JPH10202668A - Molding method for recording disk - Google Patents

Molding method for recording disk

Info

Publication number
JPH10202668A
JPH10202668A JP1631798A JP1631798A JPH10202668A JP H10202668 A JPH10202668 A JP H10202668A JP 1631798 A JP1631798 A JP 1631798A JP 1631798 A JP1631798 A JP 1631798A JP H10202668 A JPH10202668 A JP H10202668A
Authority
JP
Japan
Prior art keywords
stamper
molding
diamond
film
recording disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1631798A
Other languages
Japanese (ja)
Other versions
JP2857138B2 (en
Inventor
Masatoshi Nakayama
正俊 中山
Toshihiko Ishida
俊彦 石田
Kunihiro Ueda
国博 上田
Hiroshi Tanabe
宏 田辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP1631798A priority Critical patent/JP2857138B2/en
Publication of JPH10202668A publication Critical patent/JPH10202668A/en
Application granted granted Critical
Publication of JP2857138B2 publication Critical patent/JP2857138B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/17Component parts, details or accessories; Auxiliary operations
    • B29C45/26Moulds
    • B29C45/263Moulds with mould wall parts provided with fine grooves or impressions, e.g. for record discs
    • B29C45/2632Stampers; Mountings thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/17Component parts, details or accessories; Auxiliary operations
    • B29C45/26Moulds
    • B29C45/263Moulds with mould wall parts provided with fine grooves or impressions, e.g. for record discs
    • B29C45/2632Stampers; Mountings thereof
    • B29C2045/2634Stampers; Mountings thereof mounting layers between stamper and mould or on the rear surface of the stamper

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

PROBLEM TO BE SOLVED: To use a stamper of long life for molding and mold by introducing a raw material gas composed of hydrocarbon gas, as a main component, ionizing the same, carrying out the deposit separation on the back of the stamper to form a diamond-shaped film to be coated thereon, supporting the stamper in a molding die cavity and injecting resin. SOLUTION: A diamond shaped film is formed on the back 8 of a stamper in an ordinary film manufacturing device. As the diamond-shaped film is formed on the back 8 of the stamper 1 of a molding die, the life of the stamper 1 can be prolonged to a large extent. Also as it is hard to form marks on the stamper 1, characteristics of a matrix surface of the stamper 1 are hard to be lowered, and the quality of a disk to be molded is good for a long time. Thus the stamper 1 of low wear resistance and low friction resistance is manufactured to achieve the realization of long life of the stamper 1, and a number of disks can be manufactured by one stamper 1 to achieve the reduction of the molding cost to a large extent.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、レコード、コンパ
クトディスク、光磁気ディスク、光ディスク、レーザデ
ィスク等の記録ディスクの成形方法に関する。
The present invention relates to a method for forming a recording disk such as a record, a compact disk, a magneto-optical disk, an optical disk and a laser disk.

【0002】[0002]

【従来の技術】レコード、ディスク等のレコーデッド記
録媒体の製造には、プラスチックを、スタンパー(成形
母型)を支持した金型キャビティー内に装入し、加圧す
ることにより、成形と同時にスタンパーの表面形状を成
形品に転写することが行なわれている。このような成形
金型の一例を図1に示す。同図はレーザディスク等の成
形を行なうための射出成形金型で、可動側金型2と固定
側金型5とより成り、可動側金型が閉鎖されたときに成
形キャビティー7を形成する。可動側金型2のキャビテ
ィー7の側の鏡面研磨した表面8にはシート状金属スタ
ンパー1を支持させ、更にその周部を外周リング部材4
により押える。外周リング部材4はキャビティーの周壁
をも構成する。図1は金型が閉じた状態を示し、キャビ
ティー7が形成されている。この状態で、樹脂は供給口
3よりゲート部材12のゲート6を経て所定の成形圧力
でキャビティー7に導入されて成形が行なわれる。
2. Description of the Related Art To manufacture a recorded recording medium such as a record or a disk, a plastic is charged into a mold cavity supporting a stamper (molding mold), and is pressurized. 2. Description of the Related Art Transfer of a surface shape to a molded article has been performed. FIG. 1 shows an example of such a molding die. FIG. 1 shows an injection mold for molding a laser disk or the like, which comprises a movable mold 2 and a fixed mold 5, and forms a molding cavity 7 when the movable mold is closed. . The sheet-shaped metal stamper 1 is supported on the mirror-finished surface 8 on the side of the cavity 7 of the movable mold 2, and the periphery thereof is further formed by an outer ring member 4.
Press by. The outer peripheral ring member 4 also forms the peripheral wall of the cavity. FIG. 1 shows a state in which the mold is closed, and a cavity 7 is formed. In this state, the resin is introduced from the supply port 3 through the gate 6 of the gate member 12 into the cavity 7 at a predetermined molding pressure, and is molded.

