JP2794764B2 - Defect inspection equipment - Google Patents

Defect inspection equipment

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Publication number
JP2794764B2
JP2794764B2 JP1101649A JP10164989A JP2794764B2 JP 2794764 B2 JP2794764 B2 JP 2794764B2 JP 1101649 A JP1101649 A JP 1101649A JP 10164989 A JP10164989 A JP 10164989A JP 2794764 B2 JP2794764 B2 JP 2794764B2
Authority
JP
Japan
Prior art keywords
optical system
light
objective lens
defect inspection
observation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1101649A
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Japanese (ja)
Other versions
JPH02281223A (en
Inventor
雅人 熊澤
欣也 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
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Filing date
Publication date
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Priority to JP1101649A priority Critical patent/JP2794764B2/en
Publication of JPH02281223A publication Critical patent/JPH02281223A/en
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Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、例えば、LSI製造に供するレチクル(マス
クと同義)の欠陥検査を行う欠陥検査装置に関するもの
であり、特に被検査体を観察する観察光学系を備えた欠
陥検査装置に関する。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a defect inspection apparatus that performs a defect inspection of a reticle (synonymous with a mask) provided for LSI manufacture, for example, and particularly observes an inspection object. The present invention relates to a defect inspection device having an observation optical system.

[従来の技術] 第2図は、従来のレチクル欠陥検査装置の光学系の構
成を示す。ここで、観察光学系は、必要に応じ切り替え
る対物レンズ103〜105、撮像素子IS2、この撮像素子IS2
上の観察領域を調整する調整レンズ108等により構成さ
れ、目視観察用の接眼レンズ110と跳ねのけミラー107を
備えている。
[Prior Art] FIG. 2 shows a configuration of an optical system of a conventional reticle defect inspection apparatus. Here, the observation optical system includes an objective lens 103 to 105 that is switched as necessary, an image sensor IS2, and the image sensor IS2.
It comprises an adjustment lens 108 for adjusting the upper observation area and the like, and includes an eyepiece 110 for visual observation and a splash mirror 107.

被検査体のレチクルR2は透過照明光源BL2により下方
から照明され、レチクルR2上面の検査対象(回路パター
ン)からの観察光は、対物レンズ104、ハーフミラー10
6、調整レンズ108を経て、拡大されて撮像素子IS2に入
力され、テレビモニターM2に映像出力される。
The reticle R2 of the object to be inspected is illuminated from below by the transmitted illumination light source BL2.
6. The image is enlarged and input to the image sensor IS2 via the adjustment lens 108, and the image is output to the television monitor M2.

この検査装置には、検査対象と対物レンズ104間の距
離を最適に自動調整する、自動焦点機構が組み込まれて
いる。自動焦点検出光学系は、焦点検出装置FS2、対物
レンズの交換に応じて挿入される色収差補正レンズ11
2、赤外光を反射して可視光を透過するダイクロイック
ミラー111、ハーフミラー106、対物レンズ104で構成さ
れ、焦点検出用の光を用いて検査対象と対物レンズ104
間の距離を検出する。この距離は図示されない手段によ
って自動的に調整される。
The inspection apparatus incorporates an automatic focusing mechanism that automatically adjusts the distance between the inspection object and the objective lens 104 optimally. The automatic focus detection optical system includes a focus detection device FS2, a chromatic aberration correction lens 11 inserted according to replacement of the objective lens.
2. It is composed of a dichroic mirror 111 that reflects infrared light and transmits visible light, a half mirror 106, and an objective lens 104.
Detect the distance between them. This distance is automatically adjusted by means not shown.

焦点検出用の光(この場合赤外光)は、焦点検出装置
FS2から射出され、ダイクロイックミラー111とハーフミ
ラー106で反射され、対物レンズ104を通って検査対象で
反射され、同一の経路を逆進して焦点検出装置FS2に導
かれる。
The light for focus detection (in this case, infrared light) is a focus detection device
The light is emitted from the FS2, reflected by the dichroic mirror 111 and the half mirror 106, reflected by the inspection object through the objective lens 104, guided backward through the same path, and guided to the focus detection device FS2.

