TW445599B - Multi-chip stacked package structure - Google Patents

Multi-chip stacked package structure Download PDF

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TW445599B
TW445599B TW89109786A TW89109786A TW445599B TW 445599 B TW445599 B TW 445599B TW 89109786 A TW89109786 A TW 89109786A TW 89109786 A TW89109786 A TW 89109786A TW 445599 B TW445599 B TW 445599B
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chip
wafer
english
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chinese
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TW89109786A
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Chinese (zh)
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Su Tao
Chun-Hung Lin
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Advanced Semiconductor Eng
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Abstract

This invention is about a kind of multi-chip stacked package structure. A multi-chip module substrate is provided. A first chip is adhered to the multi-chip module substrate. The bonding face of the first chip has a central region and plural bonding pads, which are located at the periphery of the central region. A second chip is adhered on the bonding face of the first chip and the bottom face of the second chip has an outer tier and a central tier, in which the central tier of the second chip has a thickness and a periphery. The periphery of the central tier is completely located and adhered inside the central region of the first chip. A plurality of first connecting wires are used to electrically connect each bonding pad of the first chip with the multi-chip module substrate. The first connecting wire defines a loop height. The central tier thickness of the second chip is larger than the loop height of the first connecting wire such that the second chip and the first connecting wire can be stacked on the bonding face of the first chip through the use of a non-contacting manner. A plurality of second connecting wires are used to electrically connect each bonding pad of the second chip with the multi-chip module substrate.

Description

445599445599

89in〇7^Q 五、發明說明(1) --^^月日—條正 _ 【發明領域】: 本發明係有關於一曰 module, MCM),牲w 士夕日日片封裝構造(multi -chip 造。 關於一種晶片堆疊式多晶片封裝構 【先前技術】: 由於電子產品越炎私土 — 片以及提供外部電路^ =薄短小,使得用以保護半導體晶 化。 連接的封裝構造也同樣需要輕薄短小 造m::及高運作速度需求的增加,多晶片封裝構 將兩個二而伽广置越來越吸引人。多晶片封裝構造可藉由 统運你以上之晶片組合在單一封裝構造中,來使系 之限制最小化。此外,多晶片封裝構造可減ί 曰曰連妾線路之長度而降低訊號延遲以及存取時間。 最常見的多晶片封裝構造為並排式“丨^一心”“…多晶 片封裝構造’其係將兩個以上之晶片彼此並排地安裝於一 /、Π基板之主要女裝面。晶片與共同基板上導電線路間之 連接一般係藉由線銲法(wi re bond i ng)達成。然而該並排 式多晶片封裝構造之缺點為封裝效率太低,因為該共同基 板之面積會隨著晶片數目的增加而增加。 因此,美國專利第5 3 2 3 0 6 0號揭示一多晶片堆疊裝置 (multichip stacked device),其包含一第一半導體晶片 110設於一基板120並且電性連接至基板120,以及一第二 半導體晶片130堆疊於該第一半導體晶片上並且電性連接 至基板(參見第la圖)。該美國專利第5323060號之特徵89in〇7 ^ Q V. Description of the invention (1)-^^ 月 日 — 条 正 _ [Field of the invention] The present invention relates to a module (MCM), a package structure for multi-day sun-chips (multi- About a chip-stacked multi-chip package structure [Previous technology]: As electronic products become more and more private — and they provide external circuits ^ = thin and short, it is used to protect semiconductors from crystallizing. The packaging structure of the connection also requires Lightweight, thin and short build m :: and the increase of high operating speed requirements, the multi-chip package structure will become more and more attractive. The multi-chip package structure can be combined in a single package structure by transporting more than your chips. In order to minimize the limitation of the system. In addition, the multi-chip package structure can reduce the length of the flail circuit and reduce the signal delay and access time. The most common multi-chip package structure is a side-by-side "丨 ^ 一心" "... Multi-chip package structure 'is the installation of two or more wafers side by side on the main women's side of a substrate. The connection between the wafer and the conductive lines on the common substrate is generally by wire bonding. wi re bond i ng). However, the disadvantage of the side-by-side multi-chip package structure is that the packaging efficiency is too low, because the area of the common substrate will increase with the increase in the number of chips. Therefore, US Patent No. 5 3 2 3 0 No. 60 discloses a multichip stacked device including a first semiconductor wafer 110 disposed on a substrate 120 and electrically connected to the substrate 120, and a second semiconductor wafer 130 stacked on the first semiconductor wafer. And is electrically connected to the substrate (see Fig. La). Features of this US Patent No. 5323060

