TWI220013B - Conveying apparatus - Google Patents

Conveying apparatus Download PDF

Info

Publication number
TWI220013B
TWI220013B TW92117363A TW92117363A TWI220013B TW I220013 B TWI220013 B TW I220013B TW 92117363 A TW92117363 A TW 92117363A TW 92117363 A TW92117363 A TW 92117363A TW I220013 B TWI220013 B TW I220013B
Authority
TW
Taiwan
Prior art keywords
rollers
patent application
scope
item
roller
Prior art date
Application number
TW92117363A
Other languages
Chinese (zh)
Other versions
TW200500281A (en
Inventor
Kuo-Bin Lee
Hou-Yen Shiau
Chung-Kang Hsieh
Gui-Dong Huang
Original Assignee
Au Optronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Au Optronics Corp filed Critical Au Optronics Corp
Priority to TW92117363A priority Critical patent/TWI220013B/en
Application granted granted Critical
Publication of TWI220013B publication Critical patent/TWI220013B/en
Publication of TW200500281A publication Critical patent/TW200500281A/en

Links

Abstract

A conveying apparatus for conveying a substrate along a conveying route. The conveying apparatus comprises a plurality of first axles, a plurality of first rollers, a plurality of second axles and a plurality of second rollers. The first rollers are respectively disposed on the first rollers along the conveying route. The first roller has a roller surface and the roller surface contact with the bottom of the substrate. The second rollers are respectively disposed on the second rollers along the conveying route. Each of the second rollers locates between two first rollers. The second roller has a roller surface and the roller surface contact with the side of the substrate for conveying a substrate along the conveying route.

Description

1220013 五、發明說明(l) 【發明所屬之技術領域】 本發明是有關於一種傳送機構,且特別是有關於一種 適於傳送一矩形基板沿一傳送路徑移動,並能有效避免傳· 送過程中造成矩形基板邊緣破損的傳送機構。 【先前技術】 針對多媒體社會之急速進步,多半受惠於半導體元件 或人機顯示裝置的飛躍性進步。就顯示器而言,陰極射線 管(Cathode Ray Tube ,CRT)因具有優異的顯示品質與 其經濟性,一直獨佔近年來的顯示器市場。然而,對於個 人在桌上操作多數終端機/顯示器裝置的環境,或是以環 保的觀點切入,若以節省能源的潮流加以預測,陰極射線 管因空間利用以及能源消耗上仍存在很多問題,而對於 _ 輕、薄、短、小以及低消耗功率的需求無法有效提供解決 之道。因此,具有高畫質、空間利用效率佳、低消耗功 率、無輻射等優越特性之液晶顯示器(L C D )已逐漸成為 市場之主流。 液晶顯不器主要係由兩玻璃基板以及^一液晶層所構 成,其中玻璃基板通常需送入一濕式處理設備中進行一濕 式處理製程,例如在玻璃基板上喷灑一反應液體液體(如 蝕刻液或移除光阻之剝除液),以在玻璃基板上製作圖案 化線路,之後並經過一清洗液(如去離子水或有機溶液) 的清洗再進行後續的製程。值得注意的是,玻璃基板在> 行上述濕式處理的過程中,係藉由一傳送機構而達到傳送胃 玻璃基板的目的。1220013 V. Description of the invention (l) [Technical field to which the invention belongs] The present invention relates to a transfer mechanism, and more particularly, to a transfer mechanism suitable for transferring a rectangular substrate along a transfer path, and can effectively avoid the transfer and transfer process. A transfer mechanism that causes the edges of rectangular substrates to be damaged. [Previous Technology] In response to the rapid progress of the multimedia society, most of them benefit from the leaps and bounds of semiconductor components or human-machine display devices. As far as displays are concerned, cathode ray tubes (CRT) have always dominated the display market in recent years because of their excellent display quality and economy. However, for the environment where individuals operate most terminals / display devices on the table, or from the perspective of environmental protection, if the trend of energy saving is predicted, there are still many problems in cathode ray tubes due to space utilization and energy consumption. The need for _ light, thin, short, small, and low power consumption does not effectively provide a solution. Therefore, liquid crystal displays (LCD) with superior characteristics such as high picture quality, good space utilization efficiency, low power consumption, and no radiation have gradually become the mainstream of the market. The liquid crystal display is mainly composed of two glass substrates and a liquid crystal layer. The glass substrate usually needs to be sent to a wet processing equipment for a wet processing process, such as spraying a reaction liquid on the glass substrate ( (Such as etching solution or stripping solution to remove photoresist) to make patterned circuits on the glass substrate, and then go through a cleaning solution (such as deionized water or organic solution) before performing subsequent processes. It is worth noting that, during the above-mentioned wet processing of the glass substrate, the purpose of transferring the gastric glass substrate is achieved by a transfer mechanism.

11086rwf.ptd 第8頁 1220013 五、發明說明(2) 第1 A圖是繪示習知傳送機構的側面示意圖,而第1 B圖 是繪示習知傳送機構的正面示意圖。請同時參照第1 A圖及 第1 B圖,習知傳送機構1 0 0主要係由多個第一轉軸1 1 〇 、多· 個第一滾輪1 2 0 、多個第二轉轴1 3 0以及多個第二滾輪1 4 0 所構成。其中第一滾輪1 2 0配置於第一轉軸1 1 0之兩端,且 第一滾輪1 2 0具有一滾輪部1 2 2及一導引部1 2 4 ,滾輪部1 2 2 具有一滾輪面1 2 2 a,用以承靠一矩形基板1 0 (例如是一矩 形之玻璃基板)的底緣,而導引部1 2 4具有一朝向滾輪面 1 2 2 a傾斜之導引斜面1 2 4 a。值得注意的是,第一滾輪1 2 0 通常是主動滾輪,並藉著矩形基板1 0本身的重力以及第一 滾輪1 2 0轉動時與矩形基板1 0間產生之摩擦力,使第一滾 輪1 2 0可推動矩形基板1 0往一傳送路徑行進。 胃 此外,第二滾輪1 4 0配置於第二轉軸1 3 0上,且第二滾 輪1 4 0對應於第一滾輪1 2 0之上方。第二滾輪1 4 0具有一滾 輪面1 4 0 a,此滾輪面1 4 0 a用以壓制矩形基板1 0之頂緣。換 句話說,藉由第一滾輪1 2 0及第二滾輪1 4 0夾持矩形基板1 0 並進而推動矩形基板1 0,使矩形基板1 0沿著傳送路徑移動 時能更為穩固。11086rwf.ptd Page 8 1220013 V. Description of the invention (2) Figure 1 A is a schematic side view of a conventional transmission mechanism, and Figure 1 B is a schematic front view of a conventional transmission mechanism. Please refer to FIG. 1A and FIG. 1B at the same time. The conventional transmission mechanism 1 0 0 is mainly composed of a plurality of first rotating shafts 1 1 0, a plurality of first rollers 1 2 0, and a plurality of second rotating shafts 1 3 0 and a plurality of second rollers 1 40. The first roller 1 2 0 is disposed at both ends of the first rotating shaft 1 1 0, and the first roller 1 2 0 has a roller portion 1 2 2 and a guide portion 1 2 4, and the roller portion 1 2 2 has a roller The surface 1 2 2 a is used to bear the bottom edge of a rectangular substrate 10 (for example, a rectangular glass substrate), and the guide portion 1 2 4 has a guide inclined surface 1 inclined toward the roller surface 1 2 2 a. 2 4 a. It is worth noting that the first roller 1 2 0 is usually an active roller, and the first roller 1 is driven by the gravity of the rectangular substrate 10 and the frictional force generated between the first roller 12 and the rectangular substrate 10 when rotating. 1 2 0 can push the rectangular substrate 10 to a transport path. Stomach In addition, the second roller 1 40 is disposed on the second rotating shaft 130, and the second roller 1 40 corresponds to the top of the first roller 120. The second roller 1 40 has a roller surface 14 0 a, and the roller surface 1 4 0 a is used to press the top edge of the rectangular substrate 10. In other words, the first substrate 120 and the second roller 140 hold the rectangular substrate 10 and further push the rectangular substrate 10 to make the rectangular substrate 10 more stable as it moves along the conveying path.

