JPH10177940A - Chemicals feeder - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enhance a chemicals feeder in operating efficiency by a method wherein one of chemicals piping systems is closed when particles are detected in chemicals, and the other is opened, then cleaning liquid is supplied to the closed chemicals piping system to clean, and chemicals are fed to a substrate through the opened chemicals piping system. SOLUTION: When particles (dust or air bubbles) contained in chemicals are detected by a particle detector DN, the chemicals are discharged out to a cup drain D1 , and particle-free chemicals are fed to a substrate K. A cleaning liquid pipng system C is connected on the upper side of the two chemicals piping systems A and B through the intermediary of three-way switching valves V7 and V8 . Cleaning liquid sources C1 and C2 are provided in the cleaning liquid piping system C. Therefore, when the chemicals piping systems A and B are cleaned, cleaning liquid is sucked out, from the cleaning liquid sources C1 and C2 with pumps PA and PB and fed to the two chemicals piping systems A and B for maintenance.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a chemical supply device. More specifically, the present invention relates to a chemical solution supply device for supplying a chemical solution from a chemical solution source to a substrate.

[0002]

2. Description of the Related Art In the manufacture of a semiconductor device, various chemicals such as a resist, a developing solution, ultrapure water, and a rinsing solution are supplied to a substrate from a chemical source, and a resist pattern is formed by development. A chemical solution supply device is used to supply a chemical solution from the chemical solution source to the substrate, and a chemical solution supply device as shown in FIG. 4 is conventionally known.

In this chemical supply device, a pump P is connected to a chemical source S, a filter F is connected to the pump P, a nozzle N is connected to the filter F, and the pump P sucks a chemical from the chemical source S. The filter F captures dust in the chemical solution and supplies the chemical solution from the nozzle N to the substrate K.

Further, a chemical solution applied to the substrate K from the nozzle N is collected in a sampling bottle SB, and particles in the chemical solution are periodically inspected by a stand-alone detector SAD.

On the other hand, cleaning liquid pipings E1 and E2 are periodically or irregularly arranged upstream of the pump P of the chemical liquid piping system A so as to prevent excessive accumulation of dust in the piping system based on the particle inspection. Connect to wash solution source C1, C
The cleaning with the cleaning liquid of No. 2 is performed.

[0006]

However, since the above-mentioned chemical solution supply device has only one chemical solution piping system A, when removing dust accumulated in the piping system, the device is temporarily stopped for maintenance. Need to be in operation during that time. Also, a cleaning liquid pipe E for cleaning the pipe system.
The connection between E1 and E2 is manual and inefficient.

In addition, since the inspection of particles in the chemical solution is performed by a sample inspection of the chemical solution supplied from the nozzle N to the substrate K, a sudden increase in dust causes the resist pattern to adhere to the substrate K and generate bubbles. The shape failure occurs.

In such a case, an abnormality is usually detected by a pattern defect device or the like, and the resist pattern is reproduced and patterned. However, it takes time for reproduction and reworking. Eventually, the resist pattern becomes defective in shape, and the yield decreases.

The present invention has been made in consideration of the above-mentioned prior art, and improves the operation rate of the apparatus, and automatically removes particles (dust and bubbles) accumulated in a piping system. It is an object of the present invention to provide a chemical liquid supply device that improves efficiency and prevents abnormalities in a resist pattern due to dust and bubbles.

[0010]

In order to achieve the above object, according to the present invention, there is provided a chemical solution supply mechanism having two chemical solution piping systems for feeding a chemical solution to a substrate side, and a chemical solution supply mechanism provided upstream of the chemical solution supply mechanism. A cleaning mechanism for connecting and cleaning the chemical supply mechanism with the cleaning liquid; and a particle detection mechanism connected downstream of the chemical supply mechanism for detecting particles of the chemical and waste liquid and supplying the chemical to the substrate. To provide a chemical solution supply device.

According to this configuration, when particles in the chemical solution are detected by the particle detection mechanism (the function of the filter is reduced), one of the chemical solution piping systems of the chemical solution supply mechanism is closed and the other chemical solution piping system is opened. Thus, the cleaning liquid can be supplied to one closed chemical liquid piping system for cleaning, and the chemical liquid can be supplied to the substrate through the other opened chemical liquid piping system.

Therefore, the maintenance rate of the apparatus can be improved by maintaining the one chemical piping system with the cleaning liquid while supplying the chemical liquid with the other chemical liquid piping system.

[0013]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In a preferred embodiment,
The chemical supply mechanism is provided with a pump for sucking a chemical from a chemical source and a filter for capturing dust in the chemical.
It is characterized by being composed of a system chemical piping system.

