TWD187660S - 濺鍍靶 - Google Patents
濺鍍靶Info
- Publication number
- TWD187660S TWD187660S TW106301862F TW106301862F TWD187660S TW D187660 S TWD187660 S TW D187660S TW 106301862 F TW106301862 F TW 106301862F TW 106301862 F TW106301862 F TW 106301862F TW D187660 S TWD187660 S TW D187660S
- Authority
- TW
- Taiwan
- Prior art keywords
- sputtering target
- holes
- view
- design
- front member
- Prior art date
Links
- 238000005477 sputtering target Methods 0.000 title abstract description 9
- 230000000007 visual effect Effects 0.000 abstract description 3
- 238000004544 sputter deposition Methods 0.000 abstract description 2
- 230000003796 beauty Effects 0.000 abstract 2
- 238000010030 laminating Methods 0.000 description 1
Abstract
【物品用途】;本創作係有關於一種濺鍍靶，具體而言為一種用於濺鍍之濺鍍靶。;【設計說明】;從立體圖1、前視圖及後視圖觀之，本創作之濺鍍靶為長條形狀，且左右兩側部具有複數個孔部。從俯視圖及仰視圖觀之，濺鍍靶由前構件及後構件疊合而成，且後構件的長度尺寸大於前構件的長度尺寸，前構件的寬度尺寸大於後構件的寬度尺寸。從A-A、B-B部分放大圖以及C-C、D-D部分放大圖觀之，複數個孔部呈不規則排列，且複數個孔部的形狀為複數個尺寸相同或不同的圓形狀及橢圓形狀。;本創作的濺鍍靶具有柔美的流線設計，不規則排列的孔部富有視覺美感，是一種具有新穎性與創作性且富於視覺美感之設計。
Description
本創作係有關於一種濺鍍靶，具體而言為一種用於濺鍍之濺鍍靶。
從立體圖1、前視圖及後視圖觀之，本創作之濺鍍靶為長條形狀，且左右兩側部具有複數個孔部。從俯視圖及仰視圖觀之，濺鍍靶由前構件及後構件疊合而成，且後構件的長度尺寸大於前構件的長度尺寸，前構件的寬度尺寸大於後構件的寬度尺寸。從A-A、B-B部分放大圖以及C-C、D-D部分放大圖觀之，複數個孔部呈不規則排列，且複數個孔部的形狀為複數個尺寸相同或不同的圓形狀及橢圓形狀。
本創作的濺鍍靶具有柔美的流線設計，不規則排列的孔部富有視覺美感，是一種具有新穎性與創作性且富於視覺美感之設計。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106301862F TWD187660S (zh) | 2017-04-11 | 2017-04-11 | 濺鍍靶 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106301862F TWD187660S (zh) | 2017-04-11 | 2017-04-11 | 濺鍍靶 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD187660S true TWD187660S (zh) | 2018-01-01 |
Family
ID=89070918
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106301862F TWD187660S (zh) | 2017-04-11 | 2017-04-11 | 濺鍍靶 |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWD187660S (zh) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM395678U (en) | 2010-08-06 | 2011-01-01 | Total Ind Ltd | Sputtering target with high material utilization rate |
| TWM505503U (zh) | 2015-01-09 | 2015-07-21 | Linco Technology Co Ltd | 真空濺鍍靶材的冷卻裝置 |
-
2017
- 2017-04-11 TW TW106301862F patent/TWD187660S/zh unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM395678U (en) | 2010-08-06 | 2011-01-01 | Total Ind Ltd | Sputtering target with high material utilization rate |
| TWM505503U (zh) | 2015-01-09 | 2015-07-21 | Linco Technology Co Ltd | 真空濺鍍靶材的冷卻裝置 |
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