TW495485B - Fine particle, sol having fine particles dispersed, method for preparing said sol an - Google Patents

Fine particle, sol having fine particles dispersed, method for preparing said sol an Download PDF

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TW495485B
TW495485B TW88122308A TW88122308A TW495485B TW 495485 B TW495485 B TW 495485B TW 88122308 A TW88122308 A TW 88122308A TW 88122308 A TW88122308 A TW 88122308A TW 495485 B TW495485 B TW 495485B
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Taiwan
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silica
sol
fine particles
patent application
particles
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TW88122308A
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Chinese (zh)
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Hiroyasu Nishida
Mitsuru Nakai
Michio Komatsu
Hiroo Yoshitome
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Catalysts & Chem Ind Co
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經濟部智慧財產局員工消費合作社印製 495485 A7 ______ B7 五、發明說明(1 ) 技術領域 本發明爲關於多孔質複合氧化物粒子之表面,以矽石 系無機氧化物層予以覆被之微粒子。又,本發明爲關於前 述微粒子於分散媒體中分散之溶膠及其製造方法,於表面 形成含有該微粒子之防止反射被膜之基材。 背景技術 本發明者等人先前進行關於比表面積大之多孔質微粒 子分散之砂溶膠,砂石-氧化銘、砂石-氧化銷等複合氧 化物溶膠之發明(日本特開平5 — 1 3 2 3 0 9號公報) 。該複合氧化物溶膠利用其多孔質之性質,除了觸媒以外 亦可使用於粘合劑、吸附劑、低折射率之充塡劑等各種用 途。 又,已知爲了防止玻璃、塑膠片等基材表面之反射, 乃於其表面形成防止反射膜,例如,經由塗覆法、澱積法 、C V D法等,於玻璃和塑膠片之表面形成氟樹脂、氟化 鎂般之低折射率物質之被膜。但是,此些方法爲費用昂貴 並且於耐久性等亦具有問題。 將含有矽石微粒子之塗佈液於玻璃表面塗佈,並以石夕 石微粒子形成微細且具有均勻凹凸之防止反射被膜之方法 亦爲已知。但是,此方法爲在矽石微粒子所形成之凹凸面 上,利用光之亂反射減低正反射,並且利用微粒子間隙所 產生之空氣層防止反射,但粒子難於基材表面固定化且難 形成單層膜,故無法輕易控制表面的反射率。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -4 - -----Ί---*5------------訂---------線·^^· (請先閱讀背面之注咅?事項再填寫本頁) 495485 經濟部智慧財產局員工消費合作社印製 A7 ______Β7____ 五、發明說明(2 ) 更且’本發明者等人已提案令多孔性微粒子表面,以 矽石完全覆被之低折射率之複合氧化物微粒子被分散之溶 膠(日本特開平7 - 1 3 3 1 0 5號公報)。但是,爲了 令微粒子完全覆被,必須具有再度的覆被工程及熱處理工 程,並且加上於覆被粒子內封入水、醇類等溶劑,故於折 射率之降低上具有限度。又,令該粒子於樹脂等中分散所 得之薄膜、樹脂板等,於樹脂與粒子之密合性低,且在防 止反射膜之強度上亦判知具有困難點。 本發明者於日本特開平1 〇 - 1 9 4 7 2 1號公報, 日本特開平1 0 — 4 5 4 0 3號公報中,揭示含有直接結 合至矽之有機基之矽石粒子,爲與有機溶劑和樹脂之親和 性高’且,於水中可輕易地單分散。該矽石粒子雖然難引 起與樹脂混合成型之成型物上脫落粒子,但並無法完全防 止脫落。又,於使用作爲折射率調整用之充塡劑時,亦無 法充分取得低折射率。 更且,即使於玻璃和塑膠片等基材表面上,使用矽石 、氟樹脂、化鎂等低折射率材料,於基材上形成被膜, 亦與低折射率材料所構成之被膜與基材無相溶性(親和性 )時,與基材之密合性差。又,根據使用之基材,而有防 止反射之性能不夠充分之情況。 發明之揭示 本發明爲以提供多孔質複合氧化物粒子之表面,以多 孔質矽石系無機氧化物層予以覆被之各種微粒子構造爲其 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 丨^----ΙΊ---!------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 495485 經濟部智慧財產局員工消費合作社印制衣 A7 _____H7 —_ 五、發明說明(3 ) 目的。 又,本發明爲以提供將前述微粒子分散之溶膠及其製 造方法,及,於基材表面形成含有該微粒子之被膜’且爲 低折射率、與樹脂之密合性、強度、防止反射能力等優之 附有被膜之基材爲其目的。 本發明之微粒子爲矽石與矽石以外之無機氧化物所構 成之多孔質的複合氧化物粒子,且爲被厚度〇 · 5〜2 0 n m之多孔質矽石系無機氧化物層所覆被爲其特徵。 前述矽石系無機氧化物層之最大細孔徑爲以〇 · 5〜 5 n m爲佳。. 前述微粒子於矽石以S i ◦ 2表示,矽石以外之無機氧 化物以M〇x表示時之莫耳比ΜΟχ/S i〇2爲在 〇.0〇〇1〜0.2之範圍爲佳。 前述微粒子以細孔容積爲0 . 1〜1 · 5 c c / g爲 佳,且該微粒子表面再具有第2矽石覆被層爲佳。 前述微粒子爲以含有直接結合至矽之有機基爲佳,且 該有機基之直接結合矽之莫耳數(S R )與全部矽之莫耳數 (St)之比Sr/St爲以〇·〇〇 1〜〇 · 9爲佳。 本發明之微粒子分散溶膠之製造方法其特徵爲由下述 工程(a )〜工程(c )所組成。 (a )將砂酸鹽之水溶液和/或酸性砂酸液、與具有 化學式(1 )所示有機矽化合物之水解物、與鹼性可溶之 無機化合物水溶液’於Ρ Η 1 〇以上之鹼性水溶液、或視 需要分散種粒子之Ρ Η 1 0以上之鹼性水溶液中,同時添 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -----.1---1-----------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 495485 A7 B7 五、發明說明(4 ) 加調製成該粒子前質分散液之工程 (請先閱讀背面之注咅?事項再填寫本頁) (b )於前述核粒子前質分散液中’添加矽石源或石夕 石源與矽石以外之無機化合物鹽之水溶液,並於核粒子前 質中形成第一矽石系覆被層之工程 (c )於前述分散液中加酸’並由構成前述核粒子前 質之元素中,選擇除去至少一部分矽和氧以外元素之工程 R 丨I S i X ( 4 Π ) ......... ( 1 ) 〔但,R :碳數1〜1 0個之非取代或經取代烴基、 X :碳數1〜4個之烷氧基、矽烷醇基、鹵素或氫、η : 1〜3〕 又,於前述工程(c )所得之微粒子分散溶膠中,添 加鹼性水溶液,化學式(2 )所示之有機矽化合物和/或 其部分水解物,並於該微粒子上形成第二矽石覆被層爲佳 〇 R " S i X ( 4 η ) ......... ( 2 ) 〔但,R :碳數1〜1 0個之非取代或經取代烴基、 X :碳數1〜4個之烷氧基、矽烷醇基、鹵素或氫、η : 〇〜3〕 經濟部智慧財產局員工消費合作社印製 更且,將形成第二矽石覆被層之微粒子的分散溶膠, 於5 0 °C〜3 5 0 °C加熱處理,令第二矽石覆被層之細孔 消失爲佳。 本發明之被膜基材其特徵爲於基材表面,形成含有前 述微粒子及被膜形成用基體之被膜。 前述基材之折射率以1 . 6 0以上爲佳。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 495485 A7 B7 五、發明說明(5 ) 於前述基材之折射率爲1 . 6 0以下之情形中’較佳 (請先閱讀背面之注意事項再填寫本頁) 於含有前述本發明微粒子之表面被膜下,具有折射率爲 1 · 6 〇以上之中間被膜。該中間被膜較佳含有3 0〜 9 5重量%之平均粒徑爲5〜1 0 0 nm之金屬氧化物微 粒子。 寰施發明之最佳型態 以下,說明本發明之較佳實施型態。 (1 )微粒子 於本發明之微粒子核中,使用矽石與矽石以外之無機 氧化物所構成之多孔質複合氧化物粒子。無機氧化物可列 舉--種或二種以上之A 1 2〇3、 B2〇3、T i〇2、Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 495485 A7 ______ B7 V. Description of the Invention (1) Technical Field The present invention relates to the surface of porous composite oxide particles, which are covered with silica-based inorganic oxide layers. The present invention also relates to a sol in which the fine particles are dispersed in a dispersion medium, and a method for producing the sol. A base material containing the fine particles and an antireflection coating is formed on a surface. BACKGROUND OF THE INVENTION The present inventors have previously invented composite oxide sols such as sand sols, sand gravels-oxides, sand gravels-oxidation pins, and the like dispersed with porous fine particles having a large specific surface area (Japanese Patent Laid-Open No. 5-1 3 2 3 0 Bulletin 9). The composite oxide sol can be used in various applications such as a binder, an adsorbent, and a low-refractive charge filler in addition to a catalyst because of its porous nature. In addition, in order to prevent reflection on the surface of a substrate such as glass or a plastic sheet, it is known that an antireflection film is formed on the surface. For example, fluorine is formed on the surface of a glass or a plastic sheet by a coating method, a deposition method, a CVD method, or the like. Coating of resin, low refractive index material like magnesium fluoride. However, these methods are expensive and have problems in durability and the like. It is also known to apply a coating liquid containing silica fine particles on a glass surface, and form fine anti-reflection coatings having uniform unevenness with the fine particles of syrup. However, this method uses the irregular reflection of light to reduce the regular reflection on the uneven surface formed by the silica particles, and uses the air layer generated by the gap between the particles to prevent the reflection, but the particles are difficult to immobilize on the surface of the substrate and it is difficult to form a single layer. Film, so the reflectivity of the surface cannot be easily controlled. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -4------ Ί --- * 5 ------------ Order ---- ----- line · ^^ · (Please read the note on the back? Matters before filling out this page) 495485 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 ______ Β7 ____ V. Description of the invention (2) Furthermore, the invention Sol et al. Have proposed a sol in which low-refractive-index composite oxide fine particles completely covered with silica are dispersed on the surface of porous fine particles (Japanese Patent Application Laid-Open No. 7-1 3 3 105). However, in order to completely cover the fine particles, it is necessary to have a coating process and a heat treatment process again, and a solvent such as water or alcohol is sealed in the coating particles, so there is a limit in reducing the refractive index. In addition, films and resin plates obtained by dispersing the particles in a resin or the like have low adhesion to the resin and the particles, and it is difficult to determine the strength of the antireflection film. The present inventors disclosed in Japanese Patent Application Laid-Open No. 10- 1 9 4 7 2 1 and Japanese Patent Application Laid-Open No. 10- 4 5 4 0 3 that silica particles containing an organic group directly bonded to silicon are disclosed. Organic solvents and resins have high affinity, and can be easily monodispersed in water. Although the silica particles are difficult to cause the particles to fall off from the molded product mixed with the resin, they cannot completely prevent the particles from falling off. In addition, when using a filler for adjusting the refractive index, a low refractive index cannot be obtained sufficiently. Furthermore, even on the surface of substrates such as glass and plastic sheets, low-refractive-index materials such as silica, fluororesin, and magnesium oxide are used to form coatings on the substrates, as well as films and substrates composed of low-refractive-index materials. When there is no compatibility (affinity), the adhesion to the substrate is poor. In addition, depending on the substrate used, the performance of preventing reflection may be insufficient. DISCLOSURE OF THE INVENTION The present invention is to provide a surface of porous composite oxide particles, and a variety of fine particle structures covered with a porous silica-based inorganic oxide layer. The paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) 丨 ^ ---- ΙΊ ---! ------------ Order --------- line (Please read the notes on the back before filling in this Page) 495485 Printed clothing A7 of the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs _____H7 —_ 5. Description of the invention (3) Purpose. In addition, the present invention is to provide a sol in which the fine particles are dispersed, a method for producing the same, and forming a film containing the fine particles on the surface of a substrate, and having a low refractive index, adhesion to a resin, strength, anti-reflection ability, and the like. Excellent substrates with coatings are used for this purpose. The fine particles of the present invention are porous composite oxide particles composed of silica and inorganic oxides other than silica, and are covered with a porous silica-based inorganic oxide layer having a thickness of 0.5 to 20 nm. For its characteristics. The maximum pore diameter of the silica-based inorganic oxide layer is preferably from 0.5 to 5 nm. The aforementioned fine particles are expressed as Si ◦ 2 in the silica, and the molar ratio M0x / S i〇2 of the inorganic oxides other than silica expressed as Mox is preferably in the range of 0.001 to 0.2. . The fine particles preferably have a pore volume of 0.1 to 1.5 c c / g, and the fine particles preferably have a second silica coating layer on the surface. It is preferable that the microparticles contain an organic group directly bonded to silicon, and the ratio of the molar number (SR) of the directly bonded silicon of the organic group to the molar number (St) of all silicon is Sr / St. 〇1 ~ 09 is preferable. The method for producing a microparticle-dispersed sol of the present invention is characterized by being composed of the following processes (a) to (c). (a) An aqueous solution of an oxalate and / or an acidic oxalic acid solution, a hydrolysate of an organic silicon compound having the chemical formula (1), and an aqueous solution of an inorganic compound that is soluble in alkali, at a base of P Η 10 or more. Aqueous aqueous solution, or alkaline aqueous solution in which P Η 10 or more is dispersed as needed, and the paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) -----. 1- --1 ----------- Order --------- line (please read the notes on the back before filling this page) 495485 A7 B7 V. Description of the invention (4) plus modulation The process of forming the particle precursor dispersion (please read the note on the back? Matters before filling out this page) (b) 'Add a silica source or a stone evening source and other silica to the core particle precursor dispersion The process of forming an aqueous solution of an inorganic compound salt and forming a first silica-based coating in the precursor of the core particles (c) adding an acid to the aforementioned dispersion and selecting and removing from the elements constituting the precursor of the nuclear particles Engineering of at least a part of elements other than silicon and oxygen R 丨 IS i X (4 Π) ......... (1) [However, R: a non-substituted or Substituted hydrocarbyl group, X: alkoxy group having 1 to 4 carbon atoms, silanol group, halogen or hydrogen, η: 1 to 3] In addition, an alkaline aqueous solution is added to the fine particle dispersed sol obtained in the aforementioned process (c), It is preferable that the organosilicon compound represented by the chemical formula (2) and / or a partial hydrolyzate thereof, and a second silica coating layer be formed on the fine particles. R " S i X (4 η) ... ... (2) [However, R: an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, X: an alkoxy group, silanol group, halogen or hydrogen having 1 to 4 carbon atoms, η: 〇 ~ 3] Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, and it will form a dispersed sol of fine particles of the second silica coating layer, and heat treatment at 50 ° C ~ 350 ° C to make the second silica It is better that the pores of the coating layer disappear. The film substrate of the present invention is characterized in that a film containing the fine particles and a substrate for film formation is formed on the surface of the substrate. The refractive index of the aforementioned substrate is preferably 1.6 or more. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 495485 A7 B7 V. Description of the invention (5) In the case where the refractive index of the aforementioned substrate is below 1.6, it is better (please (Please read the precautions on the back before filling in this page). Under the surface coating containing the fine particles of the present invention, it has an intermediate coating with a refractive index of 1.60 or more. The intermediate film preferably contains 30 to 95% by weight of metal oxide fine particles having an average particle diameter of 5 to 100 nm. Best Modes of Huanshi Invention Hereinafter, preferred embodiments of the invention will be described. (1) Fine particles In the fine particle core of the present invention, porous composite oxide particles composed of silica and inorganic oxides other than silica are used. Inorganic oxides can be listed-one or two or more of A 1 2 03, B 2 03, T 102.

