TW432198B - The static capacitor type strain detector with the used same - Google Patents
The static capacitor type strain detector with the used same Download PDFInfo
- Publication number
- TW432198B TW432198B TW089113557A TW89113557A TW432198B TW 432198 B TW432198 B TW 432198B TW 089113557 A TW089113557 A TW 089113557A TW 89113557 A TW89113557 A TW 89113557A TW 432198 B TW432198 B TW 432198B
- Authority
- TW
- Taiwan
- Prior art keywords
- interdigital
- substrate
- antenna structure
- strain
- scope
- Prior art date
Links
- 239000003990 capacitor Substances 0.000 title abstract 11
- 230000003068 static effect Effects 0.000 title abstract 4
- 239000002184 metal Substances 0.000 claims description 18
- 230000005855 radiation Effects 0.000 claims description 10
- 230000005540 biological transmission Effects 0.000 claims description 4
- 239000000758 substrate Substances 0.000 abstract 7
- 229920001971 elastomer Polymers 0.000 abstract 4
- 239000000806 elastomer Substances 0.000 abstract 4
- 239000004020 conductor Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 13
- 238000004891 communication Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000009429 distress Effects 0.000 description 1
- 230000001795 light effect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000000191 radiation effect Effects 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000012549 training Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/125—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/14—Measuring force or stress, in general by measuring variations in capacitance or inductance of electrical elements, e.g. by measuring variations of frequency of electrical oscillators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/16—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge
- G01B7/22—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge using change in capacitance
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/14—Measuring force or stress, in general by measuring variations in capacitance or inductance of electrical elements, e.g. by measuring variations of frequency of electrical oscillators
- G01L1/142—Measuring force or stress, in general by measuring variations in capacitance or inductance of electrical elements, e.g. by measuring variations of frequency of electrical oscillators using capacitors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/14—Measuring force or stress, in general by measuring variations in capacitance or inductance of electrical elements, e.g. by measuring variations of frequency of electrical oscillators
- G01L1/142—Measuring force or stress, in general by measuring variations in capacitance or inductance of electrical elements, e.g. by measuring variations of frequency of electrical oscillators using capacitors
- G01L1/144—Measuring force or stress, in general by measuring variations in capacitance or inductance of electrical elements, e.g. by measuring variations of frequency of electrical oscillators using capacitors with associated circuitry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/14—Measuring force or stress, in general by measuring variations in capacitance or inductance of electrical elements, e.g. by measuring variations of frequency of electrical oscillators
