JPS6229511B2 - - Google Patents
Info
- Publication number
- JPS6229511B2 JPS6229511B2 JP14720785A JP14720785A JPS6229511B2 JP S6229511 B2 JPS6229511 B2 JP S6229511B2 JP 14720785 A JP14720785 A JP 14720785A JP 14720785 A JP14720785 A JP 14720785A JP S6229511 B2 JPS6229511 B2 JP S6229511B2
- Authority
- JP
- Japan
- Prior art keywords
- mesh
- frame
- corrosion
- etching
- resistant film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005530 etching Methods 0.000 claims description 28
- 238000005260 corrosion Methods 0.000 claims description 18
- 230000007797 corrosion Effects 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 10
- 238000010586 diagram Methods 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、スクリーン印刷版、シヤドウマス
ク、螢光表示管用グリツド電極、高精度金属製フ
イルターなどの微細なメツシユ部を有するメツシ
ユ製品の製造方法に関する。Detailed Description of the Invention (Industrial Application Field) The present invention relates to a method for manufacturing mesh products having fine mesh parts such as screen printing plates, shadow masks, grid electrodes for fluorescent display tubes, and high-precision metal filters. .
（従来の技術）
従来このようなメツシユ製品は、メツシユ部と
その周辺部である枠状体からなることが多く、さ
らに言えば、メツシユ部の厚みは枠状体の厚みに
比べて薄くすることが、パターン精度の向上およ
び機能上好ましいものである。第２図イ，ロは、
このようなメツシユ製造を作成する方法の一例を
図示するものである。第２図において、金属板１
および耐食膜はその厚みを誇張されて描かれてい
る。実際は金属板１は30〜200ミクロン程度であ
る。第２図イに示すように、金属板１の一方の面
には、メツシユ部に相当する耐食膜２および枠状
体に相当する耐食膜３ａを設けているが、他方の
面には枠状体に相当する耐食膜３ｂのみが設けら
れ、メツシユ部に相当する耐食膜が設けられな
い。この状態で両面からエツチングすると、第２
図ロに示すように、枠状体４に比較してメツシユ
部５の厚みが減じた形でメツシユ製品ができあが
る。(Prior art) Conventionally, such mesh products often consist of a mesh part and a frame-shaped body surrounding the mesh part, and furthermore, the thickness of the mesh part has to be thinner than the thickness of the frame-shaped body. This is preferable in terms of improved pattern accuracy and functionality. Figure 2 A and B are
An example of a method for creating such a mesh fabrication is illustrated. In FIG. 2, metal plate 1
The thickness of the corrosion-resistant film is exaggerated. Actually, the metal plate 1 has a thickness of about 30 to 200 microns. As shown in FIG. 2A, one surface of the metal plate 1 is provided with a corrosion-resistant film 2 corresponding to a mesh part and a corrosion-resistant film 3a corresponding to a frame-shaped body, and the other surface is provided with a frame-shaped body. Only the corrosion-resistant film 3b corresponding to the body is provided, and no corrosion-resistant film corresponding to the mesh portion is provided. If you etch from both sides in this state, the second
As shown in FIG. 2, a mesh product is completed in which the thickness of the mesh portion 5 is reduced compared to that of the frame-like body 4.
しかし、この従来法には以下に述べるような欠
点がある。第３図は、枠状体４とメツシユ部５の
境界部分を拡大して示すものであるが、第３図ハ
に示すように、メツシユ部５と枠状体４の接合部
は深くえぐり取られ、メツシユ部５と枠状体４の
結合が脆弱となり、時としてメツシユ部５が枠状
体４から脱離するという不良発生を招いた。 However, this conventional method has the following drawbacks. FIG. 3 shows an enlarged view of the boundary between the frame member 4 and the mesh portion 5. As shown in FIG. As a result, the connection between the mesh portion 5 and the frame-like body 4 became weak, resulting in defects in which the mesh portion 5 sometimes detached from the frame-like body 4.
蛇足ながら、境界部分の理想的な状態は、第３
図ロに示すように、枠状体４とメツシユ部５が単
調な勾配曲線により連結している状態である。 The ideal state of the boundary part is the third
As shown in FIG. 9, the frame-like body 4 and the mesh portion 5 are connected by a monotonous slope curve.
