TWD187658S - 濺鍍靶 - Google Patents

濺鍍靶

Info

Publication number
TWD187658S
TWD187658S TW106301860F TW106301860F TWD187658S TW D187658 S TWD187658 S TW D187658S TW 106301860 F TW106301860 F TW 106301860F TW 106301860 F TW106301860 F TW 106301860F TW D187658 S TWD187658 S TW D187658S
Authority
TW
Taiwan
Prior art keywords
sputtering target
view
holes
front member
viewed
Prior art date
Application number
TW106301860F
Other languages
English (en)
Inventor
田屋和美
Original Assignee
愛發科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 愛發科股份有限公司 filed Critical 愛發科股份有限公司
Priority to TW106301860F priority Critical patent/TWD187658S/zh
Publication of TWD187658S publication Critical patent/TWD187658S/zh

Links

Abstract

【物品用途】;本創作係有關於一種濺鍍靶，具體而言為一種用於濺鍍之濺鍍靶。;【設計說明】;從立體圖1、前視圖及後視圖觀之，本創作之濺鍍靶為長條形狀，且左右兩側部具有複數個孔部。從俯視圖及仰視圖觀之，濺鍍靶由前構件及後構件疊合而成，且後構件的長度尺寸大於前構件的長度尺寸，前構件的寬度尺寸大於後構件的寬度尺寸。從前視圖觀之，前構件的左右兩端呈圓弧狀。從A-A、B-B部分放大圖以及C-C、D-D部分放大圖觀之，複數個孔部呈不規則排列，且複數個孔部的形狀為複數個尺寸相同或不同的圓形狀及橢圓形狀。;本創作的濺鍍靶整體具有雅致的視覺效果，展現出一種柔和美感的原創性。

Description

濺鍍靶
本創作係有關於一種濺鍍靶，具體而言為一種用於濺鍍之濺鍍靶。
從立體圖1、前視圖及後視圖觀之，本創作之濺鍍靶為長條形狀，且左右兩側部具有複數個孔部。從俯視圖及仰視圖觀之，濺鍍靶由前構件及後構件疊合而成，且後構件的長度尺寸大於前構件的長度尺寸，前構件的寬度尺寸大於後構件的寬度尺寸。從前視圖觀之，前構件的左右兩端呈圓弧狀。從A-A、B-B部分放大圖以及C-C、D-D部分放大圖觀之，複數個孔部呈不規則排列，且複數個孔部的形狀為複數個尺寸相同或不同的圓形狀及橢圓形狀。
本創作的濺鍍靶整體具有雅致的視覺效果，展現出一種柔和美感的原創性。
TW106301860F 2017-04-11 2017-04-11 濺鍍靶 TWD187658S (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW106301860F TWD187658S (zh) 2017-04-11 2017-04-11 濺鍍靶

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW106301860F TWD187658S (zh) 2017-04-11 2017-04-11 濺鍍靶

Publications (1)

Publication Number Publication Date
TWD187658S true TWD187658S (zh) 2018-01-01

Family

ID=89070931

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106301860F TWD187658S (zh) 2017-04-11 2017-04-11 濺鍍靶

Country Status (1)

Country Link
TW (1) TWD187658S (zh)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM395678U (en) 2010-08-06 2011-01-01 Total Ind Ltd Sputtering target with high material utilization rate
TWM505503U (zh) 2015-01-09 2015-07-21 Linco Technology Co Ltd 真空濺鍍靶材的冷卻裝置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM395678U (en) 2010-08-06 2011-01-01 Total Ind Ltd Sputtering target with high material utilization rate
TWM505503U (zh) 2015-01-09 2015-07-21 Linco Technology Co Ltd 真空濺鍍靶材的冷卻裝置

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