TW586158B - Reinforced chemical mechanical planarization belt - Google Patents

Abstract

A processing belt for use in chemical mechanical planarization (CMP), is provided. The processing belt is reinforced with one of a mesh belt and a woven fabric. The processing belt includes a polymeric material encasing the mesh belt to define the processing belt. The processing belt is fabricated so that the mesh belt forms a continuous loop within the polymeric material, and the mesh belt is constructed as a grid of intersecting members. The intersecting members are joined at fixed joints to form a rigid support structure for the processing belt.

Description

586158 V. Description of the invention (1) 1. [Technical lock domain to which the invention belongs] The present invention relates to a wafer preparation tape, and more specifically, it relates to the manufacture of a tool belt used in a chemical mechanical planarization device. 2. [Previous Technology] In the manufacture of semiconductor devices, usually a plurality of thin film layers are arranged on a substrate, and their characteristics are defined in the thin film layer. During the manufacturing process, the surface shape of the substrate or wafer will become irregular, and the degree of uncorrected irregularity will increase with the subsequent increase of the film layer. Chemical mechanical planarization (CMP) has been developed into a manufacturing step for planarizing the surface of semiconductor wafers and performing additional processes including polishing, wiping, substrate cleaning, and etching processes. By controlling each other to ensure that the entire device package is supported, the operation table is polished to provide the tape. The CMP process includes applying pressure to a substrate or wafer with an operating surface. The operation surface and the wafer are both rotated, rotated, or moved independently and independently to generate the friction required for planarization, and the surface of each wafer is subjected to a consistent and controllable treatment. The traditional CMP contains a linear belt operating system, in which a belt with an operating surface = more than one roller or roller, which makes the belt move with a rotation path, the path presents _ the pressure on the wafer Flat =. Wafers are usually supported and rotated by a wafer carrier, and are placed below a belt that moves around their end. The platform t has a flat surface through which the belt passes, and the wafer is pressured 1 as a surface 'and the belt leans against a flat surface provided by the platform

Page 5 586158 Description of the invention (2) quilt: ί ::: strong: grinding: placed in aqueous solution. ㈣Knowledge research aids and strengthens flattening or other 〇1) process. The social structure / device includes a CMP operation device with a circular lining used as the operating surface, Ιίί5, a roadway system similar to a circular CMP operation device, and one machine is installed: a man and a P operation device, and other The power of the CMP operation is set and structured, and the chemical and mechanical conductor wafers are used = the approach = the semi-hidden process on which the structure is fabricated. — "Wash, polish, wipe, clean or provide it in the linear belt CMP system.-Tolerable The belt and the operating surface are usually made to perform a precise and controllable pressure f The stable structure, and-surface. In addition to the belt and the stretching and shrinkage caused by the surface around the stable operation table, the operation of the first wheel moves in a humid environment, which is connected to the belt and operation by grinding and washing. The surface is usually on a surface usually caused by a plurality of materials 材料 $ liquid. Belt and operation layer,-buffer layer and-or more = 矣 For example:-do not record steel support bonding, joining, joining and other methods Bonding surface layer. 谠 Multiple layers are formed by a continuous continuous tape-like structure in CMP to form an operating surface with an outward-facing operating surface. In the wafer, pressure is applied to the beginning of the layer with the multiple layers as described above. The CMP belt needs the support required for stretching, but the manufacture of the belt provides the avoidance of thread phase. Because of the normal use, the belt structure is made into a humid CMP environment and deteriorated. For example, the green break between layers will be transmitted by the sea.衣 见 * This may cause the belt to be difficult to correct Operation,

586158

5. Description of the invention (3) And for the end point detection system, the band will encounter the problem of rape at the beginning. The use of linear strips in linear strip CMP systems is expensive to produce and time-consuming to replace. Replacing the linear belt requires the CMP system to be suspended, leading to reduced production and increased production costs. Linear tapes may encounter problems, such as peeling or separation between layers, due to factors such as shrinkage and tensile force when used, adhesion or other bonding methods that break over time and are wet In the CMP environment. In view of the above-mentioned shortcomings, we need a method, process and device to manufacture a linear CMP operating belt, which is resilient to the pressure used, is not easy to peel or separate, is easy to manufacture and low cost, and is easy to use in multiple cmp devices and environments. Operation. III. [Summary of the Invention] Shi Pan said that the present invention can meet these needs, by providing a strengthened J a "physical CMP operation belt. | The invention can be implemented in many ways, including =, device, system, system, element or Method, etc. One of the present invention will be described below.

In the embodiment of the human mind i, a cmp operation belt is disclosed. It includes one polymer, one continuous, and one continuous loop to determine the cmp operation belt. The core is defined as one of the polymer material's sturdy continuous teacher's holes. Here comes a CMP operation belt. It contains -I Material I is shaped as a -continuous loop to determine the CMP operation ^

586158 V. Description of the invention (4) A belt and a reinforced braid embedded between the polymer material and an additional polymer layer. The reinforced braid is defined as a continuous loop between the polymer material and the additional polymer layer. The invention has many advantages. A significant benefit and advantage of the present invention is that it greatly increases the useful life of the polymer CMP process belt in the CMP process. Unlike the linear CMP operating belt of typical conventional techniques, the reinforced core of the present invention provides the required strength, support, and elasticity, and the layers and layers that are combined in a stack will not peel or separate. The reinforced core of the present invention is enclosed in the structure of the operating belt 'so it is integrated with the structure of the belt. The polymer material is shaped around and passed through the reinforced core, or sprayed and passed through the reinforced core, which greatly increases the service life of the " CMP operation belt in the CMP process. Another advantage is reduced cost and simplified manufacturing. Unlike a typical operating belt, one embodiment of the present invention includes a single polymer group with abrasive belts around it. In another embodiment, the present invention includes a supporting and dominant polymer material structure. Several layers: adhesives, braids or other bonding materials = without compromising strength, support and elasticity. Peeling Another advantage is the ability to easily integrate the information of the present invention. The present invention; Example f Optical end-point transverse survey user ", which can be combined with end-point detection to learn from strength, support and elasticity. In addition, the diners will not be involved in the need to increase the possibility of peeling or separation, or the testing device does not have another advantage: the use of the present invention is particularly useful. Choose. Examples of the present invention; imitating two special applications provides a plurality of examples according to specific conditions or process needs, by

方式, L method of implementation] t invention discloses a CMP operation belt: two ", the operation belt contains a reinforced sieve square; in a better practice, around the sieve belt to define the operation belt one /, one The polymer f-composite material is composed of the operation belt used in the CMP process by the weaver. It is reinforced by the material. In the following description, many complete understandings of the invention are proposed. However, here we go to the $ section to provide a clear explanation of the situation; ::: clarify the process operation of the well-known process with = in-= ^ do not go into details ... Avoid the book Figure 1A shows a typical linear band CMP system 1 〇. A linear CMP operation 絜 〇2 mounted around the two rollers 104. a processing wafer 〇06 attached to a linear tape CMP system 100 wafer carrier 108. The wafer carrier 108 is caused to rotate 110, which causes the wafer 106 to rotate, and the rotation of the rollers 〇〇4 causes the linear CMP operation belt 10 to move in the direction 112. There is a wafer 106 attached to it The rotating wafer carrier 108 is pressed to the linear CMP operation belt 10 that moves around the roller 104 in the direction 1 1 2 2. The platform 114 is located below the linear CMP operation belt 1 0 2 relative to the wafer carrier 108 with the wafer 106 attached thereto (that is, the linear CMP operation belt 10 02 is opposite the wafer conveyor 108 Another 586158 V. Description of the invention (6) side). The platform 114 provides additional support so that the wafer 106 can be applied with sufficient pressure to the linear CMP operation belt 102 to achieve the desired planarization or other CMP process Moreover, a flat surface is provided for consistent and measurable processing. Fig. 1B is a side view of the above-mentioned linear belt CMP system.