従来法が、第３図ハに示す欠点が生じる理由
は、第４図に概念的に示される。すなわち、第４
図はエツチング途中を想定したものであるが、エ
ツチング液１０の他方の面（この場合は下側）に
対してスプレーノズルから噴射されるのである
が、噴射されたエツチング液は、被食刻面に当接
し、それから両端へ強制流動する傾向があり、両
端で枠状体４に当接して、その付近（すなわちメ
ツシユ部と枠状体の境界部）を深く腐食溶解する
ものである。 The reason why the conventional method has the drawback shown in FIG. 3C is conceptually shown in FIG. That is, the fourth
The figure assumes that the etching is in the middle of etching, and the etching liquid 10 is sprayed from the spray nozzle onto the other side (in this case, the lower side), but the sprayed etching liquid is sprayed onto the etching surface. There is a tendency for the metal to flow forcefully toward both ends, and to contact the frame-like body 4 at both ends, deeply corroding and dissolving the vicinity thereof (that is, the boundary between the mesh portion and the frame-like body).
（発明が解決しようとする問題点）
本発明は、以上のような従来技術の欠点を解決
し、メツシユ部と枠状体との連結を理想的な状態
としたメツシユ製品の製造方法である。(Problems to be Solved by the Invention) The present invention is a method for manufacturing a mesh product that solves the above-described drawbacks of the prior art and idealizes the connection between the mesh portion and the frame-shaped body.
（問題点を解決する具体的手段）
すなわち、本発明は、金属板の一方の面に形成
しようとするメツシユ部の形状と同様の形状の耐
食膜と形成しようとする枠状体の形状と同様の形
状の耐食膜を形成し、他方の面に形成しようとす
る枠状体の形状と同様の形状の耐食膜を形成した
該金属板を、エツチング液にて両面同時に腐食溶
解することにより、枠状体とメツシユ部が一体と
なつたメツシユ製品を製造する方法において、一
方の面のメツシユ部の形状と同様の形状に施され
た前記耐食膜に対応する他方の面の位置にサイド
エツチング現象によつて最終的に脱落する線幅の
小なる補助レジストを設けた状態で両面同時エツ
チング処理を行なうことを特徴とするメツシユ製
品の製造方法である。(Specific means for solving the problem) That is, the present invention provides a corrosion-resistant film having a shape similar to that of the mesh part to be formed on one surface of a metal plate and a frame-like body having a shape similar to that of the mesh part to be formed on one side of the metal plate. A metal plate having a shape similar to that of the frame to be formed is formed on the other surface, and both sides of the metal plate are corroded and dissolved at the same time using an etching solution to form a frame. In a method for manufacturing a mesh product in which a mesh part and a mesh part are integrated, a side etching phenomenon occurs at a position on the other side corresponding to the corrosion-resistant film applied in the same shape as the mesh part on one side. This method of manufacturing a mesh product is characterized in that simultaneous etching is performed on both sides in a state where an auxiliary resist with a small line width that eventually falls off is provided.
以下、本発明の実施例を工程順に示す第１図に
基いて説明する。 Hereinafter, an embodiment of the present invention will be described based on FIG. 1, which shows the steps in order.