Therefore, one of the chemical liquid piping systems of the chemical liquid supply mechanism is closed, the cleaning liquid is suctioned from the cleaning mechanism to the chemical liquid piping system by the pump of the one of the closed chemical liquid piping systems, and the cleaning is performed to remove particles. One of the chemical piping systems can be automatically cleaned and maintained.

[0015] Further, the chemical liquid can be sucked from the chemical liquid source by the pump of the other chemical liquid piping system, and dust in the chemical liquid can be captured by the filter and supplied to the substrate.

In a preferred embodiment, the chemical supply mechanism is connected in parallel with a pump for sucking a chemical from a chemical source and a switchable parallel for catching dust in the chemical.
It is characterized by comprising two chemical liquid piping systems provided with two filters.

According to this configuration, when one filter of one chemical solution piping system is not usable, one of the filters is closed, and the cleaning liquid can be passed through the other filter for cleaning.
In the meantime, the unusable filter can be replaced with a new one so that it can be restarted at any time.

Further, in a preferred embodiment,
The cleaning mechanism is characterized by providing two switchable cleaning liquid sources connected in parallel.

Therefore, the cleaning liquid is supplied from one of the cleaning liquid sources to the chemical liquid piping system for cleaning, and then the cleaning liquid is switched to the other cleaning liquid source and the other cleaning liquid is supplied to the chemical liquid piping system for automatic cleaning.

Further, in a preferred embodiment,
The particle detection mechanism includes a particle detector that detects particles in a chemical solution and a detection application piping system provided with a nozzle that applies the chemical solution to a substrate, and a particle detector that detects particles in waste liquid for maintenance using a cleaning liquid and discharges waste liquid. And a detection drain piping system provided with a waste liquid drain.

Accordingly, particles in the chemical solution can be detected by the particle detector of the detection application piping system, and a chemical solution without particles can be supplied to the substrate from the nozzle.

On the other hand, the presence or absence of particles in the waste liquid is detected by the particle detector in the detection drain piping system, and the other chemical liquid piping system to be maintained with the cleaning liquid is reliably cleaned.

Further, in a preferred embodiment,
The particle detection mechanism includes a deaeration processing module that deaerates bubbles in the chemical solution, a detection application piping system including a particle detector that detects the particles, and a nozzle that applies the chemical solution to the substrate, and a waste liquid for maintenance using the cleaning liquid. It is characterized in that a degassing module for degassing bubbles, a particle detector for detecting particles, and a detection drain piping system having a waste liquid drain for discharging waste liquid are provided.

According to this configuration, the bubbles in the chemical solution or the waste liquid are degassed by the degassing processing modules provided respectively in the detection coating piping system and the detection drain piping system.

Therefore, on the one hand, a chemical solution without bubbles can be supplied to the substrate, and on the other hand, bubbles in the maintenance waste liquid can be removed by the cleaning liquid.

[0026]

FIG. 1 shows a chemical supply apparatus according to the present invention.
The figure is a schematic diagram of the whole.

The chemical solution source S is a chemical solution for forming a resist pattern on the substrate K by coating and developing, a resist, a developing solution,
It contains ultrapure water and rinse liquid.

A chemical solution source S has a valve V for switching two chemical solution piping systems A and B in two directions and three directions.
1, V2 and V3, V4. Each of the chemical piping systems A and B is provided with a pump PA and a filter FA, and a pump PB and a filter FB, respectively.

Therefore, each of the pumps PA and PB draws the chemical from the chemical source S, and the chemical is filtered by each filter F.
A, send it to the filter FB side to capture the dust in the chemical,
They are supplied downstream of the chemical liquid piping systems A and B, respectively.

A detection coating piping system n is connected to the downstream side of the chemical piping systems A and B via valves V5 and V6 which can be switched in three directions. The detection application piping system n is provided with a particle detector DN for detecting particles and a nozzle N for applying a chemical solution to the substrate K.

Therefore, particles in the chemical solution can be detected by the particle detector DN, and a chemical solution without particles can be supplied to the substrate K from the nozzle N and applied.

When particles in the chemical are detected by the particle detector DN, the chemical is discharged to the cup drain D1. Therefore, a good chemical solution without particles can be supplied to the substrate K.

A cleaning liquid piping system C is connected to the upstream side of the two chemical liquid piping systems A and B via valves V7 and V8 which can be switched in three directions. This cleaning liquid piping system C
Are provided with cleaning liquid sources C1 and C2.

