TW558549B - A manufacturing method for chip-type microchannels - Google Patents

Abstract

The chip with microchannels is used for testing a fluid sample, comprising a substrate having several channels as the reaction and testing zone in which the fluid sample is flowing; and a covering layer over the substrate having plural openings for sample injection and discharge to/from the channels. This invention uses a hot embossing and bonding process to produce a micro-fluidic glass chip with high resolution and high bio-compatibility, which can achieve mass-production, rapid manufacturing, cost-saving, and high-throughput parallel inspection for biomedical purposes.

Description

558549 V. Description of the invention (1) Field of the invention: The present invention relates to a method for manufacturing a wafer-type microfluidic channel, and more particularly to a biological product produced by a hot embossing and a bonding process. Inspection wafer. BACKGROUND OF THE INVENTION: Micro-electro-mechanical process technology has the characteristics of miniaturizing traditional large-scale instruments. In the field of biomolecule detection, miniaturization of detection instruments is an inevitable trend. From the sampling, transmission, reaction, separation, and final detection of biomolecules, the related technologies of microelectromechanical processes have been regarded as important technologies for the development of biochips. On the other hand, glass materials are also regarded as the production of high-resolution organisms. The basic material of the wafer. In the field of conventional micro-electromechanical technology, body micro-machining is a process that is often used. As the name implies, body micro-machining is the process of cutting a silicon wafer or glass material into a parent material, and cutting it. The bulk micro-machining process is mostly performed by wet etch or dry etch. However, when these methods are used to process glass substrates, satisfactory processing results are often not obtained. In the wet name (Wet etch), a silicon wafer or glass is rotated by a photoresist, defined by a photomask, and exposed and developed, and then this photoresist is used as a mask. The etched area will be exposed and placed in a KHH or HF rice carving solution to be etched to obtain the desired structure. The engraving process uses chemical reactions to etch, so the vertical and horizontal directions of the glass material will be equally etched, which is called isotropic.

558549 V. Description of the invention (2) (Isotropic) rhyme, so the inscription (pr0fi le) carved by money will be a little different from the structure of set 4. In addition to the above problems in wet etching, the disposal of chemical waste liquid has become another serious problem. The etching solution will reduce its efficiency with the increase of the number of uses. Therefore, strong acid and strong waste liquid will be generated in the process, and the awareness of the legacy ring will increase. In the process, the chemistry of strong acid and alkali should be avoided as much as possible. Waste liquid is generated. In dry etch, before dry etching, the same process of mask definition is required to define the area where the last name is engraved. Because this silver engraving method uses physical action to perform engraving, particle bombardment is generated by plasma (Plasma), so anisotropic etching can be performed. Although a glass structure can be produced by this method, since the etching speed is relatively slow and the cost of the etching machine is quite expensive, the cost of the machine to be maintained is more considerable. In the field of micro-electromechanical technology, hot stamping technology is used to generate a large number of microstructures. This process method is to use two heated flat plates to heat the material to the glass and change the temperature point (G 1

Temperature; Tg), when the material is in a soft but unmelted state, and pressure is applied to the metal mold core and the plastic material to be formed, the required microstructure is formed. However, in order to be compatible with biomolecules, it is still necessary to cover the material with a special post-processing process to provide the biophase valley environment supply test. Based on the above results, there is an urgent need for a manufacturing process that is simple and saves mass. Through this process, wafer substrates can be obtained that can be quickly parallel, double-tested, highly consistent, and disposable.仃 558549

For this reason, the applicant has carefully studied and researched in view of the lack of know-how, and has developed a case of perseverance. This case is: a glass substrate detection wafer used to detect fluid samples, and Production process. 1 Description of the invention: The main purpose of this case is to provide a glass-based flow channel manufacturing method, which uses a hot press forming technology (Hot embossing) and a sealing bonding process to produce Production of a high-resolution microfluidic detection glass with high compatibility with biomolecules in order to achieve rapid manufacturing, mass production, and memory of the bad guys purpose. The manufacturing method of the glass substrate wafer-type micro-flow channel in this case, the hot pressing forming process includes the following steps: (a) providing a substrate; (b) forming a plurality of groove channels on the substrate, and the groove channels It is used to provide the area for fluid flow, mixing, reaction, separation, and detection; body (C) provides a light-transmitting plate and a cover layer, through which the light-transmitting plate is bonded to the substrate, 俾The plurality of groove channels are formed into a sealing area, and (d) a plurality of injection ports and outflow ports are defined on the cover layer; (e) the light transmitting plate is removed to obtain the detection wafer.

