A7 A7 B7 421827_ 五、發明說明（1 ) 發明所屬之技術領域 本發明係關於基板洗淨裝置，特別是關於適用在作爲 各種電子機器用基板所使用的半導體基板或玻璃基板等之 洗淨之基板洗淨裝置。 先行技術 半導體裝置、液晶顯示面板等之電子機器的領域，係 製造程序中必須要有洗淨處理被處理基板之半導體基板或 玻璃基板的工程。在此場合，要從基板上洗淨除去的對象 有無麈室內的環境中的微塵顆粒、光i劑等有機物等種種 物質，而其分別的除去對象的最適切之洗淨液或是洗淨方 法從以前就被檢討。例如一般採用流水洗淨，而其他洗淨 方法例如有：以超音波洗淨爲首之物理洗淨，藉由紫外線 照射使有機物等所構成的被除去物分解之光洗淨等。 然而作爲流水洗淨上述被處理基板的從前的基板洗淨 裝置，被使用者爲具備：具有對被處理基板的表面供給洗 淨液的洗淨液供給噴嘴的基板洗淨部，及乾燥在該基板洗 淨部被洗淨的被處理基板之乾燥部，及於這些基板洗淨部 與乾燥部依序搬送被處理基板的滾軸。在使用如此構成的 基板洗淨裝置流水洗淨被處理基板時，將該裝置設置於製 造生產線，藉由滾軸將被處理基板搬送至上述基板洗淨部 ，進而藉由滾軸搬送被處理基板同時以從上述洗淨液供給 噴嘴所供給的洗洁液洗淨上述基板的表靣，此後，進而藉 由滾軸將洗淨之後的被處理基板搬送至上述乾燥部，使其 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） L-------------------訂---------線' <請先閱讀背面之注項再填寫本頁) 經濟部智慧財產局員工消費合^:社印製 -4 - A7 B7 421827 五、發明說明（2 ) 乾燥。 此外，在製造生產線上採用物理洗淨裝置、光洗淨裝 置等種種洗淨方法之基板洗淨裝置若要分別設置的話，光 在洗淨工程就會花費龐大的設備費或是裝置的佔有面積， 極不合理。進而，生產線內之基板搬送次數也變多。在此 |提案一種可在1台裝置進行不同種類的洗淨之基板洗淨 裝置。第3 3圖係其槪略構成圖。 第3 3圖所示之基板洗淨裝置2 7 0，係以單一裝置 進行光洗淨與物理洗淨者。具備：可旋轉地支撐被洗淨基 板W的旋轉夾具2 7 1，及具備抵接於基板W的表面以洗 淨基板W的洗淨用刷2 7 2之刷臂2 7 3，及具備對基板 W的表面供給洗淨液的洗淨液供給噴嘴的噴嘴臂2 7 4， 及內藏對基板W的表面照射紫外線的紫外線燈之燈臂 2 7 5，及對基板W的表面供給洗淨液的複數噴霧噴嘴 2 7 6。 發明所欲解決之課題 於上述般的構成之從前的基板洗淨裝置，因爲藉由滾 軸搬送被處理基板同時洗淨的緣故，製造生產線中的基板 洗淨裝置長度長達8〜1 0 m，在無塵室內的裝置佔有空 間變大，此外，洗淨工程之被處理基板的搬送距離也變長 的緣故，僅僅洗淨工程就耗費龐大的設備費，極不合理。 此外，半導體裝置、液晶顯示面板等領域在近年來基 板有越來越大型化的傾向，在大型基板洗淨用的裝置’洗 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） Γ5Τ L--ml —----- I I I I 11— ^ ---------V) (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合，社印製 經濟部智慧財產局員工消費合-#社印製 421827 a7 _B7____ 五、發明說明（3 ) 淨裝置的佔有空間也變大的緣故，上述問題點更爲顯著 進而，於上述從前的洗淨裝置，具有可以1台裝置進 行光洗淨與物理洗淨的優點，但是具有以下的問題點。 亦即，構成爲旋轉先端設有刷的刷臂同時進行物理洗 淨的緣故，刷的到達範圍有其極限，無論被洗淨基板旋轉 多少次，要使基板表面充分均勻抽洗淨是困難的，有產生 洗淨不均之虞。在此，爲了解問題，考慮不在臂的先 端設洗淨手段，而橫跨臂的長邊方向全體設洗淨手段之構 成。 然而，在此場合，從前的洗淨裝置在其洗淨用臂的一 端側被支撐，亦即爲單側支撐構造，由於洗淨用臂的自身 m量，先端側多少會有些向下撓曲的傾向。如此一來，隨 著臂上的位置不同，臂與被處理基板之間的距離也有些微 的差別*例如在由臂噴射洗淨液時，洗淨液的液量與沖抵 基板的強度都不相同，終究成爲洗淨不均的原因。此外， 紫外線洗淨的場合，在構造上必然會有造成紫外線不易照 射到的處所。在該部份有機物的除去很困難。於半導體裝 置、液晶顯示面板等領域，近年來基板有越來越大型化的 傾向，在大型基板洗淨用的裝置，臂的尺寸也變長的緣故 ，產生洗淨不均的上述問題點更爲顯著。 本發明係爲了解決上述課題而發明者，目的在於提供 可以減少裝置的佔用空間，適用於製造生產線的合理的基 板洗淨裝置。 此外，本發明的目的爲提供不會產生洗淨不均等，橫 本紙張尺度適用中國國家標準（CNS>A4規格<210 * 297公釐） -6- l·-----------------— I 訂·-------線 (請先閲讀背面之注意事項再填寫本頁) A7 421827 __B7_____ 五、發明說明（4 ) 跨基板全體可得均勻的洗淨效果，同時可以單一裝置實施 不同洗淨方法的洗淨，適用於製造生產線的合理的洗淨裝 置。 供解決課題之手段 爲達成上述目的，本發明的第1形態之基板洗淨裝置 ，其特徵爲具有：在各個先端將被洗淨基板由下方側支擦 的複數支撐體、及具有沿著上述被洗淨基板的底面移動同 時對上述被洗淨基板的底面供給洗淨液的洗淨用噴嘴，以 不與該洗淨用噴嘴的移動方向前方之移動上述支撐體的洗 淨用噴嘴相互干涉的方式連動於該洗淨用噴嘴的移動以使 升降移動的支撐體的升降移動驅動裝置。 亦即，於本發明的基板洗淨裝置，複數支撐體的各個 先端可以從被處理基板的下方側來支撐，而且對於上述被 處理基板的底面供給洗淨液的洗淨用噴嘴（底面洗淨用噴 嘴）可以沿著上述被處理基板的底面移動，進而支撐體的 升降移動驅動裝置，係以上述洗淨用噴嘴不與移動方向前 方的上述支撐體移動的洗淨噴嘴干涉的方式連動於該洗淨 用噴嘴的移動而可以升降移動的構成。因此，在上述複數 支撐體之各個先端將被處理基板從其下方側支撐，使上述 洗淨用噴嘴沿著上述被處理基板的底面移動的話，因爲該 洗淨用噴嘴的移動方向前方的上述支撐體會下降的緣故， 所以不會與移動的洗淨用噴嘴相干涉，此外，下降後的支 撐體在洗淨用噴嘴通過後上升，可以其先端再度支撐上述 本紙張尺度適用中國國家標準（CNS)A4規格<210 X 297公釐） Κ-------------------訂---------線·Ί (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合^:社印製 421827 Α7 Β7 五、發明說明（5 ) 被處理基板。 <請先閱讀背面之注意事項再填寫本頁) 在本發明的基板洗淨裝置，與藉由滾軸搬送同時洗淨 被處理基板的從前的基板洗淨裝置不同，藉由使上述洗淨 用噴嘴沿著上述被處理基板的底面移動，可以使被處理基 板幾乎不被移動，而洗淨被處理基板的底面。亦即，根據 本發明的基板洗淨裝置的話，可以縮短製造生產線中的基 板洗淨裝置的長度減少裝置的佔有空間，洗淨工程之被處 理基板的搬送距離也可以大幅縮短，此外，洗淨用噴嘴的 移動範圍只要相當於上述被處理基板面的大小程度即可， 不必在洗淨工程耗費龐大的設備費用或佔有空間，可以使 裝置合理化。 此外，上述洗淨用噴嘴的構成以採用以下構造者爲佳 α 第1點，以將前述洗淨用噴嘴，構成爲具備在一側導 入洗淨液的導入通路與在另一側排出洗淨後的洗淨液之排 出通路，同時在這些導入通路與排出通路之間，具備對前 述被處理基板導引從前述導入通路所導入的洗淨液以及洗 淨處理前述被處理基板的導引搆件者較佳。 經濟部智慧財產局員工消費合卞社印製 如此構成的洗淨用噴嘴，以使用已經使用在本發明申 請人已完成申請的洗淨裝置之噴嘴（省流體型噴嘴）較佳 。在使用從前一般的洗淨用噴嘴的洗淨，採用的過程是在 對基板表面供給洗淨液之後，洗淨液使被除去物從基板表 面剝離，而含有被除去物的洗淨液在基板上流動。此時， 因爲被除去物會再附著於基板表面的緣故，從前噴嘴的被 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 421827 A7 B7 經濟部智慧財產局員工消費合作社印製 五、發明說明（6 ) 除去物之除去率有其極限。在此，本申請人所提出的洗淨 裝置的噴嘴的場合，被構成爲由導入通路對基板表面供給 洗淨液時，被供給該洗淨液的部份以外的基板表面不會接 觸到洗淨液，而含有被除去物的洗淨液由排出通路排出至 外部。藉由此構成，比起使用從前一般的洗淨用噴嘴的洗 淨裝置，可以使洗淨後的基板的淸淨度顯著提高。 此外，在從前一般的洗淨裝置，爲了提高淸淨度必須 要使用大量的洗淨液，但是在本申請人所提出的洗淨裝置 ，藉由上述作用可得充分的淸淨度，同時可以藉由對設在 導引構件的噴嘴開口部的洗淨液壓力控制來自排出口的吸 引力而使洗淨液不遺漏地排出至外部。結果，可以大幅削 減洗淨液的使用量，因此可以達成「省流體型噴嘴」。 第2點，前述洗淨用噴嘴，以採用具有對前述洗淨基 板賦予超音波振動之超音波賦予手段之構成較佳。 藉由此構成，被洗淨基板以從洗淨用噴嘴所供給的洗 淨液洗淨時，因爲對該洗淨液與被處理基板賦予超音波’ 所以與未被賦予超音波的場合相比，附著於被處理基板的 被除去物的除去效率很好，可以提高洗淨後的基板的洗淨 度。 第3點，上述洗淨用噴嘴，以設有複數較佳。 藉由此構成，因爲複數個洗淨用噴嘴之各個藉由複數 種不同的洗淨方法洗淨處理被洗淨基板的緣故，以1台本 裝置可以進行種種洗淨，即使有粒子、有機物等種種除去 對象，也可以將其確實洗淨除去。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -9 - l·------- ί i!i — 訂----- (請先閱讀背面之注意事項再填寫本頁) 線 A7 421827 B7 五、發明說明（7 ) 第4點，在上述洗淨用噴嘴|以分別設複數上述導入 通路與上述排出通路者較佳。 藉此構成，可以一個洗淨用噴嘴藉由複數種不同的洗 淨方法洗淨處理被處理基板，可以減少設於洗淨部的洗淨 用噴嘴的數目，結果，可以減少洗淨用噴嘴的收容空間， 可以減少裝置的佔有空間。 進而，上述驅動裝置的構成亦可以採用下述構成。 第1點，上述驅動裝置，也可以構成爲具有：根據前 述洗淨用噴嘴的移動速度以及指定的移動時間的乘算値輸 出使該洗淨用噴嘴的移動方向前方之前述支撐體下降的驅 動訊號，接著輸出在前述洗淨用噴嘴通過前述下降後的支 撐體的上方之後使該支撐體上升的驅動訊號的控制手段， 以及在從前述控制手段輸入前述下降驅動訊號時使前述支 撐體下降，接著藉由輸入的前述上升驅動訊號使在前述洗 淨用噴嘴通過前述下降後的支撐體的上方之後使該支撐體 上升的支撐體驅動手段。 第2點，上述驅動裝置，也可以構成爲具有：在前述 洗淨用噴嘴於移動中到達指定的位置時，輸出使該洗淨用 噴嘴的移動方向前方之前述支撐體下降的驅動訊號，接著 輸出在前述洗淨用噴嘴通過前述下降後的支撐體的上方之 後使該支撐體上升的驅動訊.號的驅動訊號產生手段，以及 在來自該驅動訊號產生手段的下降驅動訊號被輸入時使前 述支撐體下降，接著藉由輸入的前述上升驅動訊號使在前 述洗淨用噴嘴通過前述下降後的支撐體的上方之後使該支 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1--! — ! -------—訂 --------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 -10- A7 421827 ___Β7___ 五、發明說明（8 ) 撐體上升的支撐體驅動手段。 第3點、上述驅動裝置，也可以構成爲具有：將前述 各支撐體向上方彈壓的支撐體保持構件，及設於前述支撐 體的受壓體，及被設於前述洗淨用噴嘴而朝向該洗淨用噴 嘴的移動方向前方延伸，隨著該洗淨用噴嘴的移動而抵接 於於該移動方向前方的支撐體的前述受壓體同時抵抗前述 支撐體保持構件的彈壓力同時壓下前述前方的支撐體之壓 體。 此外，作爲構成基板洗淨裝置的其他構成要素，也可 以設有以下手段。 第1點，也可以至少具備一個沿著前述被洗淨基板的 上面移動同時對前述被洗淨基板的前述上面供給洗淨液的 洗淨用噴嘴（上面洗淨用噴嘴）。 除了底面洗淨用噴嘴以外如上述般設有上面洗淨用噴 嘴的場合，因爲可以一次洗淨被處理基板的雙面，所以與 僅設有洗淨被洗淨基板的底面的洗淨用噴嘴的場合相比， 可以提高被處理基板的洗淨效率，縮短洗淨工程所需要的 時間。 第2點，也可以設有製造在純水中溶解氫氣氣體或者 臭氧氣體的洗淨液之洗淨液製造手段，及對前述洗淨用噴 嘴供給前述洗淨液的洗淨液供給手段。 設有如此手段的場合，可以使用在純水中溶入氣氣的 所謂含氫水或是在純水中溶入臭氧的所謂臭氧水的洗淨液 進行有效率的洗淨。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -11 - L — — — — — — — — — — — ·1111111 ^ * — — — — — — — — \*,, (請先閱讀背面之注意事項再填寫本頁) 經 濟 部 智 慧 財 產 局 員 工 消 費 合 —作 社 印 製 A7 42 1827 B7_ 五、發明說明（9 ) 第3點，也可以設有回收洗淨前述被洗淨基板之後的 已使用洗淨液之洗淨液回收手段，及再生透過該洗淨液回 收手段回收的洗淨液之洗淨液再生手段，及對前述洗淨用 噴嘴供給以該洗淨液再生手段所再生的洗淨液之再生洗淨 液供給手段。 在此場合，因爲可以回收使用後的洗淨液，再生以再 利用，所以可以削減洗淨液的使用量。作爲洗淨液的再生 手段，例如可以舉出過濾洗淨液中所包含的微粒子或異物 的過濾器、除去洗淨液中的氣體之用的脫氣裝置等。 此外，本發明之基板洗淨裝置，其特徵爲具有：保持 被洗淨基板的基板保持手段，及洗淨用噴嘴，其係以兩端 被支撐的狀態對前述被洗淨基.板係對向而且並列配置的複 數洗淨用噴嘴1該複數噴嘴的各個噴嘴具有使前述被洗淨 基板以複數種不同的洗淨方法進行任一洗淨處理之機能， 及噴嘴移動手段，其係使該洗淨用噴嘴的各個噴嘴與前述 被洗淨基板保持一定的間隔同時使其依序移動於前述並列 方向而藉此洗淨處理前述被洗淨基板的被洗淨面全區域。 亦即，於本發明的基板洗淨裝置，各洗淨用噴嘴採用 其兩端被支撐的所謂雙支撐構造，而且噴嘴移動手段將各 洗淨用噴嘴保持與被洗淨基板的間隔爲一定的狀態使移動 於噴嘴的並列方向而藉此洗淨處理基板的被洗淨面全區域 之構成。因此，與從前單支撐的從前的裝置不同，無論洗 淨用噴嘴的場所，噴嘴與被處理基板的距離都相等，可以 橫跨被處理基板全面進行均勻的洗淨。而藉由各個複數噴 本紙張尺度適用中國國家標準（CNS>A4規格（210 X 297公釐） L -------餐 i — <請先閱讀背面之注意事項再填寫本頁) 訂---------線· 經濟部智慧財產局員工消費合七社印製 A7 B7 421827 五、發明說明（1C)) 嘴將被洗淨基板以不同的洗淨方法洗淨處理的緣故，可藉 由1台本裝置進行種種的洗淨，即使有微粒子、有機物等 種種除去對象，也可以確實將其洗淨除去。此外，在洗淨 工程也不會耗費龐大的設備費或佔有空間，可以達成合理 的裝置。 進而，本發明的基板洗淨裝置，其特徵爲具有：洗淨 用噴嘴，其係從中心點呈放射狀延伸的複數洗淨用噴嘴， 該複數噴嘴之各個具有使前述被洗淨基板以複數種不同的 洗淨方法進行任一洗淨處理之機能，及基板保持旋轉手段 ，其係被配置於前述放射狀配置的洗淨用噴嘴的下方保持 而使被洗淨基板旋轉，及噴嘴移動手段，其係使前述放射 狀的洗淨用噴嘴一體保持與前述被洗淨基板之間隔爲一定 同時使其二次元移動，與前述基板保持旋轉手段協調動作 洗淨處理前述被洗淨基板的被洗淨面全區域。 於上述基板洗淨裝置，藉由採用複數的洗淨用噴嘴在 中心點側被連結，在周緣部側被支撐的放射狀的洗淨用噴 嘴，洗淨用噴嘴成爲雙支撐構造的形狀，噴嘴與被處理基 板的距離維持均等，可以橫跨被處理基板的全面進行均勻 的洗淨。在此形態的場合，與各洗淨用噴嘴獨立移動的第 1形態的裝置不同，因爲複數的噴嘴相互連結，所以被連 結的洗淨用噴嘴全體不會有從基板一端橫跨製另一端的大 幅移動，而構成爲藉由基板保持旋轉手段使基板側旋轉而 洗淨被洗淨面全區域的構成。即使如此，在複數噴嘴被連 結的中心點附近處基板的洗淨變得困難，即使各洗淨用噴 L!-------t <請先閱讀背面之注意事項再填寫本頁) 訂---------_ 經濟部智慧財產局員工消費合作社印製 - 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -13- 經濟部智慧財產局員工消費合4社印製 42 1827 a? _B7____ 五、發明說明（11 ) 嘴具有不同的洗淨機能，在中心點附近處基板的洗淨也變 得困難，使得各洗淨用噴嘴具有不同洗淨機能也在基板的 中央附近處無法有效的發揮洗淨機能。在此，採用藉由噴 嘴移動手段使放射狀的洗淨用噴嘴在保持與被洗淨基板間 維持一定間隔的情況下同時進行二次元的移動，藉由基板 保持旋轉手段配合基板的旋轉洗淨處理被洗淨基板的被洗 淨面全區域的構成。藉此，即使基板的中央部份也可以藉 由複數種的洗淨方法來進行洗淨。 此外，前述洗淨用噴嘴的構成以採用以下方式較佳。 第1點，前述洗淨用噴嘴，以具有至少對前述被洗淨 基板照射紫外線的紫外線洗淨用噴嘴，及對前述被洗淨基 板施加超音波振動的超音波洗淨用噴嘴者較佳。 藉由此構成，藉由此構成，例如在通常的純水洗淨之 後，可以連續進行藉由超音波洗淨用噴嘴進行超音波洗淨 、藉由紫外線洗淨用噴嘴進行紫外線洗淨=在此場合，藉 由純水洗淨將附著於基板上的一般粒徑的微粒子除去之後 ，藉由超音波洗淨除去微細粒徑的微粒子，進而，藉由紫 外線洗淨進行有機物的除去，可以充分除去種種被除去物 〇 第2點，前述洗淨用噴嘴，以係形成在一端具有導入 洗淨液之用的導入口的導入通路與在一端具有將洗淨後的 洗淨液朝外部排出之用的排出口的排出通路，使這些導入 通路與排出通路分別於另一端交叉彫成交叉部，同時在該 交叉部設有朝向前述被洗淨基板開口的開口部之省流體型 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐) -14 - l·-------------------訂---------線 (請先聞讀背面之注意事項再填寫本頁) 經 濟 部 智 慧 財 產 局 ‘;肖 費 合 --作 社 印 製 421827五、發明說明（12) 噴嘴，前述開口部在與 叉的方向上延伸者較佳 上述所謂省流體型 提出申請的洗淨裝置的 的洗淨用噴嘴的洗淨， 板表面後，洗淨液將被 除去物的洗淨液在基板 附著於基板表面，所以 其極限。在此，本發明 從導入通路對基板表面 液的部份以外的基板表 將包含被除去物的洗淨 ，與採用從前一般的洗 A7 B7 前述複數洗淨用噴嘴的並排方向交 噴嘴，係採用使 洗淨噴嘴的形態 洗淨的過程爲： 除去物從基板表 上流動。此時， 在從前的噴嘴被 所提出的洗淨裝 供給洗淨液之後 面並不接觸洗淨 液排出至外部的 淨用噴嘴的洗淨 用在本 。在使 洗淨液 面剝離 因爲被 除去物 置的噴 ，除了 液，而 構成。 裝置相 發明人已經 用從前一般 被供給至基 ，而含有被 除去物再度 的除去率有 嘴的場合， 供給該洗淨 從排出通路 藉由此構成 比，可以顯 著提升洗淨後的基板的淸淨度 要大量 ，藉由 嘴開口 液不露 液的使 特 制洗淨 (包含 力）與 此外，在從前一般的洗淨裝置，爲了提高淸淨度必須 出的基板洗淨裝置 時藉由控制對在噴 吸引力可以使洗淨 可以大幅削減洗淨 的洗淨液 上述作用 部的洗淨 出至噴嘴 用量，因 別是在省 液的吸引 洗淨液的 大氣壓之 ，但是在本發明 可得充分的淸淨 液壓力之來自排 的外部而排出。 此稱爲「省流體 流體型噴嘴的場 力，使維持在噴 表面張力與被洗 均衡，因此必須 人所提 度，同 出口的 結果， 型噴嘴 合，如 嘴開口 淨基板 要在數 上述般，因爲要控 部的洗淨液的壓力 的處理面的表面張 m m程度下以 l·-------------------訂 *-------- (請先閱讀背面之注意事項再填寫本頁> 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ^15- A7 B7 421827 五、發明說明（13 ) (請先閱讀背面之注意事項再填寫本頁) 0 . 1 m m程度的大小來精密地控制噴嘴的開口部與被洗 淨基板的間隔。在此，在本發明的洗淨裝置，洗淨用噴嘴 爲雙支撐構造，噴嘴與被處理基板的間隔可以安定維持於 一定値，所以非常適合用於省流體型噴嘴。 進而，基.板洗淨裝置的其他構成要素，也可以具有製 造在純水中溶解氫氣氣體或者臭氧氣體的洗淨液之洗淨液 製造手段，及對前述洗淨用噴嘴供給前述洗淨液的洗淨液 供給手段。 設有這種手段的場合，可以使用在純水中溶人氫氣氣 體的所謂含氫水或者在純水中溶入臭氧的所謂臭氧水之洗 淨液來進行有效率的洗淨。 或者是也可以採用具有回收洗淨前述被洗淨基板之後 的已使用洗淨液之洗淨液回收手段，及再生透過該洗淨液 回收手段回收的洗淨液之洗淨液再生手段，及對前述洗淨 用噴嘴供給以該洗淨液再生手段所再生的洗淨液之再生洗 淨液供給手段的構成。 經濟部智慧財產局員工消費合#社印製 在此場合，因爲可以回收曾經被使用的洗淨液，再生 以再利用，所以可以削減洗淨液的使用量。作爲洗淨液的 再生手段，例如可以可以舉出過濾洗淨液中所包含的微粒 子或異物的過濾器、除去洗淨液中的氣體之用的脫氣裝置 等。 發明之實施形態’ >紙張尺度適甩中國國家標準（CNS>A4規格（210 X 297公釐） ：16 - 421827 A7 B7 五、發明說明（14) 第1實施形態 以下，參照第1圖至第1 4圖說明本發明的第1實施 (請先閱讀背面之注意事項再填寫本頁} 形態。 第1圖係顯示本實施形態的基板洗淨裝置1的全體構 成之圖，供洗淨寬度數百mm程度的大型玻璃基板（以下 簡稱基板），將被洗淨基板洗淨之用的裝置。 圖中符號2爲洗淨部’ 3爲基板保持部’ 4、5、6 、7爲洗淨用噴嘴，8爲基板般送用機械手臂，9係載入 卡匣，1 0係載出卡匣，1 1係含氫水/臭氧水產生部（ 洗淨液製造手段），1 2係洗淨液再生部（洗淨液再生手 段），W係基板。 如第1圖所示，裝置上面中央成爲洗淨部2 ’被設有 保持基板W的基板保持部3。 基板保持部3如第2圖所示，具備第一基板支撐體 1 3，及被設於此第一基板支撐體的下方的第二基板支擦 體1 4。 經濟部智慧財產局員工消費合4社印製 第一基板支撐體1 3，只要係在旋轉乾燥時供保持基 板W之用而設者，如第2圖與第3圖所示在上面設有複數 的支撐拴1 3 a，在將被設於後數的第二基板支撐體1 4 的複數支撐栓（支撐體）1 4 a由第一基板支撐體1 3下 降時，可以複數的支撐栓1 3 a的各個先端由下方側支擦 基板W。 此外，如第3圖所示，於第一基板支撐體1 3的上面 端部，設有複數的基板固定用栓1 3 b，於後述的基板w -17- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 B7 42 1827 五、發明說明（15 ) 的乾燥工程於第一基板支撐體1 3旋轉時，被支撐於複數 支撐栓1 3 a的各個先端的基板W藉由這些複數的基板固 定用栓1 3 b由側方被支撐，防止從第一基板支撐體1 3 飛出。 此外，如第2、3圖所示，第一基板支撐體1 3上對 應後述的第二基板支撐體1 4的複數支撐栓1 4 a設有複 數的栓插通孔1 3 c與複數的栓插通用缺口 1 3 d，在各 栓插通孔1 3 c與各缺口 1 3 d使對應的支撐栓1 4 a通 過。 此外，如第2圖所示，從第一基板支撐體1 3的底面 突出支撐體旋轉用轉軸1 3 e。支撐體旋轉用轉軸1 3 e ，可旋轉而且可上下升降地嵌合於設在第二基板支撐體 1 4的轉軸孔1 4 d。 於支撐體旋轉用轉軸1 3 e的下端，設有未圖示的馬 達或汽缸等轉軸驅動源，’藉由此轉軸驅動源的動作，旋轉 轉軸1 3 e使第一基板支撐體1 3旋轉，被載置於第一基 板支撐體1 3上的基板W也與支撐體1 3共同旋轉，使殘 留於基板W的水分等飛起，可以不移動基板W而使其旋轉 乾燥。 第二基板支撐體1 4，係爲了在洗淨時保持基板W而 射得，如第2、4圖所示沿著支撐體1 4的寬度方向（橫 方向）亦即後述的洗淨用噴嘴的長邊方向（與洗淨用噴嘴 的移動方向直角相交的方向）排列的複數栓插通孔1 4 c 在支撐體14的縱方向亦即後述的洗淨用噴嘴的移動方向 本紙張尺度適用中國國家標準（CNS)A4規格（210 x 297公釐） -18- l·-------------------訂---------線 (猜先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合^:社印製 A7 421827 ___B7_ 五、發明說明（16) 上設有複數列。進而，於各栓插通孔1 4 c通有由合成樹 脂等所構成的支撐栓（支撐體）1 4 a ，所以成爲沿著支 撐體1 4的寬度方向（橫方向）亦即後述的洗淨用噴嘴的 長邊方向（與洗淨用噴嘴的移動方向直角相交的方尚）排 列的複數支撐栓1 4 a在支撐體1 4的縱方向亦即後述的 洗淨用噴嘴的移動方向上被設有複數列的狀態。 這些複數的支撐栓1 4 a的各個先端，通過栓插通孔 1 4 c，及與此對應而設的栓插通孔1 3 c或栓插通用缺 口 1 3 d突出於第一基板支撐體1 3與基板W之間的空間 ，而成爲可以在各個的先端由下方側支撐基板W。 各支撐栓1 4 a的先端，係與基板W成爲點接觸的頭 部變窄的形狀，對基板W之粒子附著極少。 各支撐栓1 4 a的下端，係與未圖示的支撐栓的升降 驅動裝置（支撐體的升降驅動裝置）的支撐栓驅動螺線管 (支撐體驅動手段）接續。 此外，如第4圖所示，於第二基板支撐體1 4的各角 落部，設有支撐體支撐板1 4 f。於這些支撐體支撐板 1 4 f ，被設有汽缸等驅動源（省略圖示）作爲基板位置 調整機構，藉由該驅動源的動作使支撐板1 4 f前後左右 移動，調整第二基板支撐體1 4的水平位置，使可以微調 被支撐於支撐栓1 4 a的先端的基板W的位置。 如第1圖所示，夾著基板保持部3相對方向的位置上 被設有一對托架基座1 6，於這些托架基座1 6間被架設 有洗淨用噴嘴4、5、6、7。洗淨用噴嘴係由被並列配 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） h--------- -----丨丨訂||!|線4^^_ (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合4社印製 421827 A7 _ B7 五、發明說明（17 > (請先閱讀背面之注意事項再填寫本頁) 置的複數（在本實施例的的場合有4個）噴嘴所構成，藉 由各洗淨用噴嘴4 ' 5、6、7以不同的洗淨方法來進行 洗淨。在本實施形態的場合，這4個噴嘴，分別是對基板 W的底面供給臭氧同時由紫外線燈（省略圖示）照射紫外 線以藉此主要分解除去有機物的紫外線洗淨用噴嘴4，及 例如第5、6圖所示對基板W的底面供給含氫水同時藉由 超音波元件（超音波賦予手段）2 5賦予超音波振動而進 行洗淨的含氫水超音波洗淨用噴嘴5，及對基板W的底面 供給臭氧水同時藉由超音波元件賦予超音波振動而進行洗 淨的臭氧水超音波洗淨用噴嘴6，及對基板w的底面供給 純水進行淸水洗淨的純水淸水洗淨用噴嘴7。 這4個噴嘴被構成爲在以複數的支撐栓1 4 a的各個 先端所支撐的基板W的底面與基板保持部3之間，以保持 與基板W的間隔爲一定的情況下可以同時沿著托架基座 1 6上的線性導軌1 7依序移動的構成。 經濟部智慧財產局員工消費合作社印製 作爲此處的噴嘴移動手段，如第5、6圖所示，分別 沿著各托架基座1 6上的線性導軌1 7可以水平移動的滑 動體1 8，分別於各個滑動體1 8的上面立起設有支柱 1 9 ，於這些支柱1 9上被固定著各洗淨用噴嘴4、5、 6、7的兩端部。各滑動體18上被配設有馬達2 0等驅 動源，成爲各滑動體1 8可自走於托架基座1 6上的構成 。而藉由從裝置的控制部（省略圖示）所供給的控制訊號 分別使各滑動體1 8上的馬達2 0動作，成爲使各洗淨用 噴嘴4、5、6、7個別水平移動的構成。此外，於支柱 -20- 本紙張尺度適用中國國家標準（CNS)A4規格（210 x 297公釐） 經濟部智慧財產局員工消費合Ηΐ社印製 42 彳827 五、發明說明（18) 1 9設有汽缸（省略圖示）等之驅動源’而可以藉由支柱 1 9上下移動來調整各洗淨用噴嘴4、5、6、7的高度 ，亦即各洗淨用噴嘴與基板W之間的間隔。這種的噴嘴的 根據移動手段的洗淨用噴嘴的移動速度’在基板w爲1 m 長方的場合，爲1〜5 Omm/秒程度。 第5、6圖係4個洗淨用噴嘴之中’例如含氫水超音 波洗淨用噴嘴5的構成例之圖。因爲其他噴嘴的基本形狀 也相同的緣故，所以用此來說明。 此洗淨用噴嘴5，形成於一側具有供導洗淨液之用的. 導入口 2 1 a的導入通路2 1與在另一側具有供排出洗淨 後的洗淨液之用的排出口 2 2 a的排出通路’於這些導入 通路2 1與排出通路2 2之間設有導引由導入通路2 1導 入的洗淨液，而且洗淨處理基板W的導引構件2 3，此導 引構件2 3具有朝向基板W開口的開口部2 4，係被稱爲 推拉型噴嘴（省流體型噴嘴）。在此場合，開口部2 4， 在與洗淨用噴嘴4、5、6、7的並列方向交叉的方向上 至少延伸基板W的寬度以上的長度（在本實施形態的場合 ，每1個洗淨用噴嘴，導引構件2 3以及開口部2 4都設 有3組，組合3組開口部2 4延伸基板W的寬度以上的長 度）。此外，壓力控制部（省略圖示），以接觸於基板W 的洗淨液於洗淨後流向排出通路2 2，維持與開口部2 4 的大氣接觸的洗淨液的壓力（包含洗淨液的表面張力與基 板的被洗淨面的表面張力）與大氣壓之均衡的方式設於排 出通路2 2側。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） n n ί I n n - » . *** _ (猜先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合4杜印製 421827 A7 _ _ B7 五、發明說明（19) 上述壓力控制部係由被設於排出口 2 2 a側的減壓幫 浦構成的。亦即，在排出通路2 2側的壓力控制部使用減 壓幫浦，控制以此減壓幫浦吸引導引構件2 3的洗淨液之 力，使與開口部2 4的大氣接觸的洗淨液的壓力（包含洗 淨液的表面張力與基板的被洗淨面的表面張力）與大氣壓 之間得到均衡。藉由使與開口部2 4的大氣接觸的洗淨液 的壓力P w (包含洗淨液的表面張力與基板的被洗淨面的 表面張力）與大氣壓P a之値幾乎相等，透過開口部2 4 對基板W供給而接觸基板W的洗淨液，可以不會漏到洗淨 用噴嘴的外部而排出於排出通路2 2。亦即，由洗淨用噴 嘴對基板W供給的洗淨液，不會接觸到基板W上的供給洗 淨液的部份（開口部2 4 )以外的部份，而從基板W除去 c 對上述構成的洗淨用噴嘴5供給洗淨液時，以洗淨用 噴嘴5的移動方向S與洗淨用噴嘴5內的洗淨液的流向 f 1的方向成爲相反方向的方式供給，較使洗淨用噴嘴5的 移動方向S與洗淨液的流動方向i i成爲相同方向的做法， 在可以提高基板的淸淨度這一點上較佳。 又，洗淨用噴嘴的接液面，以使用P F A等氟化樹脂 ，或藉由使用的洗淨液使最表面僅由鉻的氧化物構成的鈍 態膜面的不銹鋼，或是表面具備氧化鋁或鉻的氧化物的混 合膜的不銹鋼，對於臭氧水具備電解硏磨表面的鈦等，因 爲對於洗淨液沒有不純物的溶出所以較佳。使接液面爲石 英構成的話，除了氫氟酸以外適用於所有的洗淨液。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -22- ϋ ϋ n n n I I > n n I n 1 n 一n · «^1 I (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合^:社印製 421827 A? B7 五、發明說明（2Q) 進而，在導引構件2 3的下方以相對方向於塞板W的 方式設有超音波元件（超音波賦予手段）2 5，在洗淨基 板W時，對洗淨液與基板W賦予超音波。此超音波元件 2 5，係可以輸出1 9 Κ Η z以上的頻率的超音波，特別 是由可以保持洗淨液層的厚度的觀點來看，以 〇.2MHz以上的頻率較佳。 於本實施形態的洗淨用噴嘴的構成，含氫水超音波洗 淨用噴嘴5與臭氧水超音波洗淨用噴嘴6係如上述之構成 ，這些僅有使用的洗淨液是含氫水與臭氧水的差異而已。 此外，紫外線洗淨用噴嘴4的場合，取代第6圖的超音波 元件2 5而設紫外線燈，對噴嘴內供給臭氧氣體而構成即 可。藉由此構成，對基板W供給臭氧氣體同時照射紫外線 ，藉由產生的羥基自由基的作用特別分解除去有機物。在 想要防止臭氧氣體洩漏至外部的場合，只要設有空氣遮簾 機構即可。此外，關於純水洗淨用噴嘴7，只要削除第6 圖的超音波元件2 5，而單純對噴嘴內供給純水而排出的 構成即可。 又，洗淨用噴嘴4、5、6、7的開口部24與基板 W之間的距離Η，在8 in m以下不與基板W接觸的範圍較 佳，更佳者爲5mm以下不與基板W接觸的範圍，又更好 的是3mm以下不與基板W接觸的範圍。超過8mm的話 ，要在基板W與洗淨用噴嘴W之間充滿所要的洗淨液變得 很困難，洗淨不易達成。亦即，托架基座1 6、滑動體 1 8、支柱1 9等爲首的洗淨用噴嘴的支撐、移動機構， 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -23- l·-------------------訂---------J). <請先閲讀背面之注項再填寫本頁) A7 B7 421827 五、發明說明（21) 必須要將這種程度的間隔維持於基板W與洗淨溫嘴之間。 亦即，隨著場合的不同，可以設有監測基板W與洗淨用噴 嘴的間隔的距離感測器。 在本實施形態的基板洗淨裝置1，各洗淨用噴嘴4、 5、6、7係其兩端藉由支柱1 9支撐的雙支撐構造，而 且托架基座1 6、滑動體1 8 '馬達2 0等所構成的噴嘴 移動手段保持各洗淨用噴嘴與基板之間的間隔爲一定同時 藉由水平移動可以洗淨基板W的被洗淨面全區域的緣故， 可以高精度地調整洗淨中的洗淨用噴嘴與基板W的距離。 特別是在本實施形態，因爲使用洗淨用噴嘴的開口部2 4 與基板W的間隔Η必須要在數m m程度精密控制於〇 , 1 m m的等級的推拉型洗淨用噴嘴的緣故，所以藉由使洗淨 用噴嘴爲雙支撐構造|可以充分發揮推拉型噴嘴的高洗淨 效率的優點。 本實施形態之支撐栓的升降驅動裝置，在各洗淨用噴 嘴4、5、6、7沿著基板W的底面依序移動時，各洗淨 用噴嘴4、5、6、7每當移動時該洗淨用噴嘴的移動方 向前方的複數支撐栓1 4 a不與移動的洗淨用噴嘴干涉的 方式與該洗淨用噴嘴的移動相連動而使其升降移動者。 在第一實施形態的支撐栓的升降驅動裝置的槪略構成 ，具有使各滑動體1 8沿著托架基座1 6上的線性導軌 1 7行走的馬達2 0等之驅動源，與被接續的裝置的控制 部與被接續的未圖示的序列器（控制手段），與被接續於 此序列器的支撐栓驅動螺線管（支撐體驅動手段）。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） l·-------------------訂---------線「， (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合♦社印製 -24- A7 421Q27 __B7_ 五、發明說明（22) 上述序列器，根據上述洗淨用噴嘴的移動速度及指定 的移動時間的乘算値輸出使該洗淨用噴嘴的移動方向前方 之支撐栓14 a下降的脈衝訊號（驅動訊號），接著輸出 在上述洗淨用噴嘴通過下降的支撐栓1 4 a的上方之後使 支撐栓14 a上升的脈衝訊號（驅動訊號）。 上述支撐栓驅動螺線管，係在從上述序列器被輸入上 述下降脈衝訊號（下降驅動訊號）時使支撐栓1 4 a下降 ，接著藉由輸入的上述上升脈衝訊號（上升驅動訊號）在 洗淨用噴嘴通過下降的支撐栓1 4 a的上方之後使支撐栓 1 4 a上升者。 此處，洗淨用噴嘴的移動速度以及指定的移動時間的 乘算値，亦即洗淨用噴嘴的位置，例如係由後述的洗淨用 噴嘴5被安裝的滑動體1 8沿著托架基座1 6上的線性導 軌1 7水平移動時的滑動體1 8的移動速度以及移動時間 的乘積値來檢測出。而根據此檢測値以使洗淨用噴嘴5的 移動方向前方的複數支撐栓1 4 a不與移動的洗淨用噴嘴 5干涉的方式連動於洗淨用噴嘴5的移動而使其升降移動 時，預先將複數的支撐栓1 4 a的各列的位置記憶於上述 序列器，此外由洗淨用噴嘴5被安裝的滑動體1 8的移動 速度與移動時間的乘積値所檢測得的洗淨用噴嘴的移動速 度以及指定的移動時間的乘積値來判斷移動來的洗淨用噴 嘴5與支撐拴1 4 a的與各列之間隔距離的方式來設定。 進而，預先設定以指定的速度水平移動來的洗淨用噴 嘴5，及洗淨用噴嘴5的移動方向前方的支撐栓1 4 a的 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） l·-------------------訂---------線、 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合4社印製 ^25- 經濟部智慧財產局員工消費合^:社印製 ^21827 五、發明說明（23) 列較指定距離更爲接近使支撐栓1 4 a每一列開始下降時 的洗淨用噴嘴5與支撐栓1 4 a的列之間的距離（下降開 始距離），及通過下降後的支撐栓14 a的列上之洗淨用. 噴嘴5與下降的支撐栓1 4 a的列較指定距離更遠離使支 撐栓1 4 a在每一列開始上升時的洗淨用噴嘴5與支撐栓 1 4 a的列之間的距離（上升開始距離）。而在基板W之 洗淨時，藉由上述序列器，由水平移動而來的滑動體1 8 的移動速度以及移動時間的乘積値檢測出洗淨用噴嘴5與 支撐栓1 4 a的各列之距離，在該檢測値成爲上述下降開 始距離以下時由上述序列器對上述支撐栓驅動螺線管輸出 下降脈衝訊號，使洗淨用噴嘴5的移動方向前方的支撐栓 1 4 a的每一列下降，接著在上述檢測値成爲上升開始距 離以上時由上述序列器對上述支撐栓驅動螺線管輸出上升 脈衝訊號，而可以使下降的支撐栓1 4 a的每一列上升。 如第1圖所示，於洗淨部2的側方，設有含氫水/臭 氧水產生部1 1 (洗淨液製造手段）與洗淨液再生部1 2 (洗淨液再生手段）。於含氫水/臭氧水產生部1 1，被 組入在本裝置作爲洗淨液使用的含氫水的產生裝置2 7與 臭氧水的產生裝置2 8。任一洗淨液，都是藉由在純水中 使溶解氫氣氣體或是臭氧氣體而產生的，而以含氫水產生 裝置2 7所產生的含氫水1藉由被設在含氫水供給配管 2 9途中的送液幫浦3 0被供給至含氫水超音波洗淨用噴 嘴5的方式構成（洗淨液供給手段）。同樣地，以臭氧水 產生裝置2 8產生的臭氧水，藉由被設在臭氧水供給配管 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） _ 26 - l· I I -----------------訂 ii (靖先閲讀背面之注意事項再填寫本頁) 線. A7 B7 421827 五、發明說明（24) 3 1途中的送液幫浦3 2被供給至臭氧水超音波洗淨用噴 嘴6的方式構成（洗淨液供給手段）。又，於紫外線洗淨 用噴嘴4被供給來自任意的臭氧氣體供給源（省略圖示） 的臭氧氣體，於純水淸水洗淨用噴嘴7由來至製造生產線 內的純水供給用配管（省略圖示）供給純水。 此外，於洗淨液再生部1 2，設有供除去包含在使用 後的洗淨液中的微粒子或異物之用的過濾器3 3、3 4。 供除去含氫水中的微粒子所用的含氫水用過濾器3 3與除 去臭氧水中的微粒子所用的臭氧水用過濾器3 4係被設爲 不同系統》亦即，從含氫水超音波洗淨用噴嘴5的排出口 排出的使用後含氫水，藉由被設在含氫水回收配管3 5的 途中的送液幫浦36被回收至含氫水用過濾器33 (洗淨 液回收手段）。同樣的，從臭氧水超音波洗淨用噴嘴6的 排出口排出的使用後臭氧水，藉由被設在臭氧水回收配管 3 7的途中的送液幫浦3 8被回收至臭氧水用過濾器3 4 (洗淨液回收手段）。 各過濾器3 3、3 4係如第.7圖所示的構造’在中央 被配置使使用後的洗淨液流通同時具有使洗淨液從管壁透 過的機能之管體3 9，於其周邊被配置多數由鐵氟龍樹脂 所構成的濾材4 0，同時設有供遮斷管體3 9內部的洗淨 液的流通之柵板41。亦即，由過濾器33、34的導入 口 4 2導入使用後的洗淨液時，洗淨液沿著第7圖中的箭 頭F方向流動時藉由濾材4 0進行過濾.，洗淨液再度回到 管體3 9時成爲微粒子被除去的淸淨的洗淨液’而從排出 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） l·-----丨丨丨—丨丨--------訂----- (請先閱讀背面之注意事項再填寫本頁) f 經濟部智慧財產局員工消費合作社印製 Α2^δ2Τ A? ___Β7_____ 五、發明說明（25 ) 口 4 3排出^ (請先閱讀背面之注意事項再填寫本頁) 接著，如第1圖所示，通過含氫水過濾器3 3的含氫 水藉由再生含氫水供給配管4 4途中所設的送液幫浦4 5 被供給至含氫水超音波洗淨用噴嘴5 (再生洗淨液供給手 段）。同樣的，通過臭氧水用過濾器3 4的臭氧水藉由被 設在再生臭氧水供給配管4 6的途中的送液幫浦4 7被供 給至臭氧水超音波洗淨用噴嘴6(再生洗淨液供給手段） 。此外，含氫水供給配管2 9與再生含氫水供給配管4 4 在含氫水超音波洗淨用噴嘴5之前被接續’可以藉由閥 6 2對含氫水超音波洗淨用噴嘴5導入新的含氫水或是導 入再生含氫水。同樣的，臭氧水供給配管3 1與再生臭氧 水供給配管4 6在臭氧水超音波洗淨用噴嘴6之前被接續 ，可以藉由閥6 3對臭氧水超音波洗淨用噴嘴6導入新的 臭氧水或是導入再生臭氧水。又’通過各過濾器3 3、 3 4的含氫水或臭氧水，因爲除去微粒子而水中的氣體含 有濃度降低的緣故*也可以透過配管再度返回含氫水產生 裝置2 7或臭氧水產生裝置2 8，補充氫氣氣體或臭氧氣 體。 經濟部智慧財產局員工消費合作社印製 - 如第1圖所示，在洗淨部2的側方可拆裝地裝設有載 入卡匣9與載出卡匣1 0。這兩個卡匣9、1 0，係可以 收容複數枚基板W的相同形狀者，載入卡匣9收容洗淨前 的基板W，載出卡匣1 0收容已經洗淨的基板W。而在洗 淨部2與載入卡匣9、載出卡匣10的中間位置設置有基 板搬送機械手臂8。基板搬送機械手臂8具有於其上部具 ^20- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 B7 421827 五、發明說明（26 ) 伸縮自如的連結機構的臂部4 8 ’臂部4 8可以旋轉而且 可以升降，以臂部4 8的先端部支撐、搬送基板W。 (請先閱讀背面之注意事項再填寫本頁) 第8、9圖係顯示基板搬送機械手臂8的臂部4 8延 伸於基板保持部3上方的狀態。 如第8圖所示.，臂部4 8的先端的叉4 9位於第一基 板支撐體1 3之從栓插通孔1 3 c或栓插通用缺口 1 3 d 突出的支撐栓1 4 a排列之列間。由載入卡匣9接取洗淨 前的基板W的基板搬送機械手臂8在將該基板W搬送於基 板保持部3上時，如第9圖所示，以支撐栓1 4 a上升的 狀態使支撐了基板W的臂部4 8進入基板保持部3的上方 ，臂部4 8下降於複數的支撐栓1 4 a的先端上載置基板 W。其後，臂部4 8進而下降若干後退至基板保持部3的 外側之後，如第2圖所示複數支撐栓1 4 a的先端上載置 著基板W，而被保持。又，基板搬送機械手臂8的臂部 4 8先端的叉4 9，以上面的凸部4 9 a與基板成點接觸 之構成，使得對基板W之異物附著很少。 經濟部智慧財產局員工消費合4社印製 上述構成的洗淨裝置1 ，由操作者設定例如洗淨用噴 嘴4、5、6、7與基板W的間隔，洗淨用噴嘴的移動速 度，洗淨液的流量等種種洗淨條件以外，各部的動作係藉 由控制部來控制，而構成自動運轉。亦即，使用此洗淨裝 置1時，將洗淨前的基板W設定於載入卡匣9，由操作員 操作開始開關的話，藉由基板搬送機械手臂8從載入卡匣 9搬送基板W至基板保持部3上，如第1 0圖所示基板以 從第一基板支撐體1 3的栓插通孔1 3 c與栓插通用缺口 -29- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 經濟部智慧財產局員工消費合作社印製 42182了 ： 五、發明說明（27) 1 d突出的複數支撐栓1 4 a的各個先端保持著。而從托 架基座1 6的一端側至另一端側依序沿著基板W的底面送 出洗淨用噴嘴4、5、6、7的話，如第1 1圖所示各洗 淨噴嘴每次接近時洗淨用噴嘴的移動方向前方的複數支撐 栓i 4 a的每一列就下降，此時於未下降的複數支撐栓 1 4 a的各個先端保持著基板。接著，如第1 2圖所示各 洗淨用噴嘴通過時下降的支撐栓1 4 a又分別各列上升以 其先端再度保持基板W。亦即，4個洗淨用噴嘴4、5、 6、7不會被支撐栓1 4 a干涉到，在洗淨基板W.的底面 同時依序通過基板W與第一基板支撐體1 3之間，藉由洗 淨用噴嘴4 ' 5、6、7依序對基板W的底面全區域進行 紫外線洗淨、含氫水超音波洗淨、臭氧水超音波洗淨、淸 水洗淨等。如第1 3圖所示，基板洗淨後的各洗淨用噴嘴 4、5、6、7被配置於托架基座1 6的另一端側。 淸水洗淨後，使支撐栓1 4 a下降，埋沒於第二基板 支撐體1 4的栓插通孔1 4 c內時，如第1 4圖所示基板 W的底面以第一基板支撐體1 3的複數支撐栓1 3 a的先 端支撐同時以固定栓1 3 b支撐。接著，使被接續於支撐 體旋轉用轉軸1 3 e的轉軸驅動源動作而使第一基板支撐 體1 3旋轉，使基板W旋轉乾燥。乾燥後的基板W，藉由 基板搬送機械手臂8收容於載出卡匣1〇。 本實施形態的洗淨裝置1 ，複數支撐栓14 a的各個 先端可以從基板的下方側支撐，而且對於基板W的底面供 給洗淨液的洗淨用噴嘴4、5、6、7可以沿著基板W的 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -30- --------------------訂---------線、 (請先閱讀背面之注意事項再填寫本頁) 421827 A7 __B7______ 五、發明說明（28 ) 底面移動，進而上述支撐栓的升降移動驅動裝置，以上述 洗淨用噴嘴的移動方向前方的支撐栓1 4 a不與移動的洗 淨用噴嘴干涉的方式連動於該洗淨用噴嘴的移動而可以升 降移動的方式來構成的緣故，以複數的支撐栓1 4 a的各 個先端將基板W由此下方側支撐，使洗淨用噴嘴4、5、 6、7沿著基板W的底面依序移動的話，洗淨用噴嘴的移 動方向前方的支撐栓1 4 a會下降的緣故，不會與移動的 洗淨用噴嘴干涉，此外，下降的支撐栓1 4 a在洗淨用噴 嘴通過後上升，可以其先端再度支撐基板W。 亦即，根據本實施形態的基板洗淨裝置1，與藉由滾 軸搬送基板同時洗淨的從前的基板洗淨裝置不同，藉由使 洗淨用噴嘴4、5、6、7沿著基板W的底面移動，可以 使基板W幾乎沒有移動位置就洗淨基板W的底面，所以可 縮短製造生產線中的基板洗淨裝置的長度減少裝置的佔有 面積，此外洗淨工程之基扳W的搬送距離也可以大幅縮短 ，洗淨用噴嘴的移動範圍只要上述基板的大小的程度即可 ，在洗淨工程中不必耗費龐大的設備費或佔有空間，可以 達成合理的裝置。 進而，在本實施形態的基板洗淨裝置1 ，4個洗淨用 噴嘴4、5、6、7的各個係藉由紫外線洗淨、含氫水超 音波洗淨、臭氧水超音波洗淨、淸水洗淨等不同的洗淨方 法來洗淨處理的構成，所以可以1台本裝置來實施種種的 洗淨方法。亦即，例如藉由紫外線洗淨除去有機物後，藉 由含氫水超音波洗淨、臭氧水超音波洗淨除去微細粒徑的 --------------------訂---------線 (請先間讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 - 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -31 - 經濟部智慧財產局員工消費合^：社印製 421827 A7 __B7 五、發明說明（29) 微粒子之後，進而以淸水洗淨沖洗附著於基板表面的洗淨 液同時進行最終洗淨，而可以藉此充分洗淨除去種種被除 去物。結果，即使有微粒子、有機物等種種除去對象也可 以將此確實洗淨除去。此外，即使進行複數種洗淨方法也 不必在洗淨工程耗費龐大的設備費或佔有空間，可以達成 合理的裝置。 此外，本實施形態的基板洗淨裝置1的場合，藉由使 用上述構成之推拉型噴嘴作爲洗淨用噴嘴，當從導入通路 2 1對基板W的表面供給洗淨液時，在除了供給該洗淨液 的部份以外的基板表面可不接觸到洗淨液，而從排出通路 2 2將含有被除去物的洗淨液排出至外部的緣故，與使用 從前一般的洗淨用噴嘴的基板洗淨裝置相比可以顯著提高 洗淨後的基板W的淸淨度。此外，在使用從前一般的洗淨 用噴嘴的基板洗淨裝置，爲了提高淸淨度必須要大量的洗 淨液，在本實施形態的基板洗淨裝置1，藉由上述作用可 得到充分的淸淨度同時藉由控制對於在噴嘴開口部2 4的 洗淨液的壓力之來自排出口 2 2 a的吸引力，可以使洗淨 液不洩漏至外部而排出，因此可以大幅削減洗淨液的使用 量° 進而，本實施形態的基板洗淨裝置1的場合，藉由在 洗淨用噴嘴5、6設有對基板W賦予超音波振動的超音波 元件2 5，可以在以從各洗淨用噴嘴所供給的洗淨液洗淨 基板W時，對該洗淨液與基板w賦予超音波的緣故，與不 賦予超音波的場合相比，附著於基板W的被除去物的除去 本紙張尺度適用中國國家標準（CNS)A4規格（210 * 297公釐） -32- 卜--------------------訂---------線、 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 4 218 2 7 A7 ____B7___ 五、發明說明（30) 效率變佳，可以提高洗淨後的基板w的洗淨度。 此外，本實施形態的裝置1的場合，被設有含氫水/ 臭氧水產生部11，於洗淨裝置內被一體組裝入臭氧水產 生裝置2 8，特別因爲臭氧水的壽命很短，所以本發明可 在維持臭氧水的品質的狀態下使用於洗淨，可以有效進行 臭氧水超音波洗淨。進而，具備洗淨液再生部1 2，可以 回收曾經被使用過的含氫水或臭氧水等洗淨液將其再生而 再利用，因此可以削減洗淨液的使用量。 本實施形態的裝置1，於液晶顯示面板等的製造生產 線可以在基板的洗淨工程常設使用，但是因爲如上所述屬 於小型的緣故使其適當移動至必要的處所來使用亦可。 又，以上說明了在本實施形態的裝置1 ，使用設有如 上述般構成的洗淨用噴嘴4、5、6、7作爲洗淨基板W 的底面的底面洗淨用噴嘴的場合，進而，作爲在如第2圖 與第1 0圖至第1 5圖以二點虛線所示的沿著基板W的上 面移動同時對基板W的上面供給洗淨液的上面洗淨用噴嘴 ，亦可使用紫外線洗淨用噴嘴4 a、含氫水超音波洗淨用 噴嘴5 a、臭氧水超音波洗淨用噴嘴6 a、純水淸水洗淨 用噴嘴7a。如此除了底面洗淨用噴嘴4、5、6、7以 外設有如上述般的上面洗淨用噴嘴4 a、5 a、6 a、 7 a的場合，可以一次洗淨基板W的雙面，所以與僅設有 洗淨基板的底面的洗淨用噴嘴的場合相比，提高基板W的 洗淨效率，可以縮短洗淨工程所需要的時間^ 此外，於本實施形態的裝置1，支撐栓1 4 a的先端 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -33- --------------------訂--------- (請先間讀背面之注意事項再瑱寫本頁)A7 A7 B7 421827_ V. Description of the invention (1) Technical field to which the invention belongs The present invention relates to a substrate cleaning device, and more particularly to a substrate for cleaning semiconductor substrates or glass substrates used as substrates for various electronic devices Wash the device. Prior art In the field of electronic devices such as semiconductor devices and liquid crystal display panels, it is necessary to perform a process of cleaning and processing a semiconductor substrate or a glass substrate of a substrate to be processed in a manufacturing process. In this case, the object to be cleaned and removed from the substrate is a variety of substances such as fine particles and organic materials in the indoor environment, and the most appropriate cleaning solution or method for removing the object. It has been reviewed before. For example, running water is generally used for washing, and other washing methods include physical washing, including ultrasonic washing, and light washing, such as decomposition of organic matter and the like by ultraviolet radiation. However, as a conventional substrate cleaning device for washing the substrate to be processed under running water, the user is provided with a substrate cleaning section having a cleaning solution supply nozzle for supplying a cleaning solution to the surface of the substrate to be processed, and drying the substrate. The substrate cleaning section is a drying section of the substrate to be processed, and rollers for sequentially transferring the substrate to be processed between the substrate cleaning section and the drying section. When the substrate to be processed is cleaned using the substrate cleaning device configured in this way, the device is installed on a manufacturing line, and the substrate to be processed is transferred to the substrate cleaning unit by a roller, and the substrate to be processed is transferred by the roller. At the same time, the surface of the substrate is cleaned with the cleaning liquid supplied from the cleaning liquid supply nozzle. Thereafter, the cleaned substrate is transported to the drying section by a roller, so that the paper size is suitable. China National Standard (CNS) A4 Specification (210 X 297 mm) L ------------------- Order --------- Line ' < Please read the note on the back before filling this page) Employee Consumption of Intellectual Property Bureau of the Ministry of Economic Affairs ^: Printed by the agency -4-A7 B7 421827 V. Description of the invention (2) Dry. In addition, if a substrate cleaning device using various cleaning methods such as a physical cleaning device and a light cleaning device on a manufacturing production line is to be separately installed, it will cost a huge amount of equipment costs or occupy an area of the device in the cleaning process. It is extremely unreasonable. Furthermore, the number of substrate transfers in the production line also increases. Here, we propose a substrate cleaning device that can perform different types of cleaning in one device. Figure 33 is a schematic diagram of its structure. The substrate cleaning device 270 shown in Fig. 33 is a single device for light and physical cleaning. It is provided with a rotation jig 2 7 1 which rotatably supports the substrate W to be cleaned, a brush arm 2 7 3 having a cleaning brush 2 7 2 which is in contact with the surface of the substrate W to clean the substrate W, and The nozzle arm 2 7 4 of the cleaning liquid supply nozzle that supplies the cleaning liquid on the surface of the substrate W, and the lamp arm 2 7 5 that contains an ultraviolet lamp that irradiates the surface of the substrate W with ultraviolet rays, and supplies the surface of the substrate W with cleaning. Liquid multiple spray nozzles 2 7 6. The problem to be solved by the present invention is the conventional substrate cleaning device having the above-mentioned structure. Because the substrate to be processed is conveyed by rollers and washed at the same time, the length of the substrate cleaning device in the production line is as long as 8 to 10 m. The space occupied by the device in the clean room becomes larger. In addition, the transportation distance of the substrate to be processed in the cleaning process also