P00~048~amend. ptc 第4頁 445599 _案號89109786 _年 月 日 倏正__ 五、發明說明(2) 在於利用一設於兩晶片間的膠層1 4 〇來提供銲線線弧(t h e loops of the bonding wires)所需之空隙(clearance)。 並且ό玄膠層140之厚度必須大於銲線之弧高(i〇〇p height) 一指晶片1 1 0正面與銲線1 5 0線弧頂點間的距離—以避免晶 片1 3 0接觸到銲線1 5 0之線弧。 習知在晶片銲墊與基板銲墊間形成銲線連接(w丨r e interconnection)之打線技術一般係包含(a)球接合(baU bond)於晶片銲塾,(b)形成線弧於晶片銲墊與基板銲塾 間以及(c)壓印接合(stitch bond)至基板銲墊而完成該 銲線連接。一般其弧高約為1 〇至1 5密爾(m丨1)。雖然藉著 調整線弧參數,外形以及型式,習用打線技術可以將弧高 將低至大約6密爾(m i 1 )。然而這已是可得到的最小弧高, 因為若更低將使線受損並且使其拉力變差。 因此,使用習知打線技術時,該膠層丨4 〇之厚度必須大 於8岔爾以;^全防止晶片1 3 〇接觸到銲線1 & 〇之線弧。該膠 層140之材料一般為環氧膠(ep〇xy)或膠帶(tape)。然而要 形成厚度達8密爾之環氧膠層是非常困難的。此外,當使 用厚度達8密爾之膠帶,其一方面將大幅增加製造成本; 另一方面,該膠層140與矽晶片間的熱膨脹係數不一致, (CTE mismatch)也將嚴重損壞所製得封裝構造之可靠性 因此,美國專利第6 00 5778號揭示另一多晶片堆疊裝置 (multichip stacked device),其包含一第一半導體^ 110设於一基板120並且電性連接至基板12〇,以及一第二 半導體晶片1 30堆疊於該第一半導體晶片上並且電性連=P00 ~ 048 ~ amend.ptc Page 4 445599 _Case No. 89109786 _Year Month Date __ V. Description of the invention (2) It is to use a glue layer 1 4 〇 provided between two wafers to provide the wire arc. (The loops of the bonding wires). And the thickness of the adhesive layer 140 must be greater than the arc height of the bonding wire. This refers to the distance between the front surface of the wafer 1 1 0 and the vertex of the arc of the welding line 150-to avoid the wafer 1 3 0 from touching Line arc of welding wire 1 50. Conventionally, the wire bonding technology for forming a wire interconnection between a wafer pad and a substrate pad generally includes (a) a baU bond on a wafer bonding pad, and (b) forming a wire arc on the wafer bonding. The bonding wire connection is completed between the pad and the substrate pad and (c) a stitch bond to the substrate pad. Generally, the arc height is about 10 to 15 mils (m 丨 1). Although by adjusting the parameters, shape and type of the arc, the conventional arcing technique can reduce the arc height to about 6 mils (m i 1). However, this is already the minimum arc height available, because a lower value will damage the wire and make its tension worse. Therefore, when using conventional wire bonding technology, the thickness of the adhesive layer must be greater than 8 Å; to prevent the wafer 1 3 from contacting the wire arc of the bonding wire 1 &0; The material of the adhesive layer 140 is generally epoxy adhesive or tape. However, it is very difficult to form an epoxy adhesive layer having a thickness of 8 mils. In addition, when using a tape with a thickness of 8 mils, on the one hand, it will greatly increase the manufacturing cost; on the other hand, the thermal expansion coefficient between the adhesive layer 140 and the silicon wafer is inconsistent, and the package produced will be seriously damaged. Structural Reliability Therefore, U.S. Patent No. 6 00 5778 discloses another multichip stacked device, which includes a first semiconductor device 110 disposed on a substrate 120 and electrically connected to the substrate 120, and a The second semiconductor wafer 130 is stacked on the first semiconductor wafer and is electrically connected =

445599 五、發明說明(3) 案號 89109786445599 V. Description of the invention (3) Case number 89109786