【0003】[0003]

【発明が解決しようとする課題】可動側金型2は鋼から
製作して焼き入れし、その表面8には硬質めっきを施
し、高精度に研磨したものなどが使用されている。可動
側金型をこのように研磨する理由は、スタンパーが熱に
よる伸縮により可動側金型の表面8を滑動するためであ
る。例えば溶融樹脂の温度が360℃、可動側金型の表
面8の温度100℃、樹脂圧力400kg/cm2 とす
ると、スタンパー1の表面は360℃、裏面は100℃
となり、しかも上記圧力で押圧されている。そうすると
スタンパーは熱と圧力で表面8に沿って移動することに
なる。そのために上記のような金型を用いて繰り返して
成形を行なうと、スタンパー1の裏面は摩擦によりショ
ット毎に損傷を受け、亀裂を生じ、成形品の表面に亀裂
の痕を転写することになる。この問題はキャビティー側
の表面8をTiN等の耐摩耗性膜により被覆することに
よりある程度解決することができるが、充分な耐摩耗性
と低摩擦性は得られない。本発明は寿命の長いスタンパ
ーを使用してディスク等の記録ディスクを成形すること
を目的とする。
The movable mold 2 is made of steel and quenched, and its surface 8 is hard-plated and polished with high precision. The reason for polishing the movable mold in this way is that the stamper slides on the surface 8 of the movable mold due to expansion and contraction due to heat. For example, if the temperature of the molten resin is 360 ° C., the temperature of the front surface 8 of the movable mold is 100 ° C., and the resin pressure is 400 kg / cm 2 , the front surface of the stamper 1 is 360 ° C., and the back surface is 100 ° C.
And pressed by the above pressure. The stamper will then move along the surface 8 with heat and pressure. Therefore, when molding is repeatedly performed using the above-described mold, the back surface of the stamper 1 is damaged by each shot due to friction, cracks are generated, and crack marks are transferred to the surface of the molded product. . This problem can be solved to some extent by coating the surface 8 on the cavity side with a wear-resistant film such as TiN, but sufficient wear resistance and low friction cannot be obtained. An object of the present invention is to form a recording disk such as a disk using a stamper having a long life.

【0004】[0004]

【課題を解決するための手段】本発明は、成形母型とな
るスタンパーの裏面を研磨し、このスタンパーを真空成
膜室に位置付け、炭化水素ガスを主成分とする原料ガス
を導入し、これをイオン化させ、スタンパーの前記裏面
上に蒸着析出させてダイヤモンド状薄膜を被覆したスタ
ンパーを形成し、該スタンパーを成形金型キャビティー
内に支持させ、前記キャビティーに樹脂を射出すること
を特徴とする記録ディスクの成形方法を提供する。
According to the present invention, a back surface of a stamper serving as a molding master is polished, the stamper is positioned in a vacuum film forming chamber, and a raw material gas mainly composed of a hydrocarbon gas is introduced. To form a stamper coated with a diamond-like thin film by vapor deposition on the back surface of the stamper, supporting the stamper in a molding die cavity, and injecting a resin into the cavity. The present invention provides a method for molding a recording disk.

