on the surface of the substrate i. The substrate can be a general printed circuit board or a packaging substrate of a semiconductor wafer. However, in order to avoid these passive components 丨 2 hindering the semiconductor wafer 丨 丨Electrically connected to most solder pads, the passive elements 12 are traditionally placed at the corner end position of the substrate i or the additional layout area of the substrate of the semiconductor wafer ji connection area ^. However, limiting the placement of passive components 12 and 2 will reduce the flexibility of the surface circuit layout (r 〇 u t a b 丨 1 丨 t y) of substrate 1.
17098. ptd 第8頁 1231020 五、發明說明(2) 時需考量鲜接塾位置,導致該耸、士 一 侷限,不利半導體裝置高度隹穑:兀件1 2佈設數量受到 動元件12佈設數量隨著半導體封裝件 ^|,者,被 地遽增,如採習知方法該基板〗矣 _ 犯之要求而相對 導體晶片11以及大量被動元件丨2\必須同時容納多數半 千1 2 ’而迫使裝株辦夺生 亦不符合半導體封裝件輕薄短小之發展^件體^曰大, 如第2圖所示,基於上述問題,遂有構想 動元件整合至基板2上之半導I#日H ‘、 X夕數被 分篮晶片2 1與銲接區域間之區 域。然而,隨著半導體裝置内單彳 ,^ 早位面積上輸出/輸入連接 &數量的增加’銲線23數量亦隨之提昇 幻^2高度(約0.8毫米)係高於半導體晶片21高度(約H :米)’如欲避免銲線23觸及被動元件22造成短路使該 銲線2 3需拉咼並橫越該被動元件2 2之正上方,提昇在曰接困 難度,亦使得線弧(wlre loopm度增加。況且,銲\ 23 ^身具有重量,接高之銲線23若缺乏支撐,易因本身重力 崩%觸及被動元件而產生短路,且銲線2 3本身係金、鋁材 質製成’增加線弧長度將明顯提昇銲線23成本。 再者,利用習知表面黏接技術(Surfacei〇unting technology,SMT)將該被動元件22藉由銲黏劑(solder p a s t e )固接至該基板2預設銲接位置後,實施半導體裝置 膠體封裝製程時,係於高溫環境下注入熔融封裝樹脂24, 此時作業溫度(1 7 5°C )與該被動元件2 2固接使用之銲黏劑 融化溫度(1 8 3°C )接近,該銲結劑呈現半熔融軟化狀態, 容易導致該等被動元件22於注膠後遭受該熔融封裝樹脂2417098. ptd Page 8 1231020 V. Explanation of the invention (2) The fresh junction position needs to be considered, which leads to a limitation of the tower and the driver, which is not conducive to the height of the semiconductor device: the number of components 1 2 is affected by the number of components 12 For semiconductor packages ^ |, it is increased by ground, such as the conventional method of using the substrate 矣 矣 __ to meet the requirements of the conductor chip 11 and a large number of passive components 丨 2 \ must simultaneously accommodate most of the half thousand 1 2 ' The assembly company's survival is not in line with the development of thin, light, and short semiconductor packages. The size of the package is large. As shown in Figure 2, based on the above problems, it is possible to conceive of a semiconducting semiconductor element integrated on the substrate 2. ', X Xi counts the area between the chip 21 and the soldering area. However, with the increase in the number of output / input connections in the early area, the number of bonding wires 23 has also increased with the increase in the number of bonding wires 23. The height (about 0.8 mm) is higher than the height of the semiconductor wafer 21 ( (Approximately H: meters) 'If you want to avoid the short circuit caused by the welding wire 23 touching the passive element 22, the welding wire 23 needs to be pulled and traverses directly above the passive element 22, which will increase the difficulty of connection and make the wire arc (The degree of wlre loopm is increased. Moreover, the welding wire 23 has a weight. If the welding wire 23 that is connected to the high wire lacks support, it is easy to cause a short circuit due to its own gravity collapse% and touching the passive component. The welding wire 2 3 itself is made of gold and aluminum. Making 'increasing the arc length of the wire will significantly increase the cost of the welding wire 23. Furthermore, the passive component 22 is fixed to the passive component 22 by a solder paste using a conventional surface bonding technology (SMT). After the soldering position of the substrate 2 is preset, when the semiconductor device colloidal packaging process is performed, the molten packaging resin 24 is injected under a high temperature environment. At this time, the operating temperature (175 ° C) and the passive component 22 are fixedly used for soldering. Adhesive melting temperature (1 8 3 ° C ), The soldering agent is in a semi-melted and softened state, which may easily cause the passive components 22 to suffer from the molten encapsulation resin 24 after injection.
