TWD223765S - Semiconductor deposition reactor ring and supports - Google Patents

Semiconductor deposition reactor ring and supports Download PDF

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Publication number
TWD223765S
TWD223765S TW111304205F TW111304205F TWD223765S TW D223765 S TWD223765 S TW D223765S TW 111304205 F TW111304205 F TW 111304205F TW 111304205 F TW111304205 F TW 111304205F TW D223765 S TWD223765 S TW D223765S
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TW
Taiwan
Prior art keywords
deposition reactor
supports
semiconductor deposition
reactor ring
ring
Prior art date
Application number
TW111304205F
Other languages
Chinese (zh)
Inventor
魯特維 奈克
蘇俊威
王文濤
周楚秦
林興
Original Assignee
荷蘭商Ａｓｍ Ｉｐ私人控股有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 filed Critical 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司
Publication of TWD223765S publication Critical patent/TWD223765S/en

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Abstract

【物品用途】;本設計物品關於一種用於半導體沉積反應器之環以及支架。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。[Use of item];This design item is about a ring and bracket used in a semiconductor deposition reactor. ;[Design Description];The dotted line portion disclosed in the drawing is the part of this case that does not require design.

Description

半導體沉積反應器環以及支架Semiconductor deposition reactor ring and support

本設計物品關於一種用於半導體沉積反應器之環以及支架。The design article relates to a ring and support for a semiconductor deposition reactor.

圖式所揭露之虛線部分，為本案不主張設計之部分。The dotted line part disclosed in the drawing is the part not claimed in this case.

TW111304205F 2021-06-30 2021-12-22 Semiconductor deposition reactor ring and supports TWD223765S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/797,476 USD1028913S1 (en) 2021-06-30 2021-06-30 Semiconductor deposition reactor ring
US29/797,476 2021-06-30

Publications (1)

Publication Number Publication Date
TWD223765S true TWD223765S (en) 2023-02-11

Family

ID=82458069

Family Applications (4)

Application Number Title Priority Date Filing Date
TW110306972F TWD223524S (en) 2021-06-30 2021-12-22 Semiconductor deposition reactor ring and supports
TW111304207F TWD223767S (en) 2021-06-30 2021-12-22 Semiconductor deposition reactor ring and supports
TW111304205F TWD223765S (en) 2021-06-30 2021-12-22 Semiconductor deposition reactor ring and supports
TW111304206F TWD223766S (en) 2021-06-30 2021-12-22 Semiconductor deposition reactor ring and supports

Family Applications Before (2)

Application Number Title Priority Date Filing Date
TW110306972F TWD223524S (en) 2021-06-30 2021-12-22 Semiconductor deposition reactor ring and supports
TW111304207F TWD223767S (en) 2021-06-30 2021-12-22 Semiconductor deposition reactor ring and supports

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Application Number Title Priority Date Filing Date
TW111304206F TWD223766S (en) 2021-06-30 2021-12-22 Semiconductor deposition reactor ring and supports

Country Status (3)

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US (1) USD1028913S1 (en)
JP (4) JP1720448S (en)
TW (4) TWD223524S (en)

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Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD210557S (en) 2020-01-21 2021-03-21 志聖工業股份有限公司 Carrier plate for thermal process

Also Published As

Publication number Publication date
TWD223767S (en) 2023-02-11
TWD223524S (en) 2023-02-11
TWD223766S (en) 2023-02-11
USD1028913S1 (en) 2024-05-28
JP1720449S (en) 2022-07-22
JP1720450S (en) 2022-07-22
JP1720451S (en) 2022-07-22
JP1720448S (en) 2022-07-22

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