TWI221100B - Process method and system for saving cleaning water - Google Patents
Process method and system for saving cleaning water Download PDFInfo
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91110033 五、發明說明(1) 【發明領域】 生、先5 ί : : : ΐ種清洗技術,特別係指透過重複使用 ;二節省清洗液之耗用*,甚至係同時 減少清洗廢液之排放者。 【發明背景】 按習用之半導體製程中的濕式清洗方4,主要可分為 兩類:一是以清洗較大顆粒之雜質為主的快速排放沖洗法 (quick drain,簡稱QD),其係利用重力的方式將水快速 排放出去,同時將雜質拖矣出,而達到洗淨之效果;另一 是以清洗較小顆粒之懸浮雜質為主的層流洗淨法 (r i n s e ) ’其係利用層流(1 a m i n a Γ f 1 〇 w )將微小而懸浮於 水中的雜質帶出,而達到洗淨之效果。 « 參考第一圖係顯示習用清洗技術製程系統架構圖,其主要 包括一清洗液供應單元1 〇、一清洗單元2 0及一廢液排放單 元3 0。該清洗液供應單元1 〇係一可供應該清洗單元2 0足夠 之清洗液的裝置,如提供去離子水(DI water);該清洗單 元2 0中具有快速排放沖洗法之清洗裝置及一可控制整個清 洗製程之控制裝置;該廢液排放單元3 0則係將清洗使用後 的清洗液排放至它處之適當裝置。 前述之清洗單元2 0中可視需求而取代該快速排放沖洗法清 洗裝置為層流洗淨法清洗裝置,或是同時具有快速排放沖 洗法及層流洗淨法之清洗裝置。 參考第二圖係顯示習用之具有使用快速排放沖洗=及 層流洗淨法的清洗技術製程方法流程圖’其係指一次完整91110033 V. Description of the invention (1) [Field of invention] Health, first 5 ί::: a kind of cleaning technology, especially refers to through repeated use; two to save the consumption of cleaning fluid *, even reduce the discharge of cleaning waste fluid at the same time By. [Background of the Invention] According to the wet cleaning method 4 in the conventional semiconductor manufacturing process, it can be divided into two categories: one is the quick drain (QD) method, which is mainly used to clean impurities of larger particles. Gravity is used to quickly drain water out, and at the same time drag impurities out to achieve the effect of washing; the other is laminar washing method (rinse), which is mainly used to wash small particles of suspended impurities. The laminar flow (1 amina Γ f 1 〇w) brings out tiny impurities suspended in water to achieve the effect of washing. «Refer to the first figure, which shows the architecture diagram of the conventional cleaning technology process system, which mainly includes a cleaning liquid supply unit 10, a cleaning unit 20, and a waste liquid discharge unit 30. The cleaning liquid supply unit 10 is a device capable of supplying enough cleaning liquid to the cleaning unit 20, such as providing DI water; the cleaning unit 20 has a cleaning device for rapid discharge flushing method and a A control device that controls the entire cleaning process; the waste liquid discharge unit 30 is an appropriate device that discharges the cleaning liquid after cleaning to another place. In the foregoing cleaning unit 20, the rapid discharge flushing method cleaning device may be replaced by a laminar flow cleaning method cleaning device or a cleaning device having both a rapid discharge flushing method and a laminar flow cleaning method according to requirements. Reference to the second figure is a flow chart showing a conventional cleaning technology process method using rapid discharge flushing = and laminar flow cleaning method ′, which refers to a complete