上述のように、対物レンズ(103〜105)は、3種類の
観察倍率に応じて3本取り付けられていて、用途に従っ
て切り換える構造となっている。すなわち、アライメン
ト時には広い視野を必要とするので低倍率の対物レンズ
103、レチクルR2検査時は中倍率の対物レンズ104、さら
に高倍率の必要な場合は高倍率の対物レンズ105に切り
替える。
As described above, three objective lenses (103 to 105) are mounted according to three types of observation magnifications, and are configured to be switched according to the application. In other words, a wide field of view is required during alignment, so a low-magnification objective lens
At the time of the reticle R2 inspection, the objective lens 104 is switched to the medium magnification objective lens 104, and if a high magnification is required, the objective lens 105 is switched to the high magnification objective lens 105.

このとき、調整レンズ108で撮像素子IS2の視野を調整
し直し、さらに、色収差補正レンズ112を交換して、自
動焦点検出光学系に発生する軸方向色収差を補正する。
At this time, the field of view of the image sensor IS2 is readjusted by the adjustment lens 108, and the chromatic aberration correction lens 112 is replaced to correct axial chromatic aberration generated in the automatic focus detection optical system.

[発明が解決しようとする課題] 上述したような従来の外観検査装置は、観察倍率に応
じて対物レンズを切り替える必要があるとともに、色収
差補正レンズによる自動焦点検出光学系の補正が必要だ
った。また、対物レンズ切り替え機構部分が被検査物の
直上にあるため、切り替え操作時に機械の摺動部分から
ゴミが発生し、被検査物に付着して新たな汚染問題を生
じていた。
[Problems to be Solved by the Invention] In the above-described conventional visual inspection apparatus, it is necessary to switch the objective lens according to the observation magnification, and it is necessary to correct the automatic focus detection optical system by the chromatic aberration correction lens. Further, since the objective lens switching mechanism is located directly above the object to be inspected, dust is generated from a sliding portion of the machine during the switching operation and adheres to the object to be inspected, causing a new contamination problem.

本発明は、対物レンズの切り替えを必要としない、観
察倍率の変更が容易な欠陥検査装置を提供することを目
的とする。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a defect inspection apparatus that does not require switching of an objective lens and that can easily change an observation magnification.

[課題を解決するための手段] 本願請求項1に係る欠陥検査装置は、被検査体に照明
光を供給する光源部と、該被検査体からの観察光に基づ
いて該被検査体の観察像を所定の倍率のもとで結像させ
る観察光学系とを有する欠陥検査装置において、前記観
察光学系は、前記欠陥検査装置に固設されて一定倍率を
有し、無限遠対物レンズと結像レンズとを備える対物レ
ンズ系と、該対物レンズ系が形成する前記被検査体の中
間像の後側に配置されて該対物レンズ系が捕えた前記観
察像を所定の倍率に変換するための変倍光学系と、前記
観察光から焦点検出用の光を分離する分割光学系と、該
焦点検出用の光により前記対物レンズ系と前記被検査体
との位置関係を検出して作動する自動焦点機構とを備え
ることを特徴とするものである。
[Means for Solving the Problems] A defect inspection apparatus according to claim 1 of the present application includes a light source unit that supplies illumination light to an inspection object, and observation of the inspection object based on observation light from the inspection object. In a defect inspection apparatus having an observation optical system that forms an image at a predetermined magnification, the observation optical system is fixed to the defect inspection apparatus, has a constant magnification, and forms an image with an infinity objective lens. An objective lens system including an image lens, and an objective lens system for converting the observation image captured by the objective lens system to a predetermined magnification, which is disposed behind the intermediate image of the object to be inspected formed by the objective lens system. A variable power optical system, a split optical system that separates focus detection light from the observation light, and an automatic operation that operates by detecting a positional relationship between the objective lens system and the object to be inspected by the focus detection light. And a focusing mechanism.

請求項2に係る欠陥検査装置は、請求項1記載の欠陥
検査装置であり、前記分割光学系は、前記対物レンズ系
と前記変倍光学系との間に配置されることを特徴とする
ものである。
A defect inspection apparatus according to a second aspect is the defect inspection apparatus according to the first aspect, wherein the split optical system is disposed between the objective lens system and the variable power optical system. It is.