1231020 五、發明說明(3) 模 預 流(Mo 1 d f 1 〇 w )應力衝擊,造 設銲接位置,降低導電品質甚而;動元件22偏移該 此外,在現今電子產品要求輕二,J。 性之趨勢下,相對地,安置豆内f,小與多功能及高電 跟著要求輕薄短小化,ϋ此了如何封裝單元勢必 昇電子產品之電性功能,而又不$ =叙基板中,以提 線路佈局性與半導體封裝件整體戶二θ =導體封裝基板之 待解決之課題。 1子度之增加,實為目前亟 【發明内容】 鐾於以上所述習知技術 於提供一種内嵌被動元件 導 之,要目的在 法,你扣曰· 丁心干导篮封裝基板及其製作方 板線路佈裝置内被動元件之佈設數量,並增加基 體封於;:;=被動元件之半導 导體?裳件厚度,以達半導體裝置輕薄短小之目標。 體封裝1:ί:::在於提供一種内嵌被動元件之半導 影逖^二 八衣 法’以避免被動元件受高溫與模流 本。牛引“路,亦得以縮短銲線線孤長度,節省銲接成 導體上揭及其他目的,本發明之内欲被動元件之半 ν體封裝基板及其製作方法係包括: 卞1231020 V. Description of the invention (3) Mold pre-flow (Mo 1 d f 1 0 w) stress impact, set the welding position, reduce the conductive quality and even; the moving element 22 deviates from this. In addition, in today's electronic products require lighter, J. Under the trend of sex, relatively, the placement of beans inside f, small and multi-functional, and high-electricity follow the requirements of thin, thin, and short, so how to package the unit is bound to increase the electrical functions of electronic products, but not $ = in the substrate, In order to improve the layout of the circuit and the overall package of the semiconductor package, θ = a problem to be solved for the conductive package substrate. The increase of 1 degree is really urgent at the present time. [Summary of the Invention] The conventional technology described above provides a built-in passive component guide. The main purpose is to use Ding Xingan ’s guide basket packaging substrate and its manufacturing method. The number of passive components in the circuit board wiring device is increased, and the substrate is increased to be sealed;:; = semiconducting conductor of the passive component? The thickness of the skirt is to achieve the goal of thin, light and short semiconductor devices. The body package 1: ί ::: is to provide a semi-conductive film with passive components embedded in it. This method prevents the passive components from being exposed to high temperatures and mold currents. The "Niuyin Road" also shortens the solitary length of the bonding wire, saves soldering and stripping of conductors, and other purposes. The semi-passive package substrate for passive components in the present invention and its manufacturing method include: 卞
1231020 五、發明說明(4) 提供複數個單 路板兩側表面之電 電金屬層以及一間 層;再圖案化該電 元件與其電極,並 表面之開口;同時 間隔絕緣層疊置之 形成於内部之複數 之後,結合該第一 XJTJ 一 一早兀 後,形 連接至 藉 作方法 一膜狀 動元件 元件接 外,亦 生短路 動元件 成本。 路板, 開口之 以及表 電路板開口 成多數貫穿 形成於該電 由别述本發 所得之封裝 電容元件鑲 之佈設數量 置於基板表 可避免被動 之現象,以 而引發短路 再者’碡由 並使該第二 一側,以形 面至少具有 元電路板;接著,於至少一 σ — 路層上分別壓合有_載 *早7°電 隔有一絕緣声之載右 “谷膜之一導 阻膜與其表面之導電全 V電金屬 於該第一單元電路板;=形成電阻 ,另於至少一第一Ϊ中:成至少-貫穿 cm:苐二單元電路板係藉由 與目孔以電性連接各電路層; 之一柄兔,1、ί 了 電路板’俾使第 ’ 弟一單兀電路板所封閉。之 ίίϋ電鑛導通孔(ΡΤΗ),可供電性 谷膜與電阻膜至者一者表面之電路層。 =之内嵌被動元件之半導體封裝基板製 其f將至少一膜狀電阻元件與至少 埋於基板中,藉以提昇半導體裴置内 與電性功㊣’免&習知技術中需將被動 面,以增加基板線路佈局靈活性,另 元件叉鬲溫與模流影響而偏位,甚而發 降低銲接困難度’冑免銲線直接觸及‘ ’亦得以縮短銲線線孤長度,節省辉接 結合該第一單元電路板與該第二單元電 單元電路板得以封閉住第一單元電路板 成一内嵌有電阻膜與電容膜等被動元件 一凹部之多層電路板,俾供如半導體晶1231020 V. Description of the invention (4) Provide a plurality of electrical and metal layers and an interlayer on the two sides of the single circuit board; pattern the electrical element and its electrodes, and open the surface; at the same time, form an insulation layer on the inside After the plural number, the first XJTJ is combined with the first XJTJ, and the shape connection is connected to the film-type moving element by the method, which also causes the short-circuit moving element cost. Circuit boards, openings, and table circuit board openings are formed in the majority of the openings. The number of packaged capacitor elements mounted on the board obtained by the present invention is placed on the substrate table to avoid passive phenomena, which may cause short circuits or cause them. The second side is provided with at least a element circuit board in a shape surface; then, at least one σ — road layer is respectively pressed with a load _ load * 7 ° as early as electrical insulation with a sound insulation right one of the right "valley film" The conductive film and the conductive full V electrical metal on its surface are on the first unit circuit board; = to form a resistance, and in at least one first frame: to form at least -through cm: the second unit circuit board is connected with the eye hole to Electrically connect the circuit layers; one handle rabbit, 1. Enclosed the circuit board 'supplied' by the Yiyiwu circuit board. The electric mine vias (PTT), power supply valley film and resistance film One of the circuit layers on the surface. = A semiconductor package substrate with passive components embedded therein. F At least one film-shaped resistance element and at least buried in the substrate, so as to improve the internal and electrical performance of the semiconductor. ; Know-how needs to be passive In order to increase the flexibility of the circuit layout of the substrate, and the components are skewed due to the effects of temperature and mold flow, even the welding difficulty is reduced. The first unit circuit board and the second unit electric unit circuit board can seal the first unit circuit board into a multilayer circuit board with a recessed portion of a passive element such as a resistive film and a capacitive film embedded in it, such as a semiconductor crystal.
