TW567565B - Chip-on-board module, and method of manufacturing the same - Google Patents

Chip-on-board module, and method of manufacturing the same Download PDF

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Publication number
TW567565B
TW567565B TW091124366A TW91124366A TW567565B TW 567565 B TW567565 B TW 567565B TW 091124366 A TW091124366 A TW 091124366A TW 91124366 A TW91124366 A TW 91124366A TW 567565 B TW567565 B TW 567565B
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Taiwan
Prior art keywords
wafer
wafers
board
connection
pads
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TW091124366A
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Chinese (zh)
Inventor
Naoyuki Shinonaga
Syuuichi Osaka
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Mitsubishi Electric Corp
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Publication of TW567565B publication Critical patent/TW567565B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19107Disposition of discrete passive components off-chip wires

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

A chip-on-board module has a multilayer interconnection board having die mount sections; dies mounted on respective die mount sections such that a single die is mounted on each die mount section or two or more dies are being stacked and mounted there; bonding pads provided on the multilayer and connected to single dies or uppermost dies; contact pads provided on the multilayer board and connected to corresponding bonding pads; jumper pads provided in proximity to the contact pads and connected to edge terminals of the multilayer board, circuit elements mounted on the multilayer interconnection board, or through holes formed so as to extend across layers of the multilayer board; and molding resin for molding the dies and the pads. The uppermost dies of the respective die mount sections where dies are stacked in two or more layers have passed an electric property test.

Description

567565 五、發明說明(l) [發明所屬之技術領域] 本發明有關於將板上連接式晶片,特別是記憶器晶片, 微電腦晶片,AS I C晶片等之半導體晶片(d i e )裝著在多層 配線基板之板上連接式晶片及其製造方法。 [習知之技術] 以記憶器模組之實例用來表示習知 圖11是概略圖 _____,,、一 .............. ^ ^ ^ ^ 上連接式晶片(以下稱為COB)之構造,(a)是斜視圖,用來 表示全體構造,(b)表示(a)所示構造中之鄰接之2個I c, 裝著到多層配線基板之裝著構造。 ,在該等之圖中,元件編號i是多層配線基板,2是1(:引線 襯墊,用來連接和固定被設在多層配線基板上之多個IC之 引線,藉以將I C組裝在多層配線基板j上,3是電連接在j c 引線襯墊2之間之配線圖案,以指定之圖案被 ㈣基板工之表面,除了 IC之互相連接外,用來 裝者在多層配線基板之電阻,電容器、熔線等之電路元 (*圖中未顯示)之連接,或進行與形成跨越多層配線基板之 穿通孔(用以進行各個配線基板間之連接)之連接,或進 f多層配線基板外之成為連接端子之邊緣端子4之連接。5 gC继經由將多:引線^固定在上述之1(:引線襯墊2 Λ組裝在多層配線基板1上。 用 圖1 2是流程圖’用來矣+圓1 1 (、一 ^ ^ . ^ po * ^表不圖11 (a)所不之記憶器模組之 製k Y驟。亦即’在步驟81使記憶器 示)連結到習知之引線樞架(圖中未顯示)。其次,Y步7 S2,對晶片和引線框架進行線連結。然後在步糊,使驟晶567565 V. Description of the invention (l) [Technical field to which the invention belongs] The present invention relates to mounting a semiconductor chip (die) such as a memory chip, a microcomputer chip, an AS IC chip, and the like on a multilayer wiring board. On-board connected wafer of substrate and manufacturing method thereof. [Knowledgeable technology] An example of a memory module is used to indicate the knowledge. Figure 11 is a schematic diagram _____ ,,, a .............. ^ ^ ^ ^ (Hereinafter referred to as COB), (a) is a perspective view showing the overall structure, (b) shows two adjacent I c in the structure shown in (a), and is mounted on a multilayer wiring board structure. In these figures, the component number i is a multilayer wiring substrate, and 2 is 1 (: lead pads, used to connect and fix the leads of multiple ICs provided on the multilayer wiring substrate, thereby assembling the IC in a multilayer On the wiring substrate j, 3 is a wiring pattern electrically connected between the jc lead pads 2, and the surface of the substrate is fixed in a specified pattern. In addition to the interconnection of the IC, it is used to install the resistance on the multilayer wiring substrate. Connection of circuit elements (not shown in the figure) such as capacitors and fuses, or connection with through-holes (for connection between the various wiring substrates) formed across the multilayer wiring substrate, or outside the multilayer wiring substrate It becomes the connection of the edge terminal 4 of the connection terminal. 5 gC is further fixed on the multi-layer wiring substrate 1 by fixing the lead: ^ to the above 1 (: lead pad 2 Λ). Figure 12 is a flow chart 'for矣 + circle 1 1 (, a ^ ^. ^ Po * ^ shows the system k Y step of the memory module not shown in Figure 11 (a). That is, 'show the memory at step 81) is linked to the known Lead Pivot (not shown). Second, Y step 7 S2, for wafer and lead frame Performs line coupling. Then at step paste, so that the grain quenched

C:\2D-OODE\92-Ol\91124366.ptd 第5頁 567565C: \ 2D-OODE \ 92-Ol \ 91124366.ptd Page 5 567565

片和引線框架成為榭# #在·丨& + 驟S4,對每一個3實體藉以形成1C5。然後’在步 步驟S5將其廢棄,;二=試!,當不合格之情況時在 一 Λ ^ 田D格之情況時,在步驟S6如圖1 1所 不,將其組奴到多層配線基板i。 然在步驟S7實施作為記憶器模組之電特性試驗,然 後結束該製造步驟。 圖13圖18疋概略目’用來表示在步驟%將旧組裝到 夕層配線基板1之情況時之電路構造和1C之配置之方法,The sheet and the lead frame become Xe # # 在 丨 & + Step S4, thereby forming 1C5 for each 3 entities. Then ’discard it at step S5; two = try! When the unqualified condition is in the case of Δ ^ D field, it is slaved to the multilayer wiring substrate i in step S6 as shown in FIG. 11. Then, an electrical characteristic test is performed as a memory module in step S7, and then the manufacturing step is ended. FIG. 13 and FIG. 18 (Summarization) are used to show the circuit structure and the arrangement method of 1C when the old assembly is performed on the wiring board 1 at step%.

圖13和圖14表示組裝9㈣之情況,圖15和圖16表示組裝 •個1C之情況,圖17和圖18表示組裝36個1(:之情況。 f組裝9個IC之情況時,各個1C如圖14所示,被配置和 裝著在多層配線基板。該圖表示多層配線基板丨為2層之實 例,(a)表不成為表面之第}層之配線基板u,(b)表示成 為背面之第2層之配線基板lb。9個之Ic分成4個和5個之2 個群組,由4個構成之群組(5 a 1〜5 a 4 )如圖所示的被配置 在第1層之配線基板la,由5個構成之群組(5bl〜5b5)如圖 所示的被配置在第2層之配線基板1 b,兩基板間之連接經 由圖中未顯不之穿通孔進行連接。第1層之配線基板丨a之FIGS. 13 and 14 show the case of assembling 9 ,, FIG. 15 and FIG. 16 show the case of assembling 1C, and FIG. 17 and FIG. 18 show the case of assembling 36 1 (:. f When assembling 9 ICs, each 1C As shown in Fig. 14, it is arranged and mounted on a multilayer wiring substrate. This figure shows an example where the multilayer wiring substrate is two layers, (a) represents the wiring substrate u which is the} th layer on the surface, and (b) represents The second layer wiring board lb on the back side. The 9 ICs are divided into 4 and 5 2 groups, and the 4 group (5 a 1 to 5 a 4) is arranged as shown in the figure. The wiring board 1a on the first layer is composed of 5 groups (5bl to 5b5) as shown in the wiring board 1b on the second layer, and the connection between the two substrates is not shown in the figure. Hole for connection. Wiring board of the first layer 丨 a

