TW571117B - Observation device, ultraviolet microscope and observation method - Google Patents

Abstract

The present invention relates to an observation device, an ultraviolet microscope and an observation method. The inventive ultraviolet microscope comprises an observation device which observes a specimen with ultraviolet light; a gas supply device which, during the observation with ultraviolet light, supplies an inert gas to surroundings of the specimen; and a timing control device which controls supply timing of the inert gas by the gas supply device, and the timing control device controls the gas supply device so as to cause preliminary supply of the inert gas before the observation of the specimen with ultraviolet light, and also so as to cause regular supply of the inert gas at least during the observation of the specimen with ultraviolet light.

Description

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V. Description of the Invention (1) Japanese Application No. 200 ^^ 2239, filed on April 27, 2001, the entire contents of the application are incorporated herein by reference. BACKGROUND OF THE INVENTION 1. Technical Field of the Invention The present invention relates to an observation device, an ultraviolet microscope, and an observation method for observing a specimen using light in an ultraviolet region or a deep ultraviolet region. 2. Related technology In the past, it has been known that there is an ultraviolet microscope for observing specimens using light in the ultraviolet or deep ultraviolet region (wavelengths of 356 = n, 266 nm, and 248 nm, etc.). Ultraviolet microscopes have a higher resolution capability than optical microscopes that use visible light. Therefore, they have gradually been widely used in the field of miniaturization. In the field of semiconducting bone beans, with the increase in the accumulation of semiconductor elements, the miniaturization of patterns on wafers has made significant progress. In recent years, the pattern line width has reached the level of 0. U to 0. 24_. Such a miniaturized pattern cannot be observed with visible light (optical microscope), and in the semiconductor field, the use of ultraviolet microscopes has been reviewed. "However, conventional UV microscopes and photon microscopes that use the same general characteristics of visible light are used to observe specimens in the air, so as shown in Fig. 9, the oxygen in the air 93 between the objective lenses 92 will be caused by ultraviolet light ^ Part of the ozone becomes an oxygen plasma (active oxygen), which causes damage (damage) to the surface of the personal computer 91. The photoresist material pattern used in the conductor process is formed on the wafer. In this case, the surface of the photoresist material pattern will be oxygen in the gas 93. -5- 571117 A7

The ion body (active oxygen) becomes easy to peel off. Also on the surface of the pattern, the photoresist material molecules are resolved due to Qi ions 俨 r, Che Duyou I and materials, and S Rusi ion group (active oxygen), low molecular weight light 弁 ^ especially resistance The wooden scoop knife will evaporate and lose with the milk, ^ 5 in the air 93. Furthermore, the UV wavelength of the ultraviolet microscope, T e, and the outer wavelength of the outer nine, are close to the exposure wavelength when the photoresist pattern is formed (the mainstream wavelength in recent years has been 248 nm). The photoresist material pattern is exposed, so the photoresist material molecules will be decomposed in the part irradiated with the ultraviolet light Luv, and the same damage as the above will be suffered. SUMMARY OF THE INVENTION ... The present invention aims to provide an observation device, an ultraviolet microscope, and an observation method that can reduce the damage of specimens when exposed to ultraviolet light. [Corresponding to item 1 of the scope of patent application] The ultraviolet light observation device for observing a specimen using ultraviolet light according to the present invention includes a gas supply device for supplying an inert gas to the periphery of the specimen in the observation using ultraviolet light. [Corresponds to item 18 of the scope of patent application] In this ultraviolet light observation, 'the step further includes a time control device that controls the time when the gas supply device supplies the inert gas'. The time control device preferably uses a controllable gas supply device so that Before observing the specimen with ultraviolet light, an inert gas can be supplied preliminarily, and at least in the observation with ultraviolet light, a timing control device can be formally supplied. [Corresponds to item 2 of the scope of patent application] The ultraviolet microscope of the present invention includes an ultraviolet light observation device for observing a specimen with ultraviolet light, and in the observation with ultraviolet light, an inert gas is supplied to -6. (CNS) A4 size (210X297 mm) 571117

Gas supply device around the specimen. [Corresponding to item 3 of the scope of patent application] Here, the external light observation device further includes a time control device that controls the supply time of the inert gas supplied by the gas supply device. The time control device preferably uses a controllable gas supply device so that The time control device for supplying the inert gas preliminarily for observing the specimen with ultraviolet light, and at least for the observation with ultraviolet light, can formally supply the inert gas. [Corresponding to item 4 of the scope of patent application] At this time, the time control device is preferably a time control device that can preliminarily supply an inert gas in preparation for observation with ultraviolet light. [Corresponds to item 5 of the scope of patent application] In addition, it is preferable that the time control device adopts a time control device that can formally start supplying an inert gas when preparation for observation with ultraviolet light is completed. [Corresponding to item 6 of the scope of patent application] The time control device is preferably a time control device that can stop the formal supply of inert gas when the observation operation using ultraviolet light is completed. [Corresponds to item 7 of the scope of patent application] In addition, it further includes a visible light observation device for observing the specimen with visible light, and the time control device preferably adopts an operation from the time when the observation with visible light is completed to the observation with ultraviolet light. The time control device that supplies the inert gas preliminarily. [Corresponds to item 8 of the scope of patent application] The gas supply device includes a flow control device that controls the flow rate of the inert gas supplied by the gas supply device. The flow control device preferably adopts a time that can officially start supplying the inert gas to the gas supply device. , And increase the size of the paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 571117 V. Description of the invention (A7 B7

Flow control device for the flow of gas. [Corresponds to item 9 of the scope of patent application] At this time, a memory device is included, which can memorize the setting value of the inert gas flow rate supplied by the gas supply device in advance, and the flow control device preferably uses a memory device Memory setting value, flow control device for controlling the flow of inert gas. [Corresponds to item 10 of the scope of patent application] In addition, the gas supply device includes a detection device that can detect the flow rate of the inert gas supplied by the gas supply device, and the flow control device is preferably an adjustable inertia. The flow rate of the gas is a flow control device that makes the detection value of the detection device consistent with the setting value memorized by the memory device. [Corresponds to item 11 of the scope of patent application] In addition, it is preferable to further include a warning device, and when the detection value of the detection device is below a certain threshold value, a warning may be issued to the outside. [Corresponds to item 12 of the scope of patent application] In addition, the warning device is preferably a warning tp when the detection 2 is below the threshold when the gas supply device officially supplies the inert gas. ? Set now. [Corresponding to item 13 of the scope of patent application] The inert gas is preferably nitrogen. [Corresponding to item 14 of the scope of patent application] It is preferable that the inert gas is a gas that can suppress the low molecular weight of the photoresist material applied to the surface of the specimen. & [corresponding to item 15 of the scope of patent application] The ultraviolet light observation device includes an objective lens, and the gas supply device preferably uses a gas supply device capable of supplying h-shaped rolling body between the specimen and the objective lens. [Corresponds to item 16 of the scope of patent application] The ultraviolet light observation device includes a shutter device, and the violet can be cut mechanically