It can be understood from FIGS. 1A and 1B that when the linear belt CMP system 100 is in operation, the linear CMP operating belt 102 is subjected to many pressures. For example, when a point on the linear CMP operation belt 102 passes through the roller 104, it receives a tensile force, and the outer CMP area of the linear CMP operation belt 102 receives a larger tensile force than its inner area. . When the point on the linear CMP operating belt 102 continues to pass through and away from the roller 104, it receives a contraction force because the belt straightens out and passes the top or bottom end of the linear belt CMP system 1000, and goes to the next The roller 104 moves. In addition, the linear belt CMP operating system 100 subject the linear Cmp operation belt 102 to operating pressure, such as the pressure of the wafer against the operating surface, the rotating wafer 106 and the linear CMP operation belt 102. Friction contact, and other such operating pressures. 〃

FIG. 2A is a cross-sectional view of a typical linear CMP operation zone 120. FIG. The exemplary linear CMP operation zone 120 includes three layers 122, 124, and 126. The top polymer layer 122 provides an operating surface that is pressed by the wafer 106 (see Figs. U and ^) during the CMP process. A buffer layer 24 is usually provided between the polymer layer 122 and the support layer or the base layer 126, and provides a gold layer between the composite layer 1 22 and the hard support layer or the base layer 26. ΪΓ or base layer 126 is a solid stainless steel or similar metal strip, and a buffer layer 124 and a polymer operating surface are formed thereon. The multiple layers are usually bonded by casting one stomach or another on one layer

586158

Similar to the joining method of two layers. FIG. 2B is a cross-sectional view of the typical linear CMP operating belt 120 in FIG. 2A with an open area 1 28 of a belt, which is used in conjunction with an on-site optical end point detection (EPD) system. As can be seen from FIG. 2B, a portion of the linear CMP operation belt 120 is removed, including a support layer or a base layer 126, a buffer layer 124, and an operation surface polymer layer 122. When an open area 128 is formed in a linear cmp operation belt 120, an open area 1 2 of a sufficient size for implementation as an optical epd is generated in the linear operation belt 1220. Generally, a small circular, oval, or square area of sufficient size including a linear CMP operating zone 120, the size of which varies depending on the particular operating device, and its usual dimensions are approximately 1.25 inches long and 0.75 inches wide, so It is not the full width of the linear CMP operating belt 1 2 0, otherwise such a large size will seriously weaken the structural strength of the linear CMP operating belt 1 20. The manufacturing of the open area used as the epd 28 usually involves forming a hole or open area in the linear CMP operation belt 120 and penetrating each of the operation surface polymer layer 122, the buffer layer 124, and the support layer or the base layer 126. As mentioned above, when the linear CMP operating system 100 (see Figures 丨 A and 丨 β) is operating normally, the pulling force and contraction force caused by the linear CMP operating system will cause the linear CMP operating belt 120 as shown in Figure 2A. Peel or separate from the layer. The effect of pressure caused by this normal use will be aggravated by the humid environment including mortar, washing, etc. = The structure of the open area 1 2 8 shown in Figure 2 B will increase linearity c% p Operating belt 1 2 0 suffers from structural problems (Including peeling or separation between layers), due to increased surface area under pressure, increased likelihood of joints between layers, sticky points or other joints exposed to moisture, support layer

Page 11 586158 V. Description of the invention (8) Layer 1 2 6 is structurally weakened by the resulting open area and so on. Fig. 3A is a cross-sectional view of a CMP operation belt 150 according to an embodiment of the present invention. In the modified CMP operation belt 150 shown in FIG. 3A, it is basically made of a polymer 1 5 2 (also referred to herein as a polymer layer 1 5 2 and a polymer 1 5 2) combined with a stainless steel or other material. The sieve core 1 54 is formed. In one embodiment, 'the sieve core 1 4 5 forms an approximately core or central layer, and the polymer layer 1 5 2 surrounds and passes through the sieve core 1 15 4. Examples of the polymer material used to constitute the polymer layer 152 of the CMP process belt include polyurethane, polyvinyl acetate, polyvinyl chloride (PVC), polyacrylate, and epoxy resin. The resulting structure is flexible and can withstand the tensile and contractive forces caused by the use of the linear belt CMP system 100 (see Figure ι 〃 1 B), and is treated as a separate and complete structure, so it suffers from layers Possibility of peeling or separation from layers is low, it provides a stable surface as a CMP process, is easy to integrate with optical EPD systems, is durable and durable, and has many advantages over conventional techniques. In one embodiment of the present invention, the sieve core 54 provides an internal support, just like the support layer or base layer 126 described in FIGS. 2A and 2B. It is clear here that the sieve core of the CMP operation belt is determined as a continuous loop, belt-shaped inner core. This continuous loop has no beginning and end, so it is a ribbon knot. Unlike the solid support layer or base layer 126 of FIGS. 2A and 2B, the sieve holes of the present invention provide the strength and support required as an inner core, and due to the design of the sieve holes, their combination is formed in In the polymer layer, the possibility of peeling or separation between layers can be substantially reduced or eliminated, and this peeling or separation may occur when the polymer layers are bonded or formed in other ways.

Page 12 586158 V. Description of the invention (9) 'At the time of the support layer or the base layer shown in Figs. 2A and 2B. Fig. 3B is a cross-sectional view of a CMP operating belt 15o according to another embodiment of the present invention. In the embodiment shown in Fig. 3B, the polymer CMP operating belt 150 is reinforced by a mesh reinforcement layer 154. The structure of the mesh reinforcement layer 154 of FIG. 3B is the same as the mesh core 154 of FIG. 3A. Therefore, the sieve reinforcement layer 54 is a pore layer of two CMP operating belts 150, which has a continuous loop and a belt-like structure. In one embodiment, the CMP operation belt 150 is basically composed of the polymer layer 152, and the reinforced mesh layer 1 54 is disposed on the bottom surface of the polymer layer 152. Next, the reinforced sieve layer 154 is combined with the polymer layer 152 by spraying 156 with another polymer material 153 to form an additional polymer layer 5 3, which causes the reinforced sieve layer 1 54 to become a sieve core. 1 54. In one embodiment, the material of the additional polymer layer 153 is the same as that of the polymer layer 152. In still another embodiment, the material of the additional polymer layer 153 is different from that of the polymer layer 152, which depends on the needs and requirements of the manufacturing process. In one embodiment of the invention, a sprayer 158 is used to spray 1 § 6 (or other means) polymer to the reinforced sieve layer 1 54 in a position that rests against the shape of the polymer 152 CMP operation belt 150. The additional polymer layer 153 is added to the reinforced mesh layer 1 5 4 and the polymer layer 1 52. In one embodiment, a continuous structure is formed, which has the same polymer material as the polymer layer 1 52 and flows through And a wide porous mesh structure surrounding the reinforced mesh layer 154. 3C is a cross-sectional view of a CMP operation belt 15o according to yet another embodiment of the present invention. In the embodiment shown in FIG. 3C, the polymer CMP operation band 150 is strengthened by a master hole strengthening layer 154. The structure of the mesh reinforcement layer 1 54 of FIG. 3C is the same as the mesh core 1 54 of FIGS. 3A and 3B. The embodiment shown in FIG. 3C

