TW539817B - Sealing device, processing apparatus employing the sealing device, and low flow rate control device - Google Patents

Sealing device, processing apparatus employing the sealing device, and low flow rate control device Download PDF

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Publication number
TW539817B
TW539817B TW091121358A TW91121358A TW539817B TW 539817 B TW539817 B TW 539817B TW 091121358 A TW091121358 A TW 091121358A TW 91121358 A TW91121358 A TW 91121358A TW 539817 B TW539817 B TW 539817B
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Taiwan
Prior art keywords
liquid
aforementioned
peripheral surface
sealing
shaft body
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TW091121358A
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Chinese (zh)
Inventor
Tsutomu Doi
Hiromi Nagamatsu
Kenji Kazama
Mitsuhiro Ishihara
Naoki Wajima
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Shibaura Mechatronics Corp
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Publication of TW539817B publication Critical patent/TW539817B/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67126Apparatus for sealing, encapsulating, glassing, decapsulating or the like

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Sealing Using Fluids, Sealing Without Contact, And Removal Of Oil (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

This invention provides a sealing device that prevents liquid from leaking out of a wall side when the axle that is disposed to extend through the wall by the liquid. The sealing device comprises: a housing (29) having one end face connected in an air tight manner to the external face of the wall and formed with a through hole, the through hole extending through an end of a transfer roller (5) that is inserted through a through hole (8) formed in the wall of the housing; a gas supplying passage (42) for supplying gas to a first space (51) between the external surface of the axle at an end face side of the housing and the internal surface of the through hole; a liquid supply passage (43) for supplying liquid to the space between the external surface of the axle at the other end face side of the housing and the internal surface of the through hole; and first to third sealing members (38) to (40) arranged in the first and second spaces, and sealing a portion located inside the spaces of the axle, as well as enabling the gas supplied from the gas supply means flowing toward and out of an end face of the housing by virtue of the liquid supplied from the liquid supplying means.

Description

539817 A7 五、發明説明 [發明之詳細說明] [技術範圍] 本發明係有關於一種用以密封插通於壁體之貫通孔之 軸體之密封裝置,用以搬送基板並以處理液加以處理之前 述密封裝置所使用之處理裝置,及用以控制液體流量之微 小流量控制裝置。 [習知技術] 於諸如液晶表示裝置或半導體裝置之製造步驟中,有 將作為基板之液晶用玻璃基板或半導體晶片進行腐蝕處 理’與進行絕緣物層之剝離處理的步驟。此基板處理步驟 係採用將基板一張一張搬送並加以處理之單張方式者。 藉單張方式處理基板時,一面搬送基板一面於其上下 面或上面由淋浴喷嘴噴射處理液而加以處理之處理裝置是 4知的。該處理裝置係具有處理槽,於該處理槽内沿上述 基板之搬送方向以預定間隔設有自由旋轉且作為軸體的多 數搬送輥,且利用旋轉驅動該等搬送輥,以搬送上述基板。 上述搬送報之兩端部係由形成於上述處理槽之兩側壁 之貫通孔突出於外部,此突出部分各藉軸承體所支撐且可 旋轉。於搬送輥之一端部設有傳動齒輪,該傳動齒輪係與 文驅動源旋轉驅動之驅動齒輪相咬合。藉此,以前述搬送 親將供給至處理槽内之基板朝預定方向搬送。 於藉前述搬送輥所搬送之基板上噴射處理液後,該處 理液便王務狀而充滿於處理槽内,而作為處理液使用的是 腐蝕液或剝離液等藥水。因此,例如,使用腐蝕液時,會 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公爱) 4 (請先閲讀背面之注意事項再填寫本頁) 1裝| •、\t^—539817 A7 V. Description of the invention [Detailed description of the invention] [Technical scope] The present invention relates to a sealing device for sealing a shaft body inserted in a through hole of a wall body, for conveying a substrate and processing it with a processing liquid. The processing device used for the aforementioned sealing device, and the micro flow control device for controlling the liquid flow. [Conventional Technology] In manufacturing steps such as a liquid crystal display device or a semiconductor device, there are a step of subjecting a glass substrate or a semiconductor wafer for liquid crystal as a substrate to an etching treatment 'and a peeling treatment of an insulator layer. This substrate processing step is a single sheet method in which substrates are transported and processed one by one. When a substrate is processed by a single sheet, a processing apparatus that sprays a processing liquid from a shower nozzle while processing the substrate while conveying the substrate is known. The processing apparatus has a processing tank in which a plurality of transfer rollers that are freely rotating and serving as a shaft are provided at predetermined intervals along the transport direction of the substrate, and the transfer rollers are driven to rotate to transport the substrate. Both ends of the delivery report are protruded to the outside by through-holes formed on both side walls of the processing tank, and each of the protrusions is supported by a bearing body and is rotatable. A transmission gear is provided at one end of the conveying roller, and the transmission gear is meshed with a driving gear which is driven by the driving source for rotation. Thereby, the substrate supplied into the processing tank is conveyed in a predetermined direction by the aforementioned conveyance. After the processing liquid is sprayed on the substrate transferred by the aforementioned transfer roller, the processing liquid is filled in a processing tank like a king, and a chemical solution such as an etching liquid or a peeling liquid is used as the processing liquid. Therefore, for example, when using corrosive liquid, the paper size will be in accordance with Chinese National Standard (CNS) A4 specification (210X297 public love) 4 (Please read the precautions on the back before filling this page) 1 Pack | •, \ t ^ —

腐餘金屬且使作業環境惡化,所以必須防止其由處理槽流 出外部。 有處理液由處理槽流出之虞的地方,係用以搬入與搬 、土板之搬人口、搬出口’及貫通前述搬送輥兩端部之貫 =孔。前述搬入口與搬出口係藉閘板開關,以防止處理液 机出且刚述貫通孔於前述搬送輥設有密封裝置加以密 封’可防i處理液流出。 作為用以搶封方疋轉驅動之軸體的密封裝置,已知的有 機械密封。然而,機械密封因構造複雜、且價格高,所以 在女同處理衣置之處理槽設有多數搬送幸昆時,裝置全體之 成本便會大幅度上升。 因此,以往採用了液體式密封裝置,即於前述轴體之 端部設有形錢通孔之外殼’利詩諭通狀内周面與 軸體之外周©間的空間部供給液體,密封前述軸體之旋轉 部分者。 [發明解決之課題] 依用以藉液體密封軸體之密封裝置,以較簡單且低廉 之構造,便可確實進行前述軸體之密封。然而,供給至外 殼之插通孔的内周面與軸體之外周面間的空間部之液體, 係由外殼流出,並沿軸體之轴向流動,而流入處理槽内。 於處理槽内使用之處理液為腐蝕液或剝離液等高價商 品時,便進行將此處理液回收再使用。此時,由處理槽回 收之處理液中,因混合有由密封裝置流入處理槽内之液 體,而使處理液再使用之情形受到限制。 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁)Corrosion of metals and deterioration of the working environment must be prevented from flowing out of the treatment tank. The place where the treatment liquid may flow out of the treatment tank is used for carrying in and carrying out, the moving of the soil plate, the carrying out 'and the holes that pass through the two ends of the carrying roller. The aforementioned loading and unloading openings are controlled by a shutter switch to prevent the processing fluid from coming out and the through-hole just mentioned is provided with a sealing device for sealing at the aforementioned transporting roller 'to prevent the processing fluid from flowing out. As a sealing device for sealing a shaft body driven by a square rotary drive, a mechanical seal is known. However, mechanical seals are complicated in construction and expensive, so when most of the handling tanks for lesbian handling clothes are transported to Xingkun, the cost of the entire equipment will increase significantly. Therefore, a liquid-type sealing device has been conventionally used, that is, a liquid portion is provided between the inner surface of the 'Lish 谕 through-shaped inner peripheral surface and the outer peripheral shaft of the shaft body to provide liquid to seal the shaft. The rotating part of the body. [Problems to be Solved by the Invention] According to the sealing device used to seal the shaft body with a liquid, the aforementioned shaft body can be surely sealed with a relatively simple and inexpensive structure. However, the liquid supplied to the space between the inner peripheral surface of the insertion hole of the outer casing and the outer peripheral surface of the shaft body flows out of the outer casing, flows along the axial direction of the shaft body, and flows into the processing tank. When the processing liquid used in the processing tank is an expensive product such as a corrosive liquid or a stripping liquid, the processing liquid is recovered and reused. At this time, the processing liquid recovered from the processing tank is mixed with the liquid that has flowed into the processing tank from the sealing device, and the use of the processing liquid is limited. This paper size applies Chinese National Standard (CNS) Α4 specification (210X297 mm) (Please read the precautions on the back before filling this page)

