TW466327B - Slow pull dryer capable of preventing liquid surface from generating turbulence - Google Patents
Slow pull dryer capable of preventing liquid surface from generating turbulence Download PDFInfo
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- TW466327B TW466327B TW88112061A TW88112061A TW466327B TW 466327 B TW466327 B TW 466327B TW 88112061 A TW88112061 A TW 88112061A TW 88112061 A TW88112061 A TW 88112061A TW 466327 B TW466327 B TW 466327B
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r 6 63 2 7 五、 發明說明(1) 本 發 明 係 提 供 一 種 慢 抽 式 乾 燥 機(S 1 〇 w Ρυ 1 1 Dr ye r) > 尤 指 一 種 可 防 止 液 面 產 生 亂 流 之 慢 抽 式 乾燥 機 0 習 知 慢 抽 式 乾 燥 機 廣 泛 地 被 應 用 在 去 除 微 粒 子的 清 洗 製 程 上 〇 例 如 用 於 硬 碟 機 之 磁 碟 片 於 其 製 作 過 程 中常 會 有 微 粒 子 附 著 在 用 來 製 造 磁 碟 片 的 基 材 上 必 須 去 除這 些 微 粒 子 以 確 保 產 品 品 質 因 此 在 磁 碟 片 的 製 作 過 程 中常 會 利 用 慢 抽 式 乾 燥 機 以 高 溫 去 離 子 水 清 洗 基 材 藉 以 去 除微 粒 子 〇 請 參 閱 圖 及 圖 二 圖 _ 為 習 知 慢 抽 式 乾 燥 機1 0 的 示 意 圖 圖 二 為 圖 —— 所 示 慢 抽 式 乾 燥 機1 0 之 組 合 元 件圖 0 習 知 慢 抽 式 乾 燥 機1 0 包 含 有 一 熱 水 槽12 以 及 一 消 波 板14 0 熱 水 槽i2 包 含 有 四 垂 直 側 壁 16 以 及 底 板18 Q 熱 水 槽12 底 側 設 有 一 入 水 α 20 用 來 輸 入 熱 水 而 熱 水 槽12 内 所 盛裝 之 熱 水 會 由 四 垂 直 側 壁 16 之 頂 端 溢 出 0 消 波 板14 之 底 側設 有 一 開 Π 向 下 之 方 形 凹 槽22 而 消 波 板14 之 四 侧 壁 各 -hr 汉有 近 似 半 圓 形 之 出 水 D 24 〇 消 波 板14 安 裝 於 熱 水 槽12 内部 之 底 側 而 入 水 σ 20 則 位 於 凹 槽22 開 σ 之 下 消 波 板1 4 之 上 侧 是 朝 - 預 定 端2 6 傾 斜 > 而 消 波板1 4 另 包 含 有 -— 排 氣 管28 設 於 預 定 端2 6 之 上 側 0 由 入 水 σ 20 所 輸 入 之 熱 水 會 先 流 入 消 波 板14 底 侧 之 凹 槽22 以 緩 和 流速 5 而 後 再 經 由 消 波 板14 之 四 出 水 a 24 向 上 流 入 熱 水 槽12, 而 水r 6 63 2 7 V. Description of the invention (1) The present invention provides a slow-drawing dryer (S 1 〇w Ρυ 1 1 Dr ye r) > especially a slow-drawing type which can prevent turbulent flow on the liquid surface Dryer 0 The conventional slow-drawing dryer is widely used in the cleaning process of removing fine particles. For example, a magnetic disk used in a hard disk drive often has particles attached to a substrate used to manufacture the magnetic disk during the manufacturing process. These particles must be removed from the material to ensure product quality. Therefore, in the process of making magnetic disks, a slow-pump dryer is often used to clean the substrate with high-temperature deionized water to remove the particles. Please refer to the figure and the second figure. The schematic diagram of the pumping dryer 1 0 is shown in the figure 2-the combined components of the slow pumping dryer 10 shown in the figure 0. The conventional slow pumping dryer 1 0 includes a hot water tank 12 to And a damping plate 14 0 hot water tank i2 includes four vertical side walls 16 and a bottom plate 18 Q hot water tank 12 is provided with a water inlet α 20 on the bottom side for hot water input and the hot water contained in the hot water tank 12 is provided by four vertical side walls 16 top overflow 0 The bottom side of the wave plate 14 is provided with a square groove 22 which is open and downward, and the four side walls of the wave plate 14 are each -hr. There is