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The light and gate device is preferably a shutter device that can cut off the irradiation of the external light on the specimen in addition to the observation using ultraviolet light. [Corresponds to item 17 of the scope of patent application] This other step includes an autofocus device, which is used to automatically execute the external light viewing sacrifice device (focus adjuster, 1 autofocus device is best used before observation using ultraviolet light You can use an autofocus device that performs autofocus using light that is different from the autofocus of ultraviolet light. [Corresponding to item 9 of the scope of patent application] The method for observing the specimen of the present invention is a method of supplying an inert gas to the periphery of the specimen and observing the specimen with a microscope using ultraviolet light. [Corresponds to item 20 of the scope of patent application] ^ This ^ In this observation method, 'el can be observed under a microscope using ultraviolet light, the inert gas is preliminarily supplied to the periphery of the specimen, and when the specimen is observed under a microscope using ultraviolet light Brief description of the formal supply of inert gas to the specimen. FIG. 1 is a diagram showing the entire configuration of the ultraviolet microscope 10. FIG. 2 is a flow chart showing the steps of the observation operation of the ultraviolet microscope i 〇 FIG. 3 is a flow chart showing the steps of the observation operation of the ultraviolet green microscope 10 〇 FIG. 4 is a view showing another configuration example of the nitrogen supply section. 5A and 5B are diagrams showing another configuration example of the nitrogen supply section. FIG. 6 is an experimental result of the dimensional change of the photoresist material pattern. -9-

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Figure 7 shows the experimental results of the film thickness variation of the non-exposed materials. Fig. 8 is an experimental result on the dimensional change after RIE (Anisotropic Theory Early and Ancient + + Lithium Etching) treatment. Fig. 9 is a diagram for explaining the subject of the present invention. Explanation of a preferred embodiment Hereinafter, the embodiment of the present invention will be described in detail using the drawings. As shown in Figure 丨, the ultraviolet microscope 10 of the present embodiment is formed by holding the specimen 11 and simultaneously moving the table surface 12 in the xy direction, using ultraviolet light. Observation specimen ill ultraviolet light observation part (21 ~ 26), visible light observation part (31 ~ 37) for observing specimen η with visible light, shutter part (41 ~ 43) for cutting off ultraviolet light or visible light, nitrogen supply part (51 ~ 57), autofocus unit (61 ~ 67), CPU (Central Processing Unit) 13, memory 14 and operation unit 15. ', Specimens for observation objects of the external microscope 10 丨 丨 For example, it is formed by using semiconductor processes A semiconductor wafer with a photoresist material pattern. The details will be described later. The ultraviolet microscope of this embodiment is suitable for the fine photoresist material pattern (line width 013 # m ~ 024 # m) formed on the specimen 11. High resolution The observation device is described in detail. The structure of the ultraviolet microscope 10 is described in detail. The ultraviolet observation section (21 to 26) is composed of a light source 21, a half mirror 22, an objective lens 23, a dichroic mirror 24, and a CCD ( Charge-coupled device) is composed of a camera 25 and a monitor 26. Among them, the half mirror 22 is used to reflect the ultraviolet light from the light source 21 on the side of the objective lens 23, and at the same time can transmit the ultraviolet or visible light from the objective lens 23. Two-way The color mirror 24 can reflect the ultraviolet light from the half mirror 22 to the CCD camera 25 side and transmit visible light at the same time. -10- This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)

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Further, as the light source 21 of the ultraviolet light observation section (21 to 26), an ultraviolet light source such as a mercury-xenon lamp, a mercury lamp, or a UV (ultraviolet) laser can be used. When using a mercury / gas lamp or a mercury lamp as the light source 21, it is best to insert a wavelength selection filter between the light source 21 and the half mirror 22 to take out any wavelength in the ultraviolet region or the deep ultraviolet region. The objective lens 23 is an objective lens for ultraviolet light observation, and it can correct chromatic aberrations not only for ultraviolet light but also for autofocus light (light in the infrared region or the far infrared region). The CCD camera 25 is an imaging device for ultraviolet light having sensitivity to the ultraviolet or deep ultraviolet region, and its output terminal is connected to the monitor 26 via the CPU i3. On the other hand, the visible light observation section (31 to 37) of the ultraviolet microscope 10 is It consists of a light source 31 that emits visible light, a half mirror 32, an objective lens 33, an ultraviolet light blocking filter 34, a half mirror 35, a CCD camera 36, and a monitor 37. Among them, the half mirror 32 is used for reflecting the visible light from the light source 3 on the side of the objective lens 33, and at the same time, transmitting the ultraviolet light or visible light from the objective lens 33. The ultraviolet light blocking filter 34 can transmit visible light from the dichroic mirror 24 and block ultraviolet light leaking from the dichroic mirror 24 at the same time. The half mirror 35 allows the visible light from the dichroic mirror 24 to pass through the CCD camera 36, and at the same time causes it to reflect to the side (not shown in Fig. 7F). The light source 31 of the visible light observation sections (31 to 37) is, for example, a halogen lamp. The objective lens 33 is an objective lens for visible light observation, not only for visible light, but also for auto-focusing < light (light in the infrared region or far infrared region), and it can also correct chromatic aberration. The CCD camera 36 is for visible light with sensitivity to the visible light area.

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The photographing device 'has an output terminal connected to the monitor 37. Although only the i-plane objective lens 33 is shown in FIG. I, the ultraviolet microscope 10 (visible light observation section (31) is actually prepared from a low magnification to a high magnification: a multi-surface objective lens 33. Hereinafter, most of the surface objective lenses 33 are prepared. The medium low magnification objective lens 33 is referred to as a "low magnification objective lens 33", and the high magnification objective lens 33 is referred to as a "high magnification 33". In addition, the objective lens 23 and the visible light observation portion (31 to 37) of the above-mentioned ultraviolet light observation section (21 to 26). ) Low-magnification objective 33 and high-magnification objective 33 are mounted on the electric rotator (not shown). Therefore, according to the rotation of the electric rotator, the objective lens 23 for ultraviolet light observation and the observation for visible light can be used. One of the low-magnification objective 33 and the high-magnification objective 33 is inserted above the observation optical path. It describes the shutter portion (41 to 43) of the ultraviolet microscope 10. The shutter portion (41 to 43) is capable of being inserted into ultraviolet light. The shutter 41 between the light source 21 of the observation section 21 to 26 and the half mirror 22 (ultraviolet illumination light path 4ia), and the half mirror 32 (visible lighting) that can be inserted into the light source 31 of the visible light viewing section (3 1 to 37) Optical path 42a) shutter 42 and opening and closing driving of the two shutters 41, 42 The shutter controller 43 is configured. When the shutter 41 is retracted from the ultraviolet illumination light path 41a (open state), the ultraviolet light from the light source 21 can be guided to the observation light path 10a. Light viewing sacrifice specimen 11. Conversely, when the shutter 41 is inserted into the ultraviolet illumination light path 4la (closed state), the ultraviolet light from the light source 21 is blocked by the shutter 41 and cannot be guided to the observation light path 10a. Further, the shutter 42 is retracted When the visible light path 42a is off (open state), the visible light from the light source 31 can be guided to the observation light path 10a. In the UV microscopy-12- This paper standard is applicable to China National Standard (CNS) A4 (210X 297mm) (Centimeter)