請求項3に係る欠陥検査装置は、請求項1及び請求項
2のいずれかに記載の欠陥検査装置であり、前記分割光
学系は、該無限遠対物レンズと該結像レンズとの間に配
置されることを特徴とするものである。
A defect inspection apparatus according to a third aspect is the defect inspection apparatus according to any one of the first and second aspects, wherein the split optical system is disposed between the infinity objective lens and the imaging lens. It is characterized by being performed.

請求項4に係る欠陥検査装置は、請求項1から請求項
3のいずれかに記載の欠陥検査装置であり、前記焦点検
出用の光は、前記観察光とは異なる波長域の光であり、
前記分割光学系は、ダイクロイックミラーを有すること
を特徴とするものである。
A defect inspection apparatus according to a fourth aspect is the defect inspection apparatus according to any one of the first to third aspects, wherein the light for focus detection is light in a wavelength range different from the observation light,
The split optical system has a dichroic mirror.

請求項5に係る欠陥検査装置、請求項1から請求項3
のいずれかに記載の欠陥検査装置であり、前記焦点検出
用の光は、赤外光であり、かつ前記分割光学系を透過し
て前記自動焦点機構へ導かれることを特徴とするもので
ある。
A defect inspection apparatus according to claim 5, and claims 1 to 3.
Wherein the light for focus detection is infrared light, and is transmitted through the split optical system and guided to the automatic focusing mechanism. .

[作用] 請求項1の欠陥検査装置では、対物レンズ系が一定倍
率で固定されており、観察倍率を変更するときに、対物
レンズ系を切り換えないで個別に設けられた変倍光学系
により倍率の変更が行われる。従って、倍率変更時に被
検査体を汚染するゴミの発生を防止できる。また、対物
レンズ系が無限遠対物レンズと結像レンズとを備えるの
で、無限遠対物レンズと結像レンズとの間にミラー等の
光学素子を挿入してもその挿入による影響を最小限に抑
えることができ、光学系全体の設計の自由度を増すこと
ができる。また、変倍光学系が対物レンズ系によって形
成される中間像の後側に配置されるので、結像レンズに
よって形成される像を変倍することになり、変倍光学系
がさらに対物レンズから離れて被検査体の汚染をより少
なくできるとともに、変倍光学系等の設計が簡易とな
り、変倍による結像特性の劣化を防止することができ
る。さらに、分割光学系で分離された焦点検出用の光に
よって対物レンズ系と被検査体との位置関係が検出さ
れ、自動焦点機構は、この距離検出結果に基づいて対物
レンズと被検査体間の距離を自動的に最適に調整する。
[Operation] In the defect inspection apparatus of the first aspect, the objective lens system is fixed at a fixed magnification, and when changing the observation magnification, the magnification is changed by the variable magnification optical system provided separately without switching the objective lens system. Changes are made. Therefore, it is possible to prevent the generation of dust that contaminates the test object when the magnification is changed. In addition, since the objective lens system includes an infinity objective lens and an imaging lens, even if an optical element such as a mirror is inserted between the infinity objective lens and the imaging lens, the effect of the insertion is minimized. Therefore, the degree of freedom in designing the entire optical system can be increased. Further, since the variable power optical system is disposed behind the intermediate image formed by the objective lens system, the image formed by the imaging lens is changed in magnification, and the variable power optical system is further moved from the objective lens. It is possible to further reduce the contamination of the object to be inspected, simplify the design of the variable power optical system and the like, and prevent the deterioration of the imaging characteristics due to the variable power. Further, the positional relationship between the objective lens system and the object to be inspected is detected by the light for focus detection separated by the split optical system, and the auto-focus mechanism detects the distance between the objective lens and the object to be inspected based on the distance detection result. Automatically adjust the distance to optimal.

請求項2の欠陥検査装置では、分割光学系が対物レン
ズ系と変倍光学系との間に配置されるので、自動焦点機
構を、対物レンズ系を利用して一定の検出倍率で動作さ
せることができる。
In the defect inspection apparatus according to the second aspect, since the split optical system is disposed between the objective lens system and the variable power optical system, the automatic focusing mechanism is operated at a constant detection magnification using the objective lens system. Can be.

