TWI229892B - Apparatus for removing dusts from substrates - Google Patents

Apparatus for removing dusts from substrates Download PDF

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Publication number
TWI229892B
TWI229892B TW92132651A TW92132651A TWI229892B TW I229892 B TWI229892 B TW I229892B TW 92132651 A TW92132651 A TW 92132651A TW 92132651 A TW92132651 A TW 92132651A TW I229892 B TWI229892 B TW I229892B
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TW
Taiwan
Prior art keywords
patent application
scope
substrate
cleaning device
substrate cleaning
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TW92132651A
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Chinese (zh)
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TW200518173A (en
Inventor
Chun-Hao Huang
Yen-Kun Ji
Jen-Rung Jung
Chung-Jen Chen
Tzung-Lin Chuang
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Advanced Semiconductor Eng
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Priority to TW92132651A priority Critical patent/TWI229892B/en
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Publication of TWI229892B publication Critical patent/TWI229892B/en
Publication of TW200518173A publication Critical patent/TW200518173A/en

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Abstract

An apparatus for removing dusts from substrates is disclosed. The apparatus comprises a machine body having an air-blowing mechanism and a dust-collecting mechanism mounted thereon. The dust-collecting mechanism includes a dust-collecting cover and a trough board assembly with a plurality of cassette splints. The cassette splints are connected at the end of the opening of the dust-collecting cover. The substrate cassettes have two opposed ends of the opening correspondingly toward the air-blowing mechanism and the dust-collecting cover so as to be clipped by the cassette splints. When a pressed air blow the substrate cassettes, the dusts blown from the substrates in the substrate cassettes are absorbed into the dust-collecting cover without random float resulting in contamination.

Description

1229892 導體封 半導體 等,基 續封裝 參閱第 基板卡 之間的 基板污 吹氣, 污染物 ] 之主要 機台及 物機構 卡匣板 ,使得 罩,當 塵罩係 由基板 之次一 之技術領域】 係有關於一種基板s杳、变壯$ ^ 鹿a m β 為裝置,特別係有關於 塵至内之基板清潔裝置。 裝製程係實施於一無塵室,常見地其係 晶片載板,在各式製程中,如黏晶、打 板會沾附塵埃、銲接或封膠廢料等污染 製程之困難,故需要固定地清除基板之 1圖,在製程步驟之間,複數個基板20 匣10 ’以供搬運,該基板卡匣i 〇係具有 開口端11,以供放入與取出該些基板 染物清除方法係利用手動方式手持吹氣 以吹落基板或半導體晶片上之污染物, 會飛揚在無塵室中,導致二次污染。 目的係 裝設在 係包含 係設於 基板卡 該吹氣 吸取由 吹落之 目的係 在於提供一種基板清 一吹氣機 及一槽板 開放口前 端分別對 力氣流吹 中之基板 四逸而導 種基板清 五、發明說明(1) 【發明所屬 本發明 種適用於無 【先前技術 習知半 以基板作為 線或封膠等 物,導致後 污染物。請 係容置於一 在兩匣壁12 20,習知之 搶上下來回 但被吹離之 【發明内容 本發明 係包含有一 機構,該集 組之複數個 持基板卡昆 構與該吸塵 匣時,該吸 物,以避免 本發明 該機台上之 有一吸塵罩 該吸塵罩之 匣之兩開口 機構提供壓 該基板卡臣 污染物飛散 在於提供一 潔裝置,其 構與一集物 組,該槽板 緣,用以夾 應該吹氣機 向該基板卡 吹落之污染 致污染。 潔裝置,其1229892 Conductor seals semiconductors, etc. For basic packaging, refer to the main machine and physical mechanism cassette board of the substrate between the substrate card and the substrate], so that the cover, when the dust cover is the second technical field of the substrate 】 It is related to a kind of substrate s 杳, which is stronger and stronger. ^ Deer am β is a device, especially related to the dust-to-inside substrate cleaning device. The assembly process is implemented in a clean room. It is usually a wafer carrier board. In various processes, such as sticky crystals and boarding, it is difficult to contaminate the process with dust, welding or sealing waste, so it needs to be fixed. Picture 1 of removing the substrate. Between the process steps, a plurality of substrates 20 boxes 10 ′ are provided for transportation. The substrate cassette i 〇 has an open end 11 for inserting and removing the substrates. The hand-held blower is used to blow off the pollutants on the substrate or semiconductor wafer, which will fly in the clean room and cause secondary pollution. The purpose is to install the system. The purpose is to install on the substrate card. The purpose of blowing and sucking is to provide a substrate cleaning blower and a front end of a slot plate open mouth. Five kinds of substrates, description of the invention (1) [The invention belongs to the invention is applicable to the [non-previously known semi-substrates using substrates as wires or sealants, etc., resulting in post-contamination. Please place it on a wall of two boxes 12 to 20, which is known to grab back and forth but is blown away. [Summary of the Invention The present invention includes a mechanism, the set of a plurality of substrate holding kun structure and the dust box, The suction object avoids a dust extraction hood on the machine according to the present invention. The two opening mechanisms of the box of the dust extraction hood provide pressure for the substrate to disperse Carson pollutants and provide a clean device, which is structured with a collection set and the slot plate. It is used to clamp the pollution that should be blown off by the blower to the substrate card.洁 装置 Its its

