TWD208175S - Wafer retainer for manufacturing semiconductor - Google Patents
Wafer retainer for manufacturing semiconductor Download PDFInfo
- Publication number
- TWD208175S TWD208175S TW107307217D01F TW107307217D01F TWD208175S TW D208175 S TWD208175 S TW D208175S TW 107307217D01 F TW107307217D01 F TW 107307217D01F TW 107307217D01 F TW107307217D01 F TW 107307217D01F TW D208175 S TWD208175 S TW D208175S
- Authority
- TW
- Taiwan
- Prior art keywords
- view
- design
- article
- semiconductor manufacturing
- flange portion
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title abstract description 5
- 239000004065 semiconductor Substances 0.000 title abstract description 5
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Abstract
【物品用途】;本設計物品關於一種半導體製造用晶圓支持器。;【設計說明】;後視圖與前視圖相同，故省略後視圖。;左側視圖與右側視圖相同，故省略左側視圖。;本設計物品是應用於半導體製造的晶圓支持器，其具有透光性，包含：沿圓周具有既定寬度的凸緣部分、和在凸緣部分內部具有圓弧形橫截面的凹陷部分。本設計物品於俯視圖中的直徑約為300mm。凸緣部分的寬度約為20mm，凹陷部分的最深部分的深度約為400μm。在「中間省略的A-A端面放大剖視圖」中，每個部件之間的省略部分的長度為84mm。[Use of article]; This design article relates to a wafer holder for semiconductor manufacturing. ;[Design Note];The rear view is the same as the front view, so the rear view is omitted. ;The left view is the same as the right view, so the left view is omitted. ; This design article is a wafer support used in semiconductor manufacturing, which is light-transmissive and includes: a flange portion with a predetermined width along the circumference, and a recessed portion with an arc-shaped cross section inside the flange portion. The diameter of this design object in top view is approximately 300mm. The width of the flange part is about 20 mm, and the depth of the deepest part of the recessed part is about 400 μm. In the "enlarged sectional view of the A-A end face with the middle omitted", the length of the omitted part between each component is 84mm.
Description
本設計物品關於一種半導體製造用晶圓支持器。 This design item relates to a wafer supporter for semiconductor manufacturing.
後視圖與前視圖相同，故省略後視圖。 The rear view is the same as the front view, so the rear view is omitted.
左側視圖與右側視圖相同，故省略左側視圖。 The left side view is the same as the right side view, so the left side view is omitted.
本設計物品是應用於半導體製造的晶圓支持器，其具有透光性，包含：沿圓周具有既定寬度的凸緣部分、和在凸緣部分內部具有圓弧形橫截面的凹陷部分。本設計物品於俯視圖中的直徑約為300mm。凸緣部分的寬度約為20mm，凹陷部分的最深部分的深度約為400μm。在「中間省略的A-A端面放大剖視圖」中，每個部件之間的省略部分的長度為84mm。 This design article is a wafer holder used in semiconductor manufacturing. It is translucent and includes a flange portion with a predetermined width along the circumference and a recessed portion with an arc-shaped cross section inside the flange portion. The diameter of the designed article in the top view is about 300mm. The width of the flange portion is about 20 mm, and the depth of the deepest part of the recessed portion is about 400 μm. In the "A-A end face enlarged cross-sectional view omitted in the middle", the length of the omitted part between each part is 84mm.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2018-16238F JP1643123S (en) | 2018-07-25 | 2018-07-25 | |
| JP2018-016238 | 2018-07-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD208175S true TWD208175S (en) | 2020-11-11 |
Family
ID=68095686
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107307217D01F TWD208175S (en) | 2018-07-25 | 2018-12-11 | Wafer retainer for manufacturing semiconductor |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP1643123S (en) |
| TW (1) | TWD208175S (en) |
Citations (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD699199S1 (en) | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode plate for a plasma processing apparatus |
| USD699200S1 (en) | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode member for a plasma processing apparatus |
| USD709536S1 (en) | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
| USD709538S1 (en) | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
| USD709539S1 (en) | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
| USD709537S1 (en) | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
| USD724553S1 (en) | 2013-09-13 | 2015-03-17 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
| USD770992S1 (en) | 2015-06-12 | 2016-11-08 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
| USD797691S1 (en) | 2016-04-14 | 2017-09-19 | Applied Materials, Inc. | Composite edge ring |
| USD802634S1 (en) | 2015-10-23 | 2017-11-14 | Flow International Corporation | Contour follower for a fluid jet cutting machine |
| USD810705S1 (en) | 2016-04-01 | 2018-02-20 | Veeco Instruments Inc. | Self-centering wafer carrier for chemical vapor deposition |
| TWD189096S (en) | 2016-10-13 | 2018-03-11 | 恩特葛瑞斯股份有限公司 | Wafer support ring |
| TWD189313S (en) | 2017-04-07 | 2018-03-21 | Ａｓｍ知識產權私人控股有限公司 | Susceptor for semiconductor substrate processing apparatus |
-
2018
- 2018-07-25 JP JPD2018-16238F patent/JP1643123S/ja active Active
- 2018-12-11 TW TW107307217D01F patent/TWD208175S/en unknown
Patent Citations (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD699199S1 (en) | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode plate for a plasma processing apparatus |
| USD699200S1 (en) | 2011-09-30 | 2014-02-11 | Tokyo Electron Limited | Electrode member for a plasma processing apparatus |
| USD709536S1 (en) | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
| USD709538S1 (en) | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
| USD709539S1 (en) | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
| USD709537S1 (en) | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
| USD724553S1 (en) | 2013-09-13 | 2015-03-17 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
| USD770992S1 (en) | 2015-06-12 | 2016-11-08 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
| USD802634S1 (en) | 2015-10-23 | 2017-11-14 | Flow International Corporation | Contour follower for a fluid jet cutting machine |
| USD810705S1 (en) | 2016-04-01 | 2018-02-20 | Veeco Instruments Inc. | Self-centering wafer carrier for chemical vapor deposition |
| USD797691S1 (en) | 2016-04-14 | 2017-09-19 | Applied Materials, Inc. | Composite edge ring |
| TWD187824S (en) | 2016-04-14 | 2018-01-11 | 應用材料股份有限公司 | A composite edge ring |
| TWD189096S (en) | 2016-10-13 | 2018-03-11 | 恩特葛瑞斯股份有限公司 | Wafer support ring |
| TWD189313S (en) | 2017-04-07 | 2018-03-21 | Ａｓｍ知識產權私人控股有限公司 | Susceptor for semiconductor substrate processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1643123S (en) | 2019-10-07 |
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