TW593974B - Micro-mirror inspecting method and its inspecting apparatus - Google Patents

Micro-mirror inspecting method and its inspecting apparatus Download PDF

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Publication number
TW593974B
TW593974B TW92118164A TW92118164A TW593974B TW 593974 B TW593974 B TW 593974B TW 92118164 A TW92118164 A TW 92118164A TW 92118164 A TW92118164 A TW 92118164A TW 593974 B TW593974 B TW 593974B
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Taiwan
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micromirror
patent application
scope
light source
item
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TW92118164A
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Chinese (zh)
Inventor
Chien-Fong Kuo
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Benq Corp
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Abstract

A kind of micro-mirror inspecting method includes the following steps. Micro-mirror devices are first disposed on the micro-mirror supporting face of the support stand. Then, a light source is used to emit light beam toward the micro-mirror devices. Light beam is reflected from the micro-mirror to the target face, so as to project a second light spot on the target face. The distance X of the second light spot relative to the reference point is measured so as to calculate the inclined degree of the micro-mirror device on the support stand.

Description

593974 五、發明說明(1) ------- 一、 發明所屬之技術領域: ^本發明係有關於—種微鏡檢測方法及其檢測裝置,特 別係有關於一種檢測微鏡元件在組裝後之傾斜度之微鏡檢 測方法及其檢測裝置。 二、 先前技術: 曰“微機電技術發展已久,且逐漸應用於一般生活用品或 是電子產品之中。而美國德州儀器公司開發的數位微鏡元 件DMD (Digital Micromirror Device),即為一種用於 才又衫e又備的反射元件。由數位微鏡元件技術所設計的投影钃_ 機’稱為數碼光輸投影機(DLP,Digital Light ·593974 V. Description of the invention (1) ------- I. Technical field to which the invention belongs: ^ The present invention relates to a micromirror detection method and a detection device thereof, particularly to a detection micromirror element in Micromirror detection method and detection device for inclination after assembly. 2. Prior technology: "Micro-electro-mechanical technology has been developed for a long time, and it is gradually applied to general daily necessities or electronic products. The digital micromirror device (DMD) developed by Texas Instruments Corporation is a kind of application Yu Caiyou has a reflective element. The projection unit designed by digital micromirror element technology is called a digital light projector (DLP, Digital Light ·

Processing),以數位微鏡元件作為成像儀器,反射光投 射圖像到螢幕。其關鍵組件數位微鏡元件是由德州儀器公 司開發研製的一種半導體元件,每一個數位微鏡元件晶片 包含成千上萬的微小的正方形反射鏡片,又稱微鏡。這些 微鏡按照行列緊密排列,每個微鏡代表一個圖元,並可由 相應的ό己憶體在開或關的兩種狀態下控制切換轉動,從而 控制光的反射。 數碼光輸投影機之光學元件繁多,由於數碼光輸投影 機要求之解析度及成像力皆特別嚴格,故製造時之精度及· 公差皆很難掌握。尤其微鏡元件裝設於鏡頭承座上時相對 於鏡頭光軸的傾斜度’其直接關係著成像品質之好壞。但 因微鏡元件為微米製造,所以很難以一般之量測方法量測 其傾斜度。因此鏡頭成品之特性及其品質,往往需透過實Processing), using a digital micromirror element as an imaging instrument, and reflecting light to project an image onto the screen. The key component of the digital micromirror element is a semiconductor element developed by Texas Instruments. Each digital micromirror element wafer contains thousands of tiny square reflective lenses, also called micromirrors. These micromirrors are closely arranged in rows and columns, each micromirror represents a picture element, and can be controlled to switch and rotate by the corresponding memory body in two states of on or off, thereby controlling light reflection. There are many optical components of digital optical transmission projectors. Since the resolution and imaging power required by digital optical transmission projectors are extremely strict, it is difficult to grasp the accuracy and tolerances during manufacturing. In particular, the inclination of the micro-mirror element relative to the optical axis of the lens when it is mounted on the lens holder directly affects the quality of the imaging. However, since the micromirror element is made of micrometers, it is difficult to measure its inclination by a common measurement method. Therefore, the characteristics and quality of the finished lens often require