第14頁 1229892Page 14 1229892

係在一機台上裝設 機構係 塵罩以 板卡匣 該些基 有°人氣機構、一集物機構及一移動機 活動地連接該集物機構,該集物機構係 及一具有複數個卡匣板之槽板組,以夾 ,利用该機台在該吹氣機構處裝設有一 板卡!£被该移動機構之移動定點,以避 構,該移動 包含有一吸 持複數個基 擋條,作為 免損傷該吹氣機構 本發月之再目的係在於提供一種基板清潔裝置,其 包含有一吹氣機構及一集物機構,該集物機構係包含有一 複數個卡匣板之槽板組,以該些卡匣板 S ’该吹氣機構係包含有複數個吹氣喷 架係連接該些吹氣喷嘴,以利用一升降 喷嘴,以清潔該些基板卡匣中之基板, 吸塵罩以及 夾持複數個 具有 基板卡 該支 機構升降該些吹氣 嘴及一支架It is installed on a machine with a mechanism dust cover to board a cassette. These bases have a popular mechanism, a collection mechanism, and a mobile machine to movably connect the collection mechanism. The collection mechanism and a plurality of The slot plate group of the cassette board is used to install a board card at the blowing mechanism by using the machine! The point is fixed by the movement of the moving mechanism to avoid the structure. The movement includes a holding of a plurality of base barriers. As a damage-free air blowing mechanism, the purpose of this month is to provide a substrate cleaning device that includes a blower. A gas mechanism and a collection mechanism, the collection mechanism includes a slot plate group having a plurality of cassette plates, and the cassette plates S ′ include a plurality of gas blowing frames connected to these Blowing nozzles to use a lifting nozzle to clean the substrates in the substrate cassettes, a dust extraction hood and a plurality of supporting mechanisms with substrate cards to lift the blowing nozzles and a bracket.