a semi-circular water outlet D 24 0 wave plate 14 Installed on the bottom side of the inside of the hot water tank 12 and the incoming water σ 20 is located under the groove 22 and the opening σ is above the wave-suppressing plate 1 4 which is inclined toward-the predetermined end 2 6 > and the wave-suppressing plate 1 4 also contains- — The exhaust pipe 28 is set on the upper side of the predetermined end 2 6 0 The hot water input by the water inlet σ 20 will first flow into the groove 22 on the bottom side of the wave damping plate 14 to relax the flow rate 5 and then pass through the four waves of the wave damping plate 14 a 24 flows upward into hot water tank 12, and water
第5 Ιί5th Ιί
6 63 2 T 五、發明說明(2) 流會將懸浮於熱水槽1 2液面之微粒子帶向垂直側壁1 6之頂 端並將其帶出熱水槽12。此外凹槽2 2内之氣體會向預定端 2 6積聚’積聚的氣趙則會經由排氣管2 8排出熱水槽I 2。 請參閱圖三’圓三為圖一所示熱水槽12的水流示意 圖’圖中箭頭為水流方向,螺旋線為亂流,當習知慢抽式 乾燥機10應用於硬碟機之磁碟片的清洗製程時,由於四出 水口 2 4分別位於消波板i 4之四側壁上,由入水口 2 0所輸入 凹槽22之熱水’大多經四出水口24直接由四垂直侧壁16溢 出(Over f low) ’並在熱水槽1 2中形成亂流,其水流情形如 圖三所示。這種現象使慢抽式乾燥機10不易去除基材表面 的微粒子’並且懸浮於液面的微粒子不容易流出熱水槽12 而累積於熱水槽1 2内,因此影響到磁碟片的清洗製程的品 質。 由於慢抽式乾燥機1 〇使用高溫去離子水清洗基材,高 溫的熱水中常常會伴隨有氣泡產生,因此慢抽式乾燥機i 〇 設有排氣管2 8用來將消波板1 4之預定端2 6所積聚之氣泡排 出。但是由於排氣管28不連續的排氣現象會引發震動,使 熱水槽12中產生水波,因此在基材上造成水痕 (Watermark),進而使磁碟片的良率下降,並且排氣管28 不連續的排氣現象也會造成噪音。 因此本發明之主要目的在於提供一種慢抽式乾燥機,6 63 2 T V. Description of the invention (2) The flow will bring the fine particles suspended in the liquid surface of the hot water tank 12 to the top end of the vertical side wall 16 and take it out of the hot water tank 12. In addition, the gas in the groove 22 will accumulate toward the predetermined end 26, and the accumulated gas will be discharged from the hot water tank I2 through the exhaust pipe 28. Please refer to Figure 3 'Circle 3 is a schematic diagram of the water flow of the hot water tank 12 shown in Figure 1' In the figure, the arrow is the direction of the water flow, and the spiral line is the turbulent flow. When the conventional slow-pump dryer 10 is applied to the magnetic disk of the hard disk drive, In the cleaning process, since the four water outlets 24 are located on the four side walls of the wave absorbing plate i 4 respectively, most of the hot water 'in the groove 22 input from the water inlet 20 is directly connected to the four vertical side walls 16 through the four water outlets 24. Overflow (Over f low) 'and a turbulent flow is formed in the hot water tank 12; the flow of the water is shown in Figure 3. This phenomenon makes it difficult for the slow-drying dryer 10 to remove the particles on the surface of the substrate, and the particles suspended on the liquid surface do not easily flow out of the hot water tank 12 and accumulate in the hot water tank 12, thus affecting the cleaning process of the magnetic disks. quality. Because the slow-drying dryer 1 〇 uses high-temperature deionized water to clean the substrate, air bubbles are often accompanied by high-temperature hot water. Therefore, the slow-drying dryer i 〇 is equipped with an