Page 13 586158 5. In the description of the invention ('ο), the CMP operation belt 1 50 is basically formed by the polymer layer 152 around the sieve core ι54, which is similar to the CMP operation belt 150 shown in FIG. 3A. In one embodiment, an operation surface layer 1 55 is then formed on the polymer layer 1 52 surrounding the sieve core 54. In another embodiment, the operation surface layer is sprayed using a sprayer as shown in Fig. 3β. The CMP operating belt 150 shown in FIG. 3C can be used for optimizing the operating conditions by using the materials of the operating surface layer 丨 and the polymer layer 152 having different hardnesses. Both the operation surface layer 155 and the polymer layer 152 can be made of a polymer material, so they can be firmly combined. In addition, when the operating conditions allow, the operating surface layer 55 may be shaped or otherwise formed / 'and contains one or more individual layers, FIG. 3C shows only one layer. An operating surface layer composed of multiple layers of polymer material 5 5 can be used to achieve different operating surface characteristics using different hardness layers in the CMP operating belt 150, for example, 'under the operating surface Buffer layer. FIG. 4A is a cross section f of a CMP operating belt 16o according to an embodiment of the present invention. In the modified CMP operating belt 16 shown in FIG. 4A, it is basically composed of a polymer material 16 2 combined with a knitted fabric or Synthetic material reinforcement layer 6 *, and an additional polymer layer 1 6 6 formed by spraying or other means, which combines a flat fabric or a synthetic material reinforcement layer 6 4 to a polymer material 1 6 2 . The polymer material 162 may include any plurality of polymer materials suitable for manufacturing CMP process belts and surfaces, including polyurethane, polyester, pVc, poly ', acid and plural epoxy resins, and the like. ~ In the examples, the woven or synthetic material reinforcing layer 164 is a poly-keviar fabric. In another embodiment, the woven fabric ruler is made of synthetic materials, such as nylon, polyamide, polyester, etc.

Page 14 586158 V. Description of the invention (ll) In some examples, the knitted fabric is a combination of synthetic materials, for example, to swallow the brother, for example, nylon material to form the other side of the fabric. According to the purpose of the material, the texture characteristics such as strength, hardness, or elasticity are applied to a CMP operation belt 160. Requested by the king, and selected In the embodiment shown in FIG. 4A, the additional polymer layer 166 is shown, and the ::: material or synthetic material reinforcement layer 164 is bonded to the polymer material 162. Attach :::: 2 layer 166 彳 contains any number of suitable materials for making CMP operation belts, including polyurethane, polyacetate, pvc, polyacrylic acid and any number of epoxy resins. As shown in FIG. 4A *, one embodiment of the present invention includes the application of additional polymer: Bao Ba by spraying 156 with a polymer sprayer 158 desired polymerization = fabric or synthetic material strengthening layer 6 4 temporarily clamped , Fixed, nailed or otherwise temporarily placed on a polymer material 162. The nozzle and the sprinkler 1 5 8 are used to spray 1 5 6 of the additional polymer layer 6 6, so Λ * is added. The physical layer 丨 6 6 is applied to the knitted or synthetic material reinforcement layer 1 6 4 In an embodiment, it penetrates into the knitted or synthetic material reinforcement layer to form a chemical bond with the polymer material 1 6 2 and the additional polymer layer. In one embodiment, the polymer material 162 and the additional polymer layer # 1 # are made of the same polymer. In other embodiments, the polymer material is ^ The additional polymer layer 166 is made of a different polymer. However, the properties of poly-E materials provide a strong and fixed layer to layer, and in some cases chemical bonding, which effectively encloses a woven or synthetic material reinforcement layer 64 in the bound polymer 162, 1 66.

Page 15 586158 V. Description of the invention (12) In the example of your book, the braided or synthetic material reinforcement layer 164 forms the CMP 162, so it has a polymer material such as the CMP operation belt 160. Kushiro, ribbon structure. As described above, an embodiment of the present invention includes a method of temporarily applying a braid or a synthetic material reinforcing layer 164 to a method. For example, b 2, the bad ones such as clamping, fixing, pinning, gluing, and other square layers 1 ° 64 are connected to Γ to explain in detail. Figure 5, knitted or synthetic materials are strengthened, one can rely on polymer materials 162 The inner surface of the braided material or the reinforced layer of woven material 丨 64 can be formed against the outer surface of the polymer material 162 for use here. The inner surface of the polymer material 162 and the continuous loop and band structure that define the CMP operation 7 The inner surface is consistent. The inner surface of the CMP operation belt is the surface connected to the roller 104 and the platform 114 (refer to FIGS. 1A and 1B). Therefore, its outer surface is a surface having an operation surface and a wafer applied thereon for processing. Fig. 4B is a cross-sectional view of a CMP operating belt 160 according to an embodiment of the present invention. Similar to the CMP operation belt 160 shown in FIG. 4A, the CMP operation belt in FIG. 4B includes a polymer material 162, a braid or a synthetic material reinforcement layer 164, and a polymer layer 166. The braided or synthetic material reinforcement layer 164 is placed against the polymer material 162, and the additional polymer layer 166 is applied to the braided or synthetic material reinforcement layer by spraying 156 or otherwise applying the additional polymer layer. 6 6 On 1 64, the applied polymer penetrates into the knitted fabric or synthetic material reinforcement layer 164 to form a strong and fixed chemical bond between the polymer material 1 6 2 and the additional polymer layer 丨 6 6. A woven or synthetic reinforcing layer 164 is enclosed in the CMP operation belt 160. In some examples, the knot formed between the t-composite material 16 2 and the additional polymer layer 1 6 β

Page 16 586158 V. Description of the invention (13) Chemical bonding. The embodiment shown in Fig. 4B includes an EPD open area 168 'whose function is as described in Fig. 2B.

In one embodiment, the open area 1 68 of the EPD is formed in the knitted or synthetic material reinforcing layer 164 before the knitted or synthetic material reinforcing layer 1 64 is placed on the polymer material 1 62. After the additional polymer layer 166 is applied, the polymer material 162 is combined with the additional polymer layer 166 to surround the knitted or synthetic material reinforcement layer 164. In one embodiment, the open area 168 of the EPD is formed in the CMP operation belt 160. By forming an open area passing through the polymer material 16 and the additional polymer layer 16, the alignment and Pass through an open area that has been formed in a woven or synthetic material reinforcement layer 64. In some applications, the braid or synthetic material chosen is strong, strong, and financial, so it is difficult to cut or penetrate to form the EpD open area. When the knitted fabric or synthetic material is surrounded by the polymer material, the open area becomes difficult to form. Therefore, the open region is formed before the knitted fabric or synthetic material reinforcement layer 164 is placed on the polymer material 162.