Zr〇2、 Sn〇2、 C e 2 0 a , P2〇5、 Sb2〇3、Zr〇2, Sn〇2, C e 2 0 a, P205, Sb203,

Mo〇3、 Zn〇2、W〇3等。二種以上之無機氧化物可 列示Ti〇2 — Al2〇3、 Ti〇2— Zr〇2等。 經濟部智慧財產局員工消費合作社印製 核粒子於矽石成分以S i Ο 2表示、矽石以外之無機氧 化物以Μ〇X表示時之莫耳比Μ〇X / s i〇2爲以 0 · 05〜2 · 0之範圍爲佳。M〇x/S i〇2未滿 〇· 0 5 ,則後述之細孔容積無法充分變大,且折射率之 降低不足,另一方面,“〇\/3丨〇2若超過2.0,則 所得溶膠之安定性降低,故爲不佳。 核粒子之表面爲以矽石系之無機氧化物層予以覆被。 此處所謂之矽石系之無機氧化物層,爲包含①矽石單一層 -8 - 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 經濟部智慧財產局員工消費合作社印製 495485 Α7 Β7 五、發明說明(6 ) 、②矽石與矽石以外之無機氧化物所構成之複合氧化物之 單一層,及,③前述①層與②層之雙層。 本發明中,前述覆被層之厚度必須在〇·5〜20 n m之範圍。覆被層之厚度未滿0 · 5 n m,則難取得覆 被效果,且具體而言’樹脂(包含單體、聚合物、低聚物 。以下相同)有時進入複合氧化物粒子之細孔,易令後述 之折射率降低不足。又,以後述之製造工程,由該粒子中 選擇性除去至少一部分之砂與氧以外之元素時,因有時無 法保持粒子形狀,故爲不佳。另一方面,覆被層之厚度超 過2 0 n m時,則難形成具有後述適切大小細孔之覆被層 ,且所得之粒子有時變成非孔質。又,易令下一工程難以 選擇性除去元素。更且,於複合氧化物粒子中封入水、醇 類等溶劑,結果於樹脂中分散形成膜時,於乾燥時無法充 分除去溶劑,且因無法形成空氣等之氣相,故折射率之降 低不足,因此不佳。覆被膜之厚度以1〜8 n m之範圍爲 佳。 前述覆被層必須作成多孔質,且其細孔徑之最大値爲 以0 . 5〜5 n m之範圍內爲佳。最大細孔徑未滿0 · 5 n m,則樹脂難侵入覆被層內之細孔,故與樹脂之密合性 不夠充分。又,複合氧化物粒子細孔內之溶劑難於乾燥時 逃散,故折射率之降低亦不夠充分,因此不佳。另一方面 ,最大細孔徑大爲超過5 n m時,因爲不僅樹脂爲進入覆 被層且成爲核之複合氧化物粒子亦進入細孔,故折射率之 降低不夠充分。最大細孔徑以1〜4 · 5 π m之範圍爲更 "本紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公釐) -----Ί---1-----------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 495485 A7 __ B7 五、發明說明(7 ) 佳。 複合氧化物微粒子之細孔容積爲0 · 1〜1 · 5 J / g,特別以0 · 2〜1 · 5 m£ / g之範圍爲佳。細孔 容積未滿0 . 1 / g則無法作成所欲的多孔質微粒子’ 另·方面,若超過1 . 5 2/ g則微粒子之強度降低。 本發明之複合氧化物微粒子之平均粒徑必須在5〜 30〇nm之範圍。平均•粒徑未滿5 n m,則微粒子中之 覆被層的體積比例增加,且細孔之比例降低。另一方面, 平均粒徑若超過3 0 0 n m,則難取得安定的分散溶膠, 而含有該微粒子之塗膜等之透明性易降低。複合氧化物微 粒子之更佳的平均粒徑爲1 0〜2 0 0 n m之範圍。因此 ,構成複合氧化物微粒子之核粒子的平均粒徑必須爲在 4·5〜280nm之範圍。尙,微粒子之平均粒徑可根 據動態光散亂法求出。 本發明之複合氧化物微粒子較佳含有直接結合矽之有 機基。此類有機基可使用碳數1〜1 0個之非取代或經取 代之烴基,且可列舉烴基、鹵化烴基、環氧烷基、胺烷基 、甲基丙烯酸烷基、氫硫烷基等。更具體而言,可列舉甲 基、苯基、異丁基、乙烯基、三氟丙基、Θ —(3,4一 環氧環己基)、7 -縮水甘油氧丙基、T 一甲基丙烯基丙 基、N — /3_ (胺乙基)r —胺丙基、τ 一胺丙基、N — 笨基-r一胺丙基、r一氫硫基丙基等。 有機基之直接結合矽之莫耳數(s R )與全部矽之莫耳 數(St)之比Sr/St爲以〇 · 〇〇 1〜〇 . 9之範圍 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -----Ί----------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 吧485 A7 ^______B7 五、發明說明(8 ) 爲佳。Sr/St未滿0 · 00 1則因粒子表面之有機基量 少,故與有機溶劑和樹脂之親和力不夠充分,又含有有機 基所造成之折射率之降低不足。另一方面,若超過0 · 9 則有機基之性質變得過強,且於水中易引起粒子彼此間的 凝集。Sr/St之更佳範圍爲〇 · 〇1〜0 · 9。 S K / S τ爲依據下列方法求出。將溶膠於1 〇 〇 °c下 真空乾燥一晝夜,並且完全除去水等揮發成分所得之粉體 試料精秤約5克,且於0 · 0 5 N之N a〇Η水溶液 2 5 0毫升中分散,並於室溫下繼續攪拌1 0小時。經由 此操作,令粉體試料中未反應之水解性基完全被水解並且 被萃取至分散媒體之水中。該分散液中之粉體試料重覆以 超離心予以分離、水洗後,對於2 0 0 °C乾燥5小時之粉 末試料,以元素分析測定全碳含量,並由原料中所用之有 機基之平均碳數,求出有機基之直接結合矽之莫耳數(S R ),並且計算與全矽之莫耳數(St)之比例。 (2 )微粒子分散溶膠 本發明之微粒子分散溶膠爲令前述本發明之微粒子, 於水或有機溶劑、或其混合溶劑所構成之分散媒體中分散 而成。有機溶劑並無特別限定,但可使用甲醇、乙醇等一 元醇、乙二醇、丙二醇等多元醇爲首之先前有機溶劑中所 使用的有機溶劑。 上述之微粒子分散溶膠可利用於各種用途,而於視需 要進行濃縮之情形中,以預先將溶膠中之一部分鹼金屬離 -----Ί---------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -11- 495485 A7 ____ B7 五、發明說明(9 ) 子、鹼土金屬離子及銨離子等予以除去後濃縮者,更可取 得安定之濃縮的溶膠。除去方法可採用超過濾等公知之方 (請先閱讀背面之注意事項再填寫本頁) 法。 (3 )微粒子分散溶膠之製造方法 本發明之微粒子分散溶膠之製造方法爲由前述工程( a )〜(c )所構成。以下,依序說明。 ( a )〔核粒子前質分散液之調製〕 矽酸鹽較佳使用一種或二種以上之矽酸鹽選自鹼金屬 矽酸鹽、銨矽酸鹽及有機鹼之矽酸鹽。鹼金屬矽酸鹽可歹[J 舉矽酸鈉(水玻璃)和矽酸鉀,有機鹼可列舉四乙基銨等 之四級銨鹽、單乙醇胺、二乙醇胺、三乙醇胺等之胺類’ 於銨之矽酸鹽或有機鹼之矽酸鹽中,亦包含矽酸液中添力口 氨水、四級銨氫氧化物、胺化合物等之鹼性溶液。 酸性矽酸液可使用將矽酸鹼水溶液,以陽離子交換樹 脂處理等除去鹼所得之矽酸液,且特別以p Η 2〜p Η 4 ,S i 0 2濃度爲約7重量%以下之酸性矽酸液爲佳。 經濟部智慧財產局員工消費合作社印製 又,前述化學式(1 )所示之有機矽化合物具體而言 可列舉甲基三甲氧基矽烷、二甲基二甲氧基矽烷、苯基三 甲氧基矽烷、二苯基二甲氧基矽烷、甲基三乙氧基矽烷、 二甲基二乙氧基矽烷、苯基三乙氧基矽烷、二苯基二乙氧 基矽烷、異丁基三甲氧基矽烷、乙烯基三甲氧基矽烷、乙 烯基三乙氧基矽烷、乙烯基三(/3 -甲氧乙氧基)矽烷、 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 495485 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(10) 3 ’ 3 ,3 —三氟丙基三甲氧基矽烷、甲基一 3 ,3 ,3 —^氟丙基二甲氧基矽烷、A —(3 ,4 一環氧環己基) 乙_ Η甲氧基矽烷、r -縮水甘油氧基三丙基三甲氧基砂 院、r -縮水甘油氧丙基甲基二乙氧基矽烷、r -縮水甘 、油氧丙基三乙氧基矽烷、r -甲基丙烯氧基丙基甲基二甲 氧基矽烷、r一甲基丙烯氧基丙-三甲氧基矽烷、r一甲 基丙烯氧基丙基甲基二乙氧基矽烷、r-甲基丙烯氧基丙 基Η乙氧基矽烷、n — /5 (胺乙基)r 一胺丙基甲基二甲 矽烷、N - Θ (胺乙基)r 一胺丙基三甲氧基矽烷、 (胺乙基)7 -胺丙基三乙氧基矽烷、r 一胺丙基 三甲氧基矽烷、r一胺丙基三乙氧基矽烷、N—苯基一r 一胺丙基三甲氧基矽烷、r 一氫硫基內基三甲氧基矽烷、 三甲基矽烷醇、甲基三氯矽烷、甲基二氯矽烷、二甲基二 氯矽烷、三甲基氯矽烷、苯基三氯矽烷、二苯基二氯矽院 、乙烯基三氯矽烷、三甲基溴矽烷、二乙基矽烷等。 上述之有機矽化合物因爲缺乏親水性,故較佳預先進 行水解,令可於反應系中均勻混合。水解可採用此些有機 石夕化合物之已知的水解法。於水解觸媒使用鹼金屬之氫氧 化物、氨水、胺等驗性物質時,可在水解後除去此些鹼性 觸媒,並且作成鹼性溶液供使用。又,使用有機酸和無機 酸等酸性觸媒調製水解物時,較佳於水解後,以離子交換 等除去酸性觸媒。尙,所得之有機矽化合物之水解物,期 望以水溶液型態供使用。此處所謂之水溶液爲意指水解物 並非以凝膠之白濁狀態,而爲以具有透明性之狀態。 本纸張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)-13-~"'""""'" ----------*------------訂---------線^^ (請先閱讀背面之注音?事項再填寫本頁) 495485 Α7 Β7 五、發明說明(11 ) (請先閱讀背面之注意事項再填寫本頁) 無機氧化物之原料較佳使用鹼可溶之無機化合物,且 可列舉前述之金屬或非金屬之羥基酸之鹼金屬鹽或鹼土金 屬鹽、銨鹽、四級銨鹽,更具體而言,以鋁酸鈉、四硼酸 鈉、碳酸锆銨、銻酸鉀、錫酸鉀、鋁矽酸鈉、鉬酸鈉、硝 酸鉋銨、磷酸鈉等爲適當。 於調製核粒子前質分散液上,可預先個別調製前述無 機化合物之鹼水溶液,或者調製混合水溶液,並將水溶液 對應於複合氧化物之複合比例,一邊於ρ Η 1 0以上之鹼 水溶液中攪拌一邊慢慢添加。 於鹼水溶液中所添加之矽石原料、有機矽化合物及無 機氧化物之添加比例,於矽石成分以S i〇2表示,矽石以 外之無機氧化物以Μ〇X表示時之莫耳比Μ〇X / S i〇2 以Ο · 05〜2 · 0之範圍爲佳。M〇x/S i〇2未滿 0 . 0 5,則前述細孔容積無法充分變大,另一方面, Μ〇X / S 1〇2若超過2 · 0,則所得溶膠之安定性降低 。又,期望前述之Sr/St爲在0 · 00 1〜0 · 9之範 圍。 經濟部智慧財產局員工消費合作社印製 添加此些水溶液則同時令同溶液Ρ Η値變化,但本發 明並無特別需要將此ρ Η値控制於指定範圍之操作。水溶 液最終爲根據有機矽化合物和無機氧化物之種類和其混合 比例而落於固定之ρ Η値。將ρ Η控制於指定範圍時’可 例如添加酸,但此時,經由所添加之酸而生成複合氧化物 之原料金屬鹽,因此,令核粒子前質分散液之安定性降低 。尙,此時水溶液之添加速度並無特別之限制。 -14- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 經濟部智慧財產局員工消費合作社印製 495485 Α7 Β7 五、發明說明(12) 本發明之製造方法,亦可將調製核粒子前質分散液時 之種粒子的分散液,作爲起始原料。此時,種粒子可使用 Si〇2、 A 1 2 0 3 , Ti〇2、 Zr〇2、 Sn〇2 及 C e〇2等之無機氧化物或其複合氧化物例如S i Ο 2 -Α]_2〇3、 Ti〇2 — Algos、 Ti〇2—Zr〇2、 S π Ο 2 — T i 〇2、 S i Ο 2 — T i Ο 2 — A 12〇3 寺微 粒子,且通常使用其溶膠。此類種粒子之分散液可根據先 前公知之方法進行調製。例如,相對於上述無機氧化物, 於金屬鹽、金屬鹽之混合物或金屬醇鹽等中添加酸或鹼進 行水解,且視需要經由熟化則可取得。當然,亦可將前述 本發明製造方法所得之溶膠作爲種粒子分散液。 於此調整至Ρ Η 1 〇以上之種粒子分散液中,將前述 化合物之水溶液,同上述鹼水溶液中添加之方法處理,一 邊攪拌一邊添加。此時亦可不進行分散液之ρ Η控制地任 意進行。如此,若將種粒子作爲種,令複合氧化物粒子成 長,則可輕易控制成長粒子之粒徑,並且取得所欲粒度。 於種粒子分散液中所添加之矽石原料、有機矽化合物及無 機氧化物之添加比例,爲與前述鹼水溶液中添加時爲相同 之範圍。 上述之矽石原料,有機矽化合物及無機氧化物原料爲 於鹼側具有高溶解度。但,若於此溶解度高之ρ Η領域中 ,將兩者混合,則矽酸離子及鋁酸離子等之含氧酸之溶解 度降低,且析出其複合物並於膠體粒子中成長,或於種粒 子上析出且引起粒子成長。因此,於膠體粒子之析出、成 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 卜丨丨ri!會--------訂---------線· (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 495485 Α7 Β7 五、發明說明(I3) 長時,並不需要如先前法般控制P Η ° 尙,藉由目的之含有有機基之複合氧化物微粒子中’ 導入之有機基具有反應性,則亦可令此有機基與所欲之化 合物反應,進行粒子之表面修飾。 工程(b)〔第一矽石系覆被層之形成〕 所添加之矽石原料,以矽石之鹼金屬鹽(水玻璃)予 以脫鹼所得之矽酸液爲特佳。核粒子前質之分散媒體爲單 獨之水、或對有機溶劑之水比率高之情形中,亦可以矽酸 液進行覆被處理。於使用矽酸液之情形中,可於分散液中 添加指定量之矽酸液,並且同時加入鹼,令矽酸液沈澱於 核粒子表面。 矽石原料亦可使用水解性之有機矽化合物。水解性之 有機矽化合物可使用一般式R n S i (〇R ’ )4 - η〔但, R,R’ ,烷基,芳基,乙烯基’丙烯基等之烴基’η二 〇、1、 2或3〕所示之烷氧基矽烷,且特別以四甲氧基 矽烷、四乙氧基矽烷、四異丙氧基矽烷等之四烷氧基矽烷 爲佳。 添加方法可將此些烷氧基矽烷、純水、及醇類之混合 溶液中,添加少量鹼或酸作爲觸媒之溶液,加至前述核粒 子前質之分散液中,並令水解烷氧基矽烷所生成之矽酸聚 合物於該前質之表面上沈Μ。此時,亦可令院氧基砂院、 醇類、觸媒同時添加至分散液中。鹼觸媒可使用氨水、鹼 金屬之氫氧化物、胺類。又,酸觸媒可使用各種無機酸和 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ------I---*------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 495485 A7 B7 五、發明說明(14) 有機酸。尙,亦可倂用烷氧基矽烷與前述矽酸液並且進行 覆被處理。 又,於形成矽石與矽石以外之無機氧化物所構成之第 一覆被層上,可於上述形成矽石覆被層之工程中,添加砂 石以外之無機氧化物源。該無機氧化物源可於矽石源之添 加前或後添加,但以同時添加爲佳。此時之添加比率爲石夕 石以外之氧化物,相對於矽石之莫耳比爲0 · 5〜2 0之 範圍爲佳。 前述莫耳比未滿0 . 5 ,則以下一工程(c )除去矽 石以外之一部分成分後所生成之第一覆被層的細孔容積及 細孔徑過小,其結果易令與樹脂之密合性變得不充分。另 一方面,前述莫耳比大爲超過2 0時,則第一覆被層之細 孔徑過大,且樹脂侵入細孔內並且硬化,因此令折射率之 降低效果變小。 尙,形成第一覆被層時之矽石成分,矽石與矽石以外 之氧化物成分之添加量,爲形成厚度0·5〜20nm之 覆被層之充分量。又,此第一覆被層亦可由則述之單獨石夕 石覆被層、矽石與矽石以外之氧化物所構成之複合氧化物 之覆被層之多數層所構成。 工程(c )〔元素之選擇性除去〕 由構成形成第一覆被層之核粒子前質之元素中,將砂 與氧以外之元素之至少一部分予以選擇性除去,則可令形 成第一覆被層之核粒子前質之細孔容積增加。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ^ΤΓ- I-----I---------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 495485 Α7 _ Β7 五、發明說明(15) 於除去矽與氧以外之一部分元素上,可例示於形成石夕 石系覆被層之複合氧化物微粒子分散液中,添加無機酸和 有機酸則可溶解除去,或者,與陽離子交換樹脂接觸進行 離子交換除去之方法。將元素選擇性除去後之Μ Ο X / S 1〇2爲以〇 · oooi〜〇 · 2爲佳。 將兀素選擇性除去之分散液,可經由超過濾等公知之 洗淨方法進行洗淨。此時,若預先將分散液中之鹼金屬離 子、鹼土金屬離子及銨離子第一部分除去後進行超過濾、, 則可取得分散安定性高之微粒子所分散的溶膠。尙,視需 要以有機溶劑取代,則可取得有機溶劑分散溶膠。 本發明另外之微粒子分散溶膠之製造方法,爲再附加 第二矽石覆被層之形成工程。 本工程之前述化學式(2 )所示之有機矽化合物,可 使用同於工程(b )中所用的有機矽化合物。於化學式( 2 )中,使用η = 〇之有機矽化合物時可就其原樣使用, 而於使用η = 1〜3之有機矽化合物時,則較佳使用同於 前述工程(a )所用之有機矽化合物之部分水解物。 藉由形成第二矽石覆被層,則可調整覆被層厚度,且 可令最終之覆被層厚度爲0 · 5〜20 nm。 又,於第二矽石覆被層之形成上使用η = 1〜3之有 機矽化合物時,則對於有機溶劑之分散液佳,且可取得與 樹脂之親和性高之複合氧化物微粒子分散溶膠。因此,雖 可使用矽烷偶合劑等進行表面處理,但因爲對於有機溶劑 之分散性、與樹脂之親和性等優良,故亦無特別需要此類 本纸張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) Ί--.------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 495485 90.12. 24 A7 B7 五、發明説明(16 ) 處理。 (請先閲讀背面之注意事項再填寫本頁) 本發明之另外微粒子分散溶膠之製造方法,爲再附加 加熱處理工程。 即,於形成第二矽石覆被層之含有有機基之複合氧化 物微粒子分散溶膠中,視需要添加鹼性水溶液並將分散溶 膠之p Η較佳爲調整至8〜1 3之範圍,且進行加熱處理 。此時之加熱處理溫度爲約5 0〜3 5 0 °C之範圍,且特 別以1 0 0〜3 0 0 °C之範圍爲佳。經由此加熱處理,則 可依舊維持核粒子之多孔性,並且令覆被層之細孔消失, 取得經由矽石系覆被層令核粒子密閉之密閉型複合氧化物 微粒子所分散之溶膠。尙,於加熱處理時,可將工程(c )所得之含有有機基之複合氧化物微粒子分散溶膠之濃度 預先稀釋,或者予以濃縮處理。又,最後同前述工程(c )處理,且亦可進行加熱處理之分散溶膠的洗淨。 (4 )被膜基材 經濟部智慧財產局員工消費合作社印製 接著,說明本發明之被膜基材。此基材爲玻璃、聚碳 酸酯、丙烯酸樹脂、P E T、T A C等之塑膠片、塑膠薄 膜、塑膠面板等之基材表面形成被膜,並將後述之塗佈液 以浸漬法、噴霧法、旋轉器法、轅塗法等公知方法,於基 材上塗佈、乾燥,且再視需要進行煅燒則可取得。 上述塗佈液爲前述溶膠與被膜形成用基體之混合液, 且視需要亦可混合有機溶劑。 所謂被膜形成用基體,爲指於基體表面可形成被膜之 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) _ 19 - 495485 A7 B7 五、發明說明(17) (請先閱讀背面之注意事項再填寫本頁) 成分,可由與基材之密合性和硬度、塗佈性等條件合適之 樹脂等中選擇使用,且可列舉例如先前所用之聚酯樹脂、 丙烯酸樹脂、胺基甲酸酯樹脂、氯乙烯樹脂、環氧樹脂、 蜜胺樹脂、氟樹脂、聚矽氧烷樹脂、丁醛樹脂、苯酚樹脂 、醋酸乙烯酯樹脂、紫外線硬化樹脂、電,子射線硬化樹脂 、乳膠樹脂、水溶性樹脂、親水性樹脂、此些樹脂之混合 物、及此些樹脂之共聚物和改質體等之塗料用樹脂、或、 前述烷氧基矽烷等之水解性有機矽化合物等。 使用塗料用樹脂作爲基體之情形中,例如可將前述作 爲溶膠分散媒體之水以醇類等有機溶劑取代之有機溶劑分 散溶膠、或者前述微粒子以公知偶合劑處理後,並於有機 溶劑中分散之有機溶劑分散溶膠與塗料用樹脂,以適當之 有機溶劑予以稀釋,作成塗佈液。 另一方面,使用水解性有機矽化合物作爲基體之情形 中,例如可於烷氧基矽烷與醇類之混合液中,加入水及作 爲觸媒的酸或鹼,取得烷氧基矽烷之部分水解物,並於其 中混合前述之溶膠,且視需要以有機溶劑予以稀釋,作成 塗佈液。 經濟部智慧財產局員工消費合作社印製 塗佈液中之微粒子與基體之重量比例爲微粒子/基體 二1/99〜9/1之範圍爲佳。重量比若超過9/1 , 則被膜之強度不足且缺乏實用性,另一方面未滿1 / 9 9 ,則無法表現該微粒子之添加效果。 於上述基材表面所形成之被膜的折射率,可依據微粒 子與樹脂等之混合比率及所使用之樹脂之折射率而異,但 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 495485 A7 B7 五、發明說明(18 ) (請先閱讀背面之注意事項再填寫本頁) 可爲1 · 28〜1 . 50之低折射率。尙,本發明微粒子 本身之折射率爲1 · 20〜1 · 44。其係因爲本發明之 微粒子,即使分散媒體進入粒子細孔內,亦於被膜乾燥時 令分散媒體脫離成爲空隙,並且爲了將矽石系覆被層之細 孔徑控制於前述範圍,乃將樹脂等被膜形成成分封入矽石 系覆被層中,且於樹脂硬化後,保持矽石系覆被層之細孔 爲閉塞之粒子內部的多孔性。 另一方面,於前述先前之多孔性微粒子(日本特開平 5 - 1 3 2 3 0 9號公報),因爲樹脂等被膜形成成分進 入細孔內,故不能作成如此低折射率。又,與前述多孔性 微粒子表面以矽石完全覆被,且於細孔內封入溶劑之微粒 子(日本特開平7 - 1 3 3 1 0 5號公報)相比較,則本 發明之微粒子爲低折射率。 經濟部智慧財產局員工消費合作社印製 於上述被膜基材中,基材折射率爲1 · 6 0以下之情 形中,較佳於基材表面形成折射率爲1 . 6 0以上之被膜 (以下,亦稱爲中間被膜)上,形成前述含有本發明微粒 子之被膜。中間被膜之折射率若爲1 · 6 0以上,則與前 述含有本發明微粒子之被膜(以下,亦稱爲表面被膜)的 折射率差大,可取得防止反射性能優之被膜基材。中間被 膜之折射率可根據所用金屬氧化物微粒子之種類、金屬氧 化物與樹脂等之混合比率及所使用之樹脂折射率而調整。 中間被膜之被膜形成用塗佈液,爲金屬氧化物粒子與 被膜形成用基體之混合液,且視需要可混合有機溶劑。被 膜形成用基體可使用同於前述含有本發明微粒子之被膜所 -ΖΓ- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 495485 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(19 ) 用之物質,並且經由使用相同之被膜形成用基體,則可取 得兩被膜間之密合性優良之被膜基材。 中間被膜形成用塗佈液中之金屬氧化物微粒子與基體 之重量比例爲微粒子/基體=30/70〜95/5 ,特 別以5 0/5 0〜8 0/2 0之範圍爲佳。此重量比若超 過9 5 / 5則被膜之強度不足,更且與基材之密合性不夠 充分且缺乏實用性,另一方面,重量比爲未滿3 0 / 7 0 ,則中間被膜之折射率無法爲1 · 6 0以上,且與表面被 膜之折射率差不由得變大,故防止反射性能不夠充分。 上述金屬氧化物微粒子較佳使用折射率爲1 · 6 0以 上,特別爲1 · 7 0以上者,且可列舉氧化鈦(2 · 5 0 )、氧化鋅(2 · 0 )、氧化鉻(2 · 2 0 )、氧化鉋( 2 · 2 )、氧化錫(2 · 0 )、氧化鉈(2 · 1 )、鈦酸 鋇(2 · 4 0 )、氧化鋁(1 · 7 3 )、氧化鎂( 1 .77)、氧化釔(1 .92)、氧化銻(2.0)、 氧化銦(2 · 0 )等。其中亦以氧化鈦、氧化鉋、氧化錫 、氧化銻、氧化锆、氧化銦等導電性微粒2、及該微粒子 中摻混銻、錫、氟等異種元素之導電性微粒子,因爲所得 之被膜爲具有防止反射性能及防靜電效果故爲佳。金屬氧 化物粒子之折射率未滿1 . 6 0時,則中間被膜之折射率 無法作成1 · 6 0以上,且與表面被膜之折射率差不由得 變大,故防止反射性能變得不夠充分。 前述金屬氧化物微粒子之平均粒徑爲5〜1 〇 〇 nm ,且特別以1 0〜6 0 n m之範圍爲佳。平均粒徑未滿5 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -22 - ---------I ------------^ ----I---- (請先閱讀背面之注音?事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 495485 A7 ___ B7 五、發明說明(2〇) n m之粒子取得困難,而若超過1 〇 〇 n m,則可見光線 之散亂變得顯著且被膜之透明性降低,故爲不佳。 使用此類金屬氧化物微粒子,調製中間被膜形成用塗 佈液時,較佳使用金屬氧化物微粒子於分散媒體中分散之 溶膠,且可將水分散溶膠,於醇類等有機溶劑中分散之有 機溶劑分散溶膠、或前述微粒子以公知偶合劑處理後,於 有機溶劑中分散之有機溶劑分散溶膠,與塗料用樹脂以適 當之有機溶劑稀釋,則可作成塗佈液。更且於塗佈液中, 爲了提高分散性、安定性等,亦可添加界面活性劑。 上述二層被膜基材,可經由將中間被膜形成用塗佈液 進行塗佈並且乾燥,視需要予以煅燒形成中間被膜,其次 同前述將表面被膜形成用塗佈液進行塗佈並且乾燥,視需 要予以煅燒則可取得。又,於中間被膜形成用塗佈液之塗 佈後,或於乾燥後將表面被膜形成用塗佈液進行塗佈並且 乾燥,且再視需要予以煅燒則亦可取得。 根據以下所示之實施例,更加具體說明本發明。 實施例1 〔複合氧化物溶膠之製造〕 將平均粒徑5 n m,S 1〇2濃度2 0重量%之矽溶膠 1〇0克與純水1 9 0 0克之混合物於8 0 °C中加溫。此 反應母液之pH爲1 0 · 5,於同母液中同時加入S i〇2 1 · 5重量%之矽酸鈉水溶液9 0 0 0克及A 1 2〇3 〇.5重量%之鋁酸鈉水溶液9 0 0 〇克。其間,將反應 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ----- I----------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 495485 A7 _ B7 五、發明說明(21 ) 液溫度保持於8 0 °C。反應液之p Η爲在添加後立即上升 至1 2 · 5 ,其後則幾乎無變化。添加終了後,將反應液 (請先閱讀背面之注意事項再填寫本頁) 冷卻至室溫,並以超據膜予以洗淨、濃縮,取得固形成分 濃度2 0重量%之3 i〇2 · A 1 2〇3複合氧化物粒子前 質溶膠(A ) 〇 於此前質溶膠(A ) 5 0 0克中加入純水1 · 7 0 0 克並且加溫至9 8 °C,且一邊保持於此溫度,一邊將矽酸 鈉水溶液以陽離子交換樹脂予以脫鹼所得之矽酸液( S i〇2濃度3 · 5重量%) 2,000克歷5小時添加, 取得以矽石覆被之S i〇2 · A 1 2〇3複合氧化物粒子前 質溶膠(B )。 於此溶膠以超濾膜洗淨至固形成分濃度呈1 3重量% 之溶膠5 0 0克中,加入純水1 . 1 2 5克,並再滴入濃 鹽酸(3 5 · 5 % )令呈ρ Η 1 . 〇,並且進行脫鋁處理 〇 其次,一邊加入Ρ Η 3之鹽酸水溶液1 0公升及純水 5公升,一邊將超濾膜所溶解之鋁鹽予以分離,取得以矽 石覆被之S 1〇2 · A 1 2〇3複合氧化物粒子(Ρ 1 )之 經濟部智慧財產局員工消費合作社印製 分散溶膠(c)。 此矽石覆被複合氧化物粒子(Ρ 1 )之Μ Ο X / S i〇2 (莫耳比)、平均粒徑、細孔容積、覆被層之厚度 及最大細孔徑及粒子之折射率示於表1。此處,平均粒徑 爲以動態光散亂法測定,且粒子之細孔容積爲以氮吸附法 測定。覆被層之厚度,爲以動態光散亂法求出覆被前之粒 -24- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 495485 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(22) 徑,並將形成覆被層所用之氧化物或複合氧化物之重量和 真比重及覆被層之細孔容積假定成〇 · 5 / g,計算覆 被層之體積而求出,並由此些數値計算。尙,氧化物之真 比重爲S 1〇2=2 · 6 ,Al2〇3=3 · 2 ,且於複合 氧化物之情況爲採用由組成所計算之値。又,覆被層之最 大細孔徑爲以自動細孔分布測定裝置(Quanta Chrome公司 製,Autosorb-6 )予以測定。 前述溶膠中之粒子折射率爲如下測定。 (1 )將多孔質複合氧化物分散溶膠放入蒸發器中, 令分散媒體蒸發。 (2 )將其以1 2 0 °C乾燥,並且作成粉末。 (3 )將已知折射率之標準折射液,於玻璃板上滴下 2、3滴,並令上述粉末混合至其中。 (4 )以各種標準折射液進行上述(3 )之操作,並 以混合液(許多情況爲糊狀)呈現透明時之標準折射液之 折射率,視爲微粒子之折射率。 〔低反射薄膜之製造〕 將複合氧化物溶膠(c )通入超濾膜,並將分散媒體 之水以乙醇予以取代。將此乙醇溶膠(固形成分濃度5重 量% ) 5 0克、和丙烯酸樹脂(Heteroid 1 007、日立化成 (株)製)3克及異丙醇和正丁醇之1 / 1 (重量比)混 合溶劑4 7克予以充分混合,調製塗佈液。 將此塗佈液於P E T薄膜上,以棒塗法予以塗佈,且 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -25- ----- - —-------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 495485 A7 一一 B7 五、發明說明(23) 以8 0 °C乾燥1分鐘’取得低反射薄膜(F 1 )。此薄膜 (F1)、與未塗佈之PET薄膜(F〇)全光線穿透率 、霧値、波長5 5 0 n m光線之反射率及被膜之折射率示 於表2。全光線穿透率及霧値爲以Haze meter ( Suga試驗 機(株)製)測定’反射率爲以全光光度計(日本分光公 司,UDest-55 )測疋。又,被膜之折射率爲以Elipso meter (ULVAC公司製,E M S — 1 )測定。 又,於低反射薄膜(F 1 )的表面,以小刀於縱橫1 m m之間隔止,切出1 1個平行傷口、作成1 〇 〇個分量 ,並將其以玻璃膠帶黏合,其次,以下述4個階段,分類 玻璃膠帶剝離時被膜未被剝離而殘存之分量數目,評價密 合性。結果示於表2。 殘存分量數目9 5個以上:◎ 殘存分量數目9 0〜9 4個:〇 殘存分量數目85〜89個:△MoO3, Zn02, W03 and the like. Two or more kinds of inorganic oxides may be listed as Ti02-Al203, Ti02-Zr02, and the like. The molar ratio of the nuclear particles printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs to Si is represented by S i Ο2, and the inorganic oxides other than silica are represented by MoX. MoX / SiO2 is 0. · The range of 05 ~ 2 · 0 is preferable. If M〇x / S i〇2 is less than 0.005, the pore volume described later cannot be sufficiently increased, and the reduction in refractive index is insufficient. On the other hand, if "〇 \ / 3 丨 〇2 exceeds 2. 0, the stability of the obtained sol is reduced, so it is not good. The surface of the core particles is covered with a silica-based inorganic oxide layer. The so-called silica-based inorganic oxide layer here includes ① a single layer of silica-8-this paper size applies Chinese National Standard (CNS) A4 (210 X 297 mm) Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs Printed 495485 Α7 Β7 5. Description of the invention (6), ② a single layer of composite oxide composed of silica and inorganic oxides other than silica, and ③ the double layer of the aforementioned ① layer and ② layer. In the present invention, the thickness of the coating layer must be in a range of 0.5 to 20 nm. If the thickness of the coating layer is less than 0 · 5 nm, it is difficult to obtain a coating effect. Specifically, the resin (including monomers, polymers, and oligomers. The same applies below) may enter the pores of the composite oxide particles. , It is easy to make the refractive index reduction described later insufficient. In addition, in a manufacturing process described later, when at least a part of elements other than sand and oxygen are selectively removed from the particles, the shape of the particles may not be maintained in some cases, which is not preferable. On the other hand, when the thickness of the coating layer exceeds 20 nm, it is difficult to form a coating layer having pores of a suitable size to be described later, and the obtained particles sometimes become nonporous. In addition, it is easy to make it difficult to selectively remove elements in the next process. Furthermore, solvents such as water and alcohols were sealed in the composite oxide particles. As a result, when the film was dispersed in the resin to form a film, the solvent could not be sufficiently removed during drying, and because a gas phase such as air could not be formed, the reduction of the refractive index was insufficient. , So bad. The thickness of the coating film is preferably in the range of 1 to 8 nm. The coating layer must be made porous, and the maximum pore diameter of the coating layer is 0.  