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571117 A7 ------- B7 V. Description of the invention (9) In the mirror 10, the specimen 11 can be observed with visible light. Conversely, when the shutter 42 is inserted into the visible illumination light path 42a (closed state), the visible light from the light source 31 is blocked by the shutter 41 and cannot be guided to the observation light path 10a. The details of the situation will be described later. The shutter controller 43 can open and close the shutters 41 and 42 according to the control signal from the CPU 13. When the specimen 11 is viewed with ultraviolet light, the shutter 41 is opened and the shutter 42 is closed. status. When the specimen is viewed with visible light, the shutter 41 is brought into a closed state and the shutter 42 is brought into an open state. However, the time at which the specimen 41 is opened by using ultraviolet light to observe the specimen at 11 ′ is limited in accordance with the shooting time of the ccd camera 25 (the time when one frame of image is generated). Next, the nitrogen supply section (51 to 57) of the ultraviolet microscope 10 will be described. The nitrogen gas supply section (51 to 57) is used to supply nitrogen gas between the above-mentioned objective lens 23 for observation of ultraviolet light and the specimen η. The nitrogen supply unit (51 to 57) of this embodiment is a nitrogen purifying device 53 provided with a nitrogen introduction port 51 and a discharge port 52, a nitrogen tank 54, a flow regulating valve 55, and a flow sensor connected to the nitrogen introduction port 51. 56. An inhalation device 57 connected to the discharge port 52. The nitrogen purifying device 53 is a closed box-shaped box for receiving the above-mentioned objective lenses 23, 33, the specimen 11 and the table surface 12. Fresh nitrogen is always introduced into the nitrogen purifying device 53 through the introduction port 51, and the contaminated nitrogen inside the nitrogen purifying device 53 is discharged from the discharge port 52 through the suction device 57. The gas-goldness of the nitrogen purifying device 53 only needs to be such that nitrogen can accumulate in the gap between the specimen 1 and the objective lens 23. The nitrogen tank 54 can eject nitrogen gas at a time (to be described later) corresponding to a control signal from the CPU 13. In addition, the flow adjustment valve 55 is used to adjust the nitrogen flow from the nitrogen tank. -13- This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 571117 A7 B7 V. Description of the invention (10) 54 nitrogen flow. The adjustment amount of the flow adjustment valve 55 is controlled by the CPU 13. The flow sensor 56 (detection mechanism) detects the nitrogen flow from the flow adjustment valve 55, and outputs the detected value to the CPU 13. Next, the autofocus section (61 to 67) of the ultraviolet microscope 10 will be described. The autofocus section (61 to 67) is a z-driving section 61 that moves the table 12 in the up and down (z) direction, and an LED (light emitting diode) that emits light in the infrared region or the far infrared region. The light source 62, the slit 63, and the half The mirrors 64 and 65, the two-segment sensor 66, and an AF (Auto Focus) controller 67 are configured. This autofocus section (61 ~ 67) uses the AF (autofocus) light emitted from the LED light source 62 and passed through the slit 63 to project the slit image on the surface of the specimen. The slit-shaped AF light reflected on the specimen 11 is incident on the two-segment sensor 66. The position at which the slit-shaped AF light is incident on the two-segment sensor 66 corresponds to a positional shift amount corresponding to the z-direction of the document 11. The AF controller 67 controls the ζ drive unit 61 to move the table surface 12 in the ζ direction based on a signal corresponding to the position shift amount of the specimen 11 output by the two-divided sensor 66. As a result, the specimen can be positioned at the in-focus position. The autofocus section (61 ~ 67) executes the above AF operation at a time corresponding to the control signal from cplj 13 (see below), and positions the specimen 11 at the focus position. As described above, in the ultraviolet microscope 10 of this embodiment, the chromatic aberration in the wavelength region of Aρ light can be corrected in both the objective lens 23 for ultraviolet light observation and the objective lens 33 for visible light observation. Therefore, not only when viewing the specimen 11 with visible light, but also when viewing the specimen with ultraviolet light ^, the AF operation can also be performed by the autofocus section (61 to 67). ':' Yet 'In the UV microscope 10, the 15-series operating part connected to "! ^ 13 -14- This paper size applies the Chinese National Standard (CNS) _A4 specification (21〇 X 297 mm)