becomes longer. The cleaning process alone consumes huge equipment costs and is extremely unreasonable. In addition, in recent years, substrates such as semiconductor devices and liquid crystal display panels have tended to become larger and larger. For large-scale substrate cleaning devices, the paper size of this paper applies the Chinese National Standard (CNS) A4 (210 X 297). (%) Γ5Τ L--ml —----- IIII 11— ^ --------- V) (Please read the precautions on the back before filling out this page) The Intellectual Property Bureau staff of the Ministry of Economy Employees of the Intellectual Property Bureau of the Ministry of Economic Affairs and the Ministry of Economic Affairs of the People's Republic of China ## 印 印 421827 a7 _B7____ V. Description of the Invention (3) Because the space occupied by the net device has also become larger, the above problems are more significant. The cleaning device has the advantages of being able to perform light cleaning and physical cleaning with one device, but has the following problems. That is, because the brush arm provided with a brush at the tip is rotated to perform physical cleaning at the same time, the reach range of the brush has its limit. It is difficult to make the surface of the substrate sufficiently uniform to be washed and cleaned no matter how many times the substrate to be cleaned is rotated. It may cause uneven washing. Here, in order to understand the problem, it is considered that the cleaning means is not provided at the tip of the arm, and the entire washing means is provided across the long side of the arm. However, in this case, the previous cleaning device is supported at one end side of the cleaning arm, that is, a unilateral support structure. Due to the amount of m of the cleaning arm itself, the tip side is slightly deflected downward. Propensity. In this way, the distance between the arm and the substrate to be processed is slightly different as the position on the arm is different. For example, when the cleaning liquid is sprayed from the arm, the amount of the cleaning liquid and the strength against the substrate are different. After all, it becomes the cause of uneven washing. In addition, in the case of cleaning with ultraviolet rays, there is inevitably a place where the structure is difficult to be irradiated with ultraviolet rays. Removal of organic matter in this part is difficult. In the fields of semiconductor devices, liquid crystal display panels, and the like, substrates have tended to become larger in recent years. In devices for cleaning large substrates, the size of arms has also become longer. Is significant. The present invention was invented in order to solve the above-mentioned problems, and an object thereof is to provide a reasonable substrate cleaning device which can reduce the space occupied by the device and is suitable for a manufacturing line. In addition, the purpose of the present invention is to provide no washing unevenness, and the Chinese paper standard (CNS > A4) < 210 * 297 mm) -6- l · ------------------ I order · ------- line (Please read the precautions on the back first (Fill in this page again) A7 421827 __B7_____ V. Description of the invention (4) Uniform cleaning effect can be obtained across the entire substrate, and at the same time, a single device can be used to perform different cleaning methods, which is suitable for a reasonable cleaning device for manufacturing lines. Means for Solving the Problem In order to achieve the above object, the substrate cleaning apparatus of the first aspect of the present invention is characterized by having a plurality of supports for wiping the substrate to be cleaned from the lower side at each tip, and a plurality of support bodies along The cleaning nozzle that supplies the cleaning liquid to the bottom surface of the substrate to be cleaned while moving the bottom surface of the substrate to be cleaned does not interfere with the cleaning nozzle that moves the support body forward of the direction in which the cleaning nozzle moves. The system is linked to the lifting and lowering driving device of the supporting body that moves in conjunction with the movement of the cleaning nozzle. That is, in the substrate cleaning device of the present invention, each tip of the plurality of support bodies can be supported from the lower side of the substrate to be processed, and a cleaning nozzle (bottom surface cleaning) for supplying a cleaning liquid to the bottom surface of the substrate to be processed is provided. (Nozzle) can be moved along the bottom surface of the substrate to be processed, and further, the lifting and lowering driving device of the support body is linked to the cleaning nozzle so that the cleaning nozzle does not interfere with the cleaning nozzle moving in the support body forward in the moving direction. The cleaning nozzle can move up and down. Therefore, when the substrate to be processed is supported from the lower side of each of the plurality of support bodies, and the cleaning nozzle is moved along the bottom surface of the substrate to be processed, it is because the cleaning nozzle moves in the direction of the front support. Due to the experience of falling, it will not interfere with the moving cleaning nozzle. In addition, the lowered support will rise after the cleaning nozzle passes, and it can support the above-mentioned paper standard again with the Chinese National Standard (CNS) A4 specifications < 210 X 297mm) Κ ------------------- Order --------- Line · Ί (Please read the precautions on the back first (Fill in this page) Consumption of employees of the Intellectual Property Bureau of the Ministry of Economic Affairs ^: Printed by the agency 421827 Α7 Β7 V. Description of the invention (5) Processed substrate. < Please read the precautions on the back before filling this page.) The substrate cleaning device of the present invention is different from the previous substrate cleaning device that cleans the substrate to be processed by roller conveyance at the same time. By moving the nozzle along the bottom surface of the substrate to be processed, the substrate to be processed can be hardly moved, and the bottom surface of the substrate to be processed can be cleaned. That is, according to the substrate cleaning device of the present invention, the length of the substrate cleaning device in the manufacturing line can be shortened, the space occupied by the device can be reduced, and the conveyance distance of the substrate to be processed in the cleaning process can be greatly shortened. The moving range of the nozzle may be equivalent to the size of the surface of the substrate to be processed, and it is not necessary to consume a large amount of equipment cost or occupy space in the cleaning process, and the device can be rationalized. In addition, the configuration of the above-mentioned cleaning nozzle is preferably one having the following structure. Α The first point is to configure the above-mentioned cleaning nozzle to include an introduction passage for introducing a cleaning solution on one side and a discharge for cleaning on the other side. The discharge path of the subsequent cleaning solution is provided with a guide mechanism for guiding the substrate to be processed, the cleaning solution introduced from the introduction path, and a guide mechanism for cleaning and processing the substrate between the introduction path and the discharge path. The case is better. It is preferable that the nozzle for washing used in the cleaning structure thus constructed by the Employees' Union of the Intellectual Property Bureau of the Ministry of Economic Affairs use the nozzle (fluid-saving nozzle) of the cleaning device that has been applied for by the applicant of the present invention. In the conventional cleaning process using a conventional cleaning nozzle, after the cleaning liquid is supplied to the substrate surface, the cleaning liquid peels off the object to be removed from the substrate surface, and the cleaning liquid containing the object to be removed is placed on the substrate. On the flow. At this time, because the removed material will re-attach to the substrate surface, the paper size of the former nozzle applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 421827 A7 B7 Employees ’Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs Printing V. Description of the invention (6) The removal rate of the removed matter has its limit. Here, in the case of the nozzle of the cleaning device proposed by the present applicant, when the cleaning liquid is supplied to the substrate surface through the introduction path, the substrate surface other than the portion to which the cleaning liquid is supplied will not contact the cleaning The cleaning liquid and the cleaning liquid containing the object to be removed are discharged to the outside through the discharge path. With this configuration, the cleanliness of the substrate after cleaning can be significantly improved compared to a cleaning device using a conventional cleaning nozzle. In addition, in the conventional cleaning devices, a large amount of cleaning liquid was required in order to improve the cleaning degree. However, in the cleaning device proposed by the applicant, sufficient cleaning degree can be obtained by the above action, and at the same time, The suction force from the discharge port is controlled by the pressure of the washing liquid provided at the nozzle opening of the guide member, and the washing liquid is discharged to the outside without leaking. As a result, the amount of cleaning liquid used can be significantly reduced, and a "fluid-saving nozzle" can be achieved. Secondly, it is preferable that the cleaning nozzle is configured to have an ultrasonic wave applying means having ultrasonic wave vibration applied to the cleaning substrate. With this configuration, when the substrate to be cleaned is cleaned with the cleaning liquid supplied from the nozzle for cleaning, the ultrasonic wave is applied to the cleaning liquid and the substrate to be processed, so compared with a case where no ultrasonic wave is applied. The removal efficiency of the removed matter attached to the substrate to be processed is very good, and the cleaning degree of the substrate after cleaning can be improved. Thirdly, it is preferable that a plurality of the above-mentioned cleaning nozzles be provided. With this structure, since each of the plurality of cleaning nozzles cleans the substrate to be cleaned by a plurality of different cleaning methods, various cleanings can be performed with one device, even if there are various kinds of particles, organic matter, and the like. The object to be removed may be cleaned and removed. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -9-l · ------- ί i! I — Order ----- (Please read the notes on the back first Fill in this page again) Line A7 421827 B7 V. Description of the invention (7) In the fourth point, it is preferable to set a plurality of the above-mentioned introduction passages and the above-mentioned discharge passages respectively in the above-mentioned cleaning nozzle | With this configuration, the substrate to be processed can be cleaned and processed by one cleaning nozzle by a plurality of different cleaning methods, the number of cleaning nozzles provided in the cleaning section can be reduced, and as a result, the number of cleaning nozzles can be reduced. The storage space can reduce the space occupied by the device. Further, the configuration of the driving device may be the following configuration. In the first aspect, the driving device may be configured to have a drive for lowering the support body forward of the moving direction of the cleaning nozzle based on a multiplication and output of the moving speed of the cleaning nozzle and a predetermined moving time. A control signal for outputting a driving signal for raising the support after the cleaning nozzle passes above the lowered support, and lowering the support when the descending driving signal is input from the control means, Then, the support driving means for raising the support body after the cleaning nozzle passes above the lowered support body by the input of the rising drive signal. In the second point, the driving device may be configured to output a driving signal for lowering the support body forward in the moving direction of the cleaning nozzle when the cleaning nozzle reaches a predetermined position during movement, and then The driving signal generating means for driving the raised signal after the cleaning nozzle passes above the lowered supporting body is output, and when the lower driving signal from the driving signal generating means is input, the driving signal is generated. The supporting body is lowered, and the paper size of the supporting paper is adapted to the Chinese National Standard (CNS) A4 (210 X 297 mm) after the cleaning nozzle passes the upper part of the lowered supporting body by the input of the rising driving signal. Li) 1--! —! -------— Order -------- line (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs- 10- A7 421827 ___ Β7 ___ V. Description of the invention (8) Driving means for supporting body ascending. Third point, the driving device may be configured to include a support body holding member that urges each of the support bodies upward, a pressure receiving body provided on the support body, and a direction provided by the cleaning nozzle. The cleaning nozzle extends forward in the moving direction, and the pressure receiving body abutting on the support body in front of the moving direction simultaneously with the movement of the cleaning nozzle is simultaneously depressed against the elastic pressure of the support holding member. The pressing body of the aforementioned front support body. In addition, as other constituent elements constituting the substrate cleaning apparatus, the following means may be provided. In the first point, at least one cleaning nozzle (upper surface cleaning nozzle) may be provided while moving along the upper surface of the substrate to be cleaned while supplying cleaning liquid to the upper surface of the substrate to be cleaned. When the above-mentioned cleaning nozzle is provided in addition to the nozzle for cleaning the bottom surface, since both sides of the substrate to be processed can be cleaned at one time, it is the same as the nozzle for cleaning only the bottom surface of the substrate to be cleaned. Compared with the case, the cleaning efficiency of the substrate to be processed can be improved, and the time required for the cleaning process can be shortened. In the second point, there may be provided a cleaning liquid manufacturing means for manufacturing a cleaning liquid in which hydrogen gas or ozone gas is dissolved in pure water, and a cleaning liquid supply means for supplying the cleaning liquid to the cleaning nozzle. When such a means is provided, a so-called hydrogen-containing water in which gas is dissolved in pure water or a so-called ozone water in which ozone is dissolved in pure water can be used for efficient cleaning. This paper size applies to China National Standard (CNS) A4 specifications (210 X 297 mm) -11-L — — — — — — — — — — 1111111 ^ * — — — — — — — \ * ,, (Please read the notes on the back before filling out this page) Employees ’Cooperative Consumption of Intellectual Property Bureau of the Ministry of Economic Affairs—printed by the company A7 42 1827 B7_ V. Description of the invention (9) At point 3, it is also possible to set up and clean the aforementioned quilts. After the substrate has been cleaned, the cleaning liquid recovery means using the cleaning liquid, the cleaning liquid regeneration means for regenerating the cleaning liquid recovered through the cleaning liquid recovery means, and the cleaning nozzle is supplied with the cleaning Regeneration washing liquid supply means for washing liquid regenerated by the liquid regeneration means. In this case, since the used cleaning solution can be recovered and reused, the amount of cleaning solution used can be reduced. Examples of the means for regenerating the cleaning solution include a filter that filters fine particles or foreign matter contained in the cleaning solution, and a degassing device for removing gas from the cleaning solution. In addition, the substrate cleaning device of the present invention is characterized by comprising: a substrate holding means for holding the substrate to be cleaned; and a cleaning nozzle, which supports the substrate to be cleaned in a state where both ends are supported. A plurality of cleaning nozzles 1 arranged in parallel are each provided with a function of causing the substrate to be cleaned to perform any cleaning treatment by a plurality of different cleaning methods, and a nozzle moving means for Each nozzle of the cleaning nozzle maintains a certain distance from the substrate to be cleaned, and sequentially moves the nozzles in the parallel direction, thereby cleaning and processing the entire area of the cleaned surface of the substrate to be cleaned. That is, in the substrate cleaning device of the present invention, each cleaning nozzle adopts a so-called double support structure in which both ends are supported, and the nozzle moving means maintains a constant interval between each cleaning nozzle and the substrate to be cleaned. The state is such that the entire area of the cleaned surface of the processing substrate is cleaned by moving in the parallel direction of the nozzles. Therefore, unlike previous devices that were previously supported by a single unit, regardless of the location of the cleaning nozzle, the distance between the nozzle and the substrate to be processed is the same, and the entire substrate can be cleaned uniformly across the substrate. And by each plural spraying, the paper size applies the Chinese national standard (CNS > A4 specification (210 X 297 mm) L ------- meal i- < Please read the notes on the back before filling out this page) Order --------- Line · Printed by the Consumers' Association of Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 421827 V. Description of Invention (1C)) Because the substrate to be cleaned is cleaned by different cleaning methods, various cleanings can be performed by one device, and even if there are various removal objects such as fine particles and organic substances, it can be surely cleaned and removed. In addition, the cleaning project does not consume huge equipment costs or occupy space, and a reasonable installation can be achieved. Furthermore, the substrate cleaning device of the present invention is characterized by having a cleaning nozzle, which is a plurality of cleaning nozzles extending radially from a center point, and each of the plurality of nozzles has a plurality of substrates for cleaning. The function of performing various cleaning processes using different cleaning methods and the substrate holding rotation means are arranged below the aforementioned cleaning nozzles arranged radially to hold and rotate the substrate to be cleaned, and the nozzle moving means It keeps the radial cleaning nozzle integrally maintained at a constant interval from the substrate to be cleaned while moving the two-dimensional element, and works in coordination with the substrate holding and rotating means to clean and clean the substrate to be cleaned. Clean area full area. In the above-mentioned substrate cleaning apparatus, a plurality of cleaning nozzles are connected at the center point side and supported at the peripheral edge side, and the cleaning nozzles have a shape of a double support structure. The distance from the substrate to be processed is maintained uniformly, and uniform cleaning can be performed across the entire surface of the substrate to be processed. In this form, unlike the first form of apparatus in which each cleaning nozzle moves independently, since a plurality of nozzles are connected to each other, the entire connected cleaning nozzles do not cross from one end of the substrate to the other. It moves largely, and it is a structure which rotates a board | substrate side by a board | substrate holding rotation means, and wash | cleans the whole area | region of a washing surface. Even so, it becomes difficult to clean the substrate near the center point where the plural nozzles are connected, even if each cleaning spray L! ------- t < Please read the precautions on the back before filling this page) Order ---------_ Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economy-This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -13- Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Employees' Cooperative 4 42 1827 a? _B7____ V. Description of the Invention (11) The mouth has different cleaning functions, and the cleaning of the substrate near the center point is also It becomes difficult to make each cleaning nozzle have a different cleaning function, and the cleaning function cannot be effectively exhibited near the center of the substrate. Here, a radial cleaning nozzle is moved by a nozzle moving means while maintaining a certain distance between the substrate and the substrate to be cleaned, and the two-dimensional movement is performed at the same time. Structure for processing the entire area of the cleaned surface of the cleaned substrate. Thereby, even the central portion of the substrate can be cleaned by a plurality of cleaning methods. The configuration of the cleaning nozzle is preferably as follows. In the first point, it is preferable that the cleaning nozzle includes an ultraviolet cleaning nozzle that irradiates at least the substrate to be cleaned with ultraviolet rays, and an ultrasonic cleaning nozzle that applies ultrasonic vibration to the substrate to be cleaned. With this structure, for example, after normal pure water washing, ultrasonic washing by the ultrasonic cleaning nozzle and ultraviolet washing by the ultraviolet cleaning nozzle can be performed continuously. In this case, after removing particles with a normal particle size attached to the substrate by washing with pure water, the particles with fine particle diameters are removed by ultrasonic cleaning, and further, organic matter is removed by ultraviolet cleaning, which is sufficient. Removal of various to-be-removed objects. At point 2, the above-mentioned cleaning nozzle is formed with an introduction passage having an introduction port for introducing a cleaning solution at one end, and an exhaust path at one end for discharging the washed cleaning solution to the outside. The discharge path of the discharge port for the inlet and the discharge path are sculpted at the other end to form a cross section, and at the same time, the cross section is provided with an opening portion facing the substrate to be cleaned. China National Standard (CNS) A4 Specification (210 X 297 mm) -14-l · ------------------- Order --------- line (Please read the notes on the back before filling this page) Economy Ministry of Intellectual Property Bureau '; Xiao Feihe--printed by Zuozhe Co., Ltd. 421827 V. Description of the invention (12) Nozzle, the opening part extending in the direction of the fork is better After the surface of the plate is cleaned by the cleaning nozzle, the cleaning liquid adheres to the surface of the substrate the cleaning liquid of the object to be removed, so this is the limit. Here, in the present invention, the substrate surface other than the portion of the substrate surface liquid from the introduction path is used to clean the substrate surface, including the object to be removed, and the nozzles are arranged side by side with the conventional general cleaning A7 B7 and the aforementioned multiple cleaning nozzles. The process of cleaning the form of the cleaning nozzle is as follows: the removed material flows from the substrate surface. At this time, after the previous nozzle is supplied with the cleaning solution by the proposed cleaning device, the cleaning nozzle that does not touch the cleaning solution and is discharged to the outside is used for cleaning. The cleaning liquid surface is peeled off because of the spray of the removed material, and it is constituted. When the inventor of the device phase has been used to supply the substrate in the past, and there is a nozzle with the removal rate of the object to be removed again, the cleaning and discharge channels can be used to significantly improve the substrate after cleaning. The cleanliness needs to be large, and the special cleaning (including force) is not performed by the mouth opening liquid. In addition, in the conventional general cleaning device, the substrate cleaning device must be controlled to improve the cleanliness. The spraying force can greatly reduce the amount of cleaning solution to be cleaned and the amount of cleaning solution to the nozzle can be reduced. This is because it is the atmospheric pressure that attracts the cleaning solution in the province, but it is sufficient in the present invention. The pressure of the plutonium solution is discharged from the outside of the drain. This is called "the field force of the fluid-saving fluid type nozzle, so that the surface tension of the nozzle is maintained in equilibrium with the washing. Therefore, it must be raised by the person, and the result of the outlet is the same as that of the nozzle. Because the surface of the treated surface of the pressure of the cleaning liquid to be controlled is in the range of mm, the order is l · ------------------- *. -(Please read the precautions on the back before filling in this page> This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) ^ 15- A7 B7 421827 V. Description of the invention (13) (Please Read the precautions on the back before filling in this page.) The size of 0.1 mm is used to precisely control the gap between the opening of the nozzle and the substrate to be cleaned. Here, in the cleaning device of the present invention, the cleaning nozzle is Double support structure, the distance between the nozzle and the substrate to be treated can be kept constant, so it is very suitable for use with fluid-saving nozzles. Further, other components of the base plate cleaning device can also be manufactured to dissolve in pure water. Washing liquid manufacturing method for washing liquid of hydrogen gas or ozone gas, and A cleaning liquid supply means for supplying the cleaning liquid by the cleaning nozzle. When this means is provided, so-called hydrogen-containing water in which hydrogen gas is dissolved in pure water or ozone in which pure water is dissolved may be used. Efficient cleaning is performed with a cleaning solution of ozone water. Alternatively, a cleaning solution recovery method using a cleaning solution that recovers and cleans the substrate to be cleaned may be used, and recycled through the cleaning solution. The cleaning liquid regeneration means of the cleaning liquid recovered by the means, and the regenerating cleaning liquid supply means for supplying the cleaning nozzle with the cleaning liquid regenerated by the cleaning liquid regeneration means to the aforementioned cleaning nozzle. Consumption Co. # 社 印 In this case, the used washing liquid can be recovered and reused, so the amount of washing liquid can be reduced. As a regeneration means of the washing liquid, for example, filtration can be cited Filter for fine particles or foreign matter contained in the cleaning solution, degassing device for removing gas from the cleaning solution, etc. Embodiment of the invention '> Paper size is suitable for the national standard of China Standard (CNS > A4 (210 X 297 mm): 16-421827 A7 B7 V. Description of the Invention (14) First Embodiment Below, the first embodiment of the present invention will be described with reference to FIGS. 1 to 14 (please Read the precautions on the back before filling in this page} Form. Figure 1 shows the overall structure of the substrate cleaning device 1 of this embodiment. It is used to clean large glass substrates (hereinafter referred to as substrates) with a width of several hundred mm. The device used for cleaning the substrate to be cleaned. Symbol 2 in the figure is the cleaning section, 3 is the substrate holding section, 4, 5, 6, and 7 are cleaning nozzles, and 8 is a robot arm for substrate delivery. 