In other embodiments, the 'polymer material 6 2 and the additional polymer layer 1 6 6 are defined in the EPD open area 1 68 as being thinner through the braid or synthetic material reinforcement layer 164 (not shown in FIG. 4B). In some embodiments, it is not necessary for 7G to penetrate all the polymer materials 162, braids or synthetic materials to strengthen the layers 16 and the additional polymer layers 166. Because the woven or synthetic material reinforcement layer 164 already has an EPD open area, which allows optical transmission to penetrate the reinforcement layer, the polymer material 1 62 and the additional polymer layer 66 need only be thinned to make the optical used in EPD Transmission passed. In other embodiments, the open area 168 of the EPD is manufactured by

Page 17 586158 V. Description of the invention (14)

-The finished CMP operation belt 160 forms an open area penetrating each combination of polymer material 16 2, knitted or synthetic material reinforcement layer 16 4 and additional polymer layer 1 6 6. In an alternative embodiment, when manufacturing the μ p operating band 160, the open area 1 68 of the EPD may be manufactured in a polymer material 62, when the continuous loop, band structure is formed, and The open area may be formed in the braid or synthetic material reinforcement layer 164 before it is placed on the polymer material 162. When the knitted or synthetic material reinforcement layer ι64 is placed on the polymer material 162, the open area of each combination layer is aligned. An additional polymer layer 1 6 is applied, which is combined with the layer and surrounds the braid or synthetic material reinforcement layer 164 to form a CMP operating belt 160. The open area 168 of the EPD is then formed by breaking through the additional polymer layer 166 on the open area formed in the polymer material 1 62 and the braid or synthetic material reinforcement layer 1 64. Figure 5 is in accordance with the present invention In the embodiment, a detailed view of applying an additional polymer layer 166 to the structure shown in FIGS. 4A and 4B is shown. As shown in FIGS. 4A and 4B, the woven fabric or synthetic material reinforcing layer 164 is manufactured as a continuous loop, band structure, and is placed against a polymer material 162 which is also a continuous loop, band structure. The braid or synthetic material reinforcement layer 164 may be placed on the inner or outer surface of the polymer material 162, depending on the implementation and use of the desired CMP operation belt 160. In one embodiment, the braid or synthetic material reinforcing layer 164 is made of polyparaben. In other embodiments, the knitted or synthetic material reinforcing layer 164 is composed of any plurality of fabrics or synthetic materials, including polyester, rayon, nylon, polyamide, or a mixture of synthetic fibers, and the like. Woven or synthetic reinforcement of choice 1 6 4

P.18 586158 V. Description of the invention (15) is porous, which can allow the flat surface to be attached, so that the polymer "guang 62 objects and fish layers can pass through the woven fabric or synthetic material to form a bond, which will effectively edit Gas matter; ^ plus // the polymer layer 166 of the polymer in the arm & u π 1 π &, flat fabric or synthetic material reinforcement layer 164 surrounded by the occurrence of the conventional CMP operation band and optional, and °, Ό structure 'basically does not have the problem of separation and separation. The layers and layers of the structure used on the surface are shown in Fig. 5. An embodiment of the present invention includes spraying with a H8 1 56 polymer material to apply the additional polymer layer 1 "6. ΐ 二 ΐ; = 合 门 物 层 166 的 聚聚 ^ In the embodiment, ^ mesh may be a polymer or polymer material, or in other embodiments In the choice, ϊ 聚合物 polymer or polymer material. In the preferred and fixed family β shi selection polymer or polymer material, it has the characteristics of providing a strong power. In other embodiments The resulting combination of PVC, bond, and exemplified polymer materials includes polyurethane, polyester, understand, H dilute acid and What is the number of epoxy resins and so on. From Figure 6 may be 1 6 4 and also add the polymer through the braid or synthetic material to strengthen the layer and the solid material 162 and the additional polymer layer 166 form a Strong. So the second = bonding, and the braid or synthetic material reinforced layer 1 6 4 surrounds the unit. 70% of the structure determines the strengthened CMP operation belt as a combined structure. Figure 1 is another according to the present invention. In the embodiment shown in the cross-section material 162, 6 of the CMP operation belt 170 of the embodiment, the CMP operation belt 170 includes a polymer, knit, or synthetic material reinforcing layer 1 64 and an additional polymer layer. Page 19 586158

166 Sprinkle 4A surface Gokoupu 4A alpha coat layer 172 is cast, cast, or otherwise applied to the CMP operation belt 17 shown in FIG. 6. In the embodiment shown in Figs., 4B, and 5, the polymer material 162 determines the operation and soil. ^ In the embodiment shown in Fig. 6, a different operation surface layer 172 is used to define the operation surface of the CMP operation belt 170. % Decision

The purpose of manufacturing the CMP operation belt 170 shown in FIG. 6 is to optimize the operation surface, and it is applied to an operation surface layer 172 having a different hardness from the underlying polymer material 162 or the additional polymer layer 166. As shown in FIG. 5, the fabric or synthetic material reinforcing layer 164 may be placed on the surface of the polymer material 162 or on the outer surface of the polymer material 162. In this way, layers of different hardness can be combined to optimize the hardness of the operating surface layer 172, depending on operating conditions and requirements. In one embodiment, polymer material 162, braid or synthetic material reinforcement layer 164 and additional polymer layer 166 are manufactured as shown in Figures u, 4B, and 5, then the operation surface layer 172 is cast on the formed layer. The operation surface of the CMP operation belt 170 is determined. In other embodiments, a polymer material 1 62, a woven or synthetic material reinforcement layer 64, and an additional polymer layer 166 are manufactured, and then the operation surface layer 172 is sprayed

The CMP operation band 170 is determined on the formed layer. The embodiment of the CMP operating belt 170 shown in FIG. 6 can also be used to control the thickness of the CMP operating belt 170 to meet the process requirements. The thickness of the typical CMP operation belts 150, 160, and 170 according to the above embodiments of the present invention ranges from about 80 mils (nnl) to 100 mils. In the embodiment of the CMP operating belt 17o according to the present invention, the polymer material 162, the braid or the synthetic material reinforcement layer 164

Page 586 158

The thickness of the f-additive compound layer 166 can be minimized to about 20 to 30 mils.巳 'to maintain the desired strength and structural support characteristics. Then, the thickness of the entire cMP tape Ijo depends on the type and thickness of the operation surface layer 172. For example, if a thicker CMP operation belt 17 is desired, any one of the polymer material 162, the additional polymer layer 166, and the operation surface layer 172 can be made to a desired thickness to achieve the design goal. In a similar way, the thickness and composition of layers 1 72 162, 166 can be adjusted to achieve the desired hardness, strength, etc., depending on the operating conditions and requirements.

== In the CMP operation belt 150 according to the embodiment shown in FIGS. 3A, 3B, and 3C, any one of the polymer layer 152, the additional polymer layer 153, and the surface layer 1 55 can be adjusted to achieve the desired thickness. In an embodiment, the thickness of the entire operation belt 50 depends on the type and degree of the operation surface layer 55. If a thicker CMP operation belt is desired, the polymer layer 1 52 combined with the mesh core 1 54 surrounded by two households ^ can be made into a CMP operation belt of a desired thickness to achieve the required thickness.