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571117 11 V. Description of the invention (A mechanism for the operator to operate when instructing to start observation, when moving the table 12 in the ^ direction, and when instructing to switch the objective lens (23, 33). In addition, the ultraviolet microscope 10 is connected to The memory 14 (or mouth-hiding device;) of the CPU 13 stores various foot-setting conditions (prescriptions) for performing the most appropriate ultraviolet light observation, and the prescription is constituted by a checklist. Here, for example, it includes The nitrogen flow value corresponding to the ultraviolet observation conditions, the nitrogen attachment time, the nitrogen concentration, the shooting time of the camera 25 for ultraviolet observation, and so on. 'The CPU 13 is based on instructions entered in the operation unit 15 or stored in There are many memories here, and various control operations described later are performed. Cpui3 corresponds to "time control device", "flow control device", and "warning device". Its / entry is explained in the specimen of the ultraviolet microscope 10 constructed above. Observation operation. When the CPU 13 of the ultraviolet microscope 10 receives the instruction to start observation input from the operation unit 15 'in accordance with the steps of the flow shown in FIG. 2 and FIG. 3, the placement on the stage is performed. Shu〗 specimen 12 on the observation operation. In FIG. 2, FIG. 3, while displaying an ultraviolet microscope [pi) of the order of observation and a nitrogen gas supply sequence. The outline of the observation operation of the ultraviolet microscope 10 is as follows: First, the visible light observation is particularly selected for the desired observation position (observation object position) in the textbook u. Next, while the nitrogen gas is supplied near the observation target portion ', the observation target portion is observed with ultraviolet light. In this way, before using UV light for observation, first observe with visible light to lock the observing position of the observation object, so the irradiation time of ultraviolet light on specimen u can be shortened. —When the coffee microscope 13 of the ultraviolet microscope receives the instruction from the operation section 15 to start the viewing, the various sections of the ultraviolet microscope 10 are controlled and ready to be carried out. -15-571117 V. Description of the invention (12) Light observation (step si ). Specifically, the low-magnification objective lens 33 for visible light observation is inserted into the observation optical path 10a, and the light source 3 is turned on, and the shutter controller 43 is controlled to open the shutter 42. At this time, the visible light from the light source 31 is reflected by the half mirror 32 and guided to the low magnification objective 33 to illuminate the specimen n. Then, the visible light reflected by the specimen 11 is guided to the half mirror 35 through the low magnification objective 33, the half mirrors 32, 65, 22, the dichroic mirror 24, and the ultraviolet light blocking filter 34, and is divided in two directions. Shoot. The visible light passing through the half mirror 35 enters the CCD camera 36, and the visible light reflected by the half mirror 35 reaches the eyepiece (not shown). In addition, the visible light image captured by the camera 36 can be displayed on the monitor 37 as a visible light image of the specimen 11. Therefore, the operator of the ultraviolet microscope 10 can observe the visible image of the specimen through the monitor 37 or the eyepiece. Next, when the ultraviolet microscope 10 < the CPU 13 receives an instruction to move the table surface 12 from the operation unit 15 (in the case of step ⑽ "γ"), the table surface 12 is moved in the smart direction (step S3). As a result, the specimen n also moves in the direction of Qiao and updates the visible light image of the specimen observed by the operator. In step M, if no instruction is received from the moving table 12 of the operation section 15, the processing of step S3 is not executed, and the next step (§4) is entered. In step S4, whether the switching instruction of the CPU 13 shirt objective lens (23, 33) is input to the operation unit 15 '. When the switching instruction is not input (when selecting "N" in step), the processing of steps S5 to S8 is not performed. , And proceed to step s9. Steps S5 to S8 performed when the switching finger π is input (when "γ" is selected in step 54) will be described later. … 571117 V. Description of the invention (13, said that at the time of Θ, if the objective lens (23, 33) is not switched, the low-power objective lens 33 for the visible light viewing festival is kept inserted into the center of the observation optical path. In step S—CPU The 13fe-made AF controller 67 makes it execute the action to position the specimen 11 at the in-focus position of the low-magnification objective 33. Therefore, the ultraviolet microscope 10 (the author can observe the specimen 11 in the fully focused state through the monitor 37 or the eye ^ Visible light image. Next, the CPU 13 determines whether the objective lens for ultraviolet light observation has been inserted into the observation light path 10a at this time (step S10), and if the visible light observation object 33 has been inserted into the observation light path 1 〇a (when "n" is selected in step si)) 'Go to step sii, and determine the presence or absence of nitrogen flow based on the detection value of the flow sensor 56 of the nitrogen supply unit (51 to 57). I Result of the determination of step s 11 When nitrogen flow is displayed (when step 骡 is selected “Y”), go to step S12 to control the nitrogen tank 54 to stop nitrogen flow. Then, go to step S13. Otherwise, when no nitrogen is circulated (step sn select "N"), not executed The process of step S12 proceeds to step S13. According to the determination result of step S10, when the objective lens 23 for ultraviolet light observation has been inserted into the observation optical path 10a (when "γ" is selected in step sl10), step 3 in FIG. 3 is executed. After the processing from S14 to S24, the process proceeds to step S13 in FIG. 2, and the situation of steps S14 to S24 in FIG. 3 will be described later. The CPU 13 determines whether the observation operation of the ultraviolet microscope 10 is required in step S13 in FIG. When finished, do not finish (when "N" is selected in step S13), go back to the processing in step S2. In this way, when the low-magnification objective lens 33 for visible light observation has been inserted into the observation optical path 10a, the CPU I3 repeatedly executes steps S2 to S4 , S9 ~ S13, while using a low-magnification objective 33 to continue the observation of visible light -17- This paper size applies Chinese National Standard (CNS) A4 (210 X 297 mm) 571117

(Continuous observation). During this period, the operator of the ultraviolet microscope 10 can observe the low-magnification mobile table 12 of the specimen 11 in a full-focus state, and position the specimen as required. ^ When the switching instruction of the objective lens (23, 33) has been input to the operation unit 15 (when "Υ" is selected in step M), the CPU 13 proceeds to step S5 to determine whether the instruction is = the objective lens 33 for visible light observation is switched to Switching of the ultraviolet observation objective lens 23 Here, the case where the instruction input to the operation section 15 is a switching instruction from the low magnification objective lens 33 used for visible light viewing to the high magnification objective lens 33 (when "N" is selected in step S5) ). At this time, the CPU 13 proceeds to step S8 without executing the processing of step s7, and inserts the high-power objective lens 33 for visible light observation into the pain path 1 Oa. τ Thereafter, the CPU 13 continues to perform visible light observation (continuous observation) while repeatedly performing the processing of steps S2 to S4 and S9 to S13 while the visible light observation high-power objective 33 is inserted into the observation optical path 10a. During this period, the operator of the ultraviolet microscope 10 can observe the high-magnification visible light image of the specimen u in a fully focused state, move the table 12 and specifically select any observation target part in the specimen 1 for positioning. Next, a description will be given of a case where the observation target portion of the specimen 11 locked by the visible light observation described above is observed with ultraviolet light. At this time, the switching instruction for switching from the visible light observation lens 33 to the ultraviolet light observation objective lens 23 is input to the operation unit 15 (select "Y" in steps S4 and S5). Therefore, the CPU 13 proceeds to step% and starts ultraviolet light observation Of preparation.

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571117 A7 __________B7 V. Description of the invention (15) That is, the CPU 13 controls the nitrogen tank 54 and the flow adjustment 阙 55 to start the preliminary supply of gas (prepared to be discharged and circulated), and the operation of the inhalation device 57 is also started. Remove unnecessary air that has accumulated in the vicinity of the object to be observed in the specimen. In addition, the CPU 13 controls the shutter controller 43 and closes the shutter 42 in step S7. As a result, visible light from the light source 31 is blocked by the shutter 42. Thereafter, the CPU 13 turns on the ultraviolet light source 21. However, since the shutter is still closed at this point, the ultraviolet light is not irradiated on the specimen u. "The human CPU 13 inserts the objective lens 23 for external light observation into the observation optical path 10a (step S8). The AF controller 67 is controlled to position the observation target portion of the specimen n at the in-focus position of the ultraviolet observation objective lens 23 (step S9). Thereafter, since at this time, the ultraviolet observation objective lens 23 is inserted into the observation optical path 10a (step "Y" is selected as "Y"), the processing of steps S14 to S24 in Fig. 3 is performed. In step S14, the CPU 13 reads in the memory 14 (various setting conditions for ultraviolet light observation) stored in the memory 14, and then controls the flow adjustment valve 55 according to the flow rate of nitrogen contained in the read space (step S15), the formal supply (formal circulation) of nitrogen is started (step S16). The flow rate of nitrogen during formal circulation is greater than the flow rate during preliminary circulation. At this time, during the preparation period for ultraviolet light observation (steps S6 to sl10 in FIG. 2 and steps S14 and S15 in FIG. 3), since the preliminary flow of nitrogen is continuously performed, at this point (actually in the ultraviolet Before the light observation is started), the air between the objective lens 23 for ultraviolet light observation and the specimen U is almost completely removed. -19-