9 series loading cassettes, 10 series loading cassettes, 1 1 series hydrogen-containing water / ozone water generating unit (washing liquid manufacturing means), 12 series washing liquid regeneration unit (washing liquid regeneration means), W-based substrate. As shown in Fig. 1, the center of the upper surface of the apparatus is a cleaning section 2 ', and a substrate holding section 3 holding a substrate W is provided. As shown in Fig. 2, the substrate holding portion 3 includes a first substrate supporting body 13 and a second substrate supporting body 14 provided below the first substrate supporting body. Employees of the Intellectual Property Bureau of the Ministry of Economic Affairs print the first substrate support body 13 as long as it is provided for holding the substrate W during spin drying, as shown in Figs. 2 and 3 The plurality of support bolts 1 3 a may be provided when the plurality of support bolts (supports) 1 4 a of the second substrate support body 14 provided at the last number are lowered from the first substrate support body 13. Each tip of 1 a is wiped from the substrate W by the lower side branch. In addition, as shown in FIG. 3, a plurality of substrate fixing bolts 1 3 b are provided on the upper end portion of the first substrate support body 13, and the substrate w -17 described later applies to Chinese paper standards ( CNS) A4 size (210 X 297 mm) A7 B7 42 1827 V. The drying process of the invention description (15) When the first substrate support 13 is rotated, it is supported by the substrates at the respective ends of the plurality of support pins 1 3 a W is supported from the side by these plural substrate fixing bolts 1 3 b to prevent flying out from the first substrate support 1 3. In addition, as shown in FIGS. 2 and 3, the first substrate support body 13 is provided with a plurality of bolt insertion holes 1 3 c corresponding to a plurality of support plugs 1 4 a corresponding to a second substrate support body 14 to be described later and a plurality of The general-purpose notches 1 3 d are bolted, and the corresponding support bolts 14 a are passed through the respective through-holes 1 3 c and 13 3 d. In addition, as shown in Fig. 2, the support-body rotating shaft 1 3e protrudes from the bottom surface of the first substrate support 13. The rotating shaft 1 3 e for supporting body rotation is fitted in a rotating shaft hole 1 4 d provided in the second substrate supporting body 14 so as to be rotatable and movable up and down. At the lower end of the supporting body rotating shaft 1 3 e, a shaft driving source such as a motor or a cylinder (not shown) is provided, and by the operation of the shaft driving source, the rotating shaft 1 3 e rotates the first substrate supporting body 13. The substrate W carried on the first substrate supporting body 13 is also rotated together with the supporting body 13 so that moisture and the like remaining on the substrate W fly up, and the substrate W can be rotated and dried without moving. The second substrate support 14 is shot in order to hold the substrate W during cleaning, as shown in FIGS. 2 and 4 along the width direction (lateral direction) of the support 14, that is, the cleaning nozzle described later. Plural plug insertion holes 1 4 c arranged in the longitudinal direction of the long side (direction orthogonal to the moving direction of the cleaning nozzle) 1 c in the longitudinal direction of the support 14, that is, the moving direction of the cleaning nozzle to be described later. This paper scale applies. China National Standard (CNS) A4 specification (210 x 297 mm) -18- l · ------------------- Order --------- line (Guess to read the notes on the back before filling out this page) Consumption of employees of the Intellectual Property Bureau of the Ministry of Economic Affairs ^: Printed by the agency A7 421827 ___B7_ V. The invention description (16) has multiple columns. Furthermore, since each of the plug insertion holes 1 4 c is provided with a support plug (support body) 1 4 a made of a synthetic resin or the like, it is formed along the width direction (lateral direction) of the support body 14, that is, washing as described later. The plurality of support bolts 1 4 a arranged in the longitudinal direction of the cleaning nozzle (Fangsang intersecting at right angles with the moving direction of the cleaning nozzle) are in the longitudinal direction of the support body 14, which is the moving direction of the cleaning nozzle described later. It is provided with a plurality of states. Each tip of the plurality of support bolts 1 4 a protrudes from the first substrate support body through a bolt insertion hole 1 4 c and a corresponding bolt insertion hole 1 3 c or a bolt common notch 1 3 d. The space between the substrate 13 and the substrate W is such that the substrate W can be supported by the lower side at each tip. The tip of each support pin 1 4 a has a shape in which the head portion that comes into point contact with the substrate W becomes narrower, and there is very little particle adhesion to the substrate W. The lower end of each support bolt 1 4 a is connected to a support bolt drive solenoid (support body drive means) of a lift drive device (a lift drive device for the support body) of a support bolt (not shown). Further, as shown in Fig. 4, support body support plates 1 4 f are provided at the corner portions of the second substrate support body 14. A drive source (not shown) such as a cylinder is provided as a substrate position adjustment mechanism on these support body support plates 1 4 f, and the support plate 1 4 f is moved back and forth, left and right, and the second substrate support is adjusted by the action of the drive source. The horizontal position of the body 14 makes it possible to finely adjust the position of the substrate W supported on the tip of the support pin 14 a. As shown in FIG. 1, a pair of bracket bases 16 are provided at positions facing each other across the substrate holding portion 3, and cleaning nozzles 4, 5, and 6 are set between these bracket bases 16. , 7. The cleaning nozzles are arranged in parallel to the paper size and apply the Chinese National Standard (CNS) A4 specification (210 X 297 mm) h --------- ----- 丨 丨 Order ||! | Line 4 ^^ _ (Please read the notes on the back before filling out this page) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and Consumer Affairs Co., Ltd. 4 421827 A7 _ B7 V. Description of the invention (17 > (Please read the notes on the back before (Fill in this page) is composed of a plurality of nozzles (in the case of this embodiment, four nozzles), and the cleaning nozzles 4 '5, 6, and 7 are cleaned by different cleaning methods. In the embodiment, the four nozzles are an ultraviolet cleaning nozzle 4 that supplies ozone to the bottom surface of the substrate W and irradiates ultraviolet rays from an ultraviolet lamp (not shown) to mainly decompose and remove organic matter, and for example, the fifth and fifth nozzles, As shown in FIG. 6, the bottom surface of the substrate W is supplied with hydrogen-containing water, and is ultrasonically cleaned by an ultrasonic element (ultrasonic application means). 2 5 The hydrogen-containing water ultrasonic cleaning nozzle 5 is cleaned by applying ultrasonic vibration, and the substrate is cleaned. The bottom surface of W is supplied with ozone water and washed with ultrasonic vibration by an ultrasonic element. Ozone water ultrasonic cleaning nozzles 6 and pure water / water cleaning nozzles 7 that supply pure water to the bottom surface of the substrate w for rinsing and washing. These four nozzles are configured with a plurality of support pins 1 Between the bottom surface of the substrate W supported by each of the leading ends of the 4 a and the substrate holding portion 3, in order to keep the distance from the substrate W constant, the linear guides 17 on the bracket base 16 can be sequentially sequentially The composition of the movement. The consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is the nozzle movement method here. As shown in Figures 5 and 6, it can move horizontally along the linear guides 17 on the base 16 of each bracket. Each of the sliding bodies 18 is provided with pillars 19 standing on the upper surfaces of the respective sliding bodies 18, and both ends of each of the cleaning nozzles 4, 5, 6, and 7 are fixed to these pillars 19. The sliding body 18 is provided with a driving source such as a motor 20, and each sliding body 18 can be self-propelled on the bracket base 16. The sliding body 18 is provided by a control unit (not shown) of the device. The control signal of each of the motors 20 on each of the sliding bodies 18 is actuated, and the cleaning nozzles 4 and 5 are activated. Composition of individual horizontal movements 6 and 7. In addition, at the pillar -20- This paper size applies the Chinese National Standard (CNS) A4 specification (210 x 297 mm) Printed by the Consumer Consumption Agency of the Intellectual Property Bureau of the Ministry of Economic Affairs 42 彳 827 V. Description of the invention (18) 1 9 is provided with a driving source such as a cylinder (not shown), and the height of each cleaning nozzle 4, 5, 6, 7 can be adjusted by moving the pillar 19 up and down, that is, The interval between each cleaning nozzle and the substrate W. The moving speed of the cleaning nozzle by the moving means of such a nozzle is about 1 to 5 mm / sec when the substrate w is 1 m rectangular. Figs. 5 and 6 are diagrams showing an example of the configuration of, for example, a hydrogen-containing water ultrasonic cleaning nozzle 5 among the four cleaning nozzles. Since the basic shapes of the other nozzles are the same, they will be explained here. The cleaning nozzle 5 is formed on one side to guide the cleaning liquid. The introduction port 2 1 a is an introduction path 21 and the other side is provided with a drain for discharging the cleaning liquid. A discharge passage 'of the outlet 2 2 a is provided between these introduction passages 21 and 2 with a guide member 23 for guiding the cleaning liquid introduced by the introduction passage 21 and cleaning the processing substrate W. The guide member 23 has an opening portion 24 that opens toward the substrate W, and is referred to as a push-pull nozzle (a fluid-saving nozzle). In this case, the openings 24 extend at least the width of the substrate W in a direction intersecting with the parallel directions of the cleaning nozzles 4, 5, 6, and 7 (in the case of the present embodiment, The clean nozzle, the guide member 23, and the openings 24 are provided in three groups, and the three groups of the openings 24 are combined to extend the length of the substrate W or more). In addition, the pressure control unit (not shown) flows the cleaning liquid that contacts the substrate W to the discharge passage 22 after cleaning, and maintains the pressure of the cleaning liquid (including the cleaning liquid) that is in contact with the atmosphere of the opening 2 4. The surface tension of the substrate and the surface tension of the substrate to be cleaned) and the atmospheric pressure are provided in a balanced manner on the discharge path 22 side. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) nn ί I nn-». *** _ (Guess to read the precautions on the back before filling out this page) Staff Consumption of Intellectual Property Bureau, Ministry of Economic Affairs Included 4 printed 421827 A7 _ _ B7 V. Description of the invention (19) The above pressure control unit is composed of a pressure reducing pump provided at the discharge port 2 2 a side. That is, the pressure control unit on the side of the discharge passage 22 uses a pressure reducing pump to control the force of the cleaning liquid that attracts the guide member 23 with the pressure reducing pump, so as to make the cleaning solution in contact with the atmosphere of the opening 24. The pressure of the cleaning solution (including the surface tension of the cleaning solution and the surface tension of the substrate to be cleaned) is balanced with the atmospheric pressure. The pressure P w (including the surface tension of the cleaning solution and the surface tension of the substrate to be cleaned) of the cleaning solution that is in contact with the atmosphere of the opening 24 is almost equal to the pressure of the atmospheric pressure P a and passes through the opening. The cleaning liquid supplied to the substrate W and contacting the substrate W can be discharged to the discharge path 22 without leaking to the outside of the cleaning nozzle. That is, the cleaning liquid supplied to the substrate W from the cleaning nozzle does not contact the portion other than the portion (opening 2 4) on the substrate W where the cleaning liquid is supplied, and c is removed from the substrate W. When supplying the cleaning liquid to the cleaning nozzle 5 configured as described above, the cleaning nozzle 5 is supplied so that the moving direction S of the cleaning nozzle 5 and the direction of the flow of the cleaning liquid in the cleaning nozzle 5 are opposite to each other. It is preferable that the moving direction S of the cleaning nozzle 5 and the flow direction ii of the cleaning liquid be the same, since the cleanliness of the substrate can be improved. In addition, the wetted surface of the cleaning nozzle is made of a fluorinated resin such as PFA, or a stainless steel having a passive surface with only a chromium oxide on the outermost surface using the used cleaning liquid, or the surface is oxidized. Stainless steel with a mixed film of aluminum or chromium oxides is preferably titanium, which has an electrolytic honing surface for ozone water, and does not dissolve impurities in the cleaning solution. If the wetted surface is made of quartz, it is suitable for all cleaning liquids except hydrofluoric acid. This paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm) -22- ϋ ϋ nnn II > nn I n 1 n a n · «^ 1 I (Please read the precautions on the back before filling (This page) Employee Consumption Agreement of the Intellectual Property Bureau of the Ministry of Economic Affairs: Printed by the agency 421827 A? B7 V. Description of the invention (2Q) Furthermore, an ultrasonic wave is provided below the guide member 23 in a direction opposite to the plug W Element (ultrasonic application means) 25. When the substrate W is cleaned, an ultrasonic wave is applied to the cleaning liquid and the substrate W. The ultrasonic element 25 is capable of outputting an ultrasonic wave having a frequency of 19 K Η z or higher. In particular, from the viewpoint of maintaining the thickness of the cleaning liquid layer, a frequency of 0.2 MHz or higher is preferred. In the configuration of the cleaning nozzle of this embodiment, the hydrogen-containing water ultrasonic cleaning nozzle 5 and the ozone water ultrasonic cleaning nozzle 6 are configured as described above. These only cleaning liquids are hydrogen-containing water. The difference with ozone water. In the case of the ultraviolet cleaning nozzle 4, an ultraviolet lamp may be provided instead of the ultrasonic element 25 of Fig. 6, and ozone gas may be supplied into the nozzle to constitute it. With this configuration, the substrate W is supplied with ozone gas and irradiated with ultraviolet rays, and organic substances are specifically decomposed and removed by the action of the generated hydroxyl radicals. Where it is desired to prevent ozone gas from leaking to the outside, an air curtain mechanism may be provided. In addition, as for the nozzle 7 for pure water cleaning, it is only necessary to remove the ultrasonic element 25 of Fig. 6 and simply supply pure water to the nozzle and discharge it. In addition, the distance Η between the openings 24 of the cleaning nozzles 4, 5, 6, and 7 and the substrate W is preferably within a range of 8 in m or less without contacting the substrate W, and more preferably 5 mm or less and not being in contact with the substrate. The range of W contact is more preferably a range of 3 mm or less that is not in contact with the substrate W. If it exceeds 8 mm, it becomes difficult to fill the desired cleaning liquid between the substrate W and the cleaning nozzle W, and cleaning is not easily achieved. That is, the supporting and moving mechanism of the cleaning nozzles, such as the bracket base 16, the sliding body 18, and the pillar 19, etc., are applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm). ) -23- l · ------------------- Order --------- J). < Please read the note on the back before filling this page) A7 B7 421827 V. Description of the invention (21) It is necessary to maintain this interval between the substrate W and the cleaning and warming nozzle. That is, a distance sensor that monitors the distance between the substrate W and the cleaning nozzle may be provided depending on the occasion. In the substrate cleaning apparatus 1 according to this embodiment, each of the cleaning nozzles 4, 5, 6, and 7 has a double support structure in which both ends are supported by pillars 19, and the bracket base 16 and the sliding body 18 'The nozzle moving means composed of the motor 20 etc. can keep the interval between each cleaning nozzle and the substrate constant, and the entire area of the cleaned surface of the substrate W can be cleaned by horizontal movement, which can be adjusted with high accuracy. The distance between the cleaning nozzle and the substrate W during cleaning. In particular, in this embodiment, since the distance 开口 between the opening 2 4 of the cleaning nozzle and the substrate W must be precisely controlled to a level of several millimeters to a level of 0.1 mm by a push-pull cleaning nozzle, By using a double-support structure for the cleaning nozzle, the advantages of high cleaning efficiency of the push-pull nozzle can be fully utilized. When the lifting driving device of the support bolt of this embodiment moves sequentially along the bottom surface of the substrate W, each of the cleaning nozzles 4, 5, 6, and 7 moves At this time, the plurality of support bolts 1 4 a in the front of the direction of movement of the cleaning nozzle are linked to the movement of the cleaning nozzle so as not to interfere with the moving cleaning nozzle, so as to raise and lower the mover. The schematic configuration of the lifting drive device of the support bolt of the first embodiment includes a drive source such as a motor 20 for driving each of the sliding bodies 18 along a linear guide 17 on the bracket base 16 and a drive source. The control unit of the connected device and the connected sequencer (control means) (not shown), and the support bolt driving solenoid (support body drive means) connected to the sequencer. This paper size applies to China National Standard (CNS) A4 (210 X 297 public love) l · ------------------- Order --------- Line ", (Please read the precautions on the back before filling this page) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs Employee Consumption Cooperative -24- A7 421Q27 __B7_ V. Description of the invention (22) The above sequencer is used according to the above cleaning The multiplication of the moving speed of the nozzle and the specified moving time outputs a pulse signal (driving signal) that lowers the support pin 14a in the forward direction of the cleaning nozzle, and then outputs the support that is lowered by the cleaning nozzle. A pulse signal (driving signal) that raises the support bolt 14 a after the bolt 1 4 a is raised. The above-mentioned support bolt driving solenoid is to make the support bolt when the descending pulse signal (driving driving signal) is input from the sequencer. 1 4 a is lowered, and the above-mentioned rising pulse signal (rising drive signal) is input, and after the cleaning nozzle passes above the lowered support bolt 1 4 a, the support bolt 1 4 a is raised. Here, for washing Multiplication of nozzle moving speed and specified moving time That is, the position of the cleaning nozzle is, for example, the sliding body 18 that is mounted by the cleaning nozzle 5 to be described later along the linear guide 17 on the bracket base 16 when the sliding body 18 is horizontally moved. The product of the moving speed and the moving time is detected. Based on this detection, the plurality of support pins 1 4 a in the front of the moving direction of the cleaning nozzle 5 are not interlocked with the moving cleaning nozzle 5. When the cleaning nozzle 5 is moved up and down, the positions of the rows of the plurality of support pins 1 4 a are memorized in the sequencer in advance, and the moving speed of the sliding body 18 to which the cleaning nozzle 5 is mounted is moved. The product of the product of the moving time and the moving speed of the cleaning nozzle and the product of the specified moving time are used to determine the distance between the moving nozzle 5 and the support bolts 1 4 a and the distance between the columns. Furthermore, the cleaning nozzle 5 which is horizontally moved at a specified speed, and the support bolt 1 4 a in the forward direction of the cleaning nozzle 5 are set in advance. The paper size of this paper applies the Chinese National Standard (CNS) A4 standard. (210 X 297 mm l ------------------------------ Order --------- line, (Please read the notes on the back before filling this page) Intellectual Property of the Ministry of Economic Affairs Printed by the Bureau of Consumption of Employees of the Bureau ^ 25- Consumption of Employees of the Bureau of Intellectual Property of the Ministry of Economic Affairs ^: Printed by the Society ^ 21827 V. Description of the Invention (23) The column is closer than the specified distance to make the support bolts 1 4 a each column began to decline The distance between the cleaning nozzle 5 and the row of the support pins 1 4 a (falling start distance), and the cleaning on the column passing the descending support pin 14 a. The nozzle 5 and the descending support pin 1 The row of 4 a is farther than the designated distance from the distance (rising start distance) between the cleaning nozzle 5 and the row of the support pins 1 4 a when the supporting pins 1 4 a start to rise in each row. When the substrate W is cleaned, each of the rows of the cleaning nozzle 5 and the support pin 1 4 a is detected by the product of the moving speed and the moving time of the sliding body 18 which is horizontally moved by the above sequencer. When the detection distance becomes less than the above-mentioned descending start distance, the sequencer outputs a descending pulse signal to the supporting bolt driving solenoid to cause each row of the supporting bolts 1 4 a in the forward direction of the cleaning nozzle 5 to move. When the detection signal becomes lower than the rising start distance, the sequencer outputs a rising pulse signal to the support bolt driving solenoid, so that each row of the falling support bolts 14a can be raised. As shown in FIG. 1, a hydrogen-containing water / ozone water generating unit 1 1 (washing liquid manufacturing means) and a washing liquid regeneration unit 12 (washing liquid regeneration means) are provided on the side of the washing unit 2. . The hydrogen-containing water / ozone water generating section 11 is incorporated into a hydrogen-containing water generating device 27 and an ozone-water generating device 28, which are used as cleaning liquids in this device. Any washing liquid is generated by dissolving hydrogen gas or ozone gas in pure water, and the hydrogen-containing water 1 generated by the hydrogen-containing water generating device 2 7 is provided by the hydrogen-containing water. The supply pipe 29 in the middle of the supply pipe 29 is configured to be supplied to the hydrogen-containing water ultrasonic cleaning nozzle 5 (cleaning liquid supply means). Similarly, the ozone water produced by the ozone water generating device 28 is installed in the ozone water supply pipe, and the paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) _ 26-l · II- ---------------- Order ii (Jing first read the precautions on the back before filling out this page) line. A7 B7 421827 V. Description of the invention (24) 3 1 The liquid delivery help on the way The pump 32 is configured to be supplied to the ozone water ultrasonic cleaning nozzle 6 (cleaning liquid supply means). In addition, ozone gas is supplied to the ultraviolet cleaning nozzle 4 from an arbitrary ozone gas supply source (not shown), and pure water and water cleaning nozzle 7 are supplied to a pure water supply pipe (omitted in the production line). (Illustrated) Supply pure water. Filters 3, 3, and 4 are provided in the cleaning solution regeneration unit 12 for removing particles or foreign matter contained in the cleaning solution after use. The hydrogen-containing water filter 3 3 for removing fine particles in hydrogen-containing water and the ozone-water filter 3 4 for removing fine particles in ozone-water are different systems. That is, ultrasonic cleaning from hydrogen-containing water The used hydrogen-containing water discharged through the discharge port of the nozzle 5 is recovered to the hydrogen-containing water filter 33 (washing liquid recovery means) by a liquid feed pump 36 provided in the middle of the hydrogen-containing water recovery pipe 35. ). Similarly, the ozone water after use discharged from the outlet of the ozone water ultrasonic cleaning nozzle 6 is recovered to the ozone water filter by the liquid feed pump 38 installed in the middle of the ozone water recovery pipe 37.