TWD179917S - Part of the roller used for cleaning the substrate - Google Patents

Abstract

[Use of article] The article designed in this design is a roller for cleaning substrates, which is used to clean the abrasive debris attached to the surface of substrates (semiconductor wafers, etc.) that have been subjected to polishing treatment. For example, a pair of these articles are arranged to face each other up and down in the cleaning device, and a substrate is arranged in the gap. The article is rotated while the substrate is rotated on a horizontal surface to perform the cleaning process. ;[Design Description];The difference from the original design is that the design of the grinding part of the roller in this case is slightly different from the original design. These differences are subtle and do not affect the similarity between the two cases. ;The rear view is symmetrical to the front view, and the bottom view is symmetrical to the top view, so they are omitted. ; The solid line part disclosed in the drawing is the part where the design of this case is advocated, and the dotted line part is the part of the case where the design is not advocated. ;The dotted chain line disclosed in the diagram defines the scope of the claim in this case. The dotted chain line itself is a part of the design that is not claimed in this case.