I麵 第5頁 1221100 案號 91110033_ 一年 月 a 修正 五、發明說明(2) 清洗程序之流程。步驟5 0 0係將該清洗液供應單元1 〇所產 生的清洗液注入該清洗單元2 0;步驟5 0 2係該清洗單元2 0 利用步驟5 0 0所注入之清洗液,並透過其快速排放沖洗法 之清洗裝置而進入快速排放沖洗法之清洗程序,且最後將 使用後的清洗液廢液輸送至該廢液排放單元30;步驟504 係該廢液排放單元3 0將步驟50 2中所輸送之廢液導引至它 處儲存或排放出去;步驟50 6係透過該清洗單元20中的控 制裝置,判斷已進行之快速排放沖洗製程是否達到五次, 若不足五次,則會再重複執行步驟500、502、5 04及506, 若已達到五次,則會進入步驟5 0 8;步驟5 0 8係將該清洗液 供應單元1 0所產生的清洗液注入該清洗單元2 0;步驟5 1 0 係該清洗單元2 0利用步驟5 0 8所注入之清洗液,並透過其 層流洗淨法之清洗裝置而進入層流洗淨製程,且最後將使 用後的清洗液廢液輸送至該廢液排放單元3 0;步驟5 1 2係 該廢液排放單元3 0將步驟510中所輸送之廢液導引至它處 儲存或排放出去。 參考第三圖係顯示習用之具有使用快速排放沖洗法及 層流洗淨法清洗技術製程之用水量及排水量示意圖。其 中,第一階段之快速排放沖洗法6 0 0係指前述第二圖中步 驟500、502、504及506所進行之製程,而該製程五次沖洗 分別透過體積各自為A、B、C、D及E單位的清洗液6 2 1、 6 2 2、6 2 3、6 2 4及6 2 5進行快速排放沖洗製程,且每次沖洗 所排出之廢液631、632、633、634及6 3 5體積各自為A’、 B’、C’、D’及E’單位;第二階段之層流洗淨法610係指前 述第二圖中步驟508、510及51 2所進行之製程,而該製程 i^i A^ll〇〇Side I Page 5 1221100 Case No. 91110033_ Year Month a Amendment V. Description of Invention (2) Process of cleaning procedure. Step 5 0 is to inject the cleaning liquid generated by the cleaning liquid supply unit 10 into the cleaning unit 20; Step 50 2 is the cleaning unit 2 0 to use the cleaning liquid injected in Step 5 0 and quickly pass through it Discharge the cleaning device of the flushing method and enter the cleaning procedure of the rapid discharge flushing method, and finally send the used cleaning liquid waste liquid to the waste liquid discharge unit 30; step 504 is the waste liquid discharge unit 30 and step 50 2 The transported waste liquid is guided to other places for storage or discharge; step 50 6 is to judge whether the rapid discharge flushing process has been performed five times through the control device in the cleaning unit 20, and if it is less than five times, it will be repeated. Repeat steps 500, 502, 5 04, and 506. If it has reached five times, it will go to step 5 0; Step 5 0 8 is to inject the cleaning liquid produced by the cleaning liquid supply unit 10 into the cleaning unit 2 0 Step 5 1 0 The cleaning unit 20 uses the cleaning liquid injected in step 5 8 and enters the laminar flow cleaning process through the laminar flow cleaning method of the cleaning device, and finally the used cleaning liquid is discarded. Liquid to the waste liquid discharge unit 30; step The 512-based effluent discharge waste liquid guide unit 30 in step 510 it is transported to the place of storage or vented. The reference to the third figure is a schematic diagram showing the water consumption and drainage volume of a conventional cleaning process using a rapid discharge flushing method and a laminar flow cleaning method. Among them, the rapid discharge flushing method 600 in the first stage refers to the process performed in steps 500, 502, 504, and 506 in the second figure above, and the five flushes of the process are respectively A, B, C, and D and E unit cleaning liquids 6 2 1, 6, 2 2, 6 2 3, 6 2 4 and 6 2 5 The fast discharge flushing process is performed, and the waste liquid 631, 632, 633, 634, and 6 discharged each flush 3 5 volumes are A ', B', C ', D', and E 'units respectively; the second-stage laminar flow washing method 610 refers to the process performed in steps 508, 510, and 51 2 of the second figure above, And the process i ^ i A ^ ll〇〇