元件編號5 0是連接用I C ’經由邊緣端子4用來與外部電路 •接。 電路構造如圖1 3所示’構建成將時脈信號(a d d,C K E 0, /S0-3等)和I / 〇信號(DQO. · ·等)個別的並行供給到由4個構 成之群組之各個IC(5al〜5a4)和由5個構成之群組之各個 IC(5bl〜5b5)。在圖中所示之情況是例如形成經由IC5alThe component number 50 is I C ′ for connection to an external circuit via the edge terminal 4. The circuit structure is shown in Fig. 13 'It is constructed to supply the clock signals (add, CKE 0, / S0-3, etc.) and I / 〇 signals (DQO. · ·, Etc.) individually and in parallel to a group consisting of 4 Each IC of the group (5al to 5a4) and each IC of the group of 5 (5bl to 5b5). The situation shown in the figure is for example formed via IC5al

C:\2D-CODE\92-Ol\9in4366.ptd 第 6 頁 567565 五、發明說明(3) 對IC5a2供給時脈信號,但是亦可以不經由IC5ai對1(:532 供給’與對IC5a3同樣的,連接成不經由丨以“和1(:532供 給。對於其他之I C亦同。另外,對於丨/Q信號亦同。 另外’在組裝1 8個I C之情況時,各個丨c如圖丨6所示,被 配置和裝著在多層配線基板丨a,1 b。亦即,在第1層之配 線基板1 a和第2層之配線基板1 b分別各配置g個。 連接用IC50和穿通孔(圖中未顯示)因為與圖14之情況相 同,故其說明加以賓略。電路構造成為如圖15所示。 各個信號對各個ic之供給方法與圖13相同,惟一之不同 ϋ份是各個群組之1C之數目分別為9個,故其說明加 略。 曰 另外’在、组裝36個1(:之情況時,各個IC 之4個群I如圖18所示’被配置和裝著在多 各基 mb。亦即,在第i層之配線基板la和第2 f lb分別配置2個群組各18個。 /基板 顯:)因為與圖14之情況相同,故其說明加以省略 未 射成ΐ如圖17所示"曾加之並聯/串聯之電路數 /SO ΛΛίί數之增加部份,時脈信號(Add,CKE0 /=-3夺)對各個群組之供給方法與@i3相同。⑽ f HDQ0....等)亦分別並聯的供給到 1C,電性方面與圖13相同。在圖 群,、且之 經由K5MmC5dl供給1/〇信號是亦凊以兄’例如形成 由IC5bUfIC5dl供給。對於:―疋亦了以連接成不經 1C亦同。 iL5al和5cl亦同,對於其他之C: \ 2D-CODE \ 92-Ol \ 9in4366.ptd Page 6 567565 V. Description of the invention (3) Clock signal is supplied to IC5a2, but it can also be supplied to 1 (: 532 without IC5ai's the same as IC5a3). , Connected so as not to be supplied with 丨 and 1 (: 532. The same is true for other ICs. In addition, it is the same for 丨 / Q signals. In addition, in the case of assembling 18 ICs, each 丨 c is as shown in 丨As shown in Fig. 6, the multilayer wiring substrates a and 1 b are arranged and mounted. That is, the wiring substrates 1 a on the first layer and the wiring substrates 1 b on the second layer are respectively arranged. The connection IC50 and The through-hole (not shown) is the same as that in FIG. 14, so its description is omitted. The circuit structure is shown in FIG. 15. The supply method of each signal to each ic is the same as that in FIG. 13, but the only difference is The number of 1Cs in each group is 9, so the explanation is omitted. In addition, in the case of assembling 36 1 (:, 4 ICs of each IC are shown in Fig. 18). It is mounted on each base mb. That is, two wiring boards 1a and 2 f lb on the i-th layer are respectively arranged in two groups of 18 boards. ) Because it is the same as the situation in FIG. 14, its description is omitted. As shown in FIG. 17 "quoted the number of circuits connected in parallel / series / SO ΛΛίί, the clock signal (Add, CKE0 / = -3 夺) The supply method for each group is the same as @ i3. ⑽ f HDQ0 .... etc.) It is also supplied in parallel to 1C, the electrical aspect is the same as in Figure 13. In the figure group, and via The K5MmC5dl supply 1/0 signal is also used by the brother 'for example, it is formed by IC5bUfIC5dl supply. For: ― 疋 is also connected to connect without 1C is the same. IL5al and 5cl are the same, for other

567565 五、發明說明(4) [發明所欲解決之問題] 自知之圮憶器模組因為以上述方 框架,因此會有材料費變高之 X構成,所以需要引線 而需要有將晶片連結在y 5 二,:另外,在製造步驟因 I c組裝在模組用之配線基柘=猎以形成IC之步驟,和將 製造成本變高之問題。另外之1 =之2個步驟,所以會有 為不合格之情況時,因為’電特性試驗之結果在變成 之模製樹脂和引線框架成為題所以被廢棄之1c567565 V. Description of the invention (4) [Problems to be solved by the invention] Since the self-knowledge memory module has the above-mentioned square frame, it will have an X structure with a high material cost, so it needs leads and a chip connection In y 5: In addition, in the manufacturing step, I c is assembled on the wiring substrate for the module, which is a step to form an IC, and the problem of increasing the manufacturing cost. In addition, 1 = 2 steps, so it may be disqualified, because the result of the electrical characteristics test is becoming a problem, and the mold resin and lead frame are rejected. 1c

另外,在將I c組裝到配線其士 4 •數目使電路構造和多層配二.,因為依照被組裝之1C 所以需要準備多種之多層配線基板為 ^成為不同, 本發明用來因應上述之問題,直 造,不兩晷佶田W始扩力通其目的是提供COB之構 3¾ >1 ^ α ^ ^ ^ It 曰曰/1 k α 1 e)罝接裝者在多層配線基板。 犯m發明之目的是提供⑽,在將晶片組裝到多層 =;r即使晶片之數目有變化亦可以使用相同之多 層配線基板,因此可以使多層配線基板之種類變少。 » 另外,本發明之目的是提供C0B之製造方法,在 月^進行模製之前進行電特性試驗,在成為不合格之晶片s之 馨況時,只需要去除不合格晶片和多層配線基板之連接 線’不需要拆除不合格晶片就可以進行製造步驟。 [解決問題之手段] ” 本發明之COB具備有··多層配線基板,具有多個晶片裂 部;多個晶片,分別以單體或2個以上重疊之方式被穿~著In addition, when assembling I c to the wiring, the number of circuit boards and the number of layers is two. Because 1C is assembled, it is necessary to prepare a variety of multi-layer wiring substrates, which is different. The present invention is used to cope with the above problems. Straight-made, not two Putian W began to expand the power of its purpose is to provide the structure of the COB 3¾ > 1 ^ α ^ ^ ^ It is said / / 1 k α 1 e) 罝 mounters on the multilayer wiring substrate. The purpose of the invention is to provide the following: When assembling a wafer to multiple layers =; r Even if the number of wafers varies, the same multilayer wiring substrate can be used, so the number of types of multilayer wiring substrates can be reduced. »In addition, the object of the present invention is to provide a manufacturing method of COB, which performs an electrical characteristic test before molding. When it becomes a good condition for a failed wafer, it is only necessary to remove the connection between the failed wafer and the multilayer wiring substrate. The 'line' does not require dismantling the defective wafers for the manufacturing steps. [Means for Solving the Problem] The COB of the present invention is provided with a multi-layer wiring substrate having a plurality of wafer cracks; a plurality of wafers are worn in a single or two or more overlapping manners ~

