TWI775661B - Showerhead assembly and thin-film-deposition equipment using the same - Google Patents

Abstract

The invention is a showerhead assembly and thin film deposition equipment thereof, which include a first conveying pipeline, a second conveying pipeline, a diffusion unit, and an annular diffusion unit. The first and second conveying pipelines are connected to the diffusion unit, and deliver the first and second precursors to the first and second air inlet pipes of the diffusion unit, respectively, so that the first and second precursors are delivered to the bottom of the diffusion unit. The annular diffusion unit is arranged around the diffusion unit and includes a first annular conveying pipeline and a plurality of third inlet pipes, wherein the third inlet pipe is used to deliver the second precursor to the space below the diffusion unit.

Description

Spraying device and thin film deposition equipment using the same

The present invention relates to a spraying device and its thin film deposition equipment, which can be used to output two precursors with uniform distribution and similar concentration below the spraying device.

With the continuous advancement of integrated circuit technology, electronic products are currently developing towards the trend of light, thin, short, high performance, high reliability and intelligence. The scaling technology of transistors in electronic products is very important. As the size of transistors shrinks, the current transmission time and energy consumption can be reduced, so as to achieve the purpose of fast computing and energy saving. In today's miniaturized transistors, some key thin films are almost only a few atoms thick, and atomic layer deposition is one of the main techniques for developing these microstructures.

The atomic layer deposition process is a technology of depositing substances on the surface of a substrate layer by layer in the form of single atoms. The main reactants of atomic layer deposition are two chemical substances, usually called precursors, and the two precursors are combined according to each other. sequence is transferred to the reaction space.

Specifically, the first precursor is firstly transported into the reaction space, so that the first precursor is guided to the surface of the substrate, and the process of chemical adsorption is automatically terminated when the surface is saturated. The cleaning gas is delivered into the reaction space, and the gas in the reaction space is drawn out, so as to remove the residual first precursor in the reaction space. The second precursor is injected into the reaction space, so that the second precursor reacts with the first precursor chemically adsorbed on the substrate surface to form the desired film, and the reaction process is completed until the reaction of the first precursor adsorbed on the substrate surface is completed. Then, the cleaning gas is injected into the reaction space to remove the residual second precursor in the reaction space. By repeating the above steps, a thin film can be formed on the substrate.

In practical applications, the uniform distribution of the precursors in the reaction space and the temperature of the substrate will have a considerable impact on the uniformity of the ALD film. To improve the quality of atomic layer deposition process.

As described in the prior art, conventional spraying devices often cannot make the precursor evenly distributed on the substrate, which affects the quality of the thin film deposited on the surface of the substrate. To this end, the present invention proposes a novel spraying device and a thin film deposition device using the spraying device, which can form uniformly distributed precursors on the substrate and/or the carrier plate, so as to facilitate the formation of a thin film with uniform thickness on the surface of the substrate.

An object of the present invention is to provide a spraying device comprising a diffusing unit and an annular diffusing unit, wherein the annular diffusing unit is arranged around the diffusing unit. The diffusion unit includes a plurality of first air intake pipes and a plurality of second air intake pipes, and respectively transports the first precursor and the second precursor to the lower part of the diffusion unit through the first and second air intake pipes.

The annular diffusion unit includes a first annular conveying line and a plurality of third air intake pipes, wherein the first annular conveying line is connected to the third air intake pipe, and the second precursor is conveyed to the diffusion unit through the third air intake pipe to increase the total amount or concentration of the second precursor under the diffusion unit. In addition, the third air inlet pipe may be inclined relative to the bottom surface of the diffusion unit, so as to facilitate the third air inlet pipe to deliver the second precursor to the lower part of the diffusion unit.

In addition, the annular diffusion unit may be further provided with a second annular conveying line and a plurality of fourth air intake pipes, wherein the second annular conveying line is located radially outside the first annular conveying line and is fluidly connected to the fourth air intake pipes. The second annular conveying line can convey a non-reactive gas to the periphery of the diffusion unit through the fourth gas inlet pipe, so as to form a gas wall around the lower part of the diffusion unit, and restrict the flow of the first and second precursors through the gas wall or Diffusion range.