Therefore, when the chemical pipe system A or B is maintained, the cleaning liquid source C1 is pumped by the pump PA or the pump PB.
The cleaning liquid of the cleaning liquid source C2 is suctioned to supply the cleaning liquid to the chemical liquid piping system A or B, and maintenance can be performed with the cleaning liquid.

Downstream of the two chemical liquid piping systems A and B, valves V9 and V10 that can be switched in three directions are provided.
Is connected to the detection drain piping system d. The detection drain piping system d includes a particle detector D
D and a waste liquid drain D2 are provided.

Therefore, when the chemical piping system A or B is maintained with the cleaning liquid, particles in the waste liquid are detected, and the presence or absence of particles in the piping of the chemical piping system A or B being maintained is checked. If this is the case, the pipe system can be restarted.

Next, an operation method for supplying a chemical solution to a substrate using the above-described chemical solution supply device will be described.

First, the valve V1 is opened, the valve V3 is opened on the side of the pump PA, and the pump PA is driven to drive a chemical solution (resist, developing solution, ultrapure water or rinsing solution) from the chemical solution source S.
Is suctioned and sent to the filter FA. Pump PA used
Uses a bellows type or a diaphragm type.

The filter FA captures dust contained in the chemical solution. The used filter FA is, for example, 0.03 to
Use a minimum pore size of 0.1 μm.

Next, the chemical solution capturing the dust with the filter FA is sent to the particle detector DN via the opened valves V9 and V5, and the particle detector DN
To detect particles in the chemical solution, and further feed the nozzle N to the substrate K to supply a substrate-free chemical solution to the substrate K for application. The used particle detector DN uses a light source of a semiconductor laser (830 nm or 780 nm) and a laser diode (837 nm), and irradiates this light to a detection cell attached to a piping system in the particle detector DN, and is scattered by dust and bubbles. Side scattered light and forward scattered light. Accordingly, dust and bubbles can be monitored for the chemical solution discharged from the nozzle N to the substrate K immediately before discharging. The number of detection cells is equal to the number of usages per substrate, and the filter FA
Attached to the piping system that goes back to the side, the discharge amount for one discharge is measured in particles in synchronization with the discharge of the chemical solution, and the amount is
To supply.

When particles (dust or bubbles) are suddenly detected by the particle detector DN, the chemical piping system A of the pump PA and the filter FA is closed, and the chemical piping system B of the pump PB and the filter FB is opened. (V2, V4, V6, and V5), the chemical solution of the chemical source S is sent from the chemical solution piping system B to the detection application piping system n including the particle detector DN and the nozzle N, and the chemical solution is supplied from the nozzle N to the substrate K.

At this time, the amount of the chemical solution for several discharges is discarded in the cup drain D1 provided on the side of the substrate K,
Discharge the drug solution upward and restart. This is because the chemical solution before containing the particles remains in the piping of the detection application piping system n.

Next, in order to restore the closed chemical piping system A of the pump PA and the filter FA, the cleaning liquid source C1 of the cleaning liquid piping system C is first opened (the valve V).
8, V7) The cleaning liquid of the cleaning liquid source C1 is sucked by the pump PA, and the dust accumulated in the pump PA and the dust captured by the filter FA are eluted with the cleaning liquid.

The waste liquid discharged from the chemical liquid piping system A is supplied to the detection drain piping system d including the particle detector DD and the waste liquid drain D2 through the opened valves V9 and V10, and is discarded. At this time, the particle detector DD detects the particle level in the waste liquid of the cleaning liquid to be maintained, and performs cleaning with the cleaning liquid of the cleaning liquid source C1 until the particles are eliminated.

The cleaning liquid used here is, for example, n-methyl-2-pyrrolidone, T
HF, tetrachloromethane, 1,1,1-trichloroethane, trichloroethylene and the like are used, ethanol and the like are used for a developing solution, and a similar cleaning solution used for a resist is used for a rinsing solution. For ultrapure water, the same cleaning liquid used for the developer is used.

Next, cleaning is performed by replacing the chemical liquid piping system A of the pump PA and the filter FA replaced with the cleaning liquid of the cleaning liquid source C1 with the cleaning liquid of the cleaning liquid source C2 opened through the valves V8 and V7. The particle level in the waste liquid of the cleaning liquid to be maintained is detected by the particle detector DD, and the cleaning liquid source C is used until the particles disappear.
Wash with the washing solution of Step 2.

The cleaning liquid used here is, for example, ethyl lactate, ethyl pyruvate, propylene glycol monomethyl ether acetate, a mixture of ethyl lactate and methyl ethyl ketone, and ethyl lactate and n-butyl for a chemical resist. A mixture of acetate or the like is used. Ultrapure water is used for the developer, a similar cleaning liquid used for the resist is used for the rinsing liquid, and ultrapure water used for the developer is used for the ultrapure water.