1231020 五、發明說明(5) ---- 藉::m納t電性連接至該多層電路板之凹部内, 薄短4=封裝件整體厚度,達到該半導體封裝件輕 寻短小同時兼具高電性之目的。 並不、::?貝施例以進一步詳細說明本發明,但本發明 :不施例所限制。又本發明之圖式僅為簡單說 中& ® $依貝際尺寸描繪,亦即未反應出一多層基板結構 甲各層次之實際尺寸,先予敘明。 【貫施方式】 π參閱第3 Α至第3 I圖,為本發明之内嵌被動元件之半 V體封裝基板製作方法示意圖。 如第3A圖所示,首先,提供至少一第一單元電路板 二it circuit board )3a,該第一單元電路板3&係可選自 、’s 箔基板(Copper Coated Laminate, CCL)、背膠銅箔 ^ Resin Coated Copper,RCC)、或於 fr-4樹脂、FR-5樹 月曰、環氧樹脂(Epoxy)、矽(silicon)、聚醋樹脂 (Po 1 yesters)、玻璃纖維等絕緣性材料表面鍍覆銅箔層 (Copper Foil)之銅箔樹脂層等,而於本實施例中係使 用雙層銅冶基板作為單元電路板材料,亦即,可在一絕緣 树脂層3 0之上表面3 0 a及下表面3 0 b各接附一如銅箔層之第 一導電金屬層31與第二導電金屬層32。 如第3B圖所示’於該第一單元電路板3a之第一導電金 屬層3 1與第》一導電金屬層3 2上施以形成線路之微影 (Development)、姓刻(Etching)等習用製程,而形成 圖案化電路(Pattern Circuit)之第一電路層31 a斑第二1231020 V. Description of the invention (5) ---- Borrow :: m nanot is electrically connected to the recess of the multilayer circuit board, thin and short 4 = the overall thickness of the package, to achieve the lightness and shortness of the semiconductor package at the same time Purpose of high electricity. No, ::? The present invention will be further described in detail by way of examples, but the present invention is not limited by the examples. In addition, the drawings of the present invention are only briefly described in the middle & ® $ according to the size of the Bayesian, that is, the actual dimensions of each layer of the multi-layer substrate structure are not reflected. [Implementation method] π Refer to FIGS. 3A to 3I, which are schematic diagrams of a method for manufacturing a semi-V body package substrate with embedded passive components according to the present invention. As shown in FIG. 3A, firstly, at least one first unit circuit board and two it circuit boards are provided. The first unit circuit board 3 & is selected from the group consisting of a Copper Coated Laminate (CCL), a back Resin Coated Copper (RCC), or fr-4 resin, FR-5 tree month, Epoxy, silicon, Po 1 yesters, glass fiber and other insulation The copper foil resin layer, such as Copper Foil, is plated on the surface of the flexible material. In this embodiment, a double-layer copper metallurgy substrate is used as the material of the unit circuit board, that is, an insulating resin layer 30 The upper surface 30 a and the lower surface 30 b are each attached with a first conductive metal layer 31 and a second conductive metal layer 32 such as a copper foil layer. As shown in FIG. 3B, the first conductive metal layer 31 and the first conductive metal layer 32 of the first unit circuit board 3a are applied with a development, a surname, etc. to form a circuit. A conventional process is used to form the first circuit layer 31a of the patterned circuit (Pattern Circuit).
17098. ptd 第12頁 1231020 五、發明說明(6) 電路層32a’以構成一雙層電17098. ptd Page 12 1231020 V. Description of the invention (6) The circuit layer 32a ’constitutes a double-layer electrical circuit.