- G01L1/142—Measuring force or stress, in general by measuring variations in capacitance or inductance of electrical elements, e.g. by measuring variations of frequency of electrical oscillators using capacitors
- G01L1/148—Measuring force or stress, in general by measuring variations in capacitance or inductance of electrical elements, e.g. by measuring variations of frequency of electrical oscillators using capacitors using semiconductive material, e.g. silicon
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L3/00—Measuring torque, work, mechanical power, or mechanical efficiency, in general
- G01L3/02—Rotary-transmission dynamometers
- G01L3/04—Rotary-transmission dynamometers wherein the torque-transmitting element comprises a torsionally-flexible shaft
- G01L3/10—Rotary-transmission dynamometers wherein the torque-transmitting element comprises a torsionally-flexible shaft involving electric or magnetic means for indicating
- G01L3/106—Rotary-transmission dynamometers wherein the torque-transmitting element comprises a torsionally-flexible shaft involving electric or magnetic means for indicating involving electrostatic means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
- G01P2015/0808—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate
- G01P2015/0811—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass
- G01P2015/0814—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining in-plane movement of the mass, i.e. movement of the mass in the plane of the substrate for one single degree of freedom of movement of the mass for translational movement of the mass, e.g. shuttle type
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
- G01P2015/0822—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
- G01P2015/0825—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass
- G01P2015/0828—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass the mass being of the paddle type being suspended at one of its longitudinal ends
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Measuring Fluid Pressure (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Details Of Aerials (AREA)
- Force Measurement Appropriate To Specific Purposes (AREA)
Description
^32198 五、新型說明: 【新型所屬之技術領域】 本創作侧於-種天線結構,特別是關於一種可以抗, 蔽、增加頻寬且收發頻率穩定之天線結構。 几金屬屏 【先前技術】
按,隨著近年來無線通訊的快速發展,在_日t 線通訊技術的細已經是無所不在了,在天線的性能中無 漸提高’不但要求天線尺寸的簡單縮小化,且必二从逐 外界干㈣可以在金屬物體表面上正常制、增加收==圍蔽 ...1 ·. 線設計並無法滿足 而求,也往往造成使用者之困擾。 有鏗於此,如储上频失加簡除,即林_作人所欲 解決之技姻誠之所m本賴作人基料年從事相關 產品設計的經驗,有感於上述傳統用品之不便,經多年苦心孤讀 /曰匕研九’ 4作改良’終於可以摒除傳統天線結構之諸多缺點, 成功研發完成本案’並使本創作得崎生,明進功效者。 【新型内容】 有鑑於上述之缺點’本創作係提供一種天線結構,包括一用 以收發訊號之輻射體’魏射體具有電性連接之-練本體與一 自該輕射本體延伸出來之延伸臂,且於該輻射本_對之二侧, 刀別叹有向下延伸並且與該輻射本體電性連接之—饋人部以及一 接地部。 上述之天線結構,較佳的是該饋入部以及接地部係分別與 一接地金屬片電性連接。 如上述之天線結構,較佳的是該接地金屬片係為—平面型接 地金屬片。 如上述之天線結構,較佳岐該接地金屬片係為—彎折型接 地金屬片。 如上述之天線結構,較佳的是該饋入部電性連接有一傳輸 線’用以傳輸訊號。 ’ 如上述之天躲構’較料是該補本義為矩形。 如上述之天線結構,較佳的是該輻射本體係為幾何圖形。 如上述之天線結構,較佳的是該延伸臂係具有至少一次以上 之彎折。 如上述之天線結構,較佳的是該延伸臂末端係呈螺旋倒鉤狀。 本創作之主要目的在於提供一種可以抗金屬屏蔽而有效屏蔽 外界干擾之天線結構。 本創作之次要目的在於提供一種收發頻率穩定、提高天線效 月匕之天線結構。 本創作之另一目的在於提供一種可以增加頻寬之天線結構。 