第１図イに示すように、材料となる金属板１
は、枠状体と同一の厚さ、あるいは作成しようと
するメツシユ製品が必要とする最大厚さと同一の
厚さを有し、材質としては、鉄、鋼、42合金（ニ
ツケル42重量％、残部鉄）、ステレス鋼のほか、
銅、銅合金、アルミニウム、モリブデン、タング
ステン等これらに限られず各種の合属が対象とな
りうる。この金属板１の両面に感光性レジスト膜
６ａ，６ｂを施す。感光性レジストは、ポリビニ
ルアルコール、カゼイン、ゼラチン等の高分子樹
脂に重クロム酸塩のような光架橋剤を添加した水
溶性感光性樹脂が安価で使い易いが、その他に有
機溶媒系の感光性樹脂や自己硬化型の無溶剤感光
性樹脂も用いることができる。後者は、一般に高
解像パターンの形成に適している。次に第１図ロ
に示すように、両面にマスク原版７ａ，７ｂを密
着配置し、上下から光を照射して、感光性レジス
ト膜６ａ，６ｂを露光する。図の実施例ではネガ
型の感光性レジストを用いているから、光が照射
された部分だけが硬化し、現像すれば、第１図ハ
に示された状態となる。本発明の特徴はメツシユ
部に相当する耐食膜８に対峙する他方の面に、極
めて微細な線幅の補助レジスト９を設けておくこ
とである。すなわち、メツシユ部に相当する耐食
膜８は、メツシユ線幅として残存するパターンで
あるが、補助レジスト９は、それよりもはるかに
細いものであるから、エツチング処理のサイドエ
ツチング現象により消滅する。第１図ニにエツチ
ング途中における補助レジスト９が剥落する直前
の様子を示す。補助レジスト９の剥落の結果、第
１図ホに示すように、最終的には他方の面にハー
フエツチング状態が実現し、板厚を薄くすること
ができる。しかしながら、第１図ホに示すよう
に、メツシユ部５と枠状体４の境界部１２は、な
だらかな勾配曲線により連結しているから、強固
な結合状態にあると言える。 As shown in Fig. 1A, a metal plate 1 is the material
has the same thickness as the frame or the maximum thickness required by the mesh product to be made, and is made of iron, steel, 42 alloy (nickel 42% by weight, balance iron), stainless steel,
Various metals including but not limited to copper, copper alloy, aluminum, molybdenum, tungsten, etc. can be targeted. Photosensitive resist films 6a and 6b are applied to both sides of this metal plate 1. For photosensitive resists, water-soluble photosensitive resins made by adding photocrosslinking agents such as dichromate to polymeric resins such as polyvinyl alcohol, casein, and gelatin are inexpensive and easy to use, but there are also organic solvent-based photosensitive resins. Resins and self-curing solvent-free photosensitive resins can also be used. The latter is generally suitable for forming high resolution patterns. Next, as shown in FIG. 1B, mask originals 7a and 7b are placed in close contact with each other on both sides, and light is irradiated from above and below to expose the photosensitive resist films 6a and 6b. Since the illustrated embodiment uses a negative type photosensitive resist, only the portions irradiated with light are cured, and when developed, the state shown in FIG. 1C is obtained. A feature of the present invention is that an auxiliary resist 9 having an extremely fine line width is provided on the other surface facing the anti-corrosion film 8 corresponding to the mesh portion. That is, the pattern of the anti-corrosion film 8 corresponding to the mesh portion remains as a mesh line width, but the auxiliary resist 9 is much thinner than the pattern, and therefore disappears due to the side etching phenomenon of the etching process. FIG. 1D shows the state immediately before the auxiliary resist 9 peels off during etching. As a result of the peeling off of the auxiliary resist 9, a half-etched state is finally realized on the other surface as shown in FIG. 1E, and the plate thickness can be reduced. However, as shown in FIG. 1E, the boundary portion 12 between the mesh portion 5 and the frame-like body 4 is connected by a gentle slope curve, so it can be said that they are in a strong bond.
（作 用）
このようになる理由を第５図に概念的に示す。
本発明では、補助レジストａにより他方の面（下
側）のエツチングは、メツシユのひとつひとつに
ついて別個に進行することになり、下方から噴射
されるエツチング液１０は、従来法のように両端
部へ集中的に流れることなく、個々のエツチング
領域の腐食溶解に終始するものである。補助レジ
スト９は、メツシユ部と枠状体の境界部の局部的
なエツチング進行を阻止する。(Function) The reason why this happens is conceptually shown in Figure 5.
In the present invention, the etching of the other surface (lower side) by the auxiliary resist a proceeds separately for each mesh, and the etching liquid 10 injected from below is concentrated at both ends as in the conventional method. This results in corrosion and dissolution of the individual etched areas without any flow. The auxiliary resist 9 prevents the progress of local etching at the boundary between the mesh portion and the frame-like body.