請求項3の欠陥検査装置では、無限遠対物レンズによ
り被検査体からの光が平行光束に変換されるとともに、
結像レンズにより結像レンズの後側焦点位置に被検査体
の像が形成される。また、分割光学系が無限遠対物レン
ズと結像レンズとの間に配置されるので、分割光学系に
は、平行光束が入射する。
In the defect inspection apparatus according to the third aspect, the light from the object to be inspected is converted into a parallel light beam by the infinity objective lens,
An image of the inspection object is formed at the rear focal position of the imaging lens by the imaging lens. Further, since the split optical system is disposed between the infinity objective lens and the imaging lens, a parallel light beam enters the split optical system.

請求項4の欠陥検査装置では、焦点検出用の光が観察
光とは異なる波長域の光であり、分割光学系がダイクロ
イックミラーを有するので、焦点検出と観察とを並行し
て行うことができる。
In the defect inspection apparatus according to the fourth aspect, the light for focus detection is light in a wavelength range different from the observation light, and the split optical system has a dichroic mirror, so that focus detection and observation can be performed in parallel. .

請求項5の欠陥検査装置では、焦点検出用の光が、赤
外光でありかつ分割光学系を透過して自動焦点機構へ導
かれるので、分割光学系を簡易に作製することができ
る。
In the defect inspection apparatus according to the fifth aspect, since the light for focus detection is infrared light and passes through the split optical system and is guided to the automatic focusing mechanism, the split optical system can be easily manufactured.

[発明の実施例] 第1図は本発明に係る外観検査装置の一実施例にな
る、レチクルRの欠陥検査装置の光学系の構成を示す。
本実施例では、従来必要な倍率に応じて切り替えて使用
していた対物レンズを、アライメントに必要な視野と検
査に必要な開口数を持つ1本の無限系の対物レンズ3に
するとともに、観察倍率の変更は、結像レンズ9により
形成される像の後方に設置した変倍リレーレンズ11によ
って行う構成とした。
[Embodiment of the Invention] Fig. 1 shows a configuration of an optical system of a defect inspection apparatus for a reticle R, which is an embodiment of a visual inspection apparatus according to the present invention.
In the present embodiment, the objective lens, which has conventionally been switched and used according to the required magnification, is replaced with a single infinite objective lens 3 having a field of view required for alignment and a numerical aperture required for inspection and observation. The magnification is changed by a variable magnification relay lens 11 installed behind the image formed by the imaging lens 9.

本実施例の観察光学系は、固定された無限系の対物レ
ンズ3、結像レンズ9、赤外光を透過して可視光を反射
するダイクロイックミラー4、変倍リレーレンズ11、撮
像素子IS等で構成され、目視観察用の跳ねのけミラー12
と接眼レンズ13を備える。
The observation optical system of the present embodiment includes a fixed infinite objective lens 3, an imaging lens 9, a dichroic mirror 4 that transmits infrared light and reflects visible light, a variable magnification relay lens 11, an image sensor IS, and the like. , A bounce mirror for visual observation 12
And an eyepiece 13.

レチクルRは透過照明光源BLにより下方から照明され
て、レチクルR上面の検査対象(回路パターン)からの
観察光は、対物レンズ3に捕えられ、ダイクロイックミ
ラー4で反射され、ハーフミラー7を経て、結像レンズ
9により視標10上に結像する。この像を変倍リレーレン
ズ11により適切な倍率に拡大して、撮像素子ISに入力、
テレビモニターMに映像出力して、レチクルRの検査を
行なう。
The reticle R is illuminated from below by the transmitted illumination light source BL, and the observation light from the inspection target (circuit pattern) on the upper surface of the reticle R is captured by the objective lens 3, reflected by the dichroic mirror 4, passes through the half mirror 7, An image is formed on the target 10 by the imaging lens 9. This image is magnified to an appropriate magnification by the variable power relay lens 11 and input to the image sensor IS.
The image is output to the television monitor M, and the reticle R is inspected.

また、テレビモニターM画面上の異常が欠陥かゴミか
の判別を要するような場合、落射照明光源RLとハーフミ
ラー7でレチクルRを上方から照明するとともに、跳ね
のけミラー12を光路中に挿入して接眼レンズ13から前記
異常の目視観察を行う。
When it is necessary to determine whether the abnormality on the screen of the television monitor M is a defect or dust, the epi-illumination light source RL and the half mirror 7 illuminate the reticle R from above, and the bouncing mirror 12 is inserted into the optical path. Then, visual observation of the abnormality is performed from the eyepiece 13.