----- 911 Hum 五、發明說明(3) 透過體積為F單位的清洗液6 2 6進行層流洗淨製程,且所排 出之廢液6 3 6體積為f,單位。因此,在一次完整的清洗制 程中,清洗液供應單元丨〇所需供應的清洗液62〇總體積^ 為A + B + C + D + E + F單位,且廢液排放單元30所需排放的廢^ 63 0總體積量為八’+6,+(:,+〇,+£,+?,單位,以致於在每一\ 完整的清洗製程中,必須提供大量的清洗液,且也必須& 理大量的清洗廢液。如此不但造成成本上的負擔,也^成 水資源的浪費,更可能造成環保上的問題。 【發明概述】----- 911 Hum V. Description of the invention (3) The laminar flow washing process is performed through the cleaning liquid 6 2 6 whose volume is F units, and the volume of waste liquid 6 3 6 discharged is f, the unit. Therefore, in a complete cleaning process, the total volume of the cleaning liquid supply required by the cleaning liquid supply unit 丨 〇 is A + B + C + D + E + F units, and the waste liquid discharge unit 30 needs to discharge The total volume of waste ^ 63 0 is eight '+ 6, + (:, + 〇, + £, + ?, unit, so that in each complete cleaning process, a large amount of cleaning liquid must be provided, and also It is necessary to & manage a large amount of cleaning waste liquid. This will not only cause a cost burden, but also a waste of water resources, and may also cause environmental problems. [Summary of the Invention]
_ 本發明之目的,係設計一種以回收清洗液方式達到節 省水資源並相對地減少排放廢液之清洗製程方法及系統即 為達到上述目的,本發明提供一種節省清洗用水的製程系 統,其包含:一可提供快速排放沖洗製程後段或層流洗淨 製程所需之清洗液的清洗液供應單元1 0、一具有快速排放 沖洗法或層流洗淨法清洗裝置之清洗單元2 〇、一可排放製 程中產生之清洗廢液的廢液排放單元3〇、一可回收且同時 過濾部分清洗廢液之回收單元40、一可檢測判斷所回收的 之清洗廢液為需排放廢液或可回收使用之再生清洗液的檢 測單元50、一儲存所回收之再生清洗液的儲存單元60及一 可提供快速排放沖洗製程前段所需之再生清洗液的再生清 沬液供應單元7 0。 本發明之清洗流程係針對不同的清潔程度要求來作設 計,因此回收的清洗廢液量係根據清洗流程設計、回收單 元4 0的過濾能力與檢測單元5 0對回收單元之清洗廢液的檢_ The purpose of the present invention is to design a cleaning process method and system that can save water resources and relatively reduce the discharge of waste liquid by recovering the cleaning solution. In order to achieve the above purpose, the present invention provides a processing system that saves cleaning water. : A cleaning liquid supply unit 10 that can provide the cleaning liquid required for the rapid discharge of the latter part of the washing process or the laminar flow cleaning process, a washing unit with a rapid discharge washing method or a laminar flow washing method cleaning device 2 A waste liquid discharge unit 30 for discharging the cleaning waste liquid generated in the manufacturing process, a recovery unit 40 that can recover and filter part of the cleaning waste liquid at the same time, and a detection and judgment to determine whether the recovered cleaning waste liquid is a waste liquid to be discharged or can be recycled A detection unit 50 for the used regenerating cleaning solution, a storage unit 60 storing the recovered regenerating cleaning solution, and a regenerating cleaning solution supply unit 70 which can provide a quick discharge of the regenerating cleaning solution required in the first stage of the washing process. The cleaning process of the present invention is designed according to different cleaning degree requirements. Therefore, the amount of cleaning waste liquid recovered is designed according to the cleaning process, the filtering capacity of the recycling unit 40 and the detection unit 50 checking the cleaning waste fluid of the recycling unit.