器 34 4 (wash liquid recovery means). Each of the filters 3, 3, and 4 has a structure as shown in FIG. 7 'a tube body 39, which is arranged in the center to circulate the cleaning liquid after use and has the function of allowing the cleaning liquid to pass through the tube wall. A plurality of filter materials 40 made of Teflon resin are arranged around the periphery, and a grid plate 41 is provided to block the flow of the cleaning liquid inside the pipe body 39. That is, when the used washing liquid is introduced from the inlets 4 2 of the filters 33 and 34, the washing liquid is filtered by the filter medium 40 when the washing liquid flows in the direction of arrow F in FIG. 7. When it returns to the tube body 39 again, it becomes a clean cleaning solution with particles removed, and the paper is discharged from the paper. The standard of China National Standard (CNS) A4 (210 X 297 mm) is applied. L ------ 丨丨 丨 — 丨 丨 ---------------- (Please read the notes on the back before filling out this page) f Printed by the Intellectual Property Bureau Employee Consumer Cooperative of the Ministry of Economic Affairs Α2 ^ δ2Τ A? ___ Β7 _____ 5 、 Explanation of the invention (25) Drain from port 4 3 ^ (Please read the precautions on the back before filling this page) Then, as shown in Figure 1, the hydrogen-containing water passing through the hydrogen-containing water filter 3 3 is used to regenerate hydrogen. The water supply pipe 4 5 provided in the middle of the water supply pipe 4 4 is supplied to the hydrogen-containing water ultrasonic cleaning nozzle 5 (regeneration cleaning liquid supply means). Similarly, the ozone water passing through the ozone water filter 34 is supplied to the ozone water ultrasonic cleaning nozzle 6 (regeneration washing) through the liquid feed pump 4 7 provided in the middle of the regeneration ozone water supply pipe 4 6. Means of liquid supply). In addition, the hydrogen-containing water supply pipe 29 and the regenerated hydrogen-containing water supply pipe 4 4 are connected before the hydrogen-containing water ultrasonic cleaning nozzle 5, and the hydrogen-containing water ultrasonic cleaning nozzle 5 can be connected by the valve 62 2. Introduce new hydrogen-containing water or regenerate hydrogen-containing water. Similarly, the ozone water supply pipe 3 1 and the regenerated ozone water supply pipe 4 6 are connected before the ozone water ultrasonic cleaning nozzle 6, and a new one can be introduced into the ozone water ultrasonic cleaning nozzle 6 through the valve 6 3. Ozone water or regenerated ozone water. Also, the hydrogen-containing water or ozone water that has passed through each of the filters 3, 3, and 4 can be returned to the hydrogen-containing water generating device 27 or the ozone-water generating device through the piping because the concentration of the gas in the water is reduced. 2 8. Replenish hydrogen gas or ozone gas. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-As shown in Figure 1, a loading cassette 9 and a loading cassette 10 are detachably mounted on the side of the cleaning unit 2. The two cassettes 9, 10 are of the same shape that can accommodate a plurality of substrates W. The cassette 9 is loaded to accommodate the substrate W before cleaning, and the cassette 10 is configured to accommodate the cleaned substrate W. A substrate transfer robot arm 8 is provided at a middle position between the cleaning unit 2, the loading cassette 9, and the loading cassette 10. The substrate transfer robot arm 8 has a ^ 20 on its upper part. This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) A7 B7 421827 V. Description of the invention (26) The arm of the flexible linkage mechanism The 4 8 'arm portion 48 is rotatable and can be raised and lowered, and the substrate W is supported and conveyed by the tip end portion of the arm portion 48. (Please read the precautions on the back before filling in this page.) Figures 8 and 9 show the state where the arm parts 4 8 of the substrate transfer robot 8 extend above the substrate holding part 3. As shown in FIG. 8, the front fork 4 9 of the arm portion 4 8 is located on the first substrate supporting body 1 3 and the supporting bolt 1 4 a protruding from the bolt insertion hole 1 3 c or the bolt universal notch 1 3 d. Between the columns. The substrate transfer robot arm 8 that picks up the substrate W before cleaning is loaded by the loading cassette 9. When the substrate W is transferred to the substrate holding portion 3, as shown in FIG. 9, the substrate is lifted by the support pins 1 4 a. The arm portion 48 supporting the substrate W is brought into the upper side of the substrate holding portion 3, and the arm portion 48 is lowered to the tip of the plurality of support pins 14a to place the substrate W thereon. After that, the arm portion 48 is further lowered to the outside of the substrate holding portion 3, and the substrate W is placed on the tip of the plurality of support pins 1 4a as shown in Fig. 2 and is held. In addition, the front fork 4 9 of the arm portion 4 8 of the substrate transfer robot 8 is configured so that the upper convex portion 4 9 a is in point contact with the substrate, so that there is little foreign matter adhesion to the substrate W. The consumer equipment company of the Intellectual Property Bureau of the Ministry of Economic Affairs printed the cleaning device 1 having the above configuration, and the operator set, for example, the interval between the cleaning nozzles 4, 5, 6, and 7 and the substrate W, and the moving speed of the cleaning nozzle. Except for various washing conditions such as the flow rate of the washing liquid, the operation of each unit is controlled by the control unit to constitute an automatic operation. That is, when the cleaning device 1 is used, the substrate W before cleaning is set in the loading cassette 9, and when the start switch is operated by the operator, the substrate W is transferred from the loading cassette 9 by the substrate transfer robot arm 8. To the substrate holding portion 3, as shown in FIG. 10, the substrate is inserted from the first substrate support body 13 by the bolt insertion hole 1 3c and the bolt insertion common gap -29- This paper standard applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 42182 printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs: 5. Description of the invention (27) Each apex of the plurality of supporting bolts 1 4 a is prominent. When the cleaning nozzles 4, 5, 6, and 7 are sequentially sent along the bottom surface of the substrate W from one end side to the other end side of the cradle base 16, each cleaning nozzle is shown as shown in FIG. 11 each time. When approaching, each row of the plurality of support pins i 4 a in the moving direction of the cleaning nozzle is lowered, and at this time, the substrate is held at each tip of the plurality of support pins 1 4 a that have not fallen. Next, as shown in FIG. 12, the support pins 1 4 a that are lowered when the cleaning nozzles pass are raised again in each row to hold the substrate W again at their tips. That is, the four cleaning nozzles 4, 5, 6, and 7 are not interfered by the support bolts 14a, and the bottom surface of the cleaning substrate W. passes through the substrate W and the first substrate support 1 3 in sequence at the same time. In the meantime, the entire area of the bottom surface of the substrate W is sequentially subjected to ultraviolet cleaning, hydrogen-containing water ultrasonic cleaning, ozone water ultrasonic cleaning, deionizing water cleaning, etc. by the cleaning nozzles 4 '5, 6, and 7 in this order. As shown in FIG. 13, the cleaning nozzles 4, 5, 6, and 7 after cleaning the substrate are arranged on the other end side of the cradle base 16.淸 After washing with water, the support bolt 14 a is lowered and buried in the bolt insertion hole 1 4 c of the second substrate supporting body 14, and the bottom surface of the substrate W is supported by the first substrate as shown in FIG. 14. The apex support of the plurality of support bolts 1 3 a of the body 1 3 is simultaneously supported by the fixing bolts 1 3 b. Next, the rotating shaft driving source connected to the rotating shaft 1 3e for supporting body rotation is operated to rotate the first substrate supporting body 13 to rotate and dry the substrate W. The dried substrate W is stored in the carrier cassette 10 by the substrate transfer robot 8. In the cleaning device 1 of this embodiment, each tip of the plurality of support pins 14 a can be supported from the lower side of the substrate, and the cleaning nozzles 4, 5, 6, 7 that supply the cleaning liquid to the bottom surface of the substrate W can be moved along The paper size of the substrate W applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -30- -------------------- Order ---- ----- Line, (Please read the precautions on the back before filling this page) 421827 A7 __B7______ 5. Description of the invention (28) The bottom surface moves, and then the lifting and lowering driving device of the above-mentioned support bolt uses the above-mentioned cleaning nozzle. The support bolts 1 4 a in the forward direction are constructed so that they can move up and down without interfering with the movement of the cleaning nozzles. Each of the plurality of support bolts 1 4 a If the substrate W is supported on the lower side at the front end, and the cleaning nozzles 4, 5, 6, and 7 are sequentially moved along the bottom surface of the substrate W, the support bolt 1 4a in the forward direction of the cleaning nozzle is lowered. For this reason, it does not interfere with the moving cleaning nozzle, and the lowered support pin 1 4 a is used for cleaning. After rising through the mouth, its tip may again support substrate W. That is, the substrate cleaning apparatus 1 according to the present embodiment is different from the previous substrate cleaning apparatus that simultaneously cleans substrates by carrying the rollers, and the cleaning nozzles 4, 5, 6, and 7 are arranged along the substrate. The bottom surface of W can be used to clean the bottom surface of the substrate W without moving the substrate W. Therefore, the length of the substrate cleaning device in the production line can be shortened, and the area occupied by the device can be reduced. The distance can also be greatly shortened, and the moving range of the cleaning nozzle can be as large as the size of the substrate described above. In the cleaning process, it is not necessary to consume huge equipment costs or occupy space, and a reasonable device can be achieved. Furthermore, in the substrate cleaning apparatus 1 of this embodiment, each of the four cleaning nozzles 4, 5, 6, and 7 is cleaned by ultraviolet rays, ultrasonic cleaning with hydrogen-containing water, ultrasonic cleaning with ozone water,构成 The structure of the washing process by different washing methods, such as water washing, can be carried out by this device with various washing methods. That is, for example, after organic matter is removed by ultraviolet washing, ultra-fine water washing with hydrogen-containing water or ozone water is used to remove fine particle size ---------------- ---- Order --------- line (please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs-This paper size applies to Chinese National Standards (CNS) A4 specification (210 X 297 mm) -31-Consumption of employees of the Intellectual Property Bureau of the Ministry of Economic Affairs ^: Printed by the agency 421827 A7 __B7 V. Description of the invention (29) After the micro particles, rinse with rinsing water to rinse and adhere the substrate surface The washing liquid is subjected to final washing at the same time, so that various objects to be removed can be sufficiently washed and removed. As a result, even if there are various removal objects such as fine particles and organic substances, this can be surely washed and removed. In addition, even if multiple cleaning methods are performed, it is not necessary to consume huge equipment costs or occupy space in the cleaning process, and a reasonable device can be achieved. In the case of the substrate cleaning apparatus 1 of the present embodiment, by using the push-pull nozzle having the above-mentioned configuration as a cleaning nozzle, when a cleaning solution is supplied from the introduction path 21 to the surface of the substrate W, The surface of the substrate other than the cleaning liquid may not be in contact with the cleaning liquid, and the cleaning liquid containing the object to be removed is discharged from the discharge path 22 to the outside, and the substrate is washed with a conventional cleaning nozzle. Compared with the cleaning apparatus, the cleanliness of the substrate W after cleaning can be significantly improved. In addition, in a substrate cleaning apparatus using a conventional general cleaning nozzle, a large amount of cleaning liquid is required to improve the cleaning degree. In the substrate cleaning apparatus 1 of this embodiment, sufficient cleaning can be obtained by the above-mentioned effect. At the same time, by controlling the attraction force from the discharge port 2 2 a to the pressure of the cleaning solution at the nozzle opening 24, the cleaning solution can be discharged without leaking to the outside, so the cleaning solution can be greatly reduced. Usage amount ° Furthermore, in the case of the substrate cleaning apparatus 1 of this embodiment, the cleaning nozzles 5 and 6 are provided with the ultrasonic element 25 which imparts ultrasonic vibration to the substrate W, and can be cleaned from each When the substrate W is cleaned with the cleaning liquid supplied from the nozzle, the ultrasonic wave is applied to the cleaning liquid and the substrate w. Compared with a case where no ultrasonic wave is applied, the paper to be removed is removed from the paper. Standards are applicable to China National Standard (CNS) A4 specifications (210 * 297 mm) -32- Bu -------------------- Order -------- -Line, (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 4 218 2 7 A7 ____B7___ 5. Description of the invention (30) The efficiency is improved, and the cleaning degree of the substrate w after cleaning can be improved. In addition, in the case of the device 1 of the present embodiment, a hydrogen-containing water / ozone water generating unit 11 is provided, and the ozone water generating device 2 8 is integrated into the washing device. Especially, the life of the ozone water is short, so The invention can be used for cleaning while maintaining the quality of ozone water, and can effectively perform ultrasonic cleaning of ozone water. Furthermore, the cleaning liquid regeneration unit 12 is provided to recover and reuse a cleaning liquid such as hydrogen-containing water or ozone water, which has been used before, thereby reducing the amount of cleaning liquid used. The device 1 of the present embodiment can be used in a manufacturing line of a liquid crystal display panel or the like for permanent use in a substrate cleaning process. However, as described above, the device 1 can be appropriately moved to a necessary place for use. In addition, the case where the bottom surface cleaning nozzle provided with the cleaning nozzles 4, 5, 6, and 7 configured as described above as the bottom surface of the cleaning substrate W in the apparatus 1 of the present embodiment has been described above. Ultraviolet rays may also be used on the upper surface cleaning nozzles that move along the upper surface of the substrate W as shown by the two-dot chain lines in FIG. 2 and FIG. 10 to FIG. Nozzle 4a for cleaning, 5a for ultrasonic cleaning with hydrogen-containing water, 6a for ultrasonic cleaning with ozone water, and 7a for pure water and water cleaning. When the above-mentioned upper-surface cleaning nozzles 4 a, 5 a, 6 a, and 7 a are provided in addition to the bottom-surface cleaning nozzles 4, 5, 6, and 7 as described above, both sides of the substrate W can be cleaned at one time. Compared with the case where only the cleaning nozzle for cleaning the bottom surface of the substrate is provided, the cleaning efficiency of the substrate W is improved, and the time required for the cleaning process can be shortened. In addition, in the device 1 of this embodiment, the support bolt 1 4 a apex This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -33- -------------------- Order --- ------ (Please read the precautions on the back before writing this page)
經濟部智慧財產局員工消費合作杜印製 I 421827 A7 B7 五、發明說明（31) ，因爲是與基板W成點接觸的先端狹窄形狀，所以對基板 W的粒子附著極少，也可以如第1 5圖所示在第二基板支 撐體1 4，設有連通於栓插通孔1 4 c的氣體供給孔7 1 的構造。根據如此構成的裝置，在使各支撐栓1 4 a埋沒 於栓插通孔1 4 c的狀態下，從未圖示的氣體供給源對氣 體供給孔7 1供給氮氣氣體等非活性氣體，可以將附著於 支撐栓1 4 a的先端的被除去物等從支撐栓1 4 a的先端 除去，可以提高支撐拴1 4 a的先端的淸淨度，可防止再 污染基板W。 第2實施形態 以下，參照第1 6圖與第1 7圖說明本發明的第2實 施形態。 本實施形態的洗淨裝置，也與第1實施形態同樣，是 大型玻璃基板用洗淨裝置。本實施形態的裝置與第1實施 形態的裝置不同之處，僅在於支撐栓的升降驅動裝置（支 撐體的升降驅動裝置）的構成而已，載入器、載出器、搬 送機械手臂等基板搬送系、洗淨液產生部，洗淨液再生部 等，洗淨部的基板保持部以及其他的構成與第1實施形態 幾乎相同。因此，在第1 6圖只圖示洗淨部，在第_1 7圖 只圖示第1 6圖的XV I — XV I線剖面圖而已，省略其 他部份。 第2實施形'態的支撐栓的升降驅動裝置的槪略構成， 具有托架基座16上沿著直線導軌17設置的複數近距開 本紙張尺度適用中國國家標準（CNS)A4視格（210 X 297公釐） l·-------------------訂---------線} (請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合^:社印製 421827 五、發明說明（32) 關（驅動訊號產生手段）8 1，及被設於滑動體1 8的底 面的近距開關按壓部（近距開關）8 2，被接續於複數支 撐栓1 4 a的下端部的未圖示的支撐栓驅動螺線管（支撐 體驅動手段）。 各近距開關8 1 ，對應於複數支撐栓1 4 a的列而被 設置。近距開關按壓部8 2，當滑動體1 8沿著托架基座 1.6的直線導軌1 7移動，依序通過被設於托架基座1 6 上的複數近距開關8 1上時，依序按壓這些近距開關8 1 。近距開關8 1在按壓部8 2被按壓時成爲打開〇 N ’輸 出使被安裝於滑動體18的洗淨用噴嘴5的移動方向前方 的支撐栓1 4 a下降的驅動訊號。此時，下一個近距開關 8 1被按壓時，輸出使藉由來自先前被按壓的近距開關 8 1的下降驅動訊號而下降的支撐栓1 4 a上升的驅動訊 號。 此處之支撐栓驅動螺線管，在來自近距開關8 1的下 降驅動訊號被輸入時使支撐栓1 4 a每一列下降’接著藉 由輸入的上升驅動訊號在洗淨用噴嘴5通過了下降的支撐 栓1 4 a的列的上方之後使支撐栓1 4 a每一列上升。 根據第2實施形態的基板洗淨裝置，藉由上述的構成 ，以複數的支撐栓1 4 a的各個先端由基板W的下方側來 支撐，使洗淨用噴嘴4、5、6、7沿著基板W的底面依 序移動的話，藉由來自近距開關8 1的驅動訊號使洗淨$ 噴嘴的移動方向前方的支撐栓1 4 a下降的緣故’所以+ 會與移動的洗淨用噴嘴相干涉，此外，下降的支撐栓 本紙張尺度適用中國國家標準（CNS>A4規格（210 X 297公釐） -35- l·-----------(¾---- (請先閱讀背面之注意事項再填寫本頁)Consumption Cooperation by Employees of the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by I 421827 A7 B7 V. Description of the Invention (31) Because the tip has a narrow shape that makes point contact with the substrate W, there is very little particle adhesion to the substrate W. FIG. 5 shows a structure in which the second substrate support 14 is provided with a gas supply hole 7 1 that communicates with the plug insertion hole 14 c. According to the device having such a configuration, in a state where each of the support bolts 14 a is buried in the plug insertion holes 14 c, an inert gas such as nitrogen gas can be supplied to the gas supply holes 71 from a gas supply source (not shown). The removal of the object to be attached to the tip of the support pin 14 a from the tip of the support pin 14 a can improve the cleanliness of the tip of the support pin 14 a and prevent recontamination of the substrate W. Second Embodiment Hereinafter, a second embodiment of the present invention will be described with reference to Figs. 16 and 17. The cleaning apparatus of this embodiment is also a cleaning apparatus for large glass substrates, as in the first embodiment. The device of this embodiment differs from the device of the first embodiment only in the configuration of the lifting drive device (elevating drive device for the support body) of the support bolt, and substrate transfer such as a loader, a loader, and a transfer robot arm System, cleaning liquid generating section, cleaning liquid regeneration section, etc., the substrate holding section of the cleaning section and other structures are almost the same as those of the first embodiment. Therefore, only the cleaning part is shown in FIG. 16, and only the XV I-XV I line sectional view of FIG. 16 is shown in FIG. 17, and the other parts are omitted. The second embodiment is a schematic configuration of a lifting drive device for a support bolt in the form of a second embodiment. A plurality of close-up papers provided along a linear guide 17 on a bracket base 16 are provided in accordance with the Chinese National Standard (CNS) A4 viewing frame ( 210 X 297 mm) l · ------------------- Order --------- line} (Please read the precautions on the back before filling in this Page) Consumption of Employees of the Intellectual Property Bureau of the Ministry of Economic Affairs ^: Printed by the company 421827 V. Description of the invention (32) Off (driving signal generating means) 8 1 and the proximity switch pressing part provided on the bottom surface of the sliding body 18 ( Proximity switch) 8 2. An unillustrated support pin driving solenoid (support body driving means) is connected to the lower end portion of the plurality of support pins 1 4 a. Each proximity switch 8 1 is provided corresponding to a row of a plurality of support pins 1 4 a. The proximity switch pressing portion 8 2 moves when the sliding body 18 moves along the linear guide 17 of the bracket base 1.6 and sequentially passes through the plurality of proximity switches 8 1 provided on the bracket base 16. These proximity switches 8 1 are sequentially pressed. The proximity switch 81 is turned on when the pressing portion 82 is pressed, and outputs a driving signal that lowers the support bolt 14a in the forward direction of the cleaning nozzle 5 attached to the sliding body 18 in the moving direction. At this time, when the next proximity switch 81 is pressed, a driving signal for raising the support pin 14a which is lowered by the descending driving signal from the previously pressed proximity switch 81 is output. Here, the support pin driving solenoid lowers each row of support pins 1 4 a when the down driving signal from the proximity switch 8 1 is input, and then passes the cleaning driving signal 5 through the input rising driving signal. After descending above the row of support pins 1 4 a, each row of support pins 1 4 a is raised. According to the substrate cleaning apparatus according to the second embodiment, with the above-mentioned configuration, each tip of the plurality of support pins 1 4 a is supported by the lower side of the substrate W, and the cleaning nozzles 4, 5, 6, and 7 follow If the bottom surface of the substrate W is moved in order, the driving signal from the proximity switch 8 1 will cause the cleaning bolt 1 4 a in the moving direction of the nozzle to move downward. Therefore, + will be related to the moving cleaning nozzle. Interference, in addition, the paper size of the lowered support bolt is applicable to the Chinese national standard (CNS > A4 specification (210 X 297 mm) -35- l · ----------- (¾ ---- (Please read the notes on the back before filling this page)