571117 A7 B7 V. Description of the invention (16 Therefore, in the above-mentioned step S16, when the formal supply of nitrogen is started, it can be increased to the necessary flow rate in a short time. As a result, the objective lens 23 and the specimen for ultraviolet viewing The gap of 11 is actually filled with sufficient nitrogen before the ultraviolet light observation starts. Second, the CPU 13 determines whether the formal flow of nitrogen is normal according to the detection value of the flow sensor 56 at step S17, and according to step s 17 As a result of the determination, when the nitrogen gas flow is normal (when "γ" is selected in step S17), the process proceeds to step S18, and the shutter 41 on the ultraviolet illumination optical path 4U is retracted (open state), thereby actually starting ultraviolet light observation. At this time, from The ultraviolet light from the light source 21 is reflected by the half mirror 22 and transmitted through the half mirrors 65 and 32 to be guided to the ultraviolet observation objective lens u to illuminate the observation target portion of the specimen 11. The reflection is reflected on the observation target portion of the specimen u.

The ultraviolet light is guided to the dichroic mirror 24 through the ultraviolet observation objective lens 23 and the half mirrors 32, 65, and U, and is reflected by this and enters the ccd camera 25. In addition, the ultraviolet light image captured by the CCD camera 25 is displayed on the monitor 26 as an ultraviolet light image of an observation target portion of the specimen. : The operator of this ultraviolet microscope 10 can observe the ultraviolet light image of the observation target part of the specimen 11 in the fully focused state through the monitor 26. w As described above, the gap between the objective lens 23 and the specimen 11 has been filled with sufficient nitrogen gas, and 2 gas (containing oxygen) hardly exists. Therefore, when the ultraviolet light irradiates the specimen, the gap between the objective lens 23 and the specimen 11 hardly generates ozone or active oxygen, so that the damage to the observation target part of the specimen 11 can be reduced. In addition, a fine photoresist material pattern is formed on the observation target portion of the specimen 11 -20-

571117 A7 B7 V. In the description of the invention (17), if the wavelength of the ultraviolet light of "11 is close to the exposure wavelength when the photoresist material pattern is formed, the surface of the photoresist material pattern may sometimes be = Decomposition. However, in the ultraviolet microscope 10 of this embodiment, the gap between the UV well objective lens 23 and the specimen η has been filled with sufficient nitrogen = the light-resistive material molecules will not evaporate and be lost again with the specimen. The photoresist material molecules are combined. That is, the photoresist material molecules on the surface of the photoresist material pattern can be suppressed from being reduced in molecular weight. Therefore, the damage to the observation target portion (fine photoresist material pattern) of the specimen η can be reliably reduced. When the CPU 13 opens the shutter 41 on the ultraviolet illuminating light path 41a in step S18, it proceeds to step S19 to determine whether to acquire an ultraviolet image (single observation) of the observation target part of the specimen. It is based on the contents read in step S14. When the result of the determination in step S19 is that a single observation is required (when "Y" is selected in step si9), When, beginning to CCD camera 25 < video frame. Then, it proceeds to step S20 and waits until the imaging time of the CCD camera 25 included in the prescription. This is the so-called shooting of specimens 11 using an electronic shutter. When the photographing time of the sCCD camera 25 has elapsed (when "Y" is selected in step S20), the CPU 13 proceeds to step S21, so that the memory 14 stores the ultraviolet light image photographed by the ccd camera 25 as the observation target part of the specimen u. Ultraviolet image (view image). When the photography of the CCD camera 25 is finished, the CPU 13 closes the shutter ^, ends the single observation of the ultraviolet light (step S22), and stops the formal flow of nitrogen (step -21-

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After step S23), the process proceeds to step 7 and circle 2 and step S13. In step S13, as above. ^ 疋 No to end, if not to end (when "N" is selected in step S13), return to the processing of step S2. / PU 13 In the state where the object 3 for external light observation is in the heart, the surface is repeatedly performed the steps of Figure 2 and the road map Γ / The steps S14 ~ S23 and S13 are processed, while the ultraviolet microscope 10 is made available to the author. 4 Light continues to perform a single observation. At this time, the operator of the ultraviolet microscope core can sequentially take observation images of the surroundings of the observing object part locked by the visible light observation. In addition, when the result of the determination in step S17 above is that the detection value of the flow sensor 56 is lower than the threshold value of the sufficient foot (when "N" is selected in step S17), the CPU 13 proceeds to step S24 to notify the operator and warn him Anomalies have been detected in the official flow of nitrogen. Warnings use sound (warning sound) or display. Alas, proceed to step S23 'to stop the formal circulation of nitrogen. When a single observation of ultraviolet light is not performed (N is selected in step S19), the CPU 13 does not perform the processing of steps S20 to S23, but proceeds to step S 13 in FIG. 2 and thereafter, is used for ultraviolet light observation. The objective lens 23 is inserted in the observation optical path, and the processes of steps S2 to S4, S9, S10, S14 to S19, and S13 are repeatedly performed, so that the operator of the ultraviolet microscope 10 can continuously observe with ultraviolet light. Even during continuous observation, you can change the flow rate during the official circulation of nitrogen according to the content of the place read in step S14. In addition, after visible light observation (single observation or continuous observation), if you want to perform visible light observation, you can switch the objective lens 23 for ultraviolet observation to 22 • This paper size applies the Chinese National Standard (CNS) A4 specification ( 210X 297 mm) 5. Description of the invention (19) The switching instruction of the light observation objective lens 33 is input to the operation section 15 (select "Y" in step and "N" in step S5), so the CPU 13 enters step 开始 and starts execution Preparation for visible light observation. That is, the visible light observation material is inserted into the observation light path 10a (step S8), and the shutter 42 on the visible illumination light path 42a is opened at the same time. Thereafter, the CPU 13 is in a state where the objective lens 33 for visible light observation is inserted into the observation light path 10a, and the processes of steps S2 to S4, S9 to si3 are repeatedly performed, and visible light observation (continuous observation) is continued. If the nitrogen gas supplied during the above-mentioned continuous observation of the ultraviolet light has not been stopped ("Y" is selected in step su), the nitrogen gas supply may be stopped in step S12. As described above, "the ultraviolet microscope ig of this embodiment has a specimen with ultraviolet light_" The gap between the objective lens 23 and the specimen Η is sufficiently filled with nitrogen ", and 2¾ (containing milk gas) is almost absent. Therefore, the gap between the objective lens 23 and the specimen ^ hardly generates ozone or active oxygen, so that the damage to the image part of the specimen can be reliably reduced. The rule 'T, yes, and when a fine photoresist material pattern is formed on the observation target portion of specimen U', the decomposition of the green material molecules on the surface of the photoresist material pattern can also be inhibited to record molecules). Therefore, it is possible to surely reduce the damage to the object to be observed (fine < photoresist material pattern). ^ In addition, when the size of the fine photoresist material pattern (line see 0.13 _ ~ 0.24_ degree) that can be exposed and formed on the specimen η is hardly changed, the shape observation and dimensional measurement are performed. In other words, the real U external line microscope 10 is indeed the most suitable device for observing the fine photoresist pattern on the specimen η. 571117