Next, the structure of the embodiment of the present invention shown in Figs. 3A, 3B, and 3C is changed. Fig. 7 is a screen core 1 5 4f according to an embodiment of the present invention. In various embodiments, the sieve core 1 54 is designed as a grid μ. As described here, the grid determines the structure of the inner sieve core 54, and the grid can also be designed as an array. The vertical portion 1 74a ^ ^ The flat portion 1 74b is arranged to form an orthogonal grid as shown. In one or two cases, the cotton core 5 4 is formed by fixing the vertical portion 174 a to the horizontal portion 1-4 b by gluing, joining, forging, welding, or other methods. As will be explained in detail in FIGS. 8A and 8B below, the sieve core 54 is not limited to vertical

Page 21 586158 V. Description of the invention (18) "2: ί Γ part 1 74b 'It can be any required direction or grid 74 (l74am74b shown in Fig. 7A), according to the label as yiyi, brother, Requirements and specifications vary. In one embodiment, in order to interrupt the grid, the connection point 176 between each grid portion 174a and 1, 74b is fixed, which will be described in detail below and 8B. In another embodiment, the grid or array is manufactured by weaving, knitting, or other methods to form a 17 "toilet with an inner braided portion.-In the embodiment, the vertical portion 174a and the horizontal portion mb are used Cylindrical shaft or single-stranded metal wire made of stainless steel. Other materials that can form the sieve core 154 include stainless steel alloy, aluminum, steel, and steel, etc., with a strong CMP operation belt 150 (Figure 3A), strong internal structure Which can withstand 'positive

The pressure caused by the normal linear CMP operation is easy to manufacture and easy to be enclosed in the polymer, so it will not suffer from interlayer peeling, and provides a strong structure suitable for supporting the pressure of wafers for CMP processing. Provide a durable and strong, chemical port # # to maintain the operation of the CMP device without being stretched or otherwise deformed. The cylindrical shaft-like structure, similar to a single strand of metal wire or rod, was selected to provide the most flexible, strong or durable structure used to make & sieve cores 1 5 4. Other embodiments of the present invention include the use of a rectangular shaft with a flattened surface and a thin appearance to provide a large surface area as a combination of joints between the grids 1 7 4 a and 1 7 4 b, or other easy Holes are formed in a knife or array pattern. + Figures 8A and 8B show an embodiment of a sieve core formed by an alternative grid or array type of bear. In FIG. 8A, the sieve core 1 54 is simple in a chain μ.

586158

It can be made by the pattern of soil error or oblique line. In FIG. 8B, the sieve core i54 knot is manufactured by a straight parent grid shown in FIG. 7 and a simple staggered or diagonal grid shown in FIG. 8A. Figures 8A and 8B show only two alternative embodiments having a plurality of lattice arrangements or shapes. It should be understood here that the lattice portion 174 of the screen core 154 may be arranged and designed according to a specific application. For example, the screen core 154 may be metered to provide additional staggered band reinforcement, to provide additional band reinforcement around the circumference of the linear CMP operating belt, or to provide the specific, localized strengthening or reinforcement required. An example of a specific, local enhancement will be illustrated in Figure 9b. Alternative lattice or array types provide multiple embodiments of the invention to meet the needs of multiple CMP operation applications. FIG. 9A is a detailed view of a sieve core 5 54 according to an embodiment of the present invention. In the embodiment shown in FIG. 9A, an EPD open area 178 is removed by the sieve cores ~ 154. As shown in FIG. 7 above, the embodiment of the screen core 1 54 is formed by fixing the vertical portion 7 4a to the horizontal portion 174b by gluing, joining, forging, welding, or other methods. To interrupt the grid, a connection point 176 between each grid portion 174a and 174b is fixed. Fig. 9A shows an example of a break in the grid of the sieve core 154. The connection point of the grid portion is fixed 'so that one shaft portion of a fixed connection point is removed and the remaining three axes are left, and the fixed connection point remains intact. As shown in FIG. 9A, an EPD open area 178 is formed in the screen core 154 by selectively cutting a plurality of vertical portions 17 4a and horizontal portions 174b adjacent to the connection points of the lattice. Because the grid connection point 176 is fixed, the sieve core 1 5 4 can maintain the desired strength, hardness, elasticity and restoring force, which was originally provided by the sieve core 154. EPD open area 1 78 allows optical EPD signals to be transmitted through linear

Page 23 586158 V. Description of the invention (20) CMP operation belt 150 (see Fig. 3A). The EPD open area 178 shown in Fig. 9A has a shape that can be easily manufactured from the grid of the sieve core 54 shown. In a typical CMP operation zone 150, the EPD open area 178 is circular, sugar-shaped, or square, and can be modified to meet special processing requirements. The EPD open area 178 shown is representative of any number of possible shapes.

Fig. 9B is a detailed view of a sieve core 5 54 according to another embodiment of the present invention. In FIG. 9A, an EPD open area 178 is formed in the screen core 154. In the illustrated embodiment, the EPD open area 178 is enhanced by the support portion 180. Supporting part 丨 8 〇 It can be manufactured and formed according to requirements to define the EPD open area 178 around. In an embodiment of a sieve core 154, the lattice is made by weaving, knitting, or other methods of knitting the lattice portion, 74, an EPD open area with a supporting portion 18, and 1 78 for avoiding spreading and stretching. Or other deformations in the interrupted areas in the grid are particularly useful. In the conventional embodiment, the 'support portion is fixed at least at each grid connection point surrounding the open area surrounding Ep]). The embodiment shown is only one of the configurations and forms of most lattice sections 174. In another embodiment (not shown), one or more circular support portions 180 define the EPD open area 1 78, which is attached to the grid of the sieve core 5 4 and fixed at least to each Adjacent grid connection points.

Fig. 10A shows a method for making a CMP operation belt according to an embodiment of the present invention. Fig. 10A shows a cross-section of a CMP operating belt formed in the casting molds 182a, 182b, which contains an EPD open area 178 in the screen core 154. In one embodiment, the screen core 5 4 is located between the first side 18 2a and the second side 182b of the casting mold. In one embodiment, the epd open area 178

Page 586158

The position is adjacent to the characteristic region 84 on the second side 1821) of the casting model to generate a thinner region of the linear CMP operation band in the EpD open region 78. Polymeric polymers or liquid polymers are introduced into the casting mold, and flow and form around the inner sieve core 154. The use of polymers and casting models to form a linear CMP operating belt will be further explained with reference to FIG. In one embodiment of the present invention, a characteristic portion 184 of the EPD open area 178 forms a thinner surface of the polymer 52 at the EpE) open area 178. In a linear band CMP system 100 using an optical EPD system (see Figs. 1A and 1B). A light beam is transmitted through a linear CMP operating belt. The epd open area 178 allows light beams to pass through the screen core 154. A plurality of polymer beams are transmitted through the polymer group, and in one embodiment of the present invention, the thickness of the 'polymer 1 5 2 group is minimized to allow optical transmission. Features ^ Section 184 provides a thinner area of a polymer 1 52 cast in the EPD open area 1 78. In an alternative embodiment, the first side of the casting model 82a and the first side 1 8 2 b do not have a characteristic portion 1 8 4 and, if necessary, will be in the EPD open area after forming the linear CMP operation zone The surface of polymer 178 is thinned. In another embodiment, the polymer 1 52 population in the EPD open area 178 is treated locally to remove polymer 52. This partially cleared area 152 is like the same window through the EPD open area 178. Fig. 10B shows another embodiment of the casting models 182a, 182b of the present invention. The first side 182a and the second side 82b of the casting model shown in FIG. 10B have a characteristic portion 184 located in the EPD open area 178. The feature portion 18 / forms a thinner region of the polymer 152 cluster above and below the linear CMP operating band. As shown in FIG. 10A, the polymer 152 of the EPD open area 178 may be additionally

