TW529991B - Mold and its manufacturing method - Google Patents

Mold and its manufacturing method Download PDF

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TW529991B
TW529991B TW90129863A TW90129863A TW529991B TW 529991 B TW529991 B TW 529991B TW 90129863 A TW90129863 A TW 90129863A TW 90129863 A TW90129863 A TW 90129863A TW 529991 B TW529991 B TW 529991B
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Taiwan
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mold
film
nitrate
cover
patent application
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TW90129863A
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Chinese (zh)
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Kazuhiro Niwa
Zenichi Saeki
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Victor Company Of Japan
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  • Physical Vapour Deposition (AREA)

Abstract

To provide a mold for molding an optical recording medium; especially, to provide a durable mold. A multilayered film 17, wherein nitride films 18 and nitrogen-containing carbon films 19 are alternately laminated, is provided to the attaching surface 1a of a stamper 4 constituting the cavity 3 of a movable mold 1 or a fixed mold 2.

Description

529991 A 7 B7 五、發明説明(1 ) 【發明所屬之技術領域】 本發明係一種成形模型,特別,係有關成形用型模爲 了用以成形CD (小型光碟),DVD (數位多用途光碟 ),光磁碟等,並特別,用以提供壽命長的成形型模及其 製造方法。 【先前之技術】 做爲CD, DVD等磁碟狀記錄媒體之製造裝置,將 塑膠進行插入於用以支持蓋片機之型模模槽內,籍由進行 加壓成形並同時將蓋片機之表面形狀進行複製爲成形品由 先前被進行。在圖4顯示此成形用型模之一例。 圖4係顯示在先前之成形型模機中之型模主要部的構 成剖面圖。在此圖中,1係可動側型模,2係固定側型模 ,3係在上述兩型模1, 2之組合面被形成之模槽,而面 對上述可動側型模1之上述模槽3之表面(蓋片機安裝面 )1 a,係在單面被安裝有被形成前置組及前置槽等之凹 凸模型之蓋片機4。上述蓋片機4,係被載置於上述可動 側型模1之蓋片機安裝面1 a上,並使其內周部及外周部 籍由蓋片機壓具5 a、5b被固定於可動側型模1。尙有 ,在此圖4中,·6係將由未圖示之射出成形機的熔融物質 導入於上述模槽3內之樹脂供給口,7係閘構件,8係用 以控制對上述模槽3內之熔融物質流量的閘。 上述可動側型模1及固定側型模2,係籍由塑膠成形 型模用鋼被形成,至少在上述可動側型模1之蓋片機安裝 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之注意事項再本頁) II裝· 訂 經濟部智慧財產局員工消費合作社印製 -4 - 529991 A7 B7 五、發明説明(2 ) 面1 a及上述固定側型模2之模槽面2 a係被實施淬火及 退火,或,實施硬質電鍍,並可達成提高硬度及耐摩耗性 。進而,上述蓋片機安裝面1 a及模槽面2 a係被加工成 鏡面狀態,可達成被射出成形之製品尺寸的精密度之高精 密度化。 將可動側型模1加以硏磨成如此之理由,係爲了使蓋 片機4由於熱藉由伸縮用以滑動可動側型模1之表面。譬 如,達到熔融樹脂之溫度爲3 6 0 °C,可動側型模1之表 面的溫度1 0 0 °C,樹脂壓力4 0 0 k g / c m2,則形成 蓋片機4之表面係3 6 0 °C,背面係1 Ο 0 °C,而且以上 述壓力被推壓。如此,蓋片機4係形成以熱及壓力沿著其 表面進行移動。因此,反覆使用上述之型模並進行成形, 則蓋片機4係由於摩擦在每次射出受到損傷,而產生龜裂 ,所以形成在成形品之表面產生龜裂的痕跡。 另外,上述蓋片機4係籍由鎳被形成,並使與上述可 動側型模1之蓋片機安裝面1 a的接觸面被加工成鏡面狀 態。 但是,射出成形時,在上述可動側型模1之蓋片機安 裝面1 a及蓋片機4之間,係使未圖示之含有被射出的熔 融高分子物質之氣體或微小固體雜質容易進入。如眾所周 知,在高分子物質之射出成形時,係在上述模槽3內使高 溫高壓之熔融高分子物質被射出,進而射出終了後在模槽 3內使被射出之高分子物質完全加以固化以前之階段,爲 了用以提高此高分子物質之等質性及複製性,所以在模槽 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐) (請先閲讀背面之注意事項再 —裝J — 本頁) 訂 經濟部智慧財產局員工消費合作社印製 -5- 529991 A7 B7 五、發明説明(3 ) 3被加上高沖壓。 但是,先前之型模,係因爲使上述可動側型模1之蓋 片機的安裝面1 a之硬度並非十分高,所以在可動側型模 1之蓋片機的安裝面1 a及蓋片機4之背面之間,加入前 述之氣體或固體雜質,則籍由氣壓之作用及固體雜質之硏 磨作用不僅蓋片機4之背面也使上述可動側型模1之蓋片 機安裝面1 a以局部性被剝離,產生所謂表面粗糙。該表 面粗糙現象,係會引起用以劣化製品尺寸精密度之不適合 現象。 蓋片機4,係因爲用以複製數千枚之光記錄媒體則使 凹凸模型之正常複製性被損害並依次被交換成新蓋片機, 所以若在其範圍內具有耐摩性則足夠。然而,可動側型模 1 ,固定側型模2係在每回依次被交換之各蓋片機被使用 之共用裝置,且因爲係高價裝置,所以具有半永久之耐摩 耗性爲較佳。 【發明所欲解決之問題】 於此,用以延長型模之耐用年數,同時爲了用以提供 高精密度之蓋片機,所以在上述型模之蓋片機安裝面,比 用以構成該蓋片機安裝面之材料使硬度更高,且在耐摩耗 性由優良之材料所構成的硬質層,譬如,用以形成T i N 等並加以解決(日本專利(案)特開昭6 2 - 2 6 7 9 3 7號 公報),但若根據該技術,則可以達成某種程度之解決, 但充分之耐摩耗性及低摩擦性係無法得到。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之注意· * U3.. _事項再本頁 經濟部智慧財產局員工消費合作社印製 -6- 529991 A7 B7 五、發明説明(4 ) 因此,做爲用以達成耐摩耗性及低摩擦性之技術,在 型模之蓋片機安裝面,被提出專利申請有將菱形狀碳簿1膜: 進行塗布之成形用型模(特開平1 一 2 3 4 2 1 4號公報 ),但在與型模用鋼材之間的密著性存有不穩定,對耐久 性也有問題。 本發明,係有鑑於該觀點而被發明,用以延長型模之 耐用年數,同時爲了用以提供高精密度之蓋片機,將用以 構成可動側型模或固定側型模之模槽的表面之蓋片機進行 支持之部份,籍由用以提供設有以交替積層氮化膜及含有 氮碳膜之多層膜的成形用型模,進行解決。 【解決問題之手段】 關於申請專利範圍第1項之發明,其特徵係:在用以 構成可動側型模1或固定側型模2之模槽3之表面的蓋片 機安裝面1 a,設有以交替用以積層氮化膜1 8及含有氮 碳膜1 9之多層膜1 7。 關於申請專利範圍第2項之發明,係在申請專利範圍 第1項之成形用型模中,其特徵係:使氮化膜1 8爲,鈦 硝酸鹽(TiN),硅硝酸鹽(Si3N4),鋁硝酸鹽( A1N),鉅硝酸鹽(TaN),鉻硝酸鹽(ZrN)或 鈦鋁硝酸鹽。 關於申請專利範圍第3項之發明,係在申請專利範圍 第1項之成形用型模中,其特徵係:使氮化膜1 8及含有 氮碳膜1 9之積層周期2 0爲2 nm乃至2 0 nm。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之注意事項再本頁) —裝· 瓣本 訂 經濟部智慧財產局員工消費合作社印製 529991 A7 B7 五、發明説明(5 ) (請先閲讀背面之注意事項再本頁) 關於申請專利範圍第4項之發明,係成形用型模之製 造方法其特徵係:被設於用以構成申請專利範圍第1項所 記載之成形用型模之模槽3的表面之蓋片機4安裝面1 a 之氮化膜1 8及含有氮碳膜1 9,係將成形用型模進行載 置於真空成膜室10之基板夾具11上並使旋轉,同時根 據反應性濺鍍法籍由進行析出於前述蓋片機4之安裝面 1 a並被形成。 【發明之實施形態】 以下,根據檢送圖式用以說明本發明之較佳一實施例 。