【實施方式】 為使貴審查委員方便瞭解本創作之其他特徵内容與優點, 及其所達成之功效能夠更為顯現,茲將本創作配合附圖,詳細說 明如下: 請參閱第-圖’其縣本創作之立體結構示,如圖所示, 本創作之天線結構10包括-肋收發峨之輻射體u,輕射體 U具有電性連接之-輕射本體lu與一自輕射本體Ul延伸出來 之延伸臂112 ’且於輕射本體lu才目對之二側,分職有向下延伸 並且與輕射本體111電性連接之—饋人部12以及—接地部η,其 中饋入部12以及接地部13係分別與—接地金屬片15電性連接, 饋入。IU2電性連接有-傳輸線14,用以傳輸訊號,圖中所示之 ,地金屬片15係為-平面型接地金屬片,延伸臂112係具有一次 弓折而輕射本體111可為矩形或其他幾何圖形。藉由本創作之 天線結構10而可達到抗金屬屏蔽、增加頻寬且收發頻率穩定之目 的。 明參閱第—圖’其係為本創作之__實補立體結構示意圖, 如圖所不’本創作天線結構2〇之接地金屬片16係可為—彎折型 接地金屬片’用以便於安裝設置該天線結構2〇。 _凊參閱第三圖,其係為本創作之另_實施例示意圖,如圖所 不本創作之延伸臂係可具有至少一次以上之彎折,而圖中所示 之延伸臂113係具有二次彎折。 請參閱第四圖,其係為本創作之又—實施例示意圖,如圖所 不,本創作之延伸料只可從如第—圖_本體m所示之處延 中如第四圖所不之延伸臂114也可以從輻射本體⑴之另—端 延伸。 _明參閱第五冑’其係為本創作之再一實施例示意圖,如圖所 T本到作之廷伸|也可以是如圖所示之延伸臂⑴❿呈現,延 伸臂115末端係呈螺旋倒鉤狀。 ,,請參閱第六®、第七圖及第八《,其係分縣本齡之X-Y 平面、X-Z平面及γ-ζ平面之輻射場型圖,其中每一圖式顯示當本 創作分別於2.4GHz、2.45 GHz、2. 5 GHz時之輻射場侧,如圖 所不’本創倾此實_ 2.微# χ—γ平面之雛賴效果為 2. 25dBi ’ X-Z平面之健輻射效果輕娜丨,γ ζ平面之較佳輕 射效果為3. 69dBi。 上列詳細綱麵對本鮮之—可行實_之具體說明,惟 該實施例並制嫌制相狀專圍,凡未麟本創作技藝 精神所為之等效實施或變更,均應包含於本案之專利範圍中。 綜上所述,本案不但在技術思想上確屬創新,並能較習用物 品增進上料項功效,應已充分符合新雛及進步性之法定創作 專利要件,妥依法提出申請,懇請貴局核准本件新型專利申請 案,以勵創作,至感德便。 【圖式簡單說明】 第一圖係為本創作之立體結構示意圖。 第二圖係為本創作之一實施例立體結構示意圖。 M432198 第三圖係為本創作之另一實施例示意圖。 第四圖係為本創作之又一實施例示意圖。 第五圖係為本創作之再一實施例示意圖。 第六圖係為本創作之X-Y平面輻射場型圖。 第七圖係為本創作之X-Z平面輻射場型圖。 第八圖係為本創作之Y-Z平面輻射場型圖。 【主要元件符號說明】 10、20天線結構 11輻射體 111輻射本體 112、113、114、115 延伸臂 12饋入部 13接地部 14傳輸線 15、16接地金屬片
Claims (1)
- 六、申請專利範圍: L種天線結構,包括一用以收發訊號之輻射體,該輻射體具 有電性連接之一輻射本體與一自該輻射本體延伸出來之延伸 I且於該輕射本體相對之二側,分別設有向下延伸並且與 該輻射本體電性連接之一饋入部以及一接地部。 2. 如申請專利範圍第1項所述之天線結構,其中該饋入部以及 接地部係分別與一接地金屬片電性連接。 3. 如申請專利範圍第2項所述之天線結構,其中該接地金屬片 係為一平面型接地金屬片。 4·如申請專利範圍第2項所述之天線結構,其中該接地金屬片 係為一彎折型接地金屬片。 5.如申請專利範圍第丨項所述之天線結構,其中該饋入部電性 連接有一傳輸線,用以傳輸訊號。 如申明專利範圍第1項所述之天線結構,其中該輕射本體係 為矩形。 7. 如申請專利範圍第丨項所述之天線結構,財該输本體係 為幾何圖形。 8. 如申請專利範圍第1項所述之天線結構,其中該延伸臂係具 有至少一次以上之彎折。 9. 如申請專利範圍第8項所述之天線結構,其中該延伸臂末端 係呈螺旋倒鉤狀。 8
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11196003A JP2001021308A (ja) | 1999-07-09 | 1999-07-09 | 静電容量式歪センサ |
JP24851699A JP2001074569A (ja) | 1999-09-02 | 1999-09-02 | 平板型静電容量式捩り歪みセンサ |
JP24887699A JP4242977B2 (ja) | 1999-09-02 | 1999-09-02 | 円柱型静電容量式捩り歪みセンサ |
JP26021899A JP4394212B2 (ja) | 1999-09-14 | 1999-09-14 | 加速度センサ |
JP26182399A JP2001082909A (ja) | 1999-09-16 | 1999-09-16 | 静電容量式歪センサ |
Publications (1)
Publication Number | Publication Date |
---|---|
TW432198B true TW432198B (en) | 2001-05-01 |
Family
ID=27529135
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW089113557A TW432198B (en) | 1999-07-09 | 2000-07-07 | The static capacitor type strain detector with the used same |
Country Status (6)
Country | Link |
---|---|
US (1) | US6532824B1 (zh) |
EP (1) | EP1113252A4 (zh) |
KR (1) | KR100421304B1 (zh) |
CN (1) | CN1157594C (zh) |
TW (1) | TW432198B (zh) |
WO (1) | WO2001004593A1 (zh) |
Families Citing this family (100)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19961299B4 (de) * | 1999-12-18 | 2009-04-30 | Robert Bosch Gmbh | Sensor zur Erkennung des Klopfens bei einer Brennkraftmaschine |
AU2001223396A1 (en) * | 2000-02-01 | 2001-08-14 | Disetronic Licensing Ag | Container and device for administering a substance |
AU2001223397A1 (en) * | 2000-02-01 | 2001-08-14 | Disetronic Licensing Ag | Configurable device and method for releasing a substance |
US6518083B2 (en) * | 2001-01-31 | 2003-02-11 | Nippon Telegraph And Telephone Corporation | Surface shape recognition sensor and method of manufacturing the same |
