TW550118B - Coating apparatus and coating method - Google Patents

Abstract

This invention provides a coating apparatus, which, when using the coating apparatus that limit a coating zone of a substrate with a masking device, to perform coating operation, effectively limits the coating zone surely with the masking device. Grooves 110 that are coated with an organic electroluminescent (EL) material are formed on the substrate S and the organic EL material is poured in the grooves to be applied by moving nozzles 4a-4c along the grooves. The substrate S is masked by a peripheral part masking device 50 and masking plates 51 and 52 are moved by controlling driving means 53 and 54 by a control part 9. The movement of the masking plates 51 and 52 is carried out by shifting by a prescribed extent in the direction reverse to the moving direction of the nozzles 4a-4c. As a result, the organic EL materials 10a-10c are applied on the substrate S while surely limiting the coating zone.

Description

550118

[Technical Field of the Invention] The present invention relates to a semiconductor substrate, a FPD (flat panel display) substrate for a liquid crystal display device, a glass substrate for a photomask, and an optical disc plate (hereinafter, simply referred to as "4 substrates" In order to apply organic materials to the above, a foot coating device is used, and in particular, a coating device for improving a spreading method after the coating liquid is discharged from a mobile discharge nozzle is improved. [Prior technology] As a photoresist material indispensable in lithographic etching technology, in order to coat the substrate (semiconductor wafer) with a coating device, in order to effectively use the photoresist material, the remaining photoresist component on the substrate is 9 °. % Or more, coating method for suppressing photoresist material < 10% or less loss component, without rotating the substrate is considered to be a method using a completely flat plate dispersion nozzle, FIG. 7 shows the important structure of a coating device that has been recognized as a plate dispersion method Sketch map. That is, facing the top of the substrate W in the stopped state, the nozzle 100 is moved toward the arrow direction A in FIG. Π, and the photoresist material is sprayed from the tip portion to the applicator. At this time, by controlling the substrate w The transfer speed and the discharge speed of the photoresist material control the thickness of the photoresist film formed on the substrate W. However, in the actual manufacturing process, when the photoresist film is coated on the substrate by the coating device of FIG. 7 'the photoresist film is also attached to the surrounding portion of the substrate W. Therefore, it is necessary to remove the photoresist film around the substrate W after the photoresist film is applied. The step of avoiding photoresist film is accompanied by this step, which may cause dust, which may cause particles to be generated when the substrate is transferred in the subsequent steps (pattern etching etc.). Here, what is provided in Japanese Patent Application Laid-Open Publication No. 6_224114 is' for contacting or not connecting around the substrate W in the stopped state -4-This paper size applies the Chinese National Standard (CNS) A4 specification (210X (297 mm)

Binding

550118 A7

Touch the design of ‘free approach and alienation’

The coating of the peripheral part of the plate w is added to the coating device of the peripheral part masking device 101. Based on this conventional technology, as shown in Figures 8⑷ to ⑷, there is a masking device 101 on the substrate ... Peripheral parts can be coated with photoresist film: = Only, after photoresist coating, in order to remove unnecessary light film on the peripheral part W1, special equipment is unnecessary because of this, so the production volume of the process is increased. Furthermore, around the substrate W, The buttocks do not need to remove the photoresist film, so they do not work hard to produce dust. H On the other hand, in recent years, organic EL (electronic light-emitting) materials have been coated on a substrate with a sufficient pattern shape. In the process of manufacturing an organic EL display device, a coating device as described above is also used. The conventional organic EL display device is manufactured as described below. Firstly, a transparent ITO (thin oxide) film is made on the surface of the glass substrate, and then the ITO film is formed on this glass substrate. Using photolithography etching printing technology,丨 A pattern is formed in the electrode. This first electrode is equivalent to an anode. Secondly, an electrically insulating partition wall is protruded on the glass substrate like a strip-shaped first electrode, and is formed using a photolithography etching printing technique. Therefore, the nozzle of the coating device sprays the organic EL material to the strip-shaped first electrode in the partition wall. The organic El material is coated on the strip-shaped first electrode in the partition wall. Specifically, the strip-shaped first electrode in the partition wall is coated with the organic EL material. 1 The electrode is coated with a red organic EL material with a red organic EL material nozzle, a green organic EL material with a nozzle coated green organic EL material, a cyan organic EL material with a nozzle coated cyan organic EL material, and the first coating on the cyan organic EL material The second electrode adjacent to the electrode is coated with red organic EL material, so red, green, -5-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) binding