この検査装置には、レチクルRと対物レンズ3との間
の距離を最適に自動調整する、自動焦点機構が組み込ま
れている。焦点検出光学系は、焦点検出装置FS、結像レ
ンズ5、ダイクロイックミラー4(赤外光を透過して可
視光を反射する)、対物レンズ3により構成される。
This inspection apparatus incorporates an automatic focusing mechanism for automatically adjusting the distance between the reticle R and the objective lens 3 automatically. The focus detection optical system includes a focus detection device FS, an imaging lens 5, a dichroic mirror 4 (transmits infrared light and reflects visible light), and an objective lens 3.

焦点検出装置FSは、赤外発光LEDを用いて焦点検出用
のパターンを赤外光によりレチクルR上に投影する。焦
点検出装置FSは、この赤外光のレチクルR表面での反射
光を捕え、内部のビームスプリッターにより分割して、
焦点検出用のパターンを結像させる。焦点検出装置FS
は、この像から焦点の整合状態を検出するものである。
The focus detection device FS projects a pattern for focus detection on the reticle R by infrared light using an infrared light emitting LED. The focus detection device FS captures the reflected light of the infrared light on the surface of the reticle R, splits the light by an internal beam splitter,
An image of a focus detection pattern is formed. Focus detector FS
Is to detect the focus state from this image.

焦点検出用の光である赤外光は、焦点検出装置FSから
射出され、結像レンズ5、ダイクロイックミラー4、対
物レンズ3を通ってレチクルRで反射され、同一の経路
を逆進して焦点検出装置FSに導かれる。
Infrared light, which is light for focus detection, is emitted from the focus detection device FS, passes through the imaging lens 5, the dichroic mirror 4, and the objective lens 3, is reflected by the reticle R, and travels backward on the same path to focus. It is led to the detection device FS.

焦点検出装置FSは、レチクルRと対物レンズ3間の距
離を検出し、この距離は図示されない手段によって自動
的に調整される。
The focus detection device FS detects the distance between the reticle R and the objective lens 3, and this distance is automatically adjusted by means not shown.

本実施例においては、対物レンズ3は無限系とした
が、従来同様、有限系でも構成可能である。
In the present embodiment, the objective lens 3 is an infinite system, but it can be configured as a finite system as in the prior art.

本実施例においては、ダイクロイックミラー4によ
り、対物レンズ3の直後で焦点検出装置FSへの光学系を
分離したので、全体の構造が単純化され、ダイクロイッ
クミラーの製作も容易となった(赤外光透過型は、可視
光透過型よりも製作が容易である)。しかし、従来同
様、赤外光反射型のダイクロイックミラーを用いたり、
ハーフミラーのみで光学系を構成することも可能であ
る。
In the present embodiment, since the optical system to the focus detection device FS is separated immediately after the objective lens 3 by the dichroic mirror 4, the overall structure is simplified and the dichroic mirror can be easily manufactured (infrared ray). The light transmission type is easier to manufacture than the visible light transmission type). However, as before, an infrared light reflection type dichroic mirror was used,
It is also possible to configure an optical system only with a half mirror.

[発明の効果] 以上説明した通り、本発明の欠陥検査装置では、被検
査体を汚染するゴミの発生を少なくすることができる。
また、対物レンズ系が無限遠対物レンズと結像レンズと
を備えるので、光学系全体の設計の自由度を増すことが
できる。また、変倍光学系が対物レンズ系によって形成
される中間像の後側に配置されるので、変倍光学系がさ
らに対物レンズから離れて被検査体の汚染をより少なく
できるとともに、変倍光学系等の設計が簡易となり、変
倍による結像特性の劣化を防止することができる。さら
に、自動焦点機構が焦点調節を行うから、観察者は自ら
焦点調節を行うことなく、直ちに観察が可能である。
[Effects of the Invention] As described above, the defect inspection apparatus of the present invention can reduce the generation of dust contaminating the inspection object.
In addition, since the objective lens system includes the infinity objective lens and the imaging lens, the degree of freedom in designing the entire optical system can be increased. In addition, since the variable power optical system is disposed behind the intermediate image formed by the objective lens system, the variable power optical system can be further separated from the objective lens to reduce contamination of the object to be inspected, The design of the system and the like can be simplified, and it is possible to prevent the imaging characteristics from deteriorating due to zooming. Furthermore, since the autofocus mechanism performs focus adjustment, the observer can immediately observe without performing focus adjustment by himself.