A range of 5 to 5 n m is preferred. If the maximum pore diameter is less than 0 · 5 n m, it is difficult for the resin to penetrate the pores in the coating layer, so the adhesiveness with the resin is insufficient. In addition, the solvent in the pores of the composite oxide particles is difficult to escape during drying, so the reduction in the refractive index is not sufficient, which is not preferable. On the other hand, when the maximum pore diameter is larger than 5 nm, not only the resin enters the coating layer and the composite oxide particles that become the core also enter the pores, so the reduction of the refractive index is insufficient. The maximum pore diameter is more within the range of 1 ~ 4 · 5 π m " This paper size applies the Chinese National Standard (CNS) A4 specification (210 x 297 mm) ----- Ί --- 1 ---- ------- Order --------- line (please read the precautions on the back before filling this page) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 495485 A7 __ B7 V. Description of the invention ( 7) Good. The pore volume of the composite oxide fine particles is 0 · 1 ~ 1 · 5 J / g, particularly preferably in the range of 0 · 2 ~ 1 · 5 m £ / g. The pore volume is less than 0.  1 / g, the desired porous fine particles cannot be made. On the other hand, if it exceeds 1.  5 2 / g decreases the strength of the fine particles. The average particle diameter of the composite oxide fine particles of the present invention must be in the range of 5 to 300 nm. When the average particle size is less than 5 n m, the volume ratio of the coating layer in the fine particles increases, and the ratio of the pores decreases. On the other hand, if the average particle diameter exceeds 300 nm, it is difficult to obtain a stable dispersed sol, and the transparency of a coating film or the like containing the fine particles is liable to decrease. A more preferable average particle diameter of the composite oxide microparticles is in the range of 10 to 200 nm. Therefore, the average particle diameter of the core particles constituting the composite oxide fine particles must be in the range of 4 · 5 to 280 nm. Alas, the average particle size of fine particles can be obtained by the dynamic light scattering method. The composite oxide fine particles of the present invention preferably contain an organic group directly bonded to silicon. Such an organic group may use an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and examples thereof include a hydrocarbon group, a halogenated hydrocarbon group, an alkylene oxide group, an amine alkyl group, an alkyl methacrylate group, and a hydrosulfanyl group. . More specifically, methyl, phenyl, isobutyl, vinyl, trifluoropropyl, Θ- (3,4-epoxycyclohexyl), 7-glycidoxypropyl, T-methyl Allylpropyl, N- / 3- (aminoethyl) r-aminopropyl, τ-aminopropyl, N-benzyl-r-aminopropyl, r-hydrothiopropyl and the like. The ratio Sr / St of the molar number (s R) of the direct-bonded silicon of the organic group to the molar number (St) of the total silicon is 0-1.  Scope of 9 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) ----- Ί ---------------- Order ----- ---- Line (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 485 A7 ^ ______ B7 5. The invention description (8) is better. When Sr / St is less than 0 · 00 1, the amount of organic groups on the surface of the particles is small, so the affinity with organic solvents and resins is insufficient, and the reduction in refractive index caused by containing organic groups is insufficient. On the other hand, if it exceeds 0 · 9, the properties of the organic group become too strong, and the particles are likely to aggregate with each other in water. A more preferable range of Sr / St is 〇1 ~ 0 · 9. S K / S τ is obtained by the following method. The sol was vacuum-dried at 100 ° C for one day and night, and about 5 g of a powder sample obtained by completely removing volatile components such as water was added to 250 ml of a 0.50 N aqueous solution of NaOH. Disperse and continue stirring at room temperature for 10 hours. Through this operation, unreacted hydrolyzable groups in the powder sample were completely hydrolyzed and extracted into the water of the dispersion medium. The powder sample in this dispersion was repeatedly separated by ultracentrifugation, washed with water, and the powder sample dried at 200 ° C for 5 hours was determined by elemental analysis to determine the total carbon content, and the average of the organic groups used in the raw materials was determined. The number of carbons, the mole number (SR) of the directly bonded silicon of the organic group is calculated, and the ratio to the mole number (St) of the total silicon is calculated. (2) Microparticle-dispersed sol The microparticle-dispersed sol of the present invention is obtained by dispersing the microparticles of the present invention in a dispersion medium composed of water or an organic solvent, or a mixed solvent thereof. The organic solvent is not particularly limited, but organic solvents used in conventional organic solvents such as monohydric alcohols such as methanol and ethanol, and polyhydric alcohols such as ethylene glycol and propylene glycol may be used. The above-mentioned fine particle dispersing sol can be used for various purposes, and in the case of concentration as necessary, a part of the alkali metal in the sol can be removed in advance ----- Ί ------------- --Order --------- line (please read the precautions on the back before filling this page) This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) -11- 495485 A7 ____ B7 V. Description of the invention (9) Those who have concentrated the ions, alkaline earth metal ions and ammonium ions, etc., can obtain stable concentrated sol. The removal method can be a known method such as ultrafiltration (please read the precautions on the back before filling this page). (3) Method for producing fine particle-dispersed sol The method for producing fine particle-dispersed sol of the present invention is composed of the aforementioned processes (a) to (c). Hereinafter, description will be made in order. (a) [Preparation of the precursor dispersion of nuclear particles] It is preferable to use one or two or more kinds of silicates selected from the group consisting of alkali metal silicates, ammonium silicates, and organic base silicates. Alkali metal silicates can be [J For example, sodium silicate (water glass) and potassium silicate. Organic bases include quaternary ammonium salts such as tetraethylammonium, monoethanolamine, diethanolamine, and triethanolamine. The ammonium silicate or organic base silicate also contains alkaline solutions such as hydration ammonia, quaternary ammonium hydroxide, and amine compounds in the silicic acid solution. As the acidic silicic acid solution, a silicic acid solution obtained by removing an alkali aqueous solution of silicic acid with cation exchange resin treatment or the like can be used. In particular, the acidic concentration of p Η 2 to p Η 4 and S i 0 2 is about 7% by weight or less. Silicic acid is preferred. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. Specific examples of the organic silicon compound represented by the aforementioned chemical formula (1) include methyltrimethoxysilane, dimethyldimethoxysilane, and phenyltrimethoxysilane. , Diphenyldimethoxysilane, methyltriethoxysilane, dimethyldiethoxysilane, phenyltriethoxysilane, diphenyldiethoxysilane, isobutyltrimethoxy Silane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltri (/ 3-methoxyethoxy) silane, This paper is in accordance with China National Standard (CNS) A4 (210 X 297 mm) ) 495485 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (10) 3 '3,3-trifluoropropyltrimethoxysilane, methyl-1,3,3,3- ^ fluoropropyldiamine Methoxysilane, A — (3,4-epoxycyclohexyl) Ethyl hydrazone, r-glycidyloxytripropyltrimethoxytriol, r-glycidyloxypropylmethyldi Ethoxysilane, r-glycidyl, oleoxypropyltriethoxysilane, r-methacryloxy Propylmethyldimethoxysilane, r-methacryloxypropyl-trimethoxysilane, r-methacryloxypropylmethyldiethoxysilane, r-methacryloxypropyl Hydrazone ethoxysilane, n — / 5 (aminoethyl) r monoaminopropylmethyldimethylsilane, N-Θ (aminoethyl) r monoaminopropyltrimethoxysilane, (aminoethyl) 7-aminopropyltriethoxysilane, r-aminopropyltrimethoxysilane, r-aminopropyltriethoxysilane, N-phenyl-r-aminopropyltrimethoxysilane, r-hydrogen Thioyltrimethoxysilane, trimethylsilanol, methyltrichlorosilane, methyldichlorosilane, dimethyldichlorosilane, trimethylchlorosilane, phenyltrichlorosilane, diphenyldiphenyl Chlorosilicon, vinyltrichlorosilane, trimethylbromosilane, diethylsilane, etc. Because the above-mentioned organosilicon compound lacks hydrophilicity, it is preferred to perform hydrolysis in advance so that it can be uniformly mixed in the reaction system. The hydrolysis can be performed by a known hydrolysis method of these organic stone compounds. When hydrolyzing catalysts use alkali metal hydroxides, ammonia, amines, and other test substances, these alkaline catalysts can be removed after hydrolysis and made into alkaline solutions for use. When the hydrolysate is prepared using an acidic catalyst such as an organic acid or an inorganic acid, it is preferable to remove the acidic catalyst by ion exchange or the like after hydrolysis. Alas, the hydrolysate of the obtained organosilicon compound is expected to be used in the form of an aqueous solution. The term "aqueous solution" used herein means that the hydrolysate is not in a cloudy state of the gel but in a state of transparency. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -13- ~ " '" " " "' " ---------- *- ----------- Order --------- line ^^ (Please read the note on the back? Matters before filling out this page) 495485 Α7 Β7 V. Description of the invention (11) (Please (Please read the notes on the back before filling this page) The raw materials of inorganic oxides are preferably alkali-soluble inorganic compounds, and the alkali metal salts or alkaline earth metal salts, ammonium salts, The quaternary ammonium salt, more specifically, sodium aluminate, sodium tetraborate, ammonium zirconium carbonate, potassium antimonate, potassium stannate, sodium aluminosilicate, sodium molybdate, ammonium nitrate, sodium phosphate, and the like are suitable. On the precursor dispersion of the prepared nuclear particles, an alkaline aqueous solution of the aforementioned inorganic compound can be prepared individually or a mixed aqueous solution can be prepared, and the aqueous solution corresponds to the composite ratio of the composite oxide, while stirring in an alkaline aqueous solution of ρ Η 10 or more Add slowly. The molar ratio of silica raw materials, organic silicon compounds, and inorganic oxides added to the alkaline aqueous solution is represented by Si 102 as the silica component, and the molar ratio of inorganic oxides other than silica is represented by MoX. MoX / Sio2 is preferably in the range of 0. 05 to 2. 0. M〇x / S i〇2 is less than 0.  0, the aforementioned pore volume cannot be sufficiently increased. On the other hand, if MoX / S 102 exceeds 2.0, the stability of the obtained sol is reduced. It is desirable that the aforementioned Sr / St is in the range of 0. 00 1 to 0. 9. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. Adding these aqueous solutions will also change the same solution P ,, but the present invention does not need to control this ρ 于 to a specified range. The aqueous solution finally falls on a fixed ρ 根据 depending on the type of the organic silicon compound and the inorganic oxide and their mixing ratio. When ρ Η is controlled within a specified range, for example, an acid may be added. However, at this time, a raw metal salt of a composite oxide is generated by the added acid, so that the stability of the precursor dispersion of the nuclear particles is reduced. Alas, there is no particular limitation on the addition rate of the aqueous solution at this time. -14- This paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 495485 Α7 Β7 V. Description of the invention (12) The manufacturing method of the present invention can also be A dispersion of seed particles when preparing a precursor dispersion of core particles was used as a starting material. In this case, as the seed particles, inorganic oxides such as Si02, A12203, Ti02, Zr02, Sn02, and Ce02, or composite oxides thereof, such as Si02-A, can be used. ] _2〇3, Ti〇2 — Algos, Ti〇2—Zr〇2, S π Ο 2 — T i 〇2, S i 〇 2 — T i 〇 2 — A 12〇3 temple particles, and usually use them Sol. A dispersion of such particles can be prepared according to a conventionally known method. For example, it can be obtained by adding an acid or a base to a metal salt, a mixture of metal salts, or a metal alkoxide to hydrolyze the inorganic oxide with respect to the above-mentioned inorganic oxide, and it can be obtained by aging if necessary. Of course, the sol obtained by the production method of the present invention may be used as a seed particle dispersion. The particle dispersion liquid adjusted to a pH of 10 or more was treated with the aqueous solution of the aforementioned compound in the same manner as in the above-mentioned alkaline aqueous solution, and added while stirring. In this case, it may be performed arbitrarily without controlling the ρ Η of the dispersion. In this way, if seed particles are used as seeds to grow the composite oxide particles, the particle size of the grown particles can be easily controlled and the desired particle size can be obtained. The addition ratio of the silica raw material, the organosilicon compound, and the inorganic oxide added to the seed particle dispersion liquid is in the same range as when it is added to the aforementioned alkaline aqueous solution. The above silica raw materials, organic silicon compounds and inorganic oxide raw materials have high solubility on the alkali side. However, if the two are mixed in the ρ ρ field with high solubility, the solubility of oxyacids such as silicic acid ions and aluminate ions is reduced, and the complex is precipitated and grown in colloidal particles, or the species Particles