567565 五、發明說明(5) 在該多層配線 上述之各個晶 板上,形成與 墊,與上述之 線基板上,形 置成接近上述 之邊緣端子或 跨越上述多層 之各個晶片和 鲁晶片是電特 另外,本發 最上部以外之 另外,本發 晶片裝著部之 之晶片不經由 跳越配線接受 另外,本發 個配線基板, 面之另外一面 固晶片’分 線基板之各個 上述主面側和 晶片對應,形 被設置在上述 基板之各個晶片裝著部;多個連結襯墊,盥 片裝著部對應的被設置在上述之多層配^ :體之晶片或最上部之晶片連接;接觸襯土 各個連結襯墊對應的被設置在上述之多屛配 成與對應之連結襯墊連接;跳越襯墊,二# 之接觸襯墊,用來連接上述之多層配二 被組裝在上述多層配線基板之電路元件ΐ或 配線基板之各層;和模製樹脂,帛來對上述 各個襯墊進行模製;重疊2個以上之最上部 性試驗合格之晶片。 明之COB是使上述之重疊2個以上之晶片中, 晶片是電特性試驗不合格之晶片。 日^⑽是使被裝著在上述多層配線基板之 日日片,被區为成為多個群組, =配線接受信號,其他之群組之晶 J V、有多層配線基板,多|的配置多 伽献ΐ A f之主面側配線基板和構成另外一 1☆別具有多個之晶片裝著部; 別被裝者在上述夕士 曰U•面側和另外一面側之配 Z u 2 σ ,多個連結襯墊,分別被設置在 成盥餅Ξ側t配線基板上成為與上述之各個 t:彳目I之晶片連接;多個接觸襯墊,分別 主面側和另外-面側之配線基板成為與上述 «567565 V. Description of the invention (5) On each of the above-mentioned multi-layer wiring boards, the formation and pads, and the above-mentioned wire substrates, are formed close to the above-mentioned edge terminals or each of the wafers and wafers across the above-mentioned layers are electrically connected. In addition, in addition to the uppermost part of the hair, the wafer of the hair mounting part of the hair is not received through the jumper wiring. In addition, the hair of the wiring board is fixed on the other side of each of the main surfaces of the breakout substrate. Corresponding to the wafer, it is provided on each wafer mounting portion of the above substrate; a plurality of connection pads and the toilet mounting portion are correspondingly provided on the above-mentioned multilayer arrangement ^: the wafer of the body or the uppermost wafer connection; contact Each connection pad of the lining is correspondingly arranged in the above mentioned multiples to be connected with the corresponding connection pad; skip pads, two # contact pads, which are used to connect the above-mentioned multiple layers, and are assembled in the above-mentioned multiple layers Circuit element ΐ of wiring board or each layer of wiring board; and molding resin to mold each of the above-mentioned pads; overlapping two or more crystals that passed the uppermost test sheet. COB of Ming is a wafer in which two or more of the above-mentioned wafers are overlapped, and the wafer is a wafer that failed the electrical characteristics test. Sun ^ is a day-to-day film that is mounted on the above-mentioned multi-layer wiring substrate. The area is divided into multiple groups. = Wiring receives signals. The other groups of crystal JVs have multi-layer wiring substrates. The main surface side wiring board of Ga Xian ΐ A f and the other 1 ☆ Don't have multiple wafer mounting parts; don't install the device on the U • side and the other side side Z u 2 σ A plurality of connection pads are respectively arranged on the wiring board t side wiring substrate to be connected to the wafers of each of the above t: 彳 mesh I; a plurality of contact pads are respectively on the main side and the other side. The wiring board becomes the same as above «

C:\2D-CODE\92-01\91124366.ptd f 9頁 567565 五、發明說明(6) 之各個,結襯墊對應,形成與對應之連結襯墊連接;穿通 孔被π又置成跨越上述之主面側和另外一面側之配線基 板,跳越襯墊,分別被設在上述之主面側和另外一面側之 :線Ϊ Ϊ Ϊ為接近上述之接觸襯墊,$來連接上述之穿通 其二Ϊ子,被設在上述之主面側和另外一面側之配線 :,用來2ti方,用來連接上述之穿通孔;和模製樹 片曰和各個椰執述主面側和另外一面侧之配線基板之各個晶 月和各個襯塾進行模製。 ί : : ί t明之⑽是使上述之晶片▲為記憶器晶片。 ?個曰片穿:之⑽之製造方法所具備之步驟包含有:將 在具有多個晶片襄著部之多層配線基板之各 基板上,連接各個晶片和分別對;之多層配線 個連結襯塾和與該等對應之接觸;接各 上述之各個接觸襯墊,用來試驗連接到 上述之試驗成為不合格之晶片:::=’切斷 接和在不合格之晶片上重疊試驗人又逑 ^各個晶片和各個襯墊進行模製。σ Βθ , σ對上述 片η月之⑽之製造方:所具備之步驟包含有.將 各個曰曰片裝者在具有多個晶片裝 y哪匕a有·將 個晶片裝著部,和將盥上述之I邛夕層配線基板之各 ::與各個連結襯墊對應之接觸襯墊 襯 線基板上,連接各個晶片和分 :上述之夕層配 于應之連結襯墊,和連接C: \ 2D-CODE \ 92-01 \ 91124366.ptd f page 9 567565 V. Each of the description of the invention (6), the junction pad corresponds to form a connection with the corresponding connection pad; the through-hole is set by π to span The above-mentioned main surface side and the other side of the wiring board and the skip pad are respectively disposed on the above main surface side and the other side: the line Ϊ Ϊ Ϊ is close to the above-mentioned contact pad, and $ is used to connect the above. Pass through its two crickets, and are arranged on the main side and the other side of the above wiring: for 2ti side, used to connect the above-mentioned through-holes; and molded tree slices Each crystal moon and each liner of the wiring substrate on the other side are molded. ί:: ί t Mingzhi is to make the above chip ▲ a memory chip. A piece of wear: The manufacturing method of the method includes the steps of: connecting each wafer and each pair on a substrate of a multilayer wiring substrate having a plurality of wafer facing portions; and connecting a multilayer wiring substrate. And the corresponding contacts; each of the above-mentioned contact pads is used to test the wafer connected to the above-mentioned test to become unqualified :: = 'cut off and overlap the test wafer on the unqualified wafer again ^ Each wafer and each pad are molded. σ Βθ, σ for the manufacturer of the above-mentioned film η: The steps are included. Each of the chip loaders has a plurality of wafers, which has a wafer mounting section, and Wash each of the above-mentioned I-layer wiring boards :: The contact pads corresponding to the respective connection pads are connected to the wafer substrates, and the wafers are connected to each other: the above-mentioned night layer is arranged on the corresponding connection pads, and connected

567565 五、發明說明(7) ΐίΐΐΐΐ和與該等對應之接觸襯墊;*跳越襯墊設置 片鄰日日^晶片對應之接_塾和接近與上述指定晶 接用Π 應接觸襯塾,利用與各個接觸襯塾之連 普置之指定之晶片和鄰接晶片之連接;使試驗 特性;接觸襯塾’用來試驗各個晶片之電 結襯墊之連接和::i f不ί板之b”和與其對應之連 之晶片.和對卜、f 口板之晶片上重豎的装著試驗合格 「义’#對上述之各個晶片和各個襯墊進行掇制 [發明之實施形態] 運仃权製。 |施形熊1 下面將根據圖面用來說明本發明之實施形態1。 圖1是概略圖,以記憶器模組之實例用來表心 =構造’(a)是斜視圖,用來表示記憶器 二‘ ‘心 襯塾等之構造,(c)是側」觸觀塾,跳越 ^^^^k ;1 Λ /(b)^ ^" . ,, /主 在e亥寻之圖中,兀件編號1是多層 配線基板’在表面設置有多個之晶片裝著冑 ^被固定在上述之各個晶片裝著部之9個之記憶、儿 (•e) ’一不是如習知方式之將晶片連結在引線框架:曰而是 直接固定f多層配線基板。另外,晶片】〇如圖】之 所示’以單體震著在多層配線基板i,亦可以如圖!⑷工之 右方所不,裝著成使2個之晶片丨〇χ和丨〇γ重疊 4裝著之晶片亦可以成為2個以上。其詳細部份將ς後面567565 V. Description of the invention (7) ΐίΐΐΐΐ and the contact pads corresponding to these; * Skip the pad to set the next day ^ corresponding to the wafer _ 塾 and close to the 晶 should contact the lining for the specified crystal connection, Use specified wafers connected to each of the contact pads and adjacent wafers to connect; make test characteristics; contact pads are used to test the connection of the electrical junction pads of each wafer and: "if 不 ί 的 板" And the corresponding wafers. The wafers on the opposite side and the f-mouth plate are reloaded with the test pass "yi" # each of the above wafers and each pad are fabricated [implementation mode of the invention]施 形 形 熊 1 The following will be used to explain Embodiment 1 of the present invention based on the drawings. Figure 1 is a schematic diagram, an example of a memory module is used for epicenter = structure '(a) is a perspective view, To represent the structure of the memory 2 '' heart lining, etc., (c) is the side "touch the 塾, skip ^^^^ k; 1 Λ / (b) ^ ^ ". ,, / 主 在 eHAI In the figure, element number 1 is a multilayer wiring board. A plurality of wafers are mounted on the surface, and are fixed to each of the above. The nine memories of the wafer mounting section (• e) 'are not directly connected to the lead frame as in the conventional way: they are directly fixed to the f multilayer wiring board. In addition, the wafer] 〇 As shown in the figure] ′ The single-layer vibration is applied to the multilayer wiring board i. As shown by the right hand side, it can be mounted so that two wafers 丨 〇χ and 丨 γ overlap, and 4 wafers can also be made more than two. The detailed part will be followed