尙有,在以下敘述之實施例因爲係本發明之較佳具體例 ,所以被附加各種技術性之較佳的各種限定,但本發明之 範圍,係在以下之說明中無特別用以限定本發明之要旨的 記載爲限,並不被限定於此等之態樣。 經濟部智慧財產局員工消費合作社印製 圖1係在用以構成關於本實施例之成形用型模的可動 側型模的蓋片機安裝面上爲了用以形成被設置之多層膜之 成膜裝置的說明圖,圖2係顯示多層膜之構成例的側視圖 。圖3係相同,顯示多層膜之構成例的其他之側視圖。 圖1係在可動側型模的蓋片機安裝面上爲了用以形成 被設置之多層膜之成膜裝置的說明圖,在此圖1中,1〇 係真空成膜室,12係在被配置於此真空成膜室10內之 圓盤狀的基板夾具1 1之表面被安裝之基板。尙有, 1 1 a係前述之基板夾具1 1之軸,此軸1 1 a係籍由未 圖不之裝置以自由旋轉被構成。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -8- 529991 A7 B7 五、發明説明(6 ) 1 3 a、1 3b,係如與前述之基板1 2進行對峙在 前述真空成膜室10內被配置之後述2種的中間電極, 14a、14b,係各別之中間電極13a、13b用之 電源。又,15,係由渦輪分子泵及旋轉泵被構成,係被 連接於前述真空成膜室10之高真空排氣系統,而真空成 膜室1 0,係籍由此高真空排氣系統1 5被排氣成1 〇 - 6 Tor r程度爲止之局真空。16a、16b,係被連接 於前述真空成膜室1 0,用以分別控制氬氣、氮氣之流量 的質量流控制器。 其次,使用圖1之成膜裝置,並關於爲了用以成膜多 層膜之成膜方法加以詳細說明。首先,根據由前述渦輪分 子栗及旋轉栗被構成之局真空排氣系統15,將真空成膜 室1 0內進行排氣成1 〇_6To 1: r程度爲止之高真空狀 態,又,籍由被內藏於基板夾具11之未圖示之加熱器將 基板12進行調整成預定之溫度。 如此,做爲真空狀態,係籍由提高真空成膜室i 〇內 之真空度用以排除不純氣體,爲了提局成膜成分。 其次,籍由質量流控制器1 6 a,用以導入一定流量 之氬氣(濺鍍氣)。之後,籍由質量流控制器16 a,用 以導入一定流量之反應氣的氮氣,使基板夾具1 1以預定 之速度旋轉。 另外,籍由前述電源14a、14b,使上述濺鍍氣 激起等離子氣體,因爲由鈦(T i )及石墨之各中間電極 1 3 a、1 3 b被濺鍍並飛出之粒子,所以使氮化鈦( 本紙張尺度適用中國國家標準(CNS ) M規格(2l〇X297公釐) (請先閲讀背面之注意事項再9本頁) 本 經濟部智慧財產局員工消費合作社印製 -9 - 529991 A7 ___B7 五、發明説明(7 ) T i N)膜及含有氮碳(CN)膜在積層周期被積層,使 多層膜被成膜。 圖2係顯不籍由則述之成膜方法被成膜之多層膜的構 成例之側視圖。圖3係相同,顯示多層膜之構成例的其他 之側視圖,而在兩圖中,1 7係多層膜,1 8係氮化膜, 1 9係含有氮碳膜,2 0係積層周期。尙有,此積層周期 2 0,係2 nm乃至2 0 nm之範圍爲較佳。如果因爲何 故,20nm未滿時,會使生產性變差,又,被得到之表 面硬度,也因爲層間之結合性無法得到希望之硬度,又, 2 0 n m以上之時,也與前述相同,在生產性,硬度之點 ,因爲無法得到所要的硬度。 顯示於圖2之多層膜1 7,係如前述,由相互具有不 同組成之第1層及第2層的1 8、1 9所構成之積層周期 2 〇以其積層順序之複數枚,籍由在基板1 2上以輪流進 行積層並被形成跨越於蓋片機安裝面1 a全體,籍此,可 產生積層單位之各種的性質。 經濟部智慧財產局員工消費合作社印製 顯示於圖3之多層膜17,係籍由將第1及第2層與 圖2以相反進行積層並被形成,籍此,也能產生積層單位 之各種的性質。 尙有,做爲多層膜1 7,係將其最表層做爲含有氮碳 膜,但因爲能容易得到低摩擦性,所以爲較佳者。 ’形成此實施例以反應性濺鍍法被成膜之多層膜,係爲 了將各層之厚度以自由進行調節而加以調適。但是多層膜 ,係此以外之蒸鍍法,譬如,藉由陰極電弧法,真空蒸鍍 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -10- 以細 加詳 例其 施, 實號 本符 於同 葡 目 並用 , 使 4 係 圖 , 考份 參部 以一 用同 1 前 圖先 }由與 1± > > 例下有 施以尙 實 。 ( 明 填寫太 529991 A7 B7 五、發明説明(8 ) ,離子電鍍,等離子促進型化學蒸鍍法等進行形成當然也 可,不一定被限定於此實施例。 又,被成膜之多層膜,係使層間之界面即使平面上或 非平面上皆可達到在本說明敘述之效果。進而,在析出之 時,即使混合各層並使界面之粗度形成非常大時,可充分 期待與此相同之效果。 明係加以省略。首先,根據由渦輪分子泵及旋轉泵被構成 之高真空排氣系統1 5,將真空成膜室1 0內進行排氣形 成到1 0— 6To r r程度爲止之高真空狀態。 其次,將表面做成鏡面之可動側型模1進行配置於圖 1之真空成膜室1 0之預定位置,將圖4之模槽側的蓋片 機安裝面1 a做爲基板1 2,在前述圖1之真空成膜室 1 0內的濺鑛氣之氬(A 1:)氣及反應氣將氮(N2)氣以 質流量控制器用以調整流入量同時繼續進行導入,將真空 成膜室1 0內進行排氣形成到1 0 — 3 T 〇 r r程度爲止之 高真空狀態。 其次,將基板1 2之溫度形成2 0 0 °C,將濺鍍電力 ,形成鈦(T i )中間電極1 5 0 0 W,石墨中間電極 7 〇 0W,以積層周期4 nm用以生成膜厚度2 //m之膜 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 -11 - 529991 A7 B7 五、發明説明(9 ) 圖4之被得到的型模,譬如,組合成C D用之射出成 形用型模並進行成形。爲了比較,根據先前之方法,即使 關於用以被覆T i N也同樣無法進行射出成形而得到如圖 5之結果。 由此圖5也能明白顯示,形成本實施例之成形用型模 ,係籍由將相互積層氮化膜及含有氮碳膜之多層膜做爲蓋 片機之支持面,可大幅度延長型模壽命。 尙有,本實施例,係做爲前述之氮化膜,並使用鈦硝 酸鹽(T i N )爲例加以說明,但硅硝酸鹽(S i 3 N 4 ) ,鋁硝酸鹽(A IN),鉅硝酸鹽(TaN),鍩硝酸鹽 (Z I* N )或鈦鋁硝酸鹽也可得到相同之效果。 【發明之效果】 經濟部智慧財產局員工消費合作社印製 關於申請專利範圍第1項之發明,係在用以構成可動 側型模或固定側型模之模槽的表面之蓋片機安裝面,籍由 設置以交替積層氮化膜及含有氮碳膜之多層膜,爲了使摩 擦,磨耗,及/或容易受到腐蝕之蓋片機的支持表面被強 化,所以大幅度提高耐摩耗性,耐蝕性,及/或低摩擦性 ,籍此,被支持於成形用型模之模槽表面的蓋片機之耐用 年數也大幅度提高。 關於申請專利範圍第2項之發明,係在申請專利範圍 第1項所記載之成形用型模中,籍由使氮化膜爲鈦硝酸鹽 (TiN),硅硝酸鹽(Si3N4),鋁硝酸鹽(A1N ),鉅硝酸鹽(T a N ),鉻硝酸鹽(Z r N )或鈦鋁硝 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -12- 529991 A7 B7_ 五、發明説明(10) 酸鹽,爲了使摩擦,磨耗,及/或容易受到腐鈾之蓋片機 的支持表面被強化,所以大幅度提高耐摩耗性,耐蝕性, 及/或低摩擦性,籍此,被支持於成形用型模之模槽表面 的蓋片機之耐用年數也大幅提高。 關於申請專利範圍第2項之發明,係在申請專利範圍 第1項所記載之成形用型模中,籍由使氮化膜及含有氮碳 膜之積層周期爲2 nm乃至2 0 nm,爲了使摩擦,磨耗 ,及/或容易受到腐蝕之蓋片機的支持表面被強化,所以 大幅提高耐摩耗性,耐蝕性,及/或低摩擦性,籍此,被 支持於成形用型模之模槽表面的蓋片機之耐用年數也大幅 提高。 經濟部智慧財產局員工消費合作社印製 關於申請專利範圍第4項之發明,係在用以構成申請 專利範圍第1項所記載之成形用型模之模槽的表面之蓋片 機的安裝面被設置之氮化膜及含有氮碳膜,係將成形用型 模進行載置於真空成膜室之基板夾具上並使旋轉,同時因 爲根據反應性濺鍍法籍由進行析出於前述蓋片機之安裝面 並被形成之成形用型模之製造方法,可得到使耐摩耗性, 耐蝕性,及/或低摩擦性大幅度提高之成形用型模。 【圖式之簡單說明】 圖1係關於本發明爲了用以形成在用以構成成形用型 模之可動側型模之蓋片機安裝面上設置之說明圖。 圖2係顯示多層膜之構成例的側視圖。 圖3係顯示多層膜之構成例其他的側視圖。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 一 — -13- 529991 A 7 B7 五、發明説明(11 ) 圖4係先前之成形用型模之剖面圖。 圖5係顯示籍由成形用型模被射出成形之本發明及先 前例之蓋片機的比較說明圖。 【元件編號之說明】 1…可動側型模, 1 a…蓋片機安裝面, 2…固定側型模, 2 a…模槽面, 3…模槽, 4…蓋片機, 5 a…蓋片機內周部壓具, 5 b…蓋片機壓具, 6…樹脂供給口, 7…閘構件, 8…聞, 1 0…真空成膜室, 1 1…基板夾具, 1 1 a…軸, 1 2…基板, 1 3 a、1 3 b…中間電極, 14a、14b…電源, 1 5…高真空排氣系統, 1 6 a、1 6 b…質流量控制器, 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先閲讀背面之注意事項再本頁) 太 訂 經濟部智慧財產局員工消費合作社印製 -14- 529991 A7 B7 五、發明説明(12 ) 1 7…多層膜, 1 8…氮化膜, 1 9…含有氮碳膜, 2 0…積層周期。 (請先閱讀背面之注意事 丨 項再本頁) 訂 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) -15-529991 A 7 B7 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a molding model, and in particular, it relates to a molding die for molding a CD (compact disc), a DVD (digital versatile disc) , Magneto-optical disks, etc., and in particular, used to provide a long-life forming mold and its manufacturing method. [Previous technology] As a manufacturing device for disk-shaped recording media such as CDs and DVDs, plastic is inserted into the mold grooves to support the coverslipping machine, and the coverslipping machine is pressed at the same time. The surface shape is reproduced as a molded product as previously performed. An example of this molding die is shown in FIG. 4. Fig. 4 is a sectional view showing the structure of a main portion of a mold in a conventional forming mold. In this figure, 1 is a movable-side mold, 2 is a fixed-side mold, and 3 is a mold groove formed on the combined surface of the above-mentioned two molds 1, 2 while facing the above-mentioned mold of the movable-side mold 1 The surface 3 (covering machine mounting surface) 1 a of the groove 3 is a covering machine 4 on which one surface is provided with a concave-convex pattern such as a front group and a front groove. The cover slipper 4 is placed on the cover slipper mounting surface 1 a of the movable side mold 1, and the inner peripheral part and the outer peripheral part thereof are fixed to the cover slipper presses 5 a and 5 b. Movable side mold 1. Yes, in this FIG. 4, · 6 is a resin supply port that introduces a molten material from an injection molding machine (not shown) into the mold groove 3, 7 is a gate member, and 8 is used to control the mold 3 A gate for the flow of molten material inside. The above-mentioned movable-side mold 1 and the fixed-side mold 2 are made of steel for plastic molding. At least the cover-side machine of the above-mentioned movable-side mold 1 is installed. This paper is applicable to Chinese National Standard (CNS) A4 specifications. (210X297mm) (Please read the precautions on the back first, then this page) II Packing and printing Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-4-529991 A7 B7 V. Description of the invention (2) Face 1a and the above fixing The groove surface 2 a of the side mold 2 is quenched and annealed, or a hard plating is performed to improve the hardness and wear resistance. Furthermore, the cover sheet mounting machine surface 1a and the die groove surface 2a are processed into a mirror surface state, and the precision of the size of the product to be injection molded can be increased. The reason why the movable-side mold 1 is honed is to make the cover slipper 4 slide the surface of the movable-side mold 1 by expansion and contraction due to heat. For example, if the temperature of the molten resin is 3 60 ° C, the temperature of the surface of the movable mold 1 is 100 ° C, and the resin pressure is 400 kg / c m2, the surface system of the cover slipper 4 is formed. 0 ° C, the back is 100 ° C, and it is pushed with the above pressure. In this way, the cover slipper 4 is formed to move along its surface with heat and pressure. Therefore, if the above-mentioned mold is used repeatedly for molding, the cover slipper 4 is damaged due to friction during each shot, and cracks are generated. Therefore, cracks are formed on the surface of the molded product. In addition, the cover slipper 4 is formed of nickel, and a contact surface with the cover slipper mounting surface 1a of the movable-side mold 1 is processed into a mirror state. However, during injection molding, between the coverslipper mounting surface 1 a and the coverslipper 4 of the movable-side mold 1, a gas or a small solid impurity containing a molten polymer substance to be injected is not easily shown (not shown). enter. As is well known, during the injection molding of the polymer material, the molten polymer material at a high temperature and pressure is ejected in the mold cavity 3, and after the injection is completed, the polymer material that is ejected is completely cured in the mold cavity 3. At this stage, in order to improve the homogeneity and reproducibility of this polymer substance, the Chinese standard (CNS) A4 specification (210X 297 mm) is applied to the paper size of the mold groove. (Please read the precautions on the back before —Install J — This page) Order Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs -5- 529991 A7 B7 V. Invention Description (3) 3 is added with high stamping. However, since the hardness of the mounting surface 1 a of the cover sheet machine of the movable side mold 1 is not very high in the previous mold, the mounting surface 1 a and the cover sheet of the cover sheet machine of the movable side mold 1 are not very high. If the aforementioned gas or solid impurities are added between the back surface of the machine 4, not only the back surface of the cover film machine 4 but also the cover plate machine installation surface 1 of the movable side mold 1 by the effect of air pressure and the honing effect of solid impurities. a is peeled off locally, so-called surface roughness occurs. This surface roughness phenomenon causes an unsuitable phenomenon to deteriorate the dimensional accuracy of the product. The coverslipper 4 is because the normal reproducibility of the concave-convex model is impaired in order to copy thousands of optical recording media, and it is sequentially replaced with a new coverslipper, so it is sufficient to have abrasion resistance within its range. However, the movable-side mold 1 and the fixed-side mold 2 are common devices that are used in each cover slip machine that is exchanged in turn each time, and because they are high-priced devices, it is better to have semi-permanent wear resistance. [Problems to be Solved by the Invention] Here, in order to extend the durability of the mold, and in order to provide a high-precision cover film machine, the mounting surface of the cover film machine of the above mold is used to constitute The material of the mounting surface of the cover slipper makes the hardness higher, and the hard layer composed of excellent materials in wear resistance, for example, is used to form and solve T i N (Japanese Patent (Patent) JP 6) 2-2 6 7 9 3 7), but according to this technology, a certain degree of solution can be achieved, but sufficient wear resistance and low friction are not available. This paper size applies to China National Standard (CNS) A4 (210X297 mm) (Please read the note on the back. * U3 .. _ Matters printed on this page. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs-6- 529991 A7 B7 V. Description of the invention (4) Therefore, as a technology to achieve abrasion resistance and low friction, a patent application has been filed on the mounting surface of the cover machine of the mold. A diamond-shaped carbon book 1 film has been applied: Forming molds (Japanese Unexamined Patent Publication No. 1-2 2 4 2 14), however, the adhesion to the steel material for the mold is unstable, and durability is also a problem. The present invention is made in view of this problem. The invention was invented to extend the durability of the mold, and to provide a high-precision cover machine, a cover machine that forms the surface of the mold groove of the movable side mold or the fixed side mold. The supporting part is solved by providing a molding die provided with alternately laminated nitride films and multilayer films containing nitrogen and carbon films. [Means for Solving the Problem] Regarding item 1 of the scope of patent application The invention is characterized by: The cover sheet machine mounting surface 1 a of the surface of the mold groove 3 of the mold 1 or the fixed mold 2 is provided with a multilayer film 17 for alternately laminating a nitride film 18 and a nitrogen-containing carbon film 19. The invention in the second scope of the patent application is in the forming mold for the first scope of the patent application, and is characterized in that the nitride film 18 is made of titanium nitrate (TiN), silicon nitrate (Si3N4), Aluminum Nitrate (A1N), Giant Nitrate (TaN), Chromium Nitrate (ZrN) or Titanium Aluminum Nitrate. The invention in the third scope of the patent application is included in the forming mold of the first scope of the patent application. Its characteristics are: make the lamination period 20 of the nitride film 18 and the nitrogen-containing carbon film 19 be 2 nm or even 20 nm. This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) (please Read the precautions on the back first, then this page) — This book is printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and printed by the Consumer Cooperatives of the Ministry of Economic Affairs. 