The diffusing unit of the spraying device includes a stack of a first diffusing plate, a second diffusing plate and a third diffusing plate, wherein the second diffusing plate is located between the first and third diffusing plates. The first air intake pipe penetrates through the first, second and third diffuser plates, and the second air intake pipe penetrates through the third diffuser plate and is connected to at least one diffusion space on the second diffuser plate. In addition, at least cooling fluid passages may be further provided on the first and second diffuser plates to reduce the temperature of the diffuser unit.

An object of the present invention is to provide a thin film deposition apparatus, which mainly includes a cavity, a spraying device and a carrying plate, wherein the carrying plate is located in an accommodating space of the cavity, and the spraying device is fluidly connected to the cavity of the cavity. set space. The carrier tray includes a carrier surface for carrying at least one wafer, and the spraying device faces the carrier tray and is used for delivering the first and second precursors to the reaction space above the wafer.

The spraying device includes a diffusing unit and an annular diffusing unit, wherein the diffusing unit outputs the first precursor at a rate greater than that of the second precursor. The annular diffusing unit is arranged around the diffusing unit, wherein the third air inlet pipe of the annular diffusing unit faces the bearing surface, and is used to transport the second precursor to the top of the carrier tray and the wafer, so as to improve the first air flow above the carrier tray and the wafer. The concentration of the two precursors is favorable for forming a thin film with uniform thickness on the surface of the wafer.

In order to achieve the above purpose, the present invention provides a spraying device, comprising: at least one first conveying line for conveying a first precursor; at least one second conveying line for conveying a second precursor; a diffusing unit , including a plurality of first air intake pipes and a plurality of second air intake pipes, wherein the plurality of first air intake pipes are fluidly connected to the first conveying pipeline, and are used to transport the first precursor to the bottom of the diffusion unit, and the plurality of The second air inlet pipe is fluidly connected to the second conveying line, and is used for conveying the second precursor to the lower part of the diffusing unit; and an annular diffusing unit is arranged around the diffusing unit and located below the diffusing unit, and the annular diffusing unit includes At least one first annular conveying line and a plurality of third air intake pipes, wherein the first annular conveying line is fluidly connected to a plurality of third air intake pipes, and the first annular conveying line transfers the second precursor through the third air intake pipes. delivered to the bottom of the diffusion unit.

The invention provides a thin film deposition equipment, comprising: a cavity, including an accommodating space; a spraying device, fluidly connected to the accommodating space, including: at least one first conveying pipeline for conveying a first precursor; at least one The second conveying line is used to convey a second precursor; a diffusion unit includes a plurality of first air intake pipes and a plurality of second air intake pipes, wherein the plurality of first air intake pipes are fluidly connected to the first conveying line and the an accommodating space for transporting the first precursor to the accommodating space, and a plurality of second air intake pipes are fluidly connected to the second transport pipeline and the accommodating space, and used for transporting the second precursor to the accommodating space; and An annular diffuser unit is arranged around the diffuser unit and located below the diffuser unit. The annular diffuser unit includes a first annular conveying pipeline and a plurality of third air intake pipes, wherein the plurality of third air intake pipes are fluidly connected to the first The annular conveying pipeline and the accommodating space, the first annular conveying pipeline conveys the second precursor to the accommodating space through the third air inlet pipe; a carrying tray is located in the accommodating space, faces the spraying device, and is used to carry the at least one wafer.

The spraying device and the film deposition equipment, wherein the annular diffusion unit includes a second annular conveying line and a plurality of fourth air inlet pipes, the second annular conveying line is arranged around the first annular conveying line, and a plurality of The fourth air inlet pipe is fluidly connected to the second annular conveying line, and the second annular conveying line is used for conveying a non-reactive gas to the plurality of fourth air inlet pipes.

The spraying device and the film deposition equipment, wherein the third air inlet pipe faces the extending direction of the first air inlet pipe or the second air inlet pipe, and is inclined relative to the first air inlet pipe or the second air inlet pipe, and the third air inlet pipe is inclined. The four intake pipes are parallel to the first intake pipe or the second intake pipe.

In the spraying device and the thin film deposition equipment, the cross-sectional area of the first conveying line is larger than that of the second conveying line, and the second conveying line is arranged inside the first conveying line.