B 修正 至基板(參見第lb圖)。該美國專利第6〇〇5778號之特徵, 在於利用一 ό又於兩晶片間的間隔物(s p a c e r ) 1 6 Q來提供鲜 線 150 線弧(the loops of the bonding wires)所需之空 隙(clearance)。此外,以金屬導電材料製成之間隔物 (spacer) 160亦可作為半導體晶片之接地面,及提供電容 之女裝。雖然,美國專利第6 〇 〇 5 7 7 8號之間隔物 、 (spaCer)160已解決美國專利第532 3〇6〇號前述膠層14〇之 缺失,但需增加一額外間隔物元件於多晶片封裝構造中, 無形中亦增加了多晶片封裝構造之製造成本。 【發明内容】: 本發明之主要目的係提供一種多晶片堆疊封裝構造,其 包含兩晶片以堆疊方式安裝於一多晶片模組基板,其中^ 上晶片之底部底面具有一外部階梯層(〇uter Uer)及一中 央階梯層(central tier),該中央階梯層提供下晶片銲線 線弧(the loops of the bonding wires)所需之空間,以 避免上晶片接觸到下晶片銲線之線弧。 本發明之次要目的係提供一種製造多晶片堆疊封裝構造 之方法,其將兩晶片以堆疊方式安裝於一多晶片模組基 板,其中該上晶片之底部底面具有一外部階梯層(〇uter t i e r)及一中央階梯層(c e n t r a 1 t i e r ),該中央階梯層提 供下晶片銲線線弧(the loops of the bonding wires)所 需之空間,以避免上晶片接觸到下晶片銲線之線弧。 為達上述目的,根據本發明之較佳實施例之多晶片堆疊 封裝構造,該多晶片堆疊封裝構造包含一多晶片模組基且B Correct to the base plate (see Figure lb). The feature of this U.S. Patent No. 60005778 is to use the spacer 16 Q between the two wafers to provide the space required for the loops of the bonding wires ( clearance). In addition, a spacer 160 made of a metal conductive material can also be used as a ground plane for semiconductor wafers, and women's clothing that provides capacitors. Although the spacer of US Patent No. 6005 7 78 and (spaCer) 160 have solved the lack of the aforementioned adhesive layer 14 of US Patent No. 532 3060, an additional spacer element needs to be added in more In the chip package structure, the manufacturing cost of the multi-chip package structure is also virtually increased. [Summary]: The main purpose of the present invention is to provide a multi-chip stacked package structure, which includes two chips stacked on a multi-chip module substrate, wherein the bottom mask of the upper chip has an external step layer (〇uter Uer) and a central tier. The central tier provides the space required for the loops of the bonding wires to prevent the upper wafer from contacting the wire arcs of the lower wafer. A secondary object of the present invention is to provide a method for manufacturing a multi-chip stacked package structure, in which two chips are stacked on a multi-chip module substrate, wherein the bottom mask of the upper chip has an outer step layer (〇uter tier). ) And a central step layer (centra 1 tier), which provides the space required for the loops of the bonding wires to prevent the upper chip from contacting the wire arc of the lower chip. To achieve the above object, a multi-chip stacked package structure according to a preferred embodiment of the present invention includes a multi-chip module base and

POO-048-araend. ptc 第6頁 445599 案號 89109786 Λ_η 曰 修正 五、發明說明(4) 板,一第一晶片,具有相對之接合面(bonding face)及底 面(base face),該第一晶片底面黏著於該多晶片模組基 板’該第一晶片接合面具有一中央區域及複數個接合焊墊 位於中央區域之周圍;一第二晶片,具有相對之接合面 (bonding face)及底面(base face),該第二晶片底面黏 著於該第一晶片接合面,該第二晶片接合面具有一中央區 域及複數個接合焊墊位於中央區域之周圍,第二晶片底面 具有一外部階梯層(outer tier)及一中央階梯層(central t ier) ’第二晶片之中央階梯層具有一厚度及一週邊,中 央階梯層之週邊係完全位於且黏著於第一晶片之中央區域 内L複數條第一連接線將第一晶片之個別接合焊墊與多晶 片模組基板電性相連接,第一連接線界定一弧高(1〇〇p he 1 ghj:)心第一晶片之接合面與連接線線弧頂點間的距 ,,第二晶片之中央階梯層之厚度大於第一連接線之弧 =,使第一晶片得與第一連接線以不接觸方式堆疊於第一 ί ίί合面上;及複數條第二連接線將第二晶片之個別 接5绊墊與多晶片模組基板電性相連接。 之較佳實施例之製造多晶片堆疊封裝構造之 列步驟:提供-多晶片模組基板;黏著-人面r: η : ”夕晶片模組基板,1亥第一晶片具有相對之接 及底面(base face),該第-晶片接 圍· i性連接、:f域及複數個接合谭塾位於中央區域之周 與^片^基板間’第—連接線界定-弧高(1〇〇ΡPOO-048-araend. Ptc Page 6 445599 Case No. 89109786 Λ_η Modification V. Description of Invention (4) A plate, a first wafer, having a bonding face and a base face opposite to each other, the first The bottom surface of the wafer is adhered to the multi-chip module substrate. The first wafer bonding mask has a central area and a plurality of bonding pads are located around the central area. A second wafer has opposite bonding faces and a bottom surface ( base face), the second wafer bottom surface is adhered to the first wafer bonding surface, the second wafer bonding mask has a central region and a plurality of bonding pads are located around the central region, and the second wafer bottom mask has an outer step layer ( outer tier) and a central tier. The central tier of the second chip has a thickness and a periphery. The periphery of the central tier is completely located and adhered to the central region of the first chip. A connection line electrically connects the individual bonding pads of the first chip with the multi-chip module substrate. The first connection line defines an arc height (100p he 1 ghj :) of the first chip. The distance between the surface and the apex of the connecting line line. The thickness of the central stepped layer of the second chip is greater than the arc of the first connecting line. And a plurality of second connecting wires electrically connect the individual pads of the second chip to the multi-chip module substrate. List of steps for manufacturing a multi-chip stacked package structure in a preferred embodiment: provide-a multi-chip module substrate; adhesion-a human face r: η: "Xi chip module substrate, the first chip has opposite connection and bottom surface (base face), the first-wafer encirclement · i-type connection,: f-domain and a plurality of joints Tan Ying is located in the middle of the central area and ^ sheet ^ between the substrate-the first connection line definition-arc height (10〇Ρ

