經濟部中央搮率局貝工洧费合作社印製 A7 __B7 _ 五、發明説明（/) 發明領域： 本發明是關於一種滑行體(si ider)滑行高度校正標準 片(bump disk)的製造方法，特別是有關於利用剝離技術來 製造滑行高度校正標準片的方法。 習用技術： 按，在磁碟片正式出廠之前，必須經過滑行高度的測 試以確保品質良好。目前一般的做法是設計一種表面具有 已知高度突起的校正標準片，使滑行體與標準片碰撞來模 擬在實際磁碟機內滑行時的碰撞訊號，以測試碟片是否符 合所需的滑行高度。 通常在滑行體上會貼上一個信號轉換器，材質是鉛鍩 鈦氧化物(PZT ; PbZrJihOp，可於與磁碟片接觸時產生一 輸出信號。請參閱圖一，爲習知技藝利用校正標準片來校 正滑行高度的示意圓。放置在懸臂26上的滑行體24其表面 有著一個PZT信號轉換器(transducer)27，當此滑行體24欲 測試磁碟片20特定位置的高度時，就會滑行至那裡，因 此，就可以利用校正片上的突起物22來進行校正。 目前製作滑行高度校正標準片有許多方法，一般最常 用的方法是利用金屜光罩上打穿孔洞來進行突起物的濺 鍍，由於金靥光罩的厚度(約50μιη)是突起物高度(約0. 05μιη) 的1000倍，故在濺鑛突起物時，其突起物之形狀因高度落 差太大會呈現中央高兩邊低的不規則形，而且在突起物之 高度愈低時此種現象愈明顯，而在邁向未來高密度、小體 積磁碟機的趨勢下，因磁頭是愈飛愈低，其突起物之高度 _3_ 本纸張尺度逋用中國國家揉準（CNS ) Α4規格（210X297公釐） I ϋ 裝 If n 訂— 線 (請先Μ讀背面之注意事項再填寫本頁) 經濟部中央樣隼局貝工消費合作社印«. A7'. B7 五、發明説明（2 ) * 要求也將更低，所以此種情形愈發嚴重，而造成了滑行高 度校正標準片上的突起物高度不均勻、訊號再現性不佳且 校正標準片的壽命有限的各種缺點，不符未來之使用。 除此之外，IBM公司的Baumgart等人在美國專利第 5, 528,922號中，則揭露一種利用雷射光束來形成滑行高度 校正標準片火山口狀(crater)突起物的製造方法，但是此 種製程方式與本發明的剝離技術(lift off)仍有所不同。 因此，本發明揭露一種滑行高度校正標準片的新製 法，能夠在碟片上產生邊緣垂直，表面平坦的突起物，延 長滑行高度校正標準片的壽命，不會有上述習用技術之種 種缺點》 發明的概述： 本發明之主要目的爲提供一種滑行高度校正標準片之 製造方法。 本發明之次要目的爲提供一種高度容易控制的滑行高 度校正標準片之製造方法。 本發明之再一目的爲提供一種邊緣垂直且表面平坦的 突起物的滑行高度校正標準片之製造方法。 本發明係利用以下的製程方式，而達成上述之種種目 的： 首先，形成第一光阻層(PMGI)於一基材表面並曝光 後，再形^^第二光阻層於第一光阻層表面，接著利用微影 技術將光罩上的圖案轉移到第二光阻層而製定出光阻層的 圖案。本發明的重點在於所述第一光阻層在顯影液中有著 4 本纸張尺度適用中國81家揉準（〇呢〉八4规格（2丨0><297公釐） ---------装------,訂------^ (請先閲讀背面之注意事項再填寫本頁) A7 B7 經濟部令央橾窣局員工消资合作社印«- 五、發明説明（夕） 較第二光阻層更快的溶解速率，因此可以形成上窄下寬的 窗口，也就是所謂的懸垂(overhang)結構，接著，以所述 光阻圖案作爲護罩，利用濺鍍方式形成至少一個圓柱形的 突起物於所述基板的表面，突起物的材質可爲鉻、氮化 欽、類鑽石膜(diamond like crystal ; DLC)等易於源鑛的 物質，最後，利用去光阻液剝離（lift-off)光阻層以及其 上的突起物材質，而僅保留前述覆蓋於基板表面的突起 物，本發明所述之滑行高度校正標準片的製法於焉完成。 圖式的簡要說明： 圖一爲習知技藝利用校正標準片來校正滑行高度的示 意圖。 圓二爲本發明實施例於塗佈第二光阻後的剖面圓。 圖三爲本發明實施例於形成上窄下寬窗口後的剖面 圖。 圖四爲本發明實施例於形成突起物於窗口內的剖面 圖。 圖五爲本發明實施例滑行高度校正標準片的完成剖面 圖。 圖號說明： 20-校正標準片 24-滑行體 27-信號轉換器 52-第一光阻層(PMGI) 56-光罩 22-突起物 26-支架懸臂 50-基板 54-第二光阻層 57-光源 本紙張尺度逍用中國國家搮準（CNS } Α4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) -裝_Printed by A7 __B7 _ of the Central Bureau of Economic Affairs, Ministry of Economic Affairs, Fifth, Invention Description (/) Field of the Invention: The present invention relates to a method for manufacturing a sliding height correction standard disk for a sliding body. In particular, it relates to a method for manufacturing a skid height correction standard film by using a peeling technique. Conventional technology: Press, before the disc is officially shipped, it must be tested for sliding height to ensure good quality. At present, the general practice is to design a calibration standard with a known height protrusion on the surface, so that the sliding body collides with the standard to simulate the collision signal when taxiing in an actual drive to test whether the disc meets the required sliding height. . A signal converter is usually attached to the sliding body. The material is lead-titanium-titanium oxide (PZT; PbZrJihOp), which can generate an output signal when it comes in contact with the magnetic disk. Please refer to Figure 1, using calibration standards for conventional techniques. The slide is a schematic circle for correcting the sliding height. The sliding body 24 placed on the cantilever 26 has a PZT signal converter 27 on its surface. When the sliding body 24 wants to test the height of a specific position of the magnetic disk 20, it will Glide there, so you can use the protrusions 22 on the correction sheet for correction. Currently, there are many methods for making the slide height correction standard