The spraying device and the thin film deposition equipment, wherein the first conveying pipeline comprises a first pipe part, a second pipe part and an extension pipeline, the first pipe part is connected to the diffusion unit through the second pipe part, wherein the second pipe part The cross-sectional area of the pipe is larger than that of the first pipe part, and the extension pipeline is arranged in the first pipe part and part of the second pipe part, and a coil is wound on the first pipe part and the second pipe part.

The spraying device and the film deposition equipment, wherein the diffusing unit includes: a first diffusing plate, the first air intake pipe runs through the first diffusing plate; a second diffusing plate, including at least one diffusing space, wherein the first intake pipe runs through the second diffuser plate; at least one cooling pipeline is arranged inside the first diffuser plate or the second diffuser plate; and a third diffuser plate, the first air intake pipe and the second air intake pipe pass through the third diffuser plate, wherein the first A diffuser plate, a second diffuser plate and a third diffuser plate are stacked, and the second diffuser plate is located between the first diffuser plate and the third diffuser plate, wherein the first diffuser plate, the second diffuser plate and the third diffuser plate The first air intake pipe of the third diffuser is connected to the diffuser space of the second diffuser.

Please refer to FIG. 1 , which is a schematic cross-sectional view of an embodiment of the spraying device of the present invention. As shown in the figure, the spraying device 10 mainly includes at least one first conveying line 11 , at least one second conveying line 13 , one diffusing unit 15 and one annular diffusing unit 17 , wherein the first conveying line 11 and the second conveying line 13 fluid The diffusing unit 15 is connected, and the annular diffusing unit 17 is arranged around the diffusing unit 15 .

The diffusing unit 15 includes a plurality of first air intake pipes 152 and a plurality of second air intake pipes 154 , wherein the first air intake pipes 152 are fluidly connected to the first conveying line 11 , and the second air intake pipes 154 are fluidly connected to the second conveying line Line 13.

In practical applications, the first delivery line 11 can be used to deliver a first precursor and/or a cleaning gas to the first inlet pipe 152 , and the first precursor and/or cleaning gas can be delivered through the first inlet pipe 152 It is transported to the lower part of the diffusion unit 15 . The second delivery line 13 is used for delivering a second precursor and/or a cleaning gas to the second inlet pipe 154 , and delivering the second precursor and/or cleaning gas to the diffusion unit through the second inlet pipe 154 15 below.

For the convenience of description, the first precursor in the present invention includes the first precursor gas or the plasma of the first precursor, and the second precursor includes the second precursor gas or the plasma of the second precursor.

In an embodiment of the present invention, the diffusion unit 15 may be a multi-layer structure, as shown in FIG. 2 to FIG. 4 , and includes a first diffusion plate 151 , a second diffusion plate 153 and a third diffusion plate 155 . The first, second and third diffusion plates 151/153/155 are stacked and disposed, and the second diffusion plate 153 is located between the first and third diffusion plates 151/155.

The first, second and third diffuser plates 151/153/155 are respectively provided with part of the first air intake pipe 152, wherein the first air intake pipe 152 penetrates the first, second and third diffuser plates 151/153/155 . When the first, second and third diffuser plates 151/153/155 are stacked and disposed, the first air intake pipes 152 on the first, second and third diffuser plates 151/153/155 are aligned and connected to each other, wherein The first intake pipe 152 penetrates through the stacked first, second and third diffuser plates 151/153/155, so that the first precursor and/or cleaning gas can pass through the first intake pipe 152 from the diffusion unit 15. The upper surface is transferred to the lower surface.

The second diffuser plate 153 further includes at least one diffuser space 156 , and the second air intake pipe 154 is disposed on the third diffuser plate 155 , wherein the second air intake pipe 154 penetrates the third diffuser plate 155 . Specifically, as shown in FIG. 4 , an annular flange 1531 and a plurality of protrusions 1533 may be disposed on the lower surface of the second diffuser plate 153 , wherein the annular flange 1531 is disposed around the lower surface of the second diffuser plate 153 , and The convex portion 1533 is located inside the annular flange 1531 . The annular flange 1531 and the convex portion 1533 are used to define a diffusion space 156 on the lower surface of the second diffuser plate 153 , wherein the first air intake pipe 152 is disposed on the convex portion 1533 or penetrates through the convex portion 1533 .