DE10139158C1 (de) * | 2001-08-09 | 2003-04-17 | Siemens Dematic Ag | Bauelemente-Erfassungsvorrichtung, Bauelemente-Zuführvorrichtung und Verfahren zum Zuführen von Bauelementen mittels einer Bauelemente-Zuführvorrichtung |
ATE485763T1 (de) * | 2002-12-14 | 2010-11-15 | Univ Tsinghua Res Inst | Vorrichtung und verfahren zur überwachung der zusammensetzung des körpers durch bestimmung der dielektrizitätskonstante und der impedanz des körpers basiert auf digitaler frequenzabtastung |
EP1654522A4 (en) * | 2003-08-12 | 2007-05-09 | Heung Joon Park | LOAD-MEASURING CONVERTER WITH ELASTIC STRUCTURE AND MEASURING DEVICE WITH INDUCED VOLTAGE AND LOAD MEASUREMENT SYSTEM THEREWITH |
GB0323781D0 (en) * | 2003-10-10 | 2003-11-12 | Bodycage Ltd | Safety helmet |
DE10360309B4 (de) * | 2003-12-18 | 2015-01-22 | Horst Ahlers | Resistiver Dehnungssensor |
US7644628B2 (en) * | 2005-12-16 | 2010-01-12 | Loadstar Sensors, Inc. | Resistive force sensing device and method with an advanced communication interface |
WO2006010037A2 (en) | 2004-07-08 | 2006-01-26 | Deborah Schenberger | Strain monitoring system and apparatus |
US20060030062A1 (en) * | 2004-08-05 | 2006-02-09 | Jun He | Micromachined wafer strain gauge |
US7204162B2 (en) * | 2004-11-23 | 2007-04-17 | Delphi Technologies, Inc. | Capacitive strain gauge |
DE102005002057B4 (de) * | 2005-01-14 | 2007-05-31 | Nicol, Klaus, Prof. Dr. | Sensor zur Messung der Verteilung einer Flächenpressung |
US7509870B2 (en) * | 2005-10-26 | 2009-03-31 | Orthodata Technologies Llc | MEMS capacitive bending and axial strain sensor |
US7728492B2 (en) | 2005-12-19 | 2010-06-01 | Physical Logic Ag | Piezoelectric composite material |
US8104358B1 (en) * | 2006-01-23 | 2012-01-31 | University Of Puerto Rico | High sensitivity passive wireless strain sensor |
JP2008089412A (ja) * | 2006-10-02 | 2008-04-17 | Matsushita Electric Works Ltd | 圧力センサ |
DE112008000578B4 (de) * | 2007-03-23 | 2014-05-22 | Murata Mfg. Co., Ltd. | Antenne und Funkkommunikationsvorrichtung |
DE102007044225A1 (de) * | 2007-09-17 | 2009-03-19 | Liebherr-Werk Nenzing Gmbh, Nenzing | Vorrichtung zum Messen mechanischer Größen, Verfahren zum Messen mechanischer Größen sowie Verwendung einer Vorrichtung zum Messen mechanischer Größen |
EP2065681A1 (en) * | 2007-11-30 | 2009-06-03 | Paramata Limited | Sensing system and method |
US20090158856A1 (en) * | 2007-12-23 | 2009-06-25 | Divyasimha Harish | Capacitive strain gauge system and method |
US20090229369A1 (en) * | 2008-03-17 | 2009-09-17 | Siew-Seong Tan | Capacitor Compensation Structure and Method for a Micro-Electro-Mechanical System |
US7784366B2 (en) * | 2008-07-29 | 2010-08-31 | Motorola, Inc. | Single sided capacitive force sensor for electronic devices |
US7545119B1 (en) | 2008-07-31 | 2009-06-09 | International Business Machines Corporation | Sensor incorporated into energy storage device package |
US8342031B2 (en) * | 2008-10-27 | 2013-01-01 | The Regents Of The University Of California | Capacitive strain sensor |
US8225677B2 (en) * | 2008-11-06 | 2012-07-24 | Northeastern University | Capacitive sensor, system, and method for measuring parameters of a two-phase flow |