第7頁 1221100 案號 91110033_年 月 g___ 五、發明說明(4) 測標準來決定。使用再生清洗液來清洗的次數愈多、回收 單元40的過濾能力愈好及檢測單元50對回收單元之清洗廢 液的檢測標準愈低’則整個回收廢液的使用率愈南’也就 是愈節省全新清洗液的使用量。 為使熟悉該項技藝人士瞭解本發明之目的、特徵及功 效,茲藉由下述具體實施例,並配合所附之圖式’對本發 明詳加說明如后。 【發明詳細說明】 參考第四圖為顯示本發明節省清洗用水製程之系統架 構圖,其包括一清洗液供應單元10、一清洗單元2 0、一廢 液排放單元30、一回收單元40、一檢測單元50、一儲存單 元6 0及一再生清洗液供應單元7 〇。該清洗液供應單元1 0係 可提供快速排放沖洗製程後段或層流洗淨製程所需之清洗 液,此清洗液可以係去離子水(DI water);該清洗單元20 具有提供進行快速排放沖洗法或層流洗淨法之清洗裝置及 一可控制整個清洗製程之控制裝置;該回收單元4 0係可回 收且同時過渡該清洗單元2 0中快速排放沖洗製程後段或層 流洗淨製程所產生的清洗廢液,最後將這些過濾後的液體 再輸送至該檢測單元5 0處;該檢測單元5 0係透過其感測裝 置判斷該回收單元4 0所回收的之清洗廢液的污染程度,而 決定其為需排放之廢液或可回收使用的再生清洗液;該廢 液排放單元3 0係作為排放前述清洗單元2 0之快速排放沖洗 製程前段中所產生的清洗廢液以及該檢測單元5 0所判斷需 排放之清洗廢液;該儲存單元6 0係儲存該檢測單元5 0判斷Page 7 1221100 Case No. 91110033_year month g___ 5. Description of the invention (4) Determined by the test standard. The more times the regeneration cleaning liquid is used for cleaning, the better the filtration capacity of the recovery unit 40 and the lower the detection standard of the cleaning waste liquid of the recovery unit by the detection unit 50 is. Save the amount of new cleaning fluid. In order to make those skilled in the art understand the purpose, features, and effects of the present invention, the following specific embodiments and the accompanying drawings' are used to explain the present invention in detail as follows. [Detailed description of the invention] Referring to the fourth figure, a system architecture diagram showing a process for saving cleaning water according to the present invention is provided, which includes a cleaning liquid supply unit 10, a cleaning unit 20, a waste liquid discharge unit 30, a recovery unit 40, a The detection unit 50, a storage unit 60 and a regeneration cleaning liquid supply unit 70. The cleaning liquid supply unit 10 can provide the cleaning liquid required for the rapid discharge of the flushing process or the laminar flow cleaning process. The cleaning liquid can be DI water; the cleaning unit 20 has the function of providing rapid discharge flushing. Cleaning unit or laminar flow cleaning method and a control device that can control the entire cleaning process; the recovery unit 40 is recyclable and simultaneously transitions to the rear part of the rapid discharge flushing process in the cleaning unit 20 or the laminar flow cleaning process station The generated cleaning waste liquid is finally delivered to the detection unit 50; the detection unit 50 judges the pollution degree of the cleaning waste liquid recovered by the recovery unit 40 through its sensing device. It is determined that it is a waste liquid to be discharged or a recyclable cleaning liquid that can be recycled; the waste liquid discharge unit 30 is used to discharge the cleaning waste liquid generated in the previous stage of the rapid discharge flushing process of the aforementioned cleaning unit 20 and the detection The cleaning waste liquid to be discharged determined by the unit 50; the storage unit 60 stores the detection unit 50
1221100 案號 五、發明說明(5) 91110033 曰 修正 可回收使用之再生清洗液,並備存以提供後續製程使用; 該再生清洗液供應單元7 0係利用該儲存單元6 0所儲存之再 生清洗液k供前述清洗导兀2 0之快速排放沖洗製程前段使 用。 前述之清洗單元2 0中可視需求而取代該快速排放沖洗 法清洗裝置為層流洗淨法清洗裝置,或是同時具有快速排 放沖洗法及層流洗淨法之清洗裝置。 前述清洗單元2 0中快速排放沖洗製程前段係使用回收 之再生清洗液。1221100 Case No. 5. Description of the invention (5) 91110033 means revising the recyclable cleaning fluid that can be recycled and storing it for use in subsequent processes; the regenerating cleaning fluid supply unit 70 uses the regenerating cleaning stored in the storage unit 60 The liquid k is used in the front part of the rapid discharge flushing process of the cleaning guide 20 described above. In the aforementioned cleaning unit 20, the rapid discharge flushing method cleaning device may be replaced by a laminar flow method cleaning device or a cleaning device having both a rapid discharge flushing method and a laminar flow cleaning method according to requirements. The front part of the rapid discharge flushing process in the aforementioned cleaning unit 20 uses the recycled regenerating cleaning solution.