五、發明説明' ^ 本毛明係提供一種微小流量控 ^ 封軸體時,可ri你產 裝置,稭液體加以密 .....「-----:-------_裝—— (請先閱讀背面之注意事項再填寫本頁) 於不使愈封^廉之構造而確實進行其密封,且係使用 密封裂;之:之液體漏出軸體之軸向的密封裝置與使用該 置之處理裝置,及密封裝置中,並且可提升密封裝 [解決課題之方法] 壁體=貫^封裝置’係_密封由形成於 有·、大出之軸體者,其特徵在於該㈣裝置包含 外殼,係-端面與前述壁體之外面密封接合,並形成 有插通孔者’即用以將貫通前述貫通孔之前述轴體插通者; 、可丨 &氣體供給機構m供給氣體至該外殼之-端面側 月j述軸體的外周面與前述插通孔之内周面間的空間 者; 液體供給機構,係用以供給液體至前述外殼之另一端 面側之則述軸體的外周面與前述插通孔之内周面間的空間 部者; 密封機構,係設於前述插通孔之内周面與前述軸體之 外周面間的空間部内,並藉由前述液體供給機構所供給之 液體,加以密封位於前述軸體之前述空間部内的部分,且 使由前述氣體供給機構所供給之氣體朝前述外殼之一端面 側流出者。 請求項2之發明係如申請專利範圍第1項之密封裝置, 其中相對於前述外殼之前述氣體供給機構設置之處,形成 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 539817 A7 "' -------- B7__ 五、發明説明(‘ 4 一 ~ ~ 有用則非出由前述液體供給機構所供給之液體的排液流 2 ’該排液流路設置有藉前述液體之黏性將其滯留於排液 μ路内,且具有藉毛細管現象排出前述液體之細孔的喷嘴 構件。 凊求項3之發明係如申請專利範圍第丨項之密封裝置, 其中前述密封機構係由環狀之第1至第3之密封構件所形 成二而前蜂第1至第3之密封構件可將前述插通孔之内周面 與則述乳體之外周面間的空間部分隔成由前述氣體供給機 構供給氣體之第1空間部,及由前述液體供給機構供給液體 之第2空間部者。 明求項4之發明如申請專利範圍第3項之密封裝置,其 中刖述第1密封構件係位於前述外殼之—端面侧,而前述第 3密封構件係位於前述外殼之另一端面側,且前述第2密封 構件係位於第1密封構件與第3密封構件之間, 又’前·述第2密封構件與前述軸體之外周面間具有使供 給至前述第2空間部之液體流入前述第丨空間部的狹小間隙 者。 ’ 請求項5之發明如申請專利範圍第4項之密封裝置,其 中對應前述外殼之前述第1空間部的部分形成有用以排出 由前述第2空間部流人前述第i空間部之液體的排液流路, 並於该排液流路設有形成有用以限制液體排出之細孔之噴 嘴構件。 凊求孕6之發明係一種處理裝置,即將基板搬送至預定 方向亚加以處理者,其特徵在於該處理裝置包含 本紙張尺度適用中國國家標準(CNS) A4規格(2〗〇χ297公釐) (請先閲讀背面之注意事項再填寫本頁)V. Description of the invention '^ This Maoming system provides a tiny flow control ^ When sealing the shaft, you can produce the device, and the straw liquid is dense .... "-----: ------- _Equipment-(Please read the precautions on the back before filling this page) In order to make sure the seal is not sealed, the seal must be used, and the seal is used; Device and the processing device using the device, and the sealing device, and the sealing device can be improved [method for solving the problem] wall body = continuous sealing device 'system_ seal is formed by the shaft body with a large, large, It is characterized in that the cymbal device includes a housing, the end surface of which is in sealing engagement with the outer surface of the wall body, and has a through hole formed thereon, that is, a person who inserts the shaft body penetrating through the through hole; The supply mechanism m supplies gas to the space between the outer peripheral surface of the shaft body on the end surface side of the casing and the inner peripheral surface of the insertion hole; the liquid supply mechanism is used to supply liquid to the other end surface of the casing. The side describes the space between the outer peripheral surface of the shaft body and the inner peripheral surface of the aforementioned insertion hole; The mechanism is provided in a space portion between the inner peripheral surface of the insertion hole and the outer peripheral surface of the shaft body, and a portion located in the space portion of the shaft body is sealed by the liquid supplied by the liquid supply mechanism, And the gas supplied by the gas supply mechanism is caused to flow out toward one of the end faces of the casing. The invention of claim 2 is a sealing device such as the item 1 of the scope of patent application, wherein the gas supply mechanism is provided relative to the gas supply mechanism of the casing. The paper size of this paper applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 539817 A7 " '-------- B7__ V. Description of the invention (' 4 1 ~ ~ If it is useful, it is not due to the foregoing The liquid discharge flow 2 of the liquid supplied by the liquid supply mechanism. The liquid discharge path is provided with a nozzle member that retains the liquid in the discharge μ path by the viscosity of the liquid, and has a pore that discharges the liquid by a capillary phenomenon. The invention of claim 3 is the sealing device according to item 丨 of the scope of patent application, wherein the aforementioned sealing mechanism is formed by the ring-shaped first to third sealing members and the first to third bees are first to third. The sealing member may partition a space portion between the inner peripheral surface of the insertion hole and the outer peripheral surface of the milk body into a first space portion supplied with gas by the gas supply mechanism, and a second space portion supplied with liquid by the liquid supply mechanism. The space device. The invention of claim 4 is the sealing device of claim 3, wherein the first sealing member is located on the end face side of the casing, and the third sealing member is located on the other side of the casing. The second sealing member is located between the first sealing member and the third sealing member on the end surface side, and the second sealing member and the outer peripheral surface of the shaft body are provided between the second sealing member and the outer peripheral surface of the shaft body. The liquid flows into the narrow space of the aforementioned first space portion. The invention of claim 5 is the sealing device of the scope of patent application, wherein the portion corresponding to the aforementioned first space portion of the housing is formed to discharge the second space. A liquid discharge flow path for the liquid in the i-th space part is flowed in, and a nozzle member is formed in the liquid discharge flow path to form a fine hole for restricting liquid discharge. The invention of 凊 Pregnancy 6 is a processing device that transports substrates to a predetermined direction for processing, and is characterized in that the processing device includes the paper size applicable to the Chinese National Standard (CNS) A4 specification (2) 0 × 297 mm) ( (Please read the notes on the back before filling out this page)