並使得由該些基板被吹落之污染物被該吸塵罩收集。 依本發明之基板清潔裝置,其係主要包含有一機台、 了吹氣機構及一集物機構,其中該吹氣機構與該集物機構 係设於該機台之一作業平台上,該吹氣機構係包含有複數 個吹氣喷嘴’用以提供壓力氣流,該集物機構係包含有一 吸塵罩以及一具有複數個卡匣板之槽板組,其中該些卡g 板係裝設於該吸塵罩之開放口前緣,用以夾持基板卡匣, 較佳地’該槽板組係為可調間距之槽板組,其係將相鄰之 卡S板以一彈性元件連接,以夾持不同寬度之基板卡匣, 該集物機構係可連接一移動機構,以使該吸塵罩水平移動 於該作業平台’以利該吸塵罩收集該些基板被吹落之污染 物。 、And the pollutants blown off by the substrates are collected by the dust hood. The substrate cleaning device according to the present invention mainly comprises a machine, an air blowing mechanism and a collecting mechanism, wherein the blowing mechanism and the collecting mechanism are arranged on an operating platform of the machine, and the blowing mechanism The air mechanism includes a plurality of air blowing nozzles for providing a pressure air flow. The material collecting mechanism includes a dust suction cover and a slot plate group with a plurality of cassette plates, wherein the card g plates are installed in the The front edge of the opening of the dust extraction hood is used to hold the substrate cassette. Preferably, the slot plate group is an adjustable slot plate group, which connects adjacent S-boards with an elastic element to Clamping substrate cassettes of different widths, the collecting mechanism can be connected to a moving mechanism to move the dust extraction hood horizontally on the operation platform, so as to facilitate the dust extraction hood to collect the pollutants blown off by the substrates. ,

第15頁 1229892Page 15 1229892

【實施方式】 參閱所附圖式,本發明將列舉以下之實施例說明。 依據本發明之一具體實施例,請參閱第2、3及4圖, 一種基板清潔裝置i 00係主要包含有一機台11〇、一吹氣機 構120及一集物機構! 3〇,該機台11〇係具有一作業平台m 以及適當之控制開關與驅動機構,該些控制開關與驅ϋ動機 構係如氣壓閥壓力調整丨丨4與計數器丨丨5等,其中該作業平 台111之一側係供該吹氣機構丨2〇裝設,該作業平台丨丨i之 另一側係供該集物機構1 30裝設,在本實施例中,該集物 機構13係可裝設一移動機構丨4〇,並且在該機台11〇之作業 平台111係設有一滑軌112與一擋條113。 、 该吹氣機構1 2 0係包含有複數個吹氣喷嘴1 2 1 ,該些吹 氣喷嘴121係襄設於一支架122,該支架122連接至一升降 機構123,其係可為氣壓缸,以升降移動該些吹氣喷嘴 1 2 1,並且以使該些吹氣噴嘴丨2 1係能升降地吹落如第1圖 所示之複數個基板卡匣10内基板2〇之污染物,而在該機台 1 1 0之计數器1 1 5係可設定在每一基板清潔步驟中該些吹氣 噴嘴121之上下移動次數,並以該機台11〇之氣壓閥壓力調 整114調整該些吹氣喷嘴121之吹氣壓力。 該集物機構1 3 0係包含有一吸塵罩1 3 1以及一槽板組 1 3 2,該槽板組1 3 2係具有複數個卡匣板1 3 3,該吸塵罩1 31 之收斂口係連通一集塵管1 35,該吸塵罩1 31之開放口前緣 係裝設有該些卡匣板1 3 3,用以夾持複數個基板卡匣i 〇 〔如第5圖所示〕,較佳地,在該相鄰之卡匣板1 3 3間係連[Embodiment] With reference to the drawings, the present invention will be described by the following embodiments. According to a specific embodiment of the present invention, please refer to FIGS. 2, 3 and 4. A substrate cleaning device i 00 mainly includes a machine 110, an air blowing mechanism 120 and a collection mechanism! 30. The machine 11 has a working platform m and appropriate control switches and driving mechanisms. The control switches and driving mechanisms are such as the pressure adjustment of a pneumatic valve, 4 and a counter, 5 and so on. One side of the working platform 111 is provided for the blowing mechanism 丨 20, and the other side of the working platform 丨 丨 i is provided for the collection mechanism 1 30. In this embodiment, the collection mechanism 13 A moving mechanism 4o can be installed, and a slide rail 112 and a stopper 113 are provided on the operating platform 111 of the machine 11o. The air blowing mechanism 120 includes a plurality of air blowing nozzles 121. The air blowing nozzles 121 are arranged on a support 122, and the support 122 is connected to a lifting mechanism 123, which can be a pneumatic cylinder. , The air blowing nozzles 1 2 1 are moved up and down, and the air blowing nozzles 丨 2 1 are capable of blowing down the pollutants on the substrate 20 in the substrate cassette 10 as shown in FIG. 1. In the machine 1 1 0, the counter 1 1 5 can set the number of times that the blowing nozzles 121 move up and down in each substrate cleaning step, and adjust the pressure 114 with the pneumatic valve pressure of the machine 11 The blowing pressure of the blowing nozzles 121 is adjusted. The collecting mechanism 1 3 0 includes a vacuum hood 1 31 and a slot plate group 1 3 2. The slot plate group 1 3 2 has a plurality of cassette plates 1 3 3. The convergence opening of the dust cover 1 31 The dust collecting tube 1 35 is connected to the front edge of the open mouth of the suction cover 1 31. The cassette plates 1 3 3 are used to clamp a plurality of substrate cassettes i 〇 [as shown in FIG. 5. ], Preferably, connected between the adjacent cassette plates 1 3 3

