TW469513B - Surface treatment anneal of silicon-oxy -carbide semiconductor surface layer - Google Patents
Surface treatment anneal of silicon-oxy -carbide semiconductor surface layer Download PDFInfo
- Publication number
- TW469513B TW469513B TW089125067A TW89125067A TW469513B TW 469513 B TW469513 B TW 469513B TW 089125067 A TW089125067 A TW 089125067A TW 89125067 A TW89125067 A TW 89125067A TW 469513 B TW469513 B TW 469513B
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- Prior art keywords
- surface layer
- semiconductor
- patent application
- vapor deposition
- chemical vapor
- Prior art date
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- 239000002344 surface layer Substances 0.000 title claims abstract description 63
- 239000004065 semiconductor Substances 0.000 title claims abstract description 58
- 238000004381 surface treatment Methods 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 27
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 26
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 20
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 11
- 239000010703 silicon Substances 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims description 23
- 238000010438 heat treatment Methods 0.000 claims description 20
- 238000000137 annealing Methods 0.000 claims description 12
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 12
- 239000010410 layer Substances 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 11
- 238000002161 passivation Methods 0.000 claims description 9
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- NEXSMEBSBIABKL-UHFFFAOYSA-N hexamethyldisilane Chemical class C[Si](C)(C)[Si](C)(C)C NEXSMEBSBIABKL-UHFFFAOYSA-N 0.000 claims description 7
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims description 7
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 6
- 230000002079 cooperative effect Effects 0.000 claims description 6
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 6
- 238000005906 dihydroxylation reaction Methods 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- TVJPBVNWVPUZBM-UHFFFAOYSA-N [diacetyloxy(methyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(OC(C)=O)OC(C)=O TVJPBVNWVPUZBM-UHFFFAOYSA-N 0.000 claims description 4
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 2
- 238000012545 processing Methods 0.000 claims description 2