2P 第2 A圖及第2 B圖是繪示習知傳送機構造成矩形基板偏 移傳送的俯視示意圖。在此處為了明顯表現矩形基板1 0的 偏移情形,進而將上述所揭露之第二轉軸1 3 0及第二滾輪 140省略,請同時參照第2A圖及第2B圖,由於第一滾輪1 並未完全固定於第一轉軸110上,故第一滾輪120在傳送 形基板1 0時,會發生向内(如第2 A圖)或向外(如第2 B圖2P FIG. 2A and FIG. 2B are schematic plan views illustrating the offset transfer of a rectangular substrate caused by a conventional transfer mechanism. Here, in order to clearly show the deviation of the rectangular substrate 10, the second rotating shaft 130 and the second roller 140 disclosed above are omitted. Please refer to FIG. 2A and FIG. 2B at the same time. It is not completely fixed on the first rotating shaft 110, so when the first roller 120 is conveying the shaped substrate 10, it will turn inward (as shown in FIG. 2A) or outward (as shown in FIG. 2B).

11086r.wf.ptd 第9頁 1220013 五、發明說明(3) )偏移的現象,如此矩形基板1 〇則會因被擠壓或接觸不良 而發生矩形基板1 0偏移的現象。換言之,矩形基板1 〇發生 偏移的現象時,會隨著第一滾輪1 2 0滾動而使矩形基板1 〇 . 順勢沿著導引斜面1 2 4 a上滑,導致矩形基板1 〇傳送路徑完 全偏向一側,而無法沿著原本設定的傳送路徑移動。 第3圖是繪示習知傳送機構造成矩形基板破片的示意 圖。請參閱第3圖所示,矩形基板1 0受到擠壓或接觸不良 係會順勢沿著導引斜面1 2 4 a上滑,而當發生較大偏移量 時,矩形基板1 0容易受到第一滾輪1 2 0及第二滾輪1 4 0所產 生之力矩效應(即挾持力道)直接破壞矩形基板1 0的邊 緣,造成不同程度的破片情形,嚴重影響產品的品質與安 全。 【發明内容】 因此,本發明的目的就是在提供一種傳送機構,係藉 由在對應於矩形基板之側壁處配置具有導正功能之滾輪, 以有效將矩形基板保持於一傳送路徑上,並避免傳送過程 中造成矩形基板的邊緣破損。 本發明的目的另一目的是提供一種濕式處理設備,係 於濕式處理設備内配置上述之傳送機構,用以傳送矩形基 板,以便於進行一濕式處理製程。 基於上述目的,本發明提出一種傳送機構,適於傳送 至少一矩形基板沿著一傳送路徑移動,此傳送機構主要係g 由多個第一轉軸、多個第一滾輪、多個第二轉軸以及多個 第二滾輪所構成。第一滾輪配置於第一轉軸上,且沿著傳11086r.wf.ptd Page 9 1220013 V. Description of the invention (3)) The phenomenon of shifting of the rectangular substrate 10 will cause the rectangular substrate 10 to shift due to squeezing or poor contact. In other words, when the rectangular substrate 10 is shifted, the rectangular substrate 1 will be rolled along with the first roller 1 2 0. It will slide along the guide slope 1 2 4 a, resulting in a rectangular substrate 1 0 conveying path. Fully deviate to one side and cannot move along the originally set transmission path. Fig. 3 is a schematic view showing a rectangular substrate broken by a conventional transfer mechanism. Please refer to FIG. 3, if the rectangular substrate 10 is squeezed or has poor contact, it will slide along the guide slope 1 2 4 a. However, when a large offset occurs, the rectangular substrate 10 is susceptible to The moment effect (ie, the holding force) produced by the one roller 12 and the second roller 140 is directly damaging the edge of the rectangular substrate 10, causing different degrees of fragmentation, which seriously affects the quality and safety of the product. [Summary of the Invention] Therefore, an object of the present invention is to provide a conveying mechanism by arranging a roller having a guiding function on a side wall corresponding to a rectangular substrate, so as to effectively maintain the rectangular substrate on a conveying path and avoid The edges of the rectangular substrate were damaged during the transfer. Another object of the present invention is to provide a wet processing equipment, which is provided with the above-mentioned transfer mechanism in the wet processing equipment for transferring a rectangular substrate to facilitate a wet processing process. Based on the above objectives, the present invention provides a transfer mechanism adapted to transfer at least one rectangular substrate along a transfer path. The transfer mechanism is mainly composed of a plurality of first rotating shafts, a plurality of first rollers, a plurality of second rotating shafts, and A plurality of second rollers. The first roller is disposed on the first rotating shaft, and

I1086twt\ptd 第10頁 1220013 五、發明說明(4) 送路徑排列,第一滾輪具有一滾輪面,係與矩形基板之底 緣接觸。第二滾輪配置於第二轉軸上,並沿著傳送路徑排‘ 列,且位於任意兩相鄰之第一滾輪之間。第二滾輪具有一. 滾輪面係與推頂矩形基板之側壁接觸,以使矩形基板能保 持沿著傳送路徑移動。 基於上述目的,本發明另提出一種濕式處理設備,適 於對至少一矩形基板進行一濕式處理製程,此濕式處理設 備主要係由一處理室、上述所提及之傳送機構、一反應液 體供給裝置以及一清洗液供給裝置所構成。其中,處理室 具有至少一輸入端及至少一輸出端,而傳送機構配置於此 處理室内。反應液體供給裝置係配置鄰近於輸入端,且位 於矩形基板的上方,此反應液體供給裝置適於喷射一反應籲 液體於矩形基板之頂面。清洗液供給裝置係配置於反應液 體供給裝置及輸出端之間,且位於矩形基板的上方,此清 洗液供給裝置適於喷射一清洗液於矩形基板之頂面,以將 矩形基板上之反應液體洗除。 在發明之較佳實施例中,其可進一步於第一滾輪之滾 輪面上配置一第一環狀彈性構件,以避免矩形基板之底緣 直接與此滾輪面接觸而刮傷矩形基板。此外,上述之第二 滾輪例如是位於每兩相鄰之第一滾輪之間,而與第一滾輪 呈交錯的排列。另外,第一滾輪例如全部是主動滾輪,或 一部分是主動滾輪,另一部分是被動滾輪,而第二滾輪例g 如全部是主動滾輪或被動滾輪,或一部分是主動滾輪,另 一部分是被動滾輪。I1086twt \ ptd Page 10 1220013 V. Description of the invention (4) The feed path is arranged. The first roller has a roller surface that is in contact with the bottom edge of the rectangular substrate. The second rollers are arranged on the second rotating shaft, are arranged in a line along the transmission path, and are located between any two adjacent first rollers. The second roller has a roller surface contacting the side wall of the ejected rectangular substrate so that the rectangular substrate can keep moving along the conveying path. Based on the above purpose, the present invention further provides a wet processing equipment, which is suitable for performing a wet processing process on at least one rectangular substrate. The wet processing equipment is mainly composed of a processing chamber, the aforementioned transfer mechanism, and a reaction. A liquid supply device and a cleaning liquid supply device. The processing chamber has at least one input end and at least one output end, and the transmission mechanism is disposed in the processing chamber. The reaction liquid supply device is arranged adjacent to the input end and above the rectangular substrate. This reaction liquid supply device is adapted to spray a reaction liquid on the top surface of the rectangular substrate. The cleaning liquid supply device is arranged between the reaction liquid supply device and the output end, and is located above the rectangular substrate. This cleaning liquid supply device is suitable for spraying a cleaning liquid on the top surface of the rectangular substrate to transfer the reaction liquid on the rectangular substrate. Wash off. In a preferred embodiment of the invention, a first annular elastic member may be further disposed on the roller surface of the first roller to prevent the bottom edge of the rectangular substrate from directly contacting the roller surface and scratching the rectangular substrate. In addition, the above-mentioned second rollers are, for example, located between every two adjacent first rollers, and are staggered with the first rollers. In addition, the first rollers are, for example, all active rollers, or some are active rollers, the other are passive rollers, and the second rollers are all active or passive rollers, or some are active rollers, and the other are passive rollers.