445599 __案號89109786_年月日 條正___ 五、發明說明(5) he i ght)—指第一晶片之接合面與連接線線弧頂點間的距 離;黏著一第二晶片於該第一晶片上,該第二晶片具有相 對之接合面(bonding face)及底面(base face),該第二 晶片接合面具有一中央區域及複數個接合焊塾位於中央區 域之周圍,第二晶片底面具有一外部階梯層(outer tier) 及一中央階梯層(c e n t r a 1 t i e r),第二晶片之中央階梯層 具有一厚度及一週邊,中央階梯層之週邊係完全位於且黏 著於第一晶片之中央區域内,第二晶片中央階梯層之厚度 大於第一連接線之弧南’使第二晶片之底面得與第一連接 線以不接觸方式堆疊於第一晶片之接合面上;及電性連接 複數條第二連接線於第二晶片之個別接合焊墊與多晶片模 組基板間。 根據本發明,第二晶片係由下列方式製成。首先將一晶 圓固又於一工作台’使該晶圓之背面朝上而正面朝下。以 一研磨輪平行於晶圓背面機械式研磨該晶圓。研磨第二晶 片時,則先將晶圓先研磨至預設之第一厚度,約為丨4至2〇 密爾。接著’以一厚切割刀沿研磨後晶圓之晶片切割線先 將晶圓切割以形成一深度約為H 〇密爾,寬度約為6__8密 爾之槽溝。再以一薄切割刀,如鑽石刀,將具槽溝晶圓切 割成個別之第二晶片。因此,第二晶片底面形成一外部階 梯層(outer tier)‘及一中央階梯層(central Uer),中央 階梯層具有一厚度T約為8-10密爾,使第二晶片得與第一 連接線以不接觸方式堆疊於第一晶片之接合面上。 是以,本發明可兩晶片以堆疊方式安裝於一多晶片模組445599 __Case No. 89109786_ Year, Month, and Day ___ V. Description of the invention (5) he i ght) —refers to the distance between the joint surface of the first chip and the apex of the connecting line arc; a second chip is adhered to the On the first wafer, the second wafer has opposite bonding faces and base faces. The second wafer bonding mask has a central region and a plurality of bonding pads located around the central region. The second wafer The bottom mask has an outer tier and a centra 1 tier. The central tier of the second wafer has a thickness and a periphery. The periphery of the central tier is completely located and adhered to the first wafer. In the central region, the thickness of the central stepped layer of the second wafer is greater than the arc south of the first connection line, so that the bottom surface of the second wafer and the first connection line are stacked in a non-contact manner on the bonding surface of the first wafer; The plurality of second connecting wires are connected between the individual bonding pads of the second chip and the multi-chip module substrate. According to the present invention, the second wafer is made in the following manner. First, a wafer is fixed on a workbench 'so that the back side of the wafer faces upward and the front side faces downward. The wafer is mechanically ground with a grinding wheel parallel to the back of the wafer. When grinding the second wafer, the wafer is first ground to a predetermined first thickness, which is about 4 to 20 mils. Then, the wafer is cut along a wafer cutting line of the polished wafer with a thick dicing knife to form a groove having a depth of about _mil and a width of about 6__8 mil. The slotted wafer is then cut into individual second wafers with a thin dicing knife, such as a diamond knife. Therefore, an outer tier 'and a central Uer are formed on the bottom surface of the second wafer. The central tier has a thickness T of about 8-10 mils, so that the second wafer must be connected to the first wafer. The wires are stacked on the bonding surface of the first wafer in a non-contact manner. Therefore, in the present invention, two chips can be mounted on a multi-chip module in a stacked manner.