precipitate and cause particle growth. Therefore, the Chinese National Standard (CNS) A4 specification (210 X 297 mm) is applicable to the colloidal particle precipitation and cost paper size. -Line · (Please read the notes on the back before filling out this page) Printed by the Employees' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 495485 Α7 Β7 V. Description of the Invention (I3) For a long time, it is not necessary to control P as in the previous law Η ° Alas, the organic group introduced in the target organic oxide-containing composite oxide microparticles is reactive, and this organic group can also be reacted with a desired compound to modify the surface of the particles. Process (b) [Formation of the first silica-based coating layer] The silica raw material to be added is preferably a silicic acid solution obtained by alkali metal salt (water glass) of silica and dealkaliization. In the case where the dispersion medium of the precursor of the nuclear particles is water alone or the ratio of water to organic solvents is high, it may be treated with a silicic acid solution. In the case of using a silicic acid solution, a specified amount of a silicic acid solution can be added to the dispersion, and at the same time, an alkali is added to cause the silicic acid solution to precipitate on the surface of the core particles. Silica materials can also use hydrolyzable organosilicon compounds. Hydrolyzable organosilicon compounds can use the general formula R n S i (〇R ') 4-η [but, R, R', alkyl, aryl, hydrocarbyl groups such as vinyl 'propenyl, etc. , 2 or 3], and particularly preferred are tetraalkoxysilanes such as tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, and the like. The addition method can add a small amount of alkali or acid as a catalyst solution to the mixed solution of these alkoxysilanes, pure water, and alcohols, and add it to the dispersion of the precursor of the nuclear particles, and hydrolyze the alkoxy The silicic acid polymer produced by the basic silane sinks on the surface of the precursor. At this time, it is also possible to add the oxygen sand compound, alcohol, and catalyst to the dispersion at the same time. As the alkali catalyst, ammonia water, hydroxides of alkali metals, and amines can be used. In addition, the acid catalyst can use a variety of inorganic acids and the paper size is applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) ------ I --- * --------- --- Order --------- line (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 495485 A7 B7 V. Description of the invention (14) Organic acids. Alternatively, the alkoxysilane and the silicic acid solution may be coated. In addition, on the first coating layer composed of silica and inorganic oxides other than silica, an inorganic oxide source other than sandstone may be added in the above-mentioned process of forming a silica coating layer. The inorganic oxide source can be added before or after the addition of the silica source, but it is preferably added at the same time. In this case, the addition ratio is an oxide other than Shi Xiite, and the molar ratio to silica is preferably in a range of 0.5 to 20. The aforementioned Morse ratio is less than 0.  5. In the following process (c), the pore volume and pore diameter of the first coating layer formed after removing some components other than silica are too small, and as a result, the adhesion with the resin is likely to be insufficient. On the other hand, when the molar ratio is larger than 20, the pore diameter of the first coating layer is too large, and the resin penetrates into the pores and hardens, so that the effect of reducing the refractive index becomes small. Alas, the addition amount of the silica component when forming the first coating layer, and the oxide components other than silica and silica is a sufficient amount to form a coating layer having a thickness of 0.5 to 20 nm. In addition, the first coating layer may be composed of a plurality of layers including a separate stone slate coating layer, a composite oxide coating layer composed of silica and oxides other than silica. Project (c) [Selective removal of elements] The first coating can be formed by selectively removing at least a part of elements other than sand and oxygen from the elements constituting the precursors of the nuclear particles forming the first coating layer. The pore volume of the precursor particles of the coated core particles increases. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) ^ ΤΓ- I ----- I --------------- Order ----- ---- Line (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 495485 Α7 _ Β7 V. Description of the invention (15) On some elements except silicon and oxygen, The method can be exemplified in a composite oxide fine particle dispersion liquid that forms a shiyanite-based coating layer, and it can be dissolved and removed by adding an inorganic acid and an organic acid, or it can be removed by contact with a cation exchange resin for ion exchange removal. After the elements are selectively removed, M 0 X / S 102 is preferably 0 · oooi to 0 · 2. The dispersion liquid in which the element is selectively removed can be washed by a known washing method such as ultrafiltration. At this time, if the first part of the alkali metal ions, alkaline earth metal ions, and ammonium ions in the dispersion is removed beforehand and ultrafiltration is performed, a sol dispersed with fine particles having high dispersion stability can be obtained. Alas, if needed to be replaced by an organic solvent, an organic solvent dispersed sol can be obtained. The manufacturing method of the microparticle-dispersed sol according to the present invention is a process of forming a second silica coating layer. As the organosilicon compound represented by the aforementioned chemical formula (2) in this process, the same organosilicon compound as used in process (b) can be used. In the chemical formula (2), an organic silicon compound with η = 〇 may be used as it is, and when an organic silicon compound with η = 1 to 3 is used, it is preferable to use the same organic compound used in the aforementioned process (a). Partial hydrolysate of silicon compounds. By forming the second silica coating layer, the thickness of the coating layer can be adjusted, and the thickness of the final coating layer can be 0.5 to 20 nm. In addition, when an organic silicon compound having η = 1 to 3 is used for the formation of the second silica coating layer, a dispersion liquid of an organic solvent is excellent, and a composite oxide fine particle dispersed sol having a high affinity with the resin can be obtained. . Therefore, although a silane coupling agent can be used for surface treatment, but because it has excellent dispersibility for organic solvents and affinity with resin, there is no need for this type of paper. The Chinese National Standard (CNS) A4 standard is applicable. (210 X 297 mm) Ί--. ------------ Order --------- Line (Please read the precautions on the back before filling this page) 495485 90. 12.  24 A7 B7 V. Description of Invention (16) Processing. (Please read the precautions on the reverse side before filling out this page) The method for manufacturing the fine particle dispersing sol according to the present invention is a heat treatment process. That is, in the organic oxide-containing composite oxide microparticle-dispersed sol forming the second silica coating layer, if necessary, an alkaline aqueous solution is added and the p Η of the dispersed sol is preferably adjusted to a range of 8 to 13; and Perform heat treatment. The heat treatment temperature at this time is in a range of about 50 to 350 ° C, and particularly preferably in a range of 100 to 300 ° C. Through this heat treatment, the porosity of the core particles can be maintained, and the pores of the coating layer can be eliminated, so that a sol dispersed with a closed composite oxide microparticle that seals the core particles through the silica-based coating layer can be obtained. Alas, during the heat treatment, the concentration of the organic oxide-containing composite oxide fine particle dispersed sol obtained in the process (c) may be diluted beforehand or concentrated. In addition, the final treatment (c) is the same as above, and the dispersed sol that is heat-treated can also be washed. (4) Film substrate Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Next, the film substrate of the present invention will be described. This substrate is made of glass, polycarbonate, acrylic resin, PET, TAC and other plastic sheets, plastic films, plastic panels, etc. to form a coating on the surface of the substrate, and the coating solution described below is immersed, sprayed, and rotated. It can be obtained by a known method such as the coating method and the trowel coating method, which can be coated and dried on a substrate and then calcined if necessary. The coating liquid is a mixed liquid of the sol and the substrate for forming a film, and an organic solvent may be mixed if necessary. The so-called substrate for film formation refers to the size of the paper that can form a film on the surface of the substrate. Applicable to China National Standard (CNS) A4 (210X297 mm) _ 19-495485 A7 B7 V. Description of the invention (17) (Please read the back first Please fill in this page again) The ingredients can be selected and used from resins with suitable conditions such as adhesiveness, hardness, and applicability, etc., and examples include polyester resins, acrylic resins, and amines used previously Formate resin, vinyl chloride resin, epoxy resin, melamine resin, fluororesin, polysiloxane resin, butyraldehyde resin, phenol resin, vinyl acetate resin, ultraviolet curing resin, electric, radiation curing resin, latex Resins, water-soluble resins, hydrophilic resins, mixtures of these resins, coating resins for copolymers and modifiers of these resins, or hydrolyzable organosilicon compounds such as the aforementioned alkoxysilanes. In the case of using a coating resin as a substrate, for example, the aforementioned sol dispersion medium can be replaced with an organic solvent such as alcohol, such as an alcohol-dispersed sol, or the fine particles can be treated with a known coupling agent and dispersed in an organic solvent. The organic solvent disperses the sol and the coating resin, and is diluted with an appropriate organic solvent to prepare a coating solution. On the other hand, in the case of using a hydrolyzable organosilicon compound as a matrix, for example, water and an acid or base as a catalyst can be added to a mixed solution of an alkoxysilane and an alcohol to obtain a partial hydrolysis of the alkoxysilane. And mixed with the aforementioned sol, and diluted with an organic solvent as needed to prepare a coating solution. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The weight ratio of fine particles to substrate in the coating liquid is preferably in the range of fine particles / matrix 2/99 ~ 9/1. If the weight ratio exceeds 9/1, the strength of the coating is insufficient and practicality is insufficient. On the other hand, if the weight ratio is less than 1/99, the effect of adding the fine particles cannot be exhibited. The refractive index of the film formed on the surface of the above substrate may vary according to the mixing ratio of fine particles and resin and the refractive index of the resin used, but this paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297) Mm) 495485 A7 B7 V. Description of the invention (18) (Please read the precautions on the back before filling out this page) Can be 1 · 28 ~ 1.  Low refractive index of 50. Alas, the microparticles of the present invention have a refractive index of 1.20 to 1.44. This is because the fine particles of the present invention disperse the dispersion medium into voids even when the dispersion medium enters the pores of the particles, and the resin and the like are used to control the pore diameter of the silica-based coating layer within the aforementioned range when the film is dried. The film-forming component is sealed in the silica-based coating layer, and after the resin is hardened, the pores of the silica-based coating layer are kept porous within the closed particles. On the other hand, in the aforementioned porous fine particles (Japanese Patent Application Laid-Open No. 5-1 2 3 309), since a film-forming component such as a resin enters the pores, such a low refractive index cannot be made. In addition, compared with the fine particles whose surface is completely covered with silica and containing a solvent in the pores (Japanese Patent Application Laid-Open No. 7-1 3 3 105), the fine particles of the present invention have a low refractive index. rate. Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs In the above-mentioned film substrate, the refractive index of the substrate is below 1.60, preferably the refractive index of the substrate surface is 1.  The above-mentioned film containing the fine particles of the present invention is formed on a film of 60 or more (hereinafter, also referred to as an intermediate film). If the refractive index of the intermediate film is 1.60 or more, the refractive index difference from the aforementioned film (hereinafter, also referred to as a surface film) containing the fine particles of the present invention is large, and a film substrate having excellent antireflection performance can be obtained. The refractive index of the intermediate film can be adjusted according to the type of the metal oxide fine particles used, the mixing ratio of the metal oxide and the resin, and the refractive index of the resin used. The coating liquid for forming an intermediate film is a mixed liquid of metal oxide particles and a substrate for forming a film, and an organic solvent can be mixed as necessary. The substrate for film formation can be the same as the aforementioned film containing microparticles of the present invention. -ZΓ- This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm). B7 V. Description of the invention (19) By using the same substrate for film formation, a film substrate with excellent adhesion between the two films can be obtained. The weight ratio of the metal oxide fine particles to the substrate in the coating liquid for forming an intermediate film is fine particles / matrix = 30/70 ~ 95/5, and particularly preferably in a range of 50/50 to 8/20. If the weight ratio exceeds 9 5/5, the strength of the film is insufficient, and the adhesion with the substrate is insufficient and practical. On the other hand, if the weight ratio is less than 30/70, the weight of the intermediate film is insufficient. The refractive index cannot be greater than or equal to 1.60, and the difference in refractive index between the refractive index and the surface film cannot help becoming large. Therefore, the reflection prevention performance is insufficient. The metal oxide fine particles preferably use a refractive index of 1.60 or more, particularly 1.70 or more, and examples thereof include titanium oxide (2.50), zinc oxide (2.0), and chromium oxide (2 · 2 0), oxide planer (2 · 2), tin oxide (2 · 0), hafnium oxide (2 · 1), barium titanate (2 · 4 0), aluminum oxide (1 · 7 3), magnesium oxide ( 1 . 