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五、發明說明(8) 說明。 兀件編號1 0A是被設在各個晶片之襯墊,π是連結概 塾i與各個晶片裝著部對應的被設在多層配線基板1上, 12疋線’用來連接晶片1 0 (以2個以上重疊之形式裝著時是 ,上部之晶片10Y)之襯墊10A和連結襯墊u,元件編號13疋 是接觸襯墊,與連結襯墊丨丨對應的被設在多層配線基板i 上’ 1 4是配線圖案,用來連接該連結襯墊丨丨和接觸襯塾 1 3 ’ 1 5是跳越襯墊,被設置成為接近之接觸襯墊丨3,丨6是 配線圖案,用來使跳越圖案丨5互相連接,另外設置有指= _圖案用來進行與多層配線基板外之成為連接端子之^二 而子4之連接’或與組裝在多層配線基板1上之電容器, 阻、炫線等之電路元件(圖中未顯示)之連接, ^ >成%越構成多層配線基板之多個配線基板,用以 行各配線基板間之連接)之連接。 圖2疋流程圖,用來表示圖1所示之記憶器模组生 勰。 〜衣:^步 在步驟S11,將9個之晶片10連結在多層配線基板i。_ 其次,在步驟S12對晶片之襯墊丨〇A和連結襯墊丨丨 ^結。然後,在步驟S13將測試器(圖中未顯示)連 丁^ •襯墊1 3,肖來實施晶片! 〇之電特性試驗。 利用該試驗,例如當圖1 ( c )之晶片丨〇χ為不合格 在步㈣4去除連接在不合格晶片之m和連結襯墊u’之沈 (圖中未顯示),用來將晶片J 〇χ切離該電路。 但是,晶片10Χ未被拆除,而是如圖所示的殘留在多層5. Description of the invention (8) Description. The element number 1 0A is a pad provided on each wafer, and π is a connection wiring board i corresponding to each wafer mounting portion and is provided on the multilayer wiring substrate 1. A 12 ′ wire is used to connect the wafer 1 0 (to When two or more overlapping forms are mounted, the pad 10A on the upper wafer 10) and the connection pad u, and the element number 13 疋 are contact pads, which are provided on the multilayer wiring board i corresponding to the connection pads. The upper '1 4 is a wiring pattern used to connect the connection pad 丨 丨 and the contact pad 塾 1 3' 1 5 is a skip pad, which is set to be close to the contact pad 丨 3, 6 is a wiring pattern. To make the skip pattern 丨 5 connected to each other, a finger = _ pattern is used to connect to the second and fourth connection terminals outside the multilayer wiring substrate, or to a capacitor assembled on the multilayer wiring substrate 1, The connection of circuit elements (not shown in the figure) such as resistors, dazzling wires, and the like constitutes a plurality of wiring substrates that constitute a multilayer wiring substrate for connection between the wiring substrates). Fig. 2 is a flowchart showing the memory module generation shown in Fig. 1. ~ Clothing: ^ Step In step S11, nine wafers 10 are connected to the multilayer wiring board i. _ Next, the wafer pads 丨 0A and the connection pads 丨 丨 ^ are knotted in step S12. Then, in step S13, the tester (not shown in the figure) is connected to the substrate ^ • Pad 1 3, Xiao to implement the wafer! 〇 Electrical characteristics test. By using this test, for example, when the wafer of FIG. 1 (c) is unqualified, step m4 is used to remove the connection between m and the connection pad u ′ (not shown), which is used to transfer the wafer J 0x cuts off the circuit. However, the wafer 10X has not been removed, but remains in multiple layers as shown in the figure.

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配線基板1上。 其-人,在步驟s 1 5,準備另外實施之只以晶片丨〇為對象 =電特/生試驗合格之晶片1 〇Υ,將在步驟31 6合格之晶片 Υ重$的連結在不合格晶片1 〇 X之上。缺後,在驟 S1?,對重疊晶片之最上部晶片之合格晶’片10Υ之襯墊和連 f襯墊1 1進行線連結,連接合格晶片1 〇 Υ用以代替不合袼 :片10X,藉以構成電路。其次,在步驟S18,利用線12用 來對接觸襯墊1 3和跳越襯墊1 5進行線連結。 然後,在步驟S1 9利用模製樹脂1 8,對多層配線基板1上 •各個晶片1 0, 1 ox,1 ογ和連結襯墊11,接觸襯墊13,跳越 概墊15,線12和配線圖案14, 16進行模製。On the wiring board 1. The person, in step s 15, prepares another implementation only for wafers 丨 0 = wafers that have passed the electrical test / battery test. The wafers that pass in step 31.6 are weighted as unqualified. Wafer 10X. After the defect, in step S1 ?, the pad of the qualified wafer 'wafer 10Υ of the uppermost wafer of the overlapping wafer and the f-pad 11 are connected by wire, and the qualified wafer 11 is connected instead of the unsuitable wafer: wafer 10X, This constitutes the circuit. Next, in step S18, the wire 12 is used to wire-connect the contact pad 13 and the skip pad 15. Then, in step S19, using the molding resin 18, the respective wafers 1 0, 1 ox, 1 y and the bonding pads 11, the contact pads 13, the skip pads 15, the wires 12 and The wiring patterns 14, 16 are molded.

然後,在步驟S20實施作為記憶器模組之電特性試驗, 然後結束製造步驟。 t施形熊L 下面將根據圖面用來說明本發明之實施形態2。 圖3〜圖9是概略圖,以記憶器模組之實例用來表示實施 形態2之構造,圖中顯示在上述之步驟s丨1將晶片丨〇裝著在 多層配線基板1之情況時之電路構造和晶片i 〇之配置方 法’圖3和圖4表示裝著3 6個晶片之情況,圖6和圖7表示裝 Λ 8個晶片之情況,圖8和圊9表示裝著9個晶片之情況。 首先,在裝著3 6個晶片1 〇之情況,各個晶片如圖4所示 的被配置和裝著在多層配線基板1。該圖表示多層配線基 板1成為2層之貫例,(a)表示成為表面之第1層之配線基板 1 a ’( b)表示成為背面之第2層之配線基板1 b。3 6個之晶片Then, an electrical characteristic test is performed as a memory module in step S20, and then the manufacturing steps are ended. The t-shaped bear L will be used to explain the second embodiment of the present invention based on the drawings. 3 to 9 are schematic diagrams showing an example of the structure of the second embodiment with an example of a memory module. The figure shows the case where the wafer is mounted on the multilayer wiring board 1 in the above-mentioned step s1. Circuit structure and method of arranging the wafer i 0 'Fig. 3 and Fig. 4 show a case where 36 wafers are mounted, Fig. 6 and Fig. 7 show a case where Λ 8 wafers are mounted, and Fig. 8 and 圊 9 show 9 wafers are mounted Situation. First, when 36 wafers 10 are mounted, each wafer is arranged and mounted on a multilayer wiring board 1 as shown in FIG. 4. This figure shows an example in which the multilayer wiring substrate 1 has two layers. (A) shows the first layer wiring substrate 1a '(b) shows the second layer wiring substrate 1b on the back surface. 3 of 6 chips