BV H 訂---------線_ 421827 A7 B7 五、發明說明（33 ) 1 4 a在洗淨用噴嘴通過後上升，可以其先端再度支撐基 板W » <請先閱讀背面之注意事項再填寫本頁) 亦即，於第2實施形態的基板洗淨裝置，也可以達到 與第1實施形態同樣的效果。 第3實施形態 以下，參照第1 8、1 9圖說明本發明的第3實施形 態。 本實施形態的洗淨裝置，也與第1實施形態同樣，是 大型玻璃基板用洗淨裝置。本實施形態的裝置與第1實施 形態的裝置相異之處，僅在於支撐栓的升降驅動裝置（支 撐體的升降驅動裝置）的構成而已，洗淨部的基板保持部 、載入器、載出器、搬送機械手臂等基板搬送系、洗淨液 產生部，洗淨液再生部等，以及其他的構成與第1實施形 態幾乎相同。 經濟部智慧財產局員工消費合Ϋ社印製 因此，在第1 8圖只圖示從與洗淨用噴嘴的移動方向 交叉的方向所見之洗淨部的基板W的下方，在第1 9圖只 圖示由沿著洗淨用噴嘴的移動方向的方向所見之洗淨部的 洗淨用噴嘴5以及其周邊部，及此洗淨用噴嘴移動時的支 撐栓1 4 a的動作而已，而省略其他部份。 第3實施形態的支撐栓的升降驅動裝置的槪略構成， 具有將各支撐栓（支撐體）1 4 a朝上方彈壓的支撐栓保 持構件（支撐體保持構件）8 5，及被設於支撐栓1 4 a 的受壓體9 0，及被設於洗淨用噴嘴5朝向該洗淨用噴嘴 -36 - 本紙張尺度遶用中國國家標準（CNS)A4規格（210 X 297公釐） A7 B7 42182了 五、發明說吗（34) 5的至少移動方向前方（在第1 8圖爲移動方向前方以及 後方）延伸，隨著洗淨用噴嘴5的移動而抵接於該移動方 向前方的支撐栓1 4 a的受壓體9 0同時抵抗支撐栓保持 構件8 5的彈壓力而將上述前方的支撐栓1 4 a壓下的壓 下體9 5。 在第3實施形態的各支撐栓1 4 a的下端部，通往栓 保持板8 9。於此栓保持板8 9與第二基板支撐體1 4之 間設有支撐栓保持構件8 5。 支撐栓保持構件8 5，由栓保持板8 9側起依序由第 —彈簧構件8 6、彈簧構件安裝板8 7、一對第二彈簧構 件8 8等所構成，支撐栓1 4 a通過這些第一彈簧構件 8 6與彈簧構件安裝板8 7同時存在於一對第二彈簧構件 8 8之間。 第一彈簧構件8 6的下端部被安裝於栓保持板8 9， 上端部被安裝於彈簧構件安裝板8 7，此彈簧安裝板8 7 被固定於支撐栓1 4 a ，進而於此彈簧構件安裝板8 7分 別被安裝一對第二彈簧構件8 9的下端部，其上端部分別 被安裝於第二基板支撐體1 4。此外，一對第二彈簧構件 8 6與支撐栓1 4 a之間，限制第一彈簧構件8 6的伸張 量，有決定支撐栓1 4 a的上升時的位置之限制器8 8 a 中介著。 另一方面，從第一基板支撐體1 3突出的各支撐栓 14a，被設有受壓體90。受壓體90，係由被安裝於 支撐栓1 4 a的滾軸支撐板9 1，及被設於滾軸支撐體 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -37 - J--------------------訂---------線^ (請先閱讀背面之注意事項再填寫本頁》 經濟部智慧財產局員工消費合七社印製 A7 421827 __B7____ 五、發明說明（35) 9 1的一對滾軸9 2所構成。這一對滚軸9 2，成爲嵌入 被設於後述的壓下體9 5的一對凸輪9 6的溝內的狀態。 壓下體9 5，係由向下凸起的一對凸輪9 6，與分別 被設在一對凸輪9 6的溝內而導引一對滾軸9 2的導引板 9 7所構成者。 在第3實施形態的基板洗淨裝置，因爲設有如上述構 成的支撐栓的升降驅動裝置，所以如第1 9圖所示，洗淨 用噴嘴向S方向移動的話，被設於其移動方向前方的支撐 栓1 4 a的一對滾軸9 2被按壓於設在洗淨用噴嘴5的導 引板9 7而被導向設於一對凸輪9 6的溝。進而，洗淨用 噴嘴5移動時，使一對滾軸9 2上由凸輪9 6的前端部（ 進行方向的端部）通過最下部，此時，因爲藉由凸輪9 6 使按壓力增大的緣故滾軸支撐板9 1徐徐被按下，而第一 彈簧構件8 6縮短，伴隨此而第二彈簧構件8 8伸長，支 撐栓1 4 a徐徐被按下。進而，洗淨用噴嘴5移動的話， 後端部由凸輪9 6的最下部通過一對滾軸9 2上。此時， 凸輪9 6產生的按壓力減少，此外因爲支撐栓1 4 a藉由 支撐栓保持構件8 5向上方彈壓的緣故，滾軸支撐板9 1 徐徐上升1第一彈簧構件8 6與第二彈簧構件8 8徐徐回 復原狀，支撐栓1 4 a徐徐上升。 根攄第3實施形態的基板洗淨裝置的話，藉由上述的 構成，以複數的支撐栓1 4 a的各個先端由下方側支撐基 板W，使洗淨用噴嘴4、5、6、7沿著基板W的底面依 序移動的話，隨著洗淨用噴嘴的移動而該移動方向前方的 (請先閱讀背面之注意事項再填寫本頁) .¾ 訂---------線D- 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用t國國家標準（CNS>A4規格（210 X 297公釐） -38- 經濟部智慧財產局員工消費合Ϋ社印製 421827 A7 -- _B7____ 五、發明說明（36) 支撐栓1 4 a藉由被設在洗淨用噴嘴的壓下體9 5被壓下 而下降的緣故，所以不會與移動的洗淨用噴嘴相干渉，此 外，因爲下降的支撐栓1 4 a藉由支撐體保持構件8 5而 被賦予彈壓力的緣故，所以伴隨著洗淨用噴嘴的通過而上 升，可以其先端再度支撐基板W。 亦即，於第3實施形態的基板洗淨裝置，也可以發揮 與第1實施形態同樣的效果。 第4實施形態 以下，參照第2 0、2 1圖說明本發明的第4實施形 態。本實施形態的洗淨裝置，也與第1實施形態同樣，是 大型玻璃基板用洗淨裝置。本實施形態的裝置與第1實施 形態的裝置不同之處在於洗淨用噴嘴的構成，載入器、載 出器、搬送機械手臂等基板搬送系、洗淨液產生部，洗淨 液再生部等，洗淨部的基板保持部與支撐栓的升降驅動裝 置，以及其他的構成與第1實施形態幾乎相同。 因此，在第2 0圖只圖示洗淨部的洗淨用噴嘴與其移 動手段，在第2 1圖只圖示沿著洗淨用噴嘴的移動方向的 方向所見之洗淨部的洗淨用噴嘴與基板，而省略其他部份 〇 在第4實施形態，取代第1實施形態的洗淨用噴嘴5 而具備第2 0圖與第2 1圖所示的洗淨用噴嘴5 c。此洗 淨用噴嘴5 c與第1實施形態的裝置所具備的洗淨用噴嘴 5的不同處，在於一個開口部2 4設有複數導入洗淨液的 本紙張尺度適用中國國家標準（CNSXA4規格（210 X 297公釐） -39- ----------导---- (請先閱讀背面之注意事項再填寫本頁) 訂---------線. 經濟部智慧財產局員工消費合#社印製 421827 A7 _____________ B7 五、發明說吗（37) 導入通路（在圖中爲2個通路），而且排出洗淨後的洗淨 液的排出通路也設有複數個（圖中爲2個）的構成，具體 而言’於各導入通路21中介著閥21d設有第1與第2 導入管2 1 b、2 1 c，於各排出通路2 2中介著閥 22 d設有第1、第2排出管22b、22 c。 此外’第1與第2導入管21b、21 c分別接續於 含氫水供給配管2 9、臭氧水供給配管3 1。 _ 此外’第1與第2排出管2 2 b、2 2 c分別接續於 含氫水供給配管3 5、臭氧水供給配管3 7。 如此構成的洗淨用噴嘴5 a，藉由調整閥2 1 d而可 以使供給至開口部2 4的洗淨液由含氫水變更爲臭氧水， 此外，藉由調整閥2 2 d，可以在被供給至開口部2 4的 洗淨液爲含氫水時使洗淨基板W後的洗淨液經過第1排出 管2 2 b而被送出至含氫水回收配管3 5，在被供給至開 口部2 4的洗淨液爲臭氧水時使洗淨基板W後的洗淨液經 過第2排出管2 2 c而被送出至臭氧水回收配管3 7。 根據第4實施形態的基板洗淨裝置，特別是因爲具備 在各導入通路21中介著閥21d設有第1與第2導入管 21b、2 1 c，於各排出通路22中介著閥22d設有 第1與第2排出管2 2b、22 c的洗淨用噴嘴5'c的緣 故，所以可對開口部2 4供給不同種類的洗淨液，基板W 洗淨後，可以將各洗淨液送回對應的回收配管。亦即，此 洗淨用噴嘴5 c ’，因爲具備第一實施形態的含氫水超音波 洗淨用噴嘴，與臭氧水超音波洗淨用噴嘴6雙方的機能， 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） --------------------訂---------線 (請先閱讀背面之注意事碩再填寫本頁) A7 421827 __B7_____ 五、發明說明（38) 所以可藉一個洗淨用噴嘴藉由含氫水超音波洗淨、臭氧水 超音波洗淨等不同的洗淨方法來洗淨處理，可以減少設於 洗淨部的洗淨用噴嘴的數目·，結果可以減少洗淨用噴嘴的 收容空間，可減少裝置的佔有空間。 又，於第4實施形態的基板洗淨裝置，雖然針對於一 個開口部2 4設有2條導入洗淨液的導入通路，而且設有 2條排出洗淨後的洗淨液的排出通路的場合來說明，但是 導入通路與排出通路也可以設有3條以上，此外，雖然針 對第一、第2導入管2 1 b、2 1 c被接續於不同種類的 洗淨液供給配管，而第1、第2排出管2 2 b、2 2 c被 接續到不同種類的洗淨液回收配管的場合來加以說明，但 是第1、第2導入管2 1 b、2 1 c亦可分別被接續至洗 淨液的供給配管與純水供給用配管或者臭氧氣體供給源， 而第1、第2排出管22b、22c分別被接續至洗淨液 的回收配管與純水的回收配管或臭氧氣體回收配管》 第5實施形態 以下參照第2 2圖至第2 4圖說明本發明的第5實施 形態。本實施形態的洗淨裝置，係供枚葉洗淨圓形的半導 體基板（以下簡稱基板）的裝置。 本實施形態的裝置與第1實施形態的裝置不同之處僅 在於基板保持部的構成而已，載入器、載出器、搬送機械 手臂等基板搬送系、洗淨液產生部，洗淨液再生部等，洗 淨部的基板保持部以及其他的構成與第1實施形態幾乎相 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） h __— 丨 I 訂Λ〆 <請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 - -41 - A7 B7 421827 五、發明說明（39) 同。 因此’在第2 2圖只圖示基板保持部，在第2 3圖只 圓示第一基板保持體，在第2 4圖紙圖示第二基板保持體 而已，省略其他部份。 第5實施形態之基板保持部1 〇 3，如第2 2圖所示 ，具備第一基板保持體1 1 3，及被設在此第一基板保持 體1 1 3下方的第二基板保持體1 1 4。 第一基板保持體1 1 3，如第2 2、2 3圖所示，於 上面設有複數支撐栓1 1 3 a ，在將被設於後述的第二基 板保持體1 1 4的複數支撐栓（支撐體）11 4 a由第一 基板支撐體1 1 3下降時，可以用被設於複數支撐栓 1 1 3 a的各個先端部的鍔部1 1 3 g來將基板W1由下 方側支撐。 此外，如第2 2圖所示，於第一基板支撐體1 1 3有 複數栓插通孔1 1 3 C被設爲對應於後述的第二基板支撐 體1 1 4的複數支撐栓1 1 4 a，於各栓插通孔1 1 3 c 通有對應的支撐栓1 1 4 a的下端部。 此外，如第2 2圖所示，從第一基板支撐體1 1 3的 底面突出有支撐體旋轉用轉軸1 1 3 e。支撐體旋轉用轉 軸1 1 3 e ，可以旋轉於被設在第二基板支撐體1 1 4的 轉軸孔1 1 4 d，而且可以升降地被嵌合。 支撐體旋轉用轉軸1 1 3 e的下端，與第1實施形態 同樣設有轉軸驅動源，藉由此轉軸驅動源的動作，使在第 一基板支撐體1 1 3旋轉的同時，載置於第一基板支撐體 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -42 - ---------------------訂---------線· (請先Μ讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合4社印製 421827 ：； 五、發明說明（4Q) 1 1 3上的基板评：也旋轉，可以不必移動基板Wi就可以 旋轉乾燥。 (請先閱讀背面之注意事項再填寫本頁) 第二基板支撐體1 1 4，係供洗淨時保持基板W i而設 的，如第2 4圖所示設有複數列沿著支撐體1 1 4的圓周 排列的複數栓插通孔1 1 4 C。進而，於各栓插通孔 1 1 4 c通過由合成樹脂等構成的支撐栓（支撐體） 1 1 4 a的下端部的緣故，而成爲複數支撐栓1 1 4 a沿 著支撐體1 1 4的圓周排列的狀態。 這些複數的支撐栓1 1 4 a的各個先端部，被設有鍔 部 1 1 4 g。 這些複數的支撐栓1 1 4 a的各個先端的鍔部 1 1 4 g，突出於第一基板支撐體1 1 3與基板Wx之間的 空間，成爲可以藉各個鍔部1 1 4 g將基板W i由下方側支 撐。 複數支撐栓1 1 4 a的下端，被接續於與第一實施形 態同樣未圖示的支撐栓的升降驅動裝置（支撐體的升降驅 動裝置）的支撐栓驅動螺線管（支撐體驅動手段）。 經濟部智慧財產局員工消費合作社印製 - 此外，如第2 4圖所示，在第二基板支撐體1 1 4的 各角落部，設有支撐板1 1 4 ί。於這些各支撐板 ；L 1 4 f，設有與第一實施形態同樣作爲基板位置調整機 構的汽缸等驅動源（省略圖示），可以微調被支撐於支撐 栓1 1 4 a的鍔部1 1 4 g的基板W !的位置。 根據地5實施形態的基板洗淨裝置，可以藉由上述構 成，被設於複數的支撐栓1 1 4 a的各個先端部的鍔部 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 B7 421827 五、發明說明（41 ) 1 1 4 g可以將半導體基板Wi由下方側支撐，而且對於基 板W ,的底面供給洗淨液的洗淨用噴嘴可以沿著基板W i的 底面移動，進而上述支撐栓的升降移動驅動裝置，以上述 洗淨用噴嘴的移動方向前方的支撐栓1 1 4 a不與移動的 洗淨用噴嘴干涉的方式連動於該洗淨用噴嘴的移動而可以 升降移動的方式構成，因此以複數的支撐栓1 1 4 a的各 個鍔部1 1 4 g可以將基板Wi*此下方側支撐，使洗淨用 噴嘴沿著基板Wi的底面依序移動的話，洗淨用噴嘴的移動 方向前方的支撐栓1 1 4 a會下降的緣故，所以不會與移 動的洗淨用噴嘴相互干涉，此外，下降後的支撐栓 1 1 4 a在洗淨用噴嘴通過後會上升，可以再度以其先端 支撐基板W τ。 亦即，於第5實施形態的基板洗淨裝置，也可以發揮 與第1實施形態同樣的效果。 又*本發明的技術範圔並不以上述的實施形態爲限定 1在不超出本發明的要旨的範圍內可以加上種種的變更。 例如在第1至第5實施形態，說明了複數的支撐栓的下端 部分別被接續於支撐體驅動手段，這些複數的支撐栓可以 分別升降地被構成，但是並不以此爲限定，採用使相同列 的支撐栓（支撐體）的下端部安裝於同樣的支撐栓支撐板 ’而將如此的支撐栓支撐板因應上述支撐栓的列數而設置 ’使各支撐栓支撐板接續於上述支撐體驅動手段，藉由該 支撐體驅動手段使上述支撐栓支撐板升降而藉此使被安裝 於此的支撐栓每一列分別升降的方式構成亦可。 本紙張尺度適用中國國家標準（CNS)A4規格⑵G X 297公楚)' --------------------訂---------線 (請先閱讀背面之注意事項存填寫本頁 經濟部智慧財產局員工消費合作社印製 A7 421827 ___B7 ___ 五、發明說明（42 ) 此外，在上述第1、2、3、5實施形態，顯示同時 具有4個噴嘴所構成的洗淨用噴嘴之例，但是噴嘴的個數 並不以4個爲限定，可以適當變更。而作爲各洗淨用噴嘴 的形態，雖然只顯示推拉型噴嘴之例，但是本發明的基板 洗淨裝置所可以適用的噴嘴並不以推拉型噴嘴爲限定’如 第2 5圖所示，採用具有狹縫狀的開口部6 1 ，由此開口 部6 1吐出洗淨液的形式的從前一般型的噴嘴6 0亦可。 此外，作爲使用的洗淨液之例，說明含氫水、臭氧水 之例，但是此外在電解水時產生於陰極的所謂陰極水等亦 可使用。在此場合，作爲洗淨液製造裝置亦可設有電解裝 置。作爲洗淨液的再生手段除了過濾洗淨液中的微粒或是 異物之外，也可以使用供除去洗淨液中的氣體之用的脫氣 裝置等。其他，亦可於裝置內設有在洗淨後乾燥基板之用 的I P A乾燥等之乾燥部。此外，舉例說明了洗淨部的噴 嘴僅具備洗淨機能者，但是也可以是具備洗淨與乾燥雙方 機能的噴嘴，在此場合，可以不設第一基板支撐體。 此外，在上述實施形態，說明了基板洗淨裝置單體， 但是例如將本發明的基板洗淨裝置與濕式蝕刻裝置連接設 置同時於裝置間設置自動搬送機構，而使其成爲濕式蝕刻 /洗淨連續處理設備亦爲可能。 第6實施形態 以下，參照第2 6圖至第3 0圖說明本發明的第6實 施形態。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ---------------------訂---------線 | <請先閲讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合^:社印製 45 421827 五、發明說明（43) (請先閲讀背面之注意事項再填寫本頁) 第2 6圖係顯示本實施形態的基板洗淨裝置2 0 1的 全體構成之圖，係供枚葉洗淨數百mm正方程度的大型玻 璃基板（以下簡稱基板、被洗淨基板）之用的裝置》 途中的符號2 0 2係洗淨部，2 0 3係台座（基板保 持手段），204、205、206、207係洗淨用噴 嘴，2 0 8係基板搬送機械手臂，2 0 9係載入卡匣， 2 1 0係載出卡匣，2 1 1係含氫水/臭氧水產生部（洗 淨液製造手段），2 1 2係洗淨液再生部（洗淨液再生手 段），W係基板。 如第2 6圖所示，裝置上面中央爲洗淨部2 0 2，設 有保持基板W的台座2 0 3。在台座2 0 3，如第2 7圖 (a) 、 （b)所示，設有配合基板W的形狀而凹陷爲矩 經濟部智慧財產局員工消費合书社印製 形的階段部2 0 3 a，於此階段部2 0 3 a上嵌入基板W ，基板W的表面與台座2 0 3的表面以成爲相同面的狀態 被保持於台座2 0 3。此外，階段部2 0 3 a的下方進而 再往下凹陷1段|形成空間部2 0 3 b。在空間部 2 0 3 b有基板升降用轉軸2 1 3從台座下方突出。基板 升降用轉軸2 1 3的基板承受部係與基板W呈點接觸的形 狀，對基板W的粒子附著極少。於基板升降用轉軸2 1 3 的下端設有汽缸2 1 4等的轉軸驅動源，在藉由後述的基 板搬送機械手臂2 0 8承接傳遞基板W時藉由汽缸2 1 4 的動作使基板升降用轉軸2 1 3上下移動，伴隨著轉軸 2 1 3的上下移勤基板W也上升或下降。又，由被設在台 座2 0 3中央的孔2 0 3 c突出洗淨基板W的背面用的噴 -46- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 經濟部智慧財產局員工消費合_社印製 421827 a? B7 五、發明說明（44) 嘴2 1 5，在本裝置主要洗淨表面側，但是同時也可以簡 單洗淨背面側。 如第2 6圖所示，夾著台座2 0 3相對方向的位置上 設有一對托架基座2 1 6，這些托架基座2 1 6之間被架 設有洗淨用噴嘴2Q4、205、206、207。洗淨 用噴嘴被並列配置的複數（在本實施形態的場合有4個） 噴嘴所構成1各洗淨用噴嘴204、205、206、 2 0 7藉由不同的洗淨方法進行洗淨。本實施形態的場合 ，這4個噴嘴分別是對基板供給臭氧同時由紫外線燈照射 紫外線而藉此主要除去有機物的紫外線洗淨用噴嘴2 0 4 ，及供給含氫水同時藉由超音波元件2 2 5賦予超音波振 動而洗淨的含氫水超音波洗淨用噴嘴2 0 5 ，及供給臭氧 水同時藉由超音波元件2 2 5賦予超音波振動而洗淨的臭 氧水超音波洗淨用噴嘴2 0 6，及供給純水而進行淸水洗 淨的純水淸水洗淨用噴嘴2 0 7。這4個噴嘴在基板W的 上方保持與基板W的間隔爲一定同時沿著托架基座2 1 6 依序移動，藉此藉由4種洗淨方法使基板W的被洗淨面全 區域被洗淨的方式構成。 作爲噴嘴的移動手段，如第2 8圖（a ) 、（ b )所 示，係沿著各托架基座2 1 6上的直線導軌2 1 7分別設 有可以水平移動的滑動體2 1 8，在各滑動體2 1 8上分 別立起設有支柱2 1 9，於這些支柱2 1 9被固定著各洗 淨用噴嘴204、205、206，207的兩端部。於 各滑動體2 1 8上被配置馬達2 2 0等驅動源，各滑動體 本紙張尺度適用中國國家標準（CNS)A4規格（210 x 297公釐） ------------訂 -----線、〕 (請先閱讀背面之注意事項再填寫本頁) A7 B7 421827 五、發明說明（45 ) 2 1 8可在托架基座2 1 6上自走的構成。而藉由從裝置 的控制部（省略圖示）供給的控制訊號使各滑動體2 1 8 上的馬達2 2 0動作，而藉此使各洗淨用噴嘴2 0 4、 205、206、207個別水平移動的構成。此外，於 支柱2 1 9設有汽缸（省略圖示）等之驅動源，藉由支柱 2 1 9上下移動可以調整各洗淨用噴嘴2 0 4、2 0 5、 2 0 6、2 0 7的高度，亦即可以調整各洗淨用噴嘴與基 板W的間隔。 第28圖（a) 、（b)係例如4個洗淨用噴嘴之中 的含氫水超音波洗淨用噴嘴2 0 5的構成例之圖。其他的 噴嘴的基本形狀也是相同的緣故，也可用此來說明。此洗 淨用噴嘴2 0 5，係形成在一端具有供導入洗淨液之用的 導入口 2 2 1 a的導入通路2 2 1與在一端具有供把洗淨 後的洗淨液排出至外部的排出口 2 2 2 a的排出通路 2 2 2，使這些導入通路2 2 1與排出通路2 2 2於分別 的另一端交叉形成交叉部2 2 3，同時於此交叉部2 2 3 設有朝向基板W開口的開口部2 2 4，此係被稱爲推拉型 噴嘴（省流體型噴嘴）者。在此場合，開口部2 2 4，在 與洗淨用噴嘴204、205、206 ' 207的並列方 向交叉的方向上至少延伸基板W的寬度以上的長度（在本 實施形態的場合，每1個洗淨用噴嘴，導入通路2 2 1與 排出通路2 2 2交叉的交叉部2 2 3以及開口部2 2 4都 設有3組，組合3組開口部224延伸基板1的寬度以上 的長度）。此外，壓力控制部（省略圖示），以接觸於基 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297 -48 - <請先閱讀背面之注意事項再填寫本頁) _C3I^--------訂---------線- 經濟部智慧財產局員工消費合^:社印製 421827 A7 B7___ 五、發明說明（46 ) 板W的洗淨液於洗淨後流向排出通路2 2 2的方式，以維 持與開口部2 2 4的大氣接觸的洗淨液的壓力（包含洗淨 液的表面張力與基板的被洗淨面的表面張力）與大氣壓之 均衡的方式設於排出通路2 2 2側= 壓力控制部係由被設於排出口 2 2 2 a側的減壓幫浦 構成的。亦即，在排出通路2 2 2側的壓力控制部使用減 壓幫浦，控制以此減壓幫浦吸引導引構件2 2 3的洗淨液 之力，使與開口部2 2 4的大氣接觸的洗淨液的壓力（包 含洗淨液的表面張力與基板的被洗淨面的表面張力）與大 氣壓之間得到均衡。總之，藉由使與開口部2 2 4的大氣 接觸的洗淨液的壓力P w (包含洗淨液的表面張力與基板 的被洗淨面的表面張力）與大氣壓P a之値幾乎相等Pw a ，透過開口部224對基板W供給而接觸基板W的 洗淨液，可以不會漏到洗淨用噴嘴的外部而排出於排出通 路2 2 2。亦即，由洗淨用噴嘴對基板W供給的洗淨液， 不會接觸到基板W上的供給洗淨液的部份（開口部2 2 4 )以外的部份，而從基板W除去。 又，洗淨用噴嘴的接液面，以使用P F Α等氟化樹脂 ，或藉由使用的洗淨液使最表面僅由鉻的氧化物構成的鈍 態膜面的不銹鋼，或是表面具備氧化鋁或鉻的氧化物的混 合膜的不銹鋼，對於臭氧水具備電解硏磨表面的鈦等，因 爲對於洗淨液沒有不純物的溶出所以較佳。使接液面爲石 英構成的話*除了氫氟酸以外適用於所有的洗淨液。BV H order --------- line _ 421827 A7 B7 V. Description of the invention (33) 1 4 a After rising through the cleaning nozzle, it can support the substrate again at its tip W »< Please read the back first (Please fill in this page for the matters needing attention.) That is, the same effect as that of the first embodiment can be achieved in the substrate cleaning apparatus of the second embodiment. Third Embodiment A third embodiment of the present invention will be described below with reference to Figs. The cleaning apparatus of this embodiment is also a cleaning apparatus for large glass substrates, as in the first embodiment. The device of this embodiment differs from the device of the first embodiment only in the configuration of the lifting drive device (elevating drive device for the support body) of the support bolt, and the substrate holding section, loader, and loader of the cleaning section. The substrate conveying system such as an ejector and a conveying robot arm, a cleaning liquid generating section, a cleaning liquid regenerating section, and other structures are almost the same as those of the first embodiment. Printed by the Consumer Goods Agency of the Intellectual Property Bureau of the Ministry of Economic Affairs. Therefore, in FIG. 18, only the lower part of the substrate W of the cleaning unit is seen from a direction intersecting with the moving direction of the cleaning nozzle. Only the cleaning nozzle 5 and its peripheral portion of the cleaning portion, seen from the direction along the moving direction of the cleaning nozzle, and the movement of the support pin 1 4 a when the cleaning nozzle is moved are shown. Omit other parts. The schematic configuration of the lift driving device for the support bolt according to the third embodiment includes a support bolt holding member (support body holding member) 8 5 which urges each support bolt (support body) 1 4 a upward, and is provided on the support. The pressure body 9 0 of the plug 1 4 a, and the cleaning nozzle 5 is provided to face the cleaning nozzle -36-This paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm) A7 B7 42182 V. Did you say (34) 5 that extends at least forward (forward and backward in the moving direction in Figure 18), and abuts against the forward of the moving direction as the cleaning nozzle 5 moves? At the same time, the pressure receiving body 9 0 of the support bolt 14 a resists the elastic pressure of the support bolt holding member 85 and simultaneously presses the above-mentioned support body 14 5 down. The lower end portion of each of the support bolts 1 4a of the third embodiment is led to the bolt holding plate 89. A support pin holding member 85 is provided between the pin holding plate 89 and the second substrate support 14. The support bolt holding member 85 is composed of a first spring member 86, a spring member mounting plate 87, and a pair of second spring members 88, in order from the bolt holding plate 89, and the support bolt 1 4a passes These first spring members 86 and the spring member mounting plate 87 are simultaneously present between a pair of second spring members 88. The lower end portion of the first spring member 86 is attached to the bolt holding plate 89, and the upper end portion is attached to the spring member attachment plate 87. The spring attachment plate 87 is fixed to the support bolt 1 4a, and further to the spring member. The lower end portions of the pair of second spring members 89 are attached to the mounting plates 87, and the upper end portions thereof are respectively attached to the second substrate supports 14. In addition, a pair of second spring members 86 and the support bolt 14a limit the amount of extension of the first spring member 86, and there is a stopper 88a which determines the position of the support bolt 14a when it is raised. . On the other hand, each support pin 14a protruding from the first substrate support 13 is provided with a pressure receiving body 90. The pressure body 90 is composed of a roller support plate 9 1 installed on the support bolt 1 4 a and a roller support body. The paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm). -37-J -------------------- Order --------- line ^ (Please read the precautions on the back before filling this page "Economy The Intellectual Property Bureau employee ’s consumer printing company A7 421827 __B7____ V. Invention description (35) 9 1 is composed of a pair of rollers 9 2. This pair of rollers 9 2 is embedded in the pressing body described later. The state of the pair of cams 9 6 in the grooves of the 9 5. The pressing body 9 5 is guided by the pair of cams 9 6 protruding downward and the grooves of the pair of cams 9 6 are respectively guided to guide the pair. The roller 9 2 is constituted by the guide plate 97. The substrate cleaning device of the third embodiment is provided with the lifting drive device of the support bolt configured as described above, so it is used for cleaning as shown in FIG. 19 When the nozzle moves in the S direction, a pair of rollers 9 2 provided at the support bolts 1 4 a located in front of the moving direction is pressed against the guide plate 97 provided at the cleaning nozzle 5 and guided to the pair. Groove of cam 9 6. Further, When the cleaning nozzle 5 moves, the front end portion (the end portion in the advancing direction) of the pair of rollers 9 2 is passed through the lowermost portion. At this time, the pressing force is increased by the cam 9 6. The roller support plate 91 is pressed down gradually, and the first spring member 8 6 is shortened, and as a result, the second spring member 88 is extended, and the support bolt 1 4 a is pressed down gradually. When the cleaning nozzle 5 is moved, The rear end portion is passed through the pair of rollers 92 by the lowermost portion of the cam 96. At this time, the pressing force generated by the cam 96 is reduced, and because the support bolt 1 4a is pushed upward by the support bolt holding member 8 5 For this reason, the roller support plate 9 1 slowly rises 1 the first spring member 8 6 and the second spring member 8 8 slowly return to the original state, and the support bolt 1 4 a slowly rises. According to the substrate cleaning device of the third embodiment, With the above-mentioned configuration, the substrate W is supported by the respective lower ends of the plurality of support pins 14a from the lower side, and the cleaning nozzles 4, 5, 6, and 7 are sequentially moved along the bottom surface of the substrate W. The movement of the clean nozzle is in the forward direction (please read the precautions on the back first) (Fill in this page). ¾ Order --------- line D- Printed by the Consumers' Cooperative of Intellectual Property Bureau of the Ministry of Economy The paper size is applicable to national standards (CNS > A4 specifications (210 X 297 mm)- 38- Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Consumption Co., Ltd. 421827 A7-_B7____ V. Description of the invention (36) The support bolt 1 4 a is lowered by the pressing body 9 5 provided at the cleaning nozzle. Because of this, it does not interfere with the moving cleaning nozzle, and because the lowered support pin 1 4 a is given a spring pressure by the supporting body holding member 85, it accompanies the cleaning nozzle. By rising, the substrate W can be supported at its tip again. In other words, the substrate cleaning apparatus of the third embodiment can exhibit the same effects as those of the first embodiment. Fourth Embodiment Hereinafter, a fourth embodiment of the present invention will be described with reference to Figs. 20 and 21. The cleaning apparatus of this embodiment is also a cleaning apparatus for large glass substrates, as in the first embodiment. The apparatus of this embodiment differs from the apparatus of the first embodiment in the configuration of the cleaning nozzle, the substrate conveying system such as a loader, an ejector, and a transfer robot arm, a cleaning liquid generating section, and a cleaning liquid regenerating section. The other structures of the substrate holding portion and the support pin of the cleaning portion and other structures are almost the same as those of the first embodiment. Therefore, in FIG. 20, only the cleaning nozzle of the cleaning part and its moving means are shown, and in FIG. 21, only the cleaning part of the cleaning part seen in the direction along the moving direction of the cleaning nozzle is shown. The nozzle and the substrate are omitted, and in the fourth embodiment, the cleaning nozzle 5 c shown in FIGS. 20 and 21 is provided instead of the cleaning nozzle 5 in the first embodiment. This cleaning nozzle 5 c is different from the cleaning nozzle 5 provided in the apparatus of the first embodiment in that one opening 24 is provided with a plurality of cleaning liquid introductions. The paper size is in accordance with Chinese national standards (CNSXA4 specifications). (210 X 297 mm) -39- ---------- Guide ---- (Please read the notes on the back before filling this page) Order --------- line. Employee Consumption Co-operation of Intellectual Property Bureau of the Ministry of Economic Affairs # 社 印 421421827 A7 _____________ B7 V. What is the invention (37) The introduction channel (2 channels in the figure), and the drainage channel for discharging the washing liquid after washing is also set There are a plurality of structures (two in the figure). Specifically, the first and second introduction pipes 2 1 b and 2 1 c are provided through the valve 21 d in each introduction passage 21, and are interposed in each discharge passage 22. The valve 22 d is provided with first and second discharge pipes 22 b and 22 c. In addition, the first and second introduction pipes 21 b and 21 c are connected to the hydrogen-containing water supply pipe 29 and the ozone water supply pipe 31 respectively. _ In addition, the first and second discharge pipes 2 2 b and 2 2 c are connected to the hydrogen-containing water supply pipe 3 5 and the ozone water supply pipe 37, respectively. The cleaning nozzle 5 a thus constituted by The entire valve 2 1 d can be used to change the cleaning solution supplied to the opening 24 from hydrogen-containing water to ozone water. In addition, by adjusting the valve 2 2 d, the cleaning solution supplied to the opening 24 can be changed. In the case of hydrogen-containing water, the cleaning liquid after washing the substrate W is sent to the hydrogen-containing water recovery pipe 35 through the first discharge pipe 2 2 b, and the cleaning liquid supplied to the opening 24 is ozone water. At this time, the cleaning liquid after cleaning the substrate W is sent to the ozone water recovery pipe 37 through the second discharge pipe 2 2 c. The substrate cleaning apparatus according to the fourth embodiment is particularly equipped with the introduction channels 21 First and second introduction pipes 21b and 2 1c are provided through the valve 21d, and cleaning nozzles 5'c of the first and second discharge pipes 2 2b and 22c are provided through the valve 22d in each discharge passage 22. Because of this, different types of cleaning liquid can be supplied to the opening 24, and after cleaning the substrate W, each cleaning liquid can be returned to the corresponding recovery pipe. That is, this cleaning nozzle 5c ', because Equipped with the functions of the hydrogen-containing water ultrasonic cleaning nozzle and the ozone water ultrasonic cleaning nozzle 6 of the first embodiment, the paper size is suitable China National Standard (CNS) A4 Specification (210 X 297 mm) -------------------- Order --------- Line (Please read first Note on the back, please fill in this page again.) A7 421827 __B7_____ V. Description of the invention (38) So you can use a cleaning nozzle to perform different cleaning methods such as hydrogen-containing water ultrasonic cleaning and ozone water ultrasonic cleaning. The cleaning treatment can reduce the number of cleaning nozzles provided in the cleaning section. As a result, the storage space of the cleaning nozzle can be reduced, and the space occupied by the device can be reduced. Furthermore, in the substrate cleaning apparatus of the fourth embodiment, two introduction paths for introducing the cleaning solution are provided for one opening 24, and two discharge paths for discharging the cleaning solution after the cleaning are provided. In the case of description, three or more introduction passages and discharge passages may be provided. In addition, the first and second introduction pipes 2 1 b and 2 1 c are connected to different types of cleaning liquid supply pipes, and the first The first and second discharge pipes 2 2 b and 2 2 c are connected to different types of cleaning liquid recovery pipes. However, the first and second introduction pipes 2 1 b and 2 1 c may be connected respectively. To the supply pipe of the cleaning solution and the supply pipe for pure water or the ozone gas supply source, the first and second discharge pipes 22b and 22c are connected to the recovery pipe for the cleaning solution and the recovery pipe for pure water or ozone gas recovery, respectively. "Fifth Embodiment" The fifth embodiment of the present invention will be described below with reference to Figs. 22 to 24. The cleaning device of this embodiment is a device for cleaning circular semiconductor substrates (hereinafter referred to as substrates) by a single leaf. The device of this embodiment differs from the device of the first embodiment only in the structure of the substrate holding portion, the substrate transfer system such as a loader, a loader, a transfer robot arm, a cleaning liquid generating portion, and the cleaning liquid regeneration. The substrate holding part and other components of the cleaning part are almost the same as those of the first embodiment. The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm). H __— 丨 I Order Λ〆 < Please (Please read the notes on the back before filling this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economy--41-A7 B7 421827 V. Description of Invention (39) Same. Therefore, only the substrate holding portion is shown in FIG. 22, only the first substrate holding body is shown in circle in FIG. 23, and the second substrate holding body is shown in FIG. 24, and other parts are omitted. As shown in FIG. 22, the substrate holding portion 1 0 of the fifth embodiment includes a first substrate holding body 1 1 3 and a second substrate holding body provided below the first substrate holding body 1 1 3. 1 1 4. The first substrate holding body 1 1 3 is provided with a plurality of supporting pins 1 1 3 a on the upper surface as shown in FIGS. 2 and 2 and 3, and is supported by a plurality of second substrate holding bodies 1 1 4 to be described later. When the peg (support) 11 4 a is lowered from the first substrate support 1 1 3, the substrate W1 can be moved from the lower side by the crotch portions 1 1 3 g provided at the respective apex portions of the plurality of support pins 1 1 3 a. support. In addition, as shown in FIG. 22, a plurality of bolt insertion holes 1 1 3 C are provided in the first substrate supporting body 1 1 3 to correspond to a plurality of supporting bolts 1 1 of a second substrate supporting body 1 1 4 described later. 4 a, the lower end of the corresponding support bolt 1 1 4 a is passed through each of the bolt insertion holes 1 1 3 c. In addition, as shown in Fig. 22, a supporting body rotating shaft 1 1 3e protrudes from the bottom surface of the first substrate supporting body 1 1 3. The rotating shaft 1 1 e for supporting body rotation can be rotated to the rotating shaft hole 1 1 4 d provided in the second substrate supporting body 1 1 4 and can be fitted up and down. The lower end of the rotating shaft 1 1 3 e for supporting body is provided with a rotating shaft driving source similarly to the first embodiment. By the operation of the rotating shaft driving source, the first substrate supporting body 1 1 3 is rotated and placed at the same time. The first substrate support body This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -42---------------------- Order- -------- Line · (Please read the notes on the back before filling out this page) Printed by the Consumers' Cooperative 4 of the Intellectual Property Bureau of the Ministry of Economic Affairs 421827: V. Description of the Invention (4Q) 1 1 3 Substrate evaluation: also rotate, you can spin dry without moving the substrate Wi. (Please read the precautions on the back before filling in this page) The second substrate support 1 1 4 is designed to hold the substrate Wi during cleaning. As shown in Figure 2 4 there are multiple rows along the support. A plurality of bolt insertion holes 1 1 4 C arranged in a circle of 1 1 4. Furthermore, the through-holes 1 1 4 c of each plug pass through the lower end portion of the support plug (support body) 1 1 4 a made of synthetic resin or the like to form a plurality of support plugs 1 1 4 a along the support body 1 1 The state of 4 circles. Each of the plurality of support pins 1 1 4 a is provided with a crotch portion 1 1 4 g at each tip portion. Each of the plurality of support pins 1 1 4 a at the distal end of the crotch 1 1 4 g protrudes from the space between the first substrate support 1 1 3 and the substrate Wx, so that the substrate can be borrowed by each crotch 1 1 4 g Wi is supported by the lower side. The lower end of the plurality of support bolts 1 1 4 a is connected to a support bolt drive solenoid (support body drive means) connected to a lift drive device (a lift drive device for the support body) of a support bolt (not shown) similar to the first embodiment. . Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-In addition, as shown in Fig. 24, support plates 1 1 4 are provided at each corner of the second substrate support 1 1 4. For each of these support plates, L 1 4 f is provided with a driving source (not shown) such as a cylinder, which is the same as the substrate position adjustment mechanism in the first embodiment, and can be finely adjusted to the crotch 1 supported by the support bolt 1 1 4 a. 14 g of substrate W !. According to the substrate cleaning device according to the fifth embodiment, the above configuration can be provided on the crotch portion of each of the leading ends of the plurality of support pins 1 1 4 a. The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297). (Mm) A7 B7 421827 V. Description of the invention (41) 1 1 4 g The semiconductor substrate Wi can be supported from the lower side, and the cleaning nozzle for supplying the cleaning liquid to the bottom surface of the substrate W can be arranged along the substrate Wi. The bottom surface moves, and further, the lifting and lowering driving device of the support bolt is linked to the movement of the cleaning nozzle so that the support bolt 1 1 4 a in the forward direction of the cleaning nozzle does not interfere with the moving cleaning nozzle. The structure can be moved up and down, so each support 1 1 4 a of the plurality of support bolts 1 1 4 a can support the lower side of the substrate Wi *, and the cleaning nozzle can be sequentially moved along the bottom surface of the substrate Wi. In this case, because the support bolt 1 1 4 a in the forward direction of the cleaning nozzle moves downward, it does not interfere with the moving cleaning nozzle. In addition, the lowered support bolt 1 1 4 a is used for cleaning. Nozzle passes It will rise later and can support the substrate W τ with its tip again. In other words, the substrate cleaning apparatus of the fifth embodiment can exhibit the same effects as those of the first embodiment. * The technical scope of the present invention is not limited to the above-mentioned embodiments. 1 Various changes can be added within the scope not exceeding the gist of the present invention. For example, in the first to fifth embodiments, it has been described that the lower ends of the plurality of support bolts are connected to the support driving means, respectively. These plurality of support bolts can be configured to be raised and lowered separately, but it is not limited to this. The lower ends of the support bolts (support bodies) in the same row are mounted on the same support bolt support plate ', and such support bolt support plates are provided in accordance with the number of the above-mentioned support bolt rows' so that each support bolt support plate is connected to the support body The driving means may be configured such that each of the rows of the supporting bolts mounted on the supporting bolt supporting plate is lifted and lowered by the supporting body driving means, and each row of the supporting bolts mounted thereon may be raised and lowered separately. This paper size applies to Chinese National Standard (CNS) A4 specification (G X 297). -------------------- Order --------- line (Please read the precautions on the back and fill in this page. Printed on A7 421827 by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. ___B7 ___ V. Description of the invention (42) In addition, in the above-mentioned first, second, third, and fifth implementation forms, An example of a cleaning nozzle having four nozzles, but the number of nozzles is not limited to four, and can be changed as appropriate. Although the form of each cleaning nozzle is only an example of a push-pull nozzle, However, the nozzle to which the substrate cleaning device of the present invention can be applied is not limited to a push-pull nozzle. As shown in FIG. 25, a slit-shaped opening portion 6 1 is used, so that the opening portion 61 can be discharged and cleaned. It is also possible to use a conventional nozzle 60 in the form of a liquid. In addition, as examples of the cleaning liquid to be used, examples of hydrogen-containing water and ozone water will be described. Can be used. In this case, an electrolytic device can be provided as a cleaning liquid manufacturing device. As a cleaning device In addition to filtering the particulates or foreign matter in the cleaning solution, a means for regenerating the liquid may be used, such as a degassing device for removing gas from the cleaning solution. Alternatively, it may be provided in the device after cleaning Drying section for drying substrates such as IPA drying. In addition, it has been exemplified that the nozzle of the cleaning section only has a cleaning function, but it can also be a nozzle with both cleaning and drying functions. In this case, it is not necessary to provide a nozzle. First substrate support. In the above-mentioned embodiment, the substrate cleaning device is described alone. However, for example, the substrate cleaning device of the present invention is connected to a wet etching device and an automatic conveying mechanism is provided between the devices. It is also possible to use a wet etching / cleaning continuous processing facility. 6th Embodiment Hereinafter, a 6th embodiment of the present invention will be described with reference to FIGS. 26 to 30. This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) --------------------- Order --------- line | < Please read the note on the back first Please fill in this page again for the matters) Employees of the Intellectual Property Bureau of the Ministry of Economic Affairs 45 421827 V. Description of the invention (43) (Please read the precautions on the back before filling in this page) Figure 26 shows the overall structure of the substrate cleaning device 2 0 1 of this embodiment, which is used for leaf washing Device for cleaning large glass substrates (hereinafter referred to as substrates and substrates to be cleaned) with a square of several hundred mm "Symbols on the way 2 0 2 are cleaning parts, 2 0 3 are pedestals (substrate holding means), 204, 205 , 206, and 207 cleaning nozzles, 2008 series substrate transfer robots, 209 series loading cassettes, 208 series loading cassettes, and 211 series hydrogen-containing water / ozone water generating unit ( Cleaning liquid manufacturing method), 2 1 2 series cleaning liquid regeneration section (cleaning liquid regeneration method), W series substrate. As shown in FIG. 26, the center of the upper surface of the apparatus is a cleaning section 202, and a pedestal 203 for holding the substrate W is provided. As shown in FIGS. 27 (a) and (b), the pedestal 2 0 3 is provided with a stage portion 2 3 which is recessed into the shape printed by the employee ’s consumer agency of the Intellectual Property Bureau of the Ministry of Economic Affairs in accordance with the shape of the substrate W 2 3 a, the substrate W is embedded in the stage portion 23a, and the surface of the substrate W and the surface of the pedestal 203 are held on the pedestal 203 in the same state. In addition, the step portion 2 3 a is further recessed further downward by 1 step | to form the space portion 2 0 3 b. In the space portion 2 0 3 b, a substrate lifting shaft 2 1 3 protrudes from below the pedestal. The substrate receiving portion of the substrate raising and lowering shaft 2 1 3 is in a shape of point contact with the substrate W, and has very few particles attached to the substrate W. A rotary shaft driving source such as a cylinder 2 1 4 is provided at the lower end of the substrate lifting rotary shaft 2 1 3. When a substrate transfer robot arm 2 0 8 described later receives and transfers the substrate W, the substrate is lifted and lowered by the operation of the cylinder 2 1 4 When the rotary shaft 2 1 3 moves up and down, the substrate W also moves up or down with the vertical movement of the rotary shaft 2 1 3. In addition, a hole 2 0 3 c provided in the center of the pedestal 2 0 3 c is used to protrude the back surface of the substrate W for cleaning -46- Department of Intellectual Property Bureau, Consumer Consumption Co., Ltd. Printed 421827 a? B7 V. Description of the Invention (44) The mouth 2 1 5 mainly cleans the front side of the device, but it can also easily clean the back side. As shown in FIG. 26, a pair of bracket bases 2 1 6 are provided at positions opposite to each other between the bases 103, and cleaning nozzles 2Q4, 205 are set between these bracket bases 2 1 6 , 206, 207. A plurality of cleaning nozzles are arranged in parallel (in the case of the present embodiment, there are four). Each of the cleaning nozzles 204, 205, 206, and 2 7 constituted by the nozzles is cleaned by different cleaning methods. In the case of this embodiment, the four nozzles are an ultraviolet cleaning nozzle 2 0 4 for supplying ozone to a substrate and irradiating ultraviolet rays from an ultraviolet lamp to thereby remove organic matter, and supplying hydrogen-containing water through an ultrasonic element 2 at the same time. 2 5 Hydrogen-containing water to be cleaned by giving ultrasonic vibration and washed 2 0 5, and ozone water to be supplied, and ozone water to be washed by ultrasonic wave 2 2 5 The pure water was rinsed with the nozzle 2 0 6, and the pure water was rinsed with the purified water 2 7. The four nozzles are kept above the substrate W at a constant distance from the substrate W and sequentially move along the carrier base 2 1 6 to thereby make the entire area of the substrate W to be cleaned by four cleaning methods. Posed by way of washing. As means for moving the nozzles, as shown in Figs. 28 (a) and (b), sliding bodies 2 1 are provided along the linear guides 2 1 7 on each bracket base 2 1 6 to move horizontally. 8. Pillars 2 1 9 are erected on each of the sliding bodies 2 1 8, and both ends of each of the cleaning nozzles 204, 205, 206, and 207 are fixed to the pillars 2 1 9. A driving source such as a motor 2 2 0 is arranged on each sliding body 2 1 8. The paper size of each sliding body is in accordance with the Chinese National Standard (CNS) A4 specification (210 x 297 mm) ---------- --Order ----- line,] (Please read the precautions on the back before filling this page) A7 B7 421827 V. Description of the invention (45) 2 1 8 It can be self-propelled on the bracket base 2 1 6 Make up. The control signal supplied from the control unit (not shown) of the device causes the motor 2 2 0 on each of the sliding bodies 2 1 8 to operate, thereby causing each of the cleaning nozzles 204, 205, 206, and 207 to operate. Composition of individual horizontal movement. In addition, a driving source such as a cylinder (not shown) is provided on the pillar 2 19, and each cleaning nozzle 2 0 4, 2, 0 5, 2, 0 6, 2, 0 7 can be adjusted by moving the pillar 2 1 9 up and down. In other words, the distance between each cleaning nozzle and the substrate W can be adjusted. Figs. 28 (a) and (b) are diagrams showing, for example, a configuration example of the hydrogen-containing water ultrasonic cleaning nozzle 205 among the four cleaning nozzles. The other nozzles have the same basic shape and can be explained here. The cleaning nozzle 2 0 5 is formed with an introduction port 2 2 1 a at one end for introducing the cleaning liquid, and an introduction passage 2 2 1 at one end, and the cleaning liquid is discharged to the outside at one end. The discharge path 2 2 2 of the discharge port 2 2 2 a is formed so that these introduction paths 2 2 1 and the discharge path 2 2 2 intersect at the other end to form a cross section 2 2 3, and at the same time, the cross section 2 2 3 is provided with The openings 2 2 4 that open toward the substrate W are those called push-pull nozzles (fluid-saving nozzles). In this case, the openings 2 2 4 extend at least the width of the substrate W in a direction that intersects the parallel directions of the cleaning nozzles 204, 205, 206 '207 (in the case of this embodiment, one for each There are 3 sets of cleaning nozzles, the intersection 2 2 3 and the opening 2 2 4 crossing the introduction passage 2 2 1 and the discharge passage 2 2 2. The combination of the three sets of openings 224 extends the length of the substrate 1 or more. . In addition, the pressure control unit (not shown) applies the Chinese National Standard (CNS) A4 specification to the basic paper size (210 X 297 -48-< Please read the precautions on the back before filling this page) _C3I ^- ------- Order --------- Line-Consumption of Employees of the Intellectual Property Bureau of the Ministry of Economic Affairs ^: Printed by the agency 421827 A7 B7___ V. Description of the invention (46) Washing liquid for plate W After cleaning, it flows to the discharge path 2 2 2 to maintain the pressure of the cleaning solution (including the surface tension of the cleaning solution and the surface tension of the substrate to be cleaned) in contact with the atmosphere of the opening 2 2 4 and the atmospheric pressure. Equilibrium system is provided on the discharge passage 2 2 2 side = The pressure control unit is constituted by a pressure reducing pump provided on the discharge port 2 2 2 a side. In other words, the pressure control unit on the side of the discharge passage 2 2 2 uses a pressure reducing pump to control the force of the cleaning liquid that attracts the guide member 2 2 3 with the pressure reducing pump, so that the atmosphere with the opening 2 2 4 The pressure of the contacted cleaning solution (including the surface tension of the cleaning solution and the surface tension of the substrate to be cleaned) is balanced with the atmospheric pressure. In short, the pressure P w (including the surface tension of the cleaning liquid and the surface tension of the substrate to be cleaned) of the cleaning liquid in contact with the atmosphere of the opening 2 2 4 is almost equal to the pressure P a a. The cleaning liquid supplied to the substrate W through the opening 224 and contacting the substrate W can be discharged to the discharge passage 2 2 2 without leaking to the outside of the cleaning nozzle. That is, the cleaning liquid supplied to the substrate W from the cleaning nozzle is removed from the substrate W without contacting a portion other than the portion (opening 2 2 4) on the substrate W where the cleaning liquid is supplied. In addition, the liquid-contacting surface of the cleaning nozzle is made of fluorinated resin such as PF Α, or stainless steel with a passive film surface whose surface is only composed of chromium oxide by the cleaning liquid used, or the surface is provided with Stainless steel with a mixed film of aluminum oxide or chromium oxide is preferably titanium, which has an electrolytic honing surface for ozone water, and does not dissolve impurities in the cleaning solution. If the wetted surface is made of quartz, it is applicable to all cleaning solutions except hydrofluoric acid.
進而，在導引構件2 2 3的上方以相對方向於基板W 本紙張尺度適用中國國家標準（CNS)A4規格（210 * 297公釐） --------------------訂---------線ο (請先閱讀背面之注§項再填寫本頁) 經濟部智慧財產局員工消費合4社印製 -49- A7 B7 421827 五、發明說明（47) 的方式設有超音波元件2 2 5，在洗淨基板W時，對洗淨 液賦予超音波。此超音波元件2 2 5，係可以輸出 1 9 KH z以上的頻率的超音波，特別是由可以保持洗淨 液層的厚度的觀點來看，以0.2MHz以上的頻率較佳 0 於本實施形態的洗淨用噴嘴的構成，含氫水超音波洗 淨用噴嘴2 0 5與臭氧水超音波洗淨用噴嘴2 0 6係如上 述之構成，這些僅有使用的洗淨液是含氫水與臭氧水的差 異而已。此外，紫外線洗淨用噴嘴2 0 4的場合，取代第 2 8圖（b )的超音波元件2 2 5而設紫外線燈2 2 6， 對噴嘴內供給臭氧氣體而構成即可。藉由此構成，對基板 W供給臭氧氣體同時照射紫外線，藉由產生的羥基自由基 的作用特別分解除去有機物。在想要防止臭氧氣體洩漏至 外部的場合，只要設有空氣遮簾機構即可。此外，關於純 水洗淨用噴嘴2 0 7，只要削除第2 8圖（b )的超音波 元件2 2 5 ’而單純對噴嘴內供給純水而排出的構成即可 〇 又，洗淨用噴嘴204、205、206、207的 開口部2 2 4與基板W之間的距離η ,在8 m m以下不與 基板W接觸的範圍較佳，更佳者爲5mm以下不與基板w 接觸的範圍’又更好的是3 mm以下不與基板狐接觸的範 圍。超過8mm的話，要在基板W與洗淨用噴嘴w之間充 滿所要的洗淨液變得很困難，洗淨不易達成.亦即，托架 基座2 1 6、滑動體2 1 8、支柱2 1 9等爲首的洗淨用 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公楚） --------------------訂---------線^''一 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合-^社印製 經濟部智慧財產局員工消費合^：社印製 4 218 2 7 A7 B7 五、發明說明（48) 噴嘴的支撐、移動機構，必須要將這種程度的間隔維持於 基板W與洗淨溫嘴之間。亦即，隨著場合的不同，可以設 有監測基板W與洗淨用噴嘴的間隔的距離感測器。 如第26圖所示，於洗淨部2 0 2的側方，設有含氫 水/臭氧水產生部211(洗淨液製造手段）與洗淨液再 生部2 12 (洗淨液再生手段）。於含氫水/臭氧水產生 部2 1 1，被組入在本裝置作爲洗淨液使用的含氫水的產 生裝置2 2 7與臭氧水的產生裝置2 2 8。任一洗淨液， 都是藉由在純水中使溶解氫氣氣體或是臭氧氣體而產生的 ，而以含氫水產生裝置2 2 7所產生的含氫水，藉由被設 在含氫水供給配管2 2 9途中的送液幫浦2 3 0被供給至 含氫水超音波洗淨用噴嘴2 0 5的方式構成（洗淨液供給 手段）。同樣地，以臭氧水產生裝置228產生的臭氧水 ，藉由被設在臭氧水供給配管2 3 1途中的送液幫浦 2 3 2被供給至臭氧水超音波洗淨用噴嘴2 0 6的方式構 成（洗淨液供給手段）。又，於紫外線洗淨用噴嘴2 _0 4 被供給來自任意的臭氧氣體供給源（省略圖示）的臭氧氣 體，於純水淸水洗淨用噴嘴2 0 7 7由來至製造生產線內 的純水供給用配管（省略圖示）供給純水。 此外，於洗淨液再生部2 1 2，設有供除去包含在使 用後的洗淨液中的微粒子或異物之用的過濾器2 3 3、 2 3 4。供除去含氫水中的微粒子所用的含氫水用過濾器 2 3 3與除去臭氧水中的微粒子所用的臭氧水用過濾器 2 3 4係被設爲不同系統。亦即，從含氫水超音波洗淨用 -----------------：—訂---------線 〇 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -51 - 經濟部智慧財產局員工消費合作社印製 421827_^_ 五、發明說明（49) 噴嘴2 0 5的排出口排出的使用後含氫水，藉由被設在含 氫水回收配管2 3 5的途中的送液幫浦2 3 6被回收至含 氫水用過濾器2 3 3 (洗淨液回收手段）。同樣的，從臭 氧水超音波洗淨用噴嘴2 0 6的排出口排出的使用後臭氧 水，藉由被設在臭氧水回收配管2 3 7的途中的送液幫浦 2 3 8被回收至臭氧水用過濾器2 3 4 (洗淨液回收手段 )° 各過濾器2 3 3、2 3 4係如第2 9圖所示的構造， 在中央被配置使使用後的洗淨液流通同時具有使洗淨液從 管壁透過的機能之管體2 3 9，於其周邊被配置多數由鐵 氟龍樹脂所構成的濾材2 4 0，同時設有供遮斷管體 2 3 9內部的洗淨液的流通之柵板2 4 1。亦即，由過濾 器233、234的導入口 242導入使用後的洗淨液時 ，洗淨液沿著第2 9圖中的箭頭F方向流動時藉由濾材 2 4 0進行過濾，洗淨液再度回到管體2 3 9時成爲微粒 子被除去的淸淨的洗淨液，而從排出口 2 4 3排出。 接者，如弟2 6圖所不’通過含氯水過爐器2 3 3的 含氫水藉由再生含氫水供給配管2 4 4途中所設的送液幫 浦2 4 5被供給至含氫水超音波洗淨用噴嘴2 0 5 (再生 洗淨液供給手段）。同樣的，通過臭氧水用過濾器2 3 4 的臭氧水藉由被設在再生臭氧水供給配管2 4 6的途中的 送液幫浦2 4 7被供給至臭氧水超音波洗淨用噴嘴2 0 6 (再生洗淨液供給手段）。此外，含氫水供給配管2 2 9 與再生含氫水供給配管2 4 4在含氫水超音波洗淨用噴嘴 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -52- (請先M讀背面之注意事項再填寫本頁) -----1—訂---------線·一 A7 B7 421827 五、發明說明（50) <請先閱讀背面之注意事項再填寫本頁) 2 0 5之前被接續，可以藉由閥2 6 2對含氫水超音波洗 淨用噴嘴2 0 5導入新的含氫水或是導入再生含氫水。同 樣的，臭氧水供給配管2 3 1與再生臭氧水供給配管 2 4 6在臭氧水超音波洗淨用噴嘴2 0 6之前被接續，可 以藉由閥2 6 3對臭氧水超音波洗淨用噴嘴2 0 6導入新 的臭氧水或是導入再生臭氧水。又，通過各過濾器2 3 3 、.2 3 4的含氫水或臭氧水，因爲除去微粒子而水中的氣 體含有濃度降低的緣故，也可以透過配管再度返回含氫水 產生裝置2 2 7或臭氧水產生裝置2 2 8，補充氫氣氣體 或臭氧氣體。 經 濟 部 智 慧 財 產 局 員 工 消 費 社 印 製 如第2 6圖所示，在洗淨部2 0 2的側方可拆裝地裝 設有載入卡匣2 0 9與載出卡匣2 1 0 -這兩個卡匣 2 0 9、2 1 0，係可以收容複數枚基板W的相同形狀者 ，載入卡匣2 0 9收容洗淨前的基板W，載出卡匣2 1 0 收容已經洗淨的基板W。而在洗淨部2 0 2與載入卡匣 2 0 9、載出卡匣2 1 0的中間位置設置有基板搬送機械 手臂2 0 8。基板搬送機械手臂，2 0 8具有於其上部具伸 縮自如的連結機構的臂部2 4 8，臂部2 4 8可以旋轉而 且可以升降，以臂部2 4 8的先端部支撐、搬送基板W。 第30圖（a) 、（b)係顯示基板搬送機械手臂 2 ◦ 8的臂部2 4 8延伸於基板保持部2 0 3上方的狀態 。如第30圖（a)所示，臂部248的先端的叉249 係位於台座2 0 3的基板升降用轉軸2 1 3並排的列 2 1 3之間。由載入卡匣2 0 9接取洗淨前的基板W的基 -53- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 B7 421827 五、發明說明（51 ) 板搬送機械手臂2 0 8在將該基板W搬送於基板保持部 2 0 3上時，如第3 0圖（b )所示，以基板升降用轉軸 2 1 3上升的狀態使支撐了基板W的臂部2 4 8進入台座 2 0 3的上方，臂部2 4 8下降若干後退直到台座2 0 3 的外方。其後，基板升降用轉軸2 13下降時，如第2 7 圖（b )所示在台座2 0 3上載置基板W而保持。又，基 板搬送機械手臂2 0 8的臂部2 4 8先端的叉2 4 9，以 上面的凸部2 4 9 a與基板成點接觸之構成，使得對基板 W之異物附著很少。 上述構成的洗淨裝置2 0 1，由操作者設定例如洗淨 用噴嘴204、205、206、207與基板W的間隔 ，洗淨用噴嘴的移動速度，洗淨液的流量等種種洗淨條件 以外，各部的動作係藉由控制部來控制’而構成自動運轉 。亦即，使用此洗淨裝置1時’將洗淨前的基板W設定於 載入卡匣2 0 9 ，由操作員操作開始開關的話，藉由基板 搬送機械手臂2 0 8從載入卡匣2 0 9搬送基板W至台座 3上，藉由洗淨用噴嘴204、205、206、207 依序自動進行紫外線洗淨、含氫水超音波洗淨、臭氧水超 音波洗淨、淸水洗淨，在淸水洗淨後’藉由基板搬送機械 手臂2 0 8收容於載出卡匣2 1 0 ° 在本實施形態的基板洗淨裝置2 0 1 ’各洗淨用噴嘴 204、205、206 ' 207係其兩端藉由支柱 2 1 9支撐的雙支撐構造，而且托架基座2 1 6、滑動體 2 1 8、馬達2 2 0等所構成的噴嘴移動手段保持各洗淨 本紙張尺度適用中國國家標準（CNS)A4規格（210 * 297公釐） --------------------訂---------線 (請先閱讀背面之注$項再填寫本頁) 經濟部智慧財產局員工消費合^:社印製 -54- 經濟部智慧財產局員工消費合作社印製 421827 A7 _B7___ 五、發明說明（52 ) 用噴嘴與基板之間的間隔爲一定同時藉由水平移動可以洗 淨基板W的被洗淨面全區域。因此，與單支撐噴嘴的從前 的裝置相比可以高精度地調整洗淨中的洗淨用噴嘴與基板 W的距離。特別是在本實施形態，因爲使用洗淨用噴嘴的 開口部2 2 4與基板W的間隔Η必須要在數m m程度精密 控制於0.1mm的等級的推拉型洗淨用噴嘴的緣故，所 以藉由使洗淨用噴嘴爲雙支撐構造，可以充分發揮推拉型 噴嘴的高洗淨效率的優點。 進而，4個洗淨用噴嘴的各個係藉由紫外線洗淨、含 氫水超音波洗淨、臭氧水超音波洗淨、淸水洗淨等不同的 洗淨方法來洗淨處理的構成，所以可以1台本裝置來實施 種種的洗淨方法。亦即，例如藉由紫外線洗淨除去有機物 後，藉由含氫水超音波洗淨、臭氧水超音波洗淨除去微細 粒徑的微粒子之後，進而以淸水洗淨沖洗附著於基板表面 的洗淨液同時進行最終洗淨，而可以藉此充分洗淨除去種 種被除去物。結果，即使有微粒子、有機物等種種除去對 象也可以將此確實洗淨除去。此外，即使進行複數種洗淨 方法也不必在洗淨工程耗費龐大的設備費或佔有空間，可 以達成合理的裝置。 此外，本實施形態的裝置的場合，被設有含氫水/臭 氧水產生部2 1 1，於洗淨裝置內被一體組裝入臭氧水產 生裝置2 2 8，特別因爲臭氧水的壽命很短，所以本發明 可在維持臭氧水的品質的狀態下使用於洗淨，可以有效進 行臭氧水超音波洗淨。進而，具備洗淨液再生部2 1 2， 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -55- -----------------i_ 訂---------線 {請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合4社印製 421827 Α7 Β7 五、發明說明（53) 可以回收曾經被使用過的含氫水或臭氧水等洗淨液將其再 生而再利用，因此可以削減洗淨液的使用量。 又，於本實施形態的構成，台座2 0 3係僅具有支撐 基板W的機能者，但是將此台座置換爲例如旋轉夾具等， 在保持基板的同時可以旋轉的構成亦可。而在洗淨中使基 板旋轉的話，可以進行更均一的洗淨，同時可以不移動基 板而旋轉乾燥處理。 第7實施形態 以下參照第3 1圖說明本發明的第7實施形態*> 本實施形態的基板洗淨裝置，也與第6實施形態同樣 ，是大型玻璃基板用枚葉洗淨裝置。本實施形態的裝置與 第6實施形態的裝置不同之處，僅在於洗淨用噴嘴的構成 與基板保持手段的構成而已，載入器、載出器、搬送機械 手臂等基板搬送系、洗淨液產生部，洗淨液再生部等，洗 淨部的基板保持部以及其他的構成與第6實施形態幾乎相 同。因此，在第3 1圖只圖示洗淨部，省略其他部份 如第3 1圖所示，於洗淨部2 5 0的中央可旋轉地設 有保持基板W的旋轉夾具2 5 1 (基板保持旋轉手段）.。 旋轉夾具2 5 1藉由真空吸附、爪等機械固定手段於其上 面保持著基板W。此外，於旋轉夾具2 5 1被接續著馬達 等驅動源（省略圖不）’成爲伴隨著旋轉夾具2 5 1的旋 轉基板W也旋轉的構成方式。 旋轉夾具2 5 1的上方，4個噴嘴由中心點呈放射狀 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 56 --------------------訂---------線Ίί <請先閲讀背面之注意事項再填寫本頁) A7 B7 421827 五、發明說明（54) 延伸，設有平面看起來爲X字形的洗淨用噴嘴2 5 2 =各 洗淨用噴嘴，藉由各個不同的洗淨方法進行洗淨處理，一 端側被支撐於支柱2 5 3同時另一端側相互被結合。本實 施形態的場合，這4個洗淨'用噴嘴，於第31圖由中心延 伸往右下的噴嘴2 5 4，係具備紫外線燈2 5 8藉由紫外 線照射分解除去有機物的紫外線洗淨用噴嘴，由中心向左 下延伸的噴嘴，係具備超音波元件2 5 9供給含氫水同時 賦予超音波振動而進行洗淨的含氫水超音波洗淨用噴嘴， 從中心向左上方延伸的噴嘴2 5 6係具備超音波元件 2 5 9，供給純水而賦予超音波振動進行洗淨的純水超音 波洗淨噴嘴，從中心向右上延伸的噴嘴2 5 7是純水淸水 洗淨用噴嘴。 .各洗淨用噴嘴的形態，與第6實施形態相同，係如第 2 8圖所示的推拉型噴嘴（於第2 8圖（a )將任一方的 支柱2 1 9削除而連結噴嘴彼此的構成即可）。藉由此噴 嘴的採用，可以提高洗淨的效率同時可以削減洗淨液的使 用量。此外在此場合，推拉型噴嘴的開口部2 2 4，於各 噴嘴的長邊方向上至少延伸基板W的對角線的長度的一半 以上。 本實施形態的場合，與各洗淨用噴嘴獨立移動的第6 實施形態的裝置不同，不必使X字形洗淨用噴嘴2 5 2全 體從基板W的一端橫跨至另一端的大幅移動，而是藉由旋 轉夾具2 5 1使基板W旋轉而洗淨基板W的被洗淨面全區 域的構成。然而，即使此構成，在X字形洗淨用噴嘴 本紙張尺度過用中國國家標準（CNS)A4規格<210 X 297公釐) -57 - --------------------訂---------線、〕 <請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合-#社印製 A7 B7 421827 五、發明說明（55 ) 2 5 2的中心點附近也不容易進行基板W的洗淨。在此， 以在中心點附近也可以充分洗淨的程度在X字形洗淨用噴 嘴2 5 2側也在直角相交的2個方向上水平移動若干距離 ，以消除死角。此構成，可以藉由在例如4根支柱2 5 3 的下方分別使作爲第6實施形態的噴嘴移動手段使用的托 架基座216與滑動體218在直交方向上組合2段的方 式構成的移動機構（省略圖示，噴嘴移動手段）而實現之 0 此外，於支柱2 5 3具備汽缸（省略圖示），可以調 整支柱（2 5 3 )的高度以及X字形洗淨用噴嘴（2 5 2 )與基板W的間隔。如此，使X字形洗淨用噴嘴2 5 2保 持與基板W的間隔移動同時二次元地進行水平移動，藉由 旋轉夾具2 5 1配合基板W的旋轉而洗淨處理基板W的被 洗淨面全區域的方式構成。藉此，即使基板W的中央附近 也可以藉由4種不同的洗淨方法來進行充分的洗淨。 於上述構成的本實施形態的基板洗淨裝置，各洗淨用 噴嘴254 ' 255、256、257的一端側係藉由支 柱2 5 3支撐的，但另一端側被連結於噴嘴的緣故，全體 來看，仍然是雙支撐的支撐構造。藉由此構成，可以高精 度埤調整噴嘴與基板W地距離。亦即t可以充分發揮推拉 型噴嘴的高洗淨效率的優點，可以發揮與第6實施形態同 樣的效果。 又，本發明’的技術範圍並不以上述實施形態爲限定， 在未超過本發明的要旨的範圍內可以施加種種的變更。例 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -58 - --------------------訂---------線J (請先間讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合^:社印製 A7 B7 421827 五、發明說明（56 ) 如在上述第6、7實施形態，係顯示同時由4個噴嘴形成 洗淨用噴嘴之例，但是噴嘴的數目可以不限於4個，當然 也可以適當變更數目。而作爲各洗淨用噴嘴的形態，雖然 顯示推拉型的噴嘴之例，但是可以適用於本發明的基板洗 淨裝置的噴嘴並不限於推拉型噴嘴，如第3 0圖所示，亦 可採用具有狹縫狀的開口部2 6 1，而由此開口部2 6 1 流下洗淨液的從前一般的噴嘴。 此外，作爲使用的洗淨液之例，說明含氫水、臭氧水 之例，但是此外在電解水時產生於陰極的所謂陰極水等亦 可使用。在此場合，作爲洗淨液製造裝置亦可設有電解裝 置。作爲洗淨液的再生手段除了過濾洗淨液中的微粒或是 異物之外，也可以使用供除去洗淨液中的氣體之用的脫氣 裝置等。其他，亦可於裝置內設有在洗淨後乾燥基板之用 的1 P A乾燥等之乾燥部。乾燥方法可以適用旋轉乾燥、 I P A乾燥。此外，在上述實施形態，說明了基板洗淨裝 置單體，但是例如將本發明的基板洗淨裝置與濕式蝕刻裝 置連接設置同時於裝置間設置自動搬送機構，而使其成爲 濕式蝕刻/洗淨連續處理設備亦爲可能。 實施例 以下，說明爲了證實本發明的基板洗淨裝置的效果而 進行的實驗。 本紙張尺度適用中國囤家標準（CNS)A4規格（210 X 297公釐） 請 先 閱 讀 背. & 之 注 意 事 項 再 填 寫 本 頁 I I I I I 訂 經濟部智慧財產局員工消費合♦社印製 經濟部智慧財產局員工消費合作社印製 421827 A7 ____B7 五、發明說明（57) 實施例1 首先’確認上述實施形態所敘述的推拉型噴嘴單體的 洗淨效果。 於上述第6實施形態的基板洗淨裝置，使用發出X e - X e受激準分子雷射之i 7 2 nm的波長的光的紫外線 燈之推拉型構造的紫外線洗淨用噴嘴進行基板洗淨。使用 6 5 0mmX5 5 Omm的基板，將基板與噴嘴的間隔設 定爲lmm，紫外線燈的能量爲1 〇mw/cm2，此外 線的有效照射面積爲6 5 OmmXl 5 Omm，噴嘴的移 動速度爲1 5mm/秒，進行1次洗淨。洗淨前接觸角爲 4 0度的基板，在洗淨後接觸角成爲4度以下。又，所謂 接觸角是指在基板上使水滴附著時的基板表面與水滴表面 的切線的夾角，水滴越高夾角越大亦即接觸角越大，越顯 示受到有機物等的污染，水滴越平坦，亦即接觸角越小， 顯示基板越淸淨，亦爲表示淸淨度的指數。 實施例2 其次，於相當本發明的第2 6圖（使平面看來直線狀 的噴嘴並排複數列的形式）的基扳洗淨裝置，使用紫外線 洗淨用噴嘴與純水超音波洗淨用噴嘴等2個噴嘴測定其洗 淨效果。2個噴嘴同樣都使用推拉型的噴嘴。 與上述實施例1同樣的’使用發出X e e受激準 分子雷射之1 7 2 nm的波長的光的紫外線燈之推拉型構 造的紫外線洗淨用噴嘴進行1次基板洗淨。使用6 5 0 本纸張尺度適用中國國家標準（CNS)A4規格（210 X 297公 -60- ---------------------訂---------線一 (請先閱讀背面之注意事項再填寫本頁> 421827 A7 _______ B7 五、發明說明（58) mmX5 5 Omm的基板，將基板與噴嘴的間隔設定爲 1mm，紫外線燈的能量爲1 〇mW/cm2 ’此外線的 有效照射面積爲6 5 OmmXl 5 Omm，噴嘴的移動速 度爲1 5mm/秒的話，洗淨前接觸角爲4 0度的基板’ 在洗淨後接觸角成爲4度以下。 接著，將同一塊基板使用具備超音波元件的推拉型構 造的純水超音波洗淨闬噴嘴進行1次洗淨。超音波元件使 用可以輸出9 0 0W、1MH z的超音波者。使基板與噴 嘴的間隔爲3mm，使純水的流量爲4 L/分，噴嘴的移 動速度爲1 5 m m /秒的話，初期狀態的6 3 5 5 0 0個 異物減低爲42900個異物，除去率爲93 . 2%。 又，評估使用的基板，係使用在玻璃基板上形成鉻膜 ，而於其上撒布氧化鋁粒子使強制污染之後的基板。而異 物數的評估，計測了 0 . 5 v m以上的粒子的數目。 作爲比較例，使用第3 2圖所示的一般噴嘴|以純水 的流量爲3 0 L/分進行同樣的洗淨時，異物的除去率只 有8 5 . 0 %。由此結果，可知使用本發明的基板洗淨裝 置，特別是在適用推拉型噴嘴作爲洗淨用噴嘴的場合，即 使純水的流量很少也可以提高異物的除去率，洗淨效率極 佳。 此外，取代上述實驗所使用的純水洗淨液，而使用含 氫水（pHIO、氫濃度1 . 3ppm，又pH的調整使 用氨水）進行同樣的洗淨時，異物的除去率提高到 9 9 . 9 %。亦即，本發明的裝置即使純水也可以得到充 本紙張尺度適用中國國家標準（CNS>A4規格（210x 297公釐） (請先閲讚背面之注意事項再填寫本I) -------丨訂._!丨—丨！線' 經濟部智慧財產局員工消費合令社印製 421827 A7 ____B7Furthermore, above the guide member 2 2 3 in a relative direction with respect to the substrate W. This paper size applies the Chinese National Standard (CNS) A4 specification (210 * 297 mm) -------------- ------ Order --------- line ο (Please read the note § on the back before filling out this page) Printed by the 4th Consumer Agency of the Intellectual Property Bureau of the Ministry of Economic Affairs-49- A7 B7 421827 V. Description of the invention (47) The ultrasonic element 2 2 5 is provided, and when the substrate W is cleaned, an ultrasonic wave is given to the cleaning solution. This ultrasonic element 2 2 5 is capable of outputting an ultrasonic wave having a frequency of more than 19 KH z. In particular, from the viewpoint of maintaining the thickness of the cleaning liquid layer, it is preferable that the frequency is 0.2 MHz or more. The structure of the cleaning nozzle of the form, the hydrogen-containing water ultrasonic cleaning nozzle 2 05 and the ozone water ultrasonic cleaning nozzle 2 06 are configured as described above, and these only cleaning liquids are hydrogen-containing The difference between water and ozone water is just that. In the case of the ultraviolet cleaning nozzle 204, an ultraviolet lamp 2 2 6 may be provided instead of the ultrasonic element 2 2 5 in FIG. 28 (b), and ozone gas may be supplied into the nozzle. With this configuration, the substrate W is irradiated with ultraviolet rays while being supplied with ozone gas, and organic substances are specifically decomposed and removed by the action of generated hydroxyl radicals. Where ozone gas is to be prevented from leaking to the outside, an air curtain mechanism may be provided. In addition, as for the nozzle 2 0 7 for pure water cleaning, it is only necessary to remove the ultrasonic element 2 2 5 ′ shown in FIG. 28 (b) and simply supply pure water to the nozzle and discharge the structure. The distance η between the openings 2 2 4 of the nozzles 204, 205, 206, and 207 and the substrate W is preferably within a range of 8 mm or less and not in contact with the substrate W, and more preferably in a range of 5 mm or less and not in contact with the substrate w. 