【0005】[0005]

【作用】本発明によると、成形母型となるスタンパーの
摩擦、摩耗を受ける裏面が強化されるために、耐摩耗性
が向上し、また低摩擦と成り、このためスタンパーの耐
用寿命が大幅に向上し、スタンパー裏面に傷がつかない
ので成形すべきディスク等の記録ディスクが接する母型
面の品質が低下せず、そのため記録ディスクの品質を長
時間維持することができる。
According to the present invention, since the back surface of the stamper, which is a forming mold, is subject to friction and wear, the wear resistance is improved and the friction is reduced, and the service life of the stamper is greatly increased. As a result, since the stamper back surface is not damaged, the quality of the master die surface with which the recording disk such as the disk to be formed comes in contact does not decrease, so that the quality of the recording disk can be maintained for a long time.

【0006】[0006]

【発明の実施の形態】本発明で使用するスタンパーは、
成形母型となるスタンパーの裏面にダイヤモンド状薄膜
を均一に形成したものであればどんな方法で成膜された
ものでも良い。しかし現在のところ実用的な成膜速度
で、充分に広い面積の、しかも充分に平滑なダイヤモン
ド状膜を成膜し得る方法はほとんど提供されていないの
で、以下に述べる方法を用いることが推奨される。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The stamper used in the present invention is as follows.
Any method may be used as long as a diamond-like thin film is uniformly formed on the back surface of a stamper serving as a molding master. However, at present, there is hardly provided a method capable of forming a diamond-like film having a sufficiently large area and a sufficient smoothness at a practical film forming rate. Therefore, it is recommended to use the method described below. You.

【0007】以下に本発明を詳しく説明する。本発明の
基本技術であるイオン化蒸着法は、特開昭58−174
507号公報、特開昭59−174508号等に記載さ
れており、本発明の実施例ではこれらの公報に記載され
た装置を基本とした方法及び装置を用いる。しかし、炭
化水素原料のイオン化とその加速ができるなら他の方式
のイオン化蒸着技術を用いてもよい。例えば、グロー放
電、マイクロ波、熱分解、衝撃波等の手段により炭化水
素のイオン化を行なうなどの方法が可能である。
Hereinafter, the present invention will be described in detail. The ionization deposition method, which is a basic technique of the present invention, is disclosed in Japanese Patent Application Laid-Open No. 58-174.
No. 507, JP-A-59-174508, and the like. In the embodiments of the present invention, a method and an apparatus based on the apparatuses described in these publications are used. However, other types of ionization vapor deposition techniques may be used as long as the ionization and acceleration of the hydrocarbon raw material can be performed. For example, a method of ionizing hydrocarbons by means such as glow discharge, microwave, pyrolysis, and shock wave is possible.

【0008】本発明の実施に当たっては、上記公報に記
載された方法及び装置をそのまま利用しても良く、ある
いは成膜場所を変え、あるいは成膜面積をイオンビーム
の操作により増大させ、あるいはダイヤモンド状膜の品
質を向上するためにイオン偏向を行なうように変更した
装置等を使用しても良い。同公報の装置を用いる場合に
は、熱フィラメントによる熱電子放出によって炭化水素
ガスが分解されて出来るガスには多くのイオン種、分解
されないで残る中性分子や原子、ラジカル等が含まれて
いる。例えば、通常用いられる原料であるメタンガスの
場合には熱フィラメントによる熱電子放出により形成さ
れるイオンは主としてCH4 +、CH3 +であり、ほかに少
量の、CH2 +、CH+ 、C+ 、H2 + とイオン化されな
い種々の形態の反応種すなわちラジカル、アニオン、炭
化物、或は未反応物等が含まれている。
In carrying out the present invention, the method and apparatus described in the above-mentioned publication may be used as they are, or a film-forming place may be changed, or a film-forming area may be increased by operating an ion beam, or a diamond-like film may be used. In order to improve the quality of the film, an apparatus modified to perform ion deflection may be used. In the case of using the apparatus disclosed in the publication, the hydrocarbon gas is decomposed by thermionic emission from the hot filament, and the resulting gas contains many ionic species, and neutral molecules, atoms, radicals, and the like that remain without being decomposed. . For example, in the case of methane gas, which is a commonly used raw material, ions formed by thermionic emission by a hot filament are mainly CH 4 + and CH 3 + , and a small amount of ions such as CH 2 + , CH + and C + , H 2 +, and various forms of reactive species, such as radicals, anions, carbides, or unreacted materials.