I I086t.wf.ptd 第11頁 1220013 五、發明說明(5) 在發明之另一較佳實施例中,第一滾輪另包括一滾輪 部及一導引部。其中滾輪部具有上述之滾輪面,而導引部, 係與滾輪部連接,且導引部具有一朝向此滾輪部傾斜之引 導斜面,用以引導些微的偏移之矩形基板,由此引導斜面 滑回滾輪面上。 在發明之另一較佳實施例甲,傳送機構另包括多個第 三轉軸及多個第三滾輪,第三滾輪配置於第三轉軸上,並 沿著傳送路徑排列,且位於第一滾輪之上方,其中第三滾 輪具有一滾輪面,係與矩形基板之頂緣接觸。此外,其可 進一步於第三滾輪之滾輪面上配置一第二環狀彈性構件, 以避免矩形基板之頂緣直接與此滾輪面接觸而刮傷矩形基 板。另外,第三滾輪例如全部是主動滾輪或被動滾輪,或φ 一部分是主動滾輪,另一部分是被動滾輪。 在發明之另一較佳實施例中,濕式處理設備另包括一 氣體供應裝置,其中氣體供應裝置係配置於反應液體供給 裝置及清洗液供給裝置之間,且位於矩形基板的上方,此 氣體供給裝置適於喷射一氣體於矩形基板之頂面,以將矩 形基板上之反應液體吹除。此外,濕式處理設備之處理室 例如是一 U型處理室,用以節省整體的使用空間。 本發明之傳送機構因在對應於矩形基板之側壁處配置 具有導正功能之滾輪,使矩形基板在傳送過程中若發生偏 移時,能藉由具有導正功能之滾輪推頂矩形基板之側壁, 以有效將矩形基板保持於既定的傳送路徑上,並可避免彳# 送過程中造成矩形基板的邊緣破損之情形發生。此外,將I I086t.wf.ptd Page 11 1220013 V. Description of the Invention (5) In another preferred embodiment of the invention, the first roller further includes a roller portion and a guide portion. The roller portion has the above-mentioned roller surface, and the guide portion is connected to the roller portion, and the guide portion has a guide inclined surface inclined toward the roller portion to guide a slightly offset rectangular substrate, thereby guiding the inclined surface. Slide back on the roller surface. In another preferred embodiment of the invention A, the transmission mechanism further includes a plurality of third rotation shafts and a plurality of third rollers. The third rollers are arranged on the third rotation shaft and arranged along the transmission path, and are located on the first rollers. Above, the third roller has a roller surface that is in contact with the top edge of the rectangular substrate. In addition, a second ring-shaped elastic member may be further disposed on the roller surface of the third roller to prevent the top edge of the rectangular substrate from directly contacting this roller surface and scratching the rectangular substrate. In addition, the third roller is, for example, all of an active roller or a passive roller, or a part of φ is an active roller and the other is a passive roller. In another preferred embodiment of the invention, the wet processing equipment further includes a gas supply device, wherein the gas supply device is disposed between the reaction liquid supply device and the cleaning liquid supply device and is located above the rectangular substrate. The supply device is adapted to spray a gas on the top surface of the rectangular substrate to blow out the reaction liquid on the rectangular substrate. In addition, the processing room of the wet processing equipment is, for example, a U-shaped processing room to save the overall use space. Because the conveying mechanism of the present invention is provided with a roller having a guiding function at a side wall corresponding to the rectangular substrate, if the rectangular substrate is displaced during the conveying process, the side wall of the rectangular substrate can be pushed up by a roller having a guiding function. In order to effectively keep the rectangular substrate on the predetermined conveying path, and avoid the situation that the edge of the rectangular substrate is damaged during the feeding process. In addition,

11086twf.ptd 第12頁 1220013 五、發明說明(6) 此傳送機構運用於一濕式處理設備中來傳送矩形基板,可 便於進行一濕式處理製程。 為讓本發明之上述和其他目的、特徵和優點能更明顯 易懂,下文特舉一較佳實施例,並配合所附圖式,作詳細 說明如下。 【實施方式】 第4圖是繪示本發明一較佳實施例之濕式處理設備之 配置示意圖。請參閱第4圖,濕式處理設備2 0 0 ,適於對至 少一矩形基板2 0 (例如是一矩形之玻璃基板)進行一濕式 處理製程,此濕式處理設備2 0 0主要係由一處理室2 1 0 、一 反應液體供給裝置2 2 0、一清洗液供給裝置2 3 0以及一傳4 機構(本圖未示)所構成。其中,處理室2 1 0具有至少一 ® 輸入端2 1 2及至少一輸出端2 1 4,且處理室2 1 0例如是一 U型 處理室,用以節省整體的使用空間。反應液體供給裝置 2 2 0係配置鄰近於輸入端2 1 2,且位於矩形基板2 0的上方, 此反應液體供給裝置2 2 0適於喷射一酸液(如蝕刻液或移 除光阻之剝除液)於矩形基板2 0之頂面,以在矩形基板2 ◦ 上製作圖案化線路。清洗液供給裝置2 3 0係配置於反應液 體供給裝置2 2 0及輸出端2 1 4之間,且位於矩形基板2 0的上 方,此清洗液供給裝置2 3 0適於喷射一清洗液(如去離子 水或有機溶液)於矩形基板2 0之頂面,以將矩形基板2 0上 之反應液體洗除。 此外,濕式處理設備2 0 0另包括一氣體供應裝置2 4 0 , 係配置於反應液體供給裝置2 2 0及清洗液供給裝置2 3 0之11086twf.ptd Page 12 1220013 V. Description of the invention (6) This transfer mechanism is used in a wet processing equipment to transfer rectangular substrates, which can facilitate a wet processing process. In order to make the above and other objects, features, and advantages of the present invention more comprehensible, a preferred embodiment is given below and described in detail with reference to the accompanying drawings. [Embodiment] Fig. 4 is a schematic diagram showing the configuration of a wet processing equipment according to a preferred embodiment of the present invention. Referring to FIG. 4, the wet processing equipment 2 0 0 is suitable for performing a wet processing process on at least one rectangular substrate 20 (for example, a rectangular glass substrate). The wet processing equipment 2 0 0 is mainly composed of A processing chamber 2 1 0, a reaction liquid supply device 2 2 0, a cleaning liquid supply device 2 3 0, and a transmission 4 mechanism (not shown in the figure) are constituted. The processing chamber 2 10 has at least one ® input terminal 2 12 and at least one output terminal 2 1 4, and the processing chamber 2 10 is, for example, a U-shaped processing chamber to save the overall use space. The reaction liquid supply device 2 2 0 is arranged adjacent to the input terminal 2 1 2 and is located above the rectangular substrate 20. The reaction liquid supply device 2 2 0 is suitable for spraying an acid solution (such as an etching solution or removing photoresist). Stripping solution) on the top surface of the rectangular substrate 20 to make a patterned circuit on the rectangular substrate 2 ◦. The cleaning liquid supply device 2 30 is disposed between the reaction liquid supply device 2 2 0 and the output terminal 2 1 4 and is located above the rectangular substrate 20. The cleaning liquid supply device 2 3 0 is suitable for spraying a cleaning liquid ( Such as deionized water or organic solution) on the top surface of the rectangular substrate 20 to wash away the reaction liquid on the rectangular substrate 20. In addition, the wet processing equipment 2000 also includes a gas supply device 2 40, which is arranged in the reaction liquid supply device 2 2 0 and the cleaning liquid supply device 2 3 0