0535-9869TW(Nl);A03066;HEARTA.ptd 第 5 頁 5939740535-9869TW (Nl); A03066; HEARTA.ptd page 5 593974

際成像之後方能檢測。若在完整級 缺陷,則需重新拆開及組裝,耗#裝完畢後方得知鏡頭有 此,需要能在組裝過程中,即時拾龐大的時間及人力。因 測方法及其檢測裝置,以確保於測其組裝狀況的微鏡檢 /兄碩的品質。 三、發明内容: 本發明即為了要能即時檢測 之-種微鏡檢測方法,其包括下組f狀況,而提你 於承座之微鏡承靠面。再利用光^先將微鏡兀件惠Can only be detected after international imaging. If there is a defect at the complete level, it needs to be disassembled and reassembled. After the assembly is completed, it is known that the lens has this. It needs to be able to pick up a huge amount of time and labor in the assembly process. The testing method and the testing device ensure the quality of the micro-scopy / brothers-in-law for measuring the assembly condition. III. Summary of the Invention: The present invention is a micromirror detection method for real-time detection. The micromirror detection method includes the following group f conditions, and provides you with a micromirror abutment surface of the seat. Reuse the light ^ first the micromirror element

^束攸^鏡凡件反射絲面,並在該乾面上投射出〆 此;ί點。5測該第二光點相對於基準點的距離X,並, 此计异微鏡元件於承座上的傾斜度。 精 J發明亦提供一種可供上述檢測之微鏡檢測裝置,包 2—靶面以及一光源。光源朝向該微鏡元件射出一光 该光束從該微鏡元件反射至該靶面。 一應用本發明之微鏡檢測方法,可快速有效的量測微鏡 凡件裝設於鏡頭承座上時相對於鏡頭光軸的傾斜度。因 此’可以在鏡頭的裝配過程中,直接檢測微鏡元件的組裝 狀況,從而校正微鏡元件的傾斜狀況,提高產品良率。.^ 束 奕 ^ Mirrors reflect the silk surface and project this on the dry surface; 5 Measure the distance X of the second light point from the reference point, and calculate the inclination of the micromirror element on the holder. Jing J invention also provides a micromirror detection device for the above-mentioned detection, including a target surface and a light source. The light source emits a light toward the micromirror element, and the light beam is reflected from the micromirror element to the target surface. An application of the micromirror detection method of the present invention can quickly and effectively measure the inclination of the micromirror relative to the optical axis of the lens when it is mounted on the lens holder. Therefore, the assembly condition of the micromirror element can be directly detected during the lens assembly process, thereby correcting the tilting condition of the micromirror element and improving the product yield. .

四、實施方式: 首先先說明承座之構造參照第1 a圖,承座丨〇 0包括一 鏡頭承靠面11 0以及鏡頭承靠點丨丨i。參照第丨b圖,其係顯 示承座1 0 0之A方向側視圖,承座1 〇 〇更包括一微鏡承靠面Fourth, the embodiment: First, the structure of the holder is described with reference to FIG. 1a. The holder 丨 0 0 includes a lens bearing surface 11 0 and a lens bearing point 丨 丨 i. Referring to Figure 丨 b, it shows a side view of the bearing 100 in the direction of A. The bearing 100 also includes a micromirror bearing surface.