【0009】これらの粒子が一緒に基板に衝突するとイ
オンは分解されて炭素のみが残り所定のダイヤモンド構
造を発達させる。通常ダイヤモンド構造の発達は中性粒
子や雑多な種類のイオンの混在のために阻害され、結晶
は微粒子化する。しかしイオン化蒸着法を使用すると、
このような微結晶化は生ぜず表面平滑度の高いダイヤモ
ンド状薄膜が得られる。本発明でダイヤモンド状薄膜と
は、炭化水素を主成分とする原料ガスのイオン化蒸着に
より形成された炭素質薄膜又はそれと実質的に同一の薄
膜を指すものである。
When these particles collide with the substrate together, the ions are decomposed, leaving only carbon and developing a predetermined diamond structure. Normally, the development of the diamond structure is hindered by the mixture of neutral particles and various types of ions, and the crystals are reduced to fine particles. However, using ionization deposition,
Such microcrystallization does not occur, and a diamond-like thin film having a high surface smoothness can be obtained. In the present invention, the diamond-like thin film refers to a carbonaceous thin film formed by ionization deposition of a raw material gas containing a hydrocarbon as a main component or a thin film substantially the same as the carbonaceous thin film.

【0010】成膜装置 図2にスタンパー裏面8にダイヤモンド状薄膜を形成す
るための成膜装置の好ましい実施例を示す。この装置
は、実開昭59−174507号に記載されたイオン直
進型(図2)又はイオン偏向型(図3)のもの、その他
任意の装置を用いることができる。従ってここに記載し
ない成膜条件等については同公報を参照されたい。図2
を参照するに、図中10は真空容器であり、排気系18
に接続されて10-6Torr程度までの高真空に引かれ
る。12’は基板S(スタンパー)を支持するための基
板ホルダーであり、この場合電圧Vaのグリッド13が
イオンの流れを基板Sへ向けて加速する。14はフィラ
メントであり、交流電源によって加熱されて熱電子を発
生し、また負電位に維持されている。15は原料である
炭化水素ガスの供給口であり、入口17とプラズマ励起
室16’を有する。また、フィラメント14を取囲んで
対電極16が配置され、フィラメントとの間に電圧Vd
を与える。フィラメント14、対電極16を取り囲んで
イオン化ガスの閉じ込め用の磁界を発生する電磁コイル
19が配置されている。従ってVd、Va及びコイルの
電流を調製することにより膜質を変えることができる。
[0010] A preferred embodiment of a film formation apparatus for forming a diamond-like thin film on the stamper backside 8 to the film forming apparatus Figure 2. As this apparatus, an ion straight type (FIG. 2) or ion deflecting type (FIG. 3) described in Japanese Utility Model Application Laid-Open No. 59-174507, or any other apparatus can be used. Therefore, refer to the publication for film forming conditions and the like not described herein. FIG.
Referring to FIG. 1, reference numeral 10 denotes a vacuum vessel, and an exhaust system 18 is provided.
And a high vacuum of about 10 -6 Torr is applied. Reference numeral 12 'denotes a substrate holder for supporting the substrate S (stamper). In this case, the grid 13 of the voltage Va accelerates the flow of ions toward the substrate S. Reference numeral 14 denotes a filament which is heated by an AC power supply to generate thermoelectrons and is maintained at a negative potential. Reference numeral 15 denotes a supply port for a hydrocarbon gas as a raw material, and has an inlet 17 and a plasma excitation chamber 16 '. Further, a counter electrode 16 is arranged so as to surround the filament 14, and a voltage Vd
give. An electromagnetic coil 19 that surrounds the filament 14 and the counter electrode 16 and generates a magnetic field for confining the ionized gas is arranged. Therefore, the film quality can be changed by adjusting Vd, Va and the current of the coil.