US8564310B2 (en) * | 2009-08-18 | 2013-10-22 | 3M Innovative Properties Company | Capacitive oil quality monitoring sensor with fluorinated barrier coating |
KR101085489B1 (ko) | 2009-10-16 | 2011-11-21 | 박흥준 | 온도에 의한 오차를 보정하기 위한 유도 전압을 이용한 하중 측정 트랜스듀서 및 그 트랜스듀서를 이용한 하중 측정 시스템 |
CN102062652A (zh) * | 2009-11-12 | 2011-05-18 | 无锡千里信步精密机电科技有限公司 | 应用混入微小构造体的柔软感应材料的压力传感器装置及压力信号感应方法 |
US8633916B2 (en) | 2009-12-10 | 2014-01-21 | Apple, Inc. | Touch pad with force sensors and actuator feedback |
JP5800897B2 (ja) * | 2010-06-15 | 2015-10-28 | スリーエム イノベイティブ プロパティズ カンパニー | 可変静電容量センサ及びその作製方法 |
DE102011078557A1 (de) * | 2011-07-01 | 2013-01-03 | Endress + Hauser Gmbh + Co. Kg | Verfahren zum Betreiben eines Absolut- oder Relativdrucksensors mit einem kapazitiven Wandler |
DE102012005262B4 (de) | 2012-03-15 | 2014-11-06 | Forschungszentrum Jülich GmbH | Sensoranordnung aus Trägersubstrat und ferroelektrischer Schicht |
KR101480752B1 (ko) * | 2012-03-30 | 2015-01-09 | 한국과학기술원 | 표면 형상 측정 장치 |
RU2507474C1 (ru) * | 2012-08-07 | 2014-02-20 | Открытое акционерное общество "Авангард" | Индукционный датчик положения |
US9250143B2 (en) * | 2012-09-19 | 2016-02-02 | College Park Industries, Inc. | Multicapacitor force/moment sensor arrays |
CN102980508A (zh) * | 2012-11-21 | 2013-03-20 | 昆山北极光电子科技有限公司 | 一种自动平衡的机械形变测量方法 |
CN102997834B (zh) * | 2012-12-12 | 2016-05-25 | 山东建筑大学 | 一种共面电容传感器的非导电介质薄膜厚度在线检测装置 |
CN104034251B (zh) * | 2013-03-06 | 2016-12-28 | 中国科学院合肥物质科学研究院 | 一种微米尺度材料应变检测装置及其检测方法 |
DE102013114734A1 (de) * | 2013-12-20 | 2015-07-09 | Endress + Hauser Gmbh + Co. Kg | Kapazitive Druckmesszelle mit mindestens einem Temperatursensor und Druckmessverfahren |
JP6364886B2 (ja) * | 2014-03-31 | 2018-08-01 | 大日本印刷株式会社 | 包装袋の変形の検出方法 |
CA2901026C (en) | 2014-08-19 | 2020-11-24 | Western Michigan University Research Foundation | Helmet impact monitoring system |
KR101665187B1 (ko) * | 2014-09-22 | 2016-10-13 | 한국과학기술원 | 환경 정보 센서 회로 및 환경 정보 측정 장치 |
EP3010315A1 (en) | 2014-10-16 | 2016-04-20 | Nokia Technologies OY | A deformable apparatus and method |
EP3009822B1 (en) * | 2014-10-16 | 2017-06-21 | Nokia Technologies OY | A deformable apparatus and method |
EP3211364B1 (en) * | 2014-10-22 | 2020-02-19 | Bando Chemical Industries, Ltd. | Capacitance sensor |
CN105720964A (zh) * | 2014-12-02 | 2016-06-29 | 天津富纳源创科技有限公司 | 压力侦测按钮、控制器以及压力侦测按钮的操作方法 |
KR101739791B1 (ko) * | 2015-05-11 | 2017-05-26 | 주식회사 하이딥 | 압력 센싱 장치, 압력 검출기 및 이들을 포함하는 장치 |
CN105021120B (zh) * | 2015-07-06 | 2019-07-19 | 电子科技大学 | 一种电容应变传感器及其制备方法 |
CN105066870B (zh) * | 2015-08-13 | 2017-09-22 | 浙江工业大学 | 可测量表面应变轴向偏导的轴向偏差全桥双叉指型金属应变片 |
CN105180793B (zh) * | 2015-08-13 | 2017-07-25 | 浙江工业大学 | 可测量表面应变横向偏导的横向偏差全桥全叉指型金属应变片 |
US10067007B2 (en) * | 2015-09-02 | 2018-09-04 | Oculus Vr, Llc | Resistive-capacitive deformation sensor |
US9666661B2 (en) * | 2015-09-08 | 2017-05-30 | Taiwan Semiconductor Manufacturing Company, Ltd. | Coplanar metal-insulator-metal capacitive structure |
WO2017075201A1 (en) * | 2015-10-30 | 2017-05-04 | Northwestern University | Dielectrostrictive sensors for shear stress measurement, process monitoring, and quality examination of viscoelastic materials |