77), yttrium oxide (1. 92), antimony oxide (2. 0), indium oxide (2 · 0), etc. Among them, conductive fine particles such as titanium oxide, oxide scale, tin oxide, antimony oxide, zirconia, and indium oxide 2 and conductive fine particles in which different elements such as antimony, tin, and fluorine are mixed, because the obtained film is It has better anti-reflection performance and anti-static effect. The refractive index of the metal oxide particles is less than 1.  At 60, the refractive index of the intermediate film cannot be made 1.60 or more, and the refractive index difference from the surface film cannot help becoming large, so the reflection prevention performance becomes insufficient. The average particle diameter of the metal oxide fine particles is 5 to 100 nm, and particularly preferably in the range of 10 to 60 nm. The average particle size is less than 5 The size of this paper is applicable to China National Standard (CNS) A4 (210 X 297 mm) -22---------- I ------------ ^ ---- I ---- (Please read the note on the back? Matters before filling out this page) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 495485 A7 ___ B7 V. Description of the invention (2) nm particle acquisition It is difficult, and if it exceeds 100 nm, the dispersion of visible light becomes significant and the transparency of the coating is reduced, which is not good. When using such metal oxide fine particles to prepare a coating liquid for forming an intermediate film, it is preferable to use a sol in which metal oxide fine particles are dispersed in a dispersion medium, and an organic solvent in which a water-dispersed sol can be dispersed in an organic solvent such as alcohols. After the solvent-dispersed sol or the fine particles are treated with a known coupling agent, the organic solvent-dispersed sol dispersed in an organic solvent is diluted with an appropriate organic solvent to form a coating liquid. Furthermore, a surfactant may be added to the coating liquid in order to improve dispersibility, stability, and the like. The two-layer film base material may be coated and dried by applying a coating liquid for intermediate film formation, and calcined as necessary to form an intermediate film, followed by coating and drying the coating liquid for surface film formation as described above, as necessary. Can be obtained by calcining. Alternatively, the coating liquid for forming a surface film may be applied after the application of the coating liquid for forming an intermediate film or after drying, and may be obtained by firing if necessary. The present invention will be described more specifically based on the examples shown below. Example 1 [Production of composite oxide sol] A mixture of 100 g of silica sol with an average particle diameter of 5 nm and a concentration of S 100 of 20% by weight and 1,900 g of pure water was added at 80 ° C. temperature. The pH of this reaction mother liquor was 10 · 5, and SiO 2 · 1.5 wt% sodium silicate aqueous solution of 9 000 g and A 1 2 0 3 0 were simultaneously added to the same mother liquor. 9000 g of a 5% by weight aqueous sodium aluminate solution. In the meantime, it will reflect that the paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ----- I ---------------- Order ---- ----- Line (Please read the precautions on the back before filling this page) 495485 A7 _ B7 V. Description of the invention (21) The liquid temperature should be kept at 80 ° C. The p of the reaction solution rose to 1 2 · 5 immediately after the addition, and there was almost no change thereafter. After the addition is complete, cool the reaction solution (please read the precautions on the back before filling in this page), cool to room temperature, and wash and concentrate with a super film to obtain a solid concentration of 20% by weight. A 1 2 0 3 Preoxide of the composite oxide particle (A) 〇 To the previous 500 grams of the protosol (A) was added pure water 1.7 g and warmed to 9 8 ° C, while keeping at At this temperature, 2,000 g of a silicic acid solution (Sio2 concentration 3.5% by weight) obtained by debasing an aqueous sodium silicate solution with a cation exchange resin was added over 5 hours to obtain S coated with silica. 〇2 · A 1 203 composite oxide particle pro-sol (B). In this sol, 500 g of sol having a solid content concentration of 13% by weight was washed with an ultrafiltration membrane, and pure water 1 was added.  1 2 5 grams, and then add concentrated hydrochloric acid (35.5%) to make ρ Η 1.  〇, and perform aluminization treatment 〇 Secondly, while adding 10 liters of hydrochloric acid aqueous solution of P 3 and 5 liters of pure water, the aluminum salt dissolved in the ultrafiltration membrane was separated to obtain S 1 coated with silica. 2 · A 1 203 composite oxide particles (P 1) printed disperse sol (c) by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. This silica-coated composite oxide particle (P 1) has a Μ0 × / Sio2 (molar ratio), an average particle diameter, a pore volume, a thickness of the coating layer, a maximum pore diameter, and a refractive index of the particles. Shown in Table 1. Here, the average particle diameter is measured by a dynamic light scattering method, and the pore volume of the particles is measured by a nitrogen adsorption method. The thickness of the coating layer is to obtain the grains before coating by dynamic light scattering method. -24- This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm). Cooperative printed A7 B7 V. Description of the invention (22) diameter, and assuming the weight and true specific gravity of the oxide or composite oxide used to form the coating layer and the pore volume of the coating layer to be 0.5 / g, calculated The volume of the coating is obtained and calculated from these figures. Alas, the true specific gravity of the oxide is S 102 = 2 · 6 and Al 2 03 = 3 · 2, and in the case of a composite oxide, 値 calculated from the composition is used. The maximum pore diameter of the coating layer was measured using an automatic pore distribution measuring device (Autosorb-6, manufactured by Quanta Chrome). The refractive index of the particles in the sol was measured as follows. (1) The porous composite oxide dispersion sol is placed in an evaporator, and the dispersion medium is evaporated. (2) It is dried at 120 ° C and powdered. (3) Drop a standard refracting solution of known refractive index on a glass plate and drop 2 or 3 drops, and mix the above powder into it. (4) Perform the operation (3) above with various standard refracting liquids, and use the refractive index of the standard refracting liquid when the mixed solution (in many cases, paste) is transparent, as the refractive index of the particles. [Manufacture of low-reflection film] Pass the composite oxide sol (c) into the ultrafiltration membrane, and replace the water in the dispersion medium with ethanol. 50 g of this ethanol sol (solid content concentration: 5% by weight) and 3 g of acrylic resin (Heteroid 1 007, manufactured by Hitachi Chemical Co., Ltd.) and a mixed solvent of 1/1 (weight ratio) of isopropyl alcohol and n-butanol 47 g are mixed thoroughly to prepare a coating solution. This coating solution is applied on a PET film by a bar coating method, and the paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm) -25- --------- ----------- Order --------- line (Please read the precautions on the back before filling this page) Printed by the Employee Consumption Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 495485 A7 One One B7 V. Description of the invention (23) Dry at 80 ° C for 1 minute 'to obtain a low reflection film (F 1). The film (F1), the uncoated PET film (F0), the total light transmittance, the haze, the reflectance of light with a wavelength of 5 50 nm and the refractive index of the coating are shown in Table 2. The total light transmittance and haze were measured with a Haze meter (manufactured by Suga Test Co., Ltd.) and the reflectance was measured with a full-spectrophotometer (Japanese Spectrophotometer, UDest-55). The refractive index of the coating was measured using an Elipso meter (manufactured by ULVAC, E M S — 1). In addition, on the surface of the low-reflection film (F 1), a small knife was cut at a distance of 1 mm in length and width to cut out 11 parallel wounds to make 1000 components, and then bonded them with glass tape, followed by the following, In four stages, the number of components that remained on the film without peeling when the glass tape was peeled was classified, and the adhesiveness was evaluated. The results are shown in Table 2. Number of residual components 9 5 or more: ◎ Number of residual components 9 0 to 9 4: 〇 Number of residual components 85 to 89: △

殘存分量數目8 4個以下:X 〔低反射玻璃之製造〕 於矽酸乙酯(S 1〇2濃度2 8重量% ) 2 0克、乙醇 4 5克及純水5 · 3 3克之混合溶液中添加少量的鹽酸, 取得含有矽酸乙酯部分水解物之基體。於此基體中’混合 複合氧化物溶膠(c )經乙醇溶劑置換之乙醇溶膠(固形 成分濃度1 8重量% ) ’調製塗佈液。 將此塗佈液於透明玻璃板表面,以5 〇 〇 r P m ’ 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -26- -----------------------訂---------線^^ (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 495485 A7 B7 五、發明說明(24) 1〇秒之條件,以旋轉器法進行塗佈後,於1 6 0 °c中加 熱處理3 0分鐘,取得低反射玻璃(G 1 )。此玻璃( G 1 )與未塗佈玻璃(G 〇 )之全光線穿透率、霧値、波 長5 5 0 n m光線之反射率及被膜之折射率不於表2。 實施例2 〔複合氧化物溶膠之製造〕 於實施例1所得之經矽石覆被之複合氧化物粒子( P 1 )之分散溶膠(c ) 1 〇 〇克中,加入純水 1 ,9 0 0克並於9 5 °C加溫,且一邊保持此溫度,一邊 將矽酸鈉水溶液(S i〇2爲1 · 5克重量% ) 2 7,0 〇 0克及鋁酸鈉水溶液(A 1 2〇3爲0 · 5重量 % ) 2 7,0 0 0克同時慢慢添加,令微粒子(P 1 )進 行粒子成長爲核。添加終了後,冷卻至室溫,並以超濾膜 洗淨,再予以濃縮,取得固形成分濃度2 0重量%之以矽 石一氧化鋁覆被之S i〇2 · A 1 2〇3複合氧化物前質溶 膠(D )。 採集此複合氧化物前質溶膠(D ) 5 0 0克,根據實 施例1同樣之方法,進行脫鋁處理,取得表1所示之以砍 石覆被之s i〇2 · A 12〇3複合氧化物粒子(P 2)之 分散溶膠(E )。 〔低反射薄膜之製造〕 於實施例1中,除了將複合氧化物溶膠(C )變更使 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ----11----------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 495485 A7 B7 五、發明說明(25) 用複合氧化物溶膠(E )以外,同實施例1處理,取得低 反射薄膜(F 2 )。 〔低反射玻璃之製造〕 於實施例1中,除了將複合氧化物溶膠(C )變更使 用複合氧化物溶膠(E )以外,同實施例1處理’取得低 反射薄膜(G 2 )。 實施例3 〔複合氧化物溶膠之製造〕 除了使用S η〇2 0 . 5重量%之錫酸鉀水溶液 9 ,0 0 0克代替實施例1之鋁酸鈉以外,以實施例1同 樣之方法,取得固形成分濃度2 0重量%之S i〇2 · S η〇2複合氧化物前質溶膠(Η ),再以實施例1同樣之 方法,進行脫S η處理及覆被處理,取得表1所不之 S 1〇2 · S η〇2複合氧化物粒子(Ρ 3 )之分散溶膠( I ) ° 〔低反射薄膜之製造〕 於實施例1中,除了將複合氧化物溶膠(c )變更使 用複合氧化物溶膠(I )以外,同實施例1處理’取得低 反射薄膜(F 3 )。 〔低反射玻璃之製造〕 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ---------t--------訂---------線· (請先閱讀背面之注意事項再填寫本頁) 495485 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明(26) 於實施例1中,除了將複合氧化物溶膠(C )變更使 用複合氧化物溶膠(I )以外’同實施例1處理,取得低 反射薄膜(G 3 )。 竇施例4 將實施例1所得之S 1〇2 · A 1 2〇3複合氧化物粒 子前質溶膠(A ) 5 0 0克於9 0 °C中加溫,且一邊保持 於此溫度,一邊將砂酸鈉水溶液以陽離子交換樹脂脫鹼戶斤 得之矽酸液(S i〇2濃度3 · 5重量%) 3 ’ 000克及 銘酸水溶液(A 1 2〇3濃度3 · 5重量%) 1 0 0克歷2 小時添加,取得經矽石-氧化鋁覆被之S i〇2 · A 1 2〇3複合氧化物粒子前質溶膠(J )。 於此溶膠以超濾膜洗淨至固形成分濃度1 3重量%之 溶膠5 0 0克中加入純水1 · 1 2 5克,並再滴入濃鹽酸 (35 · 5%)至pHl · 0,並進行脫鋁處理。其次, 一邊加入P Η 3之鹽酸水溶液1 0公升及純水5公升,一 邊將起濾膜溶解之鋁鹽予以分離,取得以矽石-氧化鋁覆 被之S 1〇2 · A 1 2〇3複合氧化物粒子(Ρ 4 )之分散 溶膠(K )。 〔低反射薄膜之製造〕 於實施例1中,除了將複合氧化物溶膠(c )變更使 用複合氧化物溶膠(κ )以外,同實施例1處理,取得低 反射薄膜(F 4 )。 本紙張尺度適用中國國家標準(CNS)A4規格(21〇 χ 297公釐) -----------------------訂---------線^^ (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 495485 Α7 Β7 五、發明說明(27) 〔低反射玻璃之製造〕 於實施例1中,除了將複合氧化物溶膠(c )變更使 用複合氧化物溶膠(K )以外’同實施例1處理’取得低 反射玻璃(G 4 )。 比較例1 〔複合氧化物溶膠之製造〕 同實施例1處理’調製S i〇2 · A 1 2〇3複合氧化 物粒子前質溶膠(A )。於此溶膠(A ) 3 2 5克中加入 結水1 ,3 0 0克,並再滴入濃鹽酸(3 5 · 5 % )至 ρ Η 1 . 0,並進行脫鋁處理。 其次,一邊加入Ρ Η 3之鹽酸水溶液1 〇公升及純水 5公升,一邊將超濾膜溶解之鋁鹽予以分離’取得s i〇2 • A 1 2〇3複合氧化物粒子(Ρ ’ 1 )之分散溶膠(L ) 〔低反射薄膜之製造〕 於實施例1中,除了將複合氧化物溶膠(c )變更使 用複合氧化物溶膠(L )以外,同實施例1處理,取得低 反射薄膜(F ’ 1 )。 〔低反射玻璃之製造〕 於實施例1中,除了將複合氧化物溶膠(C )變更使 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -30- -1----------------^--------- (請先閱讀背面之注意事項再填寫本頁) ^^485The number of remaining components is 8 or less: X [Made of low-reflection glass] A mixed solution of 20 g of ethyl silicate (S 102 concentration 28% by weight), 45 g of ethanol, and 5.33 g of pure water A small amount of hydrochloric acid was added to obtain a matrix containing a partial hydrolyzate of ethyl silicate. In this substrate, a coating solution was prepared by mixing the mixed oxide sol (c) with an ethanol solvent (solid content concentration: 18% by weight) with an ethanol solvent. The coating solution was applied on the surface of a transparent glass plate at 500r P m ′. The paper size was in accordance with China National Standard (CNS) A4 (210 X 297 mm) -26- --------- -------------- Order --------- line ^^ (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 495485 A7 B7 V. Description of the invention (24) After applying the spinner method for 10 seconds, heat treatment was performed at 160 ° C for 30 minutes to obtain a low reflection glass (G 1). The glass (G 1) and the uncoated glass (G 0) have the total light transmittance, fog, and reflectance of light with a wavelength of 5 50 nm and the refractive index of the coating are not shown in Table 2. Example 2 [Production of composite oxide sol] To 100 g of the dispersed sol (c) of the silica-coated composite oxide particles (P 1) obtained in Example 1 was added pure water 1,90. 0 g and heating at 95 ° C, and while maintaining this temperature, an aqueous sodium silicate solution (Sio2 is 1.5 g% by weight) 2 7.0 g and an aqueous sodium aluminate solution (A 1 2 0 3 is 0.5% by weight) 27.0 g are slowly added at the same time, so that the particles (P 1) are grown into cores. After the addition was completed, the mixture was cooled to room temperature, washed with an ultrafiltration membrane, and then concentrated to obtain a silica-alumina-coated SiO 2 · A 1 2 03 composite with a solid content concentration of 20% by weight. Preoxide oxide sol (D). 