11086twf·ptd 第13頁 1220013 五、發明說明(7) 間,且位於於矩形基板2 0的上方,此氣體供應裝置2 4 0適 於喷射一氣體於矩形基板2 0之頂面,以將矩形基板2 0上之' 部分反應液體吹除,並使後續的清洗動作更為簡便。 _ 傳送機構係配置於此處理室2 1 0内,其主要之功能係 用以水平傳送矩形基板2 0以進行上述之濕式處理製程,而 傳送機構之結構將於下文中詳細說明。 第5 A圖是繪示本發明之一較佳實施例之傳送機構的側 面示意圖,而第5 B圖是繪示本發明之一較佳實施例之傳送 機構的俯視示意圖。請參閱第5 A圖及第5 B圖。傳送機構 3 0 0適於傳送至少一矩形基板2 0沿著一傳送路徑A移動,此 傳送機構3 0 0主要係由多個第一轉軸3 1 0 、多個第一滾輪 3 2 0、多個第二轉軸3 3 0以及多個第二滾輪3 4 0所構成。其籲 中第一滾輪3 2 0配置於第一轉軸3 1 0上,並沿著傳送路徑A 棑列。第二滾輪3 4 0配置於第二轉軸3 3 0上,並沿著傳送路 徑A排列,且位於任意兩相鄰之第一滾輪3 2 0之間。以第5 A 圖及第5 B圖為例第二滾輪3 4 0例如是位於每兩相鄰之第一 滾輪3 2 0之間,而與第一滾輪3 2 0呈交錯的排列。此外,第 二滾輪3 4 0具有一滾輪面3 4 0 a,此滾輪面3 4 0 a係與矩形基 板2 0之側壁接觸。另外,第一滾輪3 2 0例如全部是主動滾 輪,或一部分是主動滾輪,另一部分是被動滾輪,而第二 滾輪3 4 0例如全部是主動滾輪或被動滾輪,或一部分是主 動滾輪,另一部分是被動滾輪。 _ 第6 A圖是繪示本發明之一較佳實施例之傳送機構的正® 面示意圖。第一滾輪3 2 0係為一外徑相等之滾輪,其具有11086twf · ptd Page 13 1220013 V. Description of the invention (7) and located above the rectangular substrate 20, this gas supply device 2 4 0 is suitable for injecting a gas on the top surface of the rectangular substrate 20 to convert the rectangle Part of the reaction liquid on the substrate 20 is blown out, which makes subsequent cleaning operations easier. _ The conveying mechanism is arranged in this processing chamber 210, and its main function is to horizontally convey the rectangular substrate 20 to perform the above-mentioned wet processing process. The structure of the conveying mechanism will be explained in detail below. Fig. 5A is a schematic side view showing a conveying mechanism according to a preferred embodiment of the present invention, and Fig. 5B is a schematic top view showing a conveying mechanism according to a preferred embodiment of the present invention. See Figures 5 A and 5 B. The transfer mechanism 3 0 0 is adapted to transfer at least one rectangular substrate 20 along a transfer path A. The transfer mechanism 3 0 0 is mainly composed of a plurality of first rotating shafts 3 1 0, a plurality of first rollers 3 2 0, a plurality of A plurality of second rotating shafts 3 3 0 and a plurality of second rollers 3 4 0 are formed. Among them, the first roller 3 2 0 is arranged on the first rotating shaft 3 1 0 and is aligned along the conveying path A. The second roller 3 4 0 is disposed on the second rotating shaft 3 3 0 and is arranged along the conveying path A and is located between any two adjacent first rollers 3 2 0. Taking Figure 5A and Figure 5B as an example, the second roller 3 4 0 is, for example, located between every two adjacent first rollers 3 2 0 and is staggered with the first roller 3 2 0. In addition, the second roller 3 4 0 has a roller surface 3 4 0 a, and the roller surface 3 4 0 a is in contact with the side wall of the rectangular base plate 20. In addition, the first roller 3 2 0 is, for example, all active rollers, or a part is an active roller, the other part is a passive roller, and the second roller 3 4 0, for example, is all active rollers or a passive roller, or a part is an active roller, and the other part It is a passive scroll wheel. _ Figure 6 A is a schematic front view of a conveying mechanism according to a preferred embodiment of the present invention. The first roller 3 2 0 is a roller with the same outer diameter.

11086t\vf. ptd 第14頁 1220013 五、發明說明(8) 一滾輪面3 2 0 a,此滾輪面3 2 0係與矩形基板2 0之底緣接 觸,而此滾輪面3 2 0 a上更可進一步套設一第一環狀彈性構 件3 2 0 b,以避免矩形基板2 0之底緣直接與滾輪面3 2 0 a接觸 而刮傷矩形基板2 0。此外,本發明之傳送機構3 0 0另可配 置多個第三轉軸3 5 0及多個第三滾輪3 6 0 ,第三滾輪3 6 0係 配置於第三轉軸3 5 0上,並沿著傳送路徑A排列,且位於第 一滾輪3 2 0上方。第三滾輪3 6 0具有一滾輪面3 6 0 a,係與矩 形基板20之頂緣接觸,藉由第一滾輪3 2 0及第三滾輪3 6 0夾 持矩形基板2 0並進而推動矩形基板2 0,使矩形基板2 Q於傳 送時更為穩固。另外,第三滾輪3 6 0之滾輪面3 6 0 a上可進 一步套設一第二環狀彈性構件3 6 0 b,以避免矩形基板2 0之 頂緣直接與滾輪面接觸3 6 0 a而刮傷矩形基板2 0。當然,本· 實施例並不限定配置上述之第三轉軸3 5 0及第三滾輪3 6 0 , 因為矩形基板2 0本身的重量以及進行濕式處理時所喷灑之 液體的重量,以使得矩形基板2 0與滾輪面3 2 0 a上之第一環 狀彈性構件3 2 0 b間有足夠的摩擦力,足以帶動矩形基板 2 0。值得注意的是,由於在對應於矩形基板2 0之側壁處配 置具有導正功能之第二滾輪3 4 0,使矩形基板20在傳送過 程中發生些微的偏移現象時,能藉由此第二滾輪3 4 0之滾 輪面3 4 0 a推頂矩形基板2 0之側壁,以有效將矩形基板2 0保 持於既定之傳送路徑A上。此外,用以傳送矩形基板2 0之 第一滾輪3 1 0因設計為外徑相同之滾輪,當第一滾輪3 1 0與 第三滾輪3 6 0共同挾持矩形基板2 0時,能避免習知在傳送® 過程中造成矩形基板2 0的邊緣破損之情形發生。11086t \ vf. Ptd Page 14 1220013 V. Description of the invention (8) A roller surface 3 2 0 a, the roller surface 3 2 0 is in contact with the bottom edge of the rectangular substrate 20, and the roller surface 3 2 0 a A first ring-shaped elastic member 3 2 0 b can be further sleeved to prevent the bottom edge of the rectangular substrate 20 from directly contacting the roller surface 3 2 0 a and scratching the rectangular substrate 20. In addition, the transmission mechanism 3 0 of the present invention may be further provided with a plurality of third rotating shafts 3 50 and a plurality of third rollers 3 6 0. The third roller 3 6 0 is disposed on the third rotating shaft 3 5 0 and It is arranged along the conveying path A and is located above the first roller 3 2 0. The third roller 3 6 0 has a roller surface 3 6 0 a, which is in contact with the top edge of the rectangular substrate 20. The first roller 3 2 0 and the third roller 3 6 0 hold the rectangular substrate 20 and push the rectangle. The substrate 20 makes the rectangular substrate 2 Q more stable during transportation. In addition, a second annular elastic member 3 6 0 b can be further set on the roller surface 3 6 0 a of the third roller 3 6 0 to avoid the top edge of the rectangular substrate 20 from directly contacting the roller surface 3 6 0 a The rectangular substrate 20 was scratched. Of course, this embodiment does not limit the configuration of the third rotating shaft 3 50 and the third roller 3 6 0 described above, because the weight of the rectangular substrate 20 itself and the weight of the liquid sprayed during wet processing are such that There is sufficient friction between the rectangular substrate 20 and the first annular elastic member 3 2 0 b on the roller surface 3 2 0 a, which is enough to drive the rectangular substrate 20. It is worth noting that, because the second roller 3 4 0 with the guiding function is arranged on the side wall corresponding to the rectangular substrate 20, when the rectangular substrate 20 slightly shifts during the transportation process, the first The roller surface 3 4 a of the two rollers 3 4 0 a pushes the side wall of the rectangular substrate 20 to effectively maintain the rectangular substrate 20 on the predetermined conveying path A. In addition, the first roller 3 1 0 for conveying the rectangular substrate 20 is designed as a roller with the same outer diameter. When the first roller 3 1 0 and the third roller 3 6 0 jointly hold the rectangular substrate 20, it is possible to avoid habituation. It is known that the edge of the rectangular substrate 20 was damaged during the transfer process.