〇535-9869TWF(Nl);A03066;HEARTA.ptd〇535-9869TWF (Nl); A03066; HEARTA.ptd

593974593974

1 2 Ο,微鏡承靠面1 2 0上具有微鏡承靠點丨2 i以及開口丨2 2。 微鏡元件即藉微鏡承靠點1 2 1設於微鏡承靠面1 2 〇之上 本發明所欲檢測的’即為微鏡元件在裝設於微鏡承靠而 1 20上時,是否有過度傾斜的情形。 以下先說明本發明之微鏡檢測裝置之結構,再說明 用該微鏡檢測裝置之微鏡檢測方法。 使 參照第2a圖,本發明之微鏡檢測裝置,包括一乾面 1 5 0以及一光源1 4 0。光源朝向微鏡元件丨3 〇射出一光束 1 6 0,該光束1 6 0從該微鏡元件1 3 0反射至該把面丨5 〇。 參照第2 b圖,把面1 5 0上具有刻度以及一基準點1 $ ^ 藉由光束160從該微鏡元件130反射至該乾面150之第二光 點152的相對於基準點151的位置,可得知微鏡元件的傾斜 狀況。 、广 上述之光源1 4 0可以為雷射。 上述之光源140可設於靶面150之上。 上述之靶面1 5 0其材質可以為紙。 參照第3a圖,上述之微鏡檢測裝置可更包括一第一失 具185 ’用以夾持該承座。以及一第二夾具180,用以夾持 該光源。該第一夾具185以及第二夾具180可設於底座170 之上。 參照第3b圖,該第一夾具185以及第二夾具180該可具 有一夾具主體181,一檔板182,一調制機構183以及一固 定件1 8 4。該檔板1 8 2設於該夾具主體1 8 1中。該調制機構 183穿過該夾具主體181並與該檔板182接觸,藉由調整該1 2 0, the micromirror bearing surface 1 2 0 has a micromirror bearing point 丨 2 i and an opening 丨 2 2. The micro-mirror element is set on the micro-mirror bearing surface 1 2 1 on the micro-mirror bearing surface 1 2 0. The “mirror element” to be detected in the present invention is that when the micro-mirror element is installed on the micro-mirror support and 1 20 Whether there is excessive tilt. The structure of the micromirror detection device of the present invention will be described first, and then the micromirror detection method using the micromirror detection device will be described. Referring to FIG. 2a, the micromirror detection device of the present invention includes a dry surface 150 and a light source 140. The light source emits a light beam 160 toward the micromirror element 315, and the light beam 160 reflects from the micromirror element 130 to the handle surface 501. Referring to FIG. 2b, the scale 150 and a reference point 1 $ ^ on the surface 150 are reflected from the micromirror element 130 to the second light spot 152 of the dry surface 150 by the light beam 160 with respect to the reference point 151 Position, we can know the tilt of the micromirror element. The above light source 140 can be a laser. The above-mentioned light source 140 may be disposed on the target surface 150. The target surface 150 can be made of paper. Referring to FIG. 3a, the above-mentioned micromirror detection device may further include a first jig 185 'for holding the holder. And a second fixture 180 for holding the light source. The first jig 185 and the second jig 180 can be disposed on the base 170. Referring to FIG. 3b, the first jig 185 and the second jig 180 may have a jig body 181, a baffle plate 182, a modulation mechanism 183, and a fixing member 184. The baffle plate 1 8 2 is disposed in the clamp body 1 8 1. The modulation mechanism 183 passes through the jig body 181 and contacts the baffle plate 182.

