TW529167B - Dual transistor SRAM cell and its operation method - Google Patents
Dual transistor SRAM cell and its operation method Download PDFInfo
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529167529167
529167 五、發明說明(2) 個電晶體細胞 徊电曲肢㈣…的細胞尺寸(cell size)合 取記憶體的1〇至I6倍大°因此’此作法不機' 間,且因使:六而造價較為昂貴。此外較i:i 技術亦趨進步,早位面積之元件增加,又, 田衣才 ,之靜態隨機存取記憶體在關閉時之整體漏㊁ 畐於預備電流’Stand by Current),合、生、 住記憶體」的現象。相較之T,當使用二:J : :「關: 胞時,雖然減少了記憶胞的細胞尺寸,σ H_體的記 壓值較高之充電電Μ(電源電壓加上電:2:必須使用電 聲(threshold voltage)),苴眉田日日-本身之起始電 身所儲存的電荷越多,越能預防儲' 在如果電容本 (1 eak ),而使得資料得以保全子”谷中電荷之遺漏 有鑑於此,本發明接彳址_ 機存取記憶胞,盥傳统靜^ A,用兩個電晶體之靜態隨 存取記憶體之使用動態隨::存取記憶胞以及靜態隨機 小細胞尺寸、低出太 子5己憶胞相比,其分別具有 點。故,此使二i Φ ϊ充電電壓以及小預備電流之優 代現行靜態隨機存;^曰f之靜態隨機存取記憶胞應可取 本發明憶胞於產業上之利用。 靜態隨機存取#二種兩電晶體之靜態隨機存取記憶胞,此 電容以及第二1ΐ胞包括第一電晶體、第二電晶體、第一 第二連接端谷。其中,第一電晶體異有第一連接端、 〜位元線,第一閘,端,第一電晶體之第一連接端耦接第 有第一遠技^ 一電晶體之閘極端耦接字元線。第一電容具 接而以及第二連接端。第一電容之第一連接端柄529167 V. Description of the invention (2) The cell size of the electric crystal cells is about 10 to 16 times as large as that of the memory. Therefore, 'this method is not possible', and because: Sixth, the cost is more expensive. In addition, compared with i: i technology, it also progresses, the components of the early area increase, and the overall leakage of Tian Yicai's static random access memory when it is turned off (Stand by Current). "Living memory" phenomenon. Compared with T, when using two: J :: "off: cells, although the cell size of the memory cell is reduced, the σ H_ body has a higher recorded voltage (power supply voltage plus electricity: 2 :: You must use electrical voltage (threshold voltage)). The more electric charges stored in the starting body of the electric motor, the more it can prevent the storage of the capacitor. (1 eak), so that the data can be preserved. " In view of this, the omission of the charge in the valley is in accordance with the present invention. The present invention accesses the memory cell, using the traditional static ^ A, using two transistors to follow the static memory access dynamics :: access to the memory cell and static Compared with the random small cell size, which is 5 times lower than that of Prince Edward, it has dots. Therefore, the two i Φ ϊ charging voltage and the small standby current are superior to the current static random storage; the static random access memory cell of f should be desirable for the industrial use of the present invention. Static random access #Two types of static random access memory cells with two transistors. The capacitor and the second cell include the first transistor, the second transistor, and the first and second connection terminal valleys. Among them, the first transistor has a first connection terminal, a bit line, a first gate, a terminal, and a first connection terminal of the first transistor is coupled to the first remote terminal of a transistor. Character lines. The first capacitor is connected to the second capacitor. First connecting end handle of first capacitor
529167529167
