TWD208352S - container - Google Patents

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Publication number
TWD208352S
TWD208352S TW108306379D02F TW108306379D02F TWD208352S TW D208352 S TWD208352 S TW D208352S TW 108306379D02 F TW108306379D02 F TW 108306379D02F TW 108306379D02 F TW108306379D02 F TW 108306379D02F TW D208352 S TWD208352 S TW D208352S
Authority
TW
Taiwan
Prior art keywords
design
shape
circular
holes
circular barrel
Prior art date
Application number
TW108306379D02F
Other languages
Chinese (zh)
Inventor
金亨源
金成旭
蔡熙星
鄭熙錫
Original Assignee
南韓商吉佳藍科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 南韓商吉佳藍科技股份有限公司 filed Critical 南韓商吉佳藍科技股份有限公司
Publication of TWD208352S publication Critical patent/TWD208352S/en

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Abstract

【物品用途】;本設計係有關於一種用於基板上進行等離子體表面處理以製造半導體設備之容器。;【設計說明】;本設計之設計特點在於其整體大致呈圓形桶形狀,其圓形桶形狀上方設有一由內向外由小而大延伸的圓形放射狀,其圓形放射狀上方邊緣較為突出,且圓形桶形狀下方設有複數個較短之長條形形狀且有圓角之通孔;其與原設計之外觀差異在於其二者之複數個通孔型態不同。如是構成一與原設計近似,且相較先前技藝具特異視覺效果之設計。[Use of article]; This design relates to a container used for plasma surface treatment on a substrate to manufacture semiconductor equipment. ;[Design Description];The design feature of this design is that it is generally in the shape of a circular barrel. There is a circular radial shape extending from the inside to the outside from small to large above the circular barrel shape. The upper edge of the circular radial shape is It is more prominent, and there are a plurality of shorter long strip-shaped through holes with rounded corners below the circular barrel shape; the difference in appearance from the original design lies in the different shapes of the plurality of through holes. This constitutes a design that is similar to the original design and has a unique visual effect compared to previous techniques.

Description

容器container

本設計係有關於一種用於基板上進行等離子體表面處理以製造半導體設備之容器。This design relates to a container used for plasma surface treatment on a substrate to manufacture semiconductor devices.

本設計之設計特點在於其整體大致呈圓形桶形狀,其圓形桶形狀上方設有一由內向外由小而大延伸的圓形放射狀,其圓形放射狀上方邊緣較為突出,且圓形桶形狀下方設有複數個較短之長條形形狀且有圓角之通孔;其與原設計之外觀差異在於其二者之複數個通孔型態不同。如是構成一與原設計近似,且相較先前技藝具特異視覺效果之設計。The design feature of this design is that it is roughly in the shape of a circular barrel. The upper part of the circular barrel is provided with a circular radial extending from the inside to the outside from small to large. The upper edge of the circular radial is more protruding and round. There are a plurality of short, long strip-shaped through holes with rounded corners under the barrel shape; the appearance difference from the original design is that the two through-hole types are different. This constitutes a design that is similar to the original design and has a special visual effect compared to the previous technique.

TW108306379D02F 2019-04-17 2019-10-15 container TWD208352S (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
KR30-2019-0017925 2019-04-17
KR30-2019-0017930 2019-04-17
KR20190017923 2019-04-17
KR30-2019-0017928 2019-04-17
KR30-2019-0017923 2019-04-17

Publications (1)

Publication Number Publication Date
TWD208352S true TWD208352S (en) 2020-11-21

Family

ID=89023837

Family Applications (4)

Application Number Title Priority Date Filing Date
TW108306379D02F TWD208352S (en) 2019-04-17 2019-10-15 container
TW108306389F TWD208389S (en) 2019-04-17 2019-10-15 container
TW108306379F TWD208388S (en) 2019-04-17 2019-10-15 container
TW109305617F TWD211028S (en) 2019-04-17 2019-10-15 container

Family Applications After (3)

Application Number Title Priority Date Filing Date
TW108306389F TWD208389S (en) 2019-04-17 2019-10-15 container
TW108306379F TWD208388S (en) 2019-04-17 2019-10-15 container
TW109305617F TWD211028S (en) 2019-04-17 2019-10-15 container

Country Status (1)

Country Link
TW (4) TWD208352S (en)

Also Published As

Publication number Publication date
TWD208388S (en) 2020-11-21
TWD208389S (en) 2020-11-21
TWD211028S (en) 2021-04-11

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