550118

The cyan organic EL materials are individually coated on the first electrodes in this order. Secondly, a plurality of stripe-shaped second electrodes that are orthogonal to the first electrode are formed and arranged on a glass substrate by vacuum evaporation. An organic EL material is interposed between the second electrode and the second electrode. It is equivalent to a cathode. In this way, it is possible to manufacture an organic EL display device in which the first electrode and the second electrode are arranged in a simple χγ rectangular shape and can display full color. [Problems to be Solved by the Invention] However, those coating materials that are required to meet the fine pattern shapes such as organic EL material coating are considered to be inapplicable to the conventional flat dispersion coating device. 'Here', many of them are available. A coating device that discharges a coating liquid in a fine hole discharge nozzle method (hereinafter referred to as a linear nozzle). In this way, it is necessary for the linear nozzle to move the coating nozzle linearly along the pattern to perform coating in the desired range. In order to increase the production volume, this linear movement also needs to be speeded up. When the part masking device masks the part W1 around the substrate W, the following problems occur. As shown in FIG. 9, when the linear nozzle 102 moves at a high speed in the arrow mark direction B, the sprayed coating liquid L also performs inertial force movement in the arrow mark direction B. As a result, the linear nozzle 102 is on the movement start side. In the coating range W2, a region W3 in which the coating liquid L is not completely applied is generated. In addition, when the linear nozzle 102 is on the moving end side, the coating liquid L is scattered in a region W1 around the substrate W1. Here, as the linear nozzle 102 moves at a high speed, the coating liquid L flows in the direction of movement of the linear nozzle 102 and is applied by the inertial force. -6-

Binding

This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 550118 A7 B7 V. Description of the invention (4) That is, the coating liquid L usually flows in the direction of the linear nozzle 102. The coating coating range W2 will form an incomplete coating film, and the coating liquid L will be coated in the surrounding portion of the substrate w in the non-coating area, and the coating liquid [will have unnecessary consumption. An object of the present invention is to solve the above-mentioned problems, and provide a coating device that can reduce the amount of coating liquid used, reduce the loss component (disposal amount), and form a coating film with excellent uniformity on the pattern on the substrate. [Means for Solving the Problems] In order to achieve the above-mentioned object, the coating device for coating a coating liquid on a substrate in the present invention has a special feature that the ejection nozzle in the transverse direction on the substrate in a stopped state moves while the A coating nozzle means for discharging a coating liquid from a discharge nozzle on a substrate, and a "masking means for masking the discharged coating liquid on the periphery of the substrate" from the nozzle means for the peripheral portion of the substrate, and the masking means. In the moving direction of the nozzle means or the control means for moving in the reverse direction, the effect of the present invention is as follows. In the coating device requesting the first related invention, the application range of the coating liquid by the nozzle means is covered by the masking means. Suppose that the "masking method" is to move the nozzle means in the moving direction and the reverse direction. "Result" As the nozzle means moves, the coating liquid flows from the inertial force to the moving direction of the nozzle means. The masked area is restricted in the reverse direction, and the area covered by the flow of the coating liquid is also restricted. By means of movement, the application range of the coating liquid is surely limited to the desired range. The invention related to the second item is to request the national standard (CNS) A4 specification (210X297 mm) of the coating device described in the first item. 550118 5. In the description of the invention (5), the nozzle means is covered by the masking means placed on one side of the substrate above the coating range on the substrate, and then the masking means is placed on the surrounding part in the other direction of the substrate as the above. It is a range of movement. In the coating device requesting the second related invention, the coating of the coating liquid within the coating range can be surely achieved in the substrate masked by the masking means. When the third related invention is requested, the second item is requested. In the coating device, the above-mentioned masking hand is arranged with a gap for a peripheral portion of the substrate, and the movement control means has the following characteristics. The moving direction of the nozzle means moves the masking means on the upstream side to the periphery of the substrate. Moving at the same time, the moving direction moves the masking means on the downstream side toward the coating range of the substrate. The third related invention is requested. In the coating device, the moving direction of the nozzle means moves the masking means on the upstream side toward the peripheral portion of the substrate, which can prevent uneven coating film coating in the coating range. On the other hand, the moving direction shifts the masking means on the downstream side toward A person who moves on the substrate coating area can prevent the coating liquid from being applied to the periphery of the substrate. A feature of the fourth related invention is that, in the coating device according to the second or third aspect, the moving range of the nozzle means is the The fixed end is repeatedly coated with different moving ranges by reversing the moving gimbal, and the nozzle means is further provided with a driving control means for controlling driving. The movement control means =, in conjunction with the reversing of the nozzle means, adjusts the moving direction. In the coating device requesting the fourth related invention, the substrates can be coated in a wide range by repeating the coating with the nozzle means reversed. At this time, the masking means = the nozzle means are moved in conjunction with each other. Unnecessary 550 118 A7