529167 五、發明說明(4) 源供應電壓切換炱細胞底材電壓, 記憶胞讀取前之狀態。 旖恶隨機存取 紅上所述,本發明藉由使用兩動態 以儲存於兩動態隨機存取記憶胞、子取记憶胞, 同,作為寫入資料之值的依據,並:二:荷電壓的不 電後,電容中之電荷電壓將景彡塑田凡線破預先充 降,作為讀取資料之值的判斷:^、、、^電壓是否被拉 尺寸、小充電電塵、低預備、、☆ 务明具有小細胞 利用效益。故,此使用兩個電:髀„本之其他產業 應可取代現行靜態隨機存 =體之砰恶隨機存取記憶胞 標號說jg 圮憶胞。 1 0 0 :細胞 101 , 105 : NMOS 電晶體 103,107 :電容 BL :第一位元線 BLB :第二位元線 WL :字元線 SN1 ··第一儲存節點 SN2 :第二儲存節點 較佳實施倒 請參考第1圖,第1闰 一 中之靜熊隨機存取4己化圖繪示的是根據本發明較佳實施例 記憶胞100包括以及二胞之簡單電路圖。此靜態隨機存取 m、m之間極皆輕接&!03、107。其中,NM0S電晶體 不两接予元線WL,NMOS電晶體101、105之529167 V. Description of the invention (4) The source supply voltage switches the cell substrate voltage to memorize the state before the cell reads. As mentioned above, the present invention uses two dynamics to store in two dynamic random access memory cells and sub-fetch memory cells. At the same time, as the basis for writing data values, and: After the voltage is de-energized, the charge voltage in the capacitor will charge and drop the Jingye Sutian Fan line in advance to determine the value of the read data: ^, ,, ^ Whether the voltage is pulled, small charging dust, low reserve , ☆ Wu Ming has small cell utilization benefits. Therefore, two batteries are used for this purpose: 髀 „The other industries of the book should be able to replace the current static random access memory, the random access memory cell label, and jg 圮 memory cell. 1 0 0: Cell 101, 105: NMOS transistor 103, 107: Capacitor BL: First bit line BLB: Second bit line WL: Word line SN1 ································· The first storage node SN2: the second storage node. The first picture of the static bear random access 4 is a simple circuit diagram of a memory cell 100 and a second cell according to a preferred embodiment of the present invention. The static random access m and m are both lightly connected & 03, 107. Among them, the NM0S transistor is not connected to the element line WL, the NMOS transistor 101, 105
l^〇4()twf pull ^ 〇4 () twf pul
第8頁 529167 五、發明說明(5) 第一連接端分別耦接第一位元線虬以Page 8 529167 V. Description of the invention (5) The first connection terminals are respectively coupled to the first bit line.
NMOS電晶體101、1〇5之繁_ 弟一位兀線BLB 接地)〜=、、、田胞底材(CeU plate )電壓VCP (通常為 則為叙接作r妓第一位元線BL與第二位元線BLB之另一端 則為耦接感應放大器。 敘述ίΐ較Ϊ實施例中,細胞100之寫入與讀取之方法將 將由L接±士雷二細胞100於寫入模式時,字元線WL上之電壓The NMOS transistor 101, 105 is complicated _ brother one wire BLB ground) ~ = ,,, field cell substrate (CeU plate) voltage VCP (usually it is the first bit line BL for prostitutes) The other end of the second bit line BLB is coupled to a sense amplifier. In the comparative example, the method of writing and reading the cell 100 will be connected from L to the ± Rayleigh cell 100 in the writing mode. , The voltage on the word line WL
雪呢雷茂vnifGN^被切換為此靜態隨機存取記憶體之供應 二、、^ 、(若以動態隨機存取記憶胞設計,字元線WL ^、被切換為供應電源電壓VDD +動態隨機存取記憶胞中 電晶體之起始電壓(thresh〇ld v〇ltage))。而第一位 兀與第+二位元線BLB上之電壓則根據欲寫入之資料 (貝料0或貝料1 ),分別供以供應電源電壓vdd或是接地 電壓㈣。舉例來說,請同時參考幻圖以及第2圖,其 中,第2圖繪示的是根據本發明較佳實 ;取記,胞上寫入資則時之時脈圖。當欲寫入:;;= 二貝料1日守’子元線WL上之電壓為由接地電壓⑽^被推昇至供 應電源電壓VDD,而第一位元線BL上之電壓由接地電壓GND 被推昇至供應電源電壓VDD,第二位元線上之電壓由供應 電源電壓VDD拉降至接地電壓GND。在此情況下,熟悉此技 藝f可知,NMOS電晶體ΐ(π導通(on ),電容1〇3開始儲存 電荷,且根據第一位元線BL上之電壓變化,電容丨〇 3所儲 存之電荷電壓(第一儲存節點SN1之電壓)由接地電壓增 加至供應電源電壓VDD減去NM0S電晶體丨〇1之起始電壓V1^Sherlock Leimau vnifGN ^ is switched to this static random access memory supply II ,, ^, (if designed with a dynamic random access memory cell, the character line WL ^, is switched to supply power voltage VDD + dynamic random Access the initial voltage of the transistor in the memory cell (threshold v0ltage)). The voltages on the first and second bit lines BLB are respectively supplied with the power supply voltage vdd or the ground voltage 根据 according to the data to be written (shell material 0 or shell material 1). For example, please refer to both the magic map