、;則述基板之搬送方向一端具有搬入口, 二 則具有搬出口,且在位於與前述搬送方向交叉方 向的-對壁體上以預定間隔形成相對應之貫通孔者; 2體’係沿前述基板之搬送方向以預定間隔配設於該 々θ内’且其兩端部分別由形成於前述-s壁體之貫通 孔朝外部突出者; 、 轴承體,係支撐由前述處理槽之貫通孔所突出之前述 軸體的兩端部而可分別旋轉者; 、裝置係"又於則述壁體之外面,且用以密封前述 軸體由前述貫通孔突出之端部者, 1前述密封裝置係如申請專利範圍第i項所構成者。 」月求項7之發明如申請專利範圍第6項之處理裝置,其 中刖述軸體之端部設有傳動齒輪,該傳動齒輪係與藉驅 動源而旋轉驅動之驅動齒輪相咬合…前述液體供給機 構係設有···液體供給槽;液體供給管,係用以將該液體供 給槽之液體供給至前述外殼之插通孔與前述軸體之外周面 間的”部者;溢流管’係用以使前述液體供給槽之液面 保持疋者’及財槽,係對向前述傳動齒輪與驅動齒輪 之叹合部分而設置,並儲藏由前述溢流管所排出之液體以 >閏滑則述各齒輪之咬合部分者。 〇月求項8之發明如申請專利範圍第7項之處理裝置,盆 中前述液體供給管係設有於外周面形««,且可降; 前述液體供給槽之液體遷力以使液體往前述空間部流動之 流量調整構件者。 五、發明説明 法動二、之t月係一種微小流量控制襞置,係設於液體 i件於I體,且由流量調整構件所構成者,而該流量調整 述其辦肖面形成有螺旋溝’且其外周面接觸且被壓入前 a &體之内周面,並且使衣兑 ^ ^ 使/;,L動於刚述管體之液體沿前述螺 旋溝流動者。 依據本發明,於外殼之插通孔的内周面與軸體之外周 面間的空間部供給液體,且比前述空間部之前述液體更靠 近於壁體側之空間部地供給氣體,因此可藉此氣體來限制 液體之流動。 [發明之實施型態] 以下,參照圖面加以說明本發明之一實施型態。 第1圖係顯示此發明之處理裝置的概略性構造之平面 圖,第2圖係縱向截面圖。前述處理裝置係具有處理槽工。 忒處理槽1係呈箱型狀,且於一端面形成有搬入口2,於另 一端面則形成有搬出口3。由前述搬入口 2送入之基板冒係 藉後述之搬送裝置被搬送至前述搬出口 3,其間於前述基板 W之上下面或上面由未圖示之淋浴喷嘴喷射腐蝕液或剝離 液等之處理液。 又,前述搬入口 2與搬出口 3藉無圖示之淋浴喷嘴而開 關,除搬入及搬出基板W以外皆為關閉狀態。藉此,可防 止處理槽1内之空氣由前述搬入口 2或搬出口 3流漏至外部。 前述搬送裝置係具有沿前述基板W之搬送方向以預定 間隔平行配設之多數作為軸體之搬送輥5。搬送輥5之兩端 部係貫通形成於前述處理槽1之一對側壁7的貫通孔8而突 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公爱),; The substrate has a carrying inlet at one end in the carrying direction, and a carrying outlet, and the corresponding through-holes are formed at predetermined intervals on the opposite wall body in the direction intersecting the carrying direction; The conveying direction of the substrate is arranged in the 々θ at predetermined intervals, and both ends of the substrate protrude outward from the through-holes formed in the -s wall body; and the bearing body is supported by the through of the processing tank. The two ends of the shaft body protruding from the hole can be rotated separately; and the device system is also the outer surface of the wall body and is used to seal the end portion of the shaft body protruding from the through hole, 1 The sealing device is constituted as item i in the scope of patent application. The invention of item 7 of the month is the processing device of item 6 in the scope of patent application, wherein the end of the shaft is provided with a transmission gear, and the transmission gear is engaged with the driving gear that is driven by the driving source to rotate ... the aforementioned liquid The supply mechanism is provided with a liquid supply tank; the liquid supply pipe is used to supply the liquid in the liquid supply tank to the "portion" between the insertion hole of the housing and the outer peripheral surface of the shaft body; an overflow pipe 'It is used to maintain the liquid level of the aforementioned liquid supply tank' and the tank, which is provided to the sloping part of the transmission gear and the drive gear, and stores the liquid discharged from the overflow pipe to > The slippery part refers to the engaging part of each gear. For the invention of item 8 of the month, such as the processing device of the scope of patent application item 7, the aforementioned liquid supply pipe in the basin is provided on the outer peripheral surface ««, and can be lowered; Those who adjust the flow of liquid in the liquid supply tank to adjust the flow rate of the liquid to the space. V. Description of the Invention The second method is a small flow control device, which is set on the liquid body and the body. Flow adjustment construct The flow adjustment states that the spiral surface is formed on the surface of the handle, and that the outer peripheral surface contacts and is pressed into the inner peripheral surface of the front a & body, and the clothes are moved ^ ^ 使 / ;, L According to the present invention, the liquid in the pipe body flows along the aforementioned spiral groove. According to the present invention, the liquid is supplied to the space portion between the inner peripheral surface of the insertion hole of the housing and the outer peripheral surface of the shaft body, and is more than the liquid in the space portion. The gas is supplied to the space near the wall, so the gas can be used to restrict the flow of the liquid. [Embodiments of the invention] Hereinafter, an embodiment of the present invention will be described with reference to the drawings. The plan view of the schematic structure of the processing device of the present invention, FIG. 2 is a longitudinal sectional view. The aforementioned processing device has a processing tanker. 工 The processing tank 1 is box-shaped, and a port 2 is formed on one end surface. The other end surface is formed with a carrying-out port 3. The substrate taken in from the carrying-in port 2 is transferred to the carrying-out port 3 by a carrying device described later, with a shower not shown in the figure above or below the substrate W. Nozzle sprays corrosive or stripping fluid In addition, the carrying inlet 2 and carrying outlet 3 are opened and closed by shower nozzles (not shown), and are closed except for carrying in and carrying out the substrate W. This prevents the air in the processing tank 1 from being carried in by the foregoing. The port 2 or the conveying port 3 leaks to the outside. The conveying device includes a plurality of conveying rollers 5 arranged in parallel at predetermined intervals along the conveying direction of the substrate W as a shaft body. Both ends of the conveying roller 5 are formed in a penetrating manner. One of the aforementioned treatment tanks 1 is opposite to the through hole 8 of the side wall 7 and the paper size applies the Chinese National Standard (CNS) A4 specification (210X297 public love)

539817 A7 ------—__^________ 五、發明說明(7 ) 出於外部。於侧壁7之外側分隔形成各機械室9,於該機械 室9中前述搬送輥5之兩端部藉軸承體丨丨所支撐且可旋轉。 貫通前述搬送輥5之側壁7之貫通孔8的部分,係藉密封 裝置13如同後述被加以密封。於前述搬送輥5藉鹽化乙烯所 形成之支持環14朝軸向以預定間隔而配設。於該支持環14 如苐11A圖至11C圖所示,切斷部15於周方向之一部份以角 度Θ ’此實施型態約45度而形成。因此,即使支持環丨斗為 鹽化乙烯製,擴徑後亦可容易附著於前述搬送輥5之外周 面。 於各搬送輥5之一端部各嵌著樹脂製之傳動齒輪17。各 傳動齒輪17與同為樹脂製之驅動齒輪18相咬合。驅動齒輪 18係位於傳動齒輪17之徑向下方,多數之驅動齒輪18使前 述搬送輥5與軸線垂直,且與可旋轉而配設之驅動軸19相嵌 合。 前述驅動軸19係設有傳動滑輪21,於前述機械室9設有 作為驅動源之驅動馬達22。該驅動馬達22之旋轉軸與驅動 /月輪23相肷合。該驅動滑輪23與前述傳動滑輪21繞設有帶 子24。因此,運作驅動馬達22,經由前述驅動齒輪18使傳 動齒輪17旋轉,所以設有該傳動齒輪17之搬送輥5亦隨之旋 轉。藉此,由處理槽丨之搬入口2所搬入之基板w便被往搬 出口 3搬送。 又,前述驅動齒輪18之下方設有潤滑槽25,該驅動齒 輪18之一部份浸澤於如後述潤滑槽所供給之純水中。因 此,驅動齒輪18與傳動齒輪17之咬合部分藉純水加以潤 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公着) 10 (請先閱讀背面之注意事^再填寫本頁) _、^τ— €丨 539817539817 A7 ------—__ ^ ________ V. Description of Invention (7) Out of the outside world. Each of the machine rooms 9 is partitioned on the outer side of the side wall 7, and both ends of the conveying roller 5 in the machine room 9 are supported and rotatable by a bearing body. The portion penetrating the through hole 8 of the side wall 7 of the transfer roller 5 is sealed by a sealing device 13 as described later. The support rings 14 formed by the above-mentioned conveying roller 5 by salting ethylene are arranged at predetermined intervals in the axial direction. As shown in Figs. 11A to 11C on the support ring 14, a part of the cutting portion 15 in the circumferential direction is formed at an angle θ 'of about 45 degrees in this embodiment. Therefore, even if the support ring hopper is made of salted ethylene, it can easily adhere to the outer peripheral surface of the conveying roller 5 after the diameter expansion. A resin-made transmission gear 17 is embedded in one end portion of each of the transfer rollers 5. Each transmission gear 17 meshes with a driving gear 18 also made of resin. The driving gear 18 is located below the transmission gear 17 in the radial direction. Most of the driving gears 18 make the aforementioned transport roller 5 perpendicular to the axis, and are fitted with a driving shaft 19 which is rotatably provided. The drive shaft 19 is provided with a transmission pulley 21, and the machine room 9 is provided with a drive motor 22 as a drive source. The rotation axis of the driving motor 22 is coupled to the driving / moon wheel 23. A belt 24 is wound around the driving pulley 23 and the driving pulley 21 described above. Therefore, the drive motor 22 is operated and the transmission gear 17 is rotated via the drive gear 18, so that the transfer roller 5 provided with the transmission gear 17 is also rotated accordingly. Thereby, the substrate w carried in from the carrying inlet 2 of the processing tank 丨 is carried to the carrying outlet 3. A lubricating groove 25 is provided below the driving gear 18, and a part of the driving gear 18 is immersed in pure water supplied from a lubricating groove described later. Therefore, the engaging part of the driving gear 18 and the transmission gear 17 is moistened with pure water. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297). 10 (Please read the notes on the back ^ before filling this page) _ , ^ Τ— € 丨 539817