Page 7 558549 V. Description of the invention (4) According to the above idea, wherein step (b) further includes the following steps: (b 1) Provide a mold for nesting the mold on the substrate '(b2) Heat the substrate to A reaction temperature i ^ the plate is pressurized; and the substrate is cooled with a handle, (b3) the substrate is cooled, so that the substrate is formed from the substrate and the grooves are formed on the substrate aisle. According to the above concept, wherein the reaction temperature is the conversion temperature of the substrate, according to the above concept, according to the above concept, according to the above concept, wherein the substrate is a glass substrate. The transparent plate is a transparent glass bulb. Wherein the plurality of injection ports are respectively located in the plurality of groove channels and each of the plurality of outflows. According to the above-mentioned concept, wherein the covering J is according to the above-mentioned concept, wherein the = sacrificial layer. 0 3 structure layer and a concept according to the above, wherein the structure layer is coherent, that is, the light is not exposed to light, it has a negative photoresistance characteristic, and the structure will decompose. Is a Q TT η according to the above concept, wherein the sacrificial layer is two; 8. Sex, that is, it will decompose when exposed to light. Hunger increases to an AZ root, the above concept, where the complex number is defined by the ϋV layer by exposure development. The inlet and the outlet are the bonding of the wafer-type micro-flow channel (Bonding) of the broken substrate in this case. The method includes the following steps:

surface

Page 8 558549 V. Description of the invention (5) (a) providing a substrate, (b) forming a plurality of groove channels on the substrate, (c) covering a covering layer on the substrate; and (d) far away A plurality of injection ports and a plurality of outflow ports are formed on the cover layer to obtain a detection wafer, so that the plurality of groove channels form a tight area. According to the above concept, the plurality of injection ports and the plurality of outflow ports are respectively located above the respective ends of the plurality of groove channels. According to the above concept, the cover layer is a V glue layer. ι ^ According to the above concept, wherein the U V adhesive layer further includes a -structural layer and -a sacrificial layer. According to the above-mentioned concept, the structure layer has a negative photoresistance characteristic, that is, it will decompose without being irradiated with light, and the structure layer is a $ ^ 8. According to the above concept, the sacrificial layer in # has the characteristics of a positive photoresistance, that is, it will decompose when illuminated, where the 4 6 2 0. To & According to the above concept, wherein the plurality of groove channels are formed by press molding. … According to the above-mentioned concept ′, the plurality of injection ports and outflow ports are defined by exposure and development through the U V layer. 2: The above idea 'wherein the substrate is a glass substrate. Weep, two. Another main purpose is to provide a fluid sample detection method. Two-two wafer, which is a high-resolution microfluidic detection glass wafer with a high resolution and biomolecular phase, can be mass-produced and fast. system

Page 9 558549 V. Manufacture and reach the board for this case, which is the area to be tested, according to the above A * port, to the channel. According to the upper mouth 'are respectively formed according to the upper according to the upper mold. According to the above development and development according to the top to save costs and biomedical high-throughput parallel detection purposes. A detection wafer for a detection-fluid sample includes a plurality of groove channels based on the fluid flow and detection and a cover layer, which covers the substrate. The concept "wherein the cover layer further has a plurality of injection ports and the fluid sample is injected into and out of the plurality of grooves" The concept "wherein the plurality of injection ports and the plurality of outflows are located in the plurality of groove channels Above each end. Said conception, wherein the cover layer is a U V glue layer. Said conception 'wherein the glue layer is a SU8. The concept, wherein the plurality of groove channels is defined by the hot pressing system through the concept, wherein the plurality of injection ports and outflows are defined. The concept is described, wherein the substrate is a broken substrate. Description of the embodiments: The detailed description of the embodiment of the present invention can be found in the first to third figures. The invention is a process technology using a hot press forming method to form a desired microstructure on a glass substrate to prepare a biomedical test wafer according to the present invention. The first figure is a schematic view of a microchannel of a fluid detection wafer of the present invention. The first figure (a) is a perspective view of a detection wafer of the present invention. And the second picture (b)