567565567565

10以每4個或5個形成}個群組,區分成為合計8個群組& 組〜h群組)。在第}層之配線基板la配置a群組( i〇ai〜 10a5),b 群組(i〇bl 〜l〇b4),c 群組(i〇cl〜1〇c4)*d 群組 (l〇dl〜l〇d5)之4個群組之晶片,在第2層之配線基板化配 置 e 群組(l〇ei 〜i〇e5),f 群組(1〇fl〜1〇f4),g 群組 〜1 0 g 4 )和h群組(1 〇 h 1〜1 〇 h 5 )之4個群組之晶片。 圖5是概略圖,用來表示在圖4(a)中,以〇包圍之部份 之第1層之配線基板1 a和第2層之配線基板1 b之剖面構造, 和概略的表示與連接兩配線基板間之穿通孔丨7之連接關 蠡。 圖中之元件編號在與圖1 ( c )對應之部份附加相同之元件 編號’而其各個之說明則加以省略。另外,該圖中之穿通 孔1 7之設置位置只是一實例,並不只限於該位置。電路構 造如圖3所示,構建成將時脈信號(Add,CKE0,/S0-3等) 和I / 0化號(D Q 0. · ·等)分別並行的供給到各個群組之各個 晶片。 在圖中所示之情況,例如成為經由晶片1 〇al和丨0a2對晶 片1 0 a 3供給時脈信號之形式,但是亦可以不經由晶片1 〇 a 1 和1 0a2,連接成與該等晶片並行的供給。對於其他之晶片 •同。另外,對於I/O信號亦同。 另外,對於時脈信號是連接成不經由跳越配線2 〇直接對 a群組之晶片(10al〜10a5)和b群組之晶片(l〇bl〜10b4)供 給,但是成為經由跳越配線20對c群組〜h群組之各個晶片 供給。10 groups are formed every 4 or 5 groups and divided into a total of 8 groups & group ~ h group). Group a (i0ai ~ 10a5), group b (i0bl ~ l10b4), and group c (i0cl ~ 1〇c4) * d group ( l〇dl ~ 10d5) of the four groups of wafers, the e-group (l〇ei ~ i〇e5), f group (1〇fl ~ 1〇f4) are arranged on the second layer of the wiring substrate. , G group ~ 10 g 4) and h group (10 h 1 ~ 10 h 5) of the four groups of wafers. FIG. 5 is a schematic diagram showing the cross-sectional structure of the first-layer wiring substrate 1 a and the second-layer wiring substrate 1 b of the portion surrounded by 0 in FIG. 4 (a), and a schematic representation and The connection between the through-holes 7 connecting the two wiring substrates is closed. In the figure, the same component numbers are added to the parts corresponding to those in FIG. 1 (c), and the description of each of them is omitted. In addition, the setting position of the through holes 17 in the figure is only an example, and is not limited to this position. The circuit structure is shown in Figure 3. It is constructed to supply the clock signals (Add, CKE0, / S0-3, etc.) and I / 0 numbers (DQ 0. · ·, etc.) to the chips of each group in parallel. . In the case shown in the figure, for example, it is in the form of supplying a clock signal to the wafer 10a 3 via the wafers 10a1 and 0a2, but it may also be connected to these without passing through the wafers 10a1 and 10a2. Wafers are supplied in parallel. For other wafers • Same. The same applies to I / O signals. In addition, the clock signal is directly connected to the wafers of group a (10al to 10a5) and the wafers of group b (10bl to 10b4) without being connected via the jumper wiring 2; It is supplied to each wafer of group c to group h.

五、發明說明(11) 另外,對於I / 0信號,連接忐 一 群組〜d群組之各個晶片供仏,不經由跳越配線20直接對a 對e群組〜h群組之各個晶、片;^但是成為經由跳越配線2〇 式,在使裝著在多層配線基板:^即’如後面所述之方 一部份之群組之晶片之情 =片之數目減少,只連接 路,1遠;&妝能A A > / 、,未裝著有晶片之部份之電 岭,、連接狀悲成為遊動和成A扭# 用跳越配線部份將未裝著有a ;;、,B块動作之原因,所以利 豆次,尤驻輦·I 有曰曰片之部份之電路分離。 兵久,在裝者1 8個晶片2 〇之悟 ^ 與裝著36個之情況同構夕夕馬况蛉,如圖7所示,使用 龜線美板丨推— 7 —夕曰配線基板,只在其第1層之 •潫土板1 a進仃如圖所示之配置,^ ^ ^ ^ ^ ^ ^ ^ 不進行配置。 在第2層之配線基板1 b 另外,第1層之配線某軛〗 曰 f a ^ ^ η ^ ^ , 板1a之日日片之配置與圖4相同,配V. Description of the invention (11) In addition, for the I / 0 signal, connect each chip of the one group to the d group for supply, and directly pass through the wiring 20 to each of the crystals of the a group to the e group to the h group. , Chip; ^ But it is the type 20 through the jumper wiring, so that the multilayer chip is mounted on the multi-layer wiring substrate: ^ That is, as described below, the number of chips in a group of parts = the number of chips is reduced, and only connected Road, 1 distant; & Make-up AA > / ,, the electric ridge without the part of the chip is installed, the connection is sad and becomes a twist and the A twist # use the jumper wiring part will not be installed with a ; ,,, the reason for the action of block B, so Lidou times, especially in the I · I have the circuit part of the film. Bingjiu, the installer has 18 chips and 2 0 ^ ^ is identical to the case with 36. Evening horses are in the same condition, as shown in Figure 7, using the turtle line beauty board 丨 push — 7 — Xi Yue wiring board , Only in the first floor of the 潫 soil plate 1 a into the configuration shown in the figure, ^ ^ ^ ^ ^ ^ ^ ^ No configuration. In the second layer of the wiring substrate 1 b, a yoke of the first layer of wiring is f a ^ ^ η ^ ^.

置a拜組〜d群組之1 q输曰y H 所+ , Λ σ , 日日片。此種情況之電路構造如圖6 所不,圖中只連接呈右钮φ ^ έθ , ^ /、有斜線之3群組〜d群組之晶片,e群 組〜h群組之連接線成A τ t # μ μ # % a /策成為與戎4之時脈信號側和1 /〇信號側 之跳越配線2 0全部分離。 另外’在裝著9個晶只1 夕捧、口 η 士 壯裟Q iWm >此 日日月1 U之睛況時,如圖9所示,使用與 裝者3 6個之情況同槐夕炙s Ψ ± ^ 7夕θ配線基板,如圖所示的晶片只 μ二在、曰之配線基板1 a,未配置在第2層之配線基板 、4月f之電路構造如圖8所示,不經由跳越配線2 0 。以二妾到k 5虎源之a群組和b群組之9個晶片(圖8中以斜 線表示)被配置成為如圖9 (a )所示,虛線之部份變空。另 外,如圖8所示,全部之跳越配線2 〇成為被切斷之狀態,& 群組和b群組之晶片以外之連接線全部被切斷。Set 1 q in group a to group d to lose y H so +, Λ σ, daily film. The circuit structure in this case is shown in Figure 6. Only the right button φ ^ θ θ, ^ / is connected to the chipset of group 3 to group d with slashes, and the connection lines of group e to group h are formed. A τ t # μ μ #% a / policy is completely separated from the jumper wiring 20 on the clock signal side and the 1/0 signal side of Rong 4. In addition, when there are 9 crystals, 1 night holding, mouth η strong and strong Q iWm > on the day of the sun and moon 1 U, as shown in Figure 9, the use is the same as the case of 36 Evening s Ψ ± ^ 7 evening θ wiring substrate, the chip shown in the figure is only μ 2 in the wiring substrate 1 a, the wiring substrate is not arranged on the second layer, the circuit structure of April f is shown in Figure 8 It is shown that the jumper 2 0 is not passed. The 9 wafers (group 8 and group b) of the two sources (group 8 and group 5) of tiger source (shown by diagonal lines in Fig. 8) are arranged as shown in Fig. 9 (a), and the dotted lines become empty. In addition, as shown in FIG. 8, all the jumper wires 20 are cut off, and all the connection wires other than the chips in the & group and b group are cut off.