500 grams of this composite oxide precursor sol (D) was collected and subjected to dealumination treatment in the same manner as in Example 1 to obtain the si02 · A 12〇3 composite covered with stone cutting as shown in Table 1. Disperse sol (E) of oxide particles (P 2). [Manufacturing of low-reflection film] In Example 1, except that the composite oxide sol (C) was changed so that the paper size was adapted to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ---- 11-- -------------- Order --------- line (please read the precautions on the back before filling this page) Printed by the Employee Consumption Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs 495485 A7 B7 V. Description of the invention (25) Except using the composite oxide sol (E), the same treatment as in Example 1 was performed to obtain a low reflection film (F 2). [Production of low reflection glass] In Example 1, except that the composite oxide sol (C) was changed to use the composite oxide sol (E), the same treatment as in Example 1 was performed to obtain a low reflection film (G 2). Example 3 [Production of composite oxide sol] The same method as in Example 1 was used except that 9.0 g of a potassium stannate aqueous solution of 9,0 g was used instead of sodium aluminate of Example 1. , To obtain a solid SiO 2 · S η02 composite oxide precursor sol (Η) with a solid content concentration of 20% by weight, and then perform a de-S η treatment and a coating treatment in the same manner as in Example 1 to obtain a table. The dispersive sol (I) of S 1〇2 · S η〇2 composite oxide particles (P 3) ° [Manufacture of low-reflection film] In Example 1, except that the composite oxide sol (c) Except changing the use of the composite oxide sol (I), the same treatment as in Example 1 was performed to obtain a low-reflection film (F3). [Manufacturing of Low-Reflection Glass] This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) --------- t -------- Order ----- ---- Line · (Please read the precautions on the back before filling this page) 495485 Printed by the Consumer Property Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (26) In Example 1, except for the complex oxide The sol (C) was changed except that the composite oxide sol (I) was used. The same treatment as in Example 1 was carried out to obtain a low-reflection film (G 3). Dou Example 4 Warm 500 grams of the S 1202 · A 1 2 03 composite oxide particles protosol (A) obtained in Example 1 at 90 ° C, and keep it at this temperature, While the sodium silicate solution was dealkaliated with a cation exchange resin, the silicic acid solution (Sio2 concentration 3.5% by weight) 3'000 g and the aqueous solution of sodium oxalic acid (A1 2003 concentration 3.5% by weight) %) 100 g was added over 2 hours to obtain a silica-alumina-coated S i02 · A 1 2 03 composite oxide particle prosol (J). The sol was washed with an ultrafiltration membrane to 500 grams of sol having a solid content concentration of 13% by weight. Pure water 1. · 125 grams were added, and concentrated hydrochloric acid (35 · 5%) was added dropwise to pH l · 0. And dealumination treatment. Next, while adding 10 liters of hydrochloric acid aqueous solution of P Η 3 and 5 liters of pure water, the aluminum salt dissolved from the filter membrane was separated to obtain S 1 02 · A 1 2 coated with silica-alumina. 3 Disperse sol (K) of composite oxide particles (P 4). [Production of Low-Reflection Film] In Example 1, except that the composite oxide sol (c) was changed to use a composite oxide sol (?), The same treatment as in Example 1 was performed to obtain a low-reflection film (F4). This paper size applies to China National Standard (CNS) A4 (21〇χ 297 mm) ----------------------- Order ------ --- Line ^^ (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 495485 Α7 Β7 V. Description of the invention (27) [Manufacture of low reflection glass] In Example 1 In addition, except that the composite oxide sol (c) was changed to use the composite oxide sol (K), a low-reflection glass (G4) was obtained in the same manner as in Example 1. Comparative Example 1 [Production of composite oxide sol] The same treatment as in Example 1 was used to prepare a SiO 2 · A 1 2 03 composite oxide particle precursor sol (A). To this 32.5 grams of sol (A) was added 1,300 grams of condensed water, and then concentrated hydrochloric acid (35.5%) was added dropwise to ρ Η 1.0, and dealumination treatment was performed. Next, while adding 10 liters of a hydrochloric acid aqueous solution of P 3 and 5 liters of pure water, the aluminum salt dissolved in the ultrafiltration membrane was separated, and si0 2 • A 1 2 03 composite oxide particles (P ′ 1) were obtained. Dispersion sol (L) [Manufacture of low-reflection film] In Example 1, except that the composite oxide sol (c) was changed to use the composite oxide sol (L), the same treatment as in Example 1 was performed to obtain a low-reflection film ( F '1). [Manufacturing of low-reflection glass] In Example 1, except that the composite oxide sol (C) was changed so that the paper size applied the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -30- -1-- -------------- ^ --------- (Please read the notes on the back before filling this page) ^^ 485

五、發明說明(28 ) 用複合氧化物溶膠(L 以外 同實施例1處理,取得低 經濟部智慧財產局員工消費合作社印製V. Description of the invention (28) Use a complex oxide sol (other than L) The same as in Example 1 and obtain low-cost printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs

反射薄膜(G 也1交例2 〔複合氧化物溶膨之製造〕 同比較例1處理,調製S 1 〇 2 · A 1 2〇3複合氧化 物粒子(P, 1 )之分散溶膠(L· ),並將此丨谷膠 15〇〇克,純水500克,乙醇1 ,75〇克及28% 氨水6 2 6克之混合液於3 5 °C加溫後’添加砂酸乙酉曰( S 1〇2濃度2 8重量% ) 1 〇 4克,將複合氧化物粒子( P ’ 1 )之表面以矽酸乙酯之水解縮聚物予以覆被。其次 ,以蒸發器濃縮至固形成分濃度5重量%後’加入1 5 % 氨水至Ρ Η 1 0,並以壓熱器於1 8 〇 °C加熱處理2小時 ,取得以矽石完全覆被之S 1〇2 · A 1 2〇3複合氧化物 粒子(P ’ 2 )之分散溶膠(Μ )。 〔低反射薄膜之製造〕 於實施例1中,除了將複合氧化物溶膠(c )變更使 用複合氧化物溶膠(Μ )以外,同實施例1處理,取得低 反射薄膜(F ’ 2 )。 〔低反射玻璃之製造〕 於實施例1中,除了將複合氧化物溶膠(C )變更使 用複合氧化物溶膠(Μ )以外,同實施例1處理,取得低 (請先閱讀背面之注意事項再填寫本頁) ---------訂---------線一 本纸張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -31 - 經濟部智慧財產局員工消費合作社印製 495485 A7 ______B7 五、發明說明(29 ) 反射玻璃(G ’ 2 )。 實施例5 〔低反射被膜樹脂基材之製造〕 將實施例3所得之S i〇2 · S η〇2複合氧化物粒子 (Ρ 3 )之分散溶膠(I )通過超濾膜作成固形成分濃度 2〇重量%,並將其2 5克與UV樹脂(大日本油墨(株 )製:UnIDICK V5 5 00 ) 5克及乙醇7 0克充分混合,調 製表面被膜形成用塗佈液。又將氧化鈦膠體粒子(觸媒化 成工業(株)製·· Optolake 1130Z、折射率2 · 2,平均粒 徑20nm,濃度20重量%) 20克和UV樹脂(大曰 本油墨(株)製:Unidick V5500 ) 5克和乙醇1 1克充分 混合,調製中間被膜形成用塗佈液。 將此中間被膜形成用塗佈液於丙烯板(三菱麗昂(株 )製:AcryUte,折射率=1 . 4 9 )上,使用棒塗器予以 塗佈,並於7 0 t乾燥1分鐘,調製中間被膜樹脂基材。 此時之中間被膜之折射率爲1 . 6 4。其次,將先前調製 之表面被膜形成用塗佈液使用棒塗器進行塗佈,並於7 0 °C乾燥1分鐘後,以高壓水銀燈(8 0 w / c m )照射1 分鐘令其硬化,取得形成二層被膜之樹脂基材(R 1 )。 樹脂基材(R 1 )之全光線穿透率、霧値、波長 5 5 0 n m光線之反射率示於表2。尙,表面被膜之折身寸 率爲另外不形成中間被膜、於丙烯板上直接形成表面被膜 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -32- ----------------------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 495485 經濟部智慧財產局員工消費合作社印制衣 A7 B7 五、發明說明(3〇) ,並以 Elipso meter ( ULVAC 公司製:E M S — 1 )測定 ,且結果示於表2。 g施例6 〔低反射被膜樹脂基材之製造〕 將實施例1所得之s i〇2 · A 1 2〇3複合氧化物粒 孑(P 1 )之分散溶膠(C )通過超濾膜作成固形成分濃 度2 0重量%,並將其2 5克與丙烯酸樹脂(日立化成( 株)製:Hytarcnd 1007 ) 5克及乙醇7 0克充分混合,調 製表面被膜形成用塗佈液。又將氧化鈦膠體粒子(觸媒化 成工業(株)製:Optolake 1130Z、折射率2 · 2,平均粒 徑20nm,濃度20重量%) 20克和UV樹脂(大曰 本油墨(株)製:Unidick V5500 ) 5克和異丙醇7 5克充 分混合,調製中間被膜形成用塗佈液。 將此中間被膜形成用塗佈液於丙烯板(三菱麗昂(株 )製:Acirylite ’折射率=1 · 4 9 )上,使用浸漬法予以 塗佈,並於7 0 °C乾燥1分鐘,調製中間被膜樹脂基材。 此時之中間被Θ吴之折射率爲1 · 8 0。其次,將先前調製 之表面被膜形成用塗佈液使用棒塗器進行塗佈,並於7 0 °C乾燥1分鐘後,以高壓水銀燈(8 0 w / c m )照射1 分鐘令其硬化,取得形成二層被膜之樹脂基材(R 2 )。 樹脂基材(R 2 )之全光線穿透率、霧値、波長 5 5 0 n m光線之反射率示於表2。尙,表面被膜之折射 率爲另外不形成中間被膜、於丙烯板上直接形成表面被膜 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -33- -----1----------------訂---------線^^ (請先閱讀背面之注意事項再填寫本頁) 495485 經濟部智慧財產局員工消費合作社印製 Α7 Β7 五、發明說明(31 ) ’並以 Elipso meter ( ULVAC 公司製:E M S - 1 )測定 ’且結果示於表2。 於實施例5中,除了使用比較例1所得之S i〇2 · A 1 2 0 3複合氧化物微粒子(p ’ 1 )之分散溶膠(L ) 代替S i〇2 · s η〇2複合氧化物粒子(P 3 )之分散溶 膠(Ϊ )以外,同實施例5處理,取得二層被膜樹脂基材 (R ’ 1 )。 樹脂基材(R ’ 1 )之全光線穿透率、霧値、波長 5 5 0 n m光線之反射率示於表2。尙,表面被膜之折射 率爲另外不形成中間被膜,於丙烯板上直接形成表面被膜 ’並以 Elipso meter ( ULVAC 公司製:E M S — 1 )測定 ,且結果示於表2。 ------ I----------------訂---------線^^· (請先閱讀背面之注意事項再填寫本頁) 表1 粒子Μ〇X / S i〇2 平均粒徑細孔容積 覆被層 折射率 (莫耳比) (nm) (ml/g) 厚度 最大細孔 (nm) 徑(nm) PI 4.7 X ΙΟ'3 27 0.17 3.5 2.0 1.36 P2 4.3 X 10 3 54 0.42 2.0 3.5 1.34 P3 4·8 X l〇·3 25 0.14 2.5 1.5 1.39 P4 3.6 X l〇'3 35 0.23 7.5 4.0 1.37 p/ 1 20 X 10'3 20 0.12 0 8.0 1.47 P'2 8.0 X ΙΟ 3 27 0 7.0 0 1.40 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -34- 495485 經濟部智慧財產局員工消費合作社印制衣 A7 _B7 五、發明說明(32 ) 表2 基材 全光線穿透率 霧値 反射率 被膜之折射率 密合性 (%) (%) (%) F0 90.7 2.0 7.0 — F1 95.8 0.6 0.9 1.39 〇 F2 95.0 0.9 0.7 1.36 〇 F3 94.7 1.1 0.8 1.38 〇 F4 96.0 0.4 1.0 1.38 ◎ F,1 91.2 1.8 5.0 1.45 X F,2 93.6 1.5 3.2 1.43 Δ R1 95.5 0.2 1.0 1.42 ◎ R2 96.7 0.2 0.6 1.40 ◎ R,1 93.0 0.2 3.7 1.48 ◎ GO 92.0 0.7 4.0 — G1 96.7 0.4 0.5 1.27 G2 96.0 0.5 0.1 1.32 G3 95.5 0.5 0.6 1.38 G4 96.2 0.3 0.2 1.35 G7 1 95.0 0.5 2.2 1.43 94.7 0.5 1.8 1.41 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -35- 經濟部智慧財產局員工消費合作社印製 495485 A7 B7 五、發明說明(33 ) 實施例7 〔核粒子分散液之調製〕 將甲基三甲氧基矽烷27 · 4克於〇 . 6 5重量%之 氫氧化鈉水溶液8 7 2 · 6克中混合,並於室溫攪拌1小 時,取得CH3S i〇3/2 1 · 5重量%之無色透明之部 分水解物水溶液。 其次,將作爲種粒子之平均粒徑5 n m,S i〇2濃度 2〇重量%之矽溶膠2 0克與純水3 8 0克之混合物於 8 0 °C加溫。此反應母液之p Η爲6 0 · 5,並於同母液 中,將S i〇2 1 · 5重量%之矽酸鈉水溶液9 0 0克、 和上述部分水解物之水溶液9 0 0克,和A 1 2〇3濃度 〇.5重量%之鋁酸鈉水溶液1 8 0 0克歷6小時同時添 加◦其間,將反應液溫度保持於8 0 °C。反應液之p Η於 添加後立即上升至1 2 . 7,其後則幾乎無變化。添加終 了後,將反應液冷卻至室溫,並以超濾膜洗淨,取得固形 成分濃度2 0重量%之含有甲基之S 1〇2 · A 1 2〇3複 合氧化物之分散液(A 1 )。 〔第一矽石系覆被層之形成〕 其次,於分散液(A 1 ) 2 5 0克中加入純水5 5 0 克並於9 8 t:加溫,且一邊維持於此溫度’ 一邊將矽酸鈉 水溶液以陽離子交換樹脂脫鹼所得之矽酸液(s i 0 2濃度 3 · 5重量% ) 1 ,0 0 0克歷5小時添加’取得以$夕石 覆被之含有甲基之S 1〇2 · A 1 2〇3複合氧化物之微粒 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -36- ----------------------訂---------線^^ (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 495485 A7 B7 五、發明說明(34) 子前質溶膠(B 1 )。 〔元素之選擇性除去〕 將此溶膠(B 1 )使用超濾膜洗淨,並於固形成分濃 度1 3重量%之溶膠5 0 0克中加入純水1 .1 2 5克, 並再滴入濃鹽酸(濃度35 · 5%)至pHl · 0,且進 行脫銘處理。 其次,一邊加入P Η 3之鹽酸水溶液1 0公升及純水 5公升,且一邊使用超濾膜將溶解之鋁鹽予以洗淨除去, 並且濃縮,取得以固形成分濃度1 3重量%矽石所覆被之 含有甲基之S i〇2 · A 1 2〇3複合氧化物微粒子之分散 溶膠(C 1 )。 實施例8 〔第二矽石覆被層之形成〕 將實施例7所得之洗淨後之分散溶膠(C 1 ) 1 5 00克,和純水500克、乙醇1 ,750克及28 %氨水6 2 6克之混合液於3 5 t加溫後,添加矽酸乙酯 (Si〇2濃度28重量%) 104克,且將前述以矽石覆 被之S 1〇2 · A 1 2〇3複合氧化物微粒子之表面,再以 矽酸乙酯之水解物覆被,取得以矽石覆被2層之開放型含 有甲基之S 1〇2 · A 1 2〇3複合氧化物微粒子之分散溶 膠(D 2 )。 ^紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -37: I---I I----------------訂---------線^^· (請先閱讀背面之注意事項再填寫本頁) 495485 A7 B7 五、發明說明(35) 實施例9 〔加熱處理〕 (請先閱讀背面之注意事項再填寫本頁) 將實施例8所得之分散溶膠(D 2 ) ’以蒸發器濃縮 至固形成分濃度5重量%後,加入1 5%氨水使呈pH 1〇,並以壓熱器於1 8 0 °C加熱處理2小時,取得矽石 覆被層爲不具有細孔之密閉型含有甲基之S i〇2 · A 1 2〇3複合氧化物微粒子之分散溶膠(E 3 )。 奮施例1〇 將乙烯基三甲氧基矽烷5 0 · 6克於1 · 3重量%之 氫氧化鈉水溶液8 4 9 · 4克中混合,並於室溫攪拌1小 時,取得CH2CHS i〇3/2 3 · 0重量%之無色透明 之水解物之水溶液。 除了使用上述乙烯基三曱氧基矽烷水解所得之無色透 明部分水解物之水溶液,代替實施例7之甲基三甲氧基矽 烷水解所得之無色透明部分水解物之水溶液以外,同實施 例7處理,取得以矽石覆被之含有乙烯基之S i ◦ 2 · A 1 2〇3複合氧化物微粒子之分散溶膠(C 4 )。 經濟部智慧財產局員工消費合作社印製 實施例1 1 將實施例1 0所得之分散溶膠(C 4 ) 1 5 0 0克’ 和純水500克、乙醇1 ,750克及28%氨水626 克之混合液於3 5 °C加溫後,添加矽酸乙酯(S i〇2濃度 28重量%) 104克,且將前述以矽石覆被之Si〇2· -38- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 495485 A7 B7 五、發明說明(36) (請先閱讀背面之注咅事項再填寫本頁) A 1 2〇3複合氧化物微粒子之表面,再以矽酸乙酯之水解 物覆被’取得以砂石覆被2層之開放型含有乙嫌基之 S i〇2 · A 1 2 0 3複合氧化物微粒子之分散溶膠(D 5 實施例1 2 將實施例1 1所得之分散溶膠(D 5 ),以蒸發器濃 縮至固形成分濃度5重量%後,加入1 5 %氨水使呈P Η 1 0,並以壓熱器於1 8 0 °C加熱處理2小時,取得矽石 覆被層爲不具有細孔之密閉型含有乙烯基之S i 〇2 · A 1 2 0 3複合氧化物微粒子之分散溶膠(E 6 )。 實施例1 3 除了使用Z r〇2濃度0 . 5重量%之碳酸銷銨水溶液 1 8 0 0克,代替實施例7之鋁酸鈉水溶液以外,同實施 例7處理,取得以矽石覆被之含有乙烯基之S i〇2 · Z r 0 2複合氧化物微粒子之分散溶膠(C 7 )。 經濟部智慧財產局員工消費合作社印製 實施例1 4 將實施例1 3所得之洗淨後之分散溶膠(C 7 ) 1 5 00克,和純水50〇克、乙醇1 ,750克及28 %氨水6 2 6克之混合液於3 5 °C加溫後,添加矽酸乙酯 (Si〇2濃度28重量%) 104克,且將前述以矽石覆 被之S i〇2 · A 1 2〇3複合氧化物微粒子之表面,再以 -39- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 495485 A7 B7 五、發明說明(37) 矽酸乙酯之水解物覆被,取得以矽石覆被2層之開放型含 有甲基之S 1〇2 · Z r〇2複合氧化物微粒子之分散溶膠 (請先閱讀背面之注意事項再填寫本頁) (D 8 )。 實施例1 5 將實施例1 4所得之分散溶膠(D 8 V,以蒸發器濃 縮至固形成分濃度5重量%後,加入1 5 %氨水使呈pH 1 0,並以壓熱器於1 8 0 °C加熱處理2小時,取得矽石 覆被層爲不具有細孔之密閉型含有甲基之S i〇2 · Z r 0 2複合氧化物微粒子之分散溶膠(E 9 )。 比較例4 經濟部智慧財產局員工消費合作社印製 將平均粒徑5 n m,S 1〇2濃度2 0重量%之矽溶膠 1〇0克與純水1 9 0 0克之混合物於8 0 °C中加溫。此 反應母液之pH爲1 0 · 5,於同母液中同時加入S i〇2 1 . 5重量%之石夕酸鈉水溶液9 0 0 0克及A 1 2〇3 0 · 5重量%之鋁酸鈉水溶液9 0 0 〇克。其間,將反應 液溫度保持於8 0 °C。反應液之p Η爲在添加後立即上升 至1 2 · 5 ,其後則幾乎無變化。添加終了後,將反應液 冷卻至室溫,並以超濾膜予以洗淨、濃縮,取得固形成分 濃度2 0重量%之8 i〇2 · A 1 2〇3複合氧化物粒子前 質溶膠(S ) ◦ 於此前質溶膠(S ) 5 0 0克中加入純水1 · 7 0 0 克並且加溫至9 8 °C,且一邊保持於此溫度,一邊將矽酸 -40- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 495485 經濟部智慧財產局員工消費合作社印製 A7 _____B7___ 五、發明說明(38) 鈉水溶液以陽離子交換樹脂予以脫鹼所得之矽酸液( s 1 〇2濃度3 · 5重量%) 2,000克歷5小時添加, 取得以Ϊ夕石覆被之S i〇2 · A 1 2〇3複合氧化物粒子前 質溶膠(T )。 於此溶膠(T )以超濾膜洗淨至固形成分濃度呈1 3 重量%之溶膠500克中,加入純水1 , 125克,並再 滴入環鹽酸(3 5 . 5%)令呈pHl · 0,並且進行脫 鋁處理。 其次,一邊加入p Η 3之鹽酸水溶液1 0公升及純水 5公升’一邊將超濾膜所溶解之鋁鹽予以分離,取得以矽 石覆被之S i〇2 · A 1 2〇3複合氧化物粒子之分散溶膠 (U )。 比較例5 將平均粒徑5 n m,S i〇2濃度2 0重量%之矽溶膠 2 0克與純水3 8 0克之混合物於8 0 °C中加溫。此反應 母液之pH爲1 〇 · 5,於同母液中同時加入S i〇2 1 · 5重量%之矽酸鈉水溶液1 8 0 0克及A 1 2〇3 0 · 5重量%之鋁酸鈉水溶液1 8 0 0克。添加速度爲5 毫升/分鐘其間,將反應液溫度保持於8 0 °C。反應液之 p Η爲在添加後立即上升至1 2 · 5,其後則幾乎無變化 。添加終了後,將反應液冷卻至室溫,取得S i〇2 · A 1 2〇3複合氧化物微粒子之分散液(〇)。 於此分散液(〇)5 0 0克中加入純水1 ,7 0 0克 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -41 - ------ 雇—^ --------訂---------線 (請先閱讀背面之注意事項再填寫本頁) 495485 A7 B7 五、發明說明(39) 並且加溫至9 8 °C,且一邊保持於此溫度,一邊將矽酸鈉 水溶液以陽離子交換樹脂予以脫鹼所得之矽酸液( (請先閱讀背面之注意事項再填寫本頁) S 1〇2濃度3 . 5重量%) 3,000克添加於此溶膠以 超濾膜洗淨至固形成分濃度呈1 3重量%之溶膠5 0 0克 中,加入純水1 ,1 2 5克,並再滴入環鹽酸(3 5 · 5 % )令呈ρ Η 1 . 0,並且進行脫鋁處理。 其次,一邊加入Ρ Η 3之鹽酸水溶液1 〇公升及純水 5公升,一邊將超濾膜所溶解之鋁鹽予以分離,取得除去 •部分鋁之S i〇2 · A 1 2〇3複合氧化物微粒子之分散 液(P )。 將此分散液(P ) 1 5 0 0克,純水5 0 0克’乙醇 1 ,7 5 0克及2 8 %氨水6 2 6克之混合液於3 5 °C加 溫後,添加矽酸乙酯(S i〇2濃度2 8重量% ) 1 〇 4克 經濟部智慧財產局員工消費合作社印製 ,將複合氧化物粒子之表面以矽酸乙酯之水解縮聚物予以 覆被。其次,以蒸發器濃縮至固形成分濃度5重量%後, 加入15%氨水至ρΗ1〇,並以壓熱器於180°C加熱 處理2小時,取得以矽石覆被之S i〇2 · A 1 2〇3複合 氧化物微粒子之分散液(Q )。 比較例6 將實施例7所得之含有甲基之S i〇2 · A 1 2〇3複 合氧化物之分散液(A 1 ),使用超濾膜予以洗淨’取得 固形成分濃度1 3重量%之含有甲基之S i〇2 · A 1 2〇3複合氧化物微粒子之分散液(R )。 -42- 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 495485 A7 -------B7___ 五、發明說明(4〇) 上述實施例7〜1 5及比較例4〜6所調製之核粒子 前質及覆被層之性狀示於表3,且複合氧化物微粒子之性 狀、折射率及溶膠之分散安定性示於表4。 關於分散安定性,係將上述分散溶膠(C 1 ,D 2, E 3等)1 〇 〇重量份和丙烯酸樹脂乳膠(ZENECA (株 )製:A - 6 1 4,丙烯酸樹脂濃度3 2重量%,水分散 媒體)7 5重量份混合之分散液,於8 0 t靜置1日後之 狀態,以目視觀察,並依據下列基準進行評價。又,微粒 子之折射率爲依據實施例1記載之方法測定。 〇:與混合時同樣良好之分散狀態者 △:察見樹脂層與粒子層有分離傾向者 x :於分散液中察見粘性增加或者凝膠化者 ------ I---------------訂---------線 (請先閱讀背面之注咅?事項再填寫本頁} 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 495485 A7 _B7 五、發明說明(41) 表3 核粒子前質 覆被層 平均粒徑 M〇x/Sl〇2 厚度 (nm) (莫耳/比) (nm) 實施例 7 19.6 0.17 1.0 實施例 8 19.6 0.17 7.3 實施例 9 19.6 0.17 7.0 實施例 10 27.2 0.12 1.4 實施例 11 27.2 0.12 10.1 實施例 12 27.2 0.12 9.7 實施例 13 23.1 0.17 1.2 實施例 14 23.1 0.17 8.6 實施例 15 23.1 0.17 8.3 比較例 4 20.2 0.17 3.5 比較例 5 19.9 0.17 5.1 比較例 6 19.6 0.17 — (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -44- 495485 A7 B7 五、發明說明(42) 表4 複合氧化物微粒子 經濟部智慧財產局員工消費合作社印製 M〇x/Sl〇2 Sr/St 細孔 平均 分散 折射率 容積 粒徑 安定性 (莫耳/比) (莫耳比) (cc/g) (nm) 實施例7 4.26 X 10'3 0.26 0.30 21.6 〇 1.31 實施例8 3.69 X ΙΟ3 0.23 0.22 34.2 〇 1.34 實施例9 3.60 X 10'3 0.23 0.00 33.6 Δ 1.36 實施例1 0 3. 12 X 10'3 0.36 0.50 30.0 〇 1.26 實施例1 1 2.68 X 10'3 0.31 0.41 47.4 〇 1.28 實施例1 2 2.6 6 X ΙΟ3 0.30 0.00 46.6 Δ 1.33 實施例1 3 6.66 X 10-3 0.24 0.22 25.5 〇 1.34 實施例1 4 5.77 X 10'3 0.21 0.19 40.3 〇 1.35 實施例1 5 5.69 X 10'3 0.21 0.00 39.7 Δ 1.38 比較例4 4.72 X ΙΟ3 0.00 0.17 27.2 X 1.36 比較例5 7.68 X ΙΟ3 0.00 0.00 30.1 Δ 1.42 比較例6 170 X 1〇·3 0.44 0.08 19.6 〇 1.46 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) - 45-Reflective film (G is also described in Example 2 [Production of swell of composite oxide] The same treatment as in Comparative Example 1 was performed to prepare a dispersed sol (L ·) of S 1 〇 2 · A 1 2 03 composite oxide particles (P, 1) ), And this mixture of 1500 g of gluten, 500 g of pure water, 1,750 g of ethanol and 28% ammonia water 6 2 6 g is heated at 3 5 ° C. 'Ethyl oxalate is added (S 10% concentration 2 8% by weight) 104%, the surface of the composite oxide particles (P'1) was coated with a hydrolyzed polycondensate of ethyl silicate. Next, it was concentrated by an evaporator to a solid content concentration of 5 After weight percent, 15% ammonia water was added to PΡ10, and heat treated at 180 ° C for 2 hours with an autoclave to obtain S 1 02 · A 1 2 03 composite completely covered with silica. Dispersion sol (M) of oxide particles (P'2). [Production of low-reflection film] In Example 1, the same operation was performed except that the composite oxide sol (c) was changed to use the composite oxide sol (M). Example 1 was processed to obtain a low-reflection film (F'2). [Production of low-reflection glass] In Example 1, except for the complex oxide sol (C) In addition to using the composite oxide sol (M), the same treatment as in Example 1 was achieved (please read the precautions on the back before filling in this page) --------- Order -------- -Line 1 paper size applies to Chinese National Standard (CNS) A4 (210 X 297 mm) -31-Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 495485 A7 ______B7 V. Description of the invention (29) Reflective glass (G '2). Example 5 [Manufacture of low-reflection coating resin base material] The dispersed sol (I) of the S i〇2 · S η〇2 composite oxide particles (P 3) obtained in Example 3 was passed through an ultrafiltration membrane A solid content concentration of 20% by weight was prepared, and 25 grams of the solid content concentration was mixed with 5 grams of UV resin (manufactured by Dainippon Ink Co., Ltd .: UnIDICK V5 5 00) and 70 grams of ethanol to prepare a coating solution for forming a surface film. . 