Coating 'or in the coating range can prevent unevenness of the coating film. In addition, the fifth related invention is requested to include a coating method for applying a coating solution on a substrate, and a nozzle in a transverse direction on a substrate in a stopped state. A nozzle type = moving nozzle, and a step of moving the nozzle. A mask is provided around the substrate, a masking step for masking the peripheral part of the base 2 by the coating liquid discharged from the discharge nozzle, and a moving step for moving the mask in the movement direction and the reverse direction of the discharge nozzle, and from the above. A discharge-type nozzle is a discharge step of applying a coating liquid onto the upper surface of the substrate. The coating method according to the fifth invention is the same as the invention of the fifth invention, and the application range of the coating liquid can be surely limited to the desired range. In addition, the invention related to the sixth aspect of the present invention is the coating method of the fifth aspect of the present invention. In the above-mentioned ejection nozzle, the upper surface of the mask placed on the periphery of the substrate in one direction passes the coating method on the substrate. After the circle, it is moved as a moving range until the upper surface of the mask placed on the peripheral portion in the other direction of the substrate. According to the coating method related to the sixth invention, the same coating method as in the second invention can be reliably applied to the coating liquid in the coating range. In addition, the invention related to the seventh aspect of the invention is the method for applying the sixth aspect of the invention, wherein the mask is disposed with a gap to a peripheral portion of the substrate, and is included in the moving step. A step of moving the mask on the upstream side toward the peripheral portion of the substrate by the discharge nozzle moving direction and a step of moving the mask on the downstream side toward the coating range of the substrate by the discharge nozzle moving direction. -9-This paper size is applicable to China National Standard (CNS) A4 (210X 297mm)

550118 A7

According to the coating method related to the seventh invention, the spots are the same, and the coating film can prevent the coating film from being invented according to the third invention. The coating liquid is not applied to the periphery of the substrate. Sentence-by-sentence, meanwhile, anti-'request for the eighth related invention is to include in the company-related coating method, at the above nozzle:; = 6 or the end of the above-mentioned movement range of the nozzle, reverse the moving side: the coating movement range is heavy Repeat the steps. In the above-mentioned moving step, the step of adjusting the moving direction after interlocking in the above-mentioned ejection = nozzle reversal. According to the relevant coating method of the eighth invention, the same as the invention of the eighth * can be coated in a wide range of substrates, and it is not necessary to coat outside the coating range, or it can prevent the coating film from being affected in the coating range. Even. [Embodiment of the invention] The embodiment of the present invention will be described in detail below with reference to the drawings. The coating device related to the embodiment of the present invention is, specifically, an organic EL display device in which the organic EL material as a coating liquid is coated in a predetermined pattern shape on a rectangular glass substrate (simply referred to as a substrate S). . FIG. 1 is a schematic configuration diagram of an important part of a coating device in a manufacturing process of an organic EL display device according to an embodiment of the present invention. In this coating device, a substrate transfer device (not shown in the figure) ejects the organic EL material in a linear rod shape from the tip of the self-ejecting nozzles 4a to 4c (linear nozzles) on the substrate S to be transferred. The coating device is a substrate S mounting platform 1 that receives coating of red, green, and cyan organic EL materials 10a to 10c as shown in FIG. 1. The platform 1 is set to -10.-This paper size applies Chinese national standards ( CNS) A4 size (210X297 mm) 550118

