TWD211028S - container - Google Patents
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- Publication number
- TWD211028S TWD211028S TW109305617F TW109305617F TWD211028S TW D211028 S TWD211028 S TW D211028S TW 109305617 F TW109305617 F TW 109305617F TW 109305617 F TW109305617 F TW 109305617F TW D211028 S TWD211028 S TW D211028S
- Authority
- TW
- Taiwan
- Prior art keywords
- circular
- design
- shape
- barrel
- circular barrel
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 abstract description 2
- 238000004381 surface treatment Methods 0.000 abstract description 2
Images
Abstract
【物品用途】;本設計係有關於一種用於基板上進行等離子體表面處理以製造半導體設備之容器。;【設計說明】;本設計之設計特點在於其整體大致呈圓形桶形狀，其圓形桶形狀上方設有一由內向外由小而大延伸的圓形放射狀，其圓形放射狀上方邊緣較為突出，且圓形桶形狀下方設有複數個圓形形狀之通孔。[Use of article]; This design relates to a container used for plasma surface treatment on a substrate to manufacture semiconductor equipment. ;[Design Description];The design feature of this design is that it is generally in the shape of a circular barrel. There is a circular radial shape extending from the inside to the outside from small to large above the circular barrel shape. The upper edge of the circular radial shape is It is more prominent, and there are a plurality of circular-shaped through holes below the circular barrel shape.
Description
本設計係有關於一種用於基板上進行等離子體表面處理以製造半導體設備之容器。This design relates to a container used for plasma surface treatment on a substrate to manufacture semiconductor devices.
本設計之設計特點在於其整體大致呈圓形桶形狀，其圓形桶形狀上方設有一由內向外由小而大延伸的圓形放射狀，其圓形放射狀上方邊緣較為突出，且圓形桶形狀下方設有複數個圓形形狀之通孔。The design feature of this design is that it is roughly in the shape of a circular barrel. The upper part of the circular barrel is provided with a circular radial extending from the inside to the outside from small to large. The upper edge of the circular radial is more protruding and round. A plurality of circular through holes are provided under the barrel shape.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR30-2019-0017923 | 2019-04-17 | ||
| KR30-2019-0017925 | 2019-04-17 | ||
| KR30-2019-0017930 | 2019-04-17 | ||
| KR20190017923 | 2019-04-17 | ||
| KR30-2019-0017928 | 2019-04-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD211028S true TWD211028S (en) | 2021-04-11 |
Family
ID=89023837
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108306379F TWD208388S (en) | 2019-04-17 | 2019-10-15 | container |
| TW108306389F TWD208389S (en) | 2019-04-17 | 2019-10-15 | container |
| TW109305617F TWD211028S (en) | 2019-04-17 | 2019-10-15 | container |
| TW108306379D02F TWD208352S (en) | 2019-04-17 | 2019-10-15 | container |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108306379F TWD208388S (en) | 2019-04-17 | 2019-10-15 | container |
| TW108306389F TWD208389S (en) | 2019-04-17 | 2019-10-15 | container |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108306379D02F TWD208352S (en) | 2019-04-17 | 2019-10-15 | container |
Country Status (1)
| Country | Link |
|---|---|
| TW (4) | TWD208388S (en) |
-
2019
- 2019-10-15 TW TW108306379F patent/TWD208388S/en unknown
- 2019-10-15 TW TW108306389F patent/TWD208389S/en unknown
- 2019-10-15 TW TW109305617F patent/TWD211028S/en unknown
- 2019-10-15 TW TW108306379D02F patent/TWD208352S/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TWD208352S (en) | 2020-11-21 |
| TWD208388S (en) | 2020-11-21 |
| TWD208389S (en) | 2020-11-21 |
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| TWD211028S (en) | container |