567565 五、發明說明(12) 曰=上之各個實施形態是以記憶器模組為例進行說明,但 ^發明並不只限於記憶器模組,對於微電腦晶片或Μ ^ c i曰士亦,樣的可以實施。圖1 〇表示在多層配線基板1裝著 =丨意态晶片10,ASIC晶片30,和微電腦晶片40之複合晶 之概略圖。製造方法因為與上述之記憶器模組相 门’故將其說明省略。 [發明之效果] ,具有多個晶片裂著 重疊之方式被裝著 多個連結概塾,與 立本發明之COB具備有··多層配線基板 邛,多個晶片,分別以單體或2個以」 多層配線基板之各個晶片裝著部;多個連結襯墊,斑 之各個晶片冑著部對應的被言免置在上述美 J上:形成與單體之晶片或最上部之晶片連接;接觸2基 缘a ί、上述之各個連結襯墊對應的被設置在上述之多層配 =端子:或被組裝在上述多層配線基板板 $ 5 =上述夕層配線基板之各層;和模 述之各個晶片和各個襯塾進行模製:請用末對上 鑫之晶片是電特性試驗合格之晶片;所以不使用引之線最框上加 '成記憶器模組等之⑽,另外,因為在模製前: :卷’!·生-式驗’所以即使成為不合格亦、 浪費。另夕卜,對電特性試驗不合格之晶片,只== ^可:使不合格晶片直接殘留在多層配…,= 重疊的裝著以其他之晶片為對象之電特性試驗合格之: 第16頁 C:\2D-CODE\92-01\91124366.ptd 567565 五、發明說明(13) 片,進行樹脂模製,所以製造步驟數可以減 價格為其效果。 以降低 另外,本發明之COB將被裝著在上述多層配 片裝著部之晶片區分成為多個群組,和指定之群^ 曰曰 不經由跳越配線接受信號,其他之群組之晶 j之晶片 線接受信號,戶斤以可以減少錯誤動作之 、” 可靠度。 1以提高 另外本發明之COB具有:多層配線基板,多 配線基板,在構成主面之主面側配線基板和構成另:固 鲁另外一面側配線基板,分別具有多個之晶了面 個晶片,分別被裝著在上述之主面側和另外—^ σ ,多 基板之各個晶片裝著部;多個連結襯墊,分別二線 述主面側和另外一面側之配線基板上成為盥上:上 ㈡在對應之晶片連接;多個連接觸襯塾= 被认置在上述主面侧和另外一面側之配線567565 V. Description of the invention (12) The above embodiments are described by taking a memory module as an example, but the invention is not limited to the memory module. For microcomputer chips or M ^ ci, it is also the same. Can be implemented. FIG. 10 is a schematic view showing a composite crystal of the multi-mode wiring substrate 1 including the morphological wafer 10, the ASIC wafer 30, and the microcomputer wafer 40. The manufacturing method is omitted because it is related to the above-mentioned memory module. [Effects of the invention] A plurality of connection profiles are installed in a manner that a plurality of wafers are split and overlapped, and the COB of the present invention is provided with a multi-layer wiring board. A plurality of wafers are individually or two individually. "Multi-layer wiring board each wafer mounting part; a plurality of connection pads, spots corresponding to each wafer bumping part is said to be avoided on the above-mentioned J: forming a connection with a single wafer or the uppermost wafer; Contact 2 base edge a. The above-mentioned respective connection pads are provided in the above-mentioned multilayer distribution = terminals: or assembled in the above-mentioned multilayer wiring substrate board $ 5 = each layer of the above-mentioned wiring substrate; and each of the models described Moulding of the wafer and each liner: Please use the pair of Shangxin's wafers that are qualified for electrical characteristics test; therefore, do not use lead wires to add a 'memory module' to the frame. In addition, Before making:: Volume '! · 生-式 测' so even if it fails, it is wasteful. In addition, for the wafers that failed the electrical characteristics test, only == ^ may: make the unqualified wafers remain directly in the multi-layer assembly ..., = overlapped with the electrical characteristics test for other wafers that pass: 16th Page C: \ 2D-CODE \ 92-01 \ 91124366.ptd 567565 V. Description of the invention (13) Sheets are resin-molded, so the number of manufacturing steps can be reduced for its effect. In order to reduce the COB of the present invention, the wafers mounted on the above-mentioned multi-layered wafer mounting portion are divided into a plurality of groups, and the designated group ^ means that signals are not received through the jumper wiring, and the crystals of other groups The chip line of j receives signals, which can reduce the reliability of the erroneous operation. 1 In order to improve the COB of the present invention, the multi-layer wiring substrate, the multi-wiring substrate, the main-surface-side wiring substrate and the structure that constitute the main surface Another: Gulu's other side of the wiring board, each with a plurality of crystals and a number of wafers, respectively mounted on the above main surface side and in addition-^ σ, each wafer mounting portion of the multi-substrate; a plurality of bonding pads The pads are placed on the wiring board on the main surface side and the other surface side of the two wires, respectively: the upper part is connected to the corresponding chip; multiple connection pads 塾 = the wiring that is recognized on the main side and the other side

之各個連結襯塾對應,形成與對應之 =與亡J 孔,被設置成跨越上述之主面側和另外一 ,接,牙通 板;跳越襯塾,分別被設在上述之主面側和另f線基Corresponding to each of the connecting linings, corresponding to == J hole, is set to cross the above main surface side and the other, then, to pass through the plate; jumping linings are respectively set on the above main surface side And another f-line basis

鋈線f板成為接近上述之接觸襯墊,用 ::J 邊緣端子,被設在上述之主面側和另外 ^穿通 基板之一方或雙方,用來連接上述之穿通孔配線 曰曰 脂,用來對上述主面側和另外一面側之配美、^樹 片和各個襯,進行模製;所以可以使多層配ς基板= 化,可以提高生產效率和降低價袼。 *、、 ^ 第17頁 C:\2D-OODE\92-Ol\9ll24366.ptd 567565The f wire f board becomes a contact pad close to the above, and is used with: J edge terminal, which is provided on one or both of the above main surface side and the other through-through substrate, and is used to connect the above-mentioned through-hole wiring. Come to mold the above-mentioned main surface side and the other surface side with the beauty, tree, and each liner; therefore, the multilayer substrate can be converted, which can improve production efficiency and reduce price. * ,, ^ page 17 C: \ 2D-OODE \ 92-Ol \ 9ll24366.ptd 567565

五、發明說明(14) [元件編號之說明] 1 多層配線基板 4 邊緣端子 10 晶片 10A 晶片之襯墊 10X 不合格晶片 10Y 合格晶片 11 連結襯墊 12 線 磉 接觸概塾 14、16 配線圖案 15 跳越襯墊 17 穿通孔 18 樹脂模製體 20 跳越配線 30 ASIC晶片 40 微電腦晶片 50 連接用I C •V. Description of the invention (14) [Explanation of component number] 1 Multi-layer wiring board 4 Edge terminal 10 Wafer 10A Wafer pad 10X Failed wafer 10Y Passed wafer 11 Connection pad 12 Wire contact profile 14, 16 Wiring pattern 15 Jumper pad 17 Through-hole 18 Resin molded body 20 Jumper wiring 30 ASIC chip 40 Microcomputer chip 50 Connection IC •