- PCTMTFRHKVHKIS-BMFZQQSSSA-N (1s,3r,4e,6e,8e,10e,12e,14e,16e,18s,19r,20r,21s,25r,27r,30r,31r,33s,35r,37s,38r)-3-[(2r,3s,4s,5s,6r)-4-amino-3,5-dihydroxy-6-methyloxan-2-yl]oxy-19,25,27,30,31,33,35,37-octahydroxy-18,20,21-trimethyl-23-oxo-22,39-dioxabicyclo[33.3.1]nonatriaconta-4,6,8,10 Chemical compound C1C=C2C[C@@H](OS(O)(=O)=O)CC[C@]2(C)[C@@H]2[C@@H]1[C@@H]1CC[C@H]([C@H](C)CCCC(C)C)[C@@]1(C)CC2.O[C@H]1[C@@H](N)[C@H](O)[C@@H](C)O[C@H]1O[C@H]1/C=C/C=C/C=C/C=C/C=C/C=C/C=C/[C@H](C)[C@@H](O)[C@@H](C)[C@H](C)OC(=O)C[C@H](O)C[C@H](O)CC[C@@H](O)[C@H](O)C[C@H](O)C[C@](O)(C[C@H](O)[C@H]2C(O)=O)O[C@H]2C1 PCTMTFRHKVHKIS-BMFZQQSSSA-N 0.000 claims 2
- 230000006698 induction Effects 0.000 claims 1
- 238000005406 washing Methods 0.000 claims 1
- 239000013626 chemical specie Substances 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 13
- 230000005540 biological transmission Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 230000003071 parasitic effect Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 230000035800 maturation Effects 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 229910052702 rhenium Inorganic materials 0.000 description 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- 229910008045 Si-Si Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 229910006411 Si—Si Inorganic materials 0.000 description 1
- ADKPKEZZYOUGBZ-UHFFFAOYSA-N [C].[O].[Si] Chemical compound [C].[O].[Si] ADKPKEZZYOUGBZ-UHFFFAOYSA-N 0.000 description 1
- OBNDGIHQAIXEAO-UHFFFAOYSA-N [O].[Si] Chemical compound [O].[Si] OBNDGIHQAIXEAO-UHFFFAOYSA-N 0.000 description 1
- 150000001343 alkyl silanes Chemical class 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 230000027455 binding Effects 0.000 description 1
- 238000009739 binding Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 235000015170 shellfish Nutrition 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- -1 siloxane rings Chemical group 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
Classifications
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
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- H01L21/02337—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to a gas or vapour
- H01L21/0234—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to a gas or vapour treatment by exposure to a plasma
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