,線路區域係可作為形成如下述電中二弟-電路層3U 3 1 , , ^ 3aAV^A7;7 夕層電路板,且有關線路圖案 ^ 所周知之萝葙姑化 W系化技術繁多,惟乃業界 ⑼夭私技術,其非本案技術特徵,故未 。 如第3C圖所示,於該第一單元 ; 玫s cm两、人丄 电塔板3 a表面之第一雷 路層31a堡合有—載有電容膜41之帛三導電金 於該第二電路層32a上間隔一絕緣層4〇以壓合—^有電= 導】:!:!4:該電容膜41係選自介電常數大 :…丨電層,其係由如南分子材料、冑瓷材料、陶瓷 填充之南分子及其相似物等,其材料可例如為鈦酸鋇 (Barium-titanate)、鈦酸锆鉛 (Lead-zirconate-titanate)、無定形氫化碳(Am〇rph〇us hydr〇genated carbon)’或其粉末散佈於黏結劑(Binder) 中,如樹脂、玻璃粉末等,亦可利用濺鍍、印刷 (Printing)或滾輪旋塗(Roller coating)等方式成形。該 絕緣層40之材質係可為絕緣有機材料或陶瓷材料,如環氧 樹脂(Epoxy resin)、聚乙醯胺(p〇iy imide)、雙順丁稀二 酸酿亞胺 /三氮拼(Bismaleimide triazine —based)樹脂, 或其玻璃纖維(Glass fiber )之複合材料等組成,當然, 該絕緣層4 0並不限於僅由單一有機材料所形成,亦可由不 同絕緣材料層所疊合而成。而該電阻膜42包含有厚膜 (Thick f i lm)及薄膜(Thin f i lm)電阻材料,該厚膜電阻 材料係如銀粉(Silver powder)或碳顆粒(carb〇nThe circuit area can be used to form the circuit layer 3U 3 1, ^ 3aAV ^ A7; 7 circuit layer circuit board as described below, and related circuit patterns ^ There are many well-known technology of W. However, it is a private technology in the industry, which is not a technical feature of this case, so it is not. As shown in Figure 3C, in the first unit, the first lightning path layer 31a on the surface of the scm two and the electric tower 3a is combined—the three conductive golds carrying the capacitor film 41 are placed in the first unit. The two circuit layers 32a are separated by an insulating layer 40 to compress them-^ Electric = conductive] :! :! 4: The capacitor film 41 is selected from a dielectric layer with a large dielectric constant: ... 丨 an electrical layer, which is made of, for example, a South molecular material, a ceramic material, a ceramic filled South molecule and the like, and the material may be, for example, titanium Barium-titanate, Lead-zirconate-titanate, AmOrph〇us hydrogenated carbon 'or its powder is dispersed in a binder, such as resin , Glass powder, etc., can also be formed by sputtering, printing or roller coating. The material of the insulating layer 40 may be an insulating organic material or a ceramic material, such as epoxy resin, poiyimide, bismaleimide / triazine ( Bismaleimide triazine —based resin, or composite material of glass fiber (Glass fiber), etc. Of course, the insulating layer 40 is not limited to being formed of only a single organic material, but can also be formed by stacking different insulating material layers. . The resistive film 42 includes a thick film (Thick f i lm) and a thin film (Thin f i lm) resistive material. The thick film resistive material is, for example, silver powder or carbon particles.
17098. ptd 第13頁 1231020 五、發明說明(7) part i cl e)散布於樹脂中,及氧化釕(ru〇2 )與玻璃粉末散 布在一黏結劑(Binder)塗佈再固化而形成;該薄膜電阻材 料係如鎳鉻(N i - C r )、鎳磷(N i - P)'鎳錫(n i — s η)、鉻鋁 (Cr-Al)、及氮化鈦(TaN)合金等,其可藉由濺鐘 (Sputtering)、電鍵(Electroplating)或無電鍍 (Electroless plating)等方式形成。 如第3D圖所示’圖案化該載有電阻膜42及其表面之第 四導電金屬層34以形成第四電路層34a與電阻電極34b,以 在該基板結構中完成鑲埋有電阻元件4 2 a,並於該第一單 元電路板3 a中形成至少一貫穿表面之開口 5 〇,俾作為後續 接置電子元件之收納空間。 、如第3E圖所示,同時另於至少一第二單元電路板朴中 形成有至少一導電孔4 3以電性連接形成於該第二單元電路 板3b表面上之第五電路層35a與第六電路層36a。當然,該 第二單元電路板亦可因應實際設計需求作為多層電路板。 如第3F圖所示,於該第二單元電路板3b之第五電路層 3 5 a與第六電路層3 6 a上,分別間隔一絕緣層4 〇形成有第七 電路層37a與第八電路層38a,而該第七電路層37a與第八 電路層38a係藉由形成於絕緣層40之導電盲孔(B1 ind via) 4 4以電性連接至該第五電路層35 a與第六電路層36a。 一如第3G圖所示,結合該第一單元電路板3a與該第二單 兀電路板3 b,俾使該第一單元電路板開口 5 〇之一側為該第 二單元電路板3b所封閉,而形成一收納凹部5〇a,並於該 第二單元電路板3b之第八電路層38a上間隔一絕緣層4〇形17098. ptd page 13 1231020 V. Description of the invention (7) Part i cl e) is dispersed in resin, and ruthenium oxide (ru〇2) and glass powder are dispersed in a binder (Binder) and then cured; The thin film resistance materials are, for example, nickel-chromium (N i-C r), nickel-phosphorus (N i-P) ', nickel-tin (ni — s η), chromium-aluminum (Cr-Al), and titanium nitride (TaN) alloys. Etc., which can be formed by methods such as sputtering, electroplating, or electroless plating. As shown in FIG. 3D, 'the resistive film 42 and the fourth conductive metal layer 34 carrying the surface thereof are patterned to form a fourth circuit layer 34a and a resistive electrode 34b to complete the embedded resistive element 4 in the substrate structure. 2 a, and at least one through-surface opening 50 is formed in the first unit circuit board 3 a, and is used as a storage space for subsequent electronic components. As shown in FIG. 3E, at least one conductive hole 43 is formed in at least one second unit circuit board at the same time, and the fifth circuit layer 35a and the fifth circuit layer 35a formed on the surface of the second unit circuit board 3b are electrically connected. The sixth circuit layer 36a. Of course, the second unit circuit board can also be used as a multi-layer circuit board according to actual design requirements. As shown in FIG. 3F, a seventh circuit layer 37a and an eighth circuit are formed on the fifth circuit layer 3 5a and the sixth circuit layer 3 6 a of the second unit circuit board 3b by an insulation layer 4 respectively. The circuit layer 38a, and the seventh circuit layer 37a and the eighth circuit layer 38a are electrically connected to the fifth circuit layer 35a and the first through a conductive via (B1 ind) 4 4 formed in the insulating layer 40. Six circuit layers 36a. As shown in FIG. 3G, the first unit circuit board 3a and the second unit circuit board 3b are combined, so that one side of the opening of the first unit circuit board 50 is formed by the second unit circuit board 3b. It is closed to form a receiving recess 50a, and an insulation layer 40 is formed on the eighth circuit layer 38a of the second unit circuit board 3b.