Furthermore, since the ultraviolet microscope 10 of this embodiment is suitable for the sequence of viewing the nitrogen, the nitrogen supply to the specimen 11 can be effectively performed without waste. In addition, since the ultraviolet microscope 10 of this embodiment is prepared after the preliminary circulation of rat gas, and then the official circulation is performed, it can be increased to the required flow rate in a short time, and after the official circulation of nitrogen has begun. , Immediately start UV observation. The only known form of the ultraviolet microscope 1 〇 Because the shutter 41 is set in the ultraviolet illumination light path, the CCD camera 25 for ultraviolet light observation can take ^ frames ~ images, and the shutter can be opened within the minimum necessary photographing time. 41 and the shutter 41 is closed immediately after the CCD camera 25 shoots, so it is possible to avoid irradiating the specimen U with ultraviolet light unnecessarily for a long time. As a result, damage to the specimen 11 by ultraviolet light can be suppressed.乂, the ultraviolet microscope 10 that is consistent in form and form, since AF is focused using the AF light in the ultraviolet region or the deep ultraviolet region, the shutter 41 is opened, so that the specimen u can be prevented from being unnecessarily exposed to ultraviolet light for a long time. As a result, damage to the specimen 11 by ultraviolet light can be suppressed. Again and again, the UV light microscope 1 () of this model I uses visible light to observe the sacrifice: lock, and observe the target part, and then perform the observation of the target part | external light observation, so it can be avoided to avoid unnecessary The specimen 11 was exposed to external light for a long time. As a result, it is possible to suppress the sound J and suppress the damage of the external light to the specimen 11. Also, in the above embodiment, the nitrogen gas supply unit (51 ~ 57) supplies nitrogen milk to the specimen 11 and the objective lens 23 > ρη. However, the present invention is not limited to such a structure, and a description will be given of two examples of structures other than the addition of azepam, and the supply of C on the 0th. -twenty four-

571117 A7 _______ B7 V. Description of the invention (21) Fig. 4 shows a case in which nitrogen 72 (indicated by an arrow) is introduced directly below the objective lens 23 using a tube 71 & The tube 71 is supported by a mounting fixture 73 fixed to the main body side of the ultraviolet microscope 'so that the nitrogen ejection port 71a is maintained near the front end of the objective lens 23. The tube 71 is made of polytetrafluoroethylene, so it can prevent the contamination of nitrogen 72 and the contamination of specimen 11. In the structure shown in FIG. 4, after the nitrogen 72 supplied from the nitrogen tank 74 passes through the tube 71, it is ejected from the nitrogen ejection port 71a, and is supplied to the specimen 12 on the table 12 with a gap between the objective lens 23. Therefore, the gap between the specimen n and the objective lens 23 can be filled with nitrogen 7 2 to eliminate the gas. FIG. 5 is an example of a structure in which nitrogen gas is introduced into the objective lens 75 and the front end portion of the objective lens 75 is directed to the “benzine”. FIG. 5 (a) is a cross-sectional view of the objective lens 75, and FIG. The external view of the front end part. The objective lens 75 is composed of a lens holding lens barrel 76 holding a lens for ultraviolet light observation (not shown), and a cover lens barrel 77 covering the periphery. The inner diameter of the cover lens tube 77 is larger than the lens holding The outer diameter of the lens barrel 76, therefore, a certain space can be ensured between the lens holding lens barrel and the cover lens barrel 77. A tube 7 for introducing nitrogen gas 7S is provided on the side of the cover lens barrel 77, and this tube 79 is installed A tube 80 connected to a nitrogen tank (not shown). In addition, three nitrogen spouts 81 are opened under the cover lens cylinder 77. According to the structure of FIG. 5, nitrogen gas from a nitrogen tank (not shown) is provided. 78 is introduced between the cover lens tube 77 and the lens holding lens tube% through the tube 80 and the tube 79, and is ejected to the specimen 11 from the three nitrogen ejection ports 81. Therefore, the gap between the specimen and the objective lens 75 can be filled with nitrogen. 7 8 and the air is eliminated. The three nitrogen ejection ports 81 are preferably inclined to -25 toward the focal position of the objective lens 75. -This paper size is suitable for towel g a home standard (CNS) A4 specification (× 297 male 6 " ------- 571117

This is so that the emitted nitrogen gas 78 can effectively flow toward the center of the objective lens. In addition, the number of the nitrogen spouts 81 may be three to five. In addition, in the above-mentioned embodiment, when the ultraviolet light is observed, when the steep door 41 is opened, a check is performed to check whether the nitrogen flow is normal (step in FIG. 3).

Si7), but it is better to perform the same inspection after the shutter 41 is opened. On the other hand, when an abnormality in the flow of nitrogen is detected, it is best to close the shutter 41 while giving a warning to the outside. β σ In addition, when the nitrogen flow is checked after the shutter 41 is opened, the flow rate adjustment valve 55 can be used to control the nitrogen flow (flow sensor The detection value) is consistent with the prescription setting value. In addition, in the above-mentioned embodiment, the case where the flow rate during the formal flow of nitrogen is larger than that during the preliminary flow of nitrogen is taken as an example for description, but the flow rate may not be changed. It is also possible to temporarily stop the supply of nitrogen after the preliminary circulation of nitrogen. In addition, in the above-mentioned embodiment, the example using nitrogen is described, but other inert gases may be used. In addition, as long as the photoresist material can be reduced in molecular weight, it is an ideal gas. In addition, in the above-mentioned embodiment, the case where the nitrogen gas has been officially circulated until the preparation for the observation of ultraviolet light has been completed is taken as an example, but also the nitrogen gas is started to be circulated after a specific time has elapsed from the preliminary circulation of the nitrogen gas. Official circulation. This specific time is a time between when the nitrogen gas can sufficiently fill the 2 objective lens for ultraviolet observation and the specimen 11. In addition, the present invention can also be applied to the use of a common objective lens, as visible light and ____ -26-