Page 10 558549 V. Description of the invention (7) Section… not shown in section (A) of A-A. As shown in the first figure, the detection wafer of the present invention is a glass wafer 10, which is composed of a glass substrate 12, a UV glue 13, and a microchannel 14, wherein the glass substrate 12 and the glue 13 are transparent. The adhesive surface 15 on the glass substrate 12 is adhered; and the adhesive layer 13 has a function of sealing the microchannel 14. The hot-pressing process described in the present invention includes plastic materials and low-temperature glass filling, etc., and this embodiment is only one example. The first picture of π-Day-Naga is the flow chart of the hot-pressed glass molding process in the present invention: (:) "Xuan hot-pressed glass molding before the operation; the second picture is the press; the process of processing glass; The second picture (C) is the demolding process of the hot-pressed glass; and the second picture (1) shows the structure of the hot-pressed glass. A glass substrate material 24 is broken, and the two 24 are placed on the lower template 22. The material surface 25 is used to complete a pre-pressing action, and the material is changed to a temperature point. When the temperature reaches, the pressure transfer material 24 is started. When the pressure reaches the required setting, the temple can be demoulded. After & time, and before the demoulding, a step cooling is required, and the temperature of the substrate material 24 drops to its glass transition temperature point: the bottom is 1; the glass is broken to start the upper template 21 and the lower template 22 Separation. Its: ^ can be avoided in the cooling process to produce a cracked image. Purpose Page 11 558549 V. Description of the invention (8) Figure (a) is a schematic diagram of the glass substrate of the present invention; third figure (b) is a schematic diagram of two layers of UV glue on the transparent glass spin cloth of the present invention; Figure (c) is a schematic view of the combination of the transparent glass and the glass substrate of the present invention; third figure (d) is a schematic view of exposure through UV light after the combination; and third figure (e) is a view of the invention after removing the sacrificial layer A schematic diagram; and the third diagram (f) is the result of the invention after exposure and development. The third figure clearly reveals the bonding process in the manufacturing process of the inspection wafer according to the present invention. The structure of the inspection wafer includes a transparent glass, a glass substrate, a sacrificial layer UV glue 131, a structural layer UV glue 132, and a microfluidic channel 14. And adhesive surface 15 and so on. The bonding method is to place two layers of UV glue 'sacrifice layer UV glue 131 and structural layer UV glue 132 on a light-transmitting glass, and place them on a heating plate to heat the glass substrate 12 in a cooling process. The adhesive surface 15 is placed on the side of the transparent glass 11 with UV glue, and cooled together, and the element is exposed to a UV light for exposure. After being defined by the photomask, it is further subjected to a development step. The injection and outflow ports 26 on the detection wafer are thus generated. In the manufacturing method of the detection wafer of the present invention, it is necessary to remove the transparent glass Π before the final detection wafer structure described in the present invention can be obtained. The structure after UV light is placed in acetone (Acetone), In order to remove the sacrificial layer UV glue 131, the transparent glass 11 also falls off, and then the UV glue 1 3 2 is developed, and finally the wafer for detecting biomolecules of the present invention can be obtained. In summary, this case provides a microfluidic detection glass wafer with high resolution and high compatibility with biomolecules to achieve mass production and rapid manufacturing.

Page 12 558549

Page 13 558549 _ simple description of the diagram simple illustration: $ — Picture (a) is the root first picture (b) is the single first picture (c) is the single first and the first. The picture (a) is Root and graph (b) are root-graph (c) is root-graph (d) is root. Figure (a) is root-graph (b) is transparent and graph (c) is transparent. The third graph (d) is The third diagram (e) is the third diagram (f) is the schematic diagram of the parallel inspection wafer in which the data is shown; the schematic diagram of the double-measurement of 7L pieces; the cross-sectional view of a detection element AA; According to one aspect of the present invention, according to one aspect of the present invention, a hot-pressed mold is used to make sloped glass. According to one aspect of the present invention, a mold is used to make sloped glass: process; Schematic diagram of two layers of UV glue on a light glass spin cloth. The results after combining the light glass and the substrate are shown. Schematic diagram of UV exposure after combining; ′, thinking, and diagram; Schematic diagram of removing to the sacrificial layer; Schematic diagram of the result after shadowing. Explanation of the flow symbols: 1 0, 101 fluid detection wafer 12 glass basic 1 32 structural layer νν adhesive 15 glass adhesive surface 2 2 lower mold of hot pressing equipment 2 4 glass material 2 6 injection of biological samples 11 light transmission glass 1 3 1 Sacrificial layer UV glue 1 4 microfluidic channels 21 hot pressing equipment upper mold 23 metal mold core 25 broken glass material contact surface