11086twf.pt.cl 第15頁 1220013 五、發明說明(9) 第6 B圖是繪示本發明之另一較佳實施例之傳送機構的 正面示意圖。本圖所揭示之傳送機構的主要結構大致與前 述之實施例相同,其相同處即不贅述,而不同處為前述之-第一滾輪3 2 0沿用習知之滾輪,第一滾輪3 2 0具有一滾輪部 3 2 2及一導引部3 2 4,其中滾輪部3 2 2與導引部3 2 4連接。滾 輪部3 2 2具有一滾輪面3 2 2 a,係與矩形基板2 0之底緣接 觸,而導引部3 2 4具有一朝向面傾斜之導引斜面3 2 4a ,用 以導引些微偏移之矩形基板2 0由此導引斜面3 2 4 a下滑至滾 輪面3 2 2 a上。值得注意的是,以應力的觀點觀之,當矩形 基板2 0發生微偏移而滑上導引斜面3 2 4 a時,若矩形基板2 0 對第一滾輪3 2 0所產生之橫向應力Fgt大於矩形基板20側向 擠壓力Fr,矩形基板20可藉由本身之重力Fg由導引斜面 _ 3 2 4 a上自動下滑至滾輪面3 2 2 a上,反之若矩形基板2 0對第 一滾輪3 2 0所產生之橫向應力Fgt小於矩形基板20側向擠壓 力F r,矩形基板2 0會受此橫向應力F g t的推擠繼續向導引 斜面3 2 4a偏移,當橫向應力Fgt超過矩形基板20之重力Fg 的臨界點B時,矩形基板2 0則無法再滑回滾輪面3 2 2 a上, 而容易受到第一滾輪3 2 0及第三滾輪3 6 0所產生之力矩效應 (即挾持力道)直接破壞矩形基板2 0的邊緣,故從上可得 知,導引斜面324a是習知技術中造成矩形基板2 0破片的主 要因素之一。 此外,若將本發明之第二滾輪3 4 0同樣配置於任意兩g 相鄰之第一滾輪3 2 0之間的位置上,則當矩形基板2 0之兩 側尚未超過上述之臨界點B時,即受到第二滾輪3 4 0之滾輪11086twf.pt.cl Page 15 1220013 V. Description of the Invention (9) Figure 6B is a schematic front view of a transmission mechanism according to another preferred embodiment of the present invention. The main structure of the conveying mechanism disclosed in this figure is substantially the same as the previous embodiment, and the same points are not repeated, and the differences are the same as above. The first roller 3 2 0 follows the conventional roller, and the first roller 3 2 0 has A roller portion 3 2 2 and a guide portion 3 2 4, wherein the roller portion 3 2 2 is connected to the guide portion 3 2 4. The roller portion 3 2 2 has a roller surface 3 2 2 a, which is in contact with the bottom edge of the rectangular base plate 20, and the guide portion 3 2 4 has a guide inclined surface 3 2 4a inclined toward the surface, for guiding slightly. The offset rectangular substrate 20 slides down from the guide inclined surface 3 2 4 a onto the roller surface 3 2 2 a. It is worth noting that from the perspective of stress, when the rectangular substrate 20 slightly shifts and slides on the guide inclined surface 3 2 4 a, if the rectangular substrate 20 has a lateral stress on the first roller 3 2 0 Fgt is greater than the lateral pressing force Fr of the rectangular substrate 20, and the rectangular substrate 20 can automatically slide from the guide slope _ 3 2 4 a to the roller surface 3 2 2 a by its own gravity Fg, otherwise, if the rectangular substrate 20 pairs The lateral stress Fgt generated by the first roller 3 2 0 is smaller than the lateral pressing force F r of the rectangular substrate 20, and the rectangular substrate 20 will be pushed by the lateral stress F gt to continue to shift toward the guide inclined surface 3 2 4a. When the lateral stress Fgt exceeds the critical point B of the gravity Fg of the rectangular substrate 20, the rectangular substrate 20 can no longer slide back onto the roller surface 3 2 2 a, and is easily affected by the first roller 3 2 0 and the third roller 3 6 0 The generated moment effect (ie, the holding force) directly damages the edge of the rectangular substrate 20, so it can be known from the above that the guide slope 324a is one of the main factors that cause the rectangular substrate 20 to break in the conventional technology. In addition, if the second roller 3 4 0 of the present invention is also disposed at the position between any two adjacent first rollers 3 2 0, when both sides of the rectangular substrate 20 have not exceeded the above-mentioned critical point B At the moment, it is subject to the second roller 3 4 0