exhaust pipe 2 8 for the wave absorbing plate. The accumulated bubbles at the predetermined end 2 of 1 4 are discharged. However, the discontinuous exhaust phenomenon of the exhaust pipe 28 will cause vibrations to cause water waves in the hot water tank 12, so a watermark will be caused on the substrate, thereby reducing the yield of the magnetic disk, and the exhaust pipe 28 Discontinuous venting can also cause noise. Therefore, the main object of the present invention is to provide a slow-drawing dryer,
46 63 2 7 五、發明說明(3) 以解決上述問題。 圖式之簡單說明 圖一為習知慢抽式乾燥機的示意圖 圖二為圖一所示慢抽式乾燥機之組成元件圖 圖三為圖一所示熱水槽内水流的示意圖 圖四為本發明慢抽式乾燥機的示意圖 圖五為圖四所示慢抽式乾燥機的組成元件圖 圖六為圖四所示熱水槽内水流的示意圖 圖七為本發明另一實施例慢抽式乾燥機的示意圊 圖八為圖七所示熱水槽内水流的示意圖 圖式之符號說明 30 、 60 慢 抽 式 乾 燥 機 32、 62 熱 水 槽 34 消 波 板 36 底 板 35 、 37 39 41 、 64 、 66 、 68 > 70 垂 直 侧 壁 40 入 水 π 42 凹 槽 44 線 形 開 口 46 排 氣 管 48 傾 斜 凹 槽 50 環 狀 凸 緣 52 預 定 端 54 基 材 請 參 閱 圖 四 及 圖 五 , 圖 四 為 本發 明慢 抽 式 乾 燥 機30 的 示 意 圖 ♦ 圖 五 為 圖 四 所 示 慢 抽 式 乾燥 機30 的 組 成 元 件 圖 〇 本 發 明 慢 抽 式 乾 燥 機30 包 含 有 — 近似 方形 之 軌 水 槽32 以 及46 63 2 7 V. Description of Invention (3) To solve the above problems. Brief description of the drawings Figure 1 is a schematic diagram of a conventional slow-drawing dryer Figure 2 is a component of the slow-drawing dryer shown in Figure 1 Figure 3 is a schematic view of the water flow in the hot water tank shown in Figure 1 Figure 4 is Schematic diagram of the slow-drawing dryer of the present invention. Figure 5 is the components of the slow-drawing dryer shown in Figure 4. Figure 6 is a schematic diagram of the water flow in the hot water tank shown in Figure 4. Figure 7 is another embodiment of the invention. Figure 8 shows the schematic diagram of the water flow in the hot water tank shown in Figure 7. Symbols of 30, 60 slow-pull dryer 32, 62 hot water tank 34 wave plate 36 bottom plate 35, 37 39 41, 64, 66, 68 > 70 vertical side wall 40 into the water π 42 groove 44 linear opening 46 exhaust pipe 48 inclined groove 50 ring flange 52 predetermined end 54 base material please refer to Figure 4 and Figure 5, Figure 4 is Schematic diagram of the slow-drawing dryer 30 of the present invention ♦ FIG. 5 is a view of the slow-drawing dryer 30 shown in FIG. 4. Component diagram 〇 The slow-pump dryer 30 of the present invention contains-an approximately square rail sink 32 and
笫 7 五、發明說明(4) 一近似方形之消波板3 4。熱水槽3 2包含有四垂直側壁3 5、 37、39、41以及一底板36。熱水槽32底側設有一入水口 40 用來輸入熱水,而熱水槽32内所盛裝之熱水由四垂直側壁 35、37、39、41之頂端溢出。消波板34安裝於熱水槽32内 部之底側,消波板3 4之底側設有一開口向下之方形凹槽 4 2,熱水槽3 2底側之入水口 4 0則位於凹槽4 2開口之下。消 波板3 4之上側設有一線形開口 4 4,線形開口 4 4之線形方向 與熱水槽3 2之垂直側壁3 5、3 9相平行。 由熱水槽32之入水口 40所輸入之熱水會先流入消波板 34底側之凹槽42以緩和流速,而後再經由消波板34上侧之 線形開口 4 4向上流入熱水槽3 2。線形開口 4 4會使向上流入 熱水槽3 2之熱水形成一橫戴面近似線形之熱水流向上流向 熱水槽32之液面,並於液面形成流向四垂直側壁35、37、 3 9、4 1之穩定水流,其中液面之水流流向與四垂直側壁 35、37、39、41相垂直。而水流會將懸浮於液面之微粒子 帶向四垂直側壁3 5、3 7、3 9、4 1 ,並由四垂直侧壁3 5、 37、39、41之頂端將其帶出熱水槽32。 消波板3 4另包含有一排氣管4 6、一開口向下之傾斜凹 槽48以及一向下凸出之環狀凸緣50。消波板34之上側是朝 —預定端5 2傾斜,以使消波板3 4下側凹槽4 2内之氣體向預 定端52積聚,而排氣管46即設於預定端52之上側,用來將 預定端52之下侧所積聚之氣體排出熱水槽32。