第16頁 1229892 五、發明說明(4) 接有一彈性元件1 3 4,以供彈性夾持該些基板卡匣丨〇,達 -到調整該些卡匣板133之間距〔如第3圓所示〕,而夾持不 同規格之基板卡匣1 0 ;在本實施例中係將該移動機構1 4 〇 連接於該集物機構1 3 0之吸塵罩1 3 1,該移動機構1 4 〇係可 、 為氣壓缸’且该集物機構130另包含有在該槽板組132兩端 之滑塊1 3 6 ’該滑塊1 3 6其係延著該機台11 〇之該滑軌丨丨2滑-. 動,使得該集物機構1 30沿該滑轨1 1 2水平移動於該機台 11〇之作業平台ill間,以利該集物機構13〇之該吸塵罩131 收集該些基板2 0被吹落之污染物。 請參閱第4及5圖,將複數個容置有基板2〇之基板卡匣 1 0夾持於對應卡匣板1 3 3之間,該些卡匣板1 3 3係夾持每一 基板卡匣10之匣壁12,而該些基板卡匣10之兩開口端丨丨係 分別對應该吸塵罩131與該吹氣機構12〇之吹氣喷嘴121, 請再參閱第5及6圖,該移動機構1 4 〇係推動該集物機構1 3 〇 向前,即該移動機構1 4 0係推動該吸塵罩1 3 1與該些卡匣板 133以及被該些卡匣板133夾持之基板卡匣1〇向前,該集物 機構1 30係沿該機台11 0之線性滑軌11 2作線性移動,直到 該些基板卡匣10擋止於該機台110之擋條113 ;之後,請參 閱第7圖,該些吹氣喷嘴1 21係提供一壓力氣流,吹向該些 基板卡匣10之一開口端11 ,並且利用該升降機構123垂直 _ 升降該支架1 2 2並同時升降該些吹氣噴嘴丨21,使得該些吹 氣喷嘴1 2 1提供之壓力氣流能均勻吹落該些基板卡匣丨〇内 之基板20之污染物’同時,由該吸塵罩131提供一吸氣負 壓,使得被吹落之污染物能被收集於該吸塵罩丨31 ,以避Page 161229892 V. Description of the invention (4) An elastic element 1 3 4 is connected to elastically clamp the substrate cassettes 丨 〇, until the distance between the cassette plates 133 is adjusted (as in the third circle) In the present embodiment, the moving mechanism 1 4 0 is connected to the dust collecting cover 1 31 of the collecting mechanism 1 30, and the moving mechanism 1 4 0. It can be a pneumatic cylinder, and the collecting mechanism 130 further includes sliders 1 3 6 at the two ends of the slot plate group 132. The sliders 1 3 6 extend the slide rails of the machine 110.丨 丨 2 slide-. Movement, so that the collecting mechanism 1 30 horizontally moves along the slide rail 1 12 between the operating platform ill of the machine 110, in order to facilitate the collection of the dust collecting cover 131 of the collecting mechanism 13 The substrates 20 are blown down by contaminants. Please refer to FIGS. 4 and 5, a plurality of substrate cassettes 10 containing a substrate 20 are clamped between corresponding cassette plates 1 3 3, and the cassette plates 1 3 3 are used to clamp each substrate. The cassette wall 12 of the cassette 10, and the two open ends of the substrate cassettes 10 correspond to the air blowing nozzle 121 corresponding to the dust extraction cover 131 and the air blowing mechanism 120, respectively. Please refer to FIGS. 5 and 6 again, The moving mechanism 140 pushes the collection mechanism 130 forward, that is, the moving mechanism 140 pushes the dust cover 1 31 and the cassette plates 133 and is held by the cassette plates 133. The substrate cassette 10 is moved forward, and the collecting mechanism 1 30 is linearly moved along the linear slide rail 112 of the machine 110 until the substrate cassettes 10 stop at the stop 113 of the machine 110. After that, please refer to FIG. 7, the air blowing nozzles 1 21 provide a pressure air flow to one of the open ends 11 of the substrate cassettes 10, and use the lifting mechanism 123 to vertically lift the bracket 1 2 2 At the same time, the air blowing nozzles 21 are raised and lowered at the same time, so that the pressure air flow provided by the air blowing nozzles 1 2 1 can uniformly blow off the pollutants on the substrate 20 in the substrate cassettes ′ 0. When providing a negative pressure by the suction of the dust cover 131, so that the pollutants can be collected to be blown to the dust cover 31 Shu, in order to avoid