- H01L21/31604—Deposition from a gas or vapour
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- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2
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- H01L21/02167—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon carbide not containing oxygen, e.g. SiC, SiC:H or silicon carbonitrides
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- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
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- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/02274—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
- H01L21/02304—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment formation of intermediate layers, e.g. buffer layers, layers to improve adhesion, lattice match or diffusion barriers
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/3146—Carbon layers, e.g. diamond-like layers
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
- H01L21/31695—Deposition of porous oxides or porous glassy oxides or oxide based porous glass
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- Condensed Matter Physics & Semiconductors (AREA)
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- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
- Physical Vapour Deposition (AREA)
Description
A7 46 95 13 —---------B7_ 五、發明說明() 【發明說明】 發明領城 本發明關於半導體表面之鈍化,且更特別地,本發明 關於一種處理矽-氧一碳化矽半導體表面層以使其表面脫 羥基之方法。 發明背景 當金屬間介電質使用於半導體表面層或基板時,寄生 電容係一個問題。爲了減少寄生電容,更大地使用加有其 它元素如氧和碳所形成的矽基板或表面層係愈來愈平常的 。大部分的碳係互混的,而某些係與矽鍵結。一個感趣的 領域已經使用不同類型的矽-氧-碳化物玻璃及相關的方 法以形成半導體表面層。 已經完成許多硏究,其利用矽、碳和氧之間的反應, 尤其使用a尼克隆(nicalon ) 〃纖維及複合陶瓷。某些這 些產品已經使用於纖維光學用途。一個例子爲Renlund等人 的美國專利第5 ,180 ,694號中所揭示的矽一氧一 碳化玻璃製法及相關的產品,其之全部揭示倂於本文中作 參考。已發現這些類型的材料亦可用於半導體工業。 這些低介電常數(低k )金屬間介電質係適用於矽-氧-碳化物玻璃及降低寄生電容。已發現非晶形、氫化的 矽一氧—碳化物(―S i 0C : H)係一種可用於先進積 體電路技術應用(如具有銅者)的低k材料。與習知之具 有3 . 9介電常數的S i 〇2比較下,由烷基—矽烷和一氧 本紙張尺度適用中國國家標準(CNS>A4規格(210 X 297公釐) -----------I 1· --------訂----I----. * .( (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 -4- 經濟部智慧財產局貝工消費合作杜印裝 4695 13 五、發明說明(2 ) 化二碳之混合物所化學蒸氣沈積(C V D )的—S 1 0 C :Η玻璃係具有約2 . 5至約3 . 0的介電常數(k )。 一 S 1 ◦ C : Η膜的k値係與碳含量成直接比例,其中較 高的碳成量產生較低的k。較高的碳含量會對習知的微影 圖案轉移會造成問題,因爲一S i ◦ C.: Η與聚合物光阻 材料之間有減少的化學蝕刻敏感性。另一種減少介電常數 (k)所用的先前技藝方法係使一S i OC : Η中有多孔 的、基本上包囊的空隙。此產生適合的低介電k膜,具有 約5 - 1 0原子百分率的碳含量。然而,沿著空隙表面有 搖擺鍵的存在。這些搖擺處使得膜的介電特性變成不適合 的。 先前技藝已經嘗試改正不適合的介電特性,其包括在 氧及/或氮中非常長的熟化,或用一種阻障如氮化矽來罩 蓋- S 1 0 C : Η膜。