ΙϋΗΙΙ IH 第14頁 17098.ptd 1231020 * . 五、發明說明(8) 成有第九導電金屬層39。當然,該第一單元雷踗杯之龆 5〇亦可形成於該第二單元電路板3b中,同樣於接合該第一 f凡電路板3a與具開口之第二單元電路板扑時,得以使該 第二單元電路板3b之開口一側為該第一單元電路板3a所封 閉,以形成一收納空間。該凹部50a可供後續接置並電性 連接有如半導體晶片等電子元件至該基板上,俾有效降低 半導體裝置之整體厚度。 如第3H圖所示,於基板預定處形成有多數貫穿該封裝 基板表面之電鑛導通孔(PTH)45,該等電鑛導通孔45係可 供電性連接至形成於該電容膜4 1與電阻膜4 2至少一者表面 之電路層。該電鍍導通孔4 5係可利用機械或雷射鑽孔 (D r i 1 1 i n g)以形成通孔4 5 a,並對該封裝基板外側及通 孔45 a表面形成一如鍍鎳層或鍍銅層等金屬導電層45b,復 以填充材料45c,例如環氧樹脂(Epoxy)等絕緣材質或錫 膏(Solder Paste)等導電材質填滿通孔45a,以形成一 電鍍導通孔4 5。 如第31圖所示,圖案化該基板表面之第九導電金屬層 3 9與載有電容膜41之第三導電金屬層33,以形成有第九電 路層39 a以及第三電路層33 a與至少一電容元件之一平行板 33b,配合先前圖案化第一電路層31 a中之另一平行板 3 1 b,俾完成該電容元件4 1 a鑲埋於該封裝基板1 〇 〇中,並 使該第九電路層39a可藉由盲孔44以電性連接至封裝基板 内部之電路層。而該基板1 0 0可應用於覆晶式(F 1 i p Ch i p ) 封裝基板,亦或一般之打線式(Wire bonding)封裝基板。ΙϋΗΙΙ IH Page 14 17098.ptd 1231020 *. 5. Description of the invention (8) A ninth conductive metal layer 39 is formed. Of course, the 50th of the first unit thunder cup can also be formed in the second unit circuit board 3b, and the same can be achieved when the first unit circuit board 3a and the second unit circuit board with an opening are joined. The opening side of the second unit circuit board 3b is closed by the first unit circuit board 3a to form a receiving space. The recessed portion 50a can be used for subsequent placement and electrical connection of electronic components such as semiconductor wafers to the substrate, thereby effectively reducing the overall thickness of the semiconductor device. As shown in FIG. 3H, a plurality of electrical through-holes (PTH) 45 penetrating through the surface of the package substrate are formed at predetermined positions on the substrate. These electrical through-holes 45 are electrically connectable to the capacitor film 41 and The circuit layer on at least one surface of the resistance film 42. The plated through-holes 4 and 5 can be formed mechanically or by laser drilling (D ri 1 1 ing) to form the through-holes 4 5 a, and the outer side of the package substrate and the surface of the through-holes 45 a can be formed as nickel plating or plating. A metal conductive layer 45b such as a copper layer is filled with a filling material 45c. For example, an insulating material such as epoxy (Epoxy) or a conductive material such as Solder Paste fills the through hole 45a to form a plated through hole 45. As shown in FIG. 31, the ninth conductive metal layer 39 and the third conductive metal layer 33 on the surface of the substrate are patterned to form a ninth circuit layer 39a and a third circuit layer 33a. Cooperate with the parallel plate 33b of one of the at least one capacitive element, and cooperate with the other parallel plate 3 1 b of the first patterned first circuit layer 31 a to complete the embedding of the capacitive element 4 1 a in the package substrate 100. The ninth circuit layer 39 a can be electrically connected to the circuit layer inside the package substrate through the blind hole 44. The substrate 100 can be applied to a flip-chip (F 1 i p Ch i p) package substrate, or a general wire bonding package substrate.