When the second and third diffuser plates 153/155 are connected, the diffuser space 156 of the second diffuser plate 153 is fluidly connected to the second air intake pipe 154 of the third diffuser plate 155, wherein the gas in the diffuser space 156 will pass through the The second intake pipe 154 is delivered to the lower part of the diffuser unit 15 . In another embodiment of the present invention, the convex portion 1533 and the diffusion space 156 may also be disposed on the surface of the third diffusion plate 155 facing the second diffusion plate 153 .

The above-mentioned diffusion unit 15 including the three-layer diffusion plate is only an embodiment of the present invention, and is not a limitation of the scope of the present invention. In practical applications, the first diffuser plate 151 and the second diffuser plate 153 can also be integrated into a single-layer fourth diffuser plate 157 . As shown in FIG. 5 , a plurality of first air intakes are directly arranged on the fourth diffuser plate 157 A diffuser space 156 is provided on the lower surface of the single-layer fourth diffuser plate 157 , wherein the diffuser space 156 and the first air intake pipe 152 are not fluidly connected. In addition, at least one cooling pipeline can also be provided on the fourth diffuser plate 157 .

In an embodiment of the present invention, the first and second conveying lines 11/13 are pipe bodies, wherein the diameter and cross-sectional area of the second conveying line 13 are larger than those of the first conveying line 11, and the second conveying line 13 can be set Inside the first delivery line 11 .

As shown in FIG. 1 , a diffuser plate 113 can be provided at one end or the upper part of the first conveying line 11 , and an expansion part 111 can be provided at the other end or the bottom. The perforation 1131 of the first precursor transports the first precursor into the first conveying line 11 , and the area of the expanding portion 111 gradually expands toward one end of the first conveying line 11 . The first conveying line 11 is connected to the diffusion unit 15 via the expansion part 111 , wherein the expansion part 111 covers the plurality of first air inlet pipes 152 on the diffusion unit 15 , so that the first conveying line 11 can transfer the first precursor and/or the cleaning gas. It is delivered to the first intake pipe 152 of the diffuser unit 15 .

In an embodiment of the present invention, the cross-sectional area of the first conveying line 11 is larger than that of the second conveying line 13 , wherein the rate at which the first conveying line 11 transmits the first precursor is greater than the rate at which the second conveying line 13 conveys the second precursor .

Specifically, the second conveying line 13 may pass through the diffuser plate 113 , be disposed along the axial direction of the first conveying line 11 , and pass through the first diffusing plate 151 , wherein the second conveying line 13 is connected to the diffusing space in the diffusing unit 15 . 156. In practical application, the second delivery line 13 can deliver the second precursor and/or the cleaning gas to the diffusion space 156 and then to the second gas inlet pipe 154 via the diffusion space 156 .

The annular diffusing unit 17 is an annular body, wherein the annular diffusing unit 17 is located below the diffusing unit 15 . The annular diffusion unit 17 includes at least one first annular conveying line 171 and a plurality of third air inlet pipes 172 , wherein the first annular conveying line 171 is fluidly connected to the third air inlet pipe 172 , and the third air inlet pipe 172 connects the The second precursor is delivered below the diffusion unit 15 . For example, the cross section of the diffuser unit 15 may be circular, and the plurality of third air intake pipes 172 of the annular diffuser unit 17 are directed toward the axis of the diffuser unit 15 or an extension line of the center of the circle.

The pore size and/or cross-sectional area of the second transport line 13 is smaller than that of the first transport line 11 , so that the second transport line 13 may transport the second precursor at a lower rate than the first transport line 11 transports the first precursor. In addition, the second delivery line 13 will first deliver the two precursors to the diffusion space 156 , and then deliver the two precursors to the second intake pipe 154 through the diffusion space 156 .

As mentioned above, the rate at which the diffusion unit 15 transports the second precursor to the bottom may be lower than that of the first precursor, so that the concentration of the second precursor under the diffusion unit 15 may be lower than that of the first precursor, or the diffusion unit 15 It takes a longer time to deliver the same amount or the same concentration of the second precursor to the space below.

In practical applications, the first precursor and the second precursor may have different viscosities or fluidities, so that the uniformity of the first precursor and the second precursor delivered under the diffusion unit 15 is different. For example, when the viscosity of the first precursor is lower than that of the second precursor, the first precursor can be uniformly distributed under the diffusion unit 15 in a relatively short period of time. In contrast, the second precursor with higher viscosity cannot be quickly transferred to the edge region of the diffusion unit 15 , so that the concentration of the second precursor on the edge region of the diffusion unit 15 is lower than that in the central region.