V. Description of the invention (8) 2 Directional moving platform movement mechanism 2, Position synthesis detection unit that detects the position of the position synthesis mark formed on the substrate s 3, Red organic EL material 10a is supplied to, and working color nozzles First supply part 5 of 4a, second supply part 6 for supplying green organic EL material 10b ', ~ to, black nozzle 4b, third supply of cyan organic EL material 10c for green nozzle 4c Section 7, Nozzle moving mechanism 8 that moves nozzles of various colors to 4c in a predetermined direction, Peripheral section masking device 50 covering the periphery of the substrate $, Control platform moving mechanism 2 and position synthesis mark detection section 3, and i The third supply unit 5 to 7 and the control unit 9 of the nozzle moving mechanism 8 and the peripheral portion masking device 50 are configured. Hereinafter, the structure of each part will be described in detail. At the same time, as shown in FIG. 2 and FIG. 3, the organic EL materials 10a ~ of various colors are coated on the surface of the substrate s which is coated with the organic EL materials 10a ~ 10c of red, green, and blue. 10c The stripe grooves 11 corresponding to the predetermined pattern shape are formed and arranged in parallel. FIG. 2 shows the grooves coated with organic el material in accordance with the completely patterned shape. The substrate S formed on the surface is seen from above. A rough plan view. Fig. 3 is a schematic cross-sectional view showing a part of the substrate S shown in Fig. 2. Here, a description is given of the manufacturing steps of the substrate 8 which is coated with the organic EL materials 10a to 10c of various colors. First, a transparent ITO film is formed on the surface of the flat substrate S. Secondly, the formed IT0 film is formed on the substrate S using photolithography etching printing technology. A pattern is formed on the strip-shaped first electrode j 2, and the first electrode 12 is equivalent to an anode. Next, the strip-shaped first electrode 12 is formed around the electrically insulating partition wall 13 protruding on the substrate S using a photolithography etching printing technique. The partition wall 3 is, for example, formed with cadmium (Cr) or a dry film. In this way, the surface of the substrate s 550118 A7 B7 V. In the description of the invention (9), the stripe coating of coating the organic EL materials 10a to 10c of each color is formed in a plurality of parallel shapes. At the same time, strips in this gully! On the electrode 12, a positive hole transport layer μ is formed by positive holes in the organic EL material 10a ~ 10c. As the positive hole transport layer 14, for example, pEDT (polyethylene terephthalate) is used. Oxyphene) -PSS (Polystyrene Sulfuric Acid), the width of groove 12 is, for example, the degree of ⑻, the depth of groove 11 is, for example, the degree of hiOpm, and the distance between groove u and groove n is, for example, 10 to 20 μηι degree. In this manner, the substrate s which receives the coated state of the organic EL materials 10a to 10c is manufactured. Returning to FIG. 1, the first supply unit 5 includes, for example, a red organic material 10a, a supply source 20a, a pump 21 for taking out a red organic team material from the supply source 20a, and a red organic EL is detected. A flow meter 22 for the flow of material 10a, and a filter 23 for removing impurities in the red organic EL material 10a. The second supply unit 6 is provided with, for example, a supply source 20b of the green organic EL material 10b, a gang 21 for taking out the green organic EL material from the supply source 20b, and a flow rate at which the green organic El material 10b is detected. A meter 22 and a filter 23 for removing impurities in the green organic EL material 10b. The third supply unit 7 is provided with a supply source 20c of, for example, a cyan organic EL material 100, a gang 21 for taking out the cyan organic EL material from the supply source 20c, and a flow rate at which the cyan organic EL material 10c is detected. A meter 22 and a filter 23 for removing impurities in the green organic EL material 10c. As shown in FIG. 4, the nozzle moving mechanism 8 is provided with nozzles 4 a to 4 c of various colors, holding members 3 that hold the nozzles 4 in a juxtaposed state, and holding the holding member 31 around the support shaft 34. Supporting materials for free rotation 32. Installation and removal of the thread removal line. 12-This paper size is suitable for CNS A4 specification (21GX297 public love) 550118 A7 ------------ —__ B7 V. Description of the invention (1 ~ '--- ~ = Guide member for moving the supporting member 32 in order to Λ ". Fig. 4 (4 is a schematic perspective view of the nozzle moving mechanism section, and Fig. 4 is a view from the nozzle moving mechanism section. Figure 4 (c) is a schematic plan view showing the state where the holding member rotates around the supporting shaft of the supporting member. In the supporting member 32, the nozzle of the holding member 31 is set in a vertical direction. A support shaft 34 is provided. In the holding member 31, a failure hole 35 is designed to be inserted into the support shaft 34. A holding member 31 is fitted into the supporting shaft μ of the supporting member < fitting hole 35, and the supporting member 32 is a support holding member 31. Freely rotate around the support shaft 34. For example, as shown in Fig. 4 (c), hold The member 31 rotates around the support shaft 34. In the state shown in FIG. 4 (b), the coating tone interval p 丨 of each color can be narrower than the coating tone interval P2. The coating tone interval of each color can be narrowed by trimming. At the same time, in order to output the pore diameter of the organic material B, these nozzles 4a to 4c * have a smaller width than the groove formed on the substrate s, for example, about tens of μm, and here 10 to 70 μm. The position combination mark detection unit 3, for example, uses a CCD camera. The position combination mark detection unit 3 receives instructions from the control unit 9 and irradiates the formed position combination marks at the four corners of the glass substrate s shown in FIG. 2 respectively. M, the image data of these irradiation position marks I and M are output by the control unit 9. The peripheral masking device 50 is a pair of long-length masking plates 5 1 and 52 that mask the peripheral portion of the substrate 8 in the stopped state. The masking plates 51 and 52 are independently constituted by driving means 53 and 54 such as a cylinder that moves linearly after being independent. Therefore, the peripheral masking device 50 is aimed at the vicinity of the substrate s in the stopped state so that it may not touch the vicinity, or Alienation, X in the arrow Free to move back and forth -13-This paper size applies Chinese National Standard (CNS) A4 specification (21〇X 297 mm) 550118 V. Description of the invention (consisting of 11 movements. The clearance from the surface of the substrate S is set to 05 ~ 2mm, to prevent the organic EL material from returning to the inside of the masking plates 51 and 52 to a certain extent ^ If there is no such gap, the inside of the masking plates 51 and 52 and the surface of the substrate s will be wiped, resulting in garbage, which is not good. 9 is the position where the image data irradiated by the position combination mark detection unit 3 is the position where the position combination mark M is basically detected. The control section 7 is the first one designed by CAD (Computer Aided Design)! The electrode i2iui is given in advance. The control unit 9 calculates the result from the position of the position combination mark M and the furnishing data provided in advance. The coating start point is calculated, that is, the coating opening from the end of the groove 116 of the substrate S in one direction is calculated.