529991 A7 B7 V. Description of the Invention (5) (Please read the precautions on the back before this page) About the application The invention in item 4 of the patent is a method for manufacturing a molding die, and is characterized in that it is provided for The nitride film 18 and the nitrogen-containing carbon film 19 of the cover sheet machine 4 mounting surface 1a and the nitrogen-containing carbon film 19 are formed on the surface of the cover slipper 4 of the mold groove 3 of the molding die described in the first patent application scope. It is placed on the substrate holder 11 of the vacuum film forming chamber 10 and rotated, and at the same time, it is separated and formed on the mounting surface 1 a of the cover slipper 4 according to the reactive sputtering method. [Embodiments of the Invention] The following The preferred embodiment of the present invention will be described based on the submission pattern. However, the embodiment described below is a preferred specific example of the present invention, so various technical and better restrictions are added. However, the scope of the present invention is not limited to the description in the following description that specifically defines the gist of the present invention, and is not limited to these aspects. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. Figure 1 is a film formation on the mounting surface of a cover machine used to form the movable side mold of the forming mold of this embodiment. An explanatory diagram of the device. FIG. 2 is a side view showing a configuration example of a multilayer film. FIG. 3 is another side view showing the same configuration example of the multilayer film. Fig. 1 is an explanatory diagram of a film forming device for forming a multilayer film provided on a cover sheet machine mounting surface of a movable side mold. In Fig. 1, 10 is a vacuum film forming chamber, and 12 is a A substrate on which the surface of a disc-shaped substrate holder 11 arranged in the vacuum film forming chamber 10 is mounted. Yes, 1 1 a is the axis of the substrate clamp 11 described above, and the axis 1 1 a is formed by a device not shown in the figure to rotate freely. This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) -8- 529991 A7 B7 V. Description of the invention (6) 1 3 a, 1 3b, as opposed to the aforementioned substrate 12 in the aforementioned vacuum The two types of intermediate electrodes described later, 14a and 14b, are arranged in the film forming chamber 10, and are power sources for the respective intermediate electrodes 13a and 13b. 15, is composed of a turbo molecular pump and a rotary pump, and is connected to the high vacuum exhaust system of the vacuum film forming chamber 10, and the vacuum film forming chamber 10 is the high vacuum exhaust system 1 5 is evacuated to a local vacuum of about 10-6 Torr. 16a and 16b are mass flow controllers connected to the aforementioned vacuum film forming chamber 10 for controlling the flow rates of argon and nitrogen, respectively. Next, the film forming apparatus shown in Fig. 1 will be used, and a film forming method for forming a multilayer film will be described in detail. First, according to the local vacuum exhaust system 15 composed of the aforementioned turbo molecular pump and rotary pump, the vacuum film forming chamber 10 is evacuated to a high vacuum state up to a level of 〇_6To 1: r. The substrate 12 is adjusted to a predetermined temperature by a heater (not shown) built into the substrate holder 11. In this way, as a vacuum state, the degree of vacuum in the vacuum film forming chamber i 0 is raised to eliminate impure gases in order to improve the film forming composition. Secondly, the mass flow controller 16a is used to introduce a certain flow of argon gas (sputter gas). Thereafter, by using the mass flow controller 16a, the substrate holder 