Claims (1)

558549 VI. Above the end of the scope of patent application! A plurality of / ;, L outlets are located at the end of each of the plurality of groove channels respectively 7m: the manufacturing method of the first item of the profit range 'where the cover layer is 8 packs == =; The manufacturing method of the item layer 'where ... there is-Ϊ:: I! :: The manufacturing method of item 8, wherein the structural layer is two layers s υ 8: ... that will decompose without light irradiation, Wherein the structure 10, such as the method of patent application No. 8 manufacturing method has the characteristics of positive photoresistance, that is, your umbrella Zhaotu A \ Α Gong 4 do you have an AZ 4 6 2 0 solution, where the sacrificial layer is ^. The manufacturing method of the 7th patent application, wherein the mouth and the outflow are defined by exposure and development through the Uv layer. / 入 12. A method for detecting a fluid sample, comprising the following steps: (1) providing a substrate, (b) forming a plurality of groove channels on the substrate, (c) in A cover layer is covered on the substrate; and (d) forming a plurality of injection ports and a plurality of flows on the cover layer to obtain the detection wafer. 13. The manufacturing method according to item 12 of the scope of patent application, wherein the plurality of inlets and the plurality of outlets are located above the ends of the plurality of grooves & respectively. Daoliang Page 16 558549 6. Scope of Patent Application 1 4. The manufacturing method according to item 12 of the scope of patent application, wherein the covering layer is a U V adhesive layer. 15. The manufacturing method according to item 14 of the scope of patent application, wherein the U V adhesive layer further includes a structural layer and a sacrificial layer. 16. The manufacturing method according to item 15 of the scope of patent application, wherein the structural layer has a negative photoresistance characteristic, that is, it will decompose without being irradiated with light, and the structural layer is a S U 8. 17. The manufacturing method according to item 15 of the scope of patent application, wherein the sacrificial layer has a characteristic of positive photoresistance, that is, it will decompose when illuminated, and the sacrificial layer is an AZ4620. 18. The manufacturing method according to item 12 of the scope of patent application, wherein the plurality of groove channels are formed by hot stamping. 19 · The manufacturing method according to item 14 of the scope of patent application, wherein the plurality of injection inlets and outlets are defined by exposure and development through the U V layer. 20 · The manufacturing method according to item 12 of the scope of patent application, wherein the substrate is a glass substrate. 2 1. A fluid detection wafer for detecting a fluid sample, comprising: a substrate having a plurality of groove channels for providing a region for the fluid to flow, detect mixing and separation; and a cover layer It is covered on the substrate, so that the plurality of groove channels form a sealing area. 2 2. The fluid detection wafer according to item 21 of the patent application scope, wherein the covering layer further has a plurality of injection ports and outflow ports, so that the fluid samples are respectively, Page 17 558549 VI. Scope of patent application Fill and drain the groove channels. 2 3. The fluid detection wafer according to item 22 of the patent application scope, wherein the plurality of injection ports and the plurality of outflow ports are respectively located above the ends of the plurality of groove channels. 24. The fluid detection wafer according to item 22 of the application, wherein the plurality of injection ports and outflow ports are defined by exposure and development. 25. The fluid detection wafer according to item 21 of the patent application scope, wherein the covering layer is a U V adhesive layer. 2 6. The fluid detection wafer according to item 25 of the patent application scope, wherein the U V adhesive layer is a S U 8. 2 7. The fluid detection wafer according to item 21 of the patent application scope, wherein the plurality of groove channels are formed by hot stamping. 2 8. The fluid detection wafer according to item 21 of the application, wherein the substrate is a glass substrate. Page 18