（補足説明）
一般に、第６図において、エツチングフアクタ
ーＦ、深度Ｄ、サイドエツチ量Ｒの関係は、
Ｆ＝Ｄ／Ｒ
で表わされる。(Supplementary Explanation) Generally, in FIG. 6, the relationship among the etching factor F, depth D, and side etching amount R is expressed as F=D/R.
即ち、Ｒ＝Ｄ／Ｆとなり、耐食膜１１の幅Ｓは
エツチングフアクターＦと深度Ｄにより決定され
る。本発明では補助レジストの幅Ｓはサイドエツ
チングにより消滅する大きさとすれば良いが、実
用的には
Ｓ＝Ｄ／Ｆ
程度に設定される。通常のスプレー噴射エツチン
グ条件ではＦ＝1.5〜3.5であることが知られてい
るから、仮にＦ＝2.5とし、エツチング深度Ｄ＝
0.1mmとすると、補助レジストの幅Ｓは、
Ｓ＝０．１／２．５＝0.04mm
程度の値が一例として導き出される。 That is, R=D/F, and the width S of the corrosion-resistant film 11 is determined by the etching factor F and depth D. In the present invention, the width S of the auxiliary resist may be set to a size that disappears by side etching, but practically it is set to approximately S=D/F. It is known that F=1.5 to 3.5 under normal spray etching conditions, so let's assume F=2.5 and etching depth D=
Assuming 0.1 mm, the width S of the auxiliary resist can be derived, for example, as follows: S=0.1/2.5=0.04 mm.
なお、補助レジストの形態としては第７図イに
示すように、一本の補助レジスト９ａとすること
以外に、第７図ロに示すように、複数本からなる
補助レジスト９ｂとしても良い。複数本の補助レ
ジスト９ｂを用いれば、メツシユ５の断面形状が
四角形に近い良好な形状となるほか、補助レジス
トの疎密の程度によつて、エツチング深度を調節
することができ、メツシユ部５の厚みも制御でき
る。 The form of the auxiliary resist may be one auxiliary resist 9a as shown in FIG. 7A, or a plurality of auxiliary resists 9b as shown in FIG. 7B. By using a plurality of auxiliary resists 9b, the cross-sectional shape of the mesh 5 becomes a good shape close to a rectangle, and the etching depth can be adjusted by adjusting the density of the auxiliary resists, so that the thickness of the mesh portion 5 can be adjusted. can also be controlled.
（発明の効果）
本発明によれば、補助レズストをメツシユ部の
他方の面に形成することにより、メツシユ部と枠
状体の連絡が強固なものとなり、メツシユ部が枠
状体から剥脱するような不良品の発生が極力押さ
えられる。また、補助レジストを複数本の形態と
すれば、メツシユ部断面の形状や厚みを制御でき
所望の形態の物品を製作できるという利点もあ
る。(Effects of the Invention) According to the present invention, by forming the auxiliary resist on the other surface of the mesh part, the connection between the mesh part and the frame-like body becomes strong, and the mesh part is prevented from peeling off from the frame-like body. The occurrence of defective products is minimized. Furthermore, if the auxiliary resist is formed into a plurality of pieces, there is an advantage that the cross-sectional shape and thickness of the mesh portion can be controlled and an article having a desired shape can be manufactured.
第１図イ〜ホは、本発明のメツシユ製品の製造
法の一実施例を工程順に示す説明図であり、第２
図イ〜ロは、従来技術の一例を示す説明図、第３
図は、メツシユ製品のメツシユ部と枠状体の境界
部を拡大して示し、第３図イはその平面図、第３
図ロはその良好な形態を示す断面図、第３図ハは
その好ましくない形態を示す断面図であり、第４
図は従来技術エツチングの様子を示す説明図、第
５図は、本発明のエツチングの様子を示す説明
図、第６図は、サイドエツチング現象を示す説明
図であり、第７図イ，ロは、本発明に用いる補助
レジストの実施態様を示す説明図である。
１……金属板、３……枠状体に相当する耐食
膜、４……枠状体、５……メツシユ部、６……感
光性レジスト膜、７……マスク原版、２，８……
メツシユ部に相当する耐食膜、９……補助レジス
ト、１０……エツチング液、１１……耐食膜、１
２……境界部。
Figures 1A to 1E are explanatory diagrams showing one embodiment of the method for manufacturing a mesh product of the present invention in the order of steps;
Figures A to B are explanatory diagrams showing an example of the conventional technology;
The figure shows an enlarged view of the boundary between the mesh part and the frame-like body of the mesh product.