P00-048-amend. ptc 第8頁 445599 修正 年 月P00-048-amend.ptc Page 8 445599 Revision Year Month

B .1^ 89109786 五、發明說明(6) 基板’而使上晶片之底部完全不接觸到下晶片銲線之線 弧’且克服前述美國專利第5323060及6005778號之缺失。 為了讓本發明之上述和其他目的、特徵、和優點能更明 顯’下文特舉本發明較佳實施例,並配合所附圖示,作詳 細說明如下。 【發明說明】: 請參照第6及7圖,其揭示本發明多晶片堆疊封裝構造之 剖面圖。根據本發明之多晶片堆疊封裝構造,一第一晶片 210具有相對之接合面(bonding face)212及底面(base face)214。第一晶片210之底面214藉由一黏著層222,如 環氧樹脂’膠帶或熱塑性等之黏著層,黏著於一多晶片模 組基板220。第一晶片210之接合面212具有一中央區域218 及複數個接合焊墊216位於中央區域218之周圍。一第二晶 片230具有相對之接合面(bonding face)232及底面(base face)234。底面234藉由一黏著層240,如環氧樹脂,膠帶 或熱塑性等之黏著層,黏著於該第一晶片2丨〇之接合面2 j 2 之中央區域218。第二晶片230之接合面232具有一中央區 域238及複數個接合焊塾236位於中央區域238之周圍。 根據本發明之多晶片堆疊封裝構造,第二晶片2 3 〇底面 2 34之至少二側邊以化學蝕刻或機械切割加工方式形成一 外部階梯層(outer tier) 234a及一中央階梯層(centralB.1 ^ 89109786 V. Description of the invention (6) Substrate 'so that the bottom of the upper wafer does not touch the arc of the bonding wire of the lower wafer at all' and overcome the defects of the aforementioned U.S. Patent Nos. 5,323,060 and 6005778. In order to make the above and other objects, features, and advantages of the present invention more apparent, the preferred embodiments of the present invention will be described in detail below, in conjunction with the accompanying drawings, as follows. [Explanation of the Invention]: Please refer to FIGS. 6 and 7, which are cross-sectional views of the multi-chip stacked package structure of the present invention. According to the multi-chip stacked package structure of the present invention, a first chip 210 has a bonding face 212 and a base face 214 opposite to each other. The bottom surface 214 of the first chip 210 is adhered to a multi-chip module substrate 220 by an adhesive layer 222, such as an epoxy 'tape or a thermoplastic adhesive layer. The bonding surface 212 of the first wafer 210 has a central region 218 and a plurality of bonding pads 216 are located around the central region 218. A second wafer 230 has a bonding face 232 and a base face 234 opposite to each other. The bottom surface 234 is adhered to the central region 218 of the bonding surface 2 j 2 of the first wafer 2 through an adhesive layer 240, such as an adhesive layer of epoxy resin, tape, or thermoplastic. The bonding surface 232 of the second wafer 230 has a central region 238 and a plurality of bonding pads 236 are located around the central region 238. According to the multi-chip stacked package structure of the present invention, at least two sides of the second wafer 2 30 bottom surface 2 34 are formed by an outer tier 234a and a central tier by chemical etching or mechanical cutting.

tier)234b ’第二晶片230之中央階梯層234b具有一厚度T 及一週邊,中央階梯層234b之週邊係完全位於且黏著於第 一晶片之中央區域218内。複數條第一連接線2 5〇將第一晶tier) 234b 'The central stepped layer 234b of the second wafer 230 has a thickness T and a periphery. The periphery of the central stepped layer 234b is completely located and adhered to the central region 218 of the first wafer. The plurality of first connecting lines 2 50

第9頁 445599Page 9 445599

片210之個別接合焊墊216與多晶片模組基板2 2 〇電性相連 接。複數條第二連接線26 0將第二晶片23〇之個別接合焊墊 與多晶片模組基板22〇電性相連接。第一連接線25〇界 定一弧高(loop height)H —指第一晶片210之接合面21 2與 連接線2 5 0線弧頂點2 5 2間的距離。第二晶片2 3 〇之中央階 梯層(〇6111^3 11:丨61〇23413具有一厚度][須大於第一連接線 25 0之弧高Η,使第二晶片23 0得與第一連接線25〇以不接觸 方式堆疊於第一晶片2 1 0之接合面2 1 2上。根據本發明之多 晶片堆疊封裝構造之一實施例,第二晶片2 3 〇之中央階梯 層(central tier) 234b之厚度約為8 - 1〇密爾,而第一連接 線2 5 0之弧高係約為6密爾。因此,第二晶片2 3 〇中央階梯 層(central tier)234b之厚度T使第二晶片23 0得與第一 連接線2 5 0以不接觸方式堆疊於第一晶片2丨〇之接合面2 i 2 上0 清參照第2至5圖,其揭示本發明第二晶片2 3 〇之製造流 程圖。請參照第2圖,首先以一膠層20將一晶圓2〇〇固定於 一工作台1 0,使該晶圓2 0 0之背面2 〇 4朝上而晶圓2 〇 〇之正 面202與膠層20相接觸,晶圓2〇〇正面2〇2具有複數個接合 焊墊216。 請參照第3圖,以一研磨輪3〇平行於晶圓“ο背面2〇4機 械式研磨δ玄晶圓2 0 0。通常晶圓廢之晶圓2 〇 〇厚度約為2 〇至 25密爾(mi 1),而該晶圓須研磨至$ si 〇密爾(mi丨)之厚 度,再以鑽石刀切割成所須之晶片,然後加以封裝。第一 晶片2 1 0即將晶圓直接研磨至6至丨0密爾(m 士丨)之厚度,再The individual bonding pads 216 of the chip 210 are electrically connected to the multi-chip module substrate 220. The plurality of second connecting wires 260 electrically connect the individual bonding pads of the second chip 23o to the multi-chip module substrate 22o. The first connecting line 25 defines a loop height H—referring to the distance between the connecting surface 21 2 of the first wafer 210 and the connecting line 2 50 line vertex 2 5 2. The central stepped layer of the second wafer 2 3 0 (〇6111 ^ 3 11: 丨 61〇23413 has a thickness] [must be greater than the arc height of the first connection line 25 0, so that the second wafer 23 0 can be connected to the first Lines 250 are stacked on the contact surface 2 12 of the first wafer 210 in a non-contact manner. According to one embodiment of the multi-chip stacked package structure of the present invention, the central tier of the second wafer 2 300 ) The thickness of 234b is about 8-10 mils, and the arc height of the first connection line 250 is about 6 mils. Therefore, the thickness T of the central wafer 234b of the second wafer 2 30 is T The second wafer 23 0 and the first connecting wire 2 50 are stacked on the joint surface 2 i 2 of the first wafer 2 in a non-contact manner on 0. Referring to FIGS. 2 to 5, it discloses the second wafer of the present invention. The manufacturing flow chart of 2 3 0. Please refer to FIG. 2. First, a wafer 200 is fixed on a workbench 10 with an adhesive layer 20 so that the back surface 2 0 of the wafer 2 0 2 faces upward. The front surface 202 of the wafer 2000 is in contact with the adhesive layer 20, and the front surface 200 of the wafer 2000 has a plurality of bonding pads 216. Please refer to FIG. 3, and a polishing wheel 30 flat On the back of the wafer, ο mechanically grind the δ black wafer 2000. Generally, wafer waste wafer 2000 has a thickness of about 200 to 25 mils (mi 1), and the wafer must be ground. Up to $ si 〇mil (mi 丨) thickness, and then use a diamond knife to cut into the required wafer, and then package. The first wafer 2 1 0 is to directly grind the wafer to 6 to 0 mil (m ± 丨) 'S thickness, then

P00-048-amend. ptc 第10頁 445599 — ___案號 89109786___年月日__修正 _ 五、發明說明(8) 以鑽石刀切割成所須之晶片。研磨第二晶片23〇時,則先 將晶圓先研磨至預設之第一厚度,約為1 4至2 0密爾(晶片 厚度6至10密爾加上中央階梯層234b之厚度約為8-10密 爾)。 接著,如第4圖所示,以一厚切割刀40沿研磨後晶圓200 之晶片切割線先將晶圓2 0 0切割以形成一深度約為8 一 1 〇密 爾,寬度約為6-8密爾之槽溝。 請再參照第5圖,以一薄切割刀5 〇,如鑽石刀,將第4圖 之具槽溝晶圓切割成個別之第二晶片2 3 〇。因此,第二晶 片230底面234形成一外部階梯層(outer tier) 234a及一中 央階梯層(central tier) 234b,中央階梯層234b具有一厚 度丁約為8-10密爾,使第二晶片23〇得與第一連接線25〇以 不接觸方式堆疊於第一晶片210之接合面212上。 ,上所述,根據本發明之多晶片堆疊封裝構造特徵在於 該上晶片之底部底面具有一外部階梯層(〇uter tier)及一 中央階梯層(central tier),該中央階梯層提供下晶片銲 線線弧(the loops of the bonding Wires)所需之空間, 以避免上晶片接觸到下晶片焊線之線弧。 雖然本發明已以前述較佳實施例揭示,然其並非用以限 定本發明’任何熟習此技藝者’在不脫離本發明之精神和 範圍内,當可作各種之更動與修改。因此本發明之保護範 圍當視後附之申請專利範圍所界定者為準。P00-048-amend. Ptc Page 10 445599 — ___Case No. 89109786 __Amendment _ V. Description of the invention (8) Use a diamond knife to cut the required wafer. When grinding the second wafer 23 °, the wafer is first ground to a preset first thickness of about 14 to 20 mils (wafer thickness 6 to 10 mils plus the thickness of the central step layer 234b is about 8-10 mils). Next, as shown in FIG. 4, a thick cutting blade 40 is used to cut the wafer 200 along the wafer cutting line of the polished wafer 200 to form a depth of about 8 to 10 mils and a width of about 6 -8 Mill's Groove. Please refer to FIG. 5 again, and use a thin dicing knife 50, such as a diamond knife, to cut the grooved wafer of FIG. 4 into individual second wafers 2 3 0. Therefore, the bottom surface 234 of the second wafer 230 forms an outer tier 234a and a central tier 234b. The central step 234b has a thickness of about 8-10 mils, so that the second wafer 23 〇 and the first connection line 250 are stacked on the bonding surface 212 of the first wafer 210 in a non-contact manner. As mentioned above, the multi-chip stacked package structure according to the present invention is characterized in that the bottom and bottom masks of the upper chip have an outer step layer and a central step layer, and the central step layer provides lower chip soldering. The space required for the loops of the bonding wires to prevent the upper wafers from contacting the wire arcs of the lower wafers. Although the present invention has been disclosed with the aforementioned preferred embodiments, it is not intended to limit the present invention, 'any person skilled in the art', can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be determined by the scope of the attached patent application.