第17頁 1229892 五、發明說明(5) 免由該些基板20吹落之污染物四處飛散在無塵室内造成二 次污染,實具產業利用性。 本發明《保護範圍當視後附 < 申 為準,任何熟知此項技藝者, T、月号W釉固所界疋者 圍内所作之任何變化與修改,-不脫離本發明之精神和範 均屬於本發明之保護範園。Page 17 1229892 V. Description of the invention (5) Preventing the pollutants blown off by these substrates 20 from flying around in the clean room and causing secondary pollution, which has industrial applicability. The scope of protection of the present invention shall be subject to the appended < application. Any changes and modifications made by those skilled in the art, within the boundaries of the T and W glazed solid boundaries, shall not depart from the spirit and scope of the present invention. All belong to the protection domain of the present invention.

第18頁 1229892Page 18 1229892

【圖式簡單說明】 第1圖:習知基板卡匣之立體示意圖; 第2圖:依據本發明,一種基板清潔裝置之立體示意圖;* 第3圖··依據本發明,一種基板清潔裝置之卡匣板連接彈 性元件之局部立體示意圖; · 第4圖··依據本發明,該基板清潔裝置之側面示意圖; ·, 第5圖··依據本發明,該基板清潔裝置在移動基板卡匣狀 態之立體示意圖; 第6圖·依據本發明’該基板清潔裝置在移動基板卡匣之 側面不意圖,及 第7圖:依據本發明,該基板清潔裝置在吹吸污染物狀態 之側面示意圖。 元件符號簡單說明 • • 10 基板卡匣 11 20 基板 100 基板清潔裝置 110 111 作業平台 112 114 氣壓閥壓力調整 120 吹氣機構 121 123 升降機構 130 集物機構 131 133 卡匣板 134 136 滑塊 140 開口端 12 匣壁 機台 滑軌 113 播條 115 計數器 吹氣喷嘴 122 支架 吸塵罩 132 槽板組 彈性元件 移動機構 135 集塵管[Brief description of the drawings] Figure 1: A perspective view of a conventional substrate cassette; Figure 2: A perspective view of a substrate cleaning device according to the present invention; * Figure 3 ·· A substrate cleaning device according to the present invention Partial three-dimensional schematic diagram of the cassette plate connected to the elastic element; Figure 4 ... Side view of the substrate cleaning device according to the present invention; Figure 5 ... According to the present invention, the substrate cleaning device is in a state where the substrate cassette is moved 3D schematic diagram; FIG. 6 · According to the present invention, the substrate cleaning device is not intended to be moved on the side of the substrate cassette, and FIG. 7 is a schematic side view of the substrate cleaning device in the state of blowing pollutants according to the present invention. Simple explanation of the component symbols End 12 Box wall slide rail 113 Seed bar 115 Counter air blowing nozzle 122 Holder dust cover 132 Slot plate group elastic element moving mechanism 135 Dust collecting tube