To this end, the present invention proposes to dispose the annular diffusion unit 17 around and/or below the diffusion unit 15 , and to deliver the second precursor to the Below the diffusion unit 15 , to improve the concentration and/or uniformity of the second precursor under the diffusion unit 15 , so that the concentration of the second precursor on the edge area and the central area of the diffusion unit 15 is similar.

In an embodiment of the present invention, the third air inlet pipe 172 of the annular diffusion unit 17 may face downward of the diffusion unit 15 , so as to facilitate the delivery of the second precursor to the lower part of the diffusion unit 15 through the third air inlet pipe 172 . Specifically, the third air intake pipe 172 may face the extending direction of the first air intake pipe 152 and/or the second air intake pipe 154 , and be opposite to the first air intake pipe 152 and/or the second air intake pipe 152 of the diffuser unit 15 . The extending direction of the air pipe 154 is inclined, for example, the included angle between the third air intake pipe 172 and the first air intake pipe 152 and/or the second air intake pipe 154 of the diffuser unit 15 is between 0 degrees and 90 degrees.

In another embodiment of the present invention, the annular diffusion unit 17 may include a second annular conveying line 173 and a plurality of fourth air inlet pipes 174 , wherein the second annular conveying line 173 is arranged around the first annular conveying line 171 , outside or radially outside. The second annular conveying line 173 is fluidly connected to the fourth air inlet pipe 174, and a non-reactive gas is conveyed to the periphery of the lower part of the diffusion unit 15 through the fourth air inlet pipe 174, and a gas wall is formed around the lower part of the diffusion unit 15 to restrict A flow or diffusion region of the first precursor, the second precursor, and/or the cleaning gas. For example, the fourth intake pipe 174 of the annular diffuser unit 17 is approximately parallel to the first intake pipe 152 and/or the second intake pipe 154 .

In an embodiment of the present invention, at least one coil 19 may be further disposed on the first conveying line 11 , wherein part of the first conveying line 11 and part of the second conveying line 13 are located radially inside the coil 19 . In practical application, the coil 19 can be connected to an AC power source or a radio frequency power source, so as to transmit an AC signal or a radio frequency signal to the coil 19, so that the first precursor gas and the second precursor gas delivered by the first and second delivery lines 11/13 The precursor gas becomes the plasma.

In another embodiment of the present invention, as shown in FIG. 6 , it is a schematic cross-sectional view of an embodiment of a thin film deposition apparatus using the spraying device 10 of the present invention. The spraying device 10 described in the above embodiment of the present invention can be applied to a thin film deposition apparatus. 20, such as an atomic layer deposition chamber.

The thin film deposition apparatus 20 includes a cavity 21 , a spray device 10 and a carrier plate 23 , wherein the cavity 21 includes an accommodating space 22 . The spraying device 10 is fluidly connected to the accommodating space 22 of the cavity 21 , and delivers the first precursor, the second precursor or the cleaning gas to the accommodating space 22 of the cavity 21 .

The carrier plate 23 is located in the accommodating space 22 of the cavity 21 and faces the spraying device 10 . The carrier tray 23 is used to carry at least one wafer 25 , wherein the first air inlet pipe 152 is fluidly connected to the first conveying line 11 and the accommodating space 22 , so that the spraying device 10 can convey the first precursor through the first air inlet pipe 152 into the accommodating space 22 , and the second air intake pipe 154 is fluidly connected to the second delivery line 13 and the accommodating space 22 , so that the spraying device 10 can deliver the second precursor to the accommodating space through the second air intake pipe 154 22 to deposit a thin film on the surface of the wafer 25 .

The third air inlet pipe 172 of the annular diffusion unit 17 is fluidly connected to the first annular conveying line 171 and the accommodating space 22, wherein the third air inlet pipe 172 faces the wafer 25 and/or the carrier plate 23, so that the first annular conveying The pipeline 171 transports the second precursor into the accommodating space 22 via the third intake pipe 172 .