and the second diagram. Among them, the second diagram shows the best practice according to the present invention; taking notes, writing the timing diagram of the capital on the cell. When you want to write: ;; == the voltage on the sub-element line WL on the 1st day is boosted to the supply voltage VDD by the ground voltage ⑽ ^, and the voltage on the first bit line BL is determined by the ground voltage GND is pushed up to the supply voltage VDD, and the voltage on the second bit line is pulled down from the supply voltage VDD to the ground voltage GND. In this case, if you are familiar with this technique f, you can see that the NMOS transistor ΐ (π is on), the capacitor 103 starts to store charge, and according to the voltage change on the first bit line BL, the capacitor The charge voltage (the voltage of the first storage node SN1) is increased from the ground voltage to the supply voltage VDD minus the initial voltage V1 of the NM0S transistor. 〇1 ^
^)()4()twi ptd^) () 4 () twi ptd
五、發明說明(6) (VDD — VTN )。至於NMOS電晶體105,則亦為導通,根 第二位元線BLB上之電壓變化,電容器丨〇7所儲存之電^ 壓(第二儲存節點SN2之電壓)由〇])—VTN被拉降至 電壓GND。字元線WL上之電壓被推昇至供應電源電壓vdd — 段時間後’即由供應電源電壓VDD再被拉降至接地電遷 GND,以關閉NMOS電晶體1 〇1、1 05,而保留住儲存在六 器1 0 3、1 0 7中之電荷。以上即完成細胞丨〇 〇寫入資料工之仏 作。同理,亦可瞭解細胞丨〇〇寫入資料〇之動作。、 當細胞1 0 0於讀取模式時,第一位元線BL與第二位元 線BLB上之電壓皆被預先充電且平衡至供應電源電壓dd。 而字兀線WL上之電壓則仍將由接地電壓GND被切換為供應 電源電壓VDD。請同時參考第1圖以及第3圖,其中,第3圖 繪:的是根據本發明較佳實施例中之靜態隨機存取記憶胞 之讀取貧料1時之時脈圖。當讀取資料i時,第一位元線儿 與Ϊ二位兀fBLB上之電壓受感應放大器控制,於感應放 大器感應致能時(感應致能電壓為接地電壓GND時),皆 被預先充電且平衡至供應電源電壓VDD。接下來,字元線 WL上之電壓由接地電壓GND被切換為供應電源電壓Dp,此 時,NMOS電晶體101、NM〇s電晶體1〇5皆導通,此時由於第 一儲存節點SN1之電壓為VDD _VTN,因&,第一位元線虬 上=電壓將仍為供應電源電壓VDD。相反地,由於第二儲 f =點SN2之電壓為接地電壓GND,且第二位元線blb上之 電何需均勻4分佈,因此,當電容1 〇 7開始接受第二位元線 BLB上之電荷而進行充電時,第二位元線上之電壓將被 529167 五、發明說明(7) 拉降至略低於VDD,而第二儲存節點SN2最後所儲存之電 壓,會因為當初第二位元線BLB預先充電時之電荷量不 足,而停留在略低於VDD ~ VTN。 在第一儲存節點SN1之電壓為VDD _VTN、第二儲存節 點SN2气電壓略低於VDD—VTN期間,感應放大器感應致能 以感應第一位元線BL及第二位元線πβ上之電壓。感應放 大态,由感應時第一位元線儿上電壓(供應電源電壓”〇 )及第二位元線BLB上電壓(略低於供應電源電壓)之不 同丄分辨出細胞100此時所儲存之資料為資料丨。當感應放 大,分辨出細胞1 〇〇此時所儲存之資料為資料i後,感應放 大器感應禁能,其感應致能電壓由接地電壓GND被切換為 電源供應電壓VDD,此即為將其耦接之第一位元線虬以及 第二位元線BLB上之電位,分別維持在供應電源電壓VDD以 及拉降至接地電壓GND,電容103、107所儲存之電荷電壓 因此分別維持在VDD—VTN以及拉降至接地電壓GND,即第 一儲存節點SN1與第二儲存節點SN2之電壓恢復在未開始讀 取時之電壓。最後,字元線叽上之電壓由供應電源電壓靖 VDD被切換為接地電壓GND,NM〇s電晶體1〇1、1〇5關閉,而 保留住儲存於電容器103、1〇7中之電荷,以 f點SN1與第二儲存節點SN2之在未讀取時之電壓。以上^ =成=胞1 0 0讀取資料1之動作。同理,亦可瞭解細胞1 〇 〇 讀取資料0之動作。此外,感應放大器隨著字元線叽上之 電覆被切換為接地電壓⑽!)後感應致能,即將第一位元線 BL u及第二位元線BLB預先充電且平衡至供應電源電壓V. Description of the invention (6) (VDD — VTN). As for the NMOS transistor 105, it is also turned on. The voltage on the second bit line BLB changes. The voltage stored in the capacitor (the voltage of the second storage node SN2) is drawn from 〇]) — VTN. Drop to voltage GND. The voltage on the word line WL is pushed up to the supply voltage vdd — after a period of time, the supply voltage VDD is then pulled down to the ground voltage GND to turn off the NMOS transistor 1 01, 1 05, and it is retained. The charge stored in the six devices 10 3, 107. This completes the work of writing data into cells. In the same way, you can understand the movement of the cell 丨 〇〇 writing data 〇. When the cell 100 is in the reading mode, the voltages on the first bit line BL and the second bit line BLB are precharged and balanced to the supply voltage dd. The voltage on the word line WL will still be switched from the ground voltage GND to the supply voltage