11 is rotated at a predetermined speed by introducing nitrogen gas of a reaction gas at a certain flow rate. In addition, the plasma gas is excited by the sputtering gas by the power sources 14a and 14b, because the titanium (T i) and graphite intermediate electrodes 1 3 a and 1 3 b are sputtered and fly out, so Make titanium nitride (This paper size applies the Chinese National Standard (CNS) M specification (210 × 297 mm) (Please read the precautions on the back before 9 pages)) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-9 -529991 A7 ___B7 V. Description of the invention (7) T i N) film and nitrogen-carbon (CN) -containing film are laminated during the lamination cycle, so that a multilayer film is formed. Fig. 2 is a side view showing a configuration example of a multilayer film formed by the film formation method described above. Fig. 3 is the same, showing other side views of the configuration example of the multilayer film. In both figures, the 17-series multilayer film, the 18-series nitride film, the 19-series containing nitrogen-carbon film, and the 20-series build-up cycle. However, it is preferable that the lamination period is 20, which is in the range of 2 nm or even 20 nm. If, for any reason, the productivity is deteriorated when the thickness is less than 20 nm, and the obtained surface hardness cannot be obtained because of the bonding between layers, and when it is 20 nm or more, it is the same as above. In terms of productivity and hardness, the desired hardness cannot be obtained. The multilayer film 17 shown in FIG. 2 is, as mentioned above, a layering cycle 2 composed of the first layer and the second layer 18 and 19 having different compositions from each other. The substrates 12 are laminated in turns and are formed across the entire mounting surface 1 a of the coverslipping machine, whereby various properties of the laminated unit can be produced. The multilayer film 17 shown in Figure 3 is printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, which is formed by layering the first and second layers opposite to Figure 2 and forming it. As a result, various types of multilayer units can also be produced. Nature. Yes, as the multilayer film 17, the topmost layer is a nitrogen-containing carbon film, but it is preferable because it can easily obtain low friction. The formation of the multilayer film formed by the reactive sputtering method in this embodiment is to adjust the thickness of each layer freely. However, the multilayer film is other than the evaporation method. For example, by the cathode arc method, the size of the paper is applied to the Chinese National Standard (CNS) A4 specification (210X297 mm) -10- The real number is used in conjunction with the same Portuguese title, so that the 4 series of maps, the examination of the reference part with the same use 1 before the picture} and 1 ± > > (Please fill in the details of 529991 A7 B7 V. Invention Description (8)) Of course, it can be formed by ion plating, plasma-assisted chemical vapor deposition, etc., and it is not necessarily limited to this embodiment. Also, the multilayer film to be formed, This is to make the interface between layers achieve the effect described in this description even on a plane or a non-planar surface. Furthermore, at the time of precipitation, even if the layers are mixed and the thickness of the interface is made very large, the same can be fully expected. The effect is omitted. First, according to the high-vacuum exhaust system 15 consisting of a turbo molecular pump and a rotary pump, the vacuum film forming chamber 10 is exhausted to a level as high as 10-6 Torr. Vacuum state. Next, the movable side mold 1 with a mirror surface is arranged at a predetermined position in the vacuum film forming chamber 10 of FIG. 1, and the cover sheet machine mounting surface 1 a of the mold groove side of FIG. 4 is used as a substrate. 