Start position (equivalent to the coating start position B1 described later), and at this time, the position combination mark formed on the substrate S "is made of four points, but it can also be made, for example, at two points or more." Control section 9 is shown in FIG. 5, which controls the platform moving mechanism unit 2 by moving the platform in a predetermined direction (y direction) at a predetermined amount, and the nozzles 4a to 4c move the nozzle moving mechanism unit in a predetermined direction & universal direction). 8. As shown in FIG. 丨, according to the detected amount & ~ c of each flowmeter 22 from the first to third supply sections 5 to 7, the organic EL material with a predetermined flow rate flows from the nozzles 4a to 4c. Ioc generally outputs commands d to f at each of the ㈣21 of the third supply unit 5 to 7. Fig. 5 is a schematic side view for explaining the movement direction of the platform and the nozzle. The control unit 9 is a control unit 8 for controlling the nozzle movement, At the same time, the control of the driving universal of the driving means 53 ', 54 adjusts the masking area of the substrate s according to the masking plates 51, 52. At the same time, the nozzle moving mechanism 8 and the nozzles 4a to 4c described above are equivalent to those in the present invention. Nozzle, the above-mentioned control part 9 is regarded as the driving force in the present invention -14-Paper The standard is applicable to China National Standard (CNS) A4 specification (210X297) 550118 A7 One----B7 V. Description of the invention (12) Function of the dynamic control means. X, the above-mentioned masking plates 51 and 52 are equivalent in the present invention. < The masking means, the driving means 53, 54 and the control unit 9 function as control means in the invention. Next, the manufacturing steps are made from the constituent coating device as described above, and will be described below. As shown in FIG. 3, it is related to the manufacture and acceptance of organic EL materials 10a to 10c < coated state > substrate S. As described above, it is explained that the substrate s groove 11 is placed on the platform and coated with organic. ] ^ The steps of material 10a to 10c. The control unit 9 is assigned and instructs the four-corner position combination marks M of the substrate 8 placed on the platform to be indicated by the image-like position combination mark detection unit 3, respectively. The position combination mark detection unit 3 outputs the image data of the photographed position combination mark M from the control unit 9. The control unit 9 calculates the position based on the image data obtained by the position combination mark detection unit 3 based on the image data obtained from the image. The position of the combination mark M. The control section 9 The calculation result of the position of the combination mark% is calculated based on the pre-applied groove setting data, and the starting point of coating is calculated, that is, the coating starting position B1 at the end of the substrate § groove is calculated on the side of one end portion of the substrate. That is, as shown in FIGS. 5 (a) and 5 (b), the surrounding area masking device 50 is moved in advance. In FIGS. 5 (a) and 5 (b), while moving 4a to 4c, the organic EL material is being discharged. a ~ 10c When applying, the peripheral masking device 50 sets the peripheral portion W1 'W1 of the substrate s to a masked side view, and (a) is the case where the mouths 4a to 4C move in the direction of the arrow mark B. (B) is the case where the nozzles 4a to 4c move in the arrow mark B direction and the reverse direction. First, the masking plates 51 and 52 are arranged on the left side of the figure as shown in FIG. 5 (a), that is, the movement start position of the nozzles 4a to 4c. The side masking plate 51 is viewed from above and can face the surrounding portion W1. ， Nozzle 牦 ~ 4 (：-15 of the moving direction side-

550118 A7

The masking plate 52 is a masking plate which is moved upward to the application range of the substrate s to the repeated position. In other words, it is arranged to move in the B direction and the reverse direction of the moving directions of the nozzles 乜 to 仏, and the coating start position 基板 of the substrate s is set above the masking plate 51. As shown in FIG. 6, the second part 9 is placed at the coating start position B 丨, and the nozzles 4a to 4c are placed to control the platform moving mechanism section 2 and the nozzle moving mechanism section 8. FIG. 6 is a schematic diagram for explaining the greed movement path. At the same time, the supporting members 32 of the nozzle moving mechanism section 8 are red, green, and cyan nozzles 乜 ~ "adjusted in the vicinity of the center in the width direction of the groove n. In a good position. The distance between the nozzles 4a to 4c and the groove 11 on the substrate S is set, and the liquid column distance that maintains a linear rod shape even after the organic EL material is ejected is calculated in advance. As shown in FIG. 6, when the nozzles 4a to 4c are placed at the coating start position B 丨, the control unit 9 instructs each of the pumps 21 to flow into the grooves 11 on the substrate S from the nozzles 4a to 4c into the organic EL material 1. a ~ 10c, at the same time, while controlling the organic EL material 10a ~ 10c along the groove u on the substrate s, it flows into this groove 11 while 'moving the support member 32 along the guide member 33, so 'Red, green, and tone organic EL materials 10a ~ ^ (^ flow into the individual grooves 11 at the same time. At this time, the coating from the nozzles 4a to 4c starts from the top of the masking plate 51 and passes through the masking plate 51. Moves above the substrate S, so that the organic EL material 10a ~ 10c that is ejected is moved toward In the direction of b, the inertial force acts and does not become the masking plate 51. The organic material 10a to 10c is applied to the surrounding area wi of the substrate S in the coating range W2 by inertial force flow, that is, the masking plate 51. Because there is no upper part of the organic el material to the surrounding part of the substrate S-16-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) binding