C:\2D-CODE\92-Ol\91124366.ptd 第18頁 567565 圖式簡單說明 圖1是概略圖,以記憶器模組之實例用來表示本發明之 實施形態1之構造,(a)是斜視圖,用來表示全體構造, (b )是平面概略圖,用來表示,(c)所示之構造中,鄰接之 2個晶片,和被設在其間之各種襯墊之構造。 圖2是流程圖,用來表示圖1所示之記憶器模組之製造步 驟。 圖3是概略線圖,用來表示本發明之實施形態2之電路構 造,圖中顯示裝著3 6個晶片之情況時之實例。 » 圖4(a)、(b)是概略圖,用來表示圖3之情況時之多層配 g基板上之晶片之配置構造。 圖5是概略圖,用來表示構成多層配線基板之第1層配線 基板和第2層配線基板之剖面構造。 圖6是概略線圖,用來表示實施形態2之電路構造,圖中 顯示裝著1 8個晶片之情況時之實例。 圖7(a)、(b)是概略圖,用來表示圖6之情況時之多層配 線基板上之晶片之配置構造。 圖8是概略線圖,用來表示實施形態2之電路構造,圖中 顯示裝著9個晶片之情況時之實例。 圖9 (a )、( b)是概略圖,用來表示圖8之情況時之多層配 基板上之晶片之配置構造。 圖1 0是概略圖,用來表示在多層配線基板裝著有記憶器 晶片’ASIC晶片’微電腦晶片之複合晶片之COB之構造。 圖11是概略圖,以記憶器模組之實例用來表示習知之 COB之構造,(a)是斜視圖,用來表示全體構造,(b)是側C: \ 2D-CODE \ 92-Ol \ 91124366.ptd Page 18 567565 Brief Description of Drawings Figure 1 is a schematic diagram, and an example of a memory module is used to show the structure of Embodiment 1 of the present invention, (a) It is an oblique view showing the overall structure, and (b) is a schematic plan view showing the structure of (c) two adjacent wafers and the structure of various pads interposed therebetween. FIG. 2 is a flowchart showing manufacturing steps of the memory module shown in FIG. 1. FIG. Fig. 3 is a schematic line diagram showing the circuit structure of the second embodiment of the present invention. The figure shows an example when 36 wafers are mounted. »Figures 4 (a) and (b) are schematic diagrams showing the arrangement structure of the wafer on the multilayer substrate in the case of FIG. Fig. 5 is a schematic diagram showing a cross-sectional structure of a first-layer wiring substrate and a second-layer wiring substrate constituting a multilayer wiring substrate. Fig. 6 is a schematic diagram showing the circuit structure of the second embodiment, and shows an example when 18 wafers are mounted. 7 (a) and 7 (b) are schematic diagrams showing the arrangement structure of the wafers on the multilayer wiring substrate in the case of FIG. Fig. 8 is a schematic line diagram showing the circuit structure of the second embodiment, and the figure shows an example when 9 wafers are mounted. 9 (a) and 9 (b) are schematic diagrams showing the arrangement structure of the wafer on the multilayer substrate in the case of FIG. Fig. 10 is a schematic diagram showing a structure of a COB of a composite wafer in which a memory chip "ASIC chip" microcomputer chip is mounted on a multilayer wiring substrate. Fig. 11 is a schematic diagram showing the structure of a conventional COB with an example of a memory module. (A) is a perspective view showing the overall structure, and (b) is a side view.

C:\2D-CODE\92-01\91124366.ptd 第19頁 567565 圖式簡單說明 面剖面圖,用來表示將鄰接之2個I C裝著到多層配線基板 之裝著構造。 圖1 2是流程圖,用來表示習知之記憶器模組之製造步 構 路 電 之 組 模 器 憶 記 之 知 習 示 表 來 用 圖 線 略 概 是 3 11 圖 造 圖 示(b 顯、 中a) a 圖1( 4 著 裝 是 層 多 之 時 況 情 。之 例13 實圖 之示 時表 況來 情用 之, 1C圖 個略 概 構 路 電 之 組 模 器 憶 己 士一口 之 知 習 示 表 來 用 〇 圖 造線 構略 之概 板是 基15 線圖 配 層 多 之 時 況 If 。之 例C 實圖 之示 時表 況來 情用 之, 1C圖 個略 18概 著是 裝b) 示C顯卜 中 a κί\ 圖16 , 圖 Φ 構 路 之 組 模 器 憶 己 古口 之 知 習 示 表 來 用 〇 圖 造線 構略 之概 板是 基17 線圖 配 造 圖線 己 酉 層 多 之 時 況 情 。之 例17 實圖 之示 時表 況來 情用 之, 1C圖 個略 36概 著是 裝b) 示C 顯h 中a 圖 8 II·1 造 構 之 板 基 1C: \ 2D-CODE \ 92-01 \ 91124366.ptd Page 19 567565 Brief description of the drawing A cross-sectional view showing the mounting structure of two adjacent ICs mounted on a multilayer wiring board. Fig. 12 is a flow chart showing the manufacturing steps of a conventional memory module, a circuit diagram of a set of modules, and a table of memory and knowledge. The figure is roughly 3 11 Middle a) a Figure 1 (4 Dressing is when there are many layers. Case 13 The actual picture shows the situation and the situation is used. Figure 1C outlines the circuit module of the circuit to remember the knowledge of one person. The outline of the line diagram used in the study table is based on the base line of the 15-line diagram. If the case is shown in the figure C, the outline of the 1C diagram is roughly 18 (B) Show a κί \ in Figure C. Figure 16 and Figure Φ The model of the circuit building tool to remember the learning of the ancient mouth. The outline of the schematic diagram of the line drawing is based on the 17 line drawing and the drawing line. When there have been many layers. Example 17 The actual picture is shown in the table and the situation is used. The 1C picture is a little 36. The outline is shown in the figure. B) The C display is shown in a.

II

C:\2D-CODE\92-Ol\9]124366.ptd 第20頁C: \ 2D-CODE \ 92-Ol \ 9] 124366.ptd Page 20

Claims (1)