1 2. The argon (A 1 :) gas and the reaction gas of the ore-spattering gas in the vacuum film forming chamber 10 of FIG. 1 mentioned above use nitrogen (N2) gas to adjust the inflow while using the mass flow controller to continue the introduction, Vent the vacuum film forming chamber 10 A high vacuum state of about 10 to 3 T rr is achieved. Next, the temperature of the substrate 12 is set to 200 ° C, and the power is sputtered to form a titanium (T i) intermediate electrode 15 0 0 W, Graphite intermediate electrode 7000W, with a stacking period of 4 nm to generate a film with a film thickness of 2 // m. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling This page) Order printed by the Intellectual Property Bureau's Consumer Cooperatives of the Ministry of Economic Affairs -11-529991 A7 B7 V. Description of the invention (9) The obtained mold of Figure 4 is, for example, assembled into a CD for injection molding and performed For comparison, according to the previous method, even if it is used to cover T i N, injection molding cannot be performed, and the result shown in Fig. 5 is obtained. From this, Fig. 5 can clearly show that the forming mold of this embodiment is formed. It is based on the use of mutually laminated nitride films and multilayer films containing nitrogen and carbon films as the support surface of the coverslipper, which can greatly extend the life of the mold. Yes, in this embodiment, it is used as the aforementioned nitride film. And use titanium nitrate (T i N) as an example Explanation, but silicon nitrate (S i 3 N 4), aluminum nitrate (A IN), giant nitrate (TaN), osmium nitrate (ZI * N) or titanium aluminum nitrate can also achieve the same effect. Effect of the invention] The consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs printed the invention in the scope of patent application No. 1 which is the cover machine mounting surface on the surface used to form the mold groove of the movable side mold or the fixed side mold. By providing an alternately laminated nitride film and a multilayer film containing a nitrogen-carbon film, the support surface of the cover slipper is strengthened in order to increase friction, wear, and / or corrosion, so the wear resistance and corrosion resistance are greatly improved. , And / or low friction, and as a result, the number of years of durability of the cover sheet machine supported on the surface of the groove of the forming mold is also greatly improved. Regarding the invention in the second patent application scope, in the forming mold described in the first patent application scope, the nitride film is made of titanium nitrate (TiN), silicon nitrate (Si3N4), and aluminum nitrate. Salt (A1N), Giant Nitrate (T a N), Chromium Nitrate (Zr N) or Titanium Aluminum Nitrate. This paper applies Chinese National Standard (CNS) A4 (210X297 mm). -12- 529991 A7 B7_ 5 2. Description of the invention (10) In order to strengthen friction, wear, and / or the supporting surface of the coverslipper which is susceptible to uranium decay, the abrasion resistance, corrosion resistance, and / or low friction are greatly improved, As a result, the number of years of durability of the cover slipper supported on the surface of the grooves of the forming mold has also been greatly improved. Regarding the invention in the second scope of the patent application, in the forming mold described in the first scope of the patent application, the period of the lamination of the nitride film and the nitrogen-containing carbon film is 2 nm to 20 nm. The support surface of the coverslipper which is subject to friction, abrasion, and / or corrosion is strengthened, so that the abrasion resistance, corrosion resistance, and / or low friction are greatly improved, thereby being supported by the mold of the forming mold. The number of years of durability of the coverslipper on the groove surface has also been greatly improved. The Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs has printed the invention of item 4 of the scope of patent application, which is the mounting surface of the cover sheet machine which constitutes the surface of the mold groove of the forming mold described in item 1 of the scope of patent application. The installed nitride film and nitrogen-carbon-containing film are placed on a substrate holder in a vacuum film forming chamber and rotated while being formed, and are separated out of the cover sheet by a reactive sputtering method. The manufacturing method