Finally, the chemical piping system A of the pump PA and the filter FA replaced with the cleaning liquid of the cleaning liquid source C2 is replaced with the chemical of the chemical source S, and the replacement with the chemical is performed until the particles are eliminated by the detection of the particle detector DD. Do. This is to ensure that the system can be restarted.

The switching of each valve is performed automatically, and the switching of the piping system and the replacement of the chemical liquid and the cleaning liquid are also performed automatically.

If the particles do not disappear due to the detection of the particle detector DD in the detection drain piping system d, the filter FA is replaced by a new one manually only here. Thereafter, as described above, cleaning is performed in the order of cleaning of the cleaning liquid source C1 with the cleaning liquid and cleaning of the cleaning liquid source C2 with the cleaning liquid so that particles in the chemical liquid piping system A of the pump PA and the filter FA are eliminated.

In this manner, the closed chemical pipe system A of the pump PA and the filter PA can be restarted at any time. In addition, the pump P
B, when the chemical liquid piping system B of the filter PB is closed by detecting particles, the pumps PA,
The chemical liquid piping system A of the filter PA is opened, and the chemical liquid can be continuously supplied to the substrate K.

When the particle level detected by the particle detector DN is small, the cleaning of the chemical piping systems A and B of the pump and the filter may be performed by replacing only the new chemical of the chemical source S.

In this manner, dust and bubbles accumulated in one piping system can be washed and removed simultaneously while operating the other piping system. Therefore, the operation of supplying the chemical solution to the substrate K can be performed continuously, and the operation rate of the apparatus does not decrease.

Further, since dust and bubbles in the chemical solution are detected and discharged, abnormalities in the resist pattern due to dust and bubbles can be prevented, and the work of regenerating the resist pattern and regenerating the pattern can be omitted.

FIG. 2 is a schematic diagram showing another embodiment of the drug supply device according to the present invention to which a filter is added.

In this embodiment, three-way valves 11, 12 and valves 13, 14 are attached to the downstream side of the pumps PA, PB of the chemical piping systems A, B of the above-mentioned drug supply device. Filter FB1, FB2
And the filters FA1 and FA2, and the filters FB1 and F2
This is a device that can switch B2.

For example, the filter FA of the chemical piping system A
Particles in the chemical in the chemical piping system A are not eliminated by the replacement cleaning of the cleaning liquid sources C1 and C2 with the cleaning liquid and the cleaning of the chemical itself of the chemical source S (filter F).
When A1 cannot be used), the filter FA1 is switched to the filter FA2, and the filter FA2 side of the chemical liquid piping system A is cleaned with the cleaning liquid of the cleaning liquid source C1, and then with the cleaning liquid of the cleaning liquid source C2. Lastly, the chemical solution itself of the chemical source S is washed.

On the other hand, during this time, the closed filter FA1 is replaced with a new one, and is prepared and set as a backup for the filter FA2.

When the filter FA2 of the chemical piping system A or the filters FB1 and FB2 of the chemical piping system B can no longer be used, the cleaning liquid is flown to the other filter side for cleaning. Clean the chemical solution itself, and replace the filter with a new one during that time.

Although two filters are provided in each of the chemical liquid piping systems A and B in parallel, two or more filters may be provided.

In this way, one filter is replaced with a new filter while the other filter of one chemical piping system is being cleaned, and maintenance cleaning of one chemical piping system with the cleaning liquid is continued without being temporarily stopped. Can be.

FIG. 3 shows another embodiment of the drug supply device according to the present invention to which a deaeration module is added.
FIG.

In this embodiment, a detection application piping system n provided with a deaeration module GN and a detection drain piping system provided with a deaeration module GD are provided on the downstream side of the chemical solution piping systems A and B of the drug supply device. This is the device to which d is connected.

According to such a configuration, the degassing module GN provided in the application pipe system n for detecting the dissolved gas in the chemical solution.
In this case, the abnormality of the resist pattern due to air bubbles can be eliminated, and the dissolved gas in the waste liquid for maintenance by the cleaning liquid can be removed by the degassing module GD provided in the detection drain piping system d to speed up the cleaning.

The deaeration module to be used is a hollow fiber membrane made of a material such as ethylene tetrafluoride resin and poly-4-methylpentene-1 and having gas-permeable and liquid-impermeable properties. By flowing a chemical solution inside the hollow fiber membrane and reducing the pressure on the outside, the dissolved gas is removed to the outside under the reduced pressure through the membrane. Conventionally, a deaeration module may be added between the chemical source S and the pump P. However, this configuration cannot deaerate bubbles generated in the piping system after the pump P.