前述密封裝置13係如第3圖所示具有外殼29,即 用以嵌合插通前述搬送輥5之端部的插通孔辦。該外% 係使插通孔28與側壁7所穿設之貫通孔8相面對,且瘦^ 狀之密封圈31使其一端面與前述侧壁7之外面被 ^ 合固定。 伐 由前述貫通孔8突出之搬送報5的端部被插入較該搬送 ^有更大直徑之前述插軌28。前料殼29之—端越過全 部周長而設有内徑小於插通孔28,大於搬缝5外形之突條 32’另-端面則安裝固^有内徑尺寸大於前述搬送親5之外 形尺寸的環狀鍔構件33。於該鍔構件33之内側面的内周部 形成有段部34。 於前述插通孔28之前述突條32與前述鍔構件%間的部 分,設有第1凸緣36與第2凸緣37。於各凸緣36、37之外周 面形成有外周溝36a、37a,且第1凸緣36如第4圖所示,於 周向以等間隔形成有4個通孔36b,而第2凸緣P如第5圖所 不’有8個通孔37b於周向以等間隔形成。 於則述突條32與第1凸緣36之一端面間設有環狀的第j 始、封構件38,而於第1凸緣36之另一端面與第2凸緣37之一 端面間則設有環狀的第2密封構件39。進而,於前述第2凸 緣37之另一端面設有位於前述鍔構件%之段部34的環狀第 3密封構件40。 第1密封構件38之内周面與搬送輥5之外周面相密接, 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 11 -------•裝............... (請先閲讀背面之注意事項再填寫本頁) 訂— 539817 五、發明説明(9 2外周面形成小徑小於外殼29之插通孔28,易朝擴捏方向 灸开第、封構件39係設定成於其内周面與搬送親5之外 周面間具有狹小間隙之内徑尺寸者。 於前述外殼29,與前述p凸緣36之外周溝36a相對應 之部位形成有氣體供給流路42,與第2凸緣37之外周溝37a 相對應之部位則形成有液體供給流路43。 如第6圖所示,前述氣體供給流路42與氣體供給管44 之-端相接續。該氣體供給管44之另一端係與形成於集流 腔45之多數供給孔46的其中之一者相接續。其他供給孔仏 與其他密封裝置13之氣體供給管44相接續。 於前述集流腔45中來自氣體供給源(未圖示)之空氣 氣體,經由發電機調整器47以預定壓力,諸如地心而被 供給。因此,空氣係由集流腔45之各供給孔牝供給至密封 裝置13之氣體供給流路42,由該氣體供給流路42通過第^ 凸緣36之通孔36b,且流入藉搬送輥5之外周面與插通孔28 間的第1、第2密封構件38、39所分隔之空間部中。將該空 間部作為第1空間部51。 如述液體供給流路43與液體供給管52之一端相接續。 該液體供給管52之另一端係與設於液體供給槽53之多數供 給孔54的其中之一者相接續。其他供給孔54與其他密封裝 置13之液體供給管52相接續。 前述液體供給槽53與用以連通純水水源(未圖示)之 主給水管55經由閥55a而相接續。於前述液體供給槽53内如 第8圖與第9圖所示,將溢流管56使其一端面位於預定高度 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公爱) (請先閲讀背面之注意事項再填寫本頁) -·裝- C------- 539817 A7 ________ B7 五、發明説明(l〇 ) 而配設。該溢流管56之另一端面與第i導水管71之一端相接 續。 由前述主給水管55供給至前述液體供給槽53之純水係 通過前述液體供給管52,供給至密封裝置13之液體供給流 路43。供給至液體供給流路43之純水係由第2凸緣37之通孔 37b流入藉搬送輥5之外周面與插通孔28間的第2、第3密封 構件39、40所分隔之空間部中。將該空間部作為第2空間部 61° 如第7圖所示,前述液體供給槽53之液面係藉溢流管56 維持在預定高度。因此,使由液面供給槽53通過液體供給 管5 2供給至第2空間部61之純水的壓力不超過於同一圖中 Η所示之水頭以上。 進而,於前述液體供給管52設有流量調整構件62,即 用以調節以水頭Η之壓力流動於該液體供給管52的純水流 量者。該流量調整構件62係如第10圖所示,於外周面形成 有螺旋溝63,且由被前述液體供給管52之中途部壓入之圓 柱狀構件所構成者。 因此,由前述液體供給槽53流動至前述液體供給管52 之液體,便流動於與供給管52相比其截面面積十分狹小, 且流路長度相當長的前述流量調整構件62之外周面的螺旋 溝63内,所以少量純水以定量通過前述密封裝置13之液體 供給流路43而滴下於第2空間部61中。 又,流量調整構件62係由具有液體供給管52之柔軟性 的合成樹脂所構成,因此可易於壓入該液體供給管52之中 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐) 13 (請先閲讀背面之注意事項再填寫本頁)The sealing device 13 is provided with a housing 29 as shown in FIG. 3, that is, an insertion hole for inserting an end portion of the conveying roller 5. The outer portion is such that the insertion hole 28 faces the through hole 8 penetrated by the side wall 7, and the thin sealing ring 31 has one end surface fixed to the outer surface of the side wall 7. The end of the conveyance report 5 protruding from the aforementioned through hole 8 is inserted into the aforementioned insertion rail 28 having a larger diameter than the conveyance. The front end of the front shell 29 is provided with an inner diameter smaller than the insertion hole 28 across the entire perimeter and a protrusion 32 'larger than the shape of the moving seam 5. The other end face is installed and fixed. Dimensional ring-shaped cymbal member 33. A step portion 34 is formed on the inner peripheral portion of the inner surface of the cymbal member 33. A first flange 36 and a second flange 37 are provided in a portion between the protrusion 32 and the cymbal member% of the insertion hole 28. Peripheral grooves 36a, 37a are formed on the outer peripheral surface of each flange 36, 37. As shown in FIG. 4, the first flange 36 is formed with four through holes 36b at equal intervals in the circumferential direction, and the second flange 36 As shown in Fig. 5, there are eight through holes 37b formed at equal intervals in the circumferential direction. An annular j-th seal member 38 is provided between the protruding end 32 and one end face of the first flange 36, and between the other end face of the first flange 36 and one end face of the second flange 37 An annular second sealing member 39 is provided. Further, an annular third sealing member 40 is provided on the other end surface of the second flange 37 at the section portion 34 located in the cymbal member%. The inner peripheral surface of the first sealing member 38 is in close contact with the outer peripheral surface of the conveying roller 5. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 11 ------- • installation ... .......... (Please read the precautions on the back before filling this page) Order — 539817 V. Description of the invention (9 2 The outer peripheral surface forms a small diameter smaller than the insertion hole 28 of the housing 29, which is easy to expand toward The pinching direction moxibustion opening and sealing member 39 is set to have an inner diameter dimension with a small gap between the inner peripheral surface and the outer peripheral surface of the transporting parent 5. The outer casing 29 is in the same manner as the outer groove 36a of the p flange 36. A gas supply flow path 42 is formed at a corresponding position, and a liquid supply flow path 43 is formed at a position corresponding to the peripheral groove 37a of the second flange 37. As shown in FIG. 6, the gas supply flow path 42 and the gas supply The other end of the tube 44 is connected. The other end of the gas supply tube 44 is connected to one of the plurality of supply holes 46 formed in the manifold 45. The other supply holes 仏 are connected to the gas supply tubes of the other sealing devices 13. Continuation of phase 44. The air gas from the gas supply source (not shown) in the current collecting cavity 45 passes power generation. The regulator 47 is supplied at a predetermined pressure, such as the center of the earth. Therefore, air is supplied to the gas supply flow path 42 of the sealing device 13 from each supply hole 牝 of the manifold 45, and the gas supply flow path 42 passes through the first ^ The through hole 36b of the flange 36 flows into the space portion partitioned by the first and second seal members 38 and 39 between the outer peripheral surface of the borrow roller 5 and the insertion hole 28. This space portion is used as the first space Section 51. As described above, the liquid supply flow path 43 is connected to one end of the liquid supply pipe 52. The other end of the liquid supply pipe 52 is connected to one of the plurality of supply holes 54 provided in the liquid supply tank 53. Others The supply hole 54 is connected to the liquid supply pipe 52 of the other sealing device 13. The liquid supply tank 53 is connected to a main water supply pipe 55 for communicating with a pure water source (not shown) via a valve 55a. In the liquid supply tank As shown in Figures 8 and 9 within 53, place the overflow pipe 56 with its one end face at a predetermined height. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 public love) (Please read the precautions on the back first) (Fill in this page again.)-· 装-C ------- 539817 A7 _____ ___ B7 5. It is provided according to the description of the invention (10). The other end surface of the overflow pipe 56 is connected to one end of the i-th water guide pipe 71. Pure water supplied from the main water supply pipe 55 to the liquid supply tank 53 The liquid is supplied to the liquid supply flow path 43 of the sealing device 13 through the liquid supply pipe 52. The pure water supplied to the liquid supply flow path 43 flows into the outer peripheral surface of the borrow roller 5 through the through hole 37b of the second flange 37 and In the space portion partitioned by the second and third sealing members 39 and 40 between the insertion holes 28. This space portion is referred to as the second space portion 61 ° As shown in FIG. 7, the liquid level of the liquid supply tank 53 is maintained at a predetermined height by the overflow pipe 56. Therefore, the pressure of the pure water supplied from the liquid level supply tank 53 to the second space portion 61 through the liquid supply pipe 52 does not exceed the water head shown by Η in the same figure. Further, the liquid supply pipe 52 is provided with a flow rate adjusting member 62, that is, a device for adjusting the flow of pure water flowing through the liquid supply pipe 52 under the pressure of a water head. This flow rate adjusting member 62 is a cylindrical member having a spiral groove 63 formed on the outer peripheral surface thereof as shown in Fig. 10 and pressed into the middle portion of the liquid supply pipe 52 described above. Therefore, the liquid flowing from the liquid supply tank 53 to the liquid supply pipe 52 flows in the spiral of the outer peripheral surface of the flow rate adjusting member 62 whose cross-sectional area is very narrow compared with the supply pipe 52 and the flow path length is relatively long. In the groove 63, a small amount of pure water is dropped into the second space portion 61 at a fixed amount through the liquid supply flow path 43 of the sealing device 13. In addition, the flow rate adjusting member 62 is made of a flexible synthetic resin having a liquid supply pipe 52, so that it can be easily pressed into the liquid supply pipe 52. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm). ) 13 (Please read the notes on the back before filling this page)

