TWD198621S - 等離子處理裝置用的密封組件 - Google Patents

等離子處理裝置用的密封組件

Info

Publication number
TWD198621S
TWD198621S TW107307514F TW107307514F TWD198621S TW D198621 S TWD198621 S TW D198621S TW 107307514 F TW107307514 F TW 107307514F TW 107307514 F TW107307514 F TW 107307514F TW D198621 S TWD198621 S TW D198621S
Authority
TW
Taiwan
Prior art keywords
view
enlarged view
plasma processing
processing equipment
sealing components
Prior art date
Application number
TW107307514F
Other languages
English (en)
Inventor
Hyoung Won Kim
Myoung Kyo Jung
Hee Seok Jung
Original Assignee
南韓商吉佳藍科技股份有限&#x5
Gigalane Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 南韓商吉佳藍科技股份有限&#x5, Gigalane Co Ltd filed Critical 南韓商吉佳藍科技股份有限&#x5
Publication of TWD198621S publication Critical patent/TWD198621S/zh

Links

Abstract

【物品用途】;本創作係為一種可供密封之等離子處理裝置用的密封組件。;【設計說明】;A-A端面之剖視圖為前視圖A-A方向的剖視圖，標示A部分之放大圖是A-A端面之剖視圖中A處的放大圖，標示B部分之放大圖是立體圖1中B處的放大圖，標示C部分之放大圖是前視圖中C處的放大圖，標示D部分之放大圖是俯視圖中D處的放大圖，標示E部分之放大圖是仰視圖中E處的放大圖，標示F部分之放大圖是立體圖2中F處的放大圖。
TW107307514F 2018-07-02 2018-12-24 等離子處理裝置用的密封組件 TWD198621S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR20180030520 2018-07-02

Publications (1)

Publication Number Publication Date
TWD198621S true TWD198621S (zh) 2019-07-11

Family

ID=89032062

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107307514F TWD198621S (zh) 2018-07-02 2018-12-24 等離子處理裝置用的密封組件

Country Status (1)

Country Link
TW (1) TWD198621S (zh)

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