i1086twf.ptd 第16頁 1220013 五、發明說明(ίο) 面3 4 0 a的推頂而滑回滾輪面3 2 2 a上,故能有效將矩形基板 2 0保持於既定的傳送路徑A上,並可避免傳送過程中造成 矩形基板2 0的邊緣破損之情形發生。本實施例亦可將第三-滾輪3 6 ◦省略,並藉由矩形基板2 0本身的重量以及進行濕 式處理時所喷灑之液體的重量,以使矩形基板2 0與滾輪面 3 2 2 a上間有足夠的摩擦力,而帶動矩形基板20。此外,為 了避免矩形基板2 0在傳送過程中其表面受到刮傷,同樣可 如同前述之較佳實施例,在第一滾輪3 2 0之滾輪面3 2 2 a以 及第三滾輪3 6 0之滾輪面3 6 0 a上對應配置一第一環狀彈性 構件(圖未示)及第二環狀彈性構件(圖未示)。 綜上所述,本發明之傳送機構因在對應於矩形基板之 側壁處配置具有導正功能之滾輪,使矩形基板在傳送過程® 中若發生偏移之情形,能藉由具有導正功能之滾輪推頂矩 形基板之側壁,以有效將矩形基板保持於一既定的傳送路 徑上,故可避免傳送過程中造成矩形基板的邊緣破損之情 形發生。 雖然本發明已以較佳實施例揭露如上,然其並非用以 限定本發明,任何熟習此技藝者,在不脫離本發明之精神 和範圍内,當可作些許之更動與潤飾,因此本發明之保護 範圍當視後附之申請專利範圍所界定者為準。i1086twf.ptd Page 16 1220013 V. Description of the invention (ίο) The surface 3 4 0 a is pushed back and slides back to the roller surface 3 2 2 a, so the rectangular substrate 20 can be effectively maintained on the predetermined transmission path A. It can also avoid the situation that the edge of the rectangular substrate 20 is damaged during the transportation. In this embodiment, the third-roller 36 can also be omitted, and the rectangular substrate 20 and the roller surface 3 2 can be made by the weight of the rectangular substrate 20 itself and the weight of the liquid sprayed during wet processing. There is sufficient friction between 2a and the rectangular substrate 20 is driven. In addition, in order to prevent the surface of the rectangular substrate 20 from being scratched during the transfer, the same can be applied to the first roller 3 2 0 on the roller surface 3 2 2 a and the third roller 3 6 0 as in the aforementioned preferred embodiment. A first ring-shaped elastic member (not shown) and a second ring-shaped elastic member (not shown) are correspondingly arranged on the roller surface 3 6 0 a. In summary, the conveying mechanism of the present invention is provided with a roller having a guiding function at the side wall corresponding to the rectangular substrate, so that if the rectangular substrate is shifted during the conveying process ®, the The roller pushes the side wall of the rectangular substrate to effectively keep the rectangular substrate on a predetermined conveying path, so that the edge of the rectangular substrate can be prevented from being damaged during the conveying process. Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make some modifications and retouching without departing from the spirit and scope of the present invention. The scope of protection shall be determined by the scope of the attached patent application.

H086twf.ptd 第17頁 1220013 圖式簡單說明 第1 A圖是繪示習知傳送機構的側面示意圖; 第1 B圖是繪示習知傳送機構的正面示意圖; 第2 A圖及第2 B圖是繪示習知傳送機構造成矩形基板偏· 移傳送的俯視示意圖; 第3圖是繪示習知傳送機構造成矩形基板破片的示意 圖; 第4圖是繪示本發明一較佳實施例之濕式處理設備之 配置示意圖; 第5 A圖是繪示本發明之一較佳實施例之傳送機構的側 面示意圖;H086twf.ptd Page 17 1220013 Brief Description of Drawings Figure 1 A is a schematic side view of a conventional transmission mechanism; Figure 1 B is a schematic front view of a conventional transmission mechanism; Figures 2 A and 2 B It is a schematic plan view showing a rectangular substrate deviating and shifting caused by a conventional conveying mechanism. FIG. 3 is a schematic diagram showing a rectangular substrate fragment caused by a conventional conveying mechanism. FIG. 4 is a diagram showing the wetness of a preferred embodiment of the present invention. 5A is a schematic side view of a conveying mechanism according to a preferred embodiment of the present invention;

第5 B圖是繪示本發明之一較佳實施例之傳送機構的俯 視不' 意圖, I 第6 A圖是繪示本發明之一較佳實施例之傳送機構的正 面示意圖;以及 第6 B圖是繪示本發明之另一較佳實施例之傳送機構的 正面示意圖。 【圖式標示說明】 1 0 :矩形基板 1 0 0 :傳送機構 1 1 0 :第一轉軸 1 2 0 :第一滾輪 1 2 2 :滾輪部 g 1 2 2 a :滾輪面 胃 124 :導引部FIG. 5B is a plan view illustrating a transmission mechanism according to a preferred embodiment of the present invention, FIG. 6A is a schematic front view illustrating the transmission mechanism according to a preferred embodiment of the present invention; and FIG. Figure B is a schematic front view of a transfer mechanism according to another preferred embodiment of the present invention. [Illustration of diagrammatic labeling] 1 0: rectangular substrate 1 0 0: conveying mechanism 1 1 0: first rotating shaft 1 2 0: first roller 1 2 2: roller portion g 1 2 2 a: roller face stomach 124: guide unit

1 1086t.wf. ptd 第18頁 1220013 圖式簡單說明 124a :導引斜面 130 :第二轉軸 140 •弟二滚輪 140a :滾輪面 20 0 濕式處理設備 21 0 處理室 2 12 輸入端 21 4 輸出端 220 反應液體供給裝 23 0 清洗液供給裝置 240 氣體供應裝置 2 0 : 矩形基板 300 傳送機構 31 0 第一轉轴 320 第一滾輪 320 滾輪部 3 2 0 b :第一彈性肋條 3 2 2 : :滾輪部 3 2 2 a •滚輪面 3 2 2b :第一彈性肋條 3 2 4 : :導引部 3 2 4a •導引斜面 3 3 0 : =第二轉軸 3 4 0 : :第二滾輪 _1 1086t.wf. Ptd Page 18 1220013 Brief description of the diagram 124a: Guide slope 130: Second rotating shaft 140 • Second roller 140a: Roller surface 20 0 Wet processing equipment 21 0 Processing chamber 2 12 Input 21 4 Output End 220 Reactive liquid supply device 23 0 Cleaning liquid supply device 240 Gas supply device 2 0: Rectangular substrate 300 Conveying mechanism 31 0 First rotating shaft 320 First roller 320 Roller portion 3 2 0 b: First elastic rib 3 2 2: : Roller part 3 2 2 a • Roller surface 3 2 2b: First elastic rib 3 2 4:: Guide part 3 2 4a • Guide bevel 3 3 0: = Second rotating shaft 3 4 0:: Second roller _

11086twf.ptd 第19頁 122001311086twf.ptd Page 19 1220013

11086twf.ptd 第20頁11086twf.ptd Page 20

Claims (1)