傾斜凹槽48笫 7 V. Description of the invention (4) An approximately square wave absorbing plate 3 4. The hot water tank 32 includes four vertical side walls 35, 37, 39, 41 and a bottom plate 36. The hot water tank 32 is provided with a water inlet 40 at the bottom side for inputting hot water, and the hot water contained in the hot water tank 32 overflows from the tops of the four vertical side walls 35, 37, 39, and 41. The wave absorbing plate 34 is installed on the bottom side inside the hot water tank 32. The bottom side of the wave absorbing plate 34 is provided with a square groove 4 2 which opens downward, and the water inlet 4 on the bottom side of the hot water tank 3 2 is located in the groove 4 2 Under the opening. A linear opening 4 4 is provided on the upper side of the wave absorbing plate 3 4. The linear direction of the linear opening 4 4 is parallel to the vertical side walls 3 5 and 39 of the hot water tank 32. The hot water input from the water inlet 40 of the hot water tank 32 will first flow into the groove 42 on the bottom side of the wave absorbing plate 34 to ease the flow velocity, and then flow upward through the linear opening 4 4 of the wave absorbing plate 34 into the hot water tank 3 2 . The linear opening 4 4 will cause the hot water flowing upward into the hot water tank 32 to form an approximately linear hot water flow across the surface and upward to the liquid surface of the hot water tank 32 and form four vertical side walls 35, 37, 39 at the liquid surface. The stable water flow of 41, wherein the water flow direction of the liquid surface is perpendicular to the four vertical side walls 35, 37, 39, 41. The water flow will bring the particles suspended on the liquid surface to the four vertical side walls 3 5, 3, 7, 9, 4 1 and take them out of the hot water tank 32 from the top of the four vertical side walls 3 5, 37, 39, 41. . The wave absorbing plate 34 further includes an exhaust pipe 46, an inclined groove 48 opening downward, and an annular flange 50 protruding downward. The upper side of the wave absorbing plate 34 is inclined toward the predetermined end 5 2 so that the gas in the groove 4 2 on the lower side of the wave absorbing plate 3 4 accumulates toward the predetermined end 52, and the exhaust pipe 46 is provided above the predetermined end 52. Is used to discharge the gas accumulated under the predetermined end 52 out of the hot water tank 32. Inclined groove 48
Ο 63 2 τ 五、發明說明(5) 設於預定端52與排氣管46之間,用來使流至預定端52之氣 體得以繼續向上流入排氣管4 6,以避免氣體積聚於預定端 5 2。環狀凸緣5 0設於消波板34之線形開口 44下側並位於線 形開口 4 4之周圍,用來防止消波板3 4下側之凹槽4 2内所積 聚之氣體經由線形開口44而向上流入熱水槽32。 請參閱圖六’圖六為圖四所示熱水槽32的水流示意 圖’圖中箭頭為水流方向》本發明慢抽式乾燥機3 0可以應 用於製造磁碟片或晶圓用之基材(以下簡稱基材)的清洗製 程’當清洗複數個基材54時,複數個基材54係平行地安置 於一承載架(未顯示)内。當清洗複數個基材54時,承載架 及衣其中的基材54會先浸入熱水槽32内之熱水中,而後再 緩慢地由熱水槽32内之熱水中抽出,利用熱水的表面張力 將附著於基材54表面上的微粒子去除。而當承載架及其中 的基材54由熱水槽32之熱水液面提出時,基材54之表面是 與垂直侧壁3 5、3 9以及消波板3 4上側之線形開口 4 4相垂 直,因此使線形開口 44向上流入熱水槽32之熱水流會近似 平行地流過複數個基材5 4間之空隙,如圖六所示,並將懸 洋於液面之微粒子帶向垂直側壁35、37、39 '41之頂端而 流出熱水槽32。