CN105241585B (zh) * | 2015-11-12 | 2017-08-18 | 桂林电子科技大学 | 一种基于银导电胶的电容式传感器装置及其制作方法 |
CN105423900B (zh) * | 2015-12-04 | 2017-12-05 | 浙江工业大学 | 可测量单侧片外横向偏导的横向分布六敏感栅全桥三叉指金属应变片 |
CN105423906B (zh) * | 2015-12-04 | 2017-12-05 | 浙江工业大学 | 可测量单侧片外横向偏导的横向分布五敏感栅边叉指金属应变片 |
CN105547133B (zh) * | 2015-12-04 | 2017-12-05 | 浙江工业大学 | 可测量单侧片外轴向偏导的轴向分布五敏感栅边叉指金属应变片 |
CN105547531B (zh) * | 2016-01-19 | 2018-07-06 | 东南大学 | 一种高灵敏电容式压力传感器及其制作方法 |
US10842667B2 (en) * | 2016-02-17 | 2020-11-24 | Tramec Termico Technologies, L.L.C. | Self-regulating heater |
CN105823411B (zh) * | 2016-03-18 | 2019-02-22 | 苏州椒图电子有限公司 | 一种曲面轮廓测量方法 |
CN106092430B (zh) * | 2016-06-16 | 2018-11-16 | 清华大学深圳研究生院 | 一种梳齿电容式压力传感器 |
CN106247920B (zh) * | 2016-07-07 | 2019-02-12 | 中国计量大学 | 一种基于弹性基底夹心叉指电容的表面应变检测器件 |
US10637108B1 (en) | 2016-12-09 | 2020-04-28 | Cornell Dubilier Marketing, Inc. | Apparatus for detecting expansion of an energy storage device case |
US10612991B1 (en) * | 2017-08-25 | 2020-04-07 | Fluke Corporation | High dynamic range capacitive pressure sensor |
JP6988469B2 (ja) | 2017-12-27 | 2022-01-05 | 株式会社デンソー | 歪み検出装置およびそれを用いた診断装置 |
CN108414126A (zh) * | 2018-01-22 | 2018-08-17 | 江苏军物联网股份有限公司 | 一种焊接工位压力监测系统和监测方法 |
TWI659217B (zh) * | 2018-03-27 | 2019-05-11 | 國立交通大學 | 無線被動應變感測器 |
CN109238519B (zh) * | 2018-10-22 | 2024-03-15 | 河北工业大学 | 一种混合式柔性触觉传感器 |
US11189536B2 (en) * | 2018-12-31 | 2021-11-30 | Micron Technology, Inc. | Method and apparatus for on-chip stress detection |
CN109786430B (zh) * | 2019-02-22 | 2021-01-26 | 京东方科技集团股份有限公司 | 一种柔性显示面板及显示装置 |
JP7272836B2 (ja) * | 2019-03-19 | 2023-05-12 | 住友重機械工業株式会社 | センサ、センサ固定構造 |
CN109883316B (zh) * | 2019-03-22 | 2021-01-29 | 中国科学院力学研究所 | 一种电阻式应变传感器及应变测量方法 |
US11021950B2 (en) * | 2019-06-06 | 2021-06-01 | Probe Technology Services, Inc. | Production-logging sensor |
US11399587B2 (en) | 2019-06-12 | 2022-08-02 | The Board Of Trustees Of Western Michigan University | Pressure monitoring system for helmets |
US11762517B2 (en) * | 2019-06-19 | 2023-09-19 | Nissha Co., Ltd. | Touch panel |
US11494147B2 (en) | 2019-06-26 | 2022-11-08 | Microsoft Technology Licensing, Llc | Sensing bending of multiple joints |
CN110487168B (zh) * | 2019-08-29 | 2024-03-01 | 清华大学深圳研究生院 | 单向弯曲敏感传感器及其制备方法 |
CN111189563B (zh) * | 2020-01-07 | 2021-08-10 | 西安电子科技大学 | 一种压力检测装置及系统 |
US11662820B2 (en) | 2020-01-08 | 2023-05-30 | Dell Products, Lp | System for a solid-state keyboard and touchpad providing haptic feedback |
US11579695B2 (en) | 2020-01-31 | 2023-02-14 | Dell Products, Lp | System and method for generating sound effects on fingertips with piezoelectric actuators of a haptic keyboard |
US10936073B1 (en) | 2020-01-31 | 2021-03-02 | Dell Products, Lp | System and method for generating high-frequency and mid-frequency audible sound via piezoelectric actuators of a haptic keyboard |
US11106772B2 (en) | 2020-01-31 | 2021-08-31 | Dell Products, Lp | System and method for continuous user identification via piezo haptic keyboard and touchpad dynamics |
US11079849B1 (en) | 2020-01-31 | 2021-08-03 | Dell Products, Lp | System for extended key actions and haptic feedback and optimized key layout for a solid-state keyboard and touchpad |