前述清洗單元2 0中快速排放沖洗製程後段或層流洗淨 製程係使用純淨之清洗液。 前述之檢測單元5 0中具有量測回收廢液的導電值或歐 姆值的裝置,或檢測有機化合物含量之裝置。 第五A及五B圖說明本發明的第一實施例之流程圖,其 清洗流程設計為五次快速排放沖洗製程後再一次層流洗淨 製程,前三次的快速排放沖洗製程係使用再生清洗液。步 驟7 0 0係透過該再生清洗液供應單元7 0將再生清洗液注入 該清洗單元20;步驟702係該清洗單元20利用步驟70 0所注 入之再生清洗液’並透過其快速排放沖洗法之清洗裝置而 進入快速排放沖洗法之清洗製程,且最後將使用後的清洗 液廢液輸送至該廢液排放單元3 0;步驟70 4係該廢液排放 單元3 0將步驟70 2中所輸送之廢液導引至它處儲存或排放 出去;步驟7 0 6係透過該清洗單元2 0中的控制裝置,判斷 已進行之快速排放沖洗製程是否達到三次,若不足三次, 則會再重複執行步驟700、702、704及706’若已達到三In the aforementioned cleaning unit 20, the latter part of the rapid discharge flushing process or the laminar flow cleaning process uses a pure cleaning solution. The aforementioned detection unit 50 has a device for measuring the conductivity or ohmic value of the recovered waste liquid, or a device for detecting the content of organic compounds. Figures 5A and 5B illustrate a flowchart of the first embodiment of the present invention. The cleaning process is designed as a laminar flow cleaning process after five rapid discharge flushing processes. The first three rapid discharge flushing processes use regeneration cleaning. liquid. Step 70 is to inject the regeneration cleaning liquid into the cleaning unit 20 through the regeneration cleaning liquid supply unit 70; Step 702 is the cleaning unit 20 uses the regeneration cleaning liquid injected in step 70 to pass through the rapid cleaning method. Wash the device and enter the cleaning process of the rapid discharge flushing method, and finally send the used cleaning liquid waste liquid to the waste liquid discharge unit 30; step 70 4 is the waste liquid discharge unit 30 and transfer it in step 70 2 The waste liquid is guided to other places for storage or discharge. Step 706 is to determine whether the rapid discharge flushing process has been performed three times through the control device in the cleaning unit 20, and if it is less than three times, it will be repeated. Steps 700, 702, 704, and 706 'if three have been reached
第9頁 1221100 ΜΆ 五、發明說明(6)Page 9 1221100 ΜΆ 5. Description of the invention (6)
次’則會=入步驟70 8;步驟7〇8係將該清洗液供應單元1〇 所產生的β洗液注入該清洗單元2 〇;步驟7 1 〇係該清洗單 兀2 0利用步驟7 〇 8所注入之清洗液,並透過其快速排放沖 洗法之π,裝置而進入快速排放沖洗製程,且將產生的清 洗廢液輸迗至該回收單元4〇;步驟712係該回收單元4〇將 步驟710中所輸送之廢液回收並進行適當的過濾;步驟7Η 係該檢測單元50針對步驟712所回收並完成過濾之濾液進 行檢測、,以判斷是否要將該濾液回收使用;步驟η5係透 過該廢液排放單元3 0將步驟7丨2中判斷為不回收使用之濾 液導引至它處儲存或排放出去,且此時可能表示清洗不完 全,。因此會再回到步驟7 〇 8繼續清洗;步驟71 6係透過該儲 存單兀6 0儲存步驟7 1 2中判斷為可回收使用之濾液;步驟 71 8係將該儲存單元6 0所儲存之再生清洗液輸送至該再生 清洗液供應單元7 0中;步驟7 2 0係透過該清洗單元2 0中的 控制裝置,判斷已進行之步驟7〇8、710、71 2的快速排放 沖洗製程疋否達到兩次,若不足兩次,則會再回到步驟 7 0 8繼續執行快速排放沖洗製程,若已達到兩次,則會進 入步驟7 2 2;步驟7 2 2係將該清洗液供應單元丨〇所產生的清 洗液注入該清洗單元20;步驟724係該清洗單元20利用步 驟7 2 2所注入之清洗液,透過其層流洗淨法之清洗裝置而 進入層流洗淨製程’且將產生的清洗廢液輸送至該回枚單 元40;步驟726係該回收單元40將步驟724中所輸送之廢液 回收並進行適當的過濾;步驟728係該檢測單元50針對步 驟7 2 6所回收並完成過濾之濾液進行檢測,以判斷是否要 將該渡液回收使用;步驟7 2 9係透過該廢液排放單元3 〇將Then, it will go to step 70 8; step 708 is to inject the β washing liquid generated by the cleaning liquid supply unit 10 into the cleaning unit 2 0; step 7 1 0 is the cleaning unit 2 0 to use step 7 〇8 Injected cleaning liquid, and through its rapid discharge flushing method π, the device enters the rapid discharge flushing process, and the generated cleaning waste liquid is transferred to the recovery