1220013 六、申請專利範圍 1 · 一種傳送機構,適於傳送至少一矩形基板沿著一使 送路徑移動,該傳送機構包括: 複數個第一轉軸; - 複數個第一滾輪,該些第一滾輪分別配置於該些第一 轉軸上,且沿著該傳送路徑排列,每一該些第一滾輪具有 一滾輪面係與該矩形基板之底緣接觸; 複數個第二轉軸;以及 複數個第二滾輪,該些第二滾輪分別配置於該些第二 轉軸上,並沿著該傳送路徑排列,且位於任意兩相鄰之該 些第一滾輪之間,其中每一該些第二滚輪具有一滾輪面, 該滚奋面係與該矩形基板之側壁接觸,以使該矩形基板能 保持沿著該傳送路徑移動。 I 2.如申請專利範圍第1項所述之傳送機構,其中該些 第二滾輪係位於每兩相鄰之該些第一滾輪之間。 3 .如申請專利範圍第1項所述之傳送機構,另包括一 第一環狀彈性構件,其中該第一環狀彈性構件係配置於每 一該些第一滾輪之該滾輪面上。 4. 如申請專利範圍第1項所述之傳送機構,其中該些 第一滾輪為主動滾輪。 5. 如申請專利範圍第1項所述之傳送機構,其中該些 第一滾輪包括複數個主動滾輪及複數個被動滾輪。 6 .如申請專利範圍第1項所述之傳送機構,其中該些| 苐二滾輪為主動滾輪。 7.如申請專利範圍第1項所述之傳送機構,其中該些1220013 VI. Scope of patent application 1 · A transfer mechanism adapted to transfer at least one rectangular substrate along a feed path, the transfer mechanism includes: a plurality of first rotary shafts;-a plurality of first rollers, the first rollers Respectively arranged on the first rotating shafts and arranged along the conveying path, each of the first rollers has a roller surface contacting the bottom edge of the rectangular substrate; a plurality of second rotating shafts; and a plurality of second Rollers, the second rollers are respectively arranged on the second rotating shafts, are arranged along the conveying path, and are located between any two adjacent first rollers, wherein each of the second rollers has a The roller surface is in contact with the side wall of the rectangular substrate so that the rectangular substrate can keep moving along the conveying path. I 2. The transmission mechanism according to item 1 of the scope of patent application, wherein the second rollers are located between every two adjacent first rollers. 3. The transmission mechanism according to item 1 of the scope of patent application, further comprising a first annular elastic member, wherein the first annular elastic member is disposed on the roller surface of each of the first rollers. 4. The transmission mechanism according to item 1 of the scope of patent application, wherein the first rollers are active rollers. 5. The transmission mechanism according to item 1 of the scope of patent application, wherein the first rollers include a plurality of active rollers and a plurality of passive rollers. 6. The transmission mechanism according to item 1 of the scope of patent application, wherein the two rollers are active rollers. 7. The transmission mechanism as described in item 1 of the scope of patent application, wherein these l1086twf,ptd 第21頁 1220013 六、申請專利範圍 第二滾輪包括複數個主動滾輪及複數個被動滾輪。 8 .如申請專利範圍第1項所述之傳送機構,其中該些 第二滾輪為被動滾輪。 9 ·如申請專利範圍第1項所述之傳送機構,其中該第 一滾輪另包括: 一滾輪部,具有該滾輪面;以及 一導引部,係與該滾輪部連接,其中該導引部具有一 朝向該滾輪面傾斜之導引斜面。 1 0 ·如申請專利範圍第1項所述之傳送機構,另包括: 複數個第三轉轴;以及 複數個第三滾輪,該些第三滾輪分別配置於該些第三 轉軸上,並沿著該傳送路徑排列,且位於該些第一滾輪之β 上方,其中每一該些第三滾輪具有一滾輪面,係與該矩形 基板之頂緣接觸。 1 1 .如申請專利範圍第1 0項所述之傳送機構,其中該 些第三滾輪為主動滾輪。 1 2 .如申請專利範圍第1 0項所述之傳送機構,其中該 些第三滾輪包括複數個主動滾輪及複數個被動滾輪。 1 3 .如申請專利範圍第1 0項所述之傳送機構,其中該 些第三滾輪為被動滾輪。 1 4 .如申請專利範圍第1 0項所述之傳送機構,另包括 一第二環狀彈性構件,其中該第二環狀彈性構件係配置於g 每一該些第三滾輪之該滚輪面上。 1 5 . —種濕式處理設備,適於對至少一矩形基板進行l1086twf, ptd Page 21 1220013 6. Scope of patent application The second roller includes a plurality of active rollers and a plurality of passive rollers. 8. The transmission mechanism according to item 1 of the scope of patent application, wherein the second rollers are passive rollers. 9 · The transmission mechanism according to item 1 of the scope of patent application, wherein the first roller further comprises: a roller portion having the roller surface; and a guide portion connected to the roller portion, wherein the guide portion There is a guide slope inclined toward the surface of the roller. 1 0 · The transmission mechanism described in item 1 of the scope of patent application, further comprising: a plurality of third rotating shafts; and a plurality of third rollers, the third rollers are respectively disposed on the third rotating shafts, and It is arranged along the conveying path and is located above β of the first rollers. Each of the third rollers has a roller surface that is in contact with the top edge of the rectangular substrate. 11. The transmission mechanism according to item 10 of the scope of patent application, wherein the third rollers are active rollers. 12. The transmission mechanism according to item 10 of the scope of patent application, wherein the third rollers include a plurality of active rollers and a plurality of passive rollers. 13. The transmission mechanism according to item 10 of the scope of patent application, wherein the third rollers are passive rollers. 14. The transmission mechanism as described in item 10 of the scope of patent application, further comprising a second annular elastic member, wherein the second annular elastic member is disposed on the roller surface of each of the third rollers. on. 1 5. — A wet processing equipment, suitable for at least one rectangular substrate I1086twf.ptd 第22頁 1220013 六、申請專利範圍 一濕式處理製程,該濕式處理設備包括: 一處理室,具有至少一輸入端及至少一輸出端; 一傳送機構,適於傳送至少一矩形基板沿著一傳送路 徑移動,該傳送機構包括: 複數個第一轉軸; 複數個第一滾輪,該些第一滾輪分別配置於該些第 一轉軸上,且沿著該傳送路徑棑列,每一該些第一滾輪具 有一滾輪面係與該矩形基板之底緣接觸; 複數個第二轉軸;以及 複數個第二滾輪,該些第二滾輪分別配置於該些第 二轉軸上,並沿著該傳送路徑排列,且位於任意兩相鄰之 該些第一滾輪之間,其中每一該些第二滾輪具有一滾輪· 面,該滾輪面係與該矩形基板之側壁接觸,以使該矩形基 板能保持沿著該傳送路徑移動; 一反應液體供給裝置,係配置鄰近於該輸入端,且位 於該矩形基板的上方,該反應液體供給裝置適於喷射一反 應液體於該矩形基板之頂面;以及 一清洗液供給裝置,係配置於該酸液供給裝置及該輸 出端之間,且位於該矩形基板的上方,該清洗液供’給裝置 適於喷射一清洗液於該矩形基板之頂面,以將該矩形基板 上之該反應液體洗除。 1 6 .如申請專利範圍第1 5項所述之濕式處理設備,其_ 中該些第二滾輪係位於每兩相鄰之該些第一滾輪之間。 1 7 .如申請專利範圍第1 5項所述之濕式處理設備,另I1086twf.ptd Page 22 1220013 VI. Patent application scope A wet processing process, the wet processing equipment includes: a processing chamber with at least one input end and at least one output end; a transfer mechanism adapted to transfer at least one rectangle The substrate moves along a conveying path. The conveying mechanism includes: a plurality of first rotating shafts; a plurality of first rollers, the first rollers are respectively disposed on the first rotating shafts, and are queued along the conveying path, each Some of the first rollers have a roller surface in contact with the bottom edge of the rectangular substrate; a plurality of second rotary shafts; and a plurality of second rollers. The second rollers are respectively disposed on the second rotary shafts and along the Are arranged along the conveying path and are located between any two adjacent first rollers, each of which has a roller surface, and the roller surface is in contact with the side wall of the rectangular substrate so that the The rectangular substrate can keep moving along the conveying path; a reaction liquid supply device is arranged adjacent to the input end and located above the rectangular substrate, and the reaction liquid supply The feeding device is suitable for spraying a reaction liquid on the top surface of the rectangular substrate; and a cleaning liquid supply device is disposed between the acid liquid supply device and the output end, and is located above the rectangular substrate. The feeding device is adapted to spray a cleaning liquid on the top surface of the rectangular substrate to wash the reaction liquid on the rectangular substrate. 16. The wet processing equipment as described in item 15 of the scope of patent application, wherein the second rollers are located between every two adjacent first rollers. 17. Wet processing equipment as described in item 15 of the scope of patent application, and 11086twf.ptd 第23頁 1220013 六、申請專利範圍 包括一第一環狀彈性構件,其中該第一環狀彈性構件係配 置於每一該些第一滾輪之該滾輪面上。 1 8 ·如申請專利範圍第1 5項所述之濕式處理設備,其· 中該些第一滾輪為主動滾輪。 1 9 ·如申請專利範圍第1 5項所述之濕式處理設備,其 中該些第一滾輪包括複數個主動滾輪及複數個被動滾輪。 2 〇 ·如申請專利範圍第1 5項所述之濕式處理設備,其 中該些第二滾輪為主動滾輪。 2 1 ·如申請專利範圍第1 5項所述之濕式處理設備,其 中該些第二滾輪包括複數個主動滾輪及複數個被動滾輪。 2 2 ·如申請專利範圍第1 5項所述之濕式處理設備,其 中該些第二滾輪為被動滾輪。 < 2 3 .如申請專利範圍第1 5項所述之濕式處理設備,其 中該第一滾輪另包括: 一滾輪部,具有該滾輪面;以及 一導引部,係與該滾輪部連接,其中該導引部具有一 朝向該滾輪面傾斜之導引斜面。 2 4 .如申請專利範圍第1 5項所述之濕式處理設備,另 包括: 複數個第三轉軸;以及 複數個第三滾輪,該些第三滾輪分別配置於該些第三 轉軸上,並沿著該傳送路徑排列,且位於該些第一滾輪y 上方,其中每一該些第三滾輪具有一滾輪面,係與該矩形_ 基板之頂緣接觸。11086twf.ptd Page 23 1220013 6. The scope of patent application includes a first annular elastic member, wherein the first annular elastic member is arranged on the roller surface of each of the first rollers. 1 8 · The wet processing equipment described in item 15 of the scope of patent application, wherein the first rollers are active rollers. 19 · The wet processing equipment according to item 15 of the scope of patent application, wherein the first rollers include a plurality of active rollers and a plurality of passive rollers. 2 〇 The wet processing equipment described in item 15 of the scope of patent application, wherein the second rollers are active rollers. 2 1 · The wet processing equipment according to item 15 of the scope of patent application, wherein the second rollers include a plurality of active rollers and a plurality of passive rollers. 2 2 · The wet processing equipment according to item 15 of the scope of patent application, wherein the second rollers are passive rollers. < 2 3. The wet processing equipment according to item 15 of the scope of patent application, wherein the first roller further comprises: a roller portion having the roller surface; and a guide portion connected to the roller portion Wherein, the guide portion has a guide inclined surface inclined toward the roller surface. 24. The wet processing equipment as described in item 15 of the scope of patent application, further comprising: a plurality of third rotating shafts; and a plurality of third rollers, the third rollers are respectively disposed on the third rotating shafts, And arranged along the conveying path and located above the first rollers y, wherein each of the third rollers has a roller surface that is in contact with the top edge of the rectangular substrate. 1I086twf.ptd 第24頁 1220013 六、申請專利範圍 2 5 ·如申請專利範圍第2 4項所述之濕式處理設備,其 中該些第三滾輪為主動滾輪。 2 6 ·如申請專利範圍第2 4項所述之濕式處理設備,其-中該些第三滾輪包括複數個主動滾輪及複數個被動滾輪。 2 7 ,如申請專利範圍第2 4項所述之濕式處理設備,其 中該些第三滾輪為被動滾輪。 2 8 .如申請專利範圍第1 5項所述之濕式處理設備,另 包括一第二環狀彈性構件,其中該第二環狀彈性構件係配 置於每一該些第三滾輪之該滾輪面上。 2 9,如申請專利範圍第1 5項所述之濕式處理設備,另 包括一氣體供應裝置,其中該氣體供應裝置係配置於該^ 應液體供給裝置及該清洗液供給裝置之間,且位該矩形# 板的上方,該氣體供給裝置適於喷射一氣體於該矩形基板 之頂面,以將該矩形基板上之該反應液體吹除。 3 0 .如申請專利範圍第1 5項所述之濕式處理設備,其 中該處理室係為一 U型處理室。 馨1I086twf.ptd Page 24 1220013 6. Scope of Patent Application 2 5 • The wet processing equipment described in item 24 of the scope of patent application, in which the third rollers are active rollers. 26. The wet processing equipment as described in item 24 of the scope of patent application, wherein the third rollers include a plurality of active rollers and a plurality of passive rollers. 27. The wet processing equipment according to item 24 of the scope of patent application, wherein the third rollers are passive rollers. 28. The wet processing equipment according to item 15 of the scope of patent application, further comprising a second annular elastic member, wherein the second annular elastic member is disposed on the roller of each of the third rollers. Surface. 29. The wet processing equipment described in item 15 of the scope of patent application, further comprising a gas supply device, wherein the gas supply device is disposed between the reaction liquid supply device and the cleaning liquid supply device, and Located above the rectangular # plate, the gas supply device is adapted to inject a gas onto the top surface of the rectangular substrate to blow out the reaction liquid on the rectangular substrate. 30. The wet processing equipment according to item 15 of the scope of patent application, wherein the processing chamber is a U-shaped processing chamber. Xin 11086twf.ptd 第25頁11086twf.ptd Page 25
TW92117363A 2003-06-26 2003-06-26 Conveying apparatus TWI220013B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW92117363A TWI220013B (en) 2003-06-26 2003-06-26 Conveying apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW92117363A TWI220013B (en) 2003-06-26 2003-06-26 Conveying apparatus