另外,本發明慢抽式乾燥機3〇亦可以應用 於清洗複數個磁碟片(未顯示)的清洗製程。 由於慢抽式乾燥機3〇中,線形開口“的線形方向與垂 直側壁3 5、3 9相平行,而由入水口 4 〇所輸入之熱水是經由Ο 63 2 τ V. Description of the invention (5) It is located between the predetermined end 52 and the exhaust pipe 46, so that the gas flowing to the predetermined end 52 can continue to flow upward into the exhaust pipe 4 6 to avoid the gas accumulation in the predetermined End 5 2. The annular flange 50 is provided below the linear opening 44 of the wave absorbing plate 34 and is located around the linear opening 4 4 to prevent the gas accumulated in the groove 4 2 under the wave absorbing plate 34 from passing through the linear opening. 44。 And upward into the hot water tank 32. Please refer to FIG. 6 'FIG. 6 is a schematic diagram of the water flow of the hot water tank 32 shown in FIG. 4' The arrow is the direction of the water flow> The slow-pump dryer 30 of the present invention can be applied to the manufacture of substrates for magnetic disks or wafers ( Hereinafter, the cleaning process of the substrate). When the plurality of substrates 54 are cleaned, the plurality of substrates 54 are disposed in parallel in a carrier (not shown). When cleaning a plurality of substrates 54, the substrate 54 in the carrier and clothing will be immersed in the hot water in the hot water tank 32, and then slowly extracted from the hot water in the hot water tank 32, using the surface of the hot water The tension removes fine particles adhering to the surface of the substrate 54. When the carrier and its substrate 54 are lifted from the hot liquid surface of the hot water tank 32, the surface of the substrate 54 is in line with the linear openings 4 4 on the upper side of the vertical side walls 35, 39, and the wave absorbing plate 34. It is vertical, so the hot water flow that causes the linear opening 44 to flow upward into the hot water tank 32 will flow through the gaps between the plurality of substrates 54 in parallel, as shown in Figure 6, and bring the particles suspended on the liquid surface to the vertical side walls. 35, 37, 39 '41 and flows out of the hot water tank 32. In addition, the slow-drawing dryer 30 of the present invention can also be applied to a cleaning process for cleaning a plurality of magnetic disks (not shown). In the slow-pump dryer 30, the linear direction of the linear opening "is parallel to the vertical side walls 35, 39, and the hot water input from the water inlet 4
第ί)頁 4 6 63 2 7 五、發明說明(6) $形開口 44導引至熱水槽32内,使熱水形成橫載面近似線 形之熱水流向上流向熱水槽3 2之液面,並以近似平行地流 過複數個基材54或磁碟片間之空隙,因此本發明可防止液 ©產生IL流,並且能將懸浮於液面之微粒子帶向由垂直側 壁%5、3 7、3 9、4 1之頂端而流出熱水槽3 2。此外,慢抽式 乾燥機30中’於消波板34上設有傾斜凹槽48以使積聚於凹 槽42之預定端52内之氣體得以連續向上流入排氣管46,這 種連續排氣的設計可以解決因不連續排氣所引發的震動而 在基材54或磁碟片上留下水痕之問題,並且解決噪音問 題。因此本發明慢抽式乾燥機30可以提昇基材54或磁碟片 清洗製程的品質。 請參閱圖七’圖七為本發明另一實施例慢抽式乾燥機 60的示意圖《本實施例慢抽式乾燥機6〇與慢抽式乾燥機3〇 主要差別在於垂直側壁之結構。以下便針對慢抽式乾燥機 60之垂直側壁來說明。慢柚式乾燥機的熱水槽62包含有 四垂直侧壁64、66、68、70 ’其中垂直側壁64、68高於垂 直側壁6 6、7 0,並且二垂直侧壁6 6、7 0均與消波板3 4之線 形開口 4 4相互平行。 請參閱圖八’圖八為圖七所示熱水槽6 2的水流示意 圖,圖中箭頭所示為水流方向。