film. Generally, the most common method is to use perforated holes on the gold drawer mask to perform the projections. Sputtering, because the thickness of the gold tin mask (about 50 μιη) is 1000 times the height of the protrusions (about 0.05 μιη), when the protrusions are sputtered, the shape of the protrusions will appear low on the sides of the center due to the height difference. Irregular shape, and this phenomenon is more obvious when the height of the protrusion is lower, and in the trend towards the future high-density, small-volume disk drive, because the magnetic head is flying lower and lower, The height of the protrusion _3_ This paper size uses the Chinese National Standard (CNS) Α4 size (210X297 mm) I ϋ Install If n order — thread (please read the precautions on the back before filling this page) Ministry of Economic Affairs Printed by the Central Government Bureau of Shellfish Consumer Cooperatives «. A7 '. B7 V. Description of the Invention (2) * The requirements will also be lower, so this situation will become more serious, causing the height of the protrusions on the standard slide for height correction. Various disadvantages of uniformity, poor signal reproducibility, and limited life of the calibration standard film are not suitable for future use. In addition, Baumgart et al. Of IBM Corp. in US Patent No. 5,528,922 disclose a method of using lasers A method for manufacturing a crater-shaped protrusion with a glide height correction standard by using a light beam, but this process method is still different from the lift off technique of the present invention. Therefore, the present invention discloses a glide height correction standard The new method of film production can produce protrusions with vertical edges and flat surfaces on the disc to extend the life of the slide height correction standard film without the disadvantages of the conventional techniques. Summary of the Invention: The main object of the present invention is to provide a method for manufacturing a skid height correction standard sheet. A secondary object of the present invention is to provide a method for manufacturing a skid height correction standard sheet that is highly controllable. Another object of the present invention is Provided is a method for manufacturing a sliding height correction standard piece with a vertical edge and a flat surface. The present invention uses the following process methods to achieve the above-mentioned various objectives: First, a first photoresist layer (PMGI) is formed on a substrate. After the surface of the material is exposed, a second photoresist layer is formed on the surface of the first photoresist layer, and then the pattern on the photomask is transferred to the second photoresist layer by lithography technology to formulate the pattern of the photoresist layer. The main point of the present invention is that the first photoresist layer has 4 paper standards in the developing solution. The paper size is applicable to 81 companies in China (0?