^ Paper scales suitable for financial materials (CNS) Tiege (training) <love> V. Description of the invention (23 ', UV light microscope with dual purpose objective lens. At this time, because Shi Guang = mirror switching is not needed Action, so as long as the nitrogen flow is controlled in accordance with the observation mode ^ In addition, 'Fast: The opening time of door 41 can be set not only on the ccd camera 2 shooting time (time to generate Uzhen images), it is best to consider the purple heart 1, 1 Possible damage factors, and the opening time is set in advance before reaching the amount of damage that can be tolerated. In addition, when the light source 31 for visible light is illuminated (the light source 21 for ultraviolet light is illuminated in the step of FIG. 2). In the above embodiment, the ultraviolet microscope is used as an example for explanation, but it is not necessarily limited to this. The present invention can also be applied to other than a microscope &lt; observation device &apos; The general observation device. Next, the embodiment of the present invention will be described. Here, the case where the pattern of 130 finely-formed photoresist material formed on the specimen 11 is observed using the above-mentioned ultraviolet microscope 10 is described. The mirror 10 (the light source 21 is an ultraviolet light source with a wavelength of 266 nm. The observation action of the specimen 11 in this embodiment is basically the same as the steps in FIG. 2 ′ and FIG. 3 described above, so: a brief description of the basic action. By the way-the next The photoresist material pattern made of 130nm is coated with an antireflection film and a chemically amplified photoresist material on a cut substrate. (2) Use KrF (fluorene fluoride) Axema laser 'to mark the The pattern is formed by reducing the projection exposure, (3) after heat treatment, and developing. In this embodiment, steps S6 to si3 of FIG. 2 and 571117 A7 of FIG. 3 ________ B7___ V. Description of the invention (24) S14, SI5 During the processing, a preliminary supply of nitrogen (preparatory flow) is performed at a flow rate of about 0.1 m / sec. During the processing of steps S16 to S22 of Fig. 3, the processing is performed at 0.3 to 0.5 m / The formal ejection of nitrogen is performed at a flow rate of about sec. Then, the formal ejection of nitrogen (0.3 to 0.5 m / sec) is performed, and the shutter 41 is opened in step S18 to start irradiating ultraviolet light on the specimen 11. Thereafter, the photoresist material of the specimen 11 is passed through the monitor 26 The material pattern is subjected to morphological observation. 'When performing a single observation, take the ultraviolet light image (vstep S 21) from the CCD camera 25' and obtain the necessary information. 'Block the shutter 41 (step S22) ° At this time,' ultraviolet light The exposure time (fast opening time) of the photoresist material pattern irradiating the specimen 11 is about 15 seconds. After the ultraviolet light observation is performed with the ultraviolet microscope 10, the normal half-volume body circuit is used to continue. As a result of the processing, it was confirmed that there was no damage at the portion of the specimen ii (observation target portion irradiated with ultraviolet light) that was observed with the ultraviolet light by the ultraviolet microscope 10. In addition, the inventors of the present case have conducted the following three experiments in order to investigate in detail whether or not there is harm when using a UV microscope to perform external light observation. In these three kinds of experiments, the same nitrogen conditions as above were used (in the case of preliminary circulation, cloud, ·· 0.1 ^ / sec, flow velocity in formal circulation: 〇3 ~ 〇5m / se = again), The exposure time of the ultraviolet light (wavelength 266 nm) is the change of the number of the participants and the number of sides, and the possible damage of the photoresist material is checked. (Experiment 1: Dimensional change of photoresist material pattern) The figure shows the result of the change in H of the photoresist material pattern with respect to the irradiation time of ultraviolet light (refer to "N2 bl () w (spraying nitrogen)"). = -28- 571117 V. Description of the invention (25 A7 B7 light irradiation time, the vertical axis is the change rate of the dimensional change distance of the photoresist material pattern reference value (the size of the part that is not irradiated with ultraviolet light). The ultraviolet S light measured The irradiation time is 0see, 1 sec, 3 sec, 5 sec, 10sec, 330. Fig. 6 also shows the measurement results of the dimensional change of the photoresist material pattern when nitrogen is not supplied (refer to "simple irradiation") The results show that when the normal gas environment is not supplied with nitrogen and external light (refer to "simple irradiation"), the size of the photoresist pattern will be reduced by 18% after SeC is turned on at the time of opening * irradiation. / "目 RT /" When the ultraviolet light is irradiated in the gas-containing gas environment of this embodiment (see ',,, 20 watts (spraying nitrogen)'), 30 sec from the start of irradiation: and :: pattern <size also It is only reduced by 1%. In other words, the damage to the material pattern can be displayed. Therefore, the use of ultraviolet light; gas two environment: Jin: material family pattern UV observation can be said to be best in nitrogen (Experiment 2: Non Change in film thickness of photoresist material in the exposed part) The measurement result of the change in film thickness of the photoresist material refers to the part where no pattern is formed. The horizontal axis of FIG. 7 == exposure time, and the vertical axis is the photoresist film thickness from the reference value (purple photo: = Thickness) change rate. The ultraviolet radiation measured before the measurement = From the results shown in Figure 7, it can be known from the results in Fig. 7 that in the gas-containing gas environment: 'approximately after the start of the irradiation, the thickness of the photoresist material film is reduced, and at 10 sec Since then, the thickness of the photoresist material has increased. "、. After the delivery of sec, the paper size of the large-scale paper is settled (CNS) -29- 571117 26 V. Description of the invention (the degree of reduction is almost invisible after that When the UV light is irradiated in a nitrogen-containing gas environment, the irradiation time can be reduced to 0.5%, so that the thickness change of the photoresist material can be suppressed to 0.5%. It can be said that the damage of the material pattern is best observed in a nitrogen-containing gas environment with α? Η ^ light. The UV is compared with the irradiation time within 20 see in the brother: slow: 30sec after the first two shots, the photoresist material The change in film thickness has now become approximately stable. Therefore, this tendency can also be used to accurately measure the photoresistance pattern of the foot. Inch, film thickness, etc. For example, 'as long as the photoresistive material pattern is implemented with more than 30 see UV light] ,: the change of the photoresistive material film thickness caused by ultraviolet light is stable: Second, the size and film thickness of the resistive material pattern In the measured value obtained: Han ... compensation value is sufficient. The compensation value is only 1% when the change in the thickness of the photoresist material film is stable. Part 2: It is not necessary to consider the amount of damage caused by the exposure time of ultraviolet light = factor ' The correct measurement of the size and film thickness of the silk material pattern was obtained at six o'clock! Various measurements of the photoresist material film were performed with the ultraviolet microscope 10 = area Γ The amount of change in film thickness caused by external light irradiation was almost zero (Experiment 3:: Dimensions after RIE treatment) Here, prepare a photoresist material pattern that is irradiated for 10 sec and a photoresist material pattern that is irradiated for% time, and perform all-ion ion etching with each photoresist material pattern as a mask. The pattern of the nitrogen-cut SiN layer was formed, and the pattern size change of the SiN layer after RIE treatment was measured. Wood -30- This paper is suitable for standard S, S Standard (CNS) A4 specifications (210X297), 571117 A7