Publications (2)

Publication Number Publication Date
TWI220013B true TWI220013B (en) 2004-08-01
TW200500281A TW200500281A (en) 2005-01-01

Family

ID=34076285

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92117363A TWI220013B (en) 2003-06-26 2003-06-26 Conveying apparatus

Country Status (1)

Country Link
TW (1) TWI220013B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102976125A (en) * 2011-09-02 2013-03-20 扬发实业有限公司 Conveying device and rolling wheels for conveying

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5041207B2 (en) * 2006-11-14 2012-10-03 株式会社ダイフク Goods transport equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102976125A (en) * 2011-09-02 2013-03-20 扬发实业有限公司 Conveying device and rolling wheels for conveying

Also Published As

Publication number Publication date
TW200500281A (en) 2005-01-01

Similar Documents

Publication Publication Date Title
US9561982B2 (en) Method of cleaning glass substrates
US5823736A (en) Substrate processing device and method for substrate from the substrate processing device
US20090020414A1 (en) Method of eliminating electrostatic charges generated from friction between a carrier and a substrate
TWI220013B (en) Conveying apparatus
CN104051311B (en) Base plate transfer device and the strong acid suitable for wet process or highly basic etching technics
CN109755287A (en) A kind of flexible OLED devices and preparation method thereof
JP2001196438A (en) Apparatus for conveying thin plate-like material
CN1326757C (en) Transport mechanism and wet type processing device thereof
KR20090029402A (en) Apparatus of transferring a substrate
KR20140072988A (en) Substrate transferring device
KR20080022377A (en) The substrate transfer
JP2004144908A (en) Bonding device for polarizing plate
JP2003321118A (en) Right-angle transfer equipment
KR101043712B1 (en) Substrate transferring unit and substrate treating apparatus with the same
KR20080022378A (en) The substrate transfer
KR200331986Y1 (en) substrate processing equipment having one process line capable of handling plural substrates simultaneously
CN201632463U (en) Roller wheel device matched with brush wheel group for use
US6613156B2 (en) Apparatus and method for photoresist stripping
CN107728353B (en) display device
JP2978806B2 (en) Substrate processing method
CN109612253B (en) Double-roller device
KR20030004783A (en) Apparatus For Conveying Substrate
KR20110062542A (en) Brushing unit for cleaning glass of display device
TWI227107B (en) Fixing apparatus for setting cassette on crane fork
KR200295028Y1 (en) Apparatus for transferring a panel

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees