TW430989B - Bit isolation area formation of planar mask ROM - Google Patents

Bit isolation area formation of planar mask ROM

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Publication number
TW430989B
TW430989B TW88113417A TW88113417A TW430989B TW 430989 B TW430989 B TW 430989B TW 88113417 A TW88113417 A TW 88113417A TW 88113417 A TW88113417 A TW 88113417A TW 430989 B TW430989 B TW 430989B
Authority
TW
Taiwan
Prior art keywords
mask rom
mask
isolation area
ion implantation
planar mask
Prior art date
Application number
TW88113417A
Other languages
Chinese (zh)
Inventor
Jr-Cheng You
Lin-Jiun Wu
Original Assignee
Taiwan Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg filed Critical Taiwan Semiconductor Mfg
Priority to TW88113417A priority Critical patent/TW430989B/en
Application granted granted Critical
Publication of TW430989B publication Critical patent/TW430989B/en

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Abstract

A method for forming the bit isolation layer of mask ROM is introduced. First, provide a semiconductor substrate and form an oxide layer on it. Define photoresist mask to cover the oxide layer to form the source/drain area of mask ROM. Proceed the first ion implantation and make buried N-type region in the source/drain area. Finally, proceed the second ion implantation process by using the photoresist mask as mask of ion implantation to dope conductive impurity into the semiconductor substrate and form the isolation area of a planar mask ROM in the part of the substrate under the buried N-type region.
TW88113417A 1999-08-05 1999-08-05 Bit isolation area formation of planar mask ROM TW430989B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW88113417A TW430989B (en) 1999-08-05 1999-08-05 Bit isolation area formation of planar mask ROM

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW88113417A TW430989B (en) 1999-08-05 1999-08-05 Bit isolation area formation of planar mask ROM

Publications (1)

Publication Number Publication Date
TW430989B true TW430989B (en) 2001-04-21

Family

ID=21641805

Family Applications (1)

Application Number Title Priority Date Filing Date
TW88113417A TW430989B (en) 1999-08-05 1999-08-05 Bit isolation area formation of planar mask ROM

Country Status (1)

Country Link
TW (1) TW430989B (en)

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