[0066]

As described above, according to the present invention, when the particles in the chemical solution are detected by the particle detection mechanism (the function of the filter is reduced), one of the chemical solution piping systems of the chemical solution supply mechanism is closed and the other is closed. By opening the chemical liquid piping system, the cleaning liquid can be supplied to one closed chemical liquid piping system for cleaning, and the chemical liquid can be supplied to the substrate through the other opened chemical liquid piping system.

Therefore, the maintenance rate of the apparatus can be improved by maintaining one chemical liquid piping system with the cleaning liquid while supplying the chemical liquid with the other chemical liquid piping system.

Also, one of the chemical liquid piping systems of the chemical liquid supply mechanism is closed, and the cleaning liquid is suctioned from the cleaning mechanism to the chemical liquid piping system with the pump of the one of the closed chemical liquid piping systems for cleaning, and particles are removed. Since one of the chemical liquid piping systems can be automatically cleaned and maintained, work efficiency is improved.

Further, according to the present invention, when one of the filters of one chemical solution piping system is unusable, one of the filters can be closed and the cleaning solution can be passed through the other filter, and during that time, the unusable filter cannot be used. The filter can be replaced with a new one so that it can be restarted at any time.

Further, since particles in the chemical solution can be detected by the particle detector and a chemical solution without particles can be supplied to the substrate from the nozzle, abnormalities in the resist pattern due to dust and bubbles can be prevented.

Further, according to the present invention, bubbles in the chemical solution or the waste liquid are degassed by degassing treatment mechanisms provided respectively in the detection coating piping system and the detection drain piping system. Therefore, on the one hand, a chemical solution without air bubbles can be supplied to the substrate, and on the other hand, the air bubbles in the maintenance waste liquid can be removed by the cleaning liquid to accelerate the cleaning.

[Brief description of the drawings]

FIG. 1 is a schematic view of an embodiment of a chemical solution supply device according to the present invention.

FIG. 2 is a schematic diagram of another embodiment of the chemical liquid supply device according to the present invention.

FIG. 3 is a schematic diagram of another embodiment of the chemical liquid supply device according to the present invention.

FIG. 4 is a schematic diagram of a conventional chemical liquid supply device.

[Explanation of symbols]

A, B: Chemical solution piping system, C: Cleaning solution piping system, n: Detection application piping system, d: Detection drain piping system, S: Chemical solution source, P
A, PB: Pump, FA, FB, FA1, FA2, FB
1, FB2: filter, DN, DD: particle detector, N: nozzle, D1: cup drain, D2: waste liquid drain, K: substrate, GN, GD: dehydration processing module.

Claims (6)

[Claims] A chemical solution supply mechanism having two chemical solution piping systems for supplying a chemical solution to a substrate side; a cleaning mechanism connected to an upstream side of the chemical solution supply mechanism for cleaning the chemical solution supply mechanism with a cleaning solution; A chemical liquid supply device, comprising: a particle detection mechanism connected downstream of the chemical liquid supply mechanism to detect particles of the chemical liquid and the waste liquid and supply the liquid chemical to the substrate. 2. The chemical liquid supply mechanism according to claim 1, wherein the chemical liquid supply mechanism comprises two chemical liquid piping systems provided with a pump for sucking a chemical liquid from a chemical liquid source and a filter for catching dust in the chemical liquid. Chemical supply device. 3. The chemical solution supply mechanism comprises two systems of chemical solution piping systems provided with a pump for sucking a chemical solution from a chemical solution source and two switchable parallel-connected filters for capturing dust in the chemical solution. The chemical solution supply device according to claim 1, wherein: 4. The chemical liquid supply device according to claim 1, wherein the cleaning mechanism includes two switchable cleaning liquid sources connected in parallel. 5. A particle detection mechanism, comprising: a detection application piping system provided with a particle detector for detecting particles in a chemical solution and a nozzle for applying a chemical solution to a substrate; and a particle for detecting particles in a waste liquid for maintenance using a cleaning liquid. The chemical liquid supply device according to claim 1, comprising a detector and a detection drain piping system provided with a waste liquid drain for discharging the waste liquid. 6. A detection coating system comprising: a degassing processing module for degassing bubbles in a chemical solution; a particle detector for detecting particles; and a nozzle for coating a chemical solution on a substrate; 2. The drainage system according to claim 1, further comprising a degassing module for degassing bubbles in the waste liquid for maintenance, a particle detector for detecting particles, and a detection drain piping system having a drain for discharging waste liquid. Chemical supply device.