0535-9869TWF(Nl);A03066;HEARTA.ptd 第7頁 593974 五、發明說明(4) 調制機構183,可調整該檔板182之位置,並將工件夾持於 該檔板1 8 2與該夾具主體1 8 1之間。該固定件1 8 4設於該夾 具主體181之下,夾具主體181藉該固定件184固定於該底 座1 70之上。 再參照第2a圖,本發明之微鏡檢測方法,包括下述步 驟:首先,先定義出光源140的位置。先將一標準鏡135設 於該承座100之該微鏡承靠面120。標準鏡135係為水平程 度合於規定的鏡面,標準鏡135裝設於微鏡承靠面120時, 即為預設之未傾斜的狀況。再利用該光源1 40朝向該標準 鏡135射出該光束160,該光束160從該標準鏡135反射至該 乾面1 5 0,並在該靶面1 5 0上投射出一第一光點1 5 5,參照 第2b圖。此時,調整該光源丨4〇之位置,使該第一光點丨 投射至該基準點1 5 1。藉以上步驟,可定義光源丨4 〇的標準 位置。 接下來,進行量測微鏡元件傾斜度的步驟,依然先參 照第2 a圖,先將微鏡元件1 3 〇設於承座1 〇 〇之微鏡承靠面 1 2 0。再利用光源1 4 〇朝向微鏡元件丨3 〇射出光束丨6 〇。光束 1 6 0從微鏡元件1 3 〇反射至靶面1 5 〇,並在該靶面1 5 〇上投射 出一第二光點1 5 2,參照第2b圖。量測該第二光點1 5 2相對 於基準點1 5 1的距離X,並藉此計算微鏡元件丨3 〇於承座丨〇 〇 $ 上的傾斜度。 其計算傾斜度的方式,參照第4圖,利用光源丨4 〇與微 鏡兀件1 3 0之間的距離γ,以及第二光點丨5 2相對於基準點0535-9869TWF (Nl); A03066; HEARTA.ptd Page 7 593974 V. Description of the invention (4) The modulation mechanism 183 can adjust the position of the baffle 182 and clamp the workpiece between the baffle 1 8 2 and the Between the clamp body 1 8 1. The fixing member 1 84 is disposed under the clamp body 181, and the clamp body 181 is fixed on the base 1 70 by the fixing member 184. Referring to FIG. 2a again, the micromirror detection method of the present invention includes the following steps: First, the position of the light source 140 is first defined. First, a standard mirror 135 is set on the micromirror bearing surface 120 of the base 100. The standard mirror 135 is a mirror surface that is horizontally aligned with a predetermined level. When the standard mirror 135 is installed on the micromirror bearing surface 120, it is a preset untilted condition. Then, the light source 140 is used to emit the light beam 160 toward the standard mirror 135, and the light beam 160 is reflected from the standard mirror 135 to the dry surface 150, and a first light spot 1 is projected on the target surface 150. 5 5 Refer to Figure 2b. At this time, the position of the light source 丨 40 is adjusted so that the first light point 丨 is projected to the reference point 151. Through the above steps, the standard position of the light source 4 can be defined. Next, to perform the step of measuring the inclination of the micromirror element, referring to FIG. 2a, the micromirror element 1330 is first set on the micromirror bearing surface 120 of the base 100. The light source 14 is used to emit a light beam 6 toward the micromirror element 3 0. The light beam 160 is reflected from the micromirror element 130 to the target surface 150, and a second light spot 152 is projected on the target surface 150, referring to FIG. 2b. Measure the distance X of the second light point 15 2 from the reference point 1 51, and calculate the inclination of the micromirror element 丨 30 on the support 丨 〇 〇 $. The way to calculate the inclination, referring to Fig. 4, uses the distance γ between the light source 丨 4 0 and the micromirror element 130, and the second light point 5 2 relative to the reference point.