> 8 4 specifications (2 丨 0 > < 297 mm) ---- ----- install ------, order ------ ^ (Please read the precautions on the back before filling out this page) A7 B7 Printed by the Ministry of Economic Affairs and the Central Government Bureau Staff Consumer Cooperatives «- V. Description of the invention (Even) The dissolution rate is faster than the second photoresist layer, so it can form a window with a narrow upper and lower width, which is a so-called overhang structure. Then, the photoresist pattern is used as a shield. At least one cylindrical protrusion is formed on the surface of the substrate by a sputtering method. The material of the protrusion may be chromium, nitride, diamond-like film (diamond like crystal, DLC) and other materials that are easy to source ore. Finally Using lift-off photoresist to lift off the photoresist layer and the material of the protrusions thereon, while retaining only the protrusions covering the surface of the substrate as described above, the manufacturing method of the sliding height correction standard sheet according to the present invention is completed. Brief description of the figure: Figure 1 is a conventional technique to use the calibration standard to correct the taxi height. Intention. Circle 2 is a cross-sectional circle of the embodiment of the present invention after the application of the second photoresist. Figure 3 is a cross-sectional view of the embodiment of the present invention after forming an upper narrow lower wide window. Figure 4 is an embodiment of the present invention after forming a protrusion A cross-sectional view of an object in a window. Figure 5 is a completed cross-sectional view of a sliding height correction standard film according to an embodiment of the present invention. Description of the drawing number: 20-correction standard film 24-sliding body 27-signal converter 52-first photoresist layer (PMGI) 56-Photomask 22-Protrusion 26-Stent Cantilever 50-Substrate 54-Second Photoresist Layer 57-Light Source This paper is standard for China National Standards (CNS) Α4 (210X297 mm) (please first Read the notes on the back and fill out this page)
、1T 線 經濟部中央橾準局負工消费合作社印装 A7 B7 五、發明説明（4) 58-窗口 60-突起物層 發明詳細說明： 請參閱圖二，本發明之起始材料爲一基板50，先形成 第一光阻層52於所述基板5G表面，經過曝光後再形成第二 光阻層54於所述第一光阻層52表面，再進行一次曝光57和 顯影等微影製程（1 i thography)將光罩56上的圖案轉移到光 阻層而製定出光阻層的圖案。本發明的重點在於所述第一 光阻層52在顯影液中有著較第二光阻層54更快的溶解速 率，因此可以形成上窄下寬的窗口58，如圖三所示》 所述基板通常是表面鍍有磷化鎳(NiP)的鋁板，但是也 可以是表面鍍有其他材質。所述第一光阻層52通常是聚二 甲基麩酸酐亞胺(PMGI ; Polydimethylglutarimide)，其厚 度須略大於未來所欲形成的突起物高度，所述第二光阻層 54通常則是一般的光阻劑，而形成光阻層的方法通常係利 用自旋塗佈的技術。所述微影製程通常是利用紫外線 (Ultra Violet ; UV) ' 深紫外線（Deep Ultra Violet ; De印UV)、X-光(X-Ray)或電子束(E-Beam)等光源。 請參閱圖四，接著，濺鍍一突起物層60於整個基板50 的表面，因爲上有述光阻圖案作爲護罩，所以可以生成至 少一個邊緣垂直表面平坦的突起物60於所述基板50的表 面，如圖四所示。 所述突起物層60通常是利用蒸鍍、濺鍍、鍍膜方式所 形成，其材質通常是鉻(Cr)合金膜’但也可以是其他的材 質，如：鈦（Ti)、氮化鈦（TiN)、鎳（Ni)、類鑽石膜 6 _ 本紙*尺度逋用中國國家揉準（CNS ) A4規格（210X29*7公釐） ---------^------tr------漆. {請先Μ讀背面之注意事項再填寫本頁) 397979 五、發明説明（5) (DLC)、鋁、鎢等任何可以蒸鍍或濺鍍的材料。 請參閱圖五，爲本發明另一重點所在，係利用剝離技 術（lift off)將所述光阻層的圖案以及其上的突起物材質 直接除去，而僅保留前述覆蓋於基板50表面的突起物60， 本發明所述之滑行高度校正標準片的製法於焉完成。所述 剝離技術，在此係將整個平面基材50浸在N-甲基咯 (NMP ; N-Methy卜2-pyrrol idone)或丙酮（acetone)溶液 中，並利用超音波振盪技術而達成。而利用本發明實施例 所製作的滑行高度校正標準片，其使用壽命更是較習用方 法增加3倍以上，能夠有效地降低生產成本。 以上所述係利用較佳實施例詳細說明本發明，而非限 制本發明之範圍，而且熟知此技藝的人士皆能明瞭，適當 作些微的改變及調整，仍將不失本發明之要義所在，亦不 脫離本發明之精神和範圍。 ---------1------1T------^ (請先聞讀背面之注意事項再填寫本頁) 經濟部中央樣準局負工消費合作杜印裝 本纸張尺度適用中國國家揲率（CNS ) A4规格（210X297公釐）1. A7 B7 printed by the Central Workstation and Consumer Cooperatives of the Ministry of Economic Affairs of the 1T line. 5. Description of the invention (4) 58-window 60-projection layer Detailed description of the invention: Please refer to Figure 2. The starting material of the present invention is a substrate 50. First, a first photoresist layer 52 is formed on the surface of the substrate 5G. After exposure, a second photoresist layer 54 is formed on the surface of the first photoresist layer 52, and then a