20 g of titanium oxide colloidal particles (manufactured by Catalytic Chemical Industries, Ltd., Optolake 1130Z, refractive index 2.2, average particle size 20 nm, concentration 20% by weight), and UV resin (Dayokuben Ink Co., Ltd.) Production: Unidick V5500) 5 g and 11 g of ethanol were mixed well to prepare a coating liquid for forming an intermediate film. This coating liquid for forming an intermediate film was coated on an acrylic board (manufactured by Mitsubishi Leon Co., Ltd .: AcryUte, refractive index = 1.49), and was applied using a bar coater, and dried at 70 t for 1 minute to prepare Resin base material for intermediate film. The refractive index of the intermediate film at this time is 1. 6 4. Next, the previously prepared coating liquid for forming a surface film is coated with a bar coater and dried at 70 ° C for 1 minute. Then, it was irradiated with a high-pressure mercury lamp (80 w / cm) for 1 minute to harden it to obtain a resin substrate (R 1) forming a two-layer film. Table 2 shows the total light transmittance, fog, and reflectance of light with a wavelength of 5 50 n m of the resin substrate (R 1). Alas, the folding ratio of the surface coating is not to form an intermediate coating, and to directly form the surface coating on an acrylic sheet. The paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) -32- ---- ------------------ Order --------- line (please read the precautions on the back before filling this page) 495485 Employee Consumption of Intellectual Property Bureau of the Ministry of Economic Affairs Cooperative printed clothes A7 B7 V. Description of the invention (30), measured by Elipso meter (manufactured by ULVAC: EMS — 1), and the results are shown in Table 2. g. Example 6 [Manufacture of low-reflection coating resin substrate] The dispersed sol (C) of the SiO 2 · A 1 2 03 composite oxide particles 孑 (P 1) obtained in Example 1 was solidified by an ultrafiltration membrane. The component concentration was 20% by weight, and 25 grams thereof was sufficiently mixed with 5 grams of an acrylic resin (Hitachid 1007 manufactured by Hitachi Chemical Co., Ltd.) and 70 grams of ethanol to prepare a coating solution for forming a surface film. In addition, 20 g of titanium oxide colloidal particles (manufactured by Catalytic Chemical Industries, Ltd .: Optolake 1130Z, refractive index 2.2, average particle diameter 20 nm, concentration 20% by weight) and UV resin (manufactured by Daiichi Ink Co., Ltd .: Unidick V5500) 5 g and isopropyl alcohol 75 g were thoroughly mixed to prepare a coating liquid for forming an intermediate film. This coating solution for forming an intermediate film was coated on an acrylic plate (manufactured by Mitsubishi Leon Co., Ltd .: Acirylite 'refractive index = 1.49'), applied by a dipping method, and dried at 70 ° C for 1 minute. An intermediate film resin substrate is prepared. At this time, the refractive index of θ Wu is 1.80. Next, the previously prepared coating liquid for surface film formation was applied using a bar coater, and dried at 70 ° C for 1 minute, and then irradiated with a high-pressure mercury lamp (80 w / cm) for 1 minute to harden it to obtain A resin substrate (R 2) forming a two-layer film. Table 2 shows the total light transmittance, fog, and reflectance of light with a wavelength of 5 50 nm for the resin substrate (R 2). Alas, the refractive index of the surface coating is to form the surface coating directly on the acrylic plate without forming an intermediate coating. The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -33- ----- 1 ---------------- Order --------- line ^^ (Please read the precautions on the back before filling out this page) 495485 Employee Consumption of Intellectual Property Bureau, Ministry of Economic Affairs Cooperatives printed A7 B7 V. Description of the invention (31) 'and measured by Elipso meter (manufactured by ULVAC: EMS-1)' and the results are shown in Table 2. In Example 5, except for the use of the dispersed sol (L) of the S i〇2 · A 1 2 0 3 composite oxide fine particles (p '1) obtained in Comparative Example 1 instead of the S i〇 2 · s 〇 2 composite oxidation Except for the dispersed sol (Ϊ) of the object particles (P 3), the same treatment as in Example 5 was performed to obtain a two-layer film resin substrate (R ′ 1). Table 2 shows the total light transmittance, fog, and reflectance of light with a wavelength of 5 50 n m of the resin substrate (R ′ 1). That is, the refractive index of the surface film was not formed with an intermediate film, and the surface film was directly formed on an acrylic plate, and was measured with an Elipso meter (manufactured by ULVAC: E M S — 1). The results are shown in Table 2. ------ I ---------------- Order --------- line ^^ · (Please read the precautions on the back before filling this page) Table 1 Particles MoX / Sio2 average particle diameter pore volume coating layer refractive index (molar ratio) (nm) (ml / g) thickness maximum pore (nm) diameter (nm) PI 4.7 X ΙΟ '3 27 0.17 3.5 2.0 1.36 P2 4.3 X 10 3 54 0.42 2.0 3.5 1.34 P3 4 · 8 X l0 · 3 25 0.14 2.5 1.5 1.39 P4 3.6 X l〇'3 35 0.23 7.5 4.0 1.37 p / 1 20 X 10' 3 20 0.12 0 8.0 1.47 P'2 8.0 X ΙΟ 3 27 0 7.0 0 1.40 This paper size is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) -34- 495485 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Garment A7 _B7 V. Description of the invention (32) Table 2 Refractive index adhesiveness of the substrate's total light transmittance, haze reflectance (%) (%) (%) F0 90.7 2.0 7.0 — F1 95.8 0.6 0.9 1.39 〇F2 95.0 0.9 0.7 1.36 〇F3 94.7 1.1 0.8 1.38 〇F4 96.0 0.4 1.0 1.38 ◎ F, 1 91.2 1.8 5.0 1.45 XF, 2 93.6 1.5 3.2 1.43 Δ R1 95.5 0.2 1.0 1.42 ◎ R2 96.7 0.2 0.6 1.40 ◎ R, 1 93.0 0.2 3.7 1.48 ◎ GO 92.0 0 .7 4.0 — G1 96.7 0.4 0.5 1.27 G2 96.0 0.5 0.1 1.32 G3 95.5 0.5 0.6 1.38 G4 96.2 0.3 0.2 1.35 G7 1 95.0 0.5 2.2 1.43 94.7 0.5 1.8 1.41 (Please read the precautions on the back before filling this page) The paper size Applicable to China National Standard (CNS) A4 specification (210 X 297 mm) -35- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 495485 A7 B7 V. Description of the invention (33) Example 7 [Preparation of nuclear particle dispersion] 27.4 g of methyltrimethoxysilane was mixed in 0.85 g of a sodium hydroxide aqueous solution of 0.65 wt%, and stirred at room temperature for 1 hour to obtain CH3S iO3 / 2 1 · 5. A colorless and transparent partial hydrolysate aqueous solution by weight. Next, a mixture of 20 g of silica sol with an average particle diameter of 5 nm and a concentration of Sio2 of 20% by weight and 380 g of pure water was heated at 80 ° C. The p 母 of the mother liquor of this reaction is 60 · 5, and in the same mother liquor, 900 g of a SiO 2 1 · 5% by weight aqueous sodium silicate solution and 900 g of an aqueous solution of the above partial hydrolysate, It was simultaneously added with 1 800 g of sodium aluminate aqueous solution having a concentration of 0.5% by weight in 0.58% over a period of 6 hours. Meanwhile, the temperature of the reaction solution was maintained at 80 ° C. The p Η of the reaction solution rose to 12.7 immediately after the addition, and there was almost no change thereafter. After the end of the addition, the reaction solution was cooled to room temperature, and washed with an ultrafiltration membrane to obtain a dispersion solution of S 1 02 · A 1 2 03-containing composite oxide containing methyl groups at a solid content concentration of 20% by weight ( A 1). [Formation of the first silica-based coating layer] Next, 550 grams of pure water was added to 250 grams of the dispersion (A 1) and heated at 9 8 t: while maintaining the temperature at the same time. A silicic acid solution (si 0 2 concentration of 3.5% by weight) obtained by debasing an aqueous sodium silicate solution with a cation exchange resin was added at 1,000 g over 5 hours to obtain a methyl group containing methyl sulphate coated with S 1〇2 · A 1 2 03 Particles of composite oxides The paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) -36- ------------- --------- Order --------- line ^^ (Please read the notes on the back before filling out this page) Printed by the Employee Consumption Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 495485 A7 B7 V. Description of the invention (34) Proton prosol (B 1). [Selective removal of elements] This sol (B 1) was washed with an ultrafiltration membrane, and 1.1 g of pure water was added to 500 g of sol having a solid content concentration of 13% by weight, and then dropped. Add concentrated hydrochloric acid (concentration: 35 · 5%) to pH l · 0, and perform demarking treatment. Next, while adding 10 liters of a hydrochloric acid aqueous solution of P Η 3 and 5 liters of pure water, while washing and removing the dissolved aluminum salt using an ultrafiltration membrane, and concentrating to obtain a solid content of 13% by weight silica A dispersed sol (C 1) of the coated S i02 · A 1 2 03 composite oxide particles containing a methyl group. Example 8 [Formation of a second silica coating layer] The washed dispersed sol (C 1) 1500 g obtained in Example 7 and 500 g of pure water, 1,750 g of ethanol, and 28% ammonia water After heating 6 2 6 g of the mixed solution at 3 5 t, 104 g of ethyl silicate (SiO 2 concentration 28% by weight) was added, and the aforementioned silica-coated S 1 02 · A 1 2 03 The surface of the composite oxide fine particles was coated with a hydrolyzate of ethyl silicate to obtain an open-type methyl-containing S 1 02 · A 1 2 03 composite oxide fine particles coated with silica. Sol (D 2). ^ The paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -37: I --- I I ---------------- Order ----- ---- Line ^^ (Please read the precautions on the back before filling this page) 495485 A7 B7 V. Description of the invention (35) Example 9 [Heat treatment] (Please read the precautions on the back before filling out this page ) The dispersion sol (D 2) ′ obtained in Example 8 was concentrated by an evaporator to a solid content concentration of 5% by weight, and then 1% ammonia water was added to bring the pH to 10, and the autoclave was heated at 180 ° C. After processing for 2 hours, a silica sol (E 3) was obtained in which the silica coating layer was a closed type S i02 · A 1 2 03 composite oxide fine particle containing no pores. Fenshi Example 10. Mix 50.6 g of vinyltrimethoxysilane in 1.3 wt% sodium hydroxide aqueous solution 8 4 9 4 g, and stir at room temperature for 1 hour to obtain CH2CHS i〇3 / 2 3 · 0% by weight of a colorless and transparent hydrolysate in water. The same treatment as in Example 7 is performed except that the colorless transparent partial hydrolysate solution obtained by hydrolyzing the vinyltrimethoxysilane is used instead of the colorless transparent partial hydrolyzate solution obtained by hydrolyzing the methyltrimethoxysilane in Example 7. A dispersion sol (C 4) containing Si i 2 o A 1 2 03 composite oxide fine particles coated with silica was obtained. Example 11 printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 1 The dispersed sol (C 4) 1 500 g obtained in Example 10 and 500 g of pure water, 1,750 g of ethanol and 626 g of 28% ammonia water After the mixture was warmed at 35 ° C, 104 g of ethyl silicate (28% by weight of Si02) was added, and the aforementioned silica-coated Si02 · -38- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 495485 A7 B7 V. Description of the invention (36) (Please read the notes on the back before filling this page) A 1 2 03 Surface of composite oxide particles, Covered with a hydrolyzate of ethyl silicate to obtain an open-type dispersion of SiO 2 · A 1 2 0 3 composite oxide microparticles containing ethyl methacrylate with 2 layers of gravel (D 5 Example 1 2 The dispersion sol (D 5) obtained in Example 11 was concentrated by an evaporator to a solid content concentration of 5% by weight, then 15% ammonia water was added to make it P Η 1 0, and the autoclave was used at 180 Heat-treated at ° C for 2 hours to obtain a silica-coated closed-type vinyl-containing S i 〇2 · A 1 2 0 3 composite oxide particle without pores Disperse the sol (E 6). Example 13 The same treatment as in Example 7 was performed except that 1 800 g of an ammonium carbonate aqueous solution with a concentration of 0.5% by weight of ZrO2 was used instead of the aqueous sodium aluminate solution of Example 7. To obtain a dispersed sol (C 7) of S i02 · Z r 0 2 composite oxide particles containing vinyl coated with silica. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Example 1 4 Example After the washed disperse sol (C 7) 1 500 g obtained in 13 and the mixed solution of 50 g of pure water, 1,750 g of ethanol and 6 2 6 g of 28% ammonia water were heated at 3 5 ° C, 104 g of ethyl silicate (28% by weight of SiO2) was added, and the surface of the above-mentioned SiO 2 · A 1 2 03 composite oxide fine particles coated with silica was added to -39- paper Standards are applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) 495485 A7 B7 V. Description of the invention (37) Hydrolysate coating of ethyl silicate to obtain an open type containing silica coated with 2 layers Based on the dispersed sol of S 1〇2 · Z r〇2 composite oxide particles (please read the precautions on the back before filling this page) (D 8). Example 1 5 The dispersion sol (D 8 V obtained in Example 14 was concentrated by an evaporator to a solid content concentration of 5% by weight, and then 15% ammonia water was added to bring the pH to 10, and then an autoclave was used at 180. Heat-treated at ° C for 2 hours to obtain a silica-coated dispersed sol (E 9), which is a closed-type methyl-containing Sio2 · Z r 0 2 composite oxide fine particle having no pores. Comparative Example 4 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, a mixture of 100 g of silica sol with an average particle size of 5 nm and a concentration of 20% by weight of S 100 and 1 900 g of pure water at 80 ° C Warming up. The pH of the mother liquor of this reaction was 10 · 5, and S i02. 1.5% by weight sodium oxalate aqueous solution of 90000 g and A 1 2003.5% by weight of aluminum were simultaneously added to the same mother liquor. 