【0011】成膜方法 上記図2の装置によって成膜方法を詳しく説明する。先
ず、真空容器10内を10-6Torrまで高真空とし、
バルブ22を操作して所定流量のメタンガスを導入しな
がら排気系18を調整して所定のガス圧例えば10-1
orrとする。一方、フィラメント14には交流電流I
fを流して加熱し、フィラメント14と対電極との間に
は電位差Vdを印加して熱フィラメントによる熱電子放
出を形成する。供給口15から真空容器10に供給され
たされたメタンガス等の炭化水素ガスはフィラメントか
らの熱電子と衝突してプラスの熱分解イオンと電子を生
じる。この電子は別の熱分解イオンと衝突する。このよ
うな現象を繰り返すことによりメタンガスは熱分解物質
のプラスイオンと成る。プラスイオンはグリッド13に
印加された負電位Vaにより加速され基板Sに向けて加
速される。なお、各部の電位、電流、温度等の条件につ
いては先に引用した特許公報のほか公知の資料を参照さ
れたい。なお、プラズマガスとしてはメタンガスのほか
低分子量の炭化水素、或はこれらの一種と酸素、窒素、
アルゴン、ネオン、ヘリウムなどを用いることができ
る。
[0011] will be described in detail film forming method by the apparatus of the film forming method FIG 2. First, the inside of the vacuum vessel 10 is set to a high vacuum up to 10 -6 Torr,
The exhaust system 18 is adjusted while operating a valve 22 to introduce a predetermined flow rate of methane gas, and a predetermined gas pressure, for example, 10 -1 T
orr. On the other hand, the filament 14 has an alternating current I
f, and heat is applied. A potential difference Vd is applied between the filament 14 and the counter electrode to form thermionic emission by the hot filament. Hydrocarbon gas such as methane gas supplied from the supply port 15 to the vacuum vessel 10 collides with thermoelectrons from the filament to generate positive pyrolysis ions and electrons. This electron collides with another pyrolysis ion. By repeating such a phenomenon, the methane gas becomes a positive ion of the thermal decomposition substance. The positive ions are accelerated by the negative potential Va applied to the grid 13 and accelerated toward the substrate S. For the conditions such as the potential, current, temperature, etc. of each part, please refer to publicly known materials in addition to the above-cited patent publications. In addition, as the plasma gas, in addition to methane gas, low molecular weight hydrocarbons, or one of them and oxygen, nitrogen,
Argon, neon, helium, or the like can be used.

【0012】[0012]

【実施例】以下に本発明の実施例を説明する。実施例1 表面にニッケルめっきを施し高度に研磨したスタンパー
を真空容器10の所定位置に配置し、図1の可動金型側
のスタンパー裏面8を基板Sとし、図2の真空容器10
内にアルゴンガスを導入し、10-2Torrとしてアー
ク放電を行なわせ基板の表面をボンバードした。次い
で、容器内のアルゴンガスを排気してからメタンガスを
導入しガス圧を10-1とした。電磁コイル19の磁束密
度は400ガウス、基板電圧−400V、基板温度20
0℃とした。またフィラメント14には電流25Aを流
した。膜厚が3μmの膜を生成させた。得られたスタン
パーを図1に示したレーザディスク用の射出成形装置に
組み込んで、圧力340kg/cm2 で繰り返して射出
成形を行なった。比較のため、ダイヤモンド状薄膜を被
覆しないスタンパーを用いて同様に射出成形を行なっ
た。従来法によりTiNを被覆したものについても同様
に射出成形を行なった。表1の結果を得た。
Embodiments of the present invention will be described below. Example 1 A stamper whose surface was nickel-plated and highly polished was placed at a predetermined position of a vacuum container 10, and the stamper back surface 8 on the movable mold side in FIG.
An argon gas was introduced thereinto, an arc discharge was performed at 10 −2 Torr, and the surface of the substrate was bombarded. Next, the argon gas in the container was exhausted, and then methane gas was introduced to adjust the gas pressure to 10 -1 . The magnetic flux density of the electromagnetic coil 19 is 400 gauss, the substrate voltage is -400 V, and the substrate temperature is 20
0 ° C. A current of 25 A was passed through the filament 14. A film having a thickness of 3 μm was produced. The obtained stamper was incorporated in the laser disk injection molding apparatus shown in FIG. 1, and injection molding was repeatedly performed at a pressure of 340 kg / cm 2 . For comparison, injection molding was similarly performed using a stamper that did not cover the diamond-like thin film. Injection molding was performed in the same manner for the one coated with TiN by the conventional method. The results in Table 1 were obtained.