586158 V. Description of the invention (22) Process and clear the area of polymer 152 to form a window, 11 is a flowchart of 00 according to the present invention-Example ‘manufacturing — polymer linearization method. The method shown starts with operation 202, and the sieve core of the linear CMP operation belt is placed in the linear CMP operation. The model of the linear CMf operation band will be described with reference to Figures ^ and Μ / /. In operation 202, the polymer is linear (: the core of the master hole of the operation belt, which may or may not include an EpD open area, is placed in the model, and the polymer surrounds and passes through the sieve core to be cast. In operation 204, prepare a linear CMP operation belt to prepare a linear CMP operation in one embodiment. 'One is used to shape the polymer linear CMP operation. The use of the polymer-a complete polymer molding container to prepare, Connection: Come: Refer to Figures UA and 13B for details. Any desired polymer can be used according to the expected process requirements. Through t, flexible, durable and tough materials are more commonly used in linear CMP operation belts In order to effectively carry out wafers, frankization does not produce scratches. The polymer selected by the householder does not need to be completely elastic but should not become loose in use. Different polymers can be selected to increase: Certain characteristics. In one embodiment +, the polymer may be polyurethane. In another embodiment, the polymer may be a mixture of urethane gaseous formic acid, which can produce the operating surface of a complete linear CMP operating band, Polyammine Ester, having a specific gravity of about 0. 5 g / cm <2> and a hardness of about 2.5-90 Xiao Er (where 0 ~ 6) 1). Generally, a liquid resin and a liquid hardener are mixed to form a polyurethane mixture. In another embodiment, a &apos; polymer gel may be used to form a linear CMP operating band. After operation 20 04, the prepared polymer is injected into the mold at operation 20 6

586158 V. Description of the invention (23) ------------ In the 3 cases of material Ⅱ, urethane or other polymer or polymer 10B, two semi-cylindrical model. The cylindrical model will be described with reference to the model and model ^. It should be understood here that any other form and shape cardioid may be suitably used. This should be a polymer prepared by heat hardening at a temperature of 2 ° 8 '. The polymers of the 'class' can be heated in any way; the characteristics. : IjincMp operation belt can produce the desired-carbamazepine "in human reality, at a predetermined temperature, heat and harden into a belt. D: 5 things a predetermined time 'to form a urethane ethyl acetate operation time Temperature, which should be suitable for the selected poly c: composite material, or properties suitable to meet specific requirements. In another thermoplastic material, heat treatment is performed, and then the polymer linear CMP operation is performed by cooling. In one embodiment, This mold is as shown in FIG. 13A and after operation 208, operation 2j is performed. The tape is removed by removing it from the model (1 is a polymer linear CMP operation belt molding container 1 3B details Explanation. The "Polymer Linear 2" operation belt in the work 212 is made by the lathe plus the polymer linear CMP operation belt and there is a process. For example, the operation in 212 also includes an EPD open area, In the embodiment, the polymer linearity is 02-0. 2 „t, λ _ page 27 JOO 丄: &gt;« V. Description of the invention (24) The polymer f-line ⑽p operation belt is used for the process. Operation 212 After that, the polymer linear CMP operation of 91 / | In the embodiment according to the present invention, in the embodiment, the groove is formed during molding. It is formed in another pattern. In-implementation = groove f is provided in the model-appropriate cut and draw the groove to Produced !!: There is a cast: the object is on the lathe and the side of the car: 'Operate the polymer linear cmp operation belt in operation 216: and use it' and then clear the polymer linear cmp 3 in operation 218 for use. In the example, the polymer linear CM p operation = 90-110 inches in length, 8-16 inches in width, and 002_〇2 inches in thickness. It is suitable for TeresTM linear polishing, &gt; devices manufactured by Lam Research. Once the polymer linear CMP operating belt is ready for use, the process is completed. Figure 12 A shows the portion of the sieve core 1 54 located in the linear CMP operating belt model (not shown). In one embodiment, The screen core j 54 is placed in the model 'and is located in a track and on a support extending from the bottom track 2 220c of the model. In another embodiment, the vertical part 1 74a of the screen core 5 4 is Periodically extended to provide support to the screen core 丨 54. Screen The support of the heart 1 54 is provided to place the sieve core; [5 4 is placed in a model (not shown), so that a polymer linear CMP operation belt is manufactured, which surrounds and passes through the sieve core 1 5 4 and has a The sufficient distance is between the edge of the screen core 1 5 4 and the edge of the completed polymer linear CMP operation belt. Note here that the solid structure of the screen core 1 54 allows the screen core 1 to be placed and supported 54 in a model (not shown). In one embodiment, the screen core 1 5 4 is placed

Page 28 586158 V. Description of the invention (25) '-on the support (see Figure 12B), and in another embodiment, it is placed to extend the support of the teacher's hole core 1 5 4 in the chess pattern The vertical part 1 7 4 L ^. When placed, the material characteristics of the sieve core 1 54 can avoid sags, tunes, folds, and the like. In one embodiment, in order to accurately place the screen core 154 in the model, for example, adjacent to the EpD open area, internal placement pins (not shown) are provided.

FIG. 12B shows a screen core support 230 supporting a screen core 54 according to an embodiment of the present invention. In one embodiment, the sieve core \ supporter 2 30 extends from the bottom of the model to place the sieve core 5 4 at a desired distance from the edge of the completed polymer linear CMP operation belt. . In one embodiment, the stem 23a of the sieve core support 23 is formed of a material that has sufficient strength to support the sieve core 丨 54, can withstand any pressure in the thermal or polymer casting, And it is easy to cut off and separate from the bottom channel 22c after the completion of the polymer linear CMP operation belt. Exemplary materials include soft or brittle metals, and the like.

Figures 13 A and 1 3 β show a polymer linear CMP operation band model 2 20 according to an embodiment of the present invention. In Fig. 13A, the model 220 shows a first side 220a and a second side 220b, and a bottom channel 220c, respectively. A sieve core position guide 20 20d is located in the bottom guide 22 0c. The first side 2 20a and the second side 2 2 0 b are combined to become concentric. As shown by the directional arrow 2 2 2, the first side 22 0a defines the first surface of the polymer linear CMP operating band formed, The second side 220b defines the second surface of the formed polymer linear CMP operation zone. The bottom track 220c defines the third surface of the formed polymer linear CMP operation zone. In one embodiment, the first side 22a defines the formed

586158 V. Description of the invention (26) The upper surface of f, the lower surface of the band formed by the 22nd side of the first side, and the bottom 22a, which defines the side of the band. The inner screen core 154 (see FIG. 12A) is placed between the first side 220a and the second side 220b, and is supported on the bottom channel 220c. Figure 1 B shows a combination of polymer linear C MP operating belt models 2 2 0, which can be placed in the inner mesh core 154 (see Figure 12A), and then liquid polymers or polymer precursors can flow into the model and Forming a polymer linear] operating band. As shown in FIG. 13A, in one embodiment, the bottom track 22oc defines the side of the polymer linear CMP operation band that is opened. In the formation of the polymer band, the polymer material flows into the model 220, in one embodiment, in the form of a liquid polymer or polymer precursor. According to an embodiment of the present invention, the liquid polymer or polymer precursor then fills the model 220, flows through and surrounds the inner sieve core. Then, at the top of the model, the surface of the liquid polymer & or polymer precursor defines the second side of the polymer linear CMP operating band formed. FIG. 14 is a flowchart of a method for manufacturing a reinforced polymer CMP operation belt according to another embodiment of the present invention. FIG. The illustrated method begins with operation 2 &amp; 2 'to first manufacture a woven or synthetic reinforced layer. In one embodiment, the 'braid or synthetic material reinforcement layer is formed of polyparaben. In other embodiments, the braid or synthetic material reinforcement layer is made of nylon, rayon, polyester, polyurethane, synthetic material mixture, or any other desired braid or synthetic material to provide manufacturing The required strengthening of the αρ operating band. The required strengthening properties include, for example, strength, durability, reducing the tendency of the CMP process belt to stretch during continuous use, and a linear CMP operation.