第19頁Page 19

Claims (1)

1229892 六、申請專利範圍 【申請專利範圍】 1、一種基板清潔裝置,包含: 一機台; 一吹氣機構,其係設於該機台’該吹氣機構係包含有 複數個吹氣噴嘴;及 一集物機構,其係設於該機台,該集物機構係包含有 吸塵罩以及一槽板組,其中該槽板組係具有複數個卡 ®板’其係設於該吸塵罩之前緣,用以夾持複數個基板 卡匣。 2、 如申請專利範圍第1項所述之基板清潔装置,其另包 含有一移動機構,其係連接於該集物機構,以使該集物 機構移動,以利該集物機構之吸塵罩收集該些基板被吹 落之污染物。 3、 如申請專利範圍第2項所述之基板清潔裝置,其中該 移動機構係為一氣壓缸。 4、 如申請專利範圍第1或2項所述之基板清潔裝置,其 中該機台在該吹氣機構處裝設有一擋條。 5、 如申請專利範圍第1或2項所述之基板清潔裝置,其 中該槽板組係為可調間距並設有複數個彈性元件,以供 該些卡匣板彈性夾持該些基板卡匣。 6、 如申請專利範圍第1或2項所述之基板清潔裝置,其 中該機台係設有一滑軌,以供該集物機構之水平移動、。 7、 如申請專利範圍第1或2項所述之基板清潔展置,° 中該吹氣機構係包含有一支架,其係連接該些吹氣噴、 1229892 六、申請專利範圍 嘴。 8、 如申請專利範圍第7項所述之基板清潔裝置,其中該 支架係連接有一升降機構,用以升降該些吹氣喷嘴。 9、 如申請專利範圍第8項所述之基板清潔裝置,其中該 升降機構係為一氣壓缸。1229892 VI. Scope of patent application [Scope of patent application] 1. A substrate cleaning device, including: a machine; an air blowing mechanism, which is provided on the machine; the air blowing mechanism includes a plurality of air blowing nozzles; And a collecting mechanism, which is arranged on the machine, the collecting mechanism includes a dust collecting cover and a trough plate group, wherein the trough plate group has a plurality of card® plates, which is arranged in front of the dust collecting cover Edge for holding a plurality of substrate cassettes. 2. The substrate cleaning device as described in item 1 of the scope of the patent application, further comprising a moving mechanism connected to the collecting mechanism to move the collecting mechanism to facilitate the collection of the dust collecting cover of the collecting mechanism. The substrates are blown away by contaminants. 3. The substrate cleaning device according to item 2 of the scope of patent application, wherein the moving mechanism is a pneumatic cylinder. 4. The substrate cleaning device as described in item 1 or 2 of the scope of patent application, wherein the machine is provided with a stopper at the blowing mechanism. 5. The substrate cleaning device according to item 1 or 2 of the scope of patent application, wherein the slot plate group is an adjustable pitch and is provided with a plurality of elastic elements for the cassette plates to elastically clamp the substrate cards. cassette. 6. The substrate cleaning device described in item 1 or 2 of the scope of patent application, wherein the machine is provided with a slide rail for horizontal movement of the collecting mechanism. 7. According to the substrate cleaning exhibition described in item 1 or 2 of the scope of patent application, the air blowing mechanism in ° includes a bracket which is connected to the air blowing nozzles. 1229892 6. The scope of patent application mouth. 8. The substrate cleaning device according to item 7 of the scope of the patent application, wherein the bracket is connected with a lifting mechanism for lifting the blowing nozzles. 9. The substrate cleaning device according to item 8 of the scope of patent application, wherein the lifting mechanism is a pneumatic cylinder. 第21頁Page 21
TW92132651A 2003-11-20 2003-11-20 Apparatus for removing dusts from substrates TWI229892B (en)

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