【0013】[0013]

【表1】 [Table 1]

【0014】表から分かるように、本発明の成形用金型
は、ダイヤモンド状薄膜をスタンパーの裏面としたか
ら、スタンパーの寿命を大幅に延ばすことができた。ま
た、スタンパーに傷がつきにくいために、スタンパーの
母型表面の特性も低下しにくいので成形されるディスク
の品質も長期に良好であることが明らかである。以上の
ように本発明によれば、耐摩耗性及び摩擦抵抗の低いス
タンパーが提供され、スタンパーの長寿命化が達成し、
同一のスタンパーで多数のディスクを製造することがで
き、また成形コストの大幅な低減が達成し得る。
As can be seen from the table, in the molding die of the present invention, since the diamond-like thin film was used as the back surface of the stamper, the life of the stamper could be greatly extended. In addition, since the stamper is hardly damaged and the characteristics of the surface of the stamper die are hardly deteriorated, it is clear that the quality of the formed disk is good for a long period of time. As described above, according to the present invention, a stamper having low wear resistance and low frictional resistance is provided, and a longer life of the stamper is achieved.
A large number of disks can be manufactured with the same stamper, and a significant reduction in molding costs can be achieved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明が適用されるの成形金型の一例を示す断
面図である。
FIG. 1 is a sectional view showing an example of a molding die to which the present invention is applied.

【図2】本発明の方法を実施する装置を示す断面図の断
面図である。
FIG. 2 is a sectional view of a sectional view showing an apparatus for performing the method of the present invention.

【符号の説明】[Explanation of symbols]

1、17 スタンパー 2 可動側金型 3 樹脂供給口 4 外周リング部材 5 固定側金型 6 ゲート 7 成形キャビティー 10 真空容器 12 ゲート部材 18 排気系 14 フィラメント 15 原料供給口 16 対電極 18 排気系 19 電磁コイル Reference Signs List 1, 17 stamper 2 movable mold 3 resin supply port 4 outer ring member 5 fixed mold 6 gate 7 molding cavity 10 vacuum vessel 12 gate member 18 exhaust system 14 filament 15 material supply port 16 counter electrode 18 exhaust system 19 Electromagnetic coil

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI G11B 3/70 G11B 3/70 Z B29L 17:00 (72)発明者 田辺 宏 東京都中央区日本橋一丁目13番1号ティー ディーケイ株式会社内──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification code FI G11B 3/70 G11B 3/70 Z B29L 17:00 (72) Inventor Hiroshi Tanabe 1-13-1 Nihonbashi, Chuo-ku, Tokyo DK Corporation