當由入水口 40所輸入之熱 水在經由消波板3 4之線形開口 4 4而向上流入熱水槽6 2時, 線形開口 4 4會使向上流入熱水槽6 2之熱水形成一橫截面近Page 4) 4 6 63 2 7 V. Description of the invention (6) The $ -shaped opening 44 is guided into the hot water tank 32, so that the hot water forms a substantially linear cross-sectional surface of the hot water flow upward to the liquid surface of the hot water tank 32. The substrate 54 or the gaps between the disks flow in approximately parallel. Therefore, the present invention can prevent the IL from generating an IL flow, and can bring the particles suspended in the liquid surface to the vertical side wall.% 5, 3 7 , 3 9, 9 and 4 1 out of the hot water tank 32. In addition, the slow-pump dryer 30 is provided with an inclined groove 48 on the wave absorbing plate 34 so that the gas accumulated in the predetermined end 52 of the groove 42 can continuously flow upward into the exhaust pipe 46. This continuous exhaust The design can solve the problem of leaving water marks on the substrate 54 or the magnetic disk due to the vibration caused by the discontinuous exhaust, and solve the problem of noise. Therefore, the slow drawing dryer 30 of the present invention can improve the quality of the substrate 54 or magnetic disk cleaning process. Please refer to Fig. 7 '. Fig. 7 is a schematic diagram of a slow-extracting dryer 60 according to another embodiment of the present invention. [The slow-extracting dryer 60 of this embodiment and the slow-extracting dryer 30 are mainly different in the structure of the vertical side wall. The vertical side wall of the slow-draw dryer 60 will be described below. The hot water tank 62 of the slow grapefruit dryer includes four vertical side walls 64, 66, 68, 70 ', wherein the vertical side walls 64, 68 are higher than the vertical side walls 66, 70, and the two vertical side walls 66, 70 are both The linear openings 4 4 and the wave-cutting plates 34 are parallel to each other. Please refer to FIG. 8 'FIG. 8 is a schematic diagram of the water flow of the hot water tank 62 shown in FIG. When the hot water input from the water inlet 40 flows upward into the hot water tank 62 through the linear opening 4 4 of the wave absorbing plate 34, the linear opening 4 4 forms a cross-section of the hot water flowing upward into the hot water tank 62. near
第]0頁 46 632 7 五、發明說明(7) 似線形之熱水流向上流向熱水槽6 2之液面,並於液面之處 形成二分別流向二垂直侧壁6 6、7 0之穩定水流,二水流會 將懸浮於液面之微粒子分別帶向二垂直側'壁6 6、7 0並由二 垂直側壁6 6、7 0之頂端將其帶出熱水槽6 2。 相較於習知慢抽式乾燥機1 0,本發明慢抽式乾燥機 30、60之消波板34具有線形開口44以導引輸入熱水槽32、 62之熱水。由於線形開口 44之線形方向與熱水槽32之垂直 側壁3 5、3 9或熱水槽6 2之垂直側壁6 6、7 0相平行,因此熱 水會於熱水槽3 2、6 2之液面形成穩定水流並以近似平行地 流過複數個基材5 4或磁碟片間之空隙,而將懸浮於液面之 微粒子帶向垂直侧壁之頂端而流出熱水槽3 2。此外本發明 慢抽式乾燥機30、60之消波板34上設有傾斜凹槽48以使積 聚於凹槽42之預定端52内之氣體得以連續向上流入排氣管 4 6,這種連續排氣的設計可以解決因不連續排氣所引發的 震動而在基材54或磁碟片上留下水痕之問題,並且解決噪 音問題。因此本發明慢抽式乾燥機用於基材54或磁碟片的 清洗製程時可以提昇清洗製程品質。 以上所述僅為本發明之較佳實施例,凡本發明申請專 利範圍所做之均等變化與修飾,皆應屬本發明專利之涵蓋 範圍。