17〇98.Ptd 第 15 頁 1231020 五、發明說明(9) 藉由上述本發明之内喪被動元件之半導體封裝基板製 作方法所形成之封裝基板1 0 0,主要係包括有:第一單元 電路板3a與第二單元電路板3b,且該第一單元電路板3a具 有至少一貫穿表面之開口 5 0,而該第二單元電路板3b係封 閉住該第一單元電路板3 a開口 5 0之一側,俾可形成有至少 一收納凹部5 a ;複數之圖案化電路層 31a,32a,33a,34a,35a,36a,37a,38a,39a係間隔有絕緣層 4 0以設置於疊合之二單元電路板内部;至少一電容膜4 1與 至少一電阻膜42係形成於該第一單元電路板3a;多數可供 電性第二單元電路板3 b電路層之導電盲孔44;以及複 f1個貫穿該封裝基板1 0 0之電鍍導通孔(PTH ),可供電性連 接$开4 、读電容膜41與電阻膜42至少一者表面之電路 場〇 該第 箔基板、 月1 、石夕、 層之銅箔 等導電金 複數電路 該電 如為一圖 層4 0係可 #質等電 該導 一單 背膠 聚鲳 樹月备 屬層 層之 路層 案化 由有 性絕 電盲 元電路板 鋼箔、或 樹脂、玻 層專構成 ,以形成 多層電路 31a, 32a, 之銅層, 機材質、 緣材料所 孔4 4係形 3 a或第二單元電路板3 b係可選自銅 於FR-4樹脂、FR-5樹脂、環氧樹 璃纖維等絕緣性材料表面鍍覆銅箔 ’並加以線路圖案化其表面之銅箔 一雙層電路板,亦可形成一堆疊有 板。 3 3a,3 4a,3 5a,3 6a,3 7a,3 8a,39a例 以形成於該絕緣層4 0上,而該絕緣 纖維強化有機材質或顆料強化有機 構成。 成於絕緣層40中,其可藉由機械鑽17〇98.Ptd Page 15 1231020 V. Description of the invention (9) The package substrate 100 formed by the above-mentioned method for manufacturing a semiconductor package substrate for passive components in the present invention mainly includes: a first unit circuit Board 3a and second unit circuit board 3b, and the first unit circuit board 3a has at least one opening 50 through the surface, and the second unit circuit board 3b closes the opening 50 of the first unit circuit board 3a On one side, 俾 may be formed with at least one receiving recess 5a; a plurality of patterned circuit layers 31a, 32a, 33a, 34a, 35a, 36a, 37a, 38a, 39a are provided with an insulating layer 40 spaced apart to be disposed on the stack Inside the second unit circuit board; at least one capacitive film 41 and at least one resistive film 42 are formed in the first unit circuit board 3a; most of the power-supplyable second unit circuit board 3b is a conductive blind hole 44 in the circuit layer; and A plurality of f1 plated through holes (PTH) penetrating through the package substrate 100 can be electrically connected to at least one of the circuit fields on the surface of the read capacitor film 41 and the resistance film 42. The first foil substrate, Multiple circuits of conductive gold such as Shi Xi, layer of copper foil, etc. This layer is a layer of 0 0 series, which can be electrically conductive, a single adhesive, polycylindrical tree, and a layer of road. The layering is composed of sexually insulated blind element circuit board steel foil, resin, and glass layer. To form multilayer circuits 31a, 32a, copper layers, machine materials, edge materials, holes 4 4 series 3 a or the second unit circuit board 3 b, may be selected from copper in FR-4 resin, FR-5 resin, ring The surface of an insulating material such as oxygen glass fiber is plated with copper foil, and the surface is patterned with a copper foil on the surface, a double-layer circuit board, or a stacked board. 3 3a, 3 4a, 3 5a, 3 6a, 37a, 38a, 39a are formed on the insulating layer 40, and the insulating fiber reinforced organic material or particles reinforce the organic structure. Formed in the insulating layer 40, which can be
第16頁 1231020 五、發明說明(10) 孔或雷射鑽孔等方式形成,且於該絕緣層4 0上藉由電鍍、 無電鍍或濺鍍等方式形成至少一導電金屬層,並使該導電 金屬層可全部或部分覆蓋至該導電盲孔44,俾藉由該導電 盲孔4 4及導電孔4 3以電性連接該絕緣層雨側之電路層。 該電容膜4 1係選自介電常數大之高介電層,其係由如 高分子材料、陶瓷材料、陶瓷粉末填充之高分子及其相似 物所製成,通常介電常數大於5即可適用,當然,介電常 數值越高越好,其材料可例如為鈦酸鋇、鈦酸鍅鉛、無定 形氫化碳’或其粉末散佈於黏結劑中,如樹脂、玻璃粉末 等,亦可利用濺鍍、印刷或滾輪旋塗等方式成形。且該半 導體封裝基板所需電容值之大小,可依所使用之電容膜41 材質及形成於該電容膜4 1相對表面之平行板3 1 b,3 3 b間所 夾合之電容元件4 1 a尺寸加決定。 該電阻膜42包含有厚膜(Thick fi lm)及薄膜(Thin f i 1 m)電阻被動元件,而該厚膜電阻材料係如銀粉或碳顆 粒散布於樹脂中,及氧化釕與玻璃粉末散布在一黏結劑塗 佈再固化而形成;相對該薄膜電阻材料係如鎳鉻、鎳碟: 鎳錫、鉻紹、及氮化鈦合金等,藉由濺鍍、電鍍或無電錄 等方式形成。而選擇使用厚膜電阻器或使用薄膜電阻哭广 則是以製作多層電路板之製作成本與所製作被動元件:雷 性精確度來決定。且該半導體封裝基板所需電阻值之蛋 小,可依所使用之電限膜42材質及形成於該電阻膜“上 電極34b間相距之電阻元件42a尺寸加決定。 