IEH I Page 30 586158 V. Description of the invention (27) ^ --------- It is flexible to use in the device or system. Yuan; ^ ί: ΪShi: Middle ’woven or synthetic material reinforcement layer is formed to rely on the inner surface of the polymer material of the CMP operation belt. In another-Λ synthetic material reinforcement layer is formed and relied on the produced 2 reinforcement layer is made according to the desired size, and is placed in: Ke. In the embodiment, when manufacturing each layer, the EPD open area is required to be manufactured in a woven fabric or a synthetic material reinforcing layer. Gathering = In i = 4, 'prepare one will be shaped as a cmp operation belt = object or polymer material using a polymeric tape: use the polymer to shape the belt to become-a continuous loop with a shovel 1 of this borrower Inject the desired polymer or polymer material into a model that contains a quasi-centered application. In one embodiment, the polymer cost in operation 254 is 16 ?, and the polymer material is referred to (refer to FIG. 4A, 4B, 5, 6, and the polymer or polymer material in operation 25γΛ. In the embodiment, polymerization is added The material of polymer or polymer of arsenic includes preparation for adhering. Θ 〇 The above-mentioned symbol 166) of the polymer or polymer material can be used for operation 254 quality # $ It depends on people's needs. Generally, a flexible, durable, and stable #

Si 2: Linear CMP operation bands for effective wafer flattening. Not used during use: The polymer selected by J need not be completely flexible, but should not become loose. Different polymers can be selected to enhance expectations

586158, Invention Description (28) Certain characteristics of the process. In one embodiment, the polymer may be polyurethane. In another embodiment, the polymer may be a urethane mixture, which may produce a complete polymer CMP operating surface, which is a microcellular polyurethane with a specific gravity of about 0.4-15 g / square. Cm and hardness is about 2.5-90 Xiao D. Generally, a liquid resin and a liquid hardener are mixed to form a polyurethane mixture. In another embodiment, a polymer gel can be used to form a linear CMP operating band. After operation 2 54, the prepared polymer was injected into the mold in operation 2 5 6. In one embodiment, a urethane or other polymer or polymer material is added to a hot cylindrical mold. In one embodiment, will 2 be made? The κ compound is injected into the model to form a polymer material represented by the symbol 丨 62 in the above figure. In operation 2 58, the polymer prepared by Hu Jin is heat-hardened. Here, any kind of polymer can be heated and hardened in any way, only 1, # 2 Ϊ, the desired physical characteristics can be produced in the polymer CMP operating zone, at a predetermined temperature , Heating and curing a urethane = a substance = a predetermined time, to form-urethane ethyl acetate operating belt. The temperature and temperature of the two materials should be suitable for the selected polymer or polymer, or suitable properties to meet specific requirements. In another embodiment, the sexual material is heat-treated and then shaped by cooling. After the model, proceed to operation 2 60. The polymer material is formed by temporarily combining green fabric with knitted fabric or artificial material, which is used to form a polymer material, and which is cut into a material strengthening layer and an additional polymer layer. Strengthen, and

Page 32 5 Description of the invention (29) _ H The fabric or synthetic material reinforced layer surrounds the polymer knot of the CMP operation belt. After the manufacturing process, the polymer material in operation 262 is based on the thickness and size of the process. In-Shijing, polymer material Linear CMP process. In the embodiment, the polymer lathe is processed to a thickness ranging from about 0.02 to 0.2 inches, preferably about 2 °. 2-〇.05 inch, according to the CMP process used in the polymer CMP operating belt ^ In operation 2 64, a woven or synthetic material reinforcement layer is placed on the poly crystalline material and temporarily fixed on the material. Temporary fixing methods include clamping, pinning, gluing, and other methods to accurately place the braid or synthetic material on the polymer material. In one embodiment, a braid or synthetic material reinforcement layer is positioned against the inner surface of the polymer layer. In another embodiment, the 'knitted or synthetic material reinforcing layer is placed on the surface of the polymer material' depends on the needs of the process. In operation 2 6 ', an additional polymer material is applied to form an additional polymer layer, and a braid or synthetic material reinforcement layer is enclosed in the polymer structure of the manufactured CMP operation belt. In one embodiment, the additional polymer layer is applied to the braid or synthetic reinforcement layer by spraying additional polymer material. In another embodiment, the 'polymer material and the temporarily fixed woven or synthetic material reinforcement layer are placed in a model, and the additional polymer layer is molded on the woven or synthetic material reinforcement layer. When additional polymers

586158 V. Description of the invention (30) When the layer is applied, the polymer or polymer is the same as the polymer material, = the material passes through the knitted fabric or the synthetic material to decide to strengthen the entire body of the CMP operation belt. / Weaving fabric or synthetic material reinforcement layer In operation 268, we strengthened the a-type material, knit fabric or synthetic material to strengthen the ° MP. It stayed as a band, including polymer material structure, and was made into a thick voice. :; The overall construction of the additional polymer layer includes a lathe plus I, trimming, etc. 3 inches. In the-embodiment, this system L Ά. Temple to achieve the desired thickness spot surface properties. If the polymer linear CMP operation band has ^, then operation 268 of-implementation of {Column "empty, Thai has open domain real examples" of the person 铷 π β ^ 3 penetration, thinning and cleaning EPD Open area combination = 2 As described above, the EPD open area is formed in the braid or field layer. The actual production according to a CMP operation zone of the present invention = two: operation: 25 6 The model included in this model determines the EpD Open 2 ° structure. In operation 264, the braid or synthetic material reinforced layer has an open area of EPD that is manufactured, the alignment of which is defined in the aggregation

