TWD187657S - 濺鍍靶 - Google Patents
濺鍍靶Info
- Publication number
- TWD187657S TWD187657S TW106301859F TW106301859F TWD187657S TW D187657 S TWD187657 S TW D187657S TW 106301859 F TW106301859 F TW 106301859F TW 106301859 F TW106301859 F TW 106301859F TW D187657 S TWD187657 S TW D187657S
- Authority
- TW
- Taiwan
- Prior art keywords
- view
- sputtering target
- holes
- viewed
- front member
- Prior art date
Links
- 238000005477 sputtering target Methods 0.000 title abstract description 10
- 230000000007 visual effect Effects 0.000 abstract description 3
- 238000004544 sputter deposition Methods 0.000 abstract description 2
- 230000003796 beauty Effects 0.000 abstract 1
- 238000010030 laminating Methods 0.000 description 1
Abstract
【物品用途】;本創作係有關於一種濺鍍靶，具體而言為一種用於濺鍍之濺鍍靶。;【設計說明】;從立體圖1、前視圖及後視圖觀之，本創作之濺鍍靶為長條形狀，且左右兩側部具有複數個孔部。從A-A、B-B部分放大圖以及C-C、D-D部分放大圖觀之，複數個孔部呈不規則排列，且複數個孔部的形狀為複數個尺寸相同或不同的圓形狀及橢圓形狀。從俯視圖及仰視圖觀之，濺鍍靶由前構件及後構件疊合而成。由前視圖及後視圖觀之，後構件的長度尺寸大於前構件的長度尺寸，且前構件的寬度尺寸大於後構件的寬度尺寸。從前視圖觀之，前構件的左右兩端呈圓弧狀。;本創作的濺鍍靶由長度尺寸及寬度尺寸不同的前構件與後構件疊合成具有柔美的流線造型，不規則排列的孔部富有視覺美感，整體具有雅致的視覺效果。
Description
本創作係有關於一種濺鍍靶，具體而言為一種用於濺鍍之濺鍍靶。
從立體圖1、前視圖及後視圖觀之，本創作之濺鍍靶為長條形狀，且左右兩側部具有複數個孔部。從A-A、B-B部分放大圖以及C-C、D-D部分放大圖觀之，複數個孔部呈不規則排列，且複數個孔部的形狀為複數個尺寸相同或不同的圓形狀及橢圓形狀。從俯視圖及仰視圖觀之，濺鍍靶由前構件及後構件疊合而成。由前視圖及後視圖觀之，後構件的長度尺寸大於前構件的長度尺寸，且前構件的寬度尺寸大於後構件的寬度尺寸。從前視圖觀之，前構件的左右兩端呈圓弧狀。
本創作的濺鍍靶由長度尺寸及寬度尺寸不同的前構件與後構件疊合成具有柔美的流線造型，不規則排列的孔部富有視覺美感，整體具有雅致的視覺效果。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106301859F TWD187657S (zh) | 2017-04-11 | 2017-04-11 | 濺鍍靶 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106301859F TWD187657S (zh) | 2017-04-11 | 2017-04-11 | 濺鍍靶 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD187657S true TWD187657S (zh) | 2018-01-01 |
Family
ID=89070942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106301859F TWD187657S (zh) | 2017-04-11 | 2017-04-11 | 濺鍍靶 |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWD187657S (zh) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM395678U (en) | 2010-08-06 | 2011-01-01 | Total Ind Ltd | Sputtering target with high material utilization rate |
| TWM505503U (zh) | 2015-01-09 | 2015-07-21 | Linco Technology Co Ltd | 真空濺鍍靶材的冷卻裝置 |
-
2017
- 2017-04-11 TW TW106301859F patent/TWD187657S/zh unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM395678U (en) | 2010-08-06 | 2011-01-01 | Total Ind Ltd | Sputtering target with high material utilization rate |
| TWM505503U (zh) | 2015-01-09 | 2015-07-21 | Linco Technology Co Ltd | 真空濺鍍靶材的冷卻裝置 |
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