550118 A7 B7 V. Description of the invention (14) ^ The materials 10a to 10c become coated with inertial force in the coating range W2. This result is shown in FIG. 5 (a). The coating film at the beginning and end of the coating range W2 can be prevented from becoming thin. The organic EL material 10a to ioc is used to coat the coating range W2 by inertial force, and a masking plate is set. The moving amount of 51 is determined in advance by experiments based on the moving speed of the nozzles 4a to 4c, the discharge speed of the organic EL material 10a to 10c, and the distance relationship from the nozzles 4a to 4c to the substrate S. . If so, the value is memorized in the control unit 9 as long as the amount of movement of the driving means 53 is controlled. At the same time, the control unit 9 changes the coating amount of the organic EL material uniformly at each point of the stripe groove η according to the nozzle The moving speed of 4a ~ 4c is used to control the coating amount. The control unit 9 applies the coating to the stopped application stop position E on the other end side of the substrate S groove 11 and instructs the pumps 21 to stop flowing from the nozzles 4a to 4c to the groove on the substrate S when the nozzles 4a to 4c are placed. At the same time, the organic EL materials 10a to 10c in 11 are stopped from moving along the guide member 33 along the support member 32. At the same time, in the coating stop position E, as long as the movement of the nozzles 4a to 4c is stopped, the discharge of the organic EL material 10a to ioc can continue. For this reason, the masking plate 52 is organic EL on the substrate S. The materials 10a to 10c may not be coated, and furthermore, the operation can reduce the need to start the re-ejecting operation. Therefore, the subsequent coating stop position E is also good. At this time, the coating stop positions E of the nozzles 4a to 4c are set above the masking plate 52. Therefore, the inertia force acts on the discharged organic EL material 10a to 10c in the direction of the moving direction B, and the masking plate 52 The organic EL materials 10a to 10c appearing toward the substrate s flow with inertial force, and the coating area 2 is located below the masking plate 52. Originally, because there was a masking plate 52, it was bound from the top, -17-this paper standard @ a 家 标准 (CNS) A4 size (plus X tear public love) binding

k · 550118 A7 B7 V. Description of the invention (15 Organic EL materials 10a to 10c facing the coating range W2 of the substrate S, in order to use the inertial force flow range as the coating range W2, control the movement of the masking plate 52 to become coating coating Range W2. As a result, as shown in FIG. 5 (a), the end portion of the coating range W2 can prevent the coating film from being applied to the peripheral portion W1. The organic EL material 10a to 10c are coated with a mask by inertial force. The moving amount of the masking plate 52 set in the coating range W2 on the lower side of 52 is obtained experimentally in advance, from the moving speed of the nozzles 4a to 4c, the discharge speed of the organic EL material 10a to 10c, and from the nozzles 4a to 4c to The range of movement obtained from the distance relationship between the substrate S. In this way, this value is memorized in the control section 9 and the amount of movement of the driving means 54 can be controlled. In this way, the coating of the organic EL material 10a to 10c is completed in three rows The groove 11 is divided into the thickness of the organic EL material 10a to 10c that is waved in the groove 11. Although the inflow amount of the organic EL material 10a to 10c can be adjusted, the organic EL material 10a to 10c The thickness of 10c is generally formed to the extent of μm. Second, As shown in FIG. 6, the platform 1 is sent in batches in the y direction to only three rows, and the organic EL materials 10a to 10c are applied to the next three rows of the trenches 11. In the middle, the left end side of the groove 丨 丨 is regarded as the coating start position B 1, the right end side of the groove 11 is regarded as the coating stop position E, and the nozzles 4 a to 4 c are moved along the groove 11 from left to right, respectively. The organic EL material 10a to 10c flows into the groove ^, but in the next three rows of the groove 11, the right end side of the groove 11 is regarded as the coating start position B 1, and the left end side of the groove 11 is regarded as the coating stop position E. The nozzles 4a to 4c are moved from right to left along the groove 11, and the organic EL material 10a to ioc flows into the grooves 11. Meanwhile, the masking plates 51 and 52 are also shown in FIG. 5 (b). Generally, in the figure, shift to the right -18- This paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) # Binding