539817 A7 s----:-—_B7 _ 五、發明説明(U ) '" -- =卜液體供給管52非合成樹脂製,而是諸如㈣銅等金 屬W品,所以亦可壓入前述流量調整構件⑽。 於弟2空間部61滴下之純水,係滞留於該第】空間部 6卜且通過第2密封構件39之内周面與外周面而流入第β 間部5卜進而,第2密封構件39之兩侧面與第!、第2凸緣%、 37之端面的接觸部分亦浸於水中。 則述密封裝置13之外殼29,於與前述第i空間部51相對 應之部分’形成有其-端與前述插通孔28相通,而另一端 於外成29之下面開啟的排液流路65。該排液流路&與穿設 細孔66之噴嘴構件67相螺合。 流入第1空間部51之純水係由該空間部51滴下排液流 路65。設於該排液流路65之噴嘴構件67的細孔⑼係形成藉 純水之黏性而使純水不會立即流出之窄小内徑尺寸者。曰 因此,純水滯留在前述細孔66内及噴嘴構件67之上端 面,且藉毛細管現象如同滲出般由前述細孔66流出。即, 喷嘴構件67之細孔66係藉純水而關閉,所以供給至第i空間 部51之氣體並不會由前述細孔66流出外部。 藉此純水之流動使第丨空間部51與第2空間部61被密封 分隔。因此,由氣體供給管44通過氣體供給流路42而供給 至第1空間部51之氣體,幾乎未流到第2空間部61,而通過 第1密封構件38之内周面與搬送輥5之外周面間的間隙,而 由形成於處理槽丨之侧壁7的貫通孔8流入前述處理槽丨内。 因此,藉此氣體之流動,防止前述處理槽丨内之空氣由貫通 孔8漏出外部。 本紙張尺度適用中國國家標準(CNS) A4規格(2Κ)Χ297公釐)539817 A7 s ----: ---_ B7 _ V. Description of the invention (U) '"-= Bu Liquid supply pipe 52 is not made of synthetic resin, but is a metal W product such as sintered copper, so it can also be pressed in The aforementioned flow adjustment member ⑽. The pure water dripped from Yudi 2 space portion 61 is retained in the first space portion 6b and flows into the β interval portion 5b through the inner peripheral surface and the outer peripheral surface of the second sealing member 39. Further, the second sealing member 39 The two sides and the first! The contact portions of the end faces of the second flange% and 37 are also immersed in water. Then, the casing 29 of the sealing device 13 is formed at a portion 'corresponding to the i-th space portion 51' with its-end communicating with the aforementioned insertion hole 28, and the other end being opened below the outer member 29 to drain the liquid flow path. 65. This liquid discharge flow path is screwed with the nozzle member 67 through which the fine hole 66 is passed. The pure water that has flowed into the first space portion 51 drips the drain flow path 65 from the space portion 51. The pores of the nozzle member 67 provided in the liquid discharge flow path 65 are those having a small inner diameter size that prevents pure water from flowing out immediately due to the viscosity of the pure water. Therefore, pure water stays in the aforementioned fine holes 66 and the upper surface of the nozzle member 67, and flows out of the aforementioned fine holes 66 as if they are oozing out by the capillary phenomenon. That is, the pores 66 of the nozzle member 67 are closed by pure water, so that the gas supplied to the i-th space portion 51 does not flow out through the pores 66 described above. Thereby, the first space portion 51 and the second space portion 61 are hermetically separated from each other by the flow of pure water. Therefore, the gas supplied from the gas supply pipe 44 to the first space portion 51 through the gas supply flow path 42 hardly flows to the second space portion 61 and passes through the inner peripheral surface of the first sealing member 38 and the conveyance roller 5. The gap between the outer peripheral surfaces flows into the processing tank from the through hole 8 formed in the side wall 7 of the processing tank. Therefore, by the flow of the gas, the air in the processing tank 丨 is prevented from leaking out of the outside through the through hole 8. This paper size applies to China National Standard (CNS) A4 (2K) × 297 mm

^^裝----- (請先閲讀背面之注意事項再填寫本頁)^^ 装 ----- (Please read the precautions on the back before filling this page)