US10860112B1 (en) | 2020-01-31 | 2020-12-08 | Dell Products, Lp | System for a solid-state keyboard and touchpad with a single sheet cover for providing haptic feedback |
US11067269B1 (en) | 2020-01-31 | 2021-07-20 | Dell Products, Lp | System and method for backlight integration with electrical contact foil in piezoelectric haptic keyboard |
US11106286B2 (en) | 2020-01-31 | 2021-08-31 | Dell Products, Lp | System and method for mood detection via piezo haptic keyboard dynamics |
US11294469B2 (en) | 2020-01-31 | 2022-04-05 | Dell Products, Lp | System and method for processing user input via a reconfigurable haptic interface assembly for displaying a modified keyboard configuration |
US11079816B1 (en) | 2020-01-31 | 2021-08-03 | Dell Products, Lp | System and method for vapor chamber directional heat dissipation for a piezoelectric keyboard assembly |
US11301053B2 (en) | 2020-01-31 | 2022-04-12 | Dell Products, Lp | System for providing haptic feedback across full palm rest in fixed position of information handling system |
US11175745B2 (en) | 2020-01-31 | 2021-11-16 | Dell Products, Lp | System and method for application of piezo electric haptic keyboard personal typing profile |
US11093048B1 (en) | 2020-01-31 | 2021-08-17 | Dell Products, Lp | System for modified key actions and haptic feedback for smart typing assist with a solid-state keyboard and touchpad |
CN111208317B (zh) | 2020-02-26 | 2021-07-02 | 深迪半导体(绍兴)有限公司 | Mems惯性传感器及应用方法和电子设备 |
WO2021188708A1 (en) | 2020-03-17 | 2021-09-23 | Arris Enterprises Llc | Ceramic based strain detector |
CN111664968A (zh) * | 2020-07-15 | 2020-09-15 | 襄阳臻芯传感科技有限公司 | 一种陶瓷电容式压力传感器的制作方法 |
CN113340476B (zh) * | 2021-05-08 | 2023-10-27 | 昆山朗德森机电科技有限公司 | 一种二维解耦力矩触觉传感器及mems制备方法 |
CN114111697B (zh) * | 2021-11-26 | 2023-07-25 | 中国电建集团成都勘测设计研究院有限公司 | 一种倾倒变形体监测预警装置及监测预警方法 |
FR3130786B1 (fr) * | 2021-12-17 | 2023-12-15 | Nanomade Labs | Micro-capteur à électrodes interdigitées |
CN114353916A (zh) * | 2022-01-10 | 2022-04-15 | 江苏大学 | 一种基于柔性电容式传感器的质量测量装置 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5434519B2 (zh) * | 1973-08-31 | 1979-10-27 | ||
US4188651A (en) * | 1978-03-27 | 1980-02-12 | Sprague Electric Company | Ceramic capacitor with surface electrodes |
JPS5837799A (ja) | 1981-08-05 | 1983-03-05 | ワイケイケイ株式会社 | 荷重感知マツト |
US4422127A (en) * | 1981-12-15 | 1983-12-20 | Electronic Concepts, Inc. | Substantially small sized wound capacitor and manufacturing method therefor |
JPS5954904A (ja) | 1982-09-24 | 1984-03-29 | Hitachi Ltd | 容量型ひずみゲ−ジ |
US4479392A (en) | 1983-01-03 | 1984-10-30 | Illinois Tool Works Inc. | Force transducer |
DE3634855C1 (de) * | 1986-10-13 | 1988-03-31 | Peter Seitz | Kapazitive Messanordnung zur Bestimmung von Kraeften und/oder Druecken |
DE58900556D1 (de) * | 1988-08-11 | 1992-01-23 | Siemens Ag | Messaufnehmer fuer laengen- oder abstandsaenderungen, insbesondere fuer beruehrungslose messung von drehmomenten an rotierenden wellen. |
US5233213A (en) | 1990-07-14 | 1993-08-03 | Robert Bosch Gmbh | Silicon-mass angular acceleration sensor |
CH685214A5 (fr) * | 1991-10-15 | 1995-04-28 | Hans Ulrich Meyer | Capteur capacitif de position. |