さらに、分割光学系を対物レンズ系と変倍光学系との
間に配置した場合には、自動焦点機構を一定倍率で動作
する簡易な構造とすることができる。つまり、倍率変更
時の焦点検出に用いる色収差補正用レンズの挿入、交換
等の煩雑な調整が不要となった。また、対物レンズに応
じた焦点目標数が減って、自動焦点機構全体の構造と動
作が単純化される。また、観察光学系と自動焦点機構の
光学系とは対物レンズ等の構成部品を共有するので、全
体の部品数が減り、自動焦点機構の動作精度も向上し
た。
Further, when the split optical system is disposed between the objective lens system and the variable power optical system, the automatic focusing mechanism can have a simple structure that operates at a constant magnification. That is, complicated adjustment such as insertion and replacement of the chromatic aberration correcting lens used for focus detection at the time of changing the magnification is not required. In addition, the number of focus targets corresponding to the objective lens is reduced, and the structure and operation of the entire automatic focusing mechanism are simplified. Further, since the observation optical system and the optical system of the automatic focusing mechanism share components such as an objective lens, the total number of components is reduced, and the operation accuracy of the automatic focusing mechanism is improved.

特に、分割光学系を無限遠対物レンズと結像レンズと
の間に配置した場合には、観察光学系に挿入されたミラ
ー(実施例中において符号4、7、12で示される部分)
での非対称な色収差を生じない等の効果がある。
In particular, when the split optical system is disposed between the infinity objective lens and the imaging lens, mirrors inserted into the observation optical system (portions denoted by reference numerals 4, 7, and 12 in the embodiment).
This has the effect of preventing asymmetric chromatic aberration from occurring.

さらに、焦点検出用の光が観察光とは異なる波長域の
光で分割光学系がダイクロイックミラーを有する場合
や、焦点検出用の光が赤外光でありかつ分割光学系を透
過して自動焦点機構へ導かれるようにした場合、欠陥検
査装置を好適なものとすることができる。
Furthermore, when the light for focus detection is light in a wavelength range different from the observation light and the splitting optical system has a dichroic mirror, or when the light for focus detection is infrared light and passes through the splitting optical system and is automatically focused. When guided to the mechanism, the defect inspection apparatus can be made suitable.

【図面の簡単な説明】 [図面の説明] 第1図は本発明の一実施例に係るレチクル検査装置の光
学系の構成図。第2図は従来例の説明に係るレチクル検
査装置の光学系の構成図である。 [主要部分の符号の説明] 3……対物レンズ、BL……透過照明光源 4……ダイクロイックミラー、R……レチクル 7……ハーフミラー、FS……焦点検出装置 9……結像レンズ、IS……撮像素子 11……変倍リレーレンズ
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a configuration diagram of an optical system of a reticle inspection apparatus according to one embodiment of the present invention. FIG. 2 is a configuration diagram of an optical system of a reticle inspection apparatus according to a conventional example. [Description of Signs of Main Parts] 3 ... Objective lens, BL ... Transmission illumination light source 4 ... Dichroic mirror, R ... Reticle 7 ... Half mirror, FS ... Focus detection device 9 ... Imaging lens, IS …… Imaging element 11 …… Resizing lens

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) G01N 21/84 - 21/91 G02B 21/00 - 21/36──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) G01N 21/84-21/91 G02B 21/00-21/36