•、可I 539817 A7 B7 五、發明説明(_ 12 ) — ^ 且,因為氣體流動於第丨空間部51,以致該空間部51 内之壓力上升至與氣體之供給壓同一程度。一方面,供給 至第2空間部61之純水為少量。因此,即使純水由第2空間 部61滲入第1空間部51,該純水藉供給至第丨空間部51之氣 體的壓力,便不會通過第丨密封構件38與搬送輥5間之間 隙,而漏出至處理槽1外側。 另一芕面,於設置在前述液體供給槽53之溢流管56中 流動之純水,如第6圖所示通過第丨導水管71,流入使前述 搬送輥5旋轉驅動之驅動齒輪18之下方所設置的前述潤滑 槽25内。又,於該潤滑槽25亦透過與前述液體供給槽兄之 供給孔54其中之一相接續的第2導水管72來供給純水。於該 第2導水管72之中途部與前述液體供給管%同樣設有使液 體流量降低之流量調整構件62。 依如此構成之處理裝置,使由搬送輥5之處理槽丨之側 壁7所形成的貫通孔8突出之兩端部分藉密封裝置13加以密 封。於該密封裝置13之外殼29内部,藉第丨至第3密封構件 38至40,分隔形成第i空間部51與第2空間部61。於第工空間 口 P 5 1供給氣體,而於第2空間部6丨供給純水。第1空間部$ 1 係位於較第2空間部61更靠近處理槽丨之側壁7者。 純水係藉設於液體供給管52之流量調整構件62使其流 量為少量,减體壓力比純水壓力高出許多,力此實施型 態中約為2 kg/cm2。 如此:因為第2空間部61供給之純水流入第2、第3密封 構件39、40内之内周面與搬送輥5之外周面間之間隙,使該 本紙張尺度適用中國國家標準(OJS) Α4規格(2】0χ297公楚) ^^裝----- (請先閲讀背面之注意事項再填寫本頁) -、?τ— -線- 15 539817 A7 _____B7 五、發明説明(· 13 ) 搬送輥5之外周面被密封。且,第i空間部51供給之氣體通 過第1密封構件38之内周面與搬送親5之外周面間的間隙, 由處理槽1之側壁7的貫通孔8流入處理槽丨内。 因此,以其等之情況,可防止處理槽丨内諸如包含有呈 煙霧狀之腐蝕液的空氣由前述貫通孔8漏出處理槽丨之外 部° 同時,第2空間部61供給之純水為少量,且因為設於壁 側7之第i空間部51較第2空間部61供給更多氣體,所以可防 止前述純水由第1空間部51傳送至搬送輥5之外周面,而流 入處理槽1内。 因此,回收於處理槽1内使用之處理液以再使用時,可 防止使回收之處理液中含有純水而劣化之情況,所以能長 期進4亍此處理液之再使用。 於第2空間部61滴下之純水係通過第2密封構件39與搬 送輥5間之間隙而滲入第1空間部51,流動於該空間部51所 形成之排液流路65内,且滯留於此再藉毛細管現象由噴嘴 構件67之細孔66滲透排出。 因此,用以密封搬送輥5之純水將過度滯留於第丨空間 部51内,並未透過第!密封構件38流往處理槽1側。且,前 述細孔66之内徑十分狹小,該細孔66因純水之黏性而堵 塞,因此防止第1空間部51供給之氣體由前述細孔66流出外 部。藉此,前述氣體由第!密封構件38朝處理槽1内流出, 並阻止處理槽1之空氣流入密封裝置13側。 進而·,將些許壓力約為0之純水供給至第2空間部61, 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公爱) 16 (請先閲讀背面之注意事項再填寫本頁) .·裝| 訂- C------- 539817 A7 B7 五、發明説明(Μ 藉此純水以進行液體密封,因此不只用非常少量之純水即 可το成,且因為純水之使用量少,以致此純水傳送至搬送 輥5而難以流入處理槽1内。 又,多數密封裝置13供給之純水,使液體供給槽53之 水頭Η維持一定,且經由同一流量調整構件62而被供給, 因此可供給同量之純水於各密封裝置13。 因為於密封裝置13中供給純水之液體供給槽53的水頭 保持一定,於該液體供給槽53設有溢流管56,溢流之純水 由该溢流管56流往潤滑槽25,使驅動搬送輥5之傳動齒輪17 與驅動齒輪1 8因為水的潤滑而作用。 因此’未供給用以潤滑傳動齒輪丨7與驅動齒輪丨8之專 用純水而可完成,能減少純水之使用量。 [發明之效果] 依如同上述之此發明,可防止用以密封軸體之液體由 外设之一端面側流出,又藉由外殼之一端面側流出之氣 體’可防止壁體内侧之空氣由軸體所貫通之壁體的貫通孔 漏出外侧。且,因為是使用液體與氣體之密封構造,所以 可ό茱求構造間早、成本降低之情形。 [圖式之簡單說明] 第1圖係顯示此發明一實施型態之處理裝置之部份截 面的平面圖。 弟2圖係處理裝置之縱向截面圖。 第3圖係密封裝置之截面圖。 第4圖係按照第3圖之4-4線的截面圖。 本紙張尺度適用中國國家標準(CNS) Α4規格(2〗0χ297公釐) 17 (請先閲讀背面之注意事項再填寫本頁) 訂· C- 539817 A7 B7 五、發明説明(15 ) · 第5圖係按照第3圖之5_5線的截面圖。 第6圖係氣體與純水之配管系統圖。 第7圖係顯示液體供給槽與密封裝置之高低差的說明 圖。 第8圖係液體供給槽之平面圖。 第9圖係液體供給槽之溢流管設置部分的截面圖。 第1〇圖係顯示設於液體供給管之流量調整構件的截面 圖。 第11A圖係設於搬送輥之支持環的平面圖。 第11马圖係設於搬送輥之支持環的正視圖。 第11C圖係設於搬送輥之支持環的縱向截面圖。 (請先閲讀背面之注意事項再填寫本頁) ^^裝| 訂— -線| 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 18 539817 A7 B7 五、發明説明(l6 元件標號對照 1.. .處理槽 2."搬入口. 3.. .搬出口 5…搬送輥 7…側壁 8.. .貫通孔 9.. .機械室 13.. .密封裝置 14.. .支持環 I5.··切斷部 17.. .傳動齒輪 18.. .驅動齒輪 19.. .驅動軸 21.. .傳動滑輪 22.. .驅動馬達 23.. .驅動滑輪 24…帶子 25.. .潤滑槽 28.. .插通孑L 29…外殼 3 1...密封圈 32.. .突條 33.. .鍔構件 34…段部 36、37…凸緣 36a ' 37a·"夕卜周溝 36b、37b...通孔 38〜40…密封構件 4 2...氣體供給流路 43.. .液體供給流路 44…氣體供給管 45.. .集流腔 46、54...供給孔 47.. .發電機調整器 51…第1空間部 52.. .液體供給管 53…液體供給槽 55…主給水管 56.. .溢流管 61.. .第2空間部 62.. .流量調整構件 6 5…排溢流路 66.. . I田孑 L 67.. .喷嘴構件 71、72...導水管 (請先閲讀背面之注意事項再填寫本頁) 裝— ▼線| 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 19• , 可 I 539817 A7 B7 V. Description of the invention (_ 12) — ^ Moreover, because the gas flows in the first space portion 51, the pressure in the space portion 51 rises to the same level as the supply pressure of the gas. On the one hand, the pure water supplied to the second space portion 61 is a small amount. Therefore, even if pure water penetrates the first space portion 51 from the second space portion 61, the pure water does not pass through the gap between the first sealing member 38 and the transfer roller 5 by the pressure of the gas supplied to the first space portion 51. While leaking to the outside of the processing tank 1. On the other hand, the pure water flowing in the overflow pipe 56 provided in the liquid supply tank 53 passes through the water guide pipe 71 as shown in FIG. 6 and flows into the drive gear 18 for driving the conveying roller 5 to rotate. Inside the lubricating groove 25 provided below. The lubricating tank 25 also supplies pure water through a second water pipe 72 connected to one of the supply holes 54 of the liquid supply tank. A flow rate adjusting member 62 for reducing the liquid flow rate is provided in the middle of the second water guide pipe 72 in the same manner as the liquid supply pipe%. With the processing device thus constructed, both ends of the protruding through-hole 8 formed by the side wall 7 of the processing tank 丨 of the transfer roller 5 are sealed by the sealing device 13. The i-th space portion 51 and the second space portion 61 are formed inside the housing 29 of the sealing device 13 by partitioning from the third through the third sealing members 38 to 40. Gas is supplied to the first space port P 5 1, and pure water is supplied to the second space portion 6 丨. The first space portion $ 1 is located closer to the side wall 7 of the processing tank 丨 than the second space portion 61. The pure water system uses the flow adjustment member 62 provided in the liquid supply pipe 52 to make the flow rate small, and the reduced body pressure is much higher than the pure water pressure. In this embodiment, the force is about 2 kg / cm2. This is because the pure water supplied by the second space portion 61 flows into the gap between the inner peripheral surface inside the second and third sealing members 39 and 40 and the outer peripheral surface of the conveying roller 5, so that this paper size applies the Chinese national standard (OJS ) Α4 specifications (2) 0χ297 public Chu) ^^ equipment ----- (Please read the precautions on the back before filling out this page)-,? Τ--line-15 539817 A7 _____B7 V. Description of the invention (· 13 ) The outer peripheral surface of the transfer roller 5 is sealed. Then, the gas supplied from the i-th space portion 51 passes through the gap between the inner peripheral surface of the first sealing member 38 and the outer peripheral surface of the conveying member 5, and flows into the processing tank 丨 through the through hole 8 of the side wall 7 of the processing tank 1. Therefore, in such cases, it is possible to prevent the air containing the corrosive liquid in the form of smoke from leaking out of the processing tank 丨 through the through hole 8 in the processing tank 丨 At the same time, the pure water supplied by the second space portion 61 is a small amount