In addition, the second annular conveying line 173 of the annular diffusing unit 17 is disposed around the first annular conveying line 171 , and the fourth air inlet pipe 174 is fluidly connected to the second annular conveying line 173 and the accommodating space 22 . The second annular conveying line 173 conveys a non-reactive gas to the accommodating space 22 through the fourth air inlet pipe 174, and forms a gas wall around the lower part of the diffusion unit 15 and/or around the carrying plate 23 to limit the first precursor the flow or diffusion region of the chemical, the second precursor, and/or the cleaning gas.

Please refer to FIG. 7 , which is a schematic cross-sectional view of another embodiment of the spraying device of the present invention. As shown in the figure, the spraying device 30 mainly includes at least one first conveying line 31 , at least one second conveying line 33 , one diffusing unit 35 and one annular diffusing unit 17 , wherein the first conveying line 31 and the second conveying line 33 fluid The diffusing unit 35 is connected, and the annular diffusing unit 17 is arranged around the diffusing unit 35 .

The spraying device 30 of the embodiment of the present invention is similar to the spraying device 10 of the previous embodiment, and the main difference is that the second conveying line 33 of the spraying device 30 of this embodiment is not disposed inside the first conveying line 31 , wherein the second conveying line 33 The delivery line 33 connects the side of the diffusion unit 35 and delivers the second precursor to the diffusion space 356 of the diffusion unit 35 .

In addition, the first conveying line 31 according to the present invention may include a first pipe portion 311 and a second pipe portion 313 , wherein the cross-sectional area of the first pipe portion 311 is smaller than that of the second pipe portion 313 . The first pipe part 311 is connected to the diffusion unit 35 via the second pipe part 313 , wherein the second pipe part 313 covers the plurality of first air inlet pipes 352 on the diffusion unit 35 , so that the first transport line 31 can transport the first precursor To the first intake pipe 352 of the diffuser unit 35 .

A coil 39 can be disposed on the outer sides of the first pipe portion 311 and the second pipe portion 313 respectively, so that the first precursor in the first gas feeding line 31 becomes plasma.

In an embodiment of the present invention, an extension line 315 may be disposed in the first conveying line 31 , wherein the extension line 315 may penetrate through the first pipe portion 311 and extend to a part of the second pipe portion 313 . At least one air outlet hole 3151 may be provided on the side surface or end of the extension line 315 , and the first precursor is delivered to the space inside the first conveying line 31 through the air outlet hole 3151 .

The diffusion unit 35 of the embodiment of the present invention is similar in structure to the diffusion unit 15 of the previous embodiment, and may be a three-layer structure similar to that shown in FIG. It can also be a two-layer structure similar to FIG. 5 . The main difference between the two is that the second diffusing plate 353 of the diffusing unit 35 in this embodiment includes a second conveying line 33 , as shown in FIG. The second delivery line 33 is fluidly connected to the diffusion space 356 of the second diffusion plate 353 , and is used to transport the second precursor or the plasma of the second precursor to the diffusion space 356 . The diffusion space 356 is fluidly connected to the second air inlet pipe 354 , so that the gas in the diffusion space 356 is transported to the bottom of the diffusion unit 35 through the second air inlet pipe 354 .

In addition, the second diffuser plate 353 may also include at least one cooling line 3535 , wherein the cooling line 3535 is disposed inside the first diffuser plate 351 or the second diffuser plate 353 . The cooling line 3535 is not connected with the second conveying line 33 and the first air inlet pipe 352 , wherein the cooling line 3535 is used for conveying a cooling fluid and reducing the temperature of the diffusion unit 35 . In practical applications, a plurality of grooves can be provided on the upper surface of the second diffuser plate 353 , and the grooves can be closed to form the second conveying pipeline 33 and the cooling pipeline 3535 inside the second diffuser plate 353 .

The application of the spraying device 30 of the present invention can also be applied to the thin film deposition equipment. As shown in FIG. The spraying device 30 is fluidly connected to the accommodating space 22 of the cavity 21 , and delivers the plasma of the first precursor, the second precursor, or both to the accommodating space 22 of the cavity 21 .

In an embodiment of the present invention, as shown in FIG. 10 , the first conveying line 31 is a hollow cylindrical body, and a diffuser plate 317 is disposed on the top of the first conveying line 31 . The diffuser plate 317 includes a plurality of through holes 3171 , and the first precursor is transported into the first conveying line 31 through the through holes 3171 of the diffusing plate 317 , and then conveyed to the diffusion unit 15 through the first conveying line 31 .