透過本發明之内戒被動元件之半導體封裝基板製作方Page 16 1231020 V. Description of the invention (10) Holes or laser drilling are formed, and at least one conductive metal layer is formed on the insulating layer 40 by electroplating, electroless plating or sputtering, and the The conductive metal layer may cover the conductive blind hole 44 in whole or in part, and the conductive blind layer 44 and the conductive hole 43 are used to electrically connect the circuit layer on the rain side of the insulating layer. The capacitor film 41 is selected from a high-dielectric layer having a large dielectric constant, and is made of a polymer material such as a polymer material, a ceramic material, a ceramic powder, and the like. Generally, the dielectric constant is greater than 5; Applicable. Of course, the higher the dielectric constant value, the better. The material can be, for example, barium titanate, lead titanate titanate, amorphous hydrogenated carbon 'or its powder dispersed in a binder such as resin, glass powder, etc. Can be formed by sputtering, printing or roller spin coating. In addition, the required capacitance value of the semiconductor package substrate can be based on the material of the capacitor film 41 used and the parallel plate 3 1 b, 3 3 b sandwiched between the capacitor film 41 and the capacitor element 41. a size plus decision. The resistive film 42 includes thick film (Thick fi lm) and thin film (Thin fi 1 m) resistive passive elements, and the thick film resistive material is such as silver powder or carbon particles dispersed in resin, and ruthenium oxide and glass powder are dispersed in A bonding agent is formed by coating and curing. In contrast, the thin film resistance materials such as nickel chromium, nickel plate: nickel tin, chromium tin, and titanium nitride alloy are formed by sputtering, electroplating, or electroless recording. The choice of using thick film resistors or thin film resistors is determined by the manufacturing cost of the multilayer circuit board and the passive components: lightning accuracy. In addition, the egg of the resistance value required for the semiconductor package substrate is small, and can be determined according to the material of the electrical limiting film 42 and the size of the resistance element 42a formed between the resistance film "upper electrode 34b." Through the inner or passive aspects of the present invention, Component semiconductor package substrate manufacturer
1231020 五、發明說明 法所得之 件鑲埋於 量與電性 可避免被 之現象, 引發短路 再者’精 並使該第 (11) 基板,係 基板中, 功能,同 動元件受 以降低輝 ,亦得以 由結合該 二單元電 將至少 以提昇 時增加 向溫與 接困難 縮短銲 第一單 路板得 一側,以形成一内嵌有電 有一凹部之多層 連接至 體厚度 面至 子元 短半 同時 電阻 際製 υ 口 一 早兀 於接 得以 所封 僅係 之可 下, 飾, 少具 件收 導體 具高 先前 膜、 程所 電路 合該 使該 閉, 用以 實施 任何 均仍 納並 封裝 電性 圖式 電容 需而 板之 第一 第二 以形 例釋 範疇 運用 應為 凹部 電性 件整 之目 中僅 膜以 加以 開口 X3V 一 早兀 X3X3 一 早兀 成一 本發 ,在 本發 下述 的 以 電 及電路 設計並 亦可形 電路板 電路板 收納空 明之特 未脫離 明所揭 之申請 一膜狀 半導體 基板線 板流影 度,避 線線孤 元電路 以封閉 阻膜與 電路板 該多層 ,達到 阻膜及 層之數 分佈於 成於該 與具開 之開口 間。惟 點及功 本發明 示内容 專利範 電阻元件與 裝置内被動 路佈局靈活 響而偏位, 免銲線直接 長度,以節 板與該第二 住第一單元 電容膜等被 ,俾供如半 電路板之凹 該半導體封 至少一 元件之 性,另 甚而發 觸及被 省銲接 單元電 電路板 動元件 導體晶 部内, 裝件輕 電容元 佈設數 外,亦 生短路 動元件 成本。 路板, 開口之 以及表 片等電 藉以縮 薄短小 一電容膜表示,實際上該 位置,係依實 間,且該第一 路板中,同樣 板時, 電路板 施例, 本發明 範疇 及修 目以及相對 基板之疊層 第二單元電 口之第二單元電路 一側為該第一單元 以上所述之 效,而非用 上揭之精神 而完成之等 圍所涵蓋。 具體實 以限定 與技術 效改變1231020 V. The parts obtained by the invention description method can be embedded in the quantity and electrical properties to avoid the phenomenon of causing a short circuit and then 'fine' and make the (11) substrate, which is the substrate, functions, and synchronous components reduced It is also possible to combine the two units of electricity to at least increase the temperature and connection difficulty when lifting, and shorten the side of the first single circuit board to form a multilayer connection with a recess embedded in the electricity to the body thickness surface to the element. The short semi-simultaneous resistance system uv port can be sealed early and can only be closed. Decoration, few pieces of conductors, high current film, and circuit should be closed for the implementation of any The package of electric pattern capacitors