Moreover, since the i-th space portion 51 provided on the wall side 7 supplies more gas than the second space portion 61, the pure water can be prevented from being transferred from the first space portion 51 to the outer peripheral surface of the conveying roller 5 and flowing into the processing tank 1 within. Therefore, when the treatment liquid used in the treatment tank 1 is recovered for reuse, it is possible to prevent the recovered treatment liquid from being deteriorated by containing pure water, so that the treatment liquid can be reused for a long period of time. The pure water dropped in the second space portion 61 penetrates the first space portion 51 through the gap between the second sealing member 39 and the conveying roller 5, flows in the drain flow path 65 formed by the space portion 51, and stays there. Here again, the capillary phenomenon penetrates through the pores 66 of the nozzle member 67 and is discharged. Therefore, the pure water used to seal the conveying roller 5 will be excessively retained in the first space portion 51 and will not pass through the first! The sealing member 38 flows to the processing tank 1 side. The inner diameter of the pores 66 described above is very narrow. The pores 66 are blocked by the viscosity of pure water. Therefore, the gas supplied from the first space portion 51 is prevented from flowing out through the pores 66. By this, the aforementioned gas is removed by the first! The sealing member 38 flows out into the processing tank 1 and prevents the air in the processing tank 1 from flowing into the sealing device 13 side. Further, supply some pure water with a pressure of approximately 0 to the second space unit 61. This paper size is in accordance with China National Standard (CNS) A4 specifications (210X297 public love) 16 (Please read the precautions on the back before filling this page ). · 装 | Order-C ------- 539817 A7 B7 V. Description of the invention (M uses pure water for liquid sealing, so it can be formed by using not only a very small amount of pure water, but also because of pure water The use amount is small, so that the pure water is transmitted to the conveying roller 5 and difficult to flow into the processing tank 1. In addition, most of the pure water supplied by the sealing device 13 keeps the head of the liquid supply tank 53 constant, and passes the same flow adjustment member 62 is supplied, so that the same amount of pure water can be supplied to each sealing device 13. Because the head of the liquid supply tank 53 for supplying pure water to the sealing device 13 is kept constant, an overflow pipe 56 is provided in the liquid supply tank 53 The overflowing pure water flows from the overflow pipe 56 to the lubrication groove 25, so that the driving gear 17 and the driving gear 18 of the driving conveying roller 5 act due to the lubrication of the water. Therefore, 'not supplied to lubricate the driving gear 丨 7 It can be completed with special pure water of driving gear 丨 8 It can reduce the amount of pure water used. [Effect of the invention] According to the invention as described above, the liquid used to seal the shaft can be prevented from flowing out from one end face side of the external device, and the gas flowing out from one end face side of the casing. 'It can prevent the air inside the wall body from leaking out through the through hole of the wall body penetrated by the shaft body. And because it is a sealed structure using liquid and gas, it is possible to reduce the cost of the structure early. [Figure Brief description of the formula] Fig. 1 is a plan view showing a partial cross-section of a processing device according to an embodiment of the present invention. Fig. 2 is a longitudinal cross-sectional view of a processing device. Fig. 3 is a cross-sectional view of a sealing device. It is a cross-sectional view according to line 4-4 in Figure 3. This paper size applies the Chinese National Standard (CNS) A4 specification (2〗 0 × 297 mm) 17 (Please read the precautions on the back before filling this page) Order · C -539817 A7 B7 V. Description of the Invention (15) · Figure 5 is a cross-sectional view taken along line 5-5 of Figure 3. Figure 6 is a piping system diagram of gas and pure water. Figure 7 shows a liquid supply tank and seal An illustration of the height difference of the device. FIG. 9 is a plan view of a liquid supply tank. FIG. 9 is a cross-sectional view of an overflow pipe installation portion of the liquid supply tank. FIG. 10 is a cross-sectional view showing a flow rate adjusting member provided in the liquid supply pipe. Plan view of the support ring of the roller. Figure 11 is a front view of the support ring provided on the transfer roller. Figure 11C is a longitudinal sectional view of the support ring provided on the transfer roller. (Please read the precautions on the back before filling in this Page) ^^ Binding | Order — -line | This paper size is applicable to China National Standard (CNS) A4 (210X297 mm) 18 539817 A7 B7 V. Description of the invention (l6 Component label comparison 1 ... Processing tank 2. & quot Carrying in. 3. Carrying out 5 ... Carrying roller 7 ... Side wall 8. Through-hole 9. Machine room 13. Sealing device 14. Support ring I5 ... Cut-off part 17. .. drive gear 18... Drive gear 19... Drive shaft 21... Drive pulley 22... Drive motor 23... Drive pulley 24... Belt 25... Lubrication groove 28.. L 29 ... housing 3 1 ... sealing ring 32..protrusion 33 .. 锷 member 34 ... section 36, 37 ... flange 36a '37a " Xibu Zhougou 36b, 37b ... pass 38 ~ 40 ... sealing member 4 2 ... gas supply flow path 43 ... liquid supply flow path 44 ... gas supply pipe 45 ... collection chamber 46, 54 ... supply hole 47 ... generator adjustment Device 51 ... first space portion 52 ... liquid supply pipe 53 ... liquid supply tank 55 ... main water supply pipe 56 ... overflow pipe 61 ... second space portion 62 ... flow rate adjusting member 6 5 ... row Overflow path 66 .. I. Field L. 67 ... Nozzle members 71, 72 ... Aqueduct (please read the precautions on the back before filling out this page) Installation — ▼ 线 | This paper size applies to Chinese national standards (CNS) A4 size (210X297 mm) 19