The list of times is shown in Table 1. Results of ultraviolet light irradiation in a wide nitrogen t-body environment 00 sec, 30 sec. Violet: light (1V 30 and normal gas environment without nitrogen) (C), (d ). Fig. 8 2 e, ⑷m can know that the pattern size of the SlN layer is found when the body is exposed in a normal gas environment. When the irradiation time is 10 sec, it decreases; The degree of privacy is reduced by 10% when exposed to 30 sec. In contrast, when the ultraviolet light is irradiated in a nitrogen-containing gas environment, it can be known from the results of Fig. 8 (a) and ⑻ that the pattern size of the SiN layer is found to be reduced by only 1: 5% at the time of the irradiation. 'When irradiated for 30 sec, the reduction was only about 7%. This degree of reduction is within the allowable range of the dimensional difference in the process before UV light irradiation. In other words, in the case of 10 see and 30 see, the occurrence of damage can be significantly suppressed. From the above &lt; results, it can be seen that in the observation of a photosensitive photoresist film having an absorption band located near the ultraviolet illumination wavelength of the ultraviolet microscopy 10, it is performed for tens of seconds (sec) in a nitrogen-containing gas environment. When the sacrifice is observed for a short period of time, the damage of the photoresist material film can be reduced with good reproducibility. The above description is about the embodiment of the present invention, but the content of the present invention is not limited to this. Of course, various modifications can be made without departing from the spirit and scope of the present invention. -31- ^ Zhang Chi M Ridge Standard (CNS) Weave _χ 297 Public Love)

Claims (1)

571117 Sixth Patent Application No. 091108228 Chinese Patent Application Replacement (May 1992) Patent Application Fanyuan A UV light observation device is used to observe specimens using ultraviolet light, which includes a gas supply device, which can be used in the aforementioned ultraviolet light. During observation, y supplies active gas to the surroundings of the aforementioned specimen. 2. An ultraviolet microscope comprising: an ultraviolet light observation device that uses ultraviolet light to inspect a specimen; and a gas supply device that can supply an active gas to the periphery of the specimen during observation using the aforementioned ultraviolet light By. 3. If the ultraviolet microscope of item 2 of the patent scope is applied, and the middle step includes the time control, it is the time when the gas supply device supplies the inert gas supply time; the time control device can control the aforementioned gas supply Before the device observes the specimen with the aforementioned ultraviolet light, it can be prepared to supply the aforementioned inert holes in a prepared manner, and at least in the observation using the aforementioned ultraviolet light, it can directly supply the aforementioned inert gas. ^ 4. For example, please use the ultraviolet microscope in item 3 of the patent, where the quasi- = time control device can be used to preliminarily supply the aforementioned inert gas during the observation. 5. For example, the ultraviolet microscope of item 4 of the scope of patent application, in which the control device can use the aforementioned ultraviolet light to perform observation, and at the end, officially start supplying the aforementioned inert gas. The ° microscope of the scope of patent application No. 3, where: the time control device can stop the formal supplier of the aforementioned inert gas when the above-mentioned UV; D. 7. The ultraviolet microscope of item 3 of the patent scope of patent application, in which the sheet scale A4 size; X 297 mm) 571117 Αδ It is the use of visible light observation to further include a visible light observation device specimen; the material time control device can use the aforementioned visible light for observation 3 when the action is redundant until the use of the aforementioned ultraviolet _ — ”advanced advanced burnt offering and action, During the month 'preparatory supply of former inert gas. 8. For example, please apply the ultraviolet microscope in item 3 of the patent, and the aforementioned gas supply device includes a flow control device, which controls the flow rate of the aforementioned inert gas supplied by the aforementioned body supply device; month 'J 述说 I 控制 纟This may correspond to the time when the aforementioned gas supply device officially starts to supply the aforementioned inert gas, and the flow rate of the aforementioned inert gas is increased. 9. For example, the ultraviolet microscope of item 8 of the scope of patent application, which includes: «Jirs device, which can memorize in advance the setting value of the flow rate of the aforementioned inert gas supplied by the aforementioned gas supply device; and · the aforementioned flow control device Those who can control the flow of the inert gas according to the setting values memorized by the aforementioned memory device. 10. If the ultraviolet microscope of item 9 of the patent scope is applied, the gas supply device includes a detection device, which can detect the flow rate of the inert gas supplied by the gas supply device; the flow control device can be adjusted. The flow rate of the inert gas is such that the detection value of the detection device is consistent with the setting value memorized by the memory device. 11 · If the UV microscope of the scope of patent application No. 丨 0, which further includes a warning device, which can be detected in the aforementioned detection device-2-This paper is suitable for SS Home Standard (CNS) A4 specification (21G X 297 (Public Director) Application for Patent Scope 12. If there is a warning to the outside when the value is below the threshold. ~ The ultraviolet microscope of the eleventh patent range, in which the _4 report device can be stopped before the gas supply device is formally supplied ^ raw milk &lt; during the detection value at the aforementioned specific value to stop by 13 4 Observe the specimen using the aforementioned light. The UV microscope of item 2 of the patent scope includes nitrogen gas in an inert gas system. 14. If I ask for the ultraviolet microscope in item 2 of the patent, where the inert gas system can suppress the low molecular gas of the coating material, apply the light to the surface of the specimen. 15. If the second in the scope of patent, please An ultraviolet microscope, in which the ultraviolet light observation device includes an objective lens; the milk supply device can be one between the aforementioned inert lens and the aforementioned objective lens. Article 16: For example, please apply for the ultraviolet microscope in item 2 of the patent, and the above-mentioned ultraviolet light observation device includes a shutter device, which can cut the aforementioned ultraviolet light mechanically; The viewing time of ultraviolet light cuts off the radiant of the aforementioned ultraviolet light to the aforementioned specimen. 17. For example, the ultraviolet microscope of item 2 of the patent application scope further includes an autofocus device, which uses the focus of the ultraviolet light observation device. The regulator can use the above-mentioned "U" to use the aforementioned material to use the light center for auto-focusing that is different from the aforementioned ultraviolet light. ^ Before: Fresh coke resistance mark outside the machine M -3- This paper is suitable for financial management Home Standard (CNS) Α4 Specification (21GX297 ^ Jf 571117 A8 B8 C8 Six By. 18. If the ultraviolet light observation device of item 1 of the patent application scope further includes a time control device that controls the supply time of the aforementioned gas supply device to supply the aforementioned inert gas; the time control device may control the aforementioned gas supply device, Those who use the aforementioned purple evening tm # the aforementioned specimen I, pre-supply the pre-existing gas' and at least in the observation using the aforementioned ultraviolet light, formally supply the aforementioned inert gas. 19 · "Specimen observation method, which is to supply inert gas to the specimen week to observe the aforementioned specimen with a microscope using ultraviolet light. 20. The method for observing a specimen according to item 19 in the patent scope of Shenyan, wherein using ultraviolet light to Microscope observation of the aforementioned camphor umbrella &lt; W, preparative supply of inert gas to the surroundings of the specimen; ^ issue when using ultraviolet light to observe the aforementioned specimen with a microscope, β, ground supplies inert gas to the surroundings of the specimen. Formal_4-