TW572351U - Improved tray structure of chemical vapor deposition reacting chamber - Google Patents

Improved tray structure of chemical vapor deposition reacting chamber

Info

Publication number
TW572351U
TW572351U TW92211075U TW92211075U TW572351U TW 572351 U TW572351 U TW 572351U TW 92211075 U TW92211075 U TW 92211075U TW 92211075 U TW92211075 U TW 92211075U TW 572351 U TW572351 U TW 572351U
Authority
TW
Taiwan
Prior art keywords
vapor deposition
chemical vapor
tray structure
reacting chamber
improved tray
Prior art date
Application number
TW92211075U
Other languages
Chinese (zh)
Inventor
Yuan-Jing Chen
Original Assignee
Yuan-Jing Chen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yuan-Jing Chen filed Critical Yuan-Jing Chen
Priority to TW92211075U priority Critical patent/TW572351U/en
Publication of TW572351U publication Critical patent/TW572351U/en

Links

TW92211075U 2003-06-18 2003-06-18 Improved tray structure of chemical vapor deposition reacting chamber TW572351U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW92211075U TW572351U (en) 2003-06-18 2003-06-18 Improved tray structure of chemical vapor deposition reacting chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW92211075U TW572351U (en) 2003-06-18 2003-06-18 Improved tray structure of chemical vapor deposition reacting chamber

Publications (1)

Publication Number Publication Date
TW572351U true TW572351U (en) 2004-01-11

Family

ID=32592180

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92211075U TW572351U (en) 2003-06-18 2003-06-18 Improved tray structure of chemical vapor deposition reacting chamber

Country Status (1)

Country Link
TW (1) TW572351U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI704252B (en) * 2017-09-04 2020-09-11 台灣積體電路製造股份有限公司 Lift device, chemical vapor deposition apparatus and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI704252B (en) * 2017-09-04 2020-09-11 台灣積體電路製造股份有限公司 Lift device, chemical vapor deposition apparatus and method

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