Claims (1)

種*封裝置’係用以密封由形成於壁體之貫通孔突出 之車由體者’其特徵在於該密封裝置包含有: 、外殼,係一端面與前述壁體之外面密封接合,並形 成有插通孔’而貫通前述貫通孔之前述軸體插通前述插 通孔; > ‘ …,扣肌瓶王綠邛敍之一端面 1之則述軸體的外周面與前述插通孔之内周面間的空 間部者; 山液體供給機構,係用以供給液體至前述外殼之另 間 蠕面側之前述軸體的外周面與前述插通孔之内周面 的空間部者; 體 且 密封機構,係設於前述插通孔之内周面與前述軸體 之外周©間的空間部,並藉由前述液體供給機構所供給 之液體,密封位於前述軸體之前述空間部内的部分, 使由前述氣體供給機構所供給之氣體朝前述外^之-端面側.流出者。 •機才 1 j ,申請專利範圍第i項之密封裝置,其中相對於前述夕 殼之前述氣體供給機構設置之處,形成有用以排出由诗 :液體供給機構所供給之液體的排液流路,該排液流: 設置有藉前述液體之黏性將其滯留於排液流路内 有藉毛細管現象排出前述液體之細孔的噴嘴構件 如申請專利範圍第1項之密封裝置,其中前述密封4 係由環狀之第1至第3之密封構件所形成,而前1述第 第3之密封構件可將前述插通孔之内周面與前述氣 、申請專利範圍 外周面間的空間部分隔 體之第】空間部,及由前\成=述氣體供給機構供給氣 空間部者。 夜體供給機構供給液體之第2 4.如申請專利範圍第3項之 件係位於前述外殼之1…置、中前述第1密封構 位於之~面側,而前述第3密封構件係 位於則述外殼之另一她 於心— μ德 面側,且則述第2密封構件係位 於弟1②封構件與第3密封構件之間, 又’前述第2密封構件與前述軸體之外周面間呈有 使供給至前述第2空間部之液體流人前述第以間部的 狹小間隙者。 5·如^專利範圍第4項之密封裝置,其中對應前述外殼 之刖述第1空間部的部分形成有用以排出由前述第2空 間部流入前述第1空間部之液體的排液流路,並於該排 液々丨L路δ又有形成有用以限制液體排出之細孔之喷嘴構 件。 6· —種處理裝置,係將基板搬送至預定方向並加以處理 者,其特徵在於該處理裝置包含有: 處理槽,係於前述基板之搬送方向一端具有搬入 口’於另一端則具有搬出口,且在位於與前述搬送方向 交叉方向的一對壁體上以預定間隔形成相對應之貫通 孔者; 轴體’係沿前述基板之搬送方向以預定間隔配設於 該處理槽内,且其兩端部分別由形成於前述一對壁體之 貫通孔朝外部突出者; 21 本紙張尺度適用中國國家標準(CNS) Μ規格(21〇)<297公楚) 六、申請專利範圍 、、軸.承體’係支撐由前述處理槽之貫通孔所突出之前 述軸體的兩端部而可分別旋轉者; 论封裝置,係設於前述壁體之外面,且用以密封前 述軸體由前述貫通孔突出之端部者, 者。又,前述贿裝置“ 專·圍第W所構成 7·如申請專利範圍第6項之處理裝置,其中前述軸體之一 端部設有傳動齒輪,該傳動齒㈣與藉驅動源而旋轉驅 動之驅.動齒輪相咬合,又, 〜前述液體供給機構具有:液體供給槽;液體供給 官,係用以將該液體供給槽之液體供給至前述外殼之 插通孔與前述軸體之外周面間的空間部者;溢流管, 係用以使前述液體供給槽之液面保持一定者;及潤滑 槽,係對向前述傳動齒輪與驅動齒輪之咬合部分而設 置’並儲藏由前述溢流管所排出之液體以潤滑前述各 齒輪之咬合部分者。 8· ^申請.專難圍第7項之處理裝置,其中前述液體供給 官係設有於外周面形成螺旋溝,且可降低前述液體供給 槽之液體壓力以使液體往前述空間部流動之流量調整 構件者。 種U小/瓜里控制裝置,係設於液體流動之管體,且由 流量調整構件所構成者,而該流量調整構件於外周面形 成有螺旋溝,且其外周面接觸且被壓入前述管體之内周 面,並且使流動於前述管體之液體沿前述螺旋溝流動The "sealing device" is used to seal the vehicle body protruding from the through hole formed in the wall. It is characterized in that the sealing device includes: a casing, an end surface of which is in sealing engagement with the outer surface of the wall body, and forms There is an insertion hole ', and the shaft body penetrating the through hole is inserted into the insertion hole; >' ..., the outer peripheral surface of the shaft body and the insertion hole are described in one end face 1 of the button muscle bottle The space part between the inner peripheral surface of the inner surface; the mountain liquid supply mechanism is used to supply liquid to the outer peripheral surface of the shaft body and the inner peripheral surface of the insertion hole; The body and sealing mechanism is provided in a space portion between the inner peripheral surface of the insertion hole and the outer periphery of the shaft body, and seals the inside of the space portion of the shaft body with the liquid supplied by the liquid supply mechanism. In some cases, the gas supplied by the gas supply mechanism is directed toward the outer-end face side of the outer surface. • Machine only 1j, the sealing device of the scope of application for patent item i, where the aforementioned gas supply mechanism is arranged relative to the aforementioned evening shell, forming a drainage flow path for discharging the liquid supplied by the poetry: liquid supply mechanism The liquid discharge flow: a nozzle member provided with a pore that discharges the liquid by capillary phenomenon in the liquid discharge flow path due to the viscosity of the aforementioned liquid, such as the sealing device in the first scope of the patent application, wherein the aforementioned seal 4 is formed by the ring-shaped first to third sealing members, and the third sealing member described in the first one can separate the space between the inner peripheral surface of the aforementioned insertion hole and the outer peripheral surface of the aforementioned gas and patent applications. The first space part of the separator, and the person who supplies the gas space part from the former gas supply mechanism. Nocturnal body supply mechanism No. 2 4. If the item 3 in the scope of the patent application is located in the first casing of the aforementioned housing, the first sealing structure is located on the front side, and the third sealing member is located in the The second sealing member is located between the first sealing member and the third sealing member, and the second sealing member is located between the second sealing member and the third sealing member, and the second sealing member is between the second sealing member and the outer peripheral surface of the shaft body. A person having a narrow gap where the liquid supplied to the second space portion flows into the first interval portion is shown. 5. The sealing device according to item 4 in the patent scope, wherein a portion corresponding to the first space portion of the housing described above is formed with a drainage flow path for discharging liquid flowing from the second space portion into the first space portion, In addition, there is a nozzle member for forming a pore to limit the discharge of the liquid in the liquid path δL. 6. · A processing device for transporting substrates to a predetermined direction and processing them, characterized in that the processing device includes: a processing tank having a carrying inlet at one end in the carrying direction of the substrate, and a carrying outlet at the other end And a through-hole corresponding to a predetermined interval is formed on a pair of wall bodies intersecting the aforementioned conveying direction; the shaft body is arranged in the processing tank at a predetermined interval along the conveying direction of the substrate, and Both ends are protruded outward by through-holes formed in the aforementioned pair of wall bodies; 21 This paper size applies the Chinese National Standard (CNS) M specification (21〇) < 297 Gongchu) 6. Scope of patent application, Shaft.Bearing body 'supports the two ends of the shaft body protruding from the through holes of the treatment tank and can be rotated separately. The sealing device is provided on the outer surface of the wall body and is used to seal the shaft body. The end protruding from the through hole is either. In addition, the aforementioned bribe device "specially constitutes the seventh W. The processing device according to item 6 of the scope of patent application, wherein one end of said shaft body is provided with a transmission gear, and said transmission gear is rotationally driven by a driving source. The driving gear is engaged with each other. The liquid supply mechanism includes: a liquid supply tank; and a liquid supply officer for supplying liquid from the liquid supply tank to the insertion hole of the housing and the outer peripheral surface of the shaft body. The overflow part is used to keep the liquid level of the aforementioned liquid supply tank constant; and the lubrication tank is set to face the engaging portion of the transmission gear and the drive gear 'and is stored by the aforementioned overflow pipe The discharged liquid is used to lubricate the meshing parts of the aforementioned gears. 8 · ^ Application. The processing device of Zhuanzhuanwei Item 7, wherein the aforementioned liquid supply department is provided with a spiral groove formed on the outer peripheral surface, and the aforementioned liquid supply can be reduced. The liquid pressure of the tank is to adjust the flow rate of the liquid to the aforementioned space. The U / guari control device is installed in the pipe body where the liquid flows, and is controlled by the flow adjustment member. The flow adjustment member has a spiral groove formed on the outer peripheral surface, and the outer peripheral surface contacts and is pressed into the inner peripheral surface of the pipe body, and the liquid flowing in the pipe body flows along the spiral groove.
TW091121358A 2001-09-28 2002-09-18 Sealing device, processing apparatus employing the sealing device, and low flow rate control device TW539817B (en)

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Application Number Priority Date Filing Date Title
JP2001304375A JP4727104B2 (en) 2001-09-28 2001-09-28 SEALING DEVICE AND TREATING DEVICE USING THIS SEALING DEVICE

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CN117646797B (en) * 2024-01-30 2024-05-14 中密控股股份有限公司 Sealing suitable for coolant circulating pump of ship power device

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JPS6179761A (en) * 1984-09-26 1986-04-23 Hitachi Ltd Revolution introducing device
JPH01148171A (en) * 1987-12-07 1989-06-09 Sekine:Kk Production of grated horseradish
JPH0535249Y2 (en) * 1988-03-31 1993-09-07
JPH044567A (en) * 1990-04-19 1992-01-09 Sumitomo Electric Ind Ltd Redox flow battery
JPH044567U (en) * 1990-04-26 1992-01-16
JPH0436449A (en) * 1990-05-31 1992-02-06 Nkk Corp Roll bearing structure in molten metal bath and method of using this structure
JP3072336B2 (en) * 1991-04-30 2000-07-31 日本エヌエスシー株式会社 Intermittent coating equipment
JPH068882A (en) * 1992-06-25 1994-01-18 Kobe Steel Ltd Stern pipe sealing device
JP3556804B2 (en) * 1997-05-20 2004-08-25 東京エレクトロン株式会社 Processing device and processing method
JPH112335A (en) * 1997-06-10 1999-01-06 Ebara Corp Liquid seal device, and polishing/washing device for semiconductor wafer using this liquid seal device
JP2000271466A (en) * 1999-03-24 2000-10-03 Inui Keikaku Kk Shaft seal device of heating mixer and blade fitting part of mixer or heating mixer

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