Spring55055 A7

The coating stop position E is regarded as the coating start position B1, and the coating start position B1 is set as the coating stop position E. The arrangement relationship between the coating start position bi and the coating stop position E and the nozzles 4a to 4c is the same as the initial groove described above.丨 Three rows of knives have the same arrangement relationship. At this time, the nozzles 4a to 4c are usually located above the masking plates 51 and 52, and the size and moving amount of the masking plates 51 and 52 are set. Therefore, the grooves n remaining on the substrate S are repeatedly performed as described above, and the organic EL materials 10a to 10c of each color are flowed into the respective grooves u, so that the red, green, and cyan organic EL materials 10a to 10a ~ 10c arranges the respective grooves 11 in a strip form in the order of red, green, and cyan, that is, forms a strip arrangement. At the same time, the semi-circular dashed line shown in FIG. 6 is shown by the movement of each nozzle 4a to 4c in its two-row groove 11, and each of the nozzles 4a to 4c does not actually have a semi-circular path shown in this dotted line. The movement, as described above, moves the platform 1 in the other direction, so that each of the nozzles 4a to 4c moves in the X direction, and the organic EL material 10a to 10c can flow well in the groove n. Secondly, when the organic el material 10a to 10c is applied to the entire groove 11 on the substrate S, the second stripe-shaped second electrode that is perpendicular to the first electrode 12 is formed on the substrate S by a method such as real cheese evaporation. In a parallel arrangement, the organic EL material 10a to 10c are interposed between the first electrode 12 and the second electrode. The second electrode is equivalent to the cathode. Thus, the first electrode 12 and the second electrode are simply arranged in an XY rectangular shape. , And an organic EL display device capable of full-color display is manufactured. In this way, the substrate S is masked by the surrounding masking device 50, and after coating, the organic EL materials 10a to 10c are moved by moving the nozzles 4a to 4c in accordance with the predetermined pattern shape. If so, the substrates S, 51 and 52 are moved by the predetermined amount in the moving direction of the nozzles 4a to 4c and the reverse direction, so that the substrate S can be coated with organic-19.- This paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) Stapling

550118

The EL materials 10a to 10c are in a desired coating range. Therefore, since “α” is unnecessary after coating, a special device for removing unnecessary coating film on the periphery of the substrate is not necessary, so the yield of the process is improved, and the cost can be greatly reduced. Moreover, it is unnecessary to remove the periphery of the substrate after coating. Unnecessary step of coating the film 'With this step, no dust is generated, and the subsequent steps (patterning, etching, etc.) can eliminate the cause of particle generation during substrate transportation. Meanwhile, the present invention is not limited to the above Only the embodiment and the modification example may be performed in the following other forms. (1) In the above embodiment, as shown in FIG. 6, the platform 1 on which the substrate s is placed is grooved on the substrate S. 11 longitudinal direction (x direction) vertical direction & direction) are fed in batches, and the nozzles 4a to 4c are moved in the long direction of the groove 11 (direction ^), although the organic EL material 10a ~ flows into the groove 11 of the substrate S 10c, but the platform 1 is fixed, so that the nozzles 4a to 4c are fed in batches in a direction perpendicular to the long direction of the groove U on the substrate s, and the nozzles 4a to 4c are moved in the long direction of the groove 11 and the substrate s The organic EL material 10a ~ i〇c can also flow into the trench 11. (2) In the above embodiment, three sets of nozzles 4a to 4c of red, green, and cyan are used to flow the organic EL material i0a to 10c into the groove 11 of the substrate S, but these three groups of i The nozzles 4a to 4c are designed as multiple arrays, and the grooves u of the substrate S can also flow into the organic EL material 10a to 10c. In this way, the time taken for the coating process can be shortened. Furthermore, it is arranged in multiples or fractions of 4 The interval between the nozzles 4a to 4c and the interval between the adjacent grooves 11 (or the interval from the wide center of the groove 11 to the adjacent wide center of the groove 11) can be perpendicular to the longitudinal direction of the groove 11 by 3. These nozzles 4a ~ 4c are spaced by multiples or fractions adjacent to the groove 11 and sent in batches of -20-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 550118 A7 B7, so The widening between the nozzles can be easily maintained. (3) In the above embodiment, although the substrate s is made of a glass substrate, the substrate is made of a material other than glass, and its shape is not limited to a rectangular shape, and even a circular shape can be coated. A case where the range is limited by a masking device can also be adopted in the present invention. * (4) At the same time, Each of the embodiments described above shows the case of coating with an organic material (polyimide, etc.), but the case of coating with other photoresistive materials can also be used in the present invention. Other, technical matters described in the scope of the patent application The range can be designed in various ways. [Effects of the invention] From the above description, it can be seen that according to the present invention, the coating liquid can be applied on a substrate with a predetermined pattern shape, even when the coating liquid S is applied by moving the nozzle. '& The coating liquid coating area can be strictly restricted, which can prevent scattering outside the coating area and achieve uniformity at the same time. [Illustration of the drawing] Figure 1 The block diagram of the important part of the relevant coating device in the embodiment of the table shirt invention . Fig. 2 is a schematic plan view showing a state in which an organic EL material is coated on a corresponding groove surface of a predetermined pattern shape as viewed from above the formed substrate. FIG. 3 is a schematic cross-sectional view of a part of the substrate shown in FIG. 2. Fig. 4 斜 The outline of the nozzle moving mechanism part of the implementation of the present invention (b) is a schematic plan view seen from above the nozzle moving mechanism part, ⑷ shows the rotation state of the support member around the support axis of the support member -21-丨 Jin mNS, A4 specifications (210X297) 550118