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】被検査体に照明光を供給する光源部と、該
被検査体からの観察光に基づいて該被検査体の観察像を
所定の倍率のもとで結像させる観察光学系とを有する欠
陥検査装置において、 前記観察光学系は、前記欠陥検査装置に固設されて一定
倍率を有し、無限遠対物レンズと結像レンズとを備える
対物レンズ系と、 該対物レンズ系が形成する前記被検査体の中間像の後側
に配置されて該対物レンズ系が捕えた前記観察像を所定
の倍率に変換するための変倍光学系と、 前記観察光から焦点検出用の光を分離する分割光学系
と、 該焦点検出用の光により前記対物レンズ系と前記被検査
体との位置関係を検出して作動する自動焦点機構と、 を備えることを特徴とする欠陥検査装置。
1. A light source unit for supplying illumination light to a test object, and an observation optical system for forming an observation image of the test object at a predetermined magnification based on the observation light from the test object. Wherein the observation optical system is fixed to the defect inspection device and has a fixed magnification, and an objective lens system including an infinity objective lens and an imaging lens. A variable-magnification optical system for converting the observation image captured by the objective lens system to a predetermined magnification, which is disposed on the rear side of the intermediate image of the inspection object to be formed, and light for focus detection from the observation light 1. A defect inspection apparatus, comprising: a split optical system that separates an object; and an automatic focusing mechanism that operates by detecting a positional relationship between the objective lens system and the object to be inspected using the light for focus detection.
【請求項2】前記分割光学系は、前記対物レンズ系と前
記変倍光学系との間に配置されることを特徴とする請求
項1記載の欠陥検査装置。
2. The defect inspection apparatus according to claim 1, wherein said split optical system is disposed between said objective lens system and said variable power optical system.
【請求項3】前記分割光学系は、該無限遠対物レンズと
該結像レンズとの間に配置されることを特徴とする請求
項1または2の何れか記載の欠陥検査装置。
3. The defect inspection apparatus according to claim 1, wherein the split optical system is disposed between the infinity objective lens and the imaging lens.
【請求項4】前記焦点検出用の光は、前記観察光とは異
なる波長域の光であり、前記分割光学系は、ダイクロイ
ックミラーを有することを特徴とする請求項1〜3の何
れか一項記載の欠陥検査装置。
4. The apparatus according to claim 1, wherein the light for focus detection is light in a wavelength range different from that of the observation light, and the split optical system has a dichroic mirror. The defect inspection device according to the item.
【請求項5】前記焦点検出用の光は、赤外光であり、か
つ前記分割光学系を透過して前記自動焦点機構へ導かれ
ることを特徴とする請求項1〜3の何れか一項記載の欠
陥検査装置。
5. The auto-focus mechanism according to claim 1, wherein the light for focus detection is infrared light, and is transmitted through the split optical system and guided to the automatic focusing mechanism. Described defect inspection apparatus.
JP1101649A 1989-04-24 1989-04-24 Defect inspection equipment Expired - Fee Related JP2794764B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1101649A JP2794764B2 (en) 1989-04-24 1989-04-24 Defect inspection equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1101649A JP2794764B2 (en) 1989-04-24 1989-04-24 Defect inspection equipment

Publications (2)

Publication Number Publication Date
JPH02281223A JPH02281223A (en) 1990-11-16
JP2794764B2 true JP2794764B2 (en) 1998-09-10

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Country Link
JP (1) JP2794764B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3563800B2 (en) * 1995-01-09 2004-09-08 オリンパス株式会社 Observation optical device
EP2869108B1 (en) * 2012-06-27 2022-04-13 Sony Group Corporation Microscope and shutter mechanism

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Publication number Priority date Publication date Assignee Title
JP2614843B2 (en) * 1985-12-02 1997-05-28 オリンパス光学工業株式会社 Autofocus microscope
JPS62184428A (en) * 1986-02-08 1987-08-12 Mitsubishi Electric Corp Observing device for minute object in solution
JPS63134937A (en) * 1986-11-27 1988-06-07 Canon Inc Pattern inspection device
JPS63167318A (en) * 1986-12-27 1988-07-11 Canon Inc Stereoscopic microscope
JPS63257808A (en) * 1987-04-16 1988-10-25 Hitachi Ltd Device for inspecting parts fitting
US4845558A (en) * 1987-12-03 1989-07-04 Kla Instruments Corporation Method and apparatus for detecting defects in repeated microminiature patterns

Also Published As

Publication number Publication date
JPH02281223A (en) 1990-11-16

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