445599 案號 89109786 年月曰 修正 圖式簡單說明 【圖示說明】: 第la圖:習知美國專利第532 30 6 0號之多晶片封裝構造 之剖面圖; 第lb圖:習知美國專利第60 0 577 8號之多晶片封裝構造 之剖面圖; 第2圖:將本發明第二晶片之晶圓安裝於一研磨台之剖 面示.圖 ; 第3圖:利用研磨輪將晶圓研磨至所須厚度之剖面示 圖; 第4圖:利用厚切割刀將研磨後晶圓切割,以形成所須 之槽溝之剖面示圖; 第5圖:利用薄切割刀將第4圖之具槽溝晶圓切割成個別 晶粒之剖面不圖, 第6圖:本發明多晶片堆疊封裝構造之剖面圖;及 第7圖:本發明多晶片堆疊封裝構造沿第6圖7-7剖線之 剖面圖。 圖號說明 10 工 作 台 20 膠 層 30 研 磨輪 40 厚 切 割 刀 50 薄 切 割 刀 110 晶 片 120 基 板 130 晶 片 140 膠 層 150 銲 線 200 晶 圓 202 晶 圓 正 面 204 晶 圓 背 面 210 第 一 晶 片 212 接 合 面 214 底 面 216 接 合 焊 墊 218 中 央 區 域445599 Case No. 89109786 Brief Description of Modified Drawings [Illustration]: Figure la: A cross-sectional view of a multi-chip package structure known to US Patent No. 532 30 6 0; Figure lb: Known US Patent No. 60 0 577 No. 8 multi-chip package structure cross-sectional view; Figure 2: Cross-sectional view of a wafer mounted on a polishing table of the second wafer of the present invention; Figure 3: Figure 3: Wafer grinding using a grinding wheel to Sectional view of required thickness; Figure 4: Cross-sectional view of cutting the polished wafer with a thick dicing knife to form the required groove; Figure 5: Slotting of Figure 4 with a thin dicing knife The cross-section of a trench wafer cut into individual dies is not shown. Figure 6: A cross-sectional view of the multi-chip stacked package structure of the present invention; and Figure 7: A multi-chip stacked package structure of the present invention along the section line of Figure 7-7 Sectional view. Description of drawing number 10 Workbench 20 Adhesive layer 30 Grinding wheel 40 Thick cutter 50 Thin cutter 110 Wafer 120 Substrate 130 Wafer 140 Adhesive layer 150 Welding wire 200 Wafer 202 Wafer front 204 Wafer back 210 First wafer 212 Joint surface 214 Underside 216 Bonding pad 218 Central area

P00-048-amend. ptc 第12頁 445599 案號 89109786 Λ_Ά 曰 修正 圖式簡單說明 220 基板 230 第二晶片 234a 外部階梯層 236 接合焊墊 2 5 0 第一連接線 2 6 0 第二連接線 2 2 2 黏著層 232 接合面 234 234b 中央階梯層 238 中央區域 252 弧頂 底面P00-048-amend. Ptc Page 12 445599 Case No. 89109786 Λ_Ά Brief description of correction diagram 220 Substrate 230 Second wafer 234a External step layer 236 Bonding pad 2 5 0 First connection line 2 6 0 Second connection line 2 2 2 Adhesive layer 232 Joint surface 234 234b Central step layer 238 Central area 252 Arc top surface

P00-048-amend. ptc 第13頁P00-048-amend.ptc Page 13

Claims (1)