of the molding die formed on the mounting surface of the machine can obtain a molding die that greatly improves abrasion resistance, corrosion resistance, and / or low friction. [Brief Description of the Drawings] FIG. 1 is an explanatory diagram of the present invention for installation on a cover sheet machine for forming a movable-side mold for forming a mold. FIG. 2 is a side view showing a configuration example of a multilayer film. FIG. 3 is another side view showing a configuration example of the multilayer film. This paper size is in accordance with Chinese National Standard (CNS) A4 specification (210X297 mm) I — -13- 529991 A 7 B7 V. Description of the invention (11) Figure 4 is a sectional view of the former forming mold. Fig. 5 is a comparative explanatory view showing a cover sheet machine according to the present invention and the previous example which are formed by injection molding using a molding die. [Description of component numbers] 1 ... movable side mold, 1 a ... cover cover machine mounting surface, 2 ... fixed side mold, 2 a ... die groove surface, 3 ... die groove, 4 ... cover film machine, 5 a ... Cover press inner peripheral press, 5 b ... cover press press, 6 ... resin supply port, 7 ... gate member, 8 ... smell, 1 0 ... vacuum film forming chamber, 1 1 ... substrate holder, 1 1 a … Shaft, 1 2… substrate, 1 3 a, 1 3 b… intermediate electrode, 14a, 14b… power supply, 1 5… high vacuum exhaust system, 1 6 a, 1 6 b… mass flow controller, paper size Applicable to China National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before printing this page) Taidang Printing by Intellectual Property Bureau Employee Consumer Cooperatives -14- 529991 A7 B7 V. Invention Description (12 ) 1 7 ... multilayer film, 1 8 ... nitride film, 1 9 ... nitrogen-carbon-containing film, 2 0 ... layering cycle. (Please read the note on the back 丨 item on this page first) Order Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Printed by the Consumer Cooperatives of the Ministry of Economic Affairs This paper applies the Chinese National Standard (CNS) A4 specification (210X297 mm)

Claims (1)

529991 A8 B8 C8 D8 六、申請專利範圍 1 · 一種成形用型模其特徵爲: 在用以構成可動側型模或固定側型模之模槽的表面之 蓋片機安裝面,設有以交替用以積層氮化膜及含有氮碳膜 之多層膜。 2 ·如申請專利範圍第1項所記載之成形用型模,其 中氮化膜係鈦硝酸鹽(T i N ),硅硝酸鹽(S i 3 N 4 ) ,鋁硝酸鹽(A1N),钽硝酸鹽(TaN),鉻硝酸鹽 (Z r N )或鈦鋁硝酸鹽。 3 ·如申請專利範圍第1項所記載之成形用型模,其 中氮化膜及含有氮碳膜之積層同期係2 nm乃至2 0 nm 〇 4 · 一種成形用型模之製造方法,其特徵係: 在被設於用以構成前述申請專利範圍第1項所記載之 成形用型模的模槽之表面的蓋片機安裝面之氮化膜及含有· 氮碳膜,係將成形用型模進行載置於真空成膜室之基板夾 具上並使旋轉,同時根據反應性濺鍍法籍由進行析出於前 述蓋片機安裝面並被形成。 (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公羡) -16-529991 A8 B8 C8 D8 6. Scope of patent application 1 · A molding die is characterized by: The cover machine mounting surface on the surface used to form the mold groove of the movable side die or the fixed side die is provided with alternating Used to laminate nitride films and multilayer films containing nitrogen and carbon films. 2 · The forming mold as described in item 1 of the patent application scope, wherein the nitride film is titanium nitrate (T i N), silicon nitrate (S i 3 N 4), aluminum nitrate (A1N), tantalum Nitrate (TaN), chromium nitrate (Z r N) or titanium aluminum nitrate. 3. The forming mold as described in item 1 of the scope of the patent application, in which the nitride film and the layer containing nitrogen and carbon film are in the same period of 2 nm to 20 nm. A manufacturing method of the forming mold, which has the characteristics Department: Nitriding film and nitrogen-carbon-containing film on the mounting surface of a cover slipper provided on the surface of the die groove constituting the forming die described in item 1 of the aforementioned patent application range. The mold is placed on a substrate holder in a vacuum film forming chamber and rotated, and at the same time, it is separated out from the mounting surface of the cover slipper and formed according to a reactive sputtering method. (Please read the precautions on the back before filling this page) Order Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper applies the Chinese National Standard (CNS) A4 specification (210X297 public envy) -16-
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