593974593974

151的距離x,以三角函數公式以4/(7),可求得微鏡元 件130的傾斜度角Θ。利用傾斜度角0以及微鏡元件130本 身的長度’可以得知所需要補償厚度T。因此可在微鏡元 =130#的傾斜方位墊入厚度為了的墊片,或是以其他方式進-行補償’以修正微鏡元件丨3 〇的傾斜。 再回到第2a圖,本發明之檢測方法亦可用於檢測承座 100的平行度,其包括下述步驟:首先將標準鏡135設於該 承座100之微鏡承靠面12〇。再利用光源14〇朝向標準鏡135 射出光束160,光束16〇從標準鏡135反射至靶面15〇,並在钃 靶面150上投射出第一光點155(參照第⑶圖)。然後調整光 f 140之位置,使第一光點155投射至基準點151。再將該 ^準鏡135設於該承座100之鏡頭承靠面丨1〇(參照第2& 圖),该光束160從該標準鏡135反射至靶面15〇,並在靶 1_5 0、面上投射出第二光點152(參照第2b圖)。最後,量測第 一光點152相對於該基準點丨51的位置;並計算該微鏡承靠 面1 2 0與該鏡頭承靠面丨丨〇的平行度。 計算承座100平行度的方式,可與上述之計算微鏡元 件傾斜度的方式相同,以三角函數的方式求得。 由於鏡頭承靠面11 〇是否傾斜直接相關於鏡頭的光軸❿ 角度,因此可依照上述之承座平行度的檢測結果,對各部 位元件的尺寸誤差進行補償。 一應用本發明之微鏡檢測方法,可快速有效的量測微鏡 凡件裝設於鏡頭承座上時相對於鏡頭光軸的傾斜度。因The distance x of 151 is 4 / (7) using a trigonometric formula, and the inclination angle Θ of the micromirror element 130 can be obtained. Using the inclination angle 0 and the length of the micromirror element 130 itself, it is possible to know the thickness T to be compensated. Therefore, it is possible to insert a gasket with a thickness of 50 ° in the tilted orientation of the micromirror element = 130 #, or to compensate in other ways to correct the tilt of the micromirror element. Returning to Fig. 2a, the detection method of the present invention can also be used to detect the parallelism of the pedestal 100, which includes the following steps: First, a standard mirror 135 is set on the micromirror abutment surface 12 of the pedestal 100. Then, the light source 140 is used to emit a light beam 160 toward the standard mirror 135, and the light beam 160 is reflected from the standard mirror 135 to the target surface 150, and a first light spot 155 is projected on the target surface 150 (see FIG. 3D). Then, the position of the light f 140 is adjusted so that the first light spot 155 is projected to the reference point 151. The quasi-mirror 135 is then set on the lens bearing surface of the pedestal 100 (refer to Figure 2 & Figure), the light beam 160 is reflected from the standard mirror 135 to the target surface 150, and at the target 1-5, A second light spot 152 is projected on the surface (see FIG. 2b). Finally, the position of the first light spot 152 relative to the reference point 51 is measured; and the parallelism of the micromirror bearing surface 1 2 0 and the lens bearing surface 丨 丨 0 is calculated. The method for calculating the parallelism of the pedestal 100 can be obtained by the trigonometric function in the same manner as the above-mentioned method for calculating the inclination of the micromirror element. Since the tilt of the lens bearing surface 11 〇 is directly related to the angle of the optical axis 镜头 of the lens, the dimensional error of each component can be compensated according to the above-mentioned detection results of the parallelism of the bearing. An application of the micromirror detection method of the present invention can quickly and effectively measure the inclination of the micromirror relative to the optical axis of the lens when it is mounted on the lens holder. because

593974 五、發明說明(6) 此,可以在鏡頭的裝配過程中,直接檢測微鏡元件的組裝 狀況,從而校正微鏡元件的傾斜狀況,提高產品良率。 雖然本發明已於較佳實施例揭露如上,然其並非用以 限定本發明,任何熟習此項技藝者,在不脫離本發明之精 神和範圍内,仍可作些許的更動與潤飾,因此本發明之保 護範圍當視後附之申請專利範圍所界定者為準。593974 V. Description of the invention (6) Therefore, during the lens assembly process, the assembly status of the micromirror element can be directly detected, thereby correcting the tilting condition of the micromirror element and improving the product yield. Although the present invention has been disclosed as above in the preferred embodiment, it is not intended to limit the present invention. Any person skilled in the art can still make a few changes and decorations without departing from the spirit and scope of the present invention. The scope of protection of the invention shall be determined by the scope of the attached patent application.