unit 40; step 712 is the recovery unit 40. Recover the waste liquid transported in step 710 and perform appropriate filtration; step 7Η is the detection unit 50 detects the filtrate recovered and filtered in step 712 to determine whether the filtrate is to be recycled; step η5 is The waste liquid discharged unit 30 is used to guide the filtrate that was judged as not to be recycled in step 7 to 2 for storage or discharge, and at this time, it may indicate that the cleaning is incomplete. Therefore, it will return to step 7 08 to continue cleaning; step 71 6 is to store the filtrate judged to be recyclable in step 7 12 through the storage unit 60; step 71 8 is to store the filtrate stored in the storage unit 60 The regeneration cleaning liquid is sent to the regeneration cleaning liquid supply unit 70; step 720 is a rapid discharge flushing process of steps 708, 710, and 71 2 judged through the control device in the cleaning unit 20 疋No twice, if less than twice, then go back to step 7 0 8 to continue the fast discharge flushing process. If it has reached twice, then go to step 7 2 2; step 7 2 2 is to supply the cleaning liquid The cleaning liquid generated by the unit 丨 is injected into the cleaning unit 20; step 724 is that the cleaning unit 20 uses the cleaning liquid injected in step 7 2 2 to enter the laminar flow cleaning process through the laminar flow cleaning method of the cleaning device. And the generated cleaning waste liquid is sent to the return unit 40; step 726 is the recovery unit 40 recovers the waste liquid sent in step 724 and performs appropriate filtering; step 728 is the detection unit 50 for step 7 2 6 The recovered filtrate is filtered Perform a test to determine whether the liquid is to be recycled; Step 7 2 9 is through the waste liquid discharge unit 3 〇
第10頁 1221100 i號 91〗10033 修正 曰 _η 五、發明說明(7) 步驟728中判斷為不回收使用之濾液導引至它處儲存或排 放出去’且此時可能表示清洗不完全,因此會再回到步驟 7 2 2繼續清洗;步驟7 3 0係透過該儲存單元6 0儲存步驟7 2 8 中判斷為可回收使用之濾液;步驟7 3 2係將該儲存單元6 0 所儲存之再生清洗液輸送至該再生清洗液供應單元7 0中。 前述步驟71 4及步驟728中所使用之方法係透過檢測單 元5 0的導電度計來量測回收廢液之歐姆值,以判斷該回收 廢液之清潔程度,作為是否回收使用該回收廢液之判斷依 據。 第六圖說明第一實施例之用水量及排水量示意圖,其 中’第一階段之快速排放沖洗法8 0 0之製程前段係指前述 第五Α圖中步驟700、7〇2、7 04及70 6所進行之製程,而該 製程三次沖洗係分別透過該再生清洗液供應單元7 〇提供體 積各自為A、B及C單位的再生清洗液8 4 1、8 4 2及8 4 3進行快 速排放沖洗製程,且每次沖洗所排出之廢液8 3 1、8 3 2及 833體積各自為A’、B’及C’單位;第一階段之快速排放沖 洗法80 0之製程後段係指前述第五A圖中步驟708、710、 712、714、715、716、718及72 0所進行之製程,而該製程 兩次沖洗係分別透過該清洗液供應單元1 〇提供體積各自為 D及E單位的清洗液8 2 1及8 2 2進行快速排放沖洗製程,且每 次沖洗所排出之廢液透過該回收單元4 0過濾及通過該檢測 單元5 0檢測後所回收之再生清洗液8 5 1及8 5 2體積各自為 D’及E’單位;第二階段之層流洗淨法8 1 0係指前述第五B圖 中步驟722、724、72 6、728、729、73 0及732所進行之製 程,而該製程透過該清洗液供應單元10提供體積為F單位Page 10 1221100 i No. 91〗 10033 Amendment _η V. Description of the invention (7) The filtrate judged to be unused in step 728 is led to be stored or discharged elsewhere 'and may indicate that the cleaning is incomplete, so Will return to step 7 2 2 to continue cleaning; step 7 3 0 stores the filtrate judged to be recyclable in step 7 2 8 through the storage unit 60; step 7 3 2 stores the filtrate stored in the storage unit 60 The regenerated cleaning liquid is delivered to the regenerated cleaning liquid supply unit 70. The method used in the