就循環時間及額外的設備要求而言 ,長的熟化係昂貴的。再者,膜並非完全穩定的,因爲鍵 結處係非平穩的。阻障膜具有較高的介電常數(典型> > 4.0),其增加有效的k。 如Grabbe等人在美國專利整5 ,965 ,271號中 所揭示的,已經使用應變的矽氧烷環對於含矽石的玻璃表 面作某些化學處理,其之全部揭示倂於本文中作參考。然 而,’ 2 7 1所揭示者係針對一種更傳統之含矽石的玻璃表 面,而非針對如本發明之砍一氧一碳化物。 發明槪述 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) ---— II------------— — I 訂--------. <請先閱讀背面之注意事項再瑣寫本頁) -5- 經濟部智慧財產局員工消費合作社印製 4 6 9 5 13 A7 __B7_ 五、發明說明(3 ) 因此本發明一目的爲將一經沈積的多矽一氧一碳化物 表面層鈍化以使表面脫羥基,並不損害其功能。 本發明在烷基環境中熟化一 s i OC : Η層,因此有 效地將S i— 〇H、S iH和S I— 0改變成S is ( C Η 3 ) 3。此純化熟化係在當場於電漿增強的(P E -) CVD反應器中進行,藉由解離甲烷、乙炔或任何其它烷 基成分,如六甲基二矽烷(HMD S )或甲基三乙醯氧基 矽烷(Μ T A S )。 在本發明的猶另一方法觀點中,半導體基材表面上所 沈積的半導體表面層係在烷基環境中被處理。半導體表面 層包括一經沈積的多政_氧_碳化物’具有在分子程度爲 約5%至約20%的碳含量,及約2 . 5至約3 · 0的介 電常數。該方法包括步驟爲將半導體基材置於化學蒸氣沈 積室內,及加熱表面層。在化學蒸氣沈積室的烷基環境中 使表面退火,以鈍化半導體表面層’同時在半導體表面層 上使矽鍵結一種附著性烷基封端化學物以幫助表面的脫羥 基化。 加熱步驟更包括在化學蒸氣沈積室內用電漿加熱之步 驟。用電漿的加熱步驟可發生在約1 0 0至約5 0 0瓦的 功率。射頻感應電流可被產生,且典型上係約1 2至約 14MHz 。退火係發生在約1至約10托的真空環境中 〇 在本發明的猶另一觀點中,一種半導體物品包含一半 導體基材和一經沈積的的多矽-氧-碳化物表面層,後者 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -------I-----裝--------訂·-------* 線 _ i 、' (請先閱讀背面之注意事項再填寫本頁) -6- 46 95 13 A7 一 B7 五、發明說明(4 ) 具有在分子程度爲約5%至約2 0%的碳含量,及約 2 5至約3 · 0的介電常數。鈍化的表面具有封端用的 化學物,其實質上不含有羥基且係藉由在化學蒸氣沈積室 內加熱多矽-氧-碳化物表面層及使表面接觸烷基以經由 S i - S i鏈來鍵結分子及使表面脫羥基化而形成者 。在本發明一觀點中,烷基可選自於以下所構成的族群: 乙炔、甲烷、六甲基二矽烷及甲基三乙醯氧基矽烷,以經 由S i— 0 — S i鏈鍵結分子及使表面脫羥基。六甲基二 矽烷及甲基三乙醯氧基矽烷係約1%至約3 0%濃度。 圖式簡單說明 由以下配合圖式之詳細說明將明瞭本發明的其它目的 、特徵和優點,其中: 第1圖顯示依本發明處理多矽-氧-碳化物表面層用 的一連串步驟之總流程圖。 第2圖顯示多矽-氧-碳化物半導體表面層之示意圖 ’其具有烷基退火以塡充空隙及使表面脫羥基。 第3圖顯示用六甲基二矽烷使多矽-氧一碳化物表面 層退火的示意圖。 第4圖顯示用甲基三乙醯氧基矽烷使多矽一氧一碳化 物半導體表面層退火的示意圖。 第5圖顯示本發明可用的一種化學蒸氣沈積室之示意 側視剖面圖。 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) ----------:---裝--- 請先閱讀背面之注意事項|4歧寫本頁) 訂: 線 經濟部智慧財產局員工消費合作社印製 A7 B7 46 95 13 五、發明說明(5 ) 主要元件對照表 經濟部智慧財產局員工消費合作社印製 1 0 基 材 1 2 表 面 層 1 6 化 學 蒸 氣 沈 積 室 2 0 方 塊 2 2 方 塊 2 4 方 塊 2 6 方 塊 2 8 方 塊 3 0 空 隙 4 0 殻 體 4 1 長 套 4 2 內 膛 4 4 中 空 的 傳 動 心 軸 4 6 晶 圓 平 台 托 架 4 8 晶 圓 支 承 頂 表 面 5 0 磁 性 轉 動 傳 動 器 5 2 功 率 屏 蔽 射 jhS 頻 發生器源 5 4 電 極 6 0 烷 基 氣 體 源 6 2 氣 孔 6 6 真 生 泵 了 0 加 熱 器 請 先 閱 讀 背 面 之 注 意 事 項