Figure B is a cross-sectional view showing a favorable form, Figure 3 C is a cross-sectional view showing an unfavorable form, and Figure 4 is a cross-sectional view showing an unfavorable form.
FIG. 5 is an explanatory diagram showing the state of etching according to the prior art, FIG. 5 is an explanatory diagram showing the state of etching according to the present invention, FIG. 6 is an explanatory diagram showing the side etching phenomenon, and FIGS. , is an explanatory diagram showing an embodiment of an auxiliary resist used in the present invention. DESCRIPTION OF SYMBOLS 1... Metal plate, 3... Corrosion-resistant film corresponding to a frame-shaped body, 4... Frame-shaped body, 5... Mesh part, 6... Photosensitive resist film, 7... Mask original plate, 2, 8...
Corrosion-resistant film corresponding to the mesh part, 9... Auxiliary resist, 10... Etching solution, 11... Corrosion-resistant film, 1
2... Boundary area.
Claims (1)
ユ部の形状と同様の形状の耐食膜と形成しようと
する枠状体の形状と同様の形状の耐食膜を形成
し、他方の面に形成しようとする枠状体の形状と
同様の形状の耐食膜を形成した該金属板を、エツ
チング液にて両面同時に腐食溶解することによ
り、枠状体とメツシユ部が一体となつたメツシユ
製品を製造する方法において、一方の面のメツシ
ユ部の形状と同様の形状に施された前記耐食膜に
対応する他方の面の位置にサイドエツチング現象
によつて最終的に脱落する線幅の小なる補助レジ
ストを設けた状態で両面同時エツチング処理を行
なうことを特徴とするメツシユ製品の製造方法。 ２ 補助レジストが単数本である特許請求の範囲
第１項記載のメツシユ製品の製造方法。 ３ 補助レジストが複数本である特許請求の範囲
第１項記載のメツシユ製品の製造方法。[Scope of Claims] 1. A corrosion-resistant film having a shape similar to that of a mesh portion to be formed on one surface of a metal plate and a corrosion-resistant film having a shape similar to the shape of a frame-like body to be formed, The metal plate, on which a corrosion-resistant film having the same shape as the frame to be formed on the other side is formed, is corroded and dissolved on both sides at the same time using an etching solution, so that the frame and the mesh part are integrated. In a method for manufacturing a mesh product, the width of a line that is finally removed due to a side etching phenomenon at a position on the other surface corresponding to the corrosion-resistant film applied in a shape similar to the shape of the mesh portion on one surface. A method for manufacturing a mesh product, characterized in that simultaneous etching treatment is performed on both sides with a small auxiliary resist provided. 2. The method for manufacturing a mesh product according to claim 1, wherein the auxiliary resist is a single resist. 3. The method for manufacturing a mesh product according to claim 1, wherein there are a plurality of auxiliary resists.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14720785A JPS627877A (en) | 1985-07-04 | 1985-07-04 | Production of mesh product |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14720785A JPS627877A (en) | 1985-07-04 | 1985-07-04 | Production of mesh product |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS627877A JPS627877A (en) | 1987-01-14 |
| JPS6229511B2 true JPS6229511B2 (en) | 1987-06-26 |
Family
ID=15424985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14720785A Granted JPS627877A (en) | 1985-07-04 | 1985-07-04 | Production of mesh product |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS627877A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4710829B2 (en) * | 2005-06-20 | 2011-06-29 | 東レ株式会社 | Electromagnetic shield sheet manufacturing method, electromagnetic shield sheet manufactured by the method, and filter and display using the same |
| CN104094413B (en) * | 2011-12-07 | 2016-11-09 | 纳沃萨恩公司 | Photovoltaic cell and the method forming photovoltaic cell |
-
1985
- 1985-07-04 JP JP14720785A patent/JPS627877A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS627877A (en) | 1987-01-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |