TW394980B - Semiconductor device fabrication system and method of forming semiconductor device pattern using the same - Google Patents

Semiconductor device fabrication system and method of forming semiconductor device pattern using the same Download PDF

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Publication number
TW394980B
TW394980B TW087112710A TW87112710A TW394980B TW 394980 B TW394980 B TW 394980B TW 087112710 A TW087112710 A TW 087112710A TW 87112710 A TW87112710 A TW 87112710A TW 394980 B TW394980 B TW 394980B
Authority
TW
Taiwan
Prior art keywords
photoresist
pattern
baking
wafer
semiconductor device
Prior art date
Application number
TW087112710A
Other languages
English (en)
Chinese (zh)
Inventor
Gyu-Chan Jeoung
Kwang-Seok Choi
Jin-Hang Jung
Young-Sun Kim
Hong Lee
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Application granted granted Critical
Publication of TW394980B publication Critical patent/TW394980B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW087112710A 1998-02-05 1998-07-31 Semiconductor device fabrication system and method of forming semiconductor device pattern using the same TW394980B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR19980003252 1998-02-05
KR19980010172 1998-03-24
KR19980013856 1998-04-17
KR19980026680 1998-07-02

Publications (1)

Publication Number Publication Date
TW394980B true TW394980B (en) 2000-06-21

Family

ID=27483263

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087112710A TW394980B (en) 1998-02-05 1998-07-31 Semiconductor device fabrication system and method of forming semiconductor device pattern using the same

Country Status (2)

Country Link
KR (1) KR100291331B1 (ko)
TW (1) TW394980B (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110634447A (zh) * 2014-10-27 2019-12-31 三星显示有限公司 有机发光二极管显示装置
CN111352316A (zh) * 2020-04-15 2020-06-30 Tcl华星光电技术有限公司 光阻漂白与烘烤方法及其装置

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100589048B1 (ko) * 2000-04-14 2006-06-13 삼성전자주식회사 포토레지스트 패턴 형성 장치
JP3959612B2 (ja) * 2002-01-22 2007-08-15 東京エレクトロン株式会社 基板処理装置及び基板処理方法
KR100465867B1 (ko) * 2002-05-13 2005-01-13 주식회사 하이닉스반도체 반도체 소자의 미세 콘택 패턴 제조 방법
US7679714B2 (en) * 2006-10-12 2010-03-16 Asml Netherlands B.V. Lithographic apparatus, combination of lithographic apparatus and processing module, and device manufacturing method
KR101313656B1 (ko) * 2011-08-29 2013-10-02 주식회사 케이씨텍 인-라인 현상장비 및 이를 이용한 액정표시장치의 제조방법

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110634447A (zh) * 2014-10-27 2019-12-31 三星显示有限公司 有机发光二极管显示装置
CN110634447B (zh) * 2014-10-27 2022-06-10 三星显示有限公司 有机发光二极管显示装置
US11765938B2 (en) 2014-10-27 2023-09-19 Samsung Display Co., Ltd. Organic light emitting diode display device for reducing defects due to an overlay change
CN111352316A (zh) * 2020-04-15 2020-06-30 Tcl华星光电技术有限公司 光阻漂白与烘烤方法及其装置
CN111352316B (zh) * 2020-04-15 2024-04-12 Tcl华星光电技术有限公司 光阻漂白与烘烤方法及其装置

Also Published As

Publication number Publication date
KR19990071372A (ko) 1999-09-27
KR100291331B1 (ko) 2001-07-12

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