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 成形母型となるスタンパーを真空成膜室
に位置付け、炭化水素ガスを主成分とする原料ガスを導
入し、これをスタンパーの裏面上に蒸着析出させてダイ
ヤモンド状薄膜を被覆したスタンパーを形成し、該スタ
ンパーを成形金型キャビティー内のスタンパー支持面に
支持させ、前記キャビティーに樹脂を射出することを特
徴とする記録ディスクの成形方法。
1. A stamper serving as a molding master is positioned in a vacuum film forming chamber, a raw material gas containing a hydrocarbon gas as a main component is introduced, and this is vapor-deposited and deposited on the back surface of the stamper to coat a diamond-like thin film. A method for forming a recording disk, comprising forming a stamper, supporting the stamper on a stamper support surface in a molding die cavity, and injecting resin into the cavity.
【請求項2】 炭化水素ガスを主成分とする原料ガスを
イオン化した後、スタンパーの前記裏面上に蒸着析出さ
せるものである請求項1の記録ディスクの成形方法。
2. The recording disk forming method according to claim 1, wherein a raw material gas mainly composed of a hydrocarbon gas is ionized and then vapor-deposited on the back surface of the stamper.
JP1631798A 1998-01-12 1998-01-12 Recording disk molding method Expired - Lifetime JP2857138B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1631798A JP2857138B2 (en) 1998-01-12 1998-01-12 Recording disk molding method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1631798A JP2857138B2 (en) 1998-01-12 1998-01-12 Recording disk molding method

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP63170849A Division JP2826827B2 (en) 1988-07-11 1988-07-11 Molding stamper and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH10202668A true JPH10202668A (en) 1998-08-04
JP2857138B2 JP2857138B2 (en) 1999-02-10

Family

ID=11913135

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1631798A Expired - Lifetime JP2857138B2 (en) 1998-01-12 1998-01-12 Recording disk molding method

Country Status (1)

Country Link
JP (1) JP2857138B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001019586A1 (en) * 1999-09-13 2001-03-22 Åmic AB A method for the manufacturing of a matrix and a matrix manufactured according to said method
KR100364136B1 (en) * 2000-06-07 2002-12-12 주식회사 제이 앤 엘 테크 Stamper-supporting mold coated with diamond-like carbon film for molding data-recording disks and its manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001019586A1 (en) * 1999-09-13 2001-03-22 Åmic AB A method for the manufacturing of a matrix and a matrix manufactured according to said method
KR100364136B1 (en) * 2000-06-07 2002-12-12 주식회사 제이 앤 엘 테크 Stamper-supporting mold coated with diamond-like carbon film for molding data-recording disks and its manufacturing method

Also Published As

Publication number Publication date
JP2857138B2 (en) 1999-02-10

Similar Documents

Publication Publication Date Title
US5112025A (en) Molds having wear resistant release coatings
US6086962A (en) Method for deposition of diamond-like carbon and silicon-doped diamond-like carbon coatings from a hall-current ion source
JP3589467B2 (en) Apparatus and method for sputtering carbon
IE20000800A1 (en) High Magnetic Flux sputter targets with varied magnetic permeability in selected regions
JP2794289B2 (en) Mold for molding and manufacturing method thereof
US5707717A (en) Articles having diamond-like protective film
JP2826827B2 (en) Molding stamper and manufacturing method thereof
JP2857138B2 (en) Recording disk molding method
JP3205363B2 (en) Mold with diamond-like protective film
US5288543A (en) Protective film on sliding members and method of forming same
JP3130094B2 (en) Mold with diamond-like protective film
JP2915001B2 (en) Recording / reproducing sliding member
JP3056827B2 (en) Article having a diamond-like carbon protective film and method for producing the same
Tada et al. Deposition of diamond-like carbon using compact electron-beam-excited plasma source
JPH10330946A (en) Thin coating forming device and formation of thin coating
JPH01234397A (en) Method and apparatus for producing diamond-like thin film
JPS61288069A (en) Diamond-like carbon film forming device
JPH03215671A (en) Cvd method and device by sheet plasma
JPH0380191A (en) Method for synthesizing thin diamond film
JP3485937B2 (en) Mold having protective film of diamond-like thin film and method of manufacturing the same
JP2717853B2 (en) Diamond-like thin film, manufacturing method and manufacturing apparatus
Naoe et al. Physics and technology of sputtering for depositing magnetic films
JPH0334619B2 (en)
JPH0379768A (en) Method and device for producing diamondlike thin film
JPH06280012A (en) Production of carbon coating film

Legal Events

Date Code Title Description
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 19981110

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20071127

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081127

Year of fee payment: 10

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081127

Year of fee payment: 10