VDD. Please refer to FIG. 1 and FIG. 3 at the same time. Among them, FIG. 3 is a timing diagram of reading the lean material 1 in the static random access memory cell according to the preferred embodiment of the present invention. When reading data i, the voltages on the first bit line and the second bit fBLB are controlled by the sense amplifier. When the sense amplifier is enabled by induction (when the induced voltage is the ground voltage GND), it is precharged. And balanced to the supply voltage VDD. Next, the voltage on the word line WL is switched from the ground voltage GND to the supply voltage Dp. At this time, both the NMOS transistor 101 and the NMOS transistor 105 are turned on. The voltage is VDD_VTN. Because of &, the voltage on the first bit line = voltage will still be the supply voltage VDD. On the contrary, since the voltage of the second storage f = point SN2 is the ground voltage GND, and the electricity on the second bit line blb needs to be evenly distributed, when the capacitor 107 starts to accept the second bit line BLB, When the charge is charged, the voltage on the second bit line will be pulled down to 529167 by the 529167 V. Invention description (7), and the last voltage stored by the second storage node SN2 will be The charge amount of the element line BLB is insufficient when it is pre-charged, and stays slightly below VDD ~ VTN. During the period when the voltage of the first storage node SN1 is VDD_VTN and the gas voltage of the second storage node SN2 is slightly lower than VDD-VTN, the sense amplifier is enabled to sense the voltages on the first bit line BL and the second bit line πβ. . Inductive amplification state, the difference between the voltage on the first bit line (supply power supply voltage) and the voltage on the second bit line BLB (slightly lower than the supply power voltage) at the time of induction. The data is data 丨. When the inductive amplification recognizes that the cell 1 00 is stored at this time as the data i, the sense amplifier is disabled, and its induced enable voltage is switched from the ground voltage GND to the power supply voltage VDD. This is the potential on the first bit line 虬 and the second bit line BLB, which are coupled to them, and are respectively maintained at the supply voltage VDD and pulled down to the ground voltage GND. The charge voltages stored in the capacitors 103 and 107 are therefore It is maintained at VDD-VTN and pulled down to the ground voltage GND, that is, the voltages of the first storage node SN1 and the second storage node SN2 are restored to the voltages when reading has not started. Finally, the voltage on the word line 叽 is supplied by the power The voltage VDD is switched to the ground voltage GND, the NMOS transistor 101, 105 is turned off, and the charge stored in the capacitors 103 and 107 is retained, and the point f between SN1 and the second storage node SN2 is retained. When unread The voltage above. ^ = 成 = cell 1 0 0 to read data 1. The same way, you can also understand the action of cell 1000 to read data 0. In addition, the sense amplifier follows the electrical line on the word line 覆. It is switched to the ground voltage ⑽!), And the induction is enabled, that is, the first bit line BL u and the second bit line BLB are precharged and balanced to the supply voltage.