567565 ν. ι ζ 替換本 曰 _案號 91124366 六、申請專利範圍 1. 一種板上連接式晶片, 且 板,具有多個晶片裝著邻.二:斂疋具備有:多層配線基 以上重疊之方式被裝;:該;;固:曰曰片"分別以單體或2個 部;多個連結襯墊,盥上社、^線基板之各個晶片裝著 置在上述之多層配線基=之著部對應的被設 之晶月連接"妾觸襯墊,盥上晶片或最上部 接;跳越襯墊,;設成與對應之連結襯塾連 上述之多層配線1板:以;ΐ述:接觸襯塾’用來連接 = ί 件’或跨越上述多層配線基板之各層;和 重二個θ以η '县對上述之各個晶片和各個襯墊進行模製; 2^ Φ 之最上部之晶片是電特性試驗合格之晶片。 Λΐ:: 範圍第1項之板上連接式晶片,其中上述 驗不:格之Τ片之,片中,最上部以外之晶片是電特性試 η ?專利範圍第1項之板上連接式晶片,其中被裝 ^^夕層配線基板之晶片裝著部之晶片,被區分成為 ^ 、、且和指定之群組之晶片不經由跳越配線接受信 號’其他之群組之晶片經由跳越配線接受信號。 # 4·如申請專利範圍第2項之板上連接式晶片,其中被裝 f在上述夕層配線基板之晶片裝著部之晶片,被區分成為 f個群組’和指定之群組之晶片不經由跳越配線接受信 號’其他之群組之晶片經由跳越配線接受信號。 5 · 一種板上連接式晶片,其特徵是具有:多層配線基 c:\ 總檔\91\91124366\91124366(替換)].! 第21頁 567565 六、申請專利範圍 板,多層的配置多個配線基板,在構成主面之主面側配線 基板和構成另外一面之另外一面侧配線基板,分別具有多 個之晶片裝著部;多個晶片,分別被裝著在上述之主面側 和另外一面側之配線基板之各個晶片裝著部;多個連結襯 墊、’分別被設置在上述主面側和另外一面側之配線基板上 成為與上述之各個晶片對應,形成與對應之晶片連接;多 個接觸襯墊,分別被設置在上述主面側和另外一面側之配 線基板成為與上述之各個連結襯墊對應,形成與對應之連 結襯墊連接,穿通孔,被設置成跨越上述之主面側和另外 一面側之配線基板;跳越襯墊,分別被設在上述之主面側 寺口另外一面側之配線基板成為接近上述之接觸襯墊,用來 連接上述之穿通孔;邊緣端子,被設在上述之主面側和另 =卜一面側之配線基板之一方或雙方,用來連接上述之穿通 1ί製樹脂,用來對上述主面侧和另外一面側之配線 土板之各個晶片和各個襯墊進行模製。 6:=,專利範圍第!至5項中任一項之板上連接式晶 片八中上述之晶片是記憶器晶片。 步7驟包:ί:上連接式晶片之製造方法,其特徵是所具備之 之:”在具有多個晶片裝著部之多層配線基板 之各個晶片裝著部,和將與上述各個晶 襯墊和與各個連結襯墊對應之接置2 ^ 拉々μ τ 、接各個晶片和分別對應之連鈇栩墊,和連 接各個連結概塾和斑今蓉斜庫技 、、σ U 4對應之接觸襯塾;將試驗裝置連 C: \總檔\91\91124366\91124366(替換 )-1.ptc 第22頁567565 ν. Ι ζ Replacement of this case _ Case No. 91124366 VI. Patent application scope 1. A board-connected chip, and the board has multiple chips mounted adjacent to it. Second: Convergence is equipped with: Multi-layer wiring base overlapping The way is installed :: The; solid: said piece of film " respectively in a single or two parts; a plurality of connection pads, the bathroom, the wire substrate each chip mounted on the above-mentioned multilayer wiring base = The corresponding part of the work is provided with a crystal moon connection " contact pad, on the wafer or the uppermost connection; skip pad ,; set to connect the corresponding connection pad to the above-mentioned multilayer wiring board: with; Description: The contact liner 'is used to connect = 件 pieces' or straddle the layers of the above-mentioned multilayer wiring substrate; and the two θ's are used to mold each of the above wafers and each pad; 2 ^ Φ The upper wafer is a wafer that passed the electrical characteristics test. Λΐ :: On-board connected wafer of the first item in the range, in which the above test fails: Among the T wafers, the wafer other than the uppermost part is the electrical characteristic test η On-board connected wafer of the first item in the patent scope Among them, the wafers in the wafer mounting portion of the ^^ layer wiring board are divided into ^, and the specified group of wafers do not receive signals through the jumper wiring. The other groups of wafers receive jumper wiring. Accept the signal. # 4 · If the board-connected wafer of item 2 of the patent application scope, wherein the wafers mounted on the wafer mounting portion of the above-mentioned wiring board are divided into f's and designated groups of wafers No signal is received via the jumper wiring. Chips in other groups receive signals via the jumper wiring. 5 · A board-connected chip, which is characterized by: multi-layer wiring base c: \ master file \ 91 \ 91124366 \ 91124366 (replacement)].! Page 21 567565 VI. Patent application board, multi-layer configuration multiple The wiring substrate includes a plurality of wafer mounting portions on the main surface side wiring substrate constituting the main surface and the other surface side wiring substrate constituting the other surface, and a plurality of wafers are respectively mounted on the main surface side and the other. Each wafer mounting portion of the wiring substrate on one surface side; a plurality of connection pads, 'are provided on the wiring substrate on the main surface side and the other surface side, respectively, so as to correspond to the respective wafers described above, and form a connection with the corresponding wafer; A plurality of contact pads are respectively provided on the main surface side and the other side of the wiring substrate to correspond to each of the above-mentioned connection pads, to form connections with the corresponding connection pads, and through holes are provided to span the above-mentioned main Wiring board on the front side and the other side; jump over the pads, and the wiring board on the other side of the main side side temple entrance is close to the contact Pads are used to connect the above-mentioned through-holes; edge terminals are provided on one or both of the above-mentioned main surface side and the other side of the wiring substrate, and are used to connect the above-mentioned through-hole resins to the above main Each wafer and each pad of the wiring soil board on the front side and the other side are molded. 6: =, The above-mentioned wafer in the on-board wafer 8 of any one of the patent scope! To 5 is a memory wafer. Step 7: Package: Manufacturing method of upper-connected wafer, which is characterized by: "Each wafer mounting portion of a multilayer wiring substrate having a plurality of wafer mounting portions, and Pads and connections corresponding to each connection pad 2 ^ 々μ τ Contact liner; Connect the test device to C: \ Overall \ 91 \ 91124366 \ 91124366 (replace) -1.ptc Page 22 567565567565 接到上述之各個接觸襯墊,用來試驗 切斷上述之試驗成為不合格之晶片和其】;特性; 連接和在不合格之晶片上重疊試驗合格之晶片; 述之各個晶片和各個襯墊進行模製。 口、 8· 一種板上連接式晶片之製造方 步驟包含有: 再特敛疋所具備之 將各個 之各個晶 結襯墊和 層配線基 連接各個 設置成接 定晶片鄰 之連接用 試驗裝置 之電特性 之連結襯 合格之晶 9.如申 法,其中 晶片裝著在 片裝著部, 與各個連結 板上,連接 連結概塾和 近與指定之 接之晶片之 來獲得上述 連接到上述 ;切斷上述 墊之連接, 片;和對上 請專利範圍 上述之晶片 0己綠基板 之多個連 上述之多 襯墊,和 跳越概塾 與上述指 接觸襯塾 連接;使 各個晶片 與其對應 裝著試驗 行模製。 之製造方 具有多個晶片裝著部之多層 和將與上述之各個晶片對應 襯墊對應之接觸襯墊設置在 各個晶片和分別對應之連結 與該等對應之接觸襯墊;將 晶片對應之接觸襯墊和接近 對應接觸襯墊,利用與各個 之指定之晶片和鄰接晶片之 之各個接觸襯墊,用來試驗 之試驗成為不合板之晶片和 和在不合板之晶片上重疊的 述之各個晶片和各個襯墊進 ,7或8項之板上連接式晶片 是記憶器晶片。After receiving each of the above contact pads, it is used to test and cut off the wafers and the wafers that have become unqualified in the test described above; characteristics; connect and overlap the wafers that pass the test on the unqualified wafers; each of the wafers and each pad described Molded. 8. The manufacturing steps of a board-connected wafer include the following: a special test device for connecting each of each of the sintering pads and the layer wiring substrate to each of the connection test devices provided adjacent to the wafer. Electrical characteristics of the connecting lining qualified crystal 9. As claimed, in which the wafer is mounted on the wafer mounting section, and each connection board, connecting the connection profile and the wafer with the specified connection to obtain the above connection to the above; Cut off the connection of the above pads, and the pieces; and the above-mentioned patents, the above-mentioned wafers, a plurality of green substrates, and the above-mentioned multiple pads, and the jumper is connected with the above-mentioned finger contact pads; each wafer corresponds to it. Molded with test lines. The manufacturer has a plurality of layers of wafer mounting portions, and sets contact pads corresponding to the respective pads corresponding to the above-mentioned wafers on each wafer, and correspondingly connects with the corresponding contact pads; The pad and the near corresponding contact pad use the respective designated wafers and the respective contact pads adjacent to the wafers, and the test used for the test is to become a non-compliant wafer and each of the wafers overlapped on the non-compliant wafer. With each pad, the on-board chip of item 7 or 8 is a memory chip.
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