In another embodiment of the present invention, as shown in FIG. 11 , a cover plate 319 may be disposed on the top of the first conveying line 31 , and an extension line 315 may be disposed on the cover plate 319 , wherein the extension line 315 passes through the cover plate 319 , and connect the inner space of the first conveying line 31 . At least one air outlet hole 3151 can be provided on the side surface or end of the extension line 315 , and the first precursor can be transported to the space inside the first conveying line 31 through the air outlet hole 3151 , and then conveyed to the diffusion unit 15 through the first conveying line 31 . .

The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Modifications should be included within the scope of the patent application of the present invention.

10: Spraying device 11: The first delivery line 111: Expansion Department 113: Diffuser plate 1131: Perforation 13: Second delivery line 15: Diffusion unit 151: The first diffuser 152: First intake pipe 153: Second diffuser plate 1531: Ring Flange 1533: convex part 154: Second intake pipe 155: The third diffuser 156: Diffusion Space 157: Fourth diffuser 17: Annular diffuser unit 171: The first annular conveying line 172: The third intake pipe 173:Second annular delivery line 174: Fourth intake pipe 19: Coil 20: Thin film deposition equipment 21: Cavity 22: Accommodating space 23: Carrier plate 25: Wafer 30: Sprinkler 31: The first delivery line 311: The first pipe department 313: Second Pipe Department 315: Extension Line 3151: Air vent 317: Diffuser plate 3171: Perforation 319: Cover 33: Second delivery line 35: Diffusion unit 351: First diffuser 352: First intake pipe 353: Second diffuser 3535: Cooling Line 354: Second intake pipe 355: Third diffuser 356: Diffusion Space 39: Coil 40: Thin film deposition equipment

1 is a schematic cross-sectional view of an embodiment of a spraying device of the present invention.

FIG. 2 is a schematic perspective cross-sectional view of an embodiment of the diffusing unit of the spraying device of the present invention.

FIG. 3 is a schematic top perspective cross-sectional view of an embodiment of a diffuser plate of the diffuser unit of the present invention.

FIG. 4 is a bottom three-dimensional cross-sectional schematic diagram of an embodiment of a diffuser plate of the diffuser unit of the present invention.

FIG. 5 is a schematic perspective cross-sectional view of another embodiment of the diffusing unit of the spraying device of the present invention.

6 is a schematic cross-sectional view of an embodiment of a thin film deposition apparatus using the spraying device of the present invention.

[ Fig. 7 ] is a schematic cross-sectional view of another embodiment of the spraying device of the present invention.

[ Fig. 8 ] is a schematic three-dimensional cross-sectional view of another embodiment of a thin film deposition apparatus using the spraying device of the present invention.

FIG. 9 is a schematic three-dimensional cross-sectional view of another embodiment of a diffusing plate of the diffusing unit of the present invention.

10 is a schematic cross-sectional view of another embodiment of the spraying device of the present invention.

11 is a schematic cross-sectional view of another embodiment of the spraying device of the present invention.

10: Spraying device

11: The first delivery line

111: Expansion Department

113: Diffuser plate

1131: Perforation

13: Second delivery line

15: Diffusion unit

151: The first diffuser

152: First intake pipe

153: Second diffuser plate

154: Second intake pipe

155: The third diffuser

156: Diffusion Space

17: Annular diffuser unit

171: The first annular conveying line

172: The third intake pipe

173:Second annular delivery line

174: Fourth intake pipe

19: Coil

Claims (10)