05 35-9869TWF(N1);A03066;HEARTA.p t d 第10頁 593974 圖式簡單說明 第1 a圖係顯示習知承座之立體; 第1 b圖係顯示習,知承座之後側視圖; 第2a圖係顯示本發明之微鏡檢測裝置之示意圖; 第2 b圖係顯示本發明之微鏡檢測裝置之乾面的示意 圖, 第3a圖係顯示本發明之微鏡檢測裝置之示意圖; 第3b圖係顯示本發明之微鏡檢測裝置之夾具的示意 圖; 第4圖係顯示本發明之傾斜度計算方式之輔助說明 圖。 符號說明: I 0 0〜承座 II 0〜鏡頭承靠面 11 1〜鏡頭承靠點 1 2 0〜微鏡承靠面 1 2 1〜微鏡承靠點 1 2 2〜開口 1 3 0〜微鏡元件 1 3 5〜標準鏡 4 1 4 0〜光源 150〜靶面 1 5 1〜基準點 1 5 2〜第二光點05 35-9869TWF (N1); A03066; HEARTA.ptd Page 10593974 Brief description of the diagram Figure 1a shows the three-dimensional view of the conventional bearing; Figure 1b shows the side view of the conventional bearing; Figure 2a is a schematic diagram of the micromirror detection device of the present invention; Figure 2b is a schematic diagram of the dry surface of the micromirror detection device of the present invention; Figure 3a is a schematic diagram of the micromirror detection device of the present invention; Figure 3b Figure 4 is a schematic diagram showing the fixture of the micromirror detection device of the present invention; Figure 4 is an auxiliary explanatory diagram showing the tilt calculation method of the present invention. Explanation of Symbols: I 0 0 ~ Block II 0 ~ Lens bearing surface 11 1 ~ Lens bearing point 1 2 0 ~ Micro mirror bearing surface 1 2 1 ~ Micro mirror bearing point 1 2 2 ~ Opening 1 3 0 ~ Micromirror element 1 3 5 to standard mirror 4 1 4 0 to light source 150 to target surface 1 5 1 to reference point 1 5 2 to second light point

0535 -9869TWF(N1);A03066;HEARTA.p t d 第11頁 5939740535 -9869TWF (N1); A03066; HEARTA.p t d p. 11 593974

Claims (1)