foregoing step 71 4 and step 728 is to measure the ohmic value of the recovered waste liquid through a conductivity meter of the detection unit 50 to determine the cleanliness of the recovered waste liquid, and whether to use the recovered waste liquid as a recycling device. The basis of judgment. The sixth diagram illustrates the water consumption and drainage volume of the first embodiment. The first stage of the process of the rapid discharge flushing method 8 0 of the first stage refers to steps 700, 702, 704, and 70 in the fifth A above. 6 process, and the three washings of this process are through the regeneration cleaning liquid supply unit 7 respectively to provide the volume of A, B and C units of regeneration cleaning liquid 8 4 1, 8 4 2 and 8 4 3 for rapid discharge The flushing process, and the volume of waste liquid discharged from each flush 8 3 1, 8, 32, and 833 are each A ', B', and C 'units; the first stage of the rapid discharge flushing method 80 0 refers to the foregoing The process performed in steps 708, 710, 712, 714, 715, 716, 718, and 72 0 in the fifth figure A, and the two rinses of this process are respectively passed through the cleaning liquid supply unit 10 to provide volumes D and E, respectively. The unit's cleaning liquid 8 2 1 and 8 2 2 are subjected to a rapid discharge washing process, and the waste liquid discharged from each washing is filtered through the recovery unit 40 and passed through the detection unit 50 and the recycled cleaning liquid 8 5 is recovered. 1 and 8 5 2 volumes are D 'and E' units respectively; The flow cleaning method 8 1 0 refers to the process performed in steps 722, 724, 72 6, 728, 729, 73 0, and 732 in the fifth figure B, and the process provides a volume of F through the cleaning liquid supply unit 10 unit
Η 第11頁 1221100 案號911100沿 五、發明說明(8) 的清洗液823進行層流洗 過該回收單元4 0過渡及通程仏且。沖洗所排出之廢液透 再生清洗液8 5 3體積為F,u測單兀5 0檢測後所回收之 、〃 ^旱位。 因此,在一次完整主制Η Page 11 1221100 Case No. 911100 A laminar flow washes along with the cleaning solution 823 of the description of the invention (8) through the recovery unit 40 transition and pass. The discharged waste liquid from the flushing was passed through the regeneration cleaning liquid 8 5 3 with a volume of F, and the dry level recovered after the test was performed by the test unit 50. So in a complete mastership
所需供應的清洗液82〇她中,清洗液供應單元U 單元30所需排放的廢液^ = ^ + E + F單位,且廢液排放 以在每-次清洗製程猶環中里早位,所 了 A + B + C單位。 而要棱供全新清洗液就減少 本發明之系統中雖較習用枯 單元、儲存單亓乃增加了回收單元、檢測 卞儿 碎仔早70及再生清洗液供座留- ,^ 加了另一水循if政硷 先及供應早兀,但實際上只是增 改即;完系:此’只需將習用系統進行局部修 本發明的清洗流程可依據不同的設備、 一成本考量來進行設計與*準要求 樣介沾、主4 , 囚此整個清洗系統具有多 的/月冼Μ程设計來符合不同的需求。 ,然本發明已以一具體實施例揭露如上,然其 2疋本發明,任何熟悉此技藝者, ^ 神和範圍β,當可作各種之更動盘們飭,::本發明之精 濩把圍當視後附之申請專利範圍所界定者為準。 保 1221100 案號91110033 年月日 修正 圖式簡單說明 【圖式說明】 第一圖為顯示習用清洗技術製程之系統架構圖; 第二圖為顯示習用清洗技術製程之方法流程圖; 第三圖為顯示習用清洗技術製程之用水量及排水量示意 Ιχΐ · 圖, 第四圖為顯示本發明節省清洗用水製程之系統架構圖; 第五A及五B圖說明本發明的第一實施例之流程圖; 第六圖說明第一實施例之用水量及排水量示意圖。 