Page] 0 46 632 7 V. Description of the invention (7) The linear hot water flows upward to the liquid surface of the hot water tank 62, and forms two stable flows on the liquid surface to the two vertical side walls 6 6, 70. The water stream and the second stream will bring the particles suspended on the liquid surface to the two vertical sides' walls 6 and 70, respectively, and take them out of the hot water tank 6 2 from the top of the two vertical side walls 66 and 70. Compared with the conventional slow-extracting dryer 10, the wave-absorbing plates 34 of the slow-extracting dryers 30 and 60 of the present invention have linear openings 44 to guide the hot water input to the hot water tanks 32 and 62. Since the linear direction of the linear opening 44 is parallel to the vertical side walls 3 5 and 39 of the hot water tank 32 or the vertical side walls 6 6 and 70 of the hot water tank 62, the hot water will be on the liquid surface of the hot water tanks 3 2, 62. A stable water flow is formed and flows through the gaps between the plurality of substrates 54 or the disks in approximately parallel, and the fine particles suspended on the liquid surface are brought to the top of the vertical side wall and flow out of the hot water tank 32. In addition, the wave-absorbing plates 34 of the slow-draw dryers 30 and 60 of the present invention are provided with inclined grooves 48 so that the gas accumulated in the predetermined end 52 of the groove 42 can continuously flow upward into the exhaust pipe 46. The design of the exhaust can solve the problem of leaving water marks on the substrate 54 or the magnetic disk due to the vibration caused by the discontinuous exhaust, and solve the problem of noise. Therefore, the slow drawing dryer of the present invention can improve the quality of the cleaning process when it is used in the cleaning process of the substrate 54 or the magnetic disk. The above description is only a preferred embodiment of the present invention, and all equivalent changes and modifications made in the patentable scope of the present invention shall fall within the scope of the patent of the present invention.
第U頁Page U
Claims (1)
Priority Applications (1)
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TW88112061A TW466327B (en) | 1999-10-08 | 1999-10-08 | Slow pull dryer capable of preventing liquid surface from generating turbulence |
Applications Claiming Priority (1)
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TW88112061A TW466327B (en) | 1999-10-08 | 1999-10-08 | Slow pull dryer capable of preventing liquid surface from generating turbulence |
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TW466327B true TW466327B (en) | 2001-12-01 |
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TW88112061A TW466327B (en) | 1999-10-08 | 1999-10-08 | Slow pull dryer capable of preventing liquid surface from generating turbulence |
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TW (1) | TW466327B (en) |
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1999
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