再一 填'I 5裝 本 · 頁 訂 線 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -8- 9^5 1 3_b7_ 五、發明說明(6) _齡佳實施例之詳細說明 ----------丨'^丨|裝· — I (請先閱讀背面之注意事項i填寫本頁) 本發明係有利的,因爲其現在容許在烷基環境中熟化 矽一氧一碳化物(一 S i OC : H)半導體表面層’以容 許將S 1— OH、S iH和S I— 0鈍化成爲S i s C C Η 3 ) 3。此鈍化熟化係在當場於電漿增強的( P E CVD )反應器中進行,藉由解離甲烷、乙炔或任何 其它烷基成分,如六甲基二矽烷(HMD S )或甲基三乙 醯氧基矽烷(MTAS)。 .線; 典型地,本發明的半導體表面層包括一種多矽一氧一 碳化物表面層1 0 ,其沈積在半導體基材或其它基底1 2 上(第2圖)。多矽-氧-碳化物材料可爲一種用於後續 疊層的基材。多矽—氧一碳化物(_S i OC : H)具有 在分子程度爲約5 %至約2 0 %的碳含量’及約2 · 5至 約3,0的介電常數。雖然5%至約20%係爲碳含量的 典型範圍,但是在特殊案例中碳含量可與4 0 %同樣高。 然而,4 0 %碳濃度並非合宜的,因爲其變得更難以用其 它方法來集成半導體表面層。 經濟部智慧財產局員工消費合作社印製 第1圖顯示本發明的基本方法,其中在方塊2 0中, 半導體基材1 0具有本發明的矽一氧-碳化物表面層1 2 且係置於化學蒸氣沈積室內。典型地’基材1 0和表面層 1 2係形成爲晶圓(第5圖)。自然地’可將一或多個晶 圓置於化學蒸氣沈積室內,且典型地將大數目的晶圓置於 室內,如第5圖之化學蒸氣沈積室1 6內。 產生真空,典型地約1至1 0托的等級,如方塊2 2 本紙張尺度適用中國國家標準(CNS)A4規格(210*297公楚) -9- A7 ^ 469513 _B7_____ 五、發明說明(7 ) 中所示。將烷基注入以便在化學蒸氣沈積室內產生烷基環 境。雖然可用不同類型的烷基,但是乙炔、甲烷、六甲基 二矽烷、(CH3)3SiNHSi (CH3)3和甲基三乙 醯氧基矽烷、CH3S i COAC) 3係有利的。產生電漿 ,以加熱半導體表面層1 2,如用射頻來產生電漿(方塊 2 6 )。藉由形成一種烷基封端的化學物以鈍化表面層( 方塊28)。加熱高過於450至500 °C係不宜的。氣 \爲了破壞半導體層之空隙上所形成的烷基及羥基’常常 需要射頻功率來感生電漿,此爲技藝中所周知者。典型地 ,電漿功率係約1〇〇至約500瓦。典型地’烷基材料 的流量係約公升每分鐘的等級,其通常足以塡充半導體矽 -氧-碳化物表面層中所最初形成的孔隙。 第2圖顯示半導體表面中所形成的空隙(或孔隙) 3〇 ,具有—Η原子和一 OH原子連接於矽(S i )。如 第2圖所示,藉由S i 0 C表面層的鈍化退火,而發生烷 基退火。電漿能量和加熱會誘導適當鍵的斷裂,且將終端 化學物形成在具有(CH3) 3的S i _0—S i上。 第3圖和第4圖中使用六甲基二矽烷和甲基三乙醯氧 基矽烷當作烷基成分,其中用S i— O-S i和(CH〇3 或CH3基代替具有S i_OH和S iH的空隙30。典型 地,在退火鈍化期間1視碳含量和其它由熟悉技藝者所決 定的因素而定,六甲基二矽烷和甲基三乙醯氧基矽烷的濃 度係約1%至約3 0%。 第5圖顯不本發明所用的電漿增強的化學蒸氣沈積室 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱) ------------·---裝--- (請先閲讀背面之注意事項4:填寫本頁) - 經濟部智慧財產局員工消費合作杜印製 10- A7 469513 B7____ 五、發明說明(8 ) 1 6之一個例子。殻體4 0係實質上圓筒形且包含一設於 中央具有內膛42的長套41。內膛42含有中空的傳動 心軸4 4 ,具有圓形的晶圓平台托架4 6 ,其形成一實質 圓形的晶圓支承頂表面4 8。一磁性轉動傳動器5 0係與 傳動心軸4 4連結操作’而當傳動器5 〇轉動心軸4 4時 ’其會轉動晶圓平台托架4 6。一功率屏蔽射頻發生器源 5 2係連接至電極5 4內,其延伸穿過室1 6之頂表面及 提供所必須的加熱以讓室內產生電漿。烷基氣體源6 0提 供烷基氣體給予室,其經由中空傳動心軸4 4內所含有的 氣孔6 2被強迫進入室1 6內。真空泵6 6由室1 6中抽 真空。加熱器7 0係位於室1 6之下,且亦提供額外的熱 量以加熱晶圓W。 操作時,將由基材1 0和多矽一氧-碳化物表面層所 形成的晶圓W置於晶圓平台托架4 6上。所欲之烷基形式 的氣體被強迫向上經過傳動心軸4 4進入室1 6內。在氣 體流入之前,真空泵6 6亦由室內抽出所有的環境空氣。 最初經由加熱器7 0來加熱晶圓。磁性轉動傳動器5 0轉 動室內的晶圓W,而功率屏蔽RF發生器5 2供應必需的 功率給電極5 4,以形成電漿及容許如上述地形成鈍化層 〇 第2 - 4圖顯示一種半導體物品*其包括一沈積在基 材1 0上的多矽一氧一碳化物表面層1 2 ’其中表面層 1 2具有分子程度的碳含量在約5%至約2 0%的範圍內 ’且介電常數爲約2 . 5至約3 . 0。一鈍化表面層 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 11--If------裝 i I (請先閱讀背面之注意事項4寫本頁) 訂· _ 線 經濟部智慧財產局員工消費合作社印製 -11 - 下,熟悉技藝將了解 ,將了解的是’本發 修飾例和實施例係意 46 95 1 3 A7 ___B7__ 五、發明說明(9) 1 2 a係形成在多矽一氧-碳化物表面層上,且具有一實 質不含羥基的封端化學物,而且係藉由在化學蒸氣沈積室 內加熱多矽-氧-碳化物基材及使基材接觸一選自於乙炔 、甲烷、六甲基二矽烷及甲基三乙醯氧基矽烷的烷基,以 經由S 1 - 0 - S i鏈鍵結分子及使表面脫羥基。六甲基 二矽烷及甲基三乙醯氧基矽烷係約1 %至約3 〇%濃度, 且係在第3和4圖中有圖示說明。 在受益於上述說明和附圖的教示 有許多的修飾例和其它實施例。因此 明不限於所揭示的特定實施例,且該 欲包含於附屬的申請專利範圍內。 請 先 閱 讀 背 之 注 意 事 填 寫裝 本衣 頁 訂 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -12-