I 9040 twf ptLi 第11頁 529167 五、發明說明(8) VDD,以讀取下一週期細胞j 綜合上述,本發明提供 fe胞之靜態隨機存取記憶胞 機存取記憶胞中電容所儲存 讀取資料時之依據。因此, 體’本發明之使用兩電晶體 作方法,除了具有小細胞尺 因為此細胞構成元件較少, ,小以及實際成本低等其他 隨機存取記憶胞於產業上之 雖然本發明已以較佳實 限定本發明,任何熟習此技 =範圍内,當可作各種之更 1已圍當視後附之申請專利範 00所儲 —種使 ,及其 之電荷 相較於 之靜態 寸、充 又具有 優勢。 利用。 施例揭 藝者, 動與潤 圍所界 存之資料。 用兩個動態 使用方法, 電壓不同, 習知靜態隨 (¾機存取記 電電壓低之 整體漏電流 故’應可取 露如上,然 在不脫離本 飾,因此本 定者為準。 隨機存取記 藉由動態隨 作為寫入或 機存取記憶 憶胞及其操 優勢外,更 小、預備電 代現行靜態 其並非用以 發明之精神 發明之保護I 9040 twf ptLi Page 11 529167 V. Description of the invention (8) VDD to read the next cycle cell j In summary, the present invention provides a static random access memory cell for the fe cell to access the storage stored in the capacitor in the memory cell. Basis for obtaining information. Therefore, the present invention uses a two-electron crystal as a method, in addition to having a small cell ruler because this cell has fewer components, is small, and the actual cost is low, and other random access memory cells are used in the industry. Jiashi limited the present invention. Anyone familiar with this technique = within the scope, can be used as a variety of changes 1 has been included in the attached patent application 00 is stored-a kind of, and its charge compared to the static inch, charge Has advantages. use. Exemplified by the artist, move and run the data in the boundary. With two dynamic use methods, the voltages are different, and the static leakage current is low. The overall leakage current is low, so it should be exposed as above, but it will not depart from the decoration, so this will prevail. Random access In addition to the advantages of dynamic random writing or memory access to the memory cell and its operational advantages, the smaller, ready to replace the current static, it is not the protection of the spirit of the invention.
第12頁 529167 圖式簡單說明 為讓本發明之上述和其他目的、特徵、和優點能更明顯易 懂,下文特舉較佳實施例,並配合所附圖式,作詳細說明 如下: 圖式之簡單說明: 第1圖繪示的是根據本發明較佳實施例中之靜態隨機 存取記憶胞之簡單電路圖; 第2圖繪示的是根據本發明較佳實施例中之靜態隨機 存取記憶胞之寫入資料1時之時脈圖;以及 第3圖繪示的是根據本發明較佳實施例中之靜態隨機 存取記憶胞之讀取資料1時之時脈圖。Page 529167 Brief description of the drawings In order to make the above and other objects, features, and advantages of the present invention more comprehensible, the preferred embodiments are described below in detail with the accompanying drawings, as follows: Brief description: Figure 1 shows a simple circuit diagram of a static random access memory cell according to a preferred embodiment of the present invention; Figure 2 shows a static random access memory according to a preferred embodiment of the present invention The clock diagram of the memory cell at the time of writing data 1; and FIG. 3 shows the clock diagram of the data at the time of reading data 1 of the static random access memory cell according to the preferred embodiment of the present invention.
9040t\v( . ptd 第13頁9040t \ v (.ptd p. 13
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TW91108949A TW529167B (en) | 2002-04-30 | 2002-04-30 | Dual transistor SRAM cell and its operation method |
JP2003123869A JP2004039208A (en) | 2002-04-30 | 2003-04-28 | Static random access memory cell of two transistor and its driving method |
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TW91108949A TW529167B (en) | 2002-04-30 | 2002-04-30 | Dual transistor SRAM cell and its operation method |
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US9762246B2 (en) | 2011-05-20 | 2017-09-12 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device with a storage circuit having an oxide semiconductor |
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