US5608246A (en) * | 1994-02-10 | 1997-03-04 | Ramtron International Corporation | Integration of high value capacitor with ferroelectric memory |
WO1996005492A1 (de) * | 1994-08-16 | 1996-02-22 | Siemens Aktiengesellschaft | Kraft- oder dehnungssensor |
US5827980A (en) | 1994-08-16 | 1998-10-27 | Siemens Aktiengesellschaft | Force or extension sensor |
FR2732467B1 (fr) * | 1995-02-10 | 1999-09-17 | Bosch Gmbh Robert | Capteur d'acceleration et procede de fabrication d'un tel capteur |
US5610528A (en) | 1995-06-28 | 1997-03-11 | International Business Machines Corporation | Capacitive bend sensor |
JP3525400B2 (ja) | 1995-10-17 | 2004-05-10 | Necトーキン株式会社 | 力検出装置 |
US5804065A (en) * | 1995-11-17 | 1998-09-08 | The United States Of America As Represented By The Secretary Of Agriculture | Control apparatus for marine animals |
US6222376B1 (en) * | 1999-01-16 | 2001-04-24 | Honeywell International Inc. | Capacitive moisture detector and method of making the same |
-
2000
- 2000-07-07 CN CNB008018863A patent/CN1157594C/zh not_active Expired - Fee Related
- 2000-07-07 WO PCT/JP2000/004538 patent/WO2001004593A1/ja active IP Right Grant
- 2000-07-07 TW TW089113557A patent/TW432198B/zh not_active IP Right Cessation
- 2000-07-07 EP EP00944327A patent/EP1113252A4/en not_active Withdrawn
- 2000-07-07 KR KR10-2001-7002948A patent/KR100421304B1/ko not_active IP Right Cessation
- 2000-07-07 US US09/786,944 patent/US6532824B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US6532824B1 (en) | 2003-03-18 |
WO2001004593A8 (en) | 2001-04-12 |
CN1321243A (zh) | 2001-11-07 |
EP1113252A1 (en) | 2001-07-04 |
WO2001004593A1 (fr) | 2001-01-18 |
CN1157594C (zh) | 2004-07-14 |
KR100421304B1 (ko) | 2004-03-09 |
KR20010074988A (ko) | 2001-08-09 |
EP1113252A4 (en) | 2001-09-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW432198B (en) | The static capacitor type strain detector with the used same | |
EP3608751B1 (en) | Foldable electronic device including antenna integrated with the frame of the housing | |
CN105340129B (zh) | 具有新型天线结构的移动终端 | |
US10431912B2 (en) | CPU socket contact for improving bandwidth throughput | |
TWI657619B (zh) | 平面天線模組及電子裝置 | |
US7671811B2 (en) | Antenna device with ground plane coupled to conductive portion of an electronic device | |
US10211533B2 (en) | Dual band printed antenna | |
CN105762512A (zh) | 一种天线 | |
CN108879070B (zh) | 一种电子设备 | |
CN108832292B (zh) | 一种天线及电子设备 | |
US8059042B2 (en) | Shorted monopole antenna | |
EP3718168B1 (en) | Antenna, antenna arrangement, and electronic device | |
KR20210073999A (ko) | 인쇄회로기판 및 이를 포함하는 전자 장치 | |
US9466878B2 (en) | Multi-band antenna | |
WO2021169500A1 (zh) | 终端 | |
JP6602513B2 (ja) | アンテナ装置 | |
TW202118143A (zh) | 單天線系統 | |
Wong et al. | WWAN/LTE handset antenna with shaped circuit board, battery, and metal midplate | |
TWI291783B (en) | Antenna device having coupled feeding unit | |
TWI807673B (zh) | 電子裝置與天線結構 | |
US11158932B2 (en) | Full screen electronic device and antenna thereof | |
CN104681993A (zh) | 天线装置 | |
CN221102419U (zh) | 无线适配器 | |
CN107394379A (zh) | 一种移动终端及移动终端天线 | |
CN218215653U (zh) | 终端设备 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent | ||
MK4A | Expiration of patent term of an invention patent |