needs to be used in the first and second examples of the board. The application should be only the film in the whole part of the recessed electrical parts to open the X3V. Early X3X3. The electrical and circuit design can also shape the circuit board. The circuit board accommodates the application of a film-like semiconductor substrate wire plate, which does not depart from the disclosure, and avoids the line. Neuron circuit to close the barrier film and the multilayer circuit board, the number of layers to achieve the barrier film to be distributed in the opening between the tool and the opening. The points and functions of the invention are patented. The resistance elements and the passive circuit layout in the device are flexible and deviated. The direct length of the solder-free wire is covered by the joint plate and the capacitor film of the first unit. Concavity of the circuit board The nature of the semiconductor encapsulating at least one element, and even touches the conductor crystal part of the moving element of the circuit board of the welding-saving unit, and the number of light-weight capacitors is short. The circuit board, the opening, and the watch piece are represented by a thin and short capacitor film. In fact, the position is based on reality. In the first circuit board, when the same board is used, the circuit board is implemented. The scope of the invention and The side of the second unit circuit of the second unit electrical port of the laminated second unit electrical port on the opposite substrate is covered by the above-mentioned effect of the first unit, and is not completed by the spirit of opening. Concrete, limited, and technically effective
17098.ptd 第18頁 1231020 圖式簡單說明 【圖式簡單說明】: 第1圖係為習知將被動元件安置於半導體晶片接置區 域外之 基板 額 外 佈 局 面 積 上之不意圖 9 第 2圖係為習知將被動元件整合至半 導 體 晶 片 與銲接 區域間 之剖 面 示 意 圖 9 以 及 第 3 A圖 至 3 I圖 係 本 發 明之内嵌被 動元件之半導體封裝 基板製 作方 法 示 意 圖 〇 1,2, 100 基 板 11,21 半 導 體 晶 片 12, 22 被 動 元 件 23 銲 線 24 封 裝 樹 脂 3a 第 一 單 元 電 路板 3b 第 _ · 單 元 電 路 板 30 絕 緣 樹 脂 層 30a 上 表 面 30b 下 表 面 31 第 一 導 電 金 屬 層 32 第 二 導 電 金 屬層 33 第 二 導 電 金 屬 層 34 第 四 導 電 金 屬層 39 第 九 導 電 金 屬 層 31a 第 一 電 路 層 32a 第 二 電 路 層 3 3a 第 二 電 路 層 34a 第 四 電 路 層 35a 第 五 電 路 層 36a 第 六 電 路 層 37a 第 七 電 路 層 3 8a 第 八 電 路 層 3 9 s, 第 九 電 路 層 31b, 33b 平 行 板 34b 電 阻 電 極 40 絕 緣 層 41 電 容 膜 42 電 阻 膜 41a 電 容 元 件 42a 電 阻 元 件 43 導 電 孔17098.ptd Page 18 1231020 Brief description of the drawings [Simplified description of the drawings]: Figure 1 shows the unintended layout of the passive components on the extra layout area of the substrate outside the semiconductor wafer mounting area. 9 Figure 2 For the sake of acquaintance, a schematic cross-sectional view of integrating a passive component between a semiconductor wafer and a soldering area 9 and FIGS. 3A to 3I are schematic views of a method for manufacturing a semiconductor package substrate with a passive component embedded in the present invention. , 21 Semiconductor wafer 12, 22 Passive element 23 Bonding wire 24 Packaging resin 3a First unit circuit board 3b First unit circuit board 30 Insulating resin layer 30a Upper surface 30b Lower surface 31 First conductive metal layer 32 Second conductive metal layer 33 second conductive metal layer 34 fourth conductive metal layer 39 ninth conductive metal layer 31a first circuit layer 32a second circuit layer 3 3a second circuit layer 34a fourth circuit layer 35a fifth circuit layer 36a sixth Path layer 37a of the seventh circuit layer 3 8a eighth circuit layer 3 9 s, 34b resistor electrically ninth circuit layers 31b, 33b parallel to the plate 40 insulating layer 41, the capacitance film 42 resistive film 41a is electrically 42a electrically 43 conductive hole resistor element receiving member
17098. ptd 第19頁 123102017098.ptd p. 19 1231020
17098.ptd 第20頁17098.ptd Page 20
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