photolithography process such as exposure 57 and development is performed. (1 i thography) The pattern on the photomask 56 is transferred to the photoresist layer to define the pattern of the photoresist layer. The main point of the present invention is that the first photoresist layer 52 has a faster dissolution rate in the developing solution than the second photoresist layer 54, so that a window 58 with a narrow upper width and a lower width can be formed, as shown in FIG. The substrate is usually an aluminum plate plated with nickel phosphide (NiP), but it may also be plated with other materials. The first photoresist layer 52 is usually polydimethylglutarimide (PMGI), and its thickness must be slightly greater than the height of the protrusions to be formed in the future. The second photoresist layer 54 is generally Photoresist, and the method of forming a photoresist layer is usually a spin coating technique. The lithography process generally uses light sources such as Ultra Violet (UV), Deep Ultra Violet (UV), X-Ray, or E-Beam. Please refer to FIG. 4. Next, a protrusion layer 60 is sputtered on the entire surface of the substrate 50. Because the photoresist pattern is used as a cover, at least one protrusion 60 having a flat vertical surface on the edge can be generated on the substrate 50. The surface is shown in Figure 4. The protrusion layer 60 is generally formed by evaporation, sputtering, or plating. The material of the protrusion layer 60 is usually a chromium (Cr) alloy film, but it can also be other materials, such as titanium (Ti), titanium nitride ( TiN), nickel (Ni), diamond-like film 6 _ The size of this paper * Chinese National Standard (CNS) A4 (210X29 * 7 mm) --------- ^ ------ tr ------ lacquer. {Please read the precautions on the back before filling this page) 397979 V. Description of the Invention (5) (DLC), aluminum, tungsten, and any other materials that can be evaporated or sputtered. Please refer to FIG. 5, which is another important point of the present invention. The lift off technique is used to directly remove the pattern of the photoresist layer and the material of the protrusions thereon, while retaining only the aforementioned protrusions covering the surface of the substrate 50. Object 60, the manufacturing method of the sliding height correction standard film according to the present invention is completed. The stripping technique is achieved by immersing the entire planar substrate 50 in an N-methylpyrrole (NMP; N-Methyb 2-pyrrol idone) or acetone solution, and using an ultrasonic oscillation technique. However, the glide height correction standard film produced by the embodiment of the present invention has a service life that is more than three times longer than the conventional method, which can effectively reduce the production cost. The above is a detailed description of the present invention by using preferred embodiments, rather than limiting the scope of the present invention, and those skilled in the art will understand that appropriate changes and adjustments will still be made without losing the essence of the present invention. Without departing from the spirit and scope of the invention. --------- 1 ------ 1T ------ ^ (Please read and read the notes on the back before filling out this page) Du Yin, Offical and Consumer Cooperation, Central Procurement Bureau, Ministry of Economic Affairs The size of this paper is applicable to China National Standard (CNS) A4 (210X297 mm)