Claims (1)
- A8 B8 C8 D8 46 95 1 3 六、申請專利範圍 1 . 一種處理半導體基材上的半導體表面層之方法, 其中半導體表面層包含一經沈積的多矽_氧_碳化物表面 層’此層具有分子程度的碳含量在約5%至約2 0%的範 圍內,且介電常數爲約2 · 5至約3 . 0,該方法包括: 將半導體基材置於化學蒸氣沈積室內; 加熱半導體表面層;及 在化學蒸氣沈積室的烷基環境中使半導體表面層退火 ’以鈍化表面,其係藉由在表面上使矽鍵結一種附著性烷 基封端化學物以幫助表面的脫羥基化。 2 .如申請專利範圍第1項之方法,其中加熱步驟更 包括在化學蒸氣沈積室內用電漿加熱之步驟。 3 如申請專利範圍第2項之方法,其更包括用約 1 0 0至約5 0 0瓦的電漿功率來加熱之步驟。 4 .如申請專利範圍第1項之方法,其更包括藉由產 生射頻感應電流來加熱表面之步驟》 5 .如申請專利範圍第1項之方法,其更包括在約1 至約1 0托的真空環境內退火之步驟。 6 . —種處理半導體基材上的半導體表面層之方法, 其中半導體表面層包含一經沈積的多矽-氧-碳化物層, 此層具有分子程度的碳含量在約5%至約2 0%的範圍內 ’且介電常數爲約2 . 5至約3 · 0,該方法包括: 將半導體基材置於一經電漿增強的化學蒸氣沈積室內 在化學蒸氣沈積室內用電漿及約i 2至約1 4MH z 本紙張尺度逋用中國國家標率(CNS ) A4规格(210X297公釐) —------^—^— (請先閱讀背面之注意事項4.,馬本頁) 訂 線. 經濟部智慧財產局員工消費合作社印製 -13- 8 8 8^ ABCD 469513 六、申請專利範圍 射頻感應電流加熱半導體表面層;及 在化學蒸氣沈積室的烷基環境中使半導體表面層退火 ’以鈍化表面,其係藉由在表面上使矽鍵結一種附著性烷 基封端化學物以幫助表面的脫羥基化。 7 .如申請專利範圍第6項之方法,其更包括用約 1 0 0至5 0 0瓦的電漿功率來加熱之步驟。 8 .如申請專利範圍第6項之方法,其更包括在約1 至約1 0托的真空環境內退火之步驟。 9 . 一種處理半導體基材上所沈積的半導體表面層之 方法,其中半導體表面層包含一經沈積的多矽一氧一碳化 物表面層,該方法包括下列步驟: 將半導體基材置於化學蒸氣沈積室內; 加熱半導體表面層;及 在化學蒸氣沈積室的烷基環境中使半導體表面層退火 ,以鈍化半導體表面層,其係藉由在半導體表面層上使矽 鍵結一種附著性烷基封端化學物以幫助表面的脫羥基化, 該烷基環境具有約1至約3 0 %濃度的六甲基二矽胺烷及 或約1至約3 0%濃度的甲基三乙醯氧基矽烷中一者。 1 0 .如申請專利範圍第9項之方法,其中半導體表 面層包含一經沈積的多矽-氧-碳化物層,此層具有分子 程度的碳含量在約5 %至約2 0 %的範圍內,且介.電常數 爲約2 . 5至約3 · 0。 1 1 .如申請專利範圍第9項之方法,其中加熱步驟 更包括在化學蒸氣沈積室內用電漿加熱之步驟。 本紙涑尺度適用中國國家梯準{ CNS ) A4規格(210X297公釐) —------^—^— (請先閱讀背面之注$項長¾本頁) -9 線. 經濟部智慧財產局員工消費合作社印製 -14- 5 9 6 4 3 8 8 88 ABCD 六、申請專利範圍 1 2 .如申請專利範圍第1 1項之方法,其更包括用 約1 0 0至約5 0 0瓦的電漿功率來加熱之步驟。 {請先聞讀背面之注意事項再一. .X本頁) 1 3 .如申請專利範圍第9項之方法,其更包括藉由 產生射頻感應電流來加熱表面之步驟。 1 4 ·如申請專利範圍第9項之方法,其更包括在約 1至約1 0托的真空環境內退火之步驟。 1 5 .—種半導體物品,包括: 一半導體基材及一經沈積的多矽一氧-碳化物表面層 ,此層具有分子程度的碳含量在約5 %至約2 0 %的範圍 內且介電常數爲約2 . 5至約3 . 0,及一鈍化表面層, 具有封端用化學物,其實質上不含有羥基且係藉由在化學 蒸氣沈積室內加熱多矽-氧-碳化物表面層及使表面層接 觸烷基以經由S i - 0 - S i鏈來鍵結分子及使表面脫羥 基而形成者。 1 6 . —種半導體物品,包括: 經濟部智慧財產局員工消費合作社印製 一半導體基材及一經沈積的多矽-氧-碳化物表面層 ’此層具有分子程度的碳含量在約5 %至約2 0%的範圍 內且介電常數爲約2 . 5至約3 . 0 ,及一鈍化表面層, 具有封端用化學物,其實質上不含有羥基且係藉由在化學 蒸氣沈積室內加熱多矽一氧-碳化物表面層及使表面層接 觸一選自於乙炔、甲烷、六甲基二矽烷及甲基三乙醯氧基 矽烷的烷基,以經由S i — 0 - S i鏈鍵結分子及使表面 層脫羥基。 1 7 .如申請專利範圍第1 6項之半導體物品,其中 本紙張尺度適用中國國家標準(CNS ) A4洗格(210X297公釐) -15- 46 95 13 g« 六、申請專利範圍 在鈍化期間,該六甲基二矽烷及甲基三乙醯氧基矽烷的濃 度係約1至約3 0 %。 (請先閱讀背面之注意事項.¾本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家螺準(CNS ) A4規格(210X297公釐) -16-
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US6492283B2 (en) * | 2000-02-22 | 2002-12-10 | Asm Microchemistry Oy | Method of forming ultrathin oxide layer |