A spray device comprising: at least one first conveying pipeline for conveying a first precursor; at least one second transport pipeline for transporting a second precursor; a diffusion unit, comprising a plurality of first air inlet pipes and a plurality of second air inlet pipes, wherein the plurality of first air inlet pipes are fluidly connected to the first conveying line and used for conveying the first precursor to the diffusion below the unit, and the plurality of second inlet pipes are fluidly connected to the second delivery line and used to deliver the second precursor to the lower side of the diffusion unit; and An annular diffusing unit is arranged around the diffusing unit and below the diffusing unit, the annular diffusing unit includes at least a first annular conveying pipeline and a plurality of third air intake pipes, wherein the first annular conveying Lines are fluidly connected to the plurality of third air inlet pipes, and the first annular conveying line conveys the second precursor to the lower part of the diffusion unit via the third air inlet pipes. The spraying device according to claim 1, wherein the annular diffusing unit comprises a second annular conveying line and a plurality of fourth air inlet pipes, the second annular conveying line is arranged around the first annular conveying line, The plurality of fourth air inlet pipes are fluidly connected to the second annular conveying line, and the second annular conveying line is used for conveying a non-reactive gas to the plurality of fourth air inlet pipes. The spraying device according to claim 2, wherein the third air intake pipe faces an extension direction of the first air intake pipe or the second air intake pipe, and is opposite to the first air intake pipe or the second air intake pipe The pipe is inclined, and the fourth intake pipe is parallel to the first intake pipe or the second intake pipe. The spraying device according to claim 1, wherein the cross-sectional area of the first conveying line is larger than that of the second conveying line, and the second conveying line is arranged inside the first conveying line. The spraying device of claim 1, wherein the first conveying line comprises a first pipe portion, a second pipe portion and an extension line, the first pipe portion is connected to the diffusion unit via the second pipe portion, wherein The cross-sectional area of the second pipe portion is larger than that of the first pipe portion, and the extension pipeline is disposed in the first pipe portion and part of the second pipe portion, and is wound around the first pipe portion and the second pipe portion Set up a coil. The spray device of claim 1, wherein the diffusing unit comprises: a first diffuser plate, the first air intake pipe penetrates the first diffuser plate; a second diffuser plate, comprising at least one diffuser space, wherein the first air intake pipe penetrates the second diffuser plate; at least one cooling pipeline, disposed inside the first diffuser plate or the second diffuser plate; and a third diffuser plate, the first air intake pipe and the second air intake pipe pass through the third diffuser plate, wherein the first diffuser plate, the second diffuser plate and the third diffuser plate are stacked and arranged, and the first diffuser plate Two diffuser plates are located between the first diffuser plate and the third diffuser plate, wherein the first diffuser plate, the second diffuser plate and the first air intake pipe on the third diffuser plate are connected, and the first diffuser plate The second air intake pipe of the three diffuser plates is connected to the diffuser space of the second diffuser plate. A thin film deposition apparatus, comprising: a cavity, including an accommodating space; A spray device, fluidly connected to the accommodating space, includes: at least one first conveying pipeline for conveying a first precursor; at least one second transport pipeline for transporting a second precursor; a diffusion unit, comprising a plurality of first air intake pipes and a plurality of second air intake pipes, wherein the plurality of first air intake pipes are fluidly connected to the first conveying line and the accommodating space, and are used for the first precursor The material is transported to the accommodating space, and the plurality of second air inlet pipes are fluidly connected to the second delivery pipeline and the accommodating space, and are used to transport the second precursor to the accommodating space; and An annular diffuser unit is arranged around the diffuser unit and located below the diffuser unit. The annular diffuser unit includes a first annular conveying line and a plurality of third air intake pipes, wherein the plurality of third air intake pipes The first annular conveying line and the accommodating space are fluidly connected, and the first annular conveying line conveys the second precursor to the accommodating space below the diffusion unit through the third air inlet pipe; A carrying tray is located in the accommodating space, faces the spraying device, and is used for carrying at least one wafer. The thin film deposition apparatus according to claim 7, wherein the annular diffusion unit comprises a second annular conveying line and a plurality of fourth gas inlet pipes, the second annular conveying line is arranged around the first annular conveying line , and the plurality of fourth inlet pipes are fluidly connected to the second annular conveying line and the accommodating space, and the second annular conveying line conveys a non-reactive gas to the accommodating space through the plurality of fourth air inlet pipes . The thin film deposition apparatus of claim 8, wherein the third air intake pipe faces an extension direction of the first air intake pipe or the second air intake pipe, and is opposite to the first air intake pipe or the second air intake pipe The air pipe is inclined, and the fourth air intake pipe is parallel to the first air intake pipe or the second air intake pipe. The thin film deposition apparatus of claim 7, wherein the first conveying line comprises a first pipe portion, a second pipe portion and an extension pipe, the first pipe portion is connected to the diffusion unit through the second pipe portion, The cross-sectional area of the second pipe portion is larger than that of the first pipe portion, and the extension pipeline is disposed in the first pipe portion and part of the second pipe portion, and on the first pipe portion and the second pipe portion A coil is wound around.

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