9 000 g of aqueous sodium solution. Meanwhile, the temperature of the reaction solution was maintained at 80 ° C. The p of the reaction solution rose to 1 2 · 5 immediately after the addition, and there was almost no change thereafter. After the end of the addition, the reaction solution was cooled to room temperature, washed with an ultrafiltration membrane, and concentrated to obtain a presol of 8 〇2 · A 1 203 composite oxide particles with a solid content concentration of 20% by weight ( S) ◦ Add 1.7 g of pure water to 500 g of plastisol (S) and warm to 98 ° C, and keep the silicate at this temperature while maintaining the temperature of -40- this paper standard Applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 495485 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 _____B7___ V. Description of the invention (38) Silicic acid solution obtained by removing alkali with sodium cation exchange resin (S 1 〇2 concentration 3.5% by weight) 2,000 grams was added over 5 hours to obtain a SiO 2 · A 1 2 03 composite oxide particle presol (T) coated with flaxite. Here, the sol (T) was washed with an ultrafiltration membrane to 500 g of a sol having a solid content concentration of 13% by weight, and 1,125 g of pure water was added, and then cyclic hydrochloric acid (35.5%) was added dropwise. pHl · 0, and dealumination treatment. Next, while adding 10 liters of a hydrochloric acid aqueous solution of p Η 3 and 5 liters of pure water, the aluminum salts dissolved in the ultrafiltration membrane were separated to obtain a silica-coated S i02 · A 1 2 03 composite. Disperse sol (U) of oxide particles. Comparative Example 5 A mixture of 20 g of silica sol with an average particle diameter of 5 nm and a concentration of Si02 of 20% by weight and 380 g of pure water was heated at 80 ° C. The mother liquor of this reaction had a pH of 0.5. Simultaneous addition of SiO 2 1.5 wt% sodium silicate aqueous solution 1 800 g and A 1 230 0 5 wt% aluminate were added to the same mother liquor at the same time. 1 800 grams of aqueous sodium solution. During the addition at a rate of 5 ml / min, the temperature of the reaction solution was maintained at 80 ° C. The p Η of the reaction solution rose to 1 2 · 5 immediately after the addition, and there was almost no change after that. After the addition was completed, the reaction solution was cooled to room temperature to obtain a dispersion (0) of S i02 · A 1 2 03 composite oxide fine particles. Add 1.7 g of pure water to 500 g of this dispersion (〇). The paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm) -41------- employment — ^ -------- Order --------- line (please read the precautions on the back before filling this page) 495485 A7 B7 V. Description of the invention (39) and warm up to 9 8 ° C, and while maintaining at this temperature, the silicic acid solution obtained by debasing the sodium silicate aqueous solution with a cation exchange resin ((Please read the precautions on the back before filling in this page) S 10 2 concentration 3.5 3,000 grams of sol added to this sol, washed with ultrafiltration membrane to 500 grams of sol with a solid content concentration of 13% by weight, added 1,125 grams of pure water, and then dripped into the hydrochloric acid (3 5 · 5%) Let ρ. 1.0, and dealumination treatment. Secondly, while adding 10 liters of a hydrochloric acid aqueous solution of P 3 and 5 liters of pure water, the aluminum salt dissolved in the ultrafiltration membrane was separated to obtain a S i〇2 · A 1 2 03 composite oxidation that removes part of the aluminum. Dispersion of fine particles (P). This mixture (P) 1 500 grams, 500 grams of pure water 'ethanol 1, 7,500 grams and 28% ammonia water 6 2 6 grams of the mixture was heated at 3 5 ° C, and then added silicic acid Ethyl ester (Sio2 concentration: 28% by weight) was printed in 104 grams by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. The surface of the composite oxide particles was coated with a hydrolyzed polycondensate of ethyl silicate. Next, after concentrating with an evaporator to a solid content concentration of 5% by weight, 15% ammonia water was added to ρΗ10, and then heat-treated at 180 ° C for 2 hours using an autoclave to obtain S i02 · A coated with silica. Dispersion (Q) of 1 2 03 complex oxide particles. Comparative Example 6 The methyl-containing SiO 2 · A 1 20 3 complex oxide dispersion (A 1) obtained in Example 7 was washed with an ultrafiltration membrane to obtain a solid content concentration of 13% by weight. A dispersion (R) of S i02 · A 1 2 03 composite oxide fine particles containing a methyl group. -42- This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 495485 A7 ------- B7___ V. Description of the invention (40) Examples 7 to 15 above and comparative examples Table 3 shows the properties of the precursors and coatings of the nuclear particles prepared from 4 to 6, and Table 4 shows the properties, refractive index, and dispersion stability of the composite oxide fine particles. Regarding dispersion stability, 100 parts by weight of the above-mentioned dispersed sol (C 1, D 2, E 3, etc.) and acrylic resin latex (manufactured by ZENECA Co., Ltd .: A-6 1 4 and acrylic resin concentration 32% by weight) were used. , Water-dispersed media) 75 parts by weight of the mixed dispersion, left standing at 80 t for 1 day, visually observed, and evaluated according to the following criteria. The refractive index of the fine particles was measured according to the method described in Example 1. 〇: Dispersion state as good as when mixing △: Those with a tendency to separate the resin layer and the particle layer are observed x: Those with an increase in viscosity or gelation in the dispersion liquid ------ I ---- ----------- Order --------- line (Please read the note on the back? Matters before filling out this page} The paper size printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs Applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 495485 A7 _B7 V. Description of the invention (41) Table 3 Average particle diameter of pre-coating layer of nuclear particles M0x / Sl02 Thickness (nm) ( Molar / ratio (nm) Example 7 19.6 0.17 1.0 Example 8 19.6 0.17 7.3 Example 9 19.6 0.17 7.0 Example 10 27.2 0.12 1.4 Example 11 27.2 0.12 10.1 Example 12 27.2 0.12 9.7 Example 13 23.1 0.17 1.2 Example 14 23.1 0.17 8.6 Example 15 23.1 0.17 8.3 Comparative Example 4 20.2 0.17 3.5 Comparative Example 5 19.9 0.17 5.1 Comparative Example 6 19.6 0.17 — (Please read the precautions on the back before filling out this page) Staff Consumption of Intellectual Property Bureau, Ministry of Economic Affairs The paper size printed by the cooperative is applicable to China National Standard (CNS) A4 (210 X 297 mm) -44- 495485 A7 B7 V. Description of the invention (42) Table 4 Composite oxide particles printed by the Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperatives Mox / Sl02 Sr / St average dispersion index of fine pores Volume particle size stability (mol / r) (mol / r) (cc / g) (nm) Example 7 4.26 X 10'3 0.26 0.30 21.6 〇1.31 Example 8 3.69 X IO03 0.23 0.22 34.2 〇1.34 Example 9 3.60 X 10'3 0.23 0.00 33.6 Δ 1.36 Example 1 0 3. 12 X 10'3 0.36 0.50 30.0 〇1.26 Example 1 1 2.68 X 10'3 0.31 0.41 47.4 〇1.28 Example 1 2 2.6 6 X IO03 0.30 0.00 46.6 Δ 1.33 Example 1 3 6.66 X 10-3 0.24 0.22 25.5 〇1.34 Example 1 4 5.77 X 10'3 0.21 0.19 40.3 〇1.35 Example 1 5 5.69 X 10'3 0.21 0.00 39.7 Δ 1.38 Comparative Example 4 4.72 X ΙΟ3 0.00 0.17 27.2 X 1.36 Comparative Example 5 7.68 X ΙΟ3 0.00 0.00 30.1 Δ 1.42 Comparative Example 6 170 X 1〇 · 3 0.44 0.08 19.6 〇1.46 (Please read the precautions on the back before filling this page) This paper size is applicable to China National Standard (CNS) A4 Specification (210 X 297 mm)-45-

Claims (1)

495485 A8 B8 C8 D8 mT: 公告本 申請專利範圍 第8 8 1 2 2 3 Ο 8號專利申請案 中文申請專利範圍修正本 (請先閱讀背面之注意事項再填寫本頁) 民國9 0年1 2月修正 1 · 一種微粒子,其特徵爲由矽石與矽石以外之無機 氧化物所構成之多孔質複合氧化物粒子,且被厚度爲 〇.5〜2 Ο n m之多孔質矽石系無機氧化物層所覆被, 且, 矽石系無機氧化物層之最大細孔徑爲〇 . 5〜5 n m 矽石以S i 〇 2表示,矽石以外之無機氧化物以μ〇 X表示時之莫耳比M〇x/S i〇2爲在〇 . 〇〇〇 1〜 〇.2之範圍; 細孔容積爲0 · 1〜1 · 5cc/g者。 2 ·如申請專利範圍第1項之微粒子,其中,無機氧 化物爲由Al2〇3、 B 2 Ο 3 . Ti〇2、 Zr〇2、 S η Ο 2 > C e 2 Ο 3 , Ρ 2 Ο 5 , S b 2 Ο 3 > Μ ο Ο 3 , Ζ η〇 經濟部智慧財產局員工消費合作社印製 Ζ r〇2中所選出之1種或2種以上者。 更具有第 3 .如申請專利範圍第1項之微粒子 二矽石覆被層。 4 .如申請專利範圍第1項之微粒子,"^中微粒子爲 含有直接結合至矽之有機基。 5 ·如申請專利範圍第4項之微粒子,其中直接結合 有機基之矽的莫耳數(S R )與全部矽之莫耳數(S τ ) 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 495485 Α8 Β8 C8 D8 六、申請專利範圍 之比Sr/St爲以〇 . 〇〇1〜〇 . 9。 (請先閲讀背面之注意事項再填寫本頁) 6 . —種溶膠,其爲令如申請專利範圍第1項〜第5 項之微粒子分散於分散媒體所得者。 7 · —種微粒子分散溶膠之製造方法,其特徵爲由下 述工程(a )〜工程(c )所組成; (a )將矽酸鹽之水溶液和/或酸性砂酸液、與具有 化學式(1 )所示有機矽化合物之水解物、與驗性可溶之 無機化合物水溶液,於ρ Η 1 〇以上之鹼性水溶液、或視 需要分散種粒子之Ρ Η 1 〇以上之驗性水溶液中,同時添 加調製成核粒子前質分散液之工程; (b )於前述核粒子前質分散液中,添加矽石源或砂 石源與矽石以外之無機化合物鹽之水溶液,並於核粒子前 質中形成第一矽石系覆被層之工程; (c )於前述分散液中加酸,並由構成前述核粒子前 質之元素中,選擇除去至少一部分矽和氧以外元素之工程 R n S i X ( 4 - η ) ......... (1) 經濟部智慧財產局員工消費合作社印製 〔但,R :碳數1〜1 0個之非取代或經取代烴基、 X :碳數1〜4個之烷氧基、矽烷醇基、鹵素或氫、n : 1 〜3〕。 8 . —種微粒子分散溶膠之製造方法,其爲於申請專 利範圍第7項之工程(c )所得之微粒子分散溶膠中,添 加鹼性水溶液與,化學式(2 )所示之有機矽化合物和/ 或其部分水解物,並於該微粒子上形成第二矽石覆被層者 本紙張尺度適用中國國家標準(CNS ) Α4規格(210X 297公釐) 495485 A8 B8 C8 D8 申請專利範圍 (4 一 2 X 〇 〔但’ R :碳數1〜1 0個之非取代或經取代烴基 碳數1〜4個之烷氧基、矽烷醇基、鹵素或氫、^ 經濟部智慧財產局員工消費合作社印製 9 . 一種微粒子分散溶膠之製造方法,其爲將申請專 利範圍第8項所得之微粒子之分散溶膠,於5 〇 〇c〜 3 5 0 °C下加熱處理,令第二矽石覆被層之細孔消失者。 1 〇 . —種含有申請專利範圍第1項〜第5項微粒子 之低反射被膜基材,其特徵爲於基材表面上形成含有如申 §靑專利範圍第1項〜第5項中任一項之微粒子及被膜形成 用基體的被膜者。 1 1 .如申請專利範圍第1 〇項記載之被膜基材,其 中基材之折射率爲1 _ 6 0以上。 1 2 . —種含有申請專利範圍第1項〜第5項微粒子 之低反射被膜基材,其特徵爲於折射率爲1 . 6 0以下之 基材表面,具有折射率爲1 . 6 0以上之中間被膜,且於 該被膜上形成含有如申請專利範圍第1項〜第5項中任一 項之微粒子及被膜形成用基體的被膜者。 1 3 .如申請專利範圍第1 2項記載之被膜基材,其 中,前述中間被膜爲含有3 0〜9 5重量%平均粒徑爲5 〜1 0 0 nm的金屬氧化物微粒子。 1 4 ♦如申請專利範圍第1 0項或1 2項之被膜基材 ,其中,基材係選自玻璃、聚碳酸酯、丙烯酸樹脂、 PET、TAC等塑膠片、塑膠薄膜、塑膠面板者。 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 3- (請先閲讀背面之注意事項存填寫本頁)495485 A8 B8 C8 D8 mT: Announce the scope of patent application of this application No. 8 8 1 2 2 3 〇 Patent Application No. 8 for Chinese Patent Application Amendment (please read the notes on the back before filling this page) Republic of China 90 years 1 2 Month correction 1 · A fine particle characterized by a porous composite oxide particle composed of silica and an inorganic oxide other than silica, and is oxidized by a porous silica-based inorganic oxide having a thickness of 0.5 to 2 0 nm The material layer is coated, and the maximum pore diameter of the silica-based inorganic oxide layer is 0.5 to 5 nm. Silica is represented by S i 〇2, and inorganic oxides other than silica are represented by μ ×. The ear ratio Mox / Sio2 is in the range of 0.001 to 0.2; the pore volume is 0 · 1 to 1 · 5cc / g. 2 · The fine particles according to item 1 of the scope of the patent application, wherein the inorganic oxide is Al2O3, B2O3. Ti02, Zr02, S η0 2 > C e 2 03, P2 Ο 5, S b 2 Ο 3 > Μ ο Ο 3, Zn η〇 One or two selected from the printed ZO 2 by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. It also has No. 3 fine silica coating as in the first patent application. 4. As for the fine particles in the scope of the patent application, the fine particles in the " ^ " contain organic groups directly bonded to silicon. 5 · As for the fine particles in the scope of patent application No. 4, in which the mole number (SR) of organic silicon and the mole number (S τ) of all silicon are directly combined. The paper size applies the Chinese National Standard (CNS) A4 specification ( 210X297 mm) 495485 A8 B8 C8 D8 Six, the ratio of the scope of patent application Sr / St is in the range of 〇〇〇〇1〜 0.9. (Please read the precautions on the back before filling out this page.) 6 — A kind of sol, which is obtained by dispersing the fine particles in the scope of the patent application in items 1 to 5 in a dispersed medium. 7. A method for manufacturing a fine particle dispersed sol, which is characterized by the following processes (a) to (c); (a) an aqueous solution of silicate and / or an acidic oxalic acid solution and a chemical formula ( 1) The hydrolysate of the organic silicon compound shown, and the aqueous solution of the inorganic compound that is soluble in the test, in the alkaline aqueous solution of ρ Η 10 or more, or the test aqueous solution of P Η 10 or more where the seed particles are dispersed as necessary, (B) adding an aqueous solution of a silica source or a gravel source and an inorganic compound salt other than silica to the aforementioned nuclear particle precursor dispersion, and in front of the nuclear particles; A process of forming a first silica-based coating layer in the material; (c) a process of adding an acid to the dispersion liquid and selecting to remove at least a part of elements other than silicon and oxygen from the elements constituting the precursor of the core particle; R n S i X (4-η) ......... (1) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs [However, R: non-substituted or substituted hydrocarbon group with 1 to 10 carbons, X: alkoxy, silanol, halogen or hydrogen having 1 to 4 carbon atoms, n: 1 ~ 3]. 8. A method for producing a microparticle-dispersed sol, which is obtained by adding an alkaline aqueous solution and an organic silicon compound represented by the chemical formula (2) to the microparticle-dispersed sol obtained in the process (c) of the patent application item 7. Or its partial hydrolysate, and forming a second silica coating on the particles, the paper size is applicable to Chinese National Standard (CNS) A4 specification (210X 297 mm) 495485 A8 B8 C8 D8 patent application scope (4-2 X 〇 [But 'R: Unsubstituted or substituted hydrocarbon group with 1 to 10 carbon atoms, alkoxy group, silanol group, halogen or hydrogen with 1 to 4 carbon atoms, Preparation 9. A method for manufacturing a fine particle dispersing sol, which is a dispersing sol of the fine particles obtained in item 8 of the scope of patent application, and is heat-treated at 500 ° C to 350 ° C, so that the second silica coating layer The pores disappeared. 1 〇—A low-reflection coating base material containing fine particles in the scope of patent applications No. 1 to No. 5, which is characterized in that the surface of the base material containing No. 1 patent scope No. 1 ~ Any of item 5 Microparticles and film-coated substrates. 1 1. The film substrate described in item 10 of the patent application scope, where the refractive index of the substrate is 1 _ 60 or more. The low-reflection coating substrate of fine particles 1 to 5 is characterized in that it has an intermediate coating having a refractive index of 1.6 or more on the surface of the substrate having a refractive index of 1.6 or less, and is formed on the coating. Films containing fine particles and substrates for film formation as described in any one of claims 1 to 5 of the scope of patent application. 1 3. The film substrate as described in claim 12 of the scope of patent application, wherein the intermediate film is Contains 30 to 95% by weight of metal oxide fine particles with an average particle size of 5 to 100 nm. 1 4 ♦ If the film substrate of the 10th or 12th of the scope of patent application, the substrate is selected From glass, polycarbonate, acrylic resin, PET, TAC and other plastic sheets, plastic films, plastic panels. This paper size applies to China National Standard (CNS) A4 specifications (210X297 mm) 3- (Please read the note on the back first (Please fill in this page)
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