EP1172847A3 (en) * | 2000-07-10 | 2004-07-28 | Interuniversitair Micro-Elektronica Centrum Vzw | A method to produce a porous oxygen-silicon layer |
JP3516941B2 (ja) * | 2000-11-30 | 2004-04-05 | キヤノン販売株式会社 | 半導体装置及びその製造方法 |
US7026053B2 (en) * | 2001-01-29 | 2006-04-11 | Jsr Corporation | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device |
KR100432704B1 (ko) * | 2001-09-01 | 2004-05-24 | 주성엔지니어링(주) | 수소화된 SiOC 박막 제조방법 |
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US7749563B2 (en) | 2002-10-07 | 2010-07-06 | Applied Materials, Inc. | Two-layer film for next generation damascene barrier application with good oxidation resistance |
US6790788B2 (en) | 2003-01-13 | 2004-09-14 | Applied Materials Inc. | Method of improving stability in low k barrier layers |
US6838300B2 (en) * | 2003-02-04 | 2005-01-04 | Texas Instruments Incorporated | Chemical treatment of low-k dielectric films |
US20050077629A1 (en) * | 2003-10-14 | 2005-04-14 | International Business Machines Corporation | Photoresist ash process with reduced inter-level dielectric ( ILD) damage |
US20090061649A1 (en) | 2007-08-28 | 2009-03-05 | International Business Machines Corporation | LOW k POROUS SiCOH DIELECTRIC AND INTEGRATION WITH POST FILM FORMATION TREATMENT |
US9679804B1 (en) * | 2016-07-29 | 2017-06-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Multi-patterning to form vias with straight profiles |
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JPH0766287A (ja) | 1993-08-23 | 1995-03-10 | Matsushita Electric Ind Co Ltd | 半導体装置及びその製造方法 |
US5567661A (en) | 1993-08-26 | 1996-10-22 | Fujitsu Limited | Formation of planarized insulating film by plasma-enhanced CVD of organic silicon compound |
JP2641385B2 (ja) * | 1993-09-24 | 1997-08-13 | アプライド マテリアルズ インコーポレイテッド | 膜形成方法 |
CN1118520A (zh) * | 1994-04-15 | 1996-03-13 | 松下电器产业株式会社 | 多层金属布线的形成方法 |
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DE19904311A1 (de) * | 1998-02-06 | 1999-08-12 | Nat Semiconductor Corp | Verfahren zum Aufbringen eines kohlenstoffdotierten Dünnfilms aus Siliciumoxid auf ein Substrat |
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US6576980B1 (en) | 2003-06-10 |
JP2001210634A (ja) | 2001-08-03 |
EP1107303A3 (en) | 2002-04-10 |
KR20010052004A (ko) | 2001-06-25 |
EP1107303A2 (en) | 2001-06-13 |
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