修正 中文 發明專利說明書 製造多晶蔣 445599 發明名稱 英文 姓名(中文) 1. 陶恕 2. 林俊宏 發明人 (共2人) 申請人 (共1人) —姓名 (英文) l.TAOSu -----------------------__ ------------- 2·LIN Chun Hung 國籍 (中英文) 1·中華民國ROC 2·中華民國R〇c 住居所 (中文) J. 營區崇貫新村72-2號 2·南雄帝豉山區秦壘衔72號9樓 住居所 (英文) l.No. iZ-Z, Chorng-Shyr New Village, Tso Ying District, Kaohsiung, Taiwan 2.9F1., No. 72, Huafeng St., Gushan Chiu, Kaohsiung, Taiwan, R. 0. C. 名稱或 姓名 (中文) 1·曰月光半導體製造股份有限公司 名稱或 姓名 (英文) 1.Advanced Semiconductor Engineering, Inc. J籍 (中英文) 1.中華民國ROC 住居所 (f業所) (中文) 1..高雄市摘梓加工出口區經三路26號(本地址與前向貴局申請者相同) 住居所 業所) (夬文) 1.26, Chin 3rd Rd., Nantze Export Processing Zone, Kaohsiung, Taiwan, R. O.C. 代表人 (中文) tile虔生 __ 代表人 (英文) ---—, 1. Chian Seng CHANGAmend the Chinese invention patent specification to make polycrystalline Jiang 445599 Name of the invention English name (Chinese) 1. Tao Shu 2. Lin Junhong Inventor (total 2 persons) Applicant (total 1 person) — Name (English) l.TAOSu ---- -------------------__ ------------- 2 · LIN Chun Hung Nationality (Chinese and English) 1 · ROC 2 · ROC Residence of the Republic of China (Chinese) J. No. 72-2, Chongguan New Village, Camp Area 2 · 9th Floor Residence, No. 72, Qin Lei Title, Laoshan District, Nanxiong (English) l.No. iZ-Z, Chorng-Shyr New Village, Tso Ying District, Kaohsiung, Taiwan 2.9F1., No. 72, Huafeng St., Gushan Chiu, Kaohsiung, Taiwan, R. 0. C. Name or Name (Chinese) 1. Yueguang Semiconductor Manufacturing Co., Ltd. Name or Name (English) 1. Advanced Semiconductor Engineering, Inc. J-J (Chinese and English) 1. ROC Residence (F Business Office) (Chinese) 1 .. No. 26, Jingsan Road, Zizi Processing Export Zone, Kaohsiung City (This address is the same as the applicant who applied to your office before.) Residence Office) (Operation) 1.26, Chin 3rd Rd., Nantze Export Processing Zone, Kaohsiung, Taiwan, ROC Representative ( Text) tile Qian-sheng __ representative (English) ----, 1. Chian Seng CHANG 笙1百 445599 __案號 89109786_年月日___ 一、本案已向 國家(地區)申請專利 申請曰期 案號 主張專利法第二十四條第一項優先權 益 二、 □主張專利法第二十五條之一第一項優先權: 申請案號: 無 曰期: 三、 主張本案係符合專利法第二十條第一項□第一款但書或□第二款但書規定之期間 曰期: 四、 □有關微生物已寄存於國外: 寄存國家: 卜 寄存機構: # 寄存曰期: 寄存號碼: □有關微生物已寄存於國内(本局所指定之寄存機構): 寄存機構: 寄存曰期: 無 寄存號碼: □熟習該項技術者易於獲得,不須寄存。 ΙϋΙΙΙΙΙ P00-〇48-amend. ptc 第3頁Sheng 1 hundred 445599 __ Case No. 89109786_ Year Month ___ I. This case has been applied to the country (region) for the patent application date of the case No. Claims Article 24 of the Patent Law First Priority Rights II. □ Claims the Patent Law One of Article 25, the first priority: Application number: No date: 3. The claim is that the case is in accordance with Article 20 (1) of the Patent Law □ Paragraph 1 or □ Paragraph 2 Period: Date: □ The relevant microorganisms have been deposited abroad: The depositing country: The deposit institution: # Deposit date: The deposit number: □ The relevant microorganisms have been deposited in the country (the deposit institution designated by this bureau): the deposit institution : Storage date: No storage number: □ Those who are familiar with this technology are easy to obtain and do not need to be stored. ΙϋΙΙΙΙΙΙ P00-〇48-amend.ptc Page 3
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Cited By (2)

* Cited by examiner, † Cited by third party
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SG121705A1 (en) * 2002-02-21 2006-05-26 United Test & Assembly Ct Ltd Semiconductor package
US7919873B2 (en) 2001-09-17 2011-04-05 Megica Corporation Structure of high performance combo chip and processing method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7919873B2 (en) 2001-09-17 2011-04-05 Megica Corporation Structure of high performance combo chip and processing method
US7960212B2 (en) 2001-09-17 2011-06-14 Megica Corporation Structure of high performance combo chip and processing method
US7960842B2 (en) 2001-09-17 2011-06-14 Megica Corporation Structure of high performance combo chip and processing method
US8124446B2 (en) 2001-09-17 2012-02-28 Megica Corporation Structure of high performance combo chip and processing method
SG121705A1 (en) * 2002-02-21 2006-05-26 United Test & Assembly Ct Ltd Semiconductor package
US8288862B2 (en) 2002-02-21 2012-10-16 United Test & Assembly Center Limited Multiple die stack package

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