593974 六'申請專利範圍 1 · 一種微鏡檢測裝置,用於檢測一微鏡元件於一承座 上的傾斜度,包括: 一把面;以及 一光源,該光源朝向該微鏡元件射出一光束,該光束 從該微鏡元件反射至該靶面。 2.如申請專利範圍第1項所述之微鏡檢测裝置,其 中,該微鏡檢測裝置更包括一第一夾具,該第一夾具用以 失持該承座。 3 ·如申請專利範圍第1項所述之微鏡檢測裝置,其 中,該微鏡檢測裝置更包括一第二夾具,該第二夾具用以‘ 失持該光源。 . 4.如申請專利範圍第1項所述之微鏡檢測裝置,其 中,該光源為一雷射。 5 ·如申請專利範圍第1項所述之微鏡檢測裝置,其 中,該靶面之材質為紙。 6. 如申請專利範圍第1項所述之微鏡檢測裝置,其 中,該光源設於該靶面之上。 7. —種承座平行度檢測方法,包括下述步驟: 將一標準鏡設於該承座之一微鏡承靠面; 利用一光源朝向該標準鏡射出一光束,該光束從該標4 準鏡反射至一靶面,並在該靶面上投射出一第一光點; 調整該光源之位置,使該第一光點投射至一基準點; 將該標準鏡設於該承座之一鏡頭承靠面,該光束從該 標準鏡反射至該靶面,並在該靶面上投射出一第二光點;593974 Six 'patent application scope 1 · A micromirror detection device for detecting the inclination of a micromirror element on a holder, including: a surface; and a light source, which emits a light beam toward the micromirror element , The light beam is reflected from the micromirror element to the target surface. 2. The micromirror detection device according to item 1 of the scope of the patent application, wherein the micromirror detection device further includes a first jig for holding the holder. 3. The micromirror detection device according to item 1 of the scope of the patent application, wherein the micromirror detection device further includes a second jig, and the second jig is used to ‘miss the light source. 4. The micromirror detection device according to item 1 of the scope of patent application, wherein the light source is a laser. 5. The micromirror detection device according to item 1 of the scope of patent application, wherein the material of the target surface is paper. 6. The micromirror detection device according to item 1 of the scope of patent application, wherein the light source is disposed on the target surface. 7. A method for detecting the parallelism of a pedestal, comprising the following steps: setting a standard mirror on a micromirror abutment surface of the pedestal; using a light source to emit a light beam toward the standard mirror, the light beam from the target 4 The collimator reflects to a target surface and projects a first light spot on the target surface; adjusts the position of the light source so that the first light spot projects to a reference point; sets the standard mirror on the base A lens bearing surface, the light beam is reflected from the standard mirror to the target surface, and a second light spot is projected on the target surface; 0535-9869TWF(Nl);A03066;HEARTA.ptd 第13頁 593974 六、申請專利範圍 量測該第二光點相對於該基準點的位置;以及 計算該微鏡承靠面與該鏡頭承靠面的平行度。 8. 如申請專利範圍第7項所述之承座平行度檢測方 法,其中,該光源為一雷射。 9. 如申請專利範圍第7項所述之承座平行度檢測方 ’ 法,其中,該把面之材質為紙。 1 0.如申請專利範圍第7項所述之承座平行度檢測方 法,其中,該承座利用一第一夾具夾持。 1 1.如申請專利範圍第7項所述之承座平行度檢測方 法,其中,該光源設於該靶面之上。 丨 1 2.如申請專利範圍第7項所述之承座平行度檢測方 . 法,其中,該光源利用一第二夾具夾持。 1 3.如申請專利範圍第1 2項所述之承座平行度檢測方 法,其中,調整該光源之位置,使該第一光點投射至該基 準點之步驟,乃藉由調整該第二夾具而調整該光源之位 置。 1 4. 一種微鏡檢測方法,包括下述步驟: 將一微鏡元件設於一承座之一微鏡承靠面; 利用一光源朝向該微鏡元件射出一光束,該光束從該 微鏡元件反射至一靶面,並在該靶面上投射出一第二光 __ 點; 量測該第二光點相對於一基準點的距離X ;以及 計算該微鏡元件於該承座上的傾斜度。 1 5.如申請專利範圍第1 4項所述之微鏡檢測方法,其0535-9869TWF (Nl); A03066; HEARTA.ptd page 13 593974 6. Apply for a patent to measure the position of the second light point relative to the reference point; and calculate the micromirror bearing surface and the lens bearing surface Parallelism. 8. The method for detecting the parallelism of a seat as described in item 7 of the scope of patent application, wherein the light source is a laser. 9. The method for detecting the parallelism of a seat as described in item 7 of the scope of patent application, wherein the material of the handle is paper. 10. The method for detecting the parallelism of a socket according to item 7 of the scope of patent application, wherein the socket is held by a first jig. 1 1. The method for detecting the parallelism of a bearing as described in item 7 of the scope of patent application, wherein the light source is disposed on the target surface.丨 1 2. The method for detecting the parallelism of a bearing according to item 7 of the scope of patent application, wherein the light source is held by a second fixture. 1 3. The method for detecting the parallelism of a seat according to item 12 of the scope of patent application, wherein the step of adjusting the position of the light source so that the first light spot is projected to the reference point is by adjusting the second The position of the light source is adjusted by a jig. 1 4. A method for detecting a micromirror, comprising the following steps: setting a micromirror element on a micromirror abutting surface of a holder; using a light source to emit a light beam toward the micromirror element, and the light beam from the micromirror The element reflects to a target surface, and a second light __ point is projected on the target surface; the distance X of the second light point from a reference point is measured; and the micromirror element is calculated on the holder The inclination. 