Sketchy plan view. Fig. 5 is a schematic side view for explaining the movement direction of the substrate # in this embodiment; ⑷ shows the case where the nozzle moves in the B direction; ⑻ shows the case where the nozzle moves in the B direction and the reverse direction. FIG. 6 is a schematic diagram illustrating a nozzle moving path in this embodiment. Fig. 7 illustrates the structure of an important part of the conventional flat plate dividing + doubling, bucket, and Dingji knife-type coating device. Fig. 8 is a diagram showing an example of a masking device showing a schematic configuration of a substrate peripheral portion to a device structure. (A) is a plan view, (b) is a side view, and (C) is a plan view illustrating a substrate after coating. FIG. 9 is a schematic diagram of a coating process by a conventional coating apparatus. -22-This paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) 550118 A7 B7 V. Description of the invention (2G) Symbol No. Component Symbol Original Chinese W, S Substrate Substrate W1 Peripheral part W2 Coating range Coating range W3 Insufficient coating area Incomplete coating area W4 Peripheral portion W1 Area surrounding area W1 L Coating liquid coating liquid 1 Stage Platform 2 Stage moving mechanism portion Platform moving mechanism portion 4a, 4b, 4c, 100 Nozzle nozzle 8 Nozzle moving mechanism part Nozzle moving mechanism part 9 Control part control part 10a, 10b, 10c Organic EL material Organic EL material 50, 101 Peripheral part musk Peripheral part masking device 5 Bu 52 Musk board masking plate 53, 54 Driving means Drive device binding

-23-This paper size applies to China National Standard (CNS) A4 (210X 297mm)

Claims (1)

550118 AB c D VI. Patent Application Fanyuan1 · A coating device, which applies coating liquid on a substrate, is characterized by: 'Mouth and mouth means, in the transverse direction of the substrate in the stopped state, A discharge nozzle is moved while one side is on the substrate, and the coating liquid is discharged and coated by the discharge nozzle; a masking means is provided at a peripheral portion of the substrate, and masks a peripheral portion of the substrate with the coating liquid discharged by the nozzle means; and The movement control means moves the masking means in a direction opposite to a moving direction of the mouth-mouth means. 2. The coating device according to item 1 of the patent application range, wherein the moving range of the nozzle means is: from the upper surface of the masking means located on a peripheral portion of one side of the substrate, through the coating range on the substrate to Up to the above-mentioned masking means in a peripheral portion on the other side of the substrate. 3. The coating device according to item 2 of the scope of patent application, wherein the masking means is provided with a gap on the surrounding portion of the substrate; and the movement control means is to move the masking means on the upstream side of the nozzle means to the substrate. At the same time, the peripheral part is moved, and at the same time, the above-mentioned masking means on the downstream side in the moving direction is moved toward the coating range of the substrate. 4. If the coating device according to item 2 or 3 of the scope of patent application, it further includes: a driving control means that controls the nozzle means so as to reverse the moving direction at the end of the moving range of the nozzle hand, And No-24-This paper is suitable for standard paper ® National Transfer Standard (CNS) Α4 size (21G X 297 public love) " 一 '550118 Repeatedly apply different moving ranges; and in addition, the moving control means is adjusted in conjunction with the reversal of the nozzle means to adjust the moving direction. 5. A coating method, which applies a coating solution on a substrate; it is characterized by including the following steps: a selling nozzle moving step, which moves the ejection nozzle in the transverse direction of the substrate in a stopped state; a masking step A mask is provided on a peripheral portion of the substrate to mask the peripheral portion of the substrate from the coating liquid discharged by the discharge nozzle; a moving step moves the mask to a direction opposite to a moving direction of the discharge nozzle; And a discharge step, the coating liquid is discharged from the discharge nozzle on the upper surface of the substrate and applied. 6. The coating method according to item 5 of the scope of patent application, wherein the moving range of the above-mentioned ejection nozzle mask is: starting from the upper surface of the above-mentioned masking means located on a peripheral portion of one side of the substrate, and then coating by the upper surface of the substrate The range is up to the above-mentioned masking means located in the peripheral portion on the other side of the substrate. 7. According to the coating method in the sixth item of the patent application, the mask is provided on the peripheral portion of the substrate with a gap; and the moving step is to move the mask on the upstream side of the ejection nozzle to the moving direction. Move the peripheral part of the substrate, and apply the above mask on the downstream side of the ejection nozzle to the substrate. -25-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) Install iT ύ 550118 8 8 8 8 A BCD 々, move on patent application scope. 8. The coating method according to item 6 or 7 of the patent application scope, further comprising an iterative step, wherein the nozzle moving step is to reverse the moving direction at the end of the moving range of the discharge nozzle, and apply different moving ranges; In addition, the moving step and the reversal of the discharge nozzle are linked to adjust the moving direction. -26-This paper size applies to China National Standard (CNS) A4 (210X297 mm)