'Even better is the range that does not contact the substrate fox below 3 mm. If it exceeds 8 mm, it becomes difficult to fill the desired cleaning liquid between the substrate W and the cleaning nozzle w, and it is difficult to achieve cleaning. That is, the bracket base 2 1 6, the sliding body 2 1 8, and the pillar. The paper size used for cleaning, such as 2 1 9 etc., is applicable to China National Standard (CNS) A4 (210 X 297). --------- Line ^ `` One (Please read the notes on the back before filling out this page) Employee Consumption Agreement of the Intellectual Property Bureau of the Ministry of Economic Affairs-^ Printed by the agency of the Intellectual Property Bureau of the Ministry of Economic Affairs. Printed by the company 4 218 2 7 A7 B7 V. Description of the invention (48) The nozzle supporting and moving mechanism must maintain this interval between the substrate W and the cleaning and warming nozzle. That is, a distance sensor that monitors the distance between the substrate W and the cleaning nozzle may be provided depending on the occasion. As shown in FIG. 26, a hydrogen-containing water / ozone water generating unit 211 (washing liquid manufacturing means) and a washing liquid regeneration unit 2 12 (washing liquid regeneration means) are provided on the side of the washing part 202. ). The hydrogen-containing water / ozone water generating unit 2 1 1 is incorporated into the hydrogen-containing water generating device 2 2 7 and the ozone-water generating device 2 2 8 which are used as cleaning liquids in this device. Any washing liquid is generated by dissolving hydrogen gas or ozone gas in pure water, and the hydrogen-containing water generated by the hydrogen-containing water generating device 2 2 7 is set in hydrogen-containing water. The water supply pipe 2 2 9 is configured such that the liquid supply pump 2 3 0 is supplied to the hydrogen-containing water ultrasonic cleaning nozzle 2 05 (cleaning liquid supply means). Similarly, the ozone water generated by the ozone water generating device 228 is supplied to the ozone water ultrasonic cleaning nozzle 2 0 6 through a liquid feed pump 2 3 2 provided in the middle of the ozone water supply pipe 2 3 1. System structure (cleaning liquid supply means). In addition, ozone gas is supplied to the ultraviolet cleaning nozzle 2 _0 4 from an arbitrary ozone gas supply source (not shown), and pure water and water cleaning nozzle 2 0 7 7 are supplied to pure water in the production line. The supply pipe (not shown) supplies pure water. In addition, the washing liquid regeneration section 2 1 2 is provided with filters 2 3 3, 2 3 4 for removing particles or foreign matter contained in the used washing liquid. The hydrogen-containing water filter 2 3 3 for removing particulates in hydrogen-containing water and the ozone-water filter 2 3 4 for removing particulates in ozone water are different systems. That is, for ultrasonic cleaning from hydrogen-containing water -----------------: --Order --------- line 〇 (Please read the note on the back first Please fill in this page again for this matter) This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) -51-Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 421827 _ ^ _ 5. Description of the invention (49) The used hydrogen-containing water discharged from the discharge port of 0 5 is recovered to the hydrogen-containing water filter 2 3 3 (washing) by a liquid feeding pump 2 3 6 provided in the middle of the hydrogen-containing water recovery pipe 2 3 5. Means of liquid recovery). Similarly, the used ozone water discharged from the outlet of the ozone water ultrasonic cleaning nozzle 2 06 is recovered to the liquid feed pump 2 3 8 in the middle of the ozone water recovery pipe 2 3 7. Ozone water filter 2 3 4 (washing liquid recovery means) ° Each filter 2 3 3, 2 3 4 has a structure as shown in Fig. 29, and is arranged in the center to circulate the used cleaning liquid at the same time A pipe body 2 3 9 having a function of allowing the cleaning liquid to permeate from the pipe wall is provided with a filter material 2 4 0 composed of a Teflon resin mostly around the periphery, and a pipe body 2 3 9 for blocking the inside of the pipe body 2 3 9 is provided at the same time. The grid plate 2 4 1 of the circulation of the washing liquid. That is, when the used washing liquid is introduced through the inlets 242 of the filters 233 and 234, the washing liquid flows through the filter material 2 40 when the washing liquid flows in the direction of arrow F in FIG. 29, and the washing liquid is filtered. When it returns to the tube body 2 3 9 again, it becomes a cleaned cleaning liquid from which particles are removed, and is discharged from the discharge port 2 4 3. Then, as shown in FIG. 26, the hydrogen-containing water passing through the chlorine-containing water furnace 2 3 3 is supplied to the liquid-supplying pump 2 4 5 on the way through the recycled hydrogen-containing water supply pipe 2 4 4 Hydrogen-containing water ultrasonic cleaning nozzle 2 0 5 (regeneration cleaning liquid supply means). Similarly, the ozone water passing through the ozone water filter 2 3 4 is supplied to the ozone water ultrasonic cleaning nozzle 2 through the liquid feed pump 2 4 7 provided in the middle of the regenerating ozone water supply pipe 2 4 6. 0 6 (regeneration washing liquid supply means). In addition, the hydrogen-containing water supply piping 2 2 9 and the recycled hydrogen-containing water supply piping 2 4 4 are used for the ultrasonic cleaning of the hydrogen-containing water. The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm)- 52- (Please read the notes on the back before filling in this page) ----- 1—Order --------- line · A7 B7 421827 V. Description of the invention (50) < (Please read the notes on the back and fill in this page again.) It is connected before 2 0 5. You can introduce new hydrogen water or regenerate hydrogen water through the valve 2 6 2 for ultrasonic cleaning of hydrogen water. . Similarly, the ozone water supply pipe 2 3 1 and the regenerated ozone water supply pipe 2 4 6 are connected before the ozone water ultrasonic cleaning nozzle 2 0 6, and the ozone water ultrasonic cleaning can be performed by the valve 2 6 3 Nozzle 2 0 6 introduces new ozone water or regenerated ozone water. In addition, the hydrogen-containing water or ozone water passing through each of the filters 2 3 3 and .2 3 4 can be returned to the hydrogen-containing water generating device 2 2 7 or The ozone water generating device 2 2 8 supplements hydrogen gas or ozone gas. As shown in Figure 26, printed by the employee consumer agency of the Intellectual Property Bureau of the Ministry of Economic Affairs, a loading cassette 2 0 9 and a loading cassette 2 1 0 are detachably mounted on the side of the cleaning department 202. -The two cassettes 2 0 9 and 2 10 are those of the same shape that can accommodate a plurality of substrates W. Load the cassette 2 9 to receive the substrates W before cleaning, and carry out the cassette 2 1 0. Washed substrate W. A substrate transfer robot arm 208 is provided at a middle position between the cleaning section 202, the loading cassette 209, and the loading cassette 210. The substrate transfer robot arm 2 0 8 has an arm portion 2 4 8 with a retractable coupling mechanism on the upper part. The arm portion 2 4 8 can rotate and can be raised and lowered, and the substrate 2 4 8 supports and transfers the substrate W. . Figures 30 (a) and (b) show the state where the substrate transfer robot arm 2 ◦ 8 extends above the substrate holding portion 230. As shown in FIG. 30 (a), the fork 249 at the tip of the arm portion 248 is located between the rows 2 1 3 of the substrate lifting shafts 2 1 3 of the pedestal 2 03. The base of the substrate W before cleaning is received by the loading cassette 209. The paper size is in accordance with the Chinese National Standard (CNS) A4 specification (210 X 297 mm) A7 B7 421827 V. Description of the invention (51) When the board transfer robot arm 2 0 8 transfers the substrate W to the substrate holding portion 230, as shown in FIG. 30 (b), the substrate W is supported in a state where the substrate lifting shaft 2 1 3 is raised. The arm portion 2 4 8 enters above the pedestal 2 0 3, and the arm portion 2 4 8 descends a few backwards to the outside of the pedestal 2 3. After that, when the substrate raising / lowering shaft 2 13 is lowered, the substrate W is placed and held on the pedestal 203 as shown in FIG. 27 (b). In addition, the base plate transfer robot 2 0 8 has a distal end of a fork 2 4 9, and the upper convex portion 2 4 9 a is in point contact with the substrate, so that there is little foreign matter adhesion to the substrate W. The cleaning device 201 having the above-mentioned configuration is set by the operator for various cleaning conditions such as the interval between the cleaning nozzles 204, 205, 206, and 207 and the substrate W, the moving speed of the cleaning nozzle, and the flow rate of the cleaning liquid. In addition, the operation of each unit is controlled by the control unit to constitute an automatic operation. That is, when the cleaning device 1 is used, the substrate W before cleaning is set to the loading cassette 2 0 9, and when the operator operates the start switch, the loading cassette is transferred from the loading cassette by the substrate transfer robot 2 0 8 2 0 9 The substrate W is transferred to the pedestal 3, and the cleaning nozzles 204, 205, 206, and 207 sequentially perform ultraviolet cleaning, ultrasonic cleaning with hydrogen water, ultrasonic cleaning with ozone water, and rinsing water. After washing with water, the substrate is transported by the substrate transfer robot 208 in the carrier cassette 2 10 °. In the substrate cleaning apparatus 2 0 1 of this embodiment, each cleaning nozzle 204, 205, 206 '207 is a double-supported structure with both ends supported by pillars 2 1 9, and the nozzle moving means composed of the bracket base 2 1 6, the sliding body 2 1 8, the motor 2 2 0, etc. maintains each cleaning notebook. Paper size applies to China National Standard (CNS) A4 specifications (210 * 297 mm) -------------------- Order --------- line ( (Please read the note on the back before filling in this page) Employee Consumption Agreement of the Intellectual Property Bureau of the Ministry of Economic Affairs ^: 社 印 -54- Printed by the Employee Consumption Cooperative of the Intellectual Property Bureau of the Ministry of Economy 421827 A7 _B7___ (52) with an interval between the nozzle and the substrate constant by simultaneously horizontally moving the entire region to be washed can be washed clean of the substrate W surface. Therefore, the distance between the cleaning nozzle and the substrate W during cleaning can be adjusted with higher accuracy than in the previous apparatus having a single support nozzle. In particular, in this embodiment, since the interval Η between the opening 2 2 4 of the cleaning nozzle and the substrate W must be precisely controlled to a level of several mm to a level of 0.1 mm, a push-pull cleaning nozzle is used. With the double-support structure of the cleaning nozzle, the advantages of the high cleaning efficiency of the push-pull nozzle can be fully utilized. Furthermore, each of the four cleaning nozzles is configured to be cleaned by different washing methods such as ultraviolet washing, ultrasonic washing with hydrogen-containing water, ultrasonic washing with ozone water, and rinsing with water. Various cleaning methods can be implemented with one unit. That is, for example, after organic matter is removed by ultraviolet cleaning, ultrafine water is washed with hydrogen-containing water, and ozone particles are washed with ultra-sonic water to remove fine particles, and then the cleaning adhered to the substrate surface is rinsed with rinse water. The cleansing liquid is finally washed at the same time, so that various objects to be removed can be sufficiently washed and removed. As a result, even if there are various removal objects such as fine particles and organic substances, this can be surely washed and removed. In addition, even if multiple cleaning methods are performed, it is not necessary to consume huge equipment costs or occupy space in the cleaning process, and a reasonable installation can be achieved. In addition, in the case of the device of this embodiment, a hydrogen-containing water / ozone water generating section 2 1 1 is provided, and the ozone water generating device 2 2 8 is integrated into the cleaning device, especially because the life of the ozone water is short. Therefore, the present invention can be used for cleaning while maintaining the quality of ozone water, and can effectively perform ultrasonic cleaning of ozone water. Furthermore, the cleaning liquid regeneration section 2 1 2 is provided. The paper size is in accordance with China National Standard (CNS) A4 (210 X 297 mm) -55- ---------------- -i_ Order --------- line {Please read the notes on the back before filling out this page) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Employee Consumption Co., Ltd. 421827 Α7 Β7 V. Description of Invention (53) Can be recycled The used washing liquid such as hydrogen-containing water or ozone water can be regenerated and reused, so the amount of washing liquid can be reduced. In addition, in the configuration of this embodiment, the pedestal 203 is only capable of supporting the substrate W. However, this pedestal may be replaced with, for example, a rotary jig, and may be configured to be rotatable while holding the substrate. On the other hand, if the substrate is rotated during cleaning, more uniform cleaning can be performed, and the substrate can be rotated and dried without moving the substrate. Seventh Embodiment Hereinafter, a seventh embodiment of the present invention will be described with reference to FIG. 31 * > The substrate cleaning device of this embodiment is also a large-area glass substrate cleaning device similar to the sixth embodiment. The device of this embodiment differs from the device of the sixth embodiment only in the configuration of the cleaning nozzle and the configuration of the substrate holding means. The substrate transfer system, such as a loader, a loader, and a transfer robot, cleans the substrate. The liquid generation section, the cleaning liquid regeneration section, and the like, the substrate holding section of the cleaning section, and other configurations are almost the same as those of the sixth embodiment. Therefore, in FIG. 31, only the cleaning part is shown, and other parts are omitted. As shown in FIG. 31, a rotation jig 2 5 1 (which holds the substrate W) is rotatably provided in the center of the cleaning part 2 50. The substrate keeps rotating means). The rotary jig 2 5 1 holds the substrate W thereon by mechanical fixing means such as vacuum suction and claws. In addition, a driving source (not shown) is connected to the rotation jig 2 51 to form a configuration in which the rotation substrate W is also rotated with the rotation jig 2 51. Above the rotating clamp 2 5 1, the 4 nozzles are radial from the center point. The paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) 56 ------------- ------- Order --------- line Ίί < Please read the notes on the back before filling in this page) A7 B7 421827 V. Description of the invention (54) Extension, with a flat surface The X-shaped washing nozzle 2 5 2 = each washing nozzle is cleaned by various washing methods, and one end side is supported by the pillar 2 5 3 while the other end side is combined with each other. In the case of this embodiment, the four cleaning nozzles are nozzles 2 5 4 extending from the center to the lower right in FIG. 31, and are provided with ultraviolet lamps 2 5 8 for ultraviolet cleaning for decomposition and removal of organic matter by ultraviolet irradiation. The nozzle is a nozzle extending from the center to the lower left, and is a nozzle for ultrasonic cleaning of hydrogen-containing water which is provided with ultrasonic elements 2 5 9 and supplies ultrasonic vibration while washing with ultrasonic vibration. The nozzle extends from the center to the upper left. The 2 5 6 series is equipped with an ultrasonic element 2 5 9. It is a pure water ultrasonic cleaning nozzle that supplies pure water and gives ultrasonic vibration for washing. The nozzle 2 5 7 extending from the center to the upper right is for pure water and water cleaning. nozzle. The shape of each cleaning nozzle is the same as that of the sixth embodiment, and is a push-pull nozzle shown in Fig. 28 (in Fig. 28 (a), either of the pillars 2 1 9 are cut off and the nozzles are connected to each other). Composition is sufficient). The use of this nozzle can improve the cleaning efficiency and reduce the amount of cleaning liquid used. In this case, the openings 2 2 4 of the push-pull nozzles extend at least half the length of the diagonal of the substrate W in the longitudinal direction of each nozzle. In the case of this embodiment, unlike the apparatus of the sixth embodiment in which each cleaning nozzle is moved independently, it is not necessary to move the entire X-shaped cleaning nozzle 2 5 2 from one end of the substrate W to the other end, and It is a structure which rotates the board | substrate W by the rotation jig 2 51, and wash | cleans the whole area of the to-be-cleaned surface of the board | substrate W. However, even with this configuration, the size of the paper used for the X-shaped cleaning nozzle has passed the Chinese National Standard (CNS) A4 specification < 210 X 297 mm) -57-------------- ------- Order --------- line,] < Please read the notes on the back before filling in this page) Staff Consumption of Intellectual Property Bureau, Ministry of Economic Affairs- # 社 印制 A7 B7 421827 5. Description of the invention (55) It is not easy to clean the substrate W near the center point of 2 55 2. Here, the side of the X-shaped cleaning nozzle 2 5 2 can be sufficiently cleaned near the center point to move horizontally a few distances in two directions at right angles to eliminate dead angles. This structure can be moved by combining the bracket base 216 and the slide body 218 used as the nozzle moving means of the sixth embodiment in two orthogonal directions under the four pillars 2 5 3. 0 (mechanism (illustration omitted, nozzle moving means) is also realized) In addition, a cylinder (not shown) is provided in the pillar 2 5 3, which can adjust the height of the pillar (2 5 3) and the X-shaped cleaning nozzle (2 5 2 ) From the substrate W. In this way, the X-shaped cleaning nozzle 2 5 2 is moved horizontally in a two-dimensional manner while maintaining a spaced movement from the substrate W, and the rotation surface of the substrate W is cleaned by the rotation fixture 2 5 1 in cooperation with the rotation of the substrate W. Constructed in an all-region manner. Thereby, even in the vicinity of the center of the substrate W, sufficient cleaning can be performed by four different cleaning methods. In the substrate cleaning apparatus of the present embodiment configured as described above, one end of each cleaning nozzle 254 '255, 256, 257 is supported by a pillar 2 5 3, but the other end side is connected to the nozzle, and the whole Looking at it, it is still a double-supported support structure. With this configuration, the distance between the nozzle and the substrate W can be adjusted with high accuracy. In other words, t can fully take advantage of the high cleaning efficiency of the push-pull nozzle, and can exhibit the same effect as that of the sixth embodiment. The technical scope of the present invention is not limited to the embodiments described above, and various modifications can be made within a range not exceeding the gist of the present invention. For example, the paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) -58--------------------- Order ------ --- Line J (please read the notes on the back before filling in this page) Staff Consumption Agreement of the Intellectual Property Bureau of the Ministry of Economic Affairs ^: Printed by the agency A7 B7 421827 5. Description of the invention (56) If implemented in the above 6th and 7th The form shows an example in which the nozzles for cleaning are formed by four nozzles at the same time, but the number of nozzles is not limited to four, and the number may be changed as appropriate. As the form of each cleaning nozzle, although an example of a push-pull type nozzle is shown, the nozzle applicable to the substrate cleaning device of the present invention is not limited to a push-pull type nozzle, and as shown in FIG. 30, it can also be used. The slit-like opening 2 61 has a conventional nozzle for washing liquid flowing down through the opening 2 6 1. In addition, as examples of the cleaning liquid used, examples of hydrogen-containing water and ozone water will be described, but so-called cathode water or the like which is generated at the cathode when the water is electrolyzed may also be used. In this case, an electrolytic device may be provided as the cleaning liquid manufacturing device. As a means for regenerating the washing liquid, in addition to filtering particles or foreign matter in the washing liquid, a degassing device or the like for removing gas from the washing liquid may be used. Alternatively, a drying section such as 1 P A drying for drying the substrate after cleaning may be provided in the apparatus. The drying method can be applied to spin drying and IPA drying. In addition, in the above embodiment, a single substrate cleaning device was described. However, for example, the substrate cleaning device of the present invention is connected to a wet etching device and an automatic transfer mechanism is provided between the devices to make it a wet etching / It is also possible to clean the continuous processing equipment. Examples Hereinafter, experiments performed in order to confirm the effect of the substrate cleaning apparatus of the present invention will be described. This paper size applies to China Store Standard (CNS) A4 (210 X 297 mm) Please read the back. &Amp; Note before filling in this page Printed by the Intellectual Property Bureau employee consumer cooperative 421827 A7 ____B7 V. Description of the invention (57) Example 1 First, 'the cleaning effect of the push-pull nozzle unit described in the above embodiment is confirmed. In the substrate cleaning device according to the sixth embodiment, the substrate washes using an ultraviolet cleaning nozzle of a push-pull structure of an ultraviolet lamp that emits light having a wavelength of i 7 2 nm of X e-X e excimer laser. net. A substrate of 650 mm × 5 5 mm is used, the distance between the substrate and the nozzle is set to 1 mm, the energy of the ultraviolet lamp is 10 mw / cm2, and the effective irradiation area of the wire is 6 5 Omm × l 5 Omm, and the moving speed of the nozzle is 15 mm 1 second per second. The substrate with a contact angle of 40 degrees before cleaning was reduced to a contact angle of 4 degrees or less after cleaning. The contact angle refers to the angle between the substrate surface and the tangent to the surface of the water droplet when the water droplet is attached to the substrate. The higher the water droplet, the larger the angle, that is, the larger the contact angle, the more contaminated it is with organic matter, and the flatter the water droplet. That is, the smaller the contact angle is, the cleaner the display substrate is, and it is also an index indicating the clarity. Example 2 Next, the base-plate cleaning device corresponding to Figures 2 to 6 of the present invention (in the form of a plurality of nozzles lined up in a straight line in a plane) is used. An ultraviolet cleaning nozzle and a pure water ultrasonic cleaning device are used. The cleaning effect was measured with two nozzles, such as a nozzle. Both nozzles use push-pull nozzles. The substrate cleaning was performed once using an ultraviolet cleaning nozzle of the push-pull type structure of an ultraviolet lamp that emits light with a wavelength of 172 nm of Xe e excimer laser, as in Example 1 above. Use 6 5 0 This paper size is applicable to China National Standard (CNS) A4 specifications (210 X 297 male -60- --------------------- Order --- ------ Line 1 (Please read the precautions on the back before filling in this page> 421827 A7 _______ B7 V. Description of the invention (58) mmX5 5 Omm substrate, set the distance between the substrate and the nozzle to 1mm, UV The energy of the lamp is 10 mW / cm2 'The effective irradiation area of the wire is 65 Omm × l 5 Omm, and if the moving speed of the nozzle is 15 mm / sec, the substrate with a contact angle of 40 degrees before cleaning is cleaned' After cleaning The contact angle was 4 degrees or less. Next, the same substrate was cleaned once using a pure water ultrasonic cleaning nozzle with a push-pull structure of an ultrasonic element. The ultrasonic element was used to output 90 0W, 1MHz. Ultrasonic. If the distance between the substrate and the nozzle is 3 mm, the flow rate of pure water is 4 L / min, and the moving speed of the nozzle is 15 mm / sec, the initial foreign matter will be reduced to 42 900. Foreign matter, the removal rate was 93.2%. The substrate used in the evaluation was formed by forming a chromium film on a glass substrate and spraying alumina particles thereon. The substrate after forced contamination was used. For the number of foreign objects, the number of particles above 0.5 vm was measured. As a comparative example, the general nozzle shown in Figure 32 was used. The flow rate of pure water was 30 L. When the same cleaning is performed, the removal rate of foreign matter is only 85.0%. From this result, it can be seen that the substrate cleaning device of the present invention is particularly used in the case where a push-pull type nozzle is used as a cleaning nozzle. The flow rate of pure water can also improve the removal rate of foreign matter, and the cleaning efficiency is excellent. In addition, instead of the pure water cleaning solution used in the above experiment, hydrogen-containing water (pHIO, hydrogen concentration 1.3 ppm, and pH When the same cleaning is performed using ammonia water), the removal rate of foreign matter is increased to 99.9%. That is, the device of the present invention can obtain the paper size even if it is pure water, and the Chinese national standard (CNS > A4 specification) is applied. (210x 297 mm) (Please read the notes on the back of the praise before filling in this I) ------- 丨 Order._! 丨-丨! Line 'Printed by the Employee Consumption Order of the Intellectual Property Bureau of the Ministry of Economic Affairs 421827 A7 ____B7
經濟部智慧財產局員工消費合作社印製 五、發明說明（59) 分的洗淨力，但是將洗淨液替代爲含氫水時洗淨力可以更 進一步提高。 實施例3 其次’於相當本發明的第3 1圖（複數的噴嘴在一端 結合的形式）的基板洗淨裝置，使用紫外線洗淨用噴嘴與 純水超音波洗淨用噴嘴等2個噴嘴而測定其洗淨效果。2 個噴嘴同樣都使用推拉型的噴嘴。 首先，使用具備發出X e — X e受激準分子雷射之 1 7 2 n m的波長的光的紫外線燈之推拉型構造的紫外線 洗淨用噴嘴進行基板洗淨。使用6 5 0mmX5 5 Omm 的基板，將基板與噴嘴的間隔設定爲1 m m，紫外線燈的 能量爲1 0 m W/ c m 2，此外線的有效照射面積爲 3 2 5mmXl 5 0mm，基板的旋轉速度爲3 0 r pm ，進行3 0秒的紫外線洗淨，洗淨前接觸角爲4 0度的基 板，在洗淨後接觸角成爲4度以下。 接著，使用具備超音波元件的推拉型構造的純水超音 波洗淨用噴嘴進行1次洗淨。超音波元件使用可以輸出 4 5 0 W、1 Μ Η z的超音波者°使基板與噴嘴的間隔爲 3mm，純水的流量爲4 L/分，基板的旋轉速度爲 5 00 r pm，進行3 0秒的洗淨’初期狀態的 6 5 1 40 0個異物減低爲2 1 〇〇 〇個異物’除去率爲 9 6.8%。 ' 作爲比較例，使用第3 2圖所示的—般噴嘴’以純水 (請先閲讀背面之注意事項再填寫本頁) · n ft ϋ n I m n n n n -- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公楚） A7 421827 __B7 _ 五、發明說明（60) 的流量爲1 8 L/分進行同樣的洗淨時，異物的除去率只 有8 7 . 5%。由此結果顯示與實施例2的結果顯示相同 的傾向。亦即，使用本發明的基板洗淨裝置，特別是在適 用推拉型噴嘴作爲洗淨用噴嘴的場合，即使純水的流量很 少也可以提高異物的除去率，證實了洗淨效率極佳。 發明之效果 如以上詳細說明的根據本發明的基板洗淨裝置的話， 複數支撐體的各個先端可以從被處理基板的下方側支撐基 板，而且對於上述被處理基板的底面供給洗淨液的洗淨用 噴嘴（底面洗淨用噴嘴）可以沿著上述被處理基板的底面 移動，進而支撐體的升降移動裝置，以上述洗淨用噴嘴的 移動方向前方的上述支撐體不與移動的洗淨用噴嘴相互干 涉的方式連動於該洗淨用噴嘴的移動而可以升降移動，藉 此以前述複數支撐體的各個先端將被處理基板由此下方側 支撐，使上述洗淨用噴嘴沿著上述被處理基板的底面移動 的話，該洗淨用噴嘴的移動方向前方的上述支撐體會下降 的緣故所以不會與移動的洗淨用噴嘴相互干涉，此外，下 降後的支撐體在噴嘴通過後會上升，可以其先端再度支撐 上述被處理基板。 本發明的基板洗淨裝置，與藉由滾軸搬送被處理基板 同時洗淨的從前的基板洗淨裝置不同，藉由使上述洗淨用 噴嘴沿著上述被處理基板的底面移動，可以使被處理基板 幾乎不移動地洗淨被處理基板的底面。 ----!!! 訂.--------線 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合七社印紫 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -63- 經濟部智慧財產局員工消費合部社印製 4 218 2 7 A7 B7 五、發明說明（61) 亦即，根據本發明的基板洗淨裝置的話，製造生產線 中的基板洗淨裝置的長度可以縮短，裝置的佔有空間可以 減少。此外，洗淨工程之被處理基板的搬送距離也可以大 幅縮短，洗淨用噴嘴的移動範圍只要上述被處理基板面的 大小程度即可，不會在洗淨工程耗費龐大的設備費用或佔 有空間，可以達成合理的裝置。 此外，根據本發明的基板洗淨裝置，各洗淨用噴嘴爲 雙支撐構造，而且噴嘴移動手段將各洗淨用噴嘴保持與被 洗淨基板的間隔爲一定的狀態使移動於噴嘴的並列方向而 藉此洗淨處理基板的被洗淨面全區域之構成，因此容易維 持噴嘴與基板的距離於一定，可以橫跨被處理基板全面進 行均勻的洗淨。而藉由各個複數噴嘴將被洗淨基板以不同 的洗淨方法洗淨處理的緣故，可藉由1台本裝置進行種種 的洗淨，即使有微粒子 '有機物等種種除去對象，也可以 確實將其洗淨除去。此外，在洗淨工程也不會耗費龐大的 設備費或佔有空間，可以達成合理的裝置。此外，於本發 明的洗淨裝置適用省流體型噴嘴的場合，可以削減洗淨液 的使用量同時可以顯著提高基板的淸淨度。特別是在本發 明的洗淨裝置洗淨用噴嘴爲雙支撐構造，可以安定地維持 噴嘴與基板間的間隔，所以非常適於適闬省流體型噴嘴。 圖面之簡單說明 第1圖係顯芣本發明的第1實施形態之基板洗淨裝置 的全體構成之平面圖。 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐〉 -64- --------------------訂---------線^τ (請先閱讀背面之注意事項再填寫本頁) A7 421827 B7 五、發明說明（62 ) 第2圖係顯示該裝置的基板保持部的構成之縱剖面圖 0 第3圖係顯示該裝置的基板保持部的第一基板支撐體 的構成之平面圖= 第4圖係顯示該裝置的基板保持部的第二基板支撐體 的構成之平面圖。 第5圖係由基板保持部之側所見到的該裝置的洗淨用 噴嘴的平面圖。 第6圖係沿著第5圖的V — V線之剖面之側面圖。 第7圖係顯示該裝置的支撐體的構成之一部份的剖面 之側面圖。 第8圖係供說明該裝置的基板搬送用機械手臂的動作 之圖，顯示支撐基板之臂進入基板保持部上的狀態之平面 圖。 第9圖係沿著第8圖的VE — Μ線之縱剖面圖。 第1 0圖係供說明該裝置的動作之圖，顯示以複數的 支撐栓的各個先端保持基板的狀態之縱剖面圖。 第1 1圖係供說明該裝置的動作之圖，顯示洗淨用噴 嘴的移動方向前方的複數支撐栓下降，而基板被保持於洗 淨用噴嘴的移動方向後方的複數支撐栓的各個先端的狀態 之縱剖面圖。 第1 2圖係供說明該裝置的動作之圖，顯示藉由洗淨 用噴嘴的接近使下降之支撐栓上升而以其先端再度支撐基 板的狀態之縱剖面圖。 ------------------ (請先閲讀背面之注意事項再填寫本頁) 訂---------線( 經濟部智慧財產局員工湞費合A社印製 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -65- 4 218 27 a? _ B7 五、發明說明（63) <請先閱讀背面之注意事項再填寫本頁) 第1 3圖係供說明該裝置的動作之圖，顯示基板洗淨 後的各洗淨用噴嘴被配置於托架基座的另一端側的狀態之 縱剖面圖。 第1 4圖係供說明該裝置的動作之圖，顯示基板的底 面被以第一基板支撐體的複數支撐栓的先端支撐同時被以 固定栓支撐的狀態之縱剖面圖。 第1 5圖係供說明被設於該裝置的基板保持部的氣體 供給孔之圖，係基板保持部的縱剖面圖= 第1 6圖係由基板側所見之本發明的第2實施形態之 基板洗淨裝置的洗淨部之平面圖。 第1 7圖係沿著第1 6圖的X V I - X V I線的縱剖 面圖。 . 第1 8圖係供說明本發明的第3實施形態之基板洗淨 裝置的洗淨部之圖，係顯示從與洗淨用噴嘴的移動方向交 叉的方向所見之洗淨部的基板的下方之縱剖面圖。 第1 9圖係供說明在沿著第1 8圖的洗淨用噴嘴的移 動方向上所見之洗淨部的洗淨用噴嘴移動時的支撐栓的動 作之圖。 經濟部智慧財產局員工消費合作社印製 第2 0圖係由基板保持側所見之本發明的第4實施形 態之基板洗淨裝置的洗淨部的洗淨用噴嘴及其移動手段之 平面圖。 第2 1圖係沿著洗淨用噴嘴的移動方向所見之第2 0 圖的洗淨部之部份之剖面側視圖。 第2 2圖係顯示本發明的第5實施形態之基板洗淨裝 -66- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 B7 421827 五、發明說明（64) 置的基板保持部的構成之縱剖面圖。 第2 3圖係顯示該裝置的基板保持部的第一基板支撐 體的構成之平面圖。 第2 4圖係顯示該裝置的基板保持部的第二基板支撐 體的構成之平面圖。 第2 5圖係顯示可以適用於上述實施形態的洗淨裝置 之洗淨用噴嘴的其他形態的立體圖。 第2 6圖係顯示本發明的第6實施形態之基板洗淨裝 置的全體構成之平面圖。 第27圖係顯示該裝置的台座的構成，（a)係平面 圖，（b )係沿著（a )的I I _ I I線之縱剖面圖。 第2 8圖係顯示該裝置的洗淨用噴嘴的構成，（a ) 係平面圖，（b )係沿著（a )的I I I — I I I線之縱 剖面圖。 第2 9圖係顯不該裝置的過爐器的構成之剖開一部份 的側面圖。 第3 0圖係供說明該裝置的基板搬送用機械手臂的動 作之圖，顯示支撐基板之臂進入台座上的狀態，（a )係 平面圖，（b )係沿著（a )的V — V線之縱剖面圖。 第3 1圖係顯示本發明的第7實施形態之基板洗淨裝 置的洗淨部的構成之平面圓。 第3 2圖係顯示可以適用於上述實施形態的基板洗淨 裝置的洗淨用噴嘴的其他形態之立體圖。 第3 3圖係顯示具備複數之洗淨機能的從前的洗淨裝 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐) -6^ - (請先閲讀背面之注意事項再填寫本頁) A-^i ------訂---------線' 經濟部智慧財產局員工消費合，社印製 4 2 18 2 了 a? B7 五、發明說明（65) 置之一例的平面圖。 (請先閲讀背面之注意事項再填寫本頁) 符號說明 I 基板洗淨裝置 2 洗淨部 3、1 0 3 基板保持部 4 紫外線洗淨用噴嘴（底面洗淨用噴嘴） 4 a 紫外線洗淨用噴嘴（上面洗淨用噴嘴） 5、5 c 含氫水超音波洗淨用噴嘴（底面洗淨用噴嘴） 5 a 含氫水超音波洗淨用噴嘴（上面洗淨甩噴嘴） 6 臭氧水超音波洗淨用噴嘴（底面洗淨用噴嘴） 6 a 臭氧水超音波洗淨用噴嘴.（上面洗淨用噴嘴） 7 純水沖洗洗淨用噴嘴（底面洗淨用噴嘴） 7 a 純水沖洗洗淨用噴嘴（上面洗淨用噴嘴） II 含氫水/臭氧水產生部（洗淨液製造手段） 1 2 洗淨液再生部（洗淨液再生手段） 13、 113 第一基板支撐體 1 3 a 支撐栓 13b 固定用栓 經濟部智慧財產局員工消費合七社印製 13c、113c 支撐栓插通孔 13d 栓插通用缺口 13e、113e 支撐體旋轉用轉軸 14、 114 第二基板支撐體 14a、114a 支撐栓（支撐體） 14c、114c 栓插通孔 1 4 d、1 1 4 d 轉軸孔 本紙張尺度適用中國國家標準（CNS)A4規格（21〇χ297公釐) -68 - 421827 A7 _____B7_五、發明說明（66 ) 1 4 f ' 1 1 4 f 支撐體支撐板 1 6 托架基座（噴嘴移動手段） 18 滑動體（噴嘴移動手段） 19 支柱（噴嘴移動手段） 20 馬達C噴嘴移動手段） 經濟部智慧財產局員工消費合作社印製 2 1 導入通路 21b 第一導入管 2 1 d 閥 22a 排出口 22c 第二排出管 23 導引構件 2 7 含氫水產生裝置（ 28 臭氧水產生裝置（ 2 9 含氫水供給配管（ 3 0 ' 3 2 送液幫浦（ 3 1 臭氧水供給配管（ 3 3 含氫水用過濾器（ 34 臭氧水用過濾器（ 3 5 含氫水回收配管（ 36、38 送液幫浦（洗 37 臭氧水回收配管（ 3 9 管體 4 0 4 1 柵板 4 2 4 4 再生含氫水供給配管 2 1a 2 1c 2 2 2 2b 2 2 d 2 4 洗淨液製造 洗淨液製造 洗淨液供給 洗淨液供給 洗淨液供給 洗淨液再生 洗淨液再生 洗淨液回收 淨液回收手 洗淨液回收 濾材 導入口 (再生洗淨 導入口 第二導入管 排出通路 第一排出管 閥 開口部 手段） 手段） 手段） 手段） 手段） 手段） 手段） 手段） 段） 手段） 液供給手段） -------------0¾-----------------^ (請先閲讀背面之注意事項再填寫本頁) ^紙張尺度適用中國國家標準（cnS)A4規格（210x 297公釐) _ 69 經濟部智慧財產局員工消費合★社印製 4 218 2 7 A7 ______ B7 五、發明說明（67) 4 5 、 4 7 送液 幫浦 ( 再 生 洗 淨液供 給 手 段 ) 4 6 再生臭 氧水供給 配 管 ( 再 生洗淨 液 供 給 手 段） 4 8 臂 4 9 叉 6 0 噴嘴 6 1 開口部 6 2 閥 6 3 閥 7 1 氣體 供給 孔 8 1 近距 開關 (驅 動 訊 號 產 生手段 ) 8 2 激進 開關 按壓 部 ( 近 距 開關輸 入 機 構 ) 8 5 支撐 栓保 持構 件 ( 支 撐 體保持 構 件 ) 8 6 第一 彈簧 構件 8 7 彈 簧 構 件 安 裝板 8 8 ^ -— 彈簧 構件 8 8 a 限 制 器 8 9 栓保持板 9 0 受 壓 體 9 1 滾軸 支撐 體 9 2 滾 軸 9 5 壓下 體 9 6 凸 m 9 7 導引 板 1 1 3 g 鍔 部 1 .1 4 g 鍔 部 F 過濾 器中 的洗淨: 液 的 侃 動 f 1 洗淨液的流動方向 Η 開口 部與 基板 之; 間 的 距 離 S _嘴 移動 方向 W > • 基板 (被 洗淨 基: 板 ) 2 0 1 基 板洗 淨裝 置 2 0 2 、2 5 0 洗淨 部 2 0 3 台座（基板保持手段） (請先閲讀背面之注意事項再填寫本頁)Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. The cleaning power of (59) cents, but the cleaning power can be further improved when the cleaning liquid is replaced with hydrogen-containing water. Example 3 Next, the substrate cleaning device corresponding to FIG. 31 (a form in which plural nozzles are connected at one end) corresponding to FIG. 31 of the present invention uses two nozzles, such as a UV cleaning nozzle and a pure water ultrasonic cleaning nozzle. The cleaning effect was measured. Both nozzles also use push-pull nozzles. First, a substrate was cleaned using an ultraviolet cleaning nozzle having a push-pull structure of an ultraviolet lamp having a wavelength of 172 nm in Xe-Xe excimer laser. Using a substrate of 650 mm × 5 5 mm, the distance between the substrate and the nozzle is set to 1 mm, the energy of the ultraviolet lamp is 10 m W / cm 2 and the effective irradiation area of the wire is 3 2 5 mm × l 50 mm, and the rotation speed of the substrate The substrate was cleaned at 30 r pm for 30 seconds, and the substrate with a contact angle of 40 degrees before cleaning was cleaned, and the contact angle was 4 degrees or less after cleaning. Next, it was washed once using a pure water ultrasonic cleaning nozzle having a push-pull structure having an ultrasonic element. The ultrasonic device uses ultrasonic waves that can output 4 50 W, 1 Μ Η z. The distance between the substrate and the nozzle is 3 mm, the flow rate of pure water is 4 L / min, and the rotation speed of the substrate is 5 00 r pm. The washing time of 30 seconds was reduced from 6 5 1 40 foreign matter in the initial state to 2 1 000 foreign matter. The removal rate was 9 6.8%. 'As a comparative example, use the general nozzle shown in Figure 3 2' with pure water (please read the precautions on the back before filling this page) · n ft ϋ n I mnnnn-This paper size applies Chinese national standards ( CNS) A4 specification (210 X 297 cm) A7 421827 __B7 _ 5. Description of the invention (60) When the flow rate is 18 L / min for the same cleaning, the removal rate of foreign matter is only 87.5%. This result shows the same tendency as that of the result of Example 2. That is, when the substrate cleaning device of the present invention is used, particularly when a push-pull type nozzle is used as a cleaning nozzle, the removal rate of foreign matter can be improved even if the flow rate of pure water is small, which proves that the cleaning efficiency is excellent. Advantageous Effects of Invention As described in detail in the substrate cleaning apparatus of the present invention, each tip of the plurality of support bodies can support the substrate from below the substrate to be processed, and the bottom surface of the substrate to be processed is supplied with a cleaning solution. The nozzle (bottom surface cleaning nozzle) can be moved along the bottom surface of the substrate to be processed, and the support body is moved up and down. The support body in the moving direction of the cleaning nozzle is not connected to the moving cleaning nozzle. The cleaning nozzles can be moved up and down by interlocking with the movement of the cleaning nozzle, thereby supporting the substrate to be processed at the respective lower ends of the plurality of support bodies from below, so that the cleaning nozzles are arranged along the substrate to be processed. If the bottom surface of the cleaning nozzle moves, the support body in the moving direction of the cleaning nozzle will drop, so it will not interfere with the moving cleaning nozzle. In addition, the lowered support body will rise after the nozzle passes. The apex again supports the substrate to be processed. The substrate cleaning device of the present invention is different from the conventional substrate cleaning device that simultaneously cleans the substrate to be processed by a roller, and moves the cleaning nozzle along the bottom surface of the substrate to be processed. The processing substrate cleans the bottom surface of the processing substrate with little movement. ---- !!! Order .-------- Line (Please read the notes on the back before filling this page) Employees of Intellectual Property Bureau of the Ministry of Economy Consumption Paper printed by Heqisha Paper Co., Ltd. Chinese paper standards apply (CNS) A4 specification (210 X 297 mm) -63- Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Consumption Co., Ltd. 4 218 2 7 A7 B7 V. Invention description (61) That is, the substrate cleaning according to the present invention With the device, the length of the substrate cleaning device in the manufacturing line can be shortened, and the space occupied by the device can be reduced. In addition, the conveying distance of the substrate to be processed in the cleaning process can be greatly shortened. The moving range of the cleaning nozzle can be as long as the size of the surface of the substrate to be processed, and does not consume huge equipment costs or occupy space in the cleaning process. , Can reach a reasonable device. In addition, according to the substrate cleaning device of the present invention, each cleaning nozzle has a double-support structure, and the nozzle moving means maintains a constant distance between each cleaning nozzle and the substrate to be cleaned, and moves the nozzles in a parallel direction. In this way, the entire area of the cleaned surface of the processing substrate is cleaned, so it is easy to maintain a constant distance between the nozzle and the substrate, and the entire substrate can be cleaned uniformly across the processed substrate. The substrates to be cleaned are cleaned by different nozzles using various nozzles. Various cleaning methods can be performed by this unit. Even if there are various objects to be removed such as fine particles and organic substances, they can be reliably removed. Wash and remove. In addition, the cleaning project does not consume huge equipment costs or occupy space, and a reasonable installation can be achieved. In addition, when the cleaning device of the present invention is applied to a fluid-saving nozzle, the amount of cleaning liquid used can be reduced and the cleanliness of the substrate can be significantly improved. In particular, the cleaning nozzle of the cleaning device of the present invention has a double support structure and can stably maintain the distance between the nozzle and the substrate, so it is very suitable for a fluid-saving nozzle. Brief Description of the Drawings Fig. 1 is a plan view showing the overall configuration of a substrate cleaning apparatus according to a first embodiment of the present invention. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -64- -------------------- Order ------- --Line ^ τ (Please read the precautions on the back before filling in this page) A7 421827 B7 V. Description of the invention (62) Figure 2 is a longitudinal sectional view showing the structure of the substrate holding portion of the device. 0 Figure 3 Plan view showing the configuration of the first substrate support body of the substrate holding portion of the device = FIG. 4 is a plan view showing the structure of the second substrate support body of the substrate holding portion of the device. FIG. 5 is the side of the substrate holding portion A plan view of the cleaning nozzle of the device is seen in Fig. 6. Fig. 6 is a side view taken along a section of the V-V line in Fig. 5. Fig. 7 shows a part of the structure of the support of the device. Sectional side view. Fig. 8 is a diagram for explaining the operation of the substrate transfer robot arm of the device, and is a plan view showing a state in which the arm supporting the substrate enters the substrate holding portion. Fig. 9 is a view along VE of Fig. 8 — A longitudinal cross-sectional view of line Μ. Figure 10 is a diagram for explaining the operation of the device, showing the various tips of a plurality of support bolts. A longitudinal sectional view of a state in which a substrate is held. Fig. 11 is a diagram for explaining the operation of the device, showing that a plurality of support pins in front of the moving direction of the cleaning nozzle are lowered, and the substrate is held in the moving direction of the cleaning nozzle. A longitudinal cross-sectional view of the state of each apex of a plurality of rear support bolts. Figures 12 and 12 are diagrams for explaining the operation of the device, showing that the descending support bolt is raised by the approach of the cleaning nozzle, and is supported again at its tip. Vertical sectional view of the state of the substrate. ------------------ (Please read the precautions on the back before filling in this page) Order --------- line (Printed by the staff of the Intellectual Property Bureau of the Ministry of Economic Affairs, Hefei Company A. The paper is printed in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) -65- 4 218 27 a? _ B7 V. Description of the invention (63) < Please read the precautions on the back before filling this page.) Figures 1 and 3 are diagrams for explaining the operation of the device. Each cleaning nozzle after the substrate is cleaned is placed on the other end side of the cradle base. A longitudinal sectional view of the state. Figures 14 and 14 are diagrams for explaining the operation of the device, showing that the bottom surface of the substrate is marked with A longitudinal cross-sectional view of a state where a plurality of support pins of a substrate support body are supported at the same time by fixed pins. Figures 15 and 15 are views for explaining gas supply holes provided in a substrate holding portion of the device, and are substrate holding Vertical sectional view of the part = FIG. 16 is a plan view of the cleaning part of the substrate cleaning device of the second embodiment of the present invention as viewed from the substrate side. FIG. 17 is a view along the XVI-XVI of FIG. 16 A longitudinal cross-sectional view of the line. Fig. 18 is a view for explaining a cleaning section of a substrate cleaning apparatus according to a third embodiment of the present invention, and shows the cleaning viewed from a direction crossing the moving direction of the cleaning nozzle. A vertical cross-sectional view below the substrate of the clean section. Fig. 19 is a diagram for explaining the operation of the support pin when the washing nozzle of the washing section is viewed in the moving direction of the washing nozzle shown in Fig. 18; Printed by the Employees' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. Figure 20 is a plan view of the cleaning nozzle and its moving means of the cleaning section of the substrate cleaning device of the fourth embodiment of the present invention as seen from the substrate holding side. Fig. 21 is a cross-sectional side view of a part of the cleaning portion of Fig. 20 as seen along the moving direction of the cleaning nozzle. Figure 22 shows the cleaning of the substrate according to the fifth embodiment of the present invention. -66- This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) A7 B7 421827 V. Description of the invention (64) A longitudinal cross-sectional view of the structure of a substrate holding portion provided. Fig. 23 is a plan view showing the structure of the first substrate supporting body of the substrate holding portion of the device. Fig. 24 is a plan view showing the configuration of a second substrate supporting body of the substrate holding portion of the device. Fig. 25 is a perspective view showing another embodiment of a nozzle for cleaning which can be applied to the cleaning device of the above embodiment. Fig. 26 is a plan view showing the overall configuration of a substrate cleaning apparatus according to a sixth embodiment of the present invention. Fig. 27 shows the structure of the pedestal of the device, (a) is a plan view, and (b) is a longitudinal cross-sectional view taken along the line I I _ I I in (a). Fig. 28 shows the structure of the cleaning nozzle of the device, (a) is a plan view, and (b) is a longitudinal sectional view taken along the line I I I-I I I of (a). Fig. 29 is a side view showing a part of the structure of the furnace of the device, which is cut away. Fig. 30 is a diagram for explaining the operation of the substrate transfer robot arm of the device, showing the state where the arm supporting the substrate enters the pedestal, (a) is a plan view, and (b) is V-V along (a) Vertical section of the line. Fig. 31 is a plane circle showing the configuration of a cleaning section of a substrate cleaning apparatus according to a seventh embodiment of the present invention. Fig. 32 is a perspective view showing another embodiment of a nozzle for cleaning which can be applied to the substrate cleaning apparatus of the above embodiment. Figure 3 3 shows the previous cleaning paper with multiple cleaning functions. The paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) -6 ^-(Please read the precautions on the back before (Fill in this page) A- ^ i ------ Order --------- line 'Employees of the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Printing, printed by the company 4 2 18 2 a? B7 V. Description of the invention (65) A plan view of an example. (Please read the precautions on the back before filling this page) Symbol description I Substrate cleaning device 2 Cleaning section 3, 1 0 3 Substrate holding section 4 Nozzle for UV cleaning (nozzle for bottom cleaning) 4 a UV cleaning Nozzle (nozzle for upper washing) 5, 5 c Nozzle for ultrasonic washing with hydrogen water (nozzle for washing at the bottom) 5 a Nozzle for ultrasonic washing with hydrogen water (nozzle for washing at the top) 6 Ozone water Nozzle for ultrasonic cleaning (nozzle for bottom surface cleaning) 6 a Nozzle for ultrasonic cleaning with ozone water. (Nozzle for upper surface cleaning) 7 Nozzle for pure water washing (nozzle for bottom surface cleaning) 7 a pure water Nozzles for washing and cleaning (nozzles for cleaning on the upper surface) II Hydrogen-containing water / ozone water generating section (cleaning liquid manufacturing method) 1 2 Cleaning liquid regeneration section (cleaning liquid regeneration method) 13, 113 First substrate support 1 3 a Support bolt 13b Fixing bolt 13c, 113c Printed by employees of the Intellectual Property Bureau of the Ministry of Economic Affairs 13c, 113c Support bolt insertion hole 13d Bolt common notch 13e, 113e Rotating shaft 14, 114 Second substrate support 14a, 114a Support bolt (support body) 14c 114c Bolt through hole 1 4 d, 1 1 4 d Shaft hole The paper size is applicable to Chinese National Standard (CNS) A4 (21〇297 mm) -68-421827 A7 _____B7_ V. Description of the invention (66) 1 4 f '1 1 4 f Support body support plate 1 6 Bracket base (nozzle moving means) 18 Sliding body (nozzle moving means) 19 Pillar (nozzle moving means) 20 Motor C nozzle moving means) Intellectual Property Bureau, Ministry of Economic Affairs Employees ’consumption Cooperative printed 2 1 Introduction passage 21b First introduction pipe 2 1 d Valve 22a Discharge port 22c Second discharge pipe 23 Guide member 2 7 Hydrogen-containing water generating device (28 Ozone-water generating device (2 9 Hydrogen-containing water supply pipe ( 3 0 '3 2 Liquid supply pump (3 1 Ozone water supply piping (3 3 Filter for hydrogen water (34 Filter for ozone water (3 5 Hydrogen water recovery piping (36, 38 Liquid pump (washing 37 ozone water recovery pipe (3 9 pipe body 4 0 4 1 grid plate 4 2 4 4 regeneration hydrogen water supply pipe 2 1a 2 1c 2 2 2 2b 2 2 d 2 4 washing liquid manufacturing washing liquid manufacturing washing liquid Supply of washing liquid supply of washing liquid supply of washing liquid regeneration of washing liquid regeneration of washing liquid recovery Liquid recovery hand washing liquid recovery filter material inlet (regeneration washing introduction port second introduction pipe discharge passage first discharge pipe valve opening means) means) means) means) means) means) means) means) paragraph) means) liquid Means of supply) ------------- 0¾ ----------------- ^ (Please read the precautions on the back before filling in this page) ^ Paper Standards are applicable to China National Standard (cnS) A4 specifications (210x 297 mm) _ 69 Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs ★ Printed by the agency 4 218 2 7 A7 ______ B7 V. Description of the invention (67) 4 5 、 4 7 Liquid pump (regeneration washing liquid supply means) 4 6 Regeneration ozone water supply pipe (regeneration washing liquid supply means) 4 8 Arm 4 9 Fork 6 0 Nozzle 6 1 Opening 6 2 Valve 6 3 Valve 7 1 Gas supply hole 8 1 Proximity switch (driving signal generating means) 8 2 Push switch pusher (proximity switch input mechanism) 8 5 Support bolt holding member (support body holding member) 8 6 First spring member 8 7 Spring Spring member mounting plate 8 8 ^ -— Spring member 8 8 a Limiter 8 9 Bolt holding plate 9 0 Pressure receiving body 9 1 Roller support 9 2 Roller 9 5 Depressing body 9 6 Convex m 9 7 Guide plate 1 1 3 g crotch 1.1 .4 g crotch F Flushing in the filter: the movement of the liquid f 1 flow direction of the cleaning liquid Η the distance between the opening and the substrate S _ mouth movement direction W > • Substrate (base to be cleaned: plate) 2 0 1 Substrate cleaning device 2 0 2, 2 5 0 Cleaning section 2 0 3 Stand (substrate holding means) (Please read the precautions on the back before filling this page)
Al^--------訂---------線二 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -70- 42^827 A7 五、發明說明（68 ) 經濟部智慧財產局員工消費合作社印製 2 0 4 、2 5 4 紫 外 線 洗 淨 用 噴 嘴 2 0 5 ' 2 5 5 含 氫 水 超 音 波 洗淨 用 噴 嘴 2 0 6 臭 氧 水 超 音 波 洗 淨 用 噴 嘴 2 0 7 、2 5 7 純 水 沖洗 洗 淨 用 噴 嘴 2 1 1 含 氫 水 / 臭 氧 水 產 生 部 ( 洗 淨 液 製 造 手段 2 1 2 洗 淨 液 再 生 部 ( 洗 淨 液 再 生 手 段 ) 2 1 6 托 架 基 座 ( 噴 嘴 移 動 手 段 ) 2 1 8 滑 動 器 ( 噴 嘴 移 動 手 段 ) 2 1 9 支柱 C 噴 嘴 移 動 手 段 ) 2 2 0 馬 達 ( 噴 嘴 移 動 手 段 ) 2 2 1 導 入 通 路 2 2 2 排 出 通 路 2 2 3 交 叉 部 2 2 4 開 P 部 2 2 7 含 氫 水 產 生 裝 置 ( 洗 淨 液 製 造 手 段 ) 2 2 8 臭 氧 水 產 生 裝 置 ( 洗 淨 液 製 造 手 段 ) 2 2 9 含 氫 水供 給 配 管 ( 洗淨 液 供 給 手 段 ) 2 3 0 •2 3 2 送 液 幫 浦 ( 洗 淨 液 供 給 手 段 ) 2 3 1 臭 氧 水供 給 配 管 ( 洗 淨 液 供給手段 ) 2 3 3 含 氫 水 用 過 濾 器 ( 洗淨 液 再 生 手 段 ) 2 3 4 臭 氧 水 用 過 濾 器 ( 洗 淨 液 再 生 手 段 ) 2 3 5 含 氫 水 回 收 配 管 ( 洗 淨 液 回 收 手 段 ) 2 3 6 ' .2 3 8 送 液 幫 浦 ( 洗 淨 液 回 收 手 段 ) 2 3 7 臭 氧 水 回 收 配 管 ( 洗 淨 液 回 收 手 段 ) 2 4 4 再 生 含 氫 水 供 給 配 管 (再生洗泻 〖液供給手段 2 4 5、 .2 4 7 送 液 幫 浦 ( 再 生 洗 淨 液 供 給 手段 (請先間讀背面之注意事項再填寫本頁) --------訂---------線、 Μ或張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） IV- 421827 A7 B7 五、發明說明（69 ) 2 4 6 再生臭氧水供給配管（再生洗淨液供給手段) 2 5 1 自旋夾具（基板保持旋轉手段） 256 純水超音波洗淨用噴嘴 2 6 0 噴嘴 <請先閲讀背面之注意事項再填寫本頁) --------訂---------線' 經濟部智慧財產局員工消費合-#社印製 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -72 -Al ^ -------- Order --------- Line 2 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) -70- 42 ^ 827 A7 Description of the invention (68) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economy 2 0 4 and 2 5 4 Nozzles for ultraviolet cleaning 2 0 5 '2 5 5 Nozzles for ultrasonic cleaning of hydrogen-containing water 2 0 6 Ozone water ultrasonic Washing nozzles 2 0 7 and 2 5 7 Washing nozzles for pure water 2 1 1 Hydrogen-containing water / ozone water generating unit (washing liquid manufacturing means 2 1 2 Washing liquid regeneration unit (washing liquid regeneration means) 2 1 6 Bracket base (nozzle moving means) 2 1 8 Slider (nozzle moving means) 2 1 9 Pillar C (nozzle moving means) 2 2 0 Motor (nozzle moving means) 2 2 1 Introduction path 2 2 2 Discharge path 2 2 3 Cross section 2 2 4 Open P section 2 2 7 Hydrogen-containing water generating device (washing liquid manufacturing method) 2 2 8 Ozone water generating device (washing liquid manufacturing method) ) 2 2 9 Hydrogen-containing water supply piping (cleaning liquid supply means) 2 3 0 • 2 3 2 Liquid feed pump (cleaning liquid supply means) 2 3 1 Ozone water supply piping (cleaning liquid supply means) 2 3 3 Filter for hydrogen-containing water (washing liquid regeneration means) 2 3 4 Filter for ozone water (cleaning liquid regeneration means) 2 3 5 Hydrogen-containing water recovery pipe (washing liquid recovery means) 2 3 6 '.2 3 8 Liquid feed pump (cleaning liquid recovery means) 2 3 7 Ozone water recovery piping (cleaning liquid recovery means) 2 4 4 Regenerative hydrogen-containing water supply piping (regenerating diarrhea〗 〖Liquid supply means 2 4 5, .2 4 7 Liquid supply pump (regeneration cleaning liquid supply means (please read the precautions on the back before filling this page) -------- Order -------- Line, M or Zhang Standards apply to China National Standard (CNS) A4 specifications (210 X 297 public love) IV- 421827 A7 B7 V. Description of the invention (69) 2 4 6 Regeneration ozone water supply pipe (regeneration washing liquid supply means) 2 5 1 Spin Jig (means for holding substrate rotation) 256 pure Nozzle for ultrasonic cleaning 2 6 0 Nozzle < Please read the notes on the back before filling this page) -------- Order --------- line Consumption- # 社 印 This paper is sized for China National Standard (CNS) A4 (210 X 297 mm) -72-