【圖號說明】 清洗液供應單元 1 0 清洗單元 2 0 廢液排放單元 30 回收單元 40 檢測單元 50 儲存單元 6 0 再生清洗液供應單元 7 0Among the cleaning liquids to be supplied, 80% of the waste liquids discharged by the cleaning liquid supply unit U unit 30 are ^ = ^ + E + F units, and the waste liquids are discharged early in each cycle of the cleaning process. All A + B + C units. In order to supply a new cleaning solution, the system of the present invention has a reduced recovery unit, a storage unit, an additional recovery unit, a detection of babies as early as 70, and a regeneration cleaning solution for storage. The water supply policy is early and the supply is early, but it is actually only an increase and change; the complete system is: this only needs to repair the conventional system locally. The cleaning process of the present invention can be designed and based on different equipment and cost considerations. * It is required that the sample cleaning agent and the main 4 be used. The whole cleaning system has a multi-month design process to meet different needs. However, the present invention has been disclosed as above with a specific embodiment. However, the present invention is based on the present invention. Anyone who is familiar with this skill, ^ God and range β, can make various changes. :: The essence of the present invention Wei Dang shall be determined by the scope of the attached patent application. Bao 1221100 Case No. 91110033 Month-Day Amendment Schematic Description [Schematic Description] The first diagram is a system architecture diagram showing the process of conventional cleaning technology; the second diagram is a flowchart showing the process of conventional cleaning technology process; the third diagram is A diagram showing the water consumption and drainage volume of the conventional cleaning technology process. Figure IX. Figure 4 shows the system architecture diagram of the cleaning water saving process of the present invention. Figures 5A and 5B illustrate the flowchart of the first embodiment of the present invention; The sixth figure illustrates the water consumption and drainage volume of the first embodiment. [Illustration of drawing number] Cleaning liquid supply unit 1 0 Cleaning unit 2 0 Waste liquid discharge unit 30 Recovery unit 40 Detection unit 50 Storage unit 6 0 Regenerative cleaning liquid supply unit 7 0
第13頁Page 13
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI402110B (en) * | 2010-04-26 | 2013-07-21 | Uni President Entpr Corp | Water recovery equipment cleaning method |
TWI645949B (en) * | 2017-12-11 | 2019-01-01 | 住華科技股份有限公司 | Cutting equipment and cutting method thereof |
CN111448005A (en) * | 2017-12-08 | 2020-07-24 | 3M创新有限公司 | System and method for washing 3D printed objects |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI402110B (en) * | 2010-04-26 | 2013-07-21 | Uni President Entpr Corp | Water recovery equipment cleaning method |
CN111448005A (en) * | 2017-12-08 | 2020-07-24 | 3M创新有限公司 | System and method for washing 3D printed objects |
CN111448005B (en) * | 2017-12-08 | 2022-07-05 | 3M创新有限公司 | System and method for washing 3D printed objects |
US11738372B2 (en) | 2017-12-08 | 2023-08-29 | 3M Innovative Properties Company | System for washing a 3D-printed object |
TWI645949B (en) * | 2017-12-11 | 2019-01-01 | 住華科技股份有限公司 | Cutting equipment and cutting method thereof |
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