1 5. The micromirror detection method described in item 14 of the scope of patent application, which 0535-9869TWF(Nl);A03066;HEARTA.ptd 第14頁 593974 六、申請專利範圍 中,在將該微鏡元件設於該承座之該微鏡承靠面之步驟之 前,更包括下述步驟: 將一標準鏡設於該承座之該微鏡承靠面; 利用該光源朝向該標準鏡射出該光束,該光束從該標 準鏡反射至該靶面,並在該靶面上投射出一第一光點; 調整該光源之位置,使該第一光點投射至該基準點。 1 6.如申請專利範圍第1 4項所述之微鏡檢測方法,其 中,更包括一量測該光源與該微鏡元件之間距離Y的步 驟。 1 7.如申請專利範圍第1 6項所述之微鏡檢測方法,其 中,計算該微鏡元件於該承座上的傾斜度的步驟,乃利用 該光源與該微鏡元件之間距離Y以及該第二光點相對於一 基準點的距離X,以三角函數計算而達成。 1 8.如申請專利範圍第1 7項所述之微鏡檢測方法,其 中, 2^= tan'V—) ^ V ,0為該微鏡元件於該承座上的傾斜角。 1 9.如申請專利範圍第1 4項所述之微鏡檢測方法,其 中,該光源為一雷射。 2 0.如申請專利範圍第1 4項所述之微鏡檢測方法,其 中,該靶面之材質為紙,其上繪有刻度。 2 1.如申請專利範圍第1 4項所述之微鏡檢測方法,其 中,該承座利用一第一夾具夾持。 2 2.如申請專利範圍第1 4項所述之微鏡檢測方法,其0535-9869TWF (Nl); A03066; HEARTA.ptd Page 14 593974 6. In the scope of patent application, before the step of setting the micromirror element on the micromirror abutment surface of the base, the following steps are further included. : Setting a standard mirror on the bearing surface of the micromirror; using the light source to emit the light beam toward the standard mirror, the light beam is reflected from the standard mirror to the target surface, and a target is projected on the target surface A first light point; adjusting the position of the light source so that the first light point is projected to the reference point. 16. The method for detecting a micromirror according to item 14 of the scope of patent application, further comprising a step of measuring a distance Y between the light source and the micromirror element. 1 7. The micromirror detection method according to item 16 of the scope of the patent application, wherein the step of calculating the inclination of the micromirror element on the holder uses the distance Y between the light source and the micromirror element. And the distance X of the second light point from a reference point is calculated by a trigonometric function. 1 8. The micromirror detection method according to item 17 in the scope of the patent application, wherein 2 ^ = tan'V—) ^ V, 0 is the inclination angle of the micromirror element on the base. 19. The micromirror detection method according to item 14 of the scope of patent application, wherein the light source is a laser. 20. The micromirror detection method according to item 14 of the scope of the patent application, wherein the target surface is made of paper and a scale is drawn on it. 2 1. The micromirror detection method according to item 14 of the scope of patent application, wherein the holder is held by a first jig. 2 2. The micromirror detection method described in item 14 of the scope of patent application, which 053 5-9869TWF(N1);A03066;HEARTA.p t d 第15頁 593974 六、申請專利範圍 中,該光源設於該靶面之上。 2 3.如申請專利範圍第1 4項所述之微鏡檢測方法,其 中,該光源利用一第二夾具夾持。 2 4.如申請專利範圍第1 5項所述之微鏡檢測方法,其 中,調整該光源之位置,使該第一光點投射至該基準點之 步驟,乃藉由調整該第二夾具而調整該光源之位置。053 5-9869TWF (N1); A03066; HEARTA.p t d page 15 593974 6. In the scope of patent application, the light source is set on the target surface. 2 3. The micromirror detection method according to item 14 of the scope of patent application, wherein the light source is held by a second jig. 2 4. The micromirror detection method according to item 15 of the scope of patent application, wherein the step of adjusting the position of the light source so that the first light spot is projected to the reference point is by adjusting the second fixture Adjust the position of the light source. 0535-9869TWF(N1);A03066;HEARTA.p t d 第16頁0535-9869TWF (N1); A03066; HEARTA.p t d p.16
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107643057A (en) * 2017-11-07 2018-01-30 中航国画(上海)激光显示科技有限公司 A kind of lens assembling vertical detection device and its detection method
CN108507498A (en) * 2017-02-28 2018-09-07 上海微电子装备(集团)股份有限公司 Micro mirror monitoring method and device and lighting device and litho machine

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108507498A (en) * 2017-02-28 2018-09-07 上海微电子装备(集团)股份有限公司 Micro mirror monitoring method and device and lighting device and litho machine
CN108507498B (en) * 2017-02-28 2020-01-24 上海微电子装备(集团)股份有限公司 Micro-mirror monitoring method and device, illumination device and photoetching machine
CN107643057A (en) * 2017-11-07 2018-01-30 中航国画(上海)激光显示科技有限公司 A kind of lens assembling vertical detection device and its detection method

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