In the structure, in operation 268, the desired thinning and penetration of the E domain is finally completed. In one embodiment of Operation 2 68, the reinforced polymer CMP operation belt is manufactured to a desired thickness and size according to the process requirements. In one embodiment, the monolithic polymer material is processed to a predetermined size by a lathe. In one embodiment, the 'reinforced polymer CMP operation belt is processed by a lathe to a thickness range of about 0.02-0.2, preferably a thickness of about 0.07_〇. 12 inches, depending on the polymerization operation belt used. Depending on the CMP process. In one embodiment of operation 2 68, the edges of the reinforced polymer CMP operating belt are trimmed and the reinforced polymer CMP operating belt is cleaned for use. In an embodiment on page 34, 586158, description of the invention (31), the length of the polymer linear CMP operation belt is 90-10 inches, the width is 8-16 inches, and the thickness is 0.02-0.2 inches. It is therefore suitable for use in TeresTM linear polishing devices manufactured by Research. In one embodiment, the manufacturing of the reinforced polymer CMP to the desired thickness and size is completed, and the production of the reinforced CMP operation belt is completed. The groove is formed on the groove according to an embodiment of the present invention; on the operating surface forming a Λ band. In another embodiment: when. Hi: provided by f-suitable pattern inside the model to shape the groove to be cast by Li machining Turning and turning out on a lathe produces a square port with square grooves. In the example of "Power Worm Master &amp; -b", a different solid belt is combined into an additional overall structure. Strengthening the cmp operation Strengthening the polymer CMP operation belt is completed with the "additional operation", thus completing the entire process. Known as the manufacture and preparation of the surface Although the present invention is provided to provide: a detailed description, it should not be It is understood that those who have made reference to the embodiments of the present invention refer to the description of the present invention, which is a restrictive person. They are familiar with the modifications of this technology. Therefore, any changes or modifications to the disclosed embodiments that are easy to understand should be made. Contained in the attached towel 2 _ 586158 Brief description of the drawings V. [Simplified description of the drawings] The present invention can be easily understood by referring to the above detailed description and accompanying drawings, in which the same symbols represent the same structural elements. "Genggu Figure 1A Shows a typical linear belt CMP system; Figure 1B is a side view of the linear belt CMP system described in Figure 1A; Figure 2A is a cross-sectional view of a typical linear CMP operating belt; regional; Figure; Figure; Figure; Figure Figure 2B is a cross-sectional view of the typical linear CMP operation belt in FIG. 2A with a * 'which is used in conjunction with an on-site optical end point detection system ▼ system 2 FIG. 3A is a CMP operation belt according to an embodiment of the present invention A cross-sectional view of FIG. 3B is a CMP operation belt according to another embodiment of the present invention. A cross-sectional view of FIG. 3C is a Cmp operation belt according to another embodiment of the present invention. FIG. 4A is a CMP operation belt according to an embodiment of the present invention. The CMP operation band TK o'J plane according to an embodiment of the present invention is an example according to the present invention. In FIG. 4a, a detailed view of a polymer layer is added; a cross-sectional view of the structure shown in FIG. 6; CMP of another embodiment of the present invention FIG detail for the band; FIG. 7 is a mesh core according to an embodiment of the present invention is 586158

FIG. 8 shows an embodiment with an alternative grid or array type core; FIG. 8B shows a simple illustration of a warrior hole pattern. FIG. 8β shows an embodiment with an alternative grid or array type core. Figure 9A is a detailed view of a sieve core according to an embodiment of the present invention; FIG. 9B is a detailed view of a sieve core according to another embodiment of the present invention; and FIG. 10A is a view showing the fabrication according to an embodiment of the present invention Method of CMP operation belt; FIG. 10B shows another embodiment of the casting model of the present invention; FIG. 11 is a flowchart of a method of manufacturing a polymer linear CMP operation belt according to an embodiment of the present invention; FIG. 12A shows a screen hole The core 154 is located in the linear CMP operation belt model. FIG. 12B shows a case where a sieve core supporter supports a sieve core according to an embodiment of the present invention. FIG. 1A shows an embodiment according to the present invention. A polymer linear CMP operation belt model; FIG. 1B shows a polymer linear cMP operation belt model according to an embodiment of the present invention; and FIG. 14 is a step of manufacturing a reinforced polymer CMP operation according to another embodiment of the present invention. Flow chart of the method of making belt. Component symbol description ^ 100 linear with c μ P system

Page 586158 Simple illustration of the diagram 102 Linear C MP operation belt 104 Roller 106 Wafer 108 Wafer carrier 110 Rotating device 112 Direction 114 Platform 120 Linear C MP operation belt 122 Polymer layer 124 Buffer layer 126 Support layer or Base layer 128 EPD open area 150 CMP operation zone 152 polymer layer (polymer material) 15 3 additional polymer layer 154 mesh core 15 5 operating surface layer 156 spray 158 sprayer 160 CMP operation zone 162 polymer material 164 Fabric or synthetic reinforced layer 16 6 additional polymer layer 168 EPD open area

P.38 586158 Schematic description 170 CMP operating belt 172 Operating surface layer 174a Vertical portion 174b Horizontal portion 176 Connection point 178 EPD open area 180 Supporting portion 182a First side of the casting model 182b Second side of the casting model 184 Feature portion 220a First side 220b Second side 220c Bottom rail 220d Sieve core position track 222 Orientation 230 Sieve core support 230a Teacher hole core support branch _

Page 39

Claims (1)

586158 6. Scope of patent application 1. A chemical mechanical planarization (CMP) chemical mechanical planarization (CMP) operation belt includes: a polymer material, which is shaped into a continuous loop to determine the CMP operation. A belt; and a continuous mesh core embedded in the polymer material, and the continuous mesh core is defined as a solid inner core of the polymer material. 2. The CMP operating belt according to item 1 of the scope of patent application, wherein the polymer material comprises polyurethane, polyester, polyvinyl chloride, polyacrylate, and epoxy resin. 3. The CMP operation belt according to item 1 of the scope of patent application, wherein the continuous sieve core is defined as a grid with intersecting portions, and the intersecting portions are bonded to fixed connection points to form the CMP operation belt. A sturdy support structure. 4. The CMP operation belt according to item 1 of the scope of patent application, wherein the continuous sieve core is defined as a gardenia having intersecting portions, and the intersecting portions define a knitted structure. Submit 5 · The CMP operation belt according to item 4 of the scope of patent application, including To :: domain 5 ί 3 2 2 core grid, the interruption area is set up ^ for an open &amp; domain in the grid 'it is suitable for optical transmission through the ridge, where the surrounding part comes around the area 6. The open area in the grid of the continuous sieve core of the CMP operation month according to item 5 of the patent application scope is determined by strengthening, and the surrounding portion is fixed at the connection point surrounding the mule. 586158 Take the CMP operation belt according to item 6 of the scope of the patent application, where the 2 ^^ material is made in the open area in the grid of the continuous sieve core = thinner, and the polymer material is processed to allow J thin polymer material, the grid at the core of the continuous sieve ^ by people · 8 · According to the CMP operation belt of the patent application scope item 更, more package-define an operating surface on the polymer material, the polymer People from the irritation: the first composition material 'and from-the second polymer material ^ material two as the surface molding to the first polymer material.疋, 之 之 刼 9 · A CMP operation belt, comprising: a polymer material, which is shaped as an action belt; and transporting to determine the CMP operation-resistant fabric and the additional polymerization Between layers. 5 、 Polymer material; 5 Hai polymer material 10 · According to the scope of the patent application, the 9th polymer material includes polyurethane, polyester, '1 action I', where the epoxy resin. Sigh ethylene, polyacrylate and 1 1 According to the scope of the patent application, the additional polymer layer is made of polyurethane, polyester, or JMP operating tape, one of which is epoxy resin. a Vinyl chloride, polyacrylate, and 12 · According to the ninth scope of the patent application, the CMP operation belt formed in the reinforced braid further includes a ΰσ domain, which is suitable for optical 586158 VI. Scope of patent application Pass through the reinforced braid. 13. The CMP operating belt according to item 12 of the patent application scope, wherein the polymer material and the additional polymer layer are made thinner in the open area of the reinforced braid. 14. The CMP operation belt according to item 9 of the scope of the patent application, wherein the reinforcing braid is formed of one of poly-kevlar and a synthetic fiber, the synthetic fiber comprising nylon, polyester, Polyamide, rayon and polyvinyl chloride. 15. According to the scope of patent application No. 9 CMP operation belt, more